JP5379621B2 - Inspection recipe automatic generation apparatus, inspection recipe automatic generation program, and recording medium recording the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To secure and facilitate an inspection step for a substrate processing apparatus by automatically generating a recipe for inspecting the substrate processing apparatus. <P>SOLUTION: A controller 15 of the substrate processing apparatus includes a computer 16 and a storage device 19. The storage device 19 is stored with a substrate processing control program and an inspection recipe automatic generation program, and further can be stored with the recipe, configuration definition data and operation condition data. The computer 16 executes the inspection recipe automatic generation program to generate and register an inspection recipe in which processing procedures for allowing a plurality of components that the substrate processing apparatus has to operate are described in the storage device 19. At this time, the computer 16 generates the processing procedures constituting the inspection recipe on the basis of the configuration definition data and operation condition data. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to an apparatus for automatically generating an inspection recipe to be executed in a substrate processing apparatus in order to inspect a plurality of components provided in the substrate processing apparatus, an inspection recipe automatic generation program, and a recording medium recording the same. Substrates to be processed by the substrate processing apparatus include, for example, semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disks. Substrates, photomask substrates and the like are included.

  A substrate processing apparatus for processing a substrate such as a semiconductor wafer includes, for example, a spin chuck that holds and rotates a substrate, a plurality of processing liquid nozzles that supply a processing liquid to the substrate held by the spin chuck, and a substrate. A plurality of drainage ports for receiving the used processing liquid to be excluded and a control device for controlling them are included. For example, the correspondence relationship between the treatment liquid and the drainage port can be determined in advance, and a specific type of treatment liquid can be collected and reused at the corresponding drainage port.

The control device controls the spin chuck, the processing liquid nozzle, the drainage port, and other components according to a recipe that describes the substrate processing procedure. The processing procedure described in the recipe includes, for example, a plurality of steps. In each step, for example, start / stop of processing liquid discharge, a selected drainage port, and the like are described.
The hardware specifications of the substrate processing apparatus vary depending on the target processing contents, and in reality, the hardware specifications are custom made according to the processing contents to be executed by individual users. Accordingly, the creation of a recipe that defines the processing content corresponding to each substrate processing apparatus requires appropriate knowledge and takes time. More specifically, the recipe must be described so that the target processing can be executed while following various restrictions.

JP 2009-10029 A

  In the final stage of the manufacturing process of the substrate processing apparatus, an inspection process for confirming the operation of the components provided in the substrate processing apparatus is executed. In order to automate this inspection process, an engineer with a certain level of knowledge will create a recipe for inspection (inspection recipe) in order to observe the specified restrictions and operate all the components of the substrate processing equipment. Then, this may be executed by the substrate processing apparatus. However, in order to create an inspection recipe, of course, appropriate knowledge is required and it takes time. Therefore, in practice, a procedure for inspecting each component by operating it in sequence using a tool (remote controller) that directly operates each hardware of the substrate processing apparatus is generally used. The disadvantage of this inspection method is that it requires a great amount of work man-hours and time to inspect a large number of components. In addition, there is a possibility that the inspection method may vary among workers, and there is room for improvement in performing more reliable inspection.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an automatic inspection recipe generation device capable of automatically generating a recipe for inspecting a substrate processing apparatus, and thereby making the inspection process of the substrate processing apparatus reliable and simple. It is to be.
Another object of the present invention is to automatically generate a recipe for inspecting a substrate processing apparatus, whereby an inspection recipe automatic generation program capable of surely and simplifying the inspection process of the substrate processing apparatus. Is to provide.

  Still another object of the present invention is to provide a computer-readable recording medium in which the inspection recipe automatic generation program as described above is recorded.

In order to achieve the above object, an invention according to claim 1 is a substrate processing apparatus including a plurality of components (1, N1, N2, N3, P1, P2, P3) for processing a substrate (W). An inspection recipe automatic generation device (15) for the above-described configuration definition data storage means (193) for storing configuration definition data defining the plurality of components, and an operation describing operation conditions of the components Operation condition data storage means (194) for storing condition data, inspection recipe storage means (192) for storing inspection recipes describing processing procedures for operating the plurality of components, and the configuration definition data storage means Based on the configuration definition data stored in the operation condition data and the operation condition data stored in the operation condition data storage means, a processing procedure for configuring the inspection recipe is generated and the inspection recipe is generated. Look including an inspection recipe generation means (16) for registering the憶means, said plurality of components, a substrate holding and rotating mechanism for holding and rotating a substrate (1), and held by the substrate holding and rotating mechanism substrate A plurality of processing liquid nozzles (N1, N2, N3) for supplying the processing liquid to the operation condition data for all the processing liquid nozzles defined by the configuration definition data. The inspection recipe generating means includes simultaneous discharge and continuous discharge of a plurality of process liquid nozzles for which simultaneous discharge is prohibited by the simultaneous discharge prohibition parameter. In order to avoid this, means for generating a processing procedure for sequentially discharging the processing liquid from all the processing liquid nozzles and registering it in the inspection recipe storage means (S3 to S3) 2) the including a test recipe automatic generation system. In addition, although the alphanumeric character in a parenthesis represents the corresponding component etc. in below-mentioned embodiment, it is not the meaning which limits a claim to embodiment. The same applies hereinafter.

  The configuration definition data defines the components of the substrate processing apparatus. Examples of components of the substrate processing apparatus include a substrate holding and rotating mechanism (1), processing fluid nozzles (N1, N2, N3), and drainage ports (P1, P2, P3). In the configuration definition data, the type of the constituent element, the validity / invalidity of the constituent element (whether the constituent element exists or not) with respect to all the constituent elements provided in the substrate processing apparatus (however, operation confirmation is required) Is described.

  The substrate holding and rotating mechanism holds and rotates a substrate (typically one substrate). The substrate holding and rotating mechanism includes, for example, a rotating shaft (5) rotatable around a vertical axis, a spin base (6) fixed horizontally at the upper end of the rotating shaft, and a substrate holding mechanism (8) provided in the spin base. ) And a rotational drive mechanism (7: for example, an electric motor) for rotationally driving the rotational shaft. The substrate holding mechanism may be a suction holding mechanism (so-called vacuum chuck) that sucks and holds the lower surface of the substrate, or a device that holds (holds) the substrate by a holding member that contacts the end surface of the substrate (so-called mechanism). Chuck).

  The processing fluid nozzle includes discharge portions (11, 12, 13) for discharging fluid and valves (21, 22, 23) for opening and closing the fluid flow passage. When a plurality of flow passages merge into a single discharge section and a valve is provided for each flow path, each valve and a common discharge section may be regarded as forming individual processing fluid nozzles. it can. The processing fluid may be a gas (processing gas) or a liquid (processing liquid). Examples of the processing gas include an inert gas such as nitrogen gas and a corrosive gas such as hydrofluoric acid vapor. Examples of the processing liquid include a cleaning liquid, an etching liquid, a polymer removing liquid, a resist stripping liquid, and a rinsing liquid. The cleaning liquid is a chemical liquid for removing foreign substances on the substrate surface, and corresponds to ammonia hydrogen peroxide water, hydrochloric acid hydrogen peroxide water, and the like. The etching solution is a chemical solution that removes a thin film on the surface of the substrate, and includes hydrofluoric acid, hydrochloric acid, sulfuric acid, and the like. The polymer is a modified substance (resist residue) generated from a photoresist used as a mask for dry etching or ion implantation. The chemical solution for removing the polymer is a polymer removing solution, and is composed of a liquid containing an organic alkaline liquid, a liquid containing an organic acid, a liquid containing an inorganic acid, a liquid containing an ammonium fluoride-based substance, or the like. The resist stripping solution is made of, for example, a mixed solution of sulfuric acid and hydrogen peroxide solution, and is used for stripping a resist on the substrate surface (for example, a resist after being used as a mask for dry etching or ion implantation).

The drainage port is for receiving and discharging the used processing liquid discharged from the substrate. By selectively using a plurality of drainage ports, a plurality of types of treatment liquids can be separated and drained. The drained processing liquid may be collected for reuse as necessary.
For example, if the processing liquid discharged from a certain processing liquid nozzle is collected and reused at a certain draining port, when discharging the processing liquid from the processing liquid nozzle, a draining port other than the draining port is used. Must not be selected. This becomes an operation condition (restriction) and is stored in the operation condition storage means as operation condition data. Another example of the operating condition data is data relating to the rotation speed of the substrate rotation by the substrate holding and rotating mechanism. For example, parameters regarding the maximum substrate rotation speed and the minimum rotation speed when the processing liquid is discharged from a specific processing liquid nozzle may be described in the operating condition data.

  The inspection recipe generation means generates a processing procedure for operating a plurality of (preferably all) components while protecting the operation condition data (restrictions), and registers it in the inspection recipe storage means. Thus, an inspection recipe for inspecting a plurality of components is registered in the inspection recipe storage means. The processing procedure generated by the inspection recipe generating unit may be a procedure for operating a plurality of components sequentially, or a procedure for operating two or more components simultaneously. In either case, the operating conditions (restrictions) described in the operating condition data must be observed.

  As described above, according to the present invention, the inspection recipe for inspecting the operation of each component according to the operation condition data defining the operation condition of each component with respect to the plurality of components defined by the configuration definition data. Is automatically generated. As a result, an appropriate inspection recipe can be generated in a short time while complying with the restrictions so that there is no inspection omission while minimizing the human burden. And operation | movement regarding a some component can be confirmed by operating a substrate processing apparatus using this test | inspection recipe. Thus, the inspection process of the substrate processing apparatus can be surely and simplified.

The configuration definition data storage unit, the operation condition data storage unit, and the inspection recipe storage unit may be configured by individual storage media, or may be configured by using different storage areas of the same storage media .

In the present invention, the substrate processing apparatus to be inspected operates so as to discharge the processing liquid from the processing liquid nozzle toward the substrate in a state where the substrate holding rotation mechanism holds and rotates the substrate, for example. .
To test such a substrate processing apparatus, rotation of the substrate holding and rotating mechanism, and inspection recipe for confirming the processing liquid ejection operation or the like from the processing liquid nozzle is generated.

Configuration definition data will include a substrate holding and rotating mechanism, and a plurality of processing liquid nozzle statements regarding Le (parameter).
The operating condition data may include processing unit parameters relating to the number of rotations of the substrate rotated by the substrate holding and rotating mechanism. The processing unit parameter may include, for example, a parameter relating to the maximum substrate rotation speed of the substrate and the minimum rotation speed of the substrate when discharging the processing liquid from a specific processing liquid nozzle.

  Further, the operation condition data may include, for example, a simultaneous discharge prohibition parameter that describes another processing liquid nozzle that is prohibited from being discharged simultaneously with each processing liquid nozzle. As a result, the simultaneous discharge prohibition parameter specifies a processing liquid nozzle that permits simultaneous discharge, and thus can be paraphrased as a simultaneous discharge permission parameter that describes another processing liquid nozzle that permits simultaneous discharge. Of course, a simultaneous discharge permission parameter that directly describes another processing liquid nozzle that permits simultaneous discharge may be included in the operation condition data. In this case, simultaneous discharge is prohibited for the processing liquid nozzles other than the processing liquid nozzles described in the simultaneous discharge permission parameter.

Further, the substrate processing apparatus to be inspected may have a plurality of drain ports (P1, P2, P3) for receiving processing liquids to be removed from the substrates held by the substrate holding and rotating mechanism. In this case, the processing liquid removed from the substrate surface outward by the centrifugal force accompanying the rotation of the substrate is received by the drainage port and drained. In this case, it is preferable that an inspection recipe for confirming the operation of the drainage port is generated. In addition, the operating condition data may include a prohibited drainage port parameter that describes a drainage port that is prohibited to be used for receiving the processing liquid from each processing liquid nozzle. As a result, the prohibited drainage port parameter specifies the drainage port that permits the treatment liquid reception. In other words, the prohibited drainage port parameter describes the drainage port that permits the treatment liquid acceptance. You can also. Of course, the permitted drain port parameter describing the permitted drain port directly describing the drain port permitting treatment liquid acceptance may be included in the operation condition data. In this case, selection of a drainage port other than the drainage port described in the permitted drainage port parameter is prohibited.

According to the first aspect of the present invention , the operating condition data includes the simultaneous discharge prohibition parameters for all the processing liquid nozzles. The inspection recipe generating means generates a processing procedure by referring to the simultaneous discharge prohibition parameter so that simultaneous discharge or continuous discharge from the processing liquid nozzles for which simultaneous discharge prohibition is prohibited is not performed. Thereby, since the inspection recipe according to the simultaneous discharge prohibition parameter (restriction matter) is automatically generated, it is possible to appropriately check the operation of the plurality of processing liquid nozzles without omission.

  The processing liquid nozzle that is prohibited from being discharged simultaneously is, for example, a processing liquid nozzle that should avoid contact between discharged processing liquids. For example, it is assumed that the first processing liquid nozzle discharges acid and the second processing liquid nozzle discharges alkali. In this case, the operation condition data regarding the first processing liquid nozzle includes a simultaneous discharge prohibition parameter for prohibiting simultaneous discharge of the second processing liquid nozzle. Similarly, the operation condition data related to the second processing liquid nozzle includes a simultaneous discharge prohibition parameter that prohibits simultaneous discharge of the first processing liquid nozzle. Thereby, an inspection recipe is created so that acid and alkali can be supplied onto the substrate at the same time, or acid and alkali can be prevented from being supplied onto the substrate in succession (continuous supply).

According to a second aspect of the present invention, the plurality of components further include a plurality of drain ports (P1, P2, P3) that respectively receive processing liquids that are removed from the substrate held by the substrate holding and rotating mechanism. The operating condition data is a prohibited drainage port parameter describing a drainage port in which the acceptance of the processing liquid discharged from each processing liquid nozzle is prohibited for all the processing liquid nozzles defined by the configuration definition data. And the inspection recipe generating means selects a drainage port other than the drainage port for which acceptance of the processing liquid discharged from the processing liquid nozzle is prohibited when the processing liquid is discharged from the processing liquid nozzle. 2. The inspection according to claim 1, further comprising means (S 5, S 6, S 9, S 10, S 11) for generating a processing procedure for receiving the processing liquid and registering the processing procedure in the inspection recipe storage means. It is a recipe automatic generation system.
According to a third aspect of the present invention, there is provided an automatic inspection recipe generation apparatus for a substrate processing apparatus including a plurality of components (1, N1, N2, N3, P1, P2, P3) for processing a substrate (W). 15) Configuration definition data storage means (193) for storing configuration definition data defining the plurality of components, and operation condition data for storing operation condition data describing the operation conditions of the plurality of components A storage means (194), an inspection recipe storage means (192) for storing an inspection recipe describing a processing procedure for operating the plurality of components, configuration definition data stored in the configuration definition data storage means, and Based on the operation condition data stored in the operation condition data storage means, an inspection recipe for generating a processing procedure constituting the inspection recipe and registering it in the inspection recipe storage means Generating means (16), the plurality of components holding and rotating the substrate holding and rotating mechanism (1), and a plurality of processes for supplying the processing liquid to the substrate held by the substrate holding and rotating mechanism. Including a liquid nozzle (N1, N2, N3) and a plurality of drain ports (P1, P2, P3) for receiving the processing liquid removed from the substrate held by the substrate holding and rotating mechanism, respectively. Includes, for all the processing liquid nozzles defined by the configuration definition data, a forbidden drainage port parameter describing a drainage port in which the acceptance of the processing liquid discharged from each processing liquid nozzle is prohibited, and the inspection When the recipe generating means discharges the processing liquid from the processing liquid nozzle, the drainage port other than the drainage port is prohibited from accepting the processing liquid discharged from the processing liquid nozzle. Selecting and including means (S5, S6, S9, S10 , S11) to be registered in the inspection recipe storage unit by generating a procedure to accept the treatment fluid, inspection recipe automatic generation system.

  With this configuration, it is possible to automatically generate an inspection recipe that describes that an appropriate drainage port should be selected for each processing liquid nozzle. For example, the first processing liquid discharged from the first processing liquid nozzle is recovered via the first drainage port, and the second processing liquid discharged from the second processing liquid nozzle is recovered via the second drainage port. Assume that In this case, the operation condition data corresponding to the first processing liquid nozzle includes a prohibited drainage port parameter describing a drainage port other than the first drainage port (including the second drainage port) as a prohibited drainage port. . The operation condition data corresponding to the second treatment liquid nozzle includes a prohibited drainage port parameter describing a drainage port (including the first drainage port) other than the second drainage port as a prohibited drainage port. Thereby, an inspection recipe is generated so that a plurality of types of processing liquids are separated and discharged.

The invention according to claim 4 is an inspection recipe automatic generation program for a substrate processing apparatus including a plurality of components for processing a substrate, wherein the substrate processing apparatus defines the plurality of components. Configuration definition data storage means (193) for storing definition data, operation condition data storage means (194) for storing operation condition data describing operation conditions of the plurality of components, and operating the plurality of components An inspection recipe storage means (192) for storing an inspection recipe describing a processing procedure for the substrate, and the plurality of components hold and rotate the substrate holding rotation mechanism (1), and the substrate holding rotation A plurality of processing liquid nozzles (N1, N2, N3) for supplying a processing liquid to the substrate held in the mechanism; and the operating condition data is defined by the configuration definition data For all of the processing liquid nozzle comprises a simultaneous discharge prohibition parameters describing another processing liquid nozzles simultaneously ejecting the respective processing liquid nozzles is prohibited, the program, the computer, the configuration definition data storage means Means (S1, S3, S8) for reading the stored configuration definition data, means (S1, S4, S9) for reading the operation condition data stored in the operation condition data storage means, and the read configuration definition data and Functioning as inspection recipe generation means (S2, S6, S10, S11, S13) for generating a processing procedure constituting the inspection recipe based on operating condition data and registering it in the inspection recipe storage means, the inspection recipe generation means Simultaneous discharge of a plurality of processing liquid nozzles for which simultaneous discharge is prohibited by the simultaneous discharge prohibition parameter To avoid preliminary continuous discharge, it generates a processing procedure for discharging the sequential processing liquid from all of the treatment liquid nozzle comprises means (S3 to S12) to be registered in the inspection recipe storage means, in the inspection recipe automatically generating program is there.

By executing this program on a computer, the same effect as that of the first aspect of the invention can be obtained. With respect to this computer program, all the modifications related to the invention of the inspection recipe automatic generation apparatus can be made.
The invention according to claim 5 is an inspection recipe automatic generation program for a substrate processing apparatus including a plurality of components for processing a substrate, wherein the substrate processing apparatus defines the plurality of components. Configuration definition data storage means (193) for storing definition data, operation condition data storage means (194) for storing operation condition data describing operation conditions of the plurality of components, and operating the plurality of components An inspection recipe storage means (192) for storing an inspection recipe describing a processing procedure for the substrate, wherein the plurality of components hold and rotate the substrate, the substrate holding and rotating mechanism (1), and the substrate holding and rotating mechanism A plurality of processing liquid nozzles (N1, N2, N3) for supplying a processing liquid to the substrate held in the substrate, and a processing liquid excluded from the substrate held in the substrate holding rotation mechanism A plurality of drainage ports (P1, P2, P3) each accepting, and the operation condition data is a process discharged from each process liquid nozzle for all process liquid nozzles defined by the configuration definition data. Including a forbidden drainage port parameter that describes a drainage port for which liquid acceptance is prohibited, and the program causes the computer to read configuration definition data stored in the configuration definition data storage unit (S1, S3, S3). S8), means (S1, S4, S9) for reading the operation condition data stored in the operation condition data storage means, and a processing procedure for configuring the inspection recipe based on the read configuration definition data and operation condition data Is generated and registered in the inspection recipe storage means (S2, S6, S10, S11, S13) The inspection recipe generating means sets a drain port other than the drain port for which acceptance of the processing liquid discharged from the processing liquid nozzle is prohibited when the processing liquid is discharged from the processing liquid nozzle. An inspection recipe automatic generation program including means (S5, S6, S9, S10, S11) for selecting and generating a processing procedure that accepts the processing liquid and registering it in the inspection recipe storage means.
By executing this program on a computer, an effect similar to that of the invention of claim 3 can be obtained.
The invention described in claim 6 is a computer-readable storage medium (19, 80) in which the program according to claim 4 or 5 is recorded. Examples of the recording medium include a solid-state memory and a data recording disk, and both fixed media and removable media are applicable. Examples of the solid-state memory include a flash device in addition to ROM and RAM which are general memories. Examples of the flash device include a USB (Universal Serial Bus) memory and a memory card (such as an SD memory card). The data recording disk may be a fixed disk (such as a hard disk device) or a removable disk. Examples of the removable disk are a CD-ROM disk and a DVD-ROM disk.

1 is an illustrative configuration diagram showing a substrate processing apparatus to which an inspection recipe automatic generating apparatus according to an embodiment of the present invention is applied. It is a block diagram for demonstrating the electrical structure of the said substrate processing apparatus. It is a figure which shows an example of the structure definition data which defines the component of a substrate processing apparatus. It is a figure for demonstrating an example of operating condition data. It is a flowchart for demonstrating the example of the automatic production | generation operation | movement of the inspection recipe by a computer. It is a figure which shows an example of the test | inspection recipe produced | generated automatically. It is a block diagram for demonstrating the structure of the substrate processing apparatus with which the inspection recipe automatic generation apparatus which concerns on other embodiment of this invention was applied.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a diagram showing a configuration of a substrate processing apparatus to which an inspection recipe automatic generation apparatus according to an embodiment of the present invention is applied. This substrate processing apparatus is a single wafer type apparatus that processes substrates W such as semiconductor wafers one by one. The substrate processing apparatus includes a spin chuck 1, a plurality (three in this embodiment) of processing liquid nozzles N1, N2, and N3, a splash guard 2, and a draining cup 3.

  The spin chuck 1 is a substrate holding and rotating mechanism that holds and rotates a single substrate W in a horizontal posture. More specifically, the spin chuck 1 rotates the rotation shaft 5 extending along the vertical direction, the spin base 6 fixed in a horizontal posture at the upper end of the rotation shaft 5, and the rotation shaft 5 around the vertical axis. And a rotational drive mechanism 7. The spin base 6 is formed in, for example, a disk shape, and a plurality of holding members 8 are provided on the peripheral edge portion at intervals in the circumferential direction. The plurality of holding members 8 hold (hold) the substrate W and hold it. With this configuration, the substrate W can be held in a horizontal posture and rotated around the vertical axis.

  The processing liquid nozzles N1, N2, and N3 have discharge units 11, 12, and 13 and processing liquid valves 21, 22, and 23, respectively. The processing liquid valves 21, 22, and 23 are interposed in the middle of the processing liquid flow paths 31, 32, and 33, respectively. 13 is provided. By opening and closing the processing liquid valves 21, 22, and 23, the processing liquid can be discharged from the discharge portions 11, 12, and 13, or the discharge can be stopped. The discharge units 11, 12, and 13 are arranged so as to discharge the processing liquid toward the substrate W held by the spin chuck 1.

The ejection units 11, 12, and 13 may have a fixed nozzle form, or may have a movable nozzle (so-called scan nozzle) that moves in the horizontal direction above the substrate W. Of course, the three discharge parts 11, 12, and 13 do not need to have the same nozzle form.
The processing liquid stored in the processing liquid tank 41 is pumped out by the processing liquid pump 51 and supplied to the processing liquid nozzle N <b> 1 through the processing liquid channel 31. Similarly, the processing liquid stored in the processing liquid tank 42 is pumped out by the processing liquid pump 52 and supplied to the processing liquid nozzle N <b> 2 via the processing liquid channel 32. In this embodiment, the rinsing liquid from the rinsing liquid supply source 43 is supplied to the processing liquid nozzle N3 via the processing liquid flow path 33. The rinse liquid may be pure water (deionized water: DIW).

The splash guard 2 is a cylindrical body disposed so as to surround the spin base 6. A drainage cup 3 is disposed below the splash guard 2. As a result, the splash guard 2 and the drainage cup 3 form a processing cup 10 that prevents diffusion of the processing liquid for processing the substrate W and the atmosphere containing the mist.
The drainage cup 3 forms a bottomed cylindrical container, and the rotation shaft 5 penetrates the center of the bottom in the vertical direction. The drainage cup 3 has a cylindrical outer wall 64 erected along the vertical direction on the outer peripheral edge of the bottom wall portion 65. The drainage cup 3 further includes three drainage separation walls 61, 62, 63 formed in a coaxial cylindrical shape with the rotation shaft 5 as a central axis. Thereby, a first drainage groove 61 </ b> A is formed between the outer drainage separation wall 61 and the outer wall 64. In addition, a second drainage groove 62A is partitioned by drainage separation walls 61 and 62 inside the first drainage groove 61A. Further, a third drainage groove 63A is defined inside the second drainage groove 62A by two inner drainage separation walls 62 and 63.

  The first drainage groove 61A is connected to the first recovery pipe 45. The first recovery pipe 45 is connected to the processing liquid tank 41. Therefore, the liquid guided to the first drainage groove 61A is collected in the processing liquid tank 41 and reused. Similarly, the second drainage groove 62 </ b> A is connected to the second recovery pipe 46. The second recovery pipe 46 is connected to the processing liquid tank 42. Accordingly, the liquid guided to the second drain groove 62A is collected in the processing liquid tank 42 and reused. It is preferable that a filter for removing foreign substances in the liquid is interposed in the recovery pipes 45 and 47 as necessary. The third drainage groove 63 </ b> A is connected to the drain pipe 47. Therefore, the liquid guided to the third drain groove 63A is discarded.

  The splash guard 2 includes a plurality (three in this embodiment) of drain guides 71, 72, 73. In this embodiment, these drainage guides 71, 72, 73 are integrated, and are moved up and down integrally by the elevating drive mechanism 9. The drainage guides 71, 72, 73 are formed in a coaxial shape with the rotary shaft 5 as the central axis, and are respectively inclined toward the rotary shaft 5 side from the cylindrical lower portion and the upper end edge of the lower portion. And an upper portion having a conical surface shape inclined upward. As a result, the splash guard 2 has a plurality of (three in this embodiment) drainage ports P1, P2, and P3 that are open on the rotating shaft 5 side. That is, the drainage port P1 is formed between the upper end edges of the drainage guides 71 and 72. Below that, a drainage port P2 is defined between the upper end edges of the drainage guides 72 and 73. Further, a drainage port P3 is formed below the drainage guide 73 below.

  When the splash guard 2 is moved up and down by the lift drive mechanism 9, one of the three drainage ports P1, P2, P3 is held by the side of the spin base 6 (more precisely, the spin chuck 1). Can be made to face the side of the substrate W). Thereby, the processing liquid removed from the substrate W by centrifugal force can be introduced into any of the drain ports P1, P2, P3.

  The processing liquid introduced into the drainage port P1 is guided to the first drainage groove 61A by the drainage guides 71 and 72. This processing liquid is stored in the processing liquid tank 41 through the first recovery pipe 45. Similarly, the processing liquid introduced into the drainage port P2 is guided to the second drainage groove 62A by the drainage guides 72 and 73. The processing liquid is stored in the processing liquid tank 42 through the second recovery pipe 46. The processing liquid introduced into the drainage port P3 is guided to the third drainage groove 63A by the drainage guide 73. This processing liquid is discarded through the drain pipe 47.

  In order to control the operations of the rotation drive mechanism 7, the lift drive mechanism 9, and the processing liquid valves 21, 22, and 23, a control device 15 including a microcomputer or the like is provided. The control device 15 controls the components of the substrate processing apparatus according to a preset processing recipe. The processing recipe includes a plurality of steps describing a processing procedure for substrate processing. In each step, the rotational speed of the spin chuck 1, the processing liquid nozzle to which the processing liquid is to be discharged, the processing liquid nozzle to be stopped, the drain port to be selected, and other control information are described. For example, when the processing liquid is discharged from the processing liquid nozzle N1, the drainage port P1 is selected, and the elevation drive mechanism 9 is controlled so that the drainage port P1 faces the side of the spin chuck 1. Further, when discharging the processing liquid from the processing liquid nozzle N2, the drainage port P2 is selected, and the elevating drive mechanism 9 is controlled so that the drainage port P2 faces the side of the spin chuck 1.

FIG. 2 is a block diagram for explaining the electrical configuration of the substrate processing apparatus, and mainly shows the configuration of the control device 15. The control device 15 includes a computer 16, an input device 17, a display device 18, a storage device 19, and a hardware interface 20.
The computer 16 includes a CPU, reads necessary programs and data from the storage device 19, and executes arithmetic processing and control processing for substrate processing. Thus, the computer 16 can function as an apparatus control unit and an inspection recipe generation unit. The function of the computer 16 as the apparatus control means is to control each part of the substrate processing apparatus according to the recipe stored in the storage device 19. Further, the function of the computer 16 as the inspection recipe generating means is to automatically generate an inspection recipe to be executed when confirming the operation of the component of the substrate processing apparatus and register it in the storage device 19.

  The input device 17 is connected to the computer 16 and includes a keyboard, a pointing device, a touch panel, and other input interfaces operated by an operator. The display device 18 is connected to the computer 16 and provides an interface with the operator together with the input device 17. The display device 18 is a two-dimensional display device such as a liquid crystal display device, for example. By operating the input device 17 while referring to the display on the display device 18, the operator can select a recipe created in advance, start substrate processing, and give other commands to the computer 16. Also, the recipe can be created using the input device 17 and the display device 18.

  The storage device 19 is connected to the computer 16 and includes a solid-state memory device, a hard disk device, and other storage devices. The storage device 19 includes a storage area 190 storing a substrate processing control program, a storage area 191 storing an inspection recipe automatic generation program, a storage area 192 for storing recipes (recipe storage means, inspection recipe storage means), and configuration definition It has a storage area 193 (configuration definition data storage means) for storing data and a storage area 194 (operation condition data storage means) for storing operation condition data. The recipe includes an inspection recipe for confirming the operation of the components of the substrate processing apparatus. The inspection recipe can be called by operating the input device 17 and executed by the computer 16. By executing this inspection recipe, the operation of each part of the substrate processing apparatus can be confirmed.

The substrate processing control program is a program for operating each unit of the substrate processing apparatus in accordance with the recipe stored in the storage area 192. The computer 16 functions as device control means for controlling the operation of each part of the substrate processing apparatus according to the recipe by reading and executing this program.
The inspection recipe automatic generation program is a program for automatically generating an inspection recipe by the computer 16. The computer 16 functions as inspection recipe generation means for automatically generating an inspection recipe and registering it in the storage device 19 by reading and executing this program.

  The hardware interface 20 provides an interface to a control target (component) provided in the substrate processing apparatus. That is, the computer 16 controls the rotation drive mechanism 7, the lift drive mechanism 9, the treatment liquid nozzles N 1, N 2, N 3 (more specifically, the valves 21, 22, 23) and the like via the hardware interface 20. Although not shown in detail, detection signals from various sensors 25 provided in the substrate processing apparatus can be taken into the control device 15 via the hardware interface 20.

FIG. 3 is a diagram illustrating an example of configuration definition data that defines components of the substrate processing apparatus. In this embodiment, the configuration definition data includes processing unit parameters, nozzle parameters, and drainage port parameters. The processing unit parameter includes a description indicating that a “spin chuck” is provided.
The nozzle parameter includes the value of “valid / invalid flag” for “nozzle 1” to “nozzle 5”. In this embodiment, the substrate processing control program (see FIG. 2) executed by the computer 16 for controlling the substrate processing apparatus corresponds to the control of five “nozzles 1” to “nozzles 5”. However, the substrate processing apparatus shown in FIG. 1 actually has only three processing liquid nozzles N1, N2, and N3. Therefore, in the example of FIG. 3, three “nozzles 1” (for example, corresponding to the processing liquid nozzle N1), “nozzle 3” (for example, corresponding to the processing liquid nozzle N2), and “nozzle 5” (for example, the processing liquid nozzle N3) For “other / nozzle 2” and “nozzle 4”, the “valid / invalid flag” value is “invalid”. Yes.

  The drainage port parameter includes the value of “valid / invalid flag” for “port A” to “port C”. In this embodiment, a substrate processing control program (see FIG. 2) executed by the computer 16 for controlling the substrate processing apparatus corresponds to the control of three “port A” to “port C”. The substrate processing apparatus shown in FIG. 1 has three drainage ports P1, P2, and P3. Therefore, in the example of FIG. 3, three “ports A” (for example, corresponding to the drainage port P1), “port B” (for example, corresponding to the drainage port P2), and “port C” (for example, the drainage port P3). The value of “valid / invalid flag” is “valid”.

FIG. 4 is a diagram for explaining an example of the operation condition data. The operation condition data is data describing the operation conditions of the components provided in the substrate processing apparatus. As shown in FIG. 4, in this embodiment, the operation condition data includes a processing unit parameter, a simultaneous discharge prohibition parameter, and a prohibited drainage port parameter.
The processing unit parameter defines, for example, the maximum rotation speed of the spin chuck as one operating condition. In this embodiment, the processing unit parameter defines the minimum rotational speed of the spin chuck as another operating condition when the processing liquid is discharged from any of the processing liquid nozzles.

  The simultaneous discharge prohibition parameter is a parameter describing a processing liquid nozzle for which simultaneous discharge is prohibited for each processing liquid nozzle. In the example of FIG. 4, regarding “nozzle 1” (processing liquid nozzle N1), it is described that simultaneous discharge of “nozzle 3” (processing liquid nozzle N2) is prohibited. In addition, regarding “nozzle 3” (processing liquid nozzle N2), it is described that simultaneous discharge of “nozzle 1” (processing liquid nozzle N1) is prohibited. With regard to “nozzle 5” (treatment liquid nozzle N3), a nozzle that prohibits simultaneous ejection is not described. Accordingly, simultaneous discharge of “nozzle 1” (processing liquid nozzle N1) and “nozzle 3” (processing liquid nozzle N2) is prohibited, but “nozzle 1” (processing liquid nozzle N1) and “nozzle 5” (processing) Simultaneous discharge with the liquid nozzle N3) and simultaneous discharge with the "nozzle 3" (treatment liquid nozzle N2) and "nozzle 5" (treatment liquid nozzle N3) are both permitted.

  For example, “nozzle 1” (processing liquid nozzle N1) is a chemical liquid nozzle that discharges a first chemical liquid as a processing liquid, and “nozzle 3” (processing liquid nozzle N2) is a chemical liquid nozzle that discharges a second chemical liquid as a processing liquid. The “nozzle 5” (processing liquid nozzle N3) may be a rinsing liquid nozzle that discharges a rinsing liquid (pure water in this embodiment) as the processing liquid. In this case, the simultaneous discharge of the “nozzle 1” (processing liquid nozzle N1) and the “nozzle 3” (processing liquid nozzle N2) is prohibited, thereby preventing the first and second chemical liquids from being mixed on the substrate W. it can. For example, when the first chemical liquid is an acid and the second chemical liquid is an alkali, the simultaneous discharge prohibition parameter is set so that the simultaneous discharge of two processing liquid nozzles that discharge these chemical liquids is prohibited. .

  When the operator creates a recipe using the input device 17 and the display device 18, the processing liquid is discharged from the "nozzle 1" (processing liquid nozzle N1) and the processing liquid from the "nozzle 3" (processing liquid nozzle N2). The steps that occur at the same time as the discharge of the ink may be created by mistake. In this case, the computer 16 finds that the registration of the step violates the restriction by referring to the operating condition data. Then, for example, the computer 16 displays on the display device 18 that the simultaneous discharge of “nozzle 1” (processing liquid nozzle N1) and “nozzle 3” (processing liquid nozzle N2) is prohibited. Call attention.

  Two nozzles for which prohibition of simultaneous ejection is described in the operation condition data are not only prohibited from simultaneous ejection but also prohibited from continuous ejection. In this case, continuous discharge means that the processing liquid is discharged from the two nozzles in succession. The reason why the continuous discharge is prohibited is that the two processing liquids may be mixed on the substrate. Therefore, when the user attempts to register a step that causes continuous ejection, the computer 16 operates in the same manner as when attempting to register a step for simultaneous ejection, and alerts the operator.

  The forbidden drainage port parameter is a parameter describing the forbidden port for each nozzle. In the example of FIG. 4, “port B” (drainage port P2) and “port C” (drainage port P3) are described as prohibited ports for “nozzle 1” (treatment liquid nozzle N1). Further, “port A” (drainage port P1) and “port C” (drainage port P3) are described as prohibited ports for “nozzle 3” (treatment liquid nozzle N2). Further, “port A” (drainage port P1) and “port B” (drainage port P2) are described as prohibited ports for “nozzle 5” (treatment liquid nozzle N3).

  Accordingly, only “port A” (drainage port P1) is allowed for “nozzle 1” (treatment liquid nozzle N1), and “port B” (for treatment nozzle 3) (treatment liquid nozzle N2). Only the drain port P2) is allowed, and only the "port C" (drain port P3) is allowed for the nozzle 5 "(treatment liquid nozzle N3). The reason why the drainage port is divided according to the treatment liquid nozzle is to avoid mixing of the treatment liquid in the drainage port. By avoiding the mixing of the treatment liquid, the efficiency of recovery and reuse of the chemical liquid is increased. Moreover, mixing of a plurality of types of chemical solutions that may cause an unintended chemical reaction can be avoided.

  When the operator uses the input device 17 and the display device 18 to create a processing recipe, for example, when the processing liquid is being discharged from the “nozzle 1” (processing liquid nozzle N1), A step for instructing switching to a drainage port other than the fluid port P1) may be erroneously created. In this case, the computer 16 finds that the registration of the step violates the restriction by referring to the operating condition data. Then, for example, the computer 16 displays on the display device 18 that “nozzle 1” (treatment liquid nozzle N1) is prohibited from being selected for the drainage port, and pays attention to the operator. Prompt.

FIG. 5 is a flowchart for explaining an example of the inspection recipe automatic generation operation by the computer 16. FIG. 6 is a diagram illustrating an example of an automatically generated inspection recipe. FIGS. 5 and 6 show an example in which the operation of the processing liquid nozzles N1, N2, N3 and the drainage ports P1, P2, P3 is confirmed.
When the user performs a predetermined input operation from the input device 17, the computer 16 starts an inspection recipe automatic generation program and starts automatic generation of an inspection recipe. The computer 16 acquires the minimum spin base rotation speed (for example, 1000 rpm) at the time of nozzle discharge specified in the “processing unit parameter” in the operation condition data (step S1). Then, the computer 16 describes that the spin chuck starts rotating at the minimum number of revolutions during nozzle ejection as the first step (step 1) of the inspection recipe, and registers this in the storage device 19 (step S2).

  Next, the computer 16 refers to the “nozzle parameter” of the configuration definition data, and acquires a list of “valid” nozzles (that is, nozzles actually provided in the substrate processing apparatus) (step S3). Further, the computer 16 refers to the “simultaneous discharge prohibition parameter” of the operation condition data for the nozzles in the acquired list, and specifies a nozzle for which no simultaneous discharge is prohibited (nozzle having no prohibition condition). (Procedure S4). Usually, the rinse liquid nozzle is specified. Further, the computer 16 refers to the “prohibited drainage port parameter” of the operation condition data, and discharges the drain port (port C: drainage port) corresponding to the nozzle without the prohibition condition (“nozzle 5”: treatment liquid nozzle N3). The liquid port P3) is specified (procedure S5). Then, the computer 16 registers the discharge from the nozzle without the prohibition condition (discharge for a predetermined time) and the use of the corresponding drainage port as the next step (step 2) of the inspection recipe (procedure S6). As a result, a step for confirming the operation of the nozzle having no prohibition condition is registered.

  Further, as the next step (step 3) of the inspection recipe, the computer 16 detects whether or not the ejection from the nozzle without the prohibition condition (“nozzle 5”: the processing liquid nozzle N3) has been performed normally, and the ejection failure. If there is an alarm, an alarm is generated and automatic stop is registered without performing the subsequent processing procedure (procedure 7). Whether or not the processing liquid discharge is normal is determined by, for example, providing a flow meter in the processing liquid flow path 31, 32, 33 and taking the output of this flow meter into the computer 16 via the hardware interface 20. it can. Such a flow meter is an example of the sensors 25 shown in FIG. By first checking the operation of the nozzle without the prohibition condition (usually a rinsing liquid nozzle), the subsequent rinsing process can be performed reliably when the chemical liquid is discharged from another nozzle.

  Further, the computer 16 takes out an unextracted nozzle (for example, “Nozzle 1”) from the effective nozzle list in order to create a next step to be executed when there is no abnormality in the discharge of the processing liquid from the nozzle having no prohibition condition. (Procedure S8). Then, referring to the operation condition data, a drainage port (for example, “port A”) allowed for the nozzle is specified (step S9). Further, the computer 16 describes, as the next step (step 4) of the inspection recipe, discharge of the processing liquid from the taken-out nozzle (discharge for a predetermined time) and use of the specified drainage port. Is registered in the storage device 19 (step S10).

  Next, the computer 16 discharges the processing liquid from the nozzle (“Nozzle 5”: the processing liquid nozzle N3) without the prohibition condition and discharges the corresponding liquid discharge port (port C: liquid discharge port P3). ) Is described as the next step (step 5) of the inspection recipe, and this is registered in the storage device 19 (step S11). This is a step for replacing the chemical liquid on the substrate with the rinse liquid after the chemical liquid is used.

Then, steps S8 to S11 are repeated until the discharge of the treatment liquid is described for all effective nozzles (step S12: YES). Thereby, steps 6 and 7 in FIG. 6 are registered in the storage device 19.
When the steps (steps 4 to 7) for discharging the processing liquid for all the effective nozzles have been described (step S12: NO), the computer 16 starts rotating the spin chuck at the maximum rotation speed (for example, 3000 rpm). The step (step 8) describing this is described as the next step of the inspection recipe, and this is registered in the storage device 19 (step S13). This is because, at the end of the inspection, the substrate is rotated at a high speed, and a drying process is performed in which the liquid component on the substrate surface is shaken off by centrifugal force. Then, the computer 16 describes the rotation stop of the spin chuck as the last step (step 9) of the inspection recipe, and registers it in the storage device 19 (step S14). Thus, an inspection recipe (see FIG. 6) for confirming the operation of all the processing liquid nozzles is automatically generated and registered in the storage device 19.

  When the operator operates the input device 17 to instruct execution of the inspection recipe, the computer 16 reads out the inspection recipe from the storage device 19 and executes it. Thereby, first, the spin chuck 1 is rotated at the minimum rotation speed (for example, 1000 rpm) at the time of nozzle discharge (step 1 in FIG. 6). In this state, the elevating drive mechanism 9 is controlled, and the drainage port P3 corresponding to “Port C” is arranged on the side of the spin base 6. Further, the valve 23 of the processing liquid nozzle N3 corresponding to the “nozzle 5” is opened, and the rinsing liquid is discharged from the discharge unit 13 toward the substrate W (step 2). Thus, the operation of the processing liquid nozzle N3 can be confirmed. At this time, if there is a defect in the discharge of the rinse liquid, the computer 16 causes the display device 18 to output an alarm display and automatically stops the processing (step 3).

  If the rinse liquid is normally discharged, the valve 23 is closed after the rinse liquid is discharged for a predetermined time. Next, the elevating drive mechanism 9 is controlled so that the drainage port P1 corresponding to “port A” is positioned on the side of the spin base 6. In this state, the valve 21 of the processing liquid nozzle N1 corresponding to “nozzle 1” is opened (step 4). As a result, the processing liquid is discharged from the processing liquid nozzle N1, and the processing liquid removed from the substrate W by the centrifugal force is received in the drain port P1. Thus, the operation of the processing liquid nozzle N1 can be confirmed.

  When the valve 21 of the treatment liquid nozzle N1 is closed after a predetermined time, the elevating drive mechanism 9 is next controlled, and the liquid discharge port P3 corresponding to “port C” is arranged on the side of the spin base 6. Further, the valve 23 of the processing liquid nozzle N3 corresponding to the “nozzle 5” is opened, and the rinsing liquid is discharged from the discharge unit 13 toward the substrate W (step 5). After the rinsing liquid is discharged for a predetermined time, the valve 23 is closed. Thereby, the treatment liquid discharged from the treatment liquid nozzle N1 on the surface of the substrate W is replaced with the rinse liquid.

  Next, the elevating drive mechanism 9 is controlled so that the drainage port P2 corresponding to “Port B” is positioned on the side of the spin base 6. In this state, the valve 22 of the processing liquid nozzle N2 corresponding to the “nozzle 3” is opened (step 6). As a result, the processing liquid is discharged from the processing liquid nozzle N2, and the processing liquid removed from the substrate W by the centrifugal force is received in the drain port P2. Thus, the operation of the processing liquid nozzle N2 can be confirmed.

When the valve 22 of the processing liquid nozzle N2 is closed after a predetermined time, the elevating drive mechanism 9 is then controlled, and the drainage port P3 corresponding to “port C” is arranged on the side of the spin base 6. Further, the valve 23 of the processing liquid nozzle N3 corresponding to the “nozzle 5” is opened, and the rinsing liquid is discharged from the discharge unit 13 toward the substrate W (step 7).
After the rinsing liquid is discharged for a predetermined time, the computer 16 closes the valve 23 of the processing liquid nozzle N3 and rotates the spin chuck 1 at the maximum rotation speed (for example, 3000 rpm) (step 8). Thereby, the drying process which excludes the liquid component on the surface of the substrate W by centrifugal force is performed. After the drying process for a predetermined time, the computer 16 stops the rotation of the spin chuck 1 (step 9) and finishes the execution of the inspection recipe.

Thus, by executing the automatically generated inspection recipe, it is possible to confirm the operation of all the processing liquid nozzles N1, N2, and N3 without omission while selecting appropriate drainage ports P1, P2, and P3. In that case, mixing of the processing liquid (chemical solution) discharged from the processing liquid nozzles N1 and N2 can be surely avoided.
In the inspection recipe automatic generation process, for a plurality of processing liquid nozzles that allow simultaneous discharge, a step of performing simultaneous discharge inspection may be added to the inspection recipe. Specifically, for example, in step 8 of FIG. 5, a combination of nozzles that allow simultaneous discharge is taken out, and steps 8 to S11 may be performed for all combinations of nozzles that allow simultaneous discharge. In this case, for simultaneous discharge, for example, a drainage port corresponding to a nozzle having no prohibition condition may be used. By causing the substrate processing apparatus to execute the inspection recipe created in this way, it is possible to confirm the operation during simultaneous ejection. As a result, for example, if simultaneous discharge is not performed due to a software defect or if the flow rate of one of the processing liquids is insufficient at the time of simultaneous discharge, such an inspection recipe is automatically generated. Can be confirmed.

  In the case where the chemical liquid is replaced with the rinse liquid after the chemical liquid is discharged onto the substrate, the concentration of the chemical liquid is relatively high at the initial stage of the rinse liquid discharge. Therefore, in the initial period of switching from the chemical nozzle to the rinsing liquid nozzle (no-prohibited nozzle), the drain port corresponding to the chemical nozzle is selected, and then (after a certain period of time), the rinsing liquid nozzle is selected. The step described to use the corresponding drainage port may be registered in the inspection recipe.

FIG. 7 is a block diagram for explaining the configuration of a substrate processing apparatus to which an inspection recipe automatic generating apparatus according to another embodiment of the present invention is applied. In FIG. 7, portions corresponding to the respective portions shown in FIG. 2 are denoted by the same reference numerals.
In this embodiment, an inspection recipe automatic generation program is stored in the external storage device 80. The external storage device 80 is a USB memory, CD-ROM, DVD-ROM or other computer-readable recording medium. The computer 16 has an inspection recipe automatic generation function by reading the inspection recipe automatic generation program stored in the external storage device 80 through an appropriate reading means provided in the control device 15 and causing the computer 16 to execute the program. become. In this way, the same effect as in the above-described embodiment can be obtained.

  An advantage of this embodiment is that an inspection recipe automatic generation function can be added when necessary. Thereby, since it is not necessary to store the inspection recipe automatic generation program in the storage device 19 of the control device 15, the storage capacity of the storage device 19 can be saved. Since the control device 15 does not need to have an inspection recipe automatic generation function in advance, an inspection recipe automatic generation function can be added to the control device 15 without such a function afterwards. Furthermore, by appropriately managing the external storage device 80, the users of the inspection recipe automatic generation function can be limited.

  As mentioned above, although one Embodiment of this invention was described, this invention can also be implemented with another form. For example, in the above-described embodiment, after the use of the treatment liquid nozzles N1 and N2 that discharge the chemical liquid, the discharge from the treatment liquid nozzle N3 that discharges the rinse liquid is performed. However, for example, there may be a case where a third chemical liquid nozzle is provided, and the chemical liquid discharged from the chemical liquid nozzle is allowed to be mixed with the chemical liquid discharged from the processing liquid nozzle N1. In such a case, an inspection recipe describing that the chemical liquid is discharged from the third chemical liquid nozzle after the processing liquid is discharged from the processing liquid nozzle N1 may be generated.

In the above-described embodiment, the substrate processing apparatus including three processing liquid nozzles and three drainage ports is taken as an example. However, these numbers are merely examples.
In addition, various design changes can be made within the scope of matters described in the claims.

N1, N2, N3 Processing liquid nozzle 11, 12, 13 Discharge part 21, 22, 23 Processing liquid valve P1, P2, P3 Drainage port 1 Spin chuck 2 Splash guard 3 Drainage cup 5 Rotating shaft 6 Spin base 7 Rotation drive Mechanism 8 Holding member 9 Elevating drive mechanism 10 Processing cup 15 Control device 16 Computer 17 Input device 18 Display device 19 Storage device 190-194 Storage area 20 Hardware interface 25 Sensors 31, 32, 33 Processing liquid flow path 41, 42 Processing Liquid tank 43 Rinse liquid supply source 45 First recovery pipe 46 Second recovery pipe 47 Drain pipe 51, 52 Treatment liquid pump 61, 62, 63 Drain separation wall 61A First drain groove 62A Second drain groove 63A Third Drainage groove 64 Outer wall 65 Bottom wall portion 71, 72, 73 Drainage guide 80 External storage Location

Claims (6)

An inspection recipe automatic generation apparatus for a substrate processing apparatus including a plurality of components for processing a substrate,
Configuration definition data storage means for storing configuration definition data defining the plurality of components;
Operating condition data storage means for storing operating condition data describing operating conditions of the plurality of components;
Inspection recipe storage means for storing an inspection recipe describing a processing procedure for operating the plurality of components;
Based on the configuration definition data stored in the configuration definition data storage means and the operation condition data stored in the operation condition data storage means, a processing procedure for configuring the inspection recipe is generated and registered in the inspection recipe storage means and an inspection recipe generating means for viewing including,
The plurality of components include a substrate holding rotation mechanism that holds and rotates the substrate, and a plurality of processing liquid nozzles that supply a processing liquid to the substrate held by the substrate holding rotation mechanism,
The operating condition data includes, for all the processing liquid nozzles defined by the configuration definition data, simultaneous discharge prohibition parameters describing other processing liquid nozzles that are prohibited from simultaneous discharge with each processing liquid nozzle,
The inspection recipe generating means sequentially discharges the processing liquid from all the processing liquid nozzles so as to avoid simultaneous discharging and continuous discharging of a plurality of processing liquid nozzles for which simultaneous discharging is prohibited by the simultaneous discharge prohibiting parameter. It means including the steps is generated and registered in the inspection recipe storage unit, the inspection recipe automatic generation system. It said plurality of components further seen including receiving pre Symbol treatment liquid is eliminated from the substrate held in the substrate holding and rotating mechanism respectively accommodate a plurality of drainage ports,
The operating condition data includes, for all the processing liquid nozzles defined by the configuration definition data, a prohibited drainage port parameter that describes a drainage port in which reception of the processing liquid discharged from each processing liquid nozzle is prohibited. Including
When the processing liquid is discharged from the processing liquid nozzle, the inspection recipe generation unit selects a liquid discharging port other than the liquid discharging port for which acceptance of the processing liquid discharged from the processing liquid nozzle is prohibited, and performs the processing. means including register to generate a liquid receiving accommodate processing procedure to the inspection recipe storage unit, the inspection recipe automatic generation apparatus according to claim 1. An inspection recipe automatic generation apparatus for a substrate processing apparatus including a plurality of components for processing a substrate,
Configuration definition data storage means for storing configuration definition data defining the plurality of components;
Operating condition data storage means for storing operating condition data describing operating conditions of the plurality of components;
Inspection recipe storage means for storing an inspection recipe describing a processing procedure for operating the plurality of components;
Based on the configuration definition data stored in the configuration definition data storage means and the operation condition data stored in the operation condition data storage means, a processing procedure for configuring the inspection recipe is generated and registered in the inspection recipe storage means Inspection recipe generation means to
The plurality of components are held by a substrate holding and rotating mechanism that holds and rotates the substrate, a plurality of processing liquid nozzles that supply processing liquid to the substrate held by the substrate holding and rotating mechanism, and the substrate holding and rotating mechanism. Including a plurality of drainage ports that each receive the processing liquid to be removed from the substrate,
The operating condition data includes, for all the processing liquid nozzles defined by the configuration definition data, a prohibited drainage port parameter that describes a drainage port in which reception of the processing liquid discharged from each processing liquid nozzle is prohibited. Including
When the processing liquid is discharged from the processing liquid nozzle, the inspection recipe generation unit selects a liquid discharging port other than the liquid discharging port for which acceptance of the processing liquid discharged from the processing liquid nozzle is prohibited, and performs the processing. and it forms a liquid receiving accommodate processing procedure includes a means for registering the inspection recipe storage unit, inspection recipe automatic generation system. An inspection recipe automatic generation program for a substrate processing apparatus including a plurality of components for processing a substrate,
The substrate processing apparatus stores configuration definition data storing configuration definition data defining the plurality of components, and operating condition data storing means storing operation condition data describing operating conditions of the plurality of components. And an inspection recipe storage means for storing an inspection recipe describing a processing procedure for operating the plurality of components,
The plurality of components include a substrate holding rotation mechanism that holds and rotates the substrate, and a plurality of processing liquid nozzles that supply a processing liquid to the substrate held by the substrate holding rotation mechanism,
The operating condition data includes, for all the processing liquid nozzles defined by the configuration definition data, simultaneous discharge prohibition parameters describing other processing liquid nozzles that are prohibited from simultaneous discharge with each processing liquid nozzle,
The program causes the computer to read configuration definition data stored in the configuration definition data storage means, means to read operation condition data stored in the operation condition data storage means, and the read configuration definition data and Generate a processing procedure that constitutes the inspection recipe based on operating condition data and function as an inspection recipe generation unit that registers in the inspection recipe storage unit ,
The inspection recipe generating means sequentially discharges the processing liquid from all the processing liquid nozzles so as to avoid simultaneous discharging and continuous discharging of a plurality of processing liquid nozzles for which simultaneous discharging is prohibited by the simultaneous discharge prohibiting parameter. Including means for generating a procedure and registering it in the inspection recipe storage means;
Inspection recipe automatic generation program.   An inspection recipe automatic generation program for a substrate processing apparatus including a plurality of components for processing a substrate,
  The substrate processing apparatus stores configuration definition data storing configuration definition data defining the plurality of components, and operating condition data storing means storing operation condition data describing operating conditions of the plurality of components. And an inspection recipe storage means for storing an inspection recipe describing a processing procedure for operating the plurality of components,
  The plurality of components are held by a substrate holding and rotating mechanism that holds and rotates the substrate, a plurality of processing liquid nozzles that supply processing liquid to the substrate held by the substrate holding and rotating mechanism, and the substrate holding and rotating mechanism. Including a plurality of drainage ports that each receive the processing liquid to be removed from the substrate,
  The operating condition data includes, for all the processing liquid nozzles defined by the configuration definition data, a prohibited drainage port parameter that describes a drainage port in which reception of the processing liquid discharged from each processing liquid nozzle is prohibited. Including
  The program causes the computer to read configuration definition data stored in the configuration definition data storage means, means to read operation condition data stored in the operation condition data storage means, and the read configuration definition data and Generate a processing procedure that constitutes the inspection recipe based on operating condition data and function as an inspection recipe generation unit that registers in the inspection recipe storage unit,
  When the processing liquid is discharged from the processing liquid nozzle, the inspection recipe generation unit selects a liquid discharging port other than the liquid discharging port for which acceptance of the processing liquid discharged from the processing liquid nozzle is prohibited, and performs the processing. Including means for generating a processing procedure for receiving the liquid and registering it in the inspection recipe storage means;
Inspection recipe automatic generation program. A computer-readable storage medium in which the inspection recipe automatic generation program according to claim 4 is recorded.

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