JP5622435B2 - Automatic analyzer - Google Patents

Description

  The present invention relates to an automatic analyzer that generates a reaction solution by dispensing a sample and a reagent into a reaction vessel and analyzes components of the reaction solution.

  After analyzing the components of the reaction solution, the reaction solution as a waste liquid is discharged. Further, after discharging the waste liquid, the reaction container in which the waste liquid has been placed is washed.

  As a conventional technique for cleaning the reaction container, first, after the waste liquid in the reaction container is discharged, the cleaning liquid is supplied into the reaction container, and then the cleaning liquid is discharged from the reaction container. There is a technique for cleaning the reaction vessel by repeating the supply and discharge of the cleaning liquid for several cycles. Secondly, there is a technique for cleaning the reaction container by supplying and discharging different types of cleaning liquid into the reaction container as the next cleaning after the completion of the first cleaning. Third, when washing the reaction vessel, there is a technique in which the washing solution is once stored in the reaction vessel and then the washing solution is discharged from the reaction vessel. Fourth, there is a technique in which when washing a reaction vessel, the washing solution is discharged while being supplied into the reaction vessel, and the washing solution is not stored in the reaction vessel. Fifth, a technique combining the first to fourth conventional techniques is also conceivable.

  As the second conventional technique for supplying and discharging different types of cleaning liquid into the reaction vessel, a plurality of detergent bottles containing a plurality of cleaning liquids, a plurality of flow paths through which the plurality of cleaning liquids circulate, and a plurality of cleaning liquids are provided. A plurality of pumps that inhale from a plurality of detergent bottles and discharge to a plurality of flow paths, a cleaning nozzle that is connected to each of the plurality of flow paths and cleans the reaction container with each cleaning liquid that flows through each flow path, and a plurality of detergent pumps And a valve for switching the connection between the plurality of flow paths (for example, Patent Document 1).

  As the third prior art in which the cleaning liquid is once stored in the reaction vessel and then discharged from the reaction vessel, a control unit can be configured by setting a cleaning cycle time longer than a normal cleaning cycle time via the operation unit. However, the normal cleaning cycle time is subtracted from the cleaning cycle time set via the operation unit to calculate the suction waiting time, and this data is stored and controlled in the memory. When the measurement end detection unit detects the end of measurement such as the end of a day of measurement, the control unit discharges the cleaning liquid discharged to each reaction container based on the suction waiting time data stored in the memory. The cleaning unit is controlled so that (and pure water) is sucked after the suction waiting time elapses from the discharge time. Thereby, since the discharged cleaning liquid or the like can be kept in the reaction vessel for the waiting time of suction, a high cleaning effect can be obtained and inconvenience that dirt accumulates in the reaction vessel can be prevented (for example, Patent Document 2).

  Further, it is known that the waste liquid remains in the vicinity of the liquid level of the waste liquid in the reaction vessel after the waste liquid is discharged. After washing the reaction vessel, the remaining waste liquid becomes a factor of measurement failure and a factor of reducing measurement accuracy when analyzing the components of the reaction solution.

JP 2009-115661 A JP 2001-289864 A

  However, in the first to fifth conventional techniques described in the above patent documents, when the level of the cleaning liquid supplied to the reaction vessel is lower than the level of the waste liquid, the waste liquid remains in the reaction vessel, Cause measurement failure and decrease measurement accuracy. On the other hand, if the liquid level of the cleaning liquid supplied to the reaction vessel is too higher than the liquid level of the waste liquid, there is a problem that the cleaning liquid is wasted and the running cost increases.

  An object of the present invention is to solve the above problems, and to provide an automatic analyzer capable of preventing the occurrence of measurement failure due to residual liquid waste and the reduction in measurement accuracy and reducing the running cost. To do.

In order to solve the above-described problems, the automatic analyzer according to the embodiment generates a reaction solution by dispensing a sample and a reagent into a reaction container, and analyzes components of the reaction solution. A plurality of stages of cleaning positions are provided along the moving direction of the reaction vessel, and includes a suction mechanism, a supply mechanism, and a drive control unit. The suction mechanism is disposed at the plurality of stages of washing positions, and discharges the reaction solution after the analysis or the waste liquid that is a washing solution after washing the reaction vessel from the inside of the reaction vessel. The supply mechanism is disposed at the plurality of stages of cleaning positions, has a supply port, and supplies the cleaning liquid from the outside into the reaction vessel through the supply port. The drive control unit is configured to wash the reaction vessel over a plurality of stages, and to increase the position of the cleaning liquid as the number of times of washing in the same stage proceeds , and between the plurality of stages. The supply mechanism is controlled so that the position of the liquid level is the same when the number of times of washing is the same .

  According to the present invention, it is possible to prevent the occurrence of measurement failure due to residual waste liquid and the decrease in measurement accuracy, thereby reducing the running cost.

According to the first aspect of the present invention, it becomes possible to wash the waste liquid below the position near the liquid level by the cleaning liquid supplied from the supply port, and below the liquid level which becomes a factor of measurement failure and a factor of reducing measurement accuracy. It is possible to reliably wash the waste liquid remaining in the tank with a cleaning liquid having a minimum necessary amount.
According to the second embodiment of the present invention, the supply port is moved to a position near the liquid level of the waste liquid before discharge, and the waste liquid below the position near the liquid level is washed with the cleaning liquid supplied to the supply port. This makes it possible to reliably clean the waste liquid remaining below the liquid level, which is a cause of measurement failure and a decrease in measurement accuracy, with a cleaning liquid having a minimum required amount.

1 is a plan view of an automatic analyzer according to a first embodiment of the present invention. It is a conceptual diagram of an automatic analyzer. It is a functional block diagram of an automatic analyzer. It is a block diagram of the washing | cleaning apparatus for wash | cleaning a reaction container. It is the figure which showed a series of washing | cleaning operation | movement with the washing | cleaning liquid supplied to each reaction container. It is the figure which showed a series of washing | cleaning operation | movement in the automatic analyzer which concerns on 2nd Embodiment of this invention. It is the figure which showed a series of washing | cleaning operation | movement in the automatic analyzer which concerns on 3rd Embodiment of this invention.

[First Embodiment]
(Constitution)
The configuration of the automatic analyzer according to the first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a plan view of the automatic analyzer, FIG. 2 is a conceptual diagram of the automatic analyzer, and FIG. 3 is a functional block diagram of the automatic analyzer.

  First, the basic configuration of the automatic analyzer will be described with reference to FIGS. The automatic analyzer 10 includes a sample container 100, a sample container 101 for storing a sample (biological sample), a sample probe 103, first and second reagent containers 200, a reagent container 201 for storing reagents, a reagent probe 203, and a reaction container. 300, reaction container 301, drive control unit 40, storage unit 42, display control unit 44, display unit 45, operation unit 46, cleaning device 50, suction tube 71, supply tube 81, cleaning tank 901, and aspirating and discharging a sample A pump (not shown), a solenoid valve (not shown), and an actuator (not shown) for driving the solenoid valve.

  With the above-described configuration, the automatic analyzer 10 dispenses a sample and a reagent into the reaction vessel 301 to generate a reaction solution, a step of measuring the reaction solution, and a step of washing the reaction vessel 301 after discharging the reaction solution And the process of drying the reaction container 301 is performed in order.

  The drive control unit 40 receives a control unit 41, an instruction from the control unit 41, and drives the sample storage drive unit 104, the sample probe drive unit 105, the reagent storage drive unit 204, the reagent probe drive unit 205, and the reaction, respectively. It has a storage drive unit 304, a suction processing unit 704, a suction tube driving unit 705, a supply processing unit 804, and a supply tube driving unit 805. The suction processing unit 704, the suction pipe driving unit 705, the supply processing unit 804, and the supply pipe driving unit 805 will be described in detail in the description of the cleaning device 50.

  The control unit 41 includes a sample storage drive unit 104, a sample probe drive unit 105, a reagent storage drive unit 204, a reagent probe drive unit 205, a reaction storage drive unit 304, the pump, the electromagnetic valve, and the Various drive units including actuators are controlled.

  The control unit 41 causes the storage unit 42 to store control information for controlling the various drive units. The control unit 41 reads control information from the storage unit 42 and controls the sample probe driving unit 105 and the like. The control unit 41 controls the lowering and raising operations of each component including the sample probe 103, the reagent probe 203, the suction tube 71, and the supply tube 81.

  Next, various drive units will be described. First, the sample storage 100 and the sample probe driving unit 105 will be described with reference to FIGS. 1 to 3.

  The sample storage 100 includes a sample rack 130 which is a disk sampler on which a plurality of sample containers 101 are arranged in a circumferential direction, and the sample racks 130 are rotated in the circumferential direction so that the plurality of sample containers 101 are arranged in a circumferential direction. And a sample storage drive unit 104 that sequentially moves to the suction position PI.

  The sample probe driving unit 105 rotates the sample probe 103 between the suction position PI and the discharge position PO, and raises and lowers the sample probe 103 between a predetermined position and a work position. Accordingly, the sample probe 103 rotates to the suction position PI, descends from the predetermined position to the work position, and sucks the sample from the sample container 101 moved to the suction position PI. Thereafter, the sample probe 103 rises from the working position to a predetermined position, rotates to the discharge position PO, and discharges the sucked sample to the reaction container 301 moved to the discharge position PO.

  Next, the configuration of the first and second reagent containers 200 will be described. The first and second reagent storages 200 basically have the same configuration. Below, the 1st reagent storage 200 is mainly demonstrated and the description which overlaps with the 1st reagent storage 200 about the 2nd reagent storage 200 is abbreviate | omitted.

  The reagent store 200 is placed in a state where the reagent containers 201 are arranged in the circumferential direction, and rotates the reagent containers 201 in the circumferential direction, thereby moving the plurality of reagent containers 201 to the suction position PI in order. Drive unit 204. The reagent container 201 contains a reagent that selectively reacts with a specific component contained in the sample.

  The reagent container 201 of the second reagent storage 200 stores a reagent that makes a pair with the reagent stored in the reagent container 201 of the first reagent storage 200.

  The configuration of the reagent probe driving unit 205 is basically the same as the configuration of the sample probe driving unit 105. The reagent probe driving unit 205 rotates the reagent probe 203 between the suction position PI and the discharge position PO, and raises and lowers the reagent probe 203 between the predetermined position and the work position. As a result, the reagent probe 203 rotates to the suction position PI, descends from the predetermined position to the work position, and sucks the reagent from the reagent container 201 moved to the suction position PI. Thereafter, the reagent probe 203 rises from the working position to a predetermined position, rotates to the discharge position PO, and discharges the aspirated reagent into the reaction container 301 moved to the discharge position PO.

  Next, the reactor 300 will be described. A plurality of reaction vessels 301 are accommodated in the reaction chamber 300. The reaction chamber 300 has a reaction line 330 on which a plurality of reaction vessels 301 are arranged in a circumferential direction, and a rotation position of the reaction line 330 in the circumferential direction, thereby sequentially discharging the plurality of reaction vessels 301 to a discharge position. And a reaction chamber drive unit 304 that is moved to the PO. The reaction chamber drive unit 304 moves the reaction container 301 into which the sample and the reagent are dispensed to the measurement position. The sample and the reagent in the reaction container 301 are stirred by a stirrer (not shown) until it is moved from the discharge position PO to the measurement position. Thereby, a reaction solution is produced.

  A photometric unit 190 is disposed at the measurement position. The photometry unit 190 irradiates the stirred reaction container 301 with light, and measures the absorbance at the set wavelength from the transmitted light. The reaction container driving unit 304 moves the reaction container 301 from the measurement position to the cleaning position PW. A cleaning device 50 is disposed in the vicinity of the cleaning position PW. The cleaning device 50 discharges the waste liquid, which is the reaction solution after the measurement, from the reaction container 301 and supplies the cleaning liquid to the reaction container 301 after the waste liquid is discharged to clean the reaction container 301.

  Next, the cleaning device 50 and the drive control unit 40 for controlling the operation of the cleaning device 50 will be described with reference to FIGS. FIG. 4 is a configuration diagram of a cleaning device 50 for cleaning the reaction container 301, and FIG. 5 is a diagram illustrating a series of cleaning operations using the cleaning liquid supplied to each reaction container.

  The drive control unit 40 includes a control unit 41, a suction processing unit 704, a suction pipe driving unit 705, a supply processing unit 804, and a supply pipe driving unit 805.

  The cleaning device 50 has a first mechanism for discharging waste liquid from the reaction vessel 301 to the outside, a second mechanism for supplying pure water as a cleaning liquid to the reaction vessel 301 after discharging the waste liquid, and discharging the waste solution. And a third mechanism for supplying a detergent, which is a cleaning liquid, to the reaction vessel 301 after the operation. The first mechanism has a suction mechanism. Further, the second mechanism and the third mechanism have a supply mechanism.

  Hereafter, each structure and operation | movement of a 1st mechanism to a 3rd mechanism are demonstrated in order. The first mechanism for discharging the waste liquid from the reaction vessel 301 to the outside includes a pump 51, a gate valve 55, a waste liquid tank 61, and a suction pipe 71. A suction tube 71 is disposed in each reaction vessel 301. A suction port 72 is provided at the tip of the suction tube 71. Here, the “waste liquid” refers to a reaction solution after measuring absorbance, or a cleaning solution after cleaning the reaction vessel 301.

  Six cleaning positions PW are provided in order to perform cleaning a plurality of times from the front side to the back side in the moving direction of the reaction container 301. The reaction chamber drive unit 304 sequentially moves the reaction container 301 one by one from the start cleaning position PW on the near side in the moving direction to the terminal cleaning position PW on the far side in the moving direction. The six reaction vessels 301 moved to the six washing positions PW are shown in FIG. 1-No. 6 is attached and shown.

  In this first embodiment, when supplying the cleaning liquid to the reaction vessel 301 moved to each cleaning position PW, the position of the liquid surface of the cleaning liquid is set to the same height for each cleaning position PW, and the previous cleaning position in the moving direction. The position of the liquid level of the cleaning liquid supplied to the reaction container 301 moved to the next cleaning position PW in the moving direction is increased with respect to the position of the liquid level of the cleaning liquid supplied to the reaction container 301 moved to the PW, The drive control unit 40 is configured to clean the waste liquid adhering to the vicinity of the liquid level in the reaction vessel 301 moved to the previous cleaning position PW when the reaction vessel 301 is moved to the subsequent cleaning position PW. And the washing | cleaning apparatus 50 was comprised.

  At each cleaning position PW, the reaction vessel 301 is cleaned in a predetermined order. The order is shown in FIG. Hereinafter, the configuration of the cleaning device 50 and the drive control unit 40 for controlling the operation of the cleaning device 50 will be described in the order from Step 1 to Step 7.

(Step 1)
The reaction chamber drive unit 304 moves the reaction vessel 301 from the previous cleaning position PW to the next cleaning position PW every predetermined time (for example, 9 seconds). No. moved to the final cleaning position PW. No. 1 reaction vessel 301 and No. 1 moved to the cleaning position PW at the start. No. 6 containing the waste liquid L1, which is the reaction solution after measuring the absorbance. Six reaction vessels 301 are shown in step 1 of FIG.

(Waste liquid suction process: Step 2)
In response to the instruction from the control unit 41, the suction pipe driving unit 705 moves the suction port 72 from the upper position P1 above the reaction container 301 to the bottom vicinity position P2 near the bottom in the reaction container 301. The suction tube 71 is moved. In response to an instruction from the control unit 41, the suction processing unit 704 operates the pump 51 and opens the gate valve 55, so that the waste liquid L 1 in the reaction container 301 is transferred from the suction port 72 to the external waste liquid tank 61. Discharge.

  The configuration of the suction tube driving unit 705 is basically the same as the configuration of the sample probe driving unit 105. That is, as in the case of obtaining the required time t for moving the sample probe 103, the generation unit 43 receives an instruction from the control unit 41, and determines a predetermined number of pulses n, based on the above equation (2). And the required time t is calculated | required from the predetermined distance s which moves the suction pipe 71. FIG. The control unit 41 stores the required time t in the storage unit 42 as control information. The suction tube driving unit 705 is given a pulse number n for a required time t, and raises and lowers the suction tube 71 by a predetermined distance s between the upper position P1 and the bottom vicinity position P2.

  The suction pipe 71 moved to the upper position P1 is indicated by a broken line in FIG. 4, and the suction pipe 71 moved to the bottom vicinity position P2 is indicated by a solid line in FIG. The suction process of the waste liquid L1 is shown in step 2 in FIG. In step 2, no. Six reaction vessels 301 are empty.

  After the discharge of the waste liquid L1 is completed, in response to an instruction from the control unit 41, the suction processing unit 704 stops the operation of the pump 51 and closes the gate valve 55. In response to an instruction from the control unit 41, the suction tube driving unit 705 moves the suction tube 71 from the bottom vicinity position P2 to the upper position P1.

(Cleaning liquid supply process: Step 3)
The supply processing unit 804 and the supply pipe driving unit 805 supply the cleaning liquid to the reaction vessel 301 after discharging the waste liquid. Here, the “waste liquid” refers to the waste liquid L1, which is a reaction solution after measurement, and pure water L2, detergent L3, and detergent L4 after washing. The “cleaning liquid” refers to pure water L2, detergent L3, and detergent L4.

  In the second mechanism for supplying the pure water L2 to the reaction vessel 301 after discharging the waste liquids L1, L2, and L4, the supply processing unit 804 and the supply pipe driving unit 805 are provided with a cleaning position PW at the start end, and a terminal end. Pure water L2 is supplied to a total of four reaction vessels 301 respectively moved to the three washing positions PW on the side. The reaction vessel 301 to which pure water L2 is supplied is set to No. 3 in step 3 of FIGS. 1-No. 3 and No. It shows by attaching the number of 6.

  In the third mechanism for supplying the detergents L3 and L4 to the reaction vessel 301 after discharging the waste liquids L2 and L3, the supply processing unit 804 and the supply pipe drive unit 805 are the second in the movement direction of the reaction vessel 301. The detergent L3 is supplied to the reaction container 301 moved to the cleaning position PW, and the detergent L4 is supplied to the reaction container 301 moved to the third cleaning position PW from the start end in the moving direction. A reaction vessel 301 to which the detergent L3 is supplied is shown in FIG. The reaction container 301 to which the detergent L4 is supplied is shown in FIG. It is shown with the number 4 attached.

  First, a second mechanism for supplying pure water L2 to the reaction vessel 301 after discharging the waste liquids L1, L2, and L4 will be described. The second mechanism includes a pump 52, a gate valve 56, a flow rate adjustment valve 59, a water tank 62, and a supply pipe 81.

  In step 3, in response to an instruction from the control unit 41, the supply pipe driving unit 805 moves the supply pipe 81 at the upper position P <b> 1 to a liquid surface vicinity position P <b> 3 (reaction container 301. It is lowered to a position close to the liquid level of the waste liquid before being sucked out. Next, in response to an instruction from the control unit 41, the supply processing unit 804 operates the pump 52, opens the gate valve 56, passes from the external water tank 62 through the supply port 82, and enters each reaction vessel 301. Supply cleaning solution.

  The configuration of the supply pipe driving unit 805 is basically the same as the configuration of the sample probe driving unit 105, and the supply pipe 81 is moved back and forth between the upper position P1 and the liquid surface vicinity position P3. Move. That is, as in the case of obtaining the required time t for moving the sample probe 103, the generation unit 43 receives an instruction from the control unit 41, and determines a predetermined number of pulses n, based on the above equation (2). And the required time t is calculated | required from the predetermined distance s which moves the supply pipe | tube 81. FIG. The control unit 41 stores the required time t in the storage unit 42 as control information. The supply pipe driving unit 805 is given a pulse number n for a required time t, and raises and lowers the supply pipe 81 by a predetermined distance s between the upper position P1 and the liquid surface vicinity position P3.

  No. moved to the cleaning position PW on the end side. 1 and no. 2, the second mechanism for supplying the pure water L2 to the reaction container 301 after discharging the waste liquid L2 does not have the flow rate adjustment valve 59, whereas the cleaning position at the start end No. moved to PW 6 in that the second mechanism for supplying pure water L2 to the reaction vessel 301 after discharging the waste liquid L1 has a flow rate adjusting valve 59. No. moved to the cleaning position PW at the start end. No. 6 moved to the terminal-side cleaning position PW with respect to the liquid level position a of the pure water L2 after adjustment by adjusting the flow rate of the pure water L2 supplied to the reaction vessel 301 of No. 6. 1 and no. The position d of the level of the pure water L2 supplied to the second reaction vessel 301 can be increased by a predetermined width. Between the predetermined width from the position a to the position d, it is possible to provide the liquid surface position b of the detergent L3 and the liquid surface position c of the detergent L4. FIG. 5 shows the liquid surface position b of the detergent L3, the liquid surface position c of the detergent L4, and the liquid surface position d of the pure water L2. As for the liquid level position b of the detergent L3 and the liquid level position c of the detergent L4, a third mechanism for supplying the detergents L3 and L4 to the reaction container 301 after discharging the waste liquids L2 and L3. Will be described later.

  Hereinafter, the configurations and operations of the supply processing unit 804 and the supply pipe drive unit 805 will be referred to as No. 1-No. 3 and No. A description will be given corresponding to each of the reaction containers 301 in FIG. First, the supply pipe drive unit 805 is No. 6, the supply pipe 81 is lowered to a position a which is a liquid surface vicinity position P3 close to the liquid surface position H (step 1) of the waste liquid L1 of the reaction vessel 301. The supply pipe 81 is lowered to a position d which is a liquid surface vicinity position P3 near the liquid surface position c (step 1) of the waste liquid L4 of the third reaction vessel 301 from above.

  In response to an instruction from the control unit 41, the supply processing unit 804 operates the pump 52, opens the gate valve 56, passes the supply port 82 from the external water tank 62, No. 3 and no. Pure water L <b> 2 is supplied into each reaction vessel 301. The supply processing unit 804 opens the gate valve 56 for a time corresponding to a predetermined supply amount (for example, 0.3 to 0.6 cc) of the pure water L2.

  No. The pure water L2 is filled to the position a which is the liquid surface vicinity position P3 in the reaction vessel 301 of No. 6. Thereby, it becomes possible to wash the waste liquid L1 adhering below the position H of the liquid level on the inner surface of the reaction vessel 301. No. The pure water L2 is filled up to the position d which is the liquid surface vicinity position P3 in the third reaction vessel 301. Thereby, it becomes possible to wash the waste liquid L4 adhering to the position c or lower of the liquid level on the inner surface of the reaction vessel 301. As described above, the waste liquids L1 and L4 adhering below the liquid surface can be cleaned with the minimum required amount of cleaning liquid, and wasteful consumption of pure water L2 can be eliminated.

  Here, the “position near the liquid level” means the position of the supply port 82 close to the liquid level in the positional relationship between the supply port 82 and the liquid levels of the waste liquids L1 and L4 before being sucked out in the reaction vessel 301. Say. The distance from the liquid level of the waste liquids L1 and L4 to the liquid level vicinity position P3 is preferably 1 mm to 5 mm, and more preferably 2 mm to 3 mm. The supply pipe 81 moved to the upper position P1 is indicated by a broken line in FIG. 4, and the supply pipe 81 moved to the liquid surface vicinity position P3 is indicated by a solid line in FIG.

  In addition, the supply pipe drive unit 805 determines in step 3 that no. No. 2 position d which is the liquid surface vicinity position P3 close to the liquid surface position d (step 1) of the waste liquid L2 in the reaction container 301 of No. 2; The supply pipe 81 is lowered to a position d which is a liquid surface vicinity position P3 close to the liquid surface position d (step 1) of the waste liquid L2 of one reaction vessel 301 from above.

  In response to the instruction from the control unit 41, the supply processing unit 804 operates the pump 52, opens the gate valve 56, passes the supply port 82 from the external water tank 62, No. 1 and no. The pure water L2 is supplied into each reaction container 301 of No.2. By filling the pure water L2 up to the liquid surface vicinity position P3 in each reaction container 301, it becomes possible to wash the waste liquid L2 adhering below the liquid surface on the inner surface of the reaction container 301. No. 1 and no. In each reaction container 301 of No. 2, the liquid surface vicinity position P3 coincides with the liquid surface of the waste liquid L2 at the position d, and is not positioned above. 1 and no. 2 until the reaction containers 301 of No. 2 are moved to the fifth and sixth washing positions PW from the beginning. 1 and no. 2, the concentration of the waste liquid L2 remaining on the inner surface of each reaction vessel 301 is lowered to an allowable value or less, so that no measurement failure occurs due to the residual waste liquid L2.

  Next, a third mechanism for supplying the detergent L3 will be described. The third mechanism includes a pump 53, a gate valve 57, a detergent tank 63, and a supply pipe 81.

  In response to the instruction from the control unit 41, the supply pipe driving unit 805 moves the supply pipe 81 from the upper position P1 to the liquid surface vicinity position P3.

  The configuration of the supply tube driving unit 805 is basically the same as the configuration of the sample probe driving unit 105. That is, as in the case of obtaining the required time t for moving the sample probe 103, the generation unit 43 receives an instruction from the control unit 41, and determines a predetermined number of pulses n, based on the above equation (2). And the required time t is calculated | required from the predetermined distance s which moves the supply pipe | tube 81. FIG. The control unit 41 stores the required time t in the storage unit 42 as control information. The supply pipe driving unit 805 is given a pulse number n for a required time t, and raises and lowers the supply pipe 81 by a predetermined distance s between the upper position P1 and the liquid surface vicinity position P3. The supply pipe drive unit 805 is the No. 1 shown in Step 1. The supply pipe 81 is lowered to a liquid surface vicinity position P3 which is a position b near the liquid surface position a of the waste liquid L2 of the reaction vessel 301 of No. 5 from above.

  In response to the instruction from the control unit 41, the supply processing unit 804 activates the pump 53, opens the gate valve 57, passes the supply port 82 from the external detergent tank 63, and enters the detergent L3 into the reaction vessel 301. Supply. By filling the detergent L3 to the liquid surface vicinity position P3 in the reaction container 301, it becomes possible to wash the waste liquid L2 adhering below the liquid level on the inner surface of the reaction container 301. Moreover, it becomes possible to wash | clean waste liquid L2 adhering below the liquid level with detergent L3 of the minimum required liquid quantity. The supply processing unit 804 opens the gate valve 57 for a time corresponding to the supply amount of the detergent L3 of 0.3 to 0.6 cc.

  Here, the “position near the liquid level” means a position close to the liquid level of the waste liquids L2 and L3 before being sucked out in the reaction vessel 301 from above. The distance from the liquid level of the waste liquid L2 to the liquid level vicinity position P3 is preferably 1 mm to 5 mm, and more preferably 2 mm to 3 mm. The supply pipe 81 moved to the upper position P1 is indicated by a broken line in FIG. 4, and the supply pipe 81 moved to the liquid surface vicinity position P3 is indicated by a solid line in FIG.

  The supply pipe driving unit 805 is given the pulse number n for the required time t, and lowers the supply pipe 81 by a predetermined distance s between the upper position P1 and the liquid surface vicinity position P3. Thereby, the reaction vessel 301 moved to the second washing position PW from the starting end in the moving direction with respect to the position a of the liquid level of the pure water L2 supplied to the reaction vessel 301 moved to the starting washing position PW. It becomes possible to raise the position b of the liquid level of the detergent L3 to be supplied. By filling the detergent L3 up to the liquid surface vicinity position P3 in the reaction container 30, it becomes possible to wash the waste liquid L2 adhering below the liquid level on the inner surface of the reaction container 301. Moreover, it becomes possible to wash | clean waste liquid L2 adhering below the liquid level with detergent L3 of the minimum required liquid quantity. The position b of the liquid surface of the detergent L3 is shown in FIG.

  Next, a third mechanism for supplying the detergent L4 will be described. The third mechanism includes a pump 54, a gate valve 58, a detergent tank 64, and a supply pipe 81.

  In response to the instruction from the control unit 41, the supply pipe driving unit 805 moves the supply pipe 81 from the upper position P1 to the liquid surface vicinity position P3.

  The configuration of the supply tube driving unit 805 is basically the same as the configuration of the sample probe driving unit 105. That is, as in the case of obtaining the required time t for moving the sample probe 103, the generation unit 43 receives an instruction from the control unit 41, and determines a predetermined number of pulses n, based on the above equation (2). And the required time t is calculated | required from the predetermined distance s which moves the supply pipe | tube 81. FIG. The control unit 41 stores the required time t in the storage unit 42 as control information. The supply pipe driving unit 805 is given a pulse number n for a required time t, and raises and lowers the supply pipe 81 by a predetermined distance s between the upper position P1 and the liquid surface vicinity position P3. The supply pipe drive unit 805 is the No. 1 shown in Step 1. The supply pipe 81 is lowered to a liquid surface vicinity position P3 that is a position c near the liquid surface position b of the waste liquid L3 of the fourth reaction vessel 301 from above.

  In response to the instruction from the control unit 41, the supply processing unit 804 activates the pump 54, opens the gate valve 58, passes the supply port 82 from the external detergent tank 64, and enters the detergent L4 into the reaction vessel 301. Supply. By filling the detergent L4 up to the liquid surface vicinity position P3 in the reaction container 301, it becomes possible to wash the waste liquid L3 adhering below the liquid level on the inner surface of the reaction container 301. Moreover, it becomes possible to wash | clean waste liquid L3 adhering below the liquid level with detergent L4 of the minimum required liquid quantity. The supply processing unit 804 opens the gate valve 58 for a time corresponding to the supply amount of the detergent L4 of 0.3 to 0.6 cc.

  Here, the “position near the liquid level” means a position close to the liquid level of the waste liquid L3 before being sucked out in the reaction vessel 301 from above. The distance from the liquid level of the waste liquid L3 to the liquid level vicinity position P3 is preferably 1 mm to 5 mm, and more preferably 2 mm to 3 mm. The supply pipe 81 moved to the upper position P1 is indicated by a broken line in FIG. 4, and the supply pipe 81 moved to the liquid surface vicinity position P3 is indicated by a solid line in FIG.

  The supply pipe driving unit 805 is given the pulse number n for the required time t, and lowers the supply pipe 81 by a predetermined distance s between the upper position P1 and the liquid surface vicinity position P3. Accordingly, the liquid level position b of the detergent L3 supplied to the reaction container 301 moved to the second washing position PW from the start end in the movement direction moves to the third washing position PW from the start end in the movement direction. It becomes possible to raise the position c of the liquid level of the detergent L4 supplied to the reaction vessel 301 that has been made. By filling the detergent L4 to the liquid surface vicinity position P3 in the reaction container 30, it becomes possible to wash the waste liquid L3 adhering to the liquid surface below the inner surface of the reaction container 301. Moreover, it becomes possible to wash | clean waste liquid L3 adhering below the liquid level with detergent L4 of the minimum required liquid quantity. The position c of the liquid surface of the detergent L4 is shown in FIG.

  With the configuration of the supply processing unit 804 and the supply pipe driving unit 805 described above, the cleaning liquid that has become the waste liquid after cleaning by gradually increasing the liquid level filling the cleaning liquid from position a to position d, It becomes possible to wash the cleaning liquid adhering below the liquid level with the next cleaning liquid of the minimum required amount.

(Waste liquid suction process: Step 4)
In step 4, basically the same process as the waste liquid suction process in step 2 described above is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

  After Step 3 or Step 4, the reaction chamber drive unit 304 moves each reaction vessel 301 to the next cleaning position PW in the moving direction. Therefore, the reaction chamber drive unit 304 has a No. No. 1 reaction vessel 301 is moved from the last washing position PW. 2-No. No. 6 reaction vessel 301 is moved to the next washing position PW, 7 reaction container 301 is moved to the cleaning position PW at the start.

(Cleaning liquid supply process: Step 5)
In step 5, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

  When supplying the cleaning liquid to the reaction container 301 moved to each cleaning position PW, the drive control unit 40 and the cleaning apparatus 50 set the liquid level of the cleaning liquid to the same height for each cleaning position PW, and in the moving direction. The position of the level of the cleaning liquid supplied to the reaction container 301 moved to the next cleaning position PW in the moving direction with respect to the position of the level of the cleaning liquid supplied to the reaction container 301 moved to the previous cleaning position PW. The waste liquid adhering to the vicinity of the liquid level in the reaction vessel 301 moved to the previous cleaning position PW is cleaned when the reaction vessel 301 is moved to the subsequent cleaning position PW. did.

  The cleaning liquid supply process in step 5 will be described in comparison with the cleaning liquid supply process in step 3.

  No. In the reaction vessel 301 of No. 4, by filling the pure water L2 up to the liquid surface vicinity position P3 in the reaction vessel 30 (step 3), it is possible to wash the waste liquid L4 attached below the liquid level on the inner surface of the reaction vessel 301. Become. No. In the reaction container 301 of No. 5, by filling the detergent L4 to the position near the liquid level P3 in the reaction container 30 (step 3), it becomes possible to wash the waste liquid L3 adhering to the liquid level below the inner surface of the reaction container 301. . Furthermore, no. In the reaction container 301 in FIG. 6, by filling the detergent L3 up to the liquid surface vicinity position P3 in the reaction container 301 (step 3), it becomes possible to wash the waste liquid L2 attached below the liquid level on the inner surface of the reaction container 301. . In any of the reaction vessels 301 in Step 3, it is possible to wash the waste liquid adhering below the liquid level with the cleaning liquid having the minimum necessary amount.

  In addition, No. 2 and no. 3, the pure water L2 was filled up to the same level as the liquid level of the pure water L2 before being sucked out in the reaction vessel 30 (step 3). 2 and no. 3, the concentration of the waste liquid L2 in the reaction container 301 is sufficiently lowered, and the waste liquid L2 adhering below the liquid level on the inner surface of the reaction container 301 can be sufficiently washed. Further, since the liquid level of the pure water L2 is set to the same height, the configuration of the supply processing unit 804 can be prevented from being complicated.

(Waste liquid suction process: Step 6)
In step 6, basically the same process as the above-described waste liquid suction process in step 2 is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

  After step 5 or step 6, the reaction container drive unit 304 moves each reaction vessel 301 to the next cleaning position PW in the moving direction. Therefore, the reaction chamber drive unit 304 has a No. No. 2 reaction vessel 301 is moved from the terminal washing position PW. 3-No. No. 7 reaction vessel 301 is moved to the next cleaning position PW, Eight reaction vessels 301 are moved to the starting cleaning position PW.

(Cleaning liquid supply process: Step 7)
In step 7, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

  When supplying the cleaning liquid to the reaction container 301 moved to each cleaning position PW, the drive control unit 40 and the cleaning apparatus 50 set the liquid level of the cleaning liquid to the same height for each cleaning position PW, and in the moving direction. The position of the level of the cleaning liquid supplied to the reaction container 301 moved to the next cleaning position PW in the moving direction with respect to the position of the level of the cleaning liquid supplied to the reaction container 301 moved to the previous cleaning position PW. The waste liquid adhering to the vicinity of the liquid level in the reaction vessel 301 moved to the previous cleaning position PW is cleaned when the reaction vessel 301 is moved to the subsequent cleaning position PW. did.

  The cleaning liquid supply process in step 7 will be described in comparison with the cleaning liquid supply process in step 5.

  No. In the reaction vessel 301 of FIG. 5, by filling the pure water L2 up to the liquid surface vicinity position P3 in the reaction vessel 30 (step 5), it is possible to wash the waste liquid L4 attached below the liquid level on the inner surface of the reaction vessel 301. Become. No. In the reaction vessel 301 of No. 6, by filling the detergent L4 to the position P3 near the liquid level in the reaction vessel 30 (step 5), it is possible to wash the waste liquid L3 attached below the liquid level on the inner surface of the reaction vessel 301. Become. Furthermore, no. In the reaction container 301 in FIG. 7, by filling the detergent L3 up to the liquid level vicinity position P3 in the reaction container 301 (step 5), it becomes possible to wash the waste liquid L2 attached below the liquid level on the inner surface of the reaction container 301. . In any of the reaction vessels 301 in Step 5, it is possible to wash the waste liquid adhering below the liquid level with the minimum required amount of the cleaning liquid.

  In addition, No. 3 and no. 4, the pure water L2 was filled up to the same level as the liquid level of the pure water L2 before being sucked out in the reaction vessel 30 (step 5). 3 and no. 4, the concentration of the waste liquid L2 in the reaction container 301 is sufficiently lowered, and the waste liquid L2 adhering below the liquid level on the inner surface of the reaction container 301 can be sufficiently washed. Further, since the liquid level of the pure water L2 is set to the same height, the configuration of the supply processing unit 804 can be prevented from being complicated.

  The configuration of the drive control unit 40 and the cleaning device 50 has been described above in the order from step 1 to step 7.

(Operation of automatic analyzer)
Next, a series of operations of the automatic analyzer will be described.
(Sample dispensing, reagent dispensing)
The sample probe 103 sucks the sample and discharges the sucked sample to the reaction container 301. The sample probe 103 after the dispensing is cleaned, moves to the standby position, and prepares for the next sample dispensing.
Further, the reagent probe 203 sucks the reagent, and the sucked reagent is discharged into the reaction container 301. The dispensed reagent probe 203 is washed and moved to the standby position to prepare for the next reagent dispensing. As described above, the sample and the reagent are dispensed into the reaction container 301.

(Stirring, measurement)
The reaction container 301 into which the sample and the reagent are dispensed is moved toward the photometric unit 190 by the reaction chamber driving unit 304. Until then, the sample and the reagent in the reaction vessel 301 are stirred by a stirrer (not shown). The photometry unit 190 irradiates the stirred reaction container 301 with light, and measures the absorbance at the set wavelength from the transmitted light.

(Washing, drying)
The cleaning of the reaction vessel 301 has been described above with reference to FIGS. 4 and 5 as the operation of the cleaning device 50, and is therefore omitted here.

  The drying of the reaction vessel 301 will be described. A drying device (not shown) is provided along the moving direction of the reaction vessel 301. The drying device is provided at the tip of the cleaning device 50. The drying device uses a porous tip having water absorption, and by allowing the tip to enter and retract into the reaction vessel 301, the cleaning solution adhering in the reaction vessel 301 is absorbed, and the washed reaction vessel 301 is dried. Let

  Since the waste liquid remaining below the liquid level is reliably washed and the reaction vessel 301 after washing is dried, it can be a reaction vessel 301 that prevents the occurrence of measurement failure due to residual waste liquid and the reduction in measurement accuracy. It can be used for the next sample and reagent dispensing.

  In the first embodiment, the waste liquid adhering to the vicinity of the liquid surface in the reaction vessel 301 moved to the previous washing position PW is washed when the reaction vessel 301 is moved to the subsequent washing position PW. Although the drive control unit 40 and the cleaning device 50 are configured as described above, when the reaction container 301 moved to the same cleaning position PW is cleaned a plurality of times, the liquid is in the vicinity of the liquid surface in the reaction container 301 by the previous cleaning. You may comprise the drive control part 40 and the washing | cleaning apparatus 50 so that the dirt of the adhering waste liquid may be washed by the next washing | cleaning.

[Second Embodiment]
Next, a second embodiment of the present invention will be described with reference to FIG. FIG. 6 is a diagram showing a series of cleaning operations in the automatic analyzer.

  In the drive control unit 40 and the cleaning device 50 according to the second embodiment, when the reaction container 301 moved to the same cleaning position PW is cleaned a plurality of times, the liquid in the reaction container 301 is cleaned by the previous cleaning. The waste liquid adhering to the vicinity of the surface was washed in the next washing.

  The drive control unit 40 and the cleaning device 50 according to the second embodiment are the same as the first control except that the position of the liquid surface of the cleaning liquid is increased as the cleaning stage of the same stage proceeds. The configuration is basically the same as that of the drive control unit 40 and the cleaning device 50 according to the embodiment.

  Hereinafter, the configuration of the drive control unit 40 and the cleaning device 50 will be described in the order of Step 1 to Step 7.

(Step 1)
When the reaction chamber drive unit 304 measures the absorbance, No. 1 containing the waste liquid L1 which is the reaction solution. 6 reaction containers 301 are moved to the cleaning position PW at the start. The position H of the liquid level of the waste liquid L1 is shown in step 1 of FIG.

(Waste liquid suction process: Step 2)
In response to the instruction from the control unit 41, the suction processing unit 704 and the suction pipe driving unit 705 discharge the waste liquid L 1 in the reaction container 301 from the suction port 72 to the external waste liquid tank 61.

(Cleaning liquid supply process: Step 3)
In response to the instruction from the control unit 41, the supply processing unit 804 adjusts the opening time for opening the gate valve 56.
No. shown in Step 1. 6 is filled with pure water L2 up to a liquid surface vicinity position P3 which is a position a near the liquid surface position H of the liquid waste L1 from above, so that the liquid waste L1 attached below the liquid surface on the inner surface of the reaction container 301 Can be cleaned. Moreover, it becomes possible to wash the waste liquid L1 adhering below the liquid level with the minimum amount of pure water L2. No. Step 3 in FIG. 6 shows the position a of the level of the pure water L2 supplied to the reaction vessel 301 in FIG.

(Waste liquid suction process: Step 4)
In step 4, basically the same process as the waste liquid suction process in step 2 described above is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

(Cleaning liquid supply process: Step 5)
In step 5, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

  The drive control unit 40 and the cleaning device 50 perform the next time (step 5) with respect to the position of the liquid level of the cleaning liquid (pure water L2 and detergents L3 and L4) supplied to the previous reaction container 301 (step 3). ) Of the cleaning liquid (pure water L2 and detergents L3 and L4) supplied to the reaction container 301 is increased, and the waste liquids L2, L3, and L4 adhering to the vicinity of the liquid surface in the previous reaction container 301 are increased. Was cleaned with the next cleaning liquids L2, L3, and L4. By filling the cleaning liquid (pure water L2 and detergents L3 and L4) to the position near the liquid level P3 in the reaction container 30, the waste liquids L2, L3 and L4 adhering to the liquid level below the inner surface of the reaction container 301 can be cleaned. It becomes possible. Moreover, it becomes possible to wash the waste liquid adhering to the liquid level or lower with the necessary minimum amount of washing liquid. Step 5 in FIG. 6 shows the positions b of the pure water L2 and the liquid levels of the detergents L3 and L4 supplied to the next reaction vessel 301.

(Waste liquid suction process: Step 6)
In step 6, basically the same process as the above-described waste liquid suction process in step 2 is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

(Cleaning liquid supply process: Step 7)
In step 7, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

  The drive control unit 40 and the cleaning device 50 perform the next time (step 7) with respect to the position of the liquid level of the cleaning liquid (pure water L2 and detergents L3 and L4) supplied to the previous reaction container 301 (step 5). ) Of the cleaning liquid (pure water L2 and detergents L3 and L4) supplied to the reaction container 301 is increased, and the waste liquids L2, L3, and L4 adhering to the vicinity of the liquid surface in the previous reaction container 301 are increased. Was cleaned with the next cleaning liquids L2, L3, and L4. By filling the cleaning liquid (pure water L2 and detergents L3 and L4) to the position near the liquid level P3 in the reaction container 30, the waste liquids L2, L3 and L4 adhering to the liquid level below the inner surface of the reaction container 301 can be cleaned. It becomes possible. Moreover, it becomes possible to wash the waste liquid adhering to the liquid level or lower with the necessary minimum amount of washing liquid. Step 5 in FIG. 6 shows the positions c of the pure water L2 and the detergents L3 and L4 supplied to the next reaction vessel 301.

  In the embodiment, the drive control unit 40 and the cleaning device 50 are configured to perform the waste liquid suction process (steps 2, 4 and 4) between the previous cleaning process of the reaction container 301 and the next cleaning process of the reaction container 301. Step 6) is configured, but the reaction vessel 301 may be cleaned and the waste liquid may be suctioned at the same time.

  In the above embodiment, the supply processing unit 804 is configured to fill the next stage or the next cleaning liquid at a position higher than the level of the liquid level of the waste liquid in the previous stage or the previous reaction vessel 301. You may comprise so that the next stage or the next washing | cleaning liquid may be sprayed to the position higher than the position of the liquid level of the waste liquid in the front | former stage or the last reaction container 301. FIG.

[Third Embodiment]
Next, a third embodiment of the present invention will be described with reference to FIG. FIG. 7 is a diagram showing a series of cleaning operations in the automatic analyzer.

  The drive control unit 40 and the cleaning device 50 according to the third embodiment are basically the same as each configuration according to the first embodiment, but the cleaning process of the reaction vessel 31 and the waste liquid suction process are the same. In addition, the supply processing unit 804 is configured to spray the next or next cleaning liquid to a position higher than the position of the liquid level of the waste liquid in the previous or previous reaction vessel 301. This is different from the configuration according to the first embodiment.

  Hereinafter, the configuration of the drive control unit 40 and the cleaning device 50 will be described in the order of Step 1 to Step 7.

(Step 1)
When the reaction chamber drive unit 304 measures the absorbance, No. 1 containing the waste liquid L1 which is the reaction solution. 6 reaction containers 301 are moved to the cleaning position PW at the start. The position H of the liquid level of the waste liquid L1 is shown in Step 1 of FIG.

(Waste liquid suction process: Step 2)
In response to the instruction from the control unit 41, the supply pipe drive unit 805 moves the suction pipe 71 so as to move the suction port 72 from the upper position to the position near the bottom. In response to the instruction from the control unit 41, the suction processing unit 704 and the suction pipe driving unit 705 discharge the waste liquid L 1 in the reaction container 301 from the suction port 72 to the external waste liquid tank 61. In the third embodiment, the suction pipe 71 and the supply pipe 81 are provided integrally, and the supply pipe drive unit 805 moves the suction port 72 from the upper position to the position near the bottom, thereby simultaneously supplying the supply port 82. Is moved from the upper position to a position near the liquid level. The suction pipe 71 and the supply pipe 81 provided integrally are shown in Step 3 of FIG.

(Cleaning liquid supply process: Step 3)
In Step 2, the supply port 82 has already moved to the liquid surface vicinity position P3 near the liquid surface of the waste liquid L1 from above. It is not necessary to move the suction pipe 71 and the supply pipe 81 between the waste liquid suction process and the cleaning liquid supply process, and the cleaning of the reaction vessel 301 can be performed quickly.

  The pure water L2 is sprayed from the supply port 82 moved to a position near the liquid surface at a position higher than the liquid level of the waste liquid L1 before being sucked out in the reaction container 30 to adhere below the liquid level on the inner surface of the reaction container 301. It becomes possible to wash the waste liquid L1.

  Here, the “position near the liquid level” refers to the degree of spraying the cleaning liquid on the liquid level in the positional relationship between the supply port 82 and the liquid levels of the waste liquids L1, L2, and L4 before being sucked out in the reaction vessel 301. The position of the supply port 82 close to. The distance from the liquid level of the waste liquids L1, L2, and L4 to the liquid level vicinity position P3 is preferably 3 mm to 10 mm, and more preferably 5 mm to 7 mm. FIG. 7 shows the supply pipe 81 moved to the liquid level vicinity position P3. Moreover, the position a of the liquid level of the pure water L2 supplied to the reaction vessel 301 and the detergents L3 and L4 is shown in Step 3 of FIG.

(Waste liquid suction process: Step 4)
In step 4, basically the same process as the waste liquid suction process in step 2 described above is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

(Cleaning liquid supply process: Step 5)
In step 5, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

(Waste liquid suction process: Step 6)
In step 6, basically the same process as the above-described waste liquid suction process in step 2 is performed. The waste liquids L2, L3, and L4 in the reaction vessel 301 are discharged to the external waste liquid tank 61.

(Cleaning liquid supply process: Step 7)
In step 7, basically the same process as the cleaning liquid supply process in step 3 described above is performed.

  In parallel with the cleaning liquid supply process, the waste liquid in the reaction vessel 301 is sucked. Since the cleaning liquid supply process and the waste liquid suction process are performed simultaneously, the cleaning time of the reaction container 301 with each cleaning liquid is shortened, and the time for moving the reaction container 301 to each cleaning position PW is shortened to, for example, 4.5 seconds. It becomes possible.

  In the above embodiment, the supply processing unit 804 sets the cleaning liquid supplied to the reaction vessel 301 to a predetermined liquid amount regardless of the type of waste liquid and the amount of waste liquid, but the type of waste liquid and the amount of waste liquid An amount of cleaning liquid corresponding to the amount may be supplied to the reaction vessel 301. Accordingly, it is possible to reliably wash the waste liquid adhering to the liquid level or lower with the minimum required amount of the cleaning liquid.

DESCRIPTION OF SYMBOLS 10 Automatic analyzer 100 Sample storage 101 Sample container 103 Sample probe 104 Sample storage drive part
105 Sample probe driving unit 120 Ball screw 121 Nut 122 Stepping motor 122A Vertical movement stepping motor 123 Spline shaft 124 Rotating mechanism 125 Spline pulley
127 Motor side pulley 128 Rotating belt 129 Block
130 Sample rack 190 Photometric unit
200 Reagent chamber 201 Reagent container 203 Reagent probe
204 Reagent storage drive unit 205 Reagent probe drive unit 210 Reagent storage case 300 Reaction chamber 301 Reaction vessel 304 Reaction chamber drive unit 330 Reaction line 40 Drive control unit 41 Control unit 42 Storage unit 43 Generation unit
44 Display control unit 45 Display unit 46 Operation unit 50 Cleaning device 51, 52, 53, 54 Pump 55, 56, 57, 58 Gate valve 59 Flow rate adjusting valve 61 Waste liquid tank 62 Water tank 63, 64 Detergent tank 71 Suction pipe 72 Suction port 705 Suction tube drive unit 81 Supply tube 82 Supply port 805 Supply tube drive unit 901 Cleaning tank

Claims (3)

In an automatic analyzer that generates a reaction solution by dispensing a sample and a reagent into a reaction vessel and analyzes the components of the reaction solution,
A plurality of washing positions are provided along the moving direction of the reaction vessel,
A suction mechanism for discharging the reaction liquid after the analysis, or the waste liquid, which is a cleaning liquid after washing the reaction container, to be discharged from the reaction container to the outside, which is arranged at the plurality of stages of washing positions;
A supply mechanism that is arranged at the multiple stages of cleaning positions, has a supply port, and supplies the cleaning liquid from the outside into the reaction vessel through the supply port;
The reaction vessel is washed over the plurality of stages, and the position of the cleaning liquid is increased as the number of times of washing of the same stage proceeds, and the washing is repeated between the stages. A drive control unit that controls the supply mechanism so that the position of the liquid level is the same height when
The automatic analyzer characterized by having. The drive control unit further blows the cleaning liquid to a substantially constant position higher than the liquid level of the waste liquid in each cleaning in which the suction of the waste liquid by the suction mechanism and the supply of the cleaning liquid by the supply mechanism are repeated a plurality of times. The automatic analyzer according to claim 1 , wherein the supply mechanism is controlled to be lowered .   The automatic analyzer according to claim 2, wherein the drive control unit controls the suction mechanism and the supply mechanism to discharge the waste liquid in parallel with the process of supplying the cleaning liquid.