JPH07318715A - Production of color filter - Google Patents

Abstract

PURPOSE:To prevent the overhang formation of RGB pixel layers and to prevent disconnection of transparent electrodes by using a liquid crystal color filter (CF) patterning mask formed with boundary light shielding parts of a specific width around the apertures for RGB pixel patterns and provided with contour lines of a specific width on the outer side thereof. CONSTITUTION:The mask for CF patterning provided with the boundary light shielding parts 2 of the width 0.5 to 3mum around the apertures 1 for RGB pixel patterns and provided with the contour lines 3 (apertures) of the width 0.5 to 3mum of the boundary light shielding parts 2 is used. The photosensitive resin layer exposed by the light past the mask for CF patterning is the developed. The erosion by a developer to the unexposed parts by the boundary light shielding parts 2 is executed in the upper part in the initial period of development and the erosion of the side faces of the unexposed parts by the boundary light shielding parts 2 is not executed as the exposed parts by the contour lines 3 act as banks and the developer does not come into contact therewith. Then, the side face shapes of the resulted RGB pixel layers are not reverse tapered. The RGB pixel layers having a forward tapered shape in the side face shape are thus obtd.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device, and in particular, a transparent electrode is provided on R (red), G (green) and B (blue) filter pixels. The present invention relates to a liquid crystal color filter which prevents a disconnection defect of a transparent electrode caused by the shape of RGB pixels when applying a film.

[0002]

2. Description of the Related Art Conventionally, as a method for manufacturing a color filter, the following manufacturing method as shown in FIG. 2 has been known. First, a light-shielding layer is formed on a transparent substrate, and then a red pigment-dispersed photosensitive resin is uniformly applied and prebaked. Next, pattern exposure is performed using a liquid crystal color filter patterning mask (hereinafter referred to as CF patterning mask). Then, development is performed to remove the photosensitive resin except the pattern portion. Then, post baking is performed to form a red pixel layer.

Next, the above steps are performed on the green pigment and the blue pigment to form a green pixel layer and a blue pixel layer, respectively, to form color filters. Next, a transparent electrode film is formed on the color filter by a known method such as a vapor deposition method.

The pigment-dispersed photosensitive resin used in the above process contains a pigment having a particle diameter of 0.01 to 1 μm dispersed in the photosensitive resin. Therefore, even if ultraviolet rays are irradiated to photo-cure the resin in the RGB pixel portion, the ultraviolet rays do not reach to the lower part of the resin layer because the pigment contained in the resin in large amount absorbs the ultraviolet rays. An uncured part remains under the resin of the part. In addition, excessive dissolution is caused by the contact of the developing solution with the lower side surface of the RGB pixel portion.

Therefore, an overhang (inverse taper) pixel shape as shown in FIG. 3 is produced. for that reason,
When the transparent electrode 4 is deposited on the color filter by a vapor deposition method or the like, the overhang portion of the RGB pixel layer 6 prevents the sidewall from being deposited, resulting in a disconnection defect of the transparent electrode 4. It has drawbacks.

[0006]

In view of the above circumstances, the present invention prevents the formation of overhangs (inverse taper) of the RGB pixel layers 6 in the method of manufacturing a color filter used in a color liquid crystal display device. By
An object of the present invention is to provide a method for manufacturing a color filter that does not have the above-mentioned drawbacks.

[0007]

The above-mentioned problem is solved in the CF patterning mask used at the time of manufacturing a color filter, as shown in FIG. This can be solved by using a CF patterning mask having a boundary light-shielding portion 2 of 0.5 to 3 μm and a contour line 3 (opening) having a width of 0.5 to 3 μm provided outside the boundary light-shielding portion 2.

The present invention will be described below with reference to the drawings. As shown in FIG. 4, a transparent substrate 5 is coated with a photosensitive resin 8 and exposed by using a CF patterning mask 7 according to the present invention.

At this time, the light which has passed through the contour line 3 of the CF patterning mask 7 is diffracted and spreads divergently because the contour line 3 has a slit shape. for that reason,
At the edge of the exposure unit 10 formed by the RGB pixel pattern opening 1, the light passing through the RGB pixel pattern opening 1
The light passing through the contour line 3 and diffracted is combined, and the exposure amount increases. Therefore, the exposure unit 1 with the RGB pixel opening 1
Curing of the photosensitive resin at the edge portion of 0 is performed more firmly than before.

Next, as shown in FIG. 4B, the photosensitive resin layer 8 exposed by the light passing through the CF patterning mask 7 is developed to remove the photosensitive resin in the unexposed portion. I do. In the initial stage of development, as shown in FIG. 4 (c), the boundary light-shielding portion 2 erodes the unexposed portion 9 with the developing solution from the upper side, and the boundary light-shielding portion 2 protects the side surface of the unexposed portion 9 from the top. The erosion is due to the contour line 3 exposed portion 1
No. 1 is the bank, so the developer does not come into contact, so this is not done.
At the same time, the exposed portion 11 along the contour 3 is eroded from the side surface due to the dissolving action of the developing solution. When the development is further advanced, FIG. 4D is obtained.

Further development, in the final stage of development,
Since the exposed portion 11 formed by the contour line 3 of the CF patterning mask 7 has a narrow width, it is eroded and removed by the dissolving action of the developing solution. Further, since the unexposed portion 9 of the boundary light-shielding portion 2 has a narrow width and the contact area with the developing solution is small, the erosion by the developing solution is performed gently. Further, the edge portion of the exposed portion 10 formed by the opening 1 for the RGB pixel pattern is harder than before, so that the developing solution dissolves.
Erosion of the side surface of the exposed portion 10 by the RGB pixel pattern opening 1 is small. For the above reasons, when the remaining photosensitive resin layer is fixed by baking after the development, the RGB pixel layer 6 having a shape as shown in FIG. 4E is obtained.

Here, as a reason for setting the width of the boundary light-shielding portion 2 in the CF patterning mask 7 according to the present invention, if the width of the boundary light-shielding portion 2 is smaller than 0.5 μm, RG is set.
Exposure part 10 and contour line 3 by B pixel pattern opening 1
If the exposed portion 11 due to is made into the same pattern due to light diffraction, diffusion, etc., and is larger than 3 μm,
The reason is that the amount of the developer entering is increased and the effect of protecting the lower portion of the side surface of the exposure unit 10 by the RGB pixel pattern opening 1 from the developer is lost.

Further, as a reason for setting the width of the contour line 3, if the width of the contour line 3 is smaller than 0.5 μm, the exposed portion 11 due to the contour line 3 will be dissolved by the developing solution, and the boundary light-shielding portion 2 will not dissolve. The role of the bank preventing the erosion of the side surface of the exposed portion 9 disappears, and when the width of the contour line 3 is larger than 3 μm, the exposed portion 11 due to the contour line 3 is completely eroded even after the development is completed and remains as a pattern. , Worsening the RGB pixel shape, and the like.

[0014]

As described above, in the color filter manufactured according to the present invention, since the side surface of the exposed portion 10 is prevented from being corroded by the developing solution by the RGB pixel pattern opening 1, the side surface of the obtained RGB pixel layer 6 is prevented. The shape is not a reverse taper shape, but a forward taper shape is obtained. Therefore, the transparent electrode stacked on the RGB pixel layer 6 has
No disconnection occurs.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail with reference to FIG. <Example 1> First, a light-shielding layer having a lattice pattern of metal chromium is formed on a glass substrate having a thickness of 1.1 mm by a known method, for example, a method of performing etching after vapor deposition of metal chromium. Next, a photosensitive resin containing a red pigment (trade name "CR-200 manufactured by Fuji Hunt Technology Co., Ltd."
0 ″) is applied, and a uniform film thickness of 2.0 μm is formed by spin coating, and prebaking is performed at 90 ° C. for 5 minutes.

Next, a mask for CF patterning according to the present invention (width of light-shielding portion: 0.5 μm, contour line width: 1 μm)
Exposure is performed at a dose of 60 mJ / cm ² . Then, development is performed with an alkaline developer to remove the photosensitive resin in the unexposed area. Then, post-baking is performed at 200 ° C. for 30 minutes to form a red pixel layer.

Next, a photosensitive resin containing a green pigment (trade name "CG-2000" manufactured by Fuji Hunt Technology Co., Ltd.)
And is exposed in a dose similar to the above at a dose of 80 mJ / cm ² to form a green pixel layer. Then, using a photosensitive resin containing a blue pigment (trade name “CB-2000” manufactured by Fuji Hunt Technology Co., Ltd.), exposure was performed at a dose of 120 mJ / cm ^{2 in} the same process as above, and a green pixel layer was formed. To form a color filter having RGB pixels.

The side shape of the RGB pixel layer of the color filter having RGB pixels obtained by the above manufacturing method is a forward tapered shape which forms a fringe of a gentle slope.

[0019]

The side shape of the RGB pixel layer of the color filter manufactured by the present invention is a forward tapered shape which forms a fringe of a gentle slope. Therefore, when a transparent electrode is formed by a known method, for example, a vapor deposition method, the reverse taper-shaped overhang portion of the RGB pixel layer, which has been conventionally generated, does not hinder the film formation, and the transparency due to the film formation failure is eliminated. It is practically excellent in that it can prevent disconnection of electrodes. Also, in the case of a color filter manufactured by the conventional method, in order to prevent disconnection of the transparent electrode due to overhang of the RGB pixel layer, it is necessary to provide a transparent layer on the surface of the color filter to smooth the surface of the color filter. However, in the present invention, since it is not necessary to provide a transparent layer, it is also useful for simplifying the color filter manufacturing method.

[0020]

[Brief description of drawings]

FIG. 1 is an explanatory view showing a mask for CF pattern nig according to the present invention.

FIG. 2 is an explanatory view showing a manufacturing process of a color filter.

FIG. 3 is an explanatory diagram showing an overhang (reverse taper shape) on the side surface of an RGB pixel layer, which occurs in a conventional method of manufacturing a color filter.

4A to 4E are explanatory views showing RGB pixel formation according to the present invention.

[Explanation of symbols]

 1 RGB pixel pattern opening 2 Boundary light shielding part 3 Contour line 4 Transparent electrode 5 Transparent substrate 6 RGB pixel layer 7 Mask 8 Photosensitive resin 9 Boundary light shielding part unexposed area 10 RGB pixel pattern aperture exposed part 11 Outline Exposure part by line

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[Procedure amendment]

[Submission date] January 9, 1995

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0017

[Correction method] Change

[Correction content]

Next, a photosensitive resin containing a green pigment (trade name "CG-2000" manufactured by Fuji Hunt Technology Co., Ltd.)
And a dose of 80 mJ / cm ^{2 in} the same process as above.
Is exposed to form a green pixel layer. Then, using a photosensitive resin containing a blue pigment (trade name “CB-2000” manufactured by Fuji Hunt Technology Co., Ltd.), exposure was performed at a dose of 120 mJ / cm ^{2 in} the same process as described above to obtain a blue pixel layer. To form a color filter having RGB pixels.

[Procedure Amendment 2]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 1

[Correction method] Change

[Correction content]

[Figure 1]

Claims (1)

[Claims] 1. A method of manufacturing a color filter used in a color liquid crystal display device, wherein a boundary light-shielding portion having a width of 0.5 to 3 μm is provided around an opening of an RGB pixel pattern, and a width of 0.5 to 3 is provided outside the boundary light-shielding portion. A method of manufacturing a color filter, which comprises using an exposure mask for patterning a color filter having an opening contour line of 3 μm.