JP5265279B2 - ナノワイヤ・マルチスペクトル画像化アレイ - Google Patents
ナノワイヤ・マルチスペクトル画像化アレイ Download PDFInfo
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- JP5265279B2 JP5265279B2 JP2008233443A JP2008233443A JP5265279B2 JP 5265279 B2 JP5265279 B2 JP 5265279B2 JP 2008233443 A JP2008233443 A JP 2008233443A JP 2008233443 A JP2008233443 A JP 2008233443A JP 5265279 B2 JP5265279 B2 JP 5265279B2
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- 239000002070 nanowire Substances 0.000 title claims abstract description 60
- 238000000701 chemical imaging Methods 0.000 title claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 abstract description 7
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- 238000003491 array Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
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- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000004297 night vision Effects 0.000 description 2
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- 238000006243 chemical reaction Methods 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
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- G—PHYSICS
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
- G01J3/36—Investigating two or more bands of a spectrum by separate detectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
- G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0837—Microantennas, e.g. bow-tie
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0881—Compact construction
- G01J5/0884—Monolithic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J5/22—Electrical features thereof
- G01J5/24—Use of specially adapted circuits, e.g. bridge circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14669—Infrared imagers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J2005/0077—Imaging
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Description
本出願は、2007年9月13日提出の「Nanowire Multispectral Imaging Array」と題する米国仮特許出願第60/972,120号の利益を主張する。
本発明の別の態様は、赤外線及び/又はテラヘルツ検出用途で利用されるナノワイヤのマルチスペクトル・アレイを提供するものである。
マルチスペクトル画像化アレイシステムは、基板と、複数のそれぞれのギャップが複数のアンテナ中の各アンテナ間に形成されるように当該基板上に互いに関して配置された複数のアンテナとを具備し、複数のアンテナ中のアンテナの各グループはそれぞれ異なるアンテナサイズを含む。さらに、1つ又は複数のナノワイヤは、それぞれのギャップ中の1つ又は複数のギャップに配置されて、その結果、アンテナと通信するナノワイヤと基板とがマルチスペクトル画像化システムを構成し、ナノワイヤの使用により熱時定数したがってアンテナからの読み出しレートが低減する一方、読み出しレートに関連して周囲の気体冷却速度を低減し、マルチスペクトル画像化アレイシステムの製造可能性を増加させる。
Claims (3)
- 基板と、
各アンテナ対を構成する2つのアンテナ間にギャップが形成されるように、前記基板上に配置された複数のアンテナであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズがアンテナ対のサイズに応じて異なる、複数のアンテナと、
複数のそれぞれのギャップ中の少なくとも1つのギャップに配置された、対応するアンテナ対及び前記基板と通信する少なくとも1つのナノワイヤと
を具備し、前記少なくとも1つのナノワイヤが前記少なくとも1つのギャップのサイズに対応する長さを有する、マルチスペクトル画像化アレイシステム。 - 基板と、
各アンテナ対を構成する2つのアンテナ間にギャップが形成されるように、前記基板上に配置された複数のアンテナであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズがアンテナ対のサイズに応じて異なる、複数のアンテナと、
アンテナ対間の少なくとも1つのギャップに配置された、該アンテナ対及び前記基板と通信する少なくとも1つのナノワイヤであって、前記少なくとも1つのナノワイヤが前記アンテナ対間の前記少なくとも1つのギャップのサイズに対応する長さを有する、少なくとも1つのナノワイヤと、
前記複数のアンテナ、前記少なくとも1つのナノワイヤ及び前記基板に配置された複数の画素からなる画素アレイであって、前記複数の画素のうちの各画素が異なるサイズの複数のアンテナ対を含む、画素アレイと
を具備するマルチスペクトル画像化アレイシステム。 - マルチスペクトル画像化アレイを形成する方法であって、
基板を用意するステップと、
アンテナ対を形成するように前記基板上に配置された複数のアンテナを構成するステップと、
各アンテナ対を構成する2つのアンテナ間にギャップを形成するステップであって、各アンテナ対を構成する2つのアンテナ間のギャップのサイズはアンテナ対のサイズに応じて異なる、ステップと、
アンテナ対間の少なくとも1つのギャップに、該アンテナ対及び前記基板と通信する少なくとも1つのナノワイヤを配置するステップであって、前記少なくとも1つのナノワイヤが前記アンテナ対間の前記少なくとも1つのギャップのサイズに対応する長さを有する、ステップとを含む方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97212007P | 2007-09-13 | 2007-09-13 | |
US60/972,120 | 2007-09-13 | ||
US11/977,767 | 2007-10-26 | ||
US11/977,767 US7786440B2 (en) | 2007-09-13 | 2007-10-26 | Nanowire multispectral imaging array |
Publications (3)
Publication Number | Publication Date |
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JP2009133824A JP2009133824A (ja) | 2009-06-18 |
JP2009133824A5 JP2009133824A5 (ja) | 2011-05-19 |
JP5265279B2 true JP5265279B2 (ja) | 2013-08-14 |
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Application Number | Title | Priority Date | Filing Date |
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JP2008233443A Expired - Fee Related JP5265279B2 (ja) | 2007-09-13 | 2008-09-11 | ナノワイヤ・マルチスペクトル画像化アレイ |
Country Status (3)
Country | Link |
---|---|
US (1) | US7786440B2 (ja) |
EP (1) | EP2037243A3 (ja) |
JP (1) | JP5265279B2 (ja) |
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2007
- 2007-10-26 US US11/977,767 patent/US7786440B2/en active Active
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2008
- 2008-09-09 EP EP08164002A patent/EP2037243A3/en not_active Withdrawn
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JP2009133824A (ja) | 2009-06-18 |
US20090072145A1 (en) | 2009-03-19 |
EP2037243A2 (en) | 2009-03-18 |
EP2037243A3 (en) | 2011-03-16 |
US7786440B2 (en) | 2010-08-31 |
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