JP5531883B2 - 調整方法 - Google Patents
調整方法 Download PDFInfo
- Publication number
- JP5531883B2 JP5531883B2 JP2010214846A JP2010214846A JP5531883B2 JP 5531883 B2 JP5531883 B2 JP 5531883B2 JP 2010214846 A JP2010214846 A JP 2010214846A JP 2010214846 A JP2010214846 A JP 2010214846A JP 5531883 B2 JP5531883 B2 JP 5531883B2
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- 238000000034 method Methods 0.000 title claims description 75
- 238000003384 imaging method Methods 0.000 claims description 280
- 230000008859 change Effects 0.000 claims description 97
- 230000003287 optical effect Effects 0.000 claims description 75
- 238000001514 detection method Methods 0.000 claims description 71
- 238000007689 inspection Methods 0.000 claims description 69
- 238000009434 installation Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 description 33
- 238000012545 processing Methods 0.000 description 21
- 238000012937 correction Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000010354 integration Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000007847 structural defect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010214846A JP5531883B2 (ja) | 2010-09-27 | 2010-09-27 | 調整方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010214846A JP5531883B2 (ja) | 2010-09-27 | 2010-09-27 | 調整方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012068188A JP2012068188A (ja) | 2012-04-05 |
| JP2012068188A5 JP2012068188A5 (enExample) | 2014-04-10 |
| JP5531883B2 true JP5531883B2 (ja) | 2014-06-25 |
Family
ID=46165628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010214846A Expired - Fee Related JP5531883B2 (ja) | 2010-09-27 | 2010-09-27 | 調整方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5531883B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6122711B2 (ja) * | 2013-06-27 | 2017-04-26 | 株式会社アルバック | 位置合わせ装置、真空装置、位置合わせ方法 |
| JP6630166B2 (ja) * | 2016-01-26 | 2020-01-15 | セイコーインスツル株式会社 | 検出装置、プリンタ装置、及び検出方法 |
| KR101752761B1 (ko) * | 2016-12-14 | 2017-06-30 | (주)이즈미디어 | 테이블 틸팅 확인 장치 및 확인 방법 |
| JP7556818B2 (ja) * | 2021-02-15 | 2024-09-26 | 三桜工業株式会社 | チューブ曲げ加工システム |
| WO2023002677A1 (ja) * | 2021-07-19 | 2023-01-26 | 浜松ホトニクス株式会社 | 傾斜推定システム、傾斜推定方法、傾斜推定プログラム、半導体検査システム及び生体観察システム |
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2010
- 2010-09-27 JP JP2010214846A patent/JP5531883B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012068188A (ja) | 2012-04-05 |
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