JP5556031B2 - X-ray injection equipment - Google Patents

Description

  The present invention condenses the electron accelerating laser beam and the collision laser beam branched from the single parallel laser beam by the branching means, and the electrons accelerated by the electron acceleration laser beam and the collision laser beam. And an X-ray emission apparatus that generates and emits X-rays.

In recent years, X-ray injection apparatuses that emit hard X-rays in a specific direction have been proposed for the purpose of fluoroscopy and treatment of dangerous objects.
For example, as such an X-ray emission apparatus, an apparatus is known that cuts out only the component emitted in the characteristic direction out of X-rays emitted from the radiation source to the entire periphery by the bremsstrahlung by the beam collimator.
According to such an X-ray emission apparatus, it is possible to emit hard X-rays in an arbitrary specific direction by moving the beam collimator.

However, in the X-ray emission apparatus, only a part of the X-ray emitted from the radiation source is cut out and the remaining many components are shielded, so that the X-ray utilization efficiency is extremely low.
On the other hand, an X-ray emission apparatus has been proposed in which electrons are accelerated by laser light, and hard X-rays are generated by the inverse Compton scattering phenomenon by causing the laser light to collide with the accelerated electrons.
According to such an X-ray emission apparatus, it is possible to emit a hard X-ray that is strong only in one direction.

Meas. Sci. Techno. 12 (2001) 1824-1834

  By the way, in the case where the hard X-ray is stably generated using the inverse Compton scattering phenomenon, the laser beam is focused on a focusing region of about 10 μm, and the electron and the laser beam collide with the focused region. In order to facilitate the synchronization between the electrons and the laser beam, a single laser beam is branched into an electron acceleration laser beam and a collision laser beam.

However, the laser beam used when emitting hard X-rays using the inverse Compton scattering phenomenon as described above is a special laser beam with ultrashort pulses and high power, such as beam stretching, multistage amplification, beam compression, etc. It is generated through many processes. Therefore, the laser light source device for emitting the laser light is complicated and large.
For this reason, although measures such as installing the laser light source device on an anti-vibration table have been taken, fluctuations in the laser light emitted from the laser light source device cannot be sufficiently suppressed, and currently, as described above In contrast, the spot region of the laser beam fluctuates in the range of several μm to 10 μm, whereas the condensing region is about 10 μm.
Therefore, in an X-ray emission apparatus that generates hard X-rays using the inverse Compton scattering phenomenon, there is a problem that the intensity of the emitted hard X-rays varies or hard X-rays may not be emitted.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to make it possible to stably emit hard X-rays in an X-ray emission apparatus that generates hard X-rays using the inverse Compton scattering phenomenon. And

  The present invention adopts the following configuration as means for solving the above-described problems.

  According to a first aspect of the present invention, an electron accelerating laser beam and a collision laser beam branched from a single parallel laser beam by a branching unit are condensed, and the electrons accelerated by the electron acceleration laser beam and the collision laser beam are collected. A pair of condensing optical elements for generating and emitting X-rays by colliding with a laser beam, which are symmetrical with respect to a symmetry plane and collect incident light toward the symmetry plane A first light guide unit that has one of the condensing optical elements and guides the electron accelerating laser light; and a second light guide unit that has the other condensing optical element and guides the collision laser light. A light guide part, and the first light guide part and the second light guide part have a change caused by a deviation amount from a reference incidence condition of the parallel laser light to the branching unit with respect to the symmetry plane. The electron accelerating laser beam and the collision beam are symmetric. To adopt a configuration that guides the laser light.

  According to a second invention, in the first invention, the first light guide section and the second light guide section are an odd number of right angle mirrors or an even number of right angle mirrors except for the light collecting optical element. A configuration that is configured is adopted.

  According to a third aspect of the present invention, in the first or second aspect of the invention, the amount of deviation of the parallel laser light from the reference incident condition to the branching unit is the deviation of the optical axis of the parallel laser light from the reference incident condition. Adopt a configuration that is quantity.

  According to a fourth invention, in any one of the first to third inventions, an amount of deviation of the parallel laser light from the reference incident condition to the branching unit is an incident angle of the parallel laser light from the reference incident condition. The configuration of the amount of deviation is adopted.

According to the present invention, when the incident conditions (for example, the optical axis position and the incident angle) of the parallel laser light incident on the branching unit deviate from the reference incident conditions, the first light guide and the second light guide For the electron acceleration laser beam and the collision laser beam, a change caused by the amount of deviation is given so as to be symmetric with respect to the symmetry plane.
For this reason, the laser beam for electron acceleration inject | emitted from one condensing optical element of a pair of condensing optical element arrange | positioned symmetrically with respect to a symmetry plane, and the collision laser beam inject | emitted from the other condensing optical element Are condensed at the same position on the symmetry plane.
Therefore, even when the condensing position is changed due to the deviation, the electron accelerating laser beam and the collision laser beam are condensed at the same position, and the electrons accelerated by the electron accelerating laser beam are reliably It can collide with the laser beam for collision. That is, according to the present invention, even when the parallel laser light emitted from the laser light source device fluctuates, the electrons and the collision laser light can be reliably collided.
Therefore, according to the present invention, it is possible to stably emit hard X-rays in an X-ray emission apparatus that generates hard X-rays using the inverse Compton scattering phenomenon.

1 is a system configuration diagram schematically illustrating a schematic configuration of an X-ray emission apparatus according to a first embodiment of the present invention. It is explanatory drawing for demonstrating operation | movement of the X-ray emission apparatus in 1st Embodiment of this invention. It is the system block diagram which showed typically schematic structure of the X-ray emission apparatus in 2nd Embodiment of this invention. It is the system block diagram which showed typically schematic structure of the X-ray emission apparatus in 3rd Embodiment of this invention.

  Hereinafter, an embodiment of an X-ray emission apparatus according to the present invention will be described with reference to the drawings. In the following drawings, the scale of each member is appropriately changed in order to make each member a recognizable size.

(First embodiment)
FIG. 1 is a system configuration diagram schematically showing a schematic configuration of the X-ray emission apparatus S1 of the present embodiment.
As shown in this figure, the X-ray emission device S1 of the present embodiment includes a laser light source device 1, a beam splitter 2 (spectral means), an optical path correction glass 3, a first light guide unit 4, and a second light guide. An optical unit 5, an optical path length adjusting device 6, and a target supply device 7 are provided.

  The laser light source device 1 emits a laser beam L1 (parallel laser beam) with an ultrashort pulse and high power under the control of a control device (not shown), and a laser emitted from a laser transmitter inside. The light is emitted after being subjected to processing such as beam stretching, multistage amplification, and beam compression. The laser light source device 1 emits laser light L1 as parallel light.

  The beam splitter 2 splits the laser beam L1 incident from the laser light source device 1 into an electron acceleration laser beam L2 and a collision laser beam L3, and reflects a part of the component of the laser beam L1 to generate electrons. In addition to being guided to the first light guide 4 as the acceleration laser light L2, the laser light L1 is partially transmitted and guided to the second light guide 5 as the collision laser light L3.

  The optical path correction glass 3 corrects a deviation in the traveling direction of the collision laser beam L3 due to refraction when the laser beam L1 passes through the beam splitter 2, and between the beam splitter 2 and the second light guide unit 5. Is arranged.

The first light guide 4 guides and condenses the electron acceleration laser light L2 incident from the beam splitter 2, and includes four right-angle mirrors 4a to 4d and a parabolic mirror 4e (condensation). Optical element).
The right-angle mirrors 4a to 4d are plane mirrors that reflect incident electron acceleration laser light L2 at a right angle. The parabolic mirror 4e is a condensing mirror that condenses the electron accelerating laser beam L2 incident from the right-angle mirror 4d on the symmetry plane A shown in FIG.

The second light guide 5 guides and condenses the collision laser light L3 incident from the beam splitter 2, and includes six right-angle mirrors 5a to 5f and a parabolic mirror 5g (condensing optics). Element).
The right-angle mirrors 5a to 5f are plane mirrors that reflect the incident collision laser beam L3 at a right angle. The parabolic mirror 5g is a condensing mirror that condenses the collision laser light L3 incident from the right-angle mirror 5f on the symmetry plane A shown in FIG. The parabolic mirror 5g has an arrangement and shape that is symmetric with respect to the parabolic mirror 4e included in the first light guide 4 with respect to the symmetry plane A.

  That is, in the X-ray emission device S1 of the present embodiment, a pair of radiation beams that are symmetric with respect to the symmetry plane A and condense the electron acceleration laser beam L2 or the collision laser beam L3 toward the symmetry plane A. A collimating laser beam having a parabolic mirror 4e, 5g, a first light guide 4 that guides the electron accelerating laser beam L2, and a parabolic mirror 5e. And a second light guide 5 that guides L3.

In the X-ray emission apparatus S1 of the present embodiment, the first light guide 4 and the second light guide 5 change due to the amount of deviation of the laser light L1 from the reference incidence condition on the beam splitter 2. The electron acceleration laser beam L2 and the collision laser beam L3 are guided so as to be symmetric with respect to the symmetry plane A.
Note that the reference incident condition referred to here is a condition when the laser light L1 emitted from the laser light source device 1 at a desired optical axis position and at a desired angle is incident on the beam splitter 2, and in this embodiment. Indicates a condition in which the optical axis of the laser beam L1 is aligned with the center of the beam splitter 2 and the laser beam L1 is incident on the beam splitter 2 at an angle of 45 °.
Further, in the X-ray emission apparatus S1 of the present embodiment, the amount of deviation of the laser light L1 from the reference incidence condition to the beam splitter 2 is based on the amount of deviation of the optical axis of the laser light L1 from the reference incidence condition and the reference incidence condition. Of the incident angle of the laser beam L1.
That is, in the X-ray emission device S1 of the present embodiment, the first light guide 4 and the second light guide 5 are caused by the shift amount of the optical axis and the shift angle of the incident angle of the laser light L1 to the beam splitter 2. The electron accelerating laser beam L2 and the collision laser beam L3 are guided so that the change is symmetric with respect to the symmetry plane A.

  In the X-ray emission device S1 of the present embodiment, the first light guide unit 4 and the second light guide unit 5 are configured by an even number of right-angle mirrors except for the parabolic mirrors 4e and 5g. Thus, the electron accelerating laser beam L2 and the collision laser beam L3 are guided so that the change caused by the deviation amount from the reference incidence condition to the beam splitter 2 of the laser beam L1 is symmetric with respect to the symmetry plane A. .

The optical path length adjusting device 6 is capable of adjusting the optical path length of the electron accelerating laser light L2 in the first light guide 4 and the optical path length of the collision laser light L3 in the second light guide 5.
The optical path length adjusting device 6 moves the right-angle mirrors 4b and 4c of the first light guide section 4 and the right-angle mirrors 5c and 5d of the second light guide section 5 to move the optical path length and collision of the laser light L2 for electron acceleration. The optical path length of the laser beam L3 is adjusted.
The adjustment of the optical path length of the electron accelerating laser beam L2 in the first light guide unit 4 and the optical path length of the collision laser beam L3 in the second light guide unit 5 by the optical path length adjusting device 6 is the X-ray of this embodiment. This is performed before the injection device S1 is used.

  The target supply device 7 supplies a laser irradiation target by injecting gas on the optical path of the electron accelerating laser beam L2 and in the immediate vicinity of the condensing region.

  In the X-ray emission device S1 of the present embodiment configured as described above, when the laser light L1 emitted from the laser light source device 1 is incident on the beam splitter 2 under the reference incidence condition, the laser light L1 is The beam is branched into an electron acceleration laser beam L2 and a collision laser beam L3.

The electron accelerating laser beam L2 is emitted from the beam splitter 2 in the + z direction, guided to the symmetry plane A by the first light guide 4 and condensed.
Specifically, the electron accelerating laser beam L2 emitted from the beam splitter 2 is reflected in the -y direction by the right angle mirror 4a, then reflected in the + z direction by the right angle mirror 4b, and then reflected by the right angle me et al. 4c. Reflected in the + y direction, and further reflected in the + z direction by the right angle mirror 4d. Further, the electron accelerating laser beam L2 emitted from the right-angle mirror 4d is condensed toward the symmetry plane A by the parabolic mirror 4e.

The collision laser beam L3 is emitted from the beam splitter 2 in the + y direction, the optical path is corrected by the optical path correction glass 3, and then guided to the symmetry plane A by the second light guide 5 and is condensed.
Specifically, the collision laser beam L3 emitted from the beam splitter 2 is reflected in the + z direction by the right angle mirror 5a, then reflected in the + y direction by the right angle mirror 5b, and then in the + z direction by the right angle mirror 5c. Then, it is reflected in the -y direction by the right angle mirror 5d, then reflected in the + z direction by the right angle mirror 5e, and further reflected in the + y direction by the right angle mirror 5f. Further, the collision laser beam L3 emitted from the right-angle mirror 5f is condensed toward the symmetry plane A by the parabolic mirror 5g.

And the parabolic mirror 4e of the 1st light guide part 4 and the parabolic mirror 5g of the 2nd light guide part 5 are arrange | positioned symmetrically with respect to the symmetry plane A, and have a further symmetrical shape. Therefore, the electron acceleration laser beam L2 and the collision laser beam L3 are condensed (collised) on the symmetry plane A.
Here, the gas target supplied from the target supply device 7 onto the optical path of the electron accelerating laser beam L2 is turned into plasma by the electron accelerating laser beam L2, and the electrons generated and accelerated by the plasma laser interaction are converted into the electrons. It is emitted along the acceleration laser beam L2 and collides with the collision laser beam L3 on the symmetry plane A. As a result, hard X-rays L4 are emitted.

  Subsequently, in the X-ray emission device S1 of the present embodiment, when the optical axis of the laser light L1 emitted from the laser light source device 1 and incident on the beam splitter 2 is shifted by a deviation amount δ with respect to the reference incidence condition Will be described with reference to FIG.

When the optical axis of the laser beam L1 is shifted in the −z direction with respect to the reference incident condition, the electron accelerating laser beam L2 shifted in the −y direction is emitted from the beam splitter 2. Therefore, the electron accelerating laser beam L2 emitted from the right angle mirror 4a is shifted in the + z direction, the electron accelerating laser beam L2 emitted from the right angle mirror 4b is shifted in the -y direction, and the electrons emitted from the right angle mirror 4c. The accelerating laser beam L2 is shifted in the −z direction, and the electron accelerating laser beam L2 emitted from the right-angle mirror 4d is shifted in the −y direction.
Therefore, when the optical axis of the laser beam L1 is shifted in the -z direction with respect to the reference incident condition, the electron acceleration laser beam L2 whose optical axis is shifted in the -y direction with respect to the parabolic mirror 4e. Is incident.

On the other hand, when the optical axis of the laser beam L1 is deviated in the −z direction with respect to the reference incident condition, the collision laser beam L3 deviated in the −z direction is emitted from the beam splitter 2. Therefore, the collision laser beam L3 emitted from the right-angle mirror 5a is shifted in the -y direction, and the collision laser beam L3 emitted from the right-angle mirror 5b is shifted in the -z direction, and the collision laser beam L3 is emitted from the right-angle mirror 5c. The laser beam L3 shifts in the -y direction, the collision laser beam L3 emitted from the right-angle mirror 5d shifts in the + z direction, the collision laser beam L2 emitted from the right-angle mirror 5e shifts in the -y direction, and the right-angle mirror 5f. The collision laser beam L2 emitted from is shifted in the −z direction.
Therefore, when the optical axis of the laser beam L1 is deviated in the −z direction with respect to the reference incident condition, the collision laser beam L3 whose optical axis is deviated in the −z direction with respect to the parabolic mirror 5g is generated. Incident.

  Here, the laser beam L2 for electron acceleration whose optical axis is shifted in the -y direction incident on the parabolic mirror 4e and the collision whose optical axis is shifted in the -z direction incident on the parabolic mirror 5g. The laser beam L3 is symmetrical. The parabolic mirror 4e and the parabolic mirror 5g are symmetric. Therefore, the electron accelerating laser beam L2 reflected by the parabolic mirror 4e and the collision laser beam L3 reflected by the parabolic mirror 5g are condensed at the same position on the symmetry plane A. .

Thus, in the X-ray emission device S1 of the present embodiment, the first light guide 4 and the second light guide 5 are caused by the amount of deviation of the laser light L1 from the reference incident condition on the beam splitter 2. By guiding the electron acceleration laser beam L2 and the collision laser beam L3 so that the change is symmetric with respect to the symmetry plane A, the electron acceleration laser beam L2 reflected by the parabolic mirror 4e and The collision laser beam L3 reflected by the object mirror 5g is condensed at the same position on the symmetry plane A.
Therefore, even when the optical axis of the laser beam L1 is deviated from the reference incident condition, the electron acceleration laser beam L2 and the collision laser beam L3 are condensed at the same position, and the electron acceleration laser is surely obtained. The electrons accelerated by the light L2 can collide with the collision laser light L3. That is, according to the X-ray emission device S1 of the present embodiment, even when the laser beam L1 emitted from the laser light source device 1 fluctuates, the electrons and the collision laser beam L2 can be reliably collided. it can.

  Next, a description will be given of a case where the incident angle of the laser beam L1 emitted from the laser light source device 1 and incident on the beam splitter 2 is shifted with respect to the reference incident condition in the X-ray emission device S1 of the present embodiment.

When the vector of the laser beam L1 incident on the beam splitter 2 under the reference incident condition is (0, 1, 0), the normalization constant is N, and the minute deviation amount of the laser beam L1 is ε, the beam is emitted from the beam splitter 2. The vector of the electron accelerating laser light L2 is (ε _x / N, ε _z / N, 1 / N), and the vector of the electron accelerating laser light L2 emitted from the right angle mirror 4a is (ε _x / N, −1 / N, −ε _z / N), the vector of the electron acceleration laser light L2 emitted from the right-angle mirror 4b is (ε _x / N, ε _z / N, 1 / N), the electron acceleration emitted from the right-angle mirror 4c. The vector of the laser beam L2 for use is (ε _x / N, 1 / N, ε _z / N), and the vector of the electron acceleration laser beam L2 emitted from the right angle mirror 4d is (ε _x / N, ε _z / N, 1 / N), and the electron acceleration laser incident on the parabolic mirror 4e Vector of the light L2 is _{(ε x / N, ε z} / N, 1 / N).

On the other hand, the vector of the collision laser beam L3 emitted from the beam splitter 2 is (ε _x / N, 1 / N, ε _z / N), and the vector of the collision laser beam L3 emitted from the right angle mirror 5a is (ε _x / N, ε _z / N, 1 / N), and the vector of the laser beam L3 for collision emitted from the right angle mirror 5b is (ε _x / N, 1 / N, ε _z / N), emitted from the right angle mirror 5c. The vector of the colliding laser beam L3 is (ε _x / N, ε _z / N, 1 / N), and the vector of the colliding laser beam L3 emitted from the right-angle mirror 5d is (ε _x / N, -1 / N,-[epsilon] _z / N), and the collision laser beam L3 emitted from the right angle mirror 5e is ([epsilon] _x / N, [epsilon] _z / N, 1 / N), the collision laser emitted from the right angle mirror 5f. light vector of L3 is _{(ε x / N, 1 /} N, ε z / N) , and the paraboloid Vector collision laser beam L3 incident on 5g is _{(ε x / N, 1 /} N, ε z / N).

Here, the normal vector of the symmetry plane A is n = (0, − (√2) / 2, (√2) / 2), and the vector of the electron acceleration laser light L2 incident on the parabolic mirror 4e is a. = (Ε _x / N, ε _z / N, 1 / N), the vector of the collision laser beam L3 incident on the parabolic mirror 5g is b = (ε _x / N, 1 / N, ε _z / N) Then, the following expression (1) is obtained, and it can be seen that the vectors a and b are plane-symmetrical vectors with respect to the symmetry plane A.
b = a-2n (n · a) (1)
Therefore, the electron accelerating laser beam L2 reflected by the parabolic mirror 4e and the collision laser beam L3 reflected by the parabolic mirror 5g are condensed at the same position on the symmetry plane A. .

Thus, in the X-ray emission device S1 of the present embodiment, the first light guide 4 and the second light guide 5 are caused by the amount of deviation of the laser light L1 from the reference incident condition on the beam splitter 2. By guiding the electron acceleration laser beam L2 and the collision laser beam L3 so that the change is symmetric with respect to the symmetry plane A, the electron acceleration laser beam L2 reflected by the parabolic mirror 4e and The collision laser beam L3 reflected by the object mirror 5g is condensed at the same position on the symmetry plane A.
Therefore, even when the incident angle of the laser beam L1 is deviated with respect to the reference incident condition, the laser beam L2 for electron acceleration and the laser beam L3 for collision are condensed at the same position, and the laser for electron acceleration is surely obtained. The electrons accelerated by the light L2 can collide with the collision laser light L3. That is, according to the X-ray emission device S1 of the present embodiment, even when the laser beam L1 emitted from the laser light source device 1 fluctuates, the electrons and the collision laser beam L2 can be reliably collided. it can.

  As described above, according to the X-ray emission device S1 of the present embodiment, even when the laser beam L1 deviates from the reference incidence condition, the electrons and the collision laser that are reliably accelerated by the electron acceleration laser beam L2 are used. The light L3 can be collided and the hard X-ray L4 can be stably emitted.

(Second Embodiment)
Next, a second embodiment of the present invention will be described. In the description of the present embodiment, the description of the same parts as those of the first embodiment is omitted or simplified.

FIG. 3 is a system configuration diagram schematically showing a schematic configuration of the X-ray emission apparatus S2 of the present embodiment.
As shown in this figure, in the X-ray emission apparatus S2 of the present embodiment, the first light guide unit 4 is configured by two (even number) right-angle mirrors 4f and 4g and a parabolic mirror 4h. The light guide 5 is composed of five (odd number) right-angle mirrors 5h to 5l and a parabolic mirror 5m.
And also in the X-ray emission device S2 of the present embodiment, the parabolic mirror 4h and the parabolic mirror 5m are symmetrical with respect to the symmetry plane A, similarly to the X-ray emission device S1 of the first embodiment. Has been.

In the X-ray emission apparatus S2 of this embodiment having such a configuration, the first light guide unit 4 includes an even number of right angle mirrors, and the second light guide unit 5 includes an odd number of right angle mirrors. When the optical axis of the laser light L1 is deviated from the reference incident condition, the first light guide 4 and the second light guide 5 shift the laser light L1 from the reference incident condition to the beam splitter 2. The electron accelerating laser beam L2 and the collision laser beam L3 can be guided so that the change caused by the amount is symmetric with respect to the symmetry plane A.
Therefore, according to the X-ray emission apparatus S2 of the present embodiment, even when the optical axis of the laser beam L1 is deviated from the reference incident condition, the electrons accelerated by the laser beam L2 for electron acceleration are reliably The collision laser beam L3 can be caused to collide, and the hard X-ray L4 can be stably emitted.
However, in the case of this configuration, when the deviation of the incident condition is the incident angle deviation, the condensing point is displaced.

(Third embodiment)
Next, a third embodiment of the present invention will be described. In the description of the present embodiment, the description of the same parts as those of the first and second embodiments is omitted or simplified.

FIG. 4 is a system configuration diagram schematically showing a schematic configuration of the X-ray emission apparatus S3 of the present embodiment.
As shown in this figure, the X-ray emission apparatus S3 of the present embodiment includes two (even number) parabolic mirrors 4i and 4j, and the parabolic mirror of the second embodiment. The second light guide 5 is composed of five (odd number) right-angle mirrors 5h to 5l and a parabolic mirror 5m as in the second embodiment.
And also in the X-ray emission device S3 of the present embodiment, the parabolic mirror 4h and the parabolic mirror 5m are symmetrical with respect to the symmetry plane A, similarly to the X-ray emission device S1 of the first embodiment. Has been.

In the X-ray emission apparatus S3 of this embodiment having such a configuration, the first light guide unit 4 includes an even number of right angle mirrors, and the second light guide unit 5 includes an odd number of right angle mirrors. When the incident angle of the laser beam L1 is deviated from the reference incident condition, the first light guide 4 and the second light guide 5 shift the laser beam L1 from the reference incident condition to the beam splitter 2. The electron accelerating laser beam L2 and the collision laser beam L3 can be guided so that the change caused by the amount is symmetric with respect to the symmetry plane A.
Therefore, according to the X-ray emission apparatus S3 of the present embodiment, even when the incident angle of the laser beam L1 is deviated with respect to the reference incident condition, the electrons accelerated by the electron accelerating laser beam L2 are reliably detected. The collision laser beam L3 can be caused to collide, and the hard X-ray L4 can be stably emitted.
In the case of this configuration, when the deviation from the reference incident condition is an axial deviation, the incident laser on the final condenser mirror causes a deviation in the direction perpendicular to the laser axis. However, this vertical deviation can be removed by adopting a plane mirror as the final focusing mirror.

  As mentioned above, although preferred embodiment of this invention was described referring drawings, this invention is not limited to the said embodiment. Various shapes, combinations, and the like of the constituent members shown in the above-described embodiments are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

For example, it is possible to adopt a configuration in which the roles of the electron acceleration laser and the collision laser in the above embodiment are interchanged. In this case, the X-ray generation direction is reversed.
For example, the configuration of the first light guide unit 4 and the second light guide unit 5 in the above embodiment is an example, and other configurations may be employed.
For example, in the above-described embodiment, the configuration using a parabolic mirror as the condensing optical element of the present invention has been described. However, the present invention is not limited to this, and a condensing lens can be used as the condensing optical element.

  S1 to S3 X-ray emission device, 1 ... Laser light source device, 2 ... Beam splitter (branching means), 4 ... First light guide unit, 4a-4d, 4f, 4g ... Right angle mirror, 4e, 4h: Parabolic mirror (condensing optical element), 4i, 4j ... Parabolic mirror, 5 ... Second light guide, 5a-5f, 5h-5l ... Right angle mirror, 5g, 5m ... Parabolic mirror, A ... Symmetry plane, L1 ... Laser beam (parallel laser beam), L2 ... Laser beam for electron acceleration, L3 ... Laser beam for collision, L4 ... Hard X-ray (X-ray)

Claims (4)

The electron accelerating laser beam and the collision laser beam branched from the single parallel laser beam by the branching means are condensed, and the collision with the electrons generated and accelerated by the plasma laser interaction by the electron accelerating laser beam. An X-ray emission apparatus that generates and emits X-rays by colliding with a laser beam for use,
A pair of condensing optical elements that are symmetric with respect to a symmetry plane and condense incident light toward the symmetry plane, and one of the condensing optical elements and guide the electron acceleration laser light. A first light guide and a second light guide having the other condensing optical element and guiding the collision laser light;
The first light guide unit and the second light guide unit are arranged such that changes caused by a deviation amount of the parallel laser light from a reference incident condition to the branching unit are symmetrical with respect to the symmetry plane. An X-ray emission apparatus characterized by guiding an acceleration laser beam and the collision laser beam.   The said 1st light guide part and the said 2nd light guide part are comprised from the odd-numbered right-angle mirror or the even-numbered right-angle mirror except the said condensing optical element. X-ray injection device.   3. The X amount according to claim 1, wherein the amount of deviation of the parallel laser light from the reference incident condition to the branching unit is an amount of deviation of the optical axis of the parallel laser light from the reference incident condition. Line injection device.   The deviation amount of the parallel laser light from the reference incident condition to the branching unit is a deviation amount of the incident angle of the parallel laser light from the reference incident condition. The X-ray injection apparatus described.

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