JP5102541B2 - Insulated wire - Google Patents

Insulated wire Download PDF

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JP5102541B2
JP5102541B2 JP2007150372A JP2007150372A JP5102541B2 JP 5102541 B2 JP5102541 B2 JP 5102541B2 JP 2007150372 A JP2007150372 A JP 2007150372A JP 2007150372 A JP2007150372 A JP 2007150372A JP 5102541 B2 JP5102541 B2 JP 5102541B2
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insulating film
conductor
film
innermost
insulated wire
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JP2008305620A (en
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祐樹 本田
好幸 安藤
富也 阿部
正義 後藤
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Hitachi Cable Ltd
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Hitachi Cable Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00Coils
    • H01F5/06Insulation of windings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/12Insulating of windings

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Coils Of Transformers For General Uses (AREA)
  • Insulated Conductors (AREA)

Description

本発明は、モータやトランスなどの電気機器に用いる絶縁電線に係り、曲げ加工等の耐性に優れた絶縁電線に関する。   The present invention relates to an insulated wire used in an electric device such as a motor or a transformer, and relates to an insulated wire excellent in resistance to bending or the like.

一般的に、エナメル線と呼ばれる絶縁電線は、導体の周りに絶縁塗料からなる絶縁皮膜を設けてなる。このエナメル線を使用して電気機器、例えば、モータやトランスなどを作製する場合、一般的にはモータのコア(磁芯)のスロットに連続的にエナメル線をコイル状に巻回して形成したり、或いはエナメル線をコイル状に巻いたものをコアのスロットに嵌合、挿入したりする方法が主流であった。   In general, an insulated wire called an enameled wire is provided with an insulating film made of an insulating paint around a conductor. When an electrical device such as a motor or a transformer is manufactured using this enameled wire, the enameled wire is generally wound around a slot of a motor core (magnetic core) continuously in a coil shape. Alternatively, a method in which an enameled wire wound in a coil shape is fitted and inserted into a slot of the core has been the mainstream.

近年、例えば、自動車の発電機などに使用されている電気機器のコイルは、小型で、かつ、高密度の磁束が要求されていることから、断面積の大きい(太サイズの)エナメル線や、平角導体を有するエナメル線を用いる。このようなエナメル線を用いて、モータやトランスなどを作製する場合、巻き数の少ない短尺の小径コイルを複数形成し、これら小径コイルのエナメル線の端末部分を溶接して繋ぎ合わせ、長尺のコイルを形成する方法が提案されている。   In recent years, for example, coils of electrical equipment used in automobile generators are small and require high-density magnetic flux, so enamel wires with a large cross-sectional area (thick size), An enameled wire with a flat rectangular conductor is used. When manufacturing motors, transformers, etc. using such enameled wires, form a plurality of short small-diameter coils with a small number of turns, weld the end portions of the enameled wires of these small-diameter coils, and connect them together. A method of forming a coil has been proposed.

自動車の発電機などに用いる電気機器のコイルには、導体の周りにポリエステルイミドの絶縁皮膜を形成し、そのポリエステルイミド絶縁皮膜の周りにポリアミドイミドの絶縁皮膜を設けたダブルコート線や、導体の周りにポリアミドイミドの絶縁皮膜を設けたシングルコート線が主に使用されている。また、一部では、導体の周りにポリイミドの絶縁皮膜を形成し、そのポリイミド絶縁皮膜の周りにポリアミドイミドの絶縁皮膜を設け、耐熱性と機械強度を向上させたダブルコート線なども使用されている(例えば、特許文献1参照)。   For coils of electrical equipment used in automobile generators, etc., a double-coated wire with a polyesterimide insulation film formed around the conductor and a polyamideimide insulation film around the polyesterimide insulation film, Single-coated wires with an insulating coating of polyamideimide around are mainly used. In some cases, double-coated wires with a polyimide insulating film formed around the conductor and a polyamide-imide insulating film around the polyimide insulating film to improve heat resistance and mechanical strength are also used. (For example, refer to Patent Document 1).

また、エナメル線に必要とされる機械的特性、耐熱性、可とう性及び電気絶縁特性などを維持しつつ、導体との密着性、耐摩耗性及び熱劣化後の密着性に優れた皮膜を形成しうるイソシアヌレート環を有するポリエステルイミド樹脂なども使用されている(例えば、特許文献2参照)。   In addition, while maintaining the mechanical properties, heat resistance, flexibility, and electrical insulation properties required for enameled wires, a film with excellent adhesion to conductors, wear resistance, and adhesion after thermal degradation A polyesterimide resin having an isocyanurate ring that can be formed is also used (see, for example, Patent Document 2).

特開平5−130759号公報Japanese Patent Laid-Open No. 5-130759 特開2006−001996公報JP 2006-001996 A

しかし、従来のポリエステルイミドとポリアミドイミドの絶縁皮膜とからなるエナメル線を用いて、コア(磁芯)のスロットに連続的に巻回して電気機器用コイルを作製する場合や、上記電気機器用コイルをコアのスロットに嵌合、挿入する場合などにおいて発生する曲げ加工などに起因する応力により、絶縁皮膜が導体表面から押し上げられ、導体から剥離する皮膜浮きが発生してしまい、電気機器の信頼性が低下するという問題があった。   However, when using a conventional enameled wire made of polyesterimide and polyamideimide and winding it continuously around a core (magnetic core) slot to produce a coil for electrical equipment, The insulation film is pushed up from the surface of the conductor due to the stress caused by the bending process that occurs when the core is fitted and inserted into the slot of the core. There was a problem that decreased.

また、エナメル線製造の伸線工程において、絶縁皮膜表面に大きな凹凸が生じてしまい、部分的に絶縁破壊が発生するなど、電気的特性が低下するという問題があった。   Further, in the wire drawing process of enameled wire production, there is a problem that electrical characteristics deteriorate, such as large irregularities on the surface of the insulating film and partial dielectric breakdown.

一方、シランカップリング剤を添加したエナメル線用塗料を導体に塗布、焼付することも行われている。しかし、この方法では、特に、エナメル線用塗料がチタン系触媒を含むポリエステルイミド系樹脂塗料である場合、シランカップリング剤がエナメル線用塗料中に存在するチタン系触媒の硬化作用を阻害する為、エナメル線用塗料の硬化が促進されず、最外絶縁皮膜の硬度が低くなってしまういといった問題がある。特に、最外絶縁皮膜の鉛筆硬度が4H以下の場合、曲げ加工等の加工工程で、表面に傷が発生し、優れた絶縁皮膜を形成することができないという問題があった。   On the other hand, an enameled wire paint to which a silane coupling agent is added is applied to a conductor and baked. However, in this method, particularly when the enamel wire paint is a polyesterimide resin paint containing a titanium catalyst, the silane coupling agent inhibits the curing action of the titanium catalyst present in the enamel wire paint. There is a problem that the hardening of the enameled wire coating is not accelerated and the hardness of the outermost insulating film is lowered. In particular, when the pencil hardness of the outermost insulating film is 4H or less, there is a problem that a surface is damaged in a processing step such as bending and an excellent insulating film cannot be formed.

そこで、本発明の目的は、上記課題を解決し、曲げ加工等の耐性に優れた絶縁電線を提供することにある。   Then, the objective of this invention is providing the insulated wire excellent in tolerance, such as a bending process, solving the said subject.

上記目的を達成するために本発明は、導体と、該導体の外周に3−グリシドキシプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシランのいずれかのシランカップリング剤を塗布して形成された最内絶縁皮膜と上記最内絶縁皮膜上にエナメル線塗料を塗布、焼き付けして形成されたポリエステルイミド皮膜、あるいはポリアミドイミド皮膜からなる最外絶縁皮膜とからなる絶縁皮膜とを備え、上記最内絶縁皮膜の膜厚が上記絶縁皮膜全体の膜厚の5%以下であるものである。 In order to achieve the above object, the present invention is formed by applying a conductor and a silane coupling agent of 3-glycidoxypropyltrimethoxysilane or 3-aminopropyltrimethoxysilane to the outer periphery of the conductor. and innermost insulating coating and applying an enamel wire coating on the innermost insulating coating comprises an insulating film comprising a polyester-imide film is formed by baking, or the outermost insulation film comprising polyamide-imide film, and the The film thickness of the innermost insulating film is 5% or less of the film thickness of the entire insulating film .

上記導体の平均表面粗さRaが0.2〜1.0μmであってもよい。   The average surface roughness Ra of the conductor may be 0.2 to 1.0 μm.

上記導体から上記絶縁皮膜を剥離させる剥離強度が300N/m以上であってもよい。   The peel strength for peeling the insulating film from the conductor may be 300 N / m or more.

上記最外絶縁皮膜は、JIS S 6006による鉛筆硬度で6H以上を有してもよい。   The outermost insulating film may have a pencil hardness according to JIS S 6006 of 6H or more.

上記絶縁皮膜は、上記導体の外周に上記最内絶縁皮膜の材料としての塗料を塗布し、焼き付けすることで上記最内絶縁皮膜を形成した後、その最内絶縁皮膜の外周に上記最外絶縁皮膜の材料としての塗料を塗布し、焼き付けすることで上記最外絶縁皮膜を形成してなってもよい。   The insulating film is formed by applying a paint as a material for the innermost insulating film on the outer periphery of the conductor and baking the outermost insulating film, and then forming the outermost insulating film on the outer periphery of the innermost insulating film. The outermost insulating film may be formed by applying a paint as a film material and baking it.

上記導体は、平角導体であってもよい。   The conductor may be a flat conductor.

本発明によれば、絶縁性能と耐加工性に優れた絶縁電線を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the insulated wire excellent in insulation performance and workability can be provided.

以下、本発明の一実施形態を添付図面に基づいて詳述する。   Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

図1に示されるように、本発明に係る絶縁電線1は、導体2と、導体2の外周にシランカップリング剤を塗布して形成された最内絶縁皮膜4と最内絶縁皮膜4上にエナメル線塗料を塗布、焼き付けして形成された最外絶縁皮膜5とからなる絶縁皮膜3とを備えるものである。最内絶縁皮膜4の膜厚が絶縁皮膜3全体の膜厚の5%以下であるのが好ましい。   As shown in FIG. 1, an insulated wire 1 according to the present invention includes a conductor 2, an innermost insulating film 4 formed by applying a silane coupling agent to the outer periphery of the conductor 2, and an innermost insulating film 4. And an insulating film 3 comprising an outermost insulating film 5 formed by applying and baking an enamel wire paint. The film thickness of the innermost insulating film 4 is preferably 5% or less of the film thickness of the entire insulating film 3.

図1に示した絶縁電線1は、導体2として断面が円形の丸形導体を用いているので、この導体2を最内絶縁皮膜4、最外絶縁皮膜5が順次同心円状に覆うように形成されている。   Since the insulated wire 1 shown in FIG. 1 uses a round conductor having a circular cross section as the conductor 2, the conductor 2 is formed so that the innermost insulating film 4 and the outermost insulating film 5 are sequentially concentrically covered. Has been.

また、図2に示されるように、本発明に係る絶縁電線1aは、導体2aと、導体2aの外周にシランカップリング剤を塗布して形成された最内絶縁皮膜4aと最内絶縁皮膜4a上にエナメル線塗料を塗布、焼き付けして形成された最外絶縁皮膜5aとからなる絶縁皮膜3aとを備えるものである。   As shown in FIG. 2, the insulated wire 1a according to the present invention includes a conductor 2a, an innermost insulating film 4a formed by applying a silane coupling agent to the outer periphery of the conductor 2a, and an innermost insulating film 4a. An insulating film 3a comprising an outermost insulating film 5a formed by applying and baking an enameled wire paint thereon is provided.

図2に示した絶縁電線1aは、導体2aとして断面が平角の平角形導体を用いており、この導体2aを最内絶縁皮膜4a、最外絶縁皮膜5aが順次覆うように形成されている。以下の説明では、符号aは用いないが、絶縁電線1,1aに共通した内容を示す。   The insulated wire 1a shown in FIG. 2 uses a rectangular conductor with a flat cross section as the conductor 2a, and the conductor 2a is formed so as to cover the innermost insulating film 4a and the outermost insulating film 5a sequentially. In the following description, the symbol a is not used, but the contents common to the insulated wires 1 and 1a are shown.

導体2の構成材の材質としては、エナメル線導体として慣用的に用いられているものであれば全て適用可能であり、特に限定するものではないが、銅又は銅合金が好ましい。また、導体2の断面形状についても、特に限定するものではなく、円形導体、平角導体などのようにいずれであってもよい。さらに、導体2の断面積(サイズ)についても、特に限定するものではなく、エナメル線導体として慣用的に用いられているものであれば全て適用可能である。   The material of the constituent material of the conductor 2 is not particularly limited as long as it is conventionally used as an enameled wire conductor, and copper or a copper alloy is preferable. Also, the cross-sectional shape of the conductor 2 is not particularly limited, and may be any one such as a circular conductor or a flat conductor. Further, the cross-sectional area (size) of the conductor 2 is not particularly limited, and any conductor that is conventionally used as an enameled wire conductor can be applied.

この導体2に過酸化水素水、硫酸を用いたエッチング処理で平均表面粗さRaが0.2〜1.0である粗化処理面を形成することが好ましい。平均表面粗さRaが0.2未満である場合、皮膜浮きや、ブリスタ発生を抑制する効果が小さくなる。平均表面粗さRaが1.0を超える場合、絶縁破壊といった、電気特性の低下が発生する。   It is preferable to form a roughened surface having an average surface roughness Ra of 0.2 to 1.0 on the conductor 2 by etching using hydrogen peroxide and sulfuric acid. When the average surface roughness Ra is less than 0.2, the effect of suppressing film floating and blister generation is reduced. When the average surface roughness Ra exceeds 1.0, a decrease in electrical characteristics such as dielectric breakdown occurs.

最内絶縁皮膜4の材料となるシランカップリング剤としては、導体2と最内絶縁皮膜4との密着強度を向上させ、かつ最外絶縁皮膜5との密着強度を向上する作用を奏するものであれば特に限定するものではない。例えば、3−グリシドキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリメトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、N−2−(アミノエチル)−3−アミノプロピルプロピルトリメトキシシラン、3−メルカプトプロピルトリメトキシシラン等が好ましいが、これらに限定されるものではない。   The silane coupling agent used as the material of the innermost insulating film 4 has an effect of improving the adhesion strength between the conductor 2 and the innermost insulating film 4 and improving the adhesion strength with the outermost insulating film 5. If there is no particular limitation. For example, 3-glycidoxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-2- (Aminoethyl) -3-aminopropylpropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and the like are preferable, but are not limited thereto.

最外絶縁皮膜5の材料としては、ポリエステルイミド系樹脂、ポリアミドイミド系樹脂、ポリイミド系樹脂、ポリエステル系樹脂、ポリウレタン系樹脂を1種類以上用いるのがましい。すなわち、最外絶縁皮膜5は、ポリエステルイミド皮膜、ポリアミドイミド皮膜、ポリイミド皮膜、ポリエステル皮膜、ポリウレタン皮膜のいずれかである。   As the material of the outermost insulating film 5, it is preferable to use one or more kinds of polyesterimide resin, polyamideimide resin, polyimide resin, polyester resin, and polyurethane resin. That is, the outermost insulating film 5 is any one of a polyesterimide film, a polyamideimide film, a polyimide film, a polyester film, and a polyurethane film.

これら最内絶縁皮膜4の材料、最外絶縁皮膜5の材料は、塗料(エナメル線用塗料)の状態で提供される。従って、導体2の外周に最内絶縁皮膜4の材料としての塗料を塗布し、焼き付けすることで最内絶縁皮膜4を形成した後、その最内絶縁皮膜4の外周に最外絶縁皮膜5の材料としての塗料を塗布し、焼き付けすることで最外絶縁皮膜5を形成し、絶縁皮膜3が作製される。塗料の銘柄に関しては特に制限することはない。   The material of the innermost insulating film 4 and the material of the outermost insulating film 5 are provided in the state of paint (enamel wire paint). Accordingly, the innermost insulating film 4 is formed by applying a paint as the material of the innermost insulating film 4 to the outer periphery of the conductor 2 and baking it, and then the outermost insulating film 5 is formed on the outer periphery of the innermost insulating film 4. The outermost insulating film 5 is formed by applying and baking a paint as a material, and the insulating film 3 is produced. There are no particular restrictions on the brand of paint.

本発明にあっては、最内絶縁皮膜4の膜厚が、絶縁皮膜3全体(最内絶縁皮膜4と最外絶縁皮膜5)の膜厚の5%以下でなければならず、1%以下であるのが好ましい。最内絶縁皮膜4の膜厚が絶縁皮膜3全体の膜厚の5%を超えた場合、皮膜浮きやブリスタ発生を抑制する効果が小さくなるためである。   In the present invention, the film thickness of the innermost insulating film 4 must be 5% or less of the film thickness of the entire insulating film 3 (the innermost insulating film 4 and the outermost insulating film 5), and 1% or less. Is preferred. This is because when the film thickness of the innermost insulating film 4 exceeds 5% of the film thickness of the entire insulating film 3, the effect of suppressing film floating and blistering is reduced.

以下、本発明の原理とその作用を説明する。   The principle of the present invention and its operation will be described below.

従来は、コイル状に巻いた絶縁電線をコアのスロットに挿入する際に、そのとき発生する曲げ加工等に起因する応力によって、絶縁皮膜が導体表面から押し上げられ、絶縁皮膜が導体から剥離することにより、絶縁皮膜が浮き上がる。本発明者らは、この絶縁皮膜の浮き上がりを抑制すべく、鋭意研究した結果、以下のことを見出した。
(1)粗化処理面を有する導体2の平均表面粗さRaは、0.2〜1.0μmであることが必要である。導体2を粗化する方法としては過酸化水素水、硫酸を用いたエッチング処理や、銅めっき形成による粗化、サンドブラストによる表面研磨などがあげられるが、これらに限定されるものではない。
(2)導体2に直接接する最内絶縁皮膜4を構成する材料としては、導体2および最外絶縁皮膜5と高密着を発現し、更には導体2の防錆効果を発現するシランカップリング剤が好適である。また、シランカップリング剤からなる最内絶縁皮膜4を形成した後、ポリエステルイミド皮膜で構成される最外絶縁皮膜5を形成する場合、最外絶縁皮膜5中に存在するチタン系触媒の作用を阻害することなく、十分な硬度を有する最外絶縁皮膜5を形成することができる。ポリエステルイミド皮膜の硬化に用いられるチタン系触媒は、テトライソプロピルチタネートやテトラ−n−ブチルチタネートなどの−般に使用される化合物が挙げられる。
(3)ポリエステル皮膜以外に最外絶縁皮膜5としては、耐熱性が高く、熱分解しづらいものを用いることができ、巻線時などの加工を受けた際に傷が生じにくく、耐傷性に優れたポリアミドイミド皮膜、ポリイミド皮膜、ポリエステル皮膜、あるいはポリウレタン皮膜などが挙げられる。
(4)最外絶縁皮膜5を構成する材料としては、導体2に直接接する最内絶縁皮膜4に対する密着強度が高い材料を用いることが必要である。これは、導体2と絶縁皮膜3との密着強度が、導体2から絶縁皮膜3が剥離する力(又は浮き上がる力)よりも高いと、皮膜浮きや、ブリスタ発生を抑制できるためである。
Conventionally, when an insulated wire wound in a coil shape is inserted into a slot of a core, the insulating film is pushed up from the conductor surface due to the stress caused by the bending process, etc., and the insulating film is peeled off from the conductor. As a result, the insulating film rises. As a result of intensive studies to suppress the floating of the insulating film, the present inventors have found the following.
(1) The average surface roughness Ra of the conductor 2 having a roughened surface needs to be 0.2 to 1.0 μm. Examples of the method for roughening the conductor 2 include, but are not limited to, etching using hydrogen peroxide and sulfuric acid, roughening by forming copper plating, and surface polishing by sandblasting.
(2) As a material constituting the innermost insulating film 4 that is in direct contact with the conductor 2, a silane coupling agent that exhibits high adhesion to the conductor 2 and the outermost insulating film 5, and further exhibits a rust prevention effect of the conductor 2. Is preferred. In addition, after forming the innermost insulating film 4 made of a silane coupling agent, when forming the outermost insulating film 5 composed of a polyesterimide film, the action of the titanium-based catalyst present in the outermost insulating film 5 is increased. The outermost insulating film 5 having sufficient hardness can be formed without hindering. Examples of the titanium-based catalyst used for curing the polyesterimide film include commonly used compounds such as tetraisopropyl titanate and tetra-n-butyl titanate.
(3) In addition to the polyester film, the outermost insulating film 5 can be one that has high heat resistance and is difficult to be thermally decomposed. Examples thereof include an excellent polyamideimide film, polyimide film, polyester film, and polyurethane film.
(4) As a material constituting the outermost insulating film 5, it is necessary to use a material having high adhesion strength to the innermost insulating film 4 that is in direct contact with the conductor 2. This is because when the adhesion strength between the conductor 2 and the insulating film 3 is higher than the force (or the lifting force) at which the insulating film 3 peels from the conductor 2, film floating and blister generation can be suppressed.

以上、(1)〜(4)を踏まえ、本発明者らが、更に検討を続けた結果、本発明に至った。すなわち、粗化処理面を有する導体2の周りの最内絶縁皮膜4をシランカップリング剤皮膜とし、最外絶縁皮膜5をポリエステルイミド皮膜、あるいはポリアミドイミド皮膜、あるいはポリイミド皮膜、あるいはポリエステル皮膜、あるいはポリウレタン皮膜とし、最内絶縁皮膜4の膜厚を絶縁皮膜3全体の膜厚の5%以下とする。これにより、導体2と最内絶縁皮膜4との密着強度が300N/m以上となるエナメル線が作製でき、皮膜浮きや、ブリスタ発生を抑制することが可能になる。また、最外絶縁皮膜5は鉛筆硬度が6H以上と高くなり、曲げ加工等の耐性に優れた絶縁皮膜3を形成することが可能である。   As mentioned above, based on (1)-(4), as a result of further investigations by the present inventors, the present invention was reached. That is, the innermost insulating film 4 around the conductor 2 having the roughened surface is a silane coupling agent film, and the outermost insulating film 5 is a polyesterimide film, a polyamideimide film, a polyimide film, a polyester film, or The film thickness of the innermost insulating film 4 is set to 5% or less of the entire film thickness of the insulating film 3. As a result, an enameled wire having an adhesion strength between the conductor 2 and the innermost insulating film 4 of 300 N / m or more can be produced, and it is possible to suppress film floating and blistering. Further, the outermost insulating film 5 has a pencil hardness as high as 6H or more, and it is possible to form the insulating film 3 having excellent resistance to bending.

なお、シランカップリング剤に由来するケイ素原子はX線光電子分光測定(XPS)、エネルギー分散型X線(EDX)、オージェ電子分光(AES)、2次イオン質量分析(SIMS)、高感度反射赤外分光(IRRAS)によって測定可能である。   The silicon atoms derived from the silane coupling agent are X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray (EDX), Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS), and highly sensitive reflection red. It can be measured by external spectroscopy (IRRAS).

本発明は、上述した実施の形態に限定されるものではなく、他にも種々のものが想定されることは言うまでもない。次に、実施例を説明するが、本発明はこの実施例に限定されるものではない。   It goes without saying that the present invention is not limited to the above-described embodiment, and various other types are envisaged. Next, although an example is described, the present invention is not limited to this example.

(実施例1)
平角形状の銅導体を粗化液(HIST−7300;日立化成製)を用い粗化を行った後、3−グリシドキシプロピルトリメトキシシラン(KBM−403;信越化学工業社製)の1%水溶液を、平角形状の銅導体上に塗布し、遠赤外加熱炉により100℃×5分で加熱することで1μmの最内絶縁皮膜を設けた。この最内絶縁皮膜の周りに、ポリエステルイミド塗料(EH−402;大日精化社製)を塗布した後、焼き付けを行い、皮膜厚さが30μmの最外絶縁皮膜を設けた。これによって、絶縁皮膜全体の厚さが31μmのエナメル線を作製した。
(実施倒2)
KBM−903の代わりに3−アミノプロピルトリメトキシシラン(KBE−903;信越化学工業社製)を用いる以外は、実施倒1と同様にして、エナメル線を作製した。
(実施倒3)
ポリエステルイミド塗料の代わりにポリアミドイミド(HI−404;日立化成工業社製)塗料を用いる以外は、実施例1と同様にして、エナメル線を作製した。
(実施例4)
ポリエステルイミド塗料の代わりにポリアミドイミド(HI−404;日立化成工業社製)塗料を用いる以外は、実施例2と同様にして、エナメル線を作製した。
(比較例1)
平角形状の銅導体にポリエステルイミド塗料単体を塗布した後、焼き付けを行うことで単層の絶縁皮膜を設けた。これによって、エナメル線を作製した。
(比較例2)
平角形状の銅導体を3−メタクリロキシプロピルトリメトキシシラン(KBM−503;信越化学工業社製)の10%水溶液を、平角形状の銅導体上に塗布し、遠赤外加熱炉により100℃×5分で加熱することで2μmの最内絶縁皮膜を設けた。この最内絶縁皮膜の周りに、ポリアミドイミド(HI−404;日立化成工業社製)塗料単体を塗布した後、焼き付けを行い、皮膜厚さが30μmの最外絶縁皮膜を設けた。これによって、絶縁皮膜全体の厚さが32μmのエナメル線を作製した。
(比較例3)
平角形状の銅導体を粗化液(HIST−7300;日立化成工業社製)を用い粗化を行った後、3−アミノプロピルトリメトキシシラン(KBM−903;信越化学工業社製)の10%水溶液を、平角形状の銅導体上に塗布し、遠赤外加熱炉により100℃×5分で加熱することで2μmの最内絶縁皮膜を設けた。この最内絶縁皮膜の周りに、ポリアミドイミド(HI−404;日立化成工業社製)塗料単体を塗布した後、焼き付けを行い、皮膜厚さが30μmの最外絶縁皮膜を設けた。これによって、絶縁皮膜全体の厚さが32μmのエナメル線を作製した。
(比較例4)
ポリエステルイミド塗料の代わりにポリアミドイミド塗料を用いる以外は、比較例3と同様にして、エナメル線を作製した。
(比較例5)
平角形状の銅導体を真諭製ブラシで200rpmの回転数で3分研磨した後、ポリエステルイミド塗料単体を塗布した後、焼き付けを行い、絶縁皮膜を設けた。これによって、エナメル線を作製した。
(比較例6)
平角形状の銅導体を真鐘製ブラシで200rpmの回転数で3分研磨した後、3−メタクリロキシプロピルトリメトキシシラン(KBM−503;信越化学工業社製)の50%水溶液を、平角形状の銅導体上に塗布し、遠赤外加熱炉により100℃×5分で加熱することで2μmの最内絶縁皮膜を設けた。この最内絶縁皮膜の周りに、ポリアミドイミド(HI−404;日立化成工業社製)塗料単体を塗布した後、焼き付けを行い、皮膜厚さが32μmの最外絶縁皮膜を設けた。これによって、絶縁皮膜全体の厚さが40μmのエナメル線を作製した。
Example 1
1% of 3-glycidoxypropyltrimethoxysilane (KBM-403; manufactured by Shin-Etsu Chemical Co., Ltd.) is obtained by roughening a rectangular copper conductor using a roughening solution (HIST-7300; manufactured by Hitachi Chemical). The aqueous solution was applied onto a rectangular copper conductor and heated at 100 ° C. for 5 minutes in a far infrared heating furnace to provide a 1 μm innermost insulating film. A polyesterimide paint (EH-402; manufactured by Dainichi Seika Co., Ltd.) was applied around the innermost insulating film, and then baked to provide an outermost insulating film having a film thickness of 30 μm. As a result, an enameled wire having a total thickness of 31 μm was produced.
(Implementation 2)
An enameled wire was prepared in the same manner as in Example 1 except that 3-aminopropyltrimethoxysilane (KBE-903; manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of KBM-903.
(Implementation 3)
An enameled wire was prepared in the same manner as in Example 1 except that a polyamideimide (HI-404; manufactured by Hitachi Chemical Co., Ltd.) paint was used instead of the polyesterimide paint.
Example 4
An enameled wire was produced in the same manner as in Example 2 except that a polyamideimide (HI-404; manufactured by Hitachi Chemical Co., Ltd.) paint was used instead of the polyesterimide paint.
(Comparative Example 1)
After applying a polyesterimide paint alone to a flat copper conductor, baking was performed to provide a single-layer insulating film. This produced an enameled wire.
(Comparative Example 2)
A rectangular copper conductor was coated with a 10% aqueous solution of 3-methacryloxypropyltrimethoxysilane (KBM-503; manufactured by Shin-Etsu Chemical Co., Ltd.) on a rectangular copper conductor, and 100 ° C. in a far infrared heating furnace. An innermost insulating film of 2 μm was provided by heating in 5 minutes. A polyamideimide (HI-404; manufactured by Hitachi Chemical Co., Ltd.) coating material was applied around the innermost insulating film and then baked to provide an outermost insulating film having a film thickness of 30 μm. As a result, an enameled wire having a total thickness of 32 μm was produced.
(Comparative Example 3)
10% of 3-aminopropyltrimethoxysilane (KBM-903; manufactured by Shin-Etsu Chemical Co., Ltd.) is obtained by roughening a rectangular copper conductor using a roughening solution (HIST-7300; manufactured by Hitachi Chemical Co., Ltd.). The aqueous solution was applied onto a rectangular copper conductor and heated at 100 ° C. for 5 minutes in a far infrared heating furnace to provide a 2 μm innermost insulating film. A polyamideimide (HI-404; manufactured by Hitachi Chemical Co., Ltd.) coating material was applied around the innermost insulating film and then baked to provide an outermost insulating film having a film thickness of 30 μm. As a result, an enameled wire having a total thickness of 32 μm was produced.
(Comparative Example 4)
An enameled wire was prepared in the same manner as in Comparative Example 3 except that a polyamideimide coating was used instead of the polyesterimide coating.
(Comparative Example 5)
A flat copper conductor was polished with a brass brush at a rotation speed of 200 rpm for 3 minutes, and then a polyesterimide paint was applied alone, followed by baking to provide an insulating film. This produced an enameled wire.
(Comparative Example 6)
After polishing a rectangular copper conductor with a true bell brush at a rotation speed of 200 rpm for 3 minutes, a 50% aqueous solution of 3-methacryloxypropyltrimethoxysilane (KBM-503; manufactured by Shin-Etsu Chemical Co., Ltd.) The innermost insulating film having a thickness of 2 μm was formed by coating on a copper conductor and heating in a far infrared heating furnace at 100 ° C. for 5 minutes. A polyamideimide (HI-404; manufactured by Hitachi Chemical Co., Ltd.) paint alone was applied around the innermost insulating film and then baked to provide an outermost insulating film having a film thickness of 32 μm. Thus, an enameled wire having a total thickness of 40 μm was produced.

実施倒1〜4及び比較例1〜6について、導体表面をレーザ顕微鏡で観察し、導体の表面粗さを測定した。また、オージェ分光分析から最内絶縁皮膜の膜厚を測定し、絶縁皮膜全体の厚さをマイクロメータで測定することで、最内絶縁皮膜/絶縁皮膜全体の比を算出した。また、電気化学的還元電位測定で、導体表面の酸化膜厚の計測を行った。   About implementation fall 1-4 and Comparative Examples 1-6, the conductor surface was observed with the laser microscope and the surface roughness of the conductor was measured. Further, the thickness of the innermost insulating film was measured from Auger spectroscopic analysis, and the ratio of the innermost insulating film / the entire insulating film was calculated by measuring the thickness of the entire insulating film with a micrometer. In addition, the oxide film thickness on the conductor surface was measured by electrochemical reduction potential measurement.

さらに、以下の方法で、導体と絶縁皮膜との引剥強さを測定した。導体と絶縁皮膜との密着強度測定は以下の方法で行った。先ず、各エナメル線を製造した後、各エナメル線から約5cmの長さの試料片をそれぞれ切り取った。その後、各試料片の上面又は下面(幅が広い方の面のいずれか一方)の絶縁皮膜に、カッターなどを用いて、試料片の長手方向に延びる切り込みを1mm間隔で2本形成した。この切り込み間における絶縁皮膜の長手方向端部を、ピンセットなどを用いて導体から剥離させ、つかみ代を形成した。その後、各試料片を治具に固定すると共に、つかみ代をチャックで挟み、テンシロン万能試験機を用いて導体から絶縁皮膜を更に引き剥がした。この時、絶縁皮膜を1mm長さで剥がす時の剥離強度(密着強度)を測定した。   Furthermore, the peel strength between the conductor and the insulating film was measured by the following method. The adhesion strength between the conductor and the insulating film was measured by the following method. First, after each enamel wire was manufactured, a sample piece having a length of about 5 cm was cut from each enamel wire. Thereafter, two cuts extending in the longitudinal direction of the sample piece were formed at intervals of 1 mm on the insulating film on the upper surface or the lower surface (one of the wider surfaces) of each sample piece using a cutter or the like. The longitudinal ends of the insulating film between the cuts were peeled from the conductor using tweezers or the like to form a grip allowance. Thereafter, each sample piece was fixed to a jig, the gripping margin was sandwiched between chucks, and the insulating film was further peeled from the conductor using a Tensilon universal testing machine. At this time, the peel strength (adhesion strength) when the insulating film was peeled off with a length of 1 mm was measured.

また、JIS S 6006に規定のしんを約60°の角度をもたせて刃型に削り、これを試験片に約60゜の角度で約5Nの力で押し、試験片の長さ方向に規定の硬さのしんで1回ひっかいたとき、導体が現れるほど、皮膜がはがれないかを目視で調べた。   In addition, the stipulated in JIS S 6006 is cut into a blade shape with an angle of about 60 °, and this is pressed against the test piece with a force of about 5 N at an angle of about 60 °, and the stipulated in the length direction of the test piece It was visually inspected whether the film peeled as much as the conductor appeared when it was scratched once.

各種特性評価結果を表1に示す。   Table 1 shows the results of various characteristic evaluations.

Figure 0005102541
Figure 0005102541

表1に示すように、実施例1〜4の各エナメル線は、粗化処理面を有する導体の周りに2層で構成される絶縁皮膜を有し、導体に接する最内絶縁皮膜がシランカップリング剤皮膜であり、最外絶縁皮膜がポリエステルイミド膜であり、最内絶縁皮膜の膜厚が、絶縁皮膜全体の膜厚の5%以下である。また、平均表面粗さRaが0.2〜1.0μmの粗化処理面を有する導体の外周に、最内絶縁皮膜としてシランカップリング剤皮膜を設けることで、粗化処理・化学処理による密着性向上により導体と絶縁皮膜との剥離強度は300N/m以上となった。   As shown in Table 1, each enameled wire of Examples 1 to 4 has an insulating film composed of two layers around a conductor having a roughened surface, and the innermost insulating film in contact with the conductor is a silane cup. It is a ring agent film, the outermost insulating film is a polyesterimide film, and the film thickness of the innermost insulating film is 5% or less of the film thickness of the entire insulating film. In addition, by providing a silane coupling agent film as the innermost insulating film on the outer periphery of a conductor having a roughened surface with an average surface roughness Ra of 0.2 to 1.0 μm, adhesion by roughening and chemical treatment is achieved. The peel strength between the conductor and the insulating film became 300 N / m or more due to the improvement of the property.

また、最内絶縁皮膜となるシランカップリング剤は、最外絶縁皮膜となるポリエステルイミド中に存在するチタン系触媒の硬化作用を阻害することなく、エナメル線用塗料の硬化を促進し、硬化後は鉛筆硬度が6H以上と高く、曲げ加工等の耐性に優れた絶縁皮膜を形成することが可能である。   In addition, the silane coupling agent that becomes the innermost insulating film accelerates the hardening of the enamel wire paint without inhibiting the hardening action of the titanium-based catalyst present in the polyesterimide that becomes the outermost insulating film. Has a high pencil hardness of 6H or more, and can form an insulating film excellent in resistance to bending or the like.

本発明の一実施形態を示す絶縁電線の断面図である。It is sectional drawing of the insulated wire which shows one Embodiment of this invention. 本発明の一実施形態を示す絶縁電線の断面図である。It is sectional drawing of the insulated wire which shows one Embodiment of this invention.

符号の説明Explanation of symbols

1 絶縁電線
2 導体
3 絶縁皮膜
4 最内絶縁皮膜
5 最外絶縁皮膜
1 Insulated wire 2 Conductor 3 Insulating film 4 Innermost insulating film 5 Outermost insulating film

Claims (5)

導体と、該導体の外周に3−グリシドキシプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシランのいずれかのシランカップリング剤を塗布して形成された最内絶縁皮膜と上記最内絶縁皮膜上にエナメル線塗料を塗布、焼き付けして形成されたポリエステルイミド皮膜、あるいはポリアミドイミド皮膜からなる最外絶縁皮膜とからなる絶縁皮膜とを備え、上記最内絶縁皮膜の膜厚が上記絶縁皮膜全体の膜厚の5%以下であることを特徴とする絶縁電線。 A conductor, an innermost insulating film formed by applying a silane coupling agent of 3-glycidoxypropyltrimethoxysilane or 3-aminopropyltrimethoxysilane to the outer periphery of the conductor, and the innermost insulating film applying an enamel wire coating above, polyesterimide film is formed by baking or an insulating film comprising the outermost insulating film comprising polyamide-imide film, provided with a film thickness of the insulating coating of the innermost insulating coating, An insulated wire characterized by being 5% or less of the total film thickness . 上記導体の平均表面粗さRaが0.2〜1.0μmであることを特徴とする請求項記載の絶縁電線。 The insulated wire according to claim 1, wherein an average surface roughness Ra of the conductor characterized in that it is a 0.2 to 1.0 [mu] m. 上記導体から上記絶縁皮膜を剥離させる剥離強度が300N/m以上であることを特徴とする請求項1又は2記載の絶縁電線。 The insulated wire according to claim 1 or 2, wherein a peel strength for peeling the insulating film from the conductor is 300 N / m or more. 上記最外絶縁皮膜は、JIS S 6006による鉛筆硬度で6H以上を有することを特徴とする請求項1〜3のいずれか記載の絶縁電線。 The insulated wire according to any one of claims 1 to 3, wherein the outermost insulating film has a pencil hardness of 6H or more according to JIS S 6006. 上記導体は、平角導体であることを特徴とする請求項1〜4のいずれか記載の絶縁電線。 The insulated wire according to any one of claims 1 to 4 , wherein the conductor is a flat conductor.
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