JP5649309B2 - Method for producing styrenic polymer - Google Patents
Method for producing styrenic polymer Download PDFInfo
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- JP5649309B2 JP5649309B2 JP2010027819A JP2010027819A JP5649309B2 JP 5649309 B2 JP5649309 B2 JP 5649309B2 JP 2010027819 A JP2010027819 A JP 2010027819A JP 2010027819 A JP2010027819 A JP 2010027819A JP 5649309 B2 JP5649309 B2 JP 5649309B2
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- 229920000642 polymer Polymers 0.000 title claims description 40
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000002904 solvent Substances 0.000 claims description 35
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 34
- -1 t-butoxycarbonyl group Chemical group 0.000 claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 239000000178 monomer Substances 0.000 claims description 17
- 239000012046 mixed solvent Substances 0.000 claims description 14
- 239000002798 polar solvent Substances 0.000 claims description 13
- 150000003112 potassium compounds Chemical class 0.000 claims description 12
- 238000010539 anionic addition polymerization reaction Methods 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000001072 heteroaryl group Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 125000005129 aryl carbonyl group Chemical group 0.000 claims description 5
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 5
- 125000005143 heteroarylsulfonyl group Chemical group 0.000 claims description 5
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 4
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 4
- 125000005223 heteroarylcarbonyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 125000001412 tetrahydropyranyl group Chemical group 0.000 claims description 4
- 125000001033 ether group Chemical group 0.000 claims description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 55
- 239000000243 solution Substances 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 25
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 21
- 238000006116 polymerization reaction Methods 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000003505 polymerization initiator Substances 0.000 description 7
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 7
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 6
- 159000000001 potassium salts Chemical class 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 150000001340 alkali metals Chemical class 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 125000004475 heteroaralkyl group Chemical group 0.000 description 4
- KJJBSBKRXUVBMX-UHFFFAOYSA-N magnesium;butane Chemical compound [Mg+2].CCC[CH2-].CCC[CH2-] KJJBSBKRXUVBMX-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 125000004916 (C1-C6) alkylcarbonyl group Chemical group 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- FMUYQRFTLHAARI-UHFFFAOYSA-N 2,4-bis(2-phenylpropan-2-yl)phenol Chemical compound C=1C=C(O)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 FMUYQRFTLHAARI-UHFFFAOYSA-N 0.000 description 2
- ICKWICRCANNIBI-UHFFFAOYSA-N 2,4-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(C(C)(C)C)=C1 ICKWICRCANNIBI-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- BVUXDWXKPROUDO-UHFFFAOYSA-N 2,6-di-tert-butyl-4-ethylphenol Chemical compound CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 BVUXDWXKPROUDO-UHFFFAOYSA-N 0.000 description 2
- FIGPGTJKHFAYRK-UHFFFAOYSA-N 2,6-dibromo-4-methylphenol Chemical compound CC1=CC(Br)=C(O)C(Br)=C1 FIGPGTJKHFAYRK-UHFFFAOYSA-N 0.000 description 2
- KLIDCXVFHGNTTM-UHFFFAOYSA-N 2,6-dimethoxyphenol Chemical compound COC1=CC=CC(OC)=C1O KLIDCXVFHGNTTM-UHFFFAOYSA-N 0.000 description 2
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 2
- SJSOFNCYXJUNBT-UHFFFAOYSA-N 3,4,5-trimethoxybenzoic acid Chemical compound COC1=CC(C(O)=O)=CC(OC)=C1OC SJSOFNCYXJUNBT-UHFFFAOYSA-N 0.000 description 2
- GYDPOKGOQFTYGW-UHFFFAOYSA-N 3-Methyl-2-butene-1-thiol Chemical compound CC(C)=CCS GYDPOKGOQFTYGW-UHFFFAOYSA-N 0.000 description 2
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 2
- SHSGDXCJYVZFTP-UHFFFAOYSA-N 4-ethoxybenzoic acid Chemical compound CCOC1=CC=C(C(O)=O)C=C1 SHSGDXCJYVZFTP-UHFFFAOYSA-N 0.000 description 2
- ASDLSKCKYGVMAI-UHFFFAOYSA-N 9,10-dioxoanthracene-2-carboxylic acid Chemical compound C1=CC=C2C(=O)C3=CC(C(=O)O)=CC=C3C(=O)C2=C1 ASDLSKCKYGVMAI-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- XUKVWNHGZBPBTI-UHFFFAOYSA-N CCCCCC.CCCC[Mg]CCCC Chemical compound CCCCCC.CCCC[Mg]CCCC XUKVWNHGZBPBTI-UHFFFAOYSA-N 0.000 description 2
- QELRBSHFTSRRLI-UHFFFAOYSA-N CC[Zn]CC.CCCCCC Chemical compound CC[Zn]CC.CCCCCC QELRBSHFTSRRLI-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- GIJGXNFNUUFEGH-UHFFFAOYSA-N Isopentyl mercaptan Chemical compound CC(C)CCS GIJGXNFNUUFEGH-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- RRAFCDWBNXTKKO-UHFFFAOYSA-N eugenol Chemical compound COC1=CC(CC=C)=CC=C1O RRAFCDWBNXTKKO-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- PEHSSTUGJUBZBI-UHFFFAOYSA-N indan-5-ol Chemical compound OC1=CC=C2CCCC2=C1 PEHSSTUGJUBZBI-UHFFFAOYSA-N 0.000 description 2
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 2
- RSAZYXZUJROYKR-UHFFFAOYSA-N indophenol Chemical compound C1=CC(O)=CC=C1N=C1C=CC(=O)C=C1 RSAZYXZUJROYKR-UHFFFAOYSA-N 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- QJAOYSPHSNGHNC-UHFFFAOYSA-N octadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCCCS QJAOYSPHSNGHNC-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- WFMNHCSATCWAAQ-UHFFFAOYSA-M potassium;2,2-dimethylpropanoate Chemical compound [K+].CC(C)(C)C([O-])=O WFMNHCSATCWAAQ-UHFFFAOYSA-M 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- 239000001858 (2R)-2-methylbutane-1-thiol Substances 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- PTDVPWWJRCOIIO-UHFFFAOYSA-N (4-methoxyphenyl)methanethiol Chemical compound COC1=CC=C(CS)C=C1 PTDVPWWJRCOIIO-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 1
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 description 1
- AFDXODALSZRGIH-QPJJXVBHSA-N (E)-3-(4-methoxyphenyl)prop-2-enoic acid Chemical compound COC1=CC=C(\C=C\C(O)=O)C=C1 AFDXODALSZRGIH-QPJJXVBHSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- GBVSONMCEKNESD-UHFFFAOYSA-N 1,1'-biphenyl;lithium Chemical group [Li].C1=CC=CC=C1C1=CC=CC=C1 GBVSONMCEKNESD-UHFFFAOYSA-N 0.000 description 1
- 125000004511 1,2,3-thiadiazolyl group Chemical group 0.000 description 1
- 125000004514 1,2,4-thiadiazolyl group Chemical group 0.000 description 1
- 125000004520 1,3,4-thiadiazolyl group Chemical group 0.000 description 1
- 125000003363 1,3,5-triazinyl group Chemical group N1=C(N=CN=C1)* 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 1
- KVGOXGQSTGQXDD-UHFFFAOYSA-N 1-decane-sulfonic-acid Chemical compound CCCCCCCCCCS(O)(=O)=O KVGOXGQSTGQXDD-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 1
- ARIHJNIUXPYYHW-UHFFFAOYSA-N 1-ethenyl-2-(2-ethoxyethoxy)benzene Chemical compound CCOCCOC1=CC=CC=C1C=C ARIHJNIUXPYYHW-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- OAFSVNJTNNDLBG-UHFFFAOYSA-N 1-ethenyl-3-(2-ethoxyethoxy)benzene Chemical compound CCOCCOC1=CC=CC(C=C)=C1 OAFSVNJTNNDLBG-UHFFFAOYSA-N 0.000 description 1
- LTGJSMARDKHZOY-UHFFFAOYSA-N 1-ethenyl-3-[(2-methylpropan-2-yl)oxy]benzene Chemical compound CC(C)(C)OC1=CC=CC(C=C)=C1 LTGJSMARDKHZOY-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- VMOQKKFBYIBJOJ-UHFFFAOYSA-N 1-ethenyl-4-(2-ethoxyethoxy)benzene Chemical compound CCOCCOC1=CC=C(C=C)C=C1 VMOQKKFBYIBJOJ-UHFFFAOYSA-N 0.000 description 1
- QQHQTCGEZWTSEJ-UHFFFAOYSA-N 1-ethenyl-4-propan-2-ylbenzene Chemical compound CC(C)C1=CC=C(C=C)C=C1 QQHQTCGEZWTSEJ-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- 239000005971 1-naphthylacetic acid Substances 0.000 description 1
- 229940015297 1-octanesulfonic acid Drugs 0.000 description 1
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- ZVFJWYZMQAEBMO-UHFFFAOYSA-N 1h-benzo[h]quinolin-10-one Chemical compound C1=CNC2=C3C(=O)C=CC=C3C=CC2=C1 ZVFJWYZMQAEBMO-UHFFFAOYSA-N 0.000 description 1
- WJGPNUBJBMCRQH-UHFFFAOYSA-N 2,2-dimethyl-2,3-dihydro-1-benzofuran-7-ol Chemical compound C1=CC(O)=C2OC(C)(C)CC2=C1 WJGPNUBJBMCRQH-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- UHXBMSNEECJPSX-UHFFFAOYSA-N 2,3-dihydro-1-benzofuran-7-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=C1OCC2 UHXBMSNEECJPSX-UHFFFAOYSA-N 0.000 description 1
- QZLAEIZEPJAELS-UHFFFAOYSA-N 2,4,4-trimethylpentane-2-thiol Chemical compound CC(C)(C)CC(C)(C)S QZLAEIZEPJAELS-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-N 0.000 description 1
- FFFIRKXTFQCCKJ-UHFFFAOYSA-N 2,4,6-trimethylbenzoic acid Chemical compound CC1=CC(C)=C(C(O)=O)C(C)=C1 FFFIRKXTFQCCKJ-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- PFEFOYRSMXVNEL-UHFFFAOYSA-N 2,4,6-tritert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 PFEFOYRSMXVNEL-UHFFFAOYSA-N 0.000 description 1
- WMVJWKURWRGJCI-UHFFFAOYSA-N 2,4-bis(2-methylbutan-2-yl)phenol Chemical compound CCC(C)(C)C1=CC=C(O)C(C(C)(C)CC)=C1 WMVJWKURWRGJCI-UHFFFAOYSA-N 0.000 description 1
- OPLCSTZDXXUYDU-UHFFFAOYSA-N 2,4-dimethyl-6-tert-butylphenol Chemical compound CC1=CC(C)=C(O)C(C(C)(C)C)=C1 OPLCSTZDXXUYDU-UHFFFAOYSA-N 0.000 description 1
- CHZLVSBMXZSPNN-UHFFFAOYSA-N 2,4-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C(C)=C1 CHZLVSBMXZSPNN-UHFFFAOYSA-N 0.000 description 1
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- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 125000001715 oxadiazolyl group Chemical group 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 1
- MMSLOZQEMPDGPI-UHFFFAOYSA-N p-Mentha-1,3,5,8-tetraene Chemical compound CC(=C)C1=CC=C(C)C=C1 MMSLOZQEMPDGPI-UHFFFAOYSA-N 0.000 description 1
- VDDWRTZCUJCDJM-PNHLSOANSA-N p-Naphtholbenzein Chemical compound C12=CC=CC=C2C(O)=CC=C1\C(=C\1C2=CC=CC=C2C(=O)C=C/1)C1=CC=CC=C1 VDDWRTZCUJCDJM-PNHLSOANSA-N 0.000 description 1
- AFDXODALSZRGIH-UHFFFAOYSA-N p-coumaric acid methyl ether Natural products COC1=CC=C(C=CC(O)=O)C=C1 AFDXODALSZRGIH-UHFFFAOYSA-N 0.000 description 1
- NRZWYNLTFLDQQX-UHFFFAOYSA-N p-tert-Amylphenol Chemical compound CCC(C)(C)C1=CC=C(O)C=C1 NRZWYNLTFLDQQX-UHFFFAOYSA-N 0.000 description 1
- TWBKZBJAVASNII-UHFFFAOYSA-N pentadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCS(O)(=O)=O TWBKZBJAVASNII-UHFFFAOYSA-N 0.000 description 1
- IGMQODZGDORXEN-UHFFFAOYSA-N pentadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCS IGMQODZGDORXEN-UHFFFAOYSA-N 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 125000004591 piperonyl group Chemical group C(C1=CC=2OCOC2C=C1)* 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- JCBJVAJGLKENNC-UHFFFAOYSA-M potassium ethyl xanthate Chemical compound [K+].CCOC([S-])=S JCBJVAJGLKENNC-UHFFFAOYSA-M 0.000 description 1
- RUDNWZFWWJFUSF-UHFFFAOYSA-M potassium;(4-methylphenyl)-oxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].CC1=CC=C(S([O-])(=O)=S)C=C1 RUDNWZFWWJFUSF-UHFFFAOYSA-M 0.000 description 1
- OMKVZYFAGQKILB-UHFFFAOYSA-M potassium;butoxymethanedithioate Chemical compound [K+].CCCCOC([S-])=S OMKVZYFAGQKILB-UHFFFAOYSA-M 0.000 description 1
- NGUHUDBHBUPWGZ-UHFFFAOYSA-M potassium;n,n-dibenzylcarbamodithioate Chemical compound [K+].C=1C=CC=CC=1CN(C(=S)[S-])CC1=CC=CC=C1 NGUHUDBHBUPWGZ-UHFFFAOYSA-M 0.000 description 1
- YIBBMDDEXKBIAM-UHFFFAOYSA-M potassium;pentoxymethanedithioate Chemical compound [K+].CCCCCOC([S-])=S YIBBMDDEXKBIAM-UHFFFAOYSA-M 0.000 description 1
- ZMWBGRXFDPJFGC-UHFFFAOYSA-M potassium;propan-2-yloxymethanedithioate Chemical compound [K+].CC(C)OC([S-])=S ZMWBGRXFDPJFGC-UHFFFAOYSA-M 0.000 description 1
- LKFCPWBGBPJDRC-UHFFFAOYSA-M potassium;thiobenzate Chemical compound [K+].[O-]C(=S)C1=CC=CC=C1 LKFCPWBGBPJDRC-UHFFFAOYSA-M 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- OLBCVFGFOZPWHH-UHFFFAOYSA-N propofol Chemical compound CC(C)C1=CC=CC(C(C)C)=C1O OLBCVFGFOZPWHH-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001042 pteridinyl group Chemical group N1=C(N=CC2=NC=CN=C12)* 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- HYISVWRHTUCNCS-UHFFFAOYSA-N pyrene-1-carboxylic acid Chemical compound C1=C2C(C(=O)O)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 HYISVWRHTUCNCS-UHFFFAOYSA-N 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000005400 pyridylcarbonyl group Chemical group N1=C(C=CC=C1)C(=O)* 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- VXGYRCVTBHVXMZ-UHFFFAOYSA-N quinoline-6-carboxylic acid Chemical compound N1=CC=CC2=CC(C(=O)O)=CC=C21 VXGYRCVTBHVXMZ-UHFFFAOYSA-N 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 108700004121 sarkosyl Proteins 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229910052717 sulfur Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WMXCDAVJEZZYLT-UHFFFAOYSA-N tert-butylthiol Chemical compound CC(C)(C)S WMXCDAVJEZZYLT-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical compound C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- GCZQHDFWKVMZOE-UHFFFAOYSA-N thiophen-2-ylmethanethiol Chemical compound SCC1=CC=CS1 GCZQHDFWKVMZOE-UHFFFAOYSA-N 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- BJIOGJUNALELMI-UHFFFAOYSA-N trans-isoeugenol Natural products COC1=CC(C=CC)=CC=C1O BJIOGJUNALELMI-UHFFFAOYSA-N 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- GTSMGKYOGFOSAR-UHFFFAOYSA-N tridecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCS(O)(=O)=O GTSMGKYOGFOSAR-UHFFFAOYSA-N 0.000 description 1
- IIYTXTQVIDHSSL-UHFFFAOYSA-N trimethylsilylmethanethiol Chemical compound C[Si](C)(C)CS IIYTXTQVIDHSSL-UHFFFAOYSA-N 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical class [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- ORHBXUUXSCNDEV-UHFFFAOYSA-N umbelliferone Chemical compound C1=CC(=O)OC2=CC(O)=CC=C21 ORHBXUUXSCNDEV-UHFFFAOYSA-N 0.000 description 1
- HFTAFOQKODTIJY-UHFFFAOYSA-N umbelliferone Natural products Cc1cc2C=CC(=O)Oc2cc1OCC=CC(C)(C)O HFTAFOQKODTIJY-UHFFFAOYSA-N 0.000 description 1
- SJEYEFOHSMBQIX-UHFFFAOYSA-N undecane-1-sulfonic acid Chemical compound CCCCCCCCCCCS(O)(=O)=O SJEYEFOHSMBQIX-UHFFFAOYSA-N 0.000 description 1
- CCIDWXHLGNEQSL-UHFFFAOYSA-N undecane-1-thiol Chemical compound CCCCCCCCCCCS CCIDWXHLGNEQSL-UHFFFAOYSA-N 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- Polymerisation Methods In General (AREA)
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Description
本発明は、数平均分子量が30000以上のスチレン系重合体の製造方法に関する。 The present invention relates to a method for producing a styrene polymer having a number average molecular weight of 30,000 or more.
一般に、数平均分子量30000未満のスチレン系単量体をアニオン重合する場合は、トルエンやヘキサン等の低極性溶媒とテトラヒドロフランなどのエーテル基含有極性溶媒を任意の割合で混合した混合溶媒を用いて、分子量分布(Mw/Mn)の狭い重合体を製造することができることが知られている。 In general, when anionic polymerization of a styrene monomer having a number average molecular weight of less than 30000, a mixed solvent in which a low polarity solvent such as toluene or hexane and an ether group-containing polar solvent such as tetrahydrofuran are mixed at an arbitrary ratio, It is known that polymers having a narrow molecular weight distribution (Mw / Mn) can be produced.
一方、アニオン重合反応の反応系中に添加することにより、重合反応を制御することができる添加剤が知られている。例えば、非特許文献1では、テトラヒドロフラン溶媒中、−78℃にてスチレン系単量体を重合する際に、t−ブトキシカリウムを添加することによって、側鎖部分に由来する副反応を抑制できることが開示されている。非特許文献1では、数平均分子量9240〜61400の重合体を、狭分散(分子量分布:1.02〜1.06)で製造している。 On the other hand, an additive capable of controlling the polymerization reaction by adding it to the reaction system of the anionic polymerization reaction is known. For example, in Non-Patent Document 1, when a styrene monomer is polymerized in a tetrahydrofuran solvent at −78 ° C., side reaction derived from the side chain portion can be suppressed by adding t-butoxy potassium. It is disclosed. In Non-Patent Document 1, a polymer having a number average molecular weight of 9240 to 61400 is produced with narrow dispersion (molecular weight distribution: 1.02 to 1.06).
従来の技術で、分子量が30000以上で、かつ分子量分布(Mw/Mn)が1.01〜1.30のスチレン系重合体を工業的に製造することは困難であった。
前述のように、非特許文献1に記載されている方法によれば、テトラヒドロフラン溶媒中で、数平均分子量が約60000までのスチレン系重合体を、狭分散で製造することができる。しかし、非特許文献1に開示されている製造方法は、小スケールで精密な重合を行う場合には、すぐれた方法であるものの、高分子量のスチレン系重合体を工業的に製造する方法としては採用し得なかった。
高分子量のスチレン系重合体をテトラヒドロフラン溶媒中で、アニオン重合により工業的に製造しようとすると問題が生じる。テトラヒドロフラン溶媒中では、重合体アニオンの安定性が低いために重合反応の途中で失活しやすい。そのため、高分子量かつ狭分散の重合体を製造することが困難であった。
It was difficult to industrially produce a styrene polymer having a molecular weight of 30,000 or more and a molecular weight distribution (Mw / Mn) of 1.01 to 1.30 by conventional techniques.
As described above, according to the method described in Non-Patent Document 1, a styrene polymer having a number average molecular weight of up to about 60000 can be produced in a tetrahydrofuran dispersion in a tetrahydrofuran solvent. However, the production method disclosed in Non-Patent Document 1 is an excellent method for precise polymerization on a small scale, but as a method for industrially producing a high molecular weight styrene polymer, It was not possible to adopt.
A problem arises when a high molecular weight styrene polymer is industrially produced by anionic polymerization in a tetrahydrofuran solvent. In a tetrahydrofuran solvent, since the stability of the polymer anion is low, it is easily deactivated during the polymerization reaction. Therefore, it has been difficult to produce a high molecular weight and narrowly dispersed polymer.
一般的に、トルエンのような低極性溶媒中では、テトラヒドロフランのような極性溶媒中よりも、重合体アニオンの安定性が向上することが知られている。
そこで、50重量%以上のトルエンを含むテトラヒドロフラン溶媒中でアニオン重合反応を行うと、重合体アニオンの安定性を向上させることができる。しかし、そのような溶媒系では、重合反応の速度が非常に遅くなってしまう。反応が完結しなかったり、反応が完結する場合も長時間かかるため、その結果、目的とする高分子量の重合体を狭分散で得ることが困難であった。
また、トルエンの含有量を50%以下にすると、重合体アニオンの安定性が不十分であるため、この場合も、目的とする高分子量かつ狭分子量分布の重合体を得ることが困難であった。
In general, it is known that the stability of a polymer anion is improved in a low polarity solvent such as toluene than in a polar solvent such as tetrahydrofuran.
Therefore, when the anionic polymerization reaction is carried out in a tetrahydrofuran solvent containing 50% by weight or more of toluene, the stability of the polymer anion can be improved. However, in such a solvent system, the rate of the polymerization reaction becomes very slow. Even when the reaction is not completed or when the reaction is completed, it takes a long time. As a result, it is difficult to obtain a desired high molecular weight polymer by narrow dispersion.
In addition, when the content of toluene is 50% or less, the stability of the polymer anion is insufficient, and in this case as well, it is difficult to obtain a desired high molecular weight and narrow molecular weight distribution polymer. .
本発明者らは、上記課題を解決するために鋭意研究した結果、非極性又は低極性溶媒を50重量%以上含む溶媒系において、特定の有機カリウム化合物が重合体アニオンの反応速度を上げる添加剤となることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors have found that a specific organic potassium compound increases the reaction rate of the polymer anion in a solvent system containing 50% by weight or more of a nonpolar or low polarity solvent. As a result, the present invention has been completed.
すなわち本発明は、
(1)非極性又は低極性溶媒50〜95重量%と極性溶媒50〜5重量%とからなる混合溶媒中、有機カリウム化合物の存在下、−100〜−30℃の温度でスチレン系単量体をアニオン重合することを特徴とする、数平均分子量が30000以上であり、かつ分子量分布(Mw/Mn)が1.01〜1.30であるスチレン系重合体の製造方法や、
(2)有機カリウム化合物が、式〔I〕
R−O−K+〔I〕
(式中、Rは、アルキル基、シクロアルキル基、アルキルスルホニル基、アリールスルホニル基、ヘテロアリールスルホニル基、アルキルカルボニル基、アリールカルボニル基、ヘテロアリールカルボニル基、アリール基、ヘテロアリール基、アラルキル基又はヘテロアラルキル基を表す。)
で表される化合物であることを特徴とする(1)に記載のスチレン系重合体の製造方法や、
(3)スチレン系単量体が式〔II〕
(4)非極性又は低極性溶媒が芳香族炭化水素系溶媒であることを特徴とする(1)〜(3)のいずれかに記載のスチレン系重合体の製造方法や、
(5)極性溶媒がエーテル系溶媒であることを特徴とする(1)〜(4)のいずれかに記載のスチレン系重合体の製造方法に関する。
That is, the present invention
(1) A styrene monomer in a mixed solvent composed of 50 to 95% by weight of a nonpolar or low polarity solvent and 50 to 5% by weight of a polar solvent in the presence of an organic potassium compound at a temperature of -100 to -30 ° C. Wherein the number average molecular weight is 30000 or more and the molecular weight distribution (Mw / Mn) is 1.01 to 1.30,
(2) The organic potassium compound has the formula [I]
R-O - K + [I]
Wherein R is an alkyl group, a cycloalkyl group, an alkylsulfonyl group, an arylsulfonyl group, a heteroarylsulfonyl group, an alkylcarbonyl group, an arylcarbonyl group, a heteroarylcarbonyl group, an aryl group, a heteroaryl group, an aralkyl group or Represents a heteroaralkyl group.)
The method for producing a styrenic polymer according to (1), which is a compound represented by:
(3) The styrene monomer is represented by the formula [II]
(4) The method for producing a styrenic polymer according to any one of (1) to (3), wherein the nonpolar or low polarity solvent is an aromatic hydrocarbon solvent,
(5) The method for producing a styrene polymer according to any one of (1) to (4), wherein the polar solvent is an ether solvent.
本発明の重合体の製造方法によれば、非極性又は低極性溶媒を50重量%以上含む溶媒系において、高分子量かつ狭分散のスチレン系重合体を、アニオン重合により製造することができる。 According to the method for producing a polymer of the present invention, a high molecular weight and narrowly dispersed styrene polymer can be produced by anionic polymerization in a solvent system containing 50% by weight or more of a nonpolar or low polarity solvent.
以下に、本明細書において用いられる用語の意味を記載し、本発明について更に詳細に説明する。
「アルキル基」とは、C1〜C20の直鎖状又は分岐上のアルキル基を意味する。例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、イソペンチル基、ヘキシル基、イソヘキシル基、オクチル基等が挙げられる。
「アルコキシ基」とは、C1〜C20の直鎖状又は分岐上のアルコキシ基を意味し、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、sec−ブトキシ基、イソブトキシ基、tert−ブトキシ基、ペンチルオキシ基、イソペンチルオキシ基、ヘキシルオキシ基、イソヘキシルオキシ等が挙げられる。
「アリール基」としては、例えばフェニル、ナフチル等が挙げられる。
The meanings of terms used in the present specification are described below, and the present invention is described in more detail.
“Alkyl group” means a C1-C20 linear or branched alkyl group. Examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a pentyl group, an isopentyl group, a hexyl group, an isohexyl group, and an octyl group.
The “alkoxy group” means a C1-C20 linear or branched alkoxy group, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a sec-butoxy group, an isobutoxy group, Examples thereof include a tert-butoxy group, a pentyloxy group, an isopentyloxy group, a hexyloxy group, and isohexyloxy.
Examples of the “aryl group” include phenyl, naphthyl and the like.
「ヘテロアリール基」とは、酸素原子、窒素原子及び硫黄原子からなる群より、同一若しくは異なって選ばれる1若しくは2以上、好ましくは1ないし4の複素原子を含有する5員若しくは6員の単環式へテロアリール又は該単環式へテロアリールと前記アリールが縮合した、若しくは同一若しくは異なる該単環式へテロアリールが互いに縮合した縮合環式へテロアリールを意味し、例えばピロリル、フリル、チエニル、イミダゾリル、ピラゾリル、チアゾリル、イソチアゾリル、オキサゾリル、イソオキサゾリル、トリアゾリル、テトラゾリル、オキサジアゾリル、1,2,3−チアジアゾリル、1,2,4−チアジアゾリル、1,3,4−チアジアゾリル、ピリジル、ピラジニル、ピリミジニル、ピリダジニル、1,2,4−トリアジニル、1,3,5−トリアジニル、インドリル、ベンゾフラニル、ベンゾチエニル、ベンゾイミダゾリル、ベンゾピラゾリル、ベンゾオキサゾリル、ベンゾイソオキサゾリル、ベンゾチアゾリル、ベンゾイソチアゾリル、インダゾリル、プリニル、キノリル、イソキノリル、フタラジニル、ナフチリジニル、キノキサニル、キナゾリニル、シンノリニル、プテリジニル、ピリド[3,2−b]ピリジル等が挙げられる。
「シクロアルキル基」とは、C3〜C8のシクロアルキル基を意味し、例えば、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロへキシル基等が挙げられる。
「アルキルスルホニル基」とは、スルホニルに前記アルキル基が結合した基であり、例えば、メチルスルホニル、エチルスルホニル、n−プロピルスルホニル等が挙げられる。
The “heteroaryl group” is a 5-membered or 6-membered single atom containing 1 or 2 and preferably 1 to 4 heteroatoms selected from the group consisting of oxygen atom, nitrogen atom and sulfur atom. A cyclic heteroaryl or a condensed cyclic heteroaryl in which the monocyclic heteroaryl and the aryl are condensed or the same or different monocyclic heteroaryl is condensed with each other, such as pyrrolyl, furyl, thienyl, imidazolyl, Pyrazolyl, thiazolyl, isothiazolyl, oxazolyl, isoxazolyl, triazolyl, tetrazolyl, oxadiazolyl, 1,2,3-thiadiazolyl, 1,2,4-thiadiazolyl, 1,3,4-thiadiazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, 1, 2,4-triazini 1,3,5-triazinyl, indolyl, benzofuranyl, benzothienyl, benzimidazolyl, benzopyrazolyl, benzoxazolyl, benzisoxazolyl, benzothiazolyl, benzoisothiazolyl, indazolyl, purinyl, quinolyl, isoquinolyl, phthalazinyl, naphthyridinyl Quinoxanyl, quinazolinyl, cinnolinyl, pteridinyl, pyrido [3,2-b] pyridyl and the like.
The “cycloalkyl group” means a C3 to C8 cycloalkyl group, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
The “alkylsulfonyl group” is a group in which the alkyl group is bonded to sulfonyl, and examples thereof include methylsulfonyl, ethylsulfonyl, n-propylsulfonyl and the like.
「アリールスルホニル基」とは、スルホニルに前記アリール基が結合した基であり、例えば、フェニルスルホニル、ナフチルスルホニル等が挙げられる。
「ヘテロアリールスルホニル基」とは、スルホニルに前記へテロアリール基が結合した基であり、例えば、ピロリルスルホニル、フリルスルホニル、チエニルスルホニル、イミダゾリルスルホニル等が挙げられる。
「アラルキル基」とは、前記アリールと前記アルキルが結合した基を意味し、ベンジル、1−フェニルエチル、2−フェニルエチル、1−ナフチルメチル、2−ナフチルメチル等が挙げられる。
「ヘテロアラルキル基」とは、前記へテロアリールと前記アルキルが結合した基を意味し、例えばピロリルメチル、フリルメチル、チエニルエチル、イミダゾリルエチル等が挙げられる。
「アルキルカルボニル基」とは、カルボニルに前記アルキル基が結合した基であり、例えば、アセチル、プロピオニル、イソブチリル、バレリル、イソバレリル、ピバロイル等が挙げられる。
「アリールカルボニル基」とは、カルボニルに前記アリールが結合した基であり、例えばベンゾイル、ナフチルカルボニル等が挙げられる。
「ヘテロアリールカルボニル基」とは、カルボニルに前記へテロアリール基が結合した基であり、例えば、ピロリルカルボニル、ピリジルカルボニル、チエニルカルボニル等が挙げられる。
The “arylsulfonyl group” is a group in which the aryl group is bonded to sulfonyl, and examples thereof include phenylsulfonyl and naphthylsulfonyl.
The “heteroarylsulfonyl group” is a group in which the heteroaryl group is bonded to sulfonyl, and examples thereof include pyrrolylsulfonyl, furylsulfonyl, thienylsulfonyl, imidazolylsulfonyl and the like.
The “aralkyl group” means a group in which the aryl and the alkyl are bonded, and examples thereof include benzyl, 1-phenylethyl, 2-phenylethyl, 1-naphthylmethyl, 2-naphthylmethyl and the like.
The “heteroaralkyl group” means a group in which the heteroaryl and the alkyl are bonded, and examples thereof include pyrrolylmethyl, furylmethyl, thienylethyl, imidazolylethyl and the like.
The “alkylcarbonyl group” is a group in which the alkyl group is bonded to carbonyl, and examples thereof include acetyl, propionyl, isobutyryl, valeryl, isovaleryl, pivaloyl and the like.
The “arylcarbonyl group” is a group in which the aryl is bonded to carbonyl, and examples thereof include benzoyl and naphthylcarbonyl.
The “heteroarylcarbonyl group” is a group in which the heteroaryl group is bonded to carbonyl, and examples thereof include pyrrolylcarbonyl, pyridylcarbonyl, thienylcarbonyl, and the like.
(スチレン系重合体の製造方法)
本発明の重合体の製造方法は、非極性又は低極性溶媒50〜95重量%と極性溶媒50〜5重量%とからなる混合溶媒中において、式〔I〕で表される有機カリウム化合物の存在下、−100〜−30℃の温度で、スチレン系単量体を重合するものである。
(Method for producing styrene polymer)
The method for producing a polymer of the present invention comprises the presence of an organic potassium compound represented by the formula [I] in a mixed solvent composed of 50 to 95% by weight of a nonpolar or low polarity solvent and 50 to 5% by weight of a polar solvent. Below, the styrene monomer is polymerized at a temperature of -100 to -30 ° C.
本発明の非極性又は低極性溶媒とは、ヘキサン、ヘプタンなどの脂肪族炭化水素系溶媒や、ベンゼン、トルエンなどの芳香族炭化水素系溶媒や、シクロヘキサン、シクロヘプタンなどの脂環式炭化水素系溶媒を例示することができる。これらのうち、芳香族炭化水素系溶媒が好ましく、トルエンがより好ましい。また、これらの溶媒は、1種単独で、又は2種以上の混合溶媒として用いることができる。 The nonpolar or low polarity solvent of the present invention is an aliphatic hydrocarbon solvent such as hexane or heptane, an aromatic hydrocarbon solvent such as benzene or toluene, or an alicyclic hydrocarbon solvent such as cyclohexane or cycloheptane. A solvent can be illustrated. Of these, aromatic hydrocarbon solvents are preferred, and toluene is more preferred. Moreover, these solvent can be used individually by 1 type or as a 2 or more types of mixed solvent.
本発明の極性溶媒とは、ジエチルエーテル、テトラヒドロフラン(THF)、ジオキサン、トリオキサンなどのエーテル系溶媒や、テトラメチルエチレンジアミン、ヘキサメチルホスホリックトリアミドなどの第3級アミンを例示することができる。これらのうち、エーテル系溶媒が好ましく、テトラヒドロフランがより好ましい。また、これらの溶媒は、1種単独で、又は2種以上の混合溶媒として用いることができる。 Examples of the polar solvent of the present invention include ether solvents such as diethyl ether, tetrahydrofuran (THF), dioxane and trioxane, and tertiary amines such as tetramethylethylenediamine and hexamethylphosphoric triamide. Of these, ether solvents are preferred, and tetrahydrofuran is more preferred. Moreover, these solvent can be used individually by 1 type or as a 2 or more types of mixed solvent.
本発明では、非極性又は低極性溶媒と極性溶媒との混合溶媒を使用する。本発明で使用する混合溶媒は、非極性又は低極性溶媒を50〜95重量%、極性溶媒を50〜5重量%で混合した溶媒系が好ましく、非極性又は低極性溶媒を50〜80重量%、極性溶媒を50〜20重量%で混合した溶媒系がより好ましい。具体的には、トルエンとテトラヒドロフランを混合した溶媒系やヘキサンとテトラヒドロフランを混合した溶媒系を例示することができる。 In the present invention, a mixed solvent of a nonpolar or low polarity solvent and a polar solvent is used. The mixed solvent used in the present invention is preferably a solvent system in which a nonpolar or low polarity solvent is mixed at 50 to 95% by weight and a polar solvent is mixed at 50 to 5% by weight, and the nonpolar or low polarity solvent is 50 to 80% by weight. A solvent system in which a polar solvent is mixed at 50 to 20% by weight is more preferable. Specifically, a solvent system in which toluene and tetrahydrofuran are mixed and a solvent system in which hexane and tetrahydrofuran are mixed can be exemplified.
本発明に用いられる有機カリウム化合物とは、重合溶媒に可溶で、単量体の重合を開始する能力がなければ制限はない。それらの中でも、式〔I〕R−O−K+〔I〕で表される有機カリウム化合物が好ましい。
式〔I〕中、Rは、アルキル基、シクロアルキル基、アルキルスルホニル基、アリールスルホニル基、ヘテロアリールスルホニル基、アルキルカルボニル基、アリールカルボニル基、ヘテロアリールカルボニル基、アリール基、ヘテロアリール基、アラルキル基、ヘテロアラルキル基を表し、C1〜C6アルキル基、C3〜C6シクロアルキル基、C1〜C6アルキルスルホニル基、アリールスルホニル基、ヘテロアリールスルホニル基、C1〜C6アルキルカルボニル基、アリールカルボニル基、ヘテロアリールカルボニル基、アリール基、ヘテロアリール基、アラルキル基、ヘテロアラルキル基が好ましく、C1〜C6アルキル基、アリール基、ヘテロアリール基、C1〜C6アルキルカルボニル基がより好ましい。これらの基は置換基を有していてもよく、置換基としてはC1〜C6アルキル基、C1〜C6アルコキシ基等が挙げられる。
The organic potassium compound used in the present invention is not limited as long as it is soluble in a polymerization solvent and has no ability to initiate polymerization of a monomer. Among them, the formula [I] R-O - organic potassium compounds represented by K + [I] is preferred.
In the formula [I], R represents an alkyl group, a cycloalkyl group, an alkylsulfonyl group, an arylsulfonyl group, a heteroarylsulfonyl group, an alkylcarbonyl group, an arylcarbonyl group, a heteroarylcarbonyl group, an aryl group, a heteroaryl group, an aralkyl. Group, a heteroaralkyl group, a C1-C6 alkyl group, a C3-C6 cycloalkyl group, a C1-C6 alkylsulfonyl group, an arylsulfonyl group, a heteroarylsulfonyl group, a C1-C6 alkylcarbonyl group, an arylcarbonyl group, a heteroaryl A carbonyl group, an aryl group, a heteroaryl group, an aralkyl group, and a heteroaralkyl group are preferable, and a C1-C6 alkyl group, an aryl group, a heteroaryl group, and a C1-C6 alkylcarbonyl group are more preferable. These groups may have a substituent, and examples of the substituent include a C1-C6 alkyl group and a C1-C6 alkoxy group.
有機カリウム化合物としては、
メタノール、エタノール、イソプロパノール、n−ブタノール、t−ブタノール、ステアリルアルコール、シクロヘキサノールなどのC1〜C24の直鎖、分岐または環状のアルコール類のカリウム塩や、
As an organic potassium compound,
Potassium salts of C1-C24 linear, branched or cyclic alcohols such as methanol, ethanol, isopropanol, n-butanol, t-butanol, stearyl alcohol, cyclohexanol,
2−アリルフェノール、オイゲノール、イソオイゲノール、4−tert−アミルフェノール、4−n−アミルオキシフェノール、4−(1−アダマンチル)フェノール、1−(2−ピリジルアゾ)−2−ナフトール、1−(2−チアゾリルアゾ)−2−ナフトール、2−ベンジルフェノール、4−tert−ブチルフェノール、4−n−ブチルフェノール、3−ブトキシフェノール、6−tert−ブチル−m−クレゾール、4−ヒドロキシ−3−tert−ブチルアニソール、6−tert−ブチル−o−クレゾール、3−tert−ブチルフェノール、2−sec−ブチルフェノール、6−tert−ブチル−2,4−キシレノール、2−tert−ブチル−p−クレゾール、4−(ベンジルオキシ)フェノール、2−(ベンジルオキシ)フェノール、4−ベンジリデンアミノフェノール、2−tert−ブチル−4−エチルフェノール、4−tert−ブトキシフェノール、2,4−ビス(α,α−ジメチルベンジル)フェノール、4−sec−ブチル−2,6−ジ−tert−ブチルフェノール、カルバクロール、2−(3−sec−ブチル−5−tert−ブチル−2−ヒドロキシフェニル)ベンゾトリアゾール、4−フェニルフェノール、4−α−クミルフェノール、4−シクロヘキシルフェノール、2−シクロヘキシル−5−メチルフェノール、2,6−ジ−tert−ブチル−p−クレゾール、2,4−ジ−tert−ブチルフェノール、N,N−ジエチル−3−アミノフェノール、2,6−ジイソプロピルフェノール、2,6−ジメトキシフェノール、2−ジメチルアミノメチルフェノール、2,6−ジメチルフェノール、4−tert−ブチル−2,6−ジイソプロピルフェノール、4,6−ジ−tert−ブチル−m−クレゾール、2−(3,5−ジ−tert−ブチル−2−ヒドロキシフェニル)−5−クロロベンゾトリアゾール、2,6−ジ−tert−ブチル−4−エチルフェノール、2,6−ジ−tert−ブチル−4−メトキシフェノ一ル、N,N−ジブチル−3−アミノフェノール、2,3−ジヒドロ−2,2−ジメチル−7−ヒドロキシベンゾフラン、2,6−ジ−tert−ブチル−4−ジメチルアミノメチルフェノール、2,6−ジフェニルフェノール、3,5−ジ−tert−ブチル−4−ヒドロキシベンジルホスホン酸ジエチル、2,4−ジ−tert−アミルフェノール、2,6−ジブロモ−p−クレゾール、2−エトキシ−5−(1−プロペニル)フェノール、4−ヒドロキシベンゾフェノン、ウンベリフェロン、5−ヒドロキシインダン、2−ヒドロキシ−4−メトキシベンゾフェノン、2−ヒドロキシ−4−n−オクチルオキシベンゾフェノン、8−キノリノール、4−ヘキシルオキシフェノール、4−ヘプチルオキシフェノール、2−(2−ヒドロキシ−5−メチルフェニル)ベンゾトリアゾール、2−(5−クロロ−2−ベンゾトリアゾリル)−6−tert−ブチル−p−クレゾール、2−(3,5−ジ−tert−アミル−2−ヒドロキシフェニル)ベンゾトリアゾール、2−(5−tert−ブチル−2−ヒドロキシフェニル)ベンゾトリアゾール、10−ヒドロキシベンゾ[h]キノリン、8−ヒドロキシジュロリジン、2−(2−ヒドロキシフェニル)ベンゾチアゾール、1−(3−ヒドロキシベンジル)ピペリジン、4−メトキシ−1−ナフトール、p−ナフトールベンゼイン、4−n−オクチルオキシフェノール、8−ヒドロキシ−7−プロピルキノリン、2−プロピル−4−(4−ピリジルアゾ)フェノール、2,4,6−トリ−tert−ブチルフェノール、2,4,6−トリス(ジメチルアミノメチル)フェノール、4−トリフェニルメチルフェノール、m−クレゾールインドフェノール、チモールインドフェノール、2−フェニルフェノール、ナフトールのカリウム塩などのフェノール類のカリウム塩や、 2-allylphenol, eugenol, isoeugenol, 4-tert-amylphenol, 4-n-amyloxyphenol, 4- (1-adamantyl) phenol, 1- (2-pyridylazo) -2-naphthol, 1- (2 -Thiazolylazo) -2-naphthol, 2-benzylphenol, 4-tert-butylphenol, 4-n-butylphenol, 3-butoxyphenol, 6-tert-butyl-m-cresol, 4-hydroxy-3-tert-butylanisole 6-tert-butyl-o-cresol, 3-tert-butylphenol, 2-sec-butylphenol, 6-tert-butyl-2,4-xylenol, 2-tert-butyl-p-cresol, 4- (benzyloxy) ) Phenol, 2- (benzyloxy) ) Phenol, 4-benzylideneaminophenol, 2-tert-butyl-4-ethylphenol, 4-tert-butoxyphenol, 2,4-bis (α, α-dimethylbenzyl) phenol, 4-sec-butyl-2, 6-di-tert-butylphenol, carvacrol, 2- (3-sec-butyl-5-tert-butyl-2-hydroxyphenyl) benzotriazole, 4-phenylphenol, 4-α-cumylphenol, 4-cyclohexyl Phenol, 2-cyclohexyl-5-methylphenol, 2,6-di-tert-butyl-p-cresol, 2,4-di-tert-butylphenol, N, N-diethyl-3-aminophenol, 2,6- Diisopropylphenol, 2,6-dimethoxyphenol, 2-dimethyl Ruaminomethylphenol, 2,6-dimethylphenol, 4-tert-butyl-2,6-diisopropylphenol, 4,6-di-tert-butyl-m-cresol, 2- (3,5-di-tert- Butyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2,6-di-tert-butyl-4-ethylphenol, 2,6-di-tert-butyl-4-methoxyphenol, N, N- Dibutyl-3-aminophenol, 2,3-dihydro-2,2-dimethyl-7-hydroxybenzofuran, 2,6-di-tert-butyl-4-dimethylaminomethylphenol, 2,6-diphenylphenol, 3, Diethyl 5-di-tert-butyl-4-hydroxybenzylphosphonate, 2,4-di-tert-amylphenol, 2,6-dibromo-p-cresol, 2-ethoxy-5- (1-propenyl) phenol, 4-hydroxybenzophenone, umbelliferone, 5-hydroxyindane, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy- 4-n-octyloxybenzophenone, 8-quinolinol, 4-hexyloxyphenol, 4-heptyloxyphenol, 2- (2-hydroxy-5-methylphenyl) benzotriazole, 2- (5-chloro-2-benzotria) Zolyl) -6-tert-butyl-p-cresol, 2- (3,5-di-tert-amyl-2-hydroxyphenyl) benzotriazole, 2- (5-tert-butyl-2-hydroxyphenyl) benzo Triazole, 10-hydroxybenzo [h] quinoline, 8 Hydroxyjulolidine, 2- (2-hydroxyphenyl) benzothiazole, 1- (3-hydroxybenzyl) piperidine, 4-methoxy-1-naphthol, p-naphtholbenzein, 4-n-octyloxyphenol, 8-hydroxy -7-propylquinoline, 2-propyl-4- (4-pyridylazo) phenol, 2,4,6-tri-tert-butylphenol, 2,4,6-tris (dimethylaminomethyl) phenol, 4-triphenylmethyl Potassium salts of phenols such as phenol, m-cresol indophenol, thymol indophenol, 2-phenylphenol, potassium salt of naphthol,
ピバル酸、イソ酪酸、ヘキサン酸、2−エチルヘキサン酸、デカン酸、ラウリン酸、ミリスチン酸、ステアリン酸、N−ラウロイルサルコシン、1−ナフタレン酢酸、オレイン酸、リノール酸、ソルビン酸、フェノキシ酢酸、α−メトキシフェニル酢酸、3−フェノキシプロピオン酸、4−フェノキシ酪酸、N,N−ジエチルグリシン、2−ナフトエ酸、ピコリン酸、5−フェノキシ−n−吉草酸、3−(4−メトキシフェニル)プロピオン酸、3,4−メチレンジオキシフェニル酢酸、(±)−2−(6−メトキシ−2−ナフチル)プロピオン酸、2−ナフチルオキシ酢酸、2−フェノキシプロピオン酸、アントラキノン−2−カルボン酸、4−アミルオキシ安息香酸、2−アントラセンカルボン酸、4−ブチル安息香酸、4−tert−ブチル安息香酸、4−ベンゾイル安息香酸、4−ベンジルオキシ安息香酸、4−(4−tertブチルフェニル)安息香酸、3,5−ジベンジルオキシ安息香酸、4−シクロヘキシル安息香酸、4’−デシルオキシビフェニル−4−カルボン酸、2,3−ジヒドロベンゾフラン−7−カルボン酸、4−ジエチルアミノ安息香酸、3,5−ジ−tert−ブチル安息香酸、4−(ドデシルオキシ)安息香酸、3’,4’−ジメチルベンゾフェノン−2−カルボン酸、4−(ジフェニルホスフィノ)安息香酸、9,9−ジメチルフルオレン−2−カルボン酸、4−エトキシ安息香酸、2−エトキシ−1−ナフトエ酸、フルオレセイン、9−フルオレノン−2−カルボン酸、3−フルオロ−4−n−クチルオキシ安息香酸、1−フルオレンカルボン酸、4−(4−ヘプチルフェニル)安息香酸、4−(4−ヘキシルフェニル)安息香酸、4−ヘキシル安息香酸、4−イソブチル安息香酸、6−メトキシ−2−ナフトエ酸、4−(メチルチオ)安息香酸、4−n−オクチルオキシ安息香酸、4−n−オクチル安息香酸、ピペロニル酸、2−フェノキシ安息香酸、2−フェニルチオメチル安息香酸、1−ピレンカルボン酸、2−プロポキシ安息香酸、6−キノリンカルボン酸、3,4,5−トリメトキシ安息香酸、2,4,6−トリメチル安息香酸、2−(p−トリル)安息香酸、3,4,5−トリス(ベンジルオキシ)安息香酸、4−ウンデシルオキシ安息香酸、4−メトキシけい皮酸のカリウム塩などのカルボン酸類のカリウム塩や、 Pivalic acid, isobutyric acid, hexanoic acid, 2-ethylhexanoic acid, decanoic acid, lauric acid, myristic acid, stearic acid, N-lauroylsarcosine, 1-naphthaleneacetic acid, oleic acid, linoleic acid, sorbic acid, phenoxyacetic acid, α -Methoxyphenylacetic acid, 3-phenoxypropionic acid, 4-phenoxybutyric acid, N, N-diethylglycine, 2-naphthoic acid, picolinic acid, 5-phenoxy-n-valeric acid, 3- (4-methoxyphenyl) propionic acid 3,4-methylenedioxyphenylacetic acid, (±) -2- (6-methoxy-2-naphthyl) propionic acid, 2-naphthyloxyacetic acid, 2-phenoxypropionic acid, anthraquinone-2-carboxylic acid, 4- Amyloxybenzoic acid, 2-anthracenecarboxylic acid, 4-butylbenzoic acid, 4-tert-butyl Tylbenzoic acid, 4-benzoylbenzoic acid, 4-benzyloxybenzoic acid, 4- (4-tertbutylphenyl) benzoic acid, 3,5-dibenzyloxybenzoic acid, 4-cyclohexylbenzoic acid, 4'-decyloxy Biphenyl-4-carboxylic acid, 2,3-dihydrobenzofuran-7-carboxylic acid, 4-diethylaminobenzoic acid, 3,5-di-tert-butylbenzoic acid, 4- (dodecyloxy) benzoic acid, 3 ′, 4 '-Dimethylbenzophenone-2-carboxylic acid, 4- (diphenylphosphino) benzoic acid, 9,9-dimethylfluorene-2-carboxylic acid, 4-ethoxybenzoic acid, 2-ethoxy-1-naphthoic acid, fluorescein, 9 -Fluorenone-2-carboxylic acid, 3-fluoro-4-n-octyloxybenzoic acid, 1-fluorenecarboxylic acid 4- (4-heptylphenyl) benzoic acid, 4- (4-hexylphenyl) benzoic acid, 4-hexylbenzoic acid, 4-isobutylbenzoic acid, 6-methoxy-2-naphthoic acid, 4- (methylthio) benzoic acid 4-n-octyloxybenzoic acid, 4-n-octylbenzoic acid, piperonyl acid, 2-phenoxybenzoic acid, 2-phenylthiomethylbenzoic acid, 1-pyrenecarboxylic acid, 2-propoxybenzoic acid, 6-quinoline Carboxylic acid, 3,4,5-trimethoxybenzoic acid, 2,4,6-trimethylbenzoic acid, 2- (p-tolyl) benzoic acid, 3,4,5-tris (benzyloxy) benzoic acid, 4-un Potassium salts of carboxylic acids such as decyloxybenzoic acid, potassium salt of 4-methoxycinnamic acid,
2−メルカプトベンゾチアゾール、5−メルカプト−3−フェニル−1,3,4−チアジアゾール−2−チオン、s−ブチルメルカプタン、t−ブチルメルカプタン、2−メチル−2−ブタンチオール、イソアミルメルカプタン、2−メチル−1−ブタンチオール、3−メチル−2−ブテン−1−チオール、シクロヘキサンチオール、シクロペンタンチオール、1−ヘプタンチオール、tert−オクタンチオール、1−デカンチオール、1−ウンデカンチオール、1−ドデカンチオール、1−テトラデカンチオール、1−ヘキサデカンチオール、n−ペンタデシルメルカプタン、1−オクタデカンチオール、tert−テトラデカンチオール、2−ジメチルアミノエタンチオール、2−ジエチルアミノエタンチオール、2−ジイソプロピルアミノエタンチオール、ベンジルメルカプタン、4−メトキシベンジルメルカプタン、2−フェニルエチルメルカプタン、2−メルカプトチアゾリン、2−メルカプト−5−チアゾリドン、2−メルカプト−5−メチルチオ−1,3,4−チアジアゾール、2−メチルテトラヒドロフラン−3−チオール、(2−メルカプトエチル)ピラジン、4−ピリジンエタンチオール、トリメチルシリルメタンチオール、2−チオフェンメタンチオール、1−(4−エトキシフェニル)−5−メルカプト−1H−テトラゾールのカリウム塩などのチオアルコール類のカリウム塩や、 2-mercaptobenzothiazole, 5-mercapto-3-phenyl-1,3,4-thiadiazole-2-thione, s-butyl mercaptan, t-butyl mercaptan, 2-methyl-2-butanethiol, isoamyl mercaptan, 2- Methyl-1-butanethiol, 3-methyl-2-butene-1-thiol, cyclohexanethiol, cyclopentanethiol, 1-heptanethiol, tert-octanethiol, 1-decanethiol, 1-undecanethiol, 1-dodecanethiol 1-tetradecanethiol, 1-hexadecanethiol, n-pentadecyl mercaptan, 1-octadecanethiol, tert-tetradecanethiol, 2-dimethylaminoethanethiol, 2-diethylaminoethanethiol, 2-diisopropyl Minoethanethiol, benzyl mercaptan, 4-methoxybenzyl mercaptan, 2-phenylethyl mercaptan, 2-mercaptothiazoline, 2-mercapto-5-thiazolidone, 2-mercapto-5-methylthio-1,3,4-thiadiazole, 2- Methyltetrahydrofuran-3-thiol, (2-mercaptoethyl) pyrazine, 4-pyridineethanethiol, trimethylsilylmethanethiol, 2-thiophenemethanethiol, potassium salt of 1- (4-ethoxyphenyl) -5-mercapto-1H-tetrazole Potassium salts of thioalcohols such as
チオフェノール、4−メチルチオフェノール、4−(メチルチオ)ベンゼンチオール、4−t−ブチルチオフェノール、4−イソプロピルベンゼンチオール、5−tert−ブチル−2−メチルベンゼンチオール、4−メトキシベンゼンチオール、4−クロロベンゼンチオール、2,5−ジメチルベンゼンチオール、2,4−ジメチルベンゼンチオール、3,4−ジメチルベンゼンチオール、3,4−ジメトキシベンゼンチオール、3−エトキシベンゼンチオール、2−エチルベンゼンチオール、4−エチルベンゼンチオール、2−ナフタレンチオールのカリウム塩などのチオフェノール類のカリウム塩や、 Thiophenol, 4-methylthiophenol, 4- (methylthio) benzenethiol, 4-t-butylthiophenol, 4-isopropylbenzenethiol, 5-tert-butyl-2-methylbenzenethiol, 4-methoxybenzenethiol, 4- Chlorobenzenethiol, 2,5-dimethylbenzenethiol, 2,4-dimethylbenzenethiol, 3,4-dimethylbenzenethiol, 3,4-dimethoxybenzenethiol, 3-ethoxybenzenethiol, 2-ethylbenzenethiol, 4-ethylbenzenethiol , Potassium salts of thiophenols such as 2-naphthalenethiol potassium salt,
イソプロピルキサントゲン酸カリウム、エチルキサントゲン酸カリウム、ブチルキサントゲン酸カリウム、アミルキサントゲン酸カリウム、ジベンジルジチオカルバミン酸カリウム、チオ安息香酸のカリウム塩などのチオカルボン酸類のカリウム塩や、
1−ブタンスルホン酸、1−ヘキサンスルホン酸、1−ヘプタンスルホン酸、1−オクタンスルホン酸、1−ノナンスルホン酸、1−デカンスルホン酸、1−ウンデカンスルホン酸、1−ペンタデカンスルホン酸、1−ドデカンスルホン酸、1−トリデカンスルホン酸、1−オクタデカンスルホン酸、ドデシル硫酸、1−ヘキサデカンスルホン酸、ヘプタデカフルオロ−1−オクタンスルホン酸、アントラキノン−2−スルホン酸、9,10−ジメトキシアントラセン−2−スルホン酸、2,4−ジメチルベンゼンスルホン酸、メシチレンスルホン酸、4−n−オクチルベンゼンスルホン酸、2−モルホリノエタンスルホン酸、2−モルホリノプロパンスルホン酸、3−(トリメチルシリル)−1−プロパンスルホン酸、ダンシル酸、ドデシルベンゼンスルホン酸のカリウム塩などのスルホン酸類のカリウム塩や、
Potassium salts of thiocarboxylic acids such as potassium isopropylxanthate, potassium ethylxanthate, potassium butylxanthate, potassium amylxanthate, potassium dibenzyldithiocarbamate, potassium thiobenzoate,
1-butanesulfonic acid, 1-hexanesulfonic acid, 1-heptanesulfonic acid, 1-octanesulfonic acid, 1-nonanesulfonic acid, 1-decanesulfonic acid, 1-undecanesulfonic acid, 1-pentadecanesulfonic acid, 1- Dodecanesulfonic acid, 1-tridecanesulfonic acid, 1-octadecanesulfonic acid, dodecylsulfuric acid, 1-hexadecanesulfonic acid, heptadecafluoro-1-octanesulfonic acid, anthraquinone-2-sulfonic acid, 9,10-dimethoxyanthracene- 2-sulfonic acid, 2,4-dimethylbenzenesulfonic acid, mesitylenesulfonic acid, 4-n-octylbenzenesulfonic acid, 2-morpholinoethanesulfonic acid, 2-morpholinopropanesulfonic acid, 3- (trimethylsilyl) -1-propane Sulfonic acid, dansylic acid, dodecy And potassium sulfonic acids salts such as potassium salt of benzenesulfonic acid,
p−トルエンチオスルホン酸のカリウム塩などのチオスルホン酸類のカリウム塩や、
りん酸モノドデシル、りん酸ジフェニル、りん酸ジイソプロピル、りん酸ジブチル、りん酸ジオレイル、りん酸ジ2−エチルヘキシル、りん酸ジデシル、りん酸ジベンジルのカリウム塩などのリン酸類のカリウム塩や、
カルバゾール、インドール、フェノチアジン、フェノオキサジン、ヘキサメチルジシラザン、フタルイミド、1,2,4−トリアゾール、6−メチル−1,2,3−オキサチアジン−4(3H)−オン、2,2−ジオキサイド、チオモルホリン、モルホリンのカリウム塩などの窒素化合物類のカリウム塩や、
テトラキス(4−クロロフェニル)ほう酸、トリス(3,5−ジメチルピラゾール−1−イル)ボロヒドリドのカリウム塩などのその他類のカリウム塩を挙げることができる。
thiosulfonic acid potassium salt such as p-toluenethiosulfonic acid potassium salt,
Phosphoric acid potassium salts such as monododecyl phosphate, diphenyl phosphate, diisopropyl phosphate, dibutyl phosphate, dioleyl phosphate, di-2-ethylhexyl phosphate, didecyl phosphate, potassium salt of dibenzyl phosphate,
Carbazole, indole, phenothiazine, phenoxazine, hexamethyldisilazane, phthalimide, 1,2,4-triazole, 6-methyl-1,2,3-oxathiazin-4 (3H) -one, 2,2-dioxide, Potassium salts of nitrogen compounds such as thiomorpholine, potassium salt of morpholine,
Other potassium salts such as tetrakis (4-chlorophenyl) boric acid and tris (3,5-dimethylpyrazol-1-yl) borohydride can be mentioned.
本発明に用いられるカリウム化合物の使用量は、重合に影響しない範囲内で任意に使用できるが、具体的には開始剤に対してモル比で10モル%以上、20倍モル以下であるのが好ましく、更に好ましくは50モル%以上、5倍モル以下である。10モル%より小さい場合には、重合速度が遅くなり、重合体製造の際に分子量や分子量分布が制御された重合体を安定的に再現性よく製造できない場合があり、20倍モルより大きい場合には、重合液に相溶しなかったり、重合反応時の成長速度が著しく低下する場合がある。
有機カリウム化合物を反応系内に添加する順序は特に問わない。スチレン系単量体の重合反応中に添加してもよく、スチレン系単量体を添加する前に反応系内に添加してもよい。
有機カリウム化合物を添加することにより、通常、重合反応の速度が遅い溶媒系(非極性又は低極性溶媒が50〜80重量%以上含まれる系)においても、重合反応速度を促進することができる。その結果、重合反応が速やかに完結し、狭分散の重合体を得ることができる。
The amount of the potassium compound used in the present invention can be arbitrarily used within a range that does not affect the polymerization. Specifically, it is 10 mol% or more and 20 times mol or less in terms of molar ratio to the initiator. More preferably, it is 50 mol% or more and 5 times mol or less. If it is less than 10 mol%, the polymerization rate will be slow, and there may be cases where a polymer with controlled molecular weight and molecular weight distribution cannot be produced stably and with good reproducibility. May not be compatible with the polymerization solution, or the growth rate during the polymerization reaction may be significantly reduced.
The order of adding the organic potassium compound to the reaction system is not particularly limited. It may be added during the polymerization reaction of the styrene monomer, or may be added to the reaction system before the styrene monomer is added.
By adding an organic potassium compound, the polymerization reaction rate can usually be accelerated even in a solvent system having a slow polymerization reaction rate (a system containing 50 to 80% by weight or more of a nonpolar or low-polar solvent). As a result, the polymerization reaction is completed quickly, and a narrowly dispersed polymer can be obtained.
スチレン系単量体としては、アニオン重合性不飽和結合が芳香族炭化水素に結合した化合物であれば特に制限されないが、式〔II〕 The styrenic monomer is not particularly limited as long as it is a compound in which an anionic polymerizable unsaturated bond is bonded to an aromatic hydrocarbon, but the formula [II]
で表される化合物が好ましい。スチレン系単量体は、1種単独で、又は2種以上を組み合わせて用いることができる。
式〔II〕中、R1は、水素原子又はアルキル基を表し、水素原子又はC1〜C6アルキル基が好ましい。R2は、アルキル基、アルコキシ基、t−ブトキシカルボニル基、t−ブトキシカルボニルメチル基、又はテトラヒドロピラニル基を表し、C1〜C6アルキル基、C1〜6アルコキシ基、t−ブトキシカルボニル基、t−ブトキシカルボニルメチル基又はテトラヒドロピラニル基が好ましい。pは0〜5の整数を表し、pが2以上の場合、R2は同一又は相異なっていてもよい。pとしては、1〜3が好ましい。
R1のアルキル基、R2のアルキル基、アルコキシ基は置換基を有していてもよく、置換基としては、C1〜C6アルキル基、C1〜C6アルコキシ基、フェニル基等を挙げることができる。
The compound represented by these is preferable. A styrene-type monomer can be used individually by 1 type or in combination of 2 or more types.
In the formula [II], R 1 represents a hydrogen atom or an alkyl group, preferably a hydrogen atom or a C1-C6 alkyl group. R 2 represents an alkyl group, an alkoxy group, a t-butoxycarbonyl group, a t-butoxycarbonylmethyl group, or a tetrahydropyranyl group, and is a C1-C6 alkyl group, a C1-6 alkoxy group, a t-butoxycarbonyl group, t -A butoxycarbonylmethyl group or a tetrahydropyranyl group is preferred. p represents an integer of 0 to 5, and when p is 2 or more, R 2 may be the same or different. As p, 1-3 are preferable.
The alkyl group of R 1, the alkyl group of R 2 , and the alkoxy group may have a substituent, and examples of the substituent include a C1 to C6 alkyl group, a C1 to C6 alkoxy group, and a phenyl group. .
式〔II〕で表される化合物として、具体的には、スチレン、α−メチルスチレン、α−メチル−p−メチルスチレン、p−メチルスチレン、m−メチルスチレン、o−メチルスチレン、p−エチルスチレン、2,4−ジメチルスチレン、2,5−ジメチルスチレン、p−イソプロピルスチレン、2,4,6−トリイソプロピルスチレン、p−t−ブトキシスチレン、p−t−ブトキシ−α−メチルスチレン、m−t−ブトキシスチレン、p−t−ブトキシカルボニルスチレン、p−t−ブトキシカルボニルメチルスチレン、o−1−エトキシエトキシスチレン、m−1−エトキシエトキシスチレン、p−1−エトキシエトキシスチレン等を例示することができる。スチレン系単量体は1種単独で、又は2種以上を組み合わせて用いることができる。 Specific examples of the compound represented by the formula [II] include styrene, α-methylstyrene, α-methyl-p-methylstyrene, p-methylstyrene, m-methylstyrene, o-methylstyrene, p-ethyl. Styrene, 2,4-dimethylstyrene, 2,5-dimethylstyrene, p-isopropylstyrene, 2,4,6-triisopropylstyrene, pt-butoxystyrene, pt-butoxy-α-methylstyrene, m -T-butoxystyrene, pt-butoxycarbonylstyrene, pt-butoxycarbonylmethylstyrene, o-1-ethoxyethoxystyrene, m-1-ethoxyethoxystyrene, p-1-ethoxyethoxystyrene, etc. be able to. Styrenic monomers can be used alone or in combination of two or more.
本発明では、アニオン重合開始剤で重合反応を開始する。アニオン重合開始剤としては、求核剤であって、アニオン重合性モノマーの重合を開始させる働きを有するものであれば特に制約はなく、例えば、アルカリ金属、有機アルカリ金属などを使用することができる。
アルカリ金属の具体例としては、リチウム、ナトリウム、カリウム、セシウムなどが挙げられる。
有機アルカリ金属としては、上記アルカリ金属のアルキル化物、アリル化物、アリール化物などが挙げられる。具体的には、エチルリチウム、n−ブチルリチウム、sec−ブチルリチウム、t−ブチルリチウム、エチルナトリウム、リチウムビフェニル、リチウムナフタレン、リチウムトリフェニル、ナトリウムナフタレン、1,1−ジフェニルヘキシルリチウム、1,1−ジフェニル−3−メチルペンチルリチウム、1,4−ジリチオ−2−ブテン、1,6−ジリチオヘキサン、ポリスチリルリチウムなどを使用できる。これらのアニオン重合開始剤は1種単独で、あるいは2種以上を組み合わせて用いることができる。
In the present invention, the polymerization reaction is started with an anionic polymerization initiator. The anionic polymerization initiator is not particularly limited as long as it is a nucleophile and has a function of initiating polymerization of an anion polymerizable monomer. For example, an alkali metal, an organic alkali metal, or the like can be used. .
Specific examples of the alkali metal include lithium, sodium, potassium, cesium and the like.
Examples of the organic alkali metal include alkylated products, allylated products, and arylated products of the above alkali metals. Specifically, ethyl lithium, n-butyl lithium, sec-butyl lithium, t-butyl lithium, ethyl sodium, lithium biphenyl, lithium naphthalene, lithium triphenyl, sodium naphthalene, 1,1-diphenylhexyl lithium, 1,1 -Diphenyl-3-methylpentyl lithium, 1,4-dilithio-2-butene, 1,6-dilithiohexane, polystyryl lithium and the like can be used. These anionic polymerization initiators can be used alone or in combination of two or more.
アニオン重合開始剤の使用量は、用いるアニオン重合性モノマーに対して、通常0.001〜0.2当量、好ましくは0.005〜0.1当量である。この範囲のアニオン重合開始剤を用いることによって、目的とする重合体を収率よく製造することができる。
重合開始剤の使用量は、用いるスチレン系単量体に対して、通常0.0001〜0.2当量、好ましくは0.0005〜0.1当量である。この範囲の重合開始剤を用いることによって、目的とする重合体を収率よく製造することができる。
本発明における重合温度は、移動反応や停止反応などの副反応が起こらず、単量体が消費され重合が完結する温度範囲であれば特に制限されないが、−100℃〜−30℃の温度範囲で行われるのが好ましい。さらに好ましくは−60℃〜−30℃の温度範囲で行われることが好ましい。
The usage-amount of an anionic polymerization initiator is 0.001-0.2 equivalent normally with respect to the anionic polymerizable monomer to be used, Preferably it is 0.005-0.1 equivalent. By using an anionic polymerization initiator in this range, the target polymer can be produced with high yield.
The usage-amount of a polymerization initiator is 0.0001-0.2 equivalent normally with respect to the styrene-type monomer to be used, Preferably it is 0.0005-0.1 equivalent. By using a polymerization initiator in this range, the target polymer can be produced with good yield.
The polymerization temperature in the present invention is not particularly limited as long as no side reaction such as transfer reaction or termination reaction occurs, and the monomer is consumed and the polymerization is completed, but the temperature range is from -100 ° C to -30 ° C. Is preferably carried out. More preferably, it is carried out in a temperature range of −60 ° C. to −30 ° C.
また、単量体の重合溶媒に対する濃度は、特に制限されないが、通常1〜40重量%の範囲であり、特に5〜25重量%の範囲が好ましい。
本発明で製造される重合体の分子量は、GPC測定による数平均分子量が30000以上であるのが好ましい。
本発明においては、非極性又は低極性溶媒50〜95重量%と極性溶媒50〜5重量%とからなる混合溶媒系においても、−100〜−30℃の温度で、重合速度をコントロールして、高分子量(分子量30000以上)かつ狭分散性(分子量分布:1.01〜1.30)を示すスチレン系重合体を製造することができる。
[実施例]
以下実施例を用いて本発明を詳細に説明するが、本発明の技術的範囲はこれらの例示に限定されるものではない。
The concentration of the monomer with respect to the polymerization solvent is not particularly limited, but is usually in the range of 1 to 40% by weight, and particularly preferably in the range of 5 to 25% by weight.
As for the molecular weight of the polymer produced in the present invention, the number average molecular weight by GPC measurement is preferably 30000 or more.
In the present invention, even in a mixed solvent system consisting of 50 to 95% by weight of a nonpolar or low polarity solvent and 50 to 5% by weight of a polar solvent, the polymerization rate is controlled at a temperature of −100 to −30 ° C., A styrenic polymer having a high molecular weight (molecular weight of 30000 or more) and narrow dispersibility (molecular weight distribution: 1.01-1.30) can be produced.
[Example]
EXAMPLES Hereinafter, although this invention is demonstrated in detail using an Example, the technical scope of this invention is not limited to these illustrations.
窒素雰囲気下、テトラヒドロフラン(100g)とトルエン(200g)の混合溶媒を−40℃に冷却し、n−ブチルリチウム溶液(1.86g、4mmol)を加えた。その後、テトラヒドロフラン(30g)にp−t−ブトキシスチレン(64.07g、364mmol)を加え、ジブチルマグネシウムヘキサン溶液(0.97g、1mmol)で脱水した溶液を8分かけて滴下した。続いて、テトラヒドロフラン(20g)にピバル酸カリウム(0.14g、1mmol)を加え、ジブチルマグネシウムヘキサン溶液(0.34g、0.5mmol)で脱水した溶液を加え、30分攪拌後、メタノール(1.70g)を加えキリングした。この溶液をGPCにて測定すると、分子量(Mn)68000、分散度1.15の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。 Under a nitrogen atmosphere, a mixed solvent of tetrahydrofuran (100 g) and toluene (200 g) was cooled to −40 ° C., and an n-butyllithium solution (1.86 g, 4 mmol) was added. Thereafter, pt-butoxystyrene (64.07 g, 364 mmol) was added to tetrahydrofuran (30 g), and a solution dehydrated with dibutyl magnesium hexane solution (0.97 g, 1 mmol) was added dropwise over 8 minutes. Subsequently, potassium pivalate (0.14 g, 1 mmol) was added to tetrahydrofuran (20 g), and a solution dehydrated with dibutylmagnesium hexane solution (0.34 g, 0.5 mmol) was added. After stirring for 30 minutes, methanol (1. 70 g) was added and killed. When this solution was measured by GPC, a polymer having a molecular weight (Mn) of 68000 and a dispersity of 1.15 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
窒素雰囲気下、テトラヒドロフラン(200g)とトルエン(400g)の混合溶媒を−40℃に冷却し、n−ブチルリチウム溶液(1.96g、5mmol)を加えた。その後、テトラヒドロフラン(50g)にp−t−ブトキシスチレン(127.13g、721mmol)を加え、ジブチルマグネシウムヘキサン溶液(1.15g、2mmol)で脱水した溶液を20分かけて滴下した。続いて、12%t−ブトキシカリウム/THF溶液(1.75g、2mmol)を加え、30分攪拌後、メタノール(1.53g)を加えキリングした。この溶液をGPCにて測定すると、分子量(Mn)47000、分散度1.07の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。 Under a nitrogen atmosphere, a mixed solvent of tetrahydrofuran (200 g) and toluene (400 g) was cooled to −40 ° C., and an n-butyllithium solution (1.96 g, 5 mmol) was added. Thereafter, pt-butoxystyrene (127.13 g, 721 mmol) was added to tetrahydrofuran (50 g), and a solution dehydrated with dibutylmagnesium hexane solution (1.15 g, 2 mmol) was added dropwise over 20 minutes. Subsequently, 12% t-butoxypotassium / THF solution (1.75 g, 2 mmol) was added, and after stirring for 30 minutes, methanol (1.53 g) was added and killed. When this solution was measured by GPC, a polymer having a molecular weight (Mn) of 47000 and a dispersity of 1.07 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
窒素雰囲気下、テトラヒドロフラン(200g)とトルエン(400g)の混合溶媒を−40℃に冷却し、n−ブチルリチウム溶液(1.75g、4mmol)を加えた。ジフェニルエチレン(0.57g、3mmol)を加え、15分間攪拌し、12%t−ブトキシカリウム/THF溶液(0.97g、1mmol)を加えた。次に、テトラヒドロフラン(50g)にp−t−ブトキシスチレン(126.98g、720mmol)を加え、ジブチルマグネシウムヘキサン溶液(1.25g、2mmol)で脱水した溶液を20分間かけて滴下し、30分間攪拌後、メタノール(1.95g)を加えキリングした。この溶液をGPCにて測定すると、分子量(Mn)121000、分散度1.25の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。 Under a nitrogen atmosphere, a mixed solvent of tetrahydrofuran (200 g) and toluene (400 g) was cooled to −40 ° C., and an n-butyllithium solution (1.75 g, 4 mmol) was added. Diphenylethylene (0.57 g, 3 mmol) was added, stirred for 15 minutes, and 12% t-butoxypotassium / THF solution (0.97 g, 1 mmol) was added. Next, pt-butoxystyrene (126.98 g, 720 mmol) was added to tetrahydrofuran (50 g), and a solution dehydrated with dibutyl magnesium hexane solution (1.25 g, 2 mmol) was added dropwise over 20 minutes, followed by stirring for 30 minutes. Thereafter, methanol (1.95 g) was added and killed. When this solution was measured by GPC, a polymer having a molecular weight (Mn) of 121000 and a dispersity of 1.25 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
窒素雰囲気下、テトラヒドロフラン(30g)とトルエン(270g)の混合溶媒を−40℃に冷却し、n−ブチルリチウム溶液(1.61g、4mmol)を加えた。その後、テトラヒドロフラン(30g)にp−t−ブトキシスチレン(63.73g、362mmol)を加え、ジブチルマグネシウムヘキサン溶液(0.99g、1mmol)で脱水した溶液を20分間かけて滴下した。続いて、12%t−ブトキシカリウム/THF溶液(0.50g、0.5mmol)を加え、30分間攪拌後、メタノール(1.99g)を加えキリングした。この溶液をGPCにて測定すると分子量71000、分散度1.05の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。 Under a nitrogen atmosphere, a mixed solvent of tetrahydrofuran (30 g) and toluene (270 g) was cooled to −40 ° C., and an n-butyllithium solution (1.61 g, 4 mmol) was added. Thereafter, pt-butoxystyrene (63.73 g, 362 mmol) was added to tetrahydrofuran (30 g), and a solution dehydrated with dibutylmagnesium hexane solution (0.99 g, 1 mmol) was added dropwise over 20 minutes. Subsequently, 12% t-butoxy potassium / THF solution (0.50 g, 0.5 mmol) was added, and after stirring for 30 minutes, methanol (1.99 g) was added and killed. When this solution was measured by GPC, a polymer having a molecular weight of 71000 and a dispersity of 1.05 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
窒素雰囲気下、テトラヒドロフラン(200g)とトルエン(400g)の混合溶媒を−40℃に冷却し、n−ブチルリチウム溶液(1.66g、4mmol)および12%t−ブトキシカリウム/THF溶液(0.86g、1mmol)を加えた。その後、テトラヒドロフラン(40g)にp−t−ブトキシスチレン(52.71g、299mmol)とスチレン(31.35g、301mmol)を加え、ジブチルマグネシウムヘキサン溶液(0.63g、1mmol)で脱水した溶液を20分間かけて滴下し、15分間攪拌した。この溶液をGPCにて測定すると分子量(Mn)67000、分散度1.11の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。
続いて、3.71%塩化リチウム/テトラヒドロフラン溶液(3.23g、3mmol)にジフェニルエチレン(0.55g、3mmol)を加え、ジエチル亜鉛ヘキサン溶液(0.35g、0.5mmol)で脱水した溶液を加え15分間攪拌し、−50℃に冷却した。次に、テトラヒドロフラン(15g)にメチルメタクリレート(16.24g、162mmol)を加え、ジエチル亜鉛ヘキサン溶液(0.50g、1mmol)で脱水した溶液を7分間かけて滴下し、滴下終了後40分間攪拌し、メタノール(1.97g)を加えキリングした。この溶液を、GPCで測定すると分子量(Mn)74000、分散度1.14の重合体が生成していた。また、この溶液をガスクロマトグラフィーで測定すると単量体は残存していなかった。
Under a nitrogen atmosphere, a mixed solvent of tetrahydrofuran (200 g) and toluene (400 g) was cooled to −40 ° C., and n-butyllithium solution (1.66 g, 4 mmol) and 12% t-butoxypotassium / THF solution (0.86 g). 1 mmol) was added. Then, pt-butoxystyrene (52.71 g, 299 mmol) and styrene (31.35 g, 301 mmol) were added to tetrahydrofuran (40 g), and the solution dehydrated with dibutylmagnesium hexane solution (0.63 g, 1 mmol) was added for 20 minutes. Over a period of 15 minutes. When this solution was measured by GPC, a polymer having a molecular weight (Mn) of 67000 and a dispersity of 1.11 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
Subsequently, diphenylethylene (0.55 g, 3 mmol) was added to a 3.71% lithium chloride / tetrahydrofuran solution (3.23 g, 3 mmol), and a solution dehydrated with a diethylzinc hexane solution (0.35 g, 0.5 mmol) was added. The mixture was stirred for 15 minutes and cooled to -50 ° C. Next, methyl methacrylate (16.24 g, 162 mmol) was added to tetrahydrofuran (15 g), and a solution dehydrated with diethylzinc hexane solution (0.50 g, 1 mmol) was added dropwise over 7 minutes. After completion of the addition, the mixture was stirred for 40 minutes. Then, methanol (1.97 g) was added and killed. When this solution was measured by GPC, a polymer having a molecular weight (Mn) of 74000 and a dispersity of 1.14 was produced. Further, when this solution was measured by gas chromatography, no monomer remained.
[比較例1]
ピバル酸カリウムを加えなったこと以外、実施例1と同条件下で反応を行うと、キリング後の溶液には単量体が残存していた。
[Comparative Example 1]
When the reaction was carried out under the same conditions as in Example 1 except that potassium pivalate was not added, the monomer remained in the solution after killing.
Claims (5)
R−O−K+〔I〕
(式中、Rは、アルキル基、シクロアルキル基、アルキルスルホニル基、アリールスルホニル基、ヘテロアリールスルホニル基、アルキルカルボニル基、アリールカルボニル基、ヘテロアリールカルボニル基、アリール基、ヘテロアリール基、アラルキル基又はヘテロアラルキル基を表す。)で表される化合物であることを特徴とする請求項1に記載のスチレン系重合体の製造方法。 The organic potassium compound has the formula [I]
R-O - K + [I]
Wherein R is an alkyl group, a cycloalkyl group, an alkylsulfonyl group, an arylsulfonyl group, a heteroarylsulfonyl group, an alkylcarbonyl group, an arylcarbonyl group, a heteroarylcarbonyl group, an aryl group, a heteroaryl group, an aralkyl group or The method for producing a styrenic polymer according to claim 1, wherein the compound is represented by the following formula:
The method for producing a styrene polymer according to any one of claims 1 to 4, wherein the polar solvent is an ether solvent.
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