JP5676832B2 - 半導体ウエハの化学的機械的研磨における欠陥密度低減方法及びスラリ流量制御方法 - Google Patents
半導体ウエハの化学的機械的研磨における欠陥密度低減方法及びスラリ流量制御方法 Download PDFInfo
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- JP5676832B2 JP5676832B2 JP2001173886A JP2001173886A JP5676832B2 JP 5676832 B2 JP5676832 B2 JP 5676832B2 JP 2001173886 A JP2001173886 A JP 2001173886A JP 2001173886 A JP2001173886 A JP 2001173886A JP 5676832 B2 JP5676832 B2 JP 5676832B2
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- Japan
- Prior art keywords
- polishing
- slurry
- flow rate
- semiconductor wafer
- cost
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Y02E40/647—
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- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
Claims (4)
- 半導体ウエハの化学的機械的研磨を行う研磨システムにおいて、半導体ウエハを研磨す
る方法であって、
供給されるスラリ総量の中で、研磨に使用された後で回収可能なスラリの比率を決定す
るステップと、
前記決定された回収可能なスラリの比率から1回の研磨によって失われるスラリに要す
る費用を算出するステップと、
研磨に使用されるスラリの流量を増加させることによって研磨後の研磨表面における欠
陥が減少しそれにより達成される半導体ウエハ製造における歩留りの向上によって得られ
るウエハ1枚あたりの経済的な利益が前記1回の研磨によって失われるスラリに要する費
用よりも大きくなるように、かつ、所定の上限まで、研磨に使用されるスラリの流量を増
加させるステップと、
を含み、前記所定の上限が、前記化学的機械的研磨の間に前記半導体ウエハの表面にわた
る研磨パッドについてハイドロプレーン現象による研磨不継続を回避するのに用いるスラ
リ量を示すことを特徴とする方法。
- 半導体ウエハの化学的機械的研磨を行う研磨システムにおいて、半導体ウエハを研磨す
る方法であって、
複数回の研磨にわたってスラリを追加供給することなくすべてを回収して再利用するバ
ッチ式のスラリ・リサイクル装置を用いた場合に1回の研磨に要するスラリの費用を算出
するステップと、
研磨に使用されるスラリの流量を増加させることによって研磨後の研磨表面における欠
陥が減少しそれにより達成される半導体ウエハ製造における歩留りの向上によって得られ
るウエハ1枚あたりの経済的な利益が前記1回の研磨に要するスラリの費用の増加よりも
大きくなるように、かつ、所定の上限まで、研磨に使用されるスラリの流量を増加させる
ステップと、を含み、前記所定の上限が、前記化学的機械的研磨の間に前記半導体ウエハ
の表面にわたる研磨パッドについてハイドロプレーン現象による研磨不継続を回避するの
に用いるスラリ量を示すことを特徴とする方法。
- 請求項1ないし請求項2のいずれかの請求項に記載の方法に含まれる各ステップをコン
ピュータに実行させるコンピュータ・プログラムが記憶されているコンピュータ可読な記
憶媒体。
- 請求項1ないし請求項2のいずれかの請求項に記載の方法に含まれる各ステップをコン
ピュータに実行させるコンピュータ・プログラム。
Priority Applications (1)
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---|---|---|---|
JP2001173886A JP5676832B2 (ja) | 2001-06-08 | 2001-06-08 | 半導体ウエハの化学的機械的研磨における欠陥密度低減方法及びスラリ流量制御方法 |
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JP2001173886A JP5676832B2 (ja) | 2001-06-08 | 2001-06-08 | 半導体ウエハの化学的機械的研磨における欠陥密度低減方法及びスラリ流量制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002367938A JP2002367938A (ja) | 2002-12-20 |
JP5676832B2 true JP5676832B2 (ja) | 2015-02-25 |
Family
ID=19015266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2001173886A Expired - Fee Related JP5676832B2 (ja) | 2001-06-08 | 2001-06-08 | 半導体ウエハの化学的機械的研磨における欠陥密度低減方法及びスラリ流量制御方法 |
Country Status (1)
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JP (1) | JP5676832B2 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03248532A (ja) * | 1990-02-27 | 1991-11-06 | Sumitomo Electric Ind Ltd | 半導体ウエハの加工方法 |
JPH09102475A (ja) * | 1995-10-03 | 1997-04-15 | Hitachi Ltd | 研磨装置 |
US5709593A (en) * | 1995-10-27 | 1998-01-20 | Applied Materials, Inc. | Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
US6107203A (en) | 1997-11-03 | 2000-08-22 | Motorola, Inc. | Chemical mechanical polishing system and method therefor |
JP2000233375A (ja) * | 1999-02-16 | 2000-08-29 | Hitachi Chem Co Ltd | 平坦化研磨用セグメント型樹脂砥石 |
JP3678044B2 (ja) * | 1999-03-19 | 2005-08-03 | 栗田工業株式会社 | 研磨剤スラリの再利用方法及び装置 |
JP3847500B2 (ja) * | 1999-10-08 | 2006-11-22 | 株式会社日立製作所 | 半導体ウェハ平坦化加工方法および平坦化加工装置 |
-
2001
- 2001-06-08 JP JP2001173886A patent/JP5676832B2/ja not_active Expired - Fee Related
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JP2002367938A (ja) | 2002-12-20 |
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