JP5436959B2 - Workpiece holding material manufacturing method - Google Patents

Workpiece holding material manufacturing method Download PDF

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JP5436959B2
JP5436959B2 JP2009165414A JP2009165414A JP5436959B2 JP 5436959 B2 JP5436959 B2 JP 5436959B2 JP 2009165414 A JP2009165414 A JP 2009165414A JP 2009165414 A JP2009165414 A JP 2009165414A JP 5436959 B2 JP5436959 B2 JP 5436959B2
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foam layer
smooth
workpiece holding
workpiece
base material
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JP2011020189A (en
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智史 玉川
克昌 川端
英伸 水本
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Nitta DuPont Inc
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Nitta Haas Inc
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Description

本発明は、研磨加工などの加工が施される被加工物を保持する被加工物保持材の製造方法に関する。 The present invention relates to the production how the workpiece holding member for holding a workpiece to processing such as polishing is performed.

半導体ウェハやLCD用ガラス等の被加工物の研磨加工は、例えば、次のようにして行なわれる。すなわち、図14に示すように、研磨装置の上下に対向する定盤の上側定盤9に、研磨加工が施される被加工物10を保持し、下側定盤11に、研磨パッド12を貼り付け、被加工物10の表面を研磨パッド12に圧接させつつ両定盤間に砥粒を含む研磨液を供給しながら両定盤9,11を矢符で示すように相対回転させることにより行なわれる。   Polishing of a workpiece such as a semiconductor wafer or LCD glass is performed as follows, for example. That is, as shown in FIG. 14, the workpiece 10 to be polished is held on the upper surface plate 9 of the surface plate facing the upper and lower sides of the polishing apparatus, and the polishing pad 12 is held on the lower surface plate 11. By pasting the surface of the workpiece 10 against the polishing pad 12 and supplying a polishing liquid containing abrasive grains between the two surface plates, the surface plates 9 and 11 are relatively rotated as indicated by arrows. Done.

従来、被加工物10は、上側定盤9に固定されて被加工物10の裏面を吸着保持する被加工物保持材としてのバッキング材13と、被加工物10の外周を取り囲んで被加工物10がバッキング材13表面で位置ずれするのを防止する枠状のテンプレート14とを用いて上側定盤9に保持される(例えば、特許文献1参照)。   Conventionally, the workpiece 10 is fixed to the upper surface plate 9 and surrounds the backing material 13 as a workpiece holding material that sucks and holds the back surface of the workpiece 10 and the outer periphery of the workpiece 10. 10 is held on the upper surface plate 9 using a frame-shaped template 14 that prevents the position of the back 10 from shifting on the surface of the backing material 13 (see, for example, Patent Document 1).

上記バッキング材13としては、例えば、基材に塗工したウレタン樹脂のDMF(ジメチルホルムアミド)溶液層を水中にて湿式凝固させ、温水中で洗浄、熱風で乾燥を行って、図15(a)に示すように基材1上に発泡層2を形成し、所要の厚みに揃えるなどの目的で、図15(b)に示すように、前記発泡層2の表面2aをバフ加工したものが用いられる(例えば、特許文献2参照)。   As the backing material 13, for example, a DMF (dimethylformamide) solution layer of urethane resin applied to a base material is wet-coagulated in water, washed in warm water, and dried with hot air. As shown in FIG. 15, for the purpose of forming the foamed layer 2 on the substrate 1 and aligning it with a required thickness, the surface 2 a of the foamed layer 2 buffed as shown in FIG. 15B is used. (See, for example, Patent Document 2).

前記バフ加工後の発泡層2の表面2a−2は、被加工物を吸着保持する保持面となるのであるが、バフ加工では、十分な平滑面が得られず、このため、被加工物の吸着保持力が不十分となっていた。   The surface 2a-2 of the foamed layer 2 after the buffing serves as a holding surface for adsorbing and holding the workpiece. However, the buffing does not provide a sufficiently smooth surface. Adsorption holding power was insufficient.

このため、図16(a)に示すように、基材1上に形成された発泡層2の表面2aをバフ加工することなく、図16(b)に示すように、基材1から発泡層2を剥離し、図16(c)に示すように、表面2aを平坦な圧接ローラ7に圧接し、図16(d)に示すように発泡層2の裏面2b側をバフ加工した後、図16(e)に示すように両面テープ8等に再び接着したバッキング材がある(例えば、特許文献3参照)。   For this reason, as shown in FIG. 16A, without buffing the surface 2a of the foam layer 2 formed on the base material 1, as shown in FIG. 16 is peeled off, the surface 2a is pressed against the flat pressure roller 7 as shown in FIG. 16C, and the back surface 2b side of the foam layer 2 is buffed as shown in FIG. As shown in FIG. 16 (e), there is a backing material which is adhered again to the double-sided tape 8 or the like (for example, see Patent Document 3).

特開平09−321001号公報JP 09-32001 A 特許第3187769号Japanese Patent No. 3187769 特開2006−62058号公報JP 2006-62058 A

かかるバッキング材では、バフ加工を施していない発泡層2の表面2aを、被加工物を吸着保持する保持面とするので、発泡層2の表面2aを、バフ加工する従来例に比べて吸着保持力が向上するが、発泡の際のばらつきなどに起因して発泡層の表面の平滑度が必ずしも十分でない。   In such a backing material, the surface 2a of the foamed layer 2 that has not been buffed is used as a retaining surface for adsorbing and holding the workpiece, so that the surface 2a of the foamed layer 2 is adsorbed and retained as compared with the conventional example in which buffing is performed. Although the force is improved, the smoothness of the surface of the foam layer is not always sufficient due to variations in foaming.

また、図16(c)に示すように発泡層2の裏面2bをバフ加工するために、気泡(ポア)15が開口した孔16内に、バフ粉が残留し、発泡層2の圧縮変形を妨げ、部分的に圧縮変形率に差が生じて被加工物の品質が悪化したり、両面テープ8との貼り合わせ界面にバフ粉が存在して粘着力を低下させるといった難点もある。   Also, as shown in FIG. 16C, in order to buff the back surface 2b of the foam layer 2, buff powder remains in the holes 16 in which the bubbles 15 are opened, and the foam layer 2 is compressed and deformed. There is also a problem in that the quality of the workpiece is deteriorated due to a partial difference in compression deformation rate, and the buffing powder is present at the bonding interface with the double-sided tape 8 to reduce the adhesive force.

さらに、かかるバッキング材では、発泡による多数の気泡(ポア)を有しており、被加工物の研磨加工の際には、被加工物を保持する表面(保持面)から研磨液が浸透して、被加工物の平坦度を悪化させたり、裏面側の基材や両面テープとの接着強度が弱くなって、基材や両面テープから剥がれる場合がある。   Furthermore, such a backing material has a large number of bubbles (pores) due to foaming, and the polishing liquid permeates from the surface (holding surface) that holds the workpiece when polishing the workpiece. In some cases, the flatness of the workpiece is deteriorated, or the adhesive strength with the base material or the double-sided tape on the back surface side is weakened, and the workpiece is peeled off from the base material or the double-sided tape.

また、湿式凝固による発泡ウレタンは、表面に多数の気泡が開口しているので、表面から亀裂が入って破断しやすく、被研磨物の脱着時に被加工物保持材を破損してしまう場合がある。   In addition, urethane foam by wet coagulation has many air bubbles on the surface, so it is easy to break due to cracks from the surface, and the workpiece holding material may be damaged when the workpiece is detached. .

本発明は、上述のような点に鑑みて為されたものであって、被加工物を保持する被加工物保持材の保持力を高めるとともに、バフ加工を不要とし、更に、表裏面からの研磨液などの水分の浸透を抑制できるとともに、表裏面の強度を高めた被加工物保持材の製造方法を提供することを目的とする。 The present invention has been made in view of the above-described points, and enhances the holding force of the workpiece holding material that holds the workpiece, eliminates the need for buffing, and further from the front and back surfaces. with the penetration of moisture, such as the polishing liquid can be suppressed, and an object thereof is to provide a manufacturing how the workpiece holding member having an increased strength of the front and back surfaces.

本発明では、上記目的を達成するために、次のように構成している。   In order to achieve the above object, the present invention is configured as follows.

本発明の被加工物保持材の製造方法は、基材に、樹脂溶液を塗工し、湿式凝固して発泡層を形成する発泡層形成工程と、前記発泡層が形成された基材を、平滑な平滑部材で挟んで加熱加圧する加熱加圧工程と、前記平滑部材を、前記発泡層が形成された基材からそれぞれ剥離する平滑部材剥離工程とを含んでいる。   The manufacturing method of the workpiece holding material of the present invention includes a foam layer forming step in which a resin solution is applied to a base material and wet-solidified to form a foam layer, and the base material on which the foam layer is formed. It includes a heating and pressing step of heating and pressurizing with a smooth smooth member and a smoothing member peeling step of peeling the smoothing member from the base material on which the foam layer is formed.

平滑部材は、少なくとも発泡層形成工程で形成される発泡層の表面よりも平滑であればよい。   The smooth member should just be smoother than the surface of the foam layer formed at least by a foam layer formation process.

前記加熱加圧工程では、発泡層が形成された基材の両面に平滑部材をそれぞれ重ねて同時に加熱加圧してもよいし、一方の面に平滑部材を重ねて加熱加圧した後、他方の面に平滑部材を重ねて加熱加圧してもよい。   In the heating and pressing step, smooth members may be overlapped on both sides of the base material on which the foam layer is formed and simultaneously heated and pressurized, or after smooth members are stacked on one side and heated and pressed, A smooth member may be stacked on the surface and heated and pressed.

本発明によると、発泡層が形成された基材の両面を、平滑な平滑部材で挟んで加熱加圧した後、平滑部材を剥離するので、被加工物を保持する保持面となる発泡層の表面は、従来例に比べて平滑なものとなり、被加工物を保持するための吸着保持力が向上する。また、発泡層の表面および裏面のいずれもバフ加工を施さないので、気泡(ポア)が開口して形成される孔内に、バフ粉が残留するといったこともない。更に、発泡層の表面には、加熱加圧によって、押し潰された平滑で緻密な層が形成されているので、研磨加工の際の研磨液の浸透が、表面の緻密な層によって阻止されることになり、被加工物の平坦度を悪化させたり、発泡層が基材や両面テープから剥離するのを抑制することができる。   According to the present invention, the both sides of the base material on which the foam layer is formed are sandwiched between smooth smooth members and heated and pressurized, and then the smooth member is peeled off. The surface becomes smoother than that of the conventional example, and the suction holding force for holding the workpiece is improved. In addition, since neither the front surface nor the back surface of the foam layer is subjected to buffing, buff powder does not remain in the hole formed by opening bubbles (pores). Further, since a smooth and dense layer that is crushed by heat and pressure is formed on the surface of the foamed layer, the penetration of the polishing liquid during the polishing process is prevented by the dense layer on the surface. That is, the flatness of the workpiece can be deteriorated, and the foamed layer can be prevented from peeling from the base material or the double-sided tape.

また、発泡層の表面の緻密な層によって、表面の強度が高まり、破断しにくいものとなる。   Further, the dense layer on the surface of the foam layer increases the strength of the surface and makes it difficult to break.

好ましい実施形態では、前記加熱加圧工程に先立って、前記発泡層から前記基材を剥離する基材剥離工程を含み、前記加熱加圧工程では、前記基材が剥離された前記発泡層を、前記平滑部材で挟んで加熱加圧するものである。   In a preferred embodiment, prior to the heating and pressurizing step, a base material peeling step of peeling the base material from the foamed layer is included, and in the heating and pressurizing step, the foamed layer from which the base material has been peeled off, It is heated and pressed between the smooth members.

発泡層形成工程では、湿式発泡の際に、発泡層が若干収縮するのに対して、樹脂フィルム等からなる基材が収縮しないために、発泡層に歪が生じる。この歪が、被研磨物を保持する発泡層の表面に筋となって現れ、例えば、2psi以下の低圧研磨においては、前記筋を押し潰すことができないために、研磨面に影響を及ぼす場合がある。この実施形態では、発泡層から基材を剥離するので、発泡層の歪が解放されることになり、これによって、歪に起因する上記のような不具合が生じることもない。   In the foam layer forming step, the foam layer shrinks slightly during wet foaming, whereas the base material made of a resin film or the like does not shrink, so that the foam layer is distorted. This distortion appears as a streak on the surface of the foam layer that holds the object to be polished. For example, in low-pressure polishing of 2 psi or less, the streak cannot be crushed, which may affect the polished surface. is there. In this embodiment, since the base material is peeled from the foamed layer, the strain of the foamed layer is released, so that the above-described problems caused by the strain do not occur.

更に、この実施形態では、発泡層の表面のみならず、裏面にも、加熱加圧によって、押し潰された平滑で緻密な層が形成されるので、研磨加工の際の研磨液の浸透が、表裏面の緻密な層によって阻止されることになり、被加工物の平坦度を悪化させたり、発泡層が基材や両面テープから剥離するのを抑制することができる。また、発泡層の表裏面の緻密な層によって、表裏面の強度が高まり、破断しにくいものとなる。   Furthermore, in this embodiment, since not only the surface of the foam layer but also the back surface is formed by a heat and pressure, a smooth and dense layer that is crushed is formed. It will be blocked by the dense layers on the front and back surfaces, and the flatness of the workpiece can be deteriorated, and the foamed layer can be prevented from peeling off from the substrate or the double-sided tape. In addition, the dense layers on the front and back surfaces of the foam layer increase the strength of the front and back surfaces and make it difficult to break.

一つの実施形態では、前記平滑部材が、フィルム状またはシート状であり、前記平滑部材剥離工程で前記平滑部材を剥離した前記発泡層の片面に、両面テープを貼り付ける工程を含んでいる。   In one embodiment, the smooth member is in the form of a film or a sheet, and includes a step of attaching a double-sided tape to one side of the foam layer from which the smooth member has been peeled off in the smooth member peeling step.

この実施形態によると、発泡層の片面を裏面として両面テープを貼り付け、発泡層の表面を、被加工物保持材を保持する保持面とすることができる。   According to this embodiment, a double-sided tape can be applied with one side of the foam layer as the back surface, and the surface of the foam layer can be used as a holding surface for holding the workpiece holding material.

他の実施形態では、前記加熱加圧工程では、前記発泡層が形成された基材または前記発泡層を前記平滑部材で挟んで、少なくとも一方がヒートロールである2本のロール間を通過させるものである。前記ヒートロールの温度は、平滑部材が溶融しない70℃〜200℃であるのが好ましい。   In another embodiment, in the heating and pressurizing step, the base material on which the foam layer is formed or the foam layer is sandwiched between the smooth members, and at least one is passed between two rolls that are heat rolls. It is. The temperature of the heat roll is preferably 70 ° C. to 200 ° C. at which the smooth member does not melt.

この実施形態によると、2本のロール間を通過させることで、容易に加熱加圧できるとともに、ヒートロールの温度、通過速度やロール間の隙間等の条件の選択によって、発泡層の平滑性や厚み等の特性を調整することができる。   According to this embodiment, by passing between two rolls, it can be easily heated and pressurized, and by selecting conditions such as the temperature of the heat roll, the passing speed and the gap between the rolls, Properties such as thickness can be adjusted.

好ましい実施形態では、前記樹脂溶液が、ウレタン樹脂溶液であり、前記基材および前記平滑部材が、樹脂フィルムである。   In a preferred embodiment, the resin solution is a urethane resin solution, and the base material and the smooth member are resin films.

本発明の被加工物保持材の製造方法によれば、発泡層が形成された基材を平滑部材で挟んで、加熱加圧した後、平滑部材を剥離するので、被加工物を保持する保持面となる発泡層の表面は、従来例に比べて平滑なものとなり、被加工物を保持するための吸着保持力が向上する。また、発泡層の表面および裏面のいずれもバフ加工を施さないので、気泡(ポア)が開口して形成される孔内に、バフ粉が残留するといったこともない。   According to the method for manufacturing a workpiece holding material of the present invention, the substrate on which the foam layer is formed is sandwiched between the smooth members, heated and pressurized, and then the smooth member is peeled off. The surface of the foam layer that becomes the surface is smoother than that of the conventional example, and the suction holding force for holding the workpiece is improved. In addition, since neither the front surface nor the back surface of the foam layer is subjected to buffing, buff powder does not remain in the hole formed by opening bubbles (pores).

さらに、発泡層の表面には、平滑で緻密な層が形成されるので、研磨加工の際の研磨液の浸透が、表面の緻密な層によって阻止されることになり、被加工物の平坦度を悪化させたり、発泡層が、両面テープから剥がれるのを抑制することができる。   Further, since a smooth and dense layer is formed on the surface of the foam layer, the penetration of the polishing liquid during the polishing process is prevented by the dense layer on the surface, and the flatness of the work piece It is possible to prevent the foam layer from peeling off from the double-sided tape.

また、発泡層の表面は、気泡が潰されて緻密な層となっているので、表面の強度が高まり、破断しにくいものとなる。   In addition, since the surface of the foam layer is a dense layer in which bubbles are crushed, the strength of the surface is increased and it is difficult to break.

本発明の一つの実施の形態に係る被加工物保持材の製造工程を示す図である。It is a figure which shows the manufacturing process of the workpiece holding material which concerns on one embodiment of this invention. ヒートロールによる加熱加圧工程を示す図である。It is a figure which shows the heating-pressing process by a heat roll. 比較例の500倍の表面側の走査型電子顕微鏡写真である。It is a scanning electron micrograph of the surface side 500 times of a comparative example. 実施例の500倍の表面側の走査型電子顕微鏡写真である。It is a scanning electron micrograph of the surface side 500 times of an Example. 比較例の2000倍の表面側の走査型電子顕微鏡写真である。It is the scanning electron micrograph of the surface side 2000 times of a comparative example. 実施例の2000倍の表面側の走査型電子顕微鏡写真である。It is the scanning electron micrograph of the surface side 2000 times of an Example. 比較例の1000倍の裏面の走査型電子顕微鏡写真である。It is a scanning electron micrograph of the back surface 1000 times of a comparative example. 実施例の1000倍の裏面の走査型電子顕微鏡写真である。It is a scanning electron micrograph of the back surface 1000 times of an Example. 比較例の表面のうねり曲線を示す図である。It is a figure which shows the waviness curve of the surface of a comparative example. 実施例の表面のうねり曲線を示す図である。It is a figure which shows the waviness curve of the surface of an Example. 別の比較例の表面のうねり曲線を示す図である。It is a figure which shows the waviness curve of the surface of another comparative example. 別の実施例の表面のうねり曲線を示す図である。It is a figure which shows the waviness curve of the surface of another Example. 本発明の他の実施の形態に係る被加工物保持材の製造工程を示す図である。It is a figure which shows the manufacturing process of the workpiece holding material which concerns on other embodiment of this invention. 研磨装置の概略構成図である。It is a schematic block diagram of a grinding | polishing apparatus. 従来例の製造工程を示す図である。It is a figure which shows the manufacturing process of a prior art example. 別の従来例の製造工程を示す図である。It is a figure which shows the manufacturing process of another prior art example.

以下、図面によって本発明の実施の形態について詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

図1は、本発明の実施形態に係る被加工物保持材の製造方法を示す図である。   FIG. 1 is a diagram illustrating a method for manufacturing a workpiece holding material according to an embodiment of the present invention.

この実施形態の被加工物保持材の製造方法では、先ず、ウレタン樹脂のDMF(ジメチルホルムアミド)溶液を、PETフィルム等の基材1上に塗工し、湿式凝固法により、図1(a)に示すように、基材1上に、涙滴状の気泡などの多数の気泡を有する多孔質の発泡層2を形成する。この発泡層2を、図1(b)に示すように基材1から剥離する。   In the method for manufacturing a workpiece holding material of this embodiment, first, a DMF (dimethylformamide) solution of a urethane resin is applied onto a base material 1 such as a PET film, and the wet coagulation method is used to perform FIG. As shown in FIG. 2, a porous foam layer 2 having a large number of bubbles such as teardrop-shaped bubbles is formed on the substrate 1. The foam layer 2 is peeled from the substrate 1 as shown in FIG.

湿式凝固法によって、発泡層2を形成する工程では、湿式発泡の際に、発泡層が若干収縮するのに対して、PETフィルム等からなる基材1が収縮しないために、発泡層2に歪が生じ、この歪が、被研磨物を保持する発泡層2の表面に筋となって現れ、例えば、2psi以下の低圧研磨においては、前記筋を押し潰すことができないために、研磨面に影響を及ぼす場合があるが、この実施形態では、発泡層2から基材1を剥離するので、発泡層2の歪が解放されることになり、これによって、歪に起因する上記のような不具合が生じることもない。   In the step of forming the foamed layer 2 by the wet coagulation method, the foamed layer contracts slightly during the wet foaming, whereas the base material 1 made of PET film or the like does not contract, so that the foamed layer 2 is distorted. This distortion appears as a streak on the surface of the foamed layer 2 that holds the object to be polished. For example, in low-pressure polishing of 2 psi or less, the streak cannot be crushed, which affects the polished surface. However, in this embodiment, since the base material 1 is peeled from the foam layer 2, the strain of the foam layer 2 is released, thereby causing the above-described problems caused by the strain. It does not occur.

次に、発泡層2の表裏両面2a,2bに図1(c)に示すように、平滑部材としてのPETフィルム等の樹脂フィルム3をそれぞれ重ね、2本のヒートロール間を通過させることによって図1(d)に示すように加熱加圧して一体化する。   Next, as shown in FIG. 1C, the front and back surfaces 2a and 2b of the foam layer 2 are overlapped with a resin film 3 such as a PET film as a smooth member, and passed between two heat rolls. As shown in FIG. 1 (d), they are heated and pressurized to be integrated.

その後、表裏面の樹脂フィルム3を図1(e)に示すように剥離し、裏面2b−1に両面テープ4を貼り付けて図1(f)に示すように表面2a−1を被加工物の保持面とした被加工物保持材を得る。   Thereafter, the resin film 3 on the front and back surfaces is peeled off as shown in FIG. 1 (e), the double-sided tape 4 is attached to the back surface 2b-1, and the surface 2a-1 is processed as shown in FIG. 1 (f). A workpiece holding material having a holding surface is obtained.

この実施形態の被加工物保持材では、発泡層2に樹脂フィルム3を重ねてヒートロールによる加熱加圧を行うので、発泡層2の表面2a−1および裏面2b−1は、基材1に樹脂溶液を塗工して、湿式凝固されてなる発泡層2の表面2aおよび裏面2bに比べて、平滑である。特に、被加工物を保持する保持面となる発泡層2の表面2a−1は、後述のように、うねり曲線要素の高さの最大値(Wcmax)が3μm以内の平滑面となっている。   In the workpiece holding material of this embodiment, since the resin film 3 is superimposed on the foam layer 2 and heated and pressurized by a heat roll, the front surface 2a-1 and the back surface 2b-1 of the foam layer 2 are formed on the base material 1. Compared to the front surface 2a and back surface 2b of the foamed layer 2 formed by applying a resin solution and wet coagulating, it is smooth. In particular, the surface 2a-1 of the foam layer 2 serving as a holding surface for holding the workpiece is a smooth surface having a maximum value (Wcmax) of the waviness curve element within 3 μm, as will be described later.

また、発泡層2の裏面2b−1は、バフ加工を行わないので、図16(d)のように涙滴状の気泡が開口していない。   Further, since the back surface 2b-1 of the foam layer 2 is not buffed, no teardrop-shaped bubbles are opened as shown in FIG.

発泡層2を形成するためのウレタン樹脂としては、ポリエステル系、ポリエーテル系、ポリカーボネート系などのウレタン樹脂を用いることができ、異なる種類のウレタン樹脂をブレンドしてもよい。   As the urethane resin for forming the foamed layer 2, a urethane resin such as polyester, polyether, or polycarbonate can be used, and different types of urethane resins may be blended.

ウレタン樹脂を溶解させる水溶性有機溶媒としては、上述のジメチルホルムアミドの他、例えば、ジメチルスルホキシド、テトラヒドロフラン、ジメチルアセトアミド等の溶媒を用いることができる。   As the water-soluble organic solvent for dissolving the urethane resin, for example, a solvent such as dimethyl sulfoxide, tetrahydrofuran, dimethylacetamide or the like can be used in addition to the above-mentioned dimethylformamide.

この実施形態の被加工物保持材の製造方法では、基材1から剥がした発泡層2の表裏両面2a,2bに、平滑な樹脂フィルム3を挟んでヒートロールで加熱加圧した後、樹脂フィルム3を剥がすので、発泡層2の表裏両面2a−1,2b−1は平滑なものとなり、したがって、被加工物保持材を保持する保持面となる発泡層2の表面2a−1の吸着保持力が向上する。   In the manufacturing method of the workpiece holding material of this embodiment, the resin film is heated and pressed with a heat roll with the smooth resin film 3 sandwiched between the front and back surfaces 2a and 2b of the foam layer 2 peeled off from the substrate 1. 3 is peeled off, the front and back surfaces 2a-1 and 2b-1 of the foam layer 2 are smooth, and therefore, the adsorption holding force of the surface 2a-1 of the foam layer 2 serving as a holding surface for holding the workpiece holding material. Will improve.

更に、発泡層2の表裏両面2a−1,2b−1は、加熱加圧によって、気泡(ポア)等が押し潰された平滑で緻密な層が形成されており、研磨加工する際に、研磨液の浸透が表裏面の緻密な層によって阻止されることになる。これによって、被加工物の平坦度を悪化させたり、発泡層2が、両面テープ4から剥がれるのを抑制することができる。また、表裏両面2a−1,2b−1は、気泡が押し潰されて緻密な層となっているので、強度が高まり、破断しにくいものとなり、被研磨物の脱着時に被加工物保持材が破損するのを防止することができる。   Further, the front and back surfaces 2a-1 and 2b-1 of the foam layer 2 are formed with smooth and dense layers in which bubbles (pores) are crushed by heat and pressure. The penetration of the liquid is prevented by the dense layers on the front and back surfaces. Thereby, the flatness of the workpiece can be deteriorated, and the foam layer 2 can be prevented from being peeled off from the double-sided tape 4. Further, the front and back surfaces 2a-1 and 2b-1 are dense layers formed by crushing bubbles, so that the strength is increased and the material is not easily broken. It can be prevented from being damaged.

この発泡層2の表面2a−1について、次のようにして評価を行った。すなわち、図1(c)に示すように、表裏両面2a,2bに、平滑な樹脂フィルム3を重ねて厚みを1.2mmとした発泡層2を、図2に示すように間隙が1.0mmで、150℃の上下のヒートロール5,6間を1.0m/minで通過させ、その後、樹脂フィルム3を剥離した表面、すなわち、図1(e)に示される実施例の発泡層2の表面2a−1を、走査型電子顕微鏡(SEM)によって観察するとともに、後述の測定装置によって表面うねりを計測した。また、樹脂フィルム3を剥離した裏面、すなわち、図1(e)に示される裏面2b−1を、走査型電子顕微鏡(SEM)によって観察した。   The surface 2a-1 of the foam layer 2 was evaluated as follows. That is, as shown in FIG. 1 (c), the foamed layer 2 having a thickness of 1.2 mm by overlapping a smooth resin film 3 on both the front and back surfaces 2a and 2b has a gap of 1.0 mm as shown in FIG. Then, it passes between the upper and lower heat rolls 5 and 6 at 150 ° C. at 1.0 m / min, and then the surface from which the resin film 3 is peeled, that is, the foam layer 2 of the embodiment shown in FIG. The surface 2a-1 was observed with a scanning electron microscope (SEM), and the surface waviness was measured with a measuring device described later. Moreover, the back surface which peeled the resin film 3, ie, the back surface 2b-1 shown by FIG.1 (e), was observed with the scanning electron microscope (SEM).

一方、比較例として、図1(b)に示す基材1から剥離した発泡層2の表面2aおよび裏面2b、すなわち、樹脂フィルム3を重ねたヒートロール5,6による加熱加圧を行っていない発泡層2の表面2aおよび裏面2bについて、同様に、走査型電子顕微鏡(SEM)によって観察するとともに、表面うねりを計測した。   On the other hand, as a comparative example, the surface 2a and the back surface 2b of the foamed layer 2 peeled from the base material 1 shown in FIG. Similarly, the surface 2a and the back surface 2b of the foam layer 2 were observed with a scanning electron microscope (SEM), and the surface waviness was measured.

図3および図4は、倍率500倍の比較例および実施例の表面の縁部分におけるSEM写真であり、図5および図6は、倍率2000倍の比較例および実施例の表面の縁部分のSEM写真であり、これらの図では、表面の縁部分をSEM像とし、表面および側面を観察できるようにしている。   3 and 4 are SEM photographs of the edge portion of the surface of the comparative example and the example with a magnification of 500 times, and FIGS. 5 and 6 are SEM images of the edge portion of the surface of the comparative example and the example with a magnification of 2000 times. In these drawings, the edge portion of the surface is an SEM image so that the surface and side surfaces can be observed.

また、図7および図8は、倍率1000倍の比較例および実施例の裏面のSEM写真である。   7 and 8 are SEM photographs of the back surface of the comparative example and the example with a magnification of 1000 times.

樹脂フィルム3を重ねてヒートロール5,6を通過させた後、樹脂フィルム3を剥離した図4および図6に示される実施例の発泡層の表面は、図3および図5の比較例の発泡層の表面に比べて、表面が平滑となっており、小さな気泡(ポア)がつぶれ、緻密な層が形成されている。   After the resin film 3 is stacked and the heat rolls 5 and 6 are passed, the surface of the foamed layer of the example shown in FIGS. 4 and 6 where the resin film 3 is peeled off is the foam of the comparative example of FIGS. 3 and 5. Compared with the surface of the layer, the surface is smooth, small bubbles (pores) are crushed, and a dense layer is formed.

このように、被加工物保持材を保持する保持面となる発泡層の表面は、平滑な面となっているので、被加工物保持材を保持するための吸着保持力が向上する。   As described above, the surface of the foamed layer that serves as a holding surface for holding the workpiece holding material is a smooth surface, so that the adsorption holding force for holding the workpiece holding material is improved.

また、発泡層の表面および裏面のいずれもバフ加工する必要がないので、バフ粉が、開口した気泡(ポア)の孔内に残存することがない。   Further, since neither the front surface nor the back surface of the foam layer needs to be buffed, the buff powder does not remain in the pores of the open bubbles.

また、図8の実施例の発泡層の裏面も小さな気泡(ポア)がつぶれ、図7の比較例に比べて緻密な層が形成されている。   Further, small bubbles (pores) are also crushed on the back surface of the foam layer of the embodiment of FIG. 8, and a dense layer is formed as compared with the comparative example of FIG.

このように発泡層の表裏面は、いずれも従来に比べて平滑で緻密な層となっており、被加工物保持材を保持して研磨加工する際に、研磨液の浸透が、表裏面の緻密な層によって抑止されることになり、被加工物の平坦度を悪化させたり、発泡層が、研磨液の浸透によって両面テープから剥がれるのを防止することができる。   As described above, the front and back surfaces of the foam layer are both smoother and denser than conventional ones. When holding and polishing the workpiece holding material, the penetration of the polishing solution It is suppressed by the dense layer, and the flatness of the workpiece can be deteriorated, and the foamed layer can be prevented from being peeled off from the double-sided tape due to the penetration of the polishing liquid.

次に、上記実施例および比較例の表面のうねりの測定結果を示す。
測定条件は、下記の表1の通りである。
Next, the measurement results of the surface waviness of the above examples and comparative examples are shown.
The measurement conditions are as shown in Table 1 below.

図9に比較例のろ波うねり曲線を、図10に実施例のろ波うねり曲線をそれぞれ示す。   FIG. 9 shows the filtered waviness curve of the comparative example, and FIG. 10 shows the filtered waviness curve of the example.

また、実施例と比較例のWa(算術平均うねり)、Wcmax(うねり曲線要素の高さの最大値)、および、Wfpd(ろ波中心線うねり曲線中のある基準長さについての真直度の、評価長さの範囲内での最大値)の計測結果を、表2に示す。   In addition, Wa (arithmetic mean waviness), Wcmax (maximum value of the waviness curve element height), and Wfpd (straightness about a certain reference length in the filtered centerline waviness curve) of the example and the comparative example, Table 2 shows the measurement results of the maximum value within the range of the evaluation length.

図9、図10および表2に示すように、実施例の発泡層の表面は、比較例に比べて、うねりが低減されていることがわかる。   As shown in FIGS. 9 and 10 and Table 2, it can be seen that the undulation is reduced on the surface of the foamed layer of the example as compared with the comparative example.

表2に示されるように、実施例のうねり曲線要素の高さの最大値Wcmaxは、2.1813μmであって、3μm以内であるのに対して、比較例のうねり曲線要素の高さの最大値Wcmaxは、5.9305μmである。   As shown in Table 2, the maximum height Wcmax of the waviness curve element of the example is 2.8113 μm and within 3 μm, whereas the maximum height of the waviness curve element of the comparative example is The value Wcmax is 5.9305 μm.

したがって、実施例の被加工物保持材によれば、被加工物の平坦性を改善することができる。   Therefore, according to the workpiece holding material of the embodiment, the flatness of the workpiece can be improved.

更に、実施例の発泡層の裏面に両面テープを貼り付けた被加工物保持材の圧縮率を測定した。     Furthermore, the compressibility of the workpiece holding material in which the double-sided tape was attached to the back surface of the foamed layer of the example was measured.

圧縮率は、サンプルに初期荷重を1分間かけたときの厚みT1を測定し、続けて第二荷重を1分間かけたときの厚みT2を測定し、次式によって算出した。   The compression rate was calculated by the following equation by measuring the thickness T1 when an initial load was applied to the sample for 1 minute, and then measuring the thickness T2 when the second load was applied for 1 minute.

圧縮率(%)=[(T1−T2)/T1]×100
実施例の被加工物保持材の圧縮率は、35.1%であった。
Compression rate (%) = [(T1-T2) / T1] × 100
The compression ratio of the workpiece holding material of the example was 35.1%.

この圧縮率は、20%〜60%であるのが好ましい。   This compression rate is preferably 20% to 60%.

また、上記実施例および比較例とは、組成の異なる低モジュラスの発泡ポリウレタン樹脂を用いて別の実施例および別の比較例を製作し、同様に表面うねりを計測した。   Further, different examples and comparative examples were manufactured using low modulus foamed polyurethane resins having different compositions from the above examples and comparative examples, and surface waviness was measured in the same manner.

図11に比較例のろ波うねり曲線を、図12に実施例のろ波うねり曲線をそれぞれ示す。   FIG. 11 shows the filtering undulation curve of the comparative example, and FIG. 12 shows the filtering undulation curve of the example.

また、実施例と比較例のWa、Wcmax、および、Wfpdの計測結果を、表3に示す。   Table 3 shows the measurement results of Wa, Wcmax, and Wfpd of the example and the comparative example.

図11、図12および表3に示すように、組成の異なるポリウレタン発泡樹脂であっても、うねりが低減されていることがわかる。   As shown in FIGS. 11 and 12 and Table 3, it can be seen that the swell is reduced even with polyurethane foam resins having different compositions.

表3に示されるように、実施例のうねり曲線要素の高さの最大値Wcmaxは、2.058μmであって、3μm以内であるのに対して、比較例のうねり曲線要素の高さの最大値Wcmaxは、3.3328μmである。   As shown in Table 3, the maximum value Wcmax of the waviness curve element of the example is 2.058 μm and within 3 μm, whereas the maximum height of the waviness curve element of the comparative example is The value Wcmax is 3.3328 μm.

図13は、本発明の他の実施形態に係る被加工物保持材の製造方法を示す図であり、上述の図1に対応する部分には、同一の参照符号を付す。   FIG. 13 is a diagram showing a method for manufacturing a workpiece holding material according to another embodiment of the present invention, and the same reference numerals are given to the portions corresponding to FIG. 1 described above.

この実施形態の被加工物保持材の製造方法では、先ず、ウレタン樹脂のDMF(ジメチルホルムアミド)溶液を、PETフィルム等の基材1上に塗工し、湿式凝固法により、図13(a)に示すように、基材1上に、涙滴状の気泡などの多数の気泡を有する多孔質の発泡層2を形成する。   In the method for manufacturing a workpiece holding material of this embodiment, first, a DMF (dimethylformamide) solution of a urethane resin is applied onto a base material 1 such as a PET film, and the wet coagulation method is used to perform FIG. As shown in FIG. 2, a porous foam layer 2 having a large number of bubbles such as teardrop-shaped bubbles is formed on the substrate 1.

次に、発泡層2が形成された基材1を、図13(b)に示すように、樹脂フィルム3で挟んで、2本のヒートロール間を通過させることによって図13(c)に示すように加熱加圧して一体化する。その後、表裏面の樹脂フィルム3を図13(d)に示すように剥離し、表面2a−1を被加工物の保持面とした被加工物保持材を得るものである。   Next, as shown in FIG. 13B, the base material 1 on which the foam layer 2 is formed is sandwiched between resin films 3 and passed between two heat rolls, as shown in FIG. 13C. As shown in FIG. Thereafter, the resin films 3 on the front and back surfaces are peeled off as shown in FIG. 13D to obtain a workpiece holding material having the surface 2a-1 as the holding surface of the workpiece.

この実施形態の被加工物保持材では、発泡層2の表面に樹脂フィルム3を重ねてヒートロールによる加熱加圧を行うので、発泡層2の表面2a−1は、基材1に樹脂溶液を塗工して、湿式凝固されてなる発泡層2の表面2aに比べて、平滑である。   In the workpiece holding material of this embodiment, since the resin film 3 is superimposed on the surface of the foam layer 2 and heated and pressurized by a heat roll, the surface 2 a-1 of the foam layer 2 has a resin solution applied to the substrate 1. It is smoother than the surface 2a of the foam layer 2 that is applied and wet-solidified.

その他の構成は、上述の実施の形態と同様である。   Other configurations are the same as those of the above-described embodiment.

本発明は、半導体ウェハや精密ガラス基板などの研磨に有用である。   The present invention is useful for polishing semiconductor wafers and precision glass substrates.

1 基材 2 発泡層
3 樹脂フィルム 4 両面テープ
5,6 ヒートロール
DESCRIPTION OF SYMBOLS 1 Base material 2 Foam layer 3 Resin film 4 Double-sided tape 5,6 Heat roll

Claims (7)

基材に、樹脂溶液を塗工し、湿式凝固して発泡層を形成する発泡層形成工程と、
前記発泡層が形成された基材を、平滑な平滑部材で挟んで加熱加圧する加熱加圧工程と、
前記平滑部材を、前記発泡層が形成された基材からそれぞれ剥離する平滑部材剥離工程と、
を含むことを特徴とする被加工物保持材の製造方法。
A foam layer forming step in which a resin solution is applied to a substrate and wet solidified to form a foam layer;
A heating and pressurizing step of heating and pressurizing the base material on which the foam layer is formed between smooth smooth members;
A smooth member peeling step for peeling the smooth member from the base material on which the foam layer is formed;
A method for producing a workpiece holding material, comprising:
前記加熱加圧工程に先立って、前記発泡層から前記基材を剥離する基材剥離工程を含み、
前記加熱加圧工程では、前記基材が剥離された前記発泡層を、前記平滑部材で挟んで加熱加圧する請求項1に記載の被加工物保持材の製造方法。
Prior to the heating and pressing step, including a substrate peeling step for peeling the substrate from the foam layer,
The manufacturing method of the workpiece holding material of Claim 1 which heats and presses the said foaming layer from which the said base material peeled by the said smooth member in the said heat pressurization process.
前記平滑部材が、フィルム状またはシート状であり、
前記平滑部材剥離工程で前記平滑部材を剥離した前記発泡層の片面に、両面テープを貼り付ける工程を含む請求項2に記載の被加工物保持材の製造方法。
The smooth member is a film or a sheet,
The manufacturing method of the workpiece holding material of Claim 2 including the process of affixing a double-sided tape on the single side | surface of the said foaming layer which peeled the said smooth member at the said smooth member peeling process.
前記加熱加圧工程では、前記発泡層が形成された基材または前記発泡層を前記平滑部材で挟んで、少なくとも一方がヒートロールである2本のロール間を通過させる請求項1ないし3のいずれか一項記載の被加工物保持材の製造方法。   4. The method according to claim 1, wherein in the heating and pressurizing step, the base material on which the foam layer is formed or the foam layer is sandwiched between the smooth members, and at least one of the two rolls is a heat roll. A method for producing a workpiece holding material according to claim 1. 前記ヒートロールの温度が、70℃〜200℃である請求項4に記載の被加工物保持材の製造方法。   The method for manufacturing a workpiece holding material according to claim 4, wherein a temperature of the heat roll is 70 ° C. to 200 ° C. 前記樹脂溶液が、ウレタン樹脂溶液である請求項1ないし5のいずれか一項に記載の被加工物保持材の製造方法。   The method for producing a workpiece holding material according to any one of claims 1 to 5, wherein the resin solution is a urethane resin solution. 前記基材および前記平滑部材が、樹脂フィルムである請求項1ないし6のいずれか一項に記載の被加工物保持材の製造方法。   The said base material and the said smooth member are resin films, The manufacturing method of the workpiece holding material as described in any one of Claim 1 thru | or 6.
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