JP5518662B2 - Light emitting device and manufacturing method thereof - Google Patents

Light emitting device and manufacturing method thereof Download PDF

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JP5518662B2
JP5518662B2 JP2010222196A JP2010222196A JP5518662B2 JP 5518662 B2 JP5518662 B2 JP 5518662B2 JP 2010222196 A JP2010222196 A JP 2010222196A JP 2010222196 A JP2010222196 A JP 2010222196A JP 5518662 B2 JP5518662 B2 JP 5518662B2
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resin
light
light emitting
plate
transparent plate
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JP2012079840A (en
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和香子 新野
一彦 上野
功三郎 伊藤
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Stanley Electric Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors

Description

本発明は、発光素子からの光を波長変換層で変換する発光装置およびその製造方法に関する。   The present invention relates to a light emitting device that converts light from a light emitting element by a wavelength conversion layer and a method for manufacturing the same.

発光素子からの光の一部を波長変換層により異なる波長の光に変換し、発光素子からの光と混合して出射する発光装置が知られている。例えば、特許文献1には、セラミックや樹脂などの基板上に複数個の発光素子を並べ、発光素子3の真上に蛍光体含有樹脂で形成した波長変換層を配置した発光装置が開示されている。波長変換層の上面には、透明板が搭載されている。特許文献2には、キャビティ内に発光素子を配置し、発光素子の側面および上面を覆うようにキャビティ内に蛍光体含有樹脂を充填した発光装置が開示されている。蛍光体含有樹脂の上面には、透明板が搭載されている。   There is known a light-emitting device that converts part of light from a light-emitting element into light having a different wavelength by a wavelength conversion layer, and mixes and emits the light with light from the light-emitting element. For example, Patent Document 1 discloses a light emitting device in which a plurality of light emitting elements are arranged on a substrate such as ceramic or resin, and a wavelength conversion layer formed of a phosphor-containing resin is disposed immediately above the light emitting element 3. Yes. A transparent plate is mounted on the upper surface of the wavelength conversion layer. Patent Document 2 discloses a light emitting device in which a light emitting element is disposed in a cavity, and a phosphor-containing resin is filled in the cavity so as to cover a side surface and an upper surface of the light emitting element. A transparent plate is mounted on the upper surface of the phosphor-containing resin.

また、特許文献3には、キャビティを有するケーシング内に複数の発光素子を配置し、キャビティの上部開口を透明板で覆った発光装置が開示されている。透明板の端面から光を出射されるのを防ぐために、透明板の端面の周りの空間が光吸収材料により充填されている。   Patent Document 3 discloses a light emitting device in which a plurality of light emitting elements are arranged in a casing having a cavity, and an upper opening of the cavity is covered with a transparent plate. In order to prevent light from being emitted from the end face of the transparent plate, the space around the end face of the transparent plate is filled with a light absorbing material.

特表2008−507850号公報Special table 2008-507850 gazette 特開2006−48934号公報JP 2006-48934 A 特表2009−60113号公報Special table 2009-60113 gazette

複数の発光素子を基板やキャビティ内に並べて配置した発光装置は、複数の発光素子を隙間なく配置することができないため、発光素子の間隙部分と、発光素子の直上部分とで輝度ムラや色度ムラが生じやすい。また、単数の発光素子を配置する場合であっても発光素子直上部分と周辺領域においては輝度むらや色度ムラが生じやすい。   In a light emitting device in which a plurality of light emitting elements are arranged side by side in a substrate or cavity, a plurality of light emitting elements cannot be arranged without gaps, and therefore luminance unevenness and chromaticity are caused by the gap between the light emitting elements and the portion directly above the light emitting elements. Unevenness is likely to occur. Further, even when a single light emitting element is disposed, uneven luminance and uneven chromaticity are likely to occur in the portion directly above the light emitting element and the peripheral region.

この輝度ムラや色度ムラを解決するためには、波長変換層の上面やキャビティの開口に保護等のために配置されている透明板の上面を粗面に加工し、透明板を出射する光を拡散させることが考えられる。しかしながら、透明板の上面を粗面に加工すると、光の拡散効果が得られる反面、液体に対する濡れ性が高くなる。このため、特許文献2のように透明板の下部に蛍光体含有樹脂を充填する構成や、特許文献3のように透明板の端面の周囲に光吸収材を充填する構成では、製造工程で未硬化の蛍光体含有樹脂や光吸収材が透明樹脂の端面から上面に這い上がり、透明板の上面を汚してしまうという問題が生じる。透明板の上面は、光の出射面であるため、這い上がった樹脂で汚染されていると、光の取り出し効率が低下するとともに、光出射パターンに輝度ムラが生じる。   In order to solve this luminance unevenness and chromaticity unevenness, the light emitted from the transparent plate is processed by roughening the upper surface of the wavelength conversion layer and the upper surface of the transparent plate arranged for protection on the opening of the cavity. It is possible to diffuse. However, when the upper surface of the transparent plate is processed into a rough surface, a light diffusing effect is obtained, but wettability with respect to a liquid is increased. For this reason, the structure in which the phosphor-containing resin is filled in the lower part of the transparent plate as in Patent Document 2 and the structure in which the light absorbing material is filled around the end face of the transparent plate as in Patent Document 3 are not performed in the manufacturing process. There arises a problem that the cured phosphor-containing resin and the light absorbing material crawl up from the end surface of the transparent resin to the upper surface, and the upper surface of the transparent plate is soiled. Since the upper surface of the transparent plate is a light exit surface, if it is contaminated with the resin that has been scooped up, the light extraction efficiency is reduced and luminance unevenness occurs in the light exit pattern.

本発明の目的は、輝度ムラや色度ムラが小さく、かつ、光の取り出し効率に優れた発光装置を提供することにある。   An object of the present invention is to provide a light emitting device that is small in luminance unevenness and chromaticity unevenness and excellent in light extraction efficiency.

上記目的を達成するために、本発明の第1の態様によれば、以下のような発光装置が提供される。すなわち、基板と、基板上に実装された1以上の発光素子と、発光素子上に配置された樹脂層と、樹脂層の上に搭載された板状部材と、樹脂層および板状部材の周囲に充填された反射性樹脂部材とを有する。板状部材は、上面の周縁に設けられた平滑な縁領域と、縁領域に囲まれた凹凸加工領域とを備える。反射性樹脂部材は、板状部材の側面全体を覆っている。   In order to achieve the above object, according to the first aspect of the present invention, the following light emitting device is provided. That is, a substrate, one or more light-emitting elements mounted on the substrate, a resin layer disposed on the light-emitting element, a plate-like member mounted on the resin layer, and the periphery of the resin layer and the plate-like member And a reflective resin member filled therein. A plate-shaped member is provided with the smooth edge area | region provided in the periphery of the upper surface, and the uneven | corrugated process area | region enclosed by the edge area | region. The reflective resin member covers the entire side surface of the plate-like member.

また、本発明の第2の態様によれば、以下のような発光装置が提供される。すなわち、基板と、基板上に実装された1以上の発光素子と、発光素子上に配置された樹脂層と、樹脂層の上に搭載された板状部材と、樹脂層および板状部材の周囲に充填された反射性樹脂部材とを有する。板状部材は、上面の周縁に設けられた、樹脂這い上がり防止領域と、樹脂這い上がり防止領域に囲まれた凹凸加工領域とを備える。反射性樹脂部材は、板状部材の側面全体を覆っている。樹脂這い上がり防止領域には、未硬化の樹脂をはじく材料の層が配置されている。   Moreover, according to the 2nd aspect of this invention, the following light-emitting devices are provided. That is, a substrate, one or more light-emitting elements mounted on the substrate, a resin layer disposed on the light-emitting element, a plate-like member mounted on the resin layer, and the periphery of the resin layer and the plate-like member And a reflective resin member filled therein. The plate-like member includes a resin scooping prevention region and an uneven processing region surrounded by the resin scooping prevention region provided on the periphery of the upper surface. The reflective resin member covers the entire side surface of the plate-like member. A layer of material that repels uncured resin is disposed in the resin creep-up prevention region.

上述の板状部材の上面には、発光素子の直上部分に、平滑な直上領域がさらに設けられている構成にすることができる。   On the upper surface of the plate-shaped member described above, a smooth area directly above the light emitting element may be further provided.

また、本発明の第3の態様によれば発光装置の製造方法が提供される。すなわち、基板上に実装された発光素子の上面を未硬化の樹脂で覆い、その上に板状部材を配置する第1工程と、樹脂および板状部材の側面の周囲に、未硬化の状態で流動性のある反射性樹脂材料を充填することにより、板状部材の側面全体を前記反射性樹脂材料で覆う第2工程とを有する製造方法である。板状部材として、上面の周縁に設けられた樹脂這い上がり防止領域と、樹脂這い上がり防止領域に囲まれた凹凸加工領域とを備えるものを用いる。   Moreover, according to the 3rd aspect of this invention, the manufacturing method of a light-emitting device is provided. That is, the first step of covering the upper surface of the light emitting element mounted on the substrate with an uncured resin and placing the plate member thereon, and around the side surface of the resin and the plate member in an uncured state And a second step of covering the entire side surface of the plate-like member with the reflective resin material by filling the reflective resin material with fluidity. As the plate-like member, a member having a resin scooping prevention region provided on the periphery of the upper surface and a concavo-convex processing region surrounded by the resin scooping prevention region is used.

本発明によれば、板状部材の上面の凹凸加工領域を設けることにより、光の散乱により輝度ムラおよび色度ムラを低減できる。しかも、板状部材の上面の周縁の平滑な領域または樹脂這い上がり防止領域が、板状部材の周囲もしくは下部に樹脂を充填する際に未硬化の樹脂が板状部材の上面に這い上がる現象を防ぐ。よって、板状部材の上面の凹凸加工領域の樹脂で汚染することがなく、光の取り出し効率を向上させることができる。   According to the present invention, it is possible to reduce luminance unevenness and chromaticity unevenness due to light scattering by providing the uneven processing region on the upper surface of the plate-like member. In addition, the smooth region on the periphery of the upper surface of the plate-like member or the resin creep-up prevention region causes a phenomenon that uncured resin crawls up to the upper surface of the plate-like member when filling the resin around or below the plate-like member. prevent. Therefore, the light extraction efficiency can be improved without being contaminated by the resin in the uneven processing region on the upper surface of the plate member.

実施形態1の発光装置の(a)上面図、(b)断面図。2A is a top view of the light-emitting device of Embodiment 1, and FIG. 図1の透明板1の上面図。The top view of the transparent plate 1 of FIG. (a)〜(d)実施形態1の発光装置の製造工程を示す断面図。(A)-(d) Sectional drawing which shows the manufacturing process of the light-emitting device of Embodiment 1. FIG. 実施形態2の発光装置に用いる透明板1の上面図。FIG. 6 is a top view of a transparent plate 1 used in the light emitting device of Embodiment 2. 実施形態1の平滑な縁1bを凹加工1cにより形成した透明板1の断面図。Sectional drawing of the transparent board 1 which formed the smooth edge 1b of Embodiment 1 by the concave process 1c. 実施形態2の平滑な縁1bを凹加工1cにより形成した透明板1の断面図。Sectional drawing of the transparent plate 1 which formed the smooth edge 1b of Embodiment 2 by the concave process 1c. 実施形態3の発光装置に用いる透明板1の上面図。FIG. 6 is a top view of a transparent plate 1 used in the light emitting device of Embodiment 3. 実施形態3の透明板1に直上領域2を設けた例の上面図。FIG. 6 is a top view of an example in which a directly above region 2 is provided on the transparent plate 1 of Embodiment 3. 実施形態4の発光装置の断面図。Sectional drawing of the light-emitting device of Embodiment 4. FIG. (a)〜(d)実施形態4の発光装置の製造工程を示す断面図。(A)-(d) Sectional drawing which shows the manufacturing process of the light-emitting device of Embodiment 4. FIG.

以下、本発明の一実施の形態の発光装置について説明する。   Hereinafter, a light emitting device according to an embodiment of the present invention will be described.

(実施形態1)
図1(a)、(b)に、実施形態1の発光装置の上面図および断面図を示す。上面に配線が形成された実装基板10の上に、1以上のフリップチップタイプの発光素子11が、複数のバンプ12により接合され、実装されている。複数の発光素子11の間には、所定の間隔があけられている。
(Embodiment 1)
FIGS. 1A and 1B are a top view and a cross-sectional view of the light emitting device according to the first embodiment. One or more flip-chip type light emitting elements 11 are joined and mounted by a plurality of bumps 12 on a mounting substrate 10 on which wiring is formed on the upper surface. A predetermined interval is provided between the plurality of light emitting elements 11.

発光素子11の上面および側面は、波長変換層24で被覆されている。波長変換層24は、蛍光体粒子を樹脂や無機バインダーに混練・分散させた材料によって形成されている。   The upper surface and the side surface of the light emitting element 11 are covered with the wavelength conversion layer 24. The wavelength conversion layer 24 is formed of a material obtained by kneading and dispersing phosphor particles in a resin or an inorganic binder.

波長変換層24の上には、発光素子11を保護するために透明板1が搭載されている。図1の発光装置では、波長変換層24と透明板1を上面から見た大きさが同じであり、これらの側面は一致した位置にある。   A transparent plate 1 is mounted on the wavelength conversion layer 24 in order to protect the light emitting element 11. In the light emitting device of FIG. 1, the wavelength conversion layer 24 and the transparent plate 1 are the same in size when viewed from the top, and these side surfaces are in a coincident position.

実装基板10の上面には外周部に沿ってリング16が配置されている。波長変換層24および透明板1の側面と、リング16との間の空間は、拡散反射部材15が配置されている。拡散反射部材15は、樹脂や無機材料のバインダーに光散乱性の粒子を混合した材料を、未硬化の状態で発光素子11と枠体の間の空間に注入し、硬化させることによって形成されている。   A ring 16 is disposed on the upper surface of the mounting substrate 10 along the outer periphery. In the space between the wavelength conversion layer 24 and the side surface of the transparent plate 1 and the ring 16, the diffuse reflection member 15 is disposed. The diffuse reflection member 15 is formed by injecting a material obtained by mixing light scattering particles into a binder of resin or inorganic material into a space between the light emitting element 11 and the frame body in an uncured state and curing the material. Yes.

拡散反射部材15は、波長変換層24および透明板1の側面全体を覆い、かつ、透明板1上面を越えない厚さであることが望ましい。所望の配光パターンのカットオフラインの形成のためである。拡散反射部材15の厚さは、充填する未硬化の拡散反射部材15の量を調整することにより制御できる。   It is desirable that the diffuse reflection member 15 has a thickness that covers the entire side surfaces of the wavelength conversion layer 24 and the transparent plate 1 and does not exceed the upper surface of the transparent plate 1. This is for forming a cut-off line of a desired light distribution pattern. The thickness of the diffuse reflection member 15 can be controlled by adjusting the amount of the uncured diffuse reflection member 15 to be filled.

透明板1の上面(光の出射面側)は、図2に示すように、大部分の領域1aが粗面(凹凸面)に加工されている。発光素子11からの光を拡散して出射するためである。凹凸面の粗さRaは、光拡散の効果を得るためにRa=0.5以上2.0以下の範囲であることが好ましい。透明板1の大きさは、配列された素子11の全体よりも大きいことが望ましい。   As shown in FIG. 2, the upper surface (light emission surface side) of the transparent plate 1 has a large area 1a processed into a rough surface (uneven surface). This is because the light from the light emitting element 11 is diffused and emitted. The roughness Ra of the uneven surface is preferably in the range of Ra = 0.5 or more and 2.0 or less in order to obtain the light diffusion effect. The size of the transparent plate 1 is desirably larger than the entire arrayed elements 11.

透明板1の上面が凹凸面に加工されている場合、透明板1の上面の液体に対する濡れ性が高くなり、製造工程において未硬化の波長変換層24や未硬化の拡散反射部材15を構成する樹脂が、透明板1の上面に這い上がり、透明板1の上面を一部覆ってしまう現象が生じる可能性がある。これを防止するために、本実施形態では、透明板1の上面の縁に、粗面加工を施さない平滑な領域である縁1bを設け、縁1bで囲まれた中央の領域1aのみを凹凸加工を施している。   When the upper surface of the transparent plate 1 is processed into an uneven surface, the wettability of the upper surface of the transparent plate 1 with respect to the liquid is increased, and the uncured wavelength conversion layer 24 and the uncured diffuse reflection member 15 are configured in the manufacturing process. There is a possibility that a phenomenon occurs in which the resin crawls up to the upper surface of the transparent plate 1 and partially covers the upper surface of the transparent plate 1. In order to prevent this, in the present embodiment, the edge of the upper surface of the transparent plate 1 is provided with an edge 1b that is a smooth area that is not roughened, and only the central area 1a surrounded by the edge 1b is uneven. Has been processed.

平滑な縁1bの幅は、平滑な縁1bを乗り越えて未硬化の樹脂が凹凸加工領域1aに到達しない幅であって、かつ、配光パターンに影響を与えない幅に設定することが望ましい。未硬化の波長変換層24や未硬化の拡散反射部材15を構成する樹脂が、平滑な縁1bを乗り越えて這い上がるかどうかは、未硬化の樹脂の粘度や材質ならびに透明板1の材質によって異なるため、予め実験等を行って適切な幅に設定することが望ましい。例えば、透明板1がガラス製であり、未硬化の樹脂がシリコーン樹脂である場合、平滑な縁1bの幅は、10μm以上60μm以下とすることができる。より具体的には10μmに設定することが可能である。   The width of the smooth edge 1b is desirably set to a width that does not allow the uncured resin to reach the uneven processing area 1a over the smooth edge 1b and does not affect the light distribution pattern. Whether the resin constituting the uncured wavelength conversion layer 24 or the uncured diffuse reflection member 15 climbs over the smooth edge 1b depends on the viscosity and material of the uncured resin and the material of the transparent plate 1 Therefore, it is desirable to set an appropriate width by conducting an experiment or the like in advance. For example, when the transparent plate 1 is made of glass and the uncured resin is a silicone resin, the width of the smooth edge 1b can be 10 μm or more and 60 μm or less. More specifically, it can be set to 10 μm.

また、透明板1の側面から上面に、未硬化の波長変換層24や未硬化の拡散反射部材15を構成する樹脂が這い上がらないようにするために、透明板1の上端の角部(上面と側面とが交わる角部)は、明確なエッジ(曲率0.1mm以下)であることが望ましい。   Further, in order to prevent the resin constituting the uncured wavelength conversion layer 24 and the uncured diffuse reflection member 15 from scooping up from the side surface to the top surface of the transparent plate 1, the upper corner of the transparent plate 1 (upper surface) It is desirable that the corner portion where the side surface and the side surface intersect) is a clear edge (with a curvature of 0.1 mm or less).

透明板1の下面は、空気層等を挟まず波長変換層24と密着していることが望ましい。また、透明板1の屈折率を波長変換層24よりも大きくすることにより、発光素子11から出射された光が透明板1と波長変換層24との界面で全反射されるのを防止することができる。   It is desirable that the lower surface of the transparent plate 1 is in close contact with the wavelength conversion layer 24 without interposing an air layer or the like. Further, by making the refractive index of the transparent plate 1 larger than that of the wavelength conversion layer 24, it is possible to prevent the light emitted from the light emitting element 11 from being totally reflected at the interface between the transparent plate 1 and the wavelength conversion layer 24. Can do.

透明板1は、発光素子11の発光および波長変換層24による変換後の光に対して透明なものを用いる。例えば、ガラス等の無機材料や、シリコーン樹脂、エポキシ樹脂等の透明樹脂製の透明板1を用いることができる。   As the transparent plate 1, a material that is transparent to the light emitted from the light emitting element 11 and the light converted by the wavelength conversion layer 24 is used. For example, a transparent plate 1 made of an inorganic material such as glass or a transparent resin such as a silicone resin or an epoxy resin can be used.

波長変換層24の蛍光体は、発光素子11からの光を励起光として所望の波長の蛍光を発する蛍光体を用いる。具体的には例えば、青色光を発する発光素子11を用いる場合、青色光により励起されて、黄色蛍光を発する蛍光体(例えばYAG蛍光体等)を用いる。これにより、青色光と黄色光が混色された白色光を発する発光装置を提供できる。波長変換層24のバインダー樹脂としては、シリコーン樹脂、エポキシ等を用いることができる。   As the phosphor of the wavelength conversion layer 24, a phosphor that emits fluorescence of a desired wavelength using light from the light emitting element 11 as excitation light is used. Specifically, for example, when using the light emitting element 11 that emits blue light, a phosphor that emits yellow fluorescence when excited by the blue light (for example, a YAG phosphor) is used. Accordingly, a light emitting device that emits white light in which blue light and yellow light are mixed can be provided. As the binder resin of the wavelength conversion layer 24, silicone resin, epoxy, or the like can be used.

拡散反射部材15のバインダー樹脂としては、シリコーン樹脂、エポキシ樹脂、アルキルシリケート、金属アルコラート等の樹脂を用いることができる。散乱材料(粒子)としては、酸化チタン、酸化亜鉛、窒化硼素、窒化アルミ等の金属酸化物を用いることができる。   As the binder resin of the diffuse reflection member 15, a resin such as a silicone resin, an epoxy resin, an alkyl silicate, a metal alcoholate, or the like can be used. As the scattering material (particles), metal oxides such as titanium oxide, zinc oxide, boron nitride, and aluminum nitride can be used.

実装基板10として、例えば、Auなどの配線パターンが形成されたAlNセラミックス製の基板を用いる。バンプ12としては、例えばAuバンプを用いる。発光素子11としては、所望の波長光を出射するものを用意する。例えば、青色光を発するものを用いる。   As the mounting substrate 10, for example, an AlN ceramic substrate on which a wiring pattern such as Au is formed is used. For example, Au bumps are used as the bumps 12. As the light emitting element 11, an element that emits light having a desired wavelength is prepared. For example, one that emits blue light is used.

リング16は、例えばセラミックリングを用いることができる。   For example, a ceramic ring can be used as the ring 16.

本実施形態の発光装置の動作について説明する。発光素子11から上方に出射される光は、波長変換層24に入射し、一部または全部が所定の波長の光に変換され、波長変換層24の上面から出射される。波長変換層24の上面から出射される光は、透明板1に入射し、透明板1の上面の凹凸加工領域1bにおいて散乱されて出射される。これにより、発光素子11と発光素子11の間の間隔等に起因する色度ムラや輝度ムラを低減し、均一な色度および輝度の光を所定の配光パターンで透明板1の上面から出射することができる。   The operation of the light emitting device of this embodiment will be described. The light emitted upward from the light emitting element 11 is incident on the wavelength conversion layer 24, part or all of which is converted into light having a predetermined wavelength, and is emitted from the upper surface of the wavelength conversion layer 24. The light emitted from the upper surface of the wavelength conversion layer 24 enters the transparent plate 1 and is scattered and emitted from the uneven processing region 1 b on the upper surface of the transparent plate 1. Thereby, chromaticity unevenness and luminance unevenness due to the spacing between the light emitting elements 11 and the like are reduced, and light of uniform chromaticity and brightness is emitted from the upper surface of the transparent plate 1 with a predetermined light distribution pattern. can do.

波長変換層24および透明板1において側面方向に進行する光は、側面において拡散反射部材15によって反射されることにより進行方向を上面方向に変え、透明板1の上面において散乱されて出射される。   The light traveling in the side surface direction in the wavelength conversion layer 24 and the transparent plate 1 is reflected by the diffuse reflection member 15 on the side surface to change the traveling direction to the upper surface direction, and is scattered and emitted from the upper surface of the transparent plate 1.

本実施形態では発光素子11の側面から拡散反射部材15までの距離が短いため、発光素子11から横方向に出射された光が、透明板1の上面に到達するまでの光路長が短く、波長変換層24および透明板1による吸収の影響をほとんど受けず、高い効率で透明板1の上面から出射できる。   In the present embodiment, since the distance from the side surface of the light emitting element 11 to the diffuse reflection member 15 is short, the optical path length until the light emitted from the light emitting element 11 in the lateral direction reaches the upper surface of the transparent plate 1 is short, and the wavelength The light can be emitted from the upper surface of the transparent plate 1 with high efficiency without being affected by absorption by the conversion layer 24 and the transparent plate 1.

また、拡散反射部材15を未硬化の状態で充填するため、発光素子11に接近させて形成することができ、発光面積の小さい発光装置を提供できる。しかも、発光面積が小さいにも関わらず拡散反射部材15によりキャビティを形成しているため、発光素子11の側面から出射された光の多くは、発光素子11の内部に戻されず上面に向かい、光の取り出し効率が向上する。   Moreover, since the diffuse reflection member 15 is filled in an uncured state, it can be formed close to the light emitting element 11, and a light emitting device with a small light emitting area can be provided. Moreover, since the cavity is formed by the diffuse reflection member 15 in spite of a small light emitting area, most of the light emitted from the side surface of the light emitting element 11 is not returned to the inside of the light emitting element 11 but goes to the upper surface. The take-out efficiency is improved.

つぎに、本実施形態の発光装置の製造方法について図3(a)〜(d)を用いて説明する。   Next, a method for manufacturing the light emitting device of this embodiment will be described with reference to FIGS.

透明板1の上面には予め、縁1bを残し、領域1aを所定の粗さRaに凹凸加工を施しておく。凹凸加工方法としては、サンドブラスト等のセラミックス粒子等を透明板の表面に衝突させ物理的に表面に凹凸を付ける方法や、弗酸等で化学的に表面に凹凸を付ける方法等を用いることができる。   The edge 1b is left on the upper surface of the transparent plate 1 and the region 1a is processed to have a predetermined roughness Ra. As the unevenness processing method, it is possible to use a method in which ceramic particles such as sandblast are collided with the surface of the transparent plate to physically make the surface uneven, or a method in which the surface is chemically uneven with hydrofluoric acid or the like. .

まず、図3(a)のように、実装基板10の上面の配線パターンに、フリップチップタイプの発光素子11の素子電極をバンプ12を用いて接合し、実装する。実装基板10上にリング16を固定する。つぎに、蛍光体粒子をバインダーに混練したものを用意し、図3(b)のように印刷法やポッティング法により発光素子11の上面および側面を所定の厚さで被覆して、未硬化の波長変換層24を形成する。   First, as shown in FIG. 3A, the element electrode of the flip chip type light emitting element 11 is bonded to the wiring pattern on the upper surface of the mounting substrate 10 using the bumps 12 and mounted. The ring 16 is fixed on the mounting substrate 10. Next, a phosphor particle kneaded with a binder is prepared, and the upper and side surfaces of the light emitting element 11 are coated with a predetermined thickness by a printing method or a potting method as shown in FIG. The wavelength conversion layer 24 is formed.

図3(c)のように、波長変換層24が未硬化の状態で透明板1を搭載し、その後、波長変換層24を所定の条件で硬化させることにより、波長変換層24を接着層として透明板1をする。このとき、波長変換層24は未硬化であるが、透明板1の上面に平滑な縁1bが設けられていることと、透明板1の上端の角部のエッジが明確であることから、透明板1の上面へ未硬化の波長変換層24が這い上がらない。   As shown in FIG. 3C, the transparent plate 1 is mounted in a state where the wavelength conversion layer 24 is uncured, and then the wavelength conversion layer 24 is cured under predetermined conditions, whereby the wavelength conversion layer 24 is used as an adhesive layer. The transparent plate 1 is used. At this time, although the wavelength conversion layer 24 is uncured, since the smooth edge 1b is provided on the upper surface of the transparent plate 1 and the edge of the upper corner of the transparent plate 1 is clear, it is transparent. The uncured wavelength conversion layer 24 does not crawl on the upper surface of the plate 1.

つぎに、散乱粒子をバインダーに混練した未硬化の拡散反射部材15を用意し、図3(d)のように透明板1とリング16との間の空間に充填する。このとき、透明板1の上面と未硬化の拡散反射部材15の液面が同じ高さになるように、充填量をコントロールする。透明板1の上面は領域1aが凹凸加工されているが、平滑な縁1bが設けられていることと、透明板1の上端の角部のエッジが明確であることから、未硬化の拡散反射部材は、透明板1の上面まで這い上がらず、透明板1の上面を覆わない。未硬化の拡散反射部材15の充填後、所定の条件で硬化させる。   Next, an uncured diffuse reflection member 15 in which scattering particles are kneaded with a binder is prepared, and the space between the transparent plate 1 and the ring 16 is filled as shown in FIG. At this time, the filling amount is controlled so that the upper surface of the transparent plate 1 and the liquid surface of the uncured diffuse reflection member 15 have the same height. The upper surface of the transparent plate 1 has an uneven region 1a. However, since the smooth edge 1b is provided and the edge of the upper corner of the transparent plate 1 is clear, uncured diffuse reflection. The member does not crawl up to the upper surface of the transparent plate 1 and does not cover the upper surface of the transparent plate 1. After filling with the uncured diffuse reflection member 15, it is cured under predetermined conditions.

以上により、本実施形態1の図1に示した発光装置を製造することができる。   As described above, the light-emitting device shown in FIG. 1 of Embodiment 1 can be manufactured.

なお、上記の製造方法では、波長変換層24を硬化させた後で拡散反射部材15を充填したが、未硬化の波長変換層24の形状が変化しない程度に粘度を調整しておくことにより、波長変換層24が未硬化の状態のまま次工程に進み、拡散反射部材15を充填し、波長変換層24と拡散反射部材15とを同時に硬化させることも可能である。   In the manufacturing method described above, the diffuse reflection member 15 is filled after the wavelength conversion layer 24 is cured, but by adjusting the viscosity so that the shape of the uncured wavelength conversion layer 24 does not change, It is also possible to proceed to the next step while the wavelength conversion layer 24 is in an uncured state, fill the diffuse reflection member 15, and simultaneously cure the wavelength conversion layer 24 and the diffuse reflection member 15.

また、波長変換層24と透明板1との間に、透明部材層を配置し、透明部材層を接着層として透明板1を固定することも可能である。   It is also possible to arrange a transparent member layer between the wavelength conversion layer 24 and the transparent plate 1 and fix the transparent plate 1 using the transparent member layer as an adhesive layer.

実施形態1では、拡散反射部材15を透明板1の搭載後に充填する製造工程を説明したが、予め成形した拡散反射部材15を基板10上に搭載しておくことも可能である。この場合、拡散反射部材15の開口内に、発光素子11を実装し、未硬化の波長変換層24を充填し、透明板1を搭載した後、未硬化の波長変換層24を硬化させる。このとき、本実施形態の透明板1を用いることにより、未硬化の波長変換層24が透明板1の上面に這い上がる現象を防止することができる。   In the first embodiment, the manufacturing process for filling the diffuse reflection member 15 after mounting the transparent plate 1 has been described. However, the diffuse reflection member 15 formed in advance may be mounted on the substrate 10. In this case, the light emitting element 11 is mounted in the opening of the diffuse reflection member 15, the uncured wavelength conversion layer 24 is filled, the transparent plate 1 is mounted, and then the uncured wavelength conversion layer 24 is cured. At this time, by using the transparent plate 1 of the present embodiment, it is possible to prevent the uncured wavelength conversion layer 24 from climbing up to the upper surface of the transparent plate 1.

(実施形態2)
実施形態2では、図4のように透明板1の上面において、発光素子11の直上領域2を発光素子11の平滑な面とし、凹凸加工を施さない構成とする。他の構成は、実施形態1と同じであるので説明を省略する。
(Embodiment 2)
In the second embodiment, as shown in FIG. 4, on the upper surface of the transparent plate 1, the region 2 immediately above the light emitting element 11 is a smooth surface of the light emitting element 11 and is not subjected to uneven processing. Other configurations are the same as those in the first embodiment, and thus the description thereof is omitted.

このように、発光素子11の直上領域2を平滑な面とすることにより、発光素子11から発せられた光のうち、素子直上領域2に到達した光は散乱されずに出射されるため、直上領域2の出射光の輝度を向上させることができる。   Thus, by making the region 2 directly above the light emitting element 11 a smooth surface, the light that has reached the region 2 immediately above the element out of the light emitted from the light emitting element 11 is emitted without being scattered. The brightness of the emitted light in the region 2 can be improved.

また、色度ムラや輝度ムラの生じやすい発光素子11と発光素子11の間隙や素子周辺については、凹凸加工された領域1aにより光が散乱されるため、色度ムラや輝度ムラを低減することができる。   Further, since light is scattered by the uneven region 1a in the gap between the light emitting element 11 and the light emitting element 11 where the chromaticity unevenness and the brightness unevenness easily occur, and the periphery of the element, the chromaticity unevenness and the brightness unevenness are reduced. Can do.

なお、平滑な素子直上領域2の形状は、発光素子11の上面と同形状であっても、発光素子11の上面形状とは異なる円形等であってもよい。平滑な素子直上領域2のサイズは、素子上面よりも小さいことが望ましい。   Note that the shape of the smooth region 2 immediately above the element may be the same shape as the upper surface of the light emitting element 11, or may be a circle different from the upper surface shape of the light emitting element 11. The size of the region 2 immediately above the smooth element is desirably smaller than the upper surface of the element.

上述の実施形態1、2では、透明板1の縁1bの領域に凹凸加工を施さないことにより、平滑な縁1bを形成したが、平滑な縁1bの形成方法はこの方法に限られるものではない。例えば、透明板1の全面に凹凸加工を施した後、縁1bの表面領域に図5および図6のように凹加工(ざぐり加工)1cを施し除去することにより、縁1bに平滑面を形成することも可能である。図5は、実施形態1の図2の透明板1の断面図であり、図6は実施形態2の図4の透明板1の断面図である。図5および図6のように凹加工1cにより縁1bを平滑にした場合であっても、透明板1の上面への樹脂の這い上がりが防止される作用は、実施形態1および2と同様に生じる。   In the first and second embodiments described above, the smooth edge 1b is formed by not subjecting the region of the edge 1b of the transparent plate 1 to the uneven processing, but the method of forming the smooth edge 1b is not limited to this method. Absent. For example, after the concavo-convex process is performed on the entire surface of the transparent plate 1, the surface area of the edge 1b is removed by applying a concave process (spotting process) 1c as shown in FIGS. 5 and 6, thereby forming a smooth surface on the edge 1b. It is also possible to do. 5 is a cross-sectional view of the transparent plate 1 of FIG. 2 according to the first embodiment, and FIG. 6 is a cross-sectional view of the transparent plate 1 of FIG. Even when the edge 1b is smoothed by the concave processing 1c as shown in FIGS. 5 and 6, the effect of preventing the resin from creeping up to the upper surface of the transparent plate 1 is the same as in the first and second embodiments. Arise.

図5および図6のように平滑な縁1bを凹加工1cを施して形成することにより、大きな板から複数の透明板1を容易に製造できる。具体的には、大きな板の全面に凹凸加工を施した後、各透明板1の縁1bとなる領域に凹加工1cを施して平滑面とし、その後各透明板1のサイズに切断するという工程で複数の透明板1を製造することができる。これにより、透明板1の表面の凹凸加工時に、縁1bの領域を予めマスクで覆う必要がなく、大きな板の透明板1全面に凹凸加工を施せばよく、凹凸加工が容易になる。また、凹加工1cの工程と、切断工程は、連続的に行うことができるため、製造効率を高めることができる。   A plurality of transparent plates 1 can be easily manufactured from a large plate by forming the smooth edge 1b by performing the concave processing 1c as shown in FIGS. Specifically, a process of performing unevenness processing on the entire surface of a large plate, then performing concave processing 1c on a region that becomes the edge 1b of each transparent plate 1 to form a smooth surface, and then cutting to the size of each transparent plate 1 A plurality of transparent plates 1 can be manufactured. This eliminates the need for previously covering the area of the edge 1b with a mask during the uneven processing of the surface of the transparent plate 1, and it is only necessary to perform the uneven processing on the entire transparent plate 1 of a large plate, thereby facilitating the uneven processing. Moreover, since the process of the concave process 1c and a cutting process can be performed continuously, manufacturing efficiency can be improved.

なお、図6の平滑な素子直上領域2を凹加工1cにより形成することも可能である。   It is also possible to form the region 2 immediately above the smooth element of FIG. 6 by the concave processing 1c.

(実施形態3)
実施形態3では、図7のように透明板1の上面の縁に、樹脂の這い上がり防止剤層を形成した領域3を形成する。這い上がり防止剤層形成領域3は、平滑な領域であることがより望ましいが、凹凸加工が施されていてもよい。
(Embodiment 3)
In Embodiment 3, as shown in FIG. 7, a region 3 in which a resin scooping-up preventing agent layer is formed is formed on the edge of the upper surface of the transparent plate 1. The scooping-up preventing agent layer forming region 3 is more preferably a smooth region, but may be subjected to uneven processing.

這い上がり防止剤層形成領域3の幅は、這い上がり防止剤の材質、波長変換層24および拡散反射部材15の樹脂の材質、ならびに透明板1の表面状態を考慮して決定する。具体的には、この領域を乗り越えて未硬化の樹脂が凹凸加工領域1aに到達しない幅であって、かつ、配光パターンに影響を与えない幅に設定することが望ましい。予め実験等を行って適切な幅に設定することが望ましい。   The width of the creeping preventing agent layer forming region 3 is determined in consideration of the material of the creeping preventing agent, the resin material of the wavelength conversion layer 24 and the diffuse reflection member 15, and the surface state of the transparent plate 1. Specifically, it is desirable to set the width so that the uncured resin does not reach the concavo-convex processing region 1a over this region and does not affect the light distribution pattern. It is desirable to set an appropriate width by conducting an experiment or the like in advance.

這い上がり防止剤としては、未硬化の波長変換層24および/または未硬化の拡散反射部材15をはじくもの、例えば純水の接触角が90°以上であるものを用いる。具体的には、ポリテトラフルオロエチレン(PTFE)、四フッ化エチレン・六フッ化プロピレン共重合体(FEP)、テトラフルオロエチレン・パーフルオロアルキルビニルエーテル共重体(PFA)等のフッ素系ポリマーを用いることができる。   As the scooping-up preventing agent, one that repels the uncured wavelength conversion layer 24 and / or the uncured diffuse reflection member 15, for example, one having a contact angle of pure water of 90 ° or more is used. Specifically, use a fluoropolymer such as polytetrafluoroethylene (PTFE), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer (PFA), etc. Can do.

這い上がり防止剤層の形成方法としては、刷毛塗り等による塗布や、ゴムプレート等の別部材に這い上がり防止剤を塗布して、この部材を透明板1に押し付けて転写する方法や、ディスペンサ等を用いて射出しながら塗布する方法を用いることが可能である。   As a method of forming the scooping-up preventing agent layer, a method such as application by brush coating or the like, a scooping-up preventing agent is applied to another member such as a rubber plate, and this member is pressed against the transparent plate 1 to transfer, or a dispenser or the like It is possible to use a method of coating while injecting using a liquid.

また、透明板1には、図8のように、発光素子の直上に平滑な領域2を設けることも可能である。   In addition, the transparent plate 1 can be provided with a smooth region 2 immediately above the light emitting element as shown in FIG.

(実施形態4)
実施形態4では、図9に断面図を示すように、発光素子11側面に近い位置に傾斜した反射面130を有する拡散反射部材15を形成する。
(Embodiment 4)
In the fourth embodiment, as shown in a cross-sectional view in FIG. 9, the diffuse reflection member 15 having the reflective surface 130 inclined at a position close to the side surface of the light emitting element 11 is formed.

実装基板10上にバンプ12により発光素子11が実装され、周囲にリング16が配置されている。この構造は、実施形態1と同様である。   The light emitting element 11 is mounted on the mounting substrate 10 by bumps 12, and a ring 16 is disposed around the light emitting element 11. This structure is the same as that of the first embodiment.

発光素子11の上面には、傾斜した側面を有する波長変換層24が搭載され、その上に透明板1が搭載されている。透明板1は、実施形態1と同様に、上面に凹凸加工された領域1aと平滑な縁1bとを有する。透明板1の主平面方向の大きさは、配列された発光素子11全体よりも若干大きい。   A wavelength conversion layer 24 having inclined side surfaces is mounted on the upper surface of the light emitting element 11, and the transparent plate 1 is mounted thereon. As in the first embodiment, the transparent plate 1 has a region 1a that is processed to be uneven on the upper surface and a smooth edge 1b. The size of the transparent plate 1 in the main plane direction is slightly larger than the entire light emitting elements 11 arranged.

図9の例では、波長変換層24の側面は、発光素子11側に向かって凸の湾曲面となっている。   In the example of FIG. 9, the side surface of the wavelength conversion layer 24 is a curved surface that is convex toward the light emitting element 11 side.

発光素子11とリング16との間の空間は拡散反射部材15により充填されている。拡散反射部材15と波長変換層24との境界で形成される傾斜面130が、発光素子11および透明板1の側面方向への出射光を反射する反射面となる。   A space between the light emitting element 11 and the ring 16 is filled with a diffuse reflection member 15. The inclined surface 130 formed at the boundary between the diffuse reflection member 15 and the wavelength conversion layer 24 becomes a reflection surface that reflects the emitted light in the side surface direction of the light emitting element 11 and the transparent plate 1.

本実施形態2では、拡散反射部材15は、バンプ12の間を埋めるように、発光素子11の底面と基板10の上面との間の空間も充填している。   In the second embodiment, the diffuse reflection member 15 also fills the space between the bottom surface of the light emitting element 11 and the top surface of the substrate 10 so as to fill the space between the bumps 12.

拡散反射部材15と波長変換層24との境界の傾斜面130は、図9では、発光素子11側(内側)に向かって凸の曲面であるが、これに限られるものではなく、発光素子11の底面と透明板1の下面を直線的に結ぶ傾斜面、または、外側(リング16側)に凸の曲面であってもよい。   In FIG. 9, the inclined surface 130 at the boundary between the diffuse reflection member 15 and the wavelength conversion layer 24 is a curved surface that is convex toward the light emitting element 11 side (inner side), but is not limited thereto. An inclined surface that linearly connects the bottom surface of the transparent plate 1 and the lower surface of the transparent plate 1 or a curved surface that protrudes outward (ring 16 side) may be used.

また、傾斜面130の発光素子11側の一端は、必ずしも図9のように発光素子11の底面と同じ高さにある必要はなく、少なくとも発光素子11の側面にあればよい。発光素子11は、基板10にフリップチップ実装されることが好ましい。フリップチップ実装の場合、発光面が発光素子の底面に近い位置にあるため、傾斜面130による反射を最も利用することができるためである。   Further, one end of the inclined surface 130 on the light emitting element 11 side is not necessarily at the same height as the bottom surface of the light emitting element 11 as shown in FIG. The light emitting element 11 is preferably flip-chip mounted on the substrate 10. This is because in the case of flip chip mounting, since the light emitting surface is located near the bottom surface of the light emitting element, the reflection by the inclined surface 130 can be most utilized.

実施形態2の発光装置の各部の作用について説明する。発光素子11の出射光は、波長変換層24に入射し、一部または全部が所定の波長の光に変換され、波長変換層24の上面から出射される。波長変換層24の上面から出射される光は、透明板1に入射し、透明板1の上面の凹凸加工領域1aにおいて散乱されて出射される。これにより、発光素子11と発光素子11の間に間隔があいていること等に起因する色度ムラや輝度ムラを低減し、均一な色度および輝度の光を所定の配光パターンで透明板1の上面から出射することができる。   The operation of each part of the light emitting device of Embodiment 2 will be described. Light emitted from the light emitting element 11 is incident on the wavelength conversion layer 24, part or all of which is converted into light having a predetermined wavelength, and is emitted from the upper surface of the wavelength conversion layer 24. The light emitted from the upper surface of the wavelength conversion layer 24 enters the transparent plate 1 and is scattered and emitted in the uneven processing region 1 a on the upper surface of the transparent plate 1. As a result, chromaticity unevenness and luminance unevenness due to a gap between the light emitting element 11 and the light emitting element 11 are reduced, and light with uniform chromaticity and brightness is transmitted with a predetermined light distribution pattern. The light can be emitted from the upper surface of 1.

発光素子11の側面から出射される光は、側面から波長変換層24に入射し、拡散反射部材15と波長変換層24との境界の傾斜面130によって上方に反射される。これにより、発光素子11の側面から出射される光の多くは、発光素子11の内部に戻されないため、発光素子11によって吸収されない。また、発光素子11の側面と拡散反射部材15までの距離は短いため、波長変換層24による吸収の影響もほとんど受けない。よって、光の取り出し効率が向上する。   The light emitted from the side surface of the light emitting element 11 enters the wavelength conversion layer 24 from the side surface and is reflected upward by the inclined surface 130 at the boundary between the diffuse reflection member 15 and the wavelength conversion layer 24. Thereby, most of the light emitted from the side surface of the light emitting element 11 is not returned to the inside of the light emitting element 11 and is not absorbed by the light emitting element 11. Further, since the distance between the side surface of the light emitting element 11 and the diffuse reflection member 15 is short, it is hardly affected by absorption by the wavelength conversion layer 24. Therefore, the light extraction efficiency is improved.

つぎに、本実施形態4の発光装置の製造方法について図10(a)〜(d)を用いて説明する。まず、図10(a)のように、実装基板10上に発光素子11をバンプ12を用いて実装する。図10(b)のように、未硬化の波長変換材料24’を発光素子11の上面に塗布(滴下)し、図10(c)のように透明板1を搭載する。これにより、未硬化の波長変換材料24’が発光素子の側面の少なくとも一部を覆いつつ表面張力を保つことによって、発光素子11の側面と透明板1の下面を接続する傾斜面130が形成される。このとき、波長変換材料24’の量が少なければ、発光素子11側に凸の曲面の傾斜面130が形成され、波長変換材料24’の量を増やすと直線的な傾斜面130が形成され、さらに波長変換材料24’の量を増やすと外側に凸の曲面の傾斜面130が形成される。   Next, a method for manufacturing the light emitting device according to the fourth embodiment will be described with reference to FIGS. First, as shown in FIG. 10A, the light emitting element 11 is mounted on the mounting substrate 10 using the bumps 12. As shown in FIG. 10B, an uncured wavelength converting material 24 ′ is applied (dropped) on the upper surface of the light emitting element 11, and the transparent plate 1 is mounted as shown in FIG. As a result, the uncured wavelength conversion material 24 ′ maintains the surface tension while covering at least a part of the side surface of the light emitting element, thereby forming the inclined surface 130 that connects the side surface of the light emitting element 11 and the lower surface of the transparent plate 1. The At this time, if the amount of the wavelength converting material 24 ′ is small, a convex curved inclined surface 130 is formed on the light emitting element 11 side, and if the amount of the wavelength converting material 24 ′ is increased, a linear inclined surface 130 is formed. Further, when the amount of the wavelength conversion material 24 ′ is increased, an outwardly convex curved inclined surface 130 is formed.

波長変換材料24’を所定硬化処理により硬化させ、波長変換層24を形成する。なお、この後の工程で波長変換層24の形状が変わらないのであれば、完全に硬化させず、半硬化となる条件で硬化させても良い。   The wavelength conversion material 24 ′ is cured by a predetermined curing process to form the wavelength conversion layer 24. In addition, as long as the shape of the wavelength conversion layer 24 does not change in the subsequent steps, the wavelength conversion layer 24 may not be completely cured, but may be cured under a semi-cured condition.

つぎに、未硬化の拡散反射部材15を用意し、図10(d)のように透明板1とリング16との間の空間に充填する。この後、所定の条件により拡散反射部材15を硬化させる。   Next, an uncured diffuse reflection member 15 is prepared and filled in the space between the transparent plate 1 and the ring 16 as shown in FIG. Thereafter, the diffuse reflection member 15 is cured under predetermined conditions.

なお、上述の製造方法において、図10(b)の工程では、発光素子11の上面に未硬化の波長変換材料24’を塗布したが、本実施形態の製造方法はこれに限られるものではない。例えば、透明板1の下面に波長変換材料24’を塗布することも可能であるし、発光素子11の上面と透明板1の下面の両方に波長変換材料24’を塗布することもできる。サブマウント10に実装された発光素子11を下向きにして、波長変換材料24’を発光素子11の下面、または、透明板1の上面、または、発光素子11の下面と透明板1の上面の両方、にそれぞれ塗布する製造方法とすることも可能である。   In the manufacturing method described above, in the step of FIG. 10B, the uncured wavelength conversion material 24 ′ is applied to the upper surface of the light emitting element 11, but the manufacturing method of the present embodiment is not limited to this. . For example, the wavelength conversion material 24 ′ can be applied to the lower surface of the transparent plate 1, or the wavelength conversion material 24 ′ can be applied to both the upper surface of the light emitting element 11 and the lower surface of the transparent plate 1. With the light emitting element 11 mounted on the submount 10 facing downward, the wavelength conversion material 24 ′ is placed on the lower surface of the light emitting element 11, the upper surface of the transparent plate 1, or both the lower surface of the light emitting element 11 and the upper surface of the transparent plate 1. It is also possible to adopt a manufacturing method in which each is applied.

実施形態4の発光装置において、透明板1として、実施形態2または実施形態3の透明板1を用いることも可能である。   In the light emitting device of Embodiment 4, the transparent plate 1 of Embodiment 2 or Embodiment 3 can be used as the transparent plate 1.

上述の実施形態1〜4において、透明板1の代わりに蛍光体セラミックや蛍光体ガラス等の波長変換機能を備えた板状部材を用いることも可能である。この場合も、実施形態1〜4のように表面に凹凸加工の領域1aを設けることにより色度ムラおよび輝度ムラを防止できる。縁1bや這い上がり防止剤塗布領域3を設けることにより、未硬化の波長変換樹脂や未硬化の拡散防止部材が波長変換機能を備えた板状部材の上面に這い上がる現象を防止できる。なお、波長変換機能を備えた板状部材を用いる場合には、波長変換層の代わりに透明材料層を用いることも可能である。   In Embodiments 1 to 4 described above, a plate-like member having a wavelength conversion function such as phosphor ceramic or phosphor glass can be used instead of the transparent plate 1. Also in this case, the unevenness of chromaticity and the unevenness of luminance can be prevented by providing the surface 1a of the unevenness processing on the surface as in the first to fourth embodiments. By providing the edge 1b and the scooping-up agent application region 3, it is possible to prevent the uncured wavelength conversion resin or the uncured diffusion preventing member from scooping up on the upper surface of the plate-like member having the wavelength conversion function. In addition, when using the plate-shaped member provided with the wavelength conversion function, it is also possible to use a transparent material layer instead of the wavelength conversion layer.

上述の実施形態1〜4においては透明板1の上面にのみ凹凸加工の形成された領域1aを設けたが、透明板1の下面にも設けることが可能である。   In the above-described first to fourth embodiments, the region 1 a where the unevenness is formed is provided only on the upper surface of the transparent plate 1, but it can also be provided on the lower surface of the transparent plate 1.

実施形態1〜4において透明板1の領域1aの凹凸形状は、ランダムな粗面であっても、例えば回折格子等の特定の凹凸を繰り返した形状であってもよい。   In the first to fourth embodiments, the uneven shape of the region 1a of the transparent plate 1 may be a random rough surface or a shape in which specific unevenness such as a diffraction grating is repeated.

本発明の発光装置は、一般照明や自動車用灯具等の、波長変換層を備えた発光装置全般として利用することができる。   The light-emitting device of the present invention can be used as a general light-emitting device having a wavelength conversion layer, such as general lighting or an automotive lamp.

1…透明板、1a…凹凸加工領域、1b…平滑な縁、2…凹凸加工を施していない素子直上領域、3…這い上がり防止剤塗布領域、10…実装基板、11…発光素子、12…バンプ、15…拡散反射部材、16…リング、24…波長変換層、130…傾斜面 DESCRIPTION OF SYMBOLS 1 ... Transparent board, 1a ... Concave processing area | region, 1b ... Smooth edge, 2 ... Area | region immediately above the element which has not performed uneven | corrugated processing, 3 ... Scooping agent application area | region, 10 ... Mounting board, 11 ... Light emitting element, 12 ... Bump, 15 ... Diffuse reflection member, 16 ... Ring, 24 ... Wavelength conversion layer, 130 ... Inclined surface

Claims (4)

基板と、該基板上に実装された1以上の発光素子と、前記発光素子上に配置された樹脂層と、前記樹脂層の上に搭載された板状部材と、前記樹脂層および板状部材の周囲に充填された反射性樹脂部材とを有し、
前記板状部材は、上面の周縁に設けられた平滑な縁領域と、前記縁領域に囲まれた凹凸加工領域とを備え、
前記反射性樹脂部材は、前記板状部材の側面全体を覆っていることを特徴とする発光装置。
A substrate, one or more light-emitting elements mounted on the substrate, a resin layer disposed on the light-emitting element, a plate-like member mounted on the resin layer, and the resin layer and the plate-like member And a reflective resin member filled around
The plate-like member includes a smooth edge region provided on the periphery of the upper surface, and an uneven processing region surrounded by the edge region,
The light-emitting device, wherein the reflective resin member covers the entire side surface of the plate-like member.
基板と、該基板上に実装された1以上の発光素子と、前記発光素子上に配置された樹脂層と、前記樹脂層の上に搭載された板状部材と、前記樹脂層および板状部材の周囲に充填された反射性樹脂部材とを有し、
前記板状部材は、上面の周縁に設けられた、樹脂這い上がり防止領域と、前記樹脂這い上がり防止領域に囲まれた凹凸加工領域とを備え、
前記反射性樹脂部材は、前記板状部材の側面全体を覆っており、
前記樹脂這い上がり防止領域には、未硬化の樹脂をはじく材料の層が配置されていることを特徴とする発光装置。
A substrate, one or more light-emitting elements mounted on the substrate, a resin layer disposed on the light-emitting element, a plate-like member mounted on the resin layer, and the resin layer and the plate-like member And a reflective resin member filled around
The plate-like member includes a resin scooping prevention region provided on the periphery of the upper surface, and an uneven processing region surrounded by the resin scooping prevention region,
The reflective resin member covers the entire side surface of the plate member,
A light emitting device, wherein a layer of a material that repels an uncured resin is disposed in the resin creeping prevention region.
請求項1または2に記載の発光装置において、前記板状部材の上面には、前記発光素子の直上部分に、平滑な直上領域がさらに設けられていることを特徴とする発光装置。   3. The light emitting device according to claim 1, wherein a smooth upper region is further provided on the upper surface of the plate-like member at a portion immediately above the light emitting element. 基板上に実装された発光素子の上面を未硬化の樹脂で覆い、その上に板状部材を配置する第1工程と、
前記樹脂および板状部材の側面の周囲に、未硬化の状態で流動性のある反射性樹脂材料を充填することにより、前記板状部材の側面全体を前記反射性樹脂材料で覆う第2工程とを有し、
前記板状部材として、上面の周縁に設けられた樹脂這い上がり防止領域と、前記樹脂這い上がり防止領域に囲まれた凹凸加工領域とを備えるものを用いることを特徴とする発光装置の製造方法。
A first step of covering the upper surface of the light emitting element mounted on the substrate with an uncured resin and disposing a plate member thereon;
A second step of covering the entire side surface of the plate-shaped member with the reflective resin material by filling the resin and the side surface of the plate-shaped member with a fluid reflective resin material in an uncured state; Have
A method of manufacturing a light-emitting device, wherein the plate-like member includes a resin scooping prevention region provided on a peripheral edge of an upper surface and a concavo-convex processing region surrounded by the resin scooping prevention region.
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