JP5350063B2 - Sheet resistance measuring device and sheet resistance measuring method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To accurately measure sheet resistance of an object under measurement without performing complicated correction processing. <P>SOLUTION: The sheet resistance measuring apparatus allows a measurement processing unit to perform first measurement processing in which electric potentials are measured for three or more third contact points (for example, the contact positions of probes Pa1 to Pc1) on a first virtual circle with a first contact point (the contact position of a probe P0) as the center and second measurement processing in which electric potentials are measured for three or more third contact points (for example, the contact positions of probes Pa2 to Pc2) on a second virtual circle, which is concentric with the first virtual circle and differs in radius from the first virtual circle, and allows an arithmetic processing unit to perform first arithmetic processing which calculates the average value of the plurality of electric potentials measured by the first measurement processing as the electric potential on the first virtual circle with respect to the first contact point and second arithmetic processing which calculates the average value of the plurality of electric potentials measured by the second measurement processing as the electric potential on the second virtual circle with respect to the first contact point and to calculate the sheet resistance on the basis of the two calculated electric potentials and the current value of a supplied measuring current. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to a sheet resistance measuring device and a sheet resistance measuring method for measuring a sheet resistance (surface resistance) of a measurement object.

  As an apparatus for measuring sheet resistance using this type of sheet resistance measuring apparatus (sheet resistance measuring method), a thin film forming apparatus is disclosed in JP-A-5-9719. This thin film forming apparatus is an apparatus for forming a metal or alloy thin film on the surface of a substrate by sputtering or CVD, and inspects whether or not the formed thin film satisfies a desired film forming condition. A configuration is adopted in which the film forming conditions of the thin film to be formed are adjusted according to the inspection result. Specifically, in this thin film forming apparatus, a substrate on which thin film formation has been completed is transported to a sheet resistance measurement chamber, and sheet resistance is measured by a four terminal method in a state where a four terminal probe is in contact with the surface of the thin film. At this time, when the measured sheet resistance is within the reference range, it is determined that the thin film on the substrate is in a desired film formation state, and the film formation conditions are maintained. On the other hand, when the measured sheet resistance is out of the reference range, it is determined that the thin film on the substrate is not in a desired film formation state, and the film formation conditions are changed according to a predetermined procedure. Thereby, a thin film such as an alloy is formed on the surface of the substrate in a desired film formation state.

Japanese Patent Laid-Open No. 5-9719 (page 1-3, FIG. 1-8)

  However, the conventional thin film forming apparatus has the following problems. That is, the conventional thin film forming apparatus employs a configuration in which the film thickness is adjusted by obtaining a resistance value measured by bringing a four-terminal probe into contact with the thin film to be measured as the sheet resistance of the thin film. In this case, as disclosed in the above publication, the sheet resistance of the alloy thin film formed by sputtering depends on the measured value at the center of the substrate and the outer edge of the substrate depending on the film formation conditions (gas pressure and film formation time). The measured value on the part side may be different. However, even if the inventor is a thin film formed so that the resistance value is uniform in the entire region, the configuration in which the sheet resistance of the thin film is measured using a four-terminal probe (the thin-film sheet by the four-terminal method). In the method of measuring resistance), the current value flowing between the voltage measurement probes differs depending on the position on the substrate where the four-terminal probe is brought into contact, and due to this, the resistance value that differs at each measurement position is measured. I found something.

  Specifically, as an example, when the four-terminal probe is brought into contact with the vicinity of the outer edge of the substrate in the thin film, the portion where the measurement current flows is compared to when the four-terminal probe is brought into contact with the central portion of the substrate in the thin film. Therefore, a larger resistance value is measured than when the four-terminal probe is brought into contact with the center of the substrate. As described above, when the sheet resistance is measured by the four-terminal method, the measurement value is different depending on the position at which the four-terminal probe is brought into contact. Therefore, it is necessary to correct the measurement value according to the contact position of the four-terminal probe. For this reason, in the sheet resistance measuring apparatus employed in the conventional thin film forming apparatus, it is not only necessary to prepare in advance a correction value for correcting the measured value for each position where the four-terminal probe is brought into contact. There is a problem that it is difficult to quickly measure the sheet resistance of the measurement object due to executing complicated processing for correcting the measurement value.

  The present invention has been made in view of such problems, and provides a sheet resistance measurement device and a sheet resistance measurement method that can accurately measure the sheet resistance of a measurement object without performing complicated correction processing. The main purpose.

  In order to achieve the above object, the sheet resistance measuring apparatus according to claim 1 is configured to contact a first probe defined on one surface of a measurement object and a second contact defined on the one surface. A second probe, a third probe brought into contact with the third contact defined on the one surface, and the measurement between the first contact and the second contact via the first probe and the second probe A measurement processing unit for measuring a potential between the first contact and the third contact via the first probe and the third probe in a state where current is supplied, a measurement result of the measurement processing unit, and the measurement A sheet resistance measuring device including a calculation processing unit that calculates a sheet resistance of the measurement object based on a current value of a current, wherein the measurement processing unit is a first virtual circle centered on the first contact point. Regulations A first measurement process for measuring the potential at each of the three or more third contact points, and a second virtual circle concentric with the first virtual circle and having a radius different from that of the first virtual circle. A second measurement process for measuring the potential at each of the three or more third contacts, and the arithmetic processing unit performs the first measurement based on the plurality of the potentials measured by the first measurement process. A first calculation process for calculating a potential on the first virtual circle with respect to the contact, and a potential on the second virtual circle with respect to the first contact based on the plurality of potentials measured by the second measurement process The sheet resistance is calculated based on the two calculated potentials and the current value. The process of “calculating the potential on the first virtual circle (or on the second virtual circle) with respect to the first contact based on the plurality of measured potentials” includes, for example, “average of a plurality of potentials” "Calculate the value as a potential on a virtual circle for the first contact" or "the value obtained by adding, subtracting, multiplying or dividing a predetermined correction value to the average value of a plurality of potentials" This includes a process of “calculating as a potential on a circle”.

  The sheet resistance measuring device according to claim 2 is the sheet resistance measuring device according to claim 1, wherein the measurement processing unit is configured to perform the predetermined third contact at the time of the first measurement processing and the second measurement processing. When measuring the potential, the second contact closest to the predetermined third contact among the plurality of second contacts defined on a third virtual circle centered on the first contact and the second contact The measurement current is supplied between the first contact and the first contact.

  Furthermore, the sheet resistance measuring device according to claim 3 is the sheet resistance measuring device according to claim 1 or 2, wherein the third contacts at the time of the first measurement processing are equiangularly spaced on the first virtual circle. The third contacts at the time of the second measurement process are defined at equiangular intervals on the second virtual circle.

  The sheet resistance measuring device according to claim 4 is the sheet resistance measuring device according to any one of claims 1 to 3, wherein the first probe and the second probe are connected to the first contact and the second contact, respectively. A probe device is provided in which the probes are arranged such that the probes are in contact with each other and the plurality of third probes are in contact with the third contacts.

  Further, in the sheet resistance measuring method according to claim 5, the first probe is brought into contact with the first contact defined on one surface of the measurement object, the second probe is brought into contact with the second contact defined on the one surface, In a state where the third probe is brought into contact with the third contact defined on the one surface and a measurement current is supplied between the first contact and the second contact via the first probe and the second probe. A measurement process for measuring a potential between the first contact and the third contact is performed via the first probe and the third probe, and based on a measurement result of the measurement process and a current value of the measurement current A sheet resistance measuring method for executing a calculation process for calculating a sheet resistance of the measurement object, wherein the measurement process includes three or more locations defined on a first virtual circle centered on the first contact point. Previous A first measurement process for measuring the potential of each of the third contacts, and the three or more locations defined on a second virtual circle that is concentric with the first virtual circle and has a different radius from the first virtual circle. A second measurement process for measuring the potential for each of the three contact points, and the calculation process is performed on the first virtual circle with respect to the first contact point based on the plurality of potentials measured by the first measurement process. And a second calculation process for calculating a potential on the second virtual circle with respect to the first contact based on the plurality of potentials measured by the second measurement process. At the same time, the sheet resistance is calculated based on the two calculated potentials and the current value.

  In the sheet resistance measuring device according to claim 1 and the sheet resistance measuring method according to claim 5, the first contact point is defined with respect to three or more third contacts defined on a first virtual circle centered on the first contact point. A first measurement process for measuring the potential between the first virtual circle and the first contact point at three or more locations defined on a second virtual circle concentric with the first virtual circle and having a different radius from the first virtual circle. A first calculation for performing a second measurement process for measuring the potential between the first contact and the first contact, and calculating a potential on the first virtual circle with respect to the first contact based on the plurality of potentials measured by the first measurement process. And a second calculation process for calculating a potential on the second virtual circle with respect to the first contact based on the plurality of potentials measured by the second measurement process, and at the time of the two calculated potentials and the measurement process Based on the current value of the supplied measurement current It calculates the sheet resistance of the measured object Te.

  Therefore, according to the sheet resistance measuring device according to claim 1 and the sheet resistance measuring method according to claim 5, the three or more locations on the first virtual circle located in different directions with respect to the first contact point. A value calculated based on the potential measured at the three contact points is set as a potential on the first virtual circle with respect to the first contact point, and three or more points on the second virtual circle located in directions different from each other with respect to the first contact point. The value calculated based on the potential measured at the third contact point is set as the potential on the second virtual circle with respect to the first contact point. Even if the distances to the outer edge are not the same, the influence of the difference in the flow of the measurement current due to the difference in these distances can be averaged, so that the measurement value is corrected for each third contact. Without performing the correction process To accurately measure the sheet resistance of the target object (calculates) can.

  According to the sheet resistance measuring apparatus of the second aspect, the third virtual circle centered on the first contact is measured when measuring the potential of the predetermined third contact during the first measurement process and the second measurement process. By supplying a measurement current between the second contact closest to the predetermined third contact among the plurality of second contacts defined above, a potential is applied to each third contact. Since it is possible to avoid a situation in which the positional relationship of the second contact with respect to the first contact and the third contact is greatly different during measurement, the influence of the difference in the measured values due to the difference in the positional relationship is sufficiently affected. As a result, the sheet resistance of the measurement object can be measured (calculated) more accurately.

  Furthermore, according to the sheet resistance measuring apparatus according to claim 3, each third contact at the time of the first measurement process is defined at equal angular intervals on the first virtual circle, and each third contact at the time of the second measurement process is defined. Is defined at equal angular intervals on the second virtual circle, so that each third contact and the measurement object are compared with the state where each third contact is concentrated toward one direction with respect to the first contact. It is possible to sufficiently reduce the influence of the difference in the measured value due to the fact that the distance to the outer edge is not the same.

  According to the sheet resistance measuring apparatus of the fourth aspect, the first probe and the second probe are in contact with the first contact and the second contact, respectively, and the plurality of third probes are in contact with the third contacts. By providing the probe device in which each probe is arranged as described above, for example, compared with a configuration and a method in which the flying probe is brought into contact with the first contact, the second contact, and the third contact, for each third contact. Each time the potential is measured, the time required for a series of measurement processes can be shortened sufficiently to the extent that movement of the probe is unnecessary.

1 is a block diagram showing a configuration of a sheet resistance measuring device 1. FIG. 4 is a bottom view of the probe unit 2. FIG. 4 is a plan view for explaining the positional relationship between measurement points X1 to X8 in the measurement object X. FIG. It is a bottom view of the probe unit 2a.

  Hereinafter, embodiments of a sheet resistance measuring device and a sheet resistance measuring method according to the present invention will be described with reference to the accompanying drawings.

  The sheet resistance measuring apparatus 1 shown in FIG. 1 is a measuring apparatus configured to be able to measure the sheet resistance of a sheet-like measurement object X (conductive sheet) as an example, and includes a probe unit 2, a moving mechanism 3, and a measurement The unit 4, the control unit 5, the storage unit 6, and a holding mechanism (not shown) that holds the measurement object X are configured. The probe unit 2 is an example of a probe device. As shown in FIG. 2, the probe unit P0, Pa1 to Pc1, Pa2 to Pc2, Pa3 to Pc3, Pa4 to Pc4 (hereinafter referred to as “probe P” when they are not distinguished from each other). (Also referred to as) is implanted in the base portion 10. In this case, in the probe unit 2, the probe P0 corresponds to the first probe, three of the probes Pa4 to Pc4 correspond to the second probe, and 9 of the probes Pa1 to Pc1, Pa2 to Pc2, and Pa3 to Pc3. The book corresponds to the third probe.

  In the probe unit 2, the probe P 0 is in contact with a reference point (an example of “first contact” (not shown)) defined on one surface of the measurement object X, and the reference point is centered. Probes Pa1 to Pc1 are respectively brought into contact with three measurement points defined on a virtual circle (an example of “first virtual circle”) (an example of “three or more third contacts”: not shown). The probes Pa1 to Pc1 are implanted at equal angular intervals on a virtual circle Q1 having a radius r1 centered on the probe P0. Furthermore, in this probe unit 2, three locations defined on a virtual circle centered on the reference point (an example of “second virtual circle” and another example of “first virtual circle”) are defined. The probe P0 is centered and longer than the radius r1 (“radius r1” so that the probes Pa2 to Pc2 can be brought into contact with measurement points (an example of “three or more third contacts”, not shown), respectively. An example of a state that “is different from” ”Probes Pa2 to Pc2 are implanted at equal angular intervals on a virtual circle Q2 having a radius r2. Further, in this probe unit 2, three measurement points (“three or more third contacts”) defined on a virtual circle (another example of the “second virtual circle”) centered on the reference point described above. Example: state in which the probes Pa3 to Pc3 can be brought into contact with the probes Pa3 to Pc3, respectively, and longer than the radii r1 and r2 ("differs from the radii r1 and r2") Example) Probes Pa3 to Pc3 are implanted at equal angular intervals on a virtual circle Q3 having a radius r3.

  Further, in this probe unit 2, three current outflow points (“second contact point”) defined on a virtual circle (an example of “third virtual circle”) centering on the reference point with which the probe P0 is in contact are centered. In the following, the probe Pa4 to Pc4 can be brought into contact with the probe Pa4 to Pc4, respectively, and longer than the radii r1 to r3 ("radius r1"). An example of a state of “differing from ~ r3”) Probes Pa4 to Pc4 are implanted at equal angular intervals on a virtual circle Q4 having a radius r4. In this case, in this probe unit 2, probes Pa1 to Pa4 are arranged in a straight line in the direction of arrow A, probes Pb1 to Pb4 are arranged in a straight line in the direction of arrow B, and probes Pc1 to Pc4 are arranged in the direction of arrow C. It is arranged in a straight line in the direction. In addition, although each said probe P is comprised by the expansion-contraction type pin-shaped probe as an example, the illustration and description regarding the expansion-contraction mechanism of each probe P are abbreviate | omitted.

  The moving mechanism 3 moves each of the probe units 2 to the measurement points X1 to X8 shown in FIG. 3 by moving the probe unit 2 in an arbitrary XYZ direction on the measurement object X according to the control of the control unit 5. The probes P are sequentially brought into contact. In this sheet resistance measuring apparatus 1, as an example, the probe unit 2 is moved by the moving mechanism 3 with respect to the measurement object X held at a predetermined measurement position by a holding mechanism (not shown) to the measurement points X1 to X8. Although the structure which contacts each probe P is employ | adopted, the structure which moves the measuring object X with respect to the probe unit 2 fixed to the predetermined position, and makes each probe P contact the measurement points X1-X8, or a probe unit It is also possible to adopt a configuration in which both the probe 2 and the measurement object X are moved to bring the probes P into contact with the measurement points X1 to X8.

  The measurement unit 4 constitutes a measurement processing unit in combination with the control unit 5, and between the contact position of the probe P <b> 0 and the contact positions of the probes Pa <b> 4 to Pc <b> 4 as will be described later according to the control of the control unit 5. Is supplied with a direct current (an example of a current for measurement) and the potentials of the contact positions of the probes Pa1-Pc1, Pa2-Pc2, Pa3-Pc3 with respect to the contact position of the probe P0 (“between the first contact and the third contact”). An example of “potential” is measured. The measurement process by the measurement unit 4 will be described in detail later. The control unit 5 comprehensively controls the sheet resistance measuring apparatus 1. Specifically, the control unit 5 functions as a part of the measurement processing unit, controls the moving mechanism 3 to sequentially bring the probe unit 2 into contact with the measurement points X1 to X8, and controls the measurement unit 4. To execute the measurement process. Further, the control unit 5 functions as an arithmetic processing unit, and based on the measurement result of the measurement process by the measurement unit 4 and the current value of the direct current supplied from the measurement unit 4 during the measurement process, the sheet resistance of the measurement object X An arithmetic process for calculating is performed. The arithmetic processing by the control unit 5 will be described in detail later. The storage unit 6 stores an operation program for the control unit 5.

  Next, the sheet resistance measuring method of the measuring object X by the sheet resistance measuring apparatus 1 will be described with reference to the attached drawings.

  First, after the measurement surface (one surface) of the sheet resistance faces upward and the measurement object X is held by the holding mechanism, the measurement unit is started by operating an operation unit (not shown). In response to this, the control unit 5 controls the moving mechanism 3 to bring each probe P of the probe unit 2 into contact with, for example, the measurement point X1 of the measurement object X. Next, the control unit 5 controls the measurement unit 4 to start measuring the potential at each measurement point with respect to the reference point. At this time, as an example, the measurement unit 4 first connects the probes P0 and Pa4 to a DC power source (not shown) and contacts the probe Pa4 from the contact position (reference point: current supply point) (outflow point) of the probe P0. Direct current is supplied in the direction toward Further, the measuring unit 4 measures the potential (voltage between the contact position of the probe P0 and the contact position of the probe Pa1) with respect to the reference point of the contact position (measurement point) of the probe Pa1 via the probes P0 and Pa1. Further, the measuring unit 4 outputs measured value data Dv for the measured potential to the control unit 5.

  In response to this, the control unit 5 causes the storage unit 6 to store the measurement value data Dv output from the measurement unit 4. In the following description, description of the process in which the control unit 5 stores the measurement value data Dv output from the measurement unit 4 in the storage unit 6 is omitted. On the other hand, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pa1 is completed, the measurement unit 4 uses the probes P0 and Pa2 to measure the reference position of the contact position (measurement point) of the probe Pa2. The potential is measured, and the measured value data Dv is output to the control unit 5. Further, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pa2 is completed, the measurement unit 4 passes the probes P0 and Pa3 to the reference point of the contact position (measurement point) of the probe Pa3. The potential is measured, and the measured value data Dv is output to the control unit 5.

  Next, the measurement unit 4 connects the probe Pb4 to a DC power source (not shown) instead of the probe Pa4, and moves from the contact position (reference point: current supply point) of the probe P0 toward the contact position (outflow point) of the probe Pb4. Supply direct current. In this case, when the potential at each measurement point described below is measured in a state where a direct current is supplied between the probes P0 and Pa4 (when an outflow point that is not the closest to each measurement point is used), The positional relationship between the reference point and the outflow point with respect to each measurement point is different from that in the measurement process using the contact positions of the probes Pa1 to Pa3 as measurement points. Therefore, in the sheet resistance measuring apparatus 1, as described above, when measuring the potential with the contact positions of the probes Pa1 to Pa3 as measurement points, the probe is selected from among the contact positions (a plurality of outflow points) of the probes Pa4 to Pc4. The contact position of the probe Pa4 closest to the contact position of Pa1 to Pa3 is taken as the outflow point, and the contact position of the probes Pb1 to Pb3 is measured at the time of measuring the potential with the contact position of the probes Pb1 to Pb3 as the measurement point, as described below. The contact position of the probe Pc4 closest to the contact position of the probes Pc1 to Pc3 is used as the outflow point when measuring the potential with the contact position of the probe Pb4 closest to the outflow point and the contact position of the probes Pc1 to Pc3 as the measurement point. .

  Subsequently, the measurement unit 4 measures the potential of the contact position (measurement point) of the probe Pb1 with respect to the reference point via the probes P0 and Pb1, and outputs the measurement value data Dv to the control unit 5. Further, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pb1 is completed, the measurement unit 4 passes the probes P0 and Pb2 to the reference point of the contact position (measurement point) of the probe Pb2. The potential is measured, and the measured value data Dv is output to the control unit 5. Further, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pb2 is completed, the measurement unit 4 passes the probes P0 and Pb3 to the reference point of the contact position (measurement point) of the probe Pb3. The potential is measured, and the measured value data Dv is output to the control unit 5.

  Next, the measurement unit 4 connects the probe Pc4 to a DC power source (not shown) instead of the probe Pb4 and moves from the contact position (reference point: current supply point) of the probe P0 toward the contact position (outflow point) of the probe Pc4. Supply direct current. Subsequently, the measurement unit 4 measures the potential of the contact position (measurement point) of the probe Pc1 with respect to the reference point via the probes P0 and Pc1, and outputs the measured value data Dv to the control unit 5. Further, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pc1 is completed, the measurement unit 4 uses the probes P0 and Pc2 to measure the reference position of the contact position (measurement point) of the probe Pc2. The potential is measured, and the measured value data Dv is output to the control unit 5. Further, at the time when the output of the measurement value data Dv for the contact position (measurement point) of the probe Pc2 is completed, the measurement unit 4 passes the probes P0 and Pc3 to the reference point of the contact position (measurement point) of the probe Pc3. The potential is measured, and the measured value data Dv is output to the control unit 5.

  Thereby, in a state where the probe unit 2 is in contact with the measurement point X1 of the measurement object X, reference points (probe P0 of the probe P0) of nine measurement points (probe Pa1-Pc1, Pa2-Pc2, Pa3-Pc3 contact positions). The potential with respect to the contact position) is measured, and the measured value data Dv is stored in the storage unit 6 respectively. Thereafter, the control unit 5 controls the moving mechanism 3 so that the probe unit 2 is separated from the measurement point X1 and brought into contact with the measurement point X2, and each measurement is performed in the same manner as the series of measurement processes at the measurement point X1. Allow the potential on the point to be measured. Further, after the measurement process for the measurement point X2 is completed, the control unit 5 causes the measurement points X3 to X8 to measure the potential at each measurement point in the same manner as the measurement points X1 and X2. Thereby, a series of measurement processes for the measurement points X1 to X8 of the measurement object X are completed.

  On the other hand, when the above measurement process is completed, the control unit 5 executes the first calculation process and the second calculation process for each of the measurement points X1 to X8, and as an example, each of the distances from the reference point is equal. The average value of the potential measured at the measurement point is calculated. In this case, as described above, the probes Pa1 to Pc1 are arranged at equiangular intervals with the probe P0 as the center. Therefore, the contact positions (three measurement points) of the probes Pa1 to Pc1 are separated from each other at equal angular intervals with the contact position (reference point) of the probe P0 as the center. For this reason, even if each distance from the contact position (measurement point) of each probe Pa1-Pc1 to the outer edge of the measuring object X is not the same (nonuniform) due to the shape of the measuring object X By calculating the average value of the potentials measured at the contact positions of the probes Pa1 to Pc1, it is possible to sufficiently reduce the influence of the difference in the direct current flow between the reference point and the measurement point. Similarly, by averaging the potentials measured at the contact positions of the probes Pa2 to Pc2 and Pa3 to Pc3, it is possible to sufficiently reduce the above effects. Therefore, the control unit 5 calculates the average value of the measurement value data Dv stored in the storage unit 6 according to the operation program stored in the storage unit 6.

  Specifically, the control unit 5 calculates an average value of potentials at the contact positions of the probes Pa1 to Pc1 (measurement points having the same distance from the reference point), and the contact position of the probe P0 (reference point: hereinafter) , And also stored in the storage unit 6 as a potential on a virtual circle having a radius r1 (also referred to as “virtual circle Qx1” hereinafter) centered on “reference point Px0” (“measured” In this example, the average value of each potential is calculated as the potential on the virtual circle). Similarly, the control unit 5 calculates the average value of the potentials of the contact positions of the probes Pa2 to Pc2 (measurement points having the same distance from the reference point), and determines the contact position (reference point Px0) of the probe P0. The potential is stored in the storage unit 6 as a potential on a virtual circle having a radius r2 as a center (a circle corresponding to the virtual circle Q2: hereinafter also referred to as “virtual circle Qx2”). Further, the control unit 5 calculates an average value of potentials at the contact positions of the probes Pa3 to Pc3 (measurement points having the same distance from the reference point), and the contact position of the probe P0 (reference point Px0) is the center. To be stored in the storage unit 6 as a potential on a virtual circle having a radius r3 (a circle corresponding to the virtual circle Q3: hereinafter also referred to as “virtual circle Qx3”).

Next, the control unit 5 calculates the above calculation results (potentials on the virtual circles Qx1 to Qx3), the current value of the direct current supplied from the measurement unit 4 during the potential measurement process, and the virtual circles Qx1 from the reference point Px0. Based on the distance to Qx3 (in this example, radii r1 to r3), the sheet resistance of each measurement point X1 to X8 in the measurement object X is measured (calculated). At this time, the current value of the direct current supplied from the measurement unit 4 is “I”, the potential on the virtual circle Qx1 with respect to the reference point Px0 is “v1”, and the potential on the virtual circle Qx2 with respect to the reference point Px0 is “v2”. ”, The combined resistance“ R0 ”between the virtual circles Qx1 and Qx2 is expressed by the following equation.

さらに、電流が流れる部位の厚みを「ｔ」とすると、上記の抵抗「ｆ（ｒ）」は、次の式で表される。

ここで、導体のシート抵抗（面抵抗）「Ｒｓ」は、体積抵抗率を「ρ」を電流が流れる部位の厚み「ｔ」で除した値であるため、

となる。 In this case, the resistance “f (r)” of the conductor such as the measurement object X has a volume resistivity of “ρ”, a current flowing distance of “dr”, and a cross-sectional area of the current flowing portion of “r”. S ”is expressed by the following equation.

Furthermore, when the thickness of the portion where current flows is “t”, the resistance “f (r)” is expressed by the following equation.

Here, the sheet resistance (surface resistance) “Rs” of the conductor is a value obtained by dividing the volume resistivity by “ρ” by the thickness “t” of the portion through which the current flows.

It becomes.

であり、測定対象体Ｘのシート抵抗「Ｒｓ」は、

との式に基づいて演算できるのが理解できる。 Therefore, the combined resistance “R0” between the virtual circles Qx1 and Qx2 in the measurement object X is

The sheet resistance “Rs” of the measurement object X is

It can be understood that the calculation can be performed based on the following formula.

  Therefore, the control unit 5 follows the operation program generated corresponding to the above equation [Equation 6], the potential on the virtual circles Qx1, Qx2, and the distance (radius) from the reference point Px0 to the virtual circles Qx1, Qx2. Based on r1, r2), the sheet resistance of the measurement object X is calculated (an example of a sheet resistance measurement method in which the virtual circle Qx1 is the first virtual circle and the virtual circle Qx2 is the second virtual circle). Further, the control unit 5 calculates the sheet resistance of the measurement object X based on the potentials of the virtual circles Qx1 and Qx3 and the distances (radius r1 and r3) from the reference point Px0 to the virtual circles Qx1 and Qx3 (virtual circles). Example of sheet resistance measurement method in which Qx1 is a first virtual circle and virtual circle Qx3 is a second virtual circle). Further, the control unit 5 calculates the sheet resistance of the measurement object X based on the potentials on the virtual circles Qx2 and Qx3 and the distances (radius r2 and r3) from the reference point Px0 to the virtual circles Qx2 and Qx3 (virtual circles Xx2 and Qx3). Example of sheet resistance measurement method in which circle Qx2 is the first virtual circle and virtual circle Qx3 is the second virtual circle). Next, the control unit 5 calculates the average value of the calculation results obtained by the three calculation processes as the sheet resistance of the measurement point X1. The control unit 5 also calculates the sheet resistance for the measurement points X2 to X8 in the same procedure as the series of calculation processes for the measurement point X1. Thereby, a series of processes for measuring the sheet resistance of the measurement object X is completed.

  Thus, in the sheet resistance measuring apparatus 1 and the sheet resistance measuring method using the sheet resistance measuring apparatus 1, the first virtual circle (center of the reference point (in this example, the contact position of the probe P0)) (first virtual circle) Three or more measurement points (third contact point: as an example, each contact position of the probes Pa1 to Pc1) defined on the virtual circle Q1 in the probe unit 2 with respect to the reference point (with respect to the reference point) Between the first imaginary circle and the first imaginary circle which is concentric and has a different radius from the first imaginary circle (a circle corresponding to the imaginary circle Q2 in the probe unit 2). Measure the potential with respect to the reference point (potential between the reference points) for each of the three or more measurement points defined above (third contact point: as an example, each contact position of the probes Pa2 to Pc2). Measured by the second measurement process and the first measurement process for calculating the potential on the first virtual circle with respect to the reference point based on the plurality of potentials measured by the first measurement process. The second calculation process for calculating the potential on the second virtual circle with respect to the reference point based on the plurality of potentials is performed, and the measurement is performed based on the two calculated potentials and the current value of the direct current supplied during the measurement process. The sheet resistance of the object X is calculated.

  Therefore, according to the sheet resistance measuring apparatus 1 and the sheet resistance measuring method by the sheet resistance measuring apparatus 1, the measurement is performed at three measurement points on the first virtual circle located in directions different from each other with respect to the reference point. The value calculated based on the potential (in this example, the average value of each potential) is set as the potential on the first virtual circle with respect to the reference point, and on the second virtual circle located in a direction different from the reference point. The value calculated based on the potentials measured at the three measurement points (in this example, the average value of each potential) is set as the potential on the second virtual circle with respect to the reference point, so that the shape of the measurement object X is obtained. Therefore, even if each distance from each measurement point to the outer edge of the measurement object X is not the same, the influence of the difference in the flow of direct current due to the difference in these distances can be averaged. The measured value is supplemented for each measurement point. Without performing a complicated correction process for accurately measuring the sheet resistance of the measured object X (computed) can.

  Further, according to the sheet resistance measuring apparatus 1 and the sheet resistance measuring method by the sheet resistance measuring apparatus 1, when measuring the potential at a predetermined measurement point during the first measurement process and the second measurement process, the reference Multiple outflow points (in this example, contact positions of the probes Pa4 to Pc4) defined on a third virtual circle centered on the point (in this example, a circle corresponding to the virtual circle Q4 in the probe unit 2) By supplying a direct current between the reference point and the outflow point closest to the predetermined measurement point, when measuring the potential at each measurement point, the positional relationship of the reference point and the outflow point with respect to the measurement point is Since it is possible to avoid a situation in which the state is greatly different, it is possible to sufficiently reduce the influence of the difference in the measurement value caused by the difference in the positional relationship, and as a result, the sheet resistance of the measurement object X is further reduced. It can sure to measure (computing).

  Furthermore, according to the sheet resistance measurement device 1 and the sheet resistance measurement method by the sheet resistance measurement device 1, the measurement points at the time of the first measurement process are defined at equal angular intervals on the first virtual circle, By defining each measurement point at the time of the second measurement process at equal angular intervals on the second virtual circle, each measurement point is compared to a state where each measurement point is concentrated toward one direction with respect to the reference point. It is possible to sufficiently reduce the influence of the difference in the measurement values due to the fact that the distances between the three measurement points (each third contact point) on the circle and the outer edge of the measurement object X are not the same.

  Further, according to the sheet resistance measuring device 1 and the sheet resistance measuring method by the sheet resistance measuring device 1, the probe P0 and the probes Pa4 to Pc4 are in contact with the reference point and the outflow point, respectively, and the probes Pa1 to Pc1, By providing the probe unit 2 in which each probe P is disposed so that Pa2 to Pc2 and Pa3 to Pc3 are in contact with the respective measurement points, for example, the flying probe is brought into contact with the reference point, the outflow point, and the measurement point, respectively. Compared with the configuration and method, the time required for a series of measurement processes can be sufficiently shortened by the amount that the probe movement is not required each time the potential at each measurement point is measured.

  In addition, this invention is not limited to said structure and method. For example, probes Pa1 to Pc1, probes Pa2 to Pc2, and probes Pa3 arranged to be able to contact three measurement points (third contacts) defined on a virtual circle centered on a reference point (first contact). Although the sheet resistance measuring apparatus 1 including the probe unit 2 having Pc3 and the sheet resistance measuring method thereof have been described, a plurality of measurement points (third contact points) defined on the virtual circle can be contacted. A probe can be provided.

  Specifically, the probe unit 2a shown in FIG. 4 includes, for example, 49 probes P of probes Pa1 to Pa7, Pb1 to Pb7,... Pg1 to Pg7 (hereinafter also referred to as “probes P” when not distinguished). They are arranged in a 7 × 7 matrix. In addition, in this sheet resistance measuring apparatus 1 provided with this probe unit 2a and the probe unit 2a, about the component which has the same function as said probe unit 2 and the sheet resistance measuring apparatus 1, the same code | symbol is attached | subjected and it overlaps. Description to be omitted is omitted. In this probe unit 2a, as an example, the probe Pd4 disposed at the center thereof is brought into contact with a reference point (another example of “first contact”: not shown) defined on one surface of the measurement object X. Measurement points defined on a virtual circle centered on the reference point (circles corresponding to the virtual circles Q1 to Q4 shown in the figure: hereinafter also referred to as “virtual circles Qx1 to Qx4”) Each probe P can be brought into contact with (another example of “three or more measurement points”: not shown).

  More specifically, in the probe unit 2a, for example, during the measurement process in which the virtual circle Qx1 is the first virtual circle, the probes Pd3, Pc4, Pd5 located on the virtual circle Q1 with the radius r1 centered on the probe Pd4. The contact positions of the probes Pd1, Pa4, Pd7, and Pg4 located on the virtual circle Q5 having the radius r5 centered on the probe Pd4, with the contact positions of the four probes P4 of Pe4 being the measurement points (third contact points), respectively. A position closest to each measurement point is set as an outflow point (second contact point) so that a series of processes can be executed. For example, during the measurement process in which the virtual circle Qx2 is the second virtual circle (or the first virtual circle), the probes Pc3, Pc5, Pe5, and Pe3 positioned on the virtual circle Q2 with the radius r2 centered on the probe Pd4 are used. Of the contact positions of the probes Pa1, Pa7, Pg7, and Pg1 located on the virtual circle Q6 having a radius r6 centered on the probe Pd4, the contact positions of the four probes P are the measurement points (third contact points), respectively. A series of processes can be executed with the position closest to each measurement point as an outflow point (second contact point).

  Further, for example, during the measurement process in which the virtual circle Qx3 is the first virtual circle (or the second virtual circle), the probes Pd2, Pb4, Pd6, Pf4 positioned on the virtual circle Q3 having the radius r3 centered on the probe Pd4 are used. Of the contact positions of the probes Pd1, Pa4, Pd7, and Pg4 located on the virtual circle Q5 having the radius r5 centered on the probe Pd4, the contact positions of the four probes P are the measurement points (third contact points), respectively. A series of processes can be executed with the position closest to each measurement point as an outflow point (second contact point). Further, for example, in the measurement process in which the virtual circle Qx4 is the second virtual circle, the contact positions of the four probes P, which are the probes Pb2, Pb6, Pf6, and Pf2, located on the virtual circle Q4 with the radius r4 centered on the probe Pd4. Are the measurement points (third contact points), and the position closest to each measurement point among the contact positions of the probes Pa1, Pa7, Pg7, Pg1 located on the virtual circle Q6 with the radius r6 centered on the probe Pd4 Is configured to be able to execute a series of processes with the outflow point (second contact point).

  In this case, as described above, in the probe unit 2a, the probes P are arranged in a matrix. Accordingly, the contact positions (measurement points) of the probes Pd3, Pc4, Pd5, and Pe4 are positioned at equiangular intervals with respect to the contact position (reference point) of the probe Pd4, and the probes Pc3, Pc5, Pe5, and Pe3. The contact positions (measurement points) are positioned at equiangular intervals with respect to the contact position (reference point) of the probe Pd4. The contact positions (measurement points) of the probes Pd2, Pb4, Pd6, and Pf4 are The contact positions (reference points) of the probes Pd2, Pb6, Pf6, and Pf2 are positioned at equiangular intervals with respect to the contact positions (reference points) of the probe Pd4. Are located at equiangular intervals. Therefore, according to the sheet resistance measuring method using the probe unit 2a, the same effect as that of the sheet resistance measuring method using the probe unit 2 can be obtained.

  Furthermore, the probe unit 2 having a configuration in which each probe P is brought into contact with three third contacts on the first virtual circle and three third contacts on the second virtual circle, and four locations on the first virtual circle. Although the example which measures the electric potential of each 3rd contact using the probe unit 2a of the structure which contacts each probe P to the 3rd contact of the 3rd contact and the 4th contact on the 2nd virtual circle, respectively was demonstrated. A configuration in which the number of third contacts (measurement points) on the virtual circle and the number of third contacts (measurement points) on the second virtual circle are defined as different numbers, and the potential of each third contact is measured; The method can also be adopted. Also, a sheet resistance measuring apparatus 1 including probe units 2 and 2a each having a plurality of probes P brought into contact with a plurality of outflow points and a plurality of probes P brought into contact with the respective measurement points, and a sheet resistance measuring method thereof However, at least three flying probes, ie, a probe that contacts the reference point (first contact), a probe that contacts the outflow point (second contact), and a probe that contacts the measurement point (third contact) are used. It is also possible to adopt a configuration and method for measuring sheet resistance. In this case, by using a plurality of probes that are brought into contact with the outflow point and probes that are brought into contact with the measurement point, the time required for the sheet resistance measurement process can be sufficiently shortened.

  Further, in the sheet resistance measurement method using the probe units 2 and 2a, the current supply point and the current outflow point are switched, and each measurement is performed while supplying a direct current from the outflow point to the reference point in the above example. The potential for each point can also be measured. Further, in the sheet resistance measurement method using the probe units 2 and 2a, the direction of the measurement point (third contact) with respect to the reference point (first contact) and the outflow point (second point) with respect to the reference point (first contact). The reference point, measurement point, and outflow point are in a straight line. However, the position of the outflow point with respect to the reference point and measurement point is limited to this example. Not. In addition, an example has been described in which a plurality of outflow points are defined and the closest outflow point is used for measuring the potential at each measurement point. However, when a plurality of outflow points are defined, the closest to each measurement point is described. An outflow point other than the outflow point can be used. For example, one outflow point defined on the measurement object X can be used in common. Furthermore, although an example in which a direct current is supplied as a measurement current has been described, a configuration and a method in which each potential is measured by supplying an alternating current as a measurement current instead of a direct current can be employed. In addition, the present invention is applied to a volume resistivity measuring device and a volume resistivity measuring method for determining a volume resistivity of a measuring object X by multiplying a sheet resistance value measured according to the above sheet resistance measuring method by a thickness of the measuring object X. Each of the above-described configurations and methods can also be employed.

DESCRIPTION OF SYMBOLS 1 Sheet resistance measuring device 2, 2a Probe unit 3 Movement mechanism 4 Measuring part 5 Control part 6 Storage part P0, Pa1-Pa7, Pb1-Pb7, Pc1-Pc7, Pd1-Pd7, Pe1-Pe7, Pf1-Pf7, Pg1- Pg7 Probe Px0 Reference point Q1 to Q6, Qx1 to Qx3 Virtual circle r1 to r6 Radius X Measurement object

Claims (5)

A first probe brought into contact with a first contact defined on one surface of the measurement object, a second probe brought into contact with a second contact defined on the one surface, and a third contact defined on the one surface A third probe to be measured, and a current for measurement is supplied between the first contact and the second contact via the first probe and the second probe, and the first probe and the third probe And measuring the sheet resistance of the measurement object based on the measurement result of the measurement processing unit and the current value of the current for measurement, and measuring the potential between the first contact and the third contact A sheet resistance measuring device including an arithmetic processing unit,
The measurement processing unit includes a first measurement process for measuring the potential at three or more third contacts defined on a first virtual circle centered on the first contact, and the first virtual circle, Performing a second measurement process for measuring the potential at each of the three or more third contacts defined on a second virtual circle that is concentric and has a radius different from that of the first virtual circle,
The calculation processing unit includes a first calculation process for calculating a potential on the first virtual circle with respect to the first contact based on the plurality of potentials measured by the first measurement process, and a second measurement process. And a second calculation process for calculating a potential on the second virtual circle with respect to the first contact based on the plurality of measured potentials, and based on the two calculated potentials and the current value. A sheet resistance measuring device for calculating the sheet resistance.   The measurement processing unit is defined on a third virtual circle centered on the first contact when measuring the potential of the predetermined third contact during the first measurement process and the second measurement process. The sheet resistance measuring device according to claim 1, wherein the current for measurement is supplied between the second contact closest to the predetermined third contact among the plurality of second contacts and the first contact.   The third contacts at the time of the first measurement process are defined at equiangular intervals on the first virtual circle, and the third contacts at the time of the second measurement process are equal to the second virtual circle. The sheet resistance measuring device according to claim 1 or 2, wherein the sheet resistance measuring device is defined by an angular interval.   The probes are arranged so that the first probe and the second probe are in contact with the first contact and the second contact, respectively, and a plurality of the third probes are in contact with the third contacts. The sheet resistance measuring device according to any one of claims 1 to 3, further comprising a probe device. The first probe is brought into contact with the first contact defined on one surface of the measurement object, the second probe is brought into contact with the second contact defined on the one surface, and the third probe is contacted with the third contact defined on the one surface. And the measurement current is supplied between the first contact and the second contact via the first probe and the second probe, and the measurement probe is connected via the first probe and the third probe. Arithmetic process for measuring a potential between the first contact and the third contact and calculating a sheet resistance of the measurement object based on a measurement result of the measurement process and a current value of the measurement current A sheet resistance measuring method for performing
As the measurement process, a first measurement process for measuring the potential at each of three or more third contacts defined on a first virtual circle centered on the first contact, and a concentricity with the first virtual circle And the second measurement process for measuring the potential at each of the three or more third contacts defined on the second virtual circle having a radius different from that of the first virtual circle, and as the calculation process, A first calculation process for calculating a potential on the first virtual circle with respect to the first contact based on the plurality of potentials measured by the first measurement process, and a plurality of the plurality of measurements measured by the second measurement process And a second calculation process for calculating a potential on the second virtual circle with respect to the first contact based on the potential, and calculating the sheet resistance based on the two calculated potentials and the current value. Sheet Anti-measurement method.

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