JP5451555B2 - DAC amplifier diagnostic apparatus, charged particle beam drawing apparatus, and DAC amplifier diagnostic method - Google Patents

Description

  The present invention relates to a DAC amplifier diagnostic method / diagnosis device for diagnosing the output state of a DAC amplifier that deflects a charged particle beam with a voltage based on the output of a DAC (digital / analog converter) amplifier and irradiates a sample. The present invention relates to a charged particle beam drawing apparatus and a DAC amplifier diagnosis method for diagnosing whether a predetermined voltage is generated from a DAC amplifier.

  The conventional charged particle beam drawing apparatus processes and diagnoses the electrical characteristics of the DAC amplifier itself, and confirms that a predetermined output for reliably deflecting the charged particle beam is obtained, so that an accurate drawing result can be obtained. I have to. (For example, Patent Document 1)

JP 2007-271919 A

  In the above-mentioned Patent Document 1, a counter electrode addition type technique shown in FIG. 8 is used as a method for diagnosing a DAC amplifier on the field. This technology branches a DAC amplifier and diagnoses the amplifier using a DAC amplifier tester. However, as the speed and accuracy of the DAC amplifier increases, the output waveform to the deflector is also used for counter electrode addition. Detrimental effects such as distortion caused by the stray capacitance Cf of the path branched into the signal occur.

  Therefore, as shown in FIG. 9, the deflector side and the tester side are inserted near the branch point by a relay or buffer amplifier, and the output transmission path from the stray capacitance Cf to the deflector is separated to reduce distortion. ing.

  However, as the speed of the DAC amplifier is increased, distortion due to the capacitor and coil components added to the output transmission path by the relay and buffer amplifier tends to increase. Further, in order to increase the speed, it is necessary to shorten the transmission path between the deflector and the DAC amplifier, and the DAC amplifier is required to be greatly downsized. For this reason, it is difficult to insert a relay or a buffer amplifier.

  Furthermore, in the case of FIG. 9, diagnosis of the signal path from the DAC amplifier to the deflector and the deflector itself is impossible and impossible. In the future, there is a problem that the influence of individual differences and malfunctions of the signal paths and deflectors on the deflection accuracy and setting time will increase as the speed increases in the future.

  An object of the present invention is to provide a DAC amplifier diagnosis method capable of reliably diagnosing a DAC amplifier even when the DAC amplifier is further increased in speed, a charged particle beam drawing apparatus equipped with the diagnosis method, and a predetermined voltage generated from the DAC amplifier. It is an object of the present invention to provide a DAC amplifier diagnosis method for diagnosing whether or not the signal is being processed.

  In order to solve the above-described problem, a DAC amplifier diagnostic apparatus according to the present invention outputs a charged particle beam that passes between at least one pair of electrodes arranged opposite to each other and an analog voltage based on the first digital voltage information, A first DAC amplifier supplied to one of the electrodes, a second DAC amplifier supplied to the other electrode based on second digital voltage information, and position detection for measuring the irradiation position of the electron beam And means for matching the digital voltage information of the first and second DAC amplifiers when diagnosing the state of the first and second DAC amplifiers.

  The charged particle beam drawing apparatus according to the present invention includes a plurality of DAC amplifiers that input digital signals, convert them to analog values, amplify the analog values, and output the analog values, and a plurality of analog values output by the plurality of DAC amplifiers. A deflector for deflecting a charged particle beam by inputting at least one analog value of the above and a DAC amplifier diagnosis mechanism according to claim 1 for diagnosing the plurality of DAC amplifier abnormalities. To do.

The DAC amplifier diagnosis method of the present invention is a method of diagnosing at least one pair of DAC amplifiers among a plurality of DAC amplifiers that output an analog signal to a deflector that deflects a charged particle beam,
Irradiating the beam position detecting means with a charged particle beam;
Matching digital voltage information to a pair of DAC amplifiers;
Detecting a change in the charged particle beam irradiation position;
It is provided with.

  According to the present invention, even when the speed of the DAC amplifier is increased, it is possible to provide a drawing apparatus capable of reliably diagnosing the DAC amplifier without affecting the drawing accuracy and the reduction in size and speed of the DAC amplifier. In addition, the DAC amplifier system including the signal path of the drawing apparatus and the deflector itself can be diagnosed.

It is a conceptual block diagram for demonstrating one Embodiment regarding the drawing apparatus of this invention. It is explanatory drawing of the principal part of FIG. It is explanatory drawing for demonstrating an example for diagnosing whether an electron beam exists in a reference position. It is explanatory drawing for demonstrating the principal part of FIG. It is explanatory drawing for demonstrating the external appearance structure of the electron detector of FIG. It is a system configuration figure for explaining one embodiment about a household appliance particle beam drawing device of this invention. It is explanatory drawing for demonstrating the other example for diagnosing whether an electron beam exists in a reference position. It is explanatory drawing for demonstrating the example of a diagnosis of the conventional DAC amplifier. It is explanatory drawing for demonstrating the other diagnostic example of the conventional DAC amplifier.

  Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings.

  FIG. 1 and FIG. 2 are diagrams for explaining an embodiment of the drawing apparatus according to the present invention. FIG. 1 is a conceptual configuration diagram, and FIG.

  Hereinafter, diagnosis of the DAC amplifier of the apparatus will be described by taking a variable shaped electron beam drawing apparatus as one of charged particle beam drawing apparatuses as an example.

  In FIG. 1, reference numeral 11 denotes an electron gun. An electron beam (EB) emitted from the electron gun 11 and accelerated at 50 kV, for example, is subjected to electron optical focusing and deflection, and is finally rectangular with an aperture 12. To be molded. The electron beam that has passed through the aperture 12 is irradiated to the electron detector 16 for detecting the amount of the electron beam mounted on the stage 15 by the objective lens 13 and the positioning deflector 14. The deflector 14 includes a pair of electrodes 14a and 14b arranged in the X-axis direction, and is disposed so as to face each other with an electron beam sandwiched between the electrodes 14a and 14b.

  An aperture 17 that covers a half of the electron detector 16 is disposed at a position of the electron detector 16 facing the electron gun 11 as shown in FIG. The stage 15 on which the electron detector is mounted can be positioned at an arbitrary position by a measuring unit (not shown) for measuring the position of the stage and a stage driving mechanism (not shown). As shown in (a), the electron beam is positioned at a position on the aperture 17 at the center of the electron detector 16.

  Reference numeral 18 denotes a control unit for controlling the deflector 14. A memory 19 is connected to the control unit 18, and data for diagnosis is stored in the memory 19. Reference numerals 20 and 21 denote first and second DAC amplifiers which are connected to the deflection electrodes 14a and 14b and deflect the electron beam. The DAC amplifier 20 includes a DAC 201 and an amplifier 202. In the normal drawing operation mode, for example, negative digital voltage information is supplied from the control unit 18 to the input of the DAC 201, and a negative voltage is output from the output of the amplifier 202.

  The DAC amplifier 21 includes a DAC 211 and an amplifier 212. The DAC amplifier 20 is composed of a DAC and an amplifier having the same standard. Digital voltage information having the same absolute value as that of the normal DAC 201 is supplied from the control unit 18 to the input of the DAC 211, and a positive voltage is output from the output of the amplifier 212. The amplifiers 202 and 212 are connected to the deflection electrodes 14a and 14b, respectively, and the electron beam is deflected by the electric field generated between the electrodes, and is positioned at a predetermined position for drawing.

  The aperture 17 and the electron detector 16 detect whether or not the electron beam is at the reference position by comparing the electron detection amount at the initial reference position stored in the memory 19 with respect to whether or not the electron beam has deviated from the reference position. The position detecting means is configured.

  S connected to the control unit 18 is a diagnostic switch operated by the DAC amplifiers 20 and 21 for diagnosing whether or not the output voltage of the set value is output, and corresponds to a start command of the diagnostic program. The diagnostic switch S can be operated when drawing is not being executed, and is not operated during drawing. When the diagnostic switch S is operated, the control unit 18 instructs the DAC amplifiers 20 and 21 to have the same digital voltage having the same absolute value and polarity.

  Here, diagnosis of whether the output has the same characteristic with respect to the same input instruction of the DAC amplifiers 20 and 21 in FIG. 1 will be described with reference to FIG.

  When the diagnosis switch S is operated, the output of the DAC amplifier 20 and the output voltage of the DAC amplifier 21 are set to the same value and the same polarity based on the digital voltage information from the control unit 18, and are generated between the electrodes 14a and 14b. The deflection voltage is 0, and the electron beam is not deflected. In this state, the stage drive system causes the electron beam that has passed through the deflector 14 to irradiate with the same area as the light receiving surface of the electron detector 16 and the aperture 17 as shown in FIG. Positioning is performed, and the amount detected by the electronic detector is stored in the memory 19 as an initial reference value.

  Next, when the digital voltage information is changed to a different value from the control unit 18 to the DAC amplifiers 20 and 21, if the DAC amplifier is normal, the deflection voltage between the deflection powers is always 0, and the position of the electron beam Does not change. On the other hand, when the DAC amplifier is abnormal and the voltage output from the DAC amplifier 20 is lower than the voltage output from the DAC amplifier 21, the voltage applied to the electrode 14a is low. As shown in FIG. 2B, the electron beam is irradiated in a biased manner toward the electrode 14b. The detection result of the electron detector 16 is supplied to the control unit 18. The control unit 18 compares the electronic detection amount initial value data stored in the memory 19 so that the DAC amplifiers 20 and 21 can determine normality / abnormality.

  More specifically, as an initial state, the electron beam that has passed through the deflector 14 with the digital indication value to the DAC amplifiers 20 and 21 set to 0 V is transmitted from the electron detector 16 as shown in FIG. The stage is positioned by the stage driving system so that the light receiving surface and the aperture 17 are irradiated with substantially the same area, and the detection amount by the electron detector 16 is stored in the memory 19 as an initial reference value. The amount of detection by the electron detector 16 is such that an electron beam blanking mechanism (not shown) is used to irradiate the electron detector 16 with an electron beam in order to avoid damage caused by irradiation energy such as an electron beam on the electron detector / aperture. No.), the measured value at the electron detector at the irradiation / shot at a predetermined time is used.

  Next, the voltage indication values to the DAC amplifiers 20 and 21 are changed so as to cover all possible values. The electron beam irradiation / shot is performed at a predetermined time in synchronization with the voltage instruction, the amount of electrons is measured by the electron detector 16, and compared with the initial reference value in the memory 19. Even if the voltage instruction value changes, if the DAC amplifier is normal, the deflection voltage is always 0, and the position of the electron beam does not change. On the other hand, if there is an abnormality in the DAC amplifier and the output voltages of the DAC amplifiers 20 and 21 differ from the predetermined voltage instruction value, the deflection voltage of the deflector 14 becomes zero, the electron beam irradiation position moves, and the electron detector The amount of electrons measured in (1) changes, an abnormal state is measured by comparison with the initial value, and the DAC amplifiers 20 and 21 are diagnosed.

  In the above description, the deflection by a pair of electrodes has been described for the sake of simplicity. In practice, however, the deflection is arbitrarily performed in the XY direction using two to four pairs of electrodes. In this case, the same diagnosis is performed for the DAC amplifier whose output is connected to each pair of electrodes.

  In this case, an aperture / electron detector having a positional relationship parallel to each deflection electrode is prepared.

  3 to 5, in order to diagnose whether the DAC amplifiers 20 and 21 are normal, the same plural digital voltage instructions are given to the DAC amplifiers 20 and 21 to determine whether or not the irradiation position of the electron beam is normal. It is for demonstrating the other example of the means to do.

  This discriminating means is obtained by arranging the mark 31 shown in FIG. 3 at the position where the electron detector 16 of FIG. 1 is installed. As shown in FIG. 4, the mark 31 includes a cross-shaped portion 311 having a high reflectance and a portion 312 having a low reflectance. As shown in FIG. 3, the electron detector 33 is installed at the lowermost part of the electron barrel 32 and detects reflected electrons from a mark or the like. As shown in FIG. 5 as viewed from the stage side, the electron detector 33 is arranged in a donut shape around the hole through which the electron beam (EB) passes.

  The mark 31 and the electron detector 33 are for detecting whether the electron beam is at the reference position by comparing the electron detection amount initial value stored in the memory 19 in advance based on the amount of the electron beam reflected by the mark 31. The position detection means is configured.

  In FIG. 3, if the output voltages of the DAC amplifiers 20 and 21 are the same at the time of diagnosis, the electron beam is irradiated in a balanced manner over the same area of the high reflectance portion 311 and the low reflectance portion 312 as shown in FIG. The electron beam reflected by the mark 33 is detected by the electron detector 33. The amount of reflected electrons from the mark 33 changes depending on the position of the beam and the area where the beam is applied to the mark, so that the amount of reflected electrons changes and the beam position can be detected.

  When the DAC amplifier is normal, even if the digital voltage information is changed, the deflection voltage is 0 and the beam position does not change. When the DAC amplifier is abnormal and shows a different output voltage with respect to the digital voltage instruction value, the beam position moves, and the abnormality can be detected.

  FIG. 6 is a configuration diagram for explaining another example of the discriminating means. This discrimination means is a case where a semiconductor position detector capable of measuring the beam irradiation position in two dimensions is used as the electron detector of FIG.

  That is, the semiconductor position detector 62 is provided with four output terminals 62Xa, 62Xb, 62Ya, and 62Yb in a direction orthogonal to each other, 62Xa and 62Xb form a pair, and an output thereof is supplied to the X direction via the amplifiers 63Xa and 63Xb, respectively. It is sent to the position detection circuit 64X. The output terminals 62Ya and 62Yb form a pair, and the output is sent to the Y-direction position detection circuit 64Y via the amplifiers 63Ya and 63Yb, respectively.

  In the semiconductor position detector 62, the relative output signals from the output terminals 62Xa and 62Xb correspond to the positions of the incident electron beams, and the signals corresponding to the coordinate positions are obtained by comparing and calculating the outputs from the output terminals 62Xa and 62Xb. Can be obtained. That is, the coordinate signal in the X direction is obtained from the position detection circuit 64X, and the coordinate signal in the Y direction is obtained from the position detection circuit 64Y.

  As in the previous embodiment, as an initial state, the stage is moved with the digital indication value = 0V for the DAC amplifier 14, the electron beam irradiation position is aligned with the approximate center of the semiconductor position detector 62, and the electron beam By irradiating, the XY position is stored in the memory as an initial value. Next, it is possible to diagnose abnormality / normality of the DAC amplifiers 20 and 21 by sequentially changing the voltage instruction value, synchronizing / synchronizing with the voltage instruction value, and comparing the beam position with the initial value. If the beam position varies, it can be determined that one of the DAC amplifiers 20 and 21 is abnormal.

  In this method, for example, eight electrodes can be simultaneously evaluated. The initial value of the voltage instruction value to all 8 DAC amplifiers is set to 0V, the electron beam irradiation position is aligned with the semiconductor position detector, and the electron beam irradiation is performed, so that the XY position is stored in the memory as the initial value. To do. By sequentially changing the voltage instruction value to the DAC of all eight stations with the same value including the polarity of the counter voltage value, synchronizing with it, the electron beam is irradiated / shot, and the beam position is compared with the initial value. Diagnosis of abnormality / normality of DAC amplifier. If normal, the deflection voltage is always 0 and the electron beam position does not change, but if one amplifier is abnormal and an abnormal output value is obtained with respect to the predetermined instruction voltage, the predetermined instruction voltage Thus, the deflection voltage of the specific station is not zero, and the beam irradiation position changes in the direction of the abnormal amplifier pair. By measuring the deflection position of the electron beam position, abnormality diagnosis is possible including which pair of DAC amplifiers is abnormal.

  FIG. 7 is a system configuration diagram for explaining an embodiment relating to the charged particle beam drawing apparatus of the present invention.

  In FIG. 7, an electron beam variable shaping type drawing apparatus, which is an example of a charged particle beam drawing apparatus, includes an electron column 71, a drawing chamber 72, an XY stage 73, an electron gun 74, and a focusing lens 75 that constitute a drawing forming unit 1000. , Blanking (BLK) deflector 76, BLK aperture 77, first shaping aperture 78, projection lens 79, shaping deflector 80, second shaping aperture 81, objective lens 82, objective deflector 83, electron detector 16 , A diagnostic aperture 17, a mirror 84, and a sample 85.

  As the control unit 2000, a control computer 91, a memory 92, a drawing data generation circuit 93, a BLK deflection control circuit 94, a BLK amplifier 95, a shaping deflection control circuit 99, a distribution circuit 100, DAC amplifiers 1011 and 1012, a position deflection control circuit 104, A distribution circuit 105, DAC amplifiers 1061 and 1062, a laser length meter 109, and a drive circuit 110 are provided.

  A memory 92, a drawing data generation circuit 93, a laser length meter 109, and a drive circuit 110 are connected to the control computer 91 via a bus (not shown). The drawing data generation circuit 93 and the drive circuit 110 are controlled by a control signal output from the control computer 91. Position information from the laser length meter 109 that has measured the position of the XY stage 73 using the mirror 84 is transmitted to the control computer 91. Further, input data or output data calculated by the control computer 91 is stored in the memory 92.

  A BLK deflection control circuit 94, a shaping deflection control circuit 99, and a position deflection control circuit 104 are connected to a drawing data generation circuit 93 that processes pattern data and performs shot division and the like via a bus (not shown). The BLK deflection control circuit 94, the shaping deflection control circuit 99, and the position deflection control circuit 104 are controlled by data from the drawing data generation circuit 93 so as to perform deflection along each shot processed by the drawing data generation circuit 93. .

  The BLK deflection control circuit 94 controls blanking ON (non-drawing period) and blanking OFF (drawing period). The BLK deflection control circuit 94 acquires blanking ON and blanking OFF time width information included in the drawing data received from the drawing data generation circuit 93, generates a timing pulse signal from the time width information, and generates the timing pulse signal. A pulse signal is transmitted to the BLK amplifier 95. The BLK amplifier 95 amplifies the received timing pulse signal to an amplitude that can be driven by the BLK deflector 76 and transmits the amplified signal to the BLK deflector 76.

  A distribution circuit 100 is connected to a shaping deflection control circuit 99 that controls the beam shape and size via a bus (not shown), and control signals from the shaping deflection control circuit 99 are converted into a (+) signal and a (−) signal. Each is converted, and one is distributed to the DAC amplifier 1011 and the other is distributed to the DAC amplifier 1012 while being synchronized. FIG. 7 shows an example in which the (+) signal is distributed to the DAC amplifier 1011 and the (−) signal is distributed to the DAC amplifier 1012. In addition, the output side of the DAC amplifier 1011 is connected to one electrode forming a pair of the shaping deflector 80. The analog value that has been converted from digital to analog in the DAC amplifier 1011 and amplified is applied as a beam deflection voltage to one of the electrodes of the shaping deflector 80.

  On the other hand, the output side of the DAC amplifier 1012 is connected to the other electrode forming a pair of the shaping deflector 80. Then, the analog value that has been converted from digital to analog in the DAC amplifier 1012 and amplified is applied to the other electrode of the shaping deflector 80 as a beam deflection voltage.

  A distribution circuit 105 is connected to a position deflection control circuit 104 that controls the position of the beam via a bus (not shown), and control signals from the position deflection control circuit 104 are converted into a (+) signal and a (−) signal, respectively. One of the signals is converted and distributed to the DAC amplifier 1061 and the other to the DAC amplifier 1062 in synchronization. FIG. 7 shows an example in which the (+) signal is distributed to the DAC amplifier 1061 and the (−) signal is distributed to the DAC amplifier 1062. Further, the output side of the DAC amplifier 1061 is connected to one electrode forming a pair of the objective deflector 83. The analog value that has been converted from digital to analog in the DAC amplifier 1061 and amplified is applied as a beam deflection voltage to one electrode of the objective deflector 83 as a pair.

  On the other hand, the output side of the DAC amplifier 1062 is connected to the other electrode forming a pair of the objective deflector 83. Then, the analog value that has been digital-to-analog converted and amplified in the DAC amplifier 1062 is applied to the other electrode of the objective deflector 83 as a beam deflection voltage.

  In FIG. 7, description of components other than those necessary for describing this embodiment is omitted. It goes without saying that the drawing forming unit 1000 usually includes other necessary configurations. An electron beam as an example of a charged particle beam emitted from the electron gun 74 illuminates the entire first shaping aperture 78 having a rectangular hole, for example, a rectangular hole, by the focusing lens 75. Here, the electron beam is first shaped into a rectangle, for example, a square. The electron beam of the first aperture image that has passed through the first shaping aperture 78 is projected onto the second shaping aperture 81 by the projection lens 79. The position of the first aperture image on the second shaping aperture 81 is deflection-controlled by the electrostatic shaping deflector 80, and the beam shape and dimensions can be changed.

  The electron beam of the second aperture image that has passed through the second shaping aperture 81 is focused by the objective lens 82, deflected by the electrostatic objective deflector 83, and follows the XY stage 73 that moves continuously. The irradiation position can be determined. And it irradiates to the desired position of the sample 85 on the XY stage 73 arrange | positioned so that a movement is possible. For example, when the sample 85 is a mask for manufacturing a semiconductor device on a wafer, a light shielding film such as a chromium (Cr) film and a resist film are formed on the glass substrate in advance. deep. Then, the resist film is exposed by irradiating the resist film with an electron beam using the drawing forming unit 1000, and a resist pattern is drawn through development, washing, and the like.

  Subsequently, using the resist pattern as a mask, the lower light shielding film and the like are etched to form a mask pattern. That is, the light shielding film is patterned by drawing with an electron beam deflected by various deflectors. In this way, a mask used for manufacturing a semiconductor device on a wafer is manufactured. As described above, the electron beam emitted from the electron gun 74 is applied to a desired position of the sample 85 on the XY stage 73 that is movably disposed.

  Here, in order to prevent the electron beam from being irradiated onto the sample 85 more than necessary when the electron beam on the sample 85 has reached an irradiation time in which a desired irradiation amount is incident on the sample 85, an electrostatic BLK is used. The deflector 76 deflects the electron beam and the BLK aperture 77 cuts the electron beam so that the electron beam does not reach the surface of the sample 85. In FIG. 8, the trajectory of the electron beam when blanking is indicated by a dotted line. When the beam is ON (blanking OFF), the electron beam emitted from the electron gun 74 travels on the trajectory indicated by the solid line in FIG. On the other hand, in the case of beam OFF (blanking ON), the electron beam emitted from the electron gun 74 travels on the trajectory indicated by the dotted line in FIG. In addition, the inside of the electron column 71 and the drawing chamber 72 in which the XY stage 73 is disposed are evacuated by a vacuum pump (not shown) to form a vacuum atmosphere in which the pressure is lower than the atmospheric pressure.

  By the way, in order to form the drawing as designed by the electron beam on the sample 85, all the DAC amplifiers function normally, that is, it is necessary to generate a correct analog output voltage in response to the digital voltage instruction. There is. Therefore, diagnosis of the DAC amplifier is important.

  Therefore, when the diagnosis switch S1 is operated for diagnosis of the DAC amplifier, diagnosis of the DAC amplifiers 1061 and 1062 of the objective deflector 83 is started. First, the digital voltage instruction value to all the deflecting DAC amplifiers is set to 0 V, and the electron beam irradiation position and the electron detector 16 are aligned in this state. The electron quantity of the electron beam irradiated / shot for a predetermined time is measured by the electron detector 16 and stored as an initial value.

  Next, the voltage setting values of the DAC amplifiers 1061 and 1062 are changed and synchronized, and the electron beam is irradiated for a predetermined time, and the amount of electrons is measured by the electron detector 16 which is a part of the beam position detecting means. By measuring the position variation, the DAC amplifiers 1061 and 1062 are diagnosed as abnormal or normal.

  In FIG. 7, the DACs 1061 and 1062 connected to the deflector 83 located at 0 degrees, for example, have been described for the sake of simplicity. Actually, in order to deflect the electron beam two-dimensionally with high accuracy, a pair of deflectors are installed at a plurality of locations such as 90 degrees, 45 degrees, 135 degrees, and the like at different angles at the same position. Even in this case, the DAC amplifier connected in the same manner as the deflector 83 performs the diagnosis in the same procedure, and the diagnosis for all pairs is performed.

  The shape of the irradiation beam at this time may be an electron beam shaped into a predetermined shape by the second shaping aperture 77 by applying a predetermined deflection voltage to the shaping deflection electrode by the shaping deflection amplifier. A rectangular beam of the first shaping aperture image at the second shaping aperture position may be used by setting the deflection voltage to 0 V, passing the electron beam through the center of the second shaping aperture.

  When the diagnosis switch S2 is operated, diagnosis of the DAC amplifiers 1011 and 1012 of the shaping deflector 80 is started. First, the digital voltage instruction value to all the forming DAC amplifiers is set to 0 V, and the electron beam irradiation position and the electron detector are aligned in that state. The electron quantity of the electron beam irradiated and shot in a predetermined time is measured by an electron detector and stored as an initial value. The electron beam image irradiated to the position detection means in this state corresponds to the first shaping aperture image at the second shaping aperture position.

  Next, the voltage setting values of the pair of deflection DAC amplifiers are sequentially changed and synchronized, and the electron beam is irradiated for a predetermined time, and the amount of electrons is measured by the electron detector that is a part of the beam position detecting means. Then, by measuring the position fluctuation, the abnormality / normality of the DAC amplifier is diagnosed. Perform another pair in the same procedure, and diagnose all pairs. If there is an abnormality in the shaping DAC amplifier, the first shaping aperture image position at the second shaping aperture position moves, and the electron beam irradiation position, which is the projection image, also moves. Can be diagnosed.

  Although several embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

EB Electron beam 11, 74 Electron gun 14 Deflectors 14 a, 14 b Electrode 15 Stage 16 Electron detector 17 Diagnosis aperture 18 Control unit 19, 92 Memory 20, 21 DAC amplifier SW 1, SW switch INV Inverter 31 Mark 31
311 High reflectivity portion 312 Low reflectivity portion 33 Photodiode 62 Semiconductor position detector 1000 Drawing forming unit 71 Electron barrel 72 Drawing chamber 73 XY stage 76 Blanking deflector 80 Molding deflector 83 Objective deflector 85 Sample 2000 Control unit 91 Control computer 93 Drawing data generation circuit 94 BLK deflection control circuit 95 BLK amplifier 1011, 1012, 1061, 1062 DAC amplifier 99 Molding deflection control circuit 104 Position deflection control circuit 110 Drive circuit

Claims (5)

A charged particle beam that passes between at least one pair of opposed electrodes;
A first DAC amplifier that outputs an analog voltage based on the first digital voltage information and supplies the analog voltage to one of the electrodes;
A second DAC amplifier for supplying to the other electrode based on second digital voltage information;
A position detecting means for measuring the irradiation position of the charged particle beam,
A DAC amplifier diagnosis apparatus characterized in that the digital voltage information of the first and second DAC amplifiers is matched in the state diagnosis of the first and second DAC amplifiers.   2. The DAC amplifier according to claim 1, wherein the position detecting unit irradiates the charged particle beam directly or indirectly to the position detecting unit, and performs detection based on comparison with stored position information. Diagnostic device.   3. The first and second DAC amplifiers are diagnosed as normal when there is no change in the beam irradiation position at the time of state diagnosis of the first and second DAC amplifiers. DAC amplifier diagnostic device. A plurality of DAC amplifiers for inputting a digital signal, converting the analog signal into an analog value, amplifying the analog value, and outputting the amplified analog value;
A deflector for deflecting a charged particle beam by inputting at least one analog value of a plurality of analog values output by the plurality of DAC amplifiers;
A charged particle beam drawing apparatus comprising: the DAC amplifier diagnosis apparatus according to claim 1, which diagnoses whether the plurality of DAC amplifiers are normal. A method of diagnosing at least one pair of DAC amplifiers among a plurality of DAC amplifiers that output an analog signal to a deflector that deflects a charged particle beam,
Irradiating the beam position detecting means with a charged particle beam;
Matching digital voltage information to a pair of DAC amplifiers;
Detecting a change in the charged particle beam irradiation position;
A DAC amplifier diagnostic method comprising:

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