JP5685405B2 - 真空処理装置 - Google Patents

真空処理装置 Download PDF

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Publication number
JP5685405B2
JP5685405B2 JP2010197648A JP2010197648A JP5685405B2 JP 5685405 B2 JP5685405 B2 JP 5685405B2 JP 2010197648 A JP2010197648 A JP 2010197648A JP 2010197648 A JP2010197648 A JP 2010197648A JP 5685405 B2 JP5685405 B2 JP 5685405B2
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chamber
vacuum processing
processing apparatus
valve
gate
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JP2010197648A
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Japanese (ja)
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JP2012054491A5 (enExample
JP2012054491A (ja
Inventor
優也 溝部
優也 溝部
英宣 谷村
英宣 谷村
金清　任光
任光 金清
昌司 沖口
昌司 沖口
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2010197648A 2010-09-03 2010-09-03 真空処理装置 Expired - Fee Related JP5685405B2 (ja)

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JP2010197648A JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

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JP2010197648A JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

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JP2012054491A JP2012054491A (ja) 2012-03-15
JP2012054491A5 JP2012054491A5 (enExample) 2013-10-03
JP5685405B2 true JP5685405B2 (ja) 2015-03-18

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JP2010197648A Expired - Fee Related JP5685405B2 (ja) 2010-09-03 2010-09-03 真空処理装置

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6960830B2 (ja) 2017-11-17 2021-11-05 株式会社日立ハイテク 真空処理装置および真空処理装置の運転方法
JP7580186B2 (ja) * 2019-07-26 2024-11-11 東京エレクトロン株式会社 基板処理装置
US12211674B2 (en) 2021-05-17 2025-01-28 Hitachi High-Tech Corporation Plasma processing apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772340B2 (ja) * 1992-01-28 1995-08-02 スタンレー電気株式会社 真空蒸着装置
US6170428B1 (en) * 1996-07-15 2001-01-09 Applied Materials, Inc. Symmetric tunable inductively coupled HDP-CVD reactor
JP2001004505A (ja) * 1999-06-22 2001-01-12 Sumitomo Metal Ind Ltd ゲートバルブ，それを備える試料処理装置及び試料処理方法
JP4291499B2 (ja) * 2000-06-28 2009-07-08 パナソニック株式会社 真空処理装置
JP4606947B2 (ja) * 2005-03-16 2011-01-05 東京エレクトロン株式会社 リークレート測定方法並びにリークレート測定に用いるプログラムおよび記憶媒体
JP4079157B2 (ja) * 2005-04-12 2008-04-23 東京エレクトロン株式会社 ゲートバルブ装置及び処理システム
JP5074741B2 (ja) * 2006-11-10 2012-11-14 株式会社日立ハイテクノロジーズ 真空処理装置

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