JP5440844B2 - Organic EL panel and manufacturing method thereof - Google Patents

Organic EL panel and manufacturing method thereof Download PDF

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JP5440844B2
JP5440844B2 JP2009222615A JP2009222615A JP5440844B2 JP 5440844 B2 JP5440844 B2 JP 5440844B2 JP 2009222615 A JP2009222615 A JP 2009222615A JP 2009222615 A JP2009222615 A JP 2009222615A JP 5440844 B2 JP5440844 B2 JP 5440844B2
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哲也 片桐
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Nippon Seiki Co Ltd
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本発明は、第一電極と第二電極の間に少なくとも有機発光層を挟持してなる有機EL(エレクトロルミネッセンス)素子を支持基板上に形成してなる有機ELパネルに関するものであり、特にドットマトリクス型の有機ELパネル及びその製造方法に関するものである。   The present invention relates to an organic EL panel in which an organic EL (electroluminescence) element having at least an organic light emitting layer sandwiched between a first electrode and a second electrode is formed on a support substrate, and in particular, a dot matrix. The present invention relates to a type organic EL panel and a method for manufacturing the same.

従来より、有機ELパネルが種々提案されており、例えば特許文献1に開示されている。有機ELパネルは、ガラス基板(支持基板)上に有機EL素子からなる発光部を形成したものであり、この有機EL素子は、透明電極(第一電極),絶縁膜,有機層及び背面電極(第二電極)を有する。有機層は少なくとも有機発光層を有し、例えば、正孔注入輸送層,有機発光層,電子輸送層及び電子注入層からなるものである。透明電極,有機層及び背面電極の積層個所が発光部となる。発光部は封止部材によって気密的に覆われており、この封止部材は前記ガラス基板に接着されている。   Conventionally, various organic EL panels have been proposed, for example, disclosed in Patent Document 1. The organic EL panel is a glass substrate (supporting substrate) formed with a light emitting portion made of an organic EL element. The organic EL element includes a transparent electrode (first electrode), an insulating film, an organic layer, and a back electrode ( Second electrode). The organic layer has at least an organic light emitting layer, and includes, for example, a hole injection transport layer, an organic light emission layer, an electron transport layer, and an electron injection layer. A laminated portion of the transparent electrode, the organic layer, and the back electrode is a light emitting portion. The light emitting part is hermetically covered with a sealing member, and this sealing member is bonded to the glass substrate.

また、パッシブマトリクス型の有機ELパネルは、第一電極と第二電極とを互いに交差する複数のライン状に形成することで、第一電極と第二電極との交差個所を発光画素とし、発光画素をマトリクス状に配置するものである。発光画素の画定においては、第一電極を絶縁膜で被覆し、発光画素となる個所のみを開口部から露出させる方法が一般的である。第二電極の形成においては、第一電極と交差するように隔壁を形成し、蒸着等によって形成される前記第二電極を前記隔壁によってライン状に分離する方法が知られている。   In addition, the passive matrix type organic EL panel is formed by forming the first electrode and the second electrode in a plurality of lines intersecting each other, so that the intersection of the first electrode and the second electrode serves as a light emitting pixel, and emits light. Pixels are arranged in a matrix. In the definition of the light emitting pixel, a method is generally employed in which the first electrode is covered with an insulating film, and only the portion that becomes the light emitting pixel is exposed from the opening. In forming the second electrode, a method is known in which a partition wall is formed so as to intersect the first electrode, and the second electrode formed by vapor deposition or the like is separated into lines by the partition wall.

また、有機ELパネルの製造工程においては、支持基板上に各部を形成し、所定濃度の酸素が封入された窒素雰囲気中で両電極間に所定の電圧を印加することで、少なくとも第二電極が第一電極と接触している欠陥個所を除去するエージング工程を行うことが知られている(例えば特許文献2参照)。かかる製造工程においては、支持基板上に各部を形成し、所定濃度の酸素が封入された窒素雰囲気中で封止部材を配設した後に両電極間に所定の電圧を印加する場合がある。   In the manufacturing process of the organic EL panel, each part is formed on a support substrate, and a predetermined voltage is applied between both electrodes in a nitrogen atmosphere in which a predetermined concentration of oxygen is sealed, so that at least the second electrode is It is known to perform an aging process for removing a defective portion in contact with the first electrode (see, for example, Patent Document 2). In such a manufacturing process, there is a case where a predetermined voltage is applied between both electrodes after forming each part on a support substrate and disposing a sealing member in a nitrogen atmosphere filled with a predetermined concentration of oxygen.

特開平7−169567号公報JP-A-7-169567 特開2003−282249号公報JP 2003-282249 A

しかしながら、前述のように有機ELパネルの製造工程中で発光部を収納する封止空間内に酸素を封入すると、酸素が原因となって発光画素の隔壁側の辺からダークフレームと称される非発光領域が発生し、製品の初期状態で発光画素間の隔壁と垂直方向の幅が隔壁と平行方向の幅に対して大きく見えてしまい、見栄えが低下するという問題点があった。   However, as described above, when oxygen is sealed in the sealing space that houses the light emitting portion during the manufacturing process of the organic EL panel, oxygen is used to cause a non-dark frame called a dark frame from the side on the partition wall side of the light emitting pixel. In the initial state of the product, a light emitting region is generated, and the width between the light emitting pixels and the vertical direction looks larger than the width in the direction parallel to the barrier ribs, which deteriorates the appearance.

本発明は、この問題に鑑みなされたものであり、初期状態における見栄えの低下を抑制可能な有機ELパネル及びその製造方法を提供するものである。   This invention is made | formed in view of this problem, and provides the organic electroluminescent panel which can suppress the fall of the appearance in an initial state, and its manufacturing method.

本発明は、前記課題を解決するため、支持基板上に複数のライン状に形成される第一電極と、この第一電極と直交するように複数のライン状に形成される第二電極と、前記第一電極と前記第二電極との間に形成される有機発光層と、前記第一電極を覆うように形成され前記第一電極の一部を露出させる複数の開口部を有する絶縁膜と、前記第一電極と直交するように複数のライン状に形成され前記第二電極を複数に分離する隔壁と、前記第一電極,前記有機発光層及び前記第二電極の積層個所からなる発光部を気密的に覆うように前記支持基板上に配設される封止部材と、を備える有機ELパネルであって、前記絶縁膜は、前記開口部間の前記隔壁と垂直方向の幅が前記隔壁と平行方向の幅よりも小さくなるように形成されてなることを特徴とする。   In order to solve the above problems, the present invention provides a first electrode formed in a plurality of lines on a support substrate, a second electrode formed in a plurality of lines so as to be orthogonal to the first electrode, An organic light emitting layer formed between the first electrode and the second electrode; an insulating film formed to cover the first electrode and having a plurality of openings exposing a part of the first electrode; A light-emitting section formed in a plurality of lines so as to be orthogonal to the first electrode and separating the second electrode into a plurality of portions, and a laminated portion of the first electrode, the organic light-emitting layer, and the second electrode A sealing member disposed on the support substrate so as to hermetically cover the insulating substrate, wherein the insulating film has a width in a direction perpendicular to the partition between the openings. It is formed to be smaller than the width in the parallel direction. To.

また、前記絶縁膜は、前記封止部材を前記支持基板上に配設する封止工程にて前記発光部を収納する封止空間内に封入される酸素濃度に応じて前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差を設定され
前記封止工程において封入される酸素濃度をxvol%、前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差をyμmとしたとき、
y≧9.5x
であることを特徴とする。
The insulating film may be formed between the openings according to an oxygen concentration sealed in a sealing space that houses the light emitting part in a sealing step in which the sealing member is disposed on the support substrate. The difference between the width in the direction parallel to the partition and the width in the direction perpendicular to the partition is set ,
When the oxygen concentration enclosed in the sealing step is x vol%, and the difference between the width in the direction parallel to the partition between the openings and the width in the direction perpendicular to the partition is y μm,
y ≧ 9.5x
It is characterized by being.

本発明は、前記課題を解決するため、支持基板上に複数のライン状に形成される第一電極と、この第一電極と直交するように複数のライン状に形成される第二電極と、前記第一電極と前記第二電極との間に形成される有機発光層と、前記第一電極を覆うように形成され前記第一電極の一部を露出させる複数の開口部を有する絶縁膜と、前記第一電極と直交するように複数のライン状に形成され前記第二電極を複数に分離する隔壁と、前記第一電極,前記有機発光層及び前記第二電極の積層個所からなる発光部を気密的に覆うように前記支持基板上に配設される封止部材と、を備える有機ELパネルの製造方法であって、前記絶縁膜を、前記開口部間の前記隔壁と垂直方向の幅が前記隔壁と平行方向の幅よりも小さくなるように形成することを特徴とする。   In order to solve the above problems, the present invention provides a first electrode formed in a plurality of lines on a support substrate, a second electrode formed in a plurality of lines so as to be orthogonal to the first electrode, An organic light emitting layer formed between the first electrode and the second electrode; an insulating film formed to cover the first electrode and having a plurality of openings exposing a part of the first electrode; A light-emitting section formed in a plurality of lines so as to be orthogonal to the first electrode and separating the second electrode into a plurality of portions, and a laminated portion of the first electrode, the organic light-emitting layer, and the second electrode A sealing member disposed on the support substrate so as to hermetically cover the substrate, wherein the insulating film has a width in a direction perpendicular to the partition between the openings. Is formed to be smaller than the width in the direction parallel to the partition wall. And butterflies.

また、前記封止部材を前記支持基板上に配設する封止工程を含み、この封止工程において前記発光部を収納する封止空間内に封入される酸素濃度に応じて前記絶縁膜の前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差を設定し、
前記封止工程において封入される酸素濃度をxvol%、前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差をyμmとしたとき、
y≧9.5x
とすることを特徴とする。
In addition, the method includes a sealing step of disposing the sealing member on the support substrate, and the insulating film includes the sealing film according to an oxygen concentration sealed in a sealing space that houses the light emitting unit in the sealing step. Set a difference between the width in the parallel direction to the partition between the openings and the width in the vertical direction from the partition ,
When the oxygen concentration enclosed in the sealing step is x vol%, and the difference between the width in the direction parallel to the partition between the openings and the width in the direction perpendicular to the partition is y μm,
y ≧ 9.5x
Characterized by a.

本発明は、ドットマトリクス型の有機ELパネル及びその製造方法に関するものであり、初期状態における見栄えの低下を抑制することが可能となる。   The present invention relates to a dot matrix type organic EL panel and a method for manufacturing the same, and can suppress deterioration in appearance in an initial state.

本発明の実施形態である有機ELパネルを示す正面図。The front view which shows the organic electroluminescent panel which is embodiment of this invention. 同上有機ELパネルを示す断面図。Sectional drawing which shows an organic electroluminescent panel same as the above. 同上有機ELパネルの製造工程を示す図。The figure which shows the manufacturing process of an organic electroluminescent panel same as the above. 同上有機ELパネルを示す拡大図。The enlarged view which shows an organic electroluminescent panel same as the above. 有機ELパネルにおける封入酸素濃度とダークフレーム量との関係を示す図。The figure which shows the relationship between the enclosure oxygen concentration in an organic electroluminescent panel, and the amount of dark frames. 本発明の実施形態における封入酸素濃度と最適な絶縁膜幅の差との関係を示す図。The figure which shows the relationship between the filling oxygen concentration in embodiment of this invention, and the difference of the optimal insulating film width.

以下、本発明の一実施形態を添付の図面に基いて説明する。図1及び図2は本発明の実施形態である有機ELパネルを示すものである。有機ELパネルは、支持基板1上に透明電極(第一電極)2,絶縁膜3,隔壁4,有機層5,背面電極(第二電極)6を形成し、また、支持基板1上に封止部材7を配設してなる。なお、図1においては封止部材7を省略している。   Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. 1 and 2 show an organic EL panel according to an embodiment of the present invention. The organic EL panel has a transparent electrode (first electrode) 2, an insulating film 3, a partition wall 4, an organic layer 5, and a back electrode (second electrode) 6 formed on the support substrate 1, and sealed on the support substrate 1. A stop member 7 is provided. In FIG. 1, the sealing member 7 is omitted.

支持基板1は、例えば光透過性を有するガラス基板からなる矩形状の基板である。   The support substrate 1 is a rectangular substrate made of, for example, a light transmissive glass substrate.

透明電極2は、例えばITO(Indium Tin Oxide)等の透光性の導電材料からなるものであり、スパッタリング等の手段によって層状に形成された後フォトエッチング等の手段によって所望の形状に形成される。本実施形態においては、各透明電極2は図1における縦方向に伸びるライン状に複数形成される。   The transparent electrode 2 is made of a light-transmitting conductive material such as ITO (Indium Tin Oxide), for example, and is formed into a desired shape by means such as photoetching after being formed in layers by means such as sputtering. . In the present embodiment, each transparent electrode 2 is formed in a plurality of lines extending in the vertical direction in FIG.

絶縁膜3は、ポリイミド系の絶縁材料からなるものであり、フォトエッチング等の手段によって形成されており、透明電極2を覆うものである。絶縁膜3は、有機層5よりも広い領域に形成されており、マトリクス状に配置される発光部に対応し、透明電極2を部分的に露出させる矩形の開口部3aを有している。   The insulating film 3 is made of a polyimide-based insulating material, is formed by means such as photoetching, and covers the transparent electrode 2. The insulating film 3 is formed in a region wider than the organic layer 5 and has a rectangular opening 3a corresponding to the light emitting portions arranged in a matrix and partially exposing the transparent electrode 2.

隔壁4は、フェノール系の絶縁材料からなるものであり、フォトエッチング法等の手段によって形成されている。隔壁4は、絶縁膜3上にその断面形状が逆テーパー状になるように形成されている。隔壁4は、透明電極2と直交する方向に複数の平行線状に設けられており、有機層5及び背面電極6を複数のライン状に分断する。また、隔壁4は、前記発光部よりも広い領域に形成されている。   The partition 4 is made of a phenol-based insulating material and is formed by means such as a photoetching method. The partition wall 4 is formed on the insulating film 3 so that the cross-sectional shape thereof is a reverse taper shape. The partition 4 is provided in a plurality of parallel lines in a direction orthogonal to the transparent electrode 2, and divides the organic layer 5 and the back electrode 6 into a plurality of lines. Moreover, the partition 4 is formed in the area | region wider than the said light emission part.

有機層5は、少なくとも有機発光層を有するものであり、例えば、正孔注入輸送層,有機発光層,電子輸送層及び電子注入層からなるものである。   The organic layer 5 has at least an organic light emitting layer, and includes, for example, a hole injection transport layer, an organic light emission layer, an electron transport layer, and an electron injection layer.

背面電極6は、例えばアルミニウム(Al)等の低抵抗の金属導電材料からなるものであり、隔壁4によって透明電極2に直交する方向、すなわち図1における横方向に伸びるライン状に複数形成される。透明電極2と背面電極6とが交差し、有機層5を挟持する個所が各発光部E(有機EL素子)となる。   The back electrode 6 is made of, for example, a low-resistance metal conductive material such as aluminum (Al), and a plurality of back electrodes 6 are formed in a line shape extending in the direction perpendicular to the transparent electrode 2 by the partition walls 4, that is, in the lateral direction in FIG. . The portions where the transparent electrode 2 and the back electrode 6 intersect and sandwich the organic layer 5 are light emitting portions E (organic EL elements).

封止部材7は、金属材料からなり、例えば紫外線硬化型の接着剤8を介して支持基板1上に接着されることで、封止部材7と支持基板1とで前記発光部を収納する気密空間を構成するものである。また、封止部材7は、プレス加工等の手段によって凹形状に加工され、前記発光部と対向し吸湿部材9が配設される対向部7aと、対向部7aを囲み接着剤8を介して支持基板1と接着される接着部7bと、を有する。なお、封止部材7は、ガラス材料からなるものであってもよい。また、封止部材7は平板状であってもよく、その場合接着剤8にはスペーサーが混入されることが望ましい。   The sealing member 7 is made of a metal material, and is adhered to the support substrate 1 via, for example, an ultraviolet curable adhesive 8, so that the sealing member 7 and the support substrate 1 store the light emitting portion. It constitutes a space. In addition, the sealing member 7 is processed into a concave shape by means such as press working, and is opposed to the light emitting portion and is provided with a facing portion 7a where the moisture absorbing member 9 is disposed, and surrounds the facing portion 7a with an adhesive 8 interposed therebetween. And a bonding portion 7b bonded to the support substrate 1. The sealing member 7 may be made of a glass material. Further, the sealing member 7 may have a flat plate shape. In that case, it is desirable that a spacer is mixed in the adhesive 8.

吸湿部材9は、化学的あるいは物理的に水分を吸着する吸湿作用を有し、封止部材7の対向部7aに塗布して配置されるものである。吸湿部材9はシート状に形成されており、例えば活性アルミナ,モレキュラシーブス,酸化カルシウムあるいは酸化バリウム等の無機材料と樹脂材料とを混合してなる。また、吸湿部材9は、液状、クリーム状あるいはペースト状等の塗布型の吸湿部材であってもよい。   The hygroscopic member 9 has a hygroscopic action of adsorbing moisture chemically or physically, and is disposed by being applied to the facing portion 7 a of the sealing member 7. The hygroscopic member 9 is formed in a sheet shape, and is formed by mixing an inorganic material such as activated alumina, molecular sieves, calcium oxide or barium oxide, and a resin material. Further, the hygroscopic member 9 may be an application-type hygroscopic member such as liquid, cream or paste.

さらに、図3を用いて有機ELパネルの製造方法を説明する。まず、透明電極形成工程S1にてスパッタリング法及びフォトエッチングを適宜行い、複数のライン状に透明電極2を形成する。次に、絶縁膜形成工程S2にて、スピンコート法及びフォトエッチングを適宜行い、透明電極2を覆うとともに透明電極2を一部露出させる開口部3aを有する絶縁膜3を形成する。次に、隔壁形成工程S3にて、スピンコート法及びフォトエッチングを適宜行い、透明電極2と直交する隔壁4を形成する。次に、有機層形成工程S4にて、蒸着法によって透明電極2上に有機層5を形成する。次に、背面電極形成工程S5にて、蒸着法にて透明電極2と直交する背面電極6を形成し、各発光部Eを得る。   Furthermore, the manufacturing method of an organic electroluminescent panel is demonstrated using FIG. First, in the transparent electrode forming step S1, a sputtering method and photoetching are appropriately performed to form the transparent electrode 2 in a plurality of lines. Next, in an insulating film formation step S2, spin coating and photoetching are performed as appropriate to form the insulating film 3 having an opening 3a that covers the transparent electrode 2 and partially exposes the transparent electrode 2. Next, in the partition formation step S3, spin coating and photoetching are appropriately performed to form the partition 4 orthogonal to the transparent electrode 2. Next, in the organic layer forming step S4, the organic layer 5 is formed on the transparent electrode 2 by vapor deposition. Next, in the back electrode forming step S5, the back electrode 6 orthogonal to the transparent electrode 2 is formed by vapor deposition, and each light emitting portion E is obtained.

次に、封止工程S6において、所定の酸素濃度を有する窒素雰囲気中にて、支持基板1上に吸湿部材9が配置された封止部材7を接着剤8を介して配設し、UVを照射することによって発光部Eを封止する。このとき、支持基板1及び封止部材7にて構成される発光部Eを収納する封止空間内には所定濃度の酸素が封入されることとなる。   Next, in the sealing step S6, in a nitrogen atmosphere having a predetermined oxygen concentration, the sealing member 7 in which the hygroscopic member 9 is disposed on the support substrate 1 is disposed via the adhesive 8, and UV is emitted. The light emitting unit E is sealed by irradiation. At this time, oxygen of a predetermined concentration is sealed in the sealing space that houses the light emitting portion E configured by the support substrate 1 and the sealing member 7.

次に、エージング処理工程S7において、両電極2,6間に通常の定電流駆動時に印加する駆動電圧(例えば5V)よりも高い逆バイアス電圧(例えば25V)を印加し、少なくとも背面電極6が透明電極2と接触している欠陥個所を除去する。   Next, in the aging treatment step S7, a reverse bias voltage (for example, 25V) higher than a drive voltage (for example, 5V) applied during normal constant current driving is applied between the electrodes 2 and 6, and at least the back electrode 6 is transparent. The defective part in contact with the electrode 2 is removed.

本実施形態において特徴となる点は、図4(a)に示すように、絶縁膜形成工程S2において、絶縁膜3を開口部3a間の隔壁4と垂直方向の幅Yが隔壁4と平行方向の幅Xよりも小さくなるように(Y<X)形成する点にある。前述のように、封止工程S6において前記封止空間内に酸素を封入すると、図4(b)に示すように、酸素が原因となって発光部Eの隔壁4側の辺からダークフレームDが発生する。本実施形態は、ダークフレームDの発生量(隔壁4と垂直方向の幅Y)を考慮して開口部3a間の隔壁と垂直方向の幅Yを予め小さく設定し、ダークフレームDの発生時において発光部E間の隔壁4と平行方向の幅、すなわち開口部3a間の幅Xと、発光部E間の隔壁4と垂直方向の幅、すなわち開口部3a間の幅Yと隔壁4と垂直方向に隣り合う2つの発光部EのダークフレームDの幅Yとの合計(Y+Y×2)との差を小さくするものである。かかる方法によれば、エージング処理が終了した初期状態において、発光部E間の隔壁4と垂直方向の幅と隔壁4と平行方向の幅とを同等とすることができ、見栄えの低下を抑制することが可能となる。 Parallel point as a feature in the present embodiment, as shown in FIG. 4 (a), the insulating film forming step S2, the insulating film 3 width Y 1 of the partition wall 4 in the vertical direction between the opening portion 3a and the partition wall 4 This is in forming (Y 1 <X 1 ) so as to be smaller than the width X 1 in the direction. As described above, when oxygen is sealed in the sealing space in the sealing step S6, as shown in FIG. 4B, the dark frame D starts from the side on the partition wall 4 side of the light emitting part E due to oxygen. Will occur. In the present embodiment, in consideration of the amount of dark frame D generated (width Y 2 in the vertical direction with respect to the partition 4), the width Y 1 in the vertical direction between the partition 3 and the opening 3 a is set to be small in advance. partition wall 4 parallel to the direction of the width between the light emitting portion E at the time, i.e. the width X 1 between the openings 3a, the light emitting portion partition wall 4 and the vertical width between E, that is, the width Y 1 and the partition wall between the openings 3a 4 and the sum (Y 1 + Y 2 × 2) of the width Y 2 of the dark frame D of the two light emitting portions E adjacent in the vertical direction. According to such a method, in the initial state after the aging process is completed, the width between the light emitting portions E and the width in the vertical direction and the width in the direction parallel to the partition 4 can be made equal, and deterioration in appearance is suppressed. It becomes possible.

さらに、本願発明者は、ダークフレームDの発生量は封止工程S6にて封入された酸素濃度によって異なることを見いだした。図5は、封止工程S6にて封入される酸素濃度と発光部Eにて発生するダークフレームDの隔壁と垂直方向の幅Yとの関係を示すものである。これによれば、封止工程S6にて封入される酸素濃度をxvol%としたとき、ダークフレームDの隔壁と垂直方向の幅Yμmは、
=4.75x
となる。
Furthermore, the present inventor has found that the amount of dark frame D generated varies depending on the oxygen concentration enclosed in the sealing step S6. Figure 5 shows the relationship between the oxygen concentration to be encapsulated in the sealing step S6 and the width Y 2 of the partition and vertical dark frame D generated in the light emitting unit E. According to this, when the oxygen concentration sealed in the sealing step S6 is xvol%, the width Y 2 μm in the direction perpendicular to the partition wall of the dark frame D is
Y 2 = 4.75x
It becomes.

したがって、図6に示すように、封止工程S6にて封入される酸素濃度をxvol%、開口部3a間の隔壁4と平行方向の幅と隔壁4と垂直方向の幅との差(X−Y)をyμmとしたとき、
y=9.5x
となるように絶縁膜3を形成すれば、ダークフレームDの発生時において発光部E間の隔壁4と平行方向の幅、すなわち開口部3a間の幅Xと、発光部E間の隔壁4と垂直方向の幅、すなわち開口部3a間の幅Yと隔壁4と垂直方向に隣り合う2つの発光部EのダークフレームDの幅Yとの合計(Y+Y×2)とを一致させることができる。ダークフレームDの発生量の誤差等を考慮すれば、少なくとも
y≧9.5x
となるように絶縁膜3を形成すれば、発光部E間の隔壁4と垂直方向の幅が、ダークフレームDの発生によって初期状態の発光部E間の幅として設定される隔壁4と平行方向の幅よりも大きくなり見栄えが低下することを抑制でき、好適である。かかる方法によれば、エージング処理が終了した初期状態において、発光部E間の隔壁4と垂直方向の幅と隔壁4と平行方向の幅とを同等とすることができ、見栄えの低下を抑制することが可能となる。
Therefore, as shown in FIG. 6, the oxygen concentration sealed in the sealing step S6 is xvol%, and the difference between the width in the direction parallel to the partition 4 between the openings 3a and the width in the direction perpendicular to the partition 4 (X 1 −Y 1 ) is y μm,
y = 9.5x
By forming the insulating film 3 so that the dark frame partition wall 4 parallel to the direction of the width between the light emitting portion E at the time of occurrence and D, i.e. the width X 1 between the openings 3a, partition walls 4 between the light emitting portion E the vertical width, i.e., the sum of the width Y 2 of the dark frame D of the two light emitting portions E of the width Y 1 and the partition 4 between the openings 3a vertically adjacent (Y 1 + Y 2 × 2) Can be matched. Considering the error in the amount of generation of the dark frame D, at least y ≧ 9.5x
If the insulating film 3 is formed so that the width between the light emitting portions E and the vertical direction of the barrier ribs 4 is set as the width between the light emitting portions E in the initial state by the occurrence of the dark frame D, It can suppress that it becomes larger than the width | variety of this and the appearance falls, and is suitable. According to such a method, in the initial state after the aging process is completed, the width between the light emitting portions E and the width in the vertical direction and the width in the direction parallel to the partition 4 can be made equal, and deterioration in appearance is suppressed. It becomes possible.

本発明は、第一電極と第二電極の間に少なくとも有機発光層を挟持した発光部を支持基板上に形成した有機ELパネルに関するものであり、特にマトリクス状に配置された発光部を有する有機ELパネルに好適である。   The present invention relates to an organic EL panel in which a light emitting part having at least an organic light emitting layer sandwiched between a first electrode and a second electrode is formed on a support substrate, and particularly an organic EL panel having light emitting parts arranged in a matrix. Suitable for EL panel.

1 支持基板
2 透明電極(第一電極)
3 絶縁膜
3a 開口部
4 隔壁
5 有機層
6 背面電極(第二電極)
7 封止部材
8 接着剤
9 吸湿部材
E 発光部
D ダークフレーム
1 Support substrate 2 Transparent electrode (first electrode)
3 Insulating film 3a Opening 4 Partition 5 Organic layer 6 Back electrode (second electrode)
7 Sealing member 8 Adhesive 9 Hygroscopic member E Light emitting part D Dark frame

Claims (4)

支持基板上に複数のライン状に形成される第一電極と、この第一電極と直交するように複数のライン状に形成される第二電極と、前記第一電極と前記第二電極との間に形成される有機発光層と、前記第一電極を覆うように形成され前記第一電極の一部を露出させる複数の開口部を有する絶縁膜と、前記第一電極と直交するように複数のライン状に形成され前記第二電極を複数に分離する隔壁と、前記第一電極,前記有機発光層及び前記第二電極の積層個所からなる発光部を気密的に覆うように前記支持基板上に配設される封止部材と、を備える有機ELパネルであって、
前記絶縁膜は、前記開口部間の前記隔壁と垂直方向の幅が前記隔壁と平行方向の幅よりも小さくなるように形成されてなることを特徴とする有機ELパネル。
A first electrode formed in a plurality of lines on a support substrate, a second electrode formed in a plurality of lines so as to be orthogonal to the first electrode, and the first electrode and the second electrode An organic light emitting layer formed therebetween, an insulating film formed so as to cover the first electrode and having a plurality of openings exposing a part of the first electrode, and a plurality of layers so as to be orthogonal to the first electrode A partition wall formed in a line shape and separating the second electrode into a plurality of parts, and a light emitting part comprising the laminated portion of the first electrode, the organic light emitting layer, and the second electrode are hermetically covered on the support substrate. An organic EL panel comprising a sealing member disposed in
The organic EL panel, wherein the insulating film is formed such that a width in a direction perpendicular to the partition between the openings is smaller than a width in a direction parallel to the partition.
前記絶縁膜は、前記封止部材を前記支持基板上に配設する封止工程にて前記発光部を収納する封止空間内に封入される酸素濃度に応じて前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差を設定され
前記封止工程において封入される酸素濃度をxvol%、前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差をyμmとしたとき、
y≧9.5x
であることを特徴とする請求項1に記載の有機ELパネル。
The insulating film includes the partition between the openings according to an oxygen concentration sealed in a sealing space that houses the light emitting part in a sealing step of disposing the sealing member on the support substrate. The difference between the width in the parallel direction and the width in the vertical direction of the partition wall is set ,
When the oxygen concentration enclosed in the sealing step is x vol%, and the difference between the width in the direction parallel to the partition between the openings and the width in the direction perpendicular to the partition is y μm,
y ≧ 9.5x
The organic EL panel according to claim 1, characterized in that.
支持基板上に複数のライン状に形成される第一電極と、この第一電極と直交するように複数のライン状に形成される第二電極と、前記第一電極と前記第二電極との間に形成される有機発光層と、前記第一電極を覆うように形成され前記第一電極の一部を露出させる複数の開口部を有する絶縁膜と、前記第一電極と直交するように複数のライン状に形成され前記第二電極を複数に分離する隔壁と、前記第一電極,前記有機発光層及び前記第二電極の積層個所からなる発光部を気密的に覆うように前記支持基板上に配設される封止部材と、を備える有機ELパネルの製造方法であって、
前記絶縁膜を、前記開口部間の前記隔壁と垂直方向の幅が前記隔壁と平行方向の幅よりも小さくなるように形成することを特徴とする有機ELパネルの製造方法。
A first electrode formed in a plurality of lines on a support substrate, a second electrode formed in a plurality of lines so as to be orthogonal to the first electrode, and the first electrode and the second electrode An organic light emitting layer formed therebetween, an insulating film formed so as to cover the first electrode and having a plurality of openings exposing a part of the first electrode, and a plurality of layers so as to be orthogonal to the first electrode A partition wall formed in a line shape and separating the second electrode into a plurality of parts, and a light emitting part comprising the laminated portion of the first electrode, the organic light emitting layer, and the second electrode are hermetically covered on the support substrate. A method for producing an organic EL panel comprising:
The method of manufacturing an organic EL panel, wherein the insulating film is formed so that a width in a direction perpendicular to the partition between the openings is smaller than a width in a direction parallel to the partition.
前記封止部材を前記支持基板上に配設する封止工程を含み、この封止工程において前記発光部を収納する封止空間内に封入される酸素濃度に応じて前記絶縁膜の前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差を設定し、
前記封止工程において封入される酸素濃度をxvol%、前記開口部間の前記隔壁と平行方向の幅と前記隔壁と垂直方向の幅との差をyμmとしたとき、
y≧9.5x
とすることを特徴とする請求項に記載の有機ELパネルの製造方法。
Including a sealing step of disposing the sealing member on the support substrate, and the opening of the insulating film according to an oxygen concentration sealed in a sealing space for housing the light emitting portion in the sealing step Set the difference between the width in the direction parallel to the partition and the width in the direction perpendicular to the partition ,
When the oxygen concentration enclosed in the sealing step is x vol%, and the difference between the width in the direction parallel to the partition between the openings and the width in the direction perpendicular to the partition is y μm,
y ≧ 9.5x
Method of manufacturing an organic EL panel according to claim 3, characterized in that a.
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