JP5596158B2 - 基板に対する改善されたコーティングのための非直交ジオメトリ - Google Patents
基板に対する改善されたコーティングのための非直交ジオメトリ Download PDFInfo
- Publication number
- JP5596158B2 JP5596158B2 JP2012532079A JP2012532079A JP5596158B2 JP 5596158 B2 JP5596158 B2 JP 5596158B2 JP 2012532079 A JP2012532079 A JP 2012532079A JP 2012532079 A JP2012532079 A JP 2012532079A JP 5596158 B2 JP5596158 B2 JP 5596158B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- coater
- nozzle
- discharge hole
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims description 328
- 239000011248 coating agent Substances 0.000 title claims description 316
- 239000000758 substrate Substances 0.000 title claims description 28
- 239000011521 glass Substances 0.000 claims description 100
- 238000011144 upstream manufacturing Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 13
- 238000005229 chemical vapour deposition Methods 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 41
- 239000007789 gas Substances 0.000 description 34
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 25
- 229910001887 tin oxide Inorganic materials 0.000 description 25
- 239000010410 layer Substances 0.000 description 20
- 230000007547 defect Effects 0.000 description 14
- 239000010408 film Substances 0.000 description 14
- 238000007496 glass forming Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 230000001629 suppression Effects 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000007507 annealing of glass Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Coating Apparatus (AREA)
- Nozzles (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/572,317 | 2009-10-02 | ||
| US12/572,317 US8557328B2 (en) | 2009-10-02 | 2009-10-02 | Non-orthogonal coater geometry for improved coatings on a substrate |
| PCT/US2010/045562 WO2011041030A1 (en) | 2009-10-02 | 2010-08-16 | Non-orthogonal coater geometry for improved coatings on a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013506761A JP2013506761A (ja) | 2013-02-28 |
| JP5596158B2 true JP5596158B2 (ja) | 2014-09-24 |
Family
ID=42797274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012532079A Expired - Fee Related JP5596158B2 (ja) | 2009-10-02 | 2010-08-16 | 基板に対する改善されたコーティングのための非直交ジオメトリ |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8557328B2 (enExample) |
| EP (1) | EP2483440A1 (enExample) |
| JP (1) | JP5596158B2 (enExample) |
| KR (1) | KR101352919B1 (enExample) |
| CN (1) | CN102656293B (enExample) |
| BR (1) | BR112012007544A2 (enExample) |
| IN (1) | IN2012DN02451A (enExample) |
| MX (1) | MX2012003853A (enExample) |
| MY (1) | MY154269A (enExample) |
| RU (1) | RU2012117731A (enExample) |
| TW (1) | TWI468231B (enExample) |
| WO (1) | WO2011041030A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9221075B2 (en) * | 2009-11-09 | 2015-12-29 | Ethicon, Inc. | Surgical needle coatings and methods |
| US9259219B2 (en) | 2009-11-09 | 2016-02-16 | Ethicon, Llc | Surgical needle coatings and methods |
| US8616821B2 (en) * | 2010-08-26 | 2013-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated apparatus to assure wafer quality and manufacturability |
| US11354558B2 (en) | 2013-01-18 | 2022-06-07 | Amatech Group Limited | Contactless smartcards with coupling frames |
| US9966281B2 (en) * | 2013-11-15 | 2018-05-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and systems for chemical mechanical polish cleaning |
| US9523328B2 (en) | 2014-02-26 | 2016-12-20 | Ford Global Technologies, Llc | System, method and tooling for flexible assembly of cylinder-head valve trains |
| JP6305314B2 (ja) * | 2014-10-29 | 2018-04-04 | 東京エレクトロン株式会社 | 成膜装置およびシャワーヘッド |
| KR102420015B1 (ko) * | 2015-08-28 | 2022-07-12 | 삼성전자주식회사 | Cs-ald 장치의 샤워헤드 |
| US10534350B2 (en) | 2016-06-28 | 2020-01-14 | Ford Motor Company | Flexible pressing verification system |
| US20170368763A1 (en) | 2016-06-28 | 2017-12-28 | Ford Motor Company | Applicator and Method for Applying a Lubricant/Sealer |
| US10745804B2 (en) * | 2017-01-31 | 2020-08-18 | Ofs Fitel, Llc | Parallel slit torch for making optical fiber preform |
| US11197666B2 (en) | 2017-09-15 | 2021-12-14 | Cilag Gmbh International | Surgical coated needles |
| WO2019239184A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| WO2019239186A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| WO2019239185A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| US11485535B2 (en) * | 2018-12-19 | 2022-11-01 | The Procter & Gamble Company | Article with visual effect |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2928627A (en) * | 1956-07-10 | 1960-03-15 | Lockheed Aircraft Corp | Aircraft propulsion systems |
| US3282243A (en) | 1965-09-08 | 1966-11-01 | Ethyl Corp | Movable means comprising vapor-plating nozzle and exhaust |
| US3333936A (en) | 1965-10-15 | 1967-08-01 | Libbey Owens Ford Glass Co | Cooler compensating heater for temperature control in glass making |
| GB1282866A (en) | 1968-08-16 | 1972-07-26 | Pilkington Brothers Ltd | Improvements in or relating to the production of glass having desired surface characteristics |
| GB1516032A (en) | 1976-04-13 | 1978-06-28 | Bfg Glassgroup | Coating of glass |
| US4402722A (en) | 1982-02-01 | 1983-09-06 | Ppg Industries, Inc. | Cooling arrangement and method for forming float glass |
| US4584206A (en) | 1984-07-30 | 1986-04-22 | Ppg Industries, Inc. | Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon |
| US4900110A (en) | 1984-07-30 | 1990-02-13 | Ppg Industries, Inc. | Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon |
| US4928627A (en) | 1985-12-23 | 1990-05-29 | Atochem North America, Inc. | Apparatus for coating a substrate |
| US4853257A (en) | 1987-09-30 | 1989-08-01 | Ppg Industries, Inc. | Chemical vapor deposition of tin oxide on float glass in the tin bath |
| US5228949A (en) * | 1991-11-07 | 1993-07-20 | Chemcut Corporation | Method and apparatus for controlled spray etching |
| JPH06112132A (ja) * | 1992-09-25 | 1994-04-22 | Fuji Electric Co Ltd | 有機金属気相成長装置 |
| US5378308A (en) * | 1992-11-09 | 1995-01-03 | Bmc Industries, Inc. | Etchant distribution apparatus |
| GB9300400D0 (en) | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
| US5356718A (en) | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| US5599387A (en) | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
| US5863337A (en) | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
| JPH10280156A (ja) * | 1997-04-09 | 1998-10-20 | Sony Corp | プラズマｃｖｄ装置 |
| JP4292623B2 (ja) * | 1999-04-27 | 2009-07-08 | 旭硝子株式会社 | 酸化スズ膜の成膜方法 |
| TW579664B (en) * | 2000-01-11 | 2004-03-11 | Matsushita Electric Industrial Co Ltd | Apparatus and method for manufacturing printed circuit board |
| US8182608B2 (en) * | 2007-09-26 | 2012-05-22 | Eastman Kodak Company | Deposition system for thin film formation |
| US7572686B2 (en) * | 2007-09-26 | 2009-08-11 | Eastman Kodak Company | System for thin film deposition utilizing compensating forces |
-
2009
- 2009-10-02 US US12/572,317 patent/US8557328B2/en active Active
-
2010
- 2010-08-16 WO PCT/US2010/045562 patent/WO2011041030A1/en not_active Ceased
- 2010-08-16 BR BR112012007544A patent/BR112012007544A2/pt not_active IP Right Cessation
- 2010-08-16 EP EP10747996A patent/EP2483440A1/en not_active Withdrawn
- 2010-08-16 JP JP2012532079A patent/JP5596158B2/ja not_active Expired - Fee Related
- 2010-08-16 CN CN201080044402.1A patent/CN102656293B/zh not_active Expired - Fee Related
- 2010-08-16 MX MX2012003853A patent/MX2012003853A/es not_active Application Discontinuation
- 2010-08-16 MY MYPI2012001220A patent/MY154269A/en unknown
- 2010-08-16 IN IN2451DEN2012 patent/IN2012DN02451A/en unknown
- 2010-08-16 KR KR1020127008392A patent/KR101352919B1/ko not_active Expired - Fee Related
- 2010-08-16 RU RU2012117731/02A patent/RU2012117731A/ru not_active Application Discontinuation
- 2010-09-13 TW TW99130896A patent/TWI468231B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| RU2012117731A (ru) | 2013-11-10 |
| BR112012007544A2 (pt) | 2016-12-06 |
| MY154269A (en) | 2015-05-29 |
| EP2483440A1 (en) | 2012-08-08 |
| US8557328B2 (en) | 2013-10-15 |
| US20110081486A1 (en) | 2011-04-07 |
| MX2012003853A (es) | 2012-05-08 |
| TWI468231B (zh) | 2015-01-11 |
| KR101352919B1 (ko) | 2014-01-17 |
| IN2012DN02451A (enExample) | 2015-08-21 |
| WO2011041030A1 (en) | 2011-04-07 |
| JP2013506761A (ja) | 2013-02-28 |
| KR20120059598A (ko) | 2012-06-08 |
| CN102656293A (zh) | 2012-09-05 |
| TW201124210A (en) | 2011-07-16 |
| CN102656293B (zh) | 2014-12-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5596158B2 (ja) | 基板に対する改善されたコーティングのための非直交ジオメトリ | |
| CN102858706B (zh) | 在基材上沉积铌掺杂的氧化钛膜的方法和由此制备的涂覆基材 | |
| SU1371499A3 (ru) | Устройство дл непрерывного осаждени покрыти из оксида металла | |
| CN107846871B (zh) | 鸟类安全窗玻璃 | |
| CA2586842C (en) | Methods and equipment for depositing coatings having sequenced structures | |
| JPH0435558B2 (enExample) | ||
| JP6293679B2 (ja) | 酸化亜鉛コーティングを蒸着させるための化学蒸着過程、導電性ガラス物品を形成するための方法、およびそれによって生成されるコーティングされたガラス物品 | |
| ES2703521T3 (es) | Aparato de recubrimiento | |
| US20170313618A1 (en) | Glass treatment | |
| JPS62158137A (ja) | 被覆した平板ガラス | |
| JP2012229491A (ja) | 障壁支持体上に配置されたパネルの吹付け処理 | |
| GB2355273A (en) | Coating glass | |
| US20230167556A1 (en) | Coating apparatus | |
| WO2011161311A1 (en) | Coating apparatus | |
| JP2001107248A (ja) | Ｃｖｄ法による成膜装置 | |
| MXPA01001605A (en) | Compositions, apparatus and methods for forming coatings of selected color on a substrate and articles produced thereby |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130903 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20131203 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20131210 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131226 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140228 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140312 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140715 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140806 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5596158 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |