JP5205919B2 - Method for producing sulfonamide having ester group - Google Patents

Method for producing sulfonamide having ester group Download PDF

Info

Publication number
JP5205919B2
JP5205919B2 JP2007285228A JP2007285228A JP5205919B2 JP 5205919 B2 JP5205919 B2 JP 5205919B2 JP 2007285228 A JP2007285228 A JP 2007285228A JP 2007285228 A JP2007285228 A JP 2007285228A JP 5205919 B2 JP5205919 B2 JP 5205919B2
Authority
JP
Japan
Prior art keywords
ester group
sulfonamide
amount
compound
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007285228A
Other languages
Japanese (ja)
Other versions
JP2009114076A (en
Inventor
康博 坂本
一剛 萩谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP2007285228A priority Critical patent/JP5205919B2/en
Publication of JP2009114076A publication Critical patent/JP2009114076A/en
Application granted granted Critical
Publication of JP5205919B2 publication Critical patent/JP5205919B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Description

本発明は、エステル基を有するスルホンアミドの製造方法に関するものである。   The present invention relates to a method for producing a sulfonamide having an ester group.

エステル基を有するスルホンアミドは、医薬品のビルディングブロックとして使用されている。例えば、特許文献1には、3−アセトキシプロパンスルホンアミドの合成法が開示されている。また、特許文献2、3、4には、3−アセトキシプロパンスルホンアミド類似体の合成法が開示されている。
特開平8−198878号公報 特開平6−279446号公報 国際公開WO2001027082号公報 国際公開WO2006033446号公報
Sulfonamides having ester groups are used as pharmaceutical building blocks. For example, Patent Document 1 discloses a method for synthesizing 3-acetoxypropanesulfonamide. Patent Documents 2, 3, and 4 disclose methods for synthesizing 3-acetoxypropanesulfonamide analogs.
JP-A-8-198878 JP-A-6-279446 International Publication No. WO2001027082 International Publication WO2006033344

しかし、上記従来の製造方法の場合、原料としてアセトキシブロモプロパンなどの高価な原料を使用しているため、製造コストが嵩むこととなる。   However, in the case of the conventional manufacturing method, an expensive raw material such as acetoxybromopropane is used as the raw material, which increases the manufacturing cost.

また、上記従来の製造方法の場合、実験レベルからスケールアップして工業的に大量生産を行おうとすると、製造途中で生成する3−アセトキシプロパンスルホニルクロライドが分解してプロパンスルトンが生成し、収率低下を起こすことが懸念される。   Further, in the case of the above conventional production method, when scale up from the experimental level and industrial mass production is attempted, 3-acetoxypropanesulfonyl chloride produced in the course of production is decomposed to produce propane sultone, yield. There is concern about causing a decline.

本発明は係る実情に鑑みてなされたものであって、効率良く安価に工業生産することができ、結晶として高純度に精製することができるエステル基を有するスルホンアミドの製造方法を提供することを目的としている。   The present invention has been made in view of such circumstances, and provides a method for producing a sulfonamide having an ester group that can be industrially produced efficiently and inexpensively and can be purified to high purity as a crystal. It is aimed.

本発明者は上記課題に対して鋭意検討を行い、塩素化反応時に溶媒としてジクロロメタンを添加して、スルホニルクロライドの加水分解を抑制し、プロパンスルトンの生成を抑えることで、収率を向上させ、工業生産化を可能にするエステル基を有するスルホンアミドの製造方法を見出した。   The present inventor has intensively studied the above problems, adding dichloromethane as a solvent during the chlorination reaction, suppressing hydrolysis of the sulfonyl chloride, and suppressing the production of propane sultone, thereby improving the yield, The present inventors have found a method for producing a sulfonamide having an ester group that enables industrial production.

上記課題を解決するための本発明は、エステル基を有する化合物にチオエステルをラジカル付加し、塩化スルホニル化した後、スルホンアミド化して得られるエステル基を有するスルホンアミドの製造方法である。   The present invention for solving the above problems is a method for producing a sulfonamide having an ester group obtained by radical addition of a thioester to a compound having an ester group, sulfonyl chloride, and then sulfonamidation.

エステル基を有する化合物としては、塩酸によって加水分解してしまうエステル化合物であれば、用いることができる。恐らく、炭素鎖が大きく脂溶性のあるエステル化合物の場合、加水分解を受けない可能性があるので、できるだけ炭素数の小さいエステル化合物を用いることが好ましい。   As the compound having an ester group, any ester compound that is hydrolyzed by hydrochloric acid can be used. Presumably, in the case of an ester compound having a large carbon chain and a fat-solubility, there is a possibility that it will not undergo hydrolysis, so it is preferable to use an ester compound having as few carbon atoms as possible.

このエステル基を有する化合物としては、以下から選択される1つを用いることが好ましい。   As the compound having an ester group, one selected from the following is preferably used.

Figure 0005205919
チオエステルとしては、チオ酢酸、チオ安息香酸を挙げることができる。このうち、チオ酢酸は、安価であるため低コスト化を図る上で好ましい。このチオエステルとしては、エステル基を有する化合物に対して等モル以上の量のチオエステルを用いることが好ましい。ラジカル付加反応を行う際の反応温度については、ラジカル付加反応が起きる範囲の出来るだけ低温から溶媒の沸点までの範囲であれば、特に限定されるものではなく、具体的には、30℃以上から各溶媒の沸点の範囲で適宜調整することができる。反応条件については、空気存在下で反応させることが好ましい。
Figure 0005205919
Examples of the thioester include thioacetic acid and thiobenzoic acid. Of these, thioacetic acid is preferable in terms of cost reduction because it is inexpensive. As this thioester, it is preferable to use an amount of thioester in an equimolar amount or more relative to the compound having an ester group. The reaction temperature for performing the radical addition reaction is not particularly limited as long as the reaction temperature is within the range from the lowest possible temperature to the boiling point of the solvent. It can adjust suitably in the range of the boiling point of each solvent. About reaction conditions, it is preferable to make it react in air presence.

塩化スルホニル化する溶媒としては、ジクロロメタン、クロロホルム、四塩化炭素、ヘプタン、ヘキサン、エーテルなどの水に溶けにくい有機溶媒が挙げられる。塩化スルホルニ化する際に可燃性である塩素を吹き込むので、安全上、燃えない溶媒のハロゲン溶媒を用いることが好ましい。また、溶媒の使用量については、特に限定されるものではないが、少ないよりは多い方が好ましい。したがって、溶媒は、できるだけ無駄を生じない範囲で多少過剰気味に量を調整して使用することが好ましい。反応温度については、温度が高いとアセチル基の加水分解が早く、プロパンスルトンの生成量が多くなってしまう。したがって、20℃以下、望ましくは加水分解を抑制するために10度以下のできるだけ低温の方が良い。反応に必要な塩素量については、チオエステルから生成する中間体を消費するのに必要な量であればよい。具体的には、エステル基を有する化合物1モルに対して約2.8〜3.2モルの塩素を吹込み反応させることが好ましい。塩素量が2.8モル未満の場合収率が低下し、3.2モルを越える場合品質が低下することとなる。   Examples of the solvent for sulfonyl chloride include organic solvents that are hardly soluble in water, such as dichloromethane, chloroform, carbon tetrachloride, heptane, hexane, and ether. Since chlorine that is flammable is blown when chlorinated sulforonitrile, it is preferable to use a halogen solvent that does not burn for safety. The amount of the solvent used is not particularly limited, but a larger amount is preferable to a smaller amount. Therefore, it is preferable to use the solvent by adjusting the amount of the solvent to a slight excess as much as possible without causing waste. As for the reaction temperature, when the temperature is high, the hydrolysis of the acetyl group is fast, and the amount of propane sultone produced increases. Therefore, it is better to keep the temperature as low as possible at 20 ° C. or lower, preferably 10 ° C. or lower in order to suppress hydrolysis. The amount of chlorine necessary for the reaction may be an amount necessary for consuming the intermediate produced from the thioester. Specifically, it is preferable that about 2.8 to 3.2 mol of chlorine is blown into 1 mol of the compound having an ester group. When the amount of chlorine is less than 2.8 mol, the yield is lowered, and when it exceeds 3.2 mol, the quality is lowered.

スルホンアミド化する工程では、溶媒として酢酸エチルなどの一般的な有機溶媒を用い、温度30℃以下、望ましくは20℃以下で、アンモニアガスを吹込み反応させる。この際、使用するアンモニアガスの量としては、分析を行うことによって、途中に生成する中間体の塩化スルホニルが無くなるまでの量を用いる。具体的には、エステル基を有する化合物1モルに対して約2.2モル程度の量を吹込み反応させる。   In the sulfonamidation step, a general organic solvent such as ethyl acetate is used as a solvent, and ammonia gas is blown at a temperature of 30 ° C. or lower, preferably 20 ° C. or lower. At this time, as the amount of ammonia gas to be used, an amount until the intermediate sulfonyl chloride generated in the middle is eliminated by performing analysis is used. Specifically, an amount of about 2.2 mol is blown into 1 mol of the compound having an ester group.

本発明によれば、エステル基を有するスルホンアミドを、高純度で安価に大量生産することが出来る。   According to the present invention, a sulfonamide having an ester group can be mass-produced with high purity at low cost.

以下に、実施例を挙げ、本発明の効果をより具体的に説明をする。ただし、本発明はこれらの実施例により限定されるものではない。   Hereinafter, the effects of the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.

−実施例1−
[3−アセトキシプロパンスルホンアミドの製造]
チオ酢酸24.1kg、クロロホルム138.0kgを仕込んで酢酸アリル30.0kgを2時間かけて滴下した後、1時間反応させた。
Example 1
[Production of 3-acetoxypropanesulfonamide]
24.1 kg of thioacetic acid and 138.0 kg of chloroform were charged, and 30.0 kg of allyl acetate was added dropwise over 2 hours, followed by reaction for 1 hour.

クロロホルムを減圧留去した後、ジクロロメタン341.5kg、市水264.0kgを仕込み、塩素63.6kgを内温15℃以下で9時間かけて吹き込んだ。その後、5%中亜硫酸ソーダ水52.5kg、市水52.5kgで洗浄し、有機層を無水硫酸マグネシウム7.8kgで脱湿、ろ過した。   After distilling off chloroform under reduced pressure, 341.5 kg of dichloromethane and 264.0 kg of city water were charged, and 63.6 kg of chlorine was blown in at an internal temperature of 15 ° C. or lower for 9 hours. Then, it was washed with 52.5 kg of 5% sodium sulfite water and 52.5 kg of city water, and the organic layer was dehumidified and filtered with 7.8 kg of anhydrous magnesium sulfate.

ろ液を濃縮し、ジクロロメタンを留去した後、酢酸エチル251.0kgを仕込んだ。その後、アンモニア12.0kgを内温20℃以下で6.5時間かけて吹込み、ろ過を行い、副生した塩化アンモンを除去した。少量残存した塩化アンモニウムを5%食塩水にて洗浄し、有機層を無水硫酸マグネシウム11.1kgで脱湿し、ろ過した。   The filtrate was concentrated and dichloromethane was distilled off, followed by charging with 251.0 kg of ethyl acetate. Thereafter, 12.0 kg of ammonia was blown in at an internal temperature of 20 ° C. or less over 6.5 hours, and filtration was performed to remove by-produced ammonium chloride. A small amount of remaining ammonium chloride was washed with 5% brine, and the organic layer was dehumidified with 11.1 kg of anhydrous magnesium sulfate and filtered.

ろ液を濃縮し、酢酸エチルを留去した後、酢酸エチル35.1kg、トルエン35.1kgを仕込んだ。種晶を添加した後、トルエン66.6kg滴下し、冷却して遠心分離を行った。   After concentrating the filtrate and distilling off ethyl acetate, 35.1 kg of ethyl acetate and 35.1 kg of toluene were charged. After adding the seed crystals, 66.6 kg of toluene was added dropwise, cooled and centrifuged.

Figure 0005205919
得られた製品は29.4kg、収率54%、GC面積百分率100.0%であった。
Figure 0005205919
The obtained product was 29.4 kg, the yield was 54%, and the GC area percentage was 100.0%.

本発明は、医薬品のビルディングブロックとして利用可能なエステル基を有するスルホンアミドの工業的生産に利用できる。   INDUSTRIAL APPLICATION This invention can be utilized for industrial production of the sulfonamide which has an ester group which can be utilized as a building block of a pharmaceutical.

Claims (2)

エステル基を有する化合物にチオエステルをラジカル付加し、ジクロロメタンを溶媒として塩化スルホニル化した後、スルホンアミド化して得られることを特徴とするエステル基を有するスルホンアミドの製造方法であって、
前記エステル基を有する化合物が酢酸アリルであり、前記エステル基を有するスルホンアミドが3−アセトキシプロパンスルホンアミドである製造方法
A method for producing a sulfonamide having an ester group obtained by radical addition of a thioester to a compound having an ester group, sulfonyl chloride using dichloromethane as a solvent and then sulfonamidation ,
The production method wherein the compound having an ester group is allyl acetate and the sulfonamide having an ester group is 3-acetoxypropanesulfonamide .
前記チオエステルがチオ酢酸である請求項1記載のスルホンアミドの製造方法。 Method for producing the thioester claim 1 Symbol placement of sulfonamides is thioacetic acid.
JP2007285228A 2007-11-01 2007-11-01 Method for producing sulfonamide having ester group Expired - Fee Related JP5205919B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007285228A JP5205919B2 (en) 2007-11-01 2007-11-01 Method for producing sulfonamide having ester group

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007285228A JP5205919B2 (en) 2007-11-01 2007-11-01 Method for producing sulfonamide having ester group

Publications (2)

Publication Number Publication Date
JP2009114076A JP2009114076A (en) 2009-05-28
JP5205919B2 true JP5205919B2 (en) 2013-06-05

Family

ID=40781633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007285228A Expired - Fee Related JP5205919B2 (en) 2007-11-01 2007-11-01 Method for producing sulfonamide having ester group

Country Status (1)

Country Link
JP (1) JP5205919B2 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1191653B (en) * 1986-01-24 1988-03-23 Consiglio Nazionale Ricerche PROCESS FOR THE PREPARATION OF ALCANSOLFONIL CHLORIDE AND ARILALCANSOLFONYL CHLORIDE
JP3115575B2 (en) * 1989-01-31 2000-12-11 武田薬品工業株式会社 Imidazopyridazine derivatives, their uses and production methods
US5290956A (en) * 1991-11-04 1994-03-01 Rohm And Haas Company Latent thiol monomers
JP3887757B2 (en) * 1994-11-24 2007-02-28 住友精化株式会社 Method for producing cyanobenzenesulfonyl chloride
JP2003064063A (en) * 2000-06-23 2003-03-05 Takeda Chem Ind Ltd Benzoxazepine compound
JP2005272449A (en) * 2004-02-24 2005-10-06 Idemitsu Kosan Co Ltd Method for producing alkanethiocarboxylic acid ester

Also Published As

Publication number Publication date
JP2009114076A (en) 2009-05-28

Similar Documents

Publication Publication Date Title
JP4991121B2 (en) Method for producing thiosulfuric acid derivative
JP2007145841A (en) Synthesis of trithiocarbonate
CN113444066A (en) Preparation method of vinyl sulfate
KR100814597B1 (en) The process of isolating methyl-4-formylbenzoate and dimethylterephtalate
JP5205919B2 (en) Method for producing sulfonamide having ester group
JP3223586B2 (en) Method for producing 2,5-bis (mercaptomethyl) -1,4-dithiane
US6861549B2 (en) Production method of 4′-bromomethyl-2-cyanobiphenyl
JP4739799B2 (en) Method for producing sulfonium compound
WO2016204096A1 (en) Pyridine-3-sulfonyl chloride production method
JP2010235453A (en) Method for producing platinum complex
JP2011001330A (en) Method for producing 4-nitrophenyl chloroformate
JP4747660B2 (en) Method for producing dithiosulfate compound
JP4258658B2 (en) Method for producing acetylene compound
JP4273913B2 (en) Method for producing sulfonic acid halogen compound
JP5754842B2 (en) Method for producing p-iodophenol
JP2008150339A (en) Method for producing fluorine-containing alkane ester
JP2693225B2 (en) Sulfur-containing aliphatic carboxylic acid ester and method for producing the acid
JP2006232743A (en) Method for producing dimethyl-1, 3-dibenzyl-2-oxo- imidazolidine-4, 5-dicarboxylate
JP2022163759A (en) Manufacturing method of 3-hydroxy-2-pyrazinecarboxamide and composition suitable therefor, as well as manufacturing method of 2-aminomalonamide
EP3066087B1 (en) A process for the preparation of olopatadine and sylil intermediates thereof
JPH054957A (en) Production of 2,6-diisopropylphenylcarbodiimide
JP5730622B2 (en) Method for producing nitrophenyl alkyl sulfide
JP2007055928A (en) Method for production of maleonitrile
JP2005336073A (en) Method for producing 4-chloro-5-ethoxycarbonyl-2-methylthiopyrimidine
JP4085629B2 (en) Method for producing high quality adamantane alcohols

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20100330

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101026

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20110608

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20110623

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20110623

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20110623

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120823

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120911

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121105

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130122

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130204

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160301

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 5205919

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160301

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees