JP5438363B2 - Organic semiconductor material characterized by wide band gap - Google Patents
Organic semiconductor material characterized by wide band gap Download PDFInfo
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- JP5438363B2 JP5438363B2 JP2009106387A JP2009106387A JP5438363B2 JP 5438363 B2 JP5438363 B2 JP 5438363B2 JP 2009106387 A JP2009106387 A JP 2009106387A JP 2009106387 A JP2009106387 A JP 2009106387A JP 5438363 B2 JP5438363 B2 JP 5438363B2
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- 239000004065 semiconductor Substances 0.000 title claims description 39
- 239000000463 material Substances 0.000 title claims description 15
- -1 fluoroalkynyl group Chemical group 0.000 claims description 36
- 239000000126 substance Substances 0.000 claims description 34
- 125000001424 substituent group Chemical group 0.000 claims description 19
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000000304 alkynyl group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000003368 amide group Chemical group 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000004185 ester group Chemical group 0.000 claims description 4
- 125000004991 fluoroalkenyl group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 4
- 125000002560 nitrile group Chemical group 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 4
- 125000000101 thioether group Chemical group 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 22
- 238000000034 method Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- GBROPGWFBFCKAG-UHFFFAOYSA-N picene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C1=CC=CC=C1C=C2 GBROPGWFBFCKAG-UHFFFAOYSA-N 0.000 description 12
- 238000005160 1H NMR spectroscopy Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000012267 brine Substances 0.000 description 6
- 238000004440 column chromatography Methods 0.000 description 6
- 239000012043 crude product Substances 0.000 description 6
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 6
- 235000019341 magnesium sulphate Nutrition 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 229940126062 Compound A Drugs 0.000 description 5
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 5
- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical group N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 description 5
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- VGWBXRXNERKBSJ-UHFFFAOYSA-N dithieno[2,3-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2SC=C1 VGWBXRXNERKBSJ-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 4
- 102100033215 DNA nucleotidylexotransferase Human genes 0.000 description 3
- 101000800646 Homo sapiens DNA nucleotidylexotransferase Proteins 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- CZWHMRTTWFJMBC-UHFFFAOYSA-N dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene Chemical compound C1=CC=C2C=C(SC=3C4=CC5=CC=CC=C5C=C4SC=33)C3=CC2=C1 CZWHMRTTWFJMBC-UHFFFAOYSA-N 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- BOCFGAMKSYQRCI-UHFFFAOYSA-N dinaphtho[2,3-b:2',3'-d]furan Chemical compound C1=CC=C2C=C3C4=CC5=CC=CC=C5C=C4OC3=CC2=C1 BOCFGAMKSYQRCI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- FQJZPYXGPYJJIH-UHFFFAOYSA-N 1-bromonaphthalen-2-ol Chemical compound C1=CC=CC2=C(Br)C(O)=CC=C21 FQJZPYXGPYJJIH-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- OKJPEAGHQZHRQV-UHFFFAOYSA-N Triiodomethane Natural products IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001887 cyclopentyloxy group Chemical group C1(CCCC1)O* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000000131 cyclopropyloxy group Chemical group C1(CC1)O* 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000005743 methylethenyl group Chemical group [H]\C(*)=C(\[H])C([H])([H])[H] 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006610 n-decyloxy group Chemical group 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000006609 n-nonyloxy group Chemical group 0.000 description 1
- 125000006608 n-octyloxy group Chemical group 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 1
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical group C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Description
本発明は、有機半導体材料に関する。 The present invention relates to an organic semiconductor material.
有機半導体は、ウェットプロセスである塗布や印刷によってデバイスが作製できる可能性があることから、従来のシリコンを使った半導体のデバイスよりも単位面積あたりのコストが大幅に低減できることが期待されている。応用用途としては、有機ELや電子ペーパーに代表されるフレキシブルディスプレーや、有機薄膜太陽電池に代表される次世代エネルギーデバイスへの応用が期待されている。中でも、有機薄膜太陽電池に関しては、これまでのシリコン系太陽電池とは異なり、架台のようなものを必要としないほど軽く薄くカラフルなため、屋根、壁、窓などに貼り付ける太陽電池が実現できる可能性があり、産業上も大いに期待されている。 Organic semiconductors are likely to be able to be fabricated by wet processes such as coating and printing, and therefore it is expected that the cost per unit area can be greatly reduced as compared with conventional semiconductor devices using silicon. Applications are expected to be applied to flexible displays typified by organic EL and electronic paper, and next-generation energy devices typified by organic thin-film solar cells. In particular, organic thin-film solar cells, unlike conventional silicon-based solar cells, are light, thin and colorful so that they do not require a frame, so solar cells that can be attached to roofs, walls, windows, etc. can be realized. There is a possibility, and it is highly expected from the industry.
そのような有機薄膜太陽電池に使用される、有機半導体は、大きく分けてp型有機半導体とn型有機半導体があるが、p型有機半導体材料については、開放光電圧(VOC)が大きくでき、光電変換効率の向上が期待できるようなバンドギャップの広い有機半導体材料が求められている。 Organic semiconductors used in such organic thin-film solar cells can be broadly divided into p-type organic semiconductors and n-type organic semiconductors. For p-type organic semiconductor materials, the open-circuit photovoltage (V oc ) can be increased. Therefore, an organic semiconductor material having a wide band gap that can be expected to improve photoelectric conversion efficiency is demanded.
バンドギャップと開放光電圧との関係は、例えば、當麻らによって報告されており、n型有機半導体をフラーレンに固定し、p型有機半導体として代表的なペンタセン(バンドギャップ:約1.9eV)を用いた太陽電池の開放光電圧)(VOC)は、約0.4Vであるのに対し、p型有機半導体としてルブレン(バンドギャップ:約2.2eV)を使用した有機太陽電池からは、約0.9Vという飛躍的に大きなVOCが報告されている。(非特許文献1) The relationship between the band gap and the open photovoltage has been reported, for example, by Sasa et al., Fixing an n-type organic semiconductor to fullerene, and using a typical pentacene (band gap: about 1.9 eV) as a p-type organic semiconductor. open light voltage of the solar cell using) (V OC), compared to about 0.4V, rubrene as a p-type organic semiconductor (band gap: from organic solar cell using about 2.2 eV), about A vastly large V OC of 0.9 V has been reported. (Non-Patent Document 1)
また、有機トランジスタ特性に優れる有機半導体として、瀧宮らによって報告されたジナフト[2,3−b:2’,3’−f]チエノ[3,2−b]チエノチオフェン(以下,本非特許文献2の提案者は、この有機半導体をDNTTと称しているが、本発明と区別するため、ここでは2,3−DNTTとする。)は、キャリア移動度が2.0cm2/Vsと良好な電気特性を示すことが報告されている。2,3−DNTTのバンドギャップは、非特許文献2の中で3.38eVと見積もられていた。 In addition, as an organic semiconductor excellent in organic transistor characteristics, dinaphtho [2,3-b: 2 ′, 3′-f] thieno [3,2-b] thienothiophene reported by Kamiya et al. The proponent of Document 2 refers to this organic semiconductor as DNTT. In order to distinguish it from the present invention, it is assumed here that 2,3-DNTT is used, and the carrier mobility is as good as 2.0 cm 2 / Vs. Have been reported to exhibit excellent electrical properties. The band gap of 2,3-DNTT was estimated to be 3.38 eV in Non-Patent Document 2.
以上のように、有機半導体材料として様々な化学構造を有する化合物の研究が行われているが、代表的な有機半導体であるペンタセンは空気中または溶液中で酸化されて劣化してしまうなどの問題があるため、耐酸化性を持つ化合物が求められている。また、有機薄膜太陽電池では、p型半導体としてフタロシアニン(バンドギャップ:1.6eV)などが利用されているが、高い開放光電圧(VOC)を得るために、より幅広い(HOMO−LUMO)バンドギャップを持つ化合物が求められている。 As described above, research has been conducted on compounds having various chemical structures as organic semiconductor materials. However, pentacene, which is a typical organic semiconductor, is oxidized and deteriorated in air or in solution. Therefore, a compound having oxidation resistance is required. Further, in the organic thin film solar cell, p-type semiconductor as phthalocyanine (band gap: 1.6 eV), but such is utilized, in order to obtain a high open photovoltage (V OC), wider (HOMO-LUMO) Band There is a need for compounds with gaps.
ここで、本発明者らは、以下に示す有機半導体で有名なペンタセン[化4]とピセン[化5]の違いに着目した。ペンタセン[化4]とピセン[化5]は、ベンゼン核が5つ組み合わさった多環芳香族であり、両化合物の有機半導体特性には大差がなく、両化合物共に良好な半導体特性が報告されている。例えば、キャリア移動度は、ペンタセンが1.5cm2/Vsであり(非特許文献3)、ピセンが1.1cm2/Vsである。(非特許文献4)
[化4]
[化5]
Here, the present inventors paid attention to the difference between pentacene [Chemical 4] and picene [Chemical 5], which are well-known organic semiconductors as shown below. Pentacene [Chemical Formula 4] and Picene [Chemical Formula 5] are polycyclic aromatic compounds in which five benzene nuclei are combined, and there is no significant difference in the organic semiconductor properties of both compounds. ing. For example, the carrier mobility is 1.5 cm 2 / Vs for pentacene (Non-Patent Document 3) and 1.1 cm 2 / Vs for picene. (Non-Patent Document 4)
[Chemical 4]
[Chemical 5]
しかしながら、耐酸化性とバンドギャップについては、差があることが知られている。耐酸化性については、具体的には、ペンタセンを使った有機トランジスタは、大気中では速やかに劣化してしまうが、ピセンを使った有機トランジスタは、大気中駆動が可能である。バンドギャップについては、ペンタセンのバンドギャップが約1.9eVなのに対して、ピセンのバンドギャップは約3.3eVと広い。バンドギャップの違いは、吸収スペクトルを通じて結晶の色目にも反映され、ピセンの結晶は白色であるが、ペンタセンは、黒紫色の結晶である。 However, it is known that there is a difference between oxidation resistance and band gap. Regarding oxidation resistance, specifically, an organic transistor using pentacene deteriorates quickly in the air, but an organic transistor using picene can be driven in the air. Regarding the band gap, the band gap of pentacene is about 1.9 eV, whereas the band gap of picene is as wide as about 3.3 eV. The difference in the band gap is reflected in the color of the crystal through the absorption spectrum. The picene crystal is white, but pentacene is a black-violet crystal.
このように、ベンゼン核の組み合わさり方によって、耐酸化性とバンドギャップに大きな影響が出ることがわかった。この考え方を、左右対称なDNTT3種([化6]〜[化8]に化学式とその正式名称及び略号を示す。詳細は後述する。)に適応することで本発明に到達した。
[化6] ジナフト[2,3−b:2’,3’−f]チエノ[3,2−b]チエノチオフェン
[化7] ジナフト[2,1−b:2’,1’−f]チエノ[3,2−b]チエノチオフェン
[化8] ジナフト[1,2−b:1’,2’−f]チエノ[3,2−b]チエノチオフェン
Thus, it has been found that the combination of benzene nuclei has a large effect on oxidation resistance and band gap. The present invention has been achieved by applying this concept to symmetrical three types of DNTT (chemical formulas and their formal names and abbreviations are shown in [Chemical Formula 6] to [Chemical Formula 8]. Details will be described later).
[Chemical 6] Dinaphtho [2,3-b: 2 ′, 3′-f] thieno [3,2-b] thienothiophene
Embedded image Dinaphtho [2,1-b: 2 ′, 1′-f] thieno [3,2-b] thienothiophene
Embedded image Dinaphtho [1,2-b: 1 ′, 2′-f] thieno [3,2-b] thienothiophene
すなわち、ベンゼン環の組み合わさり方の異なる各化合物のHOMO−LUMOバンドギャップについて分子軌道計算(基底関数:RB3LYP/6−31G)を使い推定したところ、以下の表1に示すような結果になった。
上記結果より、3種のDNTT中では、1,2−DNTTのバンドギャップが最大となることが推定できた。1,2−DNTTを実際に合成し、他の2種(2,3−DNTTは非特許文献2に記載、2,1−DNTTは、特許文献1に記載)との比較をし、推定が裏付けられたため本発明に到達した。
That is, when the HOMO-LUMO band gap of each compound having different benzene ring combinations was estimated using molecular orbital calculation (basis function: RB3LYP / 6-31G), the results shown in Table 1 below were obtained. .
From the above results, it was estimated that the band gap of 1,2-DNTT was the maximum among the three types of DNTT. 1,2-DNTT was actually synthesized and compared with the other two types (2,3-DNTT is described in Non-Patent Document 2 and 2,1-DNTT is described in Patent Document 1). The present invention was reached because it was supported.
以下に本発明を詳細に説明する。 The present invention is described in detail below.
請求項1に記載の発明は、下記の化学式[化1]で示される、チエノチオフェン骨格を特徴とする有機半導体材料である。
[化1]
ただし、化学式[化1]中の置換基R1から R12は、水素原子及びハロゲン原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、フルオロアルケニル基、アルキニル基、フルオロアルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基、アミド基、イミノ基、カルボキシル基、ヒドロキシル基、エステル基、ニトロ基、ニトリル基、スルフィド基、メルカプト基、スルホニル基、シリル基のうち、少なくとも一つを含んでいる。
According to one aspect of the present invention, Ru is represented by the following chemical formula: [Formula 1], an organic semiconductor material characterized Ji eno thiophene skeleton.
[Chemical 1]
However, from the substituent R 1 in the chemical formula [Chemical Formula 1] R 12 represents a hydrogen atom and a halogen atom, aryl group, heterocyclic group, alkyl group, fluoroalkyl group, alkenyl group, fluoroalkenyl group, alkynyl group, fluoroalkynyl group, alkoxyl group, fluoroalkoxyl group, amino group, amide group , An imino group, a carboxyl group, a hydroxyl group, an ester group, a nitro group, a nitrile group, a sulfide group, a mercapto group, a sulfonyl group, and a silyl group.
化学式[化1]の正式名は、ジナフト[1,2−b:1’,2’−f]チエノ[3,2−b]チオフェンであり、以下、1,2−DNTTと表記する。 The formal name of the chemical formula [Chemical Formula 1] is dinaphtho [1,2-b: 1 ′, 2′-f] thieno [3,2-b] thiophene, and is hereinafter referred to as 1,2-DNTT.
化学式〔化1〕中の置換基R1から R12は、水素原子及びハロゲン原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、フルオロアルケニル基、アルキニル基、フルオロアルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基、アミド基、イミノ基、カルボキシル基、ヒドロキシル基、エステル基、ニトロ基、ニトリル基、スルフィド基、メルカプト基、スルホニル基、シリル基のうち、少なくとも一つを含んでいる。 なお、置換基R1から R12の好ましい例は、水素原子、フッ素原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、アルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基である。 From substituent R 1 in chemical formula [Chemical Formula 1] R 12 represents a hydrogen atom and a halogen atom, aryl group, heterocyclic group, alkyl group, fluoroalkyl group, alkenyl group, fluoroalkenyl group, alkynyl group, fluoroalkynyl group, alkoxyl group, fluoroalkoxyl group, amino group, amide group , An imino group, a carboxyl group, a hydroxyl group, an ester group, a nitro group, a nitrile group, a sulfide group, a mercapto group, a sulfonyl group, and a silyl group. In addition, from the substituent R 1 Preferred examples of R 12 are a hydrogen atom, a fluorine atom, an aryl group, a heterocyclic group, an alkyl group, a fluoroalkyl group, an alkenyl group, an alkynyl group, an alkoxyl group, a fluoroalkoxyl group, and an amino group.
置換基R1から R12における、ハロゲン原子はフッ素、塩素、臭素、ヨウ素であり、好ましい例はフッ素原子である。 From the substituent R 1 The halogen atom in R 12 is fluorine, chlorine, bromine or iodine, and a preferred example is a fluorine atom.
置換基R1から R12における、アリール基は特に限定されず、例えば、フェニル基、p−トリル基、p−フルオロフェニル基、ペンタフルオロフェニル基、p−(トリフルオロメチル)フェニル基、1−ナフチル基、2−ナフチル基ビフェニル基、ターフェニル基、(ジフェニルアミノ)フェニル基などが挙げられる。 From the substituent R 1 The aryl group in R 12 is not particularly limited, and examples thereof include a phenyl group, p-tolyl group, p-fluorophenyl group, pentafluorophenyl group, p- (trifluoromethyl) phenyl group, 1-naphthyl group, 2- A naphthyl group biphenyl group, a terphenyl group, a (diphenylamino) phenyl group, etc. are mentioned.
置換基R1から R12における、複素環基は特に限定されず、2−チエニル基、5−(n−1−オクチル)チエニル基、2−ベンゾチエニル基、2−フリル基、1−メチル−2−ピロリル基、2−ピリジル基、2−ビピリジル基などが挙げられる。 From the substituent R 1 The heterocyclic group in R 12 is not particularly limited, and a 2-thienyl group, a 5- (n-1-octyl) thienyl group, a 2-benzothienyl group, a 2-furyl group, a 1-methyl-2-pyrrolyl group, 2-pyridyl group, 2-bipyridyl group, etc. are mentioned.
置換基R1から R12における、アルキル基は特に限定されず、直鎖型、分岐型、環状型のアルキル基であり、例えば、n−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、n−ウンデシル基、n−ドデシル基、n−トリデシル基、イソプロピル基、t−ブチル基、シクロプロピル基、シクロペンチル基、アダマンチル基などが挙げられ、フルオロアルキル基は特に限定されず、トリフルオロメチル基、パーフルオロオクチル基、パーフルオロドデシル基などが挙げられる。 From the substituent R 1 The alkyl group in R 12 is not particularly limited, and is a linear, branched, or cyclic alkyl group such as an n-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, n -Octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, n-tridecyl group, isopropyl group, t-butyl group, cyclopropyl group, cyclopentyl group, adamantyl group, etc. The fluoroalkyl group is not particularly limited, and examples thereof include a trifluoromethyl group, a perfluorooctyl group, and a perfluorododecyl group.
置換基R1からR12における、アルケニル基は特に限定されず、例えば、エテニル基、メチルエテニル基、(n−オクチル)エテニル基、フェニルエテニル基、ナフチルエテニル基、ビフェニルエテニル基、ターフェニルエテニル基、パーフルオロフェニルエテニル基などが挙げられる。 The alkenyl group in the substituents R 1 to R 12 is not particularly limited, and examples thereof include an ethenyl group, a methylethenyl group, a (n-octyl) ethenyl group, a phenylethenyl group, a naphthylethenyl group, a biphenylethenyl group, and a terphenylethenyl group. Group, perfluorophenylethenyl group and the like.
置換基R1からR12における、アルケニル基は特に限定されず、例えば、エチニル基、メチルエチニル基、(n−オクチル)エチニル基、フェニルエチニル基、ナフチルエチニル基、ビフェニルエチニル基、ターフェニルエチニル基、パーフルオロフェニルエチニル基などが挙げられる。 The alkenyl group in the substituents R 1 to R 12 is not particularly limited, and examples thereof include an ethynyl group, a methylethynyl group, an (n-octyl) ethynyl group, a phenylethynyl group, a naphthylethynyl group, a biphenylethynyl group, and a terphenylethynyl group. And a perfluorophenylethynyl group.
置換基R1から R12における、アルコキシル基は特に限定されず、例えば、n−ブトキシ基、n−ペンチロキシ基、n−ヘキシロキシ基、n−ヘプトキシ基、n−オクチロキシ基、n−ノニロキシ基、n−デシロキシ基、n−ウンデシキシ基、n−ドデシロキシ基、n−トリデシロキシ基、イソプロポキシ基、t−ブチロキシ基、シクロプロポキシ基、シクロペンチロキシ基などが挙げられ、フルオロアルコキシ基は特に限定されず、トリフルオロメトキシ基、パーフルオロオクチロキシ基、パーフルオロドデシロキシ基などが挙げられる。 From the substituent R 1 The alkoxyl group in R 12 is not particularly limited. For example, n-butoxy group, n-pentyloxy group, n-hexyloxy group, n-heptoxy group, n-octyloxy group, n-nonyloxy group, n-decyloxy group, n -Undecoxy group, n-dodecyloxy group, n-tridecyloxy group, isopropoxy group, t-butyloxy group, cyclopropoxy group, cyclopentyloxy group and the like, and fluoroalkoxy group is not particularly limited, trifluoromethoxy group, Examples include perfluorooctyloxy groups and perfluorododecyloxy groups.
置換基R1からR12における、アミノ基は特に限定されず、例えば、ジフェニルアミノ基、ジ(p−トリル)アミノ基、ジナフチルアミノ基、ジチエニルアミノ基、ジピリジルアミノ基などが挙げられる。 The amino group in the substituents R 1 to R 12 is not particularly limited, and examples thereof include a diphenylamino group, a di (p-tolyl) amino group, a dinaphthylamino group, a dithienylamino group, and a dipyridylamino group.
続いて請求項2に記載の発明は、化学式〔化1〕中のRn、Rn+6が水素原子以外の同一の置換基であることを特徴とする請求項1に記載の有機半導体材料である。 Subsequently, the invention according to claim 2 is the organic semiconductor material according to claim 1, wherein R n and R n + 6 in the chemical formula [Chemical Formula 1] are the same substituents other than hydrogen atoms. .
請求項2に記載の有機半導体材料は、後述する化合物Eのn+2、(n+2)’位に置換基を有する化合物を用いることにより、容易に合成することができるが、合成方法は特に限定されるものではない。なお、化合物Eのn+2、(n+2)’位とは、[化3]に示すような位置番号である。ここで、nは1以上6以下の整数である。 The organic semiconductor material according to claim 2 can be easily synthesized by using a compound having a substituent at the n + 2, (n + 2) ′ position of the compound E described later, but the synthesis method is particularly limited. It is not a thing. The n + 2 and (n + 2) ′ positions of Compound E are position numbers as shown in [Chemical Formula 3]. Here, n is an integer of 1-6.
[化3]
[Chemical formula 3]
置換基Rn、Rn+6は、ハロゲン原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、フルオロアルケニル基、アルキニル基、フルオロアルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基、アミド基、イミノ基、カルボキシル基、ヒドロキシル基、エステル基、ニトロ基、ニトリル基、スルフィド基、メルカプト基、スルホニル基、シリル基であり、好ましい例は、フッ素原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、アルキニル基、アミノ基である。 Substituents R n and R n + 6 are a halogen atom, aryl group, heterocyclic group, alkyl group, fluoroalkyl group, alkenyl group, fluoroalkenyl group, alkynyl group, fluoroalkynyl group, alkoxyl group, fluoroalkoxyl group, amino group, Amide group, imino group, carboxyl group, hydroxyl group, ester group, nitro group, nitrile group, sulfide group, mercapto group, sulfonyl group, silyl group, preferred examples are fluorine atom, aryl group, heterocyclic group, alkyl Group, fluoroalkyl group, alkenyl group, alkynyl group and amino group.
続いて、請求項3の発明は、請求項1から請求項2のいずれかの有機半導体材料、あるいは、請求項1から請求項2のいずれかの有機半導体材料の複数を組み合わせて、からなる有機電子デバイスである。ここでいう有機電子デバイスとは、本有機半導体材料の電気特性を利用した電子デバイスのことであり、具体的には、有機トランジスタ、有機発光ダイオード、有機ダイオード、有機レーザー、有機薄膜太陽電池、有機メモリー等が挙げられる。
Then, the invention of claim 3, any one of organic semiconductor material according to claim 2 claim 1, or a combination of a plurality of any of the organic semiconductor material according to claim 2 claim 1, consisting of an organic It is an electronic device. An organic electronic device here is an electronic device that utilizes the electrical characteristics of the organic semiconductor material . Specifically, an organic transistor, an organic light emitting diode, an organic diode, an organic laser, an organic thin film solar cell, an organic thin film Memory etc. are mentioned.
本発明の化合物をこれら有機電子デバイスに利用するに当たって、高純度化のために不純物の除去等の精製が必要になるが、本発明の化合物は、液体クロマトグラフィー法、昇華法、ゾーンメルティング法、ゲルパーミネーションクロマトグラフィー法、再結晶法などによって精製できる。 When using the compound of the present invention for these organic electronic devices, purification such as removal of impurities is necessary for high purity. The compound of the present invention is not limited to liquid chromatography, sublimation, zone melting, etc. It can be purified by gel permeation chromatography method, recrystallization method and the like.
また、本発明の化合物を有機電子デバイスに利用するに当たって、主として薄膜の形態で用いられるが、その薄膜作製法として、ウェットプロセスとドライプロセスどちらを使用してもよい。 Further, when the compound of the present invention is used for an organic electronic device, it is mainly used in the form of a thin film, and either a wet process or a dry process may be used as a method for forming the thin film.
ここで言うウェットプロセスとは、スピンコート法、ディップコート法、バーコート法、スプレーコート法、インクジェット法、スクリーン印刷法、平板印刷法、凹版印刷法、凸版印刷法などを示しており、これら公知の方法が利用できる。 The wet process here refers to a spin coating method, a dip coating method, a bar coating method, a spray coating method, an ink jet method, a screen printing method, a lithographic printing method, an intaglio printing method, a relief printing method, and the like. Can be used.
ここで言うドライプロセスとは、真空蒸着法、スパッタリング法、CVD法、レーザー蒸着法、分子線エピタキシャル成長法、気相輸送成長法などを示しており、これら公知の方法が利用できる。 The dry process mentioned here indicates a vacuum deposition method, a sputtering method, a CVD method, a laser deposition method, a molecular beam epitaxial growth method, a vapor phase transport growth method, and the like, and these known methods can be used.
請求項1の発明によれば、紫外線領域での吸収効率が高く、太陽電池としても利用することができる。 According to invention of Claim 1, the absorption efficiency in an ultraviolet region is high, and it can utilize also as a solar cell.
請求項2の発明によれば、請求項1の化合物の対称位置にあるRnとRn+6を同一の置換基とすることにより、その合成過程が容易となる。 According to the invention of claim 2, the synthesis process is facilitated by making R n and R n + 6 in the symmetrical position of the compound of claim 1 the same substituent.
請求項3の発明によれば、請求項1ないし請求項2の化合物の用途を明らかにして化合物の有効利用を図ることができる。 According to the invention of claim 3, it is possible to clarify the use of the compound of claims 1 to 2 and to effectively use the compound.
以下に本発明の実施例を示す Examples of the present invention are shown below.
以下に請求項1に記載の有機半導体1,2−DNTTの合成過程の反応式[化2]を示す。 [化2]
The reaction formula [Chemical Formula 2] of the synthesis process of the organic semiconductor 1,2-DNTT according to claim 1 is shown below. [Chemical formula 2]
化合物Aの合成窒素雰囲気下、1L四つ口フラスコに1−ブロモ−2−ナフトール50.6g(22.7mmol)、トリエチルアミン63ml、塩化メチレン250mlを加え、氷水冷却下でその溶液にトリフルオロメタンスルホン酸無水物 75.9g(269mmol)の塩化メチレン(80ml)溶液を約1時間かけて滴下し、滴下後室温で4時間撹拌した。反応終了後、反応溶液を5%炭酸水素ナトリウム水溶液、10%食塩水の順で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーで精製し、化合物Aを得た。以下に化合物Aの1H−NMRおよび13C−NMRの測定結果を示す。1H−NMR(400 MHz, CDCl3): δH 7.43(d, 1H), 7.61 (ddd, 1H), 7.69 (ddd, 1H), 7.88(d, 2H), 8.32(d, 1H).13C−NMR(100 MHz,CDCl3): δC 116.2, 119.9, 127.7,127.8, 128.3, 128.8, 129.0, 129.7, 132.7, 133.0, 145.1. Synthesis of Compound A Under a nitrogen atmosphere, 10.6 ml (22.7 mmol) of 1-bromo-2-naphthol, 63 ml of triethylamine and 250 ml of methylene chloride were added to a 1 L four-necked flask, and trifluoromethanesulfonic acid was added to the solution under ice water cooling. A solution of 75.9 g (269 mmol) of anhydride in methylene chloride (80 ml) was added dropwise over about 1 hour, followed by stirring at room temperature for 4 hours. After completion of the reaction, the reaction solution was washed with 5% aqueous sodium hydrogen carbonate solution and 10% brine in that order, and the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography to obtain Compound A. The measurement results of 1 H-NMR and 13 C-NMR of Compound A are shown below. 1 H-NMR (400 MHz, CDCl 3 ): δ H 7.43 (d, 1H), 7.61 (ddd, 1H), 7.69 (ddd, 1H), 7.88 (d, 2H), 8.32 (d, 1H). 13 C-NMR (100 MHz, CDCl 3 ): δ C 116.2, 119.9, 127.7, 127.8, 128.3, 128.8, 129.0, 129.7, 132.7, 133.0, 145.1.
化合物Bの合成窒素雰囲気下、200ml四つ口フラスコに化合物A 20g(56.3mmol)、トリエチルアミン 200ml、テトラキストリフェニルホスフィンパラジウム1.25g(1.08mmol)、ヨウ化銅(I) 218mg(1.14mmol)を加え、トリメチルシリルアセチレン9.4ml (67.9mmol)を加え、40 ℃で48時間撹拌した。反応終了後、反応溶液にトルエンを加え、10%食塩水で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーで精製し、化合物Bを得た。以下に化合物Bの1H−NMRおよび13C−NMRの測定結果を示す。1H−NMR(400 MHz, CDCl3): δH 0.3(d, 9H), 7.49(d, 1H), 7.50(ddd, 1H), 7.58(ddd, 1H), 7.70(d, 1H), 7.77(d, 1H), 8.28(d, 1H).13C−NMR(100 MHz,CDCl3): δC −0.1, 100.5, 104.3, 123.3, 126.8, 127.2, 127.3, 127.8, 127.9,128.1, 129.2, 132.2, 133.7. Synthesis of Compound B Under a nitrogen atmosphere, 20 g (56.3 mmol) of Compound A , 200 ml of triethylamine, 1.25 g (1.08 mmol) of tetrakistriphenylphosphine palladium, 218 mg of copper (I) iodide (1. 14 mmol), 9.4 ml (67.9 mmol) of trimethylsilylacetylene was added, and the mixture was stirred at 40 ° C. for 48 hours. After completion of the reaction, toluene was added to the reaction solution and washed with 10% brine, and the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography to obtain Compound B. The measurement results of 1 H-NMR and 13 C-NMR of Compound B are shown below. 1 H-NMR (400 MHz, CDCl 3 ): δ H 0.3 (d, 9H), 7.49 (d, 1H), 7.50 (ddd, 1H), 7.58 (ddd, 1H), 7.70 (d, 1H), 7.77 (d, 1H), 8.28 (d, 1H). 13 C-NMR (100 MHz, CDCl 3 ): δ C -0.1, 100.5, 104.3, 123.3, 126.8, 127.2, 127.3, 127.8, 127.9 , 128.1, 129.2, 132.2, 133.7.
化合物Cの合成窒素雰囲気下、500mlナスフラスコに化合物B 30g(98.9mmol)、メタノール15
0ml、炭酸カリウム1.37g(9.91mmol)を加え、室温で2時間撹拌した。反応終了後、反応溶液にトルエンを加え、10 %食塩水で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーで精製し、化合物Cを得た。以下に化合物Cの1H−NMRおよび13C−NMRの測定結果を示す。1H−NMR(400 MHz, CDCl3): δH 3.50(s, 1H), 7.53(d, 1H),7.51−7.55(m, 1H), 7.61(ddd, 1H), 7.74(d, 1H), 7.80(d, 1H), 8.29(d, 1H).13C−NMR(100 MHz,CDCl3): δC 82.5, 83.2, 122.3, 126.8, 127.4,127.5, 127.9, 128.0,128.2, 129.3, 132.1, 133.9.
Synthesis of Compound C 30 g (98.9 mmol) of Compound B , methanol 15 in a 500 ml eggplant flask under a nitrogen atmosphere
0 ml and 1.37 g (9.91 mmol) of potassium carbonate were added and stirred at room temperature for 2 hours. After completion of the reaction, toluene was added to the reaction solution and washed with 10% brine, and the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography to obtain Compound C. The measurement results of 1 H-NMR and 13 C-NMR of Compound C are shown below. 1 H-NMR (400 MHz, CDCl 3 ): δ H 3.50 (s, 1H), 7.53 (d, 1H), 7.51-7.55 (m, 1H), 7.61 (ddd , 1H), 7.74 (d, 1H), 7.80 (d, 1H), 8.29 (d, 1H). 13 C-NMR (100 MHz, CDCl 3): δ C 82.5, 83.2, 122.3, 126.8, 127.4,127.5, 127.9, 128.0,128.2, 129.3, 132.1, 133.9.
化合物Dの合成窒素雰囲気下、1L四つ口フラスコに化合物A 29g(81.7mmol)、DMF180ml、トリエチルアミン70ml、テトラキストリフェニルホスフィンパラジウム 1.41g(1.22mmol)、ヨウ化銅(I)232mg(1.22mmol)を加え、50℃まで加熱し化合物C17.9g(77.4mmol)のDMF180ml溶液を約4時間かけて滴下し、滴下後10時間撹拌した。反応終了後、反応溶液にトルエンを加え、10%食塩水で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーと熱洗浄で精製し、化合物Dを得た。以下に化合物Dの1H−NMRおよび13C−NMRの測定結果を示す。1H−NMR(400 MHz, CDCl3): δH 7.55(ddd, 2H), 7.62(ddd, 2H), 7.69(d, 2H), 7.80(d, 2H), 7.83(d, 2H), 8.34(d, 2H).13C−NMR(100 MHz,CDCl3): δC 94.5, 123.3, 126.7, 127.4, 127.5, 127.9, 128.0,128.2, 129.2, 132.3, 133.9. Synthesis of Compound D Under a nitrogen atmosphere, 29 g (81.7 mmol) of Compound A , 180 ml of DMF, 70 ml of triethylamine, 1.41 g (1.22 mmol) of tetrakistriphenylphosphine palladium, 232 mg of copper (I) iodide (1 mg) 1.22 mmol) was added, and the mixture was heated to 50 ° C., and a solution of 17.9 g (77.4 mmol) of Compound C in 180 ml of DMF was added dropwise over about 4 hours, followed by stirring for 10 hours. After completion of the reaction, toluene was added to the reaction solution and washed with 10% brine, and the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography and hot washing to obtain Compound D. The measurement results of 1 H-NMR and 13 C-NMR of Compound D are shown below. 1 H-NMR (400 MHz, CDCl 3 ): δ H 7.55 (ddd, 2H), 7.62 (ddd, 2H), 7.69 (d, 2H), 7.80 (d, 2H), 7.83 (d, 2H), 8.34 (d, 2H). 13 C-NMR (100 MHz, CDCl 3 ): δ C 94.5, 123.3, 126.7, 127.4, 127.5, 127.9, 128.0, 128.2, 129.2 132.3, 133.9.
化合物Eの合成窒素雰囲気下、1L四つ口フラスコに化合物D 7.0g(16.1mmol)、THF 500mlを加え、−70℃まで冷却後2.69Mブチルリチウムのヘキサン溶液(13.1ml)を加え、1時間撹拌した。撹拌後、硫黄粉末 1.03g(32.1mmol)を加え、徐々に−20℃まで昇温させた。−20℃でヨードメタン2.5ml(40.1mmol)を加え、室温まで昇温した。反応終了後、反応溶液に7%希塩酸(200ml)とトルエンを加え、5%炭酸水素ナトリウム水溶液、10%食塩水の順で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーと再結晶で精製し、化合物Eを得た。1H−NMR(400 MHz, CDCl3): δH 2.63(s, 6H), 7.52(ddd, 2H),7.61(ddd, 2H), 7.73(d, 2H), 7.80(d,2H), 7.83(d, 2H),8.74(d, 2H).13C−NMR(100 MHz,CDCl3): δC 95.0, 126.7, 126.8,127.2, 127.3, 128.4, 128.6, 129.5, 133.5, 134.7, 137.2. Synthesis of Compound E In a nitrogen atmosphere, 7.0 g (16.1 mmol) of Compound D and 500 ml of THF were added to a 1 L four-necked flask, cooled to −70 ° C., and then a 2.69 M butyllithium hexane solution (13.1 ml). Added and stirred for 1 hour. After stirring, 1.03 g (32.1 mmol) of sulfur powder was added, and the temperature was gradually raised to -20 ° C. At −20 ° C., 2.5 ml (40.1 mmol) of iodomethane was added, and the temperature was raised to room temperature. After completion of the reaction, 7% dilute hydrochloric acid (200 ml) and toluene were added to the reaction solution, and the mixture was washed with 5% aqueous sodium hydrogen carbonate solution and 10% brine in that order. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography and recrystallization to obtain Compound E. 1 H-NMR (400 MHz, CDCl 3 ): δ H 2.63 (s, 6H), 7.52 (ddd, 2H), 7.61 (ddd, 2H), 7.73 (d, 2H), 7.80 (d, 2H), 7.83 (d, 2H), 8.74 (d, 2H). 13 C-NMR (100 MHz, CDCl 3 ): δ C 95.0, 126.7, 126.8, 127.2, 127.3, 128.4, 128.6, 129.5, 133.5, 134.7, 137.2.
化合物Fの合成窒素雰囲気下、30ml三つ口フラスコに化合物Eを200mg(0.56mmol)、クロロホルム 1.5ml、ヨウ素28.8g(11.3mmol)を加え、24時間還流させた。反応溶液を5%チオ硫酸ナトリウム水溶液、10%食塩水の順で洗浄し、その有機層を硫酸マグネシウムで乾燥し、減圧濃縮した。得られた粗体をカラムクロマトグラフィーで精製し、化合物Fを得た。1H−NMR(400 MHz, CDCl2CDCl2): δH 7.54(t, 2H), 7.62(t, 2H),7.86(d, 2H), 7.96(d, 2H), 7.97(d, 2H), 8.16(d, 2H).IR(KBr): 3022,1890,1612,1589,1514,1431,1379,1321,1255,1137,1056,983,806,744,665,538 cm−1.Mass (m/z,%) 340 (100)(M+),170 (40). Synthesis of Compound F Under a nitrogen atmosphere, 200 mg (0.56 mmol) of Compound E , 1.5 ml of chloroform and 28.8 g (11.3 mmol) of iodine were added to a 30 ml three-necked flask and refluxed for 24 hours. The reaction solution was washed with 5% aqueous sodium thiosulfate solution and 10% brine in that order, and the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The resulting crude product was purified by column chromatography to obtain Compound F. 1 H-NMR (400 MHz, CDCl 2 CDCl 2 ): δ H 7.54 (t, 2H), 7.62 (t, 2H), 7.86 (d, 2H), 7.96 (d, 2H) ), 7.97 (d, 2H), 8.16 (d, 2H). IR (KBr): 3022, 1890, 1612, 1589, 1514, 1431, 1379, 1321, 1255, 1137, 1056, 983, 806, 744, 665, 538 cm −1 . Mass (m / z,%) 340 (100) (M + ), 170 (40).
図1、図2、に1,2−DNTT、2,1−DNTT、2,3−DNTTのUV吸収端のスペクトルとその重ね書きを示す。これらの図から、本願発明の1,2−DNTTが紫外線領域での吸収が高いことがわかる。 The spectrum of the UV absorption edge of 1,2-DNTT, 2,1-DNTT, 2,3-DNTT and its overwriting are shown in FIGS. From these figures, it can be seen that 1,2-DNTT of the present invention has high absorption in the ultraviolet region.
本発明である1,2−DNTTを用いた有機半導体デバイスの使用例を、図3及び図4に示す。図3では、電界効果トランジスタ(以下FETとする。)での使用例を挙げている。FETはその特徴から、スイッチング素子や増幅素子として利用される。ゲート電流が低いことに加え、構造が平面的であるため、ウェットプロセスによる作製や集積化が容易であり大面積化を可能とする。ここでは、1,2−DNTTは、主にp型半導体として利用されているが、置換基、溶剤によってn型半導体として機能する場合もある。 また、図4では有機薄膜太陽電池での使用例を挙げている。図4に示す共蒸着層とは、p型とn型を一緒に蒸着させた層であり、この層で太陽光により正孔と電子により分離させやすくするためである。 Examples of use of organic semiconductor devices using 1,2-DNTT according to the present invention are shown in FIGS. FIG. 3 shows an example of use in a field effect transistor (hereinafter referred to as FET). FETs are used as switching elements and amplifying elements because of their characteristics. In addition to a low gate current, the structure is planar, so that fabrication and integration by a wet process are easy and a large area can be achieved. Here, 1,2-DNTT is mainly used as a p-type semiconductor, but may function as an n-type semiconductor depending on a substituent and a solvent. FIG. 4 shows an example of use in an organic thin film solar cell. The co-evaporation layer shown in FIG. 4 is a layer in which p-type and n-type are vapor-deposited together, and this layer is intended to facilitate separation by holes and electrons by sunlight.
本発明の1,2−DNTTは、紫外線領域での光吸収効率が高いことから、太陽電池として有効活用が期待される。また、1,2−DNTTに種々の置換基を導入することによってさらなる溶解性の向上や、移動度の向上が期待でき、半導体デバイス等に今後多いに利用されると思われる。 The 1,2-DNTT of the present invention is expected to be effectively used as a solar cell because of its high light absorption efficiency in the ultraviolet region. In addition, by introducing various substituents into 1,2-DNTT, further improvement in solubility and mobility can be expected, and it is expected to be widely used in semiconductor devices and the like in the future.
1 有機半導体を使用したFET 2 有機半導体 3 絶縁膜 4 ゲート 41 ゲート絶縁膜 5 ドレイン 6 ソース7 エミッター 8 コレクター 9 ベース 10 基板(プラスチック) 11 電極 12 n型半導体 13 p型半導体14 共蒸着層 15 ITO (Indium Tin Oxide) DESCRIPTION OF SYMBOLS 1 FET using organic semiconductor 2 Organic semiconductor 3 Insulating film 4 Gate 41 Gate insulating film 5 Drain 6 Source 7 Emitter 8 Collector 9 Base 10 Substrate (plastic) 11 Electrode 12 N-type semiconductor 13 P-type semiconductor 14 Co-deposition layer 15 ITO (Indium Tin Oxide)
Claims (3)
[化1]
ただし、化学式[化1]中の置換基R1から R12は、水素原子及びハロゲン原子、アリール基、複素環基、アルキル基、フルオロアルキル基、アルケニル基、フルオロアルケニル基、アルキニル基、フルオロアルキニル基、アルコキシル基、フルオロアルコキシル基、アミノ基、アミド基、イミノ基、カルボキシル基、ヒドロキシル基、エステル基、ニトロ基、ニトリル基、スルフィド基、メルカプト基、スルホニル基、シリル基のうち、少なくとも一つを含んでいる。 Following chemical formula Ru represented by [Chemical Formula 1, the organic semiconductor material characterized Ji eno thiophene skeleton.
[Chemical 1]
However, from the substituent R 1 in the chemical formula [Chemical Formula 1] R 12 represents a hydrogen atom and a halogen atom, aryl group, heterocyclic group, alkyl group, fluoroalkyl group, alkenyl group, fluoroalkenyl group, alkynyl group, fluoroalkynyl group, alkoxyl group, fluoroalkoxyl group, amino group, amide group , An imino group, a carboxyl group, a hydroxyl group, an ester group, a nitro group, a nitrile group, a sulfide group, a mercapto group, a sulfonyl group, and a silyl group.
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