JP5039034B2 - スペクトロメトリックリークディテクタの校正方法 - Google Patents
スペクトロメトリックリークディテクタの校正方法 Download PDFInfo
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- JP5039034B2 JP5039034B2 JP2008517454A JP2008517454A JP5039034B2 JP 5039034 B2 JP5039034 B2 JP 5039034B2 JP 2008517454 A JP2008517454 A JP 2008517454A JP 2008517454 A JP2008517454 A JP 2008517454A JP 5039034 B2 JP5039034 B2 JP 5039034B2
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- Prior art keywords
- gas
- peak
- calibration
- measured
- leak
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M3/00—Investigating fluid-tightness of structures
- G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
- G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
- G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
- G01M3/207—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material calibration arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M3/00—Investigating fluid-tightness of structures
- G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
- G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
- G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
- G01M3/202—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material using mass spectrometer detection systems
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Examining Or Testing Airtightness (AREA)
Description
図1は、スニファーリークディテクタのブロック略図を示し、
図2は、検出ガスの種々異なるピーク位置を有する質量スペクトルの例を示す図である。
51/14%
69/72%
83/63%
である。
Lr = GF x BF x IW x MF (l)
この式で、
Lr =リークレート
GF =装置係数
BF =(各ピークの)断片係数(Bruchstueckfaktor)
IW =イオン化確率
MF =材料係数
装置係数は、各々のリークディテクタ装置に依存している。装置係数は、リークディテクタ装置の感度を示す。装置係数は、種々異なるガスに対してほぼ一定のままである。テーブルから、ガスの種類に依存する係数BF,IW及びMFを取り出すことができる。そのようなテーブルは、例えば、以下のインターネットアドレスで利用可能である:
http://www.inficongasanalyzers.com/pdf/Calculating_Partia_Pressures.pdf
この実施例の校正ガスR134a(ガス1)に対しては以下の式が当てはまる。
ここで、添字1は、各々ガス1を示す。 式(2)から装置係数
GF = Lr1 / (BF1 x IW1 x MF1) (3)
が得られる。
Lr2 = GF x BF2 x IW2 x MF2 (4)
が成り立つ。
Claims (5)
- テストリークから出てくる所定の校正ガスを用いて、前記校正ガスの分光測定ピークが特定されるようにして、検出すべき種々異なるテストガス用のスペクトロメトリックリークディテクタの校正方法において、
校正ガス又は空気中に含まれているガスから、少なくとも1つのピークのスペクトル位置を特定し、
既知のリークレートの校正ガスの少なくとも1つのピークの測定された振幅を、装置係数の測定用に使用し、
前記校正ガスの既知の断片係数(Bruchstueckfaktoren)と、検査すべきガスの既知の断片係数並びに、装置係数とから、前記検査すべきガス用の校正を決め、
測定された2つのピーク間、乃至、スペクトル軸のゼロ点と、測定された1つのピークとの間で、直線補間によってスペクトル位置を決定する
ことを特徴とする方法。 - スペクトル軸のゼロ点を既知の固定点として利用する請求項1記載の校正方法。
- 検査すべきガスの各ピークを、当該各ピークのスペクトル軸における既知のスペクトル位置に基づいて、測定された単数乃至複数のピーク、及び/又は、質量を示す軸(Massenachse)のゼロ点の補間乃至補外によって決定する請求項1または2記載の校正方法。
- 測定された各ピークの領域の外側に位置している補外領域内で、各スペクトル位置を、最後のピークで決定された、補外領域内でのスペクトル位置の偏差が維持されるように決定する請求項1から3迄の何れか1記載の校正方法。
- テストリークの各ピークの振幅の測定時に、既知の断片係数から偏移した振幅分布を、測定すべき別のガス用各スペクトル軸上での補間乃至補外によって補正する請求項1から4迄の何れか1記載の校正方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005028557.0 | 2005-06-21 | ||
DE102005028557A DE102005028557A1 (de) | 2005-06-21 | 2005-06-21 | Verfahren zum Kalibrieren eines spektrometrischen Schnüffellecksuchers |
PCT/EP2006/062891 WO2006136491A1 (de) | 2005-06-21 | 2006-06-02 | Verfahren zum kalibrieren eines massenspektrometrischen schnüffellecksuchers |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008547009A JP2008547009A (ja) | 2008-12-25 |
JP5039034B2 true JP5039034B2 (ja) | 2012-10-03 |
Family
ID=36698654
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008517454A Active JP5039034B2 (ja) | 2005-06-21 | 2006-06-02 | スペクトロメトリックリークディテクタの校正方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8302454B2 (ja) |
EP (1) | EP1893965B1 (ja) |
JP (1) | JP5039034B2 (ja) |
CN (1) | CN101203738B (ja) |
DE (1) | DE102005028557A1 (ja) |
WO (1) | WO2006136491A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009059824A1 (de) * | 2009-12-21 | 2011-06-22 | Inficon GmbH, 50968 | Verfahren und Vorrichtung zur Leckbestimmung |
DE102012203137A1 (de) * | 2012-02-29 | 2013-08-29 | Inficon Gmbh | Verfahren zur Bestimmung des Maximums des Massenpeaks in der Massenspektrometrie |
DE102013216450A1 (de) * | 2013-08-20 | 2015-02-26 | Inficon Gmbh | Pico-Prüfleck |
GB2520684B (en) * | 2013-11-27 | 2020-05-20 | Micromass Ltd | Method for measurement of ion events |
FR3080915B1 (fr) * | 2018-05-02 | 2020-05-08 | Pfeiffer Vacuum | Module de detection de fuites et procede de controle de l etancheite d un objet a tester par gaz traceur |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6463250A (en) * | 1987-09-02 | 1989-03-09 | Nec Corp | Electron beam processor |
JPH05217549A (ja) * | 1992-02-06 | 1993-08-27 | Fujitsu Ltd | 四重極質量分析計の校正方法 |
AT397891B (de) * | 1992-05-27 | 1994-07-25 | Oesterr Forsch Seibersdorf | Massenspektrometrisches verfahren und massenspektrometer zur analyse von komplexen gasmischungen |
JP2612999B2 (ja) * | 1992-10-26 | 1997-05-21 | 日本電信電話株式会社 | 質量分析型ガス漏れ検知器 |
JP2675954B2 (ja) * | 1993-01-26 | 1997-11-12 | 日本電信電話株式会社 | 質量分析型ガス漏れ検知器の校正方法 |
FR2767197B1 (fr) * | 1997-08-11 | 1999-12-03 | Alsthom Cge Alcatel | Analyseur de gaz |
US6871169B1 (en) * | 1997-08-14 | 2005-03-22 | Sensys Medical, Inc. | Combinative multivariate calibration that enhances prediction ability through removal of over-modeled regions |
WO2001063250A1 (fr) * | 2000-02-24 | 2001-08-30 | Tokyo Electron Limited | Procede et appareil de detection de fuite, et appareil de fabrication de semi-conducteurs |
DE10046039A1 (de) * | 2000-09-18 | 2002-03-28 | Basf Ag | Polykondensation von organischen Siliciumverbindungen |
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2005
- 2005-06-21 DE DE102005028557A patent/DE102005028557A1/de not_active Ceased
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2006
- 2006-06-02 WO PCT/EP2006/062891 patent/WO2006136491A1/de active Application Filing
- 2006-06-02 US US11/922,038 patent/US8302454B2/en active Active
- 2006-06-02 CN CN2006800220128A patent/CN101203738B/zh active Active
- 2006-06-02 EP EP06777266.5A patent/EP1893965B1/de active Active
- 2006-06-02 JP JP2008517454A patent/JP5039034B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
DE102005028557A1 (de) | 2007-01-04 |
EP1893965B1 (de) | 2018-11-21 |
JP2008547009A (ja) | 2008-12-25 |
EP1893965A1 (de) | 2008-03-05 |
CN101203738B (zh) | 2010-11-03 |
WO2006136491A1 (de) | 2006-12-28 |
US8302454B2 (en) | 2012-11-06 |
CN101203738A (zh) | 2008-06-18 |
US20090314052A1 (en) | 2009-12-24 |
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