JP5265279B2 - ナノワイヤ・マルチスペクトル画像化アレイ - Google Patents
ナノワイヤ・マルチスペクトル画像化アレイ Download PDFInfo
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- 238000000701 chemical imaging Methods 0.000 title claims abstract description 18
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
- G01J3/36—Investigating two or more bands of a spectrum by separate detectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
- G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0837—Microantennas, e.g. bow-tie
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0881—Compact construction
- G01J5/0884—Monolithic
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J5/22—Electrical features thereof
- G01J5/24—Use of specially adapted circuits, e.g. bridge circuits
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/191—Photoconductor image sensors
- H10F39/193—Infrared image sensors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
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Description
本出願は、2007年9月13日提出の「Nanowire Multispectral Imaging Array」と題する米国仮特許出願第60/972,120号の利益を主張する。
本発明の別の態様は、赤外線及び/又はテラヘルツ検出用途で利用されるナノワイヤのマルチスペクトル・アレイを提供するものである。
マルチスペクトル画像化アレイシステムは、基板と、複数のそれぞれのギャップが複数のアンテナ中の各アンテナ間に形成されるように当該基板上に互いに関して配置された複数のアンテナとを具備し、複数のアンテナ中のアンテナの各グループはそれぞれ異なるアンテナサイズを含む。さらに、1つ又は複数のナノワイヤは、それぞれのギャップ中の1つ又は複数のギャップに配置されて、その結果、アンテナと通信するナノワイヤと基板とがマルチスペクトル画像化システムを構成し、ナノワイヤの使用により熱時定数したがってアンテナからの読み出しレートが低減する一方、読み出しレートに関連して周囲の気体冷却速度を低減し、マルチスペクトル画像化アレイシステムの製造可能性を増加させる。
Claims (3)
- 基板と、
各アンテナ対を構成する2つのアンテナ間にギャップが形成されるように、前記基板上に配置された複数のアンテナであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズがアンテナ対のサイズに応じて異なる、複数のアンテナと、
複数のそれぞれのギャップ中の少なくとも1つのギャップに配置された、対応するアンテナ対及び前記基板と通信する少なくとも1つのナノワイヤと
を具備し、前記少なくとも1つのナノワイヤが前記少なくとも1つのギャップのサイズに対応する長さを有する、マルチスペクトル画像化アレイシステム。 - 基板と、
各アンテナ対を構成する2つのアンテナ間にギャップが形成されるように、前記基板上に配置された複数のアンテナであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズがアンテナ対のサイズに応じて異なる、複数のアンテナと、
アンテナ対間の少なくとも1つのギャップに配置された、該アンテナ対及び前記基板と通信する少なくとも1つのナノワイヤであって、前記少なくとも1つのナノワイヤが前記アンテナ対間の前記少なくとも1つのギャップのサイズに対応する長さを有する、少なくとも1つのナノワイヤと、
前記複数のアンテナ、前記少なくとも1つのナノワイヤ及び前記基板に配置された複数の画素からなる画素アレイであって、前記複数の画素のうちの各画素が異なるサイズの複数のアンテナ対を含む、画素アレイと
を具備するマルチスペクトル画像化アレイシステム。 - マルチスペクトル画像化アレイを形成する方法であって、
基板を用意するステップと、
アンテナ対を形成するように前記基板上に配置された複数のアンテナを構成するステップと、
各アンテナ対を構成する2つのアンテナ間にギャップを形成するステップであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズはアンテナ対のサイズに応じて異なる、ステップと、
アンテナ対間の少なくとも1つのギャップに、該アンテナ対及び前記基板と通信する少なくとも1つのナノワイヤを配置するステップであって、前記少なくとも1つのナノワイヤが前記アンテナ対間の前記少なくとも1つのギャップのサイズに対応する長さを有する、ステップとを含む方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97212007P | 2007-09-13 | 2007-09-13 | |
US60/972,120 | 2007-09-13 | ||
US11/977,767 US7786440B2 (en) | 2007-09-13 | 2007-10-26 | Nanowire multispectral imaging array |
US11/977,767 | 2007-10-26 |
Publications (3)
Publication Number | Publication Date |
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JP2009133824A JP2009133824A (ja) | 2009-06-18 |
JP2009133824A5 JP2009133824A5 (ja) | 2011-05-19 |
JP5265279B2 true JP5265279B2 (ja) | 2013-08-14 |
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JP2008233443A Expired - Fee Related JP5265279B2 (ja) | 2007-09-13 | 2008-09-11 | ナノワイヤ・マルチスペクトル画像化アレイ |
Country Status (3)
Country | Link |
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US (1) | US7786440B2 (ja) |
EP (1) | EP2037243A3 (ja) |
JP (1) | JP5265279B2 (ja) |
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-
2007
- 2007-10-26 US US11/977,767 patent/US7786440B2/en active Active
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2008
- 2008-09-09 EP EP08164002A patent/EP2037243A3/en not_active Withdrawn
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EP2037243A2 (en) | 2009-03-18 |
EP2037243A3 (en) | 2011-03-16 |
JP2009133824A (ja) | 2009-06-18 |
US7786440B2 (en) | 2010-08-31 |
US20090072145A1 (en) | 2009-03-19 |
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