JP5686413B2 - Adamantanamine derivative - Google Patents
Adamantanamine derivative Download PDFInfo
- Publication number
- JP5686413B2 JP5686413B2 JP2011547526A JP2011547526A JP5686413B2 JP 5686413 B2 JP5686413 B2 JP 5686413B2 JP 2011547526 A JP2011547526 A JP 2011547526A JP 2011547526 A JP2011547526 A JP 2011547526A JP 5686413 B2 JP5686413 B2 JP 5686413B2
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- Prior art keywords
- substituted
- unsubstituted
- formula
- compound
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- DKNWSYNQZKUICI-UHFFFAOYSA-N amantadine Chemical class C1C(C2)CC3CC2CC1(N)C3 DKNWSYNQZKUICI-UHFFFAOYSA-N 0.000 title description 4
- -1 carboxy, hydroxy Chemical group 0.000 claims description 151
- 150000001875 compounds Chemical class 0.000 claims description 115
- 125000000217 alkyl group Chemical group 0.000 claims description 60
- 125000003118 aryl group Chemical group 0.000 claims description 38
- 229910052739 hydrogen Inorganic materials 0.000 claims description 36
- 239000001257 hydrogen Substances 0.000 claims description 36
- 125000001072 heteroaryl group Chemical group 0.000 claims description 35
- 125000000623 heterocyclic group Chemical group 0.000 claims description 35
- 238000006243 chemical reaction Methods 0.000 claims description 31
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 31
- 229910052736 halogen Inorganic materials 0.000 claims description 29
- 150000002367 halogens Chemical class 0.000 claims description 28
- 150000003839 salts Chemical class 0.000 claims description 25
- 150000002431 hydrogen Chemical class 0.000 claims description 22
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 19
- 239000012453 solvate Substances 0.000 claims description 19
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 125000003342 alkenyl group Chemical group 0.000 claims description 17
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 16
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 16
- 125000000304 alkynyl group Chemical group 0.000 claims description 15
- FPQQSJJWHUJYPU-UHFFFAOYSA-N 3-(dimethylamino)propyliminomethylidene-ethylazanium;chloride Chemical compound Cl.CCN=C=NCCCN(C)C FPQQSJJWHUJYPU-UHFFFAOYSA-N 0.000 claims description 14
- 125000002252 acyl group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 claims description 11
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 11
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims description 10
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 10
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 claims description 8
- 125000005143 heteroarylsulfonyl group Chemical group 0.000 claims description 8
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 claims description 8
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical group ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 claims description 8
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 8
- 230000002140 halogenating effect Effects 0.000 claims description 6
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 claims description 5
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide Substances CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 4
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 claims description 3
- BGRWYRAHAFMIBJ-UHFFFAOYSA-N diisopropylcarbodiimide Natural products CC(C)NC(=O)NC(C)C BGRWYRAHAFMIBJ-UHFFFAOYSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 63
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 57
- 239000000203 mixture Substances 0.000 description 42
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 40
- 239000000243 solution Substances 0.000 description 39
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 35
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 32
- 239000002904 solvent Substances 0.000 description 31
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 27
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 24
- 239000012044 organic layer Substances 0.000 description 21
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 20
- 125000001424 substituent group Chemical group 0.000 description 18
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 17
- 150000001412 amines Chemical class 0.000 description 16
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 229940125904 compound 1 Drugs 0.000 description 15
- 229910052938 sodium sulfate Inorganic materials 0.000 description 15
- 235000011152 sodium sulphate Nutrition 0.000 description 15
- 238000010898 silica gel chromatography Methods 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229920006395 saturated elastomer Polymers 0.000 description 12
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 12
- 235000017557 sodium bicarbonate Nutrition 0.000 description 12
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000000543 intermediate Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 238000010992 reflux Methods 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 8
- 229940125898 compound 5 Drugs 0.000 description 7
- 125000002541 furyl group Chemical group 0.000 description 7
- 125000005543 phthalimide group Chemical group 0.000 description 7
- 125000001544 thienyl group Chemical group 0.000 description 7
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 5
- 235000019341 magnesium sulphate Nutrition 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 125000004434 sulfur atom Chemical group 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 229910052722 tritium Inorganic materials 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 4
- 125000005129 aryl carbonyl group Chemical group 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 125000005223 heteroarylcarbonyl group Chemical group 0.000 description 4
- 125000006517 heterocyclyl carbonyl group Chemical group 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 3
- 125000005090 alkenylcarbonyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000006254 cycloalkyl carbonyl group Chemical group 0.000 description 3
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 125000000298 cyclopropenyl group Chemical group [H]C1=C([H])C1([H])* 0.000 description 3
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 125000002950 monocyclic group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 2
- 229940126558 11β-HSD1 inhibitor Drugs 0.000 description 2
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- BMTZEAOGFDXDAD-UHFFFAOYSA-M 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholin-4-ium;chloride Chemical compound [Cl-].COC1=NC(OC)=NC([N+]2(C)CCOCC2)=N1 BMTZEAOGFDXDAD-UHFFFAOYSA-M 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SORGEQQSQGNZFI-UHFFFAOYSA-N [azido(phenoxy)phosphoryl]oxybenzene Chemical compound C=1C=CC=CC=1OP(=O)(N=[N+]=[N-])OC1=CC=CC=C1 SORGEQQSQGNZFI-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 229940024606 amino acid Drugs 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- WRJWRGBVPUUDLA-UHFFFAOYSA-N chlorosulfonyl isocyanate Chemical compound ClS(=O)(=O)N=C=O WRJWRGBVPUUDLA-UHFFFAOYSA-N 0.000 description 2
- 229940125773 compound 10 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 2
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 238000010511 deprotection reaction Methods 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 239000002198 insoluble material Substances 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 2
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- XMJHPCRAQCTCFT-UHFFFAOYSA-N methyl chloroformate Chemical compound COC(Cl)=O XMJHPCRAQCTCFT-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000003226 pyrazolyl group Chemical group 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 125000003831 tetrazolyl group Chemical group 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 description 1
- ITOFPJRDSCGOSA-KZLRUDJFSA-N (2s)-2-[[(4r)-4-[(3r,5r,8r,9s,10s,13r,14s,17r)-3-hydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-17-yl]pentanoyl]amino]-3-(1h-indol-3-yl)propanoic acid Chemical compound C([C@H]1CC2)[C@H](O)CC[C@]1(C)[C@@H](CC[C@]13C)[C@@H]2[C@@H]3CC[C@@H]1[C@H](C)CCC(=O)N[C@H](C(O)=O)CC1=CNC2=CC=CC=C12 ITOFPJRDSCGOSA-KZLRUDJFSA-N 0.000 description 1
- 0 *C(*)(*)C=C[n]1ncc(C(N[C@]2C(C3)C[C@]4(*)CC2CC3C4)=O)c1* Chemical compound *C(*)(*)C=C[n]1ncc(C(N[C@]2C(C3)C[C@]4(*)CC2CC3C4)=O)c1* 0.000 description 1
- 125000001305 1,2,4-triazol-3-yl group Chemical group [H]N1N=C([*])N=C1[H] 0.000 description 1
- 125000001401 1,2,4-triazol-4-yl group Chemical group N=1N=C([H])N([*])C=1[H] 0.000 description 1
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- 229940049920 malate Drugs 0.000 description 1
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- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000002503 metabolic effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- RIFHJAODNHLCBH-UHFFFAOYSA-N methanethione Chemical group S=[CH] RIFHJAODNHLCBH-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 150000004702 methyl esters Chemical group 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical class CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 150000004682 monohydrates Chemical class 0.000 description 1
- 125000004312 morpholin-2-yl group Chemical group [H]N1C([H])([H])C([H])([H])OC([H])(*)C1([H])[H] 0.000 description 1
- 125000004572 morpholin-3-yl group Chemical group N1C(COCC1)* 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- ACTNHJDHMQSOGL-UHFFFAOYSA-N n',n'-dibenzylethane-1,2-diamine Chemical compound C=1C=CC=CC=1CN(CCN)CC1=CC=CC=C1 ACTNHJDHMQSOGL-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000001715 oxadiazolyl group Chemical group 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000004043 oxo group Chemical group O=* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000008194 pharmaceutical composition Substances 0.000 description 1
- 125000004934 phenanthridinyl group Chemical group C1(=CC=CC2=NC=C3C=CC=CC3=C12)* 0.000 description 1
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000004483 piperidin-3-yl group Chemical group N1CC(CCC1)* 0.000 description 1
- 125000004482 piperidin-4-yl group Chemical group N1CCC(CC1)* 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000159 protein binding assay Methods 0.000 description 1
- 125000001042 pteridinyl group Chemical group N1=C(N=CC2=NC=CN=C12)* 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000004307 pyrazin-2-yl group Chemical group [H]C1=C([H])N=C(*)C([H])=N1 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000002206 pyridazin-3-yl group Chemical group [H]C1=C([H])C([H])=C(*)N=N1 0.000 description 1
- 125000004940 pyridazin-4-yl group Chemical group N1=NC=C(C=C1)* 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000246 pyrimidin-2-yl group Chemical group [H]C1=NC(*)=NC([H])=C1[H] 0.000 description 1
- 125000004527 pyrimidin-4-yl group Chemical group N1=CN=C(C=C1)* 0.000 description 1
- 125000004528 pyrimidin-5-yl group Chemical group N1=CN=CC(=C1)* 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000002943 quinolinyl group Chemical class N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 159000000008 strontium salts Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000004426 substituted alkynyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000005346 substituted cycloalkyl group Chemical group 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003461 sulfonyl halides Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical class CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical class C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- 229940124597 therapeutic agent Drugs 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000005300 thiocarboxy group Chemical group C(=S)(O)* 0.000 description 1
- HFRXJVQOXRXOPP-UHFFFAOYSA-N thionyl bromide Chemical compound BrS(Br)=O HFRXJVQOXRXOPP-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 208000001072 type 2 diabetes mellitus Diseases 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/32—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C271/34—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/34—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups
- C07C233/35—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom
- C07C233/36—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a hydrogen atom or to a carbon atom of an acyclic saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/34—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups
- C07C233/41—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by amino groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/24—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
- C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C311/07—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/18—One oxygen or sulfur atom
- C07D231/20—One oxygen atom attached in position 3 or 5
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
- C07C2603/74—Adamantanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Plural Heterocyclic Compounds (AREA)
Description
本発明は、アダマンタンアミン誘導体に関する。詳しくは、11βHSD−1阻害剤(I型11βヒドロキシステロイド脱水素酵素阻害剤)の重要中間体として有用なアダマンタンアミン誘導体、およびそれを用いた11βHSD−1阻害剤の製造方法に関する。 The present invention relates to an adamantaneamine derivative. Specifically, the present invention relates to an adamantaneamine derivative useful as an important intermediate of an 11βHSD-1 inhibitor (type I 11β hydroxysteroid dehydrogenase inhibitor) and a method for producing an 11βHSD-1 inhibitor using the same.
式(III):
で示される化合物もしくはその塩またはそれらの溶媒和物は、11βHSD−1阻害活性を有し、該化合物を含有する医薬組成物はII型糖尿病治療剤として有用であることが知られている(特許文献1、特許文献2)。
特許文献1には、上記化合物の製造方法として、実施例69に以下の記載がある。
特許文献2には、上記化合物の製造方法として、実施例1に以下の記載がある。
特許文献2の実施例84には、以下の製造方法が記載されている。
また、特許文献3には、式:
で示される化合物が記載されている。
しかし、これらの特許文献には、本発明の中間体、それを用いた式(III)で示される化合物の製造方法は記載されていない。Formula (III):
Or a salt thereof or a solvate thereof has 11βHSD-1 inhibitory activity, and a pharmaceutical composition containing the compound is known to be useful as a therapeutic agent for type II diabetes (patent) Literature 1, Patent Literature 2).
Patent Document 1 includes the following description in Example 69 as a method for producing the above compound.
Patent Document 2 includes the following description in Example 1 as a method for producing the above compound.
In Example 84 of Patent Document 2, the following manufacturing method is described.
In addition, Patent Document 3 includes a formula:
Are described.
However, these patent documents do not describe the production method of the compound represented by the formula (III) using the intermediate of the present invention.
式(III):
で示される化合物もしくはその塩またはそれらの溶媒和物を効率的に製造する上で有用な中間体を提供する。また、それら中間体を用いた式(III)で示される化合物もしくはその塩またはそれらの溶媒和物の製造方法を提供する。Formula (III):
The present invention provides an intermediate useful for efficiently producing the compound represented by the formula (1) or a salt thereof or a solvate thereof. Moreover, the manufacturing method of the compound or its salt, or those solvates shown by Formula (III) using those intermediates is provided.
本発明者は、式(II):
で示される化合物が、式(III)で示される化合物の合成中間体として有用であることを見出した。本中間体を用いることにより、効率的に式(III)で示される化合物を製造することができる。
先行技術記載の方法は、式(V):
で示される化合物を製造した後に、アダマンタン骨格上の水酸基の修飾を行うものである。このルートは、多段階を経て製造された式(V)で示される化合物を原料としてさらに反応を行う必要があるので、その後の修飾反応の収率や最終目的物までのステップ数によっては、経済的ではない。
本発明のように先に所望の基を有するアダマンタンアミン誘導体を合成し、その後、式(I):
で示される化合物と反応させることにより、式(III)で示される化合物を効率よく製造することができることを見出した。The inventor has the formula (II):
Has been found to be useful as an intermediate for the synthesis of the compound represented by the formula (III). By using this intermediate, the compound represented by the formula (III) can be efficiently produced.
The method described in the prior art has the formula (V):
After the compound represented by formula (1) is produced, the hydroxyl group on the adamantane skeleton is modified. This route requires a further reaction using a compound represented by the formula (V) produced through multiple steps as a raw material, so depending on the yield of the subsequent modification reaction and the number of steps to the final product, Not right.
First, an adamantaneamine derivative having a desired group is synthesized as in the present invention, and then the formula (I):
It has been found that the compound represented by the formula (III) can be efficiently produced by reacting with the compound represented by the formula (III).
本発明者は、以下の発明を完成した。
(1)
式(II):
(式中、R10は、式:−(CR13R14)m−NR12−R11(式中、R11は置換もしくは非置換のアシル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアルキルオキシカルボニル、置換もしくは非置換のカルバモイルまたは置換もしくは非置換のスルファモイルであり、R12は水素または置換もしくは非置換のアルキルであり、R13およびR14はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、mは0〜3の整数である。)で示される基、または
式:−(CR13R14)m−O−C(O)−NR15−R16(式中、R15およびR16はそれぞれ独立して水素または置換もしくは非置換のアルキルであり、R13、R14およびmは前記と同意義である。)で示される基である。)で示される化合物もしくはその塩またはそれらの溶媒和物。
(2)
mが0である、上記(1)記載の化合物もしくはその塩またはそれらの溶媒和物。
(3)
R10が式:−(CR13R14)m−O−C(O)−NR15−R16で示される基である上記(1)または(2)記載の化合物もしくはその塩またはそれらの溶媒和物。
(4)
R10が式:−(CR13R14)m−NR12−R11で示される基である上記(1)または(2)記載の化合物もしくはその塩またはそれらの溶媒和物。
(5)
式(I):
(式中、R1は式:−Y−R5(式中、Yは単結合、−O−または−S−であり、R5は置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニルまたは置換もしくは非置換のヘテロサイクリルである。)で示される基であり、
R2およびR3はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、またはR2およびR3は隣接する炭素原子と一緒になって置換もしくは非置換の環を形成していてもよく、
R4は式:−C(=O)−NR6R7(ここでR6およびR7はそれぞれ独立して水素、置換もしくは非置換のアミノ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のヘテロアリールスルホニルまたは置換もしくは非置換のヘテロサイクリルスルホニルであるか、またはR6とR7は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基、または
式:−NR8R9(ここでR8およびR9はそれぞれ独立して水素、カルボキシ、ヒドロキシ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアシル、置換もしくは非置換のカルバモイル、置換もしくは非置換のチオカルバモイル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のアルキルオキシカルボニルまたは置換もしくは非置換のスルファモイルであるか、またはR8とR9は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基であり、
Xはヒドロキシまたは脱離基である。)で示される化合物を
式(II):
(式中、R10は上記(1)と同意義である。)で示される化合物と反応させることを特徴とする、式(III):
(式中、各記号は前記と同意義である。)で示される化合物もしくはその塩またはそれらの溶媒和物の製造方法。
(6)
Xがヒドロキシであり、縮合剤の存在下で反応させることを特徴とする、上記(5)記載の製造方法。
(7)
縮合剤が、N,N’−ジシクロヘキシルカルボジイミド、N,N’−ジイソプロピルカルボジイミドおよび1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩から選択される1以上のものである、上記(6)記載の製造方法。
(8)
1−ヒドロキシベンゾトリアゾールおよびN−ヒドロキシスクシンイミドから選択される1以上の添加剤の存在下で反応させることを特徴とする、上記(6)または(7)記載の製造方法。
(9)
式(IV):
(式中、各記号は上記(5)と同意義である。)で示される化合物に、ハロゲン化剤を反応させ、
式(I):
(式中、Xはハロゲンであり、R1〜R4は上記(5)と同意義である。)で示される化合物もしくはその塩またはそれらの溶媒和物を得る工程を含むものである、上記(5)記載の製造方法。
(10)
ハロゲン化剤が、オキシ塩化リン、五塩化リン、オキザリルクロライド、塩化チオニルから選択されるものである、上記(9)記載の製造方法。
(11)
式(I)で示される化合物と式(II)で示される化合物を塩基の存在下で反応させることを特徴とする、上記(5)〜(10)のいずれか1項に記載の製造方法。
なお、本明細書中、化合物を化合物と反応させることには、化合物もしくはその塩またはそれらの溶媒和物を化合物もしくはその塩またはそれらの溶媒和物と反応させることを包含する。The inventor has completed the following invention.
(1)
Formula (II):
(In the formula, R 10 represents the formula: — (CR 13 R 14 ) m—NR 12 —R 11 (wherein R 11 represents substituted or unsubstituted acyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted) Alkyloxycarbonyl, substituted or unsubstituted carbamoyl or substituted or unsubstituted sulfamoyl, R 12 is hydrogen or substituted or unsubstituted alkyl, and R 13 and R 14 are each independently hydrogen, substituted or unsubstituted Substituted or alkyl, and m is an integer of 0 to 3.) or a group represented by the formula: — (CR 13 R 14 ) m—O—C (O) —NR 15 —R 16 (formula among, R 15 and R 16 are each independently hydrogen or a substituted or unsubstituted alkyl, R 13, R 14 and m are as defined above There.) Is a group represented by.) Compound or a salt thereof, or a solvate represented by.
(2)
The compound or a salt thereof, or a solvate thereof according to the above (1), wherein m is 0.
(3)
R 10 has the formula :-( CR 13 R 14) m- O-C (O) -NR 15 above is a group represented by -R 16 (1) or (2) a compound according or a salt thereof, or a solvent Japanese products.
(4)
The compound or a salt thereof, or a solvate thereof according to the above (1) or (2), wherein R 10 is a group represented by the formula:-(CR 13 R 14 ) m-NR 12 -R 11 .
(5)
Formula (I):
(Wherein R 1 represents the formula: —Y—R 5 (wherein Y represents a single bond, —O— or —S—, R 5 represents substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, Substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, or substituted or unsubstituted heterocyclyl.) A group represented by
R 2 and R 3 are each independently hydrogen, substituted or unsubstituted alkyl or halogen, or R 2 and R 3 together with adjacent carbon atoms form a substituted or unsubstituted ring. Well,
R 4 has the formula: —C (═O) —NR 6 R 7, where R 6 and R 7 are each independently hydrogen, substituted or unsubstituted amino, substituted or unsubstituted alkyl, substituted or unsubstituted Alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted Or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted heteroarylsulfonyl or substituted or unsubstituted heterocyclylsulfonyl, or R 6 and R 7 together with the adjacent nitrogen atom To form a substituted or unsubstituted ring. Groups represented or formula,: -NR 8 R 9 (wherein R 8 and R 9 are each independently hydrogen, carboxy, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted Alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted acyl, substituted Or unsubstituted carbamoyl, substituted or unsubstituted thiocarbamoyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted alkyloxycarbonyl, or substituted or unsubstituted sulfamoyl, or R 8 R 9 is a group represented by a nitrogen atom and may form a substituted or unsubstituted ring together.) Adjacent,
X is hydroxy or a leaving group. The compound represented by formula (II):
(Wherein R 10 has the same meaning as in the above (1)), which is reacted with a compound represented by formula (III):
(Wherein each symbol is as defined above), or a salt thereof, or a method for producing a solvate thereof.
(6)
X is hydroxy, and it makes it react in presence of a condensing agent, The manufacturing method of said (5) description characterized by the above-mentioned.
(7)
(6) wherein the condensing agent is one or more selected from N, N′-dicyclohexylcarbodiimide, N, N′-diisopropylcarbodiimide and 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride ) Described production method.
(8)
The process according to (6) or (7) above, wherein the reaction is carried out in the presence of one or more additives selected from 1-hydroxybenzotriazole and N-hydroxysuccinimide.
(9)
Formula (IV):
(Wherein each symbol has the same meaning as in the above (5)), a halogenating agent is reacted,
Formula (I):
(Wherein X is a halogen, and R 1 to R 4 are the same as defined in (5) above), or a salt thereof or a solvate thereof. ) Described production method.
(10)
The production method according to (9) above, wherein the halogenating agent is selected from phosphorus oxychloride, phosphorus pentachloride, oxalyl chloride, and thionyl chloride.
(11)
The method according to any one of (5) to (10) above, wherein the compound represented by the formula (I) is reacted with the compound represented by the formula (II) in the presence of a base.
In the present specification, reacting a compound with a compound includes reacting the compound or a salt thereof or a solvate thereof with the compound or a salt thereof or a solvate thereof.
式(II)で示される化合物は、式(III)で示される化合物を製造するための中間体として有用である。本発明中間体を用いることにより、効率的に、式(III)で示される化合物を製造することができる。 The compound represented by the formula (II) is useful as an intermediate for producing the compound represented by the formula (III). By using the intermediate of the present invention, the compound represented by the formula (III) can be efficiently produced.
式(II):
(式中、R10は、式:−(CR13R14)m−NR12−R11(式中、R11は置換もしくは非置換のアシル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアルキルオキシカルボニル、置換もしくは非置換のカルバモイルまたは置換もしくは非置換のスルファモイルであり、R12は水素または置換もしくは非置換のアルキルであり、R13およびR14はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、mは0〜3の整数である。)で示される基または、
式:−(CR13R14)m−O−C(O)−NR15−R16(式中、R15およびR16はそれぞれ独立して水素または置換もしくは非置換のアルキルであり、R13、R14およびmは前記と同意義である。)で示される基である。)で示される化合物は、以下のように製造することができる。Formula (II):
(In the formula, R 10 represents the formula: — (CR 13 R 14 ) m—NR 12 —R 11 (wherein R 11 represents substituted or unsubstituted acyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted) Alkyloxycarbonyl, substituted or unsubstituted carbamoyl or substituted or unsubstituted sulfamoyl, R 12 is hydrogen or substituted or unsubstituted alkyl, and R 13 and R 14 are each independently hydrogen, substituted or unsubstituted A substituted alkyl or halogen, and m is an integer of 0 to 3.)
15 -R 16 (wherein wherein :-( CR 13 R 14) m- O-C (O) -NR, R 15 and R 16 are each independently hydrogen or a substituted or unsubstituted alkyl, R 13 , R 14 and m are as defined above. ) Can be produced as follows.
(上記式中、式(II−X)で示される化合物、式(II−Y)で示される化合物は、式(II)で示される化合物を具体的に表したものである。)
化合物1は、国際公開第2007/114125号パンフレット記載の化合物である。
化合物1を原料として、ヒドロキシ基を修飾し、当該修飾をした後に、アミノ保護基(フタルイミド基)をはずすことにより、式(II−X)で示される化合物や式(II−Y)で示される化合物を製造することができる。
たとえば、化合物1に、濃硫酸の存在下でニトリル類を反応させることにより、R11が置換もしくは非置換のアルキルスルホニルである式(II)で示される化合物を製造することができる。
化合物1にカルボニルジイミダゾールの存在下で、アミンを反応させることにより、R15およびR16がそれぞれ独立して水素または置換もしくは非置換のアルキルである式(II)で示される化合物を製造することができる。
また、化合物1に各種イソシアネートを反応させることによって、R15およびR16がそれぞれ独立して水素、またはR15およびR16のいずれかが水素でもう一方が置換もしくは非置換のアルキルである式(II)で示される化合物を製造することができる。
また、実施例3記載の方法に従って、化合物1から化合物5:
を合成し、遊離のアミノ基を修飾することにより、各種アミノ修飾体を合成し、その後フタルイミド基を脱保護して、式(II)で示される化合物を製造してもよい。
たとえば、化合物5に各種アシルハライドを反応させ、その後フタルイミド基を脱保護することにより、R11が置換もしくは非置換のアシルである式(II)で示される化合物を製造することができる。
化合物5に各種スルホニルハライド(たとえば、アルキルスルホニルハライド)を反応させ、その後フタルイミド基を脱保護することにより、R11が置換もしくは非置換のアルキルスルホニルである式(II)で示される化合物を製造することができる。
化合物5にアルキルオキシカルボニルハライド(たとえば、クロロ炭酸メチルなど)を反応させ、その後フタルイミド基を脱保護することにより、R11が置換もしくは非置換のアルキルオキシカルボニルである式(II)で示される化合物を製造することができる。
上記は例示であり、その他の式(II)で示される化合物も、化合物1を原料として有機化学分野で知られている化学反応を行うことにより、製造することができる。
フタルイミド基の脱保護には、ヒドラジンやメチルヒドラジン等を用いることができる。溶媒としては、アルコールを用いることができる。本脱保護工程は、加熱還流下で行うことができる。
m=1の場合は、以下のように製造することができる。化合物1に30%発煙硫酸及びギ酸を反応させ、ヒドロキシ基をカルボキシル基に変換し、メタノール中でアセチルクロライド等を反応させ、メチルエステル体に変換する。その後、エステルをリチウムボロハイドライド等で還元し、ヒドロキシメチル体を得る。当該ヒドロキシメチル体に各種の修飾を施し、m=0の場合と同様に化学反応を行い、m=1である式(II)で示される化合物を製造することができる。
たとえば、上記ヒドロキシメチル体にクロロスルホニルイソシアナートを反応させ、その後フタルイミド基を脱保護することにより、カルバモイルオキシメチル体を得ることができる。
m=2の場合は、以下のように製造することができる。上記ヒドロキシメチル体のヒドロキシメチル基を−CH2X (X=ハロゲン、Ms, Ts等の脱離基)とした後に、KCNまたはNaCNで処理することで−CH2CNへと変換し、その後、加水分解して−CH2CO2Hとして、還元して−CH2CH2OHとする。その後、m=0の場合と同様に化学反応を行い、m=2である式(II)で示される化合物を製造することができる。
m=3の場合は、以下のように製造することができる。上記−CH2CH2OH体を用いて、さらに上記と同様に処理し、−CH2 CH2CH2OH体を製造し、その後、m=0の場合と同様に化学反応を行い、m=3である式(II)で示される化合物を製造することができる。
(In the above formula, the compound represented by the formula (II-X) and the compound represented by the formula (II-Y) specifically represent the compound represented by the formula (II)).
Compound 1 is a compound described in International Publication No. 2007/114125 pamphlet.
The compound 1 is used as a raw material, the hydroxy group is modified, and after the modification, the amino protecting group (phthalimide group) is removed to obtain the compound represented by the formula (II-X) or the formula (II-Y). Compounds can be produced.
For example, a compound represented by the formula (II) in which R 11 is a substituted or unsubstituted alkylsulfonyl can be produced by reacting compound 1 with nitriles in the presence of concentrated sulfuric acid.
Producing a compound of formula (II) wherein R 15 and R 16 are each independently hydrogen or substituted or unsubstituted alkyl by reacting compound 1 with an amine in the presence of carbonyldiimidazole. Can do.
Further, by reacting compound 1 with various isocyanates, R 15 and R 16 are each independently hydrogen, or one of R 15 and R 16 is hydrogen and the other is substituted or unsubstituted alkyl ( A compound represented by II) can be produced.
Also, according to the method described in Example 3, compound 1 to compound 5:
And modifying the free amino group to synthesize various amino modifications, and then deprotecting the phthalimide group to produce the compound represented by the formula (II).
For example, a compound represented by the formula (II) in which R 11 is substituted or unsubstituted acyl can be produced by reacting compound 5 with various acyl halides and then deprotecting the phthalimide group.
A compound represented by the formula (II) in which R 11 is a substituted or unsubstituted alkylsulfonyl is produced by reacting compound 5 with various sulfonyl halides (for example, alkylsulfonyl halide) and then deprotecting the phthalimide group. be able to.
A compound represented by the formula (II) in which R 11 is substituted or unsubstituted alkyloxycarbonyl by reacting compound 5 with an alkyloxycarbonyl halide (eg, methyl chlorocarbonate) and then deprotecting the phthalimide group Can be manufactured.
The above is an example, and other compounds represented by the formula (II) can also be produced by performing a chemical reaction known in the field of organic chemistry using Compound 1 as a raw material.
Hydrazine, methyl hydrazine or the like can be used for deprotection of the phthalimide group. Alcohol can be used as the solvent. This deprotection step can be performed under heating and reflux.
In the case of m = 1, it can manufacture as follows. Compound 1 is reacted with 30% fuming sulfuric acid and formic acid to convert a hydroxy group to a carboxyl group, and to react with acetyl chloride or the like in methanol to convert it to a methyl ester form. Thereafter, the ester is reduced with lithium borohydride or the like to obtain a hydroxymethyl compound. Various modifications can be applied to the hydroxymethyl compound, and a chemical reaction can be performed in the same manner as in the case of m = 0 to produce a compound represented by the formula (II) in which m = 1.
For example, a carbamoyloxymethyl compound can be obtained by reacting the hydroxymethyl compound with chlorosulfonyl isocyanate and then deprotecting the phthalimide group.
In the case of m = 2, it can manufacture as follows. The hydroxymethyl group of the hydroxymethyl body -CH 2 X after a (X = halogen, Ms, leaving group Ts, etc.), converted to -CH 2 CN by treatment with KCN or NaCN, then, as -CH 2 CO 2 H by hydrolysis, and -CH 2 CH 2 OH by reduction. Thereafter, a chemical reaction is carried out in the same manner as in the case of m = 0, whereby a compound represented by the formula (II) in which m = 2 can be produced.
In the case of m = 3, it can manufacture as follows. Using the -CH 2 CH 2 OH form, the same treatment as above is carried out to produce a -CH 2 CH 2 CH 2 OH form, and then a chemical reaction is carried out as in the case of m = 0, A compound of formula (II) which is 3 can be prepared.
上記のようにして製造した式(II)で示される化合物を用いて、式(III)で示される化合物を製造することができる。
(式中、R1は式:−Y−R5(式中、Yは単結合、−O−または−S−であり、R5は置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のヘテロサイクリルである。)で示される基であり、
R2およびR3はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、またはR2およびR3は隣接する炭素原子と一緒になって置換もしくは非置換の環を形成していてもよく、
R4は式:−C(=O)−NR6R7(ここでR6およびR7はそれぞれ独立して水素、置換もしくは非置換のアミノ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のヘテロアリールスルホニルまたは置換もしくは非置換のヘテロサイクリルスルホニルであるか、またはR6とR7は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基、または
式:−NR8R9(ここでR8およびR9はそれぞれ独立して水素、カルボキシ、ヒドロキシ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアシル、置換もしくは非置換のカルバモイル、置換もしくは非置換のチオカルバモイル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のアルキルオキシカルボニルまたは置換もしくは非置換のスルファモイルであるか、またはR8とR9は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基であり、
Xはヒドロキシまたは脱離基であり、
R10は、式:−(CR13R14)m−NR12−R11(式中、R11は置換もしくは非置換のアシル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアルキルオキシカルボニル、置換もしくは非置換のカルバモイルまたは置換もしくは非置換のスルファモイルであり、R12は水素または置換もしくは非置換のアルキルであり、R13およびR14はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、mは0〜3の整数である。)で示される基、または
式:−(CR13R14)m−O−C(O)−N(R15R16)(式中、R15およびR16はそれぞれ独立して水素または置換もしくは非置換のアルキルであり、R13、R14およびmは前記と同意義である。)で示される基である。)A compound represented by the formula (III) can be produced using the compound represented by the formula (II) produced as described above.
(Wherein R 1 represents the formula: —Y—R 5 (wherein Y represents a single bond, —O— or —S—, R 5 represents substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, Substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted heterocyclyl.) A group represented by
R 2 and R 3 are each independently hydrogen, substituted or unsubstituted alkyl or halogen, or R 2 and R 3 together with adjacent carbon atoms form a substituted or unsubstituted ring. Well,
R 4 has the formula: —C (═O) —NR 6 R 7, where R 6 and R 7 are each independently hydrogen, substituted or unsubstituted amino, substituted or unsubstituted alkyl, substituted or unsubstituted Alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted Or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted heteroarylsulfonyl or substituted or unsubstituted heterocyclylsulfonyl, or R 6 and R 7 together with the adjacent nitrogen atom To form a substituted or unsubstituted ring. Groups represented or formula,: -NR 8 R 9 (wherein R 8 and R 9 are each independently hydrogen, carboxy, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted Alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted acyl, substituted Or unsubstituted carbamoyl, substituted or unsubstituted thiocarbamoyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted alkyloxycarbonyl, or substituted or unsubstituted sulfamoyl, or R 8 R 9 is a group represented by a nitrogen atom and may form a substituted or unsubstituted ring together.) Adjacent,
X is hydroxy or a leaving group;
R 10 has the formula: — (CR 13 R 14 ) m—NR 12 —R 11 (wherein R 11 is substituted or unsubstituted acyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted alkyloxycarbonyl. Substituted or unsubstituted carbamoyl or substituted or unsubstituted sulfamoyl, R 12 is hydrogen or substituted or unsubstituted alkyl, and R 13 and R 14 are each independently hydrogen, substituted or unsubstituted alkyl or A group represented by formula: — (CR 13 R 14 ) m—O—C (O) —N (R 15 R 16 ) (wherein m is an integer of 0 to 3), R 15 and R 16 are each independently hydrogen or a substituted or unsubstituted alkyl, R 13, R 14 and m are the same as defined above ) Is a group represented by the. )
本工程は、式(I)で示される化合物と式(II)で示される化合物を反応させ、式(III)で示される化合物を製造する工程である。
Xがヒドロキシの場合、本工程を縮合剤の存在下で行うことができる。
縮合剤としては、カルボキシル基とアミノ基の縮合に使用されるアミド縮合剤を用いることができる。たとえば、カルボジイミド類(例えば、N,N’−ジシクロヘキシルカルボジイミド、N,N’−ジイソプロピルカルボジイミド、1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩など)、ジフェニルリン酸アジド、BOP試薬(たとえば、BOP、PyBop、TBTUなど)、DMT-MM、1,1’−カルボニルビス−1H−イミダゾール、2−クロロ1,3−ジメチルイミダゾリウムクロリド、4−(4,6−ジメトキシ−1,3,5−トリアジン−2−イル)−4−メチルモルホリニウムクロリド等があげられる。好ましくは、N,N’−ジシクロヘキシルカルボジイミド、N,N’−ジイソプロピルカルボジイミドまたは1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩であり、特に好ましくは、1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩である。
本工程は添加剤の存在下で行うことができる。
添加剤としては、1−ヒドロキシベンゾトリアゾール、N−ヒドロキシスクシンイミド等があげられる。特に好ましくは、1−ヒドロキシベンゾトリアゾールである。
本工程は塩基の存在下で行うことができる。当該塩基は、脱離基の種類や反応溶媒の種類により、適宜選択することができる。
本工程に用いることのできる塩基としては、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、イミダゾール、ジアザビシクロウンデセン等の有機塩基類をあげることができる。好ましくは、トリエチルアミン、ジイソプロピルエチルアミン、ジアザビシクロウンデセン等であり、特に好ましくはトリエチルアミンである。
本工程は、−20〜200℃で行うことができる。好ましくは、0〜100℃で行うことができる。
反応溶媒としては、水、メタノール、エタノール、プロパノール等のアルコール類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素類、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジメチルホルムアミド、ジメチルアセトアミド、1−メチル−2−ピロリドン等の非プロトン性極性溶媒、テトラヒドロフラン、ジオキサン等のエ−テル類、アセトニトリル等を用いることができる。特に好ましくは、ジクロロメタン、ジメチルホルムアミドである。
なお、式(I)で示される化合物、式(II)で示される化合物は、塩や溶媒和物の形態で使用してもよい。This step is a step for producing a compound represented by the formula (III) by reacting a compound represented by the formula (I) with a compound represented by the formula (II).
When X is hydroxy, this step can be performed in the presence of a condensing agent.
As the condensing agent, an amide condensing agent used for condensation of a carboxyl group and an amino group can be used. For example, carbodiimides (eg, N, N′-dicyclohexylcarbodiimide, N, N′-diisopropylcarbodiimide, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride), diphenyl phosphate azide, BOP reagent ( For example, BOP, PyBop, TBTU, etc.), DMT-MM, 1,1′-carbonylbis-1H-imidazole, 2-chloro1,3-dimethylimidazolium chloride, 4- (4,6-dimethoxy-1,3 , 5-triazin-2-yl) -4-methylmorpholinium chloride and the like. N, N′-dicyclohexylcarbodiimide, N, N′-diisopropylcarbodiimide or 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride is preferable, and 1-ethyl-3- (3 is particularly preferable. -Dimethylaminopropyl) carbodiimide hydrochloride.
This step can be performed in the presence of an additive.
Examples of the additive include 1-hydroxybenzotriazole, N-hydroxysuccinimide and the like. Particularly preferred is 1-hydroxybenzotriazole.
This step can be performed in the presence of a base. The base can be appropriately selected depending on the type of leaving group and the type of reaction solvent.
Examples of the base that can be used in this step include organic bases such as triethylamine, diisopropylethylamine, pyridine, imidazole, and diazabicycloundecene. Triethylamine, diisopropylethylamine, diazabicycloundecene and the like are preferable, and triethylamine is particularly preferable.
This step can be performed at -20 to 200 ° C. Preferably, it can carry out at 0-100 degreeC.
Examples of the reaction solvent include water, alcohols such as methanol, ethanol, and propanol, halogenated hydrocarbons such as dichloromethane and chloroform, aromatic hydrocarbons such as benzene, toluene, and xylene, dimethylformamide, dimethylacetamide, and 1-methyl. Aprotic polar solvents such as 2-pyrrolidone, ethers such as tetrahydrofuran and dioxane, acetonitrile, and the like can be used. Particularly preferred are dichloromethane and dimethylformamide.
The compound represented by the formula (I) and the compound represented by the formula (II) may be used in the form of a salt or a solvate.
(式中、Xはハロゲンであり、その他の記号は前記と同意義である。)
本工程は、式(IV)で示される化合物とハロゲン化剤を反応させ、式(I)で示される化合物を製造する工程である。
ハロゲン化剤としては、塩化チオニル、臭化チオニル、オキザリルクロライド、オキシ塩化リン、三塩化リン、五塩化リン、三臭化リン等があげられる。好ましくは、塩化チオニル、臭化ブロマイド、オキザリルクロライド、オキシ塩化リンであり、特に好ましくは塩化チオニルである。
本工程は、0〜100℃で行うことができる。好ましくは、20〜60℃で行うことができる。
反応溶媒としては、テトラヒドロフラン、酢酸エチル、ジメチルホルムアミド等を用いることができる。特に好ましくはテトラヒドロフランである。
本工程終了後、式(I)で示される化合物を単離または非単離の状態で、式(II)で示される化合物と反応させ、式(III)で示される化合物を製造することができる。
なお、式(IV)で示される化合物は、塩や溶媒和物の形態で使用してもよい。
(Wherein X is halogen, and other symbols are as defined above.)
This step is a step for producing a compound represented by the formula (I) by reacting a compound represented by the formula (IV) with a halogenating agent.
Examples of the halogenating agent include thionyl chloride, thionyl bromide, oxalyl chloride, phosphorus oxychloride, phosphorus trichloride, phosphorus pentachloride, phosphorus tribromide and the like. Preferred are thionyl chloride, bromide bromide, oxalyl chloride, and phosphorus oxychloride, and particularly preferred is thionyl chloride.
This step can be performed at 0 to 100 ° C. Preferably, it can carry out at 20-60 degreeC.
As the reaction solvent, tetrahydrofuran, ethyl acetate, dimethylformamide or the like can be used. Particularly preferred is tetrahydrofuran.
After completion of this step, the compound represented by formula (I) can be reacted with the compound represented by formula (II) in the isolated or non-isolated state to produce the compound represented by formula (III). .
The compound represented by the formula (IV) may be used in the form of a salt or solvate.
「アルキル」は、炭素数1〜10個の直鎖状又は分枝状のアルキル基を意味し、例えば、メチル、エチル、n-プロピル、イソプロピル、n-ブチル、イソブチル、sec-ブチル、tert-ブチル、n-ぺンチル、イソぺンチル、ネオぺンチル、n-ヘキシル、イソヘキシル、n-ヘプチル、n-オクチル、n-ノニル、n-デシル等が挙げられる。好ましくは、炭素数1〜6または1〜4個のアルキルであり、例えば、メチル、エチル、n-プロピル、イソプロピル、n-ブチル、イソブチル、sec-ブチル、tert-ブチル、n-ぺンチル、イソぺンチル、ネオぺンチル、n-ヘキシル、イソヘキシルが挙げられる。 “Alkyl” means a linear or branched alkyl group having 1 to 10 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert- Examples include butyl, n-pentyl, isopentyl, neopentyl, n-hexyl, isohexyl, n-heptyl, n-octyl, n-nonyl, n-decyl and the like. Preferred is alkyl having 1 to 6 or 1 to 4 carbon atoms, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, iso Examples include pentyl, neopentyl, n-hexyl, and isohexyl.
「アルケニル」は、上記「アルキル」に1個又はそれ以上の二重結合を有する炭素数2〜8個の直鎖状又は分枝状のアルケニルを意味し、例えば、ビニル、1-プロペニル、2-プロペニル、1-ブテニル、2-ブテニル、3-ブテニル、1,3-ブタジエニル、3-メチル-2-ブテニル等が挙げられる。 “Alkenyl” means a linear or branched alkenyl having 2 to 8 carbon atoms having one or more double bonds to the above “alkyl”, and examples thereof include vinyl, 1-propenyl, 2 -Propenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1,3-butadienyl, 3-methyl-2-butenyl and the like.
「アルキニル」は、上記「アルキル」に1個又はそれ以上の三重結合を有する炭素数2〜8個の直鎖状又は分枝状のアルキニルを意味し、例えば、エチニル、プロピニル、ブチニル等が挙げられる。 “Alkynyl” means a linear or branched alkynyl having 2 to 8 carbon atoms having one or more triple bonds to the above “alkyl”, and examples thereof include ethynyl, propynyl, butynyl and the like. It is done.
「アリール」は、単環芳香族炭化水素基(例:フェニル)及び多環芳香族炭化水素基(例: 1−ナフチル、2−ナフチル、1−アントリル、2−アントリル、9−アントリル、1−フェナントリル、2−フェナントリル、3−フェナントリル、4−フェナントリル、9−フェナントリル等)を意味する。好ましくは、フェニル又はナフチル(1−ナフチル、2−ナフチル)が挙げられる。 “Aryl” means a monocyclic aromatic hydrocarbon group (eg, phenyl) and a polycyclic aromatic hydrocarbon group (eg, 1-naphthyl, 2-naphthyl, 1-anthryl, 2-anthryl, 9-anthryl, 1- Phenanthryl, 2-phenanthryl, 3-phenanthryl, 4-phenanthryl, 9-phenanthryl and the like. Preferably, phenyl or naphthyl (1-naphthyl, 2-naphthyl) is used.
「ヘテロアリール」は、単環芳香族複素環式基及び縮合芳香族複素環式基を意味する。
単環芳香族複素環式基は、酸素原子、硫黄原子、および/又は窒素原子を環内に1〜4個含んでいてもよい5〜8員の芳香環から誘導される、置換可能な任意の位置に結合手を有していてもよい基を意味する。
縮合芳香族複素環式基は、酸素原子、硫黄原子、および/又は窒素原子を環内に1〜4個含んでいてもよい5〜8員の芳香環が、1〜4個の5〜8員の芳香族炭素環もしくは他の5〜8員の芳香族ヘテロ環と縮合している、置換可能な任意の位置に結合手を有していてもよい基を意味する。“Heteroaryl” means monocyclic aromatic heterocyclic groups and fused aromatic heterocyclic groups.
The monocyclic aromatic heterocyclic group is an arbitrary substitutable substituent derived from a 5- to 8-membered aromatic ring which may contain 1 to 4 oxygen atoms, sulfur atoms and / or nitrogen atoms in the ring. Means a group which may have a bond at the position.
The condensed aromatic heterocyclic group has 1 to 4 5-8 aromatic rings, which may contain 1 to 4 oxygen atoms, sulfur atoms, and / or nitrogen atoms in the ring. It means a group which may have a bond at any substitutable position which is fused with a member aromatic carbocycle or other 5- to 8-membered aromatic heterocycle.
「ヘテロアリール」としては、例えば、フリル(例: 2−フリル、3−フリル)、チエニル(例: 2−チエニル、3−チエニル)、ピロリル(例: 1−ピロリル、2−ピロリル、3−ピロリル)、イミダゾリル(例: 1−イミダゾリル、2−イミダゾリル、4−イミダゾリル)、ピラゾリル(例: 1−ピラゾリル、3−ピラゾリル、4−ピラゾリル)、トリアゾリル(例: 1,2,4−トリアゾール−1−イル、1,2,4−トリアゾール−3−イル、1,2,4−トリアゾール−4−イル)、テトラゾリル(例:1−テトラゾリル、2−テトラゾリル、5−テトラゾリル)、オキサゾリル(例:2−オキサゾリル、4−オキサゾリル、5−オキサゾリル)、イソキサゾリル(例:3−イソキサゾリル、4−イソキサゾリル、5−イソキサゾリル)、チアゾリル(例:2−チアゾリル、4−チアゾリル、5−チアゾリル)、チアジアゾリル、イソチアゾリル(例:3−イソチアゾリル、4−イソチアゾリル、5−イソチアゾリル)、ピリジル(例:2−ピリジル、3−ピリジル、4−ピリジル)、ピリダジニル(例:3−ピリダジニル、4−ピリダジニル)、ピリミジニル(例:2−ピリミジニル、4−ピリミジニル、5−ピリミジニル)、フラザニル(例:3−フラザニル)、ピラジニル(例:2−ピラジニル)、オキサジアゾリル(例:1,3,4−オキサジアゾール−2−イル)、ベンゾフリル(例:2−ベンゾ[b]フリル、3−ベンゾ[b]フリル、4−ベンゾ[b]フリル、5−ベンゾ[b]フリル、6−ベンゾ[b]フリル、7−ベンゾ[b]フリル)、ベンゾチエニル(例:2−ベンゾ[b]チエニル、3−ベンゾ[b]チエニル、4−ベンゾ[b]チエニル、5−ベンゾ[b]チエニル、6−ベンゾ[b]チエニル、7−ベンゾ[b]チエニル)、ベンズイミダゾリル(例:1−ベンゾイミダゾリル、2−ベンゾイミダゾリル、4−ベンゾイミダゾリル、5−ベンゾイミダゾリル)、ベンゾチアゾリル、ジベンゾフリル、ベンゾオキサゾリル、キノキサリル(例:2−キノキサリニル、5−キノキサリニル、6−キノキサリニル)、シンノリニル(例:3−シンノリニル、4−シンノリニル、5−シンノリニル、6−シンノリニル、7−シンノリニル、8−シンノリニル)、キナゾリル(例:2−キナゾリニル、4−キナゾリニル、5−キナゾリニル、6−キナゾリニル、7−キナゾリニル、8−キナゾリニル)、キノリル(例:2−キノリル、3−キノリル、4−キノリル、5−キノリル、6−キノリル、7−キノリル、8−キノリル)、フタラジニル(例:1−フタラジニル、5−フタラジニル、6−フタラジニル)、イソキノリル(例:1−イソキノリル、3−イソキノリル、4−イソキノリル、5−イソキノリル、6−イソキノリル、7−イソキノリル、8−イソキノリル)、プリル、プテリジニル(例:2−プテリジニル、4−プテリジニル、6−プテリジニル、7−プテリジニル)、カルバゾリル、フェナントリジニル、アクリジニル(例:1−アクリジニル、2−アクリジニル、3−アクリジニル、4−アクリジニル、9−アクリジニル)、インドリル(例:1−インドリル、2−インドリル、3−インドリル、4−インドリル、5−インドリル、6−インドリル、7−インドリル)、イソインドリル、ファナジニル(例:1−フェナジニル、2−フェナジニル)又はフェノチアジニル(例:1−フェノチアジニル、2−フェノチアジニル、3−フェノチアジニル、4−フェノチアジニル)等が挙げられる。 Examples of the “heteroaryl” include furyl (eg, 2-furyl, 3-furyl), thienyl (eg, 2-thienyl, 3-thienyl), pyrrolyl (eg, 1-pyrrolyl, 2-pyrrolyl, 3-pyrrolyl). ), Imidazolyl (eg: 1-imidazolyl, 2-imidazolyl, 4-imidazolyl), pyrazolyl (eg: 1-pyrazolyl, 3-pyrazolyl, 4-pyrazolyl), triazolyl (eg: 1,2,4-triazole-1-) Yl, 1,2,4-triazol-3-yl, 1,2,4-triazol-4-yl), tetrazolyl (eg 1-tetrazolyl, 2-tetrazolyl, 5-tetrazolyl), oxazolyl (eg 2- Oxazolyl, 4-oxazolyl, 5-oxazolyl), isoxazolyl (eg 3-isoxazolyl, 4-isoxazolyl, 5-i Xazolyl), thiazolyl (eg: 2-thiazolyl, 4-thiazolyl, 5-thiazolyl), thiadiazolyl, isothiazolyl (eg: 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl), pyridyl (eg: 2-pyridyl, 3-pyridyl) 4-pyridyl), pyridazinyl (eg: 3-pyridazinyl, 4-pyridazinyl), pyrimidinyl (eg: 2-pyrimidinyl, 4-pyrimidinyl, 5-pyrimidinyl), furazanil (eg: 3-furazanyl), pyrazinyl (eg: 2 -Pyrazinyl), oxadiazolyl (eg 1,3,4-oxadiazol-2-yl), benzofuryl (eg 2-benzo [b] furyl, 3-benzo [b] furyl, 4-benzo [b] furyl 5-benzo [b] furyl, 6-benzo [b] furyl, 7-benzo [b] furyl), Zothienyl (eg 2-benzo [b] thienyl, 3-benzo [b] thienyl, 4-benzo [b] thienyl, 5-benzo [b] thienyl, 6-benzo [b] thienyl, 7-benzo [b] Thienyl), benzimidazolyl (eg, 1-benzimidazolyl, 2-benzoimidazolyl, 4-benzoimidazolyl, 5-benzoimidazolyl), benzothiazolyl, dibenzofuryl, benzoxazolyl, quinoxalyl (eg, 2-quinoxalinyl, 5-quinoxalinyl, 6-quinoxalinyl) ), Cinnolinyl (eg: 3-cinnolinyl, 4-cinnolinyl, 5-cinnolinyl, 6-cinnolinyl, 7-cinnolinyl, 8-cinnolinyl), quinazolyl (eg: 2-quinazolinyl, 4-quinazolinyl, 5-quinazolinyl, 6-quinazolinyl) 7-quinazolinyl, 8 -Quinazolinyl), quinolyl (eg: 2-quinolyl, 3-quinolyl, 4-quinolyl, 5-quinolyl, 6-quinolyl, 7-quinolyl, 8-quinolyl), phthalazinyl (eg: 1-phthalazinyl, 5-phthalazinyl, 6 -Phthalazinyl), isoquinolyl (eg: 1-isoquinolyl, 3-isoquinolyl, 4-isoquinolyl, 5-isoquinolyl, 6-isoquinolyl, 7-isoquinolyl, 8-isoquinolyl), prill, pteridinyl (eg: 2-pteridinyl, 4-pteridinyl) , 6-pteridinyl, 7-pteridinyl), carbazolyl, phenanthridinyl, acridinyl (eg 1-acridinyl, 2-acridinyl, 3-acridinyl, 4-acridinyl, 9-acridinyl), indolyl (eg 1-indolyl), 2-indolyl, 3-indolyl, 4-i Drill, 5-indolyl, 6-indolyl, 7-indolyl), isoindolyl, fanadinyl (eg 1-phenazinyl, 2-phenazinyl) or phenothiazinyl (eg 1-phenothiazinyl, 2-phenothiazinyl, 3-phenothiazinyl, 4-phenothiazinyl) and the like.
「シクロアルキル」は、炭素数3〜15の環状飽和炭化水素基を意味し、例えば、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチルなどが挙げられる。好ましくは、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシルが挙げられる。
「シクロアルケニル」は、炭素数3〜15個の環状の不飽和脂肪族炭化水素基を意味し、例えば、シクロプロペニル、シクロブテニル、シクロペンテニル、シクロヘキセニル、シクロヘプテニルが挙げられ、好ましくはシクロプロペニル、シクロブテニル、シクロペンテニル、シクロヘキセニルである。“Cycloalkyl” means a cyclic saturated hydrocarbon group having 3 to 15 carbon atoms, and examples thereof include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like. Preferably, cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl are mentioned.
“Cycloalkenyl” means a cyclic unsaturated aliphatic hydrocarbon group having 3 to 15 carbon atoms, and examples thereof include cyclopropenyl, cyclobutenyl, cyclopentenyl, cyclohexenyl, cycloheptenyl, and preferably cyclopropenyl, cyclobutenyl. , Cyclopentenyl and cyclohexenyl.
「ヘテロサイクリル」は、酸素原子、硫黄原子、及び/又は窒素原子を環内に1〜4個含んでいてもよく、置換可能な任意の位置に結合手を有していてもよい非芳香族複素環式基を意味する。また、そのような非芳香族複素環式基がさらに炭素数1〜4のアルキル鎖で架橋されていてもよく、シクロアルカン(5〜6員環が好ましい)やベンゼン環が縮合していてもよい。非芳香族であれば、飽和でも不飽和でもよい。好ましくは5〜8員環である。例えば、1−ピロリニル、2−ピロリニル、3−ピロリニル、1−ピロリジニル、2−ピロリジニル、3−ピロリジニル、1−イミダゾリニル、2−イミダゾリニル、4−イミダゾリニル、1−イミダゾリジニル、2−イミダゾリジニル、4−イミダゾリジニル、1−ピラゾリニル、3−ピラゾリニル、4−ピラゾリニル、1−ピラゾリジニル、3−ピラゾリジニル、4−ピラゾリジニル、ピペリジノ、2−ピペリジニル、3−ピペリジニル、4−ピペリジニル、1−ピペラジニル、2−ピペラジニル、2−モルホリニル、3−モルホリニル、モルホリノ、テトラヒドロピラニルが例示される。 “Heterocyclyl” is a non-aromatic group that may contain 1 to 4 oxygen atoms, sulfur atoms, and / or nitrogen atoms in the ring, and may have a bond at any substitutable position. Means a heterocyclic group. Further, such a non-aromatic heterocyclic group may be further bridged with an alkyl chain having 1 to 4 carbon atoms, and a cycloalkane (preferably a 5- to 6-membered ring) or a benzene ring is condensed. Good. If it is non-aromatic, it may be saturated or unsaturated. Preferably it is a 5-8 membered ring. For example, 1-pyrrolinyl, 2-pyrrolinyl, 3-pyrrolinyl, 1-pyrrolidinyl, 2-pyrrolidinyl, 3-pyrrolidinyl, 1-imidazolinyl, 2-imidazolinyl, 4-imidazolinyl, 1-imidazolidinyl, 2-imidazolidinyl, 4-imidazolidinyl, 1-pyrazolinyl, 3-pyrazolinyl, 4-pyrazolinyl, 1-pyrazolidinyl, 3-pyrazolidinyl, 4-pyrazolidinyl, piperidino, 2-piperidinyl, 3-piperidinyl, 4-piperidinyl, 1-piperazinyl, 2-piperazinyl, 2-morpholinyl, Examples are 3-morpholinyl, morpholino, tetrahydropyranyl.
「ハロゲン」は、フッ素、塩素、臭素およびヨウ素を包含する。特に塩素、臭素およびヨウ素が好ましい。
「隣接する炭素原子と一緒になって形成される置換もしくは非置換の環」は、3〜8員の環を意味し、好ましくは、4〜6員の環を意味する。該環は、炭素原子のみならず、ヘテロ原子(酸素原子、硫黄原子、窒素原子)を含んでいてもよい。
「隣接する窒素原子と一緒になって形成される置換もしくは非置換の環」は、3〜8員の環を意味し、好ましくは、4〜6員の環を意味する。該環は、窒素原子のみならず、炭素原子やさらにヘテロ原子(酸素原子、硫黄原子、窒素原子)を含んでいてもよい。“Halogen” includes fluorine, chlorine, bromine and iodine. Particularly preferred are chlorine, bromine and iodine.
“Substituted or unsubstituted ring formed together with adjacent carbon atoms” means a 3- to 8-membered ring, preferably a 4- to 6-membered ring. The ring may contain not only carbon atoms but also heteroatoms (oxygen atom, sulfur atom, nitrogen atom).
“Substituted or unsubstituted ring formed together with the adjacent nitrogen atom” means a 3- to 8-membered ring, preferably a 4- to 6-membered ring. The ring may contain not only a nitrogen atom but also a carbon atom and further a hetero atom (oxygen atom, sulfur atom, nitrogen atom).
「アシル」は、ホルミル、置換もしくは非置換のアルキルカルボニル、置換もしくは非置換のアルケニルカルボニル、置換もしくは非置換のシクロアルキルカルボニル、置換もしくは非置換のシクロアルケニルカルボニル、置換もしくは非置換のアリールカルボニル、置換もしくは非置換のヘテロアリールカルボニル、置換もしくは非置換のヘテロサイクリルカルボニルを意味する。「アルキルカルボニル」、「アルケニルカルボニル」、「シクロアルキルカルボニル」、「シクロアルケニルカルボニル」、「アリールカルボニル」、「ヘテロアリールカルボニル」、「ヘテロサイクリルカルボニル」の「アルキル」部分、「アルケニル」部分、「シクロアルキル」部分、「シクロアルケニル」部分、「アリール」部分、「ヘテロアリール」部分、「ヘテロサイクリル」部分は、それぞれ、上記「アルキル」、「アルケニル」、「シクロアルキル」、「シクロアルケニル」、「アリール」、「ヘテロアリール」、「ヘテロサイクリル」を意味する。
「脱離基」は、アルキルオキシ、アリールオキシ、アシルオキシ、アルコキシカルボニルオキシ、アリールカルボニルオキシ、アルキルスルホニルオキシ、ハロゲン等が挙げられる。特に、ハロゲンが好ましい。“Acyl” refers to formyl, substituted or unsubstituted alkylcarbonyl, substituted or unsubstituted alkenylcarbonyl, substituted or unsubstituted cycloalkylcarbonyl, substituted or unsubstituted cycloalkenylcarbonyl, substituted or unsubstituted arylcarbonyl, substituted Alternatively, it means unsubstituted heteroarylcarbonyl, substituted or unsubstituted heterocyclylcarbonyl. “Alkylcarbonyl”, “alkenylcarbonyl”, “cycloalkylcarbonyl”, “cycloalkenylcarbonyl”, “arylcarbonyl”, “heteroarylcarbonyl”, “heterocyclylcarbonyl” “alkyl” moiety, “alkenyl” moiety, The “cycloalkyl” moiety, “cycloalkenyl” moiety, “aryl” moiety, “heteroaryl” moiety, and “heterocyclyl” moiety are the above “alkyl”, “alkenyl”, “cycloalkyl”, “cycloalkenyl”, respectively. ”,“ Aryl ”,“ heteroaryl ”,“ heterocyclyl ”.
Examples of the “leaving group” include alkyloxy, aryloxy, acyloxy, alkoxycarbonyloxy, arylcarbonyloxy, alkylsulfonyloxy, halogen and the like. In particular, halogen is preferable.
「アルキルスルホニル」、「アリールスルホニル」、「ヘテロアリールスルホニル」、「ヘテロサイクリルスルホニル」、「アルキルオキシカルボニル」の「アルキル」部分、「アリール」部分、「ヘテロアリール」部分、「ヘテロサイクリル」部分は、それぞれ、上記「アルキル」、「アリール」、「ヘテロアリール」、「ヘテロサイクリル」と同意義である。 “Alkylsulfonyl”, “arylsulfonyl”, “heteroarylsulfonyl”, “heterocyclylsulfonyl”, “alkyl” moiety of “alkyloxycarbonyl”, “aryl” moiety, “heteroaryl” moiety, “heterocyclyl” The moieties are as defined above for “alkyl”, “aryl”, “heteroaryl”, and “heterocyclyl”.
「置換アルキル」、「置換アルケニル」、「置換アルキニル」、「置換アリール」、「置換ヘテロアリール」、「置換シクロアルキル」、「置換シクロアルケニル」、「置換ヘテロサイクリル」「隣接する炭素原子と一緒になって形成される置換された環」、「置換アミノ」、「置換アルキルスルホニル」、「置換アリールスルホニル」、「置換ヘテロアリールスルホニル」、「置換ヘテロサイクリルスルホニル」、「隣接する窒素原子と一緒になって形成される置換された環」、「置換アシル」、「置換カルバモイル」、「置換チオカルバモイル」、「置換アルキルオキシカルボニル」、「置換スルファモイル」、「置換アルキルカルボニル」、「置換アルケニルカルボニル」、「置換シクロアルキルカルボニル」、「置換シクロアルケニルカルボニル」、「置換アリールカルボニル」、「置換ヘテロアリールカルボニル」、「置換ヘテロサイクリルカルボニル」における置換基としては、例えば、
ハロゲン、ヒドロキシ、カルボキシ、ニトロ、シアノ、
置換もしくは非置換のアルキル(置換基としては、ハロゲン、ヒドロキシ、カルボキシ、シアノ、アミノ、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル、アルキルオキシカルボニル、アルキルオキシカルボニルアミノ、カルバモイル。例:メチル、エチル、イソプロピル、tert−ブチル、CF3、CH2OH、CH2CH2OH、CH2COOCH3、CH2NH2、CH2CN、ベンジル)、
置換もしくは非置換のアルケニル(置換基としては、ハロゲン、カルボキシ、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:ビニル)、
置換もしくは非置換のアルキニル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:エチニル)、
置換もしくは非置換のアリール(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル、置換もしくは非置換のヘテロサイクリルオキシ。例:フェニル、ナフチル)、
置換もしくは非置換のシクロアルキル(置換基としては、ハロゲン、シアノ、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル、アルキルオキシカルボニル。例:シクロプロピル、シクロブチル)、
置換もしくは非置換のシクロアルケニル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:シクロプロペニル)、
置換もしくは非置換のヘテロアリール(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:テトラゾリル、インドリル、ピラゾリル)、
置換もしくは非置換のヘテロサイクリル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:ピロリジニル、モルホリニル、ピペラジニル、ピペリジル)、
置換もしくは非置換のアルキルオキシ(置換基としては、ハロゲン、カルボキシ、シアノ、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:メトキシ、エトキシ、プロポキシ、ブトキシ、OCF3)、
置換もしくは非置換のアリールオキシ(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:フェニルオキシ)、
置換もしくは非置換のシリルオキシ、
置換もしくは非置換のアミノ(例:アルキルアミノ(例:メチルアミノ、エチルアミノ、ジメチルアミノ)、アシルアミノ(例:アセチルアミノ、ベンゾイルアミノ)、アリールアルキルアミノ(例:ベンジルアミノ、トリチルアミノ)、ヒドロキシアミノ、アルキルアミノアルキル(例:ジエチルアミノメチル)、アルキルオキシカルボニルアミノ、アルキルスルホニルアミノ、カルバモリルアミノ、ヘテロサイクリルカルボニルアミノ、アリールスルホニルアミノ、ヘテロアリールスルホニルアミノ)、
置換もしくは非置換のカルバモイル(置換基としては、ヒドロキシ、シアノ、置換もしくは非置換のアルキル、アルキルオキシ、アルキルスルホニル。例:アルキルカルバモイル(例:メチルカルバモイル、エチルカルバモイル、ジメチルカルバモイル、フェニルエチルカルバモイル、ジメチルアミノエチルカルバモイル、イソプロピルカルバモイル、ヒドロキシエチルカルバモイル)、アルキルスルホニルカルバモイル、ヘテロアリールアルキルカルバモイル、置換もしくは非置換のアルキルオキシカルバモイル。)、
置換もしくは非置換のカルバモイルオキシ(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。)、
置換もしくは非置換のアシル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:アルキルカルボニル、アリールカルボニル、ヘテロアリールカルボニル、ヘテロサイクリルカルボニル、ホルミル、アセチル。)、
置換もしくは非置換のアルキルスルホニル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:メタンスルホニル、エタンスルホニル)、
置換もしくは非置換のアリールスルホニル、
置換もしくは非置換のヘテロアリールスルホニル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。)、
置換もしくは非置換のスルファモイル、
置換もしくは非置換のアルキルオキシカルボニル(置換基としては、ハロゲン、アルキル、アリール、シクロアルキル、ヘテロアリール、ヘテロサイクリル。例:メトキシカルボニル、エトキシカルボニル、tert−ブトキシカルボニル)、アリールオキシカルボニル、ヘテロアリールオキシカルボニル、ヘテロサイクリルオキシカルボニル、
シクロアルキルスルホニル、ヘテロアリールスルホニル、ヘテロサイクリルスルホニル、
アルキルスルフィニル、シクロアルキルスルフィニル、アリールスルフィニル、ヘテロアリールスルフィニル、ヘテロサイクリルスルフィニル、
ニトロソ、
アルケニルオキシ(例:ビニルオキシ、アリルオキシ)、
アリールアルキルオキシ(例:ベンジルオキシ)、
アジド、
イソシアノ、イソシアナト、チオシアナト、イソチオシアナト、メルカプト、
アルキルチオ(例:メチルチオ)、
ホルミルオキシ、ハロホルミル、オキザロ、チオホルミル、チオカルボキシ、ジチオカルボキシ、チオカルバモイル、スルフィノ、スルホ、スルホアミノ、ヒドラジノ、ウレイド、アミジノ、グアニジノ、フタルイミド、オキソ等からなる群から選択される基があげられる。1〜4個の当該置換基で置換されていてもよい。“Substituted alkyl”, “substituted alkenyl”, “substituted alkynyl”, “substituted aryl”, “substituted heteroaryl”, “substituted cycloalkyl”, “substituted cycloalkenyl”, “substituted heterocyclyl” “adjacent carbon atoms” "Substituted ring formed together", "substituted amino", "substituted alkylsulfonyl", "substituted arylsulfonyl", "substituted heteroarylsulfonyl", "substituted heterocyclylsulfonyl", "adjacent nitrogen atom" Substituted ring "," substituted acyl "," substituted carbamoyl "," substituted thiocarbamoyl "," substituted alkyloxycarbonyl "," substituted sulfamoyl "," substituted alkylcarbonyl "," substituted Alkenylcarbonyl "," substituted cycloalkylcarbonyl "," substituted cycloalkenyl " Carbonyl ", as the substituent in the" substituted arylcarbonyl "," substituted heteroarylcarbonyl "," substituted heterocyclyl carbonyl ", e.g.,
Halogen, hydroxy, carboxy, nitro, cyano,
Substituted or unsubstituted alkyl (substituents are halogen, hydroxy, carboxy, cyano, amino, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, alkyloxycarbonyl, alkyloxycarbonylamino, carbamoyl, eg methyl , ethyl, isopropyl, tert- butyl, CF 3, CH 2 OH, CH 2 CH 2 OH, CH 2 COOCH 3, CH 2 NH 2, CH 2 CN, benzyl),
Substituted or unsubstituted alkenyl (substituents are halogen, carboxy, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg vinyl),
Substituted or unsubstituted alkynyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg ethynyl),
Substituted or unsubstituted aryl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, substituted or unsubstituted heterocyclyloxy, such as phenyl, naphthyl),
Substituted or unsubstituted cycloalkyl (substituents are halogen, cyano, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, alkyloxycarbonyl, eg cyclopropyl, cyclobutyl),
Substituted or unsubstituted cycloalkenyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg, cyclopropenyl),
Substituted or unsubstituted heteroaryl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg, tetrazolyl, indolyl, pyrazolyl),
Substituted or unsubstituted heterocyclyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, such as pyrrolidinyl, morpholinyl, piperazinyl, piperidyl),
Substituted or unsubstituted alkyloxy (halogen, carboxy, cyano, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl. Examples: methoxy, ethoxy, propoxy, butoxy, OCF 3 ),
Substituted or unsubstituted aryloxy (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg, phenyloxy),
Substituted or unsubstituted silyloxy,
Substituted or unsubstituted amino (eg, alkylamino (eg, methylamino, ethylamino, dimethylamino), acylamino (eg, acetylamino, benzoylamino), arylalkylamino (eg, benzylamino, tritylamino), hydroxyamino Alkylaminoalkyl (eg, diethylaminomethyl), alkyloxycarbonylamino, alkylsulfonylamino, carbamolylamino, heterocyclylcarbonylamino, arylsulfonylamino, heteroarylsulfonylamino),
Substituted or unsubstituted carbamoyl (Substituents are hydroxy, cyano, substituted or unsubstituted alkyl, alkyloxy, alkylsulfonyl. Examples: alkylcarbamoyl (example: methylcarbamoyl, ethylcarbamoyl, dimethylcarbamoyl, phenylethylcarbamoyl, dimethyl) Aminoethylcarbamoyl, isopropylcarbamoyl, hydroxyethylcarbamoyl), alkylsulfonylcarbamoyl, heteroarylalkylcarbamoyl, substituted or unsubstituted alkyloxycarbamoyl).
Substituted or unsubstituted carbamoyloxy (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl),
Substituted or unsubstituted acyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl. Examples: alkylcarbonyl, arylcarbonyl, heteroarylcarbonyl, heterocyclylcarbonyl, formyl, acetyl) ,
Substituted or unsubstituted alkylsulfonyl (substituents include halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, such as methanesulfonyl, ethanesulfonyl),
Substituted or unsubstituted arylsulfonyl,
Substituted or unsubstituted heteroarylsulfonyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl),
Substituted or unsubstituted sulfamoyl,
Substituted or unsubstituted alkyloxycarbonyl (substituents are halogen, alkyl, aryl, cycloalkyl, heteroaryl, heterocyclyl, eg methoxycarbonyl, ethoxycarbonyl, tert-butoxycarbonyl), aryloxycarbonyl, heteroaryl Oxycarbonyl, heterocyclyloxycarbonyl,
Cycloalkylsulfonyl, heteroarylsulfonyl, heterocyclylsulfonyl,
Alkylsulfinyl, cycloalkylsulfinyl, arylsulfinyl, heteroarylsulfinyl, heterocyclylsulfinyl,
Nitroso,
Alkenyloxy (eg vinyloxy, allyloxy),
Arylalkyloxy (eg benzyloxy),
Azide,
Isocyanato, isocyanato, thiocyanato, isothiocyanato, mercapto,
Alkylthio (eg methylthio),
Examples include groups selected from the group consisting of formyloxy, haloformyl, oxalolo, thioformyl, thiocarboxy, dithiocarboxy, thiocarbamoyl, sulfino, sulfo, sulfoamino, hydrazino, ureido, amidino, guanidino, phthalimide, oxo and the like. It may be substituted with 1 to 4 such substituents.
本発明の化合物の一つ以上の水素、炭素または他の原子は、水素、炭素または他の原子の同位体で置換され得る。
例えば、式(II)の化合物は、式(II)の化合物のすべての放射性標識体を包含する。式(II)の化合物のそのような「放射性標識化」、「放射性標識体」などは、それぞれが本発明に包含され、代謝薬物動態研究ならびに結合アッセイにおける研究および/または診断ツールとして有用である。本発明の式(II)の化合物に組み込まれ得る同位体の例としては、それぞれ2H、3H、13C、14C、15N、18O、17O、31P、32P、35S、18F、および36Clのように、水素、炭素、窒素、酸素、リン、硫黄、フッ素、および塩素が包含される。本発明の放射性標識化合物は、当該技術分野で周知の方法で調製できる。例えば、式(II)のトリチウム標識化合物は、例えば、トリチウムを用いた触媒的脱ハロゲン化反応によって、式(II)の特定の化合物にトリチウムを導入することで調製できる。この方法は、適切な触媒、例えばPd/Cの存在下、塩基の存在または非存在下で、式(II)の化合物が適切にハロゲン置換された前駆体とトリチウムガスとを反応させることを包含してもよい。他のトリチウム標識化合物を調製するための適切な方法としては、文書Isotopes in the Physical and Biomedical Sciences, Vol. 1, Labeled Compounds (Part A), Chapter 6 (1987年)を参照にできる。14C−標識化合物は、14C炭素を有する原料を用いることによって調製できる。One or more hydrogen, carbon or other atoms of the compounds of the present invention may be replaced with hydrogen, carbon or other isotopes of atoms.
For example, the compound of formula (II) includes all radiolabels of the compound of formula (II). Such “radiolabeled”, “radiolabeled” and the like of the compound of formula (II) are each encompassed by the present invention and are useful as research and / or diagnostic tools in metabolic pharmacokinetic studies and binding assays. . Examples of isotopes that can be incorporated into the compound of formula (II) of the present invention include 2 H, 3 H, 13 C, 14 C, 15 N, 18 O, 17 O, 31 P, 32 P, and 35 S, respectively. , 18 F, and 36 Cl include hydrogen, carbon, nitrogen, oxygen, phosphorus, sulfur, fluorine, and chlorine. The radiolabeled compound of the present invention can be prepared by methods well known in the art. For example, a tritium-labeled compound of formula (II) can be prepared by introducing tritium into a specific compound of formula (II), for example, by a catalytic dehalogenation reaction using tritium. This method involves reacting a compound of formula (II) with a suitably halogen-substituted precursor and tritium gas in the presence of a suitable catalyst, for example Pd / C, in the presence or absence of a base. May be. Suitable methods for preparing other tritium labeled compounds include the document Isotopes in the Physical and Biomedical Sciences, Vol. 1, Labeled Compounds (Part A), Chapter 6 (1987). The 14 C-labeled compound can be prepared by using a raw material having 14 C carbon.
「塩」としては、以下の塩が含まれる。
塩基性塩として、例えば、ナトリウム塩、カリウム塩等のアルカリ金属塩;カルシウム塩、ストロンチウム塩等のアルカリ土類金属塩;ベリリウム塩、マグネシウム塩、亜鉛塩、遷移金属塩などの金属塩;アンモニウム塩;トリメチルアミン塩、トリエチルアミン塩、ジシクロヘキシルアミン塩、エタノールアミン塩、ジエタノールアミン塩、トリエタノールアミン塩、ブロカイン塩、メグルミン塩、ジエタノールアミン塩またはエチレンジアミン塩等の脂肪族アミン塩;N,N-ジベンジルエチレンジアミン、ベネタミン塩等のアラルキルアミン塩;ピリジン塩、ピコリン塩、キノリン塩、イソキノリン塩等のヘテロ環芳香族アミン塩;テトラメチルアンモニウム塩、テトラエチルアモニウム塩、ベンジルトリメチルアンモニウム塩、ベンジルトリエチルアンモニウム塩、ベンジルトリブチルアンモニウム塩、メチルトリオクチルアンモニウム塩、テトラブチルアンモニウム塩等の第4級アンモニウム塩;アルギニン塩、リジン塩等の塩基性アミノ酸塩等が含まれる。
酸性塩としては、例えば、塩酸塩、硫酸塩、硝酸塩、リン酸塩、炭酸塩、炭酸水素塩、過塩素酸塩等の無機酸塩;酢酸塩、プロピオン酸塩、乳酸塩、マレイン酸塩、フマール酸塩、酒石酸塩、リンゴ酸塩、クエン酸塩、アスコルビン酸塩等の有機酸塩;メタンスルホン酸塩、イセチオン酸塩、ベンゼンスルホン酸塩、p-トルエンスルホン酸塩等のスルホン酸塩;アスパラギン酸塩、グルタミン酸塩等の酸性アミノ酸等が含まれる。The “salt” includes the following salts.
Examples of basic salts include alkali metal salts such as sodium salt and potassium salt; alkaline earth metal salts such as calcium salt and strontium salt; metal salts such as beryllium salt, magnesium salt, zinc salt and transition metal salt; ammonium salt ; Aliphatic amine salts such as trimethylamine salt, triethylamine salt, dicyclohexylamine salt, ethanolamine salt, diethanolamine salt, triethanolamine salt, brocaine salt, meglumine salt, diethanolamine salt or ethylenediamine salt; N, N-dibenzylethylenediamine, venetamine Aralkylamine salts such as salts; heterocyclic aromatic amine salts such as pyridine salts, picoline salts, quinoline salts, isoquinoline salts; tetramethylammonium salts, tetraethylammonium salts, benzyltrimethylammonium salts, benzyltols Examples include quaternary ammonium salts such as liethylammonium salt, benzyltributylammonium salt, methyltrioctylammonium salt, and tetrabutylammonium salt; basic amino acid salts such as arginine salt and lysine salt.
Examples of the acid salt include inorganic acid salts such as hydrochloride, sulfate, nitrate, phosphate, carbonate, bicarbonate, perchlorate; acetate, propionate, lactate, maleate, Organic acid salts such as fumarate, tartrate, malate, citrate, ascorbate; sulfonates such as methanesulfonate, isethionate, benzenesulfonate, p-toluenesulfonate; Acidic amino acids such as aspartate and glutamate are included.
「溶媒和物」は、化合物またはその塩の溶媒和物を意味し、例えば、アルコール(例:エタノール)和物や水和物等が挙げられる。水和物としては、1水和物、2水和物等を挙げることができる。 “Solvate” means a solvate of a compound or a salt thereof, and examples thereof include alcohol (eg, ethanol) solvate and hydrate. Examples of the hydrate include monohydrate, dihydrate and the like.
R10としては、式:−(CR13R14)m−NR12−R11または式:−(CR13R14)m−O−C(O)−NR15−R16が挙げられる。
R11としては、置換もしくは非置換のアシル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアルキルオキシカルボニル、置換もしくは非置換のカルバモイルまたは置換もしくは非置換のスルファモイルが挙げられる。好ましくは、、置換もしくは非置換のアシル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアルキルオキシカルボニルである。
R12としては、水素または置換もしくは非置換のアルキルが挙げられる。好ましくは、水素である。
R13およびR14としては、それぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンが挙げられる。好ましくは、水素である。
R15およびR16としては、それぞれ独立して水素または置換もしくは非置換のアルキルが挙げられる。
mは0〜3の整数である。好ましくは、0または1である。特に好ましくは、0である。Examples of R 10 include the formula: — (CR 13 R 14 ) m—NR 12 —R 11 or the formula: — (CR 13 R 14 ) m—O—C (O) —NR 15 —R 16 .
R 11 includes substituted or unsubstituted acyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted alkyloxycarbonyl, substituted or unsubstituted carbamoyl, or substituted or unsubstituted sulfamoyl. Preferred are substituted or unsubstituted acyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted alkyloxycarbonyl.
R 12 includes hydrogen or substituted or unsubstituted alkyl. Preferably, it is hydrogen.
R 13 and R 14 each independently include hydrogen, substituted or unsubstituted alkyl, or halogen. Preferably, it is hydrogen.
R 15 and R 16 each independently include hydrogen or substituted or unsubstituted alkyl.
m is an integer of 0-3. Preferably, it is 0 or 1. Particularly preferred is 0.
R1は式:−Y−R5である。
Yは単結合、−O−または−S−である。好ましくは−O−である。
R5は置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のヘテロサイクリルである。好ましくは、置換もしくは非置換のアルキルである。
R2およびR3は、それぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンである。また、R2およびR3は隣接する炭素原子と一緒になって置換もしくは非置換の環を形成していてもよい。R2およびR3として好ましいのは、置換もしくは非置換のアルキルである。
R4としては、式:−C(=O)−NR6R7または式:−NR8R9で示される基が挙げられる。好ましくは、式:−NR8R9で示される基である。
R6およびR7としては、それぞれ独立して水素、置換もしくは非置換のアミノ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のヘテロアリールスルホニルまたは置換もしくは非置換のヘテロサイクリルスルホニルが挙げられる。また、R6とR7は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。
R6およびR7として好ましいのは、水素である。
R8およびR9はそれぞれ独立して水素、カルボキシ、ヒドロキシ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアシル、置換もしくは非置換のカルバモイル、置換もしくは非置換のチオカルバモイル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のアルキルオキシカルボニル、または置換もしくは非置換のスルファモイルが挙げられる。また、R8とR9は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。
R8およびR9として好ましいのは、水素、置換もしくは非置換のアルキルオキシカルボニル、置換もしくは非置換のアシルである。
Xはヒドロキシまたは脱離基である。R 1 is of the formula: —Y—R 5 .
Y is a single bond, —O— or —S—. -O- is preferable.
R 5 is substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted Substituted cycloalkenyl, substituted or unsubstituted heterocyclyl. Preferably, it is a substituted or unsubstituted alkyl.
R 2 and R 3 are each independently hydrogen, substituted or unsubstituted alkyl or halogen. R 2 and R 3 may be combined with adjacent carbon atoms to form a substituted or unsubstituted ring. Preferred as R 2 and R 3 is substituted or unsubstituted alkyl.
Examples of R 4 include a group represented by the formula: —C (═O) —NR 6 R 7 or a formula: —NR 8 R 9 . Preferably, it is a group represented by the formula: —NR 8 R 9 .
R 6 and R 7 are each independently hydrogen, substituted or unsubstituted amino, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, Substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or Examples include unsubstituted heteroarylsulfonyl or substituted or unsubstituted heterocyclylsulfonyl. R 6 and R 7 may be combined with an adjacent nitrogen atom to form a substituted or unsubstituted ring.
Preferred as R 6 and R 7 is hydrogen.
R 8 and R 9 are each independently hydrogen, carboxy, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted Cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted acyl, substituted or unsubstituted carbamoyl, substituted or unsubstituted thiocarbamoyl, substituted Or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted alkyloxycarbonyl, or substituted or unsubstituted sulfamoyl. R 8 and R 9 may be combined with an adjacent nitrogen atom to form a substituted or unsubstituted ring.
Preferred as R 8 and R 9 are hydrogen, substituted or unsubstituted alkyloxycarbonyl, substituted or unsubstituted acyl.
X is hydroxy or a leaving group.
式(II)で示される化合物としては、以下の化合物が好ましい。
以下に実施例を挙げて本発明を説明するが、本発明を実施例に限定するものではない。
なお、各化合物については、NMRまたはlog k’の測定結果を示した。
ここで、log k’とは親油性の程度を表す値であり、以下の式により算出される。
log k’=log(tR−t0)/t0
tR:グラジエント条件下における化合物の保持時間
t0:カラムに保持されない標準物質の保持時間
測定にはXTerra MS C18 5μm、2.1×100mmのカラム(Waters製)を使用し、流速0.25mL/分でアセトニトリル/pH6.8buffer(5:95〜95:5/20分)の直線勾配をかけて測定した。As the compound represented by the formula (II), the following compounds are preferable.
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to the examples.
In addition, about each compound, the measurement result of NMR or log k 'was shown.
Here, log k ′ is a value representing the degree of lipophilicity and is calculated by the following equation.
log k ′ = log (t R −t 0 ) / t 0
t R : retention time of compound under gradient conditions t 0 : XTerra MS C18 5 μm, 2.1 × 100 mm column (Waters) was used for measuring the retention time of the standard substance not retained on the column, and the flow rate was 0.25 mL. It was measured by applying a linear gradient of acetonitrile / pH 6.8 buffer (5:95 to 95: 5/20 minutes) per minute.
化合物1は、国際公開第2007/114125号パンフレット記載の方法に順じて製造した。
化合物1(1.6g)をジクロロメタン(6ml)、アセトニトリル(3ml)にけん濁し0℃に冷却した。濃硫酸(1.1g)を滴下し0℃で20分撹拌後、室温で14時間撹拌した。反応終了後、冷却した飽和炭酸水素ナトリウム水溶液に注ぎ、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物2(1.55g,85.1%)を得た。
NMR(d6-DMSO); δ(ppm)1.50-1.53 (m, 2H), 1.77 (s, 3H), 1.94-2.03 (m, 5H), 2.12-2.18 (m, 4H), 2.68 (br s, 2H), 4.19 (s, 1H), 7.39 (s, 1H), 7.82 (s, 4H).
Compound 1 was produced according to the method described in International Publication No. 2007/114125 pamphlet.
Compound 1 (1.6 g) was suspended in dichloromethane (6 ml) and acetonitrile (3 ml) and cooled to 0 ° C. Concentrated sulfuric acid (1.1 g) was added dropwise, stirred at 0 ° C. for 20 minutes, and then stirred at room temperature for 14 hours. After completion of the reaction, the mixture was poured into a cooled saturated aqueous sodium hydrogen carbonate solution and extracted with dichloromethane. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 2 (1.55 g, 85.1%).
NMR (d6-DMSO); δ (ppm) 1.50-1.53 (m, 2H), 1.77 (s, 3H), 1.94-2.03 (m, 5H), 2.12-2.18 (m, 4H), 2.68 (br s, 2H), 4.19 (s, 1H), 7.39 (s, 1H), 7.82 (s, 4H).
化合物2(1.55g)のエタノール懸濁液(16ml)にメチルヒドラジン(0.61ml)を加え、28時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液と酢酸エチルを加えて撹拌後、不溶物をろ過した。分液し、水層を酢酸エチルで洗浄し、減圧下に濃縮した。5N水酸化ナトリウム水溶液を加えてアルカリ性とした後に、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、アミンII−1を得た。
NMR(d6-DMSO); δ(ppm)1.24-1.28 (m, 2H), 1.69-1.99 (m, 14H), 2.86 (s, 1H), 7.25 (s, 1H)
Methylhydrazine (0.61 ml) was added to an ethanol suspension (16 ml) of compound 2 (1.55 g), and the mixture was heated to reflux for 28 hours. After completion of the reaction, the solvent was distilled off, 2N aqueous hydrochloric acid and ethyl acetate were added to the residue and the mixture was stirred and insoluble matter was filtered off. The layers were separated, and the aqueous layer was washed with ethyl acetate and concentrated under reduced pressure. 5N Aqueous sodium hydroxide solution was added to make the solution alkaline, followed by extraction with dichloromethane. The organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off to give amine II-1.
NMR (d6-DMSO); δ (ppm) 1.24-1.28 (m, 2H), 1.69-1.99 (m, 14H), 2.86 (s, 1H), 7.25 (s, 1H)
化合物1(1.5g)をジクロロメタン(6ml)、プロピオニトリル(3ml)にけん濁し0℃に冷却した。濃硫酸(990mg)を滴下し、室温で18時間撹拌した。反応終了後、冷却した飽和炭酸水素ナトリウム水溶液に注ぎ、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物3(1.17g,65.8%)を得た。
Compound 1 (1.5 g) was suspended in dichloromethane (6 ml) and propionitrile (3 ml) and cooled to 0 ° C. Concentrated sulfuric acid (990 mg) was added dropwise and stirred at room temperature for 18 hours. After completion of the reaction, the mixture was poured into a cooled saturated aqueous sodium hydrogen carbonate solution and extracted with dichloromethane. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 3 (1.17 g, 65.8%).
化合物3(1.17g)のエタノール縣濁液(12ml)にメチルヒドラジン(442μl)を加え、24時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液と酢酸エチルを加えて撹拌後、不溶物をろ過した。分液し、水層を酢酸エチルで洗浄し、減圧下に濃縮した。2N水酸化ナトリウム水溶液を加えてアルカリ性とした後に、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、アミンII−2(660mg,89.4%)を得た。
NMR(d6-DMSO); δ(ppm)0.93 (t, J = 7.6 Hz, 3H), 1.25-1.28 (m, 2H), 1.69 (br s, 2H), 1.87-2.02 (m, 11H), 2.86 (s, 1H), 7.16 (s, 1H)
Methylhydrazine (442 μl) was added to an ethanol suspension (12 ml) of compound 3 (1.17 g), and the mixture was heated to reflux for 24 hours. After completion of the reaction, the solvent was distilled off, 2N aqueous hydrochloric acid and ethyl acetate were added to the residue and the mixture was stirred and insoluble matter was filtered off. The layers were separated, and the aqueous layer was washed with ethyl acetate and concentrated under reduced pressure. A 2N aqueous sodium hydroxide solution was added to make the mixture alkaline, and the mixture was extracted with dichloromethane. The organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off to give amine II-2 (660 mg, 89.4%).
NMR (d6-DMSO); δ (ppm) 0.93 (t, J = 7.6 Hz, 3H), 1.25-1.28 (m, 2H), 1.69 (br s, 2H), 1.87-2.02 (m, 11H), 2.86 (s, 1H), 7.16 (s, 1H)
化合物1(2.0g)をジクロロメタン(7ml)、クロロアセトニトリル(3.5ml)にけん濁し0℃に冷却した。濃硫酸(990mg)を滴下し、室温で6.5時間撹拌した。反応終了後、冷却した飽和炭酸水素ナトリウム水溶液に注ぎ、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物4(2.37g,94.5%)を得た。
NMR(d6-DMSO); δ(ppm)1.52-1.55 (m, 2H), 1.96-2.19 (m, 9H), 2.71 (br s, 2H), 3.98 (s, 2H), 4.20 (s, 1H), 7.77 (s, 1H), 7.82 (s, 4H)
Compound 1 (2.0 g) was suspended in dichloromethane (7 ml) and chloroacetonitrile (3.5 ml) and cooled to 0 ° C. Concentrated sulfuric acid (990 mg) was added dropwise, and the mixture was stirred at room temperature for 6.5 hours. After completion of the reaction, the mixture was poured into a cooled saturated aqueous sodium hydrogen carbonate solution and extracted with dichloromethane. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 4 (2.37 g, 94.5%).
NMR (d6-DMSO); δ (ppm) 1.52-1.55 (m, 2H), 1.96-2.19 (m, 9H), 2.71 (br s, 2H), 3.98 (s, 2H), 4.20 (s, 1H) , 7.77 (s, 1H), 7.82 (s, 4H)
化合物4(2.37g)のエタノール溶液(13ml)に酢酸(2.6ml)、チオウレア(581mg)を加え、14時間加熱還流を行った。反応終了後、水を加え、生じた不溶物をろ過した。ろ液に5N水酸化ナトリウム水溶液を加えてアルカリ性とした後に、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、化合物5(1.33g)を得た。精製することなく次の反応に用いた。
Acetic acid (2.6 ml) and thiourea (581 mg) were added to an ethanol solution (13 ml) of compound 4 (2.37 g), followed by heating under reflux for 14 hours. After completion of the reaction, water was added and the resulting insoluble material was filtered. The filtrate was made alkaline by adding 5N aqueous sodium hydroxide solution, and extracted with dichloromethane. The organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off to obtain Compound 5 (1.33 g). Used in the next reaction without purification.
化合物5(1.33g)のジクロロメタン溶液(15ml)にトリエチルアミン(1.26ml)を加え、0℃に冷却した後、メタンスルホニルクロリド(418μl)を加えた。室温にて1.5時間撹拌し、反応終了後、有機層を1N塩酸水溶液で洗浄した。溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物6(907mg,53.7%)を得た。
NMR(d6-DMSO); δ(ppm)1.49-1.52 (m, 2H), 1.93-2.15 (m, 9H), 2.72 (br s, 2H), 3.34 (s, 3H), 4.16 (s, 1H), 6.93 (s, 1H), 7.82 (s, 4H)
Triethylamine (1.26 ml) was added to a dichloromethane solution (15 ml) of compound 5 (1.33 g), and after cooling to 0 ° C., methanesulfonyl chloride (418 μl) was added. The mixture was stirred at room temperature for 1.5 hours. After completion of the reaction, the organic layer was washed with 1N aqueous hydrochloric acid. The solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 6 (907 mg, 53.7%).
NMR (d6-DMSO); δ (ppm) 1.49-1.52 (m, 2H), 1.93-2.15 (m, 9H), 2.72 (br s, 2H), 3.34 (s, 3H), 4.16 (s, 1H) , 6.93 (s, 1H), 7.82 (s, 4H)
化合物6(907mg)のエタノール懸濁液(20ml)にメチルヒドラジン(322μl)を加え、一晩加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液、酢酸エチルとヘキサンの1:1混合液を加えて撹拌後、不溶物をろ過した。分液し、水層をエーテルで洗浄した。5N水酸化ナトリウム水溶液を加えてアルカリ性とした後に、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、アミンII−3(321mg,54.2%)を得た。
NMR(d6-DMSO); δ(ppm)1.23-1.26 (m, 2H), 1.71-1.99 (m, 11H), 2.84 (s, 1H), 2.92 (s, 3H), 6.76 (br s, 1H)
Methylhydrazine (322 μl) was added to an ethanol suspension (20 ml) of compound 6 (907 mg), and the mixture was heated to reflux overnight. After completion of the reaction, the solvent was distilled off, and a 2N aqueous hydrochloric acid solution and a 1: 1 mixture of ethyl acetate and hexane were added to the residue. After stirring, the insoluble material was filtered off. The layers were separated and the aqueous layer was washed with ether. 5N Aqueous sodium hydroxide solution was added to make the solution alkaline, followed by extraction with dichloromethane. The organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off to give amine II-3 (321 mg, 54.2%).
NMR (d6-DMSO); δ (ppm) 1.23-1.26 (m, 2H), 1.71-1.99 (m, 11H), 2.84 (s, 1H), 2.92 (s, 3H), 6.76 (br s, 1H)
化合物5(700mg)のジクロロメタン溶液(14ml)にトリエチルアミン(0.99ml)を加え、0℃に冷却した後、クロロギ酸メチル(272μl)を加えた。室温にて4時間撹拌し、反応終了後、0.5N塩酸水溶液に注いだ。ジクロロメタンで抽出し、有機層を飽和食塩水で洗浄した。硫酸ナトリウムで乾燥後、溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物7(266mg,31.8%)を得た。
NMR(d6-DMSO); δ(ppm)1.49-1.52 (m, 2H), 1.89-2.16 (m, 9H), 2.68 (br s, 2H), 3.49 (s, 3H), 4.16 (s, 1H), 6.92 (s, 1H), 7.82 (s, 4H)
Triethylamine (0.99 ml) was added to a dichloromethane solution (14 ml) of compound 5 (700 mg), cooled to 0 ° C., and then methyl chloroformate (272 μl) was added. The mixture was stirred at room temperature for 4 hours. The mixture was extracted with dichloromethane, and the organic layer was washed with saturated brine. After drying with sodium sulfate, the solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 7 (266 mg, 31.8%).
NMR (d6-DMSO); δ (ppm) 1.49-1.52 (m, 2H), 1.89-2.16 (m, 9H), 2.68 (br s, 2H), 3.49 (s, 3H), 4.16 (s, 1H) , 6.92 (s, 1H), 7.82 (s, 4H)
化合物7(259mg)のエタノール懸濁液(3ml)にメチルヒドラジン(97μl)を加え、24時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液を加え、不溶物をろ過した。水層を酢酸エチルで洗浄し、5N水酸化ナトリウム水溶液を加えてアルカリ性とした後に、ジクロロメタンで抽出した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、アミンII−4(135mg,82.4%)を得た。
NMR(d6-DMSO); δ(ppm)1.23-1.26 (m, 2H), 1.69-1.99 (m, 11H), 2.84 (s, 1H), 3.45 (s, 3H), 6.76 (s, 1H)
Methylhydrazine (97 μl) was added to an ethanol suspension (3 ml) of compound 7 (259 mg), and the mixture was heated to reflux for 24 hours. After completion of the reaction, the solvent was distilled off, 2N hydrochloric acid aqueous solution was added to the residue, and insoluble matter was filtered off. The aqueous layer was washed with ethyl acetate, made alkaline with 5N aqueous sodium hydroxide solution, and extracted with dichloromethane. The organic layer was washed with saturated brine and dried over magnesium sulfate. The solvent was distilled off to give amine II-4 (135 mg, 82.4%).
NMR (d6-DMSO); δ (ppm) 1.23-1.26 (m, 2H), 1.69-1.99 (m, 11H), 2.84 (s, 1H), 3.45 (s, 3H), 6.76 (s, 1H)
化合物1(5.0g)のジクロロメタン溶液(50ml)に1,1−カルボニルジイミダゾール(3.27g)、4−ジメチルアミノピリジン(411mg)を加え、室温にて14時間撹拌した。原料の消失を確認した後に、ジメチルアミン(25.2ml,2Mテトラヒドロフラン溶液)を滴下し、更に室温で10時間撹拌した。反応終了後、2N塩酸水溶液を加えて酸性とし、クロロホルムで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去し、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物8(2.73g,44.1%)を得た。
NMR(d6-DMSO);δ(ppm)1.48-1.57(m,2H),2.060-2.29(m,9H),2.72-2.86(m,8H),4.18-4.22(br,1H), 7.82(s,4H)
1,1-carbonyldiimidazole (3.27 g) and 4-dimethylaminopyridine (411 mg) were added to a dichloromethane solution (50 ml) of compound 1 (5.0 g), and the mixture was stirred at room temperature for 14 hours. After confirming disappearance of the raw materials, dimethylamine (25.2 ml, 2M tetrahydrofuran solution) was added dropwise, and the mixture was further stirred at room temperature for 10 hours. After completion of the reaction, the mixture was acidified with 2N aqueous hydrochloric acid and extracted with chloroform. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off, and the residue was purified by silica gel column chromatography to obtain compound 8 (2.73 g, 44.1%).
NMR (d6-DMSO); δ (ppm) 1.48-1.57 (m, 2H), 2.060-2.29 (m, 9H), 2.72-2.86 (m, 8H), 4.18-4.22 (br, 1H), 7.82 (s , 4H)
化合物8(1.0g)のエタノール溶液(10ml)にメチルヒドラジン(361μl)を加え、20時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液と酢酸エチルを加えて撹拌後、分液した。水層を酢酸エチルで洗浄し、減圧下に濃縮した。炭酸ナトリウム水溶液を加えてアルカリ性とした後に、析出した固体をろ取した。水洗後、乾燥し、アミンII−5(500mg,77.3%)を得た。
NMR(CDCl3); δ(ppm)1.42-1.51(m,2H),1.88-2.19(m,11H),2.85(s,6H),3.05-3.10(br,1H)
Methylhydrazine (361 μl) was added to an ethanol solution (10 ml) of compound 8 (1.0 g), followed by heating under reflux for 20 hours. After completion of the reaction, the solvent was distilled off, 2N aqueous hydrochloric acid and ethyl acetate were added to the residue, and the mixture was stirred and separated. The aqueous layer was washed with ethyl acetate and concentrated under reduced pressure. After adding an aqueous sodium carbonate solution to make it alkaline, the precipitated solid was collected by filtration. After washing with water and drying, amine II-5 (500 mg, 77.3%) was obtained.
NMR (CDCl 3 ); δ (ppm) 1.42-1.51 (m, 2H), 1.88-2.19 (m, 11H), 2.85 (s, 6H), 3.05-3.10 (br, 1H)
化合物1(2.0g)のトルエン溶液(20ml)にエチルイソシアネート(2.7ml)を加え、8.5時間加熱還流を行った。反応終了後、溶媒を留去し、得られた固体をジイソプロピルエーテルで洗浄した。乾燥し、化合物9(2.15g,86.7%)を得た。
NMR(d6-DMSO);δ(ppm)0.99(t,J=7.2Hz,3H),1.47-1.57(m,2H),2.04-2.32(m,9H),2.76-2.84(br,2H),2.88-3.00(m,2H),4.17-4.22(br,1H),6.84-6.91(m,1H),7.83(s,4H)
Ethyl isocyanate (2.7 ml) was added to a toluene solution (20 ml) of compound 1 (2.0 g), and the mixture was heated to reflux for 8.5 hours. After completion of the reaction, the solvent was distilled off, and the resulting solid was washed with diisopropyl ether. Drying gave compound 9 (2.15 g, 86.7%).
NMR (d6-DMSO); δ (ppm) 0.99 (t, J = 7.2 Hz, 3H), 1.47-1.57 (m, 2H), 2.04-2.32 (m, 9H), 2.76-2.84 (br, 2H), 2.88-3.00 (m, 2H), 4.17-4.22 (br, 1H), 6.84-6.91 (m, 1H), 7.83 (s, 4H)
化合物9(1.0g)のエタノール溶液(10ml)にメチルヒドラジン(361μl)を加え、25時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液と酢酸エチルを加えて撹拌後、分液した。水層を酢酸エチルで洗浄し、減圧下に濃縮した。炭酸ナトリウム水溶液を加えてアルカリ性とした後に、クロロホルムで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去し、残渣をジイソプロピルエーテルで洗浄し、乾燥した後にアミンII−6(475mg,73.4%)を得た。
NMR(CDCl3);δ(ppm)1.11(t,J=7.2Hz,3H),1.38-1.51(m,2H),1.87-2.18(m,11H),3.03-3.21(m,3H),4.42-4.59(br,1H)
Methylhydrazine (361 μl) was added to an ethanol solution (10 ml) of compound 9 (1.0 g), and the mixture was heated to reflux for 25 hours. After completion of the reaction, the solvent was distilled off, 2N aqueous hydrochloric acid and ethyl acetate were added to the residue, and the mixture was stirred and separated. The aqueous layer was washed with ethyl acetate and concentrated under reduced pressure. A sodium carbonate aqueous solution was added to make the solution alkaline, followed by extraction with chloroform. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off, and the residue was washed with diisopropyl ether and dried to give amine II-6 (475 mg, 73.4%).
NMR (CDCl 3); δ ( ppm) 1.11 (t, J = 7.2Hz, 3H), 1.38-1.51 (m, 2H), 1.87-2.18 (m, 11H), 3.03-3.21 (m, 3H), 4.42 -4.59 (br, 1H)
化合物1(2.5g)のテトラヒドロフラン溶液(50ml)を−30℃に冷却し、クロロスルホニルイソシアナート(1.5ml)を加え、−30℃で1時間攪拌した。次に炭酸水素ナトリウム(3.5g)、水(1ml)を加え、室温にて16時間攪拌した。クロロホルムで抽出し、有機層を飽和食塩水で洗浄した。硫酸ナトリウムで乾燥し、溶媒を留去した。残渣をジイソプロピルエーテルで洗浄し、乾燥した後に化合物10(2.73g,95.5%)を得た。
NMR(d6-DMSO);δ(ppm)1.46-1.58(m,2H),2.02-2.30(m,9H),2.76-2.84(br,2H),4.16-4.22(br,1H),6.10-6.35(m,1H),7.82(s,4H)
A tetrahydrofuran solution (50 ml) of compound 1 (2.5 g) was cooled to −30 ° C., chlorosulfonyl isocyanate (1.5 ml) was added, and the mixture was stirred at −30 ° C. for 1 hour. Next, sodium hydrogen carbonate (3.5 g) and water (1 ml) were added, and the mixture was stirred at room temperature for 16 hours. Extraction was performed with chloroform, and the organic layer was washed with saturated brine. It dried with sodium sulfate and the solvent was distilled off. The residue was washed with diisopropyl ether and dried to give compound 10 (2.73 g, 95.5%).
NMR (d6-DMSO); δ (ppm) 1.46-1.58 (m, 2H), 2.02-2.30 (m, 9H), 2.76-2.84 (br, 2H), 4.16-4.22 (br, 1H), 6.10-6.35 (m, 1H), 7.82 (s, 4H)
化合物10(1.0g)のエタノール溶液(10ml)にメチルヒドラジン(391μl)を加え、21時間加熱還流を行った。反応終了後、溶媒を留去し、残渣に2N塩酸水溶液と酢酸エチルを加えて撹拌後、分液した。水層を酢酸エチルで洗浄し、減圧下に濃縮した。炭酸ナトリウム水溶液を加えてアルカリ性とした後に、析出した固体をろ取した。水洗後、乾燥し、アミンII−7(468mg,75.7%)を得た。
NMR(d6-DMSO);δ(ppm)1.40-1.51(m,2H),1.91-2.22(m,11H),3.28-3.34(br,1H),6.06-6.42(br,2H),8.08-8.34(br,2H)
Methylhydrazine (391 μl) was added to an ethanol solution (10 ml) of compound 10 (1.0 g), and the mixture was heated to reflux for 21 hours. After completion of the reaction, the solvent was distilled off, 2N aqueous hydrochloric acid and ethyl acetate were added to the residue, and the mixture was stirred and separated. The aqueous layer was washed with ethyl acetate and concentrated under reduced pressure. After adding an aqueous sodium carbonate solution to make it alkaline, the precipitated solid was collected by filtration. After washing with water and drying, amine II-7 (468 mg, 75.7%) was obtained.
NMR (d6-DMSO); δ (ppm) 1.40-1.51 (m, 2H), 1.91-2.22 (m, 11H), 3.28-3.34 (br, 1H), 6.06-6.42 (br, 2H), 8.08-8.34 (br, 2H)
化合物IV−1は、国際公開第2007/058346号パンフレットの実施例32の化合物33をアルカリ条件で加水分解して製造した。
化合物IV−1(300mg)のジメチルホルムアミド溶液(6.0ml)にアミンII−1(254mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(WSCD HCl)(254mg)、1−ヒドロキシベンゾトリアゾール(HOBt)(41mg)、トリエチルアミン(212μl)を加え、室温にて14時間攪拌した。反応終了後、2N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−1 (244mg,49.5%)を得た。
NMR(d6-DMSO);δ(ppm)0.98(d,J=6.8Hz,6H),1.27(s,6H),1.42(d,J=12.4Hz,2H),1.75(s,3H),1.93-2.03(m,12H),3.93(brs,1H),4.10(d,J=6.4Hz,2H),6.37(d,J=14.4Hz,1H),6.81(d,J=14.0Hz,1H),6.92(brs,1H),7.14(brs,1H),7.35(s,1H),7.41(d,J=6.4Hz,1H),7.98(s,1H)
Compound IV-1 was produced by hydrolyzing compound 33 of Example 32 of International Publication No. 2007/058346 pamphlet under alkaline conditions.
To a solution of compound IV-1 (300 mg) in dimethylformamide (6.0 ml), amine II-1 (254 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (WSCD HCl) (254 mg), 1 -Hydroxybenzotriazole (HOBt) (41 mg) and triethylamine (212 μl) were added, and the mixture was stirred at room temperature for 14 hours. After completion of the reaction, the mixture was poured into 2N aqueous hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-1 (244 mg, 49.5%).
NMR (d6-DMSO); δ (ppm) 0.98 (d, J = 6.8Hz, 6H), 1.27 (s, 6H), 1.42 (d, J = 12.4Hz, 2H), 1.75 (s, 3H), 1.93 -2.03 (m, 12H), 3.93 (brs, 1H), 4.10 (d, J = 6.4Hz, 2H), 6.37 (d, J = 14.4Hz, 1H), 6.81 (d, J = 14.0Hz, 1H) , 6.92 (brs, 1H), 7.14 (brs, 1H), 7.35 (s, 1H), 7.41 (d, J = 6.4Hz, 1H), 7.98 (s, 1H)
化合物IV−2は、国際公開第2007/058346号パンフレットの実施例29記載の化合物20のCO2tBu基を酸性条件下で加水分解し、カルボン酸を得、当該カルボン酸をDPPA/Et3Nで処理して、イソシアネート体に変換し、ついでメタノールを反応させ、その後にCO2Et基をアルカリ条件下で加水分解して、製造した。(DPPAは、ジフェニルホスフォリルアジド)
化合物IV−2(100mg)のジメチルホルムアミド溶液(2.0ml)にアミンII−2(82mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(88mg)、1−ヒドロキシベンゾトリアゾール(12mg)、トリエチルアミン(86μl)を加え、室温にて一晩攪拌した。反応終了後、0.5N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−2 (145mg,89.0%)を得た。
logk’=0.909
Compound IV-2 is obtained by hydrolyzing the CO 2 tBu group of Compound 20 described in Example 29 of WO 2007/058346 under acidic conditions to obtain a carboxylic acid, which is converted to DPPA / Et 3 N The product was converted to an isocyanate form by treatment with methanol, and then reacted with methanol, and then the CO 2 Et group was hydrolyzed under alkaline conditions to produce. (DPPA is diphenylphosphoryl azide)
To a solution of compound IV-2 (100 mg) in dimethylformamide (2.0 ml), amine II-2 (82 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (88 mg), 1-hydroxybenzotriazole (12 mg) and triethylamine (86 μl) were added, and the mixture was stirred overnight at room temperature. After completion of the reaction, the mixture was poured into a 0.5N hydrochloric acid aqueous solution and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-2 (145 mg, 89.0%).
logk ′ = 0.909
化合物IV−2(200mg)のジメチルホルムアミド溶液(4.0ml)にアミンII−3(151mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(153mg)、1−ヒドロキシベンゾトリアゾール(25mg)、トリエチルアミン(128μl)を加え、室温にて3日間攪拌した。反応終了後、2N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−3 (310mg,91.4%)を得た。
NMR(d6-DMSO);δ(ppm)0.97(d,J=6.4Hz,6H),1.38-1.42(m,8H),1.89-2.05(m,12H),2.92(s,3H),3.49(s,3H),3.91(brs,1H),4.08(d,J=6.4Hz,2H),6.30(d,J=14.4Hz,1H),6.79(d,J=14.0Hz,1H),6.87(s,1H),7.25(s,1H),7.44(d,J=6.0Hz,1H),7.96(s,1H)
A solution of compound IV-2 (200 mg) in dimethylformamide (4.0 ml) with amine II-3 (151 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (153 mg), 1-hydroxybenzotriazole (25 mg) and triethylamine (128 μl) were added, and the mixture was stirred at room temperature for 3 days. After completion of the reaction, the mixture was poured into 2N aqueous hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-3 (310 mg, 91.4%).
NMR (d6-DMSO); δ (ppm) 0.97 (d, J = 6.4Hz, 6H), 1.38-1.42 (m, 8H), 1.89-2.05 (m, 12H), 2.92 (s, 3H), 3.49 ( s, 3H), 3.91 (brs, 1H), 4.08 (d, J = 6.4Hz, 2H), 6.30 (d, J = 14.4Hz, 1H), 6.79 (d, J = 14.0Hz, 1H), 6.87 ( s, 1H), 7.25 (s, 1H), 7.44 (d, J = 6.0Hz, 1H), 7.96 (s, 1H)
化合物IV−3(80mg)のジクロロメタン溶液(2.0ml)にアミンII−4(64mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(65mg)、1−ヒドロキシベンゾトリアゾール(11mg)、トリエチルアミン(54μl)を加え、室温にて一晩攪拌した。反応終了後、0.5N塩酸水溶液に注ぎ、ジクロロメタンで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−4 (100mg,75.0%)を得た。
logk’=0.886
Compound IV-3 (80 mg) in dichloromethane (2.0 ml) was added to amine II-4 (64 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (65 mg), 1-hydroxybenzotriazole ( 11 mg) and triethylamine (54 μl) were added and stirred overnight at room temperature. After completion of the reaction, the mixture was poured into 0.5N hydrochloric acid aqueous solution and extracted with dichloromethane. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-4 (100 mg, 75.0%).
logk ′ = 0.886
化合物IV−3(80mg)のジクロロメタン溶液(3.2ml)にアミンII−8(74mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(WSCD)(65mg)、1−ヒドロキシベンゾトリアゾール(HOBt)(11mg)、トリエチルアミン(90μl)を加え、室温にて36時間攪拌した。反応終了後、0.5N塩酸水溶液に注ぎ、ジクロロメタンで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−5 (98mg,73.8%)を得た。
logk’=0.838
Compound IV-3 (80 mg) in dichloromethane solution (3.2 ml) was added to amine II-8 (74 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (WSCD) (65 mg), 1-hydroxy. Benzotriazole (HOBt) (11 mg) and triethylamine (90 μl) were added, and the mixture was stirred at room temperature for 36 hours. After completion of the reaction, the mixture was poured into 0.5N hydrochloric acid aqueous solution and extracted with dichloromethane. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-5 (98 mg, 73.8%).
logk ′ = 0.838
化合物IV−4は、国際公開第2008/142986号パンフレットの実施例84の化合物II−18を用いた。
化合物IV−4(100mg)のジメチルホルムアミド溶液(2.0ml)にアミンII−5(89mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(78mg)、1−ヒドロキシベンゾトリアゾール(12.6mg)、トリエチルアミン(108μl)を加え、室温にて23時間攪拌した。反応終了後、2N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−6 (155mg,91.7%)を得た。
NMR(d6-DMSO);δ(ppm)1.40(s,8H),1.88-2.14(m,11H),2.77(s,6H),3.49(s,3H),3.93-4.00(m,1H),6.57(d,J=13.8Hz,1H),6.88(d,J=13.8Hz,1H),7.36(s,1H),7.96(s,1H),8.34(d,J=7.2Hz,1H)
As compound IV-4, compound II-18 of Example 84 in WO2008 / 142986 pamphlet was used.
A solution of compound IV-4 (100 mg) in dimethylformamide (2.0 ml) with amine II-5 (89 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (78 mg), 1-hydroxybenzotriazole (12.6 mg) and triethylamine (108 μl) were added, and the mixture was stirred at room temperature for 23 hours. After completion of the reaction, the mixture was poured into 2N aqueous hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-6 (155 mg, 91.7%).
NMR (d6-DMSO); δ (ppm) 1.40 (s, 8H), 1.88-2.14 (m, 11H), 2.77 (s, 6H), 3.49 (s, 3H), 3.93-4.00 (m, 1H), 6.57 (d, J = 13.8Hz, 1H), 6.88 (d, J = 13.8Hz, 1H), 7.36 (s, 1H), 7.96 (s, 1H), 8.34 (d, J = 7.2Hz, 1H)
化合物IV−4(100mg)のジメチルホルムアミド溶液(2.0ml)にアミンII−6(89mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(78mg)、1−ヒドロキシベンゾトリアゾール(12.6mg)、トリエチルアミン(108μl)を加え、室温にて20時間攪拌した。反応終了後、2N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−7 (122mg,72.2%)を得た。
NMR(d6-DMSO);δ(ppm)0.98(t,J=6.9Hz,3H),1.40(s,8H),1.88-2.13(m,11H),2.88-2.97(m,2H),3.49(s,3H),3.93-3.99(m,1H),6.57(d,J=13.8Hz,1H),6.81-6.92(m,2H),7.34(s,1H),7.96(s,1H),8.33(d,J=6.6Hz,1H)
A solution of compound IV-4 (100 mg) in dimethylformamide (2.0 ml) with amine II-6 (89 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (78 mg), 1-hydroxybenzotriazole (12.6 mg) and triethylamine (108 μl) were added, and the mixture was stirred at room temperature for 20 hours. After completion of the reaction, the mixture was poured into 2N aqueous hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-7 (122 mg, 72.2%).
NMR (d6-DMSO); δ (ppm) 0.98 (t, J = 6.9 Hz, 3H), 1.40 (s, 8H), 1.88-2.13 (m, 11H), 2.88-2.97 (m, 2H), 3.49 ( s, 3H), 3.93-3.99 (m, 1H), 6.57 (d, J = 13.8Hz, 1H), 6.81-6.92 (m, 2H), 7.34 (s, 1H), 7.96 (s, 1H), 8.33 (d, J = 6.6Hz, 1H)
化合物IV−4(100mg)のジメチルホルムアミド溶液(2.0ml)にアミンII−7(79mg)、1−(3−ジメチルアミノプロピル)−3−エチルカルボジイミド塩酸塩(78mg)、1−ヒドロキシベンゾトリアゾール(12.6mg)、トリエチルアミン(108μl)を加え、室温にて14時間攪拌した。反応終了後、2N塩酸水溶液に注ぎ、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、飽和食塩水の順に洗浄し、硫酸ナトリウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラムクロマトグラフィーで精製し、化合物III−8 (137mg,85.6%)を得た。
NMR(d6-DMSO);δ(ppm)1.40(s,8H),1.88-2.13(m,11H),3.50(s,3H),3.94-3.99(m,1H),6.05-6.35(s,2H),6.58(d,J=13.6Hz,1H),6.88(d,J=13.6Hz,1H),7.35(s,1H),7.96(s,1H),8.33(d,J=6.8Hz,1H)
A solution of compound IV-4 (100 mg) in dimethylformamide (2.0 ml) with amine II-7 (79 mg), 1- (3-dimethylaminopropyl) -3-ethylcarbodiimide hydrochloride (78 mg), 1-hydroxybenzotriazole (12.6 mg) and triethylamine (108 μl) were added, and the mixture was stirred at room temperature for 14 hours. After completion of the reaction, the mixture was poured into 2N aqueous hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine in that order, and dried over sodium sulfate. After the solvent was distilled off, the residue was purified by silica gel column chromatography to obtain compound III-8 (137 mg, 85.6%).
NMR (d6-DMSO); δ (ppm) 1.40 (s, 8H), 1.88-2.13 (m, 11H), 3.50 (s, 3H), 3.94-3.99 (m, 1H), 6.05-6.35 (s, 2H ), 6.58 (d, J = 13.6Hz, 1H), 6.88 (d, J = 13.6Hz, 1H), 7.35 (s, 1H), 7.96 (s, 1H), 8.33 (d, J = 6.8Hz, 1H) )
式(II)で示される化合物は、式(III)で示される化合物を製造するための中間体として有用である。本発明中間体を用いることにより、効率的に、式(III)で示される化合物を製造することができる。 The compound represented by the formula (II) is useful as an intermediate for producing the compound represented by the formula (III). By using the intermediate of the present invention, the compound represented by the formula (III) can be efficiently produced.
Claims (9)
(式中、R10は、式:−(CR13R14)m−O−C(O)−NR15−R16(式中、R 13 およびR 14 はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、mは0〜3の整数であり、R15およびR16はそれぞれ独立して水素または置換もしくは非置換のアルキルである。)で示される基である。)で示される化合物もしくはその塩またはそれらの溶媒和物。 Formula (II):
(Wherein R 10 is a group represented by the formula : — (CR 13 R 14 ) m—O—C (O) —NR 15 —R 16 , wherein R 13 and R 14 are each independently hydrogen, substituted or non- alkyl or halogen-substituted, m is an integer of 0 to 3, R 15 and R 16 are each independently hydrogen or substituted or unsubstituted alkyl der of Ru.) a group represented by.) in Or a solvate thereof.
(式中、R1は式:−Y−R5(式中、Yは単結合、−O−または−S−であり、R5は置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニルまたは置換もしくは非置換のヘテロサイクリルである。)で示される基であり、
R2およびR3はそれぞれ独立して水素、置換もしくは非置換のアルキルまたはハロゲンであり、またはR2およびR3は隣接する炭素原子と一緒になって置換もしくは非置換の環を形成していてもよく、
R4は式:−C(=O)−NR6R7(ここでR6およびR7はそれぞれ独立して水素、置換もしくは非置換のアミノ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のヘテロアリールスルホニルまたは置換もしくは非置換のヘテロサイクリルスルホニルであるか、またはR6とR7は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基、または
式:−NR8R9(ここでR8およびR9はそれぞれ独立して水素、カルボキシ、ヒドロキシ、置換もしくは非置換のアルキル、置換もしくは非置換のアルケニル、置換もしくは非置換のアルキニル、置換もしくは非置換のシクロアルキル、置換もしくは非置換のシクロアルケニル、置換もしくは非置換のアリール、置換もしくは非置換のヘテロアリール、置換もしくは非置換のヘテロサイクリル、置換もしくは非置換のアシル、置換もしくは非置換のカルバモイル、置換もしくは非置換のチオカルバモイル、置換もしくは非置換のアルキルスルホニル、置換もしくは非置換のアリールスルホニル、置換もしくは非置換のアルキルオキシカルボニルまたは置換もしくは非置換のスルファモイルであるか、またはR8とR9は隣接する窒素原子と一緒になって置換もしくは非置換の環を形成していてもよい。)で示される基であり、
Xはヒドロキシまたは脱離基である。)で示される化合物を
式(II):
(式中、R10は請求項1と同意義である。)で示される化合物と反応させることを特徴とする、式(III):
(式中、各記号は前記と同意義である。)で示される化合物もしくはその塩またはそれらの溶媒和物の製造方法。 Formula (I):
(Wherein R 1 represents the formula: —Y—R 5 (wherein Y represents a single bond, —O— or —S—, R 5 represents substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, Substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, or substituted or unsubstituted heterocyclyl.) A group represented by
R 2 and R 3 are each independently hydrogen, substituted or unsubstituted alkyl or halogen, or R 2 and R 3 together with adjacent carbon atoms form a substituted or unsubstituted ring. Well,
R 4 has the formula: —C (═O) —NR 6 R 7, where R 6 and R 7 are each independently hydrogen, substituted or unsubstituted amino, substituted or unsubstituted alkyl, substituted or unsubstituted Alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted Or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted heteroarylsulfonyl or substituted or unsubstituted heterocyclylsulfonyl, or R 6 and R 7 together with the adjacent nitrogen atom To form a substituted or unsubstituted ring. Groups represented or formula,: -NR 8 R 9 (wherein R 8 and R 9 are each independently hydrogen, carboxy, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted Alkynyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted cycloalkenyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted acyl, substituted Or unsubstituted carbamoyl, substituted or unsubstituted thiocarbamoyl, substituted or unsubstituted alkylsulfonyl, substituted or unsubstituted arylsulfonyl, substituted or unsubstituted alkyloxycarbonyl, or substituted or unsubstituted sulfamoyl, or R 8 R 9 is a group represented by a nitrogen atom and may form a substituted or unsubstituted ring together.) Adjacent,
X is hydroxy or a leaving group. The compound represented by formula (II):
(Wherein R 10 has the same meaning as in claim 1), and is reacted with a compound represented by formula (III):
(Wherein each symbol is as defined above), or a salt thereof, or a method for producing a solvate thereof.
(式中、各記号は請求項3と同意義である。)で示される化合物に、ハロゲン化剤を反応させ、
式(I):
(式中、Xはハロゲンであり、R1〜R4は請求項3と同意義である。)で示される化合物もしくはその塩またはそれらの溶媒和物を得る工程を含むものである、請求項3記載の製造方法。 Formula (IV):
(Wherein each symbol has the same meaning as in claim 3 ), a halogenating agent is reacted with the compound,
Formula (I):
Is intended to include the step of obtaining a compound or a salt thereof, or a solvate represented by (wherein, X is halogen, R 1 to R 4 are as defined in claim 3.), According to claim 3, wherein Manufacturing method.
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- 2010-12-20 CN CN201080064530.2A patent/CN102762531B/en not_active Expired - Fee Related
- 2010-12-20 US US13/517,924 patent/US8796468B2/en not_active Expired - Fee Related
- 2010-12-20 EP EP10839331.5A patent/EP2518051A4/en not_active Withdrawn
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US8796468B2 (en) | 2014-08-05 |
WO2011078101A1 (en) | 2011-06-30 |
EP2518051A1 (en) | 2012-10-31 |
US20120259128A1 (en) | 2012-10-11 |
EP2518051A4 (en) | 2013-10-16 |
TW201125851A (en) | 2011-08-01 |
CN102762531A (en) | 2012-10-31 |
JPWO2011078101A1 (en) | 2013-05-09 |
CN102762531B (en) | 2015-12-02 |
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