JP5197439B2 - Process for producing bis (3-nitro-4-hydroxyphenyl) s - Google Patents
Process for producing bis (3-nitro-4-hydroxyphenyl) s Download PDFInfo
- Publication number
- JP5197439B2 JP5197439B2 JP2009045685A JP2009045685A JP5197439B2 JP 5197439 B2 JP5197439 B2 JP 5197439B2 JP 2009045685 A JP2009045685 A JP 2009045685A JP 2009045685 A JP2009045685 A JP 2009045685A JP 5197439 B2 JP5197439 B2 JP 5197439B2
- Authority
- JP
- Japan
- Prior art keywords
- hydroxyphenyl
- bis
- temperature
- nitro
- nitric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 13
- -1 3-nitro-4-hydroxyphenyl Chemical group 0.000 title description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 45
- 239000002904 solvent Substances 0.000 claims description 17
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 12
- 238000006396 nitration reaction Methods 0.000 claims description 9
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 claims description 5
- URFNSYWAGGETFK-UHFFFAOYSA-N 1,2-bis(4-hydroxyphenyl)ethane Natural products C1=CC(O)=CC=C1CCC1=CC=C(O)C=C1 URFNSYWAGGETFK-UHFFFAOYSA-N 0.000 claims description 5
- DTOMAXGIWFLDMR-UHFFFAOYSA-N 4-[(4-hydroxy-3-nitrophenyl)methyl]-2-nitrophenol Chemical compound C1=C([N+]([O-])=O)C(O)=CC=C1CC1=CC=C(O)C([N+]([O-])=O)=C1 DTOMAXGIWFLDMR-UHFFFAOYSA-N 0.000 claims description 4
- WOSVQZVTRSPUTD-UHFFFAOYSA-N OC1=CC=C(C=C1[N+](=O)[O-])C(C)C1=CC=C(C(=C1)[N+](=O)[O-])O Chemical compound OC1=CC=C(C=C1[N+](=O)[O-])C(C)C1=CC=C(C(=C1)[N+](=O)[O-])O WOSVQZVTRSPUTD-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 23
- 229910017604 nitric acid Inorganic materials 0.000 description 23
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 238000004128 high performance liquid chromatography Methods 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 5
- 101150065749 Churc1 gene Proteins 0.000 description 5
- 102100038239 Protein Churchill Human genes 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 0 [O-][N+](c(cc(*c(cc1)cc([N+]([O-])=O)c1O)cc1)c1O)=O Chemical compound [O-][N+](c(cc(*c(cc1)cc([N+]([O-])=O)c1O)cc1)c1O)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000001743 benzylic group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 230000000802 nitrating effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
本発明は、下記の化学式（１）で表されるビス（３−ニトロ−４−ヒドロキシフェニル）類のうち、Ｘ=CH2、CHCH3の化合物の製造法に関する。更に詳しくは、化学式（１）で表されるビス（３−ニトロ−４−ヒドロキシフェニル）類のうち、Ｘ=CH2、CHCH3の化合物を高純度で製造する方法に関する。 The present invention relates to a method for producing a compound of X = CH 2 and CHCH 3 among bis (3-nitro-4-hydroxyphenyl) s represented by the following chemical formula (1). More specifically, the present invention relates to a method for producing a compound of X═CH 2 and CHCH 3 with high purity among bis (3-nitro-4-hydroxyphenyl) s represented by the chemical formula (1).
ビス（３−アミノ−４−ヒドロキシフェニル）類は耐熱性ポリマー等の原料として重要な化合物であり、対応するビス（３−ニトロ−４−ヒドロキシフェニル）化合物を還元することで得られる。 Bis (3-amino-4-hydroxyphenyl) s are important compounds as raw materials for heat-resistant polymers and the like, and can be obtained by reducing the corresponding bis (3-nitro-4-hydroxyphenyl) compounds.
ビス（３−ニトロ−４−ヒドロキシフェニル）類の製造方法としては、２，２−ビス（４−ヒドロキシフェニル）ヘキサフルオロプロパン（ビスフェノールＡＦ）を原料として、クロロホルム溶媒中で硝酸によりニトロ化反応を行う方法（特許文献１）、酢酸溶媒中で硝酸によりニトロ化反応を行う方法（特許文献２）、硫酸水溶媒中で硫酸と硝酸より調製した混酸によりニトロ化反応を行う方法（特許文献３）等が知られている。 As a method for producing bis (3-nitro-4-hydroxyphenyl) s, nitration reaction is carried out with nitric acid in chloroform solvent using 2,2-bis (4-hydroxyphenyl) hexafluoropropane (bisphenol AF) as a raw material. A method of performing nitration reaction with nitric acid in an acetic acid solvent (Patent Document 2), a method of performing nitration reaction with a mixed acid prepared from sulfuric acid and nitric acid in a sulfuric acid aqueous solvent (Patent Document 3) Etc. are known.
また、ビス（３−ニトロ−４−ヒドロキシフェニル）類の製造する他の方法として、２，２−ビス（４−ヒドロキシフェニル）プロパン（ビスフェノールＡ）を原料として、酢酸溶媒中で硝酸によりニトロ化反応を行う方法（特許文献４）、塩化メチレン溶媒中で硝酸によりニトロ化反応を行う方法（特許文献５）等が知られている。 Further, as another method for producing bis (3-nitro-4-hydroxyphenyl) s, nitration with nitric acid in acetic acid solvent using 2,2-bis (4-hydroxyphenyl) propane (bisphenol A) as a raw material A method of performing a reaction (Patent Document 4), a method of performing a nitration reaction with nitric acid in a methylene chloride solvent (Patent Document 5), and the like are known.
しかしながら、従来公知のビス（３−ニトロ−４−ヒドロキシフェニル）類の製造方法には、化学式（１）で示される化合物のうちＸ＝CH2、CHCH3の化合物を原料として反応した例はなく、実際に前記記載の溶媒で反応してみたところ、ビス（３−ニトロ−４−ヒドロキシフェニル）の収率及び品質は、著しく低いものであった。２つの芳香環に挟まれたメチレン基、または２つの芳香環のベンジル位に水素を有することから、反応性に富み、容易に分解しやすいためと思われる。 However, there is no example in which the conventionally known methods for producing bis (3-nitro-4-hydroxyphenyl) s are reacted using a compound of X = CH 2 or CHCH 3 among the compounds represented by the chemical formula (1). When actually reacting with the above-mentioned solvents, the yield and quality of bis (3-nitro-4-hydroxyphenyl) were remarkably low. It seems to be because of having a methylene group sandwiched between two aromatic rings or hydrogen at the benzylic position of two aromatic rings, it is highly reactive and easily decomposes.
本発明の目的は、化学式（１）で表わされるビス（３−ニトロ−４−ヒドロキシフェニル）類でＸ＝CH2、CHCH3の化合物について、高収率及び高純度で得る手段を提供することにある。 An object of the present invention is to provide means for obtaining a compound of X = CH 2 and CHCH 3 in the bis (3-nitro-4-hydroxyphenyl) s represented by the chemical formula (1) with high yield and high purity. It is in.
本発明者は、上記にあげた課題を解決すべく鋭意研究を行った結果、化学式（２）で表わされるビス（４−ヒドロキシフェニル）類でＸ=CH2の化合物であるビス（４−ヒドロキシフェニル）メタン、或いはＸ=CHCH3の化合物であるビス（４−ヒドロキシフェニル）エタンをアセトニトリル溶媒中、硝酸でニトロ化することによりビス（３−ニトロ−４−ヒドロキシフェニル）メタン、ビス（３−ニトロ−４−ヒドロキシフェニル）エタンが高収率、高純度で得られることを見出し、本発明に到達したものである。 As a result of intensive studies to solve the above problems, the present inventor has found that bis (4-hydroxy) which is a bis (4-hydroxyphenyl) s represented by the chemical formula (2) and is a compound of X = CH 2. Phenyl) methane or bis (4-hydroxyphenyl) ethane, which is a compound of X═CHCH 3 , is nitrated with nitric acid in an acetonitrile solvent to thereby produce bis (3-nitro-4-hydroxyphenyl) methane, bis (3- It has been found that nitro-4-hydroxyphenyl) ethane can be obtained in high yield and high purity, and the present invention has been achieved.
すなわち、本発明は、ビス（４−ヒドロキシフェニル）メタンまたはビス（４−ヒドロキシフェニル）エタンをアセトニトリル溶媒中、硝酸でニトロ化することを特徴とするビス（３−ニトロ−４−ヒドロキシフェニル）メタン、ビス（３−ニトロ−４−ヒドロキシフェニル）エタンの製造方法に関する。 That is, the present invention relates to bis (3-nitro-4-hydroxyphenyl) methane characterized in that bis (4-hydroxyphenyl) methane or bis (4-hydroxyphenyl) ethane is nitrated with nitric acid in an acetonitrile solvent. Relates to a process for producing bis (3-nitro-4-hydroxyphenyl) ethane.
本発明によれば、化学式（１）で表わされるビス（３−ニトロ−４−ヒドロキシフェニル）類で従来使用されていた溶媒である酢酸に比べて純度および収率が高くなる。すなわち、本発明に係る製造方法を採用することで初めて工業的レベルでの生産が可能となる。 According to the present invention, purity and yield are higher than acetic acid, which is a solvent conventionally used in the bis (3-nitro-4-hydroxyphenyl) s represented by the chemical formula (1). That is, production at an industrial level is possible only when the manufacturing method according to the present invention is employed.
以下、本発明の製造方法、すなわち、ビス（４−ヒドロキシフェニル）類を硝酸によりニトロ化してビス（３−ニトロ−４−ヒドロキシフェニル）類を製造する方法において、溶媒としてアセトニトリルを用いる方法を詳細に説明する。 Hereinafter, in the production method of the present invention, that is, the method of producing bis (3-nitro-4-hydroxyphenyl) s by nitration of bis (4-hydroxyphenyl) s with nitric acid, a method using acetonitrile as a solvent is described in detail. Explained.
使用する溶媒としてはアセトニトリルを用いる。溶媒使用量は特に限定されず、経済性も考慮しつつニトロ化の反応が適切に進行するように適宜決定すればよい。通常、ビス（４−ヒドロキシフェニル）類に対して０．１〜５０倍（重量比）であり、好ましくは１〜１０倍である。 Acetonitrile is used as a solvent to be used. The amount of the solvent used is not particularly limited, and may be appropriately determined so that the nitration reaction appropriately proceeds in consideration of economy. Usually, it is 0.1-50 times (weight ratio) with respect to bis (4-hydroxyphenyl), Preferably it is 1-10 times.
アセトニトリルが好ましい理由は必ずしも明らかではないが、実施例において後述するように、１回の再結晶で９９％以上の純度とすることができたことから、アセトニトリルを溶媒として使用することで、ジニトロ化の転化率のみならずジニトロ化の選択率も従来技術に係る溶媒に比べて高まっているものと推測される。 The reason why acetonitrile is preferred is not necessarily clear, but as will be described later in the examples, it was possible to achieve a purity of 99% or more by one recrystallization, and therefore, by using acetonitrile as a solvent, dinitration can be achieved. It is presumed that not only the conversion rate but also the dinitration selectivity is increased compared to the solvents according to the prior art.
ニトロ化剤として使用する硝酸は濃度が１０〜９８％（％は質量％を意味する。以下特に断らない限り同じ）水溶液であり、市販の工業用硝酸をそのまま、または水で希釈して使用する。収率を高めつつジニトロ化の選択性を高める観点から好ましい硝酸濃度は４０〜８０％である。硝酸の使用量は通常、ビス（４−ヒドロキシフェニル）類１モルに対して１．８〜３モルであり、使用量が過度に少ない場合には反応が進行しにくくなり、過度に多い場合にはニトロ化が進みすぎるばかりでなく、分解反応も起こりやすくなる。好ましくは１．９〜２．５モルである。 Nitric acid used as a nitrating agent is an aqueous solution having a concentration of 10 to 98% (% means mass%. The same applies unless otherwise specified), and commercially available nitric acid is used as it is or diluted with water. . From the viewpoint of increasing the dinitration selectivity while increasing the yield, the preferred nitric acid concentration is 40-80%. The amount of nitric acid used is usually 1.8 to 3 moles per mole of bis (4-hydroxyphenyl) s. When the amount used is excessively small, the reaction is difficult to proceed. Not only does nitration progress too much, but it also tends to cause decomposition reactions. Preferably it is 1.9-2.5 mol.
反応温度は通常、−２０〜５０℃であり、過度に低い場合には反応が進行せず、過度に高い場合には副反応の影響が多くなり純度、収率が低下してしまう。純度および収率を高度に両立する観点から好ましい反応温度は−１０〜３０℃である。 The reaction temperature is usually −20 to 50 ° C., and when it is excessively low, the reaction does not proceed. When it is excessively high, the influence of side reactions increases and the purity and yield are reduced. A preferable reaction temperature is −10 to 30 ° C. from the viewpoint of achieving both high purity and yield.
反応の操作方法としては、ビス（４−ヒドロキシフェニル）類を溶媒中に分散させたまま撹拌し、所定の温度にしてから所定量の硝酸水溶液を滴下して加える。または、溶媒中にまず所定量の硝酸水溶液を添加後、所定の温度にしてからビス（４−ヒドロキシフェニル）類を添加する。硝酸水溶液の滴下やビス（４−ヒドロキシフェニル）類の添加によって温度が上昇するため、上記の温度範囲になるように滴下／添加速度を調整したり、適宜冷却手段を動作させたりすることが好ましい。 As a method of operating the reaction, bis (4-hydroxyphenyl) s are stirred while being dispersed in a solvent, and after a predetermined temperature is reached, a predetermined amount of nitric acid aqueous solution is added dropwise. Alternatively, a predetermined amount of nitric acid aqueous solution is first added to the solvent, and then bis (4-hydroxyphenyl) is added after a predetermined temperature is reached. Since the temperature rises due to the dropwise addition of nitric acid aqueous solution or the addition of bis (4-hydroxyphenyl) s, it is preferable to adjust the dropping / addition rate so as to be within the above temperature range or to operate the cooling means appropriately. .
反応混合物を所定の温度で原料がほぼなくなるまで撹拌する。なお、反応中の反応混合物における原料濃度は高速液体クロマトグラフィー（ＨＰＬＣ）など公知の方法により確認すればよい。攪拌時間は典型的には３０分〜２時間である。反応終了後、反応液に含まれる混合物をろ過する。ろ過ケーキを水で洗浄後、乾燥することで目的物を得る。 The reaction mixture is stirred at a given temperature until there is almost no feed. In addition, what is necessary is just to confirm the raw material density | concentration in the reaction mixture in reaction by well-known methods, such as a high performance liquid chromatography (HPLC). The stirring time is typically 30 minutes to 2 hours. After completion of the reaction, the mixture contained in the reaction solution is filtered. The target product is obtained by washing the filter cake with water and drying.
また、得られた目的物を適当な溶媒（例えばＮ−メチル−２−ピロリジノン）を用いて溶解し、これを再結晶することにより、容易に高純度にすることができる。 Moreover, it can be easily made highly pure by melt | dissolving the obtained target object using a suitable solvent (for example, N-methyl-2-pyrrolidinone), and recrystallizing this.
次に実施例によって本発明をさらに具体的に説明するが、本発明がこれらの具体例にのみ限定されるものではない。
なお、純度分析はＨＰＬＣを用いて実施し、純度は面積比率（単位：面積％）により求めた（以下、「ＨＰＬＣ純度」という。）。また、ＨＰＬＣの測定条件は以下に示す：
カラム：Ｌ−Ｃｏｌｕｍｎ ＯＤＳ（（財）化学物質評価研究機構製、４．６×１５０ｍｍ）、
カラム温度：４０℃、
注入量：１０μＬ、
流 量：１．０ｍＬ／分、
検出器：ＵＶ＝２５４ｎｍ、
移動相：Ａ／Ｂ＝６０／４０（０分）→９０／１０（２０〜３０分）、
Ａ：メタノール、
Ｂ：２０ｍＭリン酸二水素カリウム（ｐＨ＝３．６）、
サンプル調製：
メタン：固体１０ｍｇをＤＭＦ５０ｍＬに溶解、
エタン：固体１０ｍｇをメタノール５０ｍＬに溶解。
EXAMPLES Next, although an Example demonstrates this invention further more concretely, this invention is not limited only to these specific examples.
The purity analysis was performed using HPLC, and the purity was determined by area ratio (unit: area%) (hereinafter referred to as “HPLC purity”). The HPLC measurement conditions are as follows:
Column: L-Column ODS (manufactured by Chemicals Research Institute, 4.6 × 150 mm),
Column temperature: 40 ° C
Injection volume: 10 μL,
Flow rate: 1.0 mL / min,
Detector: UV = 254 nm,
Mobile phase: A / B = 60/40 (0 minutes) → 90/10 (20-30 minutes),
A: methanol,
B: 20 mM potassium dihydrogen phosphate (pH = 3.6),
Sample preparation:
Methane: 10 mg of solid dissolved in 50 mL of DMF,
Ethane: 10 mg of solid dissolved in 50 mL of methanol.
実施例１
温度計、ジムロート冷却器及び攪拌機を備えた３００ｍＬ四つ口フラスコに、ビス（４−ヒドロキシフェニル）メタン１０ｇ（０．０５０モル）、アセトニトリル１００ｇを加えて撹拌し、１５〜２０℃で温度を保持しながら６９％硝酸１０．０ｇ（理論モル比：２．２）を１時間かけて滴下した。温度を保持しながら１時間撹拌後にろ過し、アセトニトリル１０ｇ、さらに水１０ｇで洗浄してウェットケーキ１０．１ｇを得た。真空乾燥機で乾燥し、乾燥品８．１ｇを黄橙色結晶として得た。ＨＰＬＣ純度９２．８％、収率５４．７％（対理論）。
Example 1
Add 300 g of bis (4-hydroxyphenyl) methane and 100 g of acetonitrile to a 300 mL four-necked flask equipped with a thermometer, Dimroth cooler and stirrer, and maintain the temperature at 15 to 20 ° C. Then, 10.0 g of 69% nitric acid (theoretical molar ratio: 2.2) was added dropwise over 1 hour. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 10 g of acetonitrile and 10 g of water to obtain 10.1 g of a wet cake. It dried with the vacuum dryer and obtained 8.1g of dried products as a yellow-orange crystal | crystallization. HPLC purity 92.8%, yield 54.7% (versus theory).
実施例２
温度計、ジムロート冷却器及び攪拌機を備えた３００ｍＬ四つ口フラスコに、アセトニトリル１００ｇ、６９％硝酸１０．０ｇ（理論モル比：２．２）を加えて撹拌し、１５〜２０℃で温度を保持しながらビス（４−ヒドロキシフェニル）メタン１０ｇ（０．０５０モル）を１時間かけて添加した。温度を保持しながら１時間撹拌後にろ過し、アセトニトリル１０ｇ、さらに水１０ｇで洗浄してウェットケーキ１１．５ｇを得た。真空乾燥機で乾燥し、乾燥品９．１ｇを黄色結晶として得た。ＨＰＬＣ純度９５．４％、収率６０．３％（対理論）。
Example 2
A 300 mL four-necked flask equipped with a thermometer, Dimroth cooler, and stirrer was added with 100 g of acetonitrile and 10.0 g of 69% nitric acid (theoretical molar ratio: 2.2) and stirred, and the temperature was maintained at 15 to 20 ° C. Then, 10 g (0.050 mol) of bis (4-hydroxyphenyl) methane was added over 1 hour. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 10 g of acetonitrile and 10 g of water to obtain 11.5 g of a wet cake. It dried with the vacuum dryer and obtained 9.1g of dried products as yellow crystals. HPLC purity 95.4%, yield 60.3% (versus theory).
実施例３
温度計、ジムロート冷却器及び攪拌機を備えた５Ｌ四つ口フラスコに、アセトニトリル１０００ｇ、６９％硝酸２００．９ｇ（理論モル比：２．２）を加えて撹拌し、０〜５℃に冷却後、温度を保持しながらビス（４−ヒドロキシフェニル）メタン２００．３ｇ（１．００モル）を４時間かけて滴下した。温度を保持しながら１時間撹拌後にろ過し、アセトニトリル２００ｇ、さらに水２００ｇで洗浄してウェットケーキ２２６．０ｇを得た。真空乾燥機で乾燥し、乾燥品１７８．５ｇを黄色結晶として得た。ＨＰＬＣ純度９３．４％、収率５４．２％（対理論）。
Example 3
To a 5 L four-necked flask equipped with a thermometer, a Dimroth cooler and a stirrer, 1000 g of acetonitrile and 200.9 g of 69% nitric acid (theoretical molar ratio: 2.2) were added and stirred. After cooling to 0 to 5 ° C., While maintaining the temperature, 200.3 g (1.00 mol) of bis (4-hydroxyphenyl) methane was added dropwise over 4 hours. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 200 g of acetonitrile and 200 g of water to obtain 226.0 g of a wet cake. It dried with the vacuum dryer and obtained 178.5g of dried products as a yellow crystal. HPLC purity 93.4%, yield 54.2% (versus theory).
これにN−メチル−２−ピロリジノン１０００ｇを加え、加熱溶解後、水１６７ｇを加えてから１５〜２０℃に冷却した。温度を保持しながら１時間撹拌後にろ過し、水１６７ｇで洗浄してウェットケーキ１５７．８ｇを得た。真空乾燥機で乾燥し、乾燥品１４２．０ｇを黄色結晶として得た。ＨＰＬＣ純度９９．１重量％、収率４５．７モル％（対理論）であった。 To this was added 1000 g of N-methyl-2-pyrrolidinone, and after heating and dissolving, 167 g of water was added, and then cooled to 15 to 20 ° C. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 167 g of water to obtain 157.8 g of a wet cake. It dried with the vacuum dryer and obtained 142.0g of dried products as a yellow crystal. The HPLC purity was 99.1% by weight, and the yield was 45.7 mol% (theoretical).
実施例４
温度計、ジムロート冷却器及び攪拌機を備えた１００ｍＬ四つ口フラスコに、ビス（４−ヒドロキシフェニル）エタン５ｇ（０．０２３モル）、アセトニトリル１０ｇを加えて撹拌し、０〜５℃に冷却後、温度を保持しながら６１％硝酸５．３ｇ（理論モル比：２．２）を１時間かけて滴下した。温度を保持しながら１時間撹拌後、さらに６１％硝酸１．２ｇ（理論モル比：０．５）を滴下し、温度を保持しながら１時間撹拌後、室温まで徐々に昇温した。温度を保持したまま１時間撹拌後にろ過し、アセトニトリル５ｇ、さらに水５ｇで洗浄してウェットケーキ６．１ｇを得た。真空乾燥機で乾燥し、乾燥品４．５ｇを黄色結晶として得た。ＨＰＬＣ純度９０．９％、収率５９．６％（対理論）。
Example 4
In a 100 mL four-necked flask equipped with a thermometer, a Dimroth cooler and a stirrer, 5 g (0.023 mol) of bis (4-hydroxyphenyl) ethane and 10 g of acetonitrile were added and stirred. After cooling to 0 to 5 ° C., While maintaining the temperature, 5.3 g of 61% nitric acid (theoretical molar ratio: 2.2) was added dropwise over 1 hour. After stirring for 1 hour while maintaining the temperature, 1.2 g of 61% nitric acid (theoretical molar ratio: 0.5) was further added dropwise. After stirring for 1 hour while maintaining the temperature, the temperature was gradually raised to room temperature. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 5 g of acetonitrile and 5 g of water to obtain 6.1 g of a wet cake. It dried with the vacuum dryer and obtained 4.5 g of dried products as yellow crystals. HPLC purity 90.9%, yield 59.6% (versus theory).
比較例１
温度計、ジムロート冷却器及び攪拌機を備えた５００ｍＬ四つ口フラスコに、ビス（４−ヒドロキシフェニル）メタン３０ｇ（０．１５モル）、酢酸１５０ｇを加えて撹拌し、１５〜２０℃で温度を保持しながら６９％硝酸２７．４ｇ（理論モル比：２．０）を１時間かけて滴下した。温度を保持したまま１時間撹拌後にろ過し、水９０ｇで洗浄してウェットケーキ３６．１ｇを得た。真空乾燥機で乾燥し、乾燥品３０．３ｇを赤橙色結晶として得た。ＨＰＬＣ純度７８．４％、収率４７．２％（対理論）。
Comparative Example 1
Bis (4-hydroxyphenyl) methane 30 g (0.15 mol) and acetic acid 150 g are added to a 500 mL four-necked flask equipped with a thermometer, a Dimroth cooler, and a stirrer, and the temperature is maintained at 15 to 20 ° C. Then, 27.4 g of 69% nitric acid (theoretical molar ratio: 2.0) was added dropwise over 1 hour. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 90 g of water to obtain 36.1 g of a wet cake. It dried with the vacuum dryer and obtained 30.3g of dried products as red orange crystal | crystallization. HPLC purity 78.4%, yield 47.2% (versus theory).
比較例２
温度計、ジムロート冷却器及び攪拌機を備えた１００ｍＬ四つ口フラスコに、ビス（４−ヒドロキシフェニル）エタン５ｇ（０．０２３モル）、酢酸１０ｇを加えて撹拌し、５〜１０℃に冷却後、温度を保持しながら６１％硝酸５．３ｇ（理論モル比：２．２）を１時間かけて滴下した。温度を保持したまま１時間撹拌後、さらに６１％硝酸１．２ｇ（理論モル比：０．５）を滴下し、温度を保持しながら１時間撹拌後、室温まで徐々に昇温した。温度を保持したまま１時間撹拌後にろ過し、水５ｇで洗浄してウェットケーキ７．２ｇを得た。真空乾燥機で乾燥し、乾燥品４．９ｇを黄茶色結晶として得た。ＨＰＬＣ純度７５．６％、収率４９．４％（対理論）。
Comparative Example 2
In a 100 mL four-necked flask equipped with a thermometer, a Dimroth cooler and a stirrer, 5 g (0.023 mol) of bis (4-hydroxyphenyl) ethane and 10 g of acetic acid were added and stirred, and cooled to 5 to 10 ° C. While maintaining the temperature, 5.3 g of 61% nitric acid (theoretical molar ratio: 2.2) was added dropwise over 1 hour. After stirring for 1 hour while maintaining the temperature, 1.2 g of 61% nitric acid (theoretical molar ratio: 0.5) was further added dropwise. After stirring for 1 hour while maintaining the temperature, the temperature was gradually raised to room temperature. The mixture was stirred for 1 hour while maintaining the temperature, filtered, and washed with 5 g of water to obtain 7.2 g of a wet cake. It dried with the vacuum dryer and obtained 4.9g of dried products as yellow brown crystals. HPLC purity 75.6%, yield 49.4% (versus theory).
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009045685A JP5197439B2 (en) | 2009-02-27 | 2009-02-27 | Process for producing bis (3-nitro-4-hydroxyphenyl) s |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009045685A JP5197439B2 (en) | 2009-02-27 | 2009-02-27 | Process for producing bis (3-nitro-4-hydroxyphenyl) s |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010195748A JP2010195748A (en) | 2010-09-09 |
| JP5197439B2 true JP5197439B2 (en) | 2013-05-15 |
Family
ID=42820868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009045685A Active JP5197439B2 (en) | 2009-02-27 | 2009-02-27 | Process for producing bis (3-nitro-4-hydroxyphenyl) s |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5197439B2 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS505339A (en) * | 1973-05-25 | 1975-01-21 | ||
| JPS60116638A (en) * | 1983-11-30 | 1985-06-24 | Mitsui Petrochem Ind Ltd | Aqueous dispersion of solid aromatic hydroxy compound |
| GB9518704D0 (en) * | 1995-09-13 | 1995-11-15 | Zeneca Ltd | Chemical process |
| JP3901302B2 (en) * | 1997-10-02 | 2007-04-04 | 日本化薬株式会社 | Process for producing bis (3-nitro-4-hydroxyphenyl) s |
| WO2001081293A1 (en) * | 2000-04-25 | 2001-11-01 | Nippon Kayaku Kabushiki Kaisha | Process for producing bis(4-hydroxy-3-nitrophenyl) compound |
| CN101535377B (en) * | 2006-10-24 | 2011-09-14 | 住友电木株式会社 | Bis(aminophenol) derivative, process for producing the same, polyamide resin, positive photosensitive resin compositions, protective film, interlayer dielectric, semiconductor device, and display element |
-
2009
- 2009-02-27 JP JP2009045685A patent/JP5197439B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010195748A (en) | 2010-09-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2775229C (en) | Process for the preparation of sorafenib tosylate | |
| JP4872668B2 (en) | Process for producing 2-amino-5-iodobenzoic acid | |
| CN104884427A (en) | Compounds useful in the synthesis of benzamide compounds | |
| WO2012026266A1 (en) | Method for producing a methylene disulfonate compound | |
| JP2011503053A (en) | Process for producing 2-hydroxy-5-phenylalkylaminobenzoic acid derivatives and salts thereof | |
| JP5008404B2 (en) | Method for producing methylene disulfonate compound | |
| JP5243303B2 (en) | Process for producing bis (3-nitro-4-hydroxyphenyl) s | |
| JP5197439B2 (en) | Process for producing bis (3-nitro-4-hydroxyphenyl) s | |
| JP5133097B2 (en) | Method for producing 4,4'-methylenebis (2,5-dimethyl-6-nitrophenol) | |
| JP6057652B2 (en) | Method for producing 3,3'-dinitro-4,4'-dihydroxydiphenyl ether | |
| JP5133098B2 (en) | Method for producing 4,4'-ethylidenebis (2,5-dimethyl-6-nitrophenol) | |
| KR20020089486A (en) | Process for producing bis(4-hydroxy-3-nitrophenyl) compound | |
| TWI734776B (en) | Method for manufacturing nitrobenzene compound | |
| JP2021195320A (en) | Method for producing 5-bromo-2-halogenated benzoic acid | |
| JP5917514B2 (en) | Method for selective meta-chlorination of alkylanilines | |
| CN102659704B (en) | Synthetic method of bis(2,2,2-trinitro ethyl)-3-6-diamino tetrazine | |
| CN109776435B (en) | Method for preparing 1,2, 3-triazole by dibromovinylbenzene one-pot method | |
| JPWO2018212162A1 (en) | Method for producing diaminobenzene compound | |
| JP2010184904A (en) | Method for producing acetic acid compound | |
| RU2577544C1 (en) | Method for obtaining 2,2-bis[4-(4-nitrophenoxy]phenyl]hexafluoropropane under influence of ultrasound | |
| WO2015166557A1 (en) | Composition containing 3-chloro-4-methoxybenzylamine hydrochloride, and method for producing same | |
| JP2001316340A (en) | Method for producing aminohydroxy aromatic carboxylic acid and/or its derivative | |
| JP2014005224A (en) | Method of producing aromatic dialdehyde compound and oligovinylenephenylene compound | |
| WO2019146280A1 (en) | Compound and method for producing compound | |
| JP2007302642A (en) | Method for producing ruthenium complex |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20111005 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20111005 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20111017 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20121030 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121107 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121226 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130130 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130205 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160215 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5197439 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |