JP5182093B2 - Optical apparatus, exposure apparatus, and device manufacturing method - Google Patents

Description

The present invention relates to an optical apparatus, an exposure apparatus, and a device manufacturing method.
This application claims priority based on Japanese Patent Application No. 2006-241969 for which it applied on September 6, 2006, and uses the content here.

In a photolithography process, which is one of the manufacturing processes of microdevices such as semiconductor devices, an exposure apparatus that projects an image of a mask pattern onto a photosensitive substrate via a projection optical system is used. In the manufacture of micro devices, miniaturization of patterns formed on a substrate is required in order to increase the density of devices. In order to meet this demand, it is desired to further increase the resolution of the exposure apparatus. As one of the means for realizing the high resolution, the optical path space of the exposure light between the optical element of the projection optical system and the substrate is filled with the liquid, and the substrate is exposed through the projection optical system and the liquid. An immersion exposure apparatus has been devised. Patent Document 1 below discloses an example of a technique related to a holding member that holds an optical element of a projection optical system in an immersion exposure apparatus.
International Publication No. 2005/054955 Pamphlet

  When the optical element is bonded to the holding member, for example, the bonding portion may be deteriorated due to the surrounding environment (including temperature, humidity, chemical reaction, and the like). When the joint portion deteriorates, there is a possibility that the optical element cannot be satisfactorily held, for example, the position of the optical element changes. In that case, the optical characteristics of the projection optical system may fluctuate and the substrate may not be exposed satisfactorily.

  An object of this invention is to provide the optical apparatus which can hold | maintain an optical element favorably. It is another object of the present invention to provide an exposure apparatus that can satisfactorily expose a substrate through an optical element, and a device manufacturing method using the exposure apparatus.

  The present invention adopts the following configuration corresponding to each figure shown in the embodiment. However, the reference numerals with parentheses attached to each element are merely examples of the element and do not limit each element.

According to the aspect of the present invention, the optical element disposed at the boundary between the first space and the second space different from the first space and having a flange surface formed on the outer periphery, and the first of the flange surfaces. A holding member having a first facing surface facing the surface, a second facing surface facing the second surface different from the first surface among the flange surfaces, the first facing surface, and the At least one of the gas in the first space and the gas in the second space is brought to the joint between the joint that joins the first surface and the second facing surface and the second surface. An optical device is provided that includes a gas seal mechanism that generates a gas flow that suppresses the gas flow. According to an aspect of the present invention, in an exposure apparatus that exposes a substrate with exposure light, the optical apparatus according to the aspect of the present invention is provided, and exposure light is irradiated onto the substrate through the optical element of the optical apparatus. An exposure apparatus for irradiating is provided. Further, according to aspects of the present invention, a device manufacturing method using the exposure apparatus of the embodiment of the present invention is provide. According to the first aspect of the present invention, the optical element (2A) disposed at the boundary between the first space (6) and the second space (4) different from the first space (6), and the optical element A holding member (3A) having a facing surface (31) facing the first surface (11) of (2A), and a joint portion (40) for joining the facing surface (31) and the first surface (11). And a gas seal mechanism (20) that generates a gas flow that suppresses at least one of the gas in the first space (6) and the gas in the second space (4) from being brought to the joint (40). An optical device (1) is provided.

  According to the first aspect of the present invention, the optical element can be favorably held.

  According to the second aspect of the present invention, an exposure apparatus that exposes the substrate (P) with exposure light (EL) includes the optical apparatus (1) according to the above aspect, via the optical element of the optical apparatus (1). An exposure apparatus (EX) that irradiates exposure light (EL) onto a substrate (P) is provided.

  According to the 2nd aspect of this invention, a board | substrate can be favorably exposed via an optical element.

  According to the third aspect of the present invention, a device manufacturing method using the exposure apparatus (EX) of the above aspect is provided.

  According to the 3rd aspect of this invention, a device can be manufactured using the exposure apparatus which can expose a board | substrate favorably.

  According to the present invention, the optical element can be favorably held. Further, according to the present invention, the substrate can be satisfactorily exposed through the optical element. According to the present invention, a device having desired performance can be manufactured.

It is a schematic block diagram which shows the optical apparatus which concerns on 1st Embodiment. It is sectional drawing to which a part of FIG. 1 was expanded. FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. It is the figure which expanded a part of FIG. It is a one part perspective view of FIG. It is a one part perspective view of the optical apparatus which concerns on 2nd Embodiment. It is a one part perspective view of the optical apparatus which concerns on 3rd Embodiment. It is sectional drawing to which some optical devices based on 4th Embodiment were expanded. It is sectional drawing to which a part of optical device concerning a 5th embodiment was expanded. It is a one part perspective view of the optical apparatus which concerns on 6th Embodiment. It is sectional drawing to which a part of optical device concerning a 7th embodiment was expanded. It is a one part perspective view of the optical apparatus which concerns on 7th Embodiment. It is sectional drawing to which some optical devices based on 8th Embodiment were expanded. It is sectional drawing to which some optical devices based on 9th Embodiment were expanded. It is sectional drawing to which some optical devices based on 10th Embodiment were expanded. It is sectional drawing to which some optical devices based on 11th Embodiment were expanded. It is sectional drawing to which some optical devices based on 12th Embodiment were expanded. It is a schematic block diagram which shows the exposure apparatus which concerns on 13th Embodiment. It is sectional drawing to which a part of FIG. 18 was expanded. It is a flowchart figure which shows an example of the manufacturing process of a microdevice.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Optical apparatus, 2A ... Termination optical element, 3A ... Holding member, 4 ... Internal space, 5 ... Lens barrel, 6 ... External space, 11 ... 1st surface, 12 ... 2nd surface, 20 ... Gas seal mechanism, 21 DESCRIPTION OF SYMBOLS ... Gas supply port, 26 ... Gap, 31 ... Opposite surface, 32 ... Opposite surface, 40 ... Joint part, 50 ... Gas suction mechanism, 51 ... Gas suction port, EL ... Exposure apparatus, EX ... Exposure apparatus, LS ... Immersion Space, P ... Substrate, PL ... Projection optical system

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. The predetermined direction in the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction in the horizontal plane is the Y-axis direction, and the direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, the vertical direction) is the Z-axis direction. To do. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic configuration diagram illustrating an optical device 1 according to the first embodiment. In FIG. 1, an optical device 1 includes a plurality of optical elements 2A to 2E, holding members 3A to 3E that respectively hold the plurality of optical elements 2A to 2E, and an internal space 4, and the plurality of optical elements 2A. To 2E in the internal space 4 via holding members 3A to 3E.

  The optical device 1 can project an image of the object plane Os onto the image plane Is. In the present embodiment, the optical axis AX of the plurality of optical elements 2A to 2E of the optical device 1 is parallel to the Z axis. Each of the object plane Os and the image plane Is is parallel to the XY plane. The object plane Os is arranged on the + Z side of the optical device 1 in the drawing, and the image plane Is is arranged on the −Z side.

  Of the plurality of optical elements 2 </ b> A to 2 </ b> E of the optical device 1, the optical element 2 </ b> A closest to the image plane Is of the optical device 1 is the boundary between the internal space 4 of the lens barrel 5 and the external space 6 different from the internal space 4. Placed in. In the following description, among the plurality of optical elements 2A to 2E of the optical device 1, the optical element 2A disposed at the boundary between the internal space 4 and the external space 6 of the lens barrel 5 is appropriately designated as the terminal optical element 2A. Called.

  In the present embodiment, the internal space 4 of the lens barrel 5 is filled with gas. The external space 6 of the lens barrel 5 includes an immersion space LS filled with the liquid LQ. The immersion space LS is formed in the vicinity of the terminal optical element 2A on the image plane Is side of the optical device 1. The optical device 1 can project the image of the first object B1 arranged on the object plane Os onto the second object B2 arranged on the image plane Is via the liquid LQ in the immersion space LS. In the present embodiment, the immersion space LS is formed between the terminal optical element 2A and the second object B2 disposed on the image plane Is.

  The optical device 1 according to this embodiment includes an air supply port 61 formed in the lens barrel 5 and a first gas supply device 60 that supplies gas to the internal space 4 via the air supply port 61 and the air supply pipe 61P. ing. In the present embodiment, the first gas supply device 60 supplies a dry inert gas to the internal space 4. In the present embodiment, the first gas supply device 60 sends out nitrogen gas that is chemically purified and has a concentration of approximately 100%. The gas (inert gas) supplied to the internal space 4 may be helium or a mixed gas of nitrogen and helium. Further, the first gas supply device 60 may supply dry air (dry air) to the internal space 4.

  2 is a side sectional view showing the vicinity of the terminal optical element 2A disposed at the boundary between the internal space 4 and the external space 6 of the lens barrel 5 and the holding member 3A for holding the terminal optical element 2A, and FIG. FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. 4 is an enlarged view of a part of FIG. 2, and FIG. 5 is a perspective view of a part of FIG.

  As shown in FIG. 2, in the present embodiment, the terminal optical element 2A includes an incident surface 7 on which light from the object plane Os is incident, an exit surface 8 that emits light incident from the incident surface 7, and an incident surface. 7 and an outer peripheral surface 9 connecting the outer periphery of the injection surface 8 and the outer periphery of the emission surface 8. The incident surface 7 is disposed in the internal space 4 so as to face the object surface Os. The exit surface 8 is disposed in the external space 6 so as to face the image surface Is. At least a part of the outer peripheral surface 9 is disposed in the external space 6.

  As described above, the inner space 4 of the lens barrel 5 is filled with gas, and the incident surface 7 of the terminal optical element 2A disposed in the inner space 4 is in contact with the gas. The external space 6 of the lens barrel 5 includes an immersion space LS filled with the liquid LQ, and the emission surface 8 disposed in the external space 6 is in contact with the liquid LQ. Note that the liquid LQ is not shown in FIG.

  In the present embodiment, the entrance surface 7 of the terminal optical element 2A is a convex curved surface that swells toward the object plane Os, and the exit surface 8 of the terminal optical element 2A is a plane substantially parallel to the XY plane. In addition, the outer peripheral surface 9 of the terminal optical element 2A is disposed so as to surround the inclined surface 9S with respect to the exit surface 8 so as to surround the exit surface 8 and the inclined surface 9S, and is substantially parallel to the XY plane. And a plane 9F facing the -Z side. In the following description, of the outer peripheral surface 9 of the last optical element 2A, the plane 9F facing the −Z side substantially parallel to the XY plane is appropriately referred to as a flange surface 9F.

  2, 3, 4, and 5, the optical device 1 includes a holding member 3 </ b> A having a facing surface 31 that faces the first surface 11 of the flange surface 9 </ b> F, and a facing surface 31 and a first surface of the holding member 3 </ b> A. A gas flow is generated between the joint portion 40 that joins the surface 11 and the second surface 12 on the outer space 6 side with respect to the first surface 11 of the flange surface 9F, so that the gas in the outer space 6 flows. And a gas seal mechanism 20 that suppresses being brought to the joint portion 40.

  In the present embodiment, the first surface 11 is set to at least a part of the outer edge region (first region) of the flange surface 9F, and the second surface 12 is a flange closer to the external space 6 than the first surface 11 is. It is set to at least a part of the inner edge region (second region) of the surface 9F. The second surface 12 is set on the flange surface 9F so as to surround the immersion space LS and the injection surface 8 disposed in the external space 6, and the first surface 11 is an external space including the immersion space LS and the injection surface 8. 6 is set to a position farther than the second surface 12.

  The holding member 3A has a facing surface 31 that faces the first surface 11 of the flange surface 9F of the last optical element 2A. In the present embodiment, the holding member 3A has an upper surface 30 that is disposed so as to face the flange surface 9F of the last optical element 2A and faces the + Z side substantially parallel to the XY plane. The facing surface 31 is set as a part of the upper surface 30.

  The upper surface 30 of the holding member 3A facing the flange surface 9F of the last optical element 2A is formed in an annular shape so as to surround the immersion space LS and the emission surface 8 disposed in the external space 6. In the present embodiment, the facing surface 31 is set to at least a part of the outer edge region of the upper surface 30 so as to face the first surface 11 of the flange surface 9F. In the present embodiment, the flange surface 9F of the last optical element 2A and the upper surface 30 of the holding member 3A are separated from each other by a predetermined distance.

  The joining portion 40 that joins the facing surface 31 of the holding member 3A and the first surface 11 of the last optical element 2A bonds the first surface 11 and the facing surface 31 with an adhesive. The facing surface 31 is a surface on which the joint portion 40 is formed, and is a surface including the joint portion 40. Similarly, the first surface 11 is a surface on which the joint portion 40 is formed, and is a surface including the joint portion 40.

  As shown in FIG. 3, in the present embodiment, each of the first surface 11 of the terminal optical element 2 </ b> A and the facing surface 31 of the holding member 3 </ b> A bonded via the bonding portion 40 is rotated around the optical axis AX. Are set in each of a plurality of predetermined areas. In other words, the joint portion 40 (region where the adhesive is disposed) is set in a plurality of islands in the rotation direction around the optical axis AX.

  In the present embodiment, the terminal optical element 2A is made of, for example, quartz (silica). The terminal optical element 2A may be formed of a single crystal material of a fluoride compound such as calcium fluoride (fluorite), barium fluoride, strontium fluoride, lithium fluoride, and sodium fluoride. Further, the optical elements 2B to 2E can be formed of the above-described materials.

  In the present embodiment, the holding member 3A is formed of a material having the same or similar linear expansion coefficient as the optical element 2A, for example, an inorganic material such as ceramics or glass, or a metal. The holding member 3A may include boron or may be formed of glass.

  Examples of the adhesive for joining the first surface 11 of the last optical element 2A and the facing surface 31 of the holding member 3A include metals, ceramics, and glass as disclosed in International Publication No. 2005/054955. What contains inorganic materials, such as these, can be used. Moreover, as an adhesive agent which adhere | attaches the 1st surface 11 and the opposing surface 31, you may contain organic materials, such as an epoxy resin. Further, the adhesive may include a UV curable resin material that is cured by irradiation with ultraviolet light. Moreover, the junction part 40 may adhere | attach the 1st surface 11 and the opposing surface 31 with the solder of the metal containing indium etc.

  In the present embodiment, since the holding member 3A and the terminal optical element 2A are bonded using an adhesive, an increase in size and complexity of a mechanism for holding the terminal optical element 2A is suppressed.

  The gas seal mechanism 20 can generate a gas flow between the second surface 12 of the last optical element 2A. In the present embodiment, the gas seal mechanism 20 has a facing surface 32 that is arranged with a predetermined distance from the second surface 12 of the last optical element 2A.

  In the present embodiment, at least a part of the gas seal mechanism 20 is provided on the holding member 3A that holds the terminal optical element 2A. In the present embodiment, the facing surface 32 of the gas seal mechanism 20 is formed on the holding member 3A. In the present embodiment, the facing surface 32 of the gas seal mechanism 20 is set to a part of the upper surface 30 of the holding member 3A.

  In other words, in the present embodiment, the upper surface 30 of the holding member 3A has a facing surface 31 facing the first surface 11 of the terminal optical element 2A and a facing surface 32 facing the second surface 12 of the terminal optical element 2A. including. In the present embodiment, the facing surface 31 is set to at least a part of the outer edge region of the upper surface 30, and the facing surface 32 is an inner edge on the outer space 6 side (the optical axis side of the terminal optical element 2 </ b> A) than the facing surface 31. It is set to at least part of the area. The facing surface 32 is set on the upper surface 30 so as to surround the immersion space LS and the injection surface 8 disposed in the external space 6. The facing surface 31 is set at a position farther than the facing surface 32 with respect to the external space 6 including the liquid immersion space LS and the emission surface 8.

  In the present embodiment, the gas seal mechanism 20 flows gas between the second surface 12 formed on the flange surface 9F and the opposing surface 32 that is arranged with a predetermined distance from the second surface 12. Can be generated. In this embodiment, the space | interval (gap) between the 2nd surface 12 and the opposing surface 32 is set to 1 micrometer-100 micrometers, for example.

  In the present embodiment, the gas seal mechanism 20 includes a gas supply port 21 formed in the facing surface 32 and a second gas supply device 22 that supplies gas to the gas supply port 21. The second gas supply device 22 and the gas supply port 21 are connected via a supply flow path 23 formed inside the supply pipe 23P and the holding member 3A. The second gas supply device 22 can supply the dried gas to the gas supply port 21. The gas seal mechanism 20 supplies the gas sent from the second gas supply device 22 to the gap between the second surface 12 and the facing surface 32 through the gas supply port 21.

In the present embodiment, the gas seal mechanism 20 supplies a dry inert gas from the gas supply port 21. In the present embodiment, the second gas supply device 22 sends out nitrogen gas that is chemically purified and has a concentration of approximately 100%. Thereby, the gas seal mechanism 20 supplies dry nitrogen gas from the gas supply port 21. The gas (inert gas) supplied from the gas supply port 21 may be helium, carbon dioxide (CO ₂ ), argon (Ar), krypton (Cr), a mixed gas of these with nitrogen, nitrogen Or a mixed gas of helium. Further, the gas seal mechanism 20 may supply dry air (dry air) from the gas supply port 21. Further, the gas supplied into the lens barrel 5 may be reused. The gas supplied by the gas seal mechanism 20 via the gas supply port 21 may be the same as the gas supplied to the internal space 4 by the first gas supply device 60.

  As described above, in the present embodiment, the gas supply port 21 is formed on the facing surface 32, and is formed on the external space 6 side with respect to the joint portion 40 formed on the facing surface 31. In other words, the gas supply port 21 is disposed between the external space 6 and the joint portion 40, and is formed at a position closer to the external space 6 than the joint portion 40.

  As shown in FIG. 3, in the present embodiment, a plurality of gas supply ports 21 are formed on the facing surface 32 so as to correspond to each of the plurality of joints 40 formed in an island shape. That is, each of the plurality of gas supply ports 21 is disposed at a position close to each of the plurality of joint portions 40. Each of the plurality of gas supply ports 21 is disposed on the outer space 6 side with respect to the joint portion 40.

  Next, the operation of the optical device 1 will be described mainly with respect to the operation of the gas seal mechanism 20. A gas (dried gas) is sent from the second gas supply device 22 of the gas seal mechanism 20, and the gas is supplied to the gas supply port 21. The gas supply port 21 is formed in a facing surface 32 that is arranged with a predetermined distance from the second surface 12 of the last optical element 2A, and the gas supplied from the second gas supply device 22 is supplied to the second surface 12. 12 and the gap between the opposing surface 32. Gas is supplied to the gap between the second surface 12 and the opposing surface 32 from the gas supply port 21 disposed on the outer space 6 side with respect to the joint portion 40.

  Gas is supplied from the gas supply port 21 to the gap between the second surface 12 of the last optical element 2A and the facing surface 32 of the holding member 3A, whereby a predetermined gap is formed between the second surface 12 and the facing surface 32. A gas flow is generated.

  In the present embodiment, as shown in FIGS. 4 and 5, the gas seal mechanism 20 supplies the gas from the gas supply port 21 to the gap between the second surface 12 and the facing surface 32, thereby Between the surface 12 and the opposing surface 32, a gas flow from the joint 40 side toward the external space 6 side can be generated.

  In the present embodiment, the second gas supply device 22 can send a gas having a lower humidity than the gas in the external space 6, and the gas seal mechanism 20 is provided between the second surface 12 and the facing surface 32. In addition, a gas flow having a lower humidity than the gas in the external space 6 is generated.

  In the present embodiment, the gap between the second surface 12 and the facing surface 32 is set to a predetermined value (for example, 1 μm to 100 μm), and a gas seal mechanism is provided by supplying gas to the gap. 20 can raise the pressure between the 2nd surface 12 and the opposing surface 32 more than the pressure (for example, atmospheric pressure) of the external space 6 at least. That is, in the present embodiment, the gas seal mechanism 20 positively pressures the space between the second surface 12 and the facing surface 32 at least with respect to the adjacent space.

  As described above, in the present embodiment, the external space 6 includes the immersion space LS, and the gas in the external space 6 may have high humidity. When the gas in the external space 6 with high humidity is brought to the joint 40, the joint 40 may be deteriorated. For example, when a gas with high humidity (moist gas) is brought to the joint 40, the characteristics of the joint 40 including the adhesive may change. Specifically, when a humid gas is brought into the adhesive of the joint 40, for example, the adhesive may swell, the volume of the adhesive may change, or the properties of the adhesive may change. There is. In that case, there is a possibility that the position of the terminal optical element 2A fluctuates or at least one of the entrance surface 7 and the exit surface 8 is deformed. Moreover, the malfunction that the joining strength of the junction part 40 falls may arise. Then, the optical characteristics of the optical device 1 may change (deteriorate).

  In the present embodiment, the gas seal mechanism 20 generates a predetermined gas flow between the second surface 12 and the facing surface 32, so that there is a gas that may have moisture in the external space 6. , It can be suppressed to be brought to the joint 40.

  That is, in the present embodiment, the gas seal mechanism 20 generates a gas flow from the joint portion 40 side to the external space 6 side between the second surface 12 and the facing surface 32, so that moisture is removed. It can suppress that the gas of the external space 6 which may be tinged is brought to the junction part 40 from the external space 6 side.

  Further, since the gas seal mechanism 20 generates a positive pressure between the second surface 12 and the facing surface 32 by supplying gas to the gap between the second surface 12 and the facing surface 32, the external space It is possible to prevent the gas 6 from entering the gap and being brought to the joint 40.

  In the present embodiment, the gas seal mechanism 20 supplies a gas having a humidity lower than that of the gas in the external space 6 between the second surface 12 and the facing surface 32, and the gas having a low humidity is supplied. Since the flow is generated, it is possible to suppress deterioration of the joint portion 40 due to moisture.

  The facing surface 31 of the holding member 30 and the first surface 11 of the flange surface 9F are joined by a plurality of spaced joints 40 in the rotational direction around the optical axis AX. When the holding member 3A and the terminal optical element 2A are joined by the plurality of joint portions 40, a gap 26 that communicates the internal space 4 and the external space 6 between the terminal optical element 2A and the holding member 3A, 27 is formed. The gap 26 is formed between the facing surface 31 and the first surface 11, and the gap 27 is formed between the side surface 9T of the terminal optical element 2A and the inner surface of the holding member 3A facing the side surface 9T. It is formed.

  Therefore, in this embodiment, in order to suppress the gas flow between the internal space 4 and the external space 6, in other words, between the side surface 9T of the terminal optical element 2A and the inner side surface 3T of the holding member 3A, in other words. The gap 27 is filled with grease.

  Further, in order to suppress the gas flow between the internal space 4 and the external space 6, instead of filling the gap 27 with grease, the supply amount of the gas supplied from the first gas supply device 60 is adjusted, and the internal space 4 May be higher than the pressure in the external space 6 (for example, atmospheric pressure).

  That is, by making the internal space 4 positive, a gas flow from the internal space 4 toward the external space 6 can be generated via the gaps 26 and 27. Due to the synergistic effect of the gas flow and the gas seal mechanism 20, it is possible to prevent the joint 40 from being deteriorated.

  As described above, in the present embodiment, in the state where the gas flow between the internal space 4 and the external space 6 is blocked by grease, the gas seal mechanism 20 generates a predetermined gas flow, thereby deteriorating the joint 40. Can be suppressed. Further, in a state where a gas flow is generated between the internal space 4 and the external space 6 from the internal space 4 toward the external space 6, the gas flow and the gas flow of the gas seal mechanism 20 are synergistic. Due to the effect, it is possible to suppress the deterioration of the joint portion 40.

  In the present embodiment, since the holding member 3A and the terminal optical element 2A are bonded using an adhesive, an increase in size and complexity of a mechanism for holding the terminal optical element 2A is suppressed. . Thus, in the present embodiment, it is possible to hold the terminal optical element 2A in a desired state while suppressing an increase in size and complexity of the mechanism that holds the terminal optical element 2A.

  In order to achieve a high numerical aperture of the optical device 1, for example, the incident surface 7 may be a convex curved surface in order to allow light incident from the object plane Os side to reach the image plane Is through the liquid LQ. There is a possibility that the entire optical device 1 including the terminal optical element 2A needs to be enlarged. In such a case, if the mechanism for holding the terminal optical element 2A is increased in size, the entire optical device 1 may be further increased in size. Further, when the incident surface 7 (curved surface) is increased or the terminal optical element 2A is enlarged, the arrangement and structure of the mechanism for holding the terminal optical element 2A may be restricted. Moreover, if the terminal optical element 2A having a curved surface cannot be satisfactorily held and the position of the terminal optical element 2A having the curved surface fluctuates, the optical characteristics of the optical device 1 may greatly fluctuate.

  In the present embodiment, the holding member 3A and the last optical element 2A are joined by the joining portion 40, and deterioration of the joining portion 40 is suppressed using the gas seal mechanism 20, so that the entire optical device 1 is increased in size. The optical characteristics of the optical device 1 can be maintained while suppressing the complexity.

  In the present embodiment, the external space 6 includes the immersion space LS, and in order to prevent the gas on the external space 6 side that may be humid from being brought to the joint portion 40, a gas seal is provided. Although a predetermined gas flow is generated by the mechanism 20, the immersion space LS may not be formed in the external space 6. Even when the immersion space LS is not formed, for example, when the external space 6 contains more impurities (including chemical substances, particles, etc.) than the internal space 4, in other words, the gas in the external space 6 When the purity is lower than the purity of the gas in the internal space 4, the gas seal mechanism 20 prevents the gas in the external space 6 from being brought into the joint 40, so that the joint 40 has a low purity. It is possible to prevent the gas in the external space 6 from flowing into the internal space 4.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 6 is an enlarged perspective view of a part of the optical device 1 according to the second embodiment. In FIG. 6, the optical device 1 includes a holding member 3 </ b> A having a facing surface 31 that faces the first surface 11 of the terminal optical element 2 </ b> A and a facing surface 32 that faces the second surface 12. A gas supply port 21 for supplying gas is formed in the facing surface 32. As in the first embodiment, a plurality of gas supply ports 21 are formed on the facing surface 32 so as to correspond to each of the plurality of joints 40.

  The gas seal mechanism 20 </ b> A of the present embodiment has a groove 24 formed in the facing surface 32. The gas supply port 21 is formed inside the groove 24. A plurality of grooves 24 are formed so as to correspond to the gas supply ports 21. The circumferential length of the groove 24 is longer than the circumferential length of the joint 40. In the present embodiment, the groove 24 is formed in a substantially arc shape in the XY plane, and the gas supply port 21 is formed substantially at the center in the axial direction of the groove 24. The groove 24 and the gas supply port 21 are formed, and the facing surface 32 facing the second surface 12 is formed with an adhesive portion 40 and is disposed closer to the external space 6 than the facing surface 31 facing the first surface 11. Yes.

  As described above, the groove 24 can be formed in the facing surface 32, and the gas supply port 21 can be disposed inside the groove 24. Also in the present embodiment, the gas seal mechanism 20 </ b> A can generate a predetermined gas flow between the second surface 12 on the external space 6 side and the facing surface 32 with respect to the joint portion 40. In the present embodiment, at least a part of the gas supplied from the gas supply port 21 flows so as to expand along the groove 24 and then flows from the joint 40 toward the external space 6 side. Thereby, it can suppress that the gas of the external space 6 is brought to the junction part 40. FIG.

<Third Embodiment>
Next, a third embodiment will be described. FIG. 7 is an enlarged perspective view of a part of the optical device 1 according to the third embodiment. Similar to the first embodiment described above, a plurality of the joint portions 40 are set in the rotation direction around the optical axis AX.

  The gas seal mechanism 20B of this embodiment has a groove 25 formed in an annular shape in the XY plane on the upper surface 30 of the holding member 3A. A plurality of the grooves 25 are formed on the upper surface 30 so as to surround the joint portion 40 (region where the adhesive is disposed). That is, in the present embodiment, the groove 25 is formed on the upper surface 30 so as to surround the facing surface 31 on which the joint portion 40 is formed. The gas supply port 21 is formed at a predetermined position inside the groove 25.

  In the present embodiment, the gas supply port 21 is disposed closer to the inner space 4 than the joint 40 inside the groove 25. That is, in the present embodiment, the facing surface 31 on which the joint 40 is formed is disposed between the external space 6 and the gas supply port 21.

  At least a part of the groove 25 is formed on the outer space 6 side with respect to the facing surface 31. In other words, a part of the groove 25 is formed on the facing surface 32 on the outer space 6 side with respect to the joint portion 40 in the upper surface 30.

  The gas seal mechanism 20 </ b> B can generate a gas flow according to the shape of the groove 25 between the flange surface 9 </ b> F and the facing surface 31 by the gas supplied from the gas supply port 21. At least a part of the gas supplied from the gas supply port 21 flows along the groove 25. As described above, at least a part of the groove 25 is formed on the facing surface 32 on the external space 6 side with respect to the facing surface 31 including the joint portion 40, and the gas seal mechanism 20 </ b> B is supplied from the gas supply port 21. The gas flowing according to the shape of the groove 25 can generate a predetermined gas flow between the second surface 12 on the external space 6 side and the facing surface 32 with respect to the joint portion 40.

<Fourth embodiment>
Next, a fourth embodiment will be described. FIG. 8 is a side sectional view showing a part of the optical device 1 according to the fourth embodiment. As in the above-described embodiment, gaps 26 and 27 are formed between the inner space 4 and the outer space 6 between the terminal optical element 2A and the holding member 3A.

  The gas seal mechanism 20 </ b> C of this embodiment does not include a gas supply port on the facing surface 32. The gas seal mechanism 20 </ b> C of the present embodiment is formed between the facing surface 31 and the first surface 11 so as to communicate the internal space 4 and the external space 6, and the gas in the internal space 4 faces the second surface 12. It includes gaps 26 and 27 between the surface 32 and a first gas supply device 60 for supplying gas to the internal space 4.

  The gas seal mechanism 20C supplies gas from the first gas supply device 60 to the internal space 4A, and makes the pressure of the internal space 4 higher than at least the pressure of the external space 6 (for example, atmospheric pressure). In other words, the gas seal mechanism 20 </ b> C uses the first gas supply device 60 to supply gas to the internal space 4 to positively pressure the internal space 4.

  When the internal space 4 is positively pressurized, gas is supplied from the internal space 4 to the gap between the second surface 12 and the facing surface 32 via the gaps 26 and 27, and from the internal space 4 to the gaps 26 and 27. A gas flow is generated between the second surface 12 and the opposing surface 32 via the. The gas supplied from the gaps 26 and 27 between the second surface 12 and the facing surface 32 flows toward the external space 6. That is, when the internal space 4 is positively pressurized, a gas flow from the internal space 4 toward the external space 6 through the gaps 26 and 27 is generated, and between the second surface 12 and the opposing surface 32, Then, a gas flow from around the joint 40 toward the external space 6 is generated. The gas seal mechanism 20 </ b> C suppresses the gas in the external space 6 from being brought to the joint 40 by the gas flow.

<Fifth Embodiment>
Next, a fifth embodiment will be described. FIG. 9 is a side sectional view showing a part of the optical device 1 according to the fifth embodiment. This embodiment is a modification of the first to third embodiments. As shown in FIG. 9, the gas seal mechanism 20 </ b> D according to the present embodiment includes a gas suction mechanism 50 that sucks the gas between the second surface 12 and the facing surface 32. The gas suction mechanism 50 includes a gas suction port 51 formed in the holding member 3 </ b> A and a gas suction device 52 including a vacuum system capable of sucking gas through the gas suction port 51. The gas suction device 52 and the gas suction port 51 are connected to each other through a suction channel 53 formed inside the suction pipe 53P and the holding member 3A.

  The gas suction port 51 is formed in the facing surface 32 on the outer space 6 side with respect to the facing surface 31 in the upper surface 30 of the holding member 3A, and sucks the gas between the second surface 12 and the facing surface 32. Is possible. Similar to the above-described embodiment, gaps 26 and 27 are formed between the second surface 12 and the facing surface 32.

  Further, as in the above-described embodiment, a gap 26 is formed between the facing surface 31 and the first surface 11 so as to communicate the internal space 4 and the external space 6. The gap 26 allows gas to flow between the internal space 4 and the external space 6, and the gas in the internal space 4 flows between the second surface 12 and the facing surface 32.

  When the gas suction device 52 is driven, the gas between the second surface 12 and the facing surface 32 is sucked by the gas suction port 51. As shown in FIG. 9, when the gas suction port 51 sucks the gas, a gas flow is generated from the inner space 4 of the lens barrel 5 through the gap 26 toward the gas suction port 51 through the gap 26. Is done. The gas suction port 51 is disposed on the outer space 6 side from the joint portion 40, and a gas flow from the joint portion 40 side toward the outer space 6 side is generated.

  Further, when the gas suction port 51 sucks the gas, a gas flow from the external space 6 toward the gas suction port 51 is generated. The gas suction port 51 is disposed on the outer space 6 side from the joint portion 40, and the gas from the outer space 6 is sucked into the gas suction port 51 without substantially reaching the joint portion 40.

  As described above, in the present embodiment, the gas seal mechanism 20D generates a gas flow from the joint 40 side toward the external space 6 side, and transmits a gas from the external space 6 toward the joint 40 to the joint 40. Before being brought into the gas suction port 51. Thereby, it is suppressed that the gas of the external space 6 is brought to the junction 40.

  A recess may be formed on the second surface 12 so as to face the gas suction port 51. Further, a circumferential groove may be formed on the second surface 12.

<Sixth Embodiment>
Next, a sixth embodiment will be described. FIG. 10 is an enlarged perspective view of a part of the optical device 1 according to the sixth embodiment. As shown in FIG. 10, the gas seal mechanism 20E of the present embodiment includes a gas supply port 21 that supplies gas and a gas suction port 51 that sucks gas.

  In FIG. 10, a groove 24 is formed on the facing surface 32 of the holding member 3A. A plurality of grooves 24 are formed on the upper surface 30 </ b> A so as to correspond to the plurality of joint portions 40. The circumferential length of the groove 24 is longer than the circumferential length of the joint 40. The groove 24 is formed in a substantially arc shape in the XY plane. The gas supply port 21 is formed at a first position in the circumferential direction of the groove 24, and the gas suction port 51 is formed at a second position in the circumferential direction of the groove 24. In the present embodiment, a gas supply port 21 is formed at one end of the substantially arc-shaped groove 24 in the circumferential direction, and a gas suction port 51 is formed at the other end.

  The groove 24 is disposed closer to the external space 6 than the facing surface 31. That is, the groove 24 including the gas supply port 21 and the gas suction port 51 is formed on the facing surface 32 disposed on the external space 6 side with respect to the facing surface 31 including the joint portion 40.

  In the present embodiment, the gas seal mechanism 20E performs a gas supply operation using the gas supply port 21 and a gas suction operation using the gas suction port 51 in parallel, and is closer to the external space 6 side than the joint 40. A predetermined gas flow is generated between the second surface 12 and the facing surface 32.

  Thus, both the gas supply port 21 and the gas suction port 51 can be formed on the facing surface 32. Thereby, the flow of the gas between the 2nd surface 12 and the opposing surface 32 is controllable. For example, the gas seal mechanism 20E can suppress an excessive flow of gas from the gap between the second surface 12 and the facing surface 32 to the external space 6 side. If the gas flows excessively to the external space 6 side, the liquid LQ in the immersion space LS is likely to vaporize or bubbles are generated in the liquid LQ, and the gas flowing into the external space 6 is immersed in the immersion space LS. May be affected. In the present embodiment, by appropriately performing a gas supply operation using the gas supply port 21 and a gas suction operation using the gas suction port 51, the gas flow is controlled and a desired gas flow is generated. Can do.

  Note that the positional relationship and the number of the gas supply port 21 and the gas suction port 51 shown in FIG. 10 are merely examples, and the positional relationship and the number of the desired relationship between the second surface 12 and the facing surface 32 are desired. It is set as appropriate so that a gas flow can be generated.

<Seventh embodiment>
Next, a seventh embodiment will be described. FIG. 11 is an enlarged side sectional view of a part of the optical device 1 according to the seventh embodiment, and FIG. 12 is a perspective view. As shown in FIGS. 11 and 12, the gas seal mechanism 20 </ b> F of the present embodiment has a gas supply port 21 disposed on the inner space 4 side with respect to the facing surface 31 including the joint portion 40, and the facing surface 31. And a gas suction port 51 disposed on the external space 6 side.

  Similar to the first embodiment described above, a plurality of the joint portions 40 are formed in the rotation direction around the optical axis AX. In the present embodiment, the first groove 28 formed on the inner space 4 side with respect to the facing surface 31 and the outer space 6 side with respect to the facing surface 31 are formed on the upper surface 30 of the holding member 3A. A second groove 29 is formed. Each of the first groove 28 and the second groove 29 is formed on the upper surface 30 so as to sandwich a plurality of joint portions 40 (regions where the adhesive is disposed) disposed in an island shape.

  The gas supply port 21 is formed inside the first groove 28. In the present embodiment, the first groove 28 is formed in a substantially arc shape in the XY plane, and the gas supply port 21 is formed substantially at the center in the axial direction of the first groove 28. The gas supply port 21 is formed in the vicinity of the joint 40.

  The gas suction port 51 is formed inside the second groove 29. In the present embodiment, the second groove 29 is formed in a substantially arc shape in the XY plane, and the gas suction port 51 is formed in each of one end and the other end of the arc-shaped second groove 29. ing.

  The gas seal mechanism 20F performs a gas supply operation using the gas supply port 21 and a gas suction operation using the gas suction port 51 in parallel, and faces the second surface 12 on the external space 6 side from the joint 40. A predetermined gas flow is generated between the surface 32 and the surface 32.

  That is, the gas seal mechanism 20F supplies gas from the gas supply port 21 disposed on the inner space 4 side with respect to the facing surface 31, and also the gas suction port disposed on the outer space 6 side with respect to the facing surface 31. By sucking gas from 51, a gas flow from the joint 40 side toward the external space 6 side can be generated.

  Further, by sucking gas from the gas suction port 51, a gas flow from the external space 6 toward the gas suction port 51 is generated. The gas suction port 51 is disposed on the outer space 6 side from the joint portion 40, and the gas from the outer space 6 is sucked into the gas suction port 51 without substantially reaching the joint portion 40.

  As described above, also in the present embodiment, the gas seal mechanism 20F generates a gas flow from the joint 40 side toward the external space 6 side, and transmits a gas from the external space 6 toward the joint 40 to the joint 40. Before being brought into the gas suction port 51. Thereby, it is suppressed that the gas of the external space 6 is brought to the junction 40.

  In the present embodiment, the second groove 29 is formed in a substantially arc shape in the XY plane, but may be a short linear shape.

<Eighth Embodiment>
Next, an eighth embodiment will be described. FIG. 13 is an enlarged side view of a part of the optical device 1 according to the eighth embodiment. In the first to seventh embodiments described above, the facing surface 31 and the facing surface 32 are formed on the upper surface 30 facing the + Z side of the holding member 3A, but as shown in FIG. The opposing surface 32 may be formed on a surface facing different directions. In the present embodiment, the facing surface 31 of the holding member 3A is formed so as to face the side surface 9T of the terminal optical element 2A, and the facing surface 32 faces a part of the flange surface 9F of the terminal optical element 2A. Is formed. That is, in the present embodiment, the first surface 11 of the surface of the terminal optical element 2A is set to the side surface 9T, and the second surface 12 on the outer space 6 side with respect to the first surface 11 is set to the flange surface 9F. Has been. And the gas supply port 21 of the gas seal mechanism 20G is formed in the opposing surface 32, and the gas seal mechanism 20G supplies the gas from the gas supply port 21 so that the gap between the second surface 12 and the opposing surface 32 is reached. A predetermined gas flow is generated. Also in the present embodiment, deterioration of the joint 40 can be suppressed by the flow of gas generated by the gas seal mechanism 20G.

<Ninth Embodiment>
Next, a ninth embodiment will be described. FIG. 14 is an enlarged side view of a part of the optical device 1 according to the ninth embodiment. In the present embodiment, the facing surface 31 of the holding member 3A is formed to face the side surface 9T of the terminal optical element 2A, and the facing surface 32 is also formed to face the side surface 9T of the terminal optical element 2A. Yes. That is, in the present embodiment, the first surface 11 of the surface of the terminal optical element 2A is set to the side surface 9T, and the second surface 12 on the external space 6 side with respect to the first surface 11 is also set to the side surface 9T. ing. A gas supply port 21 of the gas seal mechanism 20H is formed in the facing surface 32, and the gas seal mechanism 20H supplies gas from the gas supply port 21 so that the gas seal mechanism 20H is provided between the second surface 12 and the facing surface 32. A predetermined gas flow is generated. Also in this embodiment, the deterioration of the joint 40 can be suppressed by the flow of gas generated by the gas seal mechanism 20H.

<Tenth Embodiment>
Next, a tenth embodiment will be described. FIG. 15 is an enlarged side view of a part of the optical device 1 according to the tenth embodiment. In the present embodiment, an upper surface 9U facing the + Z side and substantially parallel to the XY plane is formed at the edge of the terminal optical element 2A. The facing surface 31 of the holding member 3A is formed to face the upper surface 9U of the terminal optical element 2A, and the facing surface 32 is formed to face the side surface 9T of the terminal optical element 2A. That is, in the present embodiment, the first surface 11 of the surface of the terminal optical element 2A is set to the upper surface 9U, and the second surface 12 on the external space 6 side with respect to the first surface 11 is set to the side surface 9T. ing. A gas supply port 21 of the gas seal mechanism 20I is formed in the facing surface 32, and the gas seal mechanism 20I supplies gas from the gas supply port 21 so that a gap between the second surface 12 and the facing surface 32 is obtained. A predetermined gas flow is generated. Also in this embodiment, deterioration of the joint 40 can be suppressed by the flow of gas generated by the gas seal mechanism 20I.

<Eleventh embodiment>
Next, an eleventh embodiment will be described. In the first to tenth embodiments described above, the facing surface 32 of the gas seal mechanism is formed on the holding member 3 </ b> A having the facing surface 31. The holding member 3 </ b> A having the facing surface 31 is formed on a different member.

  FIG. 16 is a side sectional view showing a part of the optical device 1 according to the eleventh embodiment. As shown in FIG. 16, in this embodiment, the opposing surface 32 of the gas seal mechanism 20J is formed on a member 32B different from the holding member 3A. A gas supply port 21 is formed in the facing surface 32. A supply channel 23 connected to the gas supply port 21 is formed inside the member 32B. Also in this embodiment, deterioration of the joint 40 can be suppressed by the flow of gas generated by the gas seal mechanism 20J.

  The configuration of the eleventh embodiment can also be applied to the first to tenth embodiments described above.

<Twelfth embodiment>
Next, a twelfth embodiment will be described. In the above-described first to eleventh embodiments, the bonding portion bonds the first surface 11 and the opposed surface 31 with an adhesive, but as illustrated in FIG. The surface 11 and the opposing surface 31 can be bonded by direct bonding.

  Direct bonding includes optical contact and bonds two well-cleaned surfaces by bringing them into close contact with each other without an adhesive. In the present embodiment, the holding member 3A is formed of the same glass (quartz or the like) as the terminal optical element 2A, and the first surface 11 of the terminal optical element 2A and the facing surface 31 of the holding member 3A have no adhesive. The opposing surface 31 and the 1st surface 11 are joined by making it closely_contact | adhere.

  In the present embodiment, the gas seal mechanism 20L has a gas flow between the second surface 12 on the external space 6 side and the facing surface 32 with respect to the facing surface 31 (first surface 11) joined by direct bonding. Generate a flow. Also in the joint 40 'of direct bonding, when a gas with moisture is brought in or a gas with low purity is brought in, the joint 40' may be deteriorated or the joint strength may be lowered. . The gas seal mechanism 20L can suppress the deterioration of the joint 40 'by generating a gas flow in order to suppress the gas in the external space 6 from being brought to the joint 40'.

  In the first to twelfth embodiments described above, the bonding portion 40 including the adhesive is provided in an island shape, but may be provided in an annular shape so as to surround the terminal optical element 2A.

  In the first to twelfth embodiments described above, the gas supply port 21 or the groove in which the gas supply port 21 is formed may be formed in an annular shape. Similarly, the gas suction port 51 or the groove in which the gas suction port 51 is formed may be formed in an annular shape. That is, the groove may be formed over the entire circumference of the facing surface 32 of the holding member 3A.

  In the first to twelfth embodiments described above, the terminal optical element 2A may be a parallel plate.

  In the embodiment described with reference to FIGS. 13 and 14 described above, the joint 40 may be provided on the optical surface of the terminal optical element 2A.

  In the second, sixth, and seventh embodiments described above, the gap 27 may be filled with grease.

  In the ninth and eleventh embodiments, an air bearing system (a configuration in which a gas recovery port is provided adjacent to the gas supply port 21) may be used.

  In the embodiment described with reference to FIG. 15 above, the upper surface 9U is not formed, and the holding member 3A may be opposed to a part of the optical surface of the terminal optical element 2A so as not to block the optical path. Good.

  Of course, the configurations of the above-described embodiments can be arbitrarily combined.

<13th Embodiment>
Next, a thirteenth embodiment will be described. In the present embodiment, the case where the optical apparatus 1 described in the first to twelfth embodiments is the projection optical system PL of the exposure apparatus EX will be described as an example.

  FIG. 18 is a schematic block diagram that shows an exposure apparatus EX according to the thirteenth embodiment. In FIG. 18, an exposure apparatus EX includes a mask stage 71 that can move while holding a mask M, a substrate stage 72 that can move while holding a substrate P, and an illumination system that illuminates the pattern of the mask M with exposure light EL. IL, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, and a control device 73 that controls the operation of the entire exposure apparatus EX.

  In addition, the substrate P here is, for example, a substrate in which a photosensitive material (photoresist) is coated on a base material such as a semiconductor wafer such as a silicon wafer, or a protective film (top coat film) in addition to the photosensitive material. The mask M includes a reticle on which a device pattern to be reduced and projected on the substrate P is formed. In this embodiment, a transmissive mask is used as a mask, but a reflective mask may be used. The transmission type mask is not limited to a binary mask in which a pattern is formed by a light shielding film, and includes, for example, a phase shift mask such as a halftone type or a spatial frequency modulation type.

The exposure apparatus EX of the present embodiment is an immersion exposure apparatus to which an immersion method is applied in order to improve the resolution by substantially shortening the exposure wavelength and substantially increase the depth of focus. The nozzle member 80 capable of forming a predetermined immersion space LS so as to fill the optical path space with the liquid LQ is provided. The immersion space LS is a space filled with the liquid LQ, and the optical path space of the exposure light EL is a space including an optical path through which the exposure light EL travels. In the present embodiment, decalin (C ₁₀ H ₁₈ ) is used as the liquid LQ for forming the immersion space LS. As the liquid LQ, water (pure water), a fluorine-based liquid, or the like can be used.

  The nozzle member 80 includes a liquid supply port 81 (not shown in FIG. 18) that can supply the liquid LQ for forming the immersion space LS, and a liquid recovery port 82 (not shown in FIG. 18) that can recover the liquid LQ. The liquid supply operation using the liquid supply port 81 and at least a part of the liquid recovery operation using the liquid recovery port 82 are performed in parallel, thereby reducing the optical path space of the exposure light EL. The predetermined immersion space LS can be formed so as to be filled with the liquid LQ.

  In the present embodiment, the nozzle member 80 is disposed so as to face the surface of the substrate P, can hold the liquid LQ with the surface of the substrate P, and is immersed between the surface of the substrate P. The space LS can be formed.

  Further, in the vicinity of the nozzle member 80, the terminal optical element 2A closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL is disposed. The terminal optical element 2A is arranged so as to face the surface of the substrate P, can hold the liquid LQ with the surface of the substrate P, and can form an immersion space LS with the surface of the substrate P. It is.

  In the present embodiment, the exposure apparatus EX uses the nozzle member 80 to form an immersion space LS between the surface of the substrate P and the nozzle member 80 and the terminal optical element 2A facing the surface of the substrate P. To do. Thereby, the optical path space of the exposure light EL between the terminal optical element 2A of the projection optical system PL and the surface of the substrate P is filled with the liquid LQ.

  In the present embodiment, the immersion space LS is formed so that a part of the region on the substrate P including the projection region of the projection optical system PL is covered with the liquid LQ. That is, in the present embodiment, a local liquid immersion method is employed in which a liquid immersion area is formed on a part of the substrate P including the projection area of the projection optical system PL.

The illumination system IL illuminates a predetermined illumination area on the mask M with exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as a bright line (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, Alternatively, vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm), F ₂ laser light (wavelength 157 nm), or the like is used. In this embodiment, ArF excimer laser light is used.

  The mask stage 71 is movable in the X-axis, Y-axis, and θZ directions while holding the mask M by driving a mask stage driving device 71D including an actuator such as a linear motor. Position information of the mask stage 71 (and thus the mask M) is measured by the laser interferometer 71L. The laser interferometer 71L measures the position information of the mask stage 71 using a measurement mirror 71R provided on the mask stage 71. The control device 73 drives the mask stage driving device 71D based on the measurement result of the laser interferometer 71L, and controls the position of the mask M held on the mask stage 71.

  The projection optical system PL can project the pattern image of the mask M onto the substrate P at a predetermined projection magnification, and includes the optical device 1 described in the first to thirteenth embodiments. In the present embodiment, the projection optical system PL projects an image of the pattern of the mask M onto the substrate P via the liquid LQ in the immersion space LS. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, 1/8 or the like. The projection optical system PL may be any one of a reduction system, a unity magnification system, and an enlargement system. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  The substrate stage 72 has a substrate holder 72H for holding the substrate P, and the base member BP is held in a state where the substrate P is held on the substrate holder 72H by driving a substrate stage driving device 72D including an actuator such as a linear motor. Above, it is movable in directions of 6 degrees of freedom in the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions. The substrate holder 72H of the substrate stage 72 holds the substrate P so that the surface of the substrate P and the XY plane are substantially parallel.

  The position information of the substrate stage 72 (and thus the substrate P) is measured by the laser interferometer 72L. The laser interferometer 72L measures position information regarding the X axis, the Y axis, and the θZ direction of the substrate stage 72 using a measurement mirror 72R provided on the substrate stage 72. The exposure apparatus EX also includes a focus / leveling detection system (not shown) that can detect surface position information (position information regarding the Z axis, θX, and θY directions) of the surface of the substrate P held by the substrate stage 72. ing. The control device 73 drives the substrate stage driving device 72D based on the measurement result of the laser interferometer 72L and the detection result of the focus / leveling detection system, and controls the position of the substrate P held on the substrate stage 72.

  In the present embodiment, a recess 72C is provided on the substrate stage 72, and the substrate holder 72H is disposed in the recess 72C. The upper surface 72F of the substrate stage 2 other than the recess 72C is substantially flat, and the upper surface 72F of the substrate stage 2 and the surface of the substrate P held by the substrate holder 72H are substantially the same height (level). The nozzle member 80 can also form an immersion space LS between the nozzle member 80 and the upper surface 72F of the substrate stage 72.

  FIG. 19 is a side sectional view showing the vicinity of the nozzle member 80. As shown in FIG. 19, the nozzle member 80 has a liquid supply port 81 for supplying a liquid LQ for forming the immersion space LS and a liquid recovery port 82 for recovering the liquid LQ. The nozzle member 80 is disposed in the vicinity of the terminal optical element 2A so as to face the surface of the substrate P (and / or the upper surface 2F of the substrate stage 2). In the present embodiment, the nozzle member 80 is an annular member, and is disposed above the substrate P (substrate stage 2) so as to surround the optical path space K of the exposure light EL.

  The nozzle member 80 includes a bottom plate 83 having a lower surface 90A that can face the surface of the substrate P. An opening 84 through which the exposure light EL can pass is formed in the center of the bottom plate 83. The liquid supply port 81 supplies the liquid LQ between the upper surface of the bottom plate 83 and the exit surface 8 of the last optical element 2A. The liquid supply port 81 is connected to the liquid supply device 86 via a liquid supply channel 85 and a liquid supply pipe 85P formed inside the nozzle member 80. The liquid supply device 86 can deliver a clean liquid LQ whose temperature is adjusted. The liquid supply device 86 can supply the liquid LQ for forming the immersion space LS via the liquid supply pipe 85P, the liquid supply channel 85, and the liquid supply port 81. The operation of the liquid supply device 86 is controlled by the control device 73.

  The liquid recovery port 82 is provided so as to surround the lower surface 90 </ b> A of the bottom plate 83, and a porous member 87 is disposed in the liquid recovery port 82. In the present embodiment, the lower surface 90B of the porous member 87 and the lower surface 90A of the bottom plate 83 are substantially flush. The liquid recovery port 82 is connected to a liquid recovery device 89 via a liquid recovery flow path 88 and a liquid recovery pipe 88P formed inside the nozzle member 80. The liquid recovery device 89 includes a vacuum system and can recover the liquid LQ. The liquid recovery device 89 can recover the liquid LQ in the immersion space LS via the liquid recovery port 82, the liquid recovery flow path 88, and the liquid recovery pipe 88P. The operation of the liquid recovery device 89 is controlled by the control device 73.

  At least a part of the lower surface 90A of the bottom plate 83 of the nozzle member 80 and the lower surface 90B of the porous member 87 can hold the liquid LQ between the surface of the substrate P and the liquid LQ between the surface of the substrate P. The immersion space LS can be formed. In order to continue forming the immersion space LS, the control device 73 drives each of the liquid supply device 86 and the liquid recovery device 89 to use the liquid supply operation using the liquid supply port 81 and the liquid recovery port 82. Each of the liquid recovery operations is performed.

  The liquid LQ delivered from the liquid supply device 86 flows through the liquid supply flow path 85 of the nozzle member 80, and then is supplied from the liquid supply port 81 between the exit surface 8 of the last optical element 2A and the upper surface of the bottom plate 83. Is done. The liquid LQ supplied between the exit surface 8 of the last optical element 2A and the upper surface of the bottom plate 83 is connected to the lower surfaces 90A and 90B of the nozzle member 80 and the substrate P through an opening 84 formed substantially at the center of the bottom plate 83. The immersion space LS is formed so as to flow into the space between the substrate stage 2 and the optical path space K of the exposure light EL.

  The liquid LQ in the space between the lower surfaces 90A and 90B of the nozzle member 80 and the surface of the substrate P flows into the liquid recovery flow path 88 via the liquid recovery port 82 of the nozzle member 80, and the liquid recovery flow path 88 passes through the liquid recovery flow path 88. After flowing, the liquid is recovered by the liquid recovery device 89.

  The control device 73 supplies a predetermined amount of liquid LQ per unit time to the optical path space K of the exposure light EL from the liquid supply port 81 and collects a predetermined amount of liquid LQ per unit time from the liquid recovery port 82. Thus, the immersion space LS is formed so that the optical path space K of the exposure light EL between the terminal optical element 2A and the surface of the substrate P is filled with the liquid LQ.

  The exposure apparatus EX forms the immersion space LS using the nozzle member 80 at least while the pattern image of the mask M is projected onto the substrate P. The exposure apparatus EX irradiates the exposure light EL emitted from the illumination system IL and passed through the mask M onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS. Thereby, the pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed.

  In the present embodiment, while at least the immersion space LS is formed, the control device 73 generates a predetermined gas flow using the gas seal mechanism 20 (20A to 20L), and the gas in the external space 6 flows. It is suppressed from being brought to the joint portion 40 between the last optical element 2A and the holding member 3A.

  In the present embodiment, the configuration in which the terminal optical element 2A is held by the lens barrel 5 has been described, but the terminal optical element 2A may be held by the nozzle member 80. That is, the configuration of the holding member 3 </ b> A in the present embodiment may be provided in the nozzle member 80.

  Thereby, deterioration of the junction 40 is suppressed, and the holding member 3A can continue to hold the terminal optical element 2A satisfactorily. Therefore, the exposure apparatus EX can satisfactorily expose the substrate P using the projection optical system PL in which desired optical characteristics are maintained.

  In the above-described embodiment, the optical path space on the exit surface side of the terminal optical element of the projection optical system (optical device) is filled with the liquid. For example, as disclosed in International Publication No. 2004/019128 The optical path space on the object plane side of the last optical element may be filled with liquid. In that case, an optical element close to the image plane of the projection optical system after the terminal optical element in the projection optical system is a first space including the immersion space and a second space different from the first space. Placed on the border.

  As the substrate P in the above-described embodiment, not only a semiconductor wafer for manufacturing a semiconductor device but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or a film member is applied. Further, the shape of the substrate is not limited to a circle, and may be other shapes such as a rectangle.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Further, as the exposure apparatus EX, a reduced image of the first pattern is projected with the first pattern and the substrate P being substantially stationary (for example, a refraction type projection optical system that does not include a reflecting element at 1/8 reduction magnification). The present invention can also be applied to an exposure apparatus that performs batch exposure on the substrate P using the above. In this case, after that, with the second pattern and the substrate P substantially stationary, a reduced image of the second pattern is collectively exposed onto the substrate P by partially overlapping the first pattern using the projection optical system. It can also be applied to a stitch type batch exposure apparatus. Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

The optical element (such as the final optical element 2A) of the projection optical system PL is not limited to a single crystal material of a fluorinated compound. The optical element may be formed of a material having a refractive index higher than that of quartz and fluorite (for example, 1.6 or more). Examples of the material having a refractive index of 1.6 or more include sapphire and germanium dioxide disclosed in International Publication No. 2005/059617 pamphlet, or potassium chloride (refractive index disclosed in International Publication No. 2005/059618 pamphlet). The rate can be about 1.75) or the like. Furthermore, a thin film having a lyophilic property and / or a dissolution preventing function may be formed on a part (including at least a contact surface with a liquid) or the entire surface of the optical element. Quartz has a high affinity with a liquid and does not require a dissolution preventing film, but fluorite can form at least a dissolution preventing film. Examples of the liquid LQ having a refractive index higher than that of pure water (for example, 1.5 or more) include C—H bonds such as isopropanol having a refractive index of about 1.50 and glycerol (glycerin) having a refractive index of about 1.61. Alternatively, a predetermined liquid having an O—H bond, a predetermined liquid (organic solvent) such as hexane, heptane, and decane, or decalin (Decalin: Decahydronaphthalene) having a refractive index of about 1.60 may be used. Further, the liquid LQ may be a mixture of any two or more of these liquids, or a liquid obtained by adding (mixing) at least one of these liquids to pure water. Furthermore, the liquid may be a solution obtained by adding (mixing) a base or acid such as H ⁺ , Cs ⁺ , K ⁺ , Cl ⁻ , SO ₄ ²⁻ , PO ₄ ^2−, etc. to pure water. What added fine particles, such as a thing, may be used. As the liquid LQ, the light absorption coefficient is small, the temperature dependency is small, and the projection optical system and / or the photosensitive material (or top coat film or antireflection film) applied to the surface of the substrate is used. And stable. The substrate can be provided with a top coat film for protecting the photosensitive material and the base material from the liquid.

  In addition, the present invention relates to JP-A-10-163099, JP-A-10-214783 (corresponding US Pat. Nos. 6,341,007, 6,400,441, 6,549,269 and No. 6,590,634), JP 2000-505958 A (corresponding to US Pat. No. 5,969,441) and the like, and a multi-stage type exposure apparatus having a plurality of substrate stages. Applicable.

  Further, as disclosed in JP-A-11-135400 and JP-A-2000-164504 (corresponding US Pat. No. 6,897,963), a substrate stage for holding the substrate and a reference mark were formed. The present invention can also be applied to an exposure apparatus that includes a reference stage and a measurement stage equipped with a measuring instrument that can perform measurement related to exposure, such as various photoelectric sensors.

  In the above-described embodiment, an exposure apparatus that locally fills the liquid between the projection optical system PL and the substrate P is employed. However, the present invention is disclosed in JP-A-6-124873 and JP-A-10. -303114, US Pat. No. 5,825,043, etc., and can be applied to an immersion exposure apparatus that performs exposure in a state where the entire surface of the substrate to be exposed is immersed in the liquid. is there.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in US Pat. No. 6,778,257, an electronic mask (also referred to as a variable shaping mask, for example, a non-uniform mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. A light emitting image display element (including DMD (Digital Micro-mirror Device) which is a kind of Spatial Light Modulator (SLM)) may be used. An exposure apparatus using DMD is disclosed in, for example, US Pat. No. 6,778,257.

  Further, as disclosed in International Publication No. 2001/035168, an exposure apparatus (lithography system) that exposes a line-and-space pattern on a substrate P by forming interference fringes on the substrate P. The present invention can also be applied.

  Further, as disclosed in, for example, Japanese translations of PCT publication No. 2004-51850 (corresponding US Pat. No. 6,611,316), two mask patterns are synthesized on a substrate via a projection optical system. The present invention can also be applied to an exposure apparatus that double-exposes one shot area on a substrate almost simultaneously by multiple scanning exposures. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  As long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications is incorporated herein by reference.

  As described above, the exposure apparatus EX of the above embodiment is manufactured by assembling various subsystems including each component so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

As shown in FIG. 20, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Manufacturing step 203, substrate processing step 204 including substrate processing (exposure processing) for exposing the mask pattern to the substrate and developing the exposed substrate according to the above-described embodiment, device assembly step (dicing process, bonding process, (Including a processing process such as a packaging process) 205, an inspection step 206, and the like.

Claims (17)

An optical element disposed at a boundary between the first space and a second space different from the first space, and having a flange surface formed on the outer periphery ;
Among the flange surface, the first surface facing the first surface, of the flange surface, a holding member having a second opposing face opposing the different second surface to the first surface ,
A joint for joining the first facing surface and the first surface;
A gas seal that generates a gas flow that suppresses at least one of the gas in the first space and the gas in the second space from being brought to the joint between the second facing surface and the second surface. And an optical device. The optical device according to claim 1, wherein the bonding portion bonds the first surface and the first facing surface with an adhesive. The optical device according to claim 1, wherein the bonding portion bonds the first surface and the first facing surface by direct bonding. The first space includes an immersion space;
The second surface of the flange surface is located closer to the first space than the first surface,
The said gas seal mechanism supplies the gas whose humidity is lower than the gas of the said 1st space to the space between the said 2nd opposing surface and a 2nd surface. Optical device.   The optical device according to claim 4, wherein the gas seal mechanism generates the gas flow along the second surface.   The optical device according to claim 5, wherein the gas flow is directed from the joint portion to the first space. The optical device according to claim 1, wherein the gas seal mechanism positively pressures a space between the second surface and the second facing surface . The optical device according to claim 4, wherein the gas seal mechanism includes a gas supply port that is formed on the second facing surface and supplies gas toward the second surface. The gas seal mechanism, the optical device of any one of claims 4-7 provided in the holding member.   The optical device according to claim 1, wherein the gas seal mechanism includes a gas suction mechanism that sucks a gas between the second surface and the second surface. The optical device according to claim 10, wherein the gas suction mechanism has a gas suction port formed in the second facing surface . The adhesive includes an organic material,
The optical device according to claim 2, wherein the gas seal mechanism prevents deterioration of the organic material due to a chemical reaction. The adhesive includes an inorganic material,
The optical device according to claim 2, wherein the gas seal mechanism prevents corrosion of the inorganic material. A lens barrel for holding a plurality of optical elements;
The second space includes an internal space of the lens barrel,
The optical device according to any one of claims 1 to 13, wherein the optical element held by the holding member is disposed at a boundary between an internal space and an external space of the lens barrel. In an exposure apparatus that exposes a substrate with exposure light,
An exposure apparatus comprising the optical device according to any one of claims 1 to 14, and irradiating exposure light onto the substrate through the optical element of the optical device. An immersion space is formed between the optical element held by the holding member and the substrate,
The exposure apparatus according to claim 15, wherein the substrate is exposed through the optical element and the liquid in the immersion space.   A device manufacturing method using the exposure apparatus according to claim 15.

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