JP5135592B2 - Drawing method and drawing apparatus - Google Patents

Description

  The present invention relates to a drawing method and a drawing apparatus for drawing a pattern on a mask blank for manufacturing a photomask.

  2. Description of the Related Art Conventionally, for manufacturing a photomask, a drawing apparatus that draws a pattern on a mask blank with a laser beam is used (see, for example, Patent Document 1). The drawing apparatus has a stage movable in one direction (hereinafter referred to as Y direction). Above the stage, a head unit for emitting laser light is provided so as to be movable in one direction perpendicular to the Y direction (hereinafter referred to as the X direction).

  Mask blanks are fixed on the stage. In this state, the laser beam is emitted toward the mask blank at a predetermined timing while the head portion moves in the X direction. As a result, a pattern is drawn in a striped region along the X direction on the mask blank.

  Next, when the stage moves along the Y direction, the position of the mask blank is shifted in the Y direction. In this state, the laser beam is emitted toward the mask blank at a predetermined timing while the head portion moves in the X direction as described above. As a result, the pattern is drawn in another stripe region adjacent to the stripe region.

Thus, every time drawing is performed in a stripe-shaped region along the X direction, drawing can be performed on the entire surface of the mask blank by shifting the position of the mask blank in the Y direction.
JP 2002-244272 A

  In an actual drawing apparatus, the drawing accuracy of the edge of the pattern in the X direction is lower than the drawing accuracy of the edge of the pattern in the Y direction. Here, the drawing accuracy of the edge of the pattern refers to the small deviation between the position of the edge of the pattern to be drawn and the position of the edge of the pattern to be actually drawn.

  Therefore, for example, by reducing the energy intensity of the laser beam at the edge of the pattern and adjusting the beam diameter of the laser beam to be relatively small, the drawing accuracy at the edge of the pattern can be improved. However, it is difficult to change the beam diameter stably. Therefore, the drawing accuracy of the edge of the pattern in the X direction cannot be sufficiently improved.

  An object of the present invention is to provide a drawing method and a drawing apparatus in which the drawing accuracy of the edge of a pattern is improved.

  (1) A drawing method according to the first invention is a drawing method for drawing a pattern on a mask blank with a laser beam, the step of creating drawing data corresponding to the drawing pattern, and emitting a laser beam. Reciprocating the laser beam emitting portion for reciprocating in the first direction and the opposite direction thereof, reciprocating the laser beam aiming position on the one surface of the mask blank in the first direction and the opposite direction, and laser For each reciprocating movement of the light emitting part, a step of moving the mask blank and the laser light emitting part in a second direction relatively intersecting the first direction, and a movement of the laser light emitting part in the first direction A step of controlling the emission or non-emission of the laser beam from the laser beam emitting unit based on the drawing data, and the laser beam emitted by the laser beam emitting unit in the first direction. As morphism region matches the drawing pattern is obtained by a step of controlling the moving speed of the laser beam emitting portion in the first direction based on the drawing data.

  In this drawing method, the laser beam emitting part is reciprocated in the first direction and the opposite direction, so that the aiming position of the laser beam is reciprocated in the first direction and the opposite direction on one surface of the mask blank. To do. The mask blank and the laser beam emitting unit are moved in a second direction that intersects the first direction relatively each time the laser beam emitting unit reciprocates. Thereby, the aiming position of the laser beam is gradually shifted in the second direction.

  During movement of the laser beam emitting unit in the first direction, emission or non-emission of the laser beam from the laser beam emitting unit is controlled based on the drawing data. In this case, the moving speed of the laser light emitting unit in the first direction is controlled based on the drawing data so that the irradiation region of the laser light from the laser light emitting unit matches the drawing pattern in the first direction.

  In this way, by controlling the moving speed of the laser beam emitting portion in the first direction, the drawing pattern in the first direction can be maintained while maintaining the beam diameter constant without changing the energy intensity of the laser beam. Can be drawn. Thereby, the drawing accuracy of the edge of the drawing pattern in the first direction can be sufficiently improved.

  (2) When the laser beam emitting unit moves in the first direction, the laser beam aiming position by the laser beam emitting unit may be repeatedly moved in the second direction by a certain length.

  Thereby, it is possible to perform drawing with a larger area when the laser beam emitting portion moves in the first direction. Therefore, drawing efficiency can be improved. In this case, the edge of the drawing pattern is controlled by controlling the moving speed of the laser beam emitting portion in the first direction even when the laser beam irradiation position is repeatedly moved in the second direction at a constant cycle. The drawing accuracy of the part can be sufficiently improved.

  (3) In the step of creating drawing data, the drawing pattern is represented on a grid composed of a plurality of first lines along the first direction and a plurality of second lines along the second direction; In the step of adjusting the interval between the plurality of second lines so that the edge of the drawing pattern in the first direction coincides with any second line of the grid, and controlling the moving speed of the laser beam emitting unit, You may control the moving speed of a laser beam emission part based on the space | interval of several 2nd line | wires of a grid.

  In this case, based on the drawing data, the edge of the laser light irradiation region and the edge of the drawing pattern in the first direction can be reliably matched. Thereby, the drawing accuracy of the edge of the drawing pattern in the first direction can be more sufficiently improved.

  (4) A drawing apparatus according to a second aspect of the invention is a drawing apparatus for drawing a pattern on a mask blank with laser light, a drawing data creating unit for creating drawing data corresponding to the drawing pattern, and emitting laser light. The laser beam emitting part and the laser beam emitting part are reciprocated in the first direction and in the opposite direction, thereby moving the laser beam aiming position in the first direction and in the opposite direction on one surface of the mask blank. A first movement mechanism that reciprocates and a second movement that moves the mask blank and the laser light emitting portion relatively in a second direction that intersects the first direction every time the laser light emitting portion reciprocates. Movement of the laser beam emitting part in the first direction based on the drawing data so that the irradiation area of the laser beam from the laser beam emitting part in the first direction matches the drawing pattern in the first direction And a control means for controlling the emission or non-emission of the laser beam from the laser beam emitting unit based on the drawing data during the movement of the laser beam emitting unit in the first direction. It is.

  In this drawing apparatus, the laser beam emitting section is reciprocated in the first direction and the opposite direction by the first moving mechanism. Thereby, the aiming position of the laser beam reciprocates in the first direction and the opposite direction on one surface of the mask blank. Further, the mask blanks and the laser beam emitting unit are moved relative to each other in the second direction that intersects with the first direction each time the laser beam emitting unit is reciprocated by the second moving mechanism. Thereby, the aiming position of the laser beam is gradually shifted in the second direction.

  Based on the drawing data created by the drawing data creation unit, the emission or non-emission of the laser beam from the laser beam emitting unit is controlled during the movement of the laser beam emitting unit in the first direction. In this case, the moving speed of the laser light emitting unit in the first direction is controlled based on the drawing data so that the irradiation region of the laser light from the laser light emitting unit matches the drawing pattern in the first direction.

  In this way, by controlling the moving speed of the laser beam emitting portion in the first direction, the drawing pattern in the first direction can be maintained while maintaining the beam diameter constant without changing the energy intensity of the laser beam. Can be drawn. Thereby, the drawing accuracy of the edge of the drawing pattern in the first direction can be sufficiently improved.

  (5) When moving in the first direction, the laser beam emitting unit may repeatedly move the aiming position of the laser beam by a certain length in the second direction.

  Thereby, it is possible to perform drawing with a larger area when the laser beam emitting portion moves in the first direction. Therefore, drawing efficiency can be improved. In this case, the edge of the drawing pattern is controlled by controlling the moving speed of the laser beam emitting portion in the first direction even when the laser beam irradiation position is repeatedly moved in the second direction at a constant cycle. The drawing accuracy of the part can be sufficiently improved.

  According to the present invention, it is possible to draw the edge of the drawing pattern in the first direction while maintaining the beam diameter constant without changing the energy intensity of the laser beam. Thereby, the drawing accuracy of the edge of the drawing pattern in the first direction can be sufficiently improved.

  Hereinafter, a drawing method and a drawing apparatus according to an embodiment of the present invention will be described with reference to the drawings.

(1) Configuration FIG. 1 is a schematic diagram illustrating a configuration of a drawing apparatus according to the present embodiment. In FIG. 1, two directions orthogonal to each other in a horizontal plane are defined as an X direction and a Y direction.

  As shown in FIG. 1, the drawing apparatus 100 includes a stage 1, a stage drive unit 1 a, a carriage 2, a head unit 3, a laser light generation unit 4, a data processing unit 5, an on / off switching unit 6, and a sweep control unit 7. Prepare.

  Mask blanks 10 are fixed on the stage 1. The mask blank 10 has a configuration in which a light-shielding thin film made of chromium (Cr) or the like is formed on a glass substrate, for example. The stage 1 is moved along the Y direction by the stage driving unit 1a.

  Above the stage 1, a carriage 2 is provided along the X direction. A head unit 3 is attached to the carriage 2. The head unit 3 is configured to be movable in the X direction along the carriage 2.

  The laser light generation unit 4 includes, for example, a krypton ion laser and generates laser light. The laser beam is guided to the head unit 3 through the on / off switching unit 6 by an optical system and a reflecting mirror (not shown), and emitted from the head unit 3 toward the mask blank 10 on the stage 1. The on / off switching unit 6 switches on / off of laser light emission.

  The sweep control unit 7 repeatedly changes the emission direction of the laser light from the head unit 3 in a direction intersecting the X direction at a constant cycle. Thereby, the position where the laser beam should be irradiated on the mask blank 10 is repeatedly moved in the Y direction at a constant cycle. In the following description, the position where the laser beam should be irradiated on the mask blank 10 is referred to as a laser beam aiming position. Further, the movement of the laser beam aiming position due to a change in the emission direction of the laser beam is referred to as laser beam sweep. The laser beam sweep will be described later.

  The data processing unit 5 creates drawing data corresponding to the pattern to be drawn on the mask blank 10, and controls the head unit 3, the on / off switching unit 6 and the sweep control unit 7 based on the drawing data.

(2) Operation Next, an outline of the operation of the drawing apparatus 100 shown in FIG. 1 will be described. 2 to 4 are schematic plan views for explaining the outline of the operation of the drawing apparatus 100. Here, in order to facilitate understanding of the overall operation of the drawing apparatus 100, description of the sweep of laser light by the sweep control unit 7 is omitted.

  First, as shown in FIG. 2A, the position of the stage 1 is adjusted so that the end of the mask blanks 10 is positioned below the head 3 while the head 3 is at one end of the carriage 2. Is done. Subsequently, as shown in FIG. 2B, the head portion 3 emits laser light toward the mask blank 10 at a predetermined timing while moving from one end portion of the carriage 2 to the other end portion. As a result, the pattern is drawn in the stripe region P1 on the mask blank 10 along the X direction.

  Subsequently, as shown in FIG. 3C, the head portion 3 returns to one end portion of the carriage 2 in a state where the emission of the laser beam is stopped, and the stage 1 moves in the Y direction by the width of the stripe region P1. .

  Then, as shown in FIG. 3D, the head unit 3 emits laser light toward the mask blank 10 at a predetermined timing while moving again from one end of the carriage 2 to the other end. Thereby, a pattern is drawn in the stripe region P2 on the mask blank 10 adjacent to the stripe region P1.

  In this way, a pattern is drawn for each stripe region. Finally, as shown in FIG. 4E, drawing is performed on the entire surface of the mask blank 10 (a plurality of stripe regions P1 to Pz). Here, Z is an integer of 2 or more.

  In the present embodiment, the moving speed of the head unit 3 in the X direction changes based on the drawing data created by the data processing unit 5. Thereby, the pattern drawing accuracy in the X direction can be improved. The change in the moving speed of the head unit 3 will be described later.

(3) Laser Light Sweep Next, laser light sweep will be described. FIG. 5 is a diagram for explaining the sweep of the laser beam. In FIG. 5, a case where a pattern is drawn in the stripe region Px (1 ≦ x ≦ z) will be described.

  As described above, the irradiation position of the laser beam emitted from the head unit 3 is repeatedly moved in the Y direction at a constant cycle by the sweep control unit 7. That is, the laser beam sweeps in the Y direction.

  In the present embodiment, as shown in FIG. 5A, the laser beam aiming position PT moves a certain length (hereinafter referred to as a sweep length) along the Y direction. In this case, an area R (hereinafter referred to as an aiming movement area) R in which the laser beam aiming position PT moves has a sweep length Dh in the Y direction and a laser beam diameter Do in the X direction. The sweep length Dh is equal to the width in the Y direction of each of the stripe regions P1 to Pz.

  As the laser beam aiming position PT moves at a constant period and the head portion 3 (FIG. 1) moves in the X direction, the aiming movement region R gradually moves in the X direction as shown in FIG. 5B. Sneak away. As a result, the laser beam aiming position PT moves to the entire stripe region Px.

  When the position where the pattern is to be drawn (exposure position) and the laser beam aiming position PT overlap, the on / off switching unit 6 (FIG. 1) turns on the emission of the laser light. Thereby, a desired pattern can be drawn.

  Here, in order to move the laser beam aiming position PT along the Y direction while the head unit 3 moves in the X direction, the change direction of the laser beam emission direction (the direction in which the laser beam is shaken) is set to Y. It is necessary to set the direction inclined with respect to the direction. An angle (hereinafter referred to as an azimuth angle) formed by the direction in which the laser beam is oscillated with respect to the Y direction is appropriately adjusted by the sweep control unit 7 according to the moving speed of the head unit 3.

  FIG. 6 is a schematic diagram for explaining the relationship between the moving speed of the head unit 3 and the azimuth angle.

  As shown in FIG. 6A, for example, when the head unit 3 moves in the X direction at an equal speed S1, the angle (azimuth angle) θ between the direction DL in which the laser beam is shaken and the Y direction depends on the speed S1. Set to a constant value. Thereby, the laser beam aiming position PT (FIG. 5A) can be moved in the Y direction.

  Note that the angle and speed at which the laser beam is oscillated is constant, and the emission of the laser beam is turned on only within a certain range of the angle at which the laser beam is oscillated. In this case, the sweep length Dh (FIG. 5 (a)) can be kept constant by adjusting the on / off timing of laser light emission in accordance with the azimuth angle θ. Specifically, when irradiating the mask blank 10 with laser light for a certain sweep length Dh, if the azimuth angle θ is relatively large, the laser light emission period is relatively long, and the azimuth angle If θ is relatively small, the period during which laser light emission is turned on becomes relatively short.

  Here, in the present embodiment, as described above, the moving speed of the head unit 3 changes based on the drawing data.

  As shown in FIG. 6B, for example, the moving speed of the head unit 3 changes to speeds S1, S2, and S3. Speed S2 is higher than speed S1, and speed S3 is lower than speed S1. In this case, the azimuth angle θ2 when the head unit 3 moves at the speed S2 is set larger than the azimuth angle θ1 when the head unit 3 moves at the speed S1. Further, the azimuth angle θ3 when the head unit 3 moves at the speed S3 is set smaller than the azimuth angle θ1 when the head unit 3 moves at the speed S1.

  When the mask blank 10 is irradiated with the laser beam for the sweep length Dh, the head unit 3 moves at the speed S1 during the period when the laser beam emission is turned on when the head unit 3 moves at the speed S2. Is set longer than the period during which the emission of the laser beam is turned on. Further, the period in which the laser beam emission is turned on when the head unit 3 moves at the speed S3 is set shorter than the period in which the laser beam emission is turned on when the head unit 3 moves at the speed S1. .

  Thus, the azimuth angle and the on / off timing of laser light emission are adjusted according to the moving speed of the head unit 3. Thereby, the laser beam aiming position PT is repeatedly moved along the Y direction by a certain sweep length. That is, the sweep speed of the laser beam in the Y direction is constant.

(4) Drawing Data Next, details of the drawing data will be described. In the drawing apparatus 100, the head unit 3, the on / off switching unit 6 and the sweep control unit 7 are controlled based on the drawing data created by the data processing unit 5, and a pattern is drawn on the mask blank 10.

  7 and 8 are schematic diagrams for explaining a method of creating drawing data. FIG. 7A shows an example of a pattern to be drawn. FIGS. 7B to 8D show a drawing data creation process.

  In the example of FIG. 7A, a plurality (two in this example) of stripe patterns L1 and a plurality (two in this example) of stripe patterns L2 extending along the Y direction are alternately arranged. The length of the stripe pattern L1 in the X direction is larger than the length of the stripe pattern L2 in the X direction. The distance between the adjacent stripe patterns L1, L2 is equal to the length of the stripe pattern L1 in the X direction. When drawing the stripe patterns L1 and L2 in FIG. 7A, drawing data is created as follows.

  First, as shown in FIG. 7B, stripe patterns L1 and L2 are represented on the drawing range T1 of the drawing data. In the drawing range T1, a grid including a plurality of first lines SX along the X direction and a plurality of second lines SY along the Y direction is set. A plurality of rectangular regions (hereinafter referred to as basic regions) formed by the first and second lines SX and SY are basic units for setting on / off of laser light emission. The drawing range T1 corresponds to a region to be drawn on the mask blank 1.

  As an initial state, the intervals of all the first lines SX and the intervals of all the second lines SY are set equal. In this example, in the initial state, the interval between the first lines SX and the interval between the second lines SY is smaller than the length of the stripe patterns L1, L2 in the X direction and the distance between the adjacent stripe patterns L1, L2. Is set.

  In the following description, the length of the stripe patterns L1 and L2 in the X direction is referred to as the width of the stripe patterns L1 and L2.

  As shown in FIG. 8C, the interval between the second lines SY is adjusted so that the edge of each stripe pattern L1, L2 coincides with any second line SY. In this example, the interval between the second lines SY is reduced in the region R1 overlapping with the stripe pattern L1, and the interval between the second lines SY is extended in the region R2 overlapping with the stripe pattern L1. In addition, the interval between the second lines SY is reduced in the region R3 between the adjacent stripe patterns L1, L2.

Here, an example of a method for adjusting the interval between the second lines SY will be described. In the example of FIG. 7A, the width of the stripe pattern L1 is CDW1, the width of the stripe pattern L2 is CDW2, and the distance between the adjacent stripe patterns L1 and L2 is CDG. Further, the distance between the second line SY in the initial state and d _0.

Then, a natural number n ₁ as equation (1) is satisfied, determine the natural number n ₂ as the following equation (2) is satisfied, obtaining a natural number n ₃ as following equation (3) is satisfied.

Moreover, it obtains a _{d 1} as the CDW1 ₌ n _{1 d} 1, obtains a _{d 2} to be CDW2 ₌ n _{2 d} 2, obtains the _{d 2} of the CDG ₌ n 2 _{d 2.} Thereby, the interval (d ₁ ) between the second lines SY in the region R1 overlapping with the stripe pattern L1 and the interval (d ₂ ) between the second lines SY in the region R2 overlapping with the stripe pattern L2 can be determined. Further, the interval (d ₃ ) between the second lines SY in the region R3 between the adjacent stripe patterns L1 and L2 can be determined.

  Subsequently, as shown in FIG. 8D, a basic region overlapping the stripe patterns L1 and L2 is set as a laser light emission corresponding region RL. In this way, the drawing data ID1 is completed. Laser light is emitted toward a region on the mask blank 10 corresponding to the emission corresponding region RL.

(5) Adjustment of moving speed of head unit In the present embodiment, the moving speed of the head unit 3 in the X direction is adjusted according to the interval between the second lines SY of the drawing data ID1.

  Specifically, when the laser beam is aimed at the portion of the mask blank 10 corresponding to the region where the interval between the second lines SY is large, the moving speed of the head unit 3 is set relatively high. When the laser beam is aimed at a portion on the mask blank 10 corresponding to a region where the interval between the second lines SY is small, the moving speed of the head unit 3 is set to be relatively slow.

  In this case, it is possible to draw the edges of the stripe patterns L1 and L2 in the X direction with higher accuracy than when the moving speed of the head unit 3 is constant.

  9 and 10 are schematic diagrams for explaining the relationship between the moving speed of the head unit 3 and the drawing accuracy of the stripe patterns L1 and L2. FIG. 9 shows the movement state of the aiming movement region R when the movement speed of the head unit 3 is constant. FIG. 10 shows the movement state of the aiming movement region R when the movement speed of the head unit 3 is adjusted.

  9 and 10, a case where a part of the stripe patterns L1 and L2 is drawn in the stripe region Px (see FIG. 7A) will be described. In order to facilitate understanding, the movement path of the aiming movement region R is shown to gradually shift in the Y direction.

  As shown in FIG. 9, when the moving speed of the head unit 3 is constant, the aiming movement region R moves at a constant interval T1. When the aiming position PT (FIG. 5A) overlaps with the stripe patterns L1 and L2, laser light is emitted from the head unit 3.

  In this case, the positions of the edge portions of the stripe patterns L1 and L2 may deviate from the positions of the edge portions of the aiming movement region R. In that case, for example, it is necessary to draw the edges of the stripe patterns L1 and L2 in a state where the energy intensity of the laser beam is lowered to reduce the beam diameter.

  However, it is difficult to stably adjust the beam diameter to a desired value by changing the energy intensity of the laser beam. Therefore, variations tend to occur in the drawing accuracy at the edges of the stripe patterns L1 and L2.

  In contrast, in the present embodiment, in the drawing data, the interval between the second lines SY is adjusted so that the edge of each stripe pattern L1, L2 coincides with any second line SY, The moving speed of the head unit 3 in the X direction is adjusted according to the interval between the second lines SY.

  Specifically, as shown in FIG. 10, when the aiming movement region R is between the stripe patterns L1 and L2, and when the aiming movement region R overlaps the stripe pattern L1, the moving speed of the head unit 3 is relatively high. Set low. When the aim movement region R overlaps the stripe pattern L2, the moving speed of the head unit 3 is set to be relatively high.

  Accordingly, in the region between the stripe patterns L1 and L2 and the region on the stripe pattern L1, the movement interval T2 of the aiming movement region R is smaller than the distance T1 in FIG. On the other hand, in the region on the stripe pattern L2, the movement interval T3 of the aiming movement region R is larger than the distance T1 in FIG. Thereby, the position of the edge of stripe pattern L1, L2 and the position of the edge of aiming movement field R can be made to correspond exactly.

  In this way, by adjusting the moving speed of the head portion 3, it is possible to accurately match the positions of the edge portions of the stripe patterns L1, L2 with the position of the edge portion of the aiming movement region R. Therefore, the edge portions of the stripe patterns L1 and L2 can be drawn while maintaining the energy intensity of the laser light constant. As a result, the drawing accuracy of the edge portions of the stripe patterns L1 and L2 can be improved.

(6) Other Embodiments In the above embodiment, the head unit 3 is continuously moved in the X direction to perform drawing in the stripe regions P1 to Pz. The movement is stopped at a constant period, laser beam sweep is performed, and the head unit 3 is intermittently moved so as to synchronize with the laser beam sweep period, thereby performing drawing in the stripe regions P1 to Pz. Also good.

  In this case, the movement of the aiming movement region R in the X direction is adjusted in the same manner as described above by adjusting the single moving speed (that is, the moving distance) of the head unit 3 in accordance with the interval between the second lines SY of the drawing data. Can be adjusted. Thereby, the position of the edge part of stripe pattern L1, L2 and the position of the edge part of aiming movement field R can be made to correspond exactly.

  In this case, since the laser beam is shaken so that the laser beam aiming position PT moves along the Y direction with the head unit 3 stopped, the azimuth angle is set to 0 °.

  In the above embodiment, the head unit 3 is fixed in the Y direction and provided to be movable in the X direction, and the stage 1 is provided to be fixed in the X direction and movable in the Y direction. The present invention is not limited to this as long as the relative movement direction with respect to the mask blanks can be maintained. For example, the head unit 3 may be provided to be fixed in the X direction and movable in the Y direction, and the stage 1 may be provided to be fixed in the Y direction and movable in the X direction. Further, one of the head unit 3 and the stage 1 may be provided so as to be movable in both the X direction and the Y direction.

  In the above embodiment, the case where one laser beam is emitted from the head unit 3 has been described. However, the laser beam generated by the laser beam generator 4 is separated into a plurality of laser beams, and the plurality of laser beams are separated from the head. You may radiate | emit from the part 3 simultaneously. In this case, the aiming positions of the plurality of laser beams on the mask blanks 10 are adjusted so as to be aligned on a straight line along the X direction.

  In this case, the intervals between the plurality of laser beams may be changed according to the intervals between the second lines SY of the drawing data. Specifically, when the laser beam is aimed at a portion of the mask blank 10 corresponding to a region where the interval between the second lines SY is large, the interval between the plurality of laser beams is set large, and the second line When the laser beam is aimed at a portion on the mask blank 10 corresponding to a region where the SY interval is small, the intervals between the plurality of laser beams are set small. Thereby, the position of the edge part of each pattern and the position of the edge part of the aiming movement area | region R can be made to correspond exactly. Therefore, the drawing accuracy of the edge of each pattern can be improved.

(7) Correspondence between each component of claim and each part of embodiment The following describes an example of a correspondence between each component of the claim and each part of the embodiment. It is not limited.

  In the above embodiment, the X direction is an example of the first direction, the Y direction is an example of the second direction, the head unit 3 is an example of the laser beam emitting unit, and the carriage 2 and the head unit 3 are. Is an example of the first moving mechanism, the stage driving unit 1a is an example of the second moving mechanism, and the data processing unit 5 is an example of the control means.

  As each constituent element in the claims, various other elements having configurations or functions described in the claims can be used.

  The present invention can be effectively used for drawing patterns on various mask blanks.

It is a schematic diagram which shows the structure of the drawing apparatus which concerns on this Embodiment. It is a schematic plan view for demonstrating the outline | summary of operation | movement of a drawing apparatus. It is a schematic plan view for demonstrating the outline | summary of operation | movement of a drawing apparatus. It is a schematic plan view for demonstrating the outline | summary of operation | movement of a drawing apparatus. It is a figure for demonstrating the sweep of a laser beam. It is a schematic diagram for demonstrating the relationship between the moving speed of a head part, and an azimuth angle. It is a schematic diagram for demonstrating the creation method of drawing data. It is a schematic diagram for demonstrating the creation method of drawing data. It is a schematic diagram for demonstrating the relationship between the moving speed of a head part, and the drawing precision of a stripe pattern. It is a schematic diagram for demonstrating the relationship between the moving speed of a head part, and the drawing precision of a stripe pattern.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Stage 1a Stage drive part 2 Carriage 3 Head part 4 Laser beam generation part 5 Data processing part 6 On-off switching part 7 Sweep control part 10 Mask blank 100 Drawing apparatus L1, L2 Stripe pattern R Aiming movement area SX 1st line SY second line

Claims (5)

A drawing method for drawing a pattern on a mask blank by laser light,
Creating drawing data corresponding to the drawing pattern;
By reciprocating the laser beam emitting part for emitting the laser beam in the first direction and the opposite direction, the aiming position of the laser beam is set on the one surface of the mask blank in the first direction and the opposite direction. A reciprocating step;
For each reciprocation of the laser beam emitting unit, moving the mask blank and the laser beam emitting unit in a second direction that intersects the first direction relatively;
Controlling the emission or non-emission of the laser beam from the laser beam emitting unit based on the drawing data during the movement of the laser beam emitting unit in the first direction;
Based on the drawing data, the moving speed of the laser light emitting unit in the first direction is controlled so that an irradiation area of the laser light from the laser light emitting unit matches the drawing pattern in the first direction. A drawing method comprising steps. The laser beam emitting unit is repeatedly moved in the second direction by a predetermined length when the laser beam emitting unit moves in the first direction. 2. The drawing method according to 1. In the step of creating the drawing data, the drawing pattern is represented on a grid composed of a plurality of first lines along the first direction and a plurality of second lines along the second direction. Adjusting an interval between the plurality of second lines so that an edge of the drawing pattern in the first direction coincides with any second line of the grid;
The step of controlling the moving speed of the laser beam emitting section controls the moving speed of the laser beam emitting section based on the interval between the plurality of second lines of the grid. 2. The drawing method according to 2. A drawing apparatus for drawing a pattern on a mask blank with a laser beam,
A drawing data creation unit for creating drawing data corresponding to the drawing pattern;
A laser beam emitting section for emitting a laser beam;
By moving the laser beam emitting portion back and forth in the first direction and in the opposite direction, the laser beam aiming position moves back and forth in the first direction and in the opposite direction on one surface of the mask blank. A moving mechanism;
A second moving mechanism that moves the mask blanks and the laser light emitting portion relatively in a second direction intersecting the first direction for each reciprocating movement of the laser light emitting portion;
Based on the drawing data, the moving speed of the laser light emitting unit in the first direction is controlled so that an irradiation area of the laser light from the laser light emitting unit matches the drawing pattern in the first direction. And a control means for controlling emission or non-emission of the laser beam from the laser beam emitting unit based on the drawing data during the movement of the laser beam emitting unit in the first direction. A drawing apparatus characterized by. 5. The drawing apparatus according to claim 4, wherein the laser beam emitting unit repeatedly moves the aiming position of the laser beam by a predetermined length in the second direction when moving in the first direction. 6. .

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