JP5562133B2 - 粒子線治療装置および粒子線治療装置の調整方法 - Google Patents

粒子線治療装置および粒子線治療装置の調整方法 Download PDF

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JP5562133B2
JP5562133B2 JP2010137243A JP2010137243A JP5562133B2 JP 5562133 B2 JP5562133 B2 JP 5562133B2 JP 2010137243 A JP2010137243 A JP 2010137243A JP 2010137243 A JP2010137243 A JP 2010137243A JP 5562133 B2 JP5562133 B2 JP 5562133B2
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irradiation
particle beam
charged particle
electromagnet
scanning
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JP2012000232A (ja
JP2012000232A5 (https=
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久 原田
高明 岩田
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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JP2010137243A 2010-06-16 2010-06-16 粒子線治療装置および粒子線治療装置の調整方法 Expired - Fee Related JP5562133B2 (ja)

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JP2010137243A JP5562133B2 (ja) 2010-06-16 2010-06-16 粒子線治療装置および粒子線治療装置の調整方法

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JP2010137243A JP5562133B2 (ja) 2010-06-16 2010-06-16 粒子線治療装置および粒子線治療装置の調整方法

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JP2012000232A JP2012000232A (ja) 2012-01-05
JP2012000232A5 JP2012000232A5 (https=) 2013-07-25
JP5562133B2 true JP5562133B2 (ja) 2014-07-30

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5907862B2 (ja) * 2012-04-27 2016-04-26 三菱電機株式会社 粒子線回転照射装置
WO2014196052A1 (ja) * 2013-06-06 2014-12-11 三菱電機株式会社 粒子線治療装置および線量校正係数の設定方法
JP2021159110A (ja) * 2020-03-30 2021-10-11 住友重機械工業株式会社 荷電粒子線照射装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2824363B2 (ja) * 1992-07-15 1998-11-11 三菱電機株式会社 ビーム供給装置
JPH08257148A (ja) * 1995-03-24 1996-10-08 Hitachi Ltd 回転ガントリ
JP3260611B2 (ja) * 1995-12-05 2002-02-25 株式会社東芝 荷電ビーム描画制御装置
JP3178381B2 (ja) * 1997-02-07 2001-06-18 株式会社日立製作所 荷電粒子照射装置
JP3052957B2 (ja) * 1999-03-19 2000-06-19 株式会社日立製作所 荷電粒子ビーム出射方法及び円形加速器
WO2001069643A1 (en) * 2000-03-13 2001-09-20 Hitachi, Ltd. Charged particle beam scanning device
JP3423675B2 (ja) * 2000-07-13 2003-07-07 住友重機械工業株式会社 荷電粒子線照射装置、及び、これを用いた治療装置
JP2002141199A (ja) * 2000-10-31 2002-05-17 Sumitomo Heavy Ind Ltd 電子ビームの軌道補正装置及び軌道補正方法
JP4646069B2 (ja) * 2005-11-14 2011-03-09 株式会社日立製作所 粒子線照射システム
JP2008085120A (ja) * 2006-09-28 2008-04-10 Nuflare Technology Inc 荷電粒子ビーム描画装置の位置補正係数算出方法及び荷電粒子ビーム描画装置の位置補正係数更新方法
JP5828610B2 (ja) * 2007-07-12 2015-12-09 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法および荷電粒子ビーム描画装置
CN102414760B (zh) * 2009-06-09 2014-04-16 三菱电机株式会社 粒子射线照射装置

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