JP5083500B2 - Plastic container deposition equipment - Google Patents

Plastic container deposition equipment Download PDF

Info

Publication number
JP5083500B2
JP5083500B2 JP2006319823A JP2006319823A JP5083500B2 JP 5083500 B2 JP5083500 B2 JP 5083500B2 JP 2006319823 A JP2006319823 A JP 2006319823A JP 2006319823 A JP2006319823 A JP 2006319823A JP 5083500 B2 JP5083500 B2 JP 5083500B2
Authority
JP
Japan
Prior art keywords
gas supply
plastic container
slit
supply hole
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006319823A
Other languages
Japanese (ja)
Other versions
JP2008133500A (en
Inventor
浩人 鹿島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Inc filed Critical Toppan Inc
Priority to JP2006319823A priority Critical patent/JP5083500B2/en
Publication of JP2008133500A publication Critical patent/JP2008133500A/en
Application granted granted Critical
Publication of JP5083500B2 publication Critical patent/JP5083500B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Containers Having Bodies Formed In One Piece (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Chemical Vapour Deposition (AREA)

Description

本発明は真空中でプラスチック容器に真空蒸着法、化学蒸着法(CVD)等の方法により薄膜を形成するプラスチック容器の成膜装置に関する。   The present invention relates to a film forming apparatus for a plastic container that forms a thin film on a plastic container in a vacuum by a method such as vacuum vapor deposition or chemical vapor deposition (CVD).

従来からプラスチック容器は、その利便性から食品、医療など、幅広い分野で包装容器として利用されている。しかし、プラスチックは周知のように酸素、二酸化炭素などの低分ガスや水蒸気を透過してしまう性質を有している。そのため内容物が酸化してしまうなど悪影響を及ぼし、その利用範囲に制約を受けている。   Conventionally, plastic containers have been used as packaging containers in a wide range of fields such as food and medicine because of their convenience. However, as is well known, plastics have a property of permeating low gas such as oxygen and carbon dioxide and water vapor. Therefore, the contents are adversely affected, such as being oxidized, and the range of use is limited.

このため、近年プラスチック容器にガスバリア性を有する薄膜を成膜することで、その機能を向上させる技術が知られてきている。例えば、プラスチック容器の酸素遮断性を向上させるなどの目的で、酸化珪素皮膜やダイヤモンドの結晶構造に近い炭素皮膜を容器の内外面に施すことが、盛んに行われている。   For this reason, in recent years, a technique for improving the function of a plastic container by forming a thin film having a gas barrier property has been known. For example, for the purpose of improving the oxygen barrier property of a plastic container, a carbon film close to the crystal structure of a silicon oxide film or diamond is actively applied to the inner and outer surfaces of the container.

上記処方された容器は、単層のポリエステルあるいはポリエチレン容器の酸素透過度が1/10あるいは1/20にまで低下する。その結果内容物の酸化の進み方が緩慢になる。そして、商品寿命が延び、品質の向上を図ることが可能となった。   In the above prescribed container, the oxygen permeability of the single layer polyester or polyethylene container is reduced to 1/10 or 1/20. As a result, the progress of oxidation of the contents becomes slow. And the product life was extended, and it became possible to improve the quality.

上述したように、従来はエチレン/ビニルアルコール共重合体樹脂(EVOH)やポリアミド(PA)といったバリア性樹脂を用いて、多層容器を必要としていた領域にも単層成形の容器を用いることが可能となった。   As described above, it is possible to use single-layer molded containers in areas where multilayer containers were required, using barrier resins such as ethylene / vinyl alcohol copolymer resin (EVOH) and polyamide (PA). It became.

例えば、プラスチック容器の内面に炭素膜を形成するプラスチック容器の成膜装置が提案されている。(例えば、特許文献1および特許文献2参照。)。   For example, a film forming apparatus for a plastic container that forms a carbon film on the inner surface of the plastic container has been proposed. (For example, refer to Patent Document 1 and Patent Document 2.)

前記特許文献1の装置は、図4に示すように、真空中でプラスチック容器4に成膜するために、収容されるプラスチック容器の外形とほぼ相似形の隙間8を有する中空状の外部電極2が形成されている。また、この外部電極2の空所内にプラスチック容器4が収容された際に、このプラスチック容器4の口部9が当接されると共に外部電極2を絶縁する絶縁部材3が形成されている。そして、接地され外部電極2の空所内に収容された容器4の内側7に容器4の口部9から挿入される原料ガス供給孔6として、複数個のガス放出孔を有する内部電極5が形成されている。さらに、外部電極2の空所内に連通されて空所内の排気を行う排気手段11と、外部電極2の空所内に収容された容器4の内側の前記内部電極5に原料ガスを供給する供給管10と、外部電極2にマッチングボックス12を介して接続された高周波電源13を備えていることを特徴とする装置である。   As shown in FIG. 4, the apparatus of Patent Document 1 has a hollow external electrode 2 having a gap 8 that is substantially similar to the outer shape of a plastic container to be deposited in vacuum in a plastic container 4. Is formed. Further, when the plastic container 4 is accommodated in the space of the external electrode 2, the insulating member 3 is formed that abuts the mouth 9 of the plastic container 4 and insulates the external electrode 2. Then, an internal electrode 5 having a plurality of gas discharge holes is formed as a source gas supply hole 6 that is inserted into the inside 7 of the container 4 that is grounded and accommodated in the space of the external electrode 2 from the opening 9 of the container 4. Has been. Further, an exhaust means 11 that communicates with the space in the external electrode 2 and exhausts the space, and a supply pipe that supplies the source gas to the internal electrode 5 inside the container 4 accommodated in the space in the external electrode 2 10 and a high-frequency power source 13 connected to the external electrode 2 via a matching box 12.

しかしながら、上記のような従来のプラスチック容器の成膜装置では、原料ガス供給孔6の寸法が大きいと、高周波電力を投入した際、図4で示す外部電極2と内部電極5で発生したプラズマが、内部電極5の原料ガス供給管10の内部に侵入し、この侵入したプラズマにより原料ガス供給管10及び内部電極5が加熱され、その輻射熱によりプラスチック容器が塑性変形を生じる。   However, in the conventional plastic container film forming apparatus as described above, when the source gas supply hole 6 has a large size, plasma generated in the external electrode 2 and the internal electrode 5 shown in FIG. The material gas supply pipe 10 of the internal electrode 5 enters the interior of the material gas supply pipe 10, and the plasma that has entered the material gas supply pipe 10 and the internal electrode 5 are heated, and the radiant heat causes plastic deformation of the plastic container.

従って、上記輻射熱によるプラスチック容器の塑性変形が生じない範囲に、成膜時間及び投入する高周波電力及びガス流量等の成膜条件を制限するか、また、ごく小さな孔を特殊な方法で内部電極5壁面に加工しない限り、内壁面に十分な厚みを持ち、且つ、緻密である膜を成膜することができない。そして、最適な酸素もしくは水蒸気透過度を得ようと
したとき不都合である。
Therefore, the film formation conditions such as the film formation time, the high frequency power to be input and the gas flow rate are limited within a range in which the plastic container is not deformed by the radiant heat, or a very small hole is formed by a special method. Unless it is processed into a wall surface, a dense film having a sufficient thickness on the inner wall surface cannot be formed. And it is inconvenient when trying to obtain the optimum oxygen or water vapor permeability.

さらに、内部電極5の原料ガス供給管10の内部にプラズマが侵入することにより、高周波電力の殆どが、内部電極5の原料ガス供給管10内部のプラズマに投入される。そして、外部電極2と内部電極5の間に発生するプラズマに必要な電力が投入されない。   Further, when the plasma enters the source gas supply pipe 10 of the internal electrode 5, most of the high frequency power is input to the plasma inside the source gas supply pipe 10 of the internal electrode 5. Then, power necessary for plasma generated between the external electrode 2 and the internal electrode 5 is not input.

このため、内部電極5の原料ガス供給管10の内部に発生したプラズマを供給している原料の電離及び膜生成の反応を進行させてしまう。そして、プラスチック容器4の内壁面への成膜反応が十分に行われず、プラスチック容器4の内壁面の膜厚分布が不均一で、且つ、ポーラスな膜になりやすい。このため、酸素及び水蒸気透過度の低減を図る上で障害になっていた。   For this reason, the ionization of the raw material which supplies the plasma generated inside the raw material gas supply pipe 10 of the internal electrode 5 and the reaction of film formation are advanced. Then, the film forming reaction on the inner wall surface of the plastic container 4 is not sufficiently performed, and the film thickness distribution on the inner wall surface of the plastic container 4 is non-uniform and easily becomes a porous film. For this reason, it has become an obstacle in reducing oxygen and water vapor permeability.

特許文献1ではガス放出孔の寸法規定がないため、かかる不具合を生じる危険性が高く、改善が必要であった。   In Patent Document 1, since there is no stipulation of the size of the gas discharge hole, there is a high risk of causing such inconvenience, and improvement is required.

また、特許文献2では、平行平板における成膜装置において、プラズマ電力と高周波電源周波数を一定として成膜圧力とイオンシース寸法との関係を求め、これより異常発光のないガス供給孔の大きさを提示し、さらに、ガス供給孔の最適断面形状をも提案している。しかしながら圧力一定という前提が崩れると成膜が不安定となることがしばしば見られた。   Further, in Patent Document 2, in a film forming apparatus using parallel plates, the relationship between the film forming pressure and the ion sheath size is obtained with the plasma power and the high frequency power supply frequency being constant, and the size of the gas supply hole without abnormal light emission is determined from this. In addition, the optimum cross-sectional shape of the gas supply hole is also proposed. However, it has often been found that film formation becomes unstable when the premise of constant pressure is lost.

これはガス供給配管内部でガス供給開始や設定流量変化に伴う圧力の脈動が生じるためであり、ガス放出孔から噴出するガスもその影響で流量が安定せず、プラズマ整合が不安定となる。そして、甚だしい場合は放電中にプラズマ発光が突然消灯することもあった。   This is because pressure pulsation is generated in the gas supply pipe due to the start of gas supply or a change in the set flow rate, and the gas ejected from the gas discharge hole is also affected by this, and the flow rate is not stable, and the plasma matching becomes unstable. In extreme cases, the plasma emission may suddenly turn off during discharge.

さらに、特許文献1に記載されたようにガス供給孔6(図4に示す)の大きさを一定以下とすることでプラズマ整合を安定させる技術が知られているが、単にガス供給孔6の開孔径を一定以下としただけでは不十分であった。   Further, as described in Patent Document 1, a technique for stabilizing plasma matching by making the size of the gas supply hole 6 (shown in FIG. 4) constant or less is known. It was not enough to keep the aperture diameter below a certain level.

以下に先行技術文献を示す。
特開2000−256859号公報 特開昭61−15978号公報
Prior art documents are shown below.
JP 2000-256859 A Japanese Patent Laid-Open No. 61-15978

本発明は、上記従来の問題に鑑みてなされたものであり、その課題とするところは、プラスチック容器の成膜装置において、輻射熱によるプラスチック容器の塑性変形を生ずることなく、また成膜中の圧力変動によるプラズマ放電の不安定性を改善し、均一で緻密な薄膜を、安定して連続成膜が可能なプラスチック容器の成膜装置を提供することを目的とする。   The present invention has been made in view of the above-described conventional problems. The object of the present invention is to provide a plastic container film forming apparatus without causing plastic deformation of the plastic container due to radiant heat and pressure during film formation. It is an object of the present invention to provide a plastic container film forming apparatus capable of improving the instability of plasma discharge due to fluctuations and forming a uniform and dense thin film stably and continuously.

上記問題点を解決するために、本発明の請求項1に係る発明は、
外部電極の内側に配設したプラスチック製の容器内に内部電極を挿入配置し、前記容器内を真空にする手段と、内部電極から原料ガスを該容器内に供給する手段と、外部電極と内部電極間にプラズマを発生させる手段とを有し、前記容器内壁面にプラズマ化学気相析出法により薄膜を形成する成膜装置において、前記内部電極の先端にスリット状のガス供給孔を有する部材を設け、その部材の出口側面に短辺寸法が0.5mm以下、奥行き寸法
が前記短辺寸法の10倍以上有することを特徴とするプラスチック容器の成膜装置である。
In order to solve the above problems, the invention according to claim 1 of the present invention provides:
An internal electrode is inserted and arranged in a plastic container disposed inside the external electrode, a means for evacuating the container, a means for supplying a raw material gas from the internal electrode into the container, an external electrode and an internal Means for generating plasma between the electrodes, and in the film forming apparatus for forming a thin film on the inner wall surface of the container by plasma chemical vapor deposition, a member having a slit-like gas supply hole at the tip of the internal electrode The plastic container film forming apparatus is characterized in that the outlet side surface of the member has a short side dimension of 0.5 mm or less and a depth dimension of 10 times or more the short side dimension.

次に、本発明の請求項2に係る発明は、
前記スリット状のガス供給孔の短辺寸法が、該ガス供給孔を有する部材の流入側から流出側まで一定であることを特徴とする請求項1に記載のプラスチック容器の成膜装置である。
Next, the invention according to claim 2 of the present invention is as follows.
2. The plastic container film forming apparatus according to claim 1, wherein a short side dimension of the slit-shaped gas supply hole is constant from an inflow side to an outflow side of a member having the gas supply hole.

次に、本発明の請求項3に係る発明は、
前記スリット状のガス供給孔の短辺寸法が、該ガス供給孔を有する部材の流入側から流出側に向かって減少することを特徴とする請求項1に記載のプラスチック容器の成膜装置である。
Next, the invention according to claim 3 of the present invention is
2. The plastic container film forming apparatus according to claim 1, wherein a short side dimension of the slit-shaped gas supply hole decreases from an inflow side to an outflow side of a member having the gas supply hole. .

次に、本発明の請求項4に係る発明は、
前記スリット状のガス供給孔を有する部材に、1個以上のスリット状のガス供給孔を有することを特徴とする請求項1乃至3のいずれか1項に記載のプラスチック容器の成膜装置。
Next, the invention according to claim 4 of the present invention is
The film forming apparatus for a plastic container according to any one of claims 1 to 3, wherein the member having the slit-shaped gas supply hole has one or more slit-shaped gas supply holes.

次に、本発明の請求項5に係る発明は、
前記スリット状のガス供給孔を有する部材は、前記内部電極に着脱が可能な機構を備えていることを特徴とする請求項1乃至4のいずれか1項に記載のプラスチック容器の成膜装置。
Next, the invention according to claim 5 of the present invention is
5. The plastic container film forming apparatus according to claim 1, wherein the member having the slit-shaped gas supply hole includes a mechanism that can be attached to and detached from the internal electrode.

次に、本発明の請求項6に係る発明は、
前記スリット状のガス供給孔を有する部材が、射出成形法または焼結法で成されていることを特徴とする請求項1乃至5のいずれか1項に記載のプラスチック容器の成膜装置。
Next, the invention according to claim 6 of the present invention is
6. The plastic container film forming apparatus according to claim 1, wherein the member having the slit-shaped gas supply hole is formed by an injection molding method or a sintering method.

本発明のプラスチック容器の成膜装置は、配置された容器内に挿入する内部電極の先端にスリット状のガス供給孔を有する部材が設けられ、その部材の出口側面に短辺寸法が0.5mm以下、奥行き寸法が前記短辺寸法の10倍以上有することで、内部電極の原料ガス供給管の内部に発生するプラズマを防ぎ、プラズマによる内部電極の加熱をなくす。このため、その輻射熱によるプラスチック容器の塑性変形を防止することができる。また、冷却手段の無い内部電極でも熱の蓄積が無いことから安定して連続成膜が可能となる。   In the plastic container film forming apparatus of the present invention, a member having a slit-like gas supply hole is provided at the tip of an internal electrode to be inserted into the arranged container, and the short side dimension is 0.5 mm on the outlet side surface of the member. In the following, when the depth dimension is 10 times or more of the short side dimension, plasma generated inside the source gas supply pipe of the internal electrode is prevented, and heating of the internal electrode by plasma is eliminated. For this reason, plastic deformation of the plastic container due to the radiant heat can be prevented. Further, since there is no heat accumulation even in the internal electrode without the cooling means, stable continuous film formation is possible.

さらに、内部電極の原料ガス供給管の内部に発生するプラズマを防ぐことにより、供給内部における原料ガスの電離及び膜生成の反応を防止することができる。そして、外部電極と内部電極間に十分な高周波電力が投入される。   Furthermore, by preventing the plasma generated inside the source gas supply pipe of the internal electrode, it is possible to prevent ionization of the source gas and film formation reaction inside the supply. A sufficient high frequency power is supplied between the external electrode and the internal electrode.

上記の結果、供給ガスの解離及びプラスチック容器の内壁面への成膜反応が十分に行われる。そして、プラスチック容器の内壁面の膜厚分布が均一で、且つ、緻密な膜を成膜することが可能である。さらに、酸素及び水蒸気透過度を低減させることができる。   As a result, the dissociation of the supply gas and the film formation reaction on the inner wall surface of the plastic container are sufficiently performed. In addition, it is possible to form a dense film having a uniform film thickness distribution on the inner wall surface of the plastic container. Furthermore, oxygen and water vapor permeability can be reduced.

本発明のプラスチック容器の成膜装置を実施の形態に沿って以下に図面を参照にしながら詳細に説明する。   DESCRIPTION OF EMBODIMENTS A plastic container film forming apparatus according to the present invention will be described in detail below in accordance with an embodiment with reference to the drawings.

図1は、本発明のプラスチック容器の成膜装置の一実施例の概略断面図である。また、図2(a)は図1の内部電極の先端部Eを示す平面拡大図である。さらに、図2(b)は図2(a)のA−A´線の断面を示す断面図である。   FIG. 1 is a schematic cross-sectional view of an embodiment of a film forming apparatus for a plastic container according to the present invention. FIG. 2A is an enlarged plan view showing the tip E of the internal electrode in FIG. Further, FIG. 2B is a cross-sectional view showing a cross section taken along the line AA ′ of FIG.

また、図3(a)は図1の内部電極の他の先端部Fを示す平面拡大図である。さらに、図3(b)は図3(a)のB−B´線の断面を示す断面図である。   FIG. 3A is an enlarged plan view showing another tip F of the internal electrode of FIG. FIG. 3B is a cross-sectional view showing a cross section taken along line BB ′ of FIG.

本発明のプラスチック容器の成膜装置は、図1に示すように、真空中で容器4を成膜するために収容された容器4の外形とほぼ相似形の隙間8を有する中空状の外部電極2が形成されている。   As shown in FIG. 1, the film forming apparatus for a plastic container of the present invention has a hollow external electrode having a gap 8 that is substantially similar to the outer shape of the container 4 accommodated for forming the container 4 in vacuum. 2 is formed.

さらに、この外部電極2の空所内に容器4が収容された際にこの容器4の口部が当接されると共に外部電極2を絶縁する絶縁部材3と、接地され外部電極2の空所内に収容された容器4の内側7に容器の口部9から挿入される原料ガス供給孔6を持つ部材を備えた内部電極5が形成されている。   Further, when the container 4 is accommodated in the space of the external electrode 2, the opening of the container 4 is brought into contact with the insulating member 3 that insulates the external electrode 2, and is grounded in the space of the external electrode 2. An internal electrode 5 having a member having a source gas supply hole 6 inserted from the mouth portion 9 of the container is formed on the inner side 7 of the accommodated container 4.

また、外部電極2の空所内に連通されて空所内の排気を行う排気口11と、外部電極2の空所内に収容された容器4の内側の前記内部電極5に原料ガスを供給する供給管10と、外部電極2にマッチングボックス12を介して接続された高周波電源13を備えている。   Also, an exhaust port 11 that communicates with the space in the external electrode 2 and exhausts the space, and a supply pipe that supplies the source gas to the internal electrode 5 inside the container 4 accommodated in the space in the external electrode 2. 10 and a high frequency power source 13 connected to the external electrode 2 via a matching box 12.

本発明のプラスチック容器の成膜装置の内部電極5の先端に設けられているガス供給孔6を有する部材を図2(a)(b)または図3(a)(b)に示す。図2(a)(b)に示す実施例では、スリット状のガス供給孔の先端面は短辺寸法dが0.5mm以下、奥行き寸法Tが短辺寸法の10倍以上に形成されている。そして、スリット幅はガス流入側からガス流出側に向かって一定の幅に形成されている。   A member having a gas supply hole 6 provided at the tip of the internal electrode 5 of the film forming apparatus for a plastic container according to the present invention is shown in FIGS. In the embodiment shown in FIGS. 2 (a) and 2 (b), the front end surface of the slit-shaped gas supply hole is formed such that the short side dimension d is 0.5 mm or less and the depth dimension T is 10 times or more the short side dimension. . The slit width is formed with a constant width from the gas inflow side to the gas outflow side.

このため、原料ガスの吐出圧力が高くなり、高周波電力を投入した際に生じる外部電極と内部電極間5に発生したプラズマが原料ガス供給管10の内部へ侵入することを防止できる。   For this reason, the discharge pressure of the raw material gas is increased, and it is possible to prevent the plasma generated between the external electrode and the internal electrode 5 generated when high-frequency power is supplied from entering the raw material gas supply pipe 10.

また、図3(a)(b)に示す実施例では、スリット状のガス供給孔6の奥行き寸法Tがガス流動方向に2mm以上7mm以下であり、そのスリット幅が、図3(b)に示すようにガス流入側からガス流出側に向かって一定の割合で減少するように形成されている。   3A and 3B, the depth T of the slit-shaped gas supply hole 6 is 2 mm or more and 7 mm or less in the gas flow direction, and the slit width is shown in FIG. As shown, it is formed so as to decrease at a constant rate from the gas inflow side to the gas outflow side.

このため、内部電極5のガス圧力を高めることで配管内部に生じた圧力変動を容器7内部に伝え難くなり、成膜環境が安定する。そして、成膜工程も安定する。   For this reason, it becomes difficult to transmit the pressure fluctuation generated inside the pipe to the inside of the container 7 by increasing the gas pressure of the internal electrode 5, and the film forming environment is stabilized. And the film-forming process is also stabilized.

また、配管を流れる成膜ガスの乱流をスリット部分で整流化することで容器内部に定常流れが生じることも成膜工程の安定性向上に寄与する。前記整流化についてはスリット状のガス供給孔6の短辺寸法と奥行き寸法のアスペクト比が効果の指標となることが実験から判明した。この理由は、乱流によってガス流に乱れが生じても、狭いスリットに押し込められると各方向の分子運動量が合算されて特定方向の運動量成分だけが残るためと想像される。   Further, the steady flow that occurs inside the container by rectifying the turbulent flow of the film forming gas flowing through the piping at the slit portion also contributes to improving the stability of the film forming process. As for the rectification, it has been experimentally found that the aspect ratio of the short side dimension and the depth dimension of the slit-like gas supply hole 6 is an index of the effect. The reason is assumed that even if the gas flow is disturbed by the turbulent flow, when it is pushed into the narrow slit, the molecular momentum in each direction is added up and only the momentum component in the specific direction remains.

また、本発明のプラスチック容器の成膜装置に用いられている、スリット状のガス供給孔6を有する部材は、1個以上のスリット状のガス供給孔6ガスを有する。そして、スリット状のガス供給孔6のスリット数は、原料ガスの供給量を調整できる。また、必要に応じてスリット幅やテーパー角度を変えることで、ガス流量の調整が可能である。   Moreover, the member which has the slit-shaped gas supply hole 6 used for the film-forming apparatus of the plastic container of this invention has one or more slit-shaped gas supply holes 6 gas. The number of slits in the slit-like gas supply hole 6 can adjust the supply amount of the source gas. Further, the gas flow rate can be adjusted by changing the slit width and taper angle as required.

また、本発明のプラスチック容器の成膜装置に用いられている、スリット状のガス供給孔6を有する部材は、前記内部電極5に着脱が可能な機構を備えている。このため、スリット状のガス供給孔6が成膜過程で目詰まりを起こした際に、スリット状のガス供給孔6を有する部材のみの交換で済む。そして、具体的には打ち込み嵌合式やねじ方式等により部材が形成される。   Further, the member having the slit-like gas supply hole 6 used in the plastic container film forming apparatus of the present invention has a mechanism that can be attached to and detached from the internal electrode 5. For this reason, when the slit-like gas supply hole 6 is clogged during the film formation process, only the member having the slit-like gas supply hole 6 needs to be replaced. Specifically, the member is formed by a drive-in fitting method, a screw method, or the like.

さらに、本発明のプラスチック容器の成膜装置に用いられている、スリット状のガス供給孔6を有する部材は、射出成形法あるいは焼結法で作製される。   Further, the member having the slit-like gas supply hole 6 used in the plastic container film forming apparatus of the present invention is manufactured by an injection molding method or a sintering method.

上記部材の材質は特に限定されるものではないが、上記製法によると、該部材は大量に生産できるために非常に廉価に製造できる。従って、内部電極5に、上記スリット状のガス供給孔6を有する部材を結合させて使用する際に、成膜過程で目詰まりを起こしたような場合、簡単に部材のみを交換して使用しても本発明のプラスチック容器の成膜装置の運転費用に殆ど影響しない。   Although the material of the said member is not specifically limited, According to the said manufacturing method, since this member can be manufactured in large quantities, it can be manufactured very cheaply. Therefore, when a member having the slit-like gas supply hole 6 is combined with the internal electrode 5 and clogged during the film formation process, only the member can be easily replaced and used. However, it hardly affects the operating cost of the plastic container film forming apparatus of the present invention.

以下に、本発明の具体的実施例を挙げて、さらに詳しく説明するが、それに限定されるものではない。   Hereinafter, the present invention will be described in more detail with reference to specific examples, but the present invention is not limited thereto.

<実施例1>
本発明のスリット短辺が0.5mm、奥行き寸法が8mmのガス供給孔を有する部材を設けたプラスチック容器の成膜装置を用いて、500mlのプラスチック容器10本の内壁面に薄膜を形成した。この薄膜形成に際しては、成膜装置の原料ガスであるヘキサメチレンジシロキサン(HMDSO)と酸素からなる原料ガスの混合比率、成膜時間、ラジオフリークエンシー(RF)電力等の条件を任意に変化させて行った。しかる後、内壁面に薄膜を形成したプラスチック容器の酸素透過度及び膜厚等を測定し、評価した。その評価結果を表1に示す。
<Example 1>
A thin film was formed on the inner wall surface of 10 500 ml plastic containers using the plastic container film forming apparatus provided with a member having a gas supply hole having a slit short side of 0.5 mm and a depth dimension of 8 mm. When forming this thin film, conditions such as the mixing ratio of the source gas consisting of hexamethylenedisiloxane (HMDSO), which is the source gas of the film forming apparatus, and oxygen, the film forming time, and the radio frequency (RF) power are arbitrarily changed. went. Thereafter, the oxygen permeability and film thickness of a plastic container having a thin film formed on the inner wall surface were measured and evaluated. The evaluation results are shown in Table 1.

Figure 0005083500
Figure 0005083500

<比較例1>
従来の、スリット短辺が0.5mm、奥行き寸法が1.5mmのガス供給孔を有する部材を設けたプラスチック容器の成膜装置を用いて、500mlのプラスチック容器10本の内壁面に薄膜を形成した。また、薄膜形成に際しては、実施例1と同様に行った。しかる後、内壁面に薄膜を形成したプラスチック容器の酸素透過度及び膜厚等を測定し、評価した。その評価結果を表2に示す。
<Comparative Example 1>
A thin film is formed on the inner wall surface of 10 500 ml plastic containers using a conventional plastic container film forming apparatus provided with a gas supply hole having a slit short side of 0.5 mm and a depth dimension of 1.5 mm. did. The thin film was formed in the same manner as in Example 1. Thereafter, the oxygen permeability and film thickness of a plastic container having a thin film formed on the inner wall surface were measured and evaluated. The evaluation results are shown in Table 2.

Figure 0005083500
Figure 0005083500

<総合評価>
実施例1に示した本発明によれば、プラスチック容器の薄膜形成に際しては、輻射熱によるプラスチック容器の塑性変形を生ずることなく、安定したプラズマ放電でプラスチック容器内壁面に均一な薄膜を形成することができた。そして、表1に示すように、酸素透過度に優れ、且つ、各部での膜厚のバラツキが少ないプラスチック容器を作成できた。
<Comprehensive evaluation>
According to the present invention shown in Example 1, when forming a thin film of a plastic container, a uniform thin film can be formed on the inner wall surface of the plastic container with stable plasma discharge without causing plastic deformation of the plastic container due to radiant heat. did it. And as shown in Table 1, the plastic container which was excellent in oxygen permeability and there were few variations in the film thickness in each part was able to be created.

本発明のプラスチック容器の成膜装置はプラスチック容器の塑性変形を防止し、且つ、安定して連続成膜ができることはもとより、膜厚分布が均一で緻密な膜が成膜できるため、酸素および水蒸気透過度が低減されたプラスチック容器が生産できる。   The film forming apparatus for a plastic container of the present invention prevents the plastic deformation of the plastic container and can form a stable and continuous film as well as a dense film with a uniform film thickness distribution. Plastic containers with reduced permeability can be produced.

本発明のプラスチック容器の成膜装置の一実施例の概略を示す概略断面図である。It is a schematic sectional drawing which shows the outline of one Example of the film-forming apparatus of the plastic container of this invention. (a)は図1の内部電極の先端部Eの拡大を示す平面拡大図、(b)は図2(a)のA−A´線の断面を示す断面図である。FIG. 2A is an enlarged plan view showing an enlargement of a tip E of an internal electrode in FIG. 1, and FIG. 2B is a cross-sectional view showing a cross section taken along line AA ′ in FIG. (a)は図1の内部電極の他の先端部Fの拡大を示す平面拡大図、(b)は図3(a)のB−B´線の断面を示す断面図である。FIG. 4A is an enlarged plan view showing an enlargement of another tip F of the internal electrode of FIG. 1, and FIG. 3B is a cross-sectional view showing a cross section taken along line BB ′ of FIG. 従来のプラスチック容器の成膜装置の概略断面図である。It is a schematic sectional drawing of the film-forming apparatus of the conventional plastic container.

符号の説明Explanation of symbols

1…外部電極天蓋部
2…外部電極
3…絶縁板
4…プラスチック容器
5…内部電極
6…ガス供給孔
7…プラスチック内部空間
8…プラスチック容器と外部電極の隙間
9…容器口部
10…原料ガス供給管
11…排出口
DESCRIPTION OF SYMBOLS 1 ... External electrode canopy part 2 ... External electrode 3 ... Insulating plate 4 ... Plastic container 5 ... Internal electrode 6 ... Gas supply hole 7 ... Plastic internal space 8 ... Gap between a plastic container and an external electrode 9 ... Container mouth part 10 ... Source gas Supply pipe 11 ... Discharge port

Claims (6)

外部電極の内側に配設したプラスチック製の容器内に内部電極を挿入配置し、前記容器内を真空にする手段と、内部電極から原料ガスを該容器内に供給する手段と、外部電極と内部電極間にプラズマを発生させる手段とを有し、前記容器内壁面にプラズマ化学気相析出法により薄膜を形成する成膜装置において、前記内部電極の先端にスリット状のガス供給孔を有する部材を設け、その部材の出口側面に短辺寸法が0.5mm以下、奥行き寸法が前記短辺寸法の10倍以上有することを特徴とするプラスチック容器の成膜装置。   An internal electrode is inserted and arranged in a plastic container disposed inside the external electrode, a means for evacuating the container, a means for supplying a raw material gas from the internal electrode into the container, an external electrode and an internal Means for generating plasma between the electrodes, and in the film forming apparatus for forming a thin film on the inner wall surface of the container by plasma chemical vapor deposition, a member having a slit-like gas supply hole at the tip of the internal electrode An apparatus for forming a plastic container having a short side dimension of 0.5 mm or less and a depth dimension of 10 times or more of the short side dimension provided on the outlet side surface of the member. 前記スリット状のガス供給孔の短辺寸法が、該ガス供給孔を有する部材の流入側から流出側まで一定であることを特徴とする請求項1に記載のプラスチック容器の成膜装置。   2. The film forming apparatus for a plastic container according to claim 1, wherein a short side dimension of the slit-shaped gas supply hole is constant from an inflow side to an outflow side of a member having the gas supply hole. 前記スリット状のガス供給孔の短辺寸法が、該ガス供給孔を有する部材の流入側から流出側に向かって減少することを特徴とする請求項1に記載のプラスチック容器の成膜装置。   2. The film forming apparatus for a plastic container according to claim 1, wherein a short side dimension of the slit-shaped gas supply hole decreases from the inflow side to the outflow side of the member having the gas supply hole. 前記スリット状のガス供給孔を有する部材に、1個以上のスリット状のガス供給孔を有することを特徴とする請求項1乃至3のいずれか1項に記載のプラスチック容器の成膜装置。   The film forming apparatus for a plastic container according to any one of claims 1 to 3, wherein the member having the slit-shaped gas supply hole has one or more slit-shaped gas supply holes. 前記スリット状のガス供給孔を有する部材は、前記内部電極に着脱が可能な機構を備えていることを特徴とする請求項1乃至4のいずれか1項に記載のプラスチック容器の成膜装置。     5. The plastic container film forming apparatus according to claim 1, wherein the member having the slit-shaped gas supply hole includes a mechanism that can be attached to and detached from the internal electrode. 前記スリット状のガス供給孔を有する部材が、射出成形法または焼結法で成されていることを特徴とする請求項1乃至5のいずれか1項に記載のプラスチック容器の成膜装置。   6. The plastic container film forming apparatus according to claim 1, wherein the member having the slit-shaped gas supply hole is formed by an injection molding method or a sintering method.
JP2006319823A 2006-11-28 2006-11-28 Plastic container deposition equipment Expired - Fee Related JP5083500B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006319823A JP5083500B2 (en) 2006-11-28 2006-11-28 Plastic container deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006319823A JP5083500B2 (en) 2006-11-28 2006-11-28 Plastic container deposition equipment

Publications (2)

Publication Number Publication Date
JP2008133500A JP2008133500A (en) 2008-06-12
JP5083500B2 true JP5083500B2 (en) 2012-11-28

Family

ID=39558543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006319823A Expired - Fee Related JP5083500B2 (en) 2006-11-28 2006-11-28 Plastic container deposition equipment

Country Status (1)

Country Link
JP (1) JP5083500B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5884540B2 (en) * 2012-02-16 2016-03-15 凸版印刷株式会社 Gas supply pipe unit for plasma processing and film forming method using the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3870598B2 (en) * 1999-03-04 2007-01-17 凸版印刷株式会社 Plastic container deposition equipment
JP4774635B2 (en) * 2001-06-15 2011-09-14 凸版印刷株式会社 Thin film deposition apparatus for three-dimensional hollow container and thin film deposition method using the same
JP4826042B2 (en) * 2001-09-13 2011-11-30 凸版印刷株式会社 Film forming apparatus and film forming method for cup-shaped container
JP4519808B2 (en) * 2006-06-07 2010-08-04 凸版印刷株式会社 Thin film deposition method and thin film deposition apparatus

Also Published As

Publication number Publication date
JP2008133500A (en) 2008-06-12

Similar Documents

Publication Publication Date Title
AU781825B2 (en) Method of treatment with a microwave plasma
WO2002058141A1 (en) Carburetor, various types of devices using the carburetor, and method of vaporization
US20090250444A1 (en) Microwave plasma processing device
JP2007231386A (en) Container treatment apparatus using plasma
JP5083500B2 (en) Plastic container deposition equipment
JP4391413B2 (en) Vaporizer, disperser, film forming apparatus, and vaporization method
JP3649267B2 (en) Reactive gas injection head
JP3870598B2 (en) Plastic container deposition equipment
KR100805354B1 (en) Vaporizer for liquid source
JP4570277B2 (en) Inner surface treatment plastic tube manufacturing apparatus, and inner surface treatment plastic tube manufacturing method using the apparatus
JP4513332B2 (en) Deposition equipment
JP4704894B2 (en) Film forming method and film forming apparatus
JP2008001994A (en) Evaporator and evaporation method
JP5233333B2 (en) Hollow container deposition system
US10526704B2 (en) Film forming apparatus
JP2004277757A (en) Source gas feed pipe for chemical plasma treatment, and chemical plasma treatment method for inner surface of container
JP2005068471A (en) Gas feeding member for plasma treatment used for depositing vapor deposition film by plasma cvd method, and method of depositing vapor deposition film using the gas feeding member
US20230110364A1 (en) Atmospheric pressure remote plasma cvd device, film formation method, and plastic bottle manufacturing method
JP4876611B2 (en) Plasma deposition system
JP4360186B2 (en) Thin film forming apparatus and thin film forming method
JP2007204065A (en) Container processing apparatus using plasma
JP2006008254A (en) Device for forming barrier film at inner surface of plastic container and method for manufacturing inner surface barrier covered plastic container
JP2008106331A (en) Container treatment device by plasma cvd
KR100634510B1 (en) Pyrolysis furnace having gas flowing path controller
JP4325328B2 (en) Deposition equipment

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20091027

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101025

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20111021

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120808

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120821

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5083500

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150914

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees