JP5331004B2 - Ink composition - Google Patents
Ink composition Download PDFInfo
- Publication number
- JP5331004B2 JP5331004B2 JP2009534281A JP2009534281A JP5331004B2 JP 5331004 B2 JP5331004 B2 JP 5331004B2 JP 2009534281 A JP2009534281 A JP 2009534281A JP 2009534281 A JP2009534281 A JP 2009534281A JP 5331004 B2 JP5331004 B2 JP 5331004B2
- Authority
- JP
- Japan
- Prior art keywords
- ink composition
- printing
- imide oligomer
- water
- thermosetting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 59
- 150000003949 imides Chemical class 0.000 claims abstract description 62
- 238000007639 printing Methods 0.000 claims abstract description 47
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000003960 organic solvent Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 36
- -1 polycyclic aromatic compound Chemical class 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 239000007921 spray Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 13
- 125000002950 monocyclic group Chemical group 0.000 claims description 12
- 150000001491 aromatic compounds Chemical class 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 238000007641 inkjet printing Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 238000007650 screen-printing Methods 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 2
- 125000003158 alcohol group Chemical group 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 230000000704 physical effect Effects 0.000 abstract description 7
- 239000003822 epoxy resin Substances 0.000 abstract description 6
- 229920000647 polyepoxide Polymers 0.000 abstract description 6
- 229920001721 polyimide Polymers 0.000 abstract description 6
- 239000009719 polyimide resin Substances 0.000 abstract description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 57
- 230000015572 biosynthetic process Effects 0.000 description 20
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 20
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- 230000009477 glass transition Effects 0.000 description 18
- 238000003786 synthesis reaction Methods 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000843 powder Substances 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 239000011521 glass Substances 0.000 description 12
- 125000003118 aryl group Chemical group 0.000 description 11
- 239000011259 mixed solution Substances 0.000 description 11
- 239000007787 solid Substances 0.000 description 11
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- DDCJHFYXAPQYLA-UHFFFAOYSA-N (3-chlorophenyl)-phenylmethanol Chemical compound C=1C=CC(Cl)=CC=1C(O)C1=CC=CC=C1 DDCJHFYXAPQYLA-UHFFFAOYSA-N 0.000 description 7
- 239000012153 distilled water Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 235000010290 biphenyl Nutrition 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 5
- 239000012456 homogeneous solution Substances 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000004570 mortar (masonry) Substances 0.000 description 5
- 125000003367 polycyclic group Chemical group 0.000 description 5
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 4
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 3
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920005575 poly(amic acid) Polymers 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- MILSYCKGLDDVLM-UHFFFAOYSA-N 2-phenylpropan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)C1=CC=CC=C1 MILSYCKGLDDVLM-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- CFTSORNHIUMCGF-UHFFFAOYSA-N (1,1,1,3,3,3-hexafluoro-2-phenylpropan-2-yl)benzene Chemical compound C=1C=CC=CC=1C(C(F)(F)F)(C(F)(F)F)C1=CC=CC=C1 CFTSORNHIUMCGF-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 description 1
- DLUSTXUPBZDMOL-UHFFFAOYSA-N 1-phenoxy-4-[2-(4-phenoxyphenyl)propan-2-yl]benzene Chemical compound C=1C=C(OC=2C=CC=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC=C1 DLUSTXUPBZDMOL-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- MHQULXYNBKWNDF-UHFFFAOYSA-N 3,4-dimethylbenzene-1,2-diamine Chemical class CC1=CC=C(N)C(N)=C1C MHQULXYNBKWNDF-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- QSPMTSAELLSLOQ-UHFFFAOYSA-N 3-(4-aminophenyl)aniline Chemical group C1=CC(N)=CC=C1C1=CC=CC(N)=C1 QSPMTSAELLSLOQ-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- ZDBWYUOUYNQZBM-UHFFFAOYSA-N 3-(aminomethyl)aniline Chemical compound NCC1=CC=CC(N)=C1 ZDBWYUOUYNQZBM-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- WXRREUIRWZLUBD-UHFFFAOYSA-N 3-[2-(3-aminophenoxy)propan-2-yloxy]aniline Chemical compound C=1C=CC(N)=CC=1OC(C)(C)OC1=CC=CC(N)=C1 WXRREUIRWZLUBD-UHFFFAOYSA-N 0.000 description 1
- HIYRIYOUSQLJHP-UHFFFAOYSA-N 3-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=C(N)C=C1 HIYRIYOUSQLJHP-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- NQZOFDAHZVLQJO-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(OC=3C=CC(OC=4C=C(N)C=CC=4)=CC=3)=CC=2)=C1 NQZOFDAHZVLQJO-UHFFFAOYSA-N 0.000 description 1
- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- GLISOBUNKGBQCL-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(C)CCCN GLISOBUNKGBQCL-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 1
- BOMBLIPPMRMTNN-UHFFFAOYSA-N 4-(2-anthracen-1-ylethynyl)-2-benzofuran-1,3-dione Chemical compound C1=CC=C2C=C3C(C#CC4=CC=CC5=C4C(=O)OC5=O)=CC=CC3=CC2=C1 BOMBLIPPMRMTNN-UHFFFAOYSA-N 0.000 description 1
- OKWPQSKFXBHEJT-UHFFFAOYSA-N 4-(2-anthracen-1-ylethynyl)benzo[e][2]benzofuran-1,3-dione Chemical compound C1=CC=C2C=C3C(C#CC=4C5=C(C6=CC=CC=C6C=4)C(=O)OC5=O)=CC=CC3=CC2=C1 OKWPQSKFXBHEJT-UHFFFAOYSA-N 0.000 description 1
- UTKVWZGPTDWSLO-UHFFFAOYSA-N 4-(2-anthracen-1-ylethynyl)naphtho[2,3-e][2]benzofuran-1,3-dione Chemical compound C1=CC=C2C=C3C(C#CC=4C5=C(C6=CC7=CC=CC=C7C=C6C=4)C(=O)OC5=O)=CC=CC3=CC2=C1 UTKVWZGPTDWSLO-UHFFFAOYSA-N 0.000 description 1
- GRMAIVZFGOZVLO-UHFFFAOYSA-N 4-(2-naphthalen-1-ylethynyl)-2-benzofuran-1,3-dione Chemical compound C1=CC=C2C(C#CC3=CC=CC4=C3C(=O)OC4=O)=CC=CC2=C1 GRMAIVZFGOZVLO-UHFFFAOYSA-N 0.000 description 1
- AXMANIZPMQZKTG-UHFFFAOYSA-N 4-(2-phenylethynyl)-2-benzofuran-1,3-dione Chemical compound O=C1OC(=O)C2=C1C=CC=C2C#CC1=CC=CC=C1 AXMANIZPMQZKTG-UHFFFAOYSA-N 0.000 description 1
- CJEKXJHJPMXECG-UHFFFAOYSA-N 4-(2-phenylethynyl)benzo[e][2]benzofuran-1,3-dione Chemical compound O=C1OC(=O)C(C2=CC=CC=C2C=2)=C1C=2C#CC1=CC=CC=C1 CJEKXJHJPMXECG-UHFFFAOYSA-N 0.000 description 1
- JDNKWKKEEQWLDY-UHFFFAOYSA-N 4-(2-phenylethynyl)naphtho[2,3-e][2]benzofuran-1,3-dione Chemical compound O=C1OC(=O)C(C2=CC3=CC=CC=C3C=C2C=2)=C1C=2C#CC1=CC=CC=C1 JDNKWKKEEQWLDY-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- BFWYZZPDZZGSLJ-UHFFFAOYSA-N 4-(aminomethyl)aniline Chemical compound NCC1=CC=C(N)C=C1 BFWYZZPDZZGSLJ-UHFFFAOYSA-N 0.000 description 1
- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- IYMMZGRJAMFSKQ-UHFFFAOYSA-N 4-[2-(4-aminophenoxy)propan-2-yloxy]aniline Chemical compound C=1C=C(N)C=CC=1OC(C)(C)OC1=CC=C(N)C=C1 IYMMZGRJAMFSKQ-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- KIFDSGGWDIVQGN-UHFFFAOYSA-N 4-[9-(4-aminophenyl)fluoren-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 KIFDSGGWDIVQGN-UHFFFAOYSA-N 0.000 description 1
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- ZBMREUQRPOFFGE-UHFFFAOYSA-N 5-(2-anthracen-1-ylethynyl)-2-benzofuran-1,3-dione Chemical compound C1=CC=C2C=C3C(C#CC=4C=C5C(=O)OC(C5=CC=4)=O)=CC=CC3=CC2=C1 ZBMREUQRPOFFGE-UHFFFAOYSA-N 0.000 description 1
- VXGJRDXVYHVQGK-UHFFFAOYSA-N 5-(2-naphthalen-1-ylethynyl)-2-benzofuran-1,3-dione Chemical compound C1=CC=C2C(C#CC=3C=C4C(=O)OC(C4=CC=3)=O)=CC=CC2=C1 VXGJRDXVYHVQGK-UHFFFAOYSA-N 0.000 description 1
- UPGRRPUXXWPEMV-UHFFFAOYSA-N 5-(2-phenylethynyl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C#CC1=CC=CC=C1 UPGRRPUXXWPEMV-UHFFFAOYSA-N 0.000 description 1
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- XXRRHTKFJQNCFG-UHFFFAOYSA-N NC1=CC=C(OC2=CC=C(C=C2)C(=O)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1.NC=1C=C(OC2=CC=C(C=C2)C(=O)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 Chemical compound NC1=CC=C(OC2=CC=C(C=C2)C(=O)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1.NC=1C=C(OC2=CC=C(C=C2)C(=O)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 XXRRHTKFJQNCFG-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- IVGBGCPUDUTSHT-UHFFFAOYSA-N [3-(3-aminobenzoyl)phenyl]-(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(C=CC=2)C(=O)C=2C=C(N)C=CC=2)=C1 IVGBGCPUDUTSHT-UHFFFAOYSA-N 0.000 description 1
- UVXIFYUJZWURAR-UHFFFAOYSA-N [3-(4-aminobenzoyl)phenyl]-(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC(C(=O)C=2C=CC(N)=CC=2)=C1 UVXIFYUJZWURAR-UHFFFAOYSA-N 0.000 description 1
- KJGPUSGHNHJCNO-UHFFFAOYSA-N [4-(3-aminobenzoyl)phenyl]-(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=CC(=CC=2)C(=O)C=2C=C(N)C=CC=2)=C1 KJGPUSGHNHJCNO-UHFFFAOYSA-N 0.000 description 1
- DBCMPVCYHLRHND-UHFFFAOYSA-N [4-(4-aminobenzoyl)phenyl]-(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(C(=O)C=2C=CC(N)=CC=2)C=C1 DBCMPVCYHLRHND-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- NDMVXIYCFFFPLE-UHFFFAOYSA-N anthracene-9,10-diamine Chemical class C1=CC=C2C(N)=C(C=CC=C3)C3=C(N)C2=C1 NDMVXIYCFFFPLE-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- CSNJSTXFSLBBPX-UHFFFAOYSA-N n'-(trimethoxysilylmethyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CNCCN CSNJSTXFSLBBPX-UHFFFAOYSA-N 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- NQKOSCFDFJKWOX-UHFFFAOYSA-N n-[3-[diethoxy(methyl)silyl]propyl]aniline Chemical compound CCO[Si](C)(OCC)CCCNC1=CC=CC=C1 NQKOSCFDFJKWOX-UHFFFAOYSA-N 0.000 description 1
- YZPARGTXKUIJLJ-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]aniline Chemical compound CO[Si](C)(OC)CCCNC1=CC=CC=C1 YZPARGTXKUIJLJ-UHFFFAOYSA-N 0.000 description 1
- QWPIYOGWUXWHOV-UHFFFAOYSA-N naphthalene-1,2,7,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C(C(O)=O)C2=C(C(O)=O)C(C(=O)O)=CC=C21 QWPIYOGWUXWHOV-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical class C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- DYFXGORUJGZJCA-UHFFFAOYSA-N phenylmethanediamine Chemical class NC(N)C1=CC=CC=C1 DYFXGORUJGZJCA-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、印刷用インク組成物、熱硬化性イミドオリゴマー膜の製造方法及び多層印刷配線板に関する。 The present invention relates to a printing ink composition, a method for producing a thermosetting imide oligomer film, and a multilayer printed wiring board.
近年、多層印刷配線板の更なる高密度化・小型化を実現するために、より微細なパターン形状を有する導電層や絶縁層を備える多層印刷配線板が要求されている。このような導電層や絶縁層の形成方法としては、例えば、インクジェット印刷法、スクリーン印刷法、スプレー印刷法といったものが知られている(例えば、特許文献1及び2参照)。これらの印刷法に用いられるインク組成物は、絶縁材料として主にエポキシ樹脂を用いたものであり(例えば、特許文献3参照)、比較的低温で硬化するため、加工が容易に行えるという特徴がある。 In recent years, in order to achieve higher density and smaller size of multilayer printed wiring boards, multilayer printed wiring boards having a conductive layer and an insulating layer having a finer pattern shape are required. As a method for forming such a conductive layer or insulating layer, for example, an inkjet printing method, a screen printing method, a spray printing method, or the like is known (see, for example, Patent Documents 1 and 2). The ink composition used in these printing methods is one that mainly uses an epoxy resin as an insulating material (see, for example, Patent Document 3), and is cured at a relatively low temperature, so that it can be easily processed. is there.
また、更なる物性及び電気的特性向上を目指し、絶縁材料としてシリコン変性したポリイミド樹脂を用いたインク組成物も提案されている(例えば、特許文献4参照)。
しかしながら、近年の技術革新に伴い、高い耐熱性、耐湿性、難燃性及び可撓性といった物性の要求に、前述した従来技術のようなエポキシ樹脂を用いたインク組成物では、十分に対応できなくなってきている。また、シリコン変性されたポリイミド樹脂は、エポキシ樹脂に比べ機械的物性に優れているが、ガラス転移温度がエポキシ樹脂並みであるため耐熱性に問題がある。一方で、シリコン変性されていない一般的なポリイミド樹脂を用いた場合には、300℃以上の高温で処理する必要があるため、製膜時、基板を損傷するという問題があった。 However, with recent technological innovations, ink compositions using epoxy resins such as the prior art described above can sufficiently meet the demands for physical properties such as high heat resistance, moisture resistance, flame retardancy and flexibility. It is gone. Silicon modified polyimide resin is excellent in mechanical properties as compared with epoxy resin, but has a problem in heat resistance because its glass transition temperature is similar to that of epoxy resin. On the other hand, when a general polyimide resin not modified with silicon is used, the substrate needs to be processed at a high temperature of 300 ° C. or higher, which causes a problem that the substrate is damaged during film formation.
本発明はこのような事情に鑑みてなされたものであり、エポキシ樹脂の低温加工性とポリイミド樹脂の優れた物性とを兼ね備えた印刷用インク組成物及びこれを用いて形成された絶縁層を備える多層印刷配線板を提供することを目的とする。 The present invention has been made in view of such circumstances, and includes a printing ink composition that combines low-temperature processability of an epoxy resin and excellent physical properties of a polyimide resin, and an insulating layer formed using the same. An object is to provide a multilayer printed wiring board.
上記課題を解決するため研究を重ねた結果、本発明者らは、(i)一般式(1)で示される、予め閉環された熱硬化性イミドオリゴマーと、(ii)水、水溶性有機溶剤またはそれらの混合物とを用いることにより、従来では成し得なかった低温加工性と優れた物性を持つ印刷用インク組成物及びこれを用いて形成された絶縁層を備える多層印刷配線板を提供できることを見出した。 As a result of repeated research to solve the above-mentioned problems, the present inventors have (i) a thermosetting imide oligomer which has been previously closed, represented by the general formula (1), and (ii) water and a water-soluble organic solvent. Alternatively, by using a mixture thereof, it is possible to provide a printing ink composition having low-temperature processability and excellent physical properties that could not be achieved conventionally, and a multilayer printed wiring board including an insulating layer formed using the same. I found.
即ち、本発明(1)は、(i)一般式(1): That is, the present invention (1) comprises (i) the general formula (1):
式中、
nは、1〜10の数であり、
Ar1は、炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の4価の基であり、
Ar2は、炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の2価の基であり、ここで架橋員とは、−O−、−CO−、−COO−、−OCO−、−SO2−、−S−、−CH2−、−C(CH3)2−及び−C(CF3)2−からなる群から選択される2価の基を示し、そして
R1、R2は、それぞれ独立して、水素またはフェニル基を示す
で表される熱硬化性イミドオリゴマー、及び
(ii)水、水溶性有機溶剤またはそれらの混合物を含む印刷用インク組成物である。Where
n is a number from 1 to 10,
Ar 1 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or a polycyclic compound in which two or more of the same or different aromatic compounds are connected to each other directly or by a bridging member. A tetravalent group,
Ar 2 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or a polycyclic compound in which two or more of the same or different aromatic compounds are connected to each other directly or by a bridging member. a divalent group, and wherein a bridge member, -O -, - CO -, - COO -, - OCO -, - SO 2 -, - S -, - CH 2 -, - C (CH 3) 2 represents a divalent group selected from the group consisting of — and —C (CF 3 ) 2 —, and R 1 and R 2 each independently represents a hydrogen or phenyl group, and represents a thermosetting A printing ink composition comprising a water-soluble imide oligomer and (ii) water, a water-soluble organic solvent or a mixture thereof.
本発明(2)は、前記水溶性有機溶剤が、水、アルコール類またはそれらの混合物である、前記発明(1)の印刷用インク組成物である。 The present invention (2) is the printing ink composition according to the invention (1), wherein the water-soluble organic solvent is water, alcohols or a mixture thereof.
本発明(3)は、前記熱硬化性イミドオリゴマーの平均粒径が、10μm以下である、前記発明(1)または(2)の印刷用インク組成物である。 The present invention (3) is the printing ink composition of the invention (1) or (2), wherein the thermosetting imide oligomer has an average particle size of 10 μm or less.
本発明(4)は、前記発明(1)〜(3)のいずれかに記載の印刷用インク組成物を、インクジェット印刷法、スクリーン印刷法またはスプレー印刷法によって基材上に塗布することを特徴とする、熱硬化性イミドオリゴマー膜の製造方法である。 The present invention (4) is characterized in that the printing ink composition according to any one of the above inventions (1) to (3) is applied onto a substrate by an ink jet printing method, a screen printing method or a spray printing method. And a method for producing a thermosetting imide oligomer film.
本発明(5)は、前記発明(1)〜(3)のいずれかに記載の印刷用インク組成物を、インクジェット印刷法、スクリーン印刷法またはスプレー印刷法によって基材上に塗布し、さらに加熱硬化させた絶縁層を有する多層印刷配線板である。 In the invention (5), the printing ink composition according to any one of the inventions (1) to (3) is applied on a substrate by an ink jet printing method, a screen printing method or a spray printing method, and further heated. A multilayer printed wiring board having a cured insulating layer.
本発明の印刷用インク組成物は、製膜時において250℃以下で硬化が可能であり、また、短時間で硬化するため、基板の損傷なく絶縁膜を形成することができる。さらに、この絶縁膜は可撓性、耐熱性において優れた物性を示す。 The ink composition for printing of the present invention can be cured at 250 ° C. or lower during film formation, and can be formed in a short time, so that an insulating film can be formed without damaging the substrate. Further, this insulating film exhibits excellent physical properties in terms of flexibility and heat resistance.
本発明の印刷用インク組成物が含む熱硬化性イミドオリゴマーは、下記一般式(1)で表される化合物である。 The thermosetting imide oligomer contained in the printing ink composition of the present invention is a compound represented by the following general formula (1).
式中、nは1〜10の数であり、Ar1は炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の4価の基である。Ar2は炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の2価の基である。ここで架橋員とは、−O−、−CO−、−COO−、−OCO−、−SO2−、−S−、−CH2−、−C(CH3)2−及び−C(CF3)2−からなる群から選択される2価の基を示す。R1、R2は、それぞれ独立して、水素またはフェニル基を示す。In the formula, n is a number of 1 to 10, and Ar 1 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or two or more of the same or different aromatic compounds are directly or bridged It is a tetravalent group of a polycyclic compound connected to each other by members. Ar 2 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or a polycyclic compound 2 in which two or more of the same or different aromatic compounds are connected to each other directly or by a bridging member. Is a valent group. Here, the term “crosslinking member” refers to —O—, —CO—, —COO—, —OCO—, —SO 2 —, —S—, —CH 2 —, —C (CH 3 ) 2 — and —C (CF 3) 2 - represents a divalent radical selected from the group consisting of. R 1 and R 2 each independently represent hydrogen or a phenyl group.
Ar1、Ar2における「炭素数6〜36の単環式もしくは縮合多環式芳香族化合物」は、好ましくは炭素数6〜18、より好ましくは炭素数6〜12の単環式または縮合多環式芳香族化合物であり、例えば、ベンゼン、トルエン、キシレン、ナフタレン、アントラセン、フェナントレンなどが挙げられる。したがって、Ar1における「炭素数6〜36の単環式もしくは縮合多環式芳香族化合物の4価の基」は、好ましくはベンゼン、ナフタレン、アントラセン、フェナントレンなどから誘導される4価の基であり、Ar2における「炭素数6〜36の単環式もしくは縮合多環式芳香族化合物の2価の基」は、好ましくはベンゼン、トルエン、キシレン、ナフタレン、アントラセン、フェナントレンなどから誘導される2価の基であり、最も好ましくはo−、m−もしくはp−フェニレンが挙げられる。またAr2における「炭素数6〜36の単環式もしくは縮合多環式芳香族化合物」は、その芳香環上に、炭素数1〜4のアルキル基、トリフルオロメチル基などの置換基を1つ以上、好ましくは1または2つ有していてもよい。The “monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms” in Ar 1 and Ar 2 is preferably 6 to 18 carbon atoms, more preferably 6 to 12 monocyclic or condensed polycyclic compounds. Examples of cyclic aromatic compounds include benzene, toluene, xylene, naphthalene, anthracene, and phenanthrene. Therefore, the “tetravalent group of a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms” in Ar 1 is preferably a tetravalent group derived from benzene, naphthalene, anthracene, phenanthrene and the like. In Ar 2, the “divalent group of a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms” is preferably 2 derived from benzene, toluene, xylene, naphthalene, anthracene, phenanthrene and the like. A valent group, most preferably o-, m- or p-phenylene. The “monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms” in Ar 2 has 1 substituent such as an alkyl group having 1 to 4 carbon atoms and a trifluoromethyl group on the aromatic ring. You may have one or more, preferably one or two.
Ar1、Ar2における「同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物」とは、前記段落に挙げられた、単環式もしくは縮合多環式芳香族化合物が、直接もしくは架橋員(ここで架橋員とは、−O−、−CO−、−COO−、−OCO−、−SO2−、−S−、−CH2−、−C(CH3)2−及び−C(CF3)2−からなる群から選択される)により相互に連結された多環式化合物を意味する。したがって、Ar1における多環式化合物の4価の基としては、前記段落に挙げられた2つ以上の単環式芳香族化合物、特にはo−、m−もしくはp−フェニレンが直接もしくは架橋員により相互に連結された多環式化合物の4価の基、例えば、ビフェニル、ジフェニルエーテル、ベンゾフェノン、安息香酸フェニル、2,2−ジフェニルプロパン、2,2−ジフェニル−1,1,1,3,3,3−ヘキサフルオロプロパン、2,2−ビス[4−(フェノキシ)フェニル]プロパンなどから誘導される4価の基が挙げられる。Ar2における多環式化合物の2価の基としては、前記段落に挙げられた2つ以上の単環式芳香族化合物、特にはo−、m−もしくはp−フェニレンが、直接もしくは架橋員により相互に連結された多環式化合物の2価の基、例えば、ビフェニル、ジフェニルエーテル、2,2−ジフェニルプロパンなどから誘導される2価の基が挙げられる。またAr2における多環式化合物は、その芳香環上に、炭素数1〜4のアルキル基、トリフルオロメチル基などの置換基を1つ以上、好ましくは1または2つ有していてもよい。In Ar 1 and Ar 2 , “a polycyclic compound in which two or more of the same or different aromatic compounds are directly or mutually linked by a bridging member” refers to the monocyclic or condensed polycyclic compounds mentioned in the preceding paragraph. cyclic aromatic compounds, from direct or bridge member (here a bridge member, -O -, - CO -, - COO -, - OCO -, - SO 2 -, - S -, - CH 2 -, - Means a polycyclic compound interconnected by C (CH 3 ) 2 — and —C (CF 3 ) 2 —. Therefore, as the tetravalent group of the polycyclic compound in Ar 1 , two or more monocyclic aromatic compounds listed in the above paragraph, particularly o-, m-, or p-phenylene are directly or a cross-linking member. Tetravalent groups of polycyclic compounds linked together by, for example, biphenyl, diphenyl ether, benzophenone, phenyl benzoate, 2,2-diphenylpropane, 2,2-diphenyl-1,1,1,3,3 , 3-hexafluoropropane, tetravalent groups derived from 2,2-bis [4- (phenoxy) phenyl] propane and the like. As the divalent group of the polycyclic compound in Ar 2 , two or more monocyclic aromatic compounds, particularly o-, m-, or p-phenylene mentioned in the above paragraph may be directly or by a bridging member. Examples thereof include divalent groups of polycyclic compounds linked to each other, for example, divalent groups derived from biphenyl, diphenyl ether, 2,2-diphenylpropane, and the like. The polycyclic compound in Ar 2 may have one or more substituents such as an alkyl group having 1 to 4 carbon atoms or a trifluoromethyl group, preferably 1 or 2 on the aromatic ring. .
一般式(1)で表される架橋性の基を有する熱硬化性イミドオリゴマーの製造方法としては、特に制限はなく、公知の方法でよい。本発明において、熱硬化性イミドオリゴマーは次の工程によって得た。まず、エステル化溶媒中、芳香族テトラカルボン酸二無水物と、架橋性の基を有する芳香族ジカルボン酸無水物とを加熱反応させ、均一溶液を得る。 There is no restriction | limiting in particular as a manufacturing method of the thermosetting imide oligomer which has a crosslinkable group represented by General formula (1), A well-known method may be sufficient. In the present invention, the thermosetting imide oligomer was obtained by the following steps. First, an aromatic tetracarboxylic dianhydride and an aromatic dicarboxylic anhydride having a crosslinkable group are heated and reacted in an esterification solvent to obtain a uniform solution.
次に、得られた均一溶液と芳香族ジアミンを混合し、混合溶液を得る。この際の混合溶液の溶質濃度は50重量%以下が好ましい。 Next, the obtained uniform solution and aromatic diamine are mixed to obtain a mixed solution. The solute concentration of the mixed solution at this time is preferably 50% by weight or less.
この混合溶液には、1,2−ジメチルイミダゾール、ベンズイミダゾール、イソキノリン、置換ピリジンなどのイミド化触媒を加えてもよい。また公知の添加剤、例えば、無機フィラー、有機フィラー、無機顔料または有機顔料などを加えても良い。 An imidation catalyst such as 1,2-dimethylimidazole, benzimidazole, isoquinoline, or substituted pyridine may be added to this mixed solution. Moreover, you may add a well-known additive, for example, an inorganic filler, an organic filler, an inorganic pigment, or an organic pigment.
次いで、上記混合溶液を蒸発乾固し、さらに加熱してイミド化させる。加熱については、得られるイミドオリゴマーのガラス転移温度付近から、架橋性基による熱硬化が始まる温度より下の温度の範囲内で5〜180分間、好適には30〜90分間加熱することが望ましい。 Next, the mixed solution is evaporated to dryness and further heated to imidize. About heating, it is desirable to heat for 5 to 180 minutes, preferably 30 to 90 minutes within the temperature range from the vicinity of the glass transition temperature of the resulting imide oligomer to a temperature lower than the temperature at which thermosetting by the crosslinkable group starts.
ここで使用するエステル化溶媒の例としては、メタノール、エタノール、n−プロパノール、n−ブタノールなどの低級一級アルコール、好適にはメタノールまたはエタノールなどが挙げられる。これらは単独でも2種類以上組み合わせても使用することができる。 Examples of the esterification solvent used here include lower primary alcohols such as methanol, ethanol, n-propanol and n-butanol, preferably methanol or ethanol. These can be used alone or in combination of two or more.
使用する芳香族テトラカルボン酸二無水物の例としては、ピロメリット酸二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、2,3,3’,4’−ビフェニルテトラカルボン酸二無水物、2,2,3’,3’−ビフェニルテトラカルボン酸二無水物、4,4’−オキシジフタル酸二無水物、3,4’−オキシジフタル酸二無水物、3,3’−オキシジフタル酸二無水物、2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]プロパン二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’−ジフェニルスルホンテトラカルボン酸二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、1,2,7,8−ナフタレンテトラカルボン酸二無水物などが挙げられる。これらは単独でも2種類以上組み合わせても使用することができる。 Examples of the aromatic tetracarboxylic dianhydride used include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′, 4′- Biphenyltetracarboxylic dianhydride, 2,2,3 ′, 3′-biphenyltetracarboxylic dianhydride, 4,4′-oxydiphthalic dianhydride, 3,4′-oxydiphthalic dianhydride, 3, 3'-oxydiphthalic dianhydride, 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride 3,3 ′, 4,4′-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-di Carboxyphenyl) hex Fluoro propane dianhydride, and the like 1,2,7,8-naphthalene tetracarboxylic dianhydride. These can be used alone or in combination of two or more.
使用する架橋性の基を有する芳香族ジカルボン酸無水物は、4−エチニルフタル酸無水物、4−フェニルエチニルフタル酸無水物又はそれらの混合物である。 The aromatic dicarboxylic anhydride having a crosslinkable group to be used is 4-ethynylphthalic anhydride, 4-phenylethynylphthalic anhydride or a mixture thereof.
本発明の印刷用インク組成物は、一般式(1)で示される熱硬化性イミドオリゴマーの他に、別の架橋性の末端基を有するイミドオリゴマーを含んでいてもよい。そのようなイミドオリゴマーは前述と同様の方法により製造することができるが、架橋性の基を有する芳香族ジカルボン酸無水物として、上記段落のものに換えて、3−フェニルエチニルフタル酸無水物、エチニルナフタレンジカルボン酸無水物、フェニルエチニルナフタレンジカルボン酸無水物、エチニルアントラセンジカルボン酸無水物、フェニルエチニルアントラセンジカルボン酸無水物、4−ナフチルエチニルフタル酸無水物、3−ナフチルエチニルフタル酸無水物、4−アントラセニルエチニルフタル酸無水物、3−アントラセニルエチニルフタル酸無水物、アントラセニルエチニルナフタレンジカルボン酸無水物、アントラセニルエチニルアントラセンジカルボン酸無水物などを使用して製造することができる。なお、これらの芳香族ジカルボン酸無水物の芳香族環上の水素原子は、炭素数1〜6のアルキル基、アルケニル基、アルキニル基もしくはアルコキシル基、またはハロゲン原子で置換されていてもよい。これらの無水物は単独でも2種類以上組み合わせても使用することができる。 The printing ink composition of the present invention may contain an imide oligomer having another crosslinkable terminal group in addition to the thermosetting imide oligomer represented by the general formula (1). Such an imide oligomer can be produced by the same method as described above, but as an aromatic dicarboxylic acid anhydride having a crosslinkable group, instead of the one in the above paragraph, 3-phenylethynylphthalic acid anhydride, Ethynylnaphthalenedicarboxylic acid anhydride, phenylethynylnaphthalenedicarboxylic acid anhydride, ethynylanthracene dicarboxylic acid anhydride, phenylethynylanthracene dicarboxylic acid anhydride, 4-naphthylethynylphthalic acid anhydride, 3-naphthylethynylphthalic acid anhydride, 4- Anthracenylethynylphthalic anhydride, 3-anthracenylethynylphthalic anhydride, anthracenylethynylnaphthalenedicarboxylic anhydride, anthracenylethynylanthracene dicarboxylic anhydride, and the like can be used. In addition, the hydrogen atom on the aromatic ring of these aromatic dicarboxylic acid anhydrides may be substituted with an alkyl group having 1 to 6 carbon atoms, an alkenyl group, an alkynyl group or an alkoxyl group, or a halogen atom. These anhydrides can be used alone or in combination of two or more.
使用する芳香族ジアミンとしては、p−フェニレンジアミン、m−フェニレンジアミン、p−アミノベンジルアミン、m−アミノベンジルアミン、ジアミノトルエン類、ジアミノキシレン類、ジアミノナフタレン類、ジアミノアントラセン類、4,4’−ジアミノビフェニル、3,4’−ジアミノビフェニル、3,3’−ジアミノビフェニル、o−トリジン、m−トリジン、4,4’−ジアミノジフェニルメタン、3,4’−ジアミノジフェニルメタン、3,3’−ジアミノジフェニルメタン、4,4’−ジアミノジフェニルエーテル、3,4’−ジアミノジフェニルエーテル、3,3’−ジアミノジフェニルエーテル、4,4’−ジアミノジフェニルスルホン、3,4’−ジアミノジフェニルスルホン、3,3’−ジアミノジフェニルスルホン、4,4’−ジアミノジフェニルケトン、3,4’−ジアミノジフェニルケトン、3,3’−ジアミノジフェニルケトン、2,2−ビス(4−アミノフェノキシ)プロパン、2,2−ビス(3−アミノフェノキシ)プロパン、2−(3−アミノフェニル)−2−(4−アミノフェニル)プロパン、1,4−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノベンゾイル)ベンゼン、1,4−ビス(3−アミノベンゾイル)ベンゼン、1,3−ビス(4−アミノベンゾイル)ベンゼン、1,3−ビス(3−アミノベンゾイル)ベンゼン、9,9−ビス(4−アミノフェニル)フルオレン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパン、4,4’−ビス(4−アミノフェノキシ)ビフェニル、4,4’−ビス(3−アミノフェノキシ)ビフェニル、ビス[4−(4−アミノフェノキシ)フェニル]スルホン、ビス[4−(3−アミノフェノキシ)フェニル]スルホン、ビス[4−(4−アミノフェノキシ)フェニル]エーテル、ビス[4−(3−アミノフェノキシ)フェニル]エーテル、4,4’−ビス(4−アミノフェノキシ)ベンゾフェノン、4,4’−ビス(3−アミノフェノキシ)ベンゾフェノン、1,4−ビス[4−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ベンゼン、1,3−ビス[4−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ベンゼン、1,4−ビス[3−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ベンゼン、1,3−ビス[3−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ベンゼン、4,4’−ビス[4−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ジフェニルエーテル、4,4’−ビス[3−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ジフェニルエーテル、4,4’−ビス[4−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ビフェニル、4,4’−ビス[3−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ビフェニル、4,4’−ビス[4−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ジフェニルスルホン、4,4’−ビス[3−(2−、3−もしくは4−アミノフェノキシ)ベンゾイル]ジフェニルスルホンなどが挙げられる。これらは単独でも2種類以上組み合わせても使用することができる。
As aromatic diamines to be used, p-phenylenediamine, m-phenylenediamine, p-aminobenzylamine, m-aminobenzylamine, diaminotoluenes, diaminoxylenes, diaminonaphthalenes, diaminoanthracenes, 4,4 ′ -Diaminobiphenyl, 3,4'-diaminobiphenyl, 3,3'-diaminobiphenyl, o-tolidine, m-tolidine, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 3,3'-diamino Diphenylmethane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 3,3'-diamino Diphenyl sulfone, 4,4'-di Aminodiphenyl ketone, 3,4'-diaminodiphenyl ketone, 3,3'-diaminodiphenyl ketone, 2,2-bis (4-aminophenoxy) propane, 2,2-bis (3-aminophenoxy) propane, 2- (3-aminophenyl) -2- (4-aminophenyl) propane, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3 -Aminophenoxy) benzene, 1,4-bis (4-aminobenzoyl) benzene, 1,4-bis (3-aminobenzoyl) benzene, 1,3- bis (4-aminobenzoyl ) benzene, 1,3-bis (3-aminobenzoyl) benzene, 9,9-bis (4-aminophenyl) fluorene, 2,2-bis [4- (4-aminophenoxy) pheny ] Propane, 4,4'-bis (4-aminophenoxy) biphenyl, 4,4'-bis (3-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- ( 3-aminophenoxy) phenyl] sulfone, bis [4- (4-aminophenoxy) phenyl] ether, bis [4- (3-aminophenoxy) phenyl] ether, 4,4′-bis (4-aminophenoxy) benzophenone 4,4′-bis (3-aminophenoxy) benzophenone, 1,4-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] benzene, 1,3-bis [4- (2- , 3- or 4-aminophenoxy) benzoyl] benzene, 1,4-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl Benzene, 1,3-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] benzene, 4,4′-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl ether 4,4′-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl ether, 4,4′-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] biphenyl 4,4′-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] biphenyl, 4,4′-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl And sulfone and 4,4′-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl sulfone. These can be used alone or in combination of two or more.
前記の熱硬化性イミドオリゴマーは、硬化前の加工性(熱溶融性)が良好となるように、かつ、実装時における加熱工程や鉛フリーはんだ化に対応するために、熱硬化後のガラス転移温度が200℃以上、好ましくは250℃以上となるように、繰り返し数n=1〜10の範囲内で、好ましくは繰り返し数n=1〜5の範囲内で芳香族テトラカルボン酸二無水物、架橋性の基を有する芳香族ジカルボン酸無水物、芳香族ジアミンの組成が適宜選択される。繰り返し数nが10を超えると、組成物に占める架橋性の基の相対的な含有率が低下するため、硬化後のフィルムの耐熱性が低下したり、フィルムの形成が困難になる傾向があるため、好ましくない。 The above-mentioned thermosetting imide oligomer has a glass transition after thermosetting in order to improve the processability (heat meltability) before curing and to cope with the heating process and lead-free soldering at the time of mounting. An aromatic tetracarboxylic dianhydride having a repeating number n = 1 to 10 and preferably a repeating number n = 1 to 5 so that the temperature is 200 ° C. or more, preferably 250 ° C. or more, The composition of the aromatic dicarboxylic acid anhydride and aromatic diamine having a crosslinkable group is appropriately selected. When the number n of repetitions exceeds 10, the relative content of the crosslinkable group in the composition decreases, so that the heat resistance of the cured film tends to decrease or the formation of the film tends to be difficult. Therefore, it is not preferable.
得られたイミドオリゴマーは、例えば実験室レベルでは乳鉢などを用いて、平均粒径100μm以下に粉砕して粗粉末状にする。 The obtained imide oligomer is crushed to an average particle size of 100 μm or less by using a mortar or the like at the laboratory level, for example, to form a coarse powder.
熱硬化性イミドオリゴマー粉末が溶解または分散した印刷用インク組成物の製造方法は、特に限定されるものではないが、上述の熱硬化性イミドオリゴマー粗粉末を、水、水溶性有機溶剤又はそれらの混合物中で、さらに湿式粉砕するのが好ましい。このようにして得られた熱硬化性イミドオリゴマーが分散した液状物はそのままインク組成物として使用してもよいし、濾過して熱硬化性イミドオリゴマーを分離し、別の水、水溶性有機溶剤又はそれらの混合物に加えて、本発明の印刷用インク組成物としてもよい。この際に加える水、水溶性有機溶剤又はそれらの混合物の種類、量、混合比率、後述する添加剤等によって、熱硬化性イミドオリゴマーは印刷用インク組成物中に溶解または分散した状態となる。 The method for producing the printing ink composition in which the thermosetting imide oligomer powder is dissolved or dispersed is not particularly limited, but the above-mentioned thermosetting imide oligomer coarse powder is prepared by using water, a water-soluble organic solvent, or their It is preferable to further wet pulverize in the mixture. The liquid material in which the thermosetting imide oligomer thus obtained is dispersed may be used as an ink composition as it is, or filtered to separate the thermosetting imide oligomer, and another water or water-soluble organic solvent. Alternatively, in addition to the mixture thereof, the printing ink composition of the present invention may be used. The thermosetting imide oligomer is dissolved or dispersed in the printing ink composition depending on the type, amount, mixing ratio, additive described later, and the like of water, water-soluble organic solvent or a mixture thereof added at this time.
また、本発明の印刷用インク組成物における水溶性有機溶剤としては、アルコール類、グリコール類、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド、N,N−ジメチルホルムアミド、N,N−ジエチルホルムアミド、N−メチル−2−ピロリドン、1,3−ジメチル−2−イミダゾリジノン、γ−ブチロラクトン、ジメチルスルホキシド、ジエチルスルホキシド、ジメチルスルホン、ジエチルスルホン、アセトンなどが挙げられるが、加工性や環境負荷の観点からアルコール類、グリコール類を用いることが望ましい。 Examples of the water-soluble organic solvent in the printing ink composition of the present invention include alcohols, glycols, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethyl. Examples include formamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, γ-butyrolactone, dimethyl sulfoxide, diethyl sulfoxide, dimethyl sulfone, diethyl sulfone, and acetone. From this point of view, it is desirable to use alcohols and glycols.
使用するアルコール類、グリコール類は例えば、メタノール、エタノール、n−プロパノール、イソプロパノール、ブタノール等の低級アルコール類、モノエチレングリコール、ジエチレングリコール、プロピレングリコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、ジエチレングリコールモノメチルエーテル、グリセリン、ポリエチレングリコールなどのグリコール類が挙げられるが、これらに限定されるものではない。また、低沸点のメタノール、エタノール、n−プロパノール、イソプロパノール、またはその水との混合溶媒の使用が好ましい。 Alcohols and glycols used are, for example, lower alcohols such as methanol, ethanol, n-propanol, isopropanol, butanol, monoethylene glycol, diethylene glycol, propylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether Glycols such as glycerin and polyethylene glycol, but are not limited thereto. Moreover, it is preferable to use a low boiling point methanol, ethanol, n-propanol, isopropanol, or a mixed solvent thereof with water.
本発明の印刷用インク組成物における熱硬化性イミドオリゴマーの固形分濃度は、各種塗布方法において所望の粘度になるように適宜調整すればよいが、好ましくは70重量%以下である。 The solid content concentration of the thermosetting imide oligomer in the printing ink composition of the present invention may be appropriately adjusted so as to have a desired viscosity in various coating methods, but is preferably 70% by weight or less.
湿式粉砕に用いる装置としては、従来から用いられている装置、例えばボールミル、ロッドミル等を用いることができる。 As an apparatus used for wet pulverization, conventionally used apparatuses such as a ball mill and a rod mill can be used.
また、粉砕された熱硬化性イミドオリゴマーの平均粒径は、インクにした際の分散性向上のため10μm以下が好ましく、さらに好ましくは1μm以下である。 Further, the average particle size of the pulverized thermosetting imide oligomer is preferably 10 μm or less, and more preferably 1 μm or less, in order to improve dispersibility when formed into an ink.
熱硬化性イミドオリゴマーの分散方法としては、従来から用いられている分散法、例えば、ボールミル、サンドミル、アトライター、ロールミル、アジテータ、ヘンシェルミキサ、コロイドミル、超音波ホモジナイザー、パールミル、湿式ジェットミル、ペイントシェイカー等を用いることができる。ただしビーズ等のメディアを使用する分散方法の場合、メディアからの不純物の混入が考えられるので、メディアの洗浄や、有害不純物を析出しないメディアを使用するなどの対策を行うことが必要である。 As a method for dispersing the thermosetting imide oligomer, conventionally used dispersion methods such as ball mill, sand mill, attritor, roll mill, agitator, Henschel mixer, colloid mill, ultrasonic homogenizer, pearl mill, wet jet mill, paint A shaker or the like can be used. However, in the case of a dispersion method using media such as beads, it is possible to mix impurities from the media, so it is necessary to take measures such as cleaning the media or using media that does not precipitate harmful impurities.
分散を良好に行うために、硬化後の熱硬化性イミドオリゴマーの絶縁性などの所望の物性を損なわない範囲で、分散剤を添加することも可能である。分散剤として、アニオン系、ノニオン系界面活性剤、または高分子系分散剤など使用することができる。例えば、アクリル酸、メタクリル酸、マレイン酸、およびこれらの塩、アクリル酸エステル類、スチレンまたはその誘導体、ビニルエーテル類、ビニルエステル類などのエチレン性不飽和単量体などを単独、または2種類以上を混合および重合させたものを高分子系分散剤として用いることが出来る。さらに、分散状態を良好にするために、従来から用いられている公知の表面張力調整剤、水、親油性有機溶剤などを必要に応じて添加することができる。 In order to achieve good dispersion, it is also possible to add a dispersant within a range that does not impair desired physical properties such as insulation of the thermosetting imide oligomer after curing. As a dispersant, an anionic, nonionic surfactant, or a polymeric dispersant can be used. For example, an ethylenically unsaturated monomer such as acrylic acid, methacrylic acid, maleic acid, and salts thereof, acrylic esters, styrene or derivatives thereof, vinyl ethers, vinyl esters, etc. What was mixed and polymerized can be used as a polymeric dispersant. Furthermore, in order to improve the dispersion state, a conventionally known surface tension adjusting agent, water, a lipophilic organic solvent, and the like that have been conventionally used can be added as necessary.
上記のようにして得られた印刷用インク組成物を、インクジェット印刷法、スクリーン印刷法、スプレー法などによって、シリコン系ウエハや金属箔などの基材に塗布し、熱硬化性イミドオリゴマーを表面に付着させ、乾燥させることにより、熱硬化性イミドオリゴマー膜を得ることができる。これを加熱し、熱硬化性イミドオリゴマーを軟化(溶融)させ、次いで硬化させると膜(絶縁膜)を得ることができる。ここで加熱は、60℃〜450℃で行うが、処理時間の全体にわたって一定の温度であってもよく、徐々に昇温させながら行うこともできる。熱硬化性イミドオリゴマーを軟化、次いで硬化させるには150℃〜300℃が好ましい。さらに好ましくは150℃〜250℃である。この際の加熱時間は5〜60分間が好ましい。 The printing ink composition obtained as described above is applied to a substrate such as a silicon-based wafer or metal foil by an inkjet printing method, a screen printing method, a spray method, etc., and a thermosetting imide oligomer is applied to the surface. By attaching and drying, a thermosetting imide oligomer film can be obtained. When this is heated, the thermosetting imide oligomer is softened (melted) and then cured, a film (insulating film) can be obtained. Here, heating is performed at 60 ° C. to 450 ° C., but may be a constant temperature over the entire processing time, or may be performed while gradually raising the temperature. In order to soften and then cure the thermosetting imide oligomer, 150 ° C to 300 ° C is preferable. More preferably, it is 150 to 250 degreeC. The heating time at this time is preferably 5 to 60 minutes.
また、基材と絶縁膜との接着性を向上させるために、シリコン系ウエハや金属箔などの基材にシランカップリング処理をすることが望ましい。シランカップリング剤としては、例えば、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、3−アミノプロピルメチルジメトキシシラン、3−アミノプロピルメチルジエトキシシラン、N−2−(アミノエチル)−3−アミノプロピルメチルジメトキシシラン、N−2−(アミノエチル)−3−アミノプロピルトリメトキシシラン、2−アミノエチルアミノメチルトリメトキシシラン、3−アミノプロピルジメチルエトキシシラン、2−(2−アミノエチルチオエチル)トリエトキシシラン、p−アミノフェニルトリメトキシシラン、N−フェニル−3−アミノプロピルメチルジメトキシシラン、N−フェニル−3−アミノプロピルメチルジエトキシシラン、N−フェニル−3−アミノプロピルトリメトキシシラン、N−フェニル−3−アミノプロピルトリエトキシシランなどが挙げられ、これらを酸またはアルカリ化合物で加水分解したものも使用することができる。またこれらに限定されるものではなく、これらの中から選ばれる1種類以上のシランカップリング剤が好ましい。接着性の効果が大きいことから、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシランがより好ましい。 Moreover, in order to improve the adhesiveness between the base material and the insulating film, it is desirable to perform a silane coupling process on the base material such as a silicon-based wafer or a metal foil. Examples of the silane coupling agent include 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylmethyldimethoxysilane, 3-aminopropylmethyldiethoxysilane, and N-2- (aminoethyl). -3-aminopropylmethyldimethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, 2-aminoethylaminomethyltrimethoxysilane, 3-aminopropyldimethylethoxysilane, 2- (2-amino Ethylthioethyl) triethoxysilane, p-aminophenyltrimethoxysilane, N-phenyl-3-aminopropylmethyldimethoxysilane, N-phenyl-3-aminopropylmethyldiethoxysilane, N-phenyl-3-aminopropyltri Metoki Silane, N- phenyl-3-aminopropyl triethoxysilane and the like, it can also be used as hydrolysis with these acids or alkali compound. Moreover, it is not limited to these, The 1 or more types of silane coupling agent chosen from these is preferable. 3-aminopropyltrimethoxysilane and 3-aminopropyltriethoxysilane are more preferable because of the large adhesive effect.
上記のシランカップリング処理されたシリコン系ウエハまたは金属箔などの基材上に絶縁膜を作製する方法は前述の記載と同様である。 The method for producing an insulating film on a substrate such as a silicon-based wafer or metal foil subjected to the silane coupling treatment is the same as described above.
以下、本発明について実施例をもって説明する。但し、本発明は以下の実施例に限定されるものではない。以下の合成例、比較合成例、実施例、比較例において、得られたものの評価を次のように行った。 Hereinafter, the present invention will be described with reference to examples. However, the present invention is not limited to the following examples. In the following synthesis examples, comparative synthesis examples, examples, and comparative examples, those obtained were evaluated as follows.
(1)ガラス転移温度
示差走査熱量計(島津製作所製、DSC−60)を用い、窒素雰囲気下で10℃/分の昇温の条件で測定を行った。
(2)平均粒径
試料を3分間超音波分散させ、レーザー回折/散乱式粒度分布測定装置(堀場製作所製、LA−920)を用い、湿式フローセルで測定して、メジアン径、D50体積基準を平均粒径とした。
(3)熱重量減少
示差熱重量同時測定装置(島津製作所製、DTG−60)を用い、窒素雰囲気下で100℃から測定を開始して、10℃/分の昇温の条件で測定を行った(単位:%)。
(4)体積固有抵抗
デジタル超高抵抗/微小電流計(アドバンテスト製、R8340A型)を用い、ASTM D257に準じて測定を行った。(1) Glass transition temperature Using a differential scanning calorimeter (manufactured by Shimadzu Corporation, DSC-60), measurement was carried out under a temperature increase of 10 ° C./min in a nitrogen atmosphere.
(2) Average particle diameter The sample was ultrasonically dispersed for 3 minutes, and measured with a wet flow cell using a laser diffraction / scattering particle size distribution analyzer (LA-920, manufactured by Horiba, Ltd.). The average particle size was taken.
(3) Decrease in thermogravity Using a differential thermogravimetric simultaneous measurement device (DTG-60, manufactured by Shimadzu Corporation), measurement is started from 100 ° C under a nitrogen atmosphere, and measurement is performed at a temperature increase rate of 10 ° C / min. (Unit:%).
(4) Volume resistivity The measurement was performed according to ASTM D257 using a digital ultrahigh resistance / microammeter (manufactured by Advantest, R8340A type).
合成例1
500mlの四つ口フラスコに、4,4’−オキシジフタル酸二無水物9.9269g(32mmol)、4−エチニルフタル酸無水物5.5084g(32mmol)、及びメタノール100mlを仕込み、80℃のオイルバス中で還流させながら3時間加熱撹拌を行い均一溶液とした。次に、この溶液を50℃まで冷却した後、3,4’−ジアミノジフェニルエーテル9.6114g(48mmol)、及びメタノール40mlを加えて均一溶液とした。この溶液をエバポレーターで濃縮し、さらに、160℃まで温度を上げ、1時間減圧、加熱を行い、一般式(1)のイミドオリゴマー(Ar1=ジフェニルエーテル、Ar2=ジフェニルエーテル、R1=R2=水素、n=2)を固形物として得た。さらに、この固形物を乳鉢で粉砕した後、150℃で5時間乾燥した。このオリゴマーのガラス転移温度は154℃であった。Synthesis example 1
A 500 ml four-necked flask was charged with 9.9269 g (32 mmol) of 4,4′-oxydiphthalic dianhydride, 5.5084 g (32 mmol) of 4-ethynylphthalic anhydride, and 100 ml of methanol, and an oil bath at 80 ° C. The mixture was heated and stirred for 3 hours while refluxing to obtain a homogeneous solution. Next, this solution was cooled to 50 ° C., and 9.6114 g (48 mmol) of 3,4′-diaminodiphenyl ether and 40 ml of methanol were added to obtain a homogeneous solution. This solution is concentrated with an evaporator, and the temperature is further increased to 160 ° C., and the pressure is reduced and heated for 1 hour. The imide oligomer of the general formula (1) (Ar 1 = diphenyl ether, Ar 2 = diphenyl ether, R 1 = R 2 = Hydrogen, n = 2) was obtained as a solid. Furthermore, this solid was pulverized in a mortar and then dried at 150 ° C. for 5 hours. The glass transition temperature of this oligomer was 154 ° C.
合成例2
4−エチニルフタル酸無水物の使用量を2.7542g(16mmol)に、3,4’−ジアミノジフェニルエーテルの使用量を8.0095g(40mmol)に換えた以外は、合成例1と同様な方法により、一般式(1)のイミドオリゴマー(n=4)を固形物として得た。このオリゴマーのガラス転移温度は170℃であった。Synthesis example 2
According to the same method as in Synthesis Example 1, except that the amount of 4-ethynylphthalic anhydride used was changed to 2.7542 g (16 mmol) and the amount of 3,4'-diaminodiphenyl ether used was changed to 8.0095 g (40 mmol). The imide oligomer (n = 4) of the general formula (1) was obtained as a solid. The glass transition temperature of this oligomer was 170 ° C.
合成例3
500mlの四つ口フラスコに、2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]プロパン二無水物10.4097g(20mmol)、4−エチニルフタル酸無水物6.8855g(40mmol)、及びメタノール100mlを仕込み、80℃のオイルバス中で還流させながら3時間加熱撹拌を行い均一溶液とした。次に、この溶液を50℃まで冷却した後、4,4’−ジアミノジフェニルエーテル8.0095g(40mmol)、及びメタノール40mlを加えて均一溶液とした。この溶液をエバポレーターで濃縮し、さらに、160℃まで温度を上げ、1時間減圧、加熱を行い、一般式(1)のイミドオリゴマー(Ar1=2,2−ビス[4−(フェノキシ)フェニル]プロパン、Ar2=ジフェニルエーテル、R1=R2=水素、n=1)を固形物として得た。さらに、この固形物を乳鉢で粉砕した後、150℃で5時間乾燥した。このオリゴマーのガラス転移温度は152℃であった。Synthesis example 3
In a 500 ml four-necked flask, 10.4097 g (20 mmol) of 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane dianhydride, 6.8855 g (40 mmol) of 4-ethynylphthalic anhydride ) And 100 ml of methanol, and heated and stirred for 3 hours while refluxing in an oil bath at 80 ° C. to obtain a uniform solution. Next, after this solution was cooled to 50 ° C., 8.0095 g (40 mmol) of 4,4′-diaminodiphenyl ether and 40 ml of methanol were added to obtain a uniform solution. The solution is concentrated with an evaporator, and further heated to 160 ° C., heated under reduced pressure for 1 hour to give an imide oligomer of general formula (1) (Ar 1 = 2,2-bis [4- (phenoxy) phenyl]). Propane, Ar 2 = diphenyl ether, R 1 = R 2 = hydrogen, n = 1) was obtained as a solid. Furthermore, this solid was pulverized in a mortar and then dried at 150 ° C. for 5 hours. The glass transition temperature of this oligomer was 152 ° C.
合成例4
2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]プロパン二無水物の使用量を15.6146g(30mmol)に、4−エチニルフタル酸無水物の使用量を3.4427g(20mmol)に換えた以外は、合成例3と同様な方法により、一般式(1)のイミドオリゴマー(n=3)を固形物として得た。このオリゴマーのガラス転移温度は165℃であった。Synthesis example 4
The amount of 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane dianhydride used was 15.6146 g (30 mmol), and the amount of 4-ethynylphthalic anhydride used was 3.4427 g ( An imide oligomer (n = 3) of the general formula (1) was obtained as a solid in the same manner as in Synthesis Example 3 except that the amount was changed to 20 mmol). The glass transition temperature of this oligomer was 165 ° C.
実施例1
合成例1で得られた粉末状のイミドオリゴマーをイオン交換水:メタノール(50:50)の混合液に添加し、直径200μmのジルコニアビーズをさらに加え、ボールミルを用いて湿式粉砕した。粉砕後、まずジルコニアビーズを分離して、次いで濾過して固液分離を行い、熱硬化性イミドオリゴマー微粉末を単離した。この粉末の平均粒径は1μmであった。Example 1
The powdered imide oligomer obtained in Synthesis Example 1 was added to a mixed solution of ion-exchanged water: methanol (50:50), zirconia beads having a diameter of 200 μm were further added, and wet pulverization was performed using a ball mill. After pulverization, first, zirconia beads were separated, then filtered to perform solid-liquid separation, and a thermosetting imide oligomer fine powder was isolated. The average particle size of this powder was 1 μm.
次に、得られたイミドオリゴマー微粉末2gを蒸留水:メタノール(60:40)混合液18gに加え、超音波ホモジナイザーを使用して分散させ印刷用インク組成物とした。 Next, 2 g of the obtained imide oligomer fine powder was added to 18 g of a distilled water: methanol (60:40) mixed solution and dispersed using an ultrasonic homogenizer to obtain a printing ink composition.
実施例2
合成例1で得られた粉末状のイミドオリゴマーに換えて、合成例2で得られた粉末状のイミドオリゴマーを用いた以外は、実施例1と同様な方法により、印刷用インク組成物〔イミドオリゴマー微粉末(平均粒径1μm)2gを、蒸留水:メタノール(60:40)混合液18gに分散〕を得た。Example 2
A printing ink composition [imide] was obtained in the same manner as in Example 1 except that the powdery imide oligomer obtained in Synthesis Example 2 was used instead of the powdery imide oligomer obtained in Synthesis Example 1. 2 g of oligomer fine powder (average particle size 1 μm) was dispersed in 18 g of distilled water: methanol (60:40) mixed solution].
実施例3
合成例1で得られた粉末状のイミドオリゴマーに換えて、合成例3で得られた粉末状のイミドオリゴマーを用いた以外は、実施例1と同様な方法により、印刷用インク組成物〔イミドオリゴマー微粉末(平均粒径1μm)2gを、蒸留水:メタノール(60:40)混合液18gに分散〕を得た。Example 3
A printing ink composition [imide] was obtained in the same manner as in Example 1 except that the powdery imide oligomer obtained in Synthesis Example 3 was used instead of the powdery imide oligomer obtained in Synthesis Example 1. 2 g of oligomer fine powder (average particle size 1 μm) was dispersed in 18 g of distilled water: methanol (60:40) mixed solution].
実施例4
合成例1で得られた粉末状のイミドオリゴマーに換えて、合成例4で得られた粉末状のイミドオリゴマーを用いた以外は、実施例1と同様な方法により、印刷用インク組成物〔イミドオリゴマー微粉末(平均粒径1μm)2gを、蒸留水:メタノール(60:40)混合液18gに分散〕を得た。Example 4
A printing ink composition [imide] was obtained in the same manner as in Example 1 except that the powdery imide oligomer obtained in Synthesis Example 4 was used instead of the powdery imide oligomer obtained in Synthesis Example 1. 2 g of oligomer fine powder (average particle size 1 μm) was dispersed in 18 g of distilled water: methanol (60:40) mixed solution].
製造実施例1
ガラス板に実施例1で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱した。これを室温まで冷却し、ガラス板から剥がし、厚さ10μmの硬化フィルムを得た。得られた硬化フィルムのガラス転移温度は290℃であり、350℃までの熱重量減少は確認されなかった。また、硬化フィルムの体積固有抵抗は2.6×1017(Ω・cm)であった。Production Example 1
The printing ink composition obtained in Example 1 was uniformly applied to the entire surface of the glass plate by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes. This was cooled to room temperature and peeled off from the glass plate to obtain a cured film having a thickness of 10 μm. The obtained cured film had a glass transition temperature of 290 ° C., and no thermogravimetric decrease up to 350 ° C. was confirmed. Further, the volume resistivity of the cured film was 2.6 × 10 17 (Ω · cm).
製造実施例2
ガラス板に実施例2で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱した。これを室温まで冷却し、ガラス板から剥がし、厚さ10μmの硬化フィルムを得た。得られた硬化フィルムのガラス転移温度は259℃であり、350℃までの熱重量減少は確認されなかった。Production Example 2
The printing ink composition obtained in Example 2 was uniformly applied to the entire surface by a spray method on a glass plate to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes. This was cooled to room temperature and peeled off from the glass plate to obtain a cured film having a thickness of 10 μm. The obtained cured film had a glass transition temperature of 259 ° C., and no thermogravimetric reduction up to 350 ° C. was confirmed.
製造実施例3
ガラス板に実施例3で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱した。これを室温まで冷却し、ガラス板から剥がし、厚さ10μmの硬化フィルムを得た。得られた硬化フィルムのガラス転移温度は277℃であり、350℃までの熱重量減少は確認されなかった。Production Example 3
The printing ink composition obtained in Example 3 was uniformly applied to the entire surface of the glass plate by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes. This was cooled to room temperature and peeled off from the glass plate to obtain a cured film having a thickness of 10 μm. The obtained cured film had a glass transition temperature of 277 ° C., and no decrease in thermal weight up to 350 ° C. was confirmed.
製造実施例4
ガラス板に実施例4で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱した。これを室温まで冷却し、ガラス板から剥がし、厚さ10μmの硬化フィルムを得た。得られた硬化フィルムのガラス転移温度は255℃であり、350℃までの熱重量減少は確認されなかった。Production Example 4
The printing ink composition obtained in Example 4 was uniformly applied to the entire surface of the glass plate by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes. This was cooled to room temperature and peeled off from the glass plate to obtain a cured film having a thickness of 10 μm. The obtained cured film had a glass transition temperature of 255 ° C., and no thermogravimetric decrease up to 350 ° C. was confirmed.
製造実施例5
3−アミノプロピルトリエトキシシラン1g、エタノール4.5g、蒸留水4g、10%塩酸0.5gを混合して1時間撹拌したものをシランカップリング剤として6インチのシリコンウエハ(厚さ500μm)に塗布した。これを100℃で5分間乾燥させた。
次に、このシリコンウエハに実施例1で得られた印刷用インク組成物をスプレー法にてウエハ全面に均一に塗布し、熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱し、厚さ約4〜6μmの絶縁膜を有するシリコンウエハを得た。接着性を碁盤目テープ法JIS−K5400(間隔1mm、ます目の数100)で評価を行った。その結果、100個の内の全てが剥がれずに残った。Production Example 5
A mixture of 1 g of 3-aminopropyltriethoxysilane, 4.5 g of ethanol, 4 g of distilled water and 0.5 g of 10% hydrochloric acid and stirred for 1 hour was used as a silane coupling agent on a 6-inch silicon wafer (thickness 500 μm). Applied. This was dried at 100 ° C. for 5 minutes.
Next, the ink composition for printing obtained in Example 1 was uniformly applied to the entire surface of the wafer by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then heated at 250 ° C. for 10 minutes to obtain a silicon wafer having an insulating film having a thickness of about 4 to 6 μm. The adhesion was evaluated by a cross-cut tape method JIS-K5400 (interval 1 mm, number of squares 100). As a result, all of the 100 pieces remained without peeling.
製造実施例6
基材をシリコンウエハから銅箔(三井金属社製 3EC−VLP 厚さ18μm)に変えた以外は製造実施例5と同様の方法で、絶縁膜を有する銅箔を得た。接着性を碁盤目テープ法JIS−K5400(間隔1mm、ます目の数100)で評価を行った。その結果、100個の内の全てが剥がれずに残った。また可撓性は、直径1mmの針金に試験片を180°折り曲げ、その後のひび、割れ、はがれを目視判定した。その結果、ひび、割れ、はがれは確認されなかった。Production Example 6
A copper foil having an insulating film was obtained in the same manner as in Production Example 5 except that the base material was changed from a silicon wafer to a copper foil (3EC-VLP thickness 18 μm, manufactured by Mitsui Kinzoku Co., Ltd.). The adhesion was evaluated by a cross-cut tape method JIS-K5400 (interval 1 mm, number of squares 100). As a result, all of the 100 pieces remained without peeling. For flexibility, the test piece was bent 180 ° on a wire with a diameter of 1 mm, and the subsequent cracks, cracks and peeling were visually determined. As a result, no cracks, cracks, or peeling were confirmed.
比較例1
ジムロート冷却管、窒素導入管、撹拌翼を取り付けた100mlの4つ口フラスコに窒素雰囲気下で、まずN−メチル−2−ピロリドン30mlを入れ、3,4’−ジアミノジフェニルエーテル4.0047g(20mmol)を投入し、次いで4,4’−オキシジフタル酸二無水物6.2043g(20mmol)を加えた。8時間撹拌して、ポリアミド酸の重合を進めた。得られたポリアミド酸ワニスをN−メチル−2−ピロリドンで10重量%になるまで希釈し、これを印刷用インク組成物とした。Comparative Example 1
First, 30 ml of N-methyl-2-pyrrolidone was placed in a 100 ml four-necked flask equipped with a Dimroth condenser, a nitrogen inlet tube, and a stirring blade under a nitrogen atmosphere, and 4,0047 g (20 mmol) of 3,4'-diaminodiphenyl ether. Then, 4,2043 g (20 mmol) of 4,4′-oxydiphthalic dianhydride was added. The polymerization of the polyamic acid was advanced by stirring for 8 hours. The obtained polyamic acid varnish was diluted with N-methyl-2-pyrrolidone to 10 wt%, and this was used as a printing ink composition.
製造比較例1
ガラス板に比較例1の印刷用インク組成物をスプレー法にて全面に均一に塗布しポリアミド酸膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱した。これを室温まで冷却し、ガラス板から剥がし、厚さ10μmのポリイミドフィルムを得た。得られたフィルムのガラス転移温度は217℃であり、350℃までの熱重量減少は1.0%であった。また、フィルムの体積固有抵抗は8.3×1015(Ω・cm)であった。Production Comparative Example 1
The printing ink composition of Comparative Example 1 was uniformly applied to the entire surface of the glass plate by a spray method to form a polyamic acid film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes. This was cooled to room temperature and peeled from the glass plate to obtain a polyimide film having a thickness of 10 μm. The glass transition temperature of the obtained film was 217 ° C., and the thermogravimetric decrease up to 350 ° C. was 1.0%. The volume resistivity of the film was 8.3 × 10 15 (Ω · cm).
製造比較例2
加熱条件を130℃2分、180℃2分、350℃10分に変更した以外は製造比較例1と同様の検討を行った。得られたフィルムのガラス転移温度は238℃であり、350℃までの熱重量減少は確認されなかった。また、フィルムの体積固有抵抗は6.4×1016(Ω・cm)であった。Production Comparative Example 2
Except for changing the heating conditions to 130 ° C. for 2 minutes, 180 ° C. for 2 minutes, and 350 ° C. for 10 minutes, the same examination as in Production Comparative Example 1 was performed. The glass transition temperature of the obtained film was 238 ° C., and no thermogravimetric decrease up to 350 ° C. was confirmed. The volume resistivity of the film was 6.4 × 10 16 (Ω · cm).
比較例2
500mlの四つ口フラスコに、4,4’−オキシジフタル酸二無水物12.4086g(40mmol)、4−エチニルフタル酸無水物0.6885g(4mmol)、及びメタノール100mlを仕込み、80℃のオイルバス中で還流させながら3時間加熱撹拌を行い均一溶液とした。次に、この溶液を50℃まで冷却した後、3,4’−ジアミノジフェニルエーテル8.4099g(42mmol)、及びメタノール40mlを加えて均一溶液とした。この溶液をエバポレーターで濃縮し、さらに、170℃まで温度を上げ、1時間減圧、加熱を行い、一般式(1)のイミドオリゴマー(Ar1=ジフェニルエーテル、Ar2=ジフェニルエーテル、R1=R2=水素、n=20)を固形物として得た。さらに、この固形物を乳鉢で粉砕した後、150℃で5時間乾燥した。このオリゴマーのガラス転移温度は177℃であった。Comparative Example 2
A 500 ml four-necked flask is charged with 12.4086 g (40 mmol) of 4,4′-oxydiphthalic dianhydride, 0.6885 g (4 mmol) of 4-ethynylphthalic anhydride, and 100 ml of methanol, and an oil bath at 80 ° C. The mixture was heated and stirred for 3 hours while refluxing to obtain a homogeneous solution. Next, after this solution was cooled to 50 ° C., 8.499 g (42 mmol) of 3,4′-diaminodiphenyl ether and 40 ml of methanol were added to obtain a homogeneous solution. This solution is concentrated by an evaporator, and further heated to 170 ° C., heated under reduced pressure for 1 hour, and imide oligomer of general formula (1) (Ar 1 = diphenyl ether, Ar 2 = diphenyl ether, R 1 = R 2 = Hydrogen, n = 20) was obtained as a solid. Furthermore, this solid was pulverized in a mortar and then dried at 150 ° C. for 5 hours. The glass transition temperature of this oligomer was 177 ° C.
合成例1で得られた粉末状のイミドオリゴマーに換えて、上記で得られた粉末状のイミドオリゴマーを用いた以外は、実施例1と同様な方法により、印刷用インク組成物〔イミドオリゴマー微粉末(平均粒径1μm)2gを、蒸留水:メタノール(60:40)混合液18gに分散〕を得た。 The ink composition for printing [imide oligomer fine powder] was prepared in the same manner as in Example 1 except that the powdered imide oligomer obtained above was used instead of the powdered imide oligomer obtained in Synthesis Example 1. 2 g of powder (average particle size 1 μm) was dispersed in 18 g of a mixed solution of distilled water: methanol (60:40)].
比較例3
500mlの四つ口フラスコに、2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]プロパン二無水物20.8194g(40mmol)、4−エチニルフタル酸無水物0.6885g(4mmol)、及びメタノール100mlを仕込み、80℃のオイルバス中で還流させながら3時間加熱撹拌を行い均一溶液とした。次に、この溶液を50℃まで冷却した後、4,4’−ジアミノジフェニルエーテル8.4099g(42mmol)、及びメタノール40mlを加えて均一溶液とした。この溶液をエバポレーターで濃縮し、さらに、170℃まで温度を上げ、1時間減圧、加熱を行い、一般式(1)のイミドオリゴマー(Ar1=2,2−ビス[4−(フェノキシ)フェニル]プロパン、Ar2=ジフェニルエーテル、R1=R2=水素、n=20)を固形物として得た。さらに、この固形物を乳鉢で粉砕した後、150℃で5時間乾燥した。このオリゴマーのガラス転移温度は173℃であった。Comparative Example 3
In a 500 ml four-necked flask, 20.8194 g (40 mmol) of 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane dianhydride, 0.6885 g (4 mmol) of 4-ethynylphthalic anhydride ) And 100 ml of methanol, and heated and stirred for 3 hours while refluxing in an oil bath at 80 ° C. to obtain a uniform solution. Next, this solution was cooled to 50 ° C., and then 8.499 g (42 mmol) of 4,4′-diaminodiphenyl ether and 40 ml of methanol were added to obtain a homogeneous solution. This solution is concentrated with an evaporator, and the temperature is raised to 170 ° C., followed by heating under reduced pressure for 1 hour, and the imide oligomer of general formula (1) (Ar 1 = 2,2-bis [4- (phenoxy) phenyl]). Propane, Ar 2 = diphenyl ether, R 1 = R 2 = hydrogen, n = 20) was obtained as a solid. Furthermore, this solid was pulverized in a mortar and then dried at 150 ° C. for 5 hours. The glass transition temperature of this oligomer was 173 ° C.
合成例1で得られた粉末状のイミドオリゴマーに換えて、上記で得られた粉末状のイミドオリゴマーを用いた以外は、実施例1と同様な方法により、印刷用インク組成物〔イミドオリゴマー微粉末(平均粒径1μm)2gを、蒸留水:メタノール(60:40)混合液18gに分散〕を得た。 The ink composition for printing [imide oligomer fine powder] was prepared in the same manner as in Example 1 except that the powdered imide oligomer obtained above was used instead of the powdered imide oligomer obtained in Synthesis Example 1. 2 g of powder (average particle size 1 μm) was dispersed in 18 g of a mixed solution of distilled water: methanol (60:40)].
製造比較例3
ガラス板に比較例2で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱したが、フィルムは得られなかった。なお、得られた粉末状の硬化物のガラス転移温度は239℃であった。Production Comparative Example 3
The printing ink composition obtained in Comparative Example 2 was uniformly applied to the entire surface of the glass plate by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes, but no film was obtained. In addition, the glass transition temperature of the obtained powdery cured product was 239 ° C.
製造比較例4
ガラス板に比較例3で得られた印刷用インク組成物をスプレー法にて全面に均一に塗布し熱硬化性イミドオリゴマー膜を形成した。これを130℃で2分間加熱し、次いで250℃で10分間加熱したが、フィルムは得られなかった。なお、得られた粉末状の硬化物のガラス転移温度は216℃であった。Production Comparative Example 4
The printing ink composition obtained in Comparative Example 3 was uniformly applied to the entire surface of the glass plate by a spray method to form a thermosetting imide oligomer film. This was heated at 130 ° C. for 2 minutes and then at 250 ° C. for 10 minutes, but no film was obtained. In addition, the glass transition temperature of the obtained powdery hardened | cured material was 216 degreeC.
Claims (5)
式中、
nは、1〜5の数であり、
Ar1は、炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の4価の基であり、
Ar2は、炭素数6〜36の単環式もしくは縮合多環式芳香族化合物、または同一もしくは異なる2つ以上の前記芳香族化合物が直接もしくは架橋員により相互に連結された多環式化合物の2価の基であり、ここで架橋員とは、−O−、−CO−、−COO−、−OCO−、−SO2−、−S−、−CH2−、−C(CH3)2−及び−C(CF3)2−からなる群から選択される2価の基を示し、そして
R1、R2は、それぞれ独立して、水素またはフェニル基を示す
で表される熱硬化性イミドオリゴマー、及び
(ii)水、水溶性有機溶剤またはそれらの混合物
を含む印刷用インク組成物。 (I) General formula (1):
Where
n is a number from 1 to 5 ,
Ar 1 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or a polycyclic compound in which two or more of the same or different aromatic compounds are connected to each other directly or by a bridging member. A tetravalent group,
Ar 2 is a monocyclic or condensed polycyclic aromatic compound having 6 to 36 carbon atoms, or a polycyclic compound in which two or more of the same or different aromatic compounds are connected to each other directly or by a bridging member. a divalent group, and wherein a bridge member, -O -, - CO -, - COO -, - OCO -, - SO 2 -, - S -, - CH 2 -, - C (CH 3) 2 represents a divalent group selected from the group consisting of — and —C (CF 3 ) 2 —, and R 1 and R 2 each independently represents a hydrogen or phenyl group, and represents a thermosetting A printing ink composition comprising a water-soluble imide oligomer and (ii) water, a water-soluble organic solvent or a mixture thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009534281A JP5331004B2 (en) | 2007-09-27 | 2008-09-12 | Ink composition |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007251637 | 2007-09-27 | ||
JP2007251637 | 2007-09-27 | ||
PCT/JP2008/066549 WO2009041299A1 (en) | 2007-09-27 | 2008-09-12 | Ink composition |
JP2009534281A JP5331004B2 (en) | 2007-09-27 | 2008-09-12 | Ink composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009041299A1 JPWO2009041299A1 (en) | 2011-01-27 |
JP5331004B2 true JP5331004B2 (en) | 2013-10-30 |
Family
ID=40511186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009534281A Expired - Fee Related JP5331004B2 (en) | 2007-09-27 | 2008-09-12 | Ink composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5331004B2 (en) |
CN (1) | CN101796147B (en) |
TW (1) | TWI518147B (en) |
WO (1) | WO2009041299A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101440976B1 (en) | 2012-05-31 | 2014-09-18 | 주식회사 엘지화학 | Ink composition for ink-jet printing, dielectric and etching mask formed using thereof, and method of manufacturing dielectric and etching mask |
CN103275614B (en) * | 2013-05-30 | 2015-08-05 | 苏州艾特斯环保材料有限公司 | A kind of fire-resistant anticorrosion paint containing polyimide modified silicone resin |
CN110229158B (en) * | 2019-05-31 | 2022-06-07 | 西北工业大学 | Thermosetting polyimide precursor with low melt viscosity and suitable for RTM (resin transfer molding) and preparation method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03119071A (en) * | 1989-10-02 | 1991-05-21 | Chisso Corp | Ink composition for printing |
JPH05301960A (en) * | 1992-04-27 | 1993-11-16 | Kanegafuchi Chem Ind Co Ltd | Thermosetting oligomer and its production |
JPH09328549A (en) * | 1996-06-12 | 1997-12-22 | Central Glass Co Ltd | Polyimide composition |
JPH11172181A (en) * | 1997-12-10 | 1999-06-29 | Toshiba Chem Corp | Printing ink composition |
JP2007137960A (en) * | 2005-11-16 | 2007-06-07 | Amt Kenkyusho:Kk | Bisimide or bisisoimide compound and resin composition comprising the same |
JP2007246556A (en) * | 2006-03-13 | 2007-09-27 | Fujifilm Corp | Oily ink for inkjet, and inkjet-recording method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10101795A (en) * | 1996-07-18 | 1998-04-21 | Reitetsuku Kk | Production of polyimide, composition, and product thereof |
WO2008044308A1 (en) * | 2006-10-13 | 2008-04-17 | Manac Inc. | Circuit board and process for producing the same |
-
2008
- 2008-09-12 CN CN2008801057531A patent/CN101796147B/en not_active Expired - Fee Related
- 2008-09-12 WO PCT/JP2008/066549 patent/WO2009041299A1/en active Application Filing
- 2008-09-12 JP JP2009534281A patent/JP5331004B2/en not_active Expired - Fee Related
- 2008-09-18 TW TW097135747A patent/TWI518147B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03119071A (en) * | 1989-10-02 | 1991-05-21 | Chisso Corp | Ink composition for printing |
JPH05301960A (en) * | 1992-04-27 | 1993-11-16 | Kanegafuchi Chem Ind Co Ltd | Thermosetting oligomer and its production |
JPH09328549A (en) * | 1996-06-12 | 1997-12-22 | Central Glass Co Ltd | Polyimide composition |
JPH11172181A (en) * | 1997-12-10 | 1999-06-29 | Toshiba Chem Corp | Printing ink composition |
JP2007137960A (en) * | 2005-11-16 | 2007-06-07 | Amt Kenkyusho:Kk | Bisimide or bisisoimide compound and resin composition comprising the same |
JP2007246556A (en) * | 2006-03-13 | 2007-09-27 | Fujifilm Corp | Oily ink for inkjet, and inkjet-recording method |
Also Published As
Publication number | Publication date |
---|---|
TW200918616A (en) | 2009-05-01 |
CN101796147A (en) | 2010-08-04 |
JPWO2009041299A1 (en) | 2011-01-27 |
TWI518147B (en) | 2016-01-21 |
CN101796147B (en) | 2012-09-05 |
WO2009041299A1 (en) | 2009-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5708778B1 (en) | Method for producing polyimide precursor composition | |
JP5357749B2 (en) | Method for preparing polyimide-based compositions useful in high frequency circuit applications | |
TWI298334B (en) | Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom | |
JP5510545B2 (en) | Method for producing polyimide film laminate, polyimide film laminate | |
KR20060067879A (en) | Thermally conductive polyimide film composites having high thermal conductivity useful in an electronic device | |
TWI535766B (en) | Method for manufacturing conductive polyimide film | |
JP2016121295A (en) | Polyimide precursor composition, polyimide molded article, and method for preparing polyimide molded article | |
KR20140025450A (en) | Method for manufacturing conductive coating film and conductive coating film | |
WO2013105619A1 (en) | Polyimide-precursor alcohol solution composition and method for producing polyimide-precursor alcohol solution composition | |
TW201430012A (en) | Polyimide film and polyimide laminate thereof | |
JP2014148601A (en) | Method of producing polyimide molding, polyimide molding, liquid crystal alignment film, passivation film, wire coating material, and adhesive film | |
JP6427904B2 (en) | Polyimide precursor composition, method for producing polyimide molded body, and polyimide molded body | |
JP7442613B2 (en) | Polyamic acid composition, method for producing polyamic acid composition, and polyimide containing the same | |
JP6499450B2 (en) | Graphene oxide composite composition | |
JP2016124956A (en) | Polyamideimide precursor composition, polyamideimide molded article, and method for preparing polyamideimide molded article | |
JP5331004B2 (en) | Ink composition | |
JP6427905B2 (en) | Polyimide precursor composition, method for producing polyimide molded body, and polyimide molded body | |
JP2018119122A (en) | Polyimide precursor composition and method for producing polyimide molding | |
JP5259041B2 (en) | Resin composition and aqueous electrodeposition coating | |
JP6496993B2 (en) | Polyimide precursor composition, method for producing polyimide precursor, polyimide molded body, and method for producing polyimide molded body | |
JP6007809B2 (en) | Method for producing polyimide molded body, polyimide molded body, liquid crystal alignment film, passivation film, wire coating material, and adhesive film | |
JP5768926B2 (en) | Polyimide precursor composition, method for producing polyimide precursor composition, method for producing polyimide molded body, polyimide molded body, liquid crystal alignment film, passivation film, wire coating material, and adhesive film | |
JP2009221397A (en) | Polyimide precursor solution composition, and polyimide film | |
WO2007083527A1 (en) | Polyimide film and method for production thereof | |
TWI605474B (en) | Conductive polyaniline film manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110809 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110809 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120727 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130416 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130610 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130723 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130726 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5331004 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313114 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |