JP5446242B2 - Manufacturing method of color filter - Google Patents

Description

  The present invention relates to a method for producing a color filter used in a liquid crystal display device, and in particular, uses a developing device that does not peel off even when the width of a black matrix becomes narrow and that performs processing while maintaining an inclined state. However, the present invention relates to a method for manufacturing a color filter in which the black matrix does not peel off.

  In a display device such as a liquid crystal display device, it is a useful means to use a color filter for purposes such as color display, reflectance reduction, contrast improvement, and spectral characteristic control. In many cases, the color filter used in this display device is formed and used as a pixel. As a method for forming a pixel of a color filter used in a display device, a printing method, a photolithography method, and the like can be given as methods that have been practically used.

  FIG. 1 is an enlarged plan view illustrating an example of a pixel of a color filter used in a liquid crystal display device. 2 is a cross-sectional view taken along line AA of the pixel of the color filter shown in FIG. As shown in FIGS. 1 and 2, the color filter used in the liquid crystal display device has a black matrix (2), a colored pixel (3), and a transparent conductive film (4) sequentially on a glass substrate (1). It is formed.

  As a method for producing a color filter used in the liquid crystal display device, first, a black matrix is formed on a glass substrate (1), and then a black matrix pattern on the glass substrate on which the black matrix (2) is formed. A method of forming a colored pixel (3) in alignment with the transparent conductive film (4) and further forming a transparent conductive film (4) is widely used.

  The black matrix (2) has a light shielding property, determines the positions of the colored pixels of the color filter, has a uniform size, and shields undesirable light when used in a display device. The image has a function of making the image uniform and uniform with no unevenness. The black matrix (2) is formed by, for example, providing a black photoresist coating film on the glass substrate (1), and forming a black matrix by exposing and developing the coating film through a photomask. Lithography is used.

  The colored pixel (3) has, for example, a red, green, and blue filter function, and is a negative type in which a pigment such as a pigment is dispersed on a glass substrate (1) on which a black matrix is formed. A photolithographic method is employed in which a colored photoresist coating film is provided, and colored pixels are formed by exposing and developing the coated film through a photomask. The transparent conductive film (4) is formed by forming a transparent conductive film on a glass substrate on which colored pixels are formed by sputtering using, for example, ITO (Indium Tin Oxide).

  FIG. 2 is a plan view showing a stage where the black matrix (2) is formed on the glass substrate (1) when the color filter shown in FIG. 1 is manufactured. As shown in FIG. 2, the width (W) of the black matrix (2) formed on the glass substrate (1) has a pixel size ((a) × (b)) of about 100 × 300 μm. It is about 12 μm (*).

For example, the width of about 12 μm (*) becomes narrow as the pixel is miniaturized, and a pixel that is miniaturized to a size of about 50 × 150 μm becomes a black matrix having a narrow width of about 5 μm (**). .
At this time, when the width of the black matrix is narrowed, there is a problem that the black matrix (2) is easily peeled off from the glass substrate (1) as the width is narrowed.

  FIG. 3 is an enlarged cross-sectional view of the black matrix (2) shown in FIG. 2 taken along line BB after development. 3A is a cross-sectional view when the black matrix (2-1) has a width (W1) of about 12 μm (*), and FIG. 3B shows the black matrix (2-2). It is sectional drawing in the case of having the width (W2) of about 5 μm (**).

  As shown in FIG. 3A, in the exposure through the photomask to the black photoresist coating film, the exposure light (L) is gradually attenuated from the upper part (d) to the lower part (e) of the coating film. Therefore, for example, in the case of a negative black photoresist, the degree of curing due to photopolymerization is reduced in the lower part (e), and the side part of the coating film is developed in the development, and the side surface having the inclination (θ1) is developed. Become. After the development, the formed black matrix (2-1) has an inverted trapezoidal shape having an inclination (θ1) on its side surface.

  As shown by the width (W2) in FIG. 3B, when the width of the black matrix (2-2) becomes narrower, it is originally narrower than the width (W1) of the black matrix (2-1) shown in FIG. In addition to (W1> W2), after development, the width (c2) where the black matrix (2-2) is in close contact with the glass substrate (1) becomes narrow (c1> W2, c2), and the black matrix (2- 2) becomes easy to peel off from the glass substrate (1).

  Since the black matrix is post-baked after development, the inverted trapezoidal shape is deformed in the semicircular direction by the heat flow at this time. However, this tendency to peel off remains.

  As a countermeasure against such a problem that the black matrix is easily reduced due to the narrow width of the black matrix, for example, before applying a black photoresist on the glass substrate, a UV cleaning process performed on the glass substrate is performed. There is a way to weaken. Certainly, the adhesion to the glass substrate is reinforced by this method. However, if this method is excessive, there is a concern about the deterioration of foreign matter and coating characteristics, and there is a limit to the enhancement of adhesion by this method.

  As another countermeasure, for example, there is a method of strengthening a pre-bake process performed after applying a black photoresist onto a glass substrate. Certainly, the adhesion to the glass substrate is reinforced by this method. However, if this method becomes excessive, defects such as residue and color residue occur, and there is a limit to the enhancement of adhesion by this method.

On the other hand, in terms of manufacturing apparatuses for color filters used in liquid crystal display devices, development devices that perform wet processing by horizontally transporting a glass substrate in a single sheet have been widely used.
However, as the size of the glass substrate increases, it is possible to obtain good liquid replacement efficiency by swinging the spray nozzle and the glass substrate, that is, sufficient efficiency when the liquid on the glass substrate is swept out of the glass substrate. It has become increasingly difficult to obtain.

For this reason, as a developing device used for manufacturing a color filter on a large glass substrate of the fifth generation (glass substrate size, for example, 1100 × 1300 mm) or more, the glass substrate is inclined and conveyed in the width direction perpendicular to the conveying direction. Thus, a developing device that performs wet processing while maintaining an inclined state has come to be used.
When the glass substrate is inclined, a liquid flow due to gravity is generated on the glass substrate, and basically no liquid stays on the glass substrate, so that the replacement efficiency of the developer and the replacement efficiency of pure water are improved.

FIG. 4 is a plan view illustrating an example of a developing device that performs an inclination process. As shown in FIG. 4, the developing device (10) includes a developing chamber (20) for performing development and a water washing chamber (30) for performing water washing.
A glass substrate (not shown) is transported from the left side of the developing device (10) as shown by an arrow in FIG. 4, developed in the developing chamber (20), and washed in the washing chamber (30). It is conveyed to the next process.

  FIG. 5 is a plan view for explaining the relationship between the development spray (23) and the glass substrate (1) inside the development chamber (20). FIG. 6 is a side view for explaining the relationship among the transport roller (24), the development spray (23), and the glass substrate (1) from the direction indicated by the white thick arrow in FIG. In FIG. 6, the upper surface from the direction indicated by the thick arrow corresponds to FIG.

  As shown in FIG.5 and FIG.6, the conveyance roller (24) inclines in the width direction of the conveyance direction of a glass substrate (1), and is provided. In FIG. 5, the glass substrate (1) transported from the left to the transport roller (24) has the left side in the width direction of the transported glass substrate (1) as the inclined upper part (mountain side) (g), and the right side is tilted. The lower part (valley side) (h) is conveyed while being inclined, and the processing is performed while maintaining the inclined state.

The development spray (23) is above the conveyance path of the glass substrate (1) at the same inclination angle as the inclination angle (θ) of the conveyance roller (24), that is, parallel to the axial direction of the conveyance roller (24). Is provided. In the width direction (Y-axis direction) of the development spray (23), a plurality of development shower nozzles (22) are provided in a straight line, and the straight line is a plurality of lines in the direction of the conveyance path (X-axis direction). Is provided.
The development shower nozzle (22) is provided on the lower surface of the development spray (23), but is shown by a solid line in FIG.
The developing spray (23) discharges the developing solution from the developing shower nozzle (22) toward the surface of the glass substrate (1) that is inclined and conveyed, and development is performed.

By performing the development by the tilting process, as indicated by an arrow in FIG. 6, the developer discharged on the surface of the glass substrate (1) does not stay on the glass substrate, and the developer is in the lower part of the slope (valley). Side) and (h), and a new developer is always supplied to the surface of the glass substrate. As a result, the development time is shortened and the in-plane development uniformity is improved.
However, it is still in a situation where the black matrix is easily peeled off at a place where it is easily developed on the glass substrate (1).
Japanese Patent Laid-Open No. 9-189904 JP 2000-39511 A JP-A-11-74248

  The present invention has been made to solve the above problems, and in the production of a color filter used in a liquid crystal display device, the width of a black matrix formed on a glass substrate is, for example, about 5 μm (**). The black matrix is not peeled off from the glass substrate even if it becomes narrow, and as a developing device, the glass substrate is inclined and conveyed in the width direction perpendicular to the conveying direction, and development and washing are performed while maintaining the inclined state. It is an object of the present invention to provide a method for producing a color filter in which a black matrix does not peel off at a place where development is easily performed on a glass substrate even when a developing device is used.

The present invention provides a method for producing a color filter in which a transparent conductive film is formed on a glass substrate on which a colored pixel is formed after a step of forming a black matrix and a colored pixel on a glass substrate by a photolithography method.
At the time of exposure when forming a black matrix using a negative photoresist on a glass substrate, an opening corresponding to the formation of the black matrix, an opening corresponding to auxiliary exposure on the outside in the vicinity of both sides of the opening, and those To form an auxiliary pattern that suppresses development on both sides of the black matrix on the photoresist corresponding to the vicinity of both sides of the black matrix that is formed during pattern exposure using a photomask that uses light shielding parts other than the openings In the state immediately before the development is finished, the slopes of the both sides of the black matrix are gentler than the slope of the auxiliary pattern, and when the development is finished, the auxiliary pattern is A color filter characterized by being separated from the substrate so that it does not remain as a pattern. It is a production method.

  The present invention suppresses development on both sides of a black matrix on the photoresist corresponding to the vicinity of both sides of the black matrix to be formed during exposure when forming a black matrix using a photoresist on a glass substrate. Therefore, even if the width of the black matrix is narrowed, the black matrix is not peeled off from the glass substrate, and as a developing device, the glass substrate is inclined and conveyed in the width direction perpendicular to the conveying direction, Even if a developing device that performs development while maintaining an inclined state, a method for producing a color filter in which the black matrix does not peel off at a position where development is easily performed on the glass substrate is obtained.

  In the present invention, when forming a black matrix using a photoresist on a glass substrate, an auxiliary pattern for suppressing development on both sides of the black matrix is provided in the vicinity of both sides of the black matrix to be formed. The black matrix does not peel off from the glass substrate even if the width of the black matrix becomes narrow. Also, as a developing device, the glass substrate is inclined and conveyed in the width direction perpendicular to the conveying direction, and the inclined state is maintained. Even when a developing device that performs development is used, a method for producing a color filter in which peeling of the black matrix does not occur at a position where development is easily performed on a glass substrate.

  In addition, the present invention is not limited to a developing device that performs development while tilting and conveying a glass substrate, and generally can appropriately cope with in-plane development non-uniformity unique to the developing device. Further, when the development non-uniformity has a direction, it is possible to employ a photomask provided with an opening for providing auxiliary exposure or an opening for forming an auxiliary pattern corresponding to the directionality.

Below, the manufacturing method of the color filter by this invention is demonstrated in detail based on the embodiment.
FIG. 7 is a plan view of an example of a photomask used in the method for manufacturing a color filter according to the present invention. One pixel on the photomask (PM1) and its periphery are shown. FIG. 9 is a plan view of a black matrix (2-3) formed on the glass substrate (1) using the photomask (PM1) shown in FIG.

In the photomask (PM1) shown in FIG. 7, reference numeral (K1) is an opening corresponding to the formation of the black matrix (2-3) shown in FIG. Reference numeral (K2) denotes an opening corresponding to auxiliary exposure.
Reference numeral (S) denotes a portion represented by oblique lines, and shields light from portions other than the opening (K1) corresponding to the formation of the black matrix (2-3) and the opening (K2) corresponding to auxiliary exposure. Part.

The opening (K2) corresponding to the auxiliary exposure is provided to suppress development on both sides of the black matrix. As shown in FIG. 7, the opening (K2) corresponding to the auxiliary exposure is provided near both sides of the opening (K1) corresponding to the formation of the black matrix (2-3). The opening (K2) corresponding to the auxiliary exposure is a photoresist corresponding to the vicinity of both side portions of the black matrix to be formed at the time of exposing the exposure light having passed through the opening (K1) to the photoresist when forming the black matrix. It is the opening part of the auxiliary exposure given above.
A photomask (PM1) shown in FIG. 7 is a photomask used when a black matrix is formed using a negative black photoresist.

  FIG. 8 is a cross-sectional view illustrating a method for manufacturing a color filter according to the present invention. FIG. 8A is a cross-sectional view of a state in which the black photoresist coating film (5) provided on the glass substrate (1) is exposed through the photomask (PM1). As shown in FIG. 7, the photomask (PM1) shown in FIG. 7 is disposed above the glass substrate (1) provided with the black photoresist coating film (5) in FIG. 8 (a). ing. The photomask (PM1) is shown by enlarging the cross section taken along the line CC in FIG.

The exposure light (L) is irradiated from above in FIG. 8A of the photomask (PM1), and is exposed to the black photoresist coating film (5) through the opening. As the black photoresist, a negative black photoresist is used.
Reference numeral (5-1a) is a portion on the black photoresist coating film (5) where the black matrix (2-3) is formed, and the diagonal line rising to the right is exposed through the opening (K1). Represents a given state. This portion becomes a black matrix (2-3) after development.

Reference numeral (5-1b) is a portion for giving auxiliary exposure in the vicinity of both side portions of the black matrix to be formed on the coating film (5). The upward slanted line is exposed through the opening (K2). Represents a given state.
This auxiliary exposure is not for forming a pattern, but is auxiliary exposure for suppressing development on both sides of the formed black matrix (2-3) during development after exposure.

FIG. 8B is a cross-sectional view of a state immediately before the development is completed after the development. As shown in FIG. 8 (b), the coating film (5) other than the portion (5-1a) where the black matrix is formed and the auxiliary exposure portion (5-1b) is formed with a developer (M). Almost dissolved and removed.
Between the portion (5-1a) where the black matrix is formed and the auxiliary exposure portion (5-1b) indicated by reference numeral (6), other portions other than (6), for example, FIG. In b), the replacement efficiency of the developer is poor as compared with the right side portion of the auxiliary exposure portion (5-1b) indicated by the symbol (j).

For this reason, the degree to which both side surfaces of the portion (5-1a) where the black matrix is formed is suppressed compared to the both side surfaces of the black matrix (2-1) shown in FIG. It becomes.
As a result, as shown in FIG. 8B, the slopes of both sides of the portion (5-1a) where the black matrix is formed are compared with the slopes (θ1) of both sides of the black matrix (2-1). And it will be moderate.

  FIG. 8C is a cross-sectional view at the stage where development is completed. FIG. 8C corresponds to an enlarged cross section taken along line DD in FIG. By further developing from the state shown in FIG. 8B, the lower portion of the auxiliary exposure portion (5-1b) is dissolved and detached from the glass substrate (1), and the black matrix (2-3) is removed. The development to be formed ends.

As shown in FIG. 8C, both side surfaces of the black matrix (2-3) formed on the glass substrate (1) have an inclination (θ2) that is gentler than the inclination (θ1) (θ1>). θ2).
Also, the auxiliary exposure portions (5-1b) that contributed to the suppression of development on both side surfaces do not remain as a pattern but are separated.

  As shown in FIG. 10, the end point of this development is between the portion (5-1a) where the black matrix is formed and the auxiliary exposure portion (5-1b) where the replacement efficiency of the developer is poor (6). In this case, the coating film (5) on the glass substrate (1) is dissolved. At this point, the lower part (k) of the auxiliary exposure part (5-1b) is developed by development from both sides. The width (W4) of the auxiliary exposure portion (5-1b) is set in advance so as to be melted and detached from the glass substrate (1).

  Therefore, even when the width (W3, W3 = W2) of the portion (5-1a) where the black matrix is formed is narrow, for example, about 5 μm (**), the development on both sides thereof is suppressed, and the black matrix The part (5-1a) where the part (5-1a) is formed is in close contact with the glass substrate (1) and is larger than the part (c2) in close contact shown in FIG. 3 (b) (c3). > C2).

  Specifically, for example, the width (W3) of the portion (5-1a) where the black matrix is formed: 5 μm, the thickness (t1) of the coating film (5): 1.5 μm, the portion where the black matrix is formed When the distance (WB) between (5-1a) and the auxiliary exposure portion (5-1b) is 3 μm, the width (W4) of the auxiliary exposure portion (5-1b) is 3 μm. Thus, the auxiliary exposure portion (5-1b) can be satisfactorily separated at the end point of the development.

  Thereby, even if the width of the black matrix (2-3) is as narrow as, for example, about 5 μm (**), the portion that is in close contact with the glass substrate (1) becomes large (c2 → c3). (2-3) will not peel off from the glass substrate (1).

  FIG. 11 is a plan view of an example of a photomask used in the color filter manufacturing method according to claim 2. One pixel on the photomask (PM2) and its periphery are shown. FIG. 13 is a plan view of a black matrix (2-4) formed on the glass substrate (1) using the photomask (PM2) shown in FIG.

In the photomask (PM2) shown in FIG. 11, reference numeral (K1) denotes an opening corresponding to the formation of the black matrix (2-4) shown in FIG. Reference numeral (K3) denotes an opening corresponding to the formation of the auxiliary pattern (7).
Reference numeral (S) is a hatched portion, and an opening (K1) corresponding to the formation of the black matrix (2-4) and an opening (K3) corresponding to the formation of the auxiliary pattern (7). It is the light-shielding part of parts other than.

  The opening (K3) corresponding to the formation of the auxiliary pattern (7) is provided for forming the auxiliary pattern (7) that suppresses the development on both sides of the black matrix. As shown in FIG. 11, the opening (K3) corresponding to the formation of the auxiliary pattern (7) is provided in the vicinity of both sides of the opening (K1) corresponding to the formation of the black matrix (2-4). . The opening (K3) corresponding to the formation of the auxiliary pattern (7) is in the vicinity of both sides of the black matrix to be formed at the time of exposing the exposure light that has passed through the opening (K1) to the photoresist when forming the black matrix. Is an opening provided on the photoresist corresponding to.

  FIG. 12 is a cross-sectional view for explaining a color filter manufacturing method according to claim 2. FIG. 12A is a cross-sectional view of a state in which exposure through the photomask (PM2) is given to the black photoresist coating film (5) provided on the glass substrate (1). As shown in FIG. 12 (a), the photomask (PM2) shown in FIG. 11 is located above the glass substrate (1) provided with the black photoresist coating film (5) in FIG. 12 (a). It is arranged. The photomask (PM2) is shown by enlarging a cross section taken along line EE in FIG.

The exposure light (L) is irradiated from above in FIG. 12A of the photomask (PM2), and is exposed to the black photoresist coating film (5) through the opening. As the black photoresist, a negative black photoresist is used.
Reference numeral (5-2a) is a portion on the black photoresist coating film (5) where the black matrix (2-4) is formed. The diagonal line rising to the right is exposed through the opening (K1). Represents a given state. This portion becomes a black matrix (2-4) after development.

Reference numeral (5-2b) is a portion where the auxiliary pattern (7) is formed in the vicinity of both sides of the black matrix to be formed on the coating film (5). ) Represents a state where exposure is given.
This auxiliary pattern is an auxiliary pattern for suppressing development on both sides of the black matrix (2-4) formed during development after exposure.

FIG. 12B is a cross-sectional view at a stage where development is performed after exposure and development is completed. FIG. 12B corresponds to an enlarged cross section taken along line FF in FIG. As shown in FIG. 12B, the portion (5-2a) where the black matrix is formed by development becomes the black matrix (2-4) by the development, and the portion (5-2b) where the auxiliary pattern (7) is formed. Becomes the auxiliary pattern (7), and the coating film (5) other than the black matrix (2-4) and the auxiliary pattern (7) is dissolved and removed by the developer (M).
Between the black matrix (2-4) and the auxiliary pattern (7) indicated by reference numeral (6), other parts other than (6) are used, for example, reference numeral (j) in FIG. Compared to the right side of the auxiliary pattern (7) shown, the replacement efficiency of the developer is poor.

For this reason, the degree to which both side surfaces of the black matrix (2-4) are developed is suppressed as compared with the both side surfaces of the black matrix (2-1) shown in FIG. As a result, as shown in FIG. 12 (b), the slopes on both sides of the black matrix (2-4) are gentler than the slopes (θ1) on both sides of the black matrix (2-1) ( θ3) (θ1> θ3).
Also, the auxiliary pattern (7) that contributes to the suppression of development on both sides remains as a pattern.

  Thereby, even if the width of the black matrix (2-4) is as narrow as about 5 μm (**), for example, the portion that is in close contact with the glass substrate (1) becomes large (c2 → c4). (2-4) will not peel off from the glass substrate (1).

As described above, according to the color filter manufacturing method of the present invention, the black matrix is peeled off from the glass substrate even when the width of the black matrix formed on the glass substrate is reduced to, for example, about 5 μm (**). There is nothing.
In addition, when a developing device that performs development while transporting the glass substrate in an inclined manner is used, it is possible to prevent the black matrix from being peeled off on the glass substrate where it is easily developed.

For example, due to the increase in the size of the glass substrate, the liquid film of the developer becomes thicker at the inclined lower part (valley side) (h) due to the developer flowing from the inclined upper part (peak side) (g). As a result, it becomes impossible to efficiently supply a new developer to the glass substrate, particularly to the inclined lower part (valley side) (h), and the replacement efficiency of the developer deteriorates, and the inclined lower part (valley side) (h) There is a tendency that the development of this is insufficient.
Further, the liquid film with the developer from the front end portion becomes closer to the end portion (reference number (r) shown in FIG. 14) from the front end portion (reference number (q) shown in FIG. 14) in the length direction (conveyance direction) of the glass substrate Becomes thicker. For this reason, as it goes to the end (r), a new developer cannot be supplied efficiently, and the development tends to be insufficient. Then, the shortage of development is maximized at the end (r) of the inclined lower part (valley side) (h) (in FIG. 14, x mark to xxx mark).

  At this time, if the shortage of development at the terminal portion (r) is kept normal, the other portions become excessively developed, that is, portions that are easily developed. In such a case, it is possible to prevent the black matrix from peeling off by applying the method for producing a color filter according to the present invention to the portion that is easily developed.

The method for producing a color filter according to the present invention is not limited to a developing device that performs development while conveying a glass substrate in an inclined manner. Is possible.
Further, when the development non-uniformity is directional, for example, when it tends to be developed easily in the direction (Y) perpendicular to the transport direction (X), as shown in FIG. Only in (Y), it is possible to adopt a photomask (PM11) provided with an opening for providing auxiliary exposure or an opening (K22) for forming an auxiliary pattern.

It is a top view which expands and shows an example of the pixel of the color filter used for a liquid crystal display device. It is sectional drawing in the AA of the pixel of the color filter shown in FIG. It is sectional drawing which expands and shows the cross section in the BB line after image development of the black matrix shown in FIG. It is a top view which shows an example of the developing device which performs an inclination process. It is a top view explaining the relationship between the development spray in the inside of a development chamber, and a glass substrate. In FIG. 5, it is a side view explaining the relationship between the conveyance roller, the developing spray, and the glass substrate from the direction shown by the white thick arrow. It is a top view of an example of the photomask used in the manufacturing method of the color filter by this invention. (A) is sectional drawing of the state in which exposure through a photomask is given to the coating film of a black photoresist. (B) is sectional drawing of the state just before development is performed after exposure and development is complete | finished. (C) is a cross-sectional view of the stage where development has been completed. It is a top view of the black matrix formed on the glass substrate using the photomask shown in FIG. It is explanatory drawing of the state at the time of the end point of development. It is a top view of an example of the photomask used in the manufacturing method of the color filter concerning Claim 2. (A) is sectional drawing of the state in which exposure through a photomask is given to a coating film. FIG. 6B is a cross-sectional view of a stage where development is performed after exposure and development is completed. It is a top view of the black matrix formed on the glass substrate using the photomask shown in FIG. It is explanatory drawing of the replacement efficiency of the developing solution on a glass substrate. It is a top view of a photomask when development nonuniformity has directionality.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2, 2-1, 2-2, 2-3, 2-4 ... Black matrix 3 ... Colored pixel 4 ... Transparent conductive film 5 ... Application of black photoresist Films 5-1a, 5-2a... Part on the coating film where the black matrix is formed 5-1b... Part that gives auxiliary exposure in the vicinity of both sides of the black matrix on the coating film 5- 2b: On the coating film, a portion where an auxiliary pattern is formed in the vicinity of both sides of the black matrix 6: Between a portion where the black matrix is formed and an auxiliary exposure portion 7: Auxiliary pattern DESCRIPTION OF SYMBOLS 10 ... Developing apparatus 20 ... Developing chamber 22 ... Developing shower nozzle 23 ... Developing spray 24 ... Conveying roller 30 ... Washing chamber K1 ... Opening corresponding to formation of black matrix 2. Opening K3 corresponding to auxiliary exposure ... Opening L corresponding to formation of auxiliary pattern ... Exposure light M ... Developer PM1, PM2, PM11 ... Photomask S ... Shielding portions W, W1, W2, W3, W5... Black matrix width W4... Auxiliary exposure portion width W6... Auxiliary pattern width .theta. ... Inclination c1, c2, c3, c4 on the side surface of the black matrix ... Adhesion width d ... Upper part of coating film e ... Lower part of coating film g ... Upper part of slope (mountain side)
h: Lower slope (valley side)
j: right side portion q of auxiliary exposure portion q: tip end portion r of glass substrate transport direction r end portion of glass substrate transport direction

Claims (1)

In the method of manufacturing a color filter, after forming a black matrix and colored pixels on a glass substrate by a photolithography method, a transparent conductive film is formed on the glass substrate on which the colored pixels are formed.
At the time of exposure when forming a black matrix using a negative photoresist on a glass substrate, an opening corresponding to the formation of the black matrix, an opening corresponding to auxiliary exposure on the outside in the vicinity of both sides of the opening, and those To form an auxiliary pattern that suppresses development on both sides of the black matrix on the photoresist corresponding to the vicinity of both sides of the black matrix that is formed during pattern exposure using a photomask that uses light shielding parts other than the openings In the state immediately before the development is finished, the slopes of the both sides of the black matrix are gentler than the slope of the auxiliary pattern, and when the development is finished, the auxiliary pattern is A color filter characterized by being separated from the substrate so that it does not remain as a pattern. Production method.

Images