JP5309425B2 - Mask holder for electron beam exposure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electron ray exposure mask holder capable of mechanically, accurately and easily positioning an electron ray exposure mask. <P>SOLUTION: The electron ray exposure mask holder 1 comprises a holder body 3 where a planar electron ray exposure mask 2 is mounted, a holder lid 5 for clamping the electron ray exposure mask 2 with the holder body 3, and a positioning part 6 for positioning the electron ray exposure mask 2 to the holder body 3. The positioning part 6 comprises a pair of positioning pins erected on the holder body 3, a pair of mask side positioning holes provided on the electron ray exposure mask 2 for fitting the pair of positioning pins, and a pair of holder side positioning holes provided on the holder lid 5. <P>COPYRIGHT: (C)2008,JPO&amp;INPIT

Description

  The present invention relates to an electron beam exposure mask holder used when an electron beam exposure mask used in semiconductor manufacturing is mounted on an exposure apparatus.

  In recent years, miniaturization of semiconductor devices has progressed, and an electron beam exposure apparatus capable of forming a finer pattern is used in the exposure process. In such an exposure apparatus, an electron beam exposure mask in which many various fine patterns or holes of several μm are formed so that an electron beam can pass therethrough is used. These patterns or holes are usually divided into chip sizes to be mounted on an electron beam exposure apparatus, formed at the center of the mask, and mounted on an electron beam exposure mask holder dedicated to the exposure apparatus.

  The electron beam exposure mask is manufactured with accurate dimensional accuracy so that the electron beam exposure mask holder on which it is mounted mechanically matches the exposure apparatus, and the mask is placed on such a dedicated holder. Delivered after being fixed.

  Therefore, when manufacturing an electron beam exposure mask, there is a step of mounting the electron beam exposure apparatus on a dedicated holder for the electron beam exposure apparatus at the final stage of the manufacturing process. Must be mounted and fixed accurately.

Conventionally, in the step of attaching and fixing the electron beam exposure mask to the holder, as shown in FIGS. 8 and 9, the mask 100 is inserted into the recess 102 formed in the holder 101 in order to fix the mask 100, The mask 100 is held by screwing or adhering to the recess 102 by molten metal 103. (For example, refer to Patent Document 1).
JP-A-9-5984

  However, in the conventional electron beam exposure mask holder, when the mask is mounted and fixed, the outer peripheral portion of the mask is provided with a certain gap or more for setting in the holder. The mask fluctuates. Therefore, the mechanical accuracy is poor and the mask cannot be easily aligned with the proper position of the holder. Further, when the mask is fixed by adhesion, a deviation occurs with respect to an appropriate position. If the mask and the holder are not accurately positioned, the pattern required for the alignment operation when performing electron beam exposure is not in a predetermined position, and alignment cannot be performed.

  The present invention has been made in view of the above circumstances, and an object thereof is to provide an electron beam exposure mask holder capable of mechanically accurately and easily aligning an electron beam exposure mask. To do.

The present invention employs the following means in order to solve the above problems.
An electron beam exposure mask holder according to the present invention is an electron beam exposure mask holder in which an electron beam exposure mask is sandwiched, and the electron beam exposure mask is assembled when the electron beam exposure mask holder is assembled. A holder lid set below to sandwich the electron beam exposure mask, a holder body set on the holder lid to hold the electron beam exposure mask from above when assembling the electron beam exposure mask holder, A screw hole opening formed in the holder lid and the holder body for screwing from the holder body side, and at least formed in the holder lid and the holder body according to an opening pattern of the electron beam exposure mask. A frame shape that is formed in a portion where the electron beam irradiation surface of the electron beam exposure mask is in contact with the opening and the holder lid and into which the electron beam exposure mask enters. And a positioning part for aligning the electron beam exposure mask with the holder body, the positioning part being formed on either the holder body or the holder lid, and the holder body and the holder lid A conical positioning convex portion that is erected toward the other side and gradually reduces in diameter from the base side on the mounting surface side of the holder body toward the tip side, and the electron beam exposure mask. A mask side positioning hole portion into which the positioning convex portion is fitted, and the electron beam exposure mask is disposed in the frame-shaped concave portion when the holder main body and the holder lid are assembled, and The positioning is performed by fitting the positioning convex portion into the mask side positioning hole in the frame-shaped concave portion.

  In the present invention, when the electron beam exposure mask is sandwiched between the holder main body and the holder lid, the electron beam exposure mask is formed by penetrating the positioning convex portion into the mask side positioning hole of the electron beam exposure mask. It can be aligned with either the holder body or the holder lid.

  Moreover, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein the positioning convex portion is fitted into the other one of the holder main body and the holder lid. A portion is provided.

  In this invention, since the positioning convex portion penetrates the electron beam exposure mask and penetrates either the holder main body or the holder lid, the positional deviation of the mask is more suitably suppressed, and the positioning accuracy is further improved. Can do.

  Further, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein the positioning convex portion is gradually reduced in diameter from the base side toward the tip side, and the holder lid and When the electron beam exposure mask is sandwiched between the holder body and the holder body, it is provided at a height penetrating the holder-side positioning hole.

  According to the present invention, the positioning hole can be passed through the mask-side positioning hole and the holder-side positioning hole, and the positional deviation of the mask can be more suitably suppressed, and the positioning accuracy can be further improved. At this time, since the positioning convex portion gradually decreases in diameter from the base side toward the distal end side, the distal end side of the positioning convex portion can be easily inserted into the mask side positioning hole portion and the holder side positioning hole portion. At the same time, the electron beam exposure mask can be reliably aligned by fitting with the mask side positioning hole on the base side of the positioning convex portion.

  Further, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein at least two of the positioning projections are spaced apart from each other on the holder body or the holder lid. It is characterized by that.

  According to the present invention, the relative rotational movement of the electron beam exposure mask with respect to the holder main body or the holder lid can be restricted, and the mechanical positioning accuracy can be further improved.

  Further, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein the positioning projection is formed on the positioning projection from the surface in the direction in which the positioning projection is inserted to the opposite surface. In addition, the mask-side positioning hole is gradually reduced in diameter.

  This invention can fit the positioning convex portion and the mask side positioning hole portion not only on the surface in the direction in which the positioning convex portion of the electron beam exposure mask is inserted, but also on the opposite surface thereof, Reliable alignment of the electron beam exposure mask can be performed.

  Further, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein the positioning projection is formed on the positioning projection from the surface in the direction in which the positioning projection is inserted to the opposite surface. In addition, the holder-side positioning hole is gradually reduced in diameter.

  According to the present invention, the positioning projection and the holder-side positioning hole can be fitted not only on the surface in the direction in which the positioning projection is inserted but also on the opposite surface. Reliable alignment can be performed.

  Further, the electron beam exposure mask holder according to the present invention is the electron beam exposure mask holder, wherein the positioning convex portion includes the same material as the standing holder body or the holder lid, and is conductive. It has the property.

  The present invention suitably suppresses occurrence of a potential difference between the positioning convex portion and the electron beam exposure mask and between the positioning convex portion and the holder body or the holder lid when the electron beam is irradiated in the apparatus. Can do.

  According to the present invention, the electron beam exposure mask can be mechanically accurately and easily aligned.

An embodiment according to the present invention will be described with reference to FIGS.
As shown in FIG. 1, the electron beam exposure mask holder 1 according to this embodiment has an electron beam exposure between a holder main body 3 on which a plate-shaped electron beam exposure mask 2 is placed and the holder main body 3. A holder lid 5 for sandwiching the mask 2 and a positioning portion 6 for aligning the electron beam exposure mask 2 with the holder body 3.

  As shown in FIG. 2, the electron beam exposure mask 2 is formed in a substantially rectangular shape and is provided with an opening pattern 7 in the center. A pair of mask-side positioning holes 8A, into which a pair of positioning pins 11A and 11B described later are fitted, at positions on the peripheral edge side of the electron beam exposure mask 2 and facing each other with the opening pattern 7 therebetween. 8B is provided.

  As shown in FIGS. 3 and 4, the holder body 3 has an emission surface 3a in the direction in which the electron beam is emitted and a mounting surface 3b of the electron beam exposure mask 2 on the opposite side. It is formed in a substantially disc shape. An opening 10 through which an electron beam can pass is provided in the center portion corresponding to the opening pattern 7 of the electron beam exposure mask 2.

  A pair of positioning pins (positioning convex portions) are provided at positions corresponding to the pair of mask side positioning holes 8A and 8B on the mounting surface 3b side of the electron beam exposure mask 2 with the opening 10 interposed therebetween. 11A and 11B are erected. In a direction orthogonal to a straight line connecting the pair of positioning pins 11A and 11B, a pair of screw hole openings 12A and 12B into which screws for fixing the holder body 3 to an exposure apparatus (not shown) are screwed are provided. .

  As shown in FIGS. 5 and 6, the holder lid 5 has a contact surface 5a with which the electron beam exposure mask 2 is in contact and an irradiation surface 5b with which the opposite electron beam is irradiated. It is formed in a substantially disk shape. A frame-like recess 13 for placing the electron beam exposure mask 2 is provided at the center of the contact surface 5a.

  The frame-shaped recess 13 is provided with a pair of holder-side positioning holes 15A and 15B into which the pair of positioning pins 11A and 11B are fitted, and a through opening 13A is formed at the center. In a direction orthogonal to the straight line connecting the pair of holder-side positioning hole portions 15A and 15B, a pair of female screw portions 16A and 16B are provided corresponding to the pair of screw hole openings 12A and 12B.

  The positioning unit 6 includes a pair of positioning pins 11A and 11B erected on the holder body 3 and a pair of mask-side positioning holes provided on the electron beam exposure mask 2 and into which the pair of positioning pins 11A and 11B are fitted. 8A and 8B and a pair of holder-side positioning holes 15A and 15B provided in the holder lid 5 are provided.

  The pair of positioning pins 11 </ b> A and 11 </ b> B gradually reduce in diameter from the base side on the mounting surface 3 b side of the holder body 3 toward the tip side, and between the holder lid 5 and the holder body 3, an electron beam exposure mask. When 2 is clamped, it is provided at a height that penetrates the pair of holder-side positioning holes 15A and 15B. The pair of positioning pins 11A and 11B includes the same material as the holder body 3 and has conductivity.

  The pair of mask side positioning holes 8A and 8B are gradually adapted to the outer shape of the pair of positioning pins 11A and 11B from the surface 2a in the direction in which the pair of positioning pins 11A and 11B are inserted toward the opposite surface 2b. The diameter is reduced. Similarly, the pair of holder-side positioning holes 15A and 15B has the outer shape of the pair of positioning pins 11A and 11B from the contact surface 5a into which the pair of positioning pins 11A and 11B are inserted toward the irradiation surface 5b on the opposite side. In addition, the diameter is gradually reduced and smaller than the pair of mask side positioning holes 8A and 8B.

Next, a method of holding the electron beam exposure mask 2 by the electron beam exposure mask holder 1 according to the present invention and its operation will be described.
First, the holder lid 5 is set so that the irradiation surface 5b faces downward, and is placed so that the surface 2b of the electron beam exposure mask 2 is in contact with the frame-shaped recess 13. Then, the mounting surface 3b and the surface 2a of the electron beam exposure mask 2 are opposed to each other so that the emission surface 3a of the holder body 3 faces upward, and the pair of positioning pins 11A and 11B are paired with the pair of mask side positioning holes 8A. , 8B and the pair of holder side positioning holes 15A, 15B.

  In a state where the above members are set, screws (not shown) are inserted into the pair of screw hole openings 12A and 12B from above, and are screwed into the pair of female screw portions 16A and 16B to be fastened. Thus, the electron beam exposure mask 2 is sandwiched between the holder lid 5 and the holder body 3.

  According to this electron beam exposure mask holder 1, when the electron beam exposure mask 2 is sandwiched between the holder body 3 and the holder lid 5, the pair of positioning pins 11 </ b> A and 11 </ b> B are paired with the electron beam exposure mask 2. The mask 2 for electron beam exposure can be aligned with the holder body 3 by passing through the mask side positioning holes 8A and 8B. Therefore, the electron beam exposure mask 2 can be mechanically accurately and easily aligned.

  The deviation of the electron beam exposure mask 2 with respect to the electron beam exposure mask holder 1 can be kept within the allowable range of an exposure apparatus (not shown), which can contribute to the improvement of the reliability of the electron beam exposure mask 2. . Further, the work can be automated by mechanically mounting the electron beam exposure mask 2. Therefore, there is no risk of foreign matter adhesion or mask destruction by manual work, which can contribute to yield improvement.

  In particular, since the positioning pins 11A and 11B are provided across the electron beam mask 2, the relative rotational movement of the electron beam exposure mask 2 with respect to the holder body 3 can be restricted, and the mechanical positioning accuracy is further improved. Can be improved.

  Since the holder lid 5 is provided with a pair of holder-side positioning holes 15A and 15B, the pair of positioning pins 11A and 11B penetrates the pair of mask-side positioning holes 8A and 8B of the electron beam exposure mask 2. In addition, the holder lid 5 also penetrates. Therefore, the positional deviation of the electron beam exposure mask 2 can be more suitably suppressed, and the positioning accuracy can be further improved.

  Furthermore, since the pair of positioning pins 11A and 11B are gradually reduced in diameter from the base side toward the tip side, the tip side of the pair of positioning pins 11A and 11B is connected to the pair of mask side positioning holes 8A and 8B and the pair. Can be easily inserted into the holder-side positioning holes 15A and 15B, and on the base side of the pair of positioning pins 11A and 11B, the masks for electron beam exposure are fitted with the pair of mask-side positioning holes 8A and 8B. 2 can be reliably aligned.

  At this time, since the pair of mask side positioning holes 8A and 8B and the pair of holder side positioning holes 15A and 15B are also tapered to match the pair of positioning pins 11A and 11B, the electron beam exposure mask 2 The pair of positioning pins 11A and 11B and the pair of mask side positioning holes 8A and 8B are securely fitted not only on the surface 2a in the direction in which the pair of positioning is inserted but also on the surface 2b on the opposite side. be able to. Further, with respect to the holder lid 5, not only the contact surface 5a but also the irradiation surface 5b, the pair of positioning pins 11A and 11B and the pair of holder-side positioning holes 15A and 15B can be fitted. And the holder lid 5 can be reliably aligned.

  Further, since the pair of positioning pins 11A and 11B have conductivity, when the electron beam is irradiated, the pair of positioning pins 11A and 11B, the electron beam exposure mask 2, and the pair of positioning pins 11A and 11B. And potential difference between the holder lid 5 and the holder lid 5 can be suitably suppressed.

The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.
For example, in the above embodiment, the pair of positioning pins 11A and 11B are erected on the holder body 3, but may be erected on the holder lid.

  With respect to the electron beam exposure mask holder 1 described above, the distance between the pair of positioning pins 11A and 11B was 20 mm, the positional accuracy was within ± 5 μm, and the diameter was within 1 mm ± 10 μm. Further, the distance between the pair of holder-side positioning holes 15A and 15B in the holder lid 5 is 20 mm, the positional accuracy is within ± 5 μm, and the diameter is 1 mm + 40 μm or more.

  FIG. 7 shows a conceptual diagram when examining the opening diameters of the pair of mask side positioning holes 8A and 8B of the electron beam exposure mask 2 with respect to the diameters of the pair of positioning pins 11A and 11B at this time. As described above, when the maximum outer diameter of the pair of positioning pins 11A and 11B is 1 mm + 10 μm, the positional accuracy of the pair of positioning pins 11A and 11B is ± 5 μm, so that the pair of mask-side positioning holes 8A and 8B are opened. The diameter should be at least larger than these.

  In this case, the distance between the pair of mask side positioning holes 8A and 8B is 20 μm, the diameter is 1 mm + 20 μm, and the gap between the pair of positioning pins 11A and 11B and the pair of mask side positioning holes 8A and 8B is 0 μm. To 5 μm.

  In this case, when the electron beam exposure mask 2 is mounted on the electron beam exposure mask holder 1, the mask may be destroyed. Therefore, the pair of mask-side positioning holes 8A and 8B are mounted in such a manner that they are mounted so as to be vertically lowered from directly above to align with the pair of positioning pins 11A and 11B.

It is sectional drawing which shows the mask holder for electron beam exposure which concerns on one Embodiment of this invention. It is (a) top view and (b) side view which show the mask for electron beam exposure clamped by the mask holder for electron beam exposure which concerns on one Embodiment of this invention. It is a top view which shows the holder main body of the mask holder for electron beam exposure which concerns on one Embodiment of this invention. It is AA sectional drawing of FIG. It is a top view which shows the holder lid | cover of the mask holder for electron beam exposure which concerns on one Embodiment of this invention. It is BB sectional drawing of FIG. It is explanatory drawing which shows the Example of the mask holder for electron beam exposure which concerns on one Embodiment of this invention. It is a top view which shows the conventional mask holder for electron beam exposure. It is CC sectional drawing of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Electron beam exposure mask holder 2 Electron beam exposure masks 2a and 2b Surface 3 Holder body 5 Holder lid 5a Contact surface (surface)
5b Irradiated surface (surface)
6 Positioning part 8A, 8B Mask side positioning hole 11A, 11B Positioning pin (positioning convex part)
15A, 15B Holder side positioning hole

Claims (7)

An electron beam exposure mask holder in which an electron beam exposure mask is sandwiched,
A holder lid that is set down to sandwich the electron beam exposure mask when assembling the electron beam exposure mask holder;
A holder body set on the holder lid to hold the electron beam exposure mask from above when assembling the electron beam exposure mask holder;
A screw hole opening formed in the holder lid and the holder body for screwing from the holder body side;
An opening formed in the holder lid and the holder body according to at least an opening pattern of the electron beam exposure mask; and
A frame-shaped recess formed in a portion where the electron beam irradiation surface of the electron beam exposure mask is in contact with the holder lid, and the electron beam exposure mask enters;
A positioning unit for aligning the electron beam exposure mask with the holder body;
With
The positioning part is
The holder body is formed on one of the holder body and the holder lid and is erected toward the other of the holder body and the holder lid, from the base side on the mounting surface side of the holder body toward the tip side. A cone-shaped positioning convex part that gradually decreases in diameter ;
A mask side positioning hole provided in the electron beam exposure mask and into which the positioning convex portion is fitted; and
With
The electron beam exposure mask is disposed in the frame-shaped recess when the holder body and the holder lid are assembled, and the positioning projection is formed in the mask-side positioning hole in the frame-shaped recess. A mask holder for electron beam exposure, wherein the mask holder is positioned by fitting.   2. The electron beam exposure mask holder according to claim 1, wherein a holder-side positioning hole portion into which the positioning convex portion is fitted is provided in one of the holder main body and the holder lid.   When the positioning convex portion is gradually reduced in diameter from the base side toward the tip end side, and the electron beam exposure mask is sandwiched between the holder lid and the holder body, the holder side positioning hole portion is The mask holder for electron beam exposure according to claim 2, wherein the mask holder is provided at a penetrating height.   4. The electron beam exposure mask holder according to claim 1, wherein at least two of the positioning projections are arranged on the holder main body or the holder lid so as to be separated from each other. 5.   3. The mask-side positioning hole portion is gradually reduced in diameter according to the positioning convex portion from a surface in a direction in which the positioning convex portion is inserted toward an opposite surface. Mask holder for electron beam exposure.   3. The holder-side positioning hole portion is gradually reduced in diameter according to the positioning convex portion from a surface in a direction in which the positioning convex portion is inserted toward an opposite surface. Mask holder for electron beam exposure. The electron according to any one of claims 1 to 6, wherein the positioning convex portion includes the same material as the standing holder body or the holder lid and has conductivity. Mask holder for line exposure.

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