JP5557614B2 - Polishing equipment - Google Patents

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JP5557614B2
JP5557614B2 JP2010141344A JP2010141344A JP5557614B2 JP 5557614 B2 JP5557614 B2 JP 5557614B2 JP 2010141344 A JP2010141344 A JP 2010141344A JP 2010141344 A JP2010141344 A JP 2010141344A JP 5557614 B2 JP5557614 B2 JP 5557614B2
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JP2012006089A (en
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恵一 宮越
文昭 斎藤
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株式会社 エステーリンク
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本発明は、ワークの研磨やバリ取りを行う研磨装置に関するものである。   The present invention relates to a polishing apparatus for polishing and deburring a workpiece.

この種の研磨装置としては、例えば特開平5−337812号(特許文献1)がある。   As this type of polishing apparatus, for example, there is JP-A-5-337812 (Patent Document 1).

この特許文献1を簡単に説明すると、ワークを載置して移送するベルトコンベアと、該コンベアのコンベアライン上に配置されてこのコンベア上のワークを下面(研磨面)で押圧した状態で研磨する複数の回転研磨体とを備えている。   Briefly explaining this Patent Document 1, a belt conveyor on which a workpiece is placed and transferred, and a workpiece placed on the conveyor line of the conveyor and polished in a state where the workpiece on the conveyor is pressed on the lower surface (polishing surface). And a plurality of rotating abrasive bodies.

また、この種の研磨装置は、機械操作により前記研磨体の高さ調整を行うことができるように構成されていて、ワークの高さ(厚さ)に応じて、あるいは研磨体の摩耗具合いに応じて高さ調整を行うことで、ワークに対する所望の押し当て力を実現できるようになっている。   In addition, this type of polishing apparatus is configured so that the height of the polishing body can be adjusted by a mechanical operation, depending on the height (thickness) of the workpiece or the wear condition of the polishing body. A desired pressing force against the workpiece can be realized by adjusting the height accordingly.

即ち、例えば、高さのあるワークに対しては研磨体を上昇させ、高さのないワークに対しては研磨体を下降させ、また、研磨体の研磨面が摩耗してきたら、研磨体を下降させることで対応できるように構成されている。   That is, for example, for a workpiece having a height, the polishing body is raised, for a workpiece having no height, the polishing body is lowered, and when the polishing surface of the polishing body is worn, the polishing body is lowered. It is comprised so that it can respond by doing.

特開平5−337812号公報Japanese Patent Laid-Open No. 5-337812

この種の研磨装置の研磨体の高さ調整は、研磨体の研磨面をワークに対して若干押し付けた状態で目視しながら調整しているが、この作業を精度良く行うのは非常に難しく、時間と手間のかかる作業であった。   The height adjustment of the polishing body of this type of polishing apparatus is adjusted while observing the polishing surface of the polishing body slightly pressed against the workpiece, but it is very difficult to perform this work with high accuracy. It was time consuming and labor intensive.

本発明は、このような従来の研磨装置の欠点に注目し、これを解決しようとするもので、研磨体の研磨面が消耗しても、研磨面が設定したワーク研磨位置に移動するように制御されて安定した研磨作業が行われる研磨装置を提供するものである。   The present invention pays attention to the drawbacks of such a conventional polishing apparatus and tries to solve it. Even if the polishing surface of the polishing body is consumed, the polishing surface moves to the set workpiece polishing position. A polishing apparatus that performs controlled and stable polishing work is provided.

添付図面を参照して本発明の要旨を説明する。   The gist of the present invention will be described with reference to the accompanying drawings.

ワークWを載置若しくは固定する支持部1と、この支持部1の上方に設けられて支持部1に載置若しくは固定した前記ワークWを研磨する研磨体2と、この研磨体2を前記ワークWの高さに応じて前記支持部1に対し昇降移動可能な昇降機構4とを備えた研磨装置において、前記昇降機構4を介して前記研磨体2を前記支持部1に対し上昇移動若しくは下降移動した際にこの研磨体2下端の研磨面3が予め設定した基準位置P1に位置したことを検出する基準位置検出手段5と、基準位置検出手段5が前記基準位置P1に位置した前記研磨体2の研磨面3を検出した際に、この基準位置P1から研磨体2を予め設定した移動量Lだけ上昇移動若しくは下降移動させてこの研磨体2の研磨面3がワーク研磨位置P2に位置するように前記昇降機構4を駆動制御する制御部を備え、予め設定した高さ以上の高さを有するワークWを検出する想定外ワーク検出手段6を備え、この想定外ワーク検出手段6が前記ワークWを検出した際に研磨作業を停止する緊急停止手段を前記制御部に設け、前記支持部1は、ワークWを載置若しくは固定して移送する移送機構7を備え、この支持部1の移送機構7の移送始端側に前記想定外ワーク検出手段6を設けると共に、この想定外ワーク検出手段6は、支持部1に対し昇降移動可能に設けて、この想定外ワーク検出手段6で検出するワークWの高さを設定変更可能な構成としたことを特徴とする研磨装置に係るものである。 A support portion 1 for placing or fixing the workpiece W, a polishing body 2 provided above the support portion 1 for polishing the workpiece W placed or fixed on the support portion 1, and the polishing body 2 for the workpiece In a polishing apparatus including an elevating mechanism 4 that can move up and down with respect to the support portion 1 according to the height of W, the polishing body 2 is moved up or down with respect to the support portion 1 via the elevating mechanism 4. Reference position detection means 5 for detecting that the polishing surface 3 at the lower end of the polishing body 2 is located at a preset reference position P1 when moved, and the polishing body where the reference position detection means 5 is located at the reference position P1. When the second polishing surface 3 is detected, the polishing body 2 is moved up or down by a predetermined movement amount L from the reference position P1, and the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2. As the elevator 4 includes a control unit for controlling driving, provided unexpected workpiece detecting means 6 for detecting a workpiece W having a height above the height of which is set in advance, when the unexpected workpiece detection means 6 detects the workpiece W An emergency stop means for stopping the polishing operation is provided in the control unit, and the support unit 1 is provided with a transfer mechanism 7 for transferring the workpiece W by placing or fixing it, and a transfer start end of the transfer mechanism 7 of the support unit 1 The unexpected workpiece detection means 6 is provided on the side, and the unexpected workpiece detection means 6 is provided so as to be movable up and down with respect to the support portion 1, and the height of the workpiece W detected by the unexpected workpiece detection means 6 is determined. The present invention relates to a polishing apparatus characterized in that the configuration can be changed .

また、前記研磨体2の研磨面3のワーク研磨位置P2を、前記ワークWの高さに応じて設定変更可能な研磨位置設定手段と、この研磨位置設定手段の設定値に基づいて、前記基準位置P1から前記ワーク研磨位置P2までの研磨体2の前記移動量Lを自動設定する移動量設定手段とを前記制御部に設けたことを特徴とする請求項1記載の研磨装置に係るものである。   Further, based on the setting value of the polishing position setting means and the polishing position setting means capable of changing the setting of the work polishing position P2 of the polishing surface 3 of the polishing body 2 according to the height of the work W, the reference The polishing apparatus according to claim 1, wherein a movement amount setting means for automatically setting the movement amount L of the polishing body 2 from a position P1 to the workpiece polishing position P2 is provided in the control unit. is there.

また、前記基準位置検出手段5は、前記支持部1に載置若しくは固定した前記ワークWの上面より高い位置に設けて、この基準位置検出手段5が前記昇降機構4を介して上昇移動する前記研磨体2の研磨面3をワークW上面より上方の前記基準位置P1で検出し得るように構成し、この基準位置検出手段5が前記基準位置P1で前記研磨面3を検出した際に、前記制御部は、前記基準位置P1から前記研磨体2を予め設定した移動量Lだけ下降移動させてこの研磨体2の研磨面3を前記ワーク研磨位置P2に位置するように前記昇降機構4を駆動制御する構成としたことを特徴とする請求項1,2のいずれか1項に記載の研磨装置に係るものである。   The reference position detection means 5 is provided at a position higher than the upper surface of the workpiece W placed or fixed on the support portion 1, and the reference position detection means 5 moves up and down via the elevating mechanism 4. The polishing surface 3 of the polishing body 2 is configured to be detected at the reference position P1 above the upper surface of the workpiece W, and when the reference position detection unit 5 detects the polishing surface 3 at the reference position P1, The control unit drives the lifting mechanism 4 so that the polishing body 2 is moved downward from the reference position P1 by a preset movement amount L so that the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2. The polishing apparatus according to claim 1, wherein the polishing apparatus is controlled.

また、一つのワークWの研磨作業終了後あるいは所定数のワークWの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、前記研磨体2を上昇移動若しくは下降移動させて前記基準位置検出手段5による前記研磨体2の研磨面3の基準位置検出が行われるように前記昇降機構4を駆動制御する定期駆動手段を前記制御部に設けたことを特徴とする請求項1〜3のいずれか1項に記載の研磨装置に係るものである。   Further, after the polishing operation of one workpiece W, after the polishing operation of a predetermined number of workpieces W, or after a predetermined time has elapsed from the start of the polishing operation, the polishing body 2 is moved up or down to move the reference position detecting means 5. The periodical drive means which drive-controls the said raising / lowering mechanism 4 so that the reference | standard position detection of the grinding | polishing surface 3 of the said grinding | polishing body 2 by said may be provided in the said control part. This relates to the polishing apparatus according to the item.

また、前記基準位置検出手段5は、前記研磨体2に対し非接触で前記研磨面3を検出可能な光電センサー5を採用したことを特徴とする請求項1〜4のいずれか1項に記載の研磨装置に係るものである。   5. The photoelectric sensor 5 according to claim 1, wherein the reference position detection unit 5 employs a photoelectric sensor 5 capable of detecting the polishing surface 3 in a non-contact manner with respect to the polishing body 2. This relates to a polishing apparatus.

本発明は上述のように構成したから、たとえ研磨体の研磨面が摩耗しても、この摩耗した研磨面で新たな基準位置を設定し直した上で、この基準位置から予め設定した移動量だけ研磨体を自動的に移動制御してワーク研磨位置に位置させるので、このワーク研磨位置の研磨体は、研磨面の位置が研磨作業開始当初のワーク研磨位置の研磨体の研磨面と同じ位置となり、従って適時研磨面の基準位置検出を行うようにすることで、摩耗した研磨面でも研磨開始当初と同等のワークに対する所望押し当て力を自動的に実現でき、常に安定した研磨性能を発揮できることになる極めて実用性に優れた研磨装置となる。   Since the present invention is configured as described above, even if the polishing surface of the polishing body is worn, a new reference position is set again on the worn polishing surface, and the movement amount set in advance from the reference position is set. Therefore, the polishing body at this workpiece polishing position is positioned at the same position as the polishing surface of the polishing body at the initial workpiece polishing position. Therefore, by detecting the reference position of the polished surface in a timely manner, the desired pressing force against the workpiece equivalent to that at the beginning of polishing can be automatically realized even on a worn polished surface, and stable polishing performance can always be exhibited. Thus, the polishing apparatus is extremely practical.

また、本発明においては、移送機構により移送されたワークを次々と研磨して効率的に研磨作業を行うことができ、しかも、故障の懸念のある想定以上の高さのワークが移送されてきた場合には、このワークが研磨される前に研磨作業が確実に停止して故障を未然に防止することができ、その上、想定外ワーク検出手段で検出するワークの高さを設定変更可能であるなど、一層実用性に優れた構成の研磨装置となる。Further, in the present invention, the workpieces transferred by the transfer mechanism can be polished one after another to efficiently perform the polishing operation, and a workpiece with a height higher than expected that may cause a failure has been transferred. In this case, the polishing operation can be stopped before the workpiece is polished to prevent a failure, and the height of the workpiece detected by the unexpected workpiece detection means can be changed. For example, a polishing apparatus having a configuration that is more practical.

また、請求項2記載の発明においては、異なる高さのワークに対応して安定した研磨性能を発揮でき、しかも、研磨位置設定手段でワーク研磨位置を設定するだけで、基準位置からワーク研磨位置までの研磨体の前記移動量が自動設定される一層実用性に優れた構成の研磨装置となる。   In the invention described in claim 2, stable polishing performance can be exhibited corresponding to workpieces of different heights, and the workpiece polishing position can be changed from the reference position only by setting the workpiece polishing position by the polishing position setting means. Thus, the polishing apparatus having a more practical configuration in which the amount of movement of the polishing body is set automatically.

また、請求項3記載の発明においては、高さのない板状のワークへの研磨加工に好適な極めて実用性に優れた構成の研磨装置となる。   In the invention according to claim 3, the polishing apparatus has a configuration excellent in practicality and suitable for polishing a plate-like workpiece having no height.

また、請求項4記載の発明においては、基準位置検出手段による研磨体の研磨面の基準位置検出が自動で定期的に行われるので、一層安定した研磨作業が実現することになる極めて実用性に優れた構成の研磨装置となる。   Further, in the invention described in claim 4, since the reference position detection of the polishing surface of the polishing body is automatically and periodically performed by the reference position detecting means, a more stable polishing operation can be realized. The polishing apparatus has an excellent configuration.

また、請求項5記載の発明においては、光電センサーによる信頼性の高い研磨面の基準位置検出が可能であると共に、研磨体が自転したり、複数の研磨体が公転するような装置構成であっても、確実に基準位置を検出することができる一層実用性に優れた構成の研磨装置となる。   Further, the invention according to claim 5 is an apparatus configuration in which the reference position of the polishing surface with high reliability can be detected by the photoelectric sensor, and the polishing body rotates or a plurality of polishing bodies revolves. However, the polishing apparatus can be surely detected at the reference position and has a more practical configuration.

本実施例を示す概略説明側面図である。It is a schematic explanatory side view which shows a present Example. 本実施例の要部を示す概略説明斜視図である。It is a schematic explanatory perspective view which shows the principal part of a present Example. 本実施例の使用状態における、研磨体の研磨面がワークに対して所望の押し当て力で研磨する様子を示した概略説明正面図である。It is the general | schematic explanatory front view which showed a mode that the grinding | polishing surface of the grinding | polishing body grind | polished with a desired pressing force with respect to a workpiece | work in the use condition of a present Example. 本実施例の使用状態における、研磨体の研磨面が摩耗した様子を示した概略説明正面図である。It is the schematic explanatory front view which showed a mode that the grinding | polishing surface of the grinding | polishing body was worn in the use condition of a present Example. 本実施例の使用状態における、研磨体を上昇移動させて摩耗した研磨面を基準位置検出手段で検出する様子を示した概略説明正面図である。It is the rough explanatory front view which showed a mode that the grinding | polishing surface which abraded up and moved and was worn with the reference | standard position detection means in the use condition of a present Example. 図5に続いて、研磨体が基準位置から予め設定した移動量だけ下降移動してワーク研磨位置に位置し、研磨体の研磨面がワークに対して所望の押し当て力で研磨する様子を示した概略説明正面図である。Following FIG. 5, the polishing body moves downward from the reference position by a predetermined amount of movement and is positioned at the workpiece polishing position, and the polishing surface of the polishing body is polished with a desired pressing force against the workpiece. FIG. 本実施例の想定外ワーク検出手段の動作説明図である。It is operation | movement explanatory drawing of the unexpected workpiece | work detection means of a present Example.

好適と考える本発明の実施形態を、図面に基づいて本発明の作用を示して簡単に説明する。   An embodiment of the present invention which is considered to be suitable will be briefly described with reference to the drawings showing the operation of the present invention.

予め基準位置検出手段5で検出する基準位置P1と、この基準位置P1とワークWの高さ(厚さ)の関係に基づいて、この基準位置P1からワーク研磨位置P2までの研磨体2の前記移動量Lを設定しておく。   Based on the reference position P1 detected in advance by the reference position detection means 5 and the relationship between the reference position P1 and the height (thickness) of the workpiece W, the polishing body 2 from the reference position P1 to the workpiece polishing position P2 is described above. A movement amount L is set in advance.

支持部1にワークWを載置若しくは固定すると共に、支持部1上方に設けられた研磨体2をワーク研磨位置P2に位置させると、この研磨体2の下端の研磨面3でワークWを研磨することができる。   When the workpiece W is placed on or fixed to the support portion 1 and the polishing body 2 provided above the support portion 1 is positioned at the workpiece polishing position P2, the workpiece W is polished by the polishing surface 3 at the lower end of the polishing body 2. can do.

この研磨作業を継続すると、研磨体2の研磨面3に摩耗を生じてくるが、適時昇降機構4を介して前記研磨体2を前記支持部1に対し上昇移動若しくは下降移動させると、基準位置検出手段5が研磨体2下端の研磨面3が予め設定した前記基準位置P1に位置したことを検出し、この際、制御部が基準位置P1から研磨体2を予め設定しておいた前記移動量Lだけ上昇移動若しくは下降移動させてこの研磨体2の研磨面3が前記ワーク研磨位置P2に位置するように前記昇降機構4を駆動制御することになる。   If this polishing operation is continued, the polishing surface 3 of the polishing body 2 will be worn, but if the polishing body 2 is moved up or down with respect to the support portion 1 via the lifting mechanism 4 in a timely manner, the reference position The detecting means 5 detects that the polishing surface 3 at the lower end of the polishing body 2 is located at the preset reference position P1, and at this time, the control unit moves the preset polishing body 2 from the reference position P1. The lifting mechanism 4 is driven and controlled so that the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2 by being moved up or down by an amount L.

即ち、研磨体2の研磨面3に摩耗を生じても、その摩耗した研磨面3を新たな基準位置P1に設定し直し、その上でこの基準位置P1から予め設定した移動量Lだけ研磨体2を移動させてワーク研磨位置P2に位置させるので、このワーク研磨位置P2の研磨体2は、その研磨面3の位置が研磨作業開始当初のワーク研磨位置P2の研磨体2の研磨面3と同じ位置に位置することになる。   That is, even if the polishing surface 3 of the polishing body 2 is worn, the worn polishing surface 3 is reset to a new reference position P1, and then the polishing body is moved by a preset amount L from the reference position P1. 2 is moved to the workpiece polishing position P2, the polishing body 2 at the workpiece polishing position P2 has a polishing surface 3 whose position is the same as the polishing surface 3 of the polishing body 2 at the workpiece polishing position P2 at the beginning of the polishing operation. It will be located at the same position.

従って、たとえ研磨面3が摩耗しても、この摩耗した研磨面3を基準位置P1で検出することにより研磨開始当初と同等のワークWに対する所望押し当て力を自動的に実現できるので、研磨面3の基準位置P1検出を適時行うようにすることで常に安定した研磨性能を発揮できることになる。   Therefore, even if the polishing surface 3 is worn, the desired pressing force against the workpiece W equivalent to the beginning of polishing can be automatically realized by detecting the worn polishing surface 3 at the reference position P1, so that the polishing surface By performing the detection of the third reference position P1 in a timely manner, a stable polishing performance can always be exhibited.

また、例えば、前記研磨体2の研磨面3のワーク研磨位置P2を、前記ワークWの高さに応じて設定変更可能な研磨位置設定手段と、この研磨位置設定手段の設定値に基づいて、前記基準位置P1から前記ワーク研磨位置P2までの研磨体2の前記移動量Lを自動設定する移動量設定手段とを前記制御部に設ければ、異なる高さのワークWに対しても、研磨位置設定手段でワーク研磨位置P2を設定変更することで良好に対応できるし、この研磨位置設定手段でワーク研磨位置P2を設定すると、この基準位置P1から前記ワーク研磨位置P2までの研磨体2の前記移動量Lが移動量設定手段により自動設定されることになる。   Further, for example, based on the polishing position setting means capable of setting and changing the workpiece polishing position P2 of the polishing surface 3 of the polishing body 2 according to the height of the workpiece W, and the set value of the polishing position setting means, If a movement amount setting means for automatically setting the movement amount L of the polishing body 2 from the reference position P1 to the workpiece polishing position P2 is provided in the control unit, even workpieces W of different heights can be polished. This can be satisfactorily handled by changing the setting of the workpiece polishing position P2 by the position setting means. When the workpiece polishing position P2 is set by the polishing position setting means, the polishing body 2 from the reference position P1 to the workpiece polishing position P2 can be adjusted. The movement amount L is automatically set by the movement amount setting means.

また、例えば、前記基準位置検出手段5は、前記支持部1に載置若しくは固定した前記ワークWの上面より高い位置に設けて、この基準位置検出手段5が前記昇降機構4を介して上昇移動する前記研磨体2の研磨面3をワークW上面より上方の前記基準位置P1で検出し得るように構成し、この基準位置検出手段5が前記基準位置P1で前記研磨面3を検出した際に、前記制御部は、前記基準位置P1から前記研磨体2を予め設定した移動量Lだけ下降移動させてこの研磨体2の研磨面3を前記ワーク研磨位置P2に位置するように前記昇降機構4を駆動制御する構成とすれば、前記昇降機構4を介して前記研磨体2を前記支持部1に対し上昇移動させると、基準位置検出手段5が研磨体2下端の研磨面3が予め設定した基準位置P1に位置したことを検出した際、制御部が基準位置P1から研磨体2を予め設定しておいた前記移動量Lだけ下降移動させてこの研磨体2の研磨面3がワーク研磨位置P2に位置するように前記昇降機構4を駆動制御することになる。   Further, for example, the reference position detection means 5 is provided at a position higher than the upper surface of the work W placed or fixed on the support portion 1, and the reference position detection means 5 moves up and down via the lifting mechanism 4. The polishing surface 3 of the polishing body 2 is configured so as to be detected at the reference position P1 above the upper surface of the work W, and when the reference position detection means 5 detects the polishing surface 3 at the reference position P1. The controller 4 moves the polishing body 2 downward from the reference position P1 by a preset movement amount L so that the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2. If the polishing body 2 is lifted and moved with respect to the support portion 1 via the lifting mechanism 4, the reference position detection means 5 sets the polishing surface 3 at the lower end of the polishing body 2 in advance. Position at reference position P1 When this is detected, the control unit moves the polishing body 2 downward from the reference position P1 by the preset movement amount L so that the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2. The elevating mechanism 4 is driven and controlled.

従って、例えば高さのない板状のワークWへの研磨加工に際しては、研磨体2を下降移動させるストロークが確保できないような場合が想定されるが、そのような板状のワークWに対してもワークWの上面より高い位置で基準位置P1を検出することができ、この基準位置P1からワーク研磨位置P2へ支障なく下降移動させることができるので、高さのないワークWの研磨加工に好適である。   Therefore, for example, when polishing a plate-shaped workpiece W having no height, it is assumed that a stroke for moving the polishing body 2 downward cannot be secured. Since the reference position P1 can be detected at a position higher than the upper surface of the workpiece W and can be moved downward from the reference position P1 to the workpiece polishing position P2 without any trouble, it is suitable for polishing the workpiece W having no height. It is.

また、例えば、一つのワークWの研磨作業終了後あるいは所定数のワークWの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、前記研磨体2を上昇移動若しくは下降移動させて前記基準位置検出手段5による前記研磨体2の研磨面3の基準位置検出が行われるように前記昇降機構4を駆動制御する定期駆動手段を前記制御部に設ければ、基準位置検出手段5による前記研磨体2の研磨面3の基準位置検出が、自動で定期的に行われる。   Further, for example, the reference position detection is performed by moving the polishing body 2 up or down after the polishing operation of one workpiece W, after the polishing operation of a predetermined number of workpieces W, or after a predetermined time has elapsed from the start of the polishing operation. If periodic control means for driving and controlling the lifting mechanism 4 is provided in the control unit so that the reference position of the polishing surface 3 of the polishing body 2 is detected by the means 5, the polishing body 2 by the reference position detection means 5 is provided. The reference position of the polished surface 3 is automatically and periodically detected.

特に、定期駆動手段を、所定数のワークWの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、前記昇降機構4を駆動制御する構成とすれば、研磨作業効率をさほど低下させることなく、基準位置検出を行うことができるので実用的となる。   In particular, if the periodic drive means is configured to drive and control the lifting mechanism 4 after the polishing operation of a predetermined number of workpieces W or after a predetermined time has elapsed from the start of the polishing operation, the polishing operation efficiency is not significantly reduced. Since the reference position can be detected, it becomes practical.

また、例えば、前記基準位置検出手段5は、前記研磨体2に対し非接触で前記研磨面3を検出可能な光電センサー5を採用すれば、信頼性の高い光電センサー5によって精度良く研磨面3の基準位置P1を検出でき、更に研磨体2が自転したり、複数の研磨体2が公転するような装置構成であっても、これらの動作に支障を与えることなく非接触の光電センサー5によって確実に基準位置P1を検出することができる。   Further, for example, if the photoelectric sensor 5 capable of detecting the polishing surface 3 in a non-contact manner with respect to the polishing body 2 is used as the reference position detection means 5, the polishing surface 3 can be accurately obtained by the highly reliable photoelectric sensor 5. The reference position P1 can be detected, and even when the polishing body 2 rotates or the plurality of polishing bodies 2 revolve, the non-contact photoelectric sensor 5 does not interfere with these operations. The reference position P1 can be reliably detected.

また、例えば、予め設定した高さ以上の高さを有するワークWを検出する想定外ワーク検出手段6を備え、この想定外ワーク検出手段6が前記ワークWを検出した際に研磨作業を停止する緊急停止手段を前記制御部に設ければ、高さがありすぎて研磨体2や装置自体に故障を生じる懸念のあるワークWは、想定外ワーク検出手段6に検出されて緊急停止手段により研磨作業が停止するので、故障を防止できる。   Further, for example, an unexpected workpiece detection means 6 for detecting a workpiece W having a height higher than a preset height is provided, and the polishing operation is stopped when the unexpected workpiece detection means 6 detects the workpiece W. If the emergency stop means is provided in the control unit, a workpiece W that is too high and may cause a failure in the polishing body 2 or the apparatus itself is detected by the unexpected work detection means 6 and polished by the emergency stop means. Since work is stopped, failure can be prevented.

また、例えば、前記支持部1は、ワークWを載置若しくは固定して移送する移送機構7を備え、この支持部1の移送機構7の移送始端側に前記想定外ワーク検出手段6を設けると共に、この想定外ワーク検出手段6は、支持部1に対し昇降移動可能に設けて、この想定外ワーク検出手段6で検出するワークWの高さを設定変更可能な構成とすれば、移送機構7により移送されたワークWを研磨体2で次々と研磨できるので、効率的な研磨作業がなされる。   Further, for example, the support unit 1 includes a transfer mechanism 7 that transfers the workpiece W by placing or fixing the work W, and the unexpected workpiece detection means 6 is provided on the transfer start end side of the transfer mechanism 7 of the support unit 1. If the unexpected work detection means 6 is provided so as to be movable up and down with respect to the support portion 1 and the height of the work W detected by the unexpected work detection means 6 can be set and changed, the transfer mechanism 7 can be changed. Since the workpieces W transferred by the above can be polished one after another by the polishing body 2, an efficient polishing operation is performed.

しかし、高さがありすぎて故障の懸念のあるワークWが移送されてくると、このワークWが移送機構7の移送始端側で想定外ワーク検出手段6に検出されて研磨体2による研磨が行われる前に研磨作業が停止するので、想定外のワークWを研磨してしまうことによる故障が未然に防止されることになる。   However, when a workpiece W that is too high and has a possibility of failure is transferred, the workpiece W is detected by the unexpected workpiece detection means 6 on the transfer start end side of the transfer mechanism 7, and polishing by the polishing body 2 is performed. Since the polishing operation is stopped before being performed, a failure caused by polishing an unexpected workpiece W is prevented in advance.

また、想定外ワーク検出手段6は、支持部1に対し昇降移動できるので、この想定外ワーク検出手段6で検出するワークWの高さを研磨するワークWの高さに応じて設定変更可能である。   Moreover, since the unexpected workpiece | work detection means 6 can be moved up and down with respect to the support part 1, the setting change of the height of the workpiece | work W detected by this unexpected workpiece | work detection means 6 can be carried out according to the height of the workpiece | work W to grind | polish. is there.

本発明の具体的な実施例について図面に基づいて説明する。   Specific embodiments of the present invention will be described with reference to the drawings.

本実施例は、板状のワークWを研磨したりバリ取りしたりするための研磨装置に適用したもので、装置本体8にワークWを載置若しくは固定する支持部1を設け、この装置本体8の前記支持部1の上方に、支持部1に載置若しくは固定した前記ワークWを研磨する研磨体2と、この研磨体2を前記ワークWの高さに応じて前記支持部1に対し昇降移動可能な昇降機構4とを設けている。   The present embodiment is applied to a polishing apparatus for polishing or deburring a plate-like workpiece W. The apparatus main body 8 is provided with a support 1 for mounting or fixing the workpiece W, and this apparatus main body. 8 above the support portion 1, a polishing body 2 for polishing the workpiece W placed or fixed on the support portion 1, and the polishing body 2 with respect to the support portion 1 according to the height of the workpiece W An elevating mechanism 4 that can move up and down is provided.

具体的には、本実施例の支持部1は、ワークWを載置して移送する移送機構7としてのベルトコンベア7で構成し、このベルトコンベア7を装置本体8に水平に配設して、ワークW移送方向が水平方向となるように構成している。また、図示していないが、この支持部1には、ベルトコンベア7上に載置したワークWを固定しながら移送するための固定手段(吸着装置など)を設けている。   Specifically, the support portion 1 of the present embodiment is configured by a belt conveyor 7 as a transfer mechanism 7 for placing and transferring the workpiece W, and the belt conveyor 7 is disposed horizontally on the apparatus main body 8. The workpiece W transfer direction is horizontal. Although not shown, the support 1 is provided with a fixing means (such as a suction device) for transferring the workpiece W placed on the belt conveyor 7 while fixing it.

また、本実施例の研磨体2は、円板形の基板部から下向きに多数の等長ブラシ毛を密集状態に突設した研磨ブラシ2を採用しており、この研磨ブラシ2の多数のブラシ毛の下端部が集合してなす水平面状の研磨体2下端部を、板状のワークWの表面を研磨するための研磨面3としている。   Further, the polishing body 2 of the present embodiment employs a polishing brush 2 in which a large number of equal-length brush hairs protrude downwardly from a disk-shaped substrate portion, and the many brushes of the polishing brush 2 are used. A lower end of the horizontal polishing body 2 formed by gathering the lower ends of the bristles is used as a polishing surface 3 for polishing the surface of the plate-like workpiece W.

また、この研磨体2は、複数個(図面では四個)を装置本体8内の前記支持部1上方に配設したベース板9に対して夫々水平方向に回転可能に設けている。   A plurality (four in the drawing) of the polishing bodies 2 are provided so as to be horizontally rotatable with respect to the base plate 9 disposed above the support portion 1 in the apparatus main body 8.

また、このベース板9は、装置本体8に対して水平方向に回転可能に設けている。   The base plate 9 is provided so as to be rotatable in the horizontal direction with respect to the apparatus main body 8.

そして、本実施例では、研磨体2とベース板9の双方の回転駆動源として装置本体8内に研磨駆動モータ10を設け、この研磨駆動モータ10により研磨体2がベース板9に対し自転駆動すると共に、同時にベース板9も装置本体8に対し例えば研磨体2の自転方向と反対方向に回転(公転)駆動して、前記支持部1上に載置したワークWの表面を研磨する構成としている。   In this embodiment, a polishing drive motor 10 is provided in the apparatus main body 8 as a rotational drive source for both the polishing body 2 and the base plate 9, and the polishing body 2 is driven to rotate relative to the base plate 9 by the polishing drive motor 10. At the same time, the base plate 9 is also driven to rotate (revolve) in the direction opposite to the rotation direction of the polishing body 2 with respect to the apparatus main body 8 to polish the surface of the workpiece W placed on the support portion 1. Yes.

また、本実施例の昇降機構4は、前記ベース板9に螺子杆11を立設状態にして回動自在に設けると共に、この螺子杆11を装置本体8内に設けた雌螺子部12に螺着支持した構成として、この雌螺子部12に対して螺子杆11を回動螺動させると、前記ベース板9(研磨体2)が装置本体8(支持部1)に対して昇降移動するように構成している。   Further, the elevating mechanism 4 of this embodiment is provided so as to be rotatable with the screw rod 11 standing on the base plate 9, and the screw rod 11 is screwed into a female screw portion 12 provided in the apparatus main body 8. As a structure that is attached and supported, the base plate 9 (polishing body 2) is moved up and down with respect to the apparatus main body 8 (supporting portion 1) when the screw rod 11 is rotated and screwed with respect to the female screw portion 12. It is configured.

また、この螺子杆11にはスプロケット13を設け、一方、装置本体8内の上部に設けた昇降駆動源としての昇降駆動モータ14にもスプロケット13を設け、この螺子杆11のスプロケット13と昇降駆動モータ14のスプロケット13とをチェーン15で連結している。従って、昇降駆動モータ14の回転駆動力がチェーン15を介して螺子杆11に伝達されて、ベース板9(研磨体2)が昇降移動する構成としている。   Further, the screw rod 11 is provided with a sprocket 13, and on the other hand, a sprocket 13 is also provided on an elevating drive motor 14 as an elevating drive source provided at an upper portion in the apparatus main body 8. The sprocket 13 of the motor 14 is connected by a chain 15. Therefore, the rotational driving force of the elevating drive motor 14 is transmitted to the screw rod 11 through the chain 15, and the base plate 9 (polishing body 2) moves up and down.

本実施例は、前記昇降機構4を介して前記研磨体2を前記支持部1に対し上昇移動若しくは下降移動した際にこの研磨体2下端の前記研磨面3が予め設定した基準位置P1に位置したことを検出する基準位置検出手段5と、基準位置検出手段5が前記基準位置P1に位置した前記研磨体2の研磨面3を検出した際に、この基準位置P1から研磨体2を予め設定した移動量Lだけ上昇移動若しくは下降移動させてこの研磨体2の研磨面3がワーク研磨位置P2に位置するように前記昇降機構4を駆動制御する制御部を備えている。   In this embodiment, when the polishing body 2 is moved up or down with respect to the support portion 1 via the lifting mechanism 4, the polishing surface 3 at the lower end of the polishing body 2 is positioned at a preset reference position P1. When the reference position detecting means 5 for detecting that the polishing position is detected, and when the reference position detecting means 5 detects the polishing surface 3 of the polishing body 2 located at the reference position P1, the polishing body 2 is set in advance from the reference position P1. A controller for driving and controlling the elevating mechanism 4 is provided so that the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2 by being moved up or down by the amount of movement L.

具体的には、本実施例の基準位置検出手段5は、前記研磨体2に対し非接触で前記研磨面3を検出可能な光電センサー5を採用し、この光電センサー5を前記支持部1に載置若しくは固定した前記ワークWの上面より高い位置に設けて、この基準位置検出手段5が前記昇降機構4を介して上昇移動する前記研磨体2の研磨面3をワークW上面より上方の前記基準位置P1で検出し得るように構成している。   Specifically, the reference position detection means 5 of the present embodiment employs a photoelectric sensor 5 that can detect the polishing surface 3 in a non-contact manner with respect to the polishing body 2, and this photoelectric sensor 5 is used as the support portion 1. Provided at a position higher than the upper surface of the workpiece W placed or fixed, the reference surface detection means 5 moves the polishing surface 3 of the polishing body 2 that moves up via the elevating mechanism 4 above the upper surface of the workpiece W. It is configured so that it can be detected at the reference position P1.

即ち、本実施例では、前記昇降機構4を介して前記研磨体2を前記支持部1に対し上昇移動させると、光電センサー5が研磨体2下端の研磨面3が予め設定した基準位置P1に位置したことを検出し、この際制御部が基準位置P1から研磨体2を予め設定しておいた前記移動量Lだけ下降移動させてこの研磨体2の研磨面3がワーク研磨位置P2に位置するように昇降機構4を駆動制御することになる構成としている。   In other words, in this embodiment, when the polishing body 2 is moved upward with respect to the support portion 1 via the lifting mechanism 4, the photoelectric sensor 5 is brought into the reference position P1 where the polishing surface 3 at the lower end of the polishing body 2 is set in advance. In this case, the controller detects that the polishing body 2 is moved downward from the reference position P1 by the predetermined movement amount L, and the polishing surface 3 of the polishing body 2 is positioned at the workpiece polishing position P2. Thus, the elevating mechanism 4 is driven and controlled.

更に詳しくは、前記光電センサー5は、バリ取り時の粉塵飛散環境下でも安定した検出が可能な信頼性の高い透過型の光ファイバーセンサー5を採用し、この光ファイバーセンサー5の発信器5Aと受信器5Bを、前記支持部1(ベルトコンベア7)の移送方向と直交する方向の両外側位置に固定し、この発信器5Aからの信号光を研磨体2が遮光する光量によって研磨体2の研磨面3を検出し、この検出信号を前記制御部に発信する構成としている。   More specifically, the photoelectric sensor 5 employs a highly reliable transmission type optical fiber sensor 5 capable of stable detection even in a dust scattering environment during deburring, and a transmitter 5A and a receiver of the optical fiber sensor 5 are used. 5B is fixed to both outer positions in the direction orthogonal to the transfer direction of the support portion 1 (belt conveyor 7), and the polishing surface of the polishing body 2 is controlled by the amount of light that the polishing body 2 blocks the signal light from the transmitter 5A. 3 is detected, and this detection signal is transmitted to the control unit.

本実施例の制御部(図示省略)は、装置本体8に設けているが、装置本体8から遠隔位置に設けても良い。   The control unit (not shown) of the present embodiment is provided in the apparatus main body 8, but may be provided at a position remote from the apparatus main body 8.

この制御部は、前記基準位置P1から前記ワーク研磨位置P2までの研磨体2の移動量Lを記憶する移動量記憶手段と、前記基準位置検出手段5からの検出信号を受信すると、前記昇降駆動モータ14(昇降機構4)に前記移動量記憶手段で記憶した移動量Lの駆動信号を発信する駆動信号発信手段とを備えている。尚、例えば、昇降駆動モータ14にステッピングモータを採用して移動量Lが常に一定量となるようにする。また、ステッピングモータを使用せずに、エンコーダ(例えば、前記スプロケット13の回転を読むロータリーエンコーダなど)を用いた制御を行うことで、移動量Lが常に一定量となるようにしても良い。   When the control unit receives the movement amount storage means for storing the movement amount L of the polishing body 2 from the reference position P1 to the workpiece polishing position P2, and the detection signal from the reference position detection means 5, the controller drives the lift. The motor 14 (elevating mechanism 4) is provided with drive signal transmission means for transmitting a drive signal of the movement amount L stored in the movement amount storage means. For example, a stepping motor is used as the elevation drive motor 14 so that the movement amount L is always a constant amount. Further, the movement amount L may always be a constant amount by performing control using an encoder (for example, a rotary encoder that reads the rotation of the sprocket 13) without using a stepping motor.

また、本実施例では、前記研磨体2の研磨面3のワーク研磨位置P2を、前記ワークWの高さに応じて設定変更可能な研磨位置設定手段と、この研磨位置設定手段の設定値に基づいて、前記基準位置P1から前記ワーク研磨位置P2までの研磨体2の前記移動量Lを自動設定する移動量設定手段とを前記制御部に設けている。   Further, in this embodiment, the workpiece polishing position P2 of the polishing surface 3 of the polishing body 2 can be set and changed according to the height of the workpiece W, and the set value of the polishing position setting means Based on this, a movement amount setting means for automatically setting the movement amount L of the polishing body 2 from the reference position P1 to the workpiece polishing position P2 is provided in the control unit.

具体的には、本実施例で言うワーク研磨位置P2は、支持部1(ベルトコンベア7)からの研磨面3の高さで設定するものとし、前記研磨位置設定手段は、このワーク研磨位置P2(研磨面3の設定高さH)の数値を入力するための入力装置(図示省略)を備えている。   Specifically, the workpiece polishing position P2 referred to in the present embodiment is set by the height of the polishing surface 3 from the support portion 1 (belt conveyor 7), and the polishing position setting means is the workpiece polishing position P2. An input device (not shown) for inputting a numerical value of (the set height H of the polishing surface 3) is provided.

また、移動量設定手段は、前記支持部1からの前記基準位置検出手段5の高さ(前記基準位置P1の高さ)を記憶する基準高さ記憶手段と、この基準高さ記憶手段で記憶された基準位置検出手段5の高さから前記研磨位置設定手段の設定値(設定高さH)を引き算して前記基準位置P1から前記ワーク研磨位置P2までの研磨体2の前記移動量Lを算出する算出手段とを備え、この算出手段で算出された算出信号が、前記移動量記憶手段に記憶される構成としている。   The moving amount setting means stores reference height storage means for storing the height of the reference position detection means 5 from the support portion 1 (height of the reference position P1), and stores the reference height storage means. The amount of movement L of the polishing body 2 from the reference position P1 to the workpiece polishing position P2 is calculated by subtracting the set value (set height H) of the polishing position setting means from the height of the reference position detecting means 5 thus determined. A calculation means for calculating, and a calculation signal calculated by the calculation means is stored in the movement amount storage means.

また、本実施例では、所定数のワークWの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、前記研磨体2を上昇移動させて前記基準位置検出手段5による前記研磨体2の研磨面3の基準位置検出が行われるように前記昇降機構4を駆動制御する定期駆動手段を前記制御部に設けている。   Further, in this embodiment, the polishing surface of the polishing body 2 by the reference position detection means 5 is moved up by moving the polishing body 2 after a predetermined number of workpieces W have been polished or after a predetermined time has elapsed since the start of the polishing operation. Periodic driving means for driving and controlling the lifting mechanism 4 is provided in the control unit so that the reference position detection of 3 is performed.

定期駆動手段は、ワークWの研磨数をカウントする、あるいは研磨作業開始からの経過時間をカウントするカウント手段と、予め設定した研磨数あるいは経過時間を記憶する定期記憶手段と、この定期記憶手段で記憶された研磨数あるいは経過時間と前記カウント手段から出力されるカウント信号とを照合して、このカウント信号と記憶数あるいは記憶時間とが一致した時に前記昇降駆動モータ14(昇降機構4)に研磨体2を上昇移動させる駆動信号を発信する検出動作命令発信手段とを備えている。   The periodic drive means includes a count means for counting the number of polishing of the workpiece W or counting an elapsed time from the start of the polishing operation, a periodic storage means for storing a preset number of polishing or elapsed time, and the periodic storage means. The stored polishing number or elapsed time is compared with the count signal output from the counting means, and when the count signal matches the stored number or storage time, the lift drive motor 14 (lifting mechanism 4) polishes. And a detection operation command transmission means for transmitting a drive signal for moving the body 2 upward.

尚、一つのワークWの研磨作業が終了する度に、前記研磨体2を上昇移動させて前記基準位置検出手段5による前記研磨体2の研磨面3の基準位置検出が行われるように定期駆動手段を構成しても良い。   In addition, every time the polishing operation of one workpiece W is completed, the polishing body 2 is moved up and periodically driven so that the reference position of the polishing surface 3 of the polishing body 2 is detected by the reference position detecting means 5. Means may be configured.

また、本実施例では、予め設定した高さ以上の高さを有するワークWを検出する想定外ワーク検出手段6を、支持部1(ベルトコンベア7)の移送始端側に設け、この想定外ワーク検出手段6が前記ワークWを検出した際に研磨作業を停止する緊急停止手段を前記制御部に設けている。   Further, in this embodiment, an unexpected workpiece detection means 6 for detecting a workpiece W having a height higher than a preset height is provided on the transfer start end side of the support portion 1 (belt conveyor 7). An emergency stop means for stopping the polishing operation when the detection means 6 detects the workpiece W is provided in the control unit.

具体的には、本実施例の想定外ワーク検出手段6は、ワークWに対し非接触で高さを検出可能な反射型の光電センサー6を採用し、この光電センサー6の発信・受信器6Aと反射器6Bとを前記支持部1(ベルトコンベア7)の移送方向と直交する方向の両外側位置に、この支持部1より高い位置に設け、この発信・受信器6Aから発信して反射器6Bで反射した信号孔をワークWが遮光することで検出し、この検出信号を前記緊急停止手段に発信する構成としている。   Specifically, the unexpected workpiece detection means 6 of this embodiment employs a reflective photoelectric sensor 6 that can detect the height of the workpiece W in a non-contact manner, and a transmitter / receiver 6A of the photoelectric sensor 6 is used. And the reflector 6B are provided at positions higher than the support portion 1 at both outer positions in the direction perpendicular to the transfer direction of the support portion 1 (belt conveyor 7). The signal hole reflected by 6B is detected by the work W being shielded from light, and this detection signal is transmitted to the emergency stop means.

また、この想定外ワーク検出手段6は、支持部1(ベルトコンベア7)に対し昇降移動可能に設けて、この想定外ワーク検出手段6で検出するワークWの高さを設定変更可能な構成としている。   The unexpected work detection means 6 is provided so as to be movable up and down with respect to the support unit 1 (belt conveyor 7), and the height of the work W detected by the unexpected work detection means 6 can be set and changed. Yes.

具体的には、前記装置本体8内にセンサー取付部16を設け、このセンサー取付部16に設けた縦長のガイド長窓17に光電センサー6の発信・受信器6Aを取付すると共に、この発信・受信器6Aをガイド長窓17をガイドとして適宜な駆動源により上下方向に昇降駆動するように取付している。   Specifically, a sensor mounting portion 16 is provided in the apparatus main body 8, and the transmitter / receiver 6 </ b> A of the photoelectric sensor 6 is mounted on the vertically long guide long window 17 provided in the sensor mounting portion 16. The receiver 6A is mounted so as to be driven up and down by an appropriate driving source using the guide long window 17 as a guide.

即ち、本実施例の想定外ワーク検出手段6は、発信・受信器6Aだけを昇降移動可能に設け、反射器6Bは、昇降移動する発信・受信器6Aがどの位置にあっても信号光を反射可能な大きなのものを固定している。   That is, the unexpected work detection means 6 of the present embodiment is provided with only the transmitter / receiver 6A so as to be movable up and down, and the reflector 6B transmits the signal light regardless of the position of the transmitter / receiver 6A that moves up and down. A large reflective object is fixed.

また、本実施例では、この発信・受信器6Aは、前記研磨位置設定手段の設定高さHの変更に同期して自動的に昇降移動するように構成している。具体的には、この発信・受信器6Aの位置は、予め前記設定高さH+所定値α(この所定値αは、例えば研磨体2で研磨した際に故障の懸念のあるワークWの高さに設定する。)と定め、研磨位置設定手段に入力された設定値(高さH)に所定値αが加えられた高さ位置に自動的に昇降移動する構成としている。尚、発信・受信器6Aの昇降移動が、研磨位置設定手段の設定高さHの変更に同期しない構成としても良い。   In this embodiment, the transmitter / receiver 6A is configured to automatically move up and down in synchronization with the change in the set height H of the polishing position setting means. Specifically, the position of the transmitter / receiver 6A is determined in advance by the set height H + predetermined value α (the predetermined value α is the height of the workpiece W that may be damaged when polished by the polishing body 2, for example. It is configured to automatically move up and down to a height position obtained by adding a predetermined value α to the set value (height H) input to the polishing position setting means. In addition, it is good also as a structure which the raising / lowering movement of the transmission / reception device 6A does not synchronize with the change of the setting height H of a grinding | polishing position setting means.

また、緊急停止手段は、前記想定外ワーク検出手段6からの検出信号を受信すると、前記研磨駆動モータ10と、ベルトコンベア7の駆動源とに駆動停止信号を発信する駆動停止信号発信手段を備えている。   The emergency stop means includes drive stop signal transmission means for transmitting a drive stop signal to the polishing drive motor 10 and the drive source of the belt conveyor 7 when receiving the detection signal from the unexpected work detection means 6. ing.

次に、本実施例の作動を説明する。   Next, the operation of this embodiment will be described.

予め研磨位置設定手段に設定高さHを入力して、基準位置P1からワーク研磨位置P2までの研磨体2の移動量Lを設定しておく。   The set height H is input to the polishing position setting means in advance, and the movement amount L of the polishing body 2 from the reference position P1 to the workpiece polishing position P2 is set in advance.

ベルトコンベア7にワークWを載置固定し、研磨体2をワーク研磨位置P2に位置させて装置を駆動すると、ベルトコンベア7によって移送されるワークWが次々と研磨体2の研磨面3で研磨されていくことになる(図3参照)。   When the workpiece W is placed and fixed on the belt conveyor 7 and the polishing body 2 is positioned at the workpiece polishing position P2 and the apparatus is driven, the workpieces W transferred by the belt conveyor 7 are successively polished on the polishing surface 3 of the polishing body 2. (See FIG. 3).

この研磨作業を継続しているうちに、研磨体2の研磨面3に徐々に摩耗を生じてくるが(図4参照)、所定数のワークWの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、定期駆動手段が昇降機構4を駆動制御して自動的に研磨体2を上昇移動させ、この際に基準位置検出手段5による研磨体2の研磨面3の基準位置検出が行われる(図5参照)。   While the polishing operation is continued, the polishing surface 3 of the polishing body 2 gradually wears (see FIG. 4), but after a predetermined number of workpieces W have been polished or for a predetermined time from the start of the polishing operation. After the elapse of time, the regular driving means drives and controls the elevating mechanism 4 to automatically move the polishing body 2 upward, and at this time, the reference position detection means 5 detects the reference position of the polishing surface 3 of the polishing body 2 ( (See FIG. 5).

すると、この基準位置検出手段5の検出信号を受けて、制御部が基準位置P1から研磨体2を予め設定しておいた前記移動量Lだけ研磨体2を下降移動させてこの研磨体2の研磨面3が前記ワーク研磨位置P2に位置するように前記昇降機構4を駆動制御することになる(図6参照)。   Then, in response to the detection signal of the reference position detecting means 5, the control unit moves the polishing body 2 downward from the reference position P1 by the movement amount L set in advance, and the polishing body 2 is moved. The elevating mechanism 4 is driven and controlled so that the polishing surface 3 is positioned at the workpiece polishing position P2 (see FIG. 6).

即ち、研磨体2の研磨面3に摩耗を生じても、その摩耗した研磨面3を新たな基準位置P1に設定し直し、その上でこの基準位置P1から予め設定した移動量Lだけ研磨体2を移動させてワーク研磨位置P2に位置させるので、このワーク研磨位置P2の研磨体2は、その研磨面3の位置が研磨作業開始当初のワーク研磨位置P2の研磨体2の研磨面3と同じ位置に位置することになり、研磨開始当初と同等のワークWに対する所望押し当て力を自動的に実現できる。   That is, even if the polishing surface 3 of the polishing body 2 is worn, the worn polishing surface 3 is reset to a new reference position P1, and then the polishing body is moved by a preset amount L from the reference position P1. 2 is moved to the workpiece polishing position P2, the polishing body 2 at the workpiece polishing position P2 has a polishing surface 3 whose position is the same as the polishing surface 3 of the polishing body 2 at the workpiece polishing position P2 at the beginning of the polishing operation. It will be located in the same position, and the desired pressing force with respect to the workpiece | work W equivalent to the beginning of grinding | polishing can be implement | achieved automatically.

また、研磨作業中に、高さがありすぎて故障の懸念のあるワークWが移送されてくると、このワークWが移送機構7の移送始端側で想定外ワーク検出手段6に検出されて研磨体2による研磨が行われる前に研磨作業が停止する(図7参照)。   Further, if a workpiece W that is too high and has a possibility of failure is transferred during the polishing operation, the workpiece W is detected by the unexpected workpiece detection means 6 on the transfer start end side of the transfer mechanism 7 and polished. The polishing operation is stopped before the polishing by the body 2 is performed (see FIG. 7).

尚、本発明は、本実施例に限られるものではなく、各構成要件の具体的構成は適宜設計し得るものである。   Note that the present invention is not limited to this embodiment, and the specific configuration of each component can be designed as appropriate.

1 支持部
2 研磨体
3 研磨面
4 昇降機構
5 基準位置検出手段(光電センサー)
6 想定外ワーク検出手段
7 移送機構
L 移動量
P1 基準位置
P2 ワーク研磨位置
W ワーク
DESCRIPTION OF SYMBOLS 1 Support part 2 Polishing body 3 Polishing surface 4 Lifting mechanism 5 Reference position detection means (photoelectric sensor)
6 Unexpected workpiece detection means 7 Transfer mechanism L Travel distance P1 Reference position P2 Work polishing position W Workpiece

Claims (5)

ワークを載置若しくは固定する支持部と、この支持部の上方に設けられて支持部に載置若しくは固定した前記ワークを研磨する研磨体と、この研磨体を前記ワークの高さに応じて前記支持部に対し昇降移動可能な昇降機構とを備えた研磨装置において、前記昇降機構を介して前記研磨体を前記支持部1に対し上昇移動若しくは下降移動した際にこの研磨体下端の研磨面が予め設定した基準位置に位置したことを検出する基準位置検出手段と、基準位置検出手段が前記基準位置に位置した前記研磨体の研磨面を検出した際に、この基準位置から研磨体を予め設定した移動量だけ上昇移動若しくは下降移動させてこの研磨体の研磨面がワーク研磨位置に位置するように前記昇降機構を駆動制御する制御部を備え、予め設定した高さ以上の高さを有するワークを検出する想定外ワーク検出手段を備え、この想定外ワーク検出手段が前記ワークを検出した際に研磨作業を停止する緊急停止手段を前記制御部に設け、前記支持部は、ワークを載置若しくは固定して移送する移送機構を備え、この支持部の移送機構の移送始端側に前記想定外ワーク検出手段を設けると共に、この想定外ワーク検出手段は、支持部に対し昇降移動可能に設けて、この想定外ワーク検出手段で検出するワークの高さを設定変更可能な構成としたことを特徴とする研磨装置。 A support part for placing or fixing the work, a polishing body provided above the support part for polishing the work placed or fixed on the support part, and the polishing body according to the height of the work In a polishing apparatus provided with an elevating mechanism that can move up and down with respect to a support part, when the polishing body is moved up and down with respect to the support part 1 via the elevating mechanism, the polishing surface at the lower end of the polishing body is Reference position detection means for detecting that the position is set at a preset reference position, and when the reference position detection means detects the polishing surface of the polishing body located at the reference position, the polishing body is preset from the reference position. Yes was by the amount of movement is moved upward or downward movement and a control unit for the polishing surface of the polishing body is driving and controlling the lifting mechanism so as to be positioned in the workpiece polishing position, the more high-preset of the height An unexpected work detection means for detecting a workpiece to be detected, and an emergency stop means for stopping a polishing operation when the unexpected work detection means detects the work is provided in the control unit, and the support unit mounts the work. And a transfer mechanism that moves in a fixed or fixed manner, and provides the unexpected workpiece detection means on the transfer start end side of the transfer mechanism of the support portion, and the unexpected workpiece detection means is provided so as to be movable up and down relative to the support portion. A polishing apparatus characterized in that the height of the workpiece detected by the unexpected workpiece detection means can be set and changed . 前記研磨体の研磨面のワーク研磨位置を、前記ワークの高さに応じて設定変更可能な研磨位置設定手段と、この研磨位置設定手段の設定値に基づいて、前記基準位置から前記ワーク研磨位置までの研磨体の前記移動量を自動設定する移動量設定手段とを前記制御部に設けたことを特徴とする請求項1記載の研磨装置。   Polishing position setting means capable of setting and changing the workpiece polishing position of the polishing surface of the polishing body according to the height of the workpiece, and the workpiece polishing position from the reference position based on the set value of the polishing position setting means The polishing apparatus according to claim 1, wherein a movement amount setting means for automatically setting the movement amount of the polishing body up to is provided in the control unit. 前記基準位置検出手段は、前記支持部に載置若しくは固定した前記ワークの上面より高い位置に設けて、この基準位置検出手段が前記昇降機構を介して上昇移動する前記研磨体の研磨面をワーク上面より上方の前記基準位置で検出し得るように構成し、この基準位置検出手段が前記基準位置で前記研磨面を検出した際に、前記制御部は、前記基準位置から前記研磨体を予め設定した移動量だけ下降移動させてこの研磨体の研磨面を前記ワーク研磨位置に位置するように前記昇降機構を駆動制御する構成としたことを特徴とする請求項1,2のいずれか1項に記載の研磨装置。   The reference position detection means is provided at a position higher than the upper surface of the work placed or fixed on the support portion, and the polishing surface of the polishing body on which the reference position detection means moves up and down via the lifting mechanism It is configured to be able to detect at the reference position above the upper surface, and when the reference position detecting means detects the polishing surface at the reference position, the control unit presets the polishing body from the reference position. 3. The structure according to claim 1, wherein the elevating mechanism is driven and controlled so that the polishing surface of the polishing body is positioned at the workpiece polishing position by being moved downward by the amount of movement. The polishing apparatus as described. 一つのワークの研磨作業終了後あるいは所定数のワークの研磨作業終了後あるいは研磨作業開始から所定時間経過後に、前記研磨体を上昇移動若しくは下降移動させて前記基準位置検出手段による前記研磨体の研磨面の基準位置検出が行われるように前記昇降機構を駆動制御する定期駆動手段を前記制御部に設けたことを特徴とする請求項1〜3のいずれか1項に記載の研磨装置。   Polishing of the polishing body by the reference position detecting means by moving the polishing body up or down after the polishing work of one work, after the polishing work of a predetermined number of works, or after a predetermined time has elapsed since the start of the polishing work. The polishing apparatus according to claim 1, wherein a periodical drive unit that drives and controls the lifting mechanism is provided in the control unit so that a reference position of the surface is detected. 前記基準位置検出手段は、前記研磨体に対し非接触で前記研磨面を検出可能な光電センサーを採用したことを特徴とする請求項1〜4のいずれか1項に記載の研磨装置。   The polishing apparatus according to claim 1, wherein the reference position detection unit employs a photoelectric sensor capable of detecting the polishing surface in a non-contact manner with respect to the polishing body.
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