JP5649869B2 - Charged particle beam drawing apparatus and charged particle beam drawing method - Google Patents

Description

  The present invention relates to a charged particle beam drawing apparatus and a charged particle beam drawing method, and, for example, to a shot division method of a figure when drawing using an electron beam.

  Lithography technology, which is responsible for the progress of miniaturization of semiconductor devices, is an extremely important process for generating a pattern among semiconductor manufacturing processes. In recent years, with the high integration of LSI, circuit line widths required for semiconductor devices have been reduced year by year. In order to form a desired circuit pattern on these semiconductor devices, a highly accurate original pattern (also referred to as a reticle or a mask) is required. Here, the electron beam (electron beam) drawing technique has an essentially excellent resolution, and is used for producing a high-precision original pattern.

FIG. 10 is a conceptual diagram for explaining the operation of a conventional variable shaping type electron beam drawing apparatus.
The variable shaped electron beam (EB) drawing apparatus operates as follows. In the first aperture 410, a rectangular opening for forming the electron beam 330, for example, a rectangular opening 411 is formed. Further, the second aperture 420 is formed with a variable shaping opening 421 for shaping the electron beam 330 having passed through the opening 411 of the first aperture 410 into a desired rectangular shape. The electron beam 330 irradiated from the charged particle source 430 and passed through the opening 411 of the first aperture 410 is deflected by the deflector, passes through a part of the variable shaping opening 421 of the second aperture 420, and passes through a predetermined range. The sample 340 mounted on a stage that continuously moves in one direction (for example, the X direction) is irradiated. That is, the drawing area of the sample 340 mounted on the stage in which the rectangular shape that can pass through both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is continuously moved in the X direction. Drawn on. A method of creating an arbitrary shape by passing both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is referred to as a variable shaping method (VSB method).

  In such variable shaping type electron beam drawing, each of the design figures is divided so that one of the design figure sizes is larger than the maximum shot size, and the figure is less than the maximum shot size. Draw a shot figure. Here, for a parallelogram whose angle between the base and the hypotenuse is 45 degrees, the length of the base is the divided length, and the parallelogram is formed from one side in the vertical direction until the remaining length is less than or equal to twice the divided length. And the remaining parallelogram remaining at the end is divided in half in the height direction. Then, a method is disclosed in which the parallelogram whose height direction is the division length is divided into triangles, and the remaining two parallelograms remaining at the ends are divided into the triangles on the hypotenuses on both sides and the remainder into rectangles. (See Patent Document 1).

Japanese Patent No. 4006216

  As described above, the length of the base is smaller than the maximum shot size, but a parallelogram whose height direction is larger than the maximum shot size cannot be shot at a time, so it needs to be divided. Here, if it divides | segments with the technique of patent document 1, the figure which remains in an edge part will become smaller compared with another figure. As a result of dividing the figure, if a figure with a small dimension remains at the end, there is a problem that a dimensional error when drawing the figure with the small dimension becomes large. Furthermore, with the recent miniaturization of patterns, the number of shots tends to increase. However, as the number of shots increases, the drawing time increases accordingly, so it is desirable to suppress the increase in the number of shots as much as possible. Yes.

  Therefore, the present invention overcomes the above-described problems and reduces the length of the parallelogram having a height in the height direction larger than twice the length of the base and an angle of 45 degrees at the end of the parallelogram. An object of the present invention is to provide an apparatus and a method capable of dividing a figure without leaving a figure. Furthermore, it aims at providing the apparatus and method which can reduce the number of figures divided | segmented more.

A charged particle beam drawing apparatus according to one embodiment of the present invention includes:
A storage unit for storing graphic data of a first parallelogram whose length in the height direction is greater than twice the length of the base and has an angle of 45 degrees;
The length of the base is defined as a split length, and any one of the two directions parallel to the height direction and the two directions parallel to the base direction is defined as the first and second split directions. A first dividing unit that divides the parallelogram from both directions of the first and second dividing directions by the dividing length until the remaining dividing direction length is shorter than the length of the bottom;
A second dividing unit that divides a plurality of second parallelograms that are newly formed by dividing the length of the base by dividing the plurality of second parallelograms into two right-angled isosceles triangles;
A drawing unit for variably shaping a charged particle beam so as to form a plurality of newly formed right isosceles triangles, and drawing the first parallelogram on the sample using the shaped charged particle beam;
It is provided with.

  According to this configuration, one remaining parallelogram shorter than the division length can be arranged at the center of the first parallelogram. Furthermore, since there is only one parallelogram shorter than the division length, the number of divided figures can be reduced.

  Further, it is preferable that at least one of the first and second divided portions divides the remaining parallelogram whose length in the division direction is shorter than the length of the base into two right-angled isosceles triangles and one quadrangle. .

Alternatively, the remaining parallelograms whose division direction length remains shorter than the length of the base further includes a determination unit that determines whether the division direction length is equal to or less than a threshold value,
The drawing unit may be configured to draw the remaining parallelograms determined to be equal to or less than the threshold value as rectangles.

The charged particle beam drawing method of one embodiment of the present invention includes:
Storing in a storage device graphic data of a first parallelogram in which one of the length in the height direction and the length of the base is larger than twice the other and has an angle of 45 degrees;
Any from the storage device reads the first parallelogram graphic data, division length and the other length described above Satoshi, the two directions parallel to the height direction, the two directions parallel to the bottom direction, of the With these two directions as the first and second dividing directions, the parallelogram from both directions of the first and second dividing directions is divided by the length until the remaining dividing direction length is shorter than the other length. Dividing, and
Dividing each of the plurality of second parallelograms having the height of the other length newly formed by being divided by the other length described above into two right-angled isosceles triangles;
Variably shaping the charged particle beam so as to form a plurality of newly formed right isosceles triangles, and drawing the first parallelogram on the sample using the shaped charged particle beam;
It is provided with.

  It is also preferable to further comprise a step of dividing the remaining parallelogram whose length in the dividing direction is shorter than the other length described above into two right-angled isosceles triangles and one quadrangle.

  According to the present invention, a figure can be divided without leaving a small figure at the end of the parallelogram with respect to a parallelogram having a length in the height direction that is greater than twice the length of the base and an angle of 45 degrees. . Furthermore, since the number of remaining small figures can be reduced, the number of figures finally divided can be further reduced.

1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to Embodiment 1. FIG. FIG. 6 is a conceptual diagram for explaining a drawing procedure in the first embodiment. FIG. 4 is a flowchart showing main steps of the drawing method according to Embodiment 1. 3 is a conceptual diagram illustrating a parallelogram and a y-direction division method according to Embodiment 1. FIG. FIG. 3 is a conceptual diagram illustrating a parallelogram and an x-direction division method in the first embodiment. FIG. 3 is a conceptual diagram showing how to approximate the remaining parallelogram in the first embodiment. FIG. 10 is a conceptual diagram illustrating a parallelogram and a method of x-direction division in the second embodiment. FIG. 10 is a conceptual diagram showing a parallelogram and a y-direction division method in the second embodiment. FIG. 10 is a conceptual diagram showing how to approximate the remaining parallelogram in the second embodiment. It is a conceptual diagram for demonstrating operation | movement of the conventional variable shaping type | mold electron beam drawing apparatus.

  Hereinafter, in the embodiment, a configuration using an electron beam will be described as an example of a charged particle beam. However, the charged particle beam is not limited to an electron beam, and a beam using charged particles such as an ion beam may be used. Further, a variable shaping type drawing apparatus will be described as an example of the charged particle beam apparatus.

Embodiment 1 FIG.
FIG. 1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to the first embodiment. In FIG. 1, the drawing apparatus 100 includes a drawing unit 150 and a control unit 160. The drawing apparatus 100 is an example of a charged particle beam drawing apparatus. In particular, it is an example of a variable shaping type drawing apparatus. The drawing unit 150 includes an electron column 102 and a drawing chamber 103. In the electron column 102, there are an electron gun 201, an illumination lens 202, a first aperture 203, a projection lens 204, a deflector 205, a second aperture 206, an objective lens 207, a main deflector 208, and a sub deflector 209. Has been placed. An XY stage 105 is disposed in the drawing chamber 103. On the XY stage 105, a sample 101 such as a mask to be drawn at the time of drawing is arranged. The sample 101 includes an exposure mask for manufacturing a semiconductor device. Further, the sample 101 includes mask blanks on which nothing has been drawn yet.

  The control unit 160 includes a control computer unit 110, a memory 111, a control circuit 120, and storage devices 140 and 142 such as a magnetic disk device. The control computer unit 110, the memory 111, the control circuit 120, and the storage devices 140 and 142 such as a magnetic disk device are connected to each other via a bus (not shown).

  In the control computer unit 110, a distribution unit 112, an x-direction division unit 114, a y-direction division unit 116, a shot data generation unit 118, a shot division unit 119, and a determination unit 115 are arranged. The distribution unit 112, the x-direction division unit 114, the y-direction division unit 116, the shot data generation unit 118, the shot division unit 119, and the determination unit 115 may be configured by hardware such as an electric circuit. You may comprise with software, such as a program which performs a function. Alternatively, it may be configured by a combination of hardware and software. Information input / output to / from the distribution unit 112, the x-direction division unit 114, the y-direction division unit 116, the shot data generation unit 118, the shot division unit 119, and the determination unit 115 and information being calculated are stored in the memory 111 each time. Is done.

  Here, FIG. 1 shows a configuration necessary for explaining the first embodiment. The drawing apparatus 100 may normally have other necessary configurations. For example, the main deflector 208 and the sub-deflector 209, which are the main and sub two-stage multi-stage deflectors, are used for position deflection, but the position deflection is performed by one stage deflector or three or more stages of multi-stage deflectors. It may be the case.

  FIG. 2 is a conceptual diagram for explaining a drawing procedure according to the first embodiment. In the drawing apparatus 100, the drawing area of the sample 101 is virtually divided into a plurality of strip-shaped stripe areas 20. In FIG. 2, for example, a case where one chip indicated by the chip region 10 is drawn on the sample 101 is illustrated. Of course, a plurality of chips may be drawn on the sample 101. The width of the stripe region 20 is divided by a width that can be deflected by the main deflector 208. When drawing on the sample 101, the XY stage 105 is continuously moved in the x direction, for example. The electron beam 200 irradiates one stripe region 20 while continuously moving in this way. The movement of the XY stage 105 in the X direction is a continuous movement, and at the same time, the main deflector 208 causes the shot position of the electron beam 200 to follow the stage movement. Further, the drawing time can be shortened by continuously moving. When drawing of one stripe region 20 is completed, the XY stage 105 is stepped in the y direction, and the next stripe region 20 is drawn in the x direction (in this case, the opposite direction). The moving time of the XY stage 105 can be shortened by making the drawing operation of each stripe region 20 meander.

  FIG. 3 is a flowchart showing main steps of the drawing method according to the first embodiment. 3, the drawing method according to the first embodiment includes an input / storage process (S100), a graphic distribution process (S102), a y-direction division process (S104), a determination process (S106), and an x-direction division. A series of steps such as a step (S108), a shot division step (S110) of other figures, a shot data generation step (S120), and a drawing step (S122) are performed. However, when the remaining parallelogram described later is divided without determination, the determination step (S106) can be omitted.

  FIG. 4 is a conceptual diagram showing a parallelogram and a y-direction division method in the first embodiment. In FIG. 4, the parallelogram 30 (first parallelogram) has a base length D that is equal to or less than the maximum shot size set by the drawing apparatus 100 and a height that is more than twice the base length D. Large and has an angle of 45 degrees. That is, it is a parallelogram whose angle between the hypotenuse and the base or top is 45 degrees. Here, it is assumed that the height is larger than the maximum shot size. In the drawing apparatus 100, by passing the electron beam 200 through both the first aperture 203 and the second aperture 206, a rectangular or square having an arbitrary size or a right angle having a hypotenuse of 45 degrees for each shot. The electron beam 200 is shaped into a triangle (variable shaping). At that time, a maximum shot size that can be formed in advance is set, and the dimension of the formed beam is controlled to be equal to or less than the maximum shot size.

  First, as an input / storage step (S100), graphic data serving as layout data (drawing data) is input from the outside of the drawing apparatus 100 and stored (stored) in the storage device 140 (storage unit). Then, the control computer unit 110 sequentially reads layout data from the storage device 140 for each predetermined processing area.

  As the graphic distribution step (S102), the distribution unit 112 refers to the graphic data defined in the layout data sequentially read from the storage device 140, and converts the graphic input sequentially into the above-mentioned base length D. Is divided into a parallelogram 30 having a height less than the maximum shot size set by the drawing apparatus 100 and having a height larger than twice the base length D and a 45 degree angle, and other figures.

  In the y-direction division step (S104), the y-direction division unit 116 sets the base length D as the division length and performs two directions parallel to the height direction (y direction) (vertical direction, y direction, and -y direction). Dividing the parallelogram 30 from both the upper and lower directions as the division directions (first and second division directions) by the division length D until the remaining division direction length k is shorter than the base length D. . The y-direction dividing unit 116 is an example of a first dividing unit. As a result, the parallelogram 30 is divided into a plurality of parallelograms 40 divided by the division length D and the remaining parallelogram 50 having one division direction length k as shown in FIG. Is done. In the example of FIG. 4, parallelograms 40a and 40c having two division lengths D in the upward direction (y direction) and parallelograms 40b having two division lengths D in the downward direction (−y direction). , 40d. By dividing the parallelogram 30 from both the upper and lower directions, the parallelogram 50 having a shorter division direction length than the other can be arranged at the center instead of the end of the parallelogram 30. Therefore, it is possible to avoid a dimensional error caused by drawing a small figure at the end during drawing.

  In the x-direction dividing step (S108), the x-direction dividing unit 114 divides a plurality of newly formed parallelograms 40 (second parallelograms) by dividing each of the two right angles 2 by dividing the base D by the length D. Divide into equilateral triangles. The x-direction dividing unit 114 is an example of a second dividing unit.

  FIG. 5 is a conceptual diagram showing the parallelogram and the x-direction division method in the first embodiment. In FIG. 5, each parallelogram 40 is divided in the x direction by being cut along a shorter diagonal line. Thereby, each parallelogram 40 is divided into two right-angled isosceles triangles 42 and 44, respectively. On the other hand, the remaining parallelogram 50 is divided into two right-angled isosceles triangles 52 and 54 and one rectangle 56 consisting of a rectangle or a square in the center so that the hypotenuses on both sides are cut off (rectangles with all angles being right-angled). Divided.

  As described above, each parallelogram 40 is divided into two right-angled isosceles triangles 42 and 44, and the parallelogram 50 is divided into two right-angled isosceles triangles 52 and 54 and one rectangle 56. Therefore, the parallelogram 30 is divided into a number of figures obtained by adding “3”, which is the number of divisions of the remaining parallelogram 50, to twice the number of the parallelogram 40. Therefore, the number of figures can be reduced by at least one as compared with the conventional division method.

  On the other hand, as the shot dividing step (S110) of other graphics, the shot dividing unit 119 divides the other graphics so that each figure has a maximum shot size or less.

  As the shot data generation step (S120), the shot data generation unit 118 performs a plurality of stages of data conversion processing on the layout data, and generates shot data of each figure divided into a size equal to or smaller than the maximum shot size. The generated shot data is temporarily stored in the storage device 142 sequentially.

  As a drawing step (S122), the control circuit 120 reads shot data from the storage device 142, controls the drawing unit 150, and draws each graphic pattern using the electron beam 200. Specifically, the drawing unit 150 operates as follows.

  The electron beam 200 emitted from the electron gun 201 (emission unit) illuminates the entire first aperture 203 having a rectangular hole, for example, a rectangular hole, by the illumination lens 202. Here, the electron beam 200 is first formed into a rectangle, for example, a rectangle. Then, the electron beam 200 of the first aperture image that has passed through the first aperture 203 is projected onto the second aperture 206 by the projection lens 204. The deflector 205 controls the deflection of the first aperture image on the second aperture 206, and can change the beam shape and size for each shot. Here, it shape | molds in the shape of each divided | segmented figure mentioned above. The electron beam 200 of the second aperture image that has passed through the second aperture 206 is focused by the objective lens 207, deflected by the main deflector 208 and the sub deflector 209, and continuously moved. The desired position of the sample 101 arranged in the above is irradiated. FIG. 1 shows a case in which multi-stage deflection of main and sub two stages is used for position deflection. In such a case, the electron beam 200 is deflected while following the stage movement to the reference position of the subfield (SF) which is a small area obtained by virtually dividing the stripe area by the main deflector 208, and the sub-deflector 209 deflects the electron beam 200 in the SF. What is necessary is just to deflect the beam concerning each irradiation position. For example, the right isosceles triangle 42, the right isosceles triangle 44, the right isosceles triangle 42, the right isosceles triangle 44, the right isosceles triangle 44, and the parallelogram 50 shown in FIG. 52, a rectangle 56, a right isosceles triangle 54, a right isosceles triangle 42 of a parallelogram 40d, a right isosceles triangle 44, a right isosceles triangle 42 of a parallelogram 40b, and a right isosceles triangle 44 are formed in this order. The parallelogram 30 can be drawn by irradiating the sample 101 with the beam of each shot.

  Although not shown, a blanker (blanking deflector) and a blanking aperture for forming each shot beam are further arranged in the electron column 102, and the blanker is arranged on the blanking aperture by the blanker. The state of beam 0FF is formed by deflecting the electron beam 200 continuous to the shielding surface. The beam ON state is formed by deflecting the electron beam 200 to the opening on the blanking aperture by the blanker. The beam that has passed through the blanking aperture with the beam turned on becomes an electron beam for one shot.

  As described above, according to the present embodiment, a small figure is formed at the end of a parallelogram with respect to a parallelogram whose length in the height direction is greater than twice the length of the base and has an angle of 45 degrees. The figure can be divided without leaving Furthermore, since the number of remaining small figures can be reduced, the number of figures finally divided can be further reduced. Since the number of figures to be divided is enormous, the number of figures to be divided can be reduced as the number of figures of the parallelogram described above increases. As a result, the drawing time can be greatly shortened.

  FIG. 6 is a conceptual diagram showing how to approximate the remaining parallelogram in the first embodiment. It is also preferable to draw the remaining parallelogram 50 whose split direction length is shorter than the base length D by approximating as follows.

  In such a case, as a determination step (S106), before the division in the x direction, the determination unit 115 determines the length in the division direction for the remaining parallelogram 50 whose division direction length remains shorter than the base length D. It is determined whether k is equal to or less than a threshold value.

  When it is determined that the threshold value is equal to or less than the threshold value, the shot data generation unit 118 generates shot data with the remaining parallelogram 50 as a rectangle 58 in the shot data generation step (S120). In the drawing step (S122), the drawing unit 150 draws the remaining parallelogram 50 determined to be equal to or less than the threshold value as a rectangle 58. By configuring as described above, the number of figures to be divided can be reduced. If it is not determined that the threshold value is not greater than the threshold value, it may be divided into three figures in the x direction as described above.

Embodiment 2. FIG.
In Embodiment 1, although it divided | segmented to the x direction after dividing | segmenting to the y direction, it does not restrict to this. In the second embodiment, a case where the order is reversed will be described. The configuration of the drawing apparatus is the same as in FIG. The free chart in the drawing direction is the same as that in FIG. 3 except that the order of the y-direction dividing step (S104) and the x-direction dividing step (S108) is reversed. The contents other than those described below are the same as those in the first embodiment.

  FIG. 7 is a conceptual diagram illustrating the parallelogram and the x-direction division method according to the second embodiment. In FIG. 7, the parallelogram 30 (first parallelogram) is similar to FIG. 4 in that the base length D is equal to or less than the maximum shot size set by the drawing apparatus 100 and the height is the base length D. And an angle of 45 degrees. That is, it is a parallelogram whose angle between the hypotenuse and the base or top is 45 degrees. Here, it is assumed that the height is larger than the maximum shot size.

  In the x-direction dividing step (S108), the x-direction dividing unit 114 sets the base length D as the split length, and performs two directions parallel to the base direction (x direction) (left-right direction, x direction, and -x direction). As a division direction (first and second division directions), the parallelogram 30 is divided from the left and right directions by the division length D until the remaining division direction length L is shorter than the base length D. In the second embodiment, the x-direction dividing unit 114 is an example of a first dividing unit. Thereby, as shown in FIG. 7, the parallelogram 30 includes a plurality of parallelograms 70 divided by the division length D, the remaining parallelogram 80 having one division direction length L, and both end portions. Are divided into two right-angled isosceles triangles 60. In the example of FIG. 7, one right isosceles triangle 60a in the right direction (x direction), two parallelograms 70a and 70c having two division lengths D, and one in the left direction (−x direction). An example is shown in which it is divided into a right-angled isosceles triangle 60b and a parallelogram 70b having one division length D. By dividing the parallelogram 30 from both the left and right directions, the parallelogram 80 having a shorter division direction length than the others can be arranged at the center instead of the end of the parallelogram 30. Therefore, it is possible to avoid a dimensional error caused by drawing a small figure at the end during drawing.

  As the y-direction dividing step (S104), the y-direction dividing unit 116 divides the plurality of newly formed parallelograms 70 (second parallelograms) by the base length D into two right angles 2 respectively. Divide into equilateral triangles. The y-direction dividing unit 116 is an example of a second dividing unit.

  FIG. 8 is a conceptual diagram illustrating a parallelogram and a y-direction division method according to the second embodiment. In FIG. 8, each parallelogram 70 is divided in the y direction by being cut along the shorter diagonal line. Thereby, each parallelogram 40 is divided into two right-angled isosceles triangles 72 and 74, respectively. On the other hand, the remaining parallelogram 80 is divided into two rectangular isosceles triangles 82 and 84 and a central rectangle or a square 86 so that the oblique sides on both the upper and lower sides are separated.

  As described above, each parallelogram 70 is divided into two right-angled isosceles triangles 72 and 74, and the parallelogram 80 is divided into two right-angled isosceles triangles 82 and 84 and one rectangle 86. Therefore, the parallelogram 30 is “3” that is twice the number of the parallelogram 70 and the number of figures of the two right-angled isosceles triangles 60 a and 60 b on both sides. The figure is divided into a number obtained by adding a certain “2”. Therefore, the number of figures can be reduced by at least one as compared with the conventional division method.

  As described above, according to the second embodiment, a small figure is formed at the end of a parallelogram with respect to a parallelogram whose length in the height direction is greater than twice the length of the base and has an angle of 45 degrees. The figure can be divided without leaving Furthermore, since the number of remaining small figures can be reduced, the number of figures finally divided can be further reduced. Since the number of figures to be divided is enormous, the number of figures to be divided can be reduced as the number of figures of the parallelogram described above increases. As a result, the drawing time can be greatly shortened.

  FIG. 9 is a conceptual diagram showing how to approximate the remaining parallelogram in the second embodiment. The remaining parallelogram 80 whose split direction length remains shorter than the base length D is preferably drawn by approximating as follows.

  In such a case, as a determination step (S106), before the division in the y direction, the determination unit 115 determines the division direction length of the remaining parallelogram 80 whose division direction length remains shorter than the base length D. It is determined whether L is equal to or less than a threshold value.

  If it is determined that the threshold value is less than or equal to the threshold value, the shot data generation unit 118 generates shot data with the remaining parallelogram 80 as a rectangle 88 in the shot data generation step (S120). In the drawing step (S122), the drawing unit 150 draws the remaining parallelogram 80 determined to be equal to or less than the threshold value as a rectangle 88. By configuring as described above, the number of figures to be divided can be reduced. If it is not determined that the threshold value is not greater than the threshold value, it may be divided into three figures in the y direction as described above.

  The embodiments have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. In the example described above, a parallelogram in which the short side is parallel to the x direction and the height direction is the y direction is shown as an example. However, the short side is parallel to the y direction and the height direction is parallel to the x direction. A quadrilateral can be similarly configured. In such a case, “bottom” and “height” may be replaced.

  In other words, when dividing the first parallelogram having one of the length in the height direction and the length of the base larger than twice the other and an angle of 45 degrees, first, the other length D described above is used. Is a first parallelogram from both directions of the first and second division directions, with two directions parallel to either the height direction or the base direction as the first and second division directions. Is divided by the division length D until the remaining division direction length becomes shorter than the other length D described above. Next, the plurality of second parallelograms newly formed by being divided by the other length described above may be divided into two right-angled isosceles triangles. Further, the remaining parallelograms whose division direction length remains shorter than the other length described above may be divided into two right-angled isosceles triangles and one quadrangle.

  In addition, although descriptions are omitted for parts and the like that are not directly required for the description of the present invention, such as a device configuration and a control method, a required device configuration and a control method can be appropriately selected and used. For example, although the description of the control unit configuration for controlling the drawing apparatus 100 is omitted, it goes without saying that the required control unit configuration is appropriately selected and used.

  In addition, all charged particle beam writing apparatuses and methods that include elements of the present invention and that can be appropriately modified by those skilled in the art are included in the scope of the present invention.

10 chip region 20 stripe region 30, 40, 50, 70, 80 parallelogram 42, 44, 52, 54, 60, 72, 74, 82, 84 right angled isosceles triangle 56, 86 rectangle 58, 88 rectangle 100 drawing device 101, 340 Sample 102 Electron column 103 Drawing chamber 105 XY stage 110 Control computer unit 111 Memory 112 Distribution unit 114 X direction division unit 115 Determination unit 116 y direction division unit 118 Shot data generation unit 119 Shot division unit 120 Control circuit 140 , 142 storage device 150 drawing unit 160 control unit 200 electron beam 201 electron gun 202 illumination lens 203, 410 first aperture 204 projection lens 205 deflector 206, 420 second aperture 207 objective lens 208 main deflector 209 sub deflector 330 Electron beam 411 Open 421 shaped opening 430 a charged particle source

Claims (5)

A storage unit for storing graphic data of a first parallelogram whose length in the height direction is greater than twice the length of the base and has an angle of 45 degrees;
The length of the base is defined as a split length, and any one of the two directions parallel to the height direction and the two directions parallel to the base direction is defined as the first and second split directions. A first dividing unit that divides the parallelogram from both directions of the first and second dividing directions by the dividing length until a remaining dividing direction length is shorter than a length of the base;
A second dividing unit that divides a plurality of second parallelograms that are newly formed by being divided by the length of the base, into two right-angled isosceles triangles;
A drawing unit that variably shapes a charged particle beam so as to form a plurality of newly formed right isosceles triangles, and draws the first parallelogram on a sample using the shaped charged particle beam;
A charged particle beam drawing apparatus comprising:   At least one of the first and second divided portions divides the remaining parallelogram whose length in the dividing direction is shorter than the length of the base into two right-angled isosceles triangles and one quadrangle. The charged particle beam drawing apparatus according to claim 1. For the remaining parallelograms whose division direction length remains shorter than the length of the base, the determination unit further determines whether the division direction length is equal to or less than a threshold,
The charged particle beam drawing apparatus according to claim 1, wherein the drawing unit draws the remaining parallelograms determined to be equal to or less than a threshold value as rectangles. Storing in a storage device graphic data of a first parallelogram in which one of the length in the height direction and the length of the base is larger than twice the other and has an angle of 45 degrees;
Read graphic data of the first parallelogram from the storage device, the other divided length length Satoshi, the two directions parallel to the height direction, the two directions parallel to the bottom direction, of the One of the two directions is defined as the first and second division directions, and the remaining division direction length of the parallelogram from both directions of the first and second division directions is shorter than the other length. Dividing by the division length until,
Dividing each of a plurality of second parallelograms having the height of the other length newly formed by being divided by the other length into two right-angled isosceles triangles;
Variably shaping a charged particle beam so as to form a plurality of newly formed right isosceles triangles, and drawing the first parallelogram on a sample using the shaped charged particle beam;
A charged particle beam drawing method comprising:   The charged particle according to claim 4, further comprising a step of dividing the remaining parallelogram whose length in the division direction is shorter than the other length into two right-angled isosceles triangles and one quadrangle. Beam drawing method.

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