JP5655554B2 - Development processing apparatus and development processing method - Google Patents

Description

  The present invention relates to a development processing apparatus, and in particular, development processing for performing development processing when producing a color filter forming substrate for a large display display device such as a liquid crystal display device by a photolithography method using a colored photosensitive resin. Relates to the device.

In recent years, there has been a widespread use of large display devices such as liquid crystal display devices, but color filter forming substrates used in such display devices are generally colored photosensitive resins (hereinafter referred to as colored resists). It is patterned by a photolithographic process, which is applied to a substrate, selectively exposed and developed.
In this photolithographic process, high quality, high productivity, and low cost are required.
The development processing of the colored photosensitive resin layer (colored resist) for forming such a color filter forming substrate for a large display device is usually performed by a cascade type development processing device or a circulation type development processing device. It has been broken.

In the case of a cascade-type development processing apparatus, for example, as shown in FIG. 5, while conveying the workpiece to be processed so as to pass from the first developing tank 111 into the second developing tank 112, and In the first developing tank 111 and the second developing tank 112, development processing is performed by the developing solutions 141 and 142, respectively, but includes a pipe 150 for supplying a new developing solution to the second developing tank 112. A new liquid supply line (not shown in the whole) is provided, and the development solution in the second development tank 112 is circulated and connected to each other by piping for circulation in the first development tank 111 again. The developer used in the development in the first developing tank on the workpiece supply side is caused to flow to a waste liquid line (not shown) including the pipe 171. The circulation line includes a tank 163 for storing the developer after development, a pump 164 for taking out the developer from the tank 163, and a filter 165 for filtering the developer sent from the pump 164. The new developer is supplied to the second developer tank 112 through the new solution supply line, and the developer after being developed in the second developer tank 112 is supplied to the tank 163 to the first developer tank 111. The collected developer 143 is filtered through a filter 165 and supplied.
In each of the developing tanks of the first developing tank 111 and the second developing tank 112, the work is transported by a transporting roller, and the developer is showered from a plurality of discharge portions and is poured onto the work.
In the development processing apparatus shown in FIG. 5, development processing including a resist breakpoint stage in which the amount of dissolved resist rapidly increases in the development processing is performed in the first development tank 111, and the resist breakpoint stage is performed in the second development tank 112. Subsequent development processing not included is performed. In general, in a continuous development process, the dissolution of the colored resist by the developer does not proceed evenly, and the colored resist is hardly dissolved at the initial stage of development, and the amount of the colored resist dissolved at a stage called a resist breakpoint. It increases rapidly, and then the amount of dissolution decreases rapidly again.
In the case of a cascade-type development processing apparatus, the reused developer is less deteriorated, but the amount of new solution used is enormous.

In the development processing apparatus shown in FIG. 5, the tanks for performing development processes with different developer supply and recovery paths are divided into the first development tank 111 and the second development tank 112 for convenience. However, the first developing tank 111 and the second developing tank 112 are also simply referred to as a development processing tank 110.
Further, prior to the development processing by the development processing apparatus shown in FIG. 5, in order to form a developer film uniformly over the entire development processing surface of the workpiece, a large amount of developer is poured at a high speed to instantly form the developer film. However, FIG. 5 does not show the aqua knife processing unit. Further, rinsing (cleaning with pure water) is performed after the development processing by the development processing apparatus shown in FIG. 5, but the rinsing processing section is not shown in FIG.

Also in the case of a circulation type development processing apparatus, for example, as shown in FIG. 6, the workpiece to be processed is conveyed so as to pass from the first developing tank to the second developing tank, In the first developing tank 211 and the second developing tank 212, a developing process is performed with a developing solution, but a new liquid supply line including the pipe 250 for supplying a new developing solution to the second developing tank 212 (the whole Are not shown), and each part for circulating the developer after development in each developing tank of the first developing tank 211 and the second developing tank 212 to be used again in the first developing tank 211 is provided. A circulation line connected by piping is provided.
Here, unlike the development processing apparatus shown in FIG. 5, there is no waste liquid line for using the developer after the development processing in the first developing tank 111 as a waste liquid.
The circulation line includes a tank 263 for storing the developer after development, a pump 264 for taking out the developer from the tank 263, and a filter 265 for filtering the developer sent from the pump 264. A new developer is supplied to the second developer tank 212 through the new solution supply line, and the developer after being developed in the second developer tank 212 and the first developer tank 211 are supplied to the first developer tank 211. The developer 243 collected in one tank through the pipes 261 and 262, respectively, and the developer after development in the first developer tank is taken out by the pump 264 and filtered through the filter 265. Supplied.
The developer 243 overflowed from the tank 263 flows to the waste liquid line.
In the development processing apparatus shown in FIG. 6, development processing including a resist breakpoint stage in which the amount of dissolved resist rapidly increases in the development processing is performed in the first development tank 211, and the resist breakpoint stage is performed in the second development tank 212. Subsequent development processing not included is performed. Also in this case, in each of the developing tanks of the first developing tank 211 and the second developing tank 212, the work is transported by a transporting roller, and the developing solution is showered from a plurality of discharge portions onto the work.
Further, an aqua knife processing unit that is performed prior to the development processing by the development processing device shown in FIG. 6 and a rinsing processing unit that performs rinsing (deionized water cleaning) after the development processing by the development processing device shown in FIG. 6 are not shown.
In FIG. 6, the tanks for performing the development process with different developer supply and recovery paths are divided and referred to as the first developer tank and the second developer tank for convenience. 211 and the second developing tank 212 are also simply referred to as a developing tank.
In the case of a circulation type development processing apparatus, the amount of the new developer used can be suppressed, but the filter is likely to be clogged due to deterioration of the developer used after being circulated.

  In any of the above systems, it is difficult to properly determine the balance between the amount of the new developer used and the developability of the developer used for development and reused.

JP 09-297405 A

As described above, a cascade-type development processing device or a circulation-type development processing device is usually used for development processing for producing a color filter forming substrate for a large display device. However, there is a problem that the amount of the new solution used is enormous, while the amount of the new solution used is enormous. However, there is a problem that the filter is easily clogged due to deterioration of the developer used after being circulated, and there has been a demand for a development processing apparatus that can solve these problems.
The present invention is corresponding to these, and mainly for the development processing of large substrates, it is possible to suppress the amount of new solution used, and the development processing is difficult to cause clogging of the filter due to the deterioration of the developing solution. Is to provide equipment.

The development processing apparatus of the present invention is a development processing apparatus for developing a workpiece by allowing a developer to be showered on the workpiece from above the processing surface of the plate-like workpiece to be developed. A new solution supply line for supplying the solution and a circulation line for collecting and circulating the developer after the development processing from the bottom side of the development processing tank are provided, and the developer after the development processing is provided in the circulation line. A storage tank and a filter for filtering the developer from the tank are supplied, new developer is supplied from the new solution supply line, and the developed developer collected in the tank by the circulation line is filtered through the filter. to and to supply as a developing solution for development processing, a workpiece, a processing side up, in a state tilted from the horizontal in the direction perpendicular to the conveying direction, it has a conveying means for conveying, current The developer bathed by the work at each position in the transport direction of the processing tank flows down from the work along the slope of the work processing surface. In the development tank, between the bottom and the transported work And a waste liquid collecting means for receiving and collecting the developer after the development process dripped from the workpiece in a predetermined position range in the transport direction, and flowing the collected developer after the development process to the waste liquid line as a waste liquid. It is characterized by that.
In the development processing apparatus, the waste liquid collecting means receives and collects the development liquid after the development process dripped from the work with one ridge having an opening on the upper side, and returns to the waste liquid line. It is characterized by the fact that it is made to flow, and it is characterized in that its position can be moved in the conveying direction.
Alternatively, in the above development processing apparatus, the waste liquid collecting means includes a plurality of divisions divided in a direction orthogonal to the conveyance direction so as to cover the entire upper opening of the bottle with the opening on the upper side. And each divided upper lid is inclined so that the developer flows to the bottom when closed, and the developer after the development process from the region where the divided upper lid is opened to the ridge Is collected and flowed to a waste liquid line.
Alternatively, in the above development processing apparatus, the waste liquid collecting unit has a plurality of upper lids, each of which has a pair of a lid having an opening on the upper side and an upper lid covering the opening of each bowl along the transport direction. And each top lid is inclined so that the developer flows to the bottom when closed, and collects the developer after the development process from the region where the top lid is opened to the ridge, It is what flows into a waste liquid line, It is characterized by the above-mentioned.
In any one of the development processing apparatuses described above, the work is a large color filter forming substrate.
The development process here is based on the premise that the photosensitive resin that has been coated on one surface of the workpiece and selectively exposed is developed.
Here, it is assumed that a developing solution having a large amount of dissolved resist including the resist breakpoint stage is caused to flow to the waste liquid line.

The development processing method of the present invention is a development processing method in which a developing solution is showered onto a work from above the processing surface of a plate-like work to be developed, and the work is developed. While supplying the solution, the developer after the development process used in the resist breakpoint stage of the workpiece development process is used as a waste liquid, and the developer after the other development process is filtered to obtain a developer for the development process. It is characterized by being used in a circulating manner.
Then, in the above development processing method, the workpiece is transported in a state where the workpiece is tilted from the horizontal in a direction orthogonal to the transport direction with the processing surface facing upward, and the workpiece is moved at each position in the transport direction of the development processing tank. The developer developed in a predetermined position range in the transport direction in the developing tank, between the bottom and the work to be transported, flows along the slope of the work processing surface and flows down from the work. The developing solution after the developing process used in the resist breakpoint stage of the processing is selectively received and collected to obtain a waste solution.

(Function)
The development processing apparatus of the present invention has such a configuration, and while the plate-shaped workpiece to be developed is being conveyed, the developer is showered on the workpiece from above the processing surface of the workpiece. in developing processing apparatus for development processing, it is possible to suppress the amount of fresh solution, and, it is made possible to hard clogging of the filter due to deterioration of the developer.
Specifically, a new solution supply line for supplying a new developer and a circulation line for collecting and circulating the developer after the development processing from the bottom side of the development processing tank are provided, and the circulation line is provided with the development processing. A developing solution that has a tank for storing the subsequent developing solution and a filter that filters the developing solution from the tank, supplies a new developing solution through the new solution supply line, and collects the developing solution in the tank through the circulation line; Is supplied through the filter as a developer for development processing, and has a conveying means for conveying the workpiece with the processing surface facing upward and tilted from the horizontal in a direction perpendicular to the conveying direction. In addition, the developer bathed on the work at each position in the developing tank transport direction flows along the slope of the work processing surface and hangs down from the work. Waste liquid that receives and collects the developed developer dropped from the work in a predetermined position range in the conveying direction at a position between the two and flows the collected developed developer to the waste liquid line as waste liquid This is achieved by providing recovery means.
The development processing apparatus of the present invention adopts the circulating use of the developer of the conventional circulation type development processing apparatus, while the developability of the conventional cascade type development processing apparatus is good, but the use amount of the new developer is large. In other words, it is possible to develop a processing device that combines the advantages of the conventional cascade processing device and the circulation processing device.
In addition, it is conceivable that the developing tank is made into three or more developing tanks in a cascade system, and the developing solution after the developing process in the tank at the resist breakpoint stage in the developing process is used as a waste liquid. Enormous design and piping materials are required to prepare multiple development tanks for selecting which tanks are to be drained at the diversified resist breakpoint stage corresponding to the combination of resist and developer .
On the other hand, the invention of claim 1 of the present application makes it possible to reduce enormous design and piping materials.
Further, in the case of the circulation system, it is possible to reduce the problem that the developing solution in which the photosensitive resin to be developed is easily clogged with the filter.

Examples of the waste liquid collecting means include a mode in which the developer after the development process dripped from the work is received and collected by a single ridge having an opening on the upper side, and is flowed to the waste liquid line.
In the case of this embodiment, the developer after the development processing at the transport position corresponding to the resist breakpoint stage can be selectively collected.
In particular, when the wrinkles can be moved in the transport direction, the transport position corresponding to the resist breakpoint stage corresponds to the diversification of the resist breakpoint stage determined with the diversification of resists and the diversification of developers. It is assumed that the developer after the development processing can be selectively collected.
Alternatively, as the waste liquid collecting means, one ridge having an opening on the upper side and a plurality of divided upper lids divided in a direction orthogonal to the transport direction so as to cover the entire upper opening of the ridge, and each divided upper lid Is inclined so that when closed, the developer flows to the bottom, and the developer after the development process is collected from the region where the upper part of the divided lid is opened to the waste liquid line. Also mentioned.
In this case as well, the developer after development processing at the transfer position corresponding to the resist breakpoint stage is selected in response to the diversification of the resist breakpoint stage determined with the diversification of the resist and the diversification of the developer. It can be collected automatically.
In addition, when each split upper lid is provided with a ridge (also referred to as a bank portion) for controlling the flow of the developer when it is closed, it can be reliably and selectively collected.
Alternatively, the waste liquid collecting means includes a tub having a plurality of upper lids, each of which has a pair of a jar having an opening on the upper side and an upper lid covering the opening of each jar along the conveying direction, and each upper lid is closed. In such a case, the developer is inclined so as to flow to the bottom, and the developer after the development processing is collected from the region where the upper lid is opened to the trough and then flows to the waste liquid line.
In this case as well, the developer after development processing at the transfer position corresponding to the resist breakpoint stage is selected in response to the diversification of the resist breakpoint stage determined with the diversification of the resist and the diversification of the developer. It can be collected automatically.
In addition, when each split upper lid is provided with a ridge (also referred to as a bank portion) for controlling the flow of the developer when it is closed, it can be reliably and selectively collected.

This is particularly effective when the work is a large color filter forming substrate.
The large color filter forming substrate referred to here means a large substrate used when imposing a color filter forming substrate of a large display device in recent years.

  In the development processing method of the present invention, by adopting such a configuration, the developer is showered on the workpiece from above the processing surface of the workpiece while the plate-shaped workpiece to be developed is being transported. In the development processing method in which the development processing is performed, the amount of new solution used can be suppressed, and it is possible to prevent clogging of the filter due to deterioration of the developer.

  In this way, the present invention is a development processing apparatus for developing a workpiece by carrying the developer in a shower form from the upper side of the processing surface of the workpiece while transporting the plate-shaped workpiece to be developed, The present invention makes it possible to provide a development processing apparatus that can suppress the amount of new solution used and can hardly clog a filter due to deterioration of the developer.

It is the schematic which showed schematic structure of the 1st example of embodiment of the development processing apparatus of this invention. FIG. 2A is a schematic sectional view showing the development processing tank of the first example, and FIG. 2B is a schematic sectional view seen from the A1-A2 side of FIG. FIG. 3A is a view showing the waste liquid recovery means of the second example of the embodiment of the development processing apparatus of the present invention, and FIG. 3B is a view seen from the B0 side of FIG. 3A. 3 (c) is a view of the state in which two divided upper lids are removed as viewed from the B0 side of FIG. 3 (a), and FIG. 3 (d) is a schematic cross section viewed from B1-B2 of FIG. 3 (a). FIG. FIG. 4 (a) is a view showing the waste liquid recovery means of the third example of the embodiment of the development processing apparatus of the present invention, and FIG. 4 (b) is a state where the upper lids of the two baskets are removed. FIG. 4C is a schematic cross-sectional view as seen from C1-C2 in FIG. 4A. It is the schematic which showed schematic structure of one example of the conventional cascade type development processing apparatus. It is the schematic which showed schematic structure of one example of the conventional development processing apparatus of the circulation system.

First, a first example of the embodiment of the development processing apparatus of the present invention will be described with reference to FIGS.
In FIG. 1, a thin dotted arrow indicates a direction in which a plate-shaped workpiece to be processed is conveyed.
Further, the following description will replace the description of the development processing method of the present invention.
Developing apparatus of the first example, a photosensitive colored resist was coated on one surface, as a plate-shaped work 80 to be processed the color filter over a substrate for forming large, which is selectively exposed, one by one development In a single-wafer type developing apparatus that performs processing, the developing solutions 41 and 42 are showered on the work 80 from the upper side of the processing surface of the plate-like work 80 to be developed, and the work 80 is developed. A development processing apparatus.
Then, as shown in FIG. 1, a new liquid supply line (not shown) including a pipe 50 for supplying a new developer to the developer discharge section (also referred to as a nozzle) 21a via the pipe 50. And a circulation line for collecting and circulating the developer after the development processing from the bottoms 91 and 92 side of the developing tanks 11 and 12.
The circulation line collects the developing solution after the development processing from the bottoms 91 and 92 side of the developing tank through the pipes 61 and 62 and sends it to the tank 63 for storing the developing solution after the development processing. It is a series of lines that take out the developer 43 from 63, filter it with a filter 65, and send it to the pipe 20. The developer after development is circulated through the circulation line so that it can be reused.
Thus, in the development processing apparatus of this example, a new developer is supplied from the new solution supply line, and the developer after the development process collected in the tank by the circulation line is filtered through the filter. Supply as developer.
In the development processing apparatus of this example, as shown in FIG. 2, transport means (not shown) for transporting the workpiece 80 with the processing surface facing upward and tilted from the horizontal in a direction orthogonal to the transport direction. The developer bathed by the work at each position in the transporting direction of the development processing tank 10 flows along the inclination of the work processing surface and hangs down from the work (see FIG. 2B). In the first developing tank 11 in 10, a developer 41 a after development processing that has been dripped from the workpiece in a predetermined position range in the conveying direction is received at a position between the bottom 91 and the workpiece 80 to be conveyed. A waste liquid collecting means is provided for collecting the collected developer 41a after the development processing to a waste liquid line (not shown) including the pipe 71.
The waste liquid collecting means receives and collects the developing solution 41a after the development process dripped from the work with one gutter 30 having an opening 31 on the upper side, and returns it to a waste liquid line including the pipe 71 as a part thereof. It is a flow.

In the development apparatus of the first example, the basket 30 can be moved in the transport direction in the first developer tank 11, and receives and collects the developer 41a after the development process at a desired transport direction position. Can flow to the waste liquid line.
Further, the developer after the development processing in the first developing tank 11 other than being recovered by the waste liquid recovery means flows from the bottom 91 through the pipe 61 to the circulation line that is recovered in the tank 63.
The developer after the development processing in the second developing tank 12 flows from the bottom 92 through the pipe 62 to the circulation line collected in the tank 63.

In the development processing apparatus shown in FIG. 1, development processing including a resist breakpoint stage in which the amount of dissolved resist rapidly increases in the development processing is performed in the first development tank 11, and in the second development tank 12, the resist breakpoint stage is performed. Subsequent development processing not included is performed, and here, a developing solution containing a large amount of resist including the resist breakpoint stage is caused to flow to the waste liquid line.
As described above, in general, in a continuous development process, the dissolution of the colored resist by the developer does not proceed evenly, and the colored resist hardly dissolves at the initial stage of development. At a so-called stage, the dissolution amount of the colored resist increases rapidly, and then the dissolution amount decreases rapidly.

Prior to development by the development processing apparatus of this example, in order to uniformly form a developer film on the entire surface, an aqua knife process in which a large amount of developer is poured at a high speed to form a developer film instantaneously is performed. However, the aqua knife process is not shown in FIGS.
Further, rinsing is performed after development by the development processing apparatus of this example, but the rinsing processing unit is not shown in FIGS.
Usually, an alkaline developer is used to form the R, G, and B color filter portions or the black matrix in the production of the color filter forming substrate, and pure water is used as the rinse solution.

Conveying means intended to roller conveying, here, while conveying the workpiece by conveying rollers attached to the shaft of rotation of the motor over the drive, and the developer from a plurality of ejection portions like a shower on the treated surface of the workpiece It is something to bathe.
As shown in FIG. 2B, the pipes 20 and 20a for supplying the developer to the discharge sections 21 and 21a are also provided on the workpiece 80 to be transported in order to transport the developer in a state inclined from the horizontal in the direction orthogonal to the transport direction. It is tilted along the slope.
Each of the pipes 20 and 20a for supplying the developer to the discharge unit includes a plurality of discharge units 21 and 21a for discharging the developer, and is arranged at a predetermined pitch interval, so that the entire discharge unit is uniformly developed. The liquid comes into contact.
Here, the rod 30 can be moved by a ball screw by motor drive, but the means for moving the rod is not limited to this.

In the development processing apparatus of this example, the workpiece 80 is conveyed with the processing surface of the workpiece 80 inclined at an angle of about 5 degrees from the horizontal in the direction orthogonal to the conveying direction of the workpiece 80, and the developer bathed on the workpiece 80 is: It flows along the processing surface of the workpiece 80 in a direction orthogonal to the conveying direction of the workpiece 80, and hangs down from the workpiece.
The tank 63 in the circulation line overflows the developer 43 and flows to the waste liquid line via the pipe 72.

Here, the conveyance direction position of the collar 30 will be described.
In the development processing apparatus of this example, when one type of colored resist is developed with a predetermined developer, the position at the resist breakpoint stage is almost determined. In the position range in the transport direction that covers the area where the resist dissolves or flows into the substrate, the developer bathed in the work is received and collected from the opening of the trough, and the collected developer after the development processing is sent to the waste liquid line. And flow.
When there are two or more combinations of the colored resist and the developing solution, the position in the transport direction at which the resist breakpoint stage is determined for each colored resist and the developing solution is almost determined. Corresponding to the position in the conveyance direction at the registration breakpoint stage corresponding to the set, the ridge is moved to perform development processing.
Note that the resist breakpoint stage in development can be confirmed by human eyes, and it is easy to accurately move the eyelid to the transport direction position corresponding to the resist breakpoint stage.
Usually, for each set of colored resist and developer, data on the position in the conveyance direction of the ridge corresponding to the resist breakpoint stage is previously obtained, and the ridge is moved in accordance with the data. As a result, it is possible to reliably and selectively collect the developer applied to the work 80 at the resist breakpoint stage where the resist is dissolved and flowed in a large amount and pass it to the waste liquid line.
In addition, it is possible to surely cope with diversification of resist and developer sets.
As a result, it is possible to suppress the amount of new solution used in a development processing apparatus that performs a developing process of a workpiece by showering the workpiece with the developer from the upper side of the processing surface of the plate-shaped workpiece to be developed. In addition, it is possible to prevent clogging of the filter due to deterioration of the developer.
As a result, the development processing apparatus of this example is enormous in order to prepare a tank for selecting which tank is to be drained at the diversified resist breakpoint stage, which is necessary in the case of the conventional cascade-type development processing apparatus. Design and piping materials can be reduced, and the problem that the developing solution in which the developed photosensitive resin is dissolved easily causes filter clogging in the case of the conventional circulation system. It is possible.

Next, a second example of the embodiment of the development processing apparatus of the present invention will be described.
Similarly to the first example, the second example is a development processing apparatus that uses a large color filter forming substrate as a plate-shaped workpiece to be processed and performs development processing with a developer while transporting the workpiece. In the second example, the waste liquid collecting means in the first example is a direction perpendicular to the conveying direction so as to cover the entire upper opening of the bag as shown in FIG. And each of the divided upper lids 35 is inclined so that the developer flows to the bottom when closed, and from the region where the divided upper lid 35 is opened. Instead of collecting the developing solution after the development process into the tub 30A and flowing it to the waste liquid line.
The ridge 30A of the second example has a longer length in the transport direction than the ridge 30 of the first example, and the opening area of the ridge 30A contains the developed developer that can be covered by the movement of the ridge 30 of the first example. This corresponds to a region that can be collected at the opening 31.
In the case of the second example, by opening only the divided upper cover 35 in the conveyance direction position range corresponding to the corresponding resist breakpoint stage and closing the other divided upper cover for each of the diversified coloring resist and developer solutions. The developer immersed in the work in the region including the resist breakpoint stage where the resist is dissolved and inflowed frequently can be selectively collected with the tub 30A and allowed to flow to the waste liquid line.
Also in this example, the developer after the development processing in the first developing tank, other than being collected by the waste liquid collecting means, is collected from the bottom of the first developing tank and flows to the circulation line.
When each split upper lid 35 is provided with a ridge (also referred to as a bank) for controlling the flow of the developer when closed, it can be reliably and selectively collected and allowed to flow to the waste liquid line. .

Next, a third example of the embodiment of the development processing apparatus of the present invention will be described.
Similarly to the first example, the third example is a development processing apparatus that uses a large color filter forming substrate as a plate-shaped workpiece to be processed and performs development processing with a developer while transporting the workpiece. In the third example, as shown in FIG. 4, the waste liquid collecting means in the first example is a set of ridges having openings on the upper side and upper lids covering the openings of the ridges along the conveying direction. Each of the top lids is inclined so that the developer flows to the bottom when the top lid is closed. Instead of collecting the developer and flowing it to the waste liquid line.
In the case of the third example, for each set of diversified colored resist and developing solution, open only the top lid of the eyelid in the transport direction position range corresponding to the corresponding resist breakpoint, and close the top lid of the other eyelids. This makes it possible to selectively collect the developer soaked in the work at the resist breakpoint stage where the resist is dissolved and flowed in a lot, and to flow it to the waste liquid line.
Even in the third example, when each top lid is provided with a ridge (bank portion) that controls the flow of the developer when closed, it is surely selectively collected and allowed to flow to the waste liquid line. Can do.

In the first to third examples, the developing tank 10 is connected to a new liquid supply line, connected to a circulation line, connected to a waste liquid line, or developed after the developing process from the bottom. For the sake of convenience, the first developer tank 11 and the second developer tank 12 are divided into two because of the difference in the collection path to the circulation line, but the present invention is not limited to this.
For example, in the third example, the first developer tank to the fourth developer tank are divided, and the first developer tank to the third developer tank are respectively provided with a ridge having an opening on the upper side and the opening of the ridge. It is good also as a form which provided the upper cover which covers all.
Of course, in this embodiment, in each developing tank having a pair of ridges and top lids, a flow path for the developer after development connected to the circulation line is arranged on the bottom side, and each pair of ridges and top lids is arranged.桶 is provided with a developer flow path after development leading to the waste liquid line.

DESCRIPTION OF SYMBOLS 10 Development processing tank 11 1st developing tank 12 2nd developing tank 20, 20a Piping 21, 21a Discharge part (it is also called a nozzle)
30 桶 30a to 30e 桶 30A 桶 31 Opening 35 Divided upper lid 35a to 35e Upper lid 41, 42 Developer (for processing) Developer 41a (after development processing) Developer
41b Developer (after development)
43 Developer 50 Piping 61, 62 Piping 63 Tank 64 Pump 65 Filter 66 Piping 71, 72 Piping 80 Work 91, 92 Bottom 95 Wall 110 Development processing tank 111 First developing tank 112 Second developing tank 120, 120a Piping 121, 121a Discharge unit (also called nozzle)
141, 142 (processing) developer 143 (reuse) developer 150 piping 162 piping 163 tank 164 pump 165 filter 166 piping 171 piping 210 development processing tank 211 first developing tank 212 second developing tank 220, 220a Piping 221 and 221a Discharge part (also called nozzle)
241,242 (for processing) Developer 243 (for reuse) Developer 250 Pipe 261,262 Pipe 263 Tank 264 Pump 265 Filter 266 Pipe

Claims (6)

A developing device for developing a workpiece by applying the developer to the workpiece in a shower form from above the processing surface of the plate-like workpiece to be developed. A new solution for supplying a new developer. A supply line and a circulation line for collecting and circulating the developer after development processing from the bottom side of the development tank are provided, and the circulation line includes a tank for storing the developer after development processing, and a tank from the tank. A filter for filtering the developer, a new developer is supplied from the new solution supply line, and the developer after the development process collected in the tank by the circulation line is filtered through a filter, and the developer for the development process is intended to supply as the workpiece, and the top treated surface, in a state tilted from the horizontal in the direction perpendicular to the conveying direction, it has a conveying means for conveying, Dear in the conveying direction of the developing tank In the developer processing tank, the developer bathed on the workpiece flows along the inclination of the workpiece processing surface and hangs down from the workpiece. The waste solution collecting means is arranged to receive and collect the developer after the development process dripped from the work in the process, and to flow the collected developer solution after the development process to the waste liquid line as a waste liquid .
The waste liquid collecting means receives and collects the developing solution after the development process dripped from the work with a single ridge having an opening on the upper side, and flows it to the waste liquid line.
The development processing apparatus according to claim 1, wherein the position of the ridge is movable in the conveyance direction . A developing device for developing a workpiece by applying the developer to the workpiece in a shower form from above the processing surface of the plate-like workpiece to be developed. A new solution for supplying a new developer. A supply line and a circulation line for collecting and circulating the developer after development processing from the bottom side of the development tank are provided, and the circulation line includes a tank for storing the developer after development processing, and a tank from the tank. A filter for filtering the developer, a new developer is supplied from the new solution supply line, and the developer after the development process collected in the tank by the circulation line is filtered through a filter, and the developer for the development process Each of the development processing tanks in the transport direction, having a transport means for transporting the work in a state inclined from the horizontal in a direction orthogonal to the transport direction with the processing surface facing upward. In the developer processing tank, the developer bathed on the workpiece flows along the inclination of the workpiece processing surface and hangs down from the workpiece. The waste solution collecting means is arranged to receive and collect the developer after the development process dripped from the work in the process, and to flow the collected developer solution after the development process to the waste liquid line as a waste liquid.
The waste liquid recovery means includes one ridge having an opening on the upper side, and a plurality of divided upper lids divided in a direction orthogonal to the transport direction so as to cover the entire opening of the ridge, and each divided upper lid is The developer is inclined so that when it is closed, the developer flows to the bottom, and the developer after the development process is collected from the area where the divided upper lid is opened to the trough and flows to the waste liquid line. developing apparatus wherein there. A developing device for developing a workpiece by applying the developer to the workpiece in a shower form from above the processing surface of the plate-like workpiece to be developed. A new solution for supplying a new developer. A supply line and a circulation line for collecting and circulating the developer after development processing from the bottom side of the development tank are provided, and the circulation line includes a tank for storing the developer after development processing, and a tank from the tank. A filter for filtering the developer, a new developer is supplied from the new solution supply line, and the developer after the development process collected in the tank by the circulation line is filtered through a filter, and the developer for the development process Each of the development processing tanks in the transport direction, having a transport means for transporting the work in a state inclined from the horizontal in a direction orthogonal to the transport direction with the processing surface facing upward. In the developer processing tank, the developer bathed on the workpiece flows along the inclination of the workpiece processing surface and hangs down from the workpiece. The waste solution collecting means is arranged to receive and collect the developer after the development process dripped from the work in the process, and to flow the collected developer solution after the development process to the waste liquid line as a waste liquid.
The waste liquid collecting means includes a tub having a plurality of upper lids, each set having a jar having an opening on the upper side and an upper lid covering the opening of each jar along the transport direction, and each upper lid is closed. In addition, the developer is inclined so as to flow to the bottom, and the developer after the development processing is collected from the region where the upper lid is opened to the ridge and is flowed to the waste liquid line. Development processing apparatus. 4. The development processing apparatus according to claim 1, wherein the workpiece is a large color filter forming substrate . A development processing method in which a developer is showered from the upper side of a processing surface of a plate-like workpiece to be developed and is applied to the workpiece to develop the workpiece. The developer after development used in the resist breakpoint stage of development processing is used as a waste solution, and the developer after other development processing is filtered and used as a developer for development processing in a circulating manner. A development processing method characterized by the above. 6. The development processing method according to claim 5, wherein the work is transported in a state where the work surface is inclined upward from a horizontal direction in a direction orthogonal to the transport direction, and each position of the development processing tank in the transport direction. In the development processing tank, the developer in a predetermined position range in the transport direction is moved to a position between the bottom and the work to be transported while flowing the developer on the work surface along the inclination of the work processing surface and dripping from the work. A development processing method characterized in that the development solution after the development processing used in the resist breakpoint stage of the development processing is selectively received and collected as a waste liquid.

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