JP5270084B2 - Moisture-proof composition and moisture-proof sheet using the same - Google Patents
Moisture-proof composition and moisture-proof sheet using the same Download PDFInfo
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- JP5270084B2 JP5270084B2 JP2006305538A JP2006305538A JP5270084B2 JP 5270084 B2 JP5270084 B2 JP 5270084B2 JP 2006305538 A JP2006305538 A JP 2006305538A JP 2006305538 A JP2006305538 A JP 2006305538A JP 5270084 B2 JP5270084 B2 JP 5270084B2
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- 239000000203 mixture Substances 0.000 title claims abstract description 41
- 239000010703 silicon Substances 0.000 claims abstract description 44
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 7
- 239000010408 film Substances 0.000 claims description 27
- 230000004888 barrier function Effects 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000003054 catalyst Substances 0.000 claims description 7
- 150000002484 inorganic compounds Chemical class 0.000 claims description 6
- 229910010272 inorganic material Inorganic materials 0.000 claims description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 5
- 239000004645 polyester resin Substances 0.000 claims description 5
- 229920001225 polyester resin Polymers 0.000 claims description 5
- 229910000077 silane Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229920006122 polyamide resin Polymers 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 150000004756 silanes Chemical class 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- -1 monosubstituted silicon atoms Chemical group 0.000 abstract description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 11
- 229920003169 water-soluble polymer Polymers 0.000 abstract description 9
- 150000003376 silicon Chemical class 0.000 description 24
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 23
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- 239000004372 Polyvinyl alcohol Substances 0.000 description 9
- 229920002451 polyvinyl alcohol Polymers 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 230000007062 hydrolysis Effects 0.000 description 7
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 7
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 6
- 229920000573 polyethylene Polymers 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000013558 reference substance Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 229920002292 Nylon 6 Polymers 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- CSCPPACGZOOCGX-WFGJKAKNSA-N deuterated acetone Substances [2H]C([2H])([2H])C(=O)C([2H])([2H])[2H] CSCPPACGZOOCGX-WFGJKAKNSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 235000013305 food Nutrition 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229920006280 packaging film Polymers 0.000 description 2
- 239000012785 packaging film Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- SQUNKLNGFIILTR-UHFFFAOYSA-N C1(CCCCC1)CO[Si](OC)(OC)CC Chemical compound C1(CCCCC1)CO[Si](OC)(OC)CC SQUNKLNGFIILTR-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
- TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 description 1
- 125000002339 acetoacetyl group Chemical group O=C([*])C([H])([H])C(=O)C([H])([H])[H] 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- HNYOPLTXPVRDBG-UHFFFAOYSA-N barbituric acid Chemical compound O=C1CC(=O)NC(=O)N1 HNYOPLTXPVRDBG-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 229940023913 cation exchange resins Drugs 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Wrappers (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、優れた水蒸気バリア性を有する防湿性組成物及びそれを用いた防湿性シートに関するものである。 The present invention relates to a moisture-proof composition having excellent water vapor barrier properties and a moisture-proof sheet using the same.
食品、電子部材及び医療部材用のバリア包装フィルムにおいては、ガスバリア性(酸素バリア性、水蒸気バリア性等)等の機能を付与させる目的で、ポリエチレンテレフタレートフィルム、ナイロンフィルム、ポリプロピレンフィルム等の基材フィルム表面に、ガスバリア性組成物(酸素バリア性組成物、防湿性組成物等)等を塗布することが行われている。
例えば、特許文献1は、アルコキシドの部分加水分解重縮合物と水溶性高分子との混合物あるいは該部分加水分解重縮合物と水溶性高分子との反応生成物等のガスバリア性組成物を開示し、ポリオレフィン系樹脂からなる2層の間に、該ガスバリア性組成物からなる高分子ガスバリア層を配設した積層フィルムを提案している。
また、特許文献2は、ポリビニルアルコール系樹脂、ケイ素アルコキシド、低級アルコール、水、およびケイ素アルコキシド加水分解触媒を、ポリビニルアルコール系樹脂/ケイ素アルコキシドの重量部比が100/300〜100/600となるように混合してケイ素アルコキシドを加水分解した後に、ケイ素アルコキシド加水分解触媒を除去した塗工液を、熱可塑性樹脂フィルムに塗工したガスバリア性フィルムを提案している。
さらに、特許文献3は、アルコキシシラン又はその加水分解物と、ポリビニルアルコール及び/又はエチレン−ビニルアルコールコポリマーとを含有する塗工組成物を重縮合してなる複合ポリマー層を熱可塑性樹脂の基材フィルムの少なくとも片面に積層したバリア性積層フィルムを提案している。
しかしながら、これらの発明は、いずれもアルコキシシラン又はその加水分解物の重縮合物をガスバリア性組成物、特に酸素バリア性組成物として用いるものであり、防湿性組成物としては性能的に満足できるものではなかった。
In barrier packaging films for foods, electronic parts and medical parts, base films such as polyethylene terephthalate films, nylon films, polypropylene films and the like for the purpose of imparting functions such as gas barrier properties (oxygen barrier properties, water vapor barrier properties, etc.) A gas barrier composition (oxygen barrier composition, moisture-proof composition, etc.) or the like is applied to the surface.
For example, Patent Document 1 discloses a gas barrier composition such as a mixture of a partially hydrolyzed polycondensate of alkoxide and a water-soluble polymer or a reaction product of the partially hydrolyzed polycondensate and water-soluble polymer. The present invention proposes a laminated film in which a polymer gas barrier layer made of the gas barrier composition is disposed between two layers made of polyolefin resin.
Patent Document 2 discloses that a polyvinyl alcohol resin, silicon alkoxide, lower alcohol, water, and a silicon alkoxide hydrolysis catalyst have a polyvinyl alcohol resin / silicon alkoxide weight part ratio of 100/300 to 100/600. A gas barrier film is proposed in which a silicon alkoxide is hydrolyzed and then coated on a thermoplastic resin film with a coating liquid from which the silicon alkoxide hydrolysis catalyst has been removed.
Further, Patent Document 3 discloses that a composite polymer layer obtained by polycondensation of a coating composition containing alkoxysilane or a hydrolyzate thereof and polyvinyl alcohol and / or ethylene-vinyl alcohol copolymer is used as a thermoplastic resin substrate. A barrier laminate film laminated on at least one side of the film is proposed.
However, all of these inventions use alkoxysilane or a polycondensate of a hydrolyzate thereof as a gas barrier composition, particularly an oxygen barrier composition, and are satisfactory in terms of performance as a moisture-proof composition. It wasn't.
本発明は、このような状況下で、水蒸気バリア性に優れる防湿性組成物及びそれを用いた防湿性シートを提供することを課題とするものである。 Under such circumstances, an object of the present invention is to provide a moisture-proof composition excellent in water vapor barrier properties and a moisture-proof sheet using the same.
本発明者らは、前記課題を達成するために鋭意研究を重ねた結果、特定のテトラアルコキシシラン加水分解物と水溶性ポリマーとの反応生成物を含む組成物が顕著な防湿性を奏することを見出した。本発明は、かかる知見に基づいて完成したものである。
すなわち、本発明の要旨は、
(1)無置換ケイ素及び1〜3置換ケイ素の総数に対する無置換ケイ素及び1置換ケイ素の数量比率{(無置換ケイ素数+1置換ケイ素数)/(無置換ケイ素数+1〜3置換ケイ素数)}×100(%)が5%以上であるテトラアルコキシシラン加水分解物と水溶性ポリマーとの反応生成物を含む防湿性組成物、
(2)前記テトラアルコキシシランが、下記一般式(I)で表わされるシランから少なくとも1種選択されたシランである上記(1)の防湿性組成物。
As a result of intensive studies to achieve the above-mentioned problems, the present inventors have found that a composition containing a reaction product of a specific tetraalkoxysilane hydrolyzate and a water-soluble polymer exhibits remarkable moisture resistance. I found it. The present invention has been completed based on such findings.
That is, the gist of the present invention is as follows.
(1) Quantity ratio of unsubstituted silicon and 1-substituted silicon to the total number of unsubstituted silicon and 1 to 3 substituted silicon {(number of unsubstituted silicon + 1 number of substituted silicon) / (number of unsubstituted silicon + 1 to 3 substituted silicon)} A moisture-proof composition containing a reaction product of a tetraalkoxysilane hydrolyzate and a water-soluble polymer, wherein x100 (%) is 5% or more,
(2) The moisture-proof composition according to (1), wherein the tetraalkoxysilane is a silane selected from at least one silane represented by the following general formula (I).
(3)前記水溶性ポリマーが、ポリビニルアルコール及び/又はポリエチレンビニルアルコールである上記(1)又は(2)の防湿性組成物、
(4)上記(1)〜(3)のいずれかの防湿性組成物を基材フィルムに積層してなる防湿性シート、
(5)前記基材フィルムが、ポリエステル樹脂及び/又はポリアミド樹脂からなる上記(4)の防湿性シート、及び
(6)前記防湿性組成物層と前記基材フィルムとの間に金属薄膜層及び/又は無機化合物薄膜層を積層してなる上記(4)又は(5)の防湿性シートである。
(3) The moisture-proof composition according to (1) or (2), wherein the water-soluble polymer is polyvinyl alcohol and / or polyethylene vinyl alcohol,
(4) A moisture-proof sheet obtained by laminating the moisture-proof composition according to any one of (1) to (3) above on a base film,
(5) The moisture-proof sheet of the above (4), wherein the substrate film is made of a polyester resin and / or a polyamide resin, and (6) a metal thin film layer and a gap between the moisture-proof composition layer and the substrate film (4) The moisture-proof sheet according to (4) or (5), which is formed by laminating an inorganic compound thin film layer.
本発明によれば、水蒸気バリア性に優れる防湿性組成物及びそれを用いた防湿性シートを提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the moisture-proof composition excellent in water vapor | steam barrier property and a moisture-proof sheet using the same can be provided.
本発明の防湿性組成物は、無置換ケイ素及び1〜3置換ケイ素の総数に対する無置換ケイ素及び1置換ケイ素の数量比率{(無置換ケイ素数+1置換ケイ素数)/(無置換ケイ素数+1〜3置換ケイ素数)}×100(%)が5%以上であるテトラアルコキシシラン加水分解物と水溶性ポリマーとの反応生成物を含むものであり、この無置換ケイ素及び1置換ケイ素の数量比率が5%未満であると本発明の目的とする水蒸気バリア性を享受し得ない。
ここで、無置換ケイ素とは4つの水酸基と結合しているケイ素をいい、1置換ケイ素とは3つの水酸基及び1つのシロキサン基(−O−Si)と結合しているケイ素をいい、2置換ケイ素とは2つの水酸基及び2つのシロキサン基(−O−Si)と結合しているケイ素をいう。3置換ケイ素とは1つの水酸基及び3つのシロキサン基(−O−Si)と結合しているケイ素をいう。
The moisture-proof composition of the present invention is a ratio of the number of unsubstituted silicon and 1-substituted silicon to the total number of unsubstituted silicon and 1 to 3 substituted silicon {(number of unsubstituted silicon + 1 number of substituted silicon) / (number of unsubstituted silicon + 1 to 1 The number of 3-substituted silicon)} × 100 (%) includes a reaction product of a tetraalkoxysilane hydrolyzate and a water-soluble polymer that is 5% or more. If it is less than 5%, the water vapor barrier property of the present invention cannot be enjoyed.
Here, unsubstituted silicon refers to silicon bonded to four hydroxyl groups, and monosubstituted silicon refers to silicon bonded to three hydroxyl groups and one siloxane group (—O—Si). Silicon refers to silicon bonded to two hydroxyl groups and two siloxane groups (—O—Si). Tri-substituted silicon refers to silicon bonded to one hydroxyl group and three siloxane groups (—O—Si).
本発明の防湿性組成物に用いられるテトラアルコキシシランは、上記一般式(I)で表わされるシランから少なくとも1種選択されたシランであることが好ましい。これらのテトラアルコキシシランとしては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン、ジメトキシジエトキシシラン等が挙げられる。 The tetraalkoxysilane used in the moisture-proof composition of the present invention is preferably a silane selected from at least one silane represented by the general formula (I). Examples of these tetraalkoxysilanes include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, and dimethoxydiethoxysilane.
上記のテトラアルコキシシランは水及びアルコールと混合され、この混合液に、加水分解触媒が加えられ、加水分解される。得られたテトラアルコキシシラン加水分解物は、水溶性ポリマーと混合され反応し、その反応生成物が防湿性組成物の防湿性成分となる。
ここで、アルコールとしては、イソプロピルアルコール、n−プロピルアルコール、エタノール、メタノール等が挙げられる。
また、加水分解触媒としては、塩酸、硝酸、硫酸、リン酸等の無機酸、有機リン酸、蟻酸、酢酸、無水酢酸、クロロ酢酸、プロピオン酸、酪酸、吉草酸、クエン酸、グルコン酸、コハク酸、酒石酸、乳酸、フマル酸、リンゴ酸、イタコン酸、シュウ酸、粘液酸、尿酸、バルビツル酸、p−トルエンスルホン酸等の有機酸、酸性陽イオン交換樹脂等の酸性触媒が挙げられる。
The tetraalkoxysilane is mixed with water and alcohol, and a hydrolysis catalyst is added to the mixed solution to cause hydrolysis. The obtained tetraalkoxysilane hydrolyzate is mixed and reacted with the water-soluble polymer, and the reaction product becomes a moisture-proof component of the moisture-proof composition.
Here, examples of the alcohol include isopropyl alcohol, n-propyl alcohol, ethanol, methanol and the like.
Hydrolysis catalysts include inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid and phosphoric acid, organic phosphoric acid, formic acid, acetic acid, acetic anhydride, chloroacetic acid, propionic acid, butyric acid, valeric acid, citric acid, gluconic acid, succinic acid. Examples include acids, tartaric acid, lactic acid, fumaric acid, malic acid, itaconic acid, oxalic acid, mucous acid, uric acid, barbituric acid, and p-toluenesulfonic acid, and acidic catalysts such as acidic cation exchange resins.
上述のテトラアルコキシシラン加水分解物の無置換ケイ素及び1〜3置換ケイ素の総数に対する無置換ケイ素及び1置換ケイ素の数量比率を5%以上とするためには、加水分解反応後の脱水縮合反応を進行し過ぎないように、(1)反応時間を短くする、(2)反応温度を低くする、(3)加水分解触媒量を少なくする、等の措置を採ることが望ましい。脱水縮合反応が進行すると生成したシラノール基(−Si−OH)が縮合して、シロキサン結合(Si−O−Si)が増加し、テトラアルコキシシラン加水分解物の反応性が低下し、水蒸気バリア性が低下するからである。
(1)〜(3)は、適宜、複数の措置を組み合わせることが好ましい。
In order to make the quantity ratio of unsubstituted silicon and 1-substituted silicon to 5% or more with respect to the total number of unsubstituted silicon and 1 to 3 substituted silicon of the above-mentioned tetraalkoxysilane hydrolyzate, dehydration condensation reaction after hydrolysis reaction is performed. It is desirable to take measures such as (1) shortening the reaction time, (2) lowering the reaction temperature, and (3) reducing the amount of hydrolysis catalyst so as not to proceed too much. As the dehydration condensation reaction proceeds, the generated silanol groups (—Si—OH) condense, increasing the siloxane bonds (Si—O—Si), reducing the reactivity of the tetraalkoxysilane hydrolyzate, and providing a water vapor barrier property. This is because of a decrease.
(1) to (3) preferably combine a plurality of measures as appropriate.
本発明の防湿性組成物に用いられる水溶性ポリマーは、ポリビニルアルコール及び/又はポリエチレンビニルアルコールであることが好ましい。
上記ポリビニルアルコールとしては、けん化度75モル%以上であることが好ましく、ポリエチレンビニルアルコールとしては、ビニルアルコール単位が60モル%以上であることが好ましい。
また、上記ポリビニルアルコール又はポリエチレンビニルアルコールは、本発明の効果を損なわない範囲内でシリル基やアセトアセチル基等で変性されていてもよい。上記ポリビニルアルコール又はポリエチレンビニルアルコールの重合度は、水蒸気バリア性や加工性を勘案すると、100〜5,000であることが好ましく、300〜3,000であることがより好ましい。
The water-soluble polymer used in the moisture-proof composition of the present invention is preferably polyvinyl alcohol and / or polyethylene vinyl alcohol.
The polyvinyl alcohol preferably has a saponification degree of 75 mol% or more, and the polyethylene vinyl alcohol preferably has 60 mol% or more of vinyl alcohol units.
The polyvinyl alcohol or polyethylene vinyl alcohol may be modified with a silyl group, an acetoacetyl group, or the like within a range not impairing the effects of the present invention. The degree of polymerization of the polyvinyl alcohol or polyethylene vinyl alcohol is preferably from 100 to 5,000, more preferably from 300 to 3,000, considering water vapor barrier properties and processability.
本発明の防湿性組成物は、さらにシランカップリング剤を含むことができる。
シランカップリング剤としては、公知の有機反応性基含有オルガノアルコキシシランを用いることができる。
本発明においては、特に、エポキシ基を有するオルガノアルコキシシランが好適であり、例えば、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等が挙げられる。
上記のようなシランカップリング剤は、1種ないし2種以上を混合して用いてもよい。
本発明において、上記のようなシランカップリング剤の使用量は、上記のテトラアルコキシシラン加水分解物100重量部に対して1〜20重量部位の範囲内で使用することができる。
The moisture-proof composition of the present invention can further contain a silane coupling agent.
A known organic reactive group-containing organoalkoxysilane can be used as the silane coupling agent.
In the present invention, an organoalkoxysilane having an epoxy group is particularly suitable, for example, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, β- (3,4-epoxy). (Cyclohexyl) ethyltrimethoxysilane and the like.
The above silane coupling agents may be used alone or in combination of two or more.
In this invention, the usage-amount of the above silane coupling agents can be used within the range of 1-20 weight part with respect to 100 weight part of said tetraalkoxysilane hydrolysates.
本発明の防湿性組成物は基材フィルムに塗布され、乾燥されて塗膜を形成し、防湿性シートが得られる。
基材フィルムとしては、特に限定されないが、ポリエチレンテレフタレート(以下、PETという)、ポリブチレンテレフタレート、ポリエチレンテレナフタレート等のポリエステル樹脂、ナイロン6、ナイロン6,6等のポリアミド樹脂、ポリプロピレン、ポリエチレン等のポリオレフィン樹脂等、又はこれらの二種以上を溶融混合したものが好ましい。これらの内、ポリエステル樹脂及び/又はポリアミド樹脂が機械的強度が高く好適であり、中でもポリエステル樹脂は十分な耐熱性及び機械的強度を有するためさらに好適であり、PETが特に好適である。基材フィルムは未延伸フィルムでも、一軸又は二軸延伸フィルムでもよい。また基材フィルムを二枚以上積層したものを用いてもよい。
塗布後の乾燥条件は、基材フィルムの変形を起こさない範囲であれば、特に制限はないが、100〜200℃で30秒から10分間が好ましい。
The moisture-proof composition of the present invention is applied to a substrate film and dried to form a coating film, whereby a moisture-proof sheet is obtained.
Although it does not specifically limit as a base film, Polyester resin, such as polyethylene terephthalate (henceforth PET), polybutylene terephthalate, polyethylene terephthalate, Polyamide resin, such as nylon 6, nylon 6, 6, Polyolefin, such as polypropylene and polyethylene A resin or the like, or a mixture obtained by melting and mixing two or more of these is preferable. Of these, polyester resins and / or polyamide resins are preferable because of their high mechanical strength. Among them, polyester resins are more preferable because they have sufficient heat resistance and mechanical strength, and PET is particularly preferable. The substrate film may be an unstretched film or a uniaxial or biaxially stretched film. Moreover, you may use what laminated | stacked two or more base film.
The drying conditions after coating are not particularly limited as long as they do not cause deformation of the base film, but are preferably 100 to 200 ° C. for 30 seconds to 10 minutes.
本発明の防湿性組成物層と基材フィルムとの間に、所望により金属薄膜層及び/又は無機化合物薄膜層を積層してもよい。
金属薄膜層は、アルミニウム等の金属を基材フィルム上にPVD法(物理蒸着法)(真空蒸着法、イオンプレーティング法、スパッタリング法等)により金属蒸着層を形成することが好ましい。
また、無機化合物薄膜層は、シリカ、ジルコニア(二酸化ジルコニウム)、アルミナ等の金属酸化物等を基材フィルム上にPVD法(物理蒸着法)(真空蒸着法、イオンプレーティング法、スパッタリング法等)、ゾル−ゲル法及びLPD法(液相析出法;Liquid Phase Deposition)等により薄膜層を形成することが好ましい。
ここで、ゾル−ゲル法は、アルコキシシランや他の金属アルコキシドを加水分解・重縮合し、得られた塗工液を基材フィルム又は成形体に塗布する方法である。LPD法は、例えば水溶液中で金属フルオロ錯体の加水分解平衡反応系(配位子置換反応)に、フッ化物イオンと容易に反応してより安定な化合物を生成するホウ酸(フッ化物イオン捕捉剤)を添加することにより、系中の遊離のフッ化物イオンとより安定な錯イオンを形成させ、上記平衡反応系を酸化物析出側ヘシフトさせて、反応水溶液に浸漬した基板上に酸化物薄膜を析出させる方法である。
金属薄膜層及び/又は無機化合物薄膜層の厚さは0.001〜10μmであるのが好ましく、0.01〜1μmであるのが特に好ましい。また複数の金属薄膜層及び/又は無機化合物薄膜層を積層することにより、さらなるガスバリア性の向上が可能である。
If desired, a metal thin film layer and / or an inorganic compound thin film layer may be laminated between the moisture-proof composition layer of the present invention and the substrate film.
The metal thin film layer is preferably formed by depositing a metal such as aluminum on a base film by a PVD method (physical vapor deposition method) (vacuum vapor deposition method, ion plating method, sputtering method, etc.).
Also, the inorganic compound thin film layer is made of PVD method (physical vapor deposition method) (vacuum vapor deposition method, ion plating method, sputtering method, etc.) on a base film with a metal oxide such as silica, zirconia (zirconium dioxide), alumina, etc. The thin film layer is preferably formed by a sol-gel method, an LPD method (liquid phase deposition method), or the like.
Here, the sol-gel method is a method in which alkoxysilane and other metal alkoxides are hydrolyzed and polycondensed, and the obtained coating solution is applied to a substrate film or a molded body. The LPD method is a boric acid (fluoride ion scavenger) that easily reacts with fluoride ions in a hydrolysis equilibrium reaction system (ligand substitution reaction) of a metal fluoro complex in an aqueous solution to form a more stable compound. ) To form a more stable complex ion with free fluoride ions in the system, shift the equilibrium reaction system to the oxide deposition side, and form an oxide thin film on the substrate immersed in the reaction aqueous solution. It is the method of making it precipitate.
The thickness of the metal thin film layer and / or the inorganic compound thin film layer is preferably 0.001 to 10 μm, and particularly preferably 0.01 to 1 μm. Further, by laminating a plurality of metal thin film layers and / or inorganic compound thin film layers, it is possible to further improve gas barrier properties.
本発明を実施例により、さらに詳細に説明するが、本発明は、これらの例によってなんら限定されるものではない。
なお、29Si−NMR測定及び水蒸気透過率の測定は、下記の方法に従って評価した。
(1)29Si−NMR測定
石英製のNMR試料管にテトラアルコキシシラン加水分解物/アセトン−D6NMR用/TMS混合液(テトラアルコキシシラン加水分解物/アセトン−D6NMR用/TMS=60質量%/35質量%/5質量%)0.5gを入れ、29Si−NMRスペクトルを核磁気共鳴装置(日本電子製、FT NMR、JNM−AL400)を用い、室温、積算回数1200回の条件にて測定した。
テトラメチルシラン(TMS)を基準物質として−70ppmから−106ppm領域の全ピーク面積を100とした場合に、−70ppmから−80ppm領域のピーク面積比率が無置換ケイ素の数量比率を示し、−81ppmから−87ppm領域のピーク面積比率が1置換ケイ素の数量比率を示し、−88ppmから−96ppm領域のピーク面積比率が2置換ケイ素の数量比率を示し、−97ppmから−106ppm領域のピーク面積比率が3置換ケイ素の数量比率を示す。
(2)水蒸気透過率の測定
得られた防湿性シートの水蒸気バリア性を、水蒸気透過率測定装置(MOCON社製、MOCON PERMATRAN−W3/33)を用い、温度40℃、湿度100%、キャリアガス流量(窒素ガス)20cm3/min、測定時間4.5時間の条件にて測定した。
Examples The present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
The 29 Si-NMR measurement and the water vapor transmission rate were evaluated according to the following methods.
(1) 29 Si-NMR measurement In a quartz NMR sample tube, tetraalkoxysilane hydrolyzate / acetone-D6 NMR / TMS mixed solution (tetraalkoxysilane hydrolyzate / acetone-D6 NMR / TMS = 60% by mass / 35 (Mass% / 5 mass%) 0.5 g was added, and the 29 Si-NMR spectrum was measured using a nuclear magnetic resonance apparatus (manufactured by JEOL, FT NMR, JNM-AL400) at room temperature and 1200 times of integration. .
When tetramethylsilane (TMS) is used as a reference substance and the total peak area in the −70 ppm to −106 ppm region is 100, the peak area ratio in the −70 ppm to −80 ppm region indicates the quantity ratio of unsubstituted silicon, and from −81 ppm The peak area ratio in the −87 ppm region indicates the quantity ratio of 1-substituted silicon, the peak area ratio in the −88 ppm to −96 ppm area indicates the quantity ratio of the 2-substituted silicon, and the peak area ratio in the −97 ppm to −106 ppm region is 3 substitutions. The quantity ratio of silicon is shown.
(2) Measurement of water vapor transmission rate The water vapor barrier property of the resulting moisture-proof sheet was measured using a water vapor transmission rate measuring device (MOCON PERMATRAN-W3 / 33, manufactured by MOCON) at a temperature of 40 ° C, humidity of 100%, and carrier gas. The measurement was performed under the conditions of a flow rate (nitrogen gas) of 20 cm 3 / min and a measurement time of 4.5 hours.
実施例1
還流冷却器、撹拌機を備えた4つ口フラスコに水/イソプロピルアルコール/テトラエトキシシラン混合液(水/イソプロピルアルコール/テトラエトキシシラン=38.6質量%/52.4質量%/9.0質量%)98.8質量部を撹拌し25℃にした。
この混合液に0.5mol/L塩酸1.2質量部を添加しテトラエトキシシランを加水分解した。25℃で30分間撹拌することで、(a)成分としてテトラアルコキシシラン加水分解物が得られた。このテトラアルコキシシラン加水分解物は29Si−NMRスペクトルがテトラメチルシラン(TMS)を基準物質として−70ppmから−106ppm領域の全ピーク面積を100とした場合に、−70ppmから−80ppm領域のピーク面積比率が2.7%、−81ppmから−87ppm領域のピーク面積比率が38.7%、−88ppmから−96ppm領域のピーク面積比率が49.7%、−97ppmから−106ppm領域のピーク面積比率が8.8%であった。
次に、撹拌機を備えた反応器に(b)成分としてポリビニルアルコールの水/イソプロピルアルコール4%溶液(水/イソプロピルアルコール=95質量%/5質量%)56.3質量部を入れ撹拌した。この溶液中に(a)成分として上記のテトラアルコキシシラン加水分解物43.7質量部を入れ25℃で20分間撹拌し、本発明の防湿性組成物を得た。得られた組成物を片面がPVD法にてアルミナ蒸着処理されたPETフィルム(厚さ12μm)上に、バーコーターNo.10により塗布し、25℃で5分間乾燥し、さらにオーブンにて190℃で10分間乾燥させて塗膜を形成することにより、防湿性シートを得た。
得られた防湿性シートの水蒸気透過率を測定した所、0.09g/m2/dayであった。
Example 1
In a four-necked flask equipped with a reflux condenser and a stirrer, a water / isopropyl alcohol / tetraethoxysilane mixed solution (water / isopropyl alcohol / tetraethoxysilane = 38.6 mass% / 52.4 mass% / 9.0 mass) %) 98.8 parts by mass were stirred and brought to 25 ° C.
To this mixed solution, 1.2 parts by mass of 0.5 mol / L hydrochloric acid was added to hydrolyze tetraethoxysilane. By stirring at 25 ° C. for 30 minutes, a tetraalkoxysilane hydrolyzate was obtained as component (a). This tetraalkoxysilane hydrolyzate has a peak area of -70 ppm to -80 ppm when the 29 Si-NMR spectrum is tetramethylsilane (TMS) as a reference substance and the total peak area of -70 ppm to -106 ppm is 100. The ratio is 2.7%, the peak area ratio in the −81 ppm to −87 ppm region is 38.7%, the peak area ratio in the −88 ppm to −96 ppm region is 49.7%, and the peak area ratio in the −97 ppm to −106 ppm region is It was 8.8%.
Next, 56.3 parts by mass of a water / isopropyl alcohol 4% solution of polyvinyl alcohol (water / isopropyl alcohol = 95% by mass / 5% by mass) as component (b) was placed in a reactor equipped with a stirrer and stirred. In this solution, 43.7 parts by mass of the above tetraalkoxysilane hydrolyzate was added as component (a) and stirred at 25 ° C. for 20 minutes to obtain the moisture-proof composition of the present invention. The obtained composition was applied to a bar coater no. The film was dried at 25 ° C. for 5 minutes and further dried in an oven at 190 ° C. for 10 minutes to form a coating film, thereby obtaining a moisture-proof sheet.
It was 0.09 g / m < 2 > / day when the water-vapor-permeation rate of the obtained moisture-proof sheet | seat was measured.
実施例2
還流冷却器、撹拌機を備えた4つ口フラスコに水/イソプロピルアルコール/テトラエトキシシラン混合液(水/イソプロピルアルコール/テトラエトキシシラン=38.6質量%/52.4質量%/9.0質量%)98.8質量部を撹拌し25℃にした。
この混合液に0.5mol/L塩酸1.2質量部を添加しテトラエトキシシランを加水分解した。25℃で4時間撹拌することで、(a)成分としてテトラアルコキシシラン加水分解物が得られた。このテトラアルコキシシラン加水分解物は29Si−NMRスペクトルがテトラメチルシラン(TMS)を基準物質として−70ppmから−106ppm領域の全ピーク面積を100とした場合に、−70ppmから−80ppm領域のピーク面積比率が0%、−81ppmから−87ppm領域のピーク面積比率が5.6%、−88ppmから−96ppm領域のピーク面積比率が55.3%、−97ppmから−106ppm領域のピーク面積比率が39.0%であった。
次に、上記(a)成分のテトラアルコキシシラン加水分解物を用い、実施例1と同様にして防湿性組成物及び防湿性シートを得た。
得られた防湿性シートの水蒸気透過率を測定した所、0.16g/m2/dayであった。
Example 2
In a four-necked flask equipped with a reflux condenser and a stirrer, a water / isopropyl alcohol / tetraethoxysilane mixed solution (water / isopropyl alcohol / tetraethoxysilane = 38.6 mass% / 52.4 mass% / 9.0 mass) %) 98.8 parts by mass were stirred and brought to 25 ° C.
To this mixed solution, 1.2 parts by mass of 0.5 mol / L hydrochloric acid was added to hydrolyze tetraethoxysilane. By stirring at 25 ° C. for 4 hours, a tetraalkoxysilane hydrolyzate was obtained as component (a). This tetraalkoxysilane hydrolyzate has a peak area of -70 ppm to -80 ppm when the 29 Si-NMR spectrum is tetramethylsilane (TMS) as a reference substance and the total peak area of -70 ppm to -106 ppm is 100. The ratio is 0%, the peak area ratio in the −81 ppm to −87 ppm region is 5.6%, the peak area ratio in the −88 ppm to −96 ppm region is 55.3%, and the peak area ratio in the −97 ppm to −106 ppm region is 39. 0%.
Next, using the tetraalkoxysilane hydrolyzate as the component (a), a moisture-proof composition and a moisture-proof sheet were obtained in the same manner as in Example 1.
It was 0.16 g / m < 2 > / day when the water-vapor-permeation rate of the obtained moisture-proof sheet | seat was measured.
比較例1
還流冷却器、撹拌機を備えた4つ口フラスコに水/イソプロピルアルコール/テトラエトキシシラン混合液(水/イソプロピルアルコール/テトラエトキシシラン=38.6質量%/52.4質量%/9.0質量%)98.8質量部を撹拌し25℃にした。
この混合液に0.5mol/L塩酸1.2質量部を添加しテトラエトキシシランを加水分解した。25℃で24時間撹拌することで、(a)成分としてテトラアルコキシシラン加水分解物が得られた。このテトラアルコキシシラン加水分解物は29Si−NMRスペクトルがテトラメチルシラン(TMS)を基準物質として−70ppmから−106ppm領域の全ピーク面積を100とした場合に、−70ppmから−80ppm領域のピーク面積比率が0%、−81ppm−から87ppm領域のピーク面積比率が0%、−88ppmから−96ppm領域のピーク面積比率が35.5%、−97ppmから−106ppm領域のピーク面積比率が64.5%であった。
次に、上記(a)成分のテトラアルコキシシラン加水分解物を用い、実施例1と同様にして防湿性組成物及び防湿性シートを得た。
得られた防湿性シートの水蒸気透過率を測定した所、0.50g/m2/dayであった。
Comparative Example 1
In a four-necked flask equipped with a reflux condenser and a stirrer, a water / isopropyl alcohol / tetraethoxysilane mixed solution (water / isopropyl alcohol / tetraethoxysilane = 38.6 mass% / 52.4 mass% / 9.0 mass) %) 98.8 parts by mass were stirred and brought to 25 ° C.
To this mixed solution, 1.2 parts by mass of 0.5 mol / L hydrochloric acid was added to hydrolyze tetraethoxysilane. By stirring at 25 ° C. for 24 hours, a tetraalkoxysilane hydrolyzate was obtained as component (a). This tetraalkoxysilane hydrolyzate has a peak area of -70 ppm to -80 ppm when the 29 Si-NMR spectrum is tetramethylsilane (TMS) as a reference substance and the total peak area of -70 ppm to -106 ppm is 100. The ratio is 0%, the peak area ratio in the -81 ppm- to 87 ppm region is 0%, the peak area ratio in the -88 ppm to -96 ppm region is 35.5%, and the peak area ratio in the -97 ppm to -106 ppm region is 64.5% Met.
Next, using the tetraalkoxysilane hydrolyzate as the component (a), a moisture-proof composition and a moisture-proof sheet were obtained in the same manner as in Example 1.
It was 0.50 g / m < 2 > / day when the water-vapor-permeation rate of the obtained moisture-proof sheet | seat was measured.
比較例2
還流冷却器、撹拌機を備えた4つ口フラスコに水/イソプロピルアルコール/テトラエトキシシラン混合液(水/イソプロピルアルコール/テトラエトキシシラン=39.8質量%/51.7質量%/9.3質量%)96.0質量部を撹拌し25℃にした。
この混合液に4.8mol/L塩酸4.0質量部を添加しテトラエトキシシランを加水分解した。25℃で4時間撹拌することで、(a)成分としてテトラアルコキシシラン加水分解物が得られた。このテトラアルコキシシラン加水分解物は29Si−NMRスペクトルがテトラメチルシラン(TMS)を基準物質として−70ppmから−106ppm領域の全ピーク面積を100とした場合に、−70ppmから−80ppm領域のピーク面積比率が0%、−81ppmから−87ppm領域のピーク面積比率が0%、−88ppmから−96ppm領域のピーク面積比率が17.9%、−97ppmから−106ppm領域のピーク面積比率が82.1%であった。
次に、上記(a)成分のテトラアルコキシシラン加水分解物を用い、実施例1と同様にして防湿性組成物及び防湿性シートを得た。
得られた防湿性シートの水蒸気透過率を測定した所、0.66g/m2/dayであった。
Comparative Example 2
In a four-necked flask equipped with a reflux condenser and a stirrer, a water / isopropyl alcohol / tetraethoxysilane mixed solution (water / isopropyl alcohol / tetraethoxysilane = 39.8 mass% / 51.7 mass% / 9.3 mass) %) 96.0 parts by mass were stirred and brought to 25 ° C.
To this mixed solution, 4.0 parts by mass of 4.8 mol / L hydrochloric acid was added to hydrolyze tetraethoxysilane. By stirring at 25 ° C. for 4 hours, a tetraalkoxysilane hydrolyzate was obtained as component (a). This tetraalkoxysilane hydrolyzate has a peak area of -70 ppm to -80 ppm when the 29 Si-NMR spectrum is tetramethylsilane (TMS) as a reference substance and the total peak area of -70 ppm to -106 ppm is 100. The ratio is 0%, the peak area ratio in the -81 ppm to -87 ppm region is 0%, the peak area ratio in the -88 ppm to -96 ppm region is 17.9%, and the peak area ratio in the -97 ppm to -106 ppm region is 82.1% Met.
Next, using the tetraalkoxysilane hydrolyzate as the component (a), a moisture-proof composition and a moisture-proof sheet were obtained in the same manner as in Example 1.
It was 0.66 g / m < 2 > / day when the water-vapor-permeation rate of the obtained moisture-proof sheet | seat was measured.
実施例1及び2と、比較例1及び2との水蒸気透過率を比較すれば明らかなように、本発明の防湿性組成物及び防湿性シートは優れた水蒸気バリア性を奏するものである。 As is clear from comparison of the water vapor transmission rates of Examples 1 and 2 and Comparative Examples 1 and 2, the moisture-proof composition and moisture-proof sheet of the present invention exhibit excellent water vapor barrier properties.
本発明の防湿性組成物及び防湿性シートは、食品、電子部材及び医療部材用等の各種用途の防湿性包装フィルムとして好適に用いられる。 The moisture-proof composition and moisture-proof sheet of the present invention are suitably used as a moisture-proof packaging film for various uses such as foods, electronic members, and medical members.
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