JP5111270B2 - Photocatalyst sheet manufacturing method - Google Patents
Photocatalyst sheet manufacturing method Download PDFInfo
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- JP5111270B2 JP5111270B2 JP2008182081A JP2008182081A JP5111270B2 JP 5111270 B2 JP5111270 B2 JP 5111270B2 JP 2008182081 A JP2008182081 A JP 2008182081A JP 2008182081 A JP2008182081 A JP 2008182081A JP 5111270 B2 JP5111270 B2 JP 5111270B2
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- 239000011941 photocatalyst Substances 0.000 title claims description 86
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 42
- 239000011800 void material Substances 0.000 claims description 38
- 239000006185 dispersion Substances 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 24
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 23
- 239000000843 powder Substances 0.000 claims description 18
- 238000009835 boiling Methods 0.000 claims description 11
- 230000001699 photocatalysis Effects 0.000 claims description 11
- 238000000859 sublimation Methods 0.000 claims description 11
- 230000008022 sublimation Effects 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 238000007539 photo-oxidation reaction Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 15
- 239000000835 fiber Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 230000003373 anti-fouling effect Effects 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000011162 core material Substances 0.000 description 3
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000004745 nonwoven fabric Substances 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical group CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 2
- 229920002748 Basalt fiber Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- DEIVNMVWRDMSMJ-UHFFFAOYSA-N hydrogen peroxide;oxotitanium Chemical compound OO.[Ti]=O DEIVNMVWRDMSMJ-UHFFFAOYSA-N 0.000 description 2
- 239000012784 inorganic fiber Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 238000004887 air purification Methods 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
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- Catalysts (AREA)
Description
本発明は、シート基材の表面に、光触媒層を形成して光触媒シートを製造するための技術に関する。 The present invention relates to a technique for producing a photocatalytic sheet by forming a photocatalytic layer on the surface of a sheet substrate.
主に建材として用いられるシート状の材料の中に、シート基材の表面に光触媒層を有する物が存在する。光触媒層には、例えば二酸化チタンなどの光酸化機能を有する光触媒粉が含まれている。光触媒層は、太陽光などの光を受けて酸化機能を発揮し、また、その酸化機能に基づく例えば防汚、消臭、抗菌、大気浄化などの優れた機能（これらの機能を、光触媒機能と称する場合がある。）を発揮する。 Among sheet-like materials mainly used as building materials, there are those having a photocatalytic layer on the surface of a sheet base material. The photocatalyst layer contains, for example, photocatalyst powder having a photooxidation function such as titanium dioxide. The photocatalyst layer exhibits an oxidation function in response to light such as sunlight, and has excellent functions based on the oxidation function such as antifouling, deodorization, antibacterial, air purification, etc. May be referred to.)
ところで、一般に、光触媒層の表面は平滑である方がよいとされている。特に、光触媒層が、光酸化機能に加えて親水性に基づく防汚機能を有するものである場合には、光触媒層の表面に空隙があると、汚れ物質がその空隙内に入り込むことで上述の防汚機能が発揮されなくなる場合があるので、光触媒層を形成する場合、その表面をできる限り平滑にしようという努力が行われる。
他方、本願発明者の研究により、光触媒層に空隙がある場合の方が、防汚機能以外のがより良く発揮される場合があることが見出された。例えば、空隙がある光触媒層を有する光触媒シートはそうでない光触媒層を有する光触媒シートよりも環境汚染物質の吸着性がよく、窒素酸化物（ＮＯＸ）や、硫黄酸化物（ＳＯＸ）等の浄化機能に勝る場合がある。
By the way, it is generally said that the surface of the photocatalyst layer should be smooth. In particular, when the photocatalyst layer has an antifouling function based on hydrophilicity in addition to the photooxidation function, if there are voids on the surface of the photocatalyst layer, the dirt substance enters the voids to Since the antifouling function may not be exhibited, when the photocatalyst layer is formed, an effort is made to make the surface as smooth as possible.
On the other hand, it has been found by the inventor's research that when the photocatalyst layer has voids, things other than the antifouling function may be better exhibited. For example, a photocatalyst sheet having a photocatalyst layer with voids has better adsorbability of environmental pollutants than a photocatalyst sheet having a photocatalyst layer that is not so, and purifies nitrogen oxides (NO X ), sulfur oxides (SO X ), etc. It may outperform the function.
もっとも、従来の光触媒シートの光触媒層でも、空隙を持つものがある。一般的な光触媒シートは、シート基材の表面に、フッ素樹脂と、光触媒粉を含有する分散液を塗布し、分散液を塗布したシート基材をフッ素樹脂の融点以上で加熱し、加熱したそのシート基材を常温まで冷却することにより製造される。分散液に含まれるフッ素樹脂と光触媒粉の線膨張係数は通常異なるため、上述の加熱と冷却の過程を実行したときに両者の膨張の程度の相違によりそれらの界面に熱収縮応力が発生して界面剥離が生じることにより、光触媒層に空隙が生じる場合がある。
しかしながら、上述の空隙は加熱温度や加熱時間等様々な条件に依拠するものであるため、その再現性が高いとはいえない。つまり、意図したような空隙を有する光触媒層を持つ光触媒シートを製造するための技術は存在していない。
However, some photocatalyst layers of conventional photocatalyst sheets have voids. A general photocatalyst sheet is obtained by applying a dispersion containing a fluororesin and photocatalyst powder to the surface of a sheet substrate, heating the sheet substrate coated with the dispersion above the melting point of the fluororesin, Manufactured by cooling the sheet substrate to room temperature. Since the linear expansion coefficients of the fluororesin and the photocatalyst powder contained in the dispersion are usually different, when the above heating and cooling processes are performed, thermal contraction stress is generated at the interface due to the difference in the degree of expansion between the two. When the interfacial peeling occurs, voids may occur in the photocatalyst layer.
However, since the above-mentioned voids depend on various conditions such as heating temperature and heating time, it cannot be said that the reproducibility is high. That is, there is no technique for producing a photocatalyst sheet having a photocatalyst layer having a void as intended.
本発明は、シート基材の表面に光触媒層を形成して光触媒シートを製造する技術を、形成される光触媒層が、細かな空隙を有するようにできるように改良することをその課題とする。 This invention makes it the subject to improve the technique which forms a photocatalyst layer in the surface of a sheet base material, and manufactures a photocatalyst sheet so that the formed photocatalyst layer may have a fine space | gap.
上述の課題を解決するための本願発明として、本願発明者は、以下の発明を提案する。
本願発明は、シート基材の少なくとも一方の表面であり、光触媒層が設けられることで光酸化機能が与えられる特定表面に、光触媒層を形成する光触媒シートの製造方法である。そして、この光触媒シートの製造方法では、前記特定表面に、フッ素樹脂と、光触媒粉と、空隙形成剤と、を含有した分散液を塗布し、前記分散液を塗布したシート基材を、前記フッ素樹脂の融点以上熱分解温度以下であり、且つ前記空隙形成剤の熱分解温度、沸点又は昇華温度以上の温度で加熱し、加熱したそのシート基材を冷却する（例えば、常温まで自然冷却する）ことで、前記特定表面に光触媒層を設ける。
本願の方法では、光触媒シートを製造するためにシート基材の表面に塗布される分散液は、空隙形成剤を含んでいる。そして、分散液を塗布したシート基材を加熱するときの温度は、分散液に含まれるフッ素樹脂の融点以上熱分解温度以下であり、且つ空隙形成剤の熱分解温度、沸点、又は昇華温度以上の温度とする。そうすることにより、本願の方法では、加熱を行った場合に空隙形成剤がその場所から消失させられ、空隙形成剤が存在していた空間が光触媒層の中に空隙として残ることになる。
したがって、本願発明の光触媒シートの製造方法によれば、光触媒層の中に生じる空隙を再現性よく制御できるようになる。
もっとも、上述の温度範囲で加熱を行ったとしても、空隙形成剤をその場所から完全には消失させられない場合がある。しかしながら、本願発明の方法で製造した光触媒シートを使用すれば、光触媒層に残っていた空隙形成剤は光触媒によって分解され光触媒層からやがてなくなるので、光触媒層の空隙形成剤が存在していた空間には結果的に空隙が生じることになる。
なお、上述の温度で加熱した場合に空隙形成剤がそこから消失するようにするため、空隙形成剤の熱分解温度、沸点、又は昇華温度の少なくとも一つは、フッ素樹脂の熱分解温度以下の範囲に収まるようにすることになる。
本願において、熱分解温度とは、常温から空気中で１０℃／分で昇温させたときにその物質（例えば、空隙形成剤或いはフッ素樹脂）の重量が１０％減少した時点の温度をいう。
The present inventor proposes the following invention as the present invention for solving the above-mentioned problems.
This invention is a manufacturing method of the photocatalyst sheet which forms a photocatalyst layer in the specific surface which is a at least one surface of a sheet | seat base material, and a photooxidation function is provided by providing a photocatalyst layer. In this photocatalyst sheet manufacturing method, a dispersion liquid containing a fluororesin, a photocatalyst powder, and a void forming agent is applied to the specific surface, and the sheet base material to which the dispersion liquid is applied It is heated at a temperature not lower than the melting point of the resin but not higher than the thermal decomposition temperature and not lower than the thermal decomposition temperature, boiling point or sublimation temperature of the void forming agent, and the heated sheet substrate is cooled (for example, naturally cooled to room temperature). Thus, a photocatalytic layer is provided on the specific surface.
In the method of the present application, the dispersion applied to the surface of the sheet base material for producing the photocatalytic sheet contains a void forming agent. And the temperature at the time of heating the sheet | seat base material which apply | coated the dispersion liquid is more than melting | fusing point of the fluororesin contained in dispersion liquid and below pyrolysis temperature, and more than thermal decomposition temperature, boiling point, or sublimation temperature of a space | gap formation agent. Temperature. By doing so, in the method of the present application, when heating is performed, the void forming agent disappears from the place, and the space where the void forming agent was present remains as voids in the photocatalyst layer.
Therefore, according to the method for producing a photocatalyst sheet of the present invention, the voids generated in the photocatalyst layer can be controlled with good reproducibility.
But even if it heats in the above-mentioned temperature range, a space | gap formation agent may not be lose | disappeared completely from the place. However, if the photocatalyst sheet produced by the method of the present invention is used, the void-forming agent remaining in the photocatalyst layer is decomposed by the photocatalyst and eventually disappears from the photocatalyst layer. As a result, voids are generated.
In order to cause the void forming agent to disappear when heated at the above temperature, at least one of the thermal decomposition temperature, boiling point, or sublimation temperature of the void forming agent is not higher than the thermal decomposition temperature of the fluororesin. It will be within the range.
In the present application, the thermal decomposition temperature refers to a temperature at which the weight of a substance (for example, a void forming agent or a fluororesin) is reduced by 10% when the temperature is increased from room temperature to 10 ° C./min in air.
本願発明で分散液に含有させるフッ素樹脂しては、例えば、ポリテトラフルオロエチレン（ＰＴＦＥ）、テトラフルオロエチレン-エチレン共重合体（ＥＴＦＥ）、テトラフルオロエチレン-ヘキサフルオロプロピレン共重合体（ＦＥＰ）、テトラフルオロエチレン-パーフルオロアルキルビニルエーテル共重合体（ＰＦＡ）を挙げることができる。フッ素樹脂として２種類以上のものを用いてもよい。 Examples of the fluororesin contained in the dispersion in the present invention include polytetrafluoroethylene (PTFE), tetrafluoroethylene-ethylene copolymer (ETFE), tetrafluoroethylene-hexafluoropropylene copolymer (FEP), A tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA) can be mentioned. Two or more kinds of fluororesins may be used.
本願発明で用いる光触媒粉は、既知の光触媒の粉末であれば基本的にどのようなものでも構わない。光触媒としては、二酸化チタン、三酸化チタン、酸化亜鉛などの公知の材料を利用できる。
光触媒粉は、例えば、高活性タイプの光触媒と、ガス吸着タイプの光触媒の少なくとも一方を含むものとすることができる。
高活性タイプの光触媒は、セルフクリーニング機能をより良く発揮するようにされた光触媒であり、例えば石原産業株式会社製の品番ＳＴ−０１や、品番ＳＴ−２１がこれにあたる。高活性タイプの光触媒の例として、二酸化チタンの場合であれば、アナターゼ型とルチル型の２種類が光触媒として一般的に用いられる。特に、その粒子径を小さくしてその表面積を増大させることによってその活性を増大させたアナターゼ型の二酸化チタンは、高活性タイプの光触媒の典型例である。
ガス吸着タイプの光触媒は、光触媒粉の周りに気体中の有害ガスを吸着するための物質が被覆されているものであり、例えば石原産業株式会社製のＳＴ−３１がこれにあたる。
前者を用いるとセルフクリーニング機能を効率よく発揮させることができるという利点が、後者を用いると、気体中の有害物質が効率よく吸着分解されるため気体浄化に優れるという利点をそれぞれ得られるが、両者を用いると両者を併せた効果を得られるだけでなく、両者を単独で利用するよりもガス分解性が高くなるという利点を得られる。
The photocatalyst powder used in the present invention may be basically any one as long as it is a known photocatalyst powder. As the photocatalyst, known materials such as titanium dioxide, titanium trioxide, and zinc oxide can be used.
The photocatalyst powder may include, for example, at least one of a highly active type photocatalyst and a gas adsorption type photocatalyst.
The high activity type photocatalyst is a photocatalyst that is made to exhibit the self-cleaning function better. For example, product number ST-01 manufactured by Ishihara Sangyo Co., Ltd. and product number ST-21 correspond to this. As an example of a highly active photocatalyst, in the case of titanium dioxide, two types of anatase type and rutile type are generally used as the photocatalyst. In particular, anatase-type titanium dioxide whose activity is increased by reducing its particle size and increasing its surface area is a typical example of a highly active photocatalyst.
In the gas adsorption type photocatalyst, a substance for adsorbing a harmful gas in the gas is coated around the photocatalyst powder. For example, ST-31 manufactured by Ishihara Sangyo Co., Ltd. corresponds to this.
If the former is used, the advantage that the self-cleaning function can be exhibited efficiently is obtained, and if the latter is used, the harmful substances in the gas are efficiently adsorbed and decomposed, so that the advantage of gas purification is obtained. In addition to obtaining the combined effect, it is possible to obtain the advantage of higher gas decomposability than using both alone.
本願発明で分散液に含有させる空隙形成剤は、それがその場所から消失した後に光触媒層の中に空隙を残せるようなものであればどのような種類の物質であってもよいが、有機系の高分子材料を空隙形成剤として用いることができる。より具体的には、ポリアクリル酸塩、ポリビニルアルコール、ナフタレンスルホン酸塩のホルマリン縮合物、ジイソブチレンとマレイン酸の共重合物の塩などを空隙形成剤として利用できる。空隙形成剤として２種類以上のものを用いてもよい。空隙形成剤は、その熱分解温度が３００℃以下のものを用いると、フッ素樹脂の熱分解温度以下であり、且つ空隙形成剤の熱分解温度、沸点又は昇華温度以上の温度を幅広く取れる場合が多い。また、空隙形成剤の熱分解温度、沸点又は昇華温度は、分散液中の水分を乾燥させることのできる温度以上の温度であればよく、１５０℃以上であることが好ましい。そうすることにより、分散液を乾燥している間に空隙形成剤が分散液中から消失することを防止し易くなる。この程度熱分解温度、沸点又は昇華温度が高い空隙形成剤であれば、加熱中に十分な孔が形成され易い。上に例示した空隙形成剤はいずれも、熱分解温度、沸点又は昇華温度のうちの少なくとも１つが、１５０℃以上３００℃以下である。 The void forming agent to be included in the dispersion in the present invention may be any kind of substance as long as it can leave voids in the photocatalyst layer after disappearance from the place, These polymer materials can be used as a void forming agent. More specifically, a polyacrylate, polyvinyl alcohol, a formalin condensate of naphthalene sulfonate, a salt of a copolymer of diisobutylene and maleic acid, and the like can be used as the void forming agent. Two or more kinds of void forming agents may be used. If a void forming agent having a thermal decomposition temperature of 300 ° C. or lower is used, it may be lower than the thermal decomposition temperature of the fluororesin, and a wide range of temperatures above the thermal decomposition temperature, boiling point or sublimation temperature of the void forming agent may be taken. Many. In addition, the thermal decomposition temperature, boiling point or sublimation temperature of the void forming agent may be any temperature that is at least a temperature at which moisture in the dispersion can be dried, and is preferably 150 ° C. or higher. By doing so, it becomes easy to prevent the void-forming agent from disappearing from the dispersion while the dispersion is being dried. If the void forming agent has such a high thermal decomposition temperature, boiling point or sublimation temperature, sufficient pores are easily formed during heating. In any of the void forming agents exemplified above, at least one of the thermal decomposition temperature, the boiling point, and the sublimation temperature is 150 ° C. or higher and 300 ° C. or lower.
本発明におけるシート基材は公知の適当なもので構わない。
例えば、その素材は、ガラス繊維、シリカ繊維、バサルト繊維、シリコンカーバイド繊維等の無機繊維であってもよいし、ステンレス繊維、銅繊維、チタン繊維等の金属繊維であってもよい。
シート基材は、また、織布であってもよいし、編物であってもよいし、不織布であってもよい。
シート基材は、また、織布、編物、不織布などによって形成された芯材の少なくとも一方の面に、合成樹脂及び／又はゴム材料を被覆したものであってもよい。かかる被覆を行う場合には、その被覆により形成される層は何層であってもよい。
The sheet base material in the present invention may be a known appropriate material.
For example, the material may be an inorganic fiber such as glass fiber, silica fiber, basalt fiber, or silicon carbide fiber, or may be a metal fiber such as stainless fiber, copper fiber, or titanium fiber.
The sheet base material may be a woven fabric, a knitted fabric, or a non-woven fabric.
The sheet base material may be one in which at least one surface of a core material formed of a woven fabric, a knitted fabric, a nonwoven fabric, or the like is coated with a synthetic resin and / or a rubber material. When such coating is performed, any number of layers may be formed by the coating.
本願発明では、分散液中のフッ素樹脂、光触媒粉、空隙形成剤の割合には特に制限はない。もっとも空隙形成剤がなくなった後の空隙を光触媒層中に適当な大きさ及び数で作るには、空隙形成剤は、分散液に０．５〜５重量％含有されるのがよい。必ずしもそうする必要はないが、光触媒層の比表面積を０．３ｍ２／ｇ〜０．６ｍ２／ｇ程度とすると、環境汚染物質の吸着性で有利となる。
光触媒粉と空隙形成剤の分散液に占める好ましい割合は、光触媒粉が１０重量％〜６０重量％、空隙形成剤が０．５重量％〜５．０重量％である。ただし、光触媒粉と空隙形成剤の重量比は３：１〜２：１の範囲であるのが好ましい。それらの比率がこの範囲であると、光触媒粉の分散性が良くなり光触媒層を多孔質化させ易くなる。分散液には界面活性剤が含まれていてもよい。界面活性剤は、分散液中に０．１重量％〜１．０重量％含まれていてもよ界面活性剤を含有させると、分散液のシート基材への塗工性が高まる。
分散液の特定表面への塗布量は、適当に決定することができる。例えば、５０〜１００ｇ／ｍ２程度の分散液を特定表面へ塗布するようにすることができる。これにより、光触媒層の比表面積を適当な範囲に治めやすくなるとともに、光触媒シートの強度や柔軟性を確保し易くなる。
In the present invention, the ratio of the fluororesin, photocatalyst powder, and void forming agent in the dispersion is not particularly limited. However, in order to create a void having an appropriate size and number in the photocatalyst layer after the void-forming agent is eliminated, the void-forming agent is preferably contained in the dispersion by 0.5 to 5% by weight. It need not necessarily be so, when the specific surface area of the photocatalyst layer and 0.3m 2 /g~0.6m 2 / g approximately, which is advantageous in adsorption of environmental pollutants.
The preferred ratio of the photocatalyst powder and the void forming agent in the dispersion is 10 wt% to 60 wt% for the photocatalyst powder and 0.5 wt% to 5.0 wt% for the void forming agent. However, the weight ratio of the photocatalyst powder to the void forming agent is preferably in the range of 3: 1 to 2: 1. When the ratio is within this range, the dispersibility of the photocatalyst powder is improved and the photocatalyst layer is easily made porous. The dispersion may contain a surfactant. The surfactant may be contained in the dispersion liquid in an amount of 0.1% by weight to 1.0% by weight. When the surfactant is contained, the coating property of the dispersion liquid on the sheet base material is enhanced.
The amount of the dispersion applied to the specific surface can be appropriately determined. For example, a dispersion of about 50 to 100 g / m 2 can be applied to a specific surface. Thereby, it becomes easy to control the specific surface area of the photocatalyst layer to an appropriate range, and it becomes easy to ensure the strength and flexibility of the photocatalyst sheet.
以下、本発明の好ましい一実施形態を説明する。
この実施形態では、以下のような方法で光触媒シートを得る。
この実施形態では、まず、シート基材の一方の表面に、以下のような分散液を塗布する。シート基材の分散液が塗布される表面が、本願発明でいう特定表面である。この実施形態ではそうしないが、シート基材の双方の表面に分散液を塗布することもできる。この場合、シート基材の双方の表面が特定表面になる。
なお、シート基材は、ガラス繊維を織って形成した芯材の両表面をＰＴＦＥで覆い、更にその両表面をＦＥＰで覆ったものである。もっとも、シート基材は、ＰＴＦＥやＦＥＰで必ずしも覆われていなくてもよく、また、これら以外の他の層で覆われていてもよい。芯材は、無機繊維（例えば、シリカ繊維、バサルト繊維、シリコンカーバイド繊維）又は金属繊維（例えば、ステンレス繊維、銅繊維、チタン繊維）でできていてもよく、また、必ずしも織ったものでなく、編物であっても、不織布であってもよい。
Hereinafter, a preferred embodiment of the present invention will be described.
In this embodiment, a photocatalytic sheet is obtained by the following method.
In this embodiment, first, the following dispersion liquid is applied to one surface of a sheet base material. The surface to which the dispersion liquid of the sheet base material is applied is the specific surface referred to in the present invention. Although not in this embodiment, the dispersion can also be applied to both surfaces of the sheet substrate. In this case, both surfaces of the sheet substrate are specific surfaces.
The sheet base material is obtained by covering both surfaces of a core material formed by weaving glass fibers with PTFE and further covering both surfaces with FEP. But the sheet | seat base material does not necessarily need to be covered with PTFE or FEP, and may be covered with other layers other than these. The core material may be made of inorganic fiber (for example, silica fiber, basalt fiber, silicon carbide fiber) or metal fiber (for example, stainless fiber, copper fiber, titanium fiber), and is not necessarily woven, It may be a knitted fabric or a non-woven fabric.
分散液には、フッ素樹脂と、光触媒粉と、空隙形成剤と、界面活性剤が含まれる。
この実施形態におけるフッ素樹脂はＦＥＰである。もっとも、フッ素樹脂としては、ＰＴＦＥ、ＥＴＦＥ、ＰＦＡ等を用いてもよい。より詳細には、この実施形態では、分散液を調整するために、ＦＥＰの水系ディスパージョン（固形分５４重量％）を用いた。
この実施形態における光触媒粉は、二酸化チタンの粉である。もっとも、光触媒としては、三酸化チタン、酸化亜鉛など他の材料を利用できる。より詳細には、この実施形態では、分散液を調整する際に、高活性タイプアナターゼ型酸化チタン光触媒（石原産業社製、品番ＳＴ−０１、１次粒子径：７ｎｍ、表面積：３００ｍ２／ｇ、表面処理：無し）の水系分散体（特注品、固形分２５重量％）を用いた。
空隙形成剤は、その熱分解温度、沸点又は昇華温度のいずれかが、フッ素樹脂の熱分解温度よりも低い物質である。この実施形態の空隙形成剤は、その熱分解温度が１５０℃以上３００℃以下のものである。より詳細には、この実施形態における空隙形成剤は、ポリアクリル酸塩である。もっとも、空隙形成剤はこれに限られず、ポリビニルアルコール、ナフタレンスルホン酸塩のホルマリン縮合物、ジイソブチレンとマレイン酸の共重合物の塩等が利用できる。
この実施形態の界面活性剤は、これには限られないがシリコン系界面活性剤である。
以上で説明した、ＦＥＰの水系ディスパージョン３７ｇ、高活性タイプアナターゼ型酸化チタン光触媒の水系分散体２０ｇ、ポリアクリル酸塩１．３ｇ、シリコン系界面活性剤１．３ｇと、精製水３０ｇとを混合、攪拌し、分散液とした。このとき、ＦＥＰと高活性タイプアナターゼ型酸化チタン光触媒の重量比は略４：１となった。
The dispersion contains a fluororesin, photocatalyst powder, a void forming agent, and a surfactant.
The fluororesin in this embodiment is FEP. However, PTFE, ETFE, PFA, or the like may be used as the fluororesin. More specifically, in this embodiment, an aqueous dispersion of FEP (solid content of 54% by weight) was used to adjust the dispersion.
The photocatalytic powder in this embodiment is a titanium dioxide powder. However, other materials such as titanium trioxide and zinc oxide can be used as the photocatalyst. More specifically, in this embodiment, when preparing the dispersion, a highly active anatase-type titanium oxide photocatalyst (manufactured by Ishihara Sangyo Co., Ltd., product number ST-01, primary particle size: 7 nm, surface area: 300 m 2 / g , Surface treatment: none) aqueous dispersion (custom product, solid content 25 wt%) was used.
The void forming agent is a substance whose thermal decomposition temperature, boiling point or sublimation temperature is lower than the thermal decomposition temperature of the fluororesin. The void forming agent of this embodiment has a thermal decomposition temperature of 150 ° C. or higher and 300 ° C. or lower. More specifically, the void forming agent in this embodiment is a polyacrylate. However, the void forming agent is not limited to this, and polyvinyl alcohol, a formalin condensate of naphthalene sulfonate, a salt of a copolymer of diisobutylene and maleic acid, and the like can be used.
The surfactant in this embodiment is a silicon surfactant, although not limited thereto.
As described above, 37 g of FEP aqueous dispersion, 20 g of aqueous dispersion of highly active anatase-type titanium oxide photocatalyst, 1.3 g of polyacrylate, 1.3 g of silicon surfactant, and 30 g of purified water are mixed. , Stirred to obtain a dispersion. At this time, the weight ratio of FEP to the highly active anatase-type titanium oxide photocatalyst was about 4: 1.
上述の分散液を、バーコート法により、シート基材の片面の全面に塗布した。その後分散液を常温で自然乾燥させてから、６０℃で３００秒加熱し、更に３６０℃で１８０秒加熱して光触媒層を焼成した。その後、光触媒層がその片面に形成されたシート基材を自然冷却し、漂白のために屋外で一定時間暴露することにより、光触媒シートを得た。
なお、この実施形態におけるフッ素樹脂であるＦＥＰの融点は２７０℃、熱分解温度は４８０℃であり、この実施形態における空隙形成剤の熱分解温度は１８０℃であるから、焼成の際の温度である３６０℃は、フッ素樹脂の融点以上熱分解温度以下であり、且つ空隙形成剤の熱分解温度以上の温度である。フッ素樹脂と空隙形成剤の少なくとも一方を変更した場合には、この条件を満たすように焼成の際の温度を変更する。なお、焼成の温度は、フッ素樹脂の融点以上熱分解温度以下であり、且つ空隙形成剤の沸点又は昇華温度以上であってもよい。
The above dispersion was applied to the entire surface of one side of the sheet base material by a bar coating method. Thereafter, the dispersion was naturally dried at room temperature, then heated at 60 ° C. for 300 seconds, and further heated at 360 ° C. for 180 seconds to fire the photocatalyst layer. Then, the sheet base material in which the photocatalyst layer was formed on one side was naturally cooled, and exposed to the outdoors for a certain time for bleaching to obtain a photocatalyst sheet.
In this embodiment, FEP, which is a fluororesin, has a melting point of 270 ° C. and a thermal decomposition temperature of 480 ° C., and the thermal decomposition temperature of the void forming agent in this embodiment is 180 ° C. A certain 360 ° C. is a temperature not lower than the melting point of the fluororesin and not higher than the thermal decomposition temperature and not lower than the thermal decomposition temperature of the void forming agent. When at least one of the fluororesin and the void forming agent is changed, the temperature during firing is changed so as to satisfy this condition. The firing temperature may be not less than the melting point of the fluororesin and not more than the thermal decomposition temperature, and may be not less than the boiling point or sublimation temperature of the void forming agent.
上述のようにして得た光触媒シート（「試料１」という。）に対して試験を行った。
なお、試料１と対比するため、試料１とは異なる光触媒シート（「試料２」という。）を作成した。試料２の光触媒シートは、基本的に試料１の光触媒シートと同じ方法で製造され、基本的に試料１の光触媒シートと同じものとなっている。ただし、試料２の光触媒シートを製造する場合には、分散液に空隙形成剤を混合しなかった。試料２の光触媒を製造する方法は、その１点でのみ試料１の光触媒シートを製造する方法と異なっている。
The test was performed on the photocatalyst sheet obtained as described above (referred to as “Sample 1”).
For comparison with Sample 1, a photocatalytic sheet different from Sample 1 (referred to as “Sample 2”) was prepared. The photocatalyst sheet of sample 2 is basically manufactured in the same manner as the photocatalyst sheet of sample 1, and is basically the same as the photocatalyst sheet of sample 1. However, when producing the photocatalyst sheet of Sample 2, no void forming agent was mixed into the dispersion. The method for producing the photocatalyst of sample 2 is different from the method of producing the photocatalytic sheet of sample 1 only at one point.
試験は、株式会社島津テクノリサーチが実施するＮ２ガス吸着法により、試料１と試料２のガスの吸着量を測定することにより行った。
試験結果を、以下の表１に示す。
試料１と試料２の比表面積には、２２０ｍ２／膜ｍ２の差が有り、試料１はその比表面積が試料２よりも顕著に大きいことが明らかになった。
これは、試料１の光触媒シートが多くの空隙を有する多孔質のものであることを示している。
The test was performed by measuring the gas adsorption amounts of Sample 1 and Sample 2 by the N 2 gas adsorption method carried out by Shimadzu Techno Research Co., Ltd.
The test results are shown in Table 1 below.
The specific surface area of Sample 1 and Sample 2 has a difference of 220 m 2 / membrane m 2 , and it was revealed that Sample 1 has a significantly larger specific surface area than Sample 2.
This indicates that the photocatalyst sheet of Sample 1 is porous having many voids.
Claims (2)
前記特定表面に、フッ素樹脂と、光触媒粉と、空隙形成剤と、を含有した分散液であり、前記空隙形成剤を、０．５〜５重量％含有し、前記光触媒粉と前記空隙形成剤の重量比が３：１〜２：１の範囲であるものを塗布し、
前記分散液を塗布したシート基材を、前記フッ素樹脂の融点以上熱分解温度以下であり、且つ前記空隙形成剤の熱分解温度、沸点、又は昇華温度以上の温度で加熱し、
加熱したそのシート基材を常温まで冷却することで、前記特定表面に光触媒層を設ける、
光触媒シートの製造方法。 A photocatalyst sheet manufacturing method for forming a photocatalyst layer on a specific surface provided with a photooxidation function by providing a photocatalyst layer on at least one surface of a sheet substrate,
A dispersion containing a fluororesin, a photocatalyst powder, and a void forming agent on the specific surface, and containing 0.5 to 5% by weight of the void forming agent, and the photocatalyst powder and the void forming agent. A weight ratio of 3: 1 to 2: 1 is applied,
The sheet base material coated with the dispersion is heated at a temperature not lower than the melting point of the fluororesin and not higher than the thermal decomposition temperature, and not lower than the thermal decomposition temperature, boiling point, or sublimation temperature of the void forming agent,
By cooling the heated sheet base material to room temperature, a photocatalytic layer is provided on the specific surface.
A method for producing a photocatalytic sheet.
請求項１記載の光触媒シートの製造方法。 As the void forming agent, those having a thermal decomposition temperature, boiling point or sublimation temperature of 300 ° C. or less are used.
The manufacturing method of the photocatalyst sheet of Claim 1.
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