JP5004891B2 - Inclination adjusting mechanism and method for controlling the inclination adjusting mechanism - Google Patents

Description

  The present invention relates to a technique for adjusting the tilt of a stage on which a tilt adjustment target is placed.

  In recent years, with the miniaturization of devices such as MEMS devices and RF devices and the increase in density of electronic circuits, chips are pressure-mounted on the circuit pattern surface of the substrate placed on the stage with high positional accuracy, There is a need to pressure-bond other substrates to this substrate, including bonding, with high positional accuracy. In the field of nanoimprinting, there is a demand for aligning a mold having a fine pattern with respect to a substrate and performing pressure transfer. Therefore, in order to improve the positional accuracy during contact pressure mounting of the chip to be pressed on the substrate placed on the stage, or the positional accuracy when bonding another substrate to this substrate, the substrate on the stage Therefore, there is a demand for a technique for adjusting the parallelism between the circuit pattern surface and the circuit pattern surface of a chip mounted thereon or another substrate to be bonded with high accuracy by adjusting the tilt of the stage. In addition, it is required to pressurize uniformly during pressurization. Accordingly, the following techniques have been proposed as techniques for adjusting the tilt of the stage.

  In the apparatus described in Patent Document 1, a spherical member having a convex spherical surface provided on the lower surface side of the stage and a receiving member having a concave spherical surface that receives the spherical member are arranged such that the convex spherical surface of the receiving member passes through air. It is configured to be able to move freely along the concave spherical surface. As described above, since the frictional force generated between the convex spherical surface and the concave spherical surface is suppressed by passing air between the convex spherical surface and the concave spherical surface, the convex spherical surface moves freely along the concave spherical surface. be able to. Therefore, when the substrate placed on the stage and the chip mounted on the substrate are brought into contact with each other, the stage of the substrate on the stage is passively copied by moving the convex spherical surface along the concave spherical surface. The parallelism between the substrate and the chip can be adjusted by adjusting the inclination.

  A configuration is also known in which the convex spherical surface can move freely along the concave spherical surface of the receiving member by using a bearing instead of the air described above.

  Further, in the apparatus described in Patent Document 2, the stage is adjusted by supporting the stage from below while a plurality of piezo elements expand and contract, and the board placed on the stage is mounted on the board. A configuration in which the parallelism between the chip and the like is matched is also known.

JP 2006-134899 A (paragraphs 0016 to 0028, FIGS. 1 to 3 etc.) Japanese Patent Laying-Open No. 2006-116602 (paragraph 0016, FIGS. 3, 7, 8, etc.)

  By the way, in the apparatus described in the above-mentioned Patent Document 1, air is used between the convex spherical surface and the concave spherical surface at the time of copying the stage by moving the convex spherical surface of the spherical member along the concave spherical surface of the receiving member. The generation of frictional force is suppressed. As described above, air is used during the copying operation of the stage when the substrate on the stage, which is the object to be tilted, and the chip mounted thereon are in contact with each other. Therefore, the copying operation of the stage is performed in a vacuum atmosphere. I can't. Therefore, in a vacuum atmosphere, it is impossible to adjust the parallelism between the substrate and the chip mounted thereon by adjusting the inclination of the substrate placed on the stage using this apparatus. .

  Further, in this apparatus, although air is used to suppress the generation of frictional force between the convex spherical surface and the concave spherical surface, the air is distributed over the entire contact surface between the convex spherical surface and the concave spherical surface. For this purpose, the convex spherical surface and the concave spherical surface must be formed of a very expensive sintered metal containing many open pores so that air tends to remain on the surfaces of the convex spherical surface and the concave spherical surface. Further, in order to supply air to the contact surface between the convex spherical surface and the concave spherical surface, complicated processing has to be performed on the convex spherical surface and the concave spherical surface, which causes a cost increase.

  By the way, the copying operation of the stage as described above is performed by passively moving the stage by a moment generated when a chip mounted on the substrate placed on the stage hits a so-called piece. . This copying operation is completed when the stage is passive and the contact between the substrate and the chip is eliminated. At this time, if the size of the chip mounted on the substrate is small, the moment generated is also small. Therefore, even if the friction force generated between the convex spherical surface and the concave spherical surface is suppressed using air, the stage can be successfully performed. There was a risk of not copying. In addition, in order to distribute air between the convex spherical surface and the concave spherical surface, high pressure air must be supplied. Therefore, there is a possibility that the stage may not be copied accurately, and there has been a demand for improvement in technology.

  Further, in the configuration in which the convex spherical surface freely moves along the concave spherical surface of the receiving member via the bearing, the stage is supported by a plurality of bearings that support the convex spherical surface by points. Therefore, compared to the configuration in which the concave spherical surface described in Patent Document 1 is in surface contact with the convex spherical surface to support the stage, the applied pressure that can be applied to the stage is small. In addition, if a high pressure exceeding the breaking strength of the bearing is applied to the stage, the bearing may be damaged.

  On the other hand, in the apparatus described in Patent Document 2 described above, a plurality of piezo elements are mounted on a substrate placed on a stage to actively adjust the tilt of the stage by supporting the stage from below while expanding and contracting. Regardless of the size of the chip etc., the tilt of the stage can be adjusted with high accuracy. However, since this apparatus only supports a plurality of parts of the stage from below with a plurality of piezo elements, the pressure that can be applied to the stage is such that the concave spherical surface contacts the convex spherical surface. Compared to the configuration that supports

  As described above, conventionally, it has been difficult to achieve both a technique for adjusting the tilt of the stage with high accuracy and a technique for increasing the applied pressure that can be applied to the stage. Moreover, it was not possible in a vacuum.

  The present invention has been made in view of the above-described problems, and provides a technique capable of adjusting the tilt of the stage with high accuracy and increasing the pressurizing force that can be applied to the stage. Objective.

  It is a second object of the present invention to provide a technique that can adjust the tilt of the head with high accuracy and can increase the applied pressure that can be applied to the head.

  In order to achieve the first object, an inclination adjustment mechanism according to the present invention includes a stage on which an inclination adjustment object is placed on an upper surface, and a surface that is in contact with and away from the lower surface of the stage so that the stage can be moved. A back-up means for supporting, and a plurality of piezo elements each having a support portion provided at the tip thereof, and the piezo elements that adjust the tilt of the stage by supporting the stage from below by the support portions while the piezo elements expand and contract. Drive means, wherein the piezo drive means expands and contracts each of the piezo elements so that the lower surface of the stage and the backup means are separated at least when the tilt of the stage is adjusted (Claim 1). .

  In order to achieve the above object, the tilt adjusting mechanism control method according to the present invention includes a stage on which an object to be tilted is placed on an upper surface, and a lower surface of the stage so as to be in contact with and away from the surface. In a control method of a tilt adjustment mechanism comprising backup means for supporting a stage, the stage is tilted by supporting the stage from below by the support part while a plurality of piezo elements provided with a support part at the front end are expanded and contracted. At least when adjusting the tilt of the stage, each piezoelectric element is expanded and contracted so that the lower surface of the stage and the backup means are separated from each other (claim 12).

  With such a configuration, the stage is adjusted by tilting the stage by supporting the stage from below with a support portion at the tip while the plurality of piezoelectric elements expand and contract, and at least when adjusting the stage tilt, the lower surface of the stage and the backup means are Each piezo element is expanded and contracted so as to be separated from each other. Therefore, when adjusting the tilt of the stage by the expansion and contraction of the piezo element, there is no disturbance such as frictional force caused by the backup means coming into contact with the lower surface of the stage. The tilt of the stage can be adjusted. In addition, since the backup means supports the stage by making contact with the lower surface of the stage so as to be able to come in contact with and away from the stage, even if a high pressure is applied to the stage, the backup means supports the stage from below with the surface. The stage can be reliably supported, and the applied pressure that can be applied to the stage can be increased.

  Further, when adjusting the tilt of the stage, the lower surface of the stage is separated from the backup means by expansion and contraction of the piezo element, so that no disturbance such as a frictional force due to the support of the lower surface of the stage by the backup means occurs. Therefore, unlike the conventional case, there is no need to supply high pressure air to the contact surface between the lower surface of the stage and the backup means, so there is no need to configure the stage with a special material such as sintered metal. For example, the manufacturing cost of the apparatus can be greatly reduced. Further, since air is not used when adjusting the tilt of the stage, disturbance caused by the supplied air acting on the stage does not occur, and the tilt of the stage can be adjusted with high accuracy.

  Further, the lower surface of the stage may be formed in a convex spherical shape, and the backup means may be provided with a spherical concave portion that can slide on the lower surface of the convex spherical surface.

  With such a configuration, the spherical concave portion of the backup means reliably contacts the lower surface of the convex spherical stage to support the stage no matter how the tilt of the stage is adjusted by expansion and contraction of the piezo element. can do.

  The lower surface of the stage is formed in a flat shape, and the backup means is formed with a base portion formed with a spherical concave portion and a spherical convex portion that can be slidably contacted with the spherical concave portion, and the spherical convex portion A configuration may be provided in which a receiving portion is provided in surface contact with the lower surface of the stage while being in sliding contact with the spherical concave portion.

  With such a configuration, no matter how the inclination of the stage is adjusted by the expansion and contraction of the piezo element, the receiving part of the backup means is surely flat with the convex part slidingly contacting the spherical concave part of the base part. The stage can be supported in surface contact with the lower surface of the stage.

  Moreover, it is good also as a spherical bearing centering on the contact surface of a to-be-pressurized object. By doing so, the positional deviation at the time of contact is eliminated, and the positional accuracy can be improved and the influence of friction on the joint surface can be reduced.

  In addition, since the tilt adjusting mechanism according to the present invention does not employ air as a means for suppressing the friction force generated between the lower surface of the stage and the backup unit, the tilt adjusting mechanism of the present invention is used in a vacuum atmosphere. can do. Therefore, a configuration may be provided in which a vacuum chamber is further provided, and the stage, the backup unit, and the piezo driving unit are disposed in the vacuum chamber.

  With such a configuration, for example, when adjusting the tilt of a wafer whose surface is activated by plasma or the like as the tilt adjustment target, the wafer is adjusted by adjusting the tilt of the wafer in vacuum. This is convenient because the surface activation state of the surface can be maintained over a long period of time.

  Further, a head that is disposed opposite to the stage and holds a reference tilt object on the lower surface that serves as a reference tilt in tilt adjustment of the tilt adjustment object by adjusting the tilt of the stage, and an upper surface of the stage, Moving means for moving the lower surface of the head so as to be close to each other, wherein the piezo driving means is configured such that the inclination of the inclination adjustment object substantially coincides with the inclination of the reference inclination object. Then, after adjusting the tilt adjustment object and the reference tilt object substantially in parallel, the stage and the head are moved close to each other so that the tilt adjustment object and the reference tilt object are brought into contact with each other. (Claim 5).

  With such a configuration, the inclination adjustment object and the reference inclination object are aligned by substantially matching the inclination of the inclination adjustment object placed on the stage with the inclination of the reference inclination object held on the lower surface of the head. Since the tilt adjustment target object and the reference tilt target object are brought into contact with each other after being adjusted to be substantially parallel to each other, it is possible to effectively prevent positional deviation caused by the difference in the tilt of the contact surfaces between the two objects. Can be prevented.

  Further, the apparatus further includes a pressurizing unit that pressurizes an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage, and each of the piezoelectric elements is disposed so as to surround the backup unit. The support part surrounds the support position of the lower surface of the stage by the backup unit and supports the stage from below, and the piezo driving unit is configured to press the lower surface of the stage before pressurizing the object to be pressed by the pressurizing unit. The piezo elements are expanded and contracted so that the backup means are separated from each other, and the pressurizing means is expanded and contracted by the piezo drive means so that the lower surface of the stage and the backup means are separated from each other. Later, the object to be pressurized may be pressurized (Claim 6).

  With such a configuration, when the object to be pressed is pressed by the pressurizing unit, each piezo element is expanded and contracted so that the lower surface of the stage and the backup unit are separated from each other. The stage is supported by a piezo element that surrounds the support position and supports the stage from below. Therefore, it is possible to intensively pressurize the peripheral portion of the pressed object whose stage is supported from below by the piezo element.

  Further, the apparatus further includes a pressurizing unit that pressurizes an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage, and each of the piezoelectric elements is disposed so as to surround the backup unit. The support unit surrounds the support position of the lower surface of the stage by the backup unit and supports the stage from below, and the piezo driving unit is operated by the support unit before pressurizing the object to be pressed by the pressurizing unit. The piezo elements are expanded and contracted to release the support state from below the stage, and the pressurizing means is configured so that the piezo drive means releases the support state from below the stage. You may make it pressurize the said to-be-pressurized object after expanding / contracting (Claim 7).

  With such a configuration, when the object to be pressed is pressed by the pressing unit, each piezo element is expanded and contracted so as to release the support state from below the stage by the support portion of the piezo element. It will be supported by backup means disposed between each piezo element. Therefore, it is possible to intensively pressurize the central portion of the object to be pressed whose stage is supported from below by the backup means.

  Further, a pressurizing unit that pressurizes an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage, a load detection unit that detects a load on each piezoelectric element, and each piezoelectric element Piezo element control parameter storage means for preliminarily storing control parameters when the piezo drive means expands and contracts, and the piezo drive means detects the load when the pressurizing object is pressurized by the pressurizing means. A configuration in which each piezo element is expanded and contracted based on the control parameter stored in advance in the piezo element control parameter storage means so that the detected value of the load applied to each piezo element by the means becomes a preset set value. (Claim 8).

  With such a configuration, the load center can be obtained by calculating the output value from each load detecting means, and can be adjusted to the load center position designated in advance by driving the piezo element. Further, since the load at the time of pressurization is received by the piezo element and the backup means, the difference between the actually applied load and the total load detection value of each piezo element becomes the load applied to the backup means. For this reason, it is possible to control the uniform load state during pressurization including the above-described medium-bottom state and medium-high state from the relationship between the load received by the backup means and the load received by each piezo element.

  A head disposed opposite to the stage to hold the object to be pressed on the lower surface; a moving means for moving the upper surface of the stage and the lower surface of the head so as to approach each other; and an upper surface of the stage A pressure object as the tilt adjustment object placed on the head, a pressure means for pressurizing the pressure object held by the head, and load detection for detecting a load on each piezo element Each of the piezo elements so that the detected value of the load applied to each piezo element by the load detecting means becomes a preset value when the object to be pressed is pressed by the pressing means. Control parameters when the piezoelectric driving means expands and contracts, and each piezoelectric element by the load detection means when the object to be pressed held by the stage and the object to be pressed held by the head are contacted by the moving means Piezo element control parameter storage means for preliminarily storing control parameters when the piezo driving means expands and contracts each piezo element so that the detected value of the load becomes a preset setting value, and the piezo driving Means for contacting the objects to be pressed by the moving means, and for pressing the objects to be pressed by the pressing means, for the contacts previously stored in the piezo element control parameter storage means respectively; The piezoelectric elements may be expanded and contracted based on the control parameters during the pressurization.

  With such a configuration, the stage inclination can be changed when the objects to be pressed are in contact with each other and between the objects to be pressed, so that the position does not shift when the objects to be pressed are in contact with each other. Set the pressure object placed on the stage in parallel with the pressure object held by the head, and make the load to the pressure object uniform during pressurization (correcting back-up and deflection of members) Setting), it is possible to eliminate misalignment and pressurize with a uniform load.

  Also, when the object to be pressed is in contact, the backup means is separated from the stage, and the contact detection of the object to be pressed is detected by the load detection means under the piezo element, so that it is detected closest to the contact object and without resistance. Therefore, contact between objects to be pressed can be detected with high accuracy in a very low load region. After that, when pressurizing objects to be pressed, the piezoelectric element is lowered and the back-up means receives a high load from the pressurizing means. Uniform load can be obtained. As the detection means for feeding back the applied pressure in this case, if the pressurizing means is a servo, the torque control of the motor may be performed, and if it is a cylinder, the pressure control of the fluid may be performed. However, since there is a resistance such as a bearing or a sealing O-ring between the object to be pressurized, a minute pressure control as in contact cannot be expected. An object to be pressurized placed on the upper surface of the stage can be uniformly pressurized over the entire surface.

  In order to achieve the second object, the tilt adjustment mechanism according to the present invention includes a head having a tilt adjustment object installed on a lower surface thereof and a surface contactable to and away from the upper surface of the head. And a plurality of piezo elements each having a support portion provided at the tip thereof, and the head is supported from above by the support portion while the piezo elements extend and contract to adjust the tilt of the head. Piezo driving means, wherein the piezo driving means extends and contracts each of the piezo elements so that the upper surface of the head and the backup means are separated at least when adjusting the tilt of the head. ).

  With such a configuration, the head is supported from above by the support portion at the tip while the plurality of piezo elements expand and contract to adjust the head tilt, and at least when adjusting the head tilt, the upper surface of the head and the backup means are Each piezo element is expanded and contracted so as to be separated from each other. Therefore, when adjusting the tilt of the head by expansion and contraction of the piezo element, there is no disturbance such as friction force caused by the backup means coming into contact with the upper surface of the head. The head tilt can be adjusted. Further, since the backup means supports the head by making contact with the upper surface of the head so as to be able to contact and separate, the backup means supports the head from above with a surface even if a high pressure is applied to the head from below. Thus, the head can be reliably supported, and the pressurizing force that can be applied to the head can be increased.

  Further, when adjusting the head tilt, the upper surface of the head and the backup unit are separated from each other by expansion and contraction of the piezo element, so that no disturbance such as frictional force due to the support of the upper surface of the head by the backup unit occurs. Therefore, unlike the conventional case, it is not necessary to supply high pressure air to the contact surface between the upper surface of the head and the backup means, so there is no need to configure the head with a special material such as sintered metal. For example, the manufacturing cost of the apparatus can be greatly reduced. Further, since air is not used when adjusting the head tilt, there is no disturbance caused by the supplied air acting on the head, and the head tilt can be adjusted with high accuracy.

  In addition, a stage that is disposed opposite to the head and holds a reference tilt object on the upper surface that serves as a reference tilt in tilt adjustment of the tilt adjustment object by adjusting the tilt of the head, and a lower surface of the head, And a moving means for moving the upper surface of the stage so as to be close to each other, wherein the piezo driving means approximately matches the inclination of the inclination adjustment object with the inclination of the reference inclination object. After the tilt adjustment object and the reference tilt object are adjusted to be substantially parallel, the head and the stage are moved close to each other so that the tilt adjustment object and the reference tilt object are brought into contact with each other. (Claim 11).

  With such a configuration, the inclination adjustment object and the reference inclination object are aligned by substantially matching the inclination of the inclination adjustment object installed on the head with the inclination of the reference inclination object held on the upper surface of the stage. Since the tilt adjustment target object and the reference tilt target object are brought into contact with each other after being adjusted substantially parallel to each other, it is possible to effectively prevent positional deviation caused by different tilts of the contact surfaces between the two objects when contacting each other. it can.

  According to the invention described in claims 1 and 12, each piezo element is expanded and contracted so that the lower surface of the stage is separated from the backup means at least when adjusting the tilt of the stage. In this case, since there is no disturbance such as friction force caused by the backup means coming into contact with the lower surface of the stage, the tilt of the stage can be adjusted with a very high accuracy by a smooth operation. In addition, since the backup means supports the stage by making contact with the lower surface of the stage so as to be able to come in contact with and away from the stage, even if a high pressure is applied to the stage, the backup means supports the stage from below with the surface. The stage can be reliably supported, and the applied pressure that can be applied to the stage can be increased.

  According to the invention described in claim 2, no matter how the inclination of the stage is adjusted by the expansion and contraction of the piezo element, the spherical concave portion of the backup means is surely in surface contact with the lower surface of the convex spherical stage, The stage can be supported.

  According to the third aspect of the invention, no matter how the inclination of the stage is adjusted by the expansion and contraction of the piezo element, the receiving portion of the backup means is in a state where the spherical convex portion is in sliding contact with the spherical concave portion of the base portion. The stage can be supported by making surface contact with the lower surface of the flat stage.

  According to the invention described in claim 4, for example, when adjusting the tilt of the wafer whose bonding surface is surface-activated by plasma or the like as the tilt adjustment object, by adjusting the tilt of the wafer in a vacuum, This is convenient because the surface activation state of the bonding surface of the wafer can be maintained over a long period of time.

  According to the fifth aspect of the present invention, the inclination adjustment object and the reference inclination are substantially matched with the inclination of the reference inclination object held on the lower surface of the head. Since the tilt adjustment target object and the reference tilt target object are brought into contact with each other after the target object is adjusted to be substantially parallel, the positional deviation caused by the difference in the tilt of the contact surface between the two objects occurs. It can be effectively prevented.

  According to the sixth aspect of the present invention, when the object to be pressed is pressed by the pressing unit, each piezo element is expanded and contracted so that the lower surface of the stage and the backup unit are separated from each other. It is supported by a piezo element that surrounds the support position on the lower surface of the stage and supports the stage from below. Therefore, it is possible to intensively pressurize the peripheral portion of the pressed object whose stage is supported from below by the piezo element.

  According to the invention described in claim 7, in order to expand and contract each piezo element so as to release the support state from below the stage by the support portion of the piezo element when the object to be pressed is pressed by the pressurizing unit, The stage is supported by backup means disposed between each piezo element. Therefore, it is possible to intensively pressurize the central portion of the object to be pressed whose stage is supported from below by the backup means.

  According to the eighth aspect of the present invention, the load center can be obtained by calculating the output value from each load detecting means, and adjusted to the load center position designated in advance by driving the piezo element. Further, since the load at the time of pressurization is received by the piezo element and the backup means, the difference between the actually applied load and the total load detection value of each piezo element becomes the load applied to the backup means. For this reason, it is possible to control the uniform load state during pressurization including the above-described medium-bottom state and medium-high state from the relationship between the load received by the backup means and the load received by each piezo element.

  According to the ninth aspect of the present invention, since the inclination of the stage can be changed when the objects to be pressed are in contact with each other and when the objects to be pressed are pressed, the positional deviation can be reduced when the objects to be pressed are in contact with each other. Set to a value that does not occur (the pressure object placed on the stage is parallel to the pressure object held by the head), and a value that makes the load on the pressure object uniform during pressurization By setting to (corrected deflection), it is possible to eliminate the displacement and pressurize with a uniform load.

  According to the tenth aspect of the present invention, since each piezo element is expanded and contracted so that the upper surface of the head and the backup unit are separated from each other at least during the head tilt adjustment, the head tilt is adjusted by the expansion and contraction of the piezo element. In addition, since there is no disturbance such as friction force caused by the backup means coming into contact with the upper surface of the head, the tilt of the head can be adjusted with very high accuracy by a smooth operation. Further, since the backup means supports the head by making contact with the upper surface of the head so as to be able to contact and separate, the backup means supports the head from above with a surface even if a high pressure is applied to the head from below. Thus, the head can be reliably supported, and the pressurizing force that can be applied to the head can be increased.

  According to the eleventh aspect of the present invention, the inclination adjustment object and the reference inclination object are substantially matched with the inclination of the reference inclination object held on the upper surface of the stage. After the object is adjusted to be almost parallel, the tilt adjustment object and the reference tilt object are brought into contact with each other. Can be prevented.

<First Embodiment>
A nanoimprint apparatus 1 including a plane adjustment mechanism 2 that is a first embodiment of an inclination adjustment mechanism of the present invention will be described with reference to FIG. FIG. 1 is a diagram illustrating a configuration of the nanoimprint apparatus 1. A nanoimprint apparatus 1 shown in FIG. 1 is a substrate having an uneven pattern formed by lithography on an original plate (corresponding to “reference tilt object” and “pressurized object” of the present invention) M made of SiO ₂ or the like. (Equivalent to “inclination adjustment object” and “pressurized object” of the present invention) Imprinted on a transfer liquid layer composed of an ultraviolet curable resin liquid layer coated on S, A plane adjustment mechanism (corresponding to the “tilt adjustment mechanism” of the present invention) 2 on which the substrate S is placed, a recognition means 3 capable of simultaneously reading the alignment marks AL formed on the original plate M and the substrate S, and recognition Alignment means 4 for aligning the original plate M and the substrate S based on the reading of the alignment mark AL on the original plate M and the substrate S by the means 3, a monitor 8a, a plane adjustment mechanism 2, and a recognition means 3 And a controller 8 (corresponding to “piezo drive means” of the present invention) 8 for controlling the drive of the alignment means 4.

  Further, the plane adjusting mechanism 2 is disposed in a vacuum chamber 5 provided in the nanoimprint apparatus 1, and the vacuum chamber 6 is evacuated by a vacuum pump 6, whereby a transfer liquid layer of the substrate S having an uneven pattern of the original M Imprinting can be performed in a vacuum. Further, a glass window 7 is provided in the upper part of the vacuum chamber 5, and the recognition means 3 reads the alignment mark AL of the original plate M and the substrate S through the glass window 7, or the substrate S through the glass window 7. The applied ultraviolet curable resin liquid layer can be irradiated with ultraviolet light. In addition, a holding mechanism (not shown) such as an electrostatic chuck, a mechanical chuck, or a vise (not shown) is provided below the glass window 7 in the vacuum chamber 5 so that the original plate M, the substrate S, and other components can be held. Equivalent to “head”). Then, by holding the substrate S or other components instead of the original plate M in this holding mechanism, the nanoimprint apparatus 1 is held by the substrate S placed on the stage 21 included in the planar adjustment mechanism 2 and the holding mechanism. It can also be used as a joining device with the substrate S or the component made. Further, as will be described later, the original plate M or the substrate S held by the holding mechanism, or other components, and the substrate S on the stage 21 come into contact with each other by moving the stage 21 upward, and the stage 21 and the glass window. 7 is sandwiched and pressurized by the lower holding mechanism. Therefore, the glass window 7 is made of hard glass so that the original plate M and the like held by the holding mechanism can be supported from the upper surface side.

Recognition means 3, X-Y directions and the camera table 31 movable in the Z direction which is the focus direction, the substrate with ultraviolet light from the ultraviolet light source 32a via the original plate M made of glass windows 7 and SiO ₂ S And a camera 33 constituted by a CCD or the like so that the alignment mark AL of the original plate M and the substrate S can be read simultaneously through the glass window 7. The fiber lens 32 and the camera 33 are installed on the camera table 31, and the fiber lens 32 and the camera 33 are moved by the movement of the camera table 31 in the XY direction and the Z direction based on a control command from the controller 8. It is selectively disposed above the glass window 7 so that the substrate S can be irradiated with ultraviolet light, and the alignment mark AL of the original plate M and the substrate S can be read simultaneously.

  The alignment means 4 is composed of a piezo element or the like and is capable of position control in nanometer units, and one end is attached to the XY table 41 via a pressure sensor 42 and the other end is vacuum. A Z-axis 43 led out of the chamber 5, a Z-axis guide 44 a for guiding the Z-axis 43, a θ-axis 44 capable of rotating the Z-axis 43 in the θ (rotation) direction, and a ball screw 45 a A Z-axis 43 can be controlled to move up and down in the Y direction, and a servo mechanism 45 controlled by the controller 8 is provided. Since the other end of the Z-axis 43 is led out of the vacuum chamber 5 through an O-ring (not shown), the atmosphere in the vacuum chamber 5 and the outside air are surely shut off. In addition, the Z-axis 43 is controlled to move upward by the servo mechanism 45, and the substrate S placed on the stage 21 of the plane adjustment mechanism 2 installed on the XY table 41 comes into contact with the original plate M. While being detectable by the pressure sensor 42, the output of the pressure sensor 42 is fed back to the controller 8. The controller 8 can control the pressure applied to the original plate M of the substrate S by controlling the elevation of the Z axis 43 using the output of the pressure sensor 42. As described above, the controller 8, the Z axis 43, and the servo mechanism 45 function as the “pressurizing unit” and the “moving unit” of the present invention.

  Further, the position information obtained by simultaneously reading the alignment mark AL of the original plate M and the substrate S irradiated with the light from the coaxial light source 33 a by the camera 33 is fed back to the controller 8, and the controller 8 is obtained by the camera 33. Using the position information, a relative position error between the original plate M and the alignment mark AL of the substrate S is derived, and based on this position error, the XY table 41 and the θ axis 44 of the alignment means 4 are driven to drive the original plate. The alignment between M and the substrate S can be performed with high accuracy.

  The controller 8 detects each alignment mark image by performing image processing by the vector correlation method on the alignment mark images of the original plate M and the substrate S obtained by the camera 33. With such a configuration, when both alignment marks AL of the original plate M and the substrate S are not within the depth of field of the camera 33, both alignment mark images picked up by the camera 33 are blurred. However, by displaying the density of each alignment mark image as a vector, the shape of the alignment mark can be accurately detected from both alignment mark images.

  Next, the plane adjustment mechanism 2 will be described with reference to FIG. FIG. 2 is an enlarged view of a main part of the nanoimprint apparatus 1 and shows the plane adjusting mechanism 2. FIG. 2A is a plan view and FIG. 2B is a front view. As shown in the figure, the plane adjustment mechanism 2 includes a stage 21 that includes a heater (not shown), is provided with an electrostatic chuck, a mechanical chuck, and the like and is configured to be able to place and hold the substrate S on the upper surface. A convex spherical hemisphere 22 formed on the lower surface of the stage 21, a spherical bearing 23 formed so as to be in sliding contact with the hemisphere 22 and supporting the hemisphere 22 in contact with and away from the surface, and the stage 21. Three piezoelectric elements (piezo elements) 24a, 24b, 24c (supported from below by the support portions 24a1, 24b1, 24c1 at the front end and pressed by adjusting the tilt of the stage 21 by expanding and contracting the stage 21 from the lower surface side. The stage 2 is disposed under the piezoelectric elements 24a, 24b, and 24c, and detects the load applied to the piezoelectric elements 24a, 24b, and 24c. Detectable pressure sensor load to and a ( "load detecting means" corresponds to the present invention) 25. As shown in FIG. 2, the piezoelectric elements 24 a, 24 b, and 24 c are disposed so as to surround the spherical bearing 23, and the support portions 24 a 1, 24 b 1, and 24 c 1 are supported on the stage 21 by the spherical bearing 23 (hemisphere 22). ) To support the stage 21 from below. With such a configuration, the spherical bearing 23 surely has the bottom surface of the convex spherical stage 21 (hemisphere 22) regardless of how the inclination of the stage 21 is adjusted by the expansion and contraction of the piezoelectric elements 24a, 24b, and 24c. The stage 21 can be supported in surface contact with the surface.

  Further, the plane adjusting mechanism 2 controls the expansion and contraction of the piezoelectric elements 24a, 24b, and 24c using the output of the pressure sensor 25 when the substrate S and the original plate M are pressurized, so that the addition between the stage 21 and the original plate M is performed. Parallelism adjustment during pressure can be performed. That is, first, the servo mechanism 45 is driven, and the Z-axis 43 is moved upward until the pressure sensor 42 detects the ground contact between the stage 21 and the original plate M. Then, after the hemisphere 22 is in sliding contact with the spherical bearing 23 and the copying of the stage 21 and the original plate M is completed, the controller 8 causes the piezoelectric element 24a so that the outputs of the three pressure sensors 25 become substantially the same value. , 24b, and 24c, the parallelism when the original plate M and the stage 21 are pressed can be adjusted with high accuracy. In this way, by adjusting the parallelism between the original plate M and the stage 21, the substrate S placed on the stage 21 can be uniformly pressed over the entire surface of the original plate M as shown in FIG. FIG. 3 is a view showing a state where the entire surface of the substrate S is uniformly pressed (hereinafter referred to as “uniformly pressed state”).

  In addition, before making the board | substrate S mounted in the stage 21 and the original plate M contact, the inclination adjustment of the stage 21 demonstrated in detail later is performed, and each contact of the board | substrate S on the stage 21 and the original plate M is performed. It is desirable to adjust the inclination of the surface with high accuracy so as to prevent the positional deviation that occurs when the substrate S and the original plate M are brought into contact with each other. Further, when the substrate S and the original plate M are pressurized, a frictional force is generated on the contact surface between the hemispherical body 22 and the spherical bearing 23. However, when the substrate 8 and the original plate M are pressed by the controller 8 using the servo mechanism 45, the moment generated in the stage 21 and the pressing force to the stage 21 by the expansion / contraction control of the piezoelectric elements 24a, 24b, 24c by the controller 8 Thus, the hemispherical body 22 can be in sliding contact with the spherical bearing 23.

  Next, an example of a method for controlling the planar adjustment mechanism 2 will be described with reference to FIG. 4A and 4B are views mainly showing a state where the central portion of the substrate S is pressurized (hereinafter referred to as “medium / high state”), where FIG. 4A is a front view and FIG. 4B is a plan view. As shown in the figure, the piezoelectric elements 24a, 24b, and 24c are controlled by a control command from the controller 8 when the substrate S and the original plate M are pressed by moving the Z-axis 43 upward. The center portion of the substrate S on which the stage 21 (hemisphere 22) is supported by the spherical bearing 23 is released by controlling the drive so that the support portion 24a1, 24b1, 24c1 supports the stage 21 from below. The pressure can be intensively applied. With such a configuration, since air accumulated in the central portion is pushed out to the peripheral edge side of the substrate S, it is possible to prevent a void from being generated particularly near the central portion of the substrate.

  Next, another example of the method for controlling the planar adjustment mechanism 2 will be described with reference to FIG. 5A and 5B are views showing a state in which the peripheral edge of the substrate S is mainly pressed (hereinafter referred to as a “medium-bottom state”), where FIG. 5A is a front view and FIG. 5B is a plan view. is there. When the substrate S placed on the stage 21 and the original plate M are pressed by moving the Z-axis 43 upward, the piezoelectric elements 24a, 24b, and 24c are controlled by a control command from the controller 8 as shown in FIG. Is controlled so that the lower surface (hemisphere 22) of the stage 21 and the spherical bearing 23 are separated from each other, thereby focusing on the peripheral portion of the substrate S on which the stage 21 is supported by the piezoelectric elements 24a, 24b, and 24c. Can be pressurized. With such a configuration, for example, the substrate S in which a frame for atmosphere sealing is formed at the peripheral portion, and the substrate S serving as a lid held by a holding mechanism above the stage 21 instead of the original plate M. By bonding, when the arbitrary atmosphere is sealed in the portion surrounded by the frame body between the two substrates S, the peripheral portion of the substrate S can be intensively pressurized. Can be joined well.

  In order to bring the substrate S and the original plate M into a uniform pressure state, the expansion and contraction of the piezoelectric elements 24a, 24b, and 24c may be controlled so that the expansion and contraction state is substantially intermediate between the medium-bulk state and the medium-high state. Conventionally, the tilt of the stage 21 is fixed at the time of contact between the substrate S and the original plate M, and the substrate S is pressurized in a state in which this tilt is maintained. Therefore, the pressurization state with respect to the substrate S and the original plate M cannot be corrected, and the pressurization state on the substrate S and the original plate M depends on the polishing state of the substrate S and the manufacturing accuracy of the stage 21 and the like, and is uniformly pressed. It was difficult to achieve a state, and there was a need for improvement in technology. However, according to the configuration described above, the expansion and contraction amounts of the piezoelectric elements 24a, 24b, and 24c can be quantified and controlled by the controller 8, thereby adjusting the medium and high states. A uniform pressurization state that is an intermediate state between the state and the medium-high state can be realized. Thus, the pressurization state of the substrate S or the like can be easily adjusted by adjusting the expansion / contraction amount of the piezoelectric elements 24a, 24b, and 24c when the substrate S or the like is pressed.

  As will be described later, the parallelism between the substrates S and between the substrate S and the original plate M, that is, the inclination of the substrate S, the original plate M, the stage 21 and the like, and the parallelism of the substrate S at the time of high pressurization, etc. The degree (inclination) is slightly different due to the deflection of the device that occurs during pressurization. Thus, as described above, the amount of expansion and contraction of the piezoelectric elements 24a, 24b, and 24c can be quantitatively controlled, so that not only a uniform pressurization state but also a medium solid state or a medium high state can be achieved.

  Further, as will be described later, when the substrates S or the substrate S and the original plate M are in contact with each other, the parallelism ( When contact is made in a state in which the inclination is adjusted, the hemispherical body 22 and the spherical bearing 23 may be separated from each other and a gap may be left therebetween. The hemisphere 22 and the spherical bearing 23 are brought into contact with each other by shrinking the piezoelectric elements 24a, 24b, and 24c while increasing the applied pressure while maintaining the uniform pressure state, thereby further increasing the applied pressure. As a result, the parallelism of the contact surfaces between the substrates S or between the substrate S and the original plate M is maintained, that is, no displacement occurs due to slippage or the like on the contact surfaces, which occurs due to high pressure. Although the inclination of the stage 21 changes due to the deflection of the apparatus, the uniform pressure state is maintained. Such a uniform pressure state is realized by the piezoelectric elements 24a, 24b, and 24c and the bearing operations of the hemispherical body 22 and the spherical bearing 23 functioning in a well-balanced manner. When the piezoelectric elements 24a, 24b, and 24c are made long (high), they are in a medium-border state, and when the piezoelectric elements 24a, 24b, and 24c are made short (low), they are in a medium-high state.

  Next, referring to FIG. 6 to FIG. 8, the nanoimprint apparatus 1 holds the substrate S or other components in place of the original plate M in the holding mechanism provided at the lower part of the glass window 7. Alternatively, an example when used as a joining device between other components and the substrate S placed on the stage 21 will be described. 6 to 8 are diagrams illustrating an example of a method for uniformly pressing the substrate S over the entire surface, and are diagrams illustrating different states. There is a slight shift in the parallelism between the glass window 7 and the stage 21, and these shifts are schematically shown in these drawings.

  As shown in FIG. 6, at least during tilt adjustment of the stage 21, the expansion and contraction control of the piezoelectric elements 24 a, 24 b, and 24 c is performed by the drive signal of the controller 8, and the hemisphere 22 is lifted away from the spherical bearing 23 and separated. By adjusting the inclination of 21, the parallelism between the substrate S placed on the stage 21 and the substrate S held by the holding mechanism provided at the lower part of the glass window 7 is adjusted. This is because the adjustment of the parallelism between the stage 21 and the holding mechanism disposed under the glass window 7 by the method of contacting the stage 21 and the glass window 7 with the hemisphere 22 and the spherical bearing 23 separated from each other. In advance, the lengths of the piezoelectric elements 24a, 24b, and 24c when the parallelism between the stage 21 and the glass window 7 is adjusted are measured in advance, and the control parameters (" Is stored in a storage means such as a memory provided in the controller 8 and the stored value is used to store the stage 21 on which the substrate S is placed; The parallelism with the holding mechanism at the lower part of the glass window 7 holding the substrate S or the component can be adjusted. Further, the tilt of the stage 21 may be adjusted using a displacement sensor such as an eddy current sensor.

  Next, as shown in FIG. 7, the stage 21 is moved upward to bring the substrate S placed on the stage 21 into contact with the substrate S held by the holding mechanism provided below the glass window 7. In this contact state, the piezoelectric element is controlled so that the hemisphere 22 and the spherical bearing 23 come into contact with each other while moving the stage 21 further upward to gradually increase the applied pressure. At this time, the two substrates S in contact with each other are not displaced due to the static frictional force acting on the contact surface.

  With such a configuration, the inclinations of the substrates S placed on the stage 21 are substantially matched with the inclinations of the substrates S held by the holding mechanism provided at the lower part of the glass window 7, so Since the two substrates S are brought into contact after the contact surfaces are adjusted to be substantially parallel, it is possible to effectively prevent a positional shift caused by a difference in inclination between the contact surfaces when the two substrates are in contact.

As shown in FIG. 8, when the hemisphere 22 and the spherical bearing 23 come into contact with each other, the drive control of the Z-axis 43 (stage 21) is changed from the upward position (movement) control to the output value of the pressure sensor 42. The pressure control based on the above is switched, and the piezoelectric elements 24a, 24b, and 24c are further contracted while the substrates S are pressurized with an arbitrary pressure. With such a configuration, the stage 21 is supported by the spherical bearing 23 via the hemispherical body 22, and the stage by the spherical bearing 23 is supported so that the spherical bearing 23 can support the hemispherical body 22 in a stable state. The inclination of the stage 21 naturally changes so that the support direction of the 21 (hemisphere 22) is substantially opposite to the direction of the applied pressure. That is, the deflection of the glass window 7 and the like due to the high pressurizing force changes the tilt of the stage 21 so that the direction of the pressurizing force and the substrate mounting surface of the stage 21 are substantially orthogonal to each other. In contrast to the example shown in FIG. 2, the parallelism on the holding mechanism side below the glass window 7 follows the stage 21. Therefore, the inclination of the holding mechanism side of the stage 21 and the lower portion of the glass window 7 when the two substrates S held by the stage 21 and the holding mechanism are in contact (see FIG. 6), and the lower portion of the stage 21 and the glass window 7 at the time of high pressurization. The inclination of the holding mechanism side of the two substrates S is different (see FIG. 8). Thus, by varying the inclination of the stage 21 and the like at the time of contact and at the time of high pressurization, the two substrates S are brought into contact with each other. It is possible to apply pressure uniformly from a direction substantially perpendicular to.

  In other words, the plane adjusting mechanism 2 moves the hemisphere 22, the spherical bearing 23, and the piezoelectric elements 24a, 24b, and 24c when the pressure that causes distortion in the stage 21 and the glass window 7 is not applied to both the substrates S. Utilizing the control, the parallelism of the stage 21 is controlled to match the glass window 7, that is, the substrate S side held by the holding mechanism. On the other hand, when high pressure is applied to both the substrates S so that the stage 21 and the glass window 7 are distorted, the plane adjusting mechanism 2 uses these distortions to hold the lower part of the glass window 7 as described above. By controlling the parallelism on the mechanism side to the stage 21, it is possible to press both substrates S satisfactorily at all times from the time when both substrates S are in contact until both substrates S are pressed with a high pressure. In addition, when high pressurizing force is applied to both the substrates S in a state where the inclination of the holding mechanism side below the stage 21 and the glass window 7 is maintained from the state when the two substrates S are in contact with each other as shown in FIG. Since the direction of the pressure applied to S and the inclination of the contact surfaces of the two substrates S are not substantially orthogonal to each other, there is a risk of positional deviation between the substrates S during pressurization. However, by performing the above-described control, it is possible to reliably prevent the positional deviation between the two substrates S when the two substrates S are pressurized.

  Note that, as described with reference to FIG. 2, the piezoelectric elements 24 a, 24 b, and 24 c may be expanded and contracted so as to be in a uniform pressure state using the output value of the pressure sensor 25 as described with reference to FIG. . Further, the lengths of the piezoelectric elements 24a, 24b, 24c when both substrates S are uniformly pressed over the entire surface during high pressurization are measured in advance, and the control parameters are stored in a storage means such as a memory provided in the controller 8. The lengths (control parameters) of the piezoelectric elements 24a, 24b, and 24c stored in the storage means are used when the state is stored and the state of contact between the two substrates S shown in FIG. Thus, the expansion / contraction control of the piezoelectric elements 24a, 24b, and 24c may be performed. That is, the expansion and contraction control of the piezoelectric elements 24a, 24b, and 24c is performed so that the output values of all the pressure sensors 25 are the same, that is, in a state where both the substrates S are uniformly pressed over the entire surface at the time of high pressurization. Do. Next, the control parameters of the piezoelectric elements 24a, 24b, 24c when the output values of all the pressure sensors 25 are almost the same (the “object to be pressed” of the present invention). Is stored in a storage means such as a memory provided in the controller 8 in advance.

  Then, the length of the piezoelectric elements 24a, 24b, and 24c is obtained by using the values stored in the storage means when the state of contact between the substrates S shown in FIG. By controlling the above, it is possible to vary the inclination of the stage 21 and the like when the two substrates S are in contact with each other and at the time of high pressurization. With such a configuration, it is possible to press both substrates S satisfactorily at all times from the time when both substrates S are in contact until both substrates S are pressed with high pressure. Note that when the state of contact between the substrates S is shifted to the high pressure state, the lengths of the piezoelectric elements 24a, 24b, and 24c may be changed stepwise to the lengths stored in the storage unit. . Even with such a configuration, there is no deviation between the two substrates S due to the static friction force acting between the two substrates S, and the two substrates S can be uniformly pressed over the entire surface. Even with such a configuration, the substrate S and the like can be uniformly pressurized over the entire surface. As described above, the controller 8 functions as the “piezo element control parameter storage unit” of the present invention.

  As described above, the tilt of the stage 21 is adjusted by tilt adjustment by the plane adjusting mechanism 2 to bring the substrates S into contact with each other and the output value of the pressure sensor 25 at the time of high pressurization thereafter. By adjusting the inclination of the stage 21 so that both the substrates S are in a uniform pressure state by using a method such as the above, it is possible to achieve a high positional accuracy and without causing a positional shift due to the high pressure. The substrates S can be joined together. In this way, by adjusting the inclination of the stage 21 so as to obtain an optimum inclination when the two substrates S are in contact with each other and when both the substrates S are highly pressurized, the bonding of the substrates S can be performed with high accuracy. The structure to be performed is an epoch-making thing which cannot be achieved by the conventional structure. In the above-described example, the bonding between the substrates S has been described as an example. However, when a component such as a chip is mounted on the substrate S, or the uneven pattern that the original plate M has on the transfer liquid layer UVR on the substrate S. Even when P is imprinted, highly accurate mounting or imprinting can be performed by adjusting the tilt of the stage 21 by this method.

  Next, with reference to FIGS. 9 to 12, an example in which the uneven pattern of the original plate is continuously transferred to the large substrate S by the nanoimprint apparatus 1 will be described with reference to FIG. FIG. 9 is a diagram showing a state in which the uneven pattern of the original plate M is continuously transferred to the transfer liquid layer UVR formed on the substrate S. FIG. 10 is a diagram showing the configuration of the XY coarse movement table 9 that moves the substrate S. 11 and 12 are enlarged views of the main part of the nanoimprint apparatus 1, particularly showing the configuration of the XY coarse movement table 9 and showing different states.

  The nanoimprint apparatus 1 according to the present embodiment moves the substrate S placed on the stage 21 and the substrate receiver 26 roughly by the XY coarse movement table 9 so that the transfer is formed on the large substrate S by coating. The concave / convex pattern of the original plate M can be continuously transferred (imprinted) to a predetermined small area SA of the liquid layer UVR. As shown in FIG. 10, the XY coarse movement table 9 includes an X axis 91, a Y axis 92 provided substantially orthogonal to the X axis 91 so as to be movable along the X axis 91, and a Y axis 92. And a substrate support portion 93 provided so as to be movable along the substrate. With this configuration, as shown in FIG. 11, the substrate S placed on the stage 21 and the substrate receiver 26 is moved in the X direction by moving the Y axis 92 along the X axis 91. The substrate support portion 93 can be moved in the Y direction by moving along the Y axis 92.

  Further, the XY coarse movement table 9 moves the substrate S in a state where the substrate S is in contact with the stage 21, and after the substrate S is moved, the XY coarse movement table 9 is placed in contact with the stage 21 that moves in alignment. Also. The substrate S is moved by the substrate support portion 93 (substrate holding jig) of the coarse movement table 9, but the jig 93 is a guide configured to be slightly larger than the substrate S. By finely moving the position, a gap is formed between the substrate S and the coarse movement table 9 so that the fine movement for aligning the substrate S can be performed.

  Therefore, as shown in FIG. 11, the XY coarse movement table 9 is driven by giving a control command from the controller 8, and of the entire area of the transfer liquid layer UVR formed on the substrate S, The substrate S can be moved roughly so that the region to which the uneven pattern is to be transferred is positioned on the stage 21. Next, by driving the alignment unit 4 and performing high-precision alignment between the original plate M and the substrate S, the uneven pattern of the original plate M can be transferred to the transfer liquid layer UVR on the substrate S with high positional accuracy. Then, as shown in FIG. 12, after the substrate S is moved by driving the XY coarse movement table 9 and high-precision alignment is performed by the alignment means 4, the uneven pattern of the original plate M is transferred to the transfer liquid layer UVR. By repeating the above, the concavo-convex pattern can be transferred to the transfer liquid layer UVR of the original plate M in succession to the transfer liquid layer UVR of the substrate S.

1. Example of Imprint Method Next, an example of the imprint method will be described with reference to FIGS. 13 and 14. FIG. 13 is a diagram illustrating an example of an imprint method. FIG. 14 is a diagram showing the imprint method shown in FIG. 13, and (a) to (d) show different states. As shown in FIG. 13, in this example of the imprinting method, the concave-convex pattern of the original plate M is formed on the single-layered transfer liquid layer UVR formed by applying a photocurable resin that is cured by ultraviolet light on the substrate S. It is configured to imprint P. The transfer liquid layer UVR can be formed of various photocurable resins such as urethane, acrylic, epoxy, and urethane acrylate.

  As shown in FIG. 14A, first, the XY coarse movement table 9 is driven in a state where the concave-convex pattern P of the original plate M and the transfer liquid layer UVR on the substrate S are not in contact with each other. The alignment mark AL is read by the recognition means 3 to perform rough alignment. Then, as shown in FIG. 4B, the Z-axis 43 is moved upward to bring the concave / convex pattern P of the original plate M into contact with the transfer liquid layer UVR.

Next, as shown in FIG. 14 (c), the alignment means 4 is driven in a state in which the concave / convex pattern P surface of the original plate M is in contact with the transfer liquid layer UVR on the substrate S, and the alignment marks on the original plate M and the substrate S are driven. High precision alignment is performed by simultaneously reading AL by the recognition means 3. Then, as shown in FIG. 4D, the Z-axis 43 is further moved upward to press the substrate S against the original plate M with an arbitrary applied pressure, and the camera table 31 is driven, whereby the fiber lens 32 is moved. Arranged above the glass window 7. Subsequently, of the entire region of the transfer liquid layer UVR, the ultraviolet light is partially irradiated to the region where the original plate M made of SiO ₂ contacts. As a result, the portion of the transfer liquid layer UVR that is in contact with the concavo-convex pattern P of the original M is cured, and imprinting of the concavo-convex pattern P onto the portion is completed.

  With such a configuration, the alignment mark AL formed on each of the original plate M and the substrate S is recognized in a state where the uneven pattern P surface of the original plate M is in contact with the transfer liquid layer UVR applied on the substrate S. 3, the original plate M and the substrate S are aligned by reading at the same time, so that the concave and convex pattern P of the original plate M can be easily obtained without special processing on the original plate M and the substrate S as in the prior art. In addition, imprinting can be performed on the transfer liquid layer UVR on the substrate S with high positional accuracy. Moreover, since the alignment between the original plate M and the substrate S is performed by reading the alignment mark AL between the original plate M and the substrate S by the recognition means 3, there is no possibility that the original plate M and the substrate S are damaged due to the alignment.

  In addition, since the transfer liquid layer UVR is formed of a resin liquid layer if the above-described imprint method is configured, the resin liquid layer (transfer liquid layer UVR) on which the uneven pattern P of the original plate M is imprinted. ) As a mask, it can be easily formed as a circuit pattern on the substrate S.

  Moreover, if it is set as the structure of an example of the above-mentioned imprinting method, many photocurable resins have low viscosity, and the uneven | corrugated pattern P of the original plate M is made by making photocurable resin with low viscosity into the transfer liquid layer UVR. With the surface in contact with the transfer liquid layer UVR applied on the substrate S, the alignment between the original plate M and the substrate S can be easily performed.

2. Next, another example of the imprint method will be described with reference to FIGS. 15 and 16. FIG. 15 is a diagram illustrating another example of the imprint method. FIG. 16 is a diagram showing the imprint method shown in FIG. 15, and (a) through (d) show different states. As shown in FIG. 15, another example of this imprint method is different from the above-described imprint method in that the transfer onto the substrate S formed by applying a photocurable resin that is cured by ultraviolet light. The liquid layer UVR has a two-layer structure in which the base liquid layer BR is a lower layer and the lubricating liquid layer LR having a lower viscosity than the base liquid layer BR is an upper layer. And the uneven | corrugated pattern P which the original plate M has is imprinted on the transfer liquid layer UVR comprised in this way in 2 layer structure.

  As shown in FIG. 16A, first, the XY coarse movement table 9 is driven in a state where the uneven pattern P of the original plate M and the transfer liquid layer UVR on the substrate S are not in contact with each other, and the original plate M and the substrate S are thus driven. The alignment mark AL is read by the recognition means 3 so that the rough alignment between the original plate M and the substrate S is performed. Then, as shown in FIG. 4B, the Z-axis 43 is moved upward to bring the concave / convex pattern P of the original plate M into contact with the lubricating liquid layer LR (transfer liquid layer UVR).

Next, as shown in FIG. 16C, the alignment means 4 is driven in a state where the uneven pattern P surface of the original plate M is in contact with the lubricating liquid layer LR on the substrate S, so that the alignment marks on the original plate M and the substrate S are aligned. By simultaneously reading AL by the recognizing means 3, high-precision alignment between the original plate M and the substrate S is performed. Then, as shown in FIG. 4D, the substrate S is moved further upward by moving the Z-axis 43 to the original plate M so that the concave / convex pattern P of the original plate M contacts the base liquid layer BR. The fiber lens 32 is disposed above the glass window 7 by pressing and driving the camera table 31. Subsequently, ultraviolet light is partially irradiated to the position of the original plate M made of SiO ₂ in the transfer liquid layer UVR. As a result, the portion of the transfer liquid layer UVR that is in contact with the concavo-convex pattern P of the original M is cured, and imprinting of the concavo-convex pattern P onto the portion is completed. Then, as shown in FIG. 4D, the Z-axis 43 is further moved upward to press the substrate S against the original plate M with an arbitrary applied pressure, and the camera table 31 is driven, whereby the fiber lens 32 is moved. Arranged above the glass window 7. Subsequently, of the entire region of the transfer liquid layer UVR, the ultraviolet light is partially irradiated to the region where the original plate M made of SiO ₂ contacts. As a result, the portion of the transfer liquid layer UVR that is in contact with the concavo-convex pattern P of the original M is cured, and imprinting of the concavo-convex pattern P onto the portion is completed.

  With such a configuration, the original plate M has the original plate M by aligning the original plate M and the substrate S in a state where the uneven pattern surface of the original plate M is in contact with the lubricating liquid layer LR having a lower viscosity than the base liquid layer BR. The uneven pattern P can be easily imprinted on the transfer liquid layer UVR on the substrate S with high positional accuracy.

  As described above, according to the present embodiment, while the plurality of piezoelectric elements 24a, 24b, and 24c are expanded and contracted, the stage 21 is supported from below by the support portions 24a1, 24b1, and 24c1 at the front ends to adjust the inclination of the stage 21. At least during the tilt adjustment of the stage 21, the piezoelectric elements 24a, 24b, and 24c are expanded and contracted so that the lower surface (hemisphere 22) of the stage 21 and the spherical bearing 23 are separated from each other. Therefore, when adjusting the inclination of the stage 21 by expansion and contraction of the piezoelectric elements 24a, 24b, and 24c, there is no disturbance such as friction force caused by the spherical bearing 23 coming into contact with the hemisphere 22 of the stage 21. Therefore, the tilt of the stage 21 can be adjusted with very high accuracy by a smooth operation. In addition, since the spherical bearing 23 is in surface contact with the hemispherical body 22 of the stage 21 so as to come into contact with and separate from the stage 21 and supports the stage 21, the spherical bearing 23 holds the stage 21 even if high pressure is applied to the stage 21. The stage 21 can be reliably supported by supporting the surface from below, and the applied pressure that can be applied to the stage 21 can be increased.

  Further, since air is not employed as means for suppressing the frictional force generated between the hemispherical body 22 and the spherical bearing 23, the plane adjusting mechanism 2 can be used in a vacuum atmosphere. Therefore, when adjusting the tilt of the wafer whose surface is activated by plasma, etc., the surface activation state of the bonded surface of the wafer can be maintained for a long time by adjusting the tilt of the wafer in vacuum. It is convenient because there is.

Second Embodiment
A nanoimprint apparatus 100 including a plane adjustment mechanism 102 that is a first embodiment of the tilt adjustment mechanism of the present invention will be described with reference to FIG. FIG. 17 is a diagram illustrating a configuration of the nanoimprint apparatus 100. The nanoimprint apparatus 100 is different from the nanoimprint apparatus 1 of the first embodiment in that it includes a drive unit 200 having a piezo drive means 215 instead of the XY table 41, and the stage 121 is moved by the drive unit 200. The high-precision alignment of the original plate M and the substrate S is performed. In the nanoimprint apparatus 1, a base 141 having a light guide path 141 a configured by a prism or a mirror is disposed at a position where the XY table 41 is disposed, and is disposed outside the vacuum chamber 5. The original plate M and the substrate S can be irradiated from the light source 34 with alignment infrared light or transfer liquid layer curing ultraviolet light. Since other configurations are the same as those of the first embodiment, the same configurations are denoted by the same reference numerals, and descriptions of the configurations and operations are omitted. Hereinafter, a description will be given centering on differences from the first embodiment.

  As shown in FIG. 17, the plane adjustment mechanism (corresponding to the “tilt adjustment mechanism” of the present invention) 102 is disposed in the vacuum chamber 5 provided in the nanoimprint apparatus 100, and the plane adjustment mechanism 102 is the drive unit described above. 200. The drive unit 200 will be described in detail later. In the nanoimprint apparatus 100, the vacuum chamber 5 is evacuated by the vacuum pump 6, whereby the imprint pattern of the original plate M on the transfer liquid layer of the substrate S can be performed in vacuum. Further, a glass window 7 is provided in the upper part of the vacuum chamber 5, and the recognition means 3 reads the alignment mark AL of the original plate M and the substrate S through the glass window 7, or the substrate S through the glass window 7. The applied ultraviolet curable resin liquid layer can be irradiated with ultraviolet light.

  On the other hand, a glass window 5 a is formed on the side surface of the vacuum chamber 5, so that infrared light or ultraviolet light can enter the vacuum chamber 5 from a light source 34 provided outside the vacuum chamber 5. Light incident from the light source 34 into the vacuum chamber is guided to the original plate M, the substrate S, and the camera 33 by a light guide 141 a provided on the base 141. With this configuration, for example, when the original plate M is made of a material that does not transmit visible light, such as Si, the camera 33 is guided by guiding infrared light from below to the camera 33. The alignment marks AL of M and the substrate S can be read simultaneously. When the original plate M is made of a material that cannot transmit ultraviolet light, the ultraviolet light is guided from below to the transfer liquid layer UVR on the substrate S, so that the transfer liquid layer UVR is cured and the original plate M is cured. Can be imprinted on the transfer liquid layer UVR.

  Next, the planar adjustment mechanism 102 will be described with reference to FIG. As shown in FIG. 17, the plane adjustment mechanism 102 includes a heater 121 (not shown), an electrostatic chuck, a mechanical chuck, and the like, and a stage 121 configured to be able to place and hold the substrate S, and a stage A hemisphere (corresponding to the “receiving portion” of the present invention) 122 in which a spherical convex portion is provided on the lower surface side of 121 so as to be able to come into contact with and separate from the planar lower surface of stage 121; A spherical concave portion 122 (corresponding to the “base” of the present invention) 123 that is formed with a spherical concave portion that can slidably contact with the spherical convex portion 122 and supports the hemispherical body 122 detachably, and a support foot (the “support” of the present invention 213), the stage 121 is supported from below, and the stage 121 is pressed by expanding and contracting from the lower surface side to control the tilt of the stage 121 and to move the stage 121 in the XY direction and the θ (rotation) direction. Move And three driving units 200 are disposed on each of the lower drive unit 200, and a detectable pressure sensor 25 a load to the stage 121. With such a configuration, the hemisphere 122 is in a state in which the spherical convex portion is in sliding contact with the spherical concave portion of the spherical bearing 123, regardless of how the tilt of the stage 121 is adjusted by the drive unit 200 as will be described later. However, the stage 121 can be reliably supported by surface contact with the lower surface of the planar stage 121.

  As shown in FIG. 18, the drive unit 200 is provided with an auxiliary lifting piezoelectric element 227 that can be expanded and contracted in the vertical direction below a base 203 of a drive unit 219 (see FIG. 19) described later. 203, a receiving unit (corresponding to the “supporting portion” of the present invention) 217, a lifting and lowering piezoelectric element 205, a lower coupling body 207, a piezo driving means 215, a supporting foot 213, and an auxiliary lifting and lowering piezoelectric element 227 are integrated into a driving unit. 200.

  Next, the driving unit 219 shown in FIG. 19 will be described in detail with reference to FIGS. FIG. 19 is a front view of the drive unit. FIG. 20 is a plan view of a part of the drive unit. FIG. 21 is an explanatory diagram of the walking operation by the drive unit. FIG. 22 is an explanatory diagram of the walking operation by the drive unit. FIG. 23 is an explanatory diagram of a positioning operation for positioning the stage.

  The drive unit 219 is configured as follows. That is, as shown in FIGS. 19 and 10, a lift piezoelectric element (piezo element) 205 is disposed on a flat base 203, and the lift piezoelectric element 205 is placed on the lift piezoelectric element 205 via a lower coupling body 207. The driving piezoelectric elements 209a, 209b, and 209c are connected to each other, and a long support leg 213 is connected to the driving piezoelectric elements (piezo elements) 209a, 209b, and 209c in the vertical direction via the upper connecting body 211. Is supported. Here, each driving piezoelectric element 209a, 209b, 209c and the upper coupling body 211 constitute a piezo driving means 215.

  The base 203 is provided with a pedestal 217, and the support foot 213 moves up and down through an opening 217 a in the upper center of the pedestal 217, and the support foot 213 is driven by the driving piezoelectric elements 209 a and 209 b. , 209 c to expand and contract in the vertical direction, the tip (upper end) of the support foot 213 moves above and below the upper surface of the cradle 217. Then, a drive unit 219 in which the base 203, the receiving base 217, the lifting and lowering piezoelectric element 205, the lower coupling body 207, the piezo driving means 215, and the support foot 213 are integrated is formed, for example, as shown in FIG. The three drive units 200 having the drive unit 219 are arranged substantially on the circumference to constitute the plane adjustment mechanism 102.

  Further, for example, a disk-shaped stage 121 that holds a substrate such as a semiconductor wafer is placed on the upper surface of the cradle 217, and the stage 121 is lifted from above the cradle 217 as the tip of the support foot 213 moves. When the support legs 213 of the plurality of drive units 200 (drive units 219) move in a coordinated manner, the stage 121 is moved (including rotation) in a predetermined direction and held on the stage 121. A substrate such as a semiconductor wafer is positioned at a predetermined position.

  The operation of the drive unit 200 will be briefly described with a focus on the operation of the drive unit 219. A voltage is applied to each drive piezoelectric element 209a, 209b, 209c by the controller 8 so that each drive piezoelectric element 209a, 209b, 209c is changed. The tip end of the support leg 213 is protruded upward from the upper surface of the cradle 217 by being extended and displaced upward. As a result, the stage 121 on the cradle 217 is once lifted from the cradle 217, and from this state, the voltage applied to each drive piezoelectric element 209a, 209b, 209c by the controller 8 is controlled to thereby drive each drive piezoelectric element 209a, 209b. , 209c are expanded and contracted as appropriate, and the stage 121 is translated by moving the support foot 213 in one direction, for example. Thereafter, the driving piezoelectric elements 209a, 209b, and 209c are compressed and displaced by applying a voltage opposite to that at the time of extension, and thereby the tip of the support foot 213 is sunk below the upper surface of the cradle 217, so that the support foot 213 is lowered. The stage 121 is moved down and placed on the cradle 217 again, while the support legs 213 are returned to their original positions, and the stage 121 is moved to a predetermined position by repeating such operations and held on the stage 121. A substrate such as a semiconductor wafer is positioned at a predetermined position. At this time, the distal ends of the driving piezoelectric elements 209a, 209b, and 209c move in the horizontal direction and the height direction due to the expansion and contraction of the driving piezoelectric elements 209a, 209b, and 209c, and the distal ends of the support feet 213 are in the horizontal direction and height. It can move in the direction. Further, the arrangement configuration of the piezoelectric elements may be a configuration in which the plane direction and the height direction are separated.

  If the drive unit 200 (drive unit 219) is configured as described above, the distance between the cradle 217 and the support foot 213 can be reduced, and a compact configuration can be achieved. Moreover, since the distance between the cradle 217 and the support foot 213 can be reduced, when the stage 121 is lifted from the cradle 217 by driving the piezo driving means 215 and the support foot 213, The influence of the undulation and unevenness of the contact surface can be minimized.

  The drive piezoelectric elements 209a, 209b, and 209c are elements that expand and contract when a voltage is applied, and any material may be used. In addition, since the drive unit 200 includes a receiving base 217 on which the stage 121 is placed and supports the load, the stage 121 is supported only by the support legs 213 connected to the drive piezoelectric elements 209a, 209b, and 209c. Compared with the case where it supports, the durability with respect to the pressure applied to the stage 121 can be improved.

  Next, the walking operation of the drive unit 200 (drive unit 219) in the plane adjustment mechanism 102 will be described with reference to FIGS.

  First, the operation of the drive unit 219 will be described in detail. As shown in FIGS. 21 and 21, the controller 8 starts each drive from the controller 8 with an initial state where the tip of the support foot 213 sinks below the upper surface of the cradle 217. A voltage is arbitrarily applied to each of the piezoelectric elements 209a, 209b, and 209c, and the support foot 213 is tilted in the direction opposite to the direction of the arrow D for moving the stage 121 (step S1 in FIGS. 21 and 22).

  Subsequently, the driving piezoelectric elements 209 a, 209 b, and 209 c are extended and displaced with the support feet 213 tilted so that the tips of the support feet 213 protrude above the upper surface of the cradle 217, and the stage 121 is supported by the support feet 213. Is lifted to raise the stage 121 from the cradle 217 (step S2 in FIGS. 21 and 22). Then, with the stage 121 lifted by the tip of the support foot 213, the voltage applied by the controller 8 is controlled to displace the driving piezoelectric elements 209a, 209b, and 209c, and the tip of the support foot 213 is moved in the direction of arrow D. By tilting, the stage 121 is moved in the direction of arrow D (step S3 in FIGS. 21 and 22).

  Thereafter, the controller 8 controls the applied voltage to compress and displace the driving piezoelectric elements 209a, 209b, and 209c so that the tip of the support foot 213 is depressed below the upper surface of the cradle 217 (FIGS. 21 and 22). In step S4), when the inclination of the support foot 213 is returned to the initial state, one walking operation is completed (step S5 in FIGS. 21 and 22).

  Next, the positioning operation of the stage 121 that is positioned by the walking operation of each drive unit 200 (drive unit 219) of the plane adjustment mechanism 102 will be described with reference to FIG. As shown in FIG. 23, the stage 121 can be moved in the X, Y, and θ (rotation) directions and in the three directions by appropriately combining the walking operations of the three drive units 200 constituting the plane adjustment mechanism 102. Positioning operation combining movement can be performed. For example, as shown in FIG. 23A, when the support legs 213 of the drive units 200 are simultaneously moved in the same X direction, the stage 121 can be moved in the X direction, as shown in FIG. In addition, if the support legs 213 of the respective drive units 200 are simultaneously moved in the same Y direction, the movable stage 121 can be moved in the Y direction. As shown in FIG. When 213 is simultaneously moved in the tangential direction of the circumference of the disk-shaped stage 121, the stage 121 can be rotationally moved in the θ direction, and when the moving direction of the support legs 213 of the drive unit 200 is reversed, the stage 121 can be rotated in the direction opposite to the θ direction.

  If necessary, when the controller 8 applies a voltage to the driving piezoelectric elements 209a, 209b, and 209c, the creep characteristics in the contracting operation of the driving piezoelectric elements 209a, 209b, and 209c are set for each driving target. It is desirable to perform a creep correction operation to temporarily overshoot and return to the target voltage with respect to the target voltage with respect to the expansion / contraction amount of the piezoelectric elements 209a, 209b, and 209c. Thus, each driving piezoelectric element 209a, 209b, 209c can be controlled accurately and quickly to the final target displacement, and the plane adjusting mechanism 102 using each driving piezoelectric element 209a, 209b, 209c can be controlled. Responsiveness can be improved and high-speed and high-accuracy positioning can be performed.

  According to such a configuration, the alignment of the original plate M and the substrate S can be performed with very high positional accuracy by moving the stage 121 by the planar adjustment mechanism 102. Further, since the elevating piezoelectric element 205 for elevating and lowering the driving piezoelectric elements 209a, 209b, and 209c at the same time is provided below the driving piezoelectric elements 209a, 209b, and 209c, each driving piezoelectric element is expanded and contracted. The elements 209a, 209b, and 209c can be moved up and down at the same time, and the lack of expansion and contraction of the driving piezoelectric elements 209a, 209b, and 209c can be compensated by the raising and lowering of the lifting and lowering piezoelectric element 205. In order to secure the amount of protrusion from the base, unnecessary work such as polishing while measuring the upper surface of the cradle becomes unnecessary.

  In addition, since the walking operation can be executed by the drive unit 200 having the cradle 217 and the one support foot 213, compared to the conventional configuration in which two support feet 213 are required to execute the walking operation. Therefore, it is possible to reduce the size of the apparatus and reduce the manufacturing cost.

  If there are two support feet 213, when the support feet 213 are switched to support the stage 121, both support feet 213 are swinging, so that slip occurs between the support feet 213 and the stage 121. As a result, misalignment occurs, and the intended operation cannot be obtained. However, with the above-described configuration, the support foot 213 can be walked with one foot, so that the occurrence of slipping between the support foot 213 and the stage 121 can be suppressed, and the target stage 121 can be moved. Can be performed.

  Further, as shown in FIG. 23, if the plane adjustment mechanism 102 includes three drive units 200 so as to be positioned on an arbitrary circumference, nine drive piezoelectric elements are used in all directions of the stage 121. Therefore, the apparatus can be made compact and the cost can be reduced.

  Furthermore, since an arbitrary plane is defined by the three tips of the support legs 213 of the three drive units 200, if the contact surface of the stage 121 with the support legs 213 is a plane, even during the walking operation Since the stage 121 and the support foot 213 always come into contact with each other, the slip between the stage 121 and the support foot 213 can be suppressed, which is very preferable.

  Further, the plane adjusting mechanism 102 described above has both high-accuracy position control by the driving unit 200 having the driving piezoelectric elements 209a, 209b, and 209c and high load resistance by the cradle 217.

  Further, the plane adjustment mechanism 102 can adjust the parallelism between the stage 121 and the original plate M using the output of the pressure sensor 25. That is, first, the servo mechanism 45 is driven, and the Z axis 43 is moved upward until the pressure sensor 42 detects the ground contact between the stage 121 and the original plate M. Then, after the hemisphere 122 is in sliding contact with the spherical bearing 123 and the copying of the stage 121 and the original plate M is completed, the expansion and contraction control of the piezoelectric elements of the drive unit 200 is further performed so that the outputs of the three pressure sensors 25 match. By performing the above, the parallelism between the original plate M and the stage 121 can be adjusted with high accuracy. In this way, by adjusting the parallelism between the original plate M and the stage 21, the substrate S placed on the stage 21 can be uniformly pressed over the entire surface of the original plate M as shown in FIG.

  In addition, before making the board | substrate S mounted in the stage 21 and the original plate M contact, the inclination adjustment of the stage 21 similar to 1st Embodiment is performed, and each of the board | substrate S on the stage 21 and the original plate M is carried out. It is desirable to adjust the inclination of the contact surface with high precision so as to prevent the positional deviation that occurs when the substrate S and the original plate M are in contact with each other. Further, when the substrate S and the original plate M are pressurized, a frictional force is generated on the contact surface between the hemispherical body 22 and the spherical bearing 23. However, when the substrate 8 and the original plate M are pressed by the controller 8 using the servo mechanism 45, the moment generated in the stage 21 and the pressing force to the stage 21 by the expansion / contraction control of the piezoelectric elements 24a, 24b, 24c by the controller 8 Thus, the hemispherical body 22 can be in sliding contact with the spherical bearing 23.

  At this time, the above-mentioned lift piezoelectric element 205 is the first lift piezoelectric element, and the auxiliary lift piezoelectric element 227 is the second lift piezoelectric element. For example, in bonding, the substrate S on the stage 121 and the glass window 7 are joined. When contacting with a contact object such as the substrate S held at the lower position, it is necessary to prevent the positional deviation between the two, so the lifting piezoelectric elements 205 as the first lifting piezoelectric elements 205 If the parallel adjustment is performed, the parallel adjustment can be effectively performed and the displacement can be prevented (see FIG. 24). On the other hand, when the substrates S are pressed and bonded, parallel adjustment for applying a uniform load is required, and the parallel adjustment of the substrates S is performed by the auxiliary lifting piezoelectric element 227 which is the second lifting piezoelectric element. If it carries out, the parallel adjustment at the time of pressurization can be performed effectively, and a uniform load can be applied (refer FIG. 25). At this time, in order to avoid misalignment at the time of contact or to make the load at the time of pressurization uniform, fine parallel adjustment within several μm is necessary, but by using this lifting and lowering piezoelectric element, It becomes possible. In addition, since the support foot 213 is lowered and supported by the stage 121 by the receiving base 217 at the time of pressurization, parallel adjustment at the time of contact and parallel adjustment at the time of pressurization can be performed by adopting a two-stage configuration with the base below. This is preferable because it can be adjusted independently. 24 and 25 are diagrams showing an example of the operation of the planar adjustment mechanism 102. FIG.

  Next, an example of a method for controlling the planar adjustment mechanism 102 will be described with reference to FIG. FIG. 26 is a diagram showing a state in which the central portion of the substrate S is mainly pressurized. As shown in the figure, the piezoelectric elements 205 and 227c are contracted by a control command from the controller 8 when the substrate S and the original plate M are pressed by moving the Z axis 43 upward. In this way, the central portion of the substrate S on which the stage 121 is supported by the hemisphere 122 can be intensively pressed by releasing the support state from the lower side of the stage 121 by the support feet 213 and the cradle 217. it can. With such a configuration, since air accumulated in the central portion is pushed out to the peripheral edge side of the substrate S, it is possible to prevent a void from being generated particularly near the central portion of the substrate.

  Next, another example of the control method of the plane adjustment mechanism 2 will be described with reference to FIG. FIG. 27 is a diagram showing a state in which the peripheral edge of the substrate S is mainly pressed. As shown in the figure, when the substrate S placed on the stage 121 and the original plate M are pressurized by moving the Z-axis 43 upward, the piezoelectric element 227 is extended by a control command from the controller 8. By driving and separating the lower surface of the stage 121 and the hemispherical body 122, the peripheral edge of the substrate S on which the stage 121 is supported can be intensively pressed by the cradle 217. With such a configuration, the substrate S on which the frame for atmosphere sealing is formed at the peripheral portion is bonded to the substrate S serving as a lid held by the holding mechanism above the stage 121 instead of the original plate M. Thus, when an arbitrary atmosphere is sealed in the portion surrounded by the frame body between the two substrates S, the peripheral edge portion of the substrate S can be preferentially pressurized. Can be joined well.

  As described above, according to the present embodiment, the same effects as those of the first embodiment described above can be achieved. Further, according to the present embodiment, the uneven pattern of the original M can be imprinted with high positional accuracy on the transfer liquid layer UVR formed on the substrate S by the same method as in the first embodiment. .

<Third Embodiment>
A joining apparatus 300 including a plane adjustment mechanism 502 that is a third embodiment of the tilt adjustment mechanism of the present invention will be described with reference to FIG. FIG. 28 is a diagram illustrating a configuration of the bonding apparatus 300. The bonding apparatus 300 bonds (mounts) a substrate 322 such as a wafer and a chip 320 such as an electrical component, or bonds the substrates 322 to each other. The joining apparatus 300 is significantly different from the nanoimprint apparatuses 1 and 100 of the first and second embodiments described above, in that the head 307 is configured to move up and down, and the plane adjustment mechanism that constitutes the joining apparatus 300. 502 is not provided in the vacuum chamber 5. Hereinafter, the joining apparatus 300 will be described in detail. The flat surface adjustment mechanism (corresponding to the “tilt adjustment mechanism” of the present invention) 502 on which the substrate 322 is placed on the upper surface of the stage 521 provided in the bonding apparatus 300 is the same as the flat surface adjustment mechanism 2 of the first embodiment described above. Since the configuration and the operation are almost the same, the same reference numerals are given, and the detailed description of the configuration and the operation is omitted. Note that, as in the first and second embodiments, a plane adjustment mechanism 502 that constitutes the bonding apparatus 300 may be disposed in the vacuum chamber 5. By doing so, the surface of the bonded portion of the object to be bonded is etched and activated by an energy wave such as plasma or atomic beam, and the work can be performed in a vacuum atmosphere before bonding. Oxidation is prevented, and the etched organic layer and the like are not reattached to the surface of the bonded portion. Therefore, it becomes possible to bond materials (bonded objects) directly at room temperature and under a low load.

  In a bonding apparatus 300 shown in FIG. 28, a chip (a bonding target as a bonding target held by the head 307 on the lower surface and having a metal electrode 320a made of lead-tin solder on a bonding surface of a semiconductor (“ 320 and a stage 521 disposed opposite to the head 307, which is a workpiece to be joined that is held on the upper surface and is made of lead-tin solder. A vertical drive mechanism (“moving means”, “additional force” according to the present invention) that can control a substrate 322 having a metal electrode 322a (corresponding to “an object to be tilted” and “an object to be pressed” in the present invention) The chip 320 and the substrate 322 are joined by heating with the stage heater 311 while pressing the metal electrode 320a and the metal electrode 322a so that the metal electrode 320a and the metal electrode 322a are in contact with each other. As described above, the bonding apparatus 300 according to the present embodiment is configured to be able to form devices such as various semiconductor devices (such as optical element devices) or MEMS devices by bonding the chip 320 and the substrate 322. Has been.

  As shown in FIG. 28, the joining device 300 includes a joining mechanism 327, a mounting mechanism 328 having a plane adjustment mechanism 502 and a stage table 312, a position recognition unit 329, a transport unit 330, and a control device 331. ing. Further, the joining mechanism 327 includes a vertical drive mechanism 325 and a head 307 that holds the chip 320 and the substrate 322 on the lower surface. The vertical drive mechanism 325 includes a head holding portion by a vertical drive motor 301 and a bolt / nut mechanism 302. The 306 can be moved up and down while being guided by the up and down guide 303. The head holding portion 306 is guided in the vertical direction by the head escape guide 305 and is connected to the bolt / nut mechanism 302 while being pulled by the own weight counter 304 for canceling the own weight. The head 307 is coupled to the head holding portion 306.

  In addition, a pressure sensor 332 is provided in the head holding portion 306 so that a pressure applied to an object to be bonded (chip 320, substrate 322, etc.) sandwiched between the head 307 and the stage 521 can be detected. It is configured. Therefore, by feeding back the pressure applied to the workpiece detected by the pressure sensor 332 to the control device 331, the vertical drive mechanism 325 is controlled based on the feedback value to control the pressure applied to the workpiece. be able to. Further, the height of the head 307 can be detected by the head height detecting means 324 provided in the head holding unit 306.

  Further, the mounting mechanism 328 adsorbs and holds the substrate 322 placed on the upper surface, and adjusts the position of the substrate 322 with respect to the chip 320 and the planar adjustment mechanism 502 having a stage 521 with a built-in stage heater 311. And a stage table 312 having a movable axis that can be moved in parallel and rotationally. The joining mechanism 327 is coupled to the frame 334, and the frame 334 is connected to the gantry 335 by four support columns 313 disposed so as to surround the periphery of the pressure center of the head 307. As described above, the chip 320 and the substrate 322 that are the objects to be bonded can be heated by the stage heater 311. Note that a part of the support column 313 and the frame 334 is not shown.

  Next, the plane adjustment mechanism 502 will be described with reference to FIG. Similar to the plane adjustment mechanism 2 shown in FIG. 2, the plane adjustment mechanism 502 includes a stage heater 311 and is configured to be able to place and hold the substrate S on the upper surface by providing an electrostatic chuck, a mechanical chuck, or the like. A stage 521, a convex spherical hemisphere 522 formed on the lower surface of the stage 521, a spherical bearing 523 formed so as to be slidable in contact with the hemisphere 522 and supporting the hemisphere 522 in surface contact with each other. Three piezoelectric elements (piezo elements) 524a and 524b that support the stage 521 from below by the support portions 524a1, 524b1, and 524c1 at the tip and adjust the inclination of the stage 521 by pressing the stage 521 by expanding and contracting from the lower surface side. , 524c (corresponding to the “piezo drive means” of the present invention) and the piezoelectric elements 524a, 524b, 524c. a, 524b, and a 525 (corresponding to the "load detecting means" of the present invention) capable of detecting the pressure sensor a load to the stage 21 by detecting the load to 524c.

  Similar to the planar adjustment mechanism 2 shown in FIG. 2, the piezoelectric (piezo) elements 524a, 524b, and 524c included in the planar adjustment mechanism 502 are disposed so as to surround the spherical bearing 523, and the support portions 524a1, 524b1, and 524c1. Is configured to support the stage 521 from below by surrounding the support position (hemisphere 522) of the stage 521 by the spherical bearing 523. With such a configuration, the spherical bearing 523 can reliably make the bottom surface of the convex spherical stage 521 (hemisphere 522) no matter how the inclination of the stage 521 is adjusted by the expansion and contraction of the piezoelectric elements 524a, 524b, and 524c. The stage 521 can be supported in surface contact.

  The plane adjustment mechanism 502 controls the expansion and contraction of the piezoelectric elements 524a, 524b, and 524c using the output of the pressure sensor 525 when the substrate 322 and the chip 320 are pressed, and the substrate 322 mounted on the stage 521 The parallelism can be adjusted during pressurization with the chip 320 held by the head 307. That is, first, the vertical drive mechanism 325 is driven, and the head 307 is moved downward until the pressure sensor 332 detects the grounding between the substrate 322 and the chip 320. After the hemisphere 522 is in sliding contact with the spherical bearing 523, the substrate 322 and the chip 320 are completely copied, and then the piezoelectric element is controlled by the control device 331 so that the outputs of the three pressure sensors 525 become substantially the same value. By performing expansion / contraction control of 524a, 524b, and 524c, the parallelism when the substrate 322 and the chip 320 are pressed can be adjusted with high accuracy. In this way, by adjusting the parallelism between the substrate 322 and the chip 320, the substrate 322 placed on the stage 521 and the chip 320 held by the head 307 are adjusted as in the example shown in FIG. Uniform pressure can be applied over the entire surface.

  The position recognition unit 329 is inserted between the chip 320 and the substrate 322 arranged to face each other, and the upper and lower mark recognition means 314 for recognizing the alignment marks for position recognition of the upper and lower chips 320 and the substrate 322 respectively. 320, a light emitting point recognizing means 333 that is used when adjusting the position (alignment) between the objects to be bonded by causing the light emitting elements to function electrically and emitting light when bonding the light emitting elements as the objects to be bonded; A recognition means moving table 315 for moving the recognition means 314 and the light emitting point recognition means 333 horizontally and / or up and down is provided.

  Further, the transport unit 330 includes a substrate transport device 316 and a substrate transport conveyor 317 that transport the substrate 322, and a chip supply device 318 and a chip tray 319 that transport the chips 320. The control device 331 functions as the “piezo driving means”, “pressurizing means”, “moving means”, and “piezo element control parameter storage means” of the present invention, controls the plane adjusting mechanism 502, and joins the joining device. 28 is provided with an operation panel (not shown) for controlling the whole 300, and the vertical drive mechanism 325 is controlled by a detection signal of the height position of the head 307 by the head height detection means 324, and the head 307 in FIG. The height in the direction of arrow Z can be adjusted. With such a configuration, the control device 331 performs control similar to the control of the plane adjustment mechanism 2 described with reference to FIGS. 2 to 8 in the first embodiment to the plane adjustment mechanism 502. Can be executed.

  As described above, according to the present embodiment, the same effects as those of the first and second embodiments described above can be achieved. In addition, according to the present embodiment, the parallel adjustment between the chip 320 and the substrate 322 is adjusted with high accuracy by the plane adjustment mechanism 502, so that the chip 320 is bonded to the substrate 322 with very high positional accuracy ( Implementation).

<Fourth embodiment>
A plane adjusting mechanism 602 that is a fourth embodiment of the tilt adjusting mechanism of the present invention will be described with reference to FIG. FIG. 29 is an enlarged view of a main part of the plane adjustment mechanism 602, showing the plane adjustment mechanism 602, where (a) is a plan view and (b) is a front view. This embodiment differs greatly from the third embodiment described above in that a plane adjustment mechanism (corresponding to the “tilt adjustment mechanism” of the present invention) 602 is provided in the upper vertical drive mechanism 325, and the head holding portion 306 is provided. The plane adjustment mechanism 602 also moves up and down as it moves up and down. Since the other configuration and operation are the same as the configuration and operation of the joining apparatus 300 described above, description of the configuration and operation will be omitted, and the plane adjustment mechanism 602 will be described below with reference to FIG. 29 while also referring to FIG. This will be described in detail.

  As shown in FIG. 29, the plane adjusting mechanism 602 is provided in the head holding unit 306, includes a heater (not shown), and is provided with an electrostatic chuck, a mechanical chuck, and the like, and the substrate S is placed and held on the lower surface. The head 621 configured to be capable of being formed, the convex spherical hemisphere 622 formed on the upper surface of the head 621, and the hemisphere 622 are formed so as to be slidable and support the hemisphere 622 so that the hemisphere 622 can be contacted and separated. The spherical bearing 623 and the head 621 are supported from below by the support portions 624a1, 624b1, and 624c1 at the tip, and three piezoelectric elements (piezo elements) that adjust the inclination of the head 621 by pressing the head 621 by expanding and contracting from the upper surface side. Elements) 624a, 624b, and 624c (corresponding to the “piezo drive means” of the present invention) and piezoelectric elements 624a, 624b, and 624c, respectively. Elements 624a, 624b, and a 625 (corresponding to the "load detecting means" of the present invention) capable of detecting the pressure sensor a load to the head 621 by detecting the load to 624c. As shown in FIG. 29, the piezoelectric elements 624a, 624b, and 624c are disposed so as to surround the spherical bearing 623, and the support portions 624a1, 624b1, and 624c1 are supported positions of the head 621 by the spherical bearing 623 (hemisphere 622). ) To support the head 621 from above. With such a configuration, the spherical bearing 623 reliably ensures that the upper surface of the convex spherical head 621 (hemisphere 622) no matter how the inclination of the head 621 is adjusted by the expansion and contraction of the piezoelectric elements 624a, 624b, and 624c. The head 621 can be supported in surface contact. Unlike the above-described third embodiment, the head 621 is pulled upward by a pulling means 626 made of a spring, an elastic member, or the like so as not to fall, and its own weight is canceled. In the initial state, the spherical bearing 623 is used. And the hemisphere 622 are in sliding contact.

Further, the plane adjusting mechanism 602 controls the expansion and contraction of the piezoelectric elements 624a, 624b, and 624c using the output of the pressure sensor 625 when the substrate S or the like is pressed, thereby adding the substrate S between the head 621 and the stage 607. Parallelism adjustment during pressure can be performed. That is, first, the vertical drive mechanism 325 is driven, and the head holding unit 306 is moved downward until the pressure sensor 332 detects the grounding of the substrate S held on the head 621 and the stage 607, respectively.
Then, after the copying operation of the head 621 by the hemispherical body 622 slidingly contacting the spherical bearing 623 is completed, the piezoelectric elements 624a and 624b are further controlled by the control device 331 so that the outputs of the three pressure sensors 625 become substantially the same value. , 624c, the parallelism of the substrate S and the like installed on the head 621 and the stage 607 can be adjusted with high accuracy. In this way, by adjusting the parallelism of the substrate S and the like placed on the head 621 and the stage 607, respectively, the substrate S and the like held on the head 621 and the stage 607 are spread over the entire surface as shown in FIG. Uniform pressure can be applied. FIG. 30 is a view showing a state where the entire surface of the substrate S is uniformly pressed (hereinafter referred to as “uniformly pressed state”).

  Before the substrate S or the like placed on the stage 607 is brought into contact with the substrate S or the like placed on the head 621, the head 621 is held in the head 621 by adjusting the inclination of the head 621 described in detail later. For example, misalignment that occurs when the substrates S are in contact with each other can be achieved by adjusting the inclinations of the contact surfaces of the substrate S and the substrate S placed on the stage 607 with high accuracy. Desirable to prevent. Further, when the substrate S or the like is pressed, a frictional force is generated on the contact surface between the hemisphere 622 and the spherical bearing 623. However, when the control device 331 using the vertical drive mechanism 325 pressurizes the substrate S or the like, the moment generated in the head 621, and the pressing force to the head 621 by the expansion and contraction control of the piezoelectric elements 624a, 624b, and 624c by the control device 331, Thus, the hemispherical body 622 can come into sliding contact with the spherical bearing 623.

  Next, an example of a control method of the plane adjustment mechanism 602 will be described with reference to FIG. FIGS. 31A and 31B are views mainly showing a state where the central portion of the substrate S is pressurized (hereinafter referred to as “medium / high state”), where FIG. 31A is a front view and FIG. 31B is a plan view. As shown in the figure, piezoelectric elements 624a, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, 624b, and 624b are pressed by a control command from the controller 331 when the stage S607 and the substrate S held by the head 621 are pressed. The center of the substrate S on which the head 621 (hemisphere 622) is supported by the spherical bearing 623 is released by controlling the driving so as to contract the 624c and releasing the support state from above the head 621 by the support portions 624a1, 624b1, 624c1. It is possible to pressurize the part intensively. With such a configuration, since air accumulated in the central portion is pushed out to the peripheral edge side of the substrate S, it is possible to prevent a void from being generated particularly near the central portion of the substrate. In FIG. 31, the traction means 626 is not shown, but the traction means 626 is also omitted in FIGS. 32 to 35 referred to in the following description.

  Next, another example of the control method of the plane adjustment mechanism 602 will be described with reference to FIG. FIGS. 32A and 32B are views showing a state in which the peripheral edge of the substrate S is mainly pressed (hereinafter referred to as a “centered state”), where FIG. 32A is a front view and FIG. 32B is a plan view. is there. At the time of pressurization of the stage S 607 and the substrate S held by the head 621 by moving the head holding unit 306 upward, as shown in the figure, the piezoelectric elements 624a, 624b, By driving and controlling so that 624c extends, the lower surface (hemisphere 622) of the head 621 and the spherical bearing 623 are separated from each other, thereby emphasizing the peripheral portion of the substrate S on which the head 621 is supported by the piezoelectric elements 624a, 624b, and 624c. Can be pressurized. With such a configuration, for example, the substrate S in which the atmosphere sealing frame is formed on the periphery held by the stage 607 and the substrate S serving as a lid installed on the head 621 are joined. When sealing an arbitrary atmosphere in the portion surrounded by the frame body between the two substrates S, the peripheral edge of the substrate S can be intensively pressed, so that the frame body and the substrate S serving as a lid can be satisfactorily Can be joined.

  In order to bring the substrate S and the like held by the stage 607 and the head 621 into a uniform pressure state, the piezoelectric elements 624a, 624b, and 624c are set so as to be in a substantially intermediate expansion / contraction state between a medium-bearing state and a medium-high state. The expansion and contraction may be controlled. Conventionally, the tilt of the head 621 is fixed when the substrates S held on the stage 607 and the head 621 are in contact with each other, and both substrates S are pressurized while maintaining this tilt. Therefore, the pressurization state for the substrate S or the like cannot be corrected, and the pressurization state of the substrate S or the like depends on the polishing state of the substrate S and the manufacturing accuracy of the stage 607, the head 621, etc., and is a uniform pressurization state. It was difficult to do so, and there was a need for technological improvements. However, according to the above-described configuration, the amount of expansion / contraction of the piezoelectric elements 624a, 624b, and 624c can be quantified and controlled by the control device 331, so that it can be adjusted to a medium or medium height state. A uniform pressure state, which is an intermediate state between this state and the medium-high state, can be realized. Thus, the pressurization state of the substrate S or the like can be easily adjusted by adjusting the expansion / contraction amount of the piezoelectric elements 624a, 624b, and 624c when the substrate S or the like is pressed.

  As will be described later, for example, the parallelism at the time of contact between the substrates S, the substrate 322 and the chip 320, that is, the inclination of the substrates S, 322, the chip 320, the head 621, etc., and the substrate at the time of high pressurization. The parallelism (inclination) such as S is slightly different due to the deflection of the device that occurs during pressurization. Therefore, as described above, by controlling the expansion / contraction amount of the piezoelectric elements 624a, 624b, and 624c quantitatively, not only a uniform pressurization state but also a medium-bulk state or a medium-high state can be achieved.

  Further, as will be described later, when the substrates S or the substrate 322 and the chip 320 are in contact with each other, the parallelism of these contact surfaces (so that the substrates S or the substrate 322 and the chip 320 are not misaligned ( When contact is made in a state in which the inclination is adjusted, the hemisphere 622 and the spherical bearing 623 may be separated from each other and a gap may be left therebetween. The hemisphere 622 and the spherical bearing 623 are brought into contact with each other by contracting the piezoelectric elements 624a, 624b, and 624c while increasing the applied pressure while maintaining the uniform pressure state, thereby further increasing the applied pressure. As a result, the parallelism of the contact surfaces between the substrates S or between the substrate 322 and the chip 320 is maintained, that is, no displacement occurs due to slippage or the like on the contact surfaces, which occurs due to high pressure. Although the inclination of the head 621 changes due to the deflection of the apparatus, the uniform pressure state is maintained. Such a uniform pressure state is realized by the piezoelectric elements 624a, 624b, and 624c and the bearing operations of the hemispherical body 622 and the spherical bearing 623 functioning in a balanced manner. When the piezoelectric elements 624a, 624b, and 624c are made long (high), the medium-high state is obtained. When the piezoelectric elements 624a, 624b, and 624c are made short (low), the medium-high state is obtained.

  Next, referring to FIGS. 33 to 35, a method of controlling the planar adjustment mechanism 602 when bonding the substrate S or the chip 320 installed on the head 621 to the substrate S held on the stage 607 or the like. An example will be described. FIG. 33 to FIG. 35 are diagrams showing an example of a method for uniformly pressing the substrate S over the entire surface, and show different states. There is a slight shift in the parallelism between the head 621 and the stage 607, and these shifts are schematically shown in these drawings.

  As shown in FIG. 33, at least during the tilt adjustment of the head 621, the expansion and contraction control of the piezoelectric elements 624a, 624b, and 624c is performed by the drive signal of the control device 331 so that the hemisphere 622 is lifted away from the spherical bearing 623. By adjusting the tilt of the head 621, the parallelism between the substrate S placed on the head 621 and the substrate S placed on the upper surface of the stage 607 is adjusted. This is because the parallelism between the head 621 and the stage 607 is adjusted in advance by the method of contacting the head 621 and the stage 607 with the hemisphere 622 and the spherical bearing 623 separated from each other, and the head 621 and the stage 607 are adjusted. The control device 331 measures the lengths of the piezoelectric elements 624a, 624b, and 624c when the parallelism is adjusted in advance and sets the control parameters (preset values when the objects to be pressed are in contact). The degree of parallelism between the head 621 on which the substrate S and the chip 320 are placed and the stage 607 on which the substrate S and the like are placed is obtained by using the stored values. Can be adjusted. Further, the inclination of the head 621 may be adjusted using a displacement sensor such as an eddy current sensor.

  Next, as shown in FIG. 34, the head 621 is moved downward to bring the substrate S placed on the lower surface of the head 621 into contact with the substrate S placed on the upper surface of the stage 607. Then, as shown in FIG. 35, the piezoelectric element is contracted so that the hemisphere 622 and the spherical bearing 623 come into contact with each other while moving the head 621 further downward while gradually increasing the applied pressure. Take control. At this time, the two substrates S in contact with each other are not displaced due to the static frictional force acting on the contact surface.

  With such a configuration, the inclinations of the substrates S placed on the stage 21 are substantially matched with the inclinations of the substrates S held by the holding mechanism provided at the lower part of the glass window 7, so Since the two substrates S are brought into contact after the contact surfaces are adjusted to be substantially parallel, it is possible to effectively prevent a positional shift caused by a difference in inclination between the contact surfaces when the two substrates are in contact.

  As shown in FIG. 35, when the hemisphere 622 and the spherical bearing 623 come into contact with each other, the drive control of the vertical drive mechanism 325 (head 621) is changed from the downward position (movement) control to the output of the pressure sensor 332. Switching to pressure control based on the value is performed, and the piezoelectric elements 624a, 624b, and 624c are further contracted while the substrates S are pressurized with an arbitrary pressure. With such a configuration, the head 621 is supported by the spherical bearing 623 through the hemispherical body 622, and the spherical bearing 623 can support the hemispherical body 622 in a stable state. The inclination of the head 621 naturally changes so that the support direction of the 621 (hemisphere 622) is substantially opposite to the direction of the applied pressure. That is, the deflection of the stage 607 and the like due to the high applied pressure changes the inclination of the head 621 so that the direction of the applied pressure and the substrate installation surface of the head 621 are substantially orthogonal to each other, as shown in FIG. In contrast to the example, the parallelism of the stage 607 follows the head 621. Therefore, the inclination of the head 621 and the stage 607 when the two substrates S held on the head 621 and the stage 607 are in contact with each other (see FIG. 33) is different from the inclination of the head 621 and the stage 607 when the pressure is high (see FIG. 33). As shown in FIG. 35, the heads 621 and the like at the time of contact and at the time of high pressure are made different in this way, so that both the substrates S can be uniformly pressed from the direction substantially perpendicular to the contact surfaces of the two substrates S. it can.

  In other words, the planar adjustment mechanism 602 uses the hemisphere 622, the spherical bearing 623, and the piezoelectric elements 624a, 624b, and 624c when pressure that causes distortion in the head 621 and the stage 607 is not applied to both substrates S. Then, control is performed to adjust the parallelism of the head 621 to the stage 607, that is, the substrate S side held by the stage 607. On the other hand, the plane adjustment mechanism 602, when a pressure high enough to cause distortion in the head 621, the stage 607, etc. is applied to both substrates S, as described above, uses these distortions to adjust the parallelism on the stage 607 side. By performing control in accordance with the head 621, it is possible to press both substrates S satisfactorily at all times from the time when both substrates S are in contact until the both substrates S are pressed with high pressure. 33, when a high pressure is applied to both substrates S while maintaining the tilt of the head 621 and the stage 607 from the state when both substrates S are in contact with each other as shown in FIG. Since the direction and the inclination of the contact surfaces of the two substrates S are not substantially orthogonal, there is a possibility that positional displacement occurs between the substrates S during pressurization. However, by performing the above-described control, it is possible to reliably prevent the positional deviation between the two substrates S when the two substrates S are pressurized.

  Note that, as described with reference to FIG. 2, the piezoelectric elements 624a, 624b, and 624c may be controlled to expand and contract so as to be in a uniform pressure state using the output value of the pressure sensor 625 as described with reference to FIG. . Further, the lengths of the piezoelectric elements 624a, 624b, and 624c when the substrates S are uniformly pressed over the entire surface during high pressurization are measured in advance, and the control parameters are stored in a storage unit such as a memory provided in the controller 8. 33, the lengths (control parameters) of the piezoelectric elements 624a, 624b, and 624c stored in the storage means are used when shifting from the contact state of the two substrates S shown in FIG. 33 to the high pressure state. Thus, the expansion / contraction control of the piezoelectric elements 624a, 624b, and 624c may be performed. That is, the expansion and contraction control of the piezoelectric elements 624a, 624b, and 624c is performed so that the output values of all the pressure sensors 625 are the same at the time of high pressurization, in other words, the substrates S are uniformly pressed over the entire surface. Do. Next, the control parameters of the piezoelectric elements 624a, 624b, and 624c when the output values of all the pressure sensors 625 are substantially the same (when the object to be pressurized is pressurized) Is stored in advance in storage means such as a memory provided in the control device 331.

  Then, the length of the piezoelectric elements 624a, 624b, and 624c is obtained using the values stored in the storage means when the state of contact between the substrates S shown in FIG. By controlling the above, it is possible to vary the inclination of the head 621 and the like when the two substrates S are in contact with each other and when high pressure is applied. With such a configuration, it is possible to press both substrates S satisfactorily at all times from the time when both substrates S are in contact until both substrates S are pressed with high pressure. Note that when the state of contact between the substrates S is shifted to the high pressure state, the lengths of the piezoelectric elements 624a, 624b, and 624c may be changed stepwise to the lengths stored in the storage unit. . Even with such a configuration, there is no deviation between the two substrates S due to the static friction force acting between the two substrates S, and the two substrates S can be uniformly pressed over the entire surface. Even with such a configuration, the substrate S and the like can be uniformly pressurized over the entire surface. As described above, the control device 331 functions as “piezo element control parameter storage means”.

  As described above, the inclination of the head 621 is adjusted so that the contact surface becomes parallel by the inclination adjustment by the plane adjustment mechanism 602, and the substrates S are brought into contact with each other. By adjusting the inclination of the head 621 so that both the substrates S are in a uniform pressure state by using a method such as the above, it is possible to achieve a high positional accuracy and without causing a positional shift due to the high pressure. The substrates S can be joined together. In this way, by adjusting the inclination of the head 621 so that the inclination is optimal when the substrates S are in contact with each other and when the substrates S are highly pressurized, the bonding of the substrates S can be performed with high accuracy. The structure to be performed is an epoch-making thing which cannot be achieved by the conventional structure. In the above-described example, the bonding between the substrates S has been described as an example. However, when a component such as a chip is mounted on the substrate S, or the uneven pattern that the original plate M has on the transfer liquid layer UVR on the substrate S. Also when imprinting P, highly accurate mounting or imprinting can be performed by adjusting the inclination of the head 621 by this method.

  As described above, according to this embodiment, the same effects as those of the first to third embodiments described above can be achieved. Further, according to the present embodiment, by adjusting the parallelism of the substrates S and the like with the plane adjustment mechanism 602 with high accuracy, the substrates and the like can be joined with very high positional accuracy.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, the “backup means” of the present invention is not limited to the above-described configuration, and any configuration can be used as long as the configuration can always support the lower surface of the stage 21 in surface contact. Further, the configurations of the first to third embodiments described above can be variously combined without departing from the spirit of the present invention.

  Further, as the transfer liquid layer, as the resin other than the photocurable resin, a resin that has low viscosity and can be cured by applying some energy other than heat may be employed.

  In the above-described embodiment, the alignment of the original plate M and the substrate S is performed using the alignment mark image obtained by simultaneously capturing the alignment mark AL of the original plate M and the substrate S with the camera 33. After reading one of the alignment marks AL of M and the substrate S, the other alignment mark AL is read, and both alignment mark images after reading are subjected to position error correction processing, respectively. The structure which aligns the original plate M and the board | substrate S using a mark image may be sufficient.

  With such a configuration, the alignment marks AL of the original plate M and the substrate S are individually imaged, so that each alignment mark can be read accurately without being out of focus. On the other hand, since there is a time difference in the imaging of both alignment marks by the camera 33 due to the focusing time of the camera 33 with respect to each alignment mark AL, the vibration of the apparatus and the scanning timing of the camera 33 are included in both alignment mark images. There is a risk that a relative position error may occur due to the difference between the two. However, after imaging both alignment marks AL, the position error correction processing is performed on both alignment mark images to correct the above-described position error. Therefore, using both corrected alignment mark images, By aligning with the substrate S, alignment can be performed with high accuracy.

  The method of irradiating UV (ultraviolet light) can be applied from the stage 21 side through the lower window glass 5a and the like together with the method of irradiating from the upper glass window 7. Further, a plurality of LEDs can be embedded on the stage 21 or the like to form a flat substrate S, and it is not necessary to irradiate ultraviolet light from the outside of the chamber 5 by embedding the LEDs under the stage 21.

  The original plate M may be a metal other than glass. In this case, the resin as the transfer liquid layer may be cured by a heating method at a low temperature, or UV (ultraviolet light) may be applied to the resin as the transfer liquid layer from the lower stage 21 side. Moreover, the alignment mark AL for alignment can also be used as the alignment mark AL by forming a hole in the original plate M or the substrate S.

  Further, when the stage 121 is walked using the drive unit 200 as in the second embodiment, in addition to the lower auxiliary lift piezoelectric element 227, the lift piezoelectric element 205 of the drive unit 219 is parallel to the stage 121. It can also be used for adjustment.

  Further, the substrates S or the substrates S in a state where a gap is left between the hemisphere 122 and the spherical bearing 123 by extending the piezoelectric elements 209a, 209b, 209c, and 205 of the auxiliary lifting piezoelectric element 227 or the driving unit 219. By bringing S and the original plate M into contact, a minute ground pressure at the time of contact can be detected by the pressure sensor 25 below the auxiliary lifting piezoelectric element 227. By doing so, a minute force can be detected by the pressure sensor 42 attached to the lower Z-axis 43. This is because the pressure sensor 42 attached to the Z-axis 43 is required to have rigidity for holding the stage 121, so that sensitivity to pressure is deteriorated.

  In the first embodiment, a servo motor is used to rotate the Z-axis in the θ direction. However, in the second embodiment, the stage 121 is moved in the θ direction by the circumferentially arranged drive unit 200. Thus, the stage 121 can be positioned with higher positional accuracy.

It is a figure which shows the structure of the nanoimprint apparatus provided with the plane adjustment mechanism which is 1st Embodiment of the inclination adjustment mechanism of this invention. It is a principal part enlarged view of the nanoimprint apparatus of FIG. It is a figure which shows the state by which the whole surface of a board | substrate is pressurized uniformly. It is a figure which shows the state by which the center part of the board | substrate is mainly pressurized. It is a figure which shows the state in which the peripheral part of the board | substrate is mainly pressurized. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly. It is a figure which shows the state which transcribe | transfers the uneven | corrugated pattern of an original plate continuously to the transfer layer of a board | substrate. It is a figure which shows the structure of the coarse motion table which moves a board | substrate. It is a principal part enlarged view of a nanoimprint apparatus. It is a principal part enlarged view of a nanoimprint apparatus. It is a figure which shows an example of the imprint method. It is a figure which shows the imprint method shown in FIG. It is a figure which shows the other example of the imprint method. It is a figure which shows the imprint method shown in FIG. It is a figure which shows the structure of the nanoimprint apparatus provided with the plane adjustment mechanism which is 2nd Embodiment of the inclination adjustment mechanism of this invention. It is a figure which shows a drive unit. It is a front view of a drive part. It is a top view of a part of drive part. It is explanatory drawing of walking operation by a drive part. It is explanatory drawing of walking operation by a drive part. It is explanatory drawing of positioning operation which positions a stage. It is a figure which shows an example of operation | movement of a plane adjustment mechanism. It is a figure which shows an example of operation | movement of a plane adjustment mechanism. It is a figure which shows the state by which the center part of the board | substrate is mainly pressurized. It is a figure which shows the state in which the peripheral part of the board | substrate is mainly pressurized. It is a figure which shows the structure of a joining apparatus provided with the plane adjustment mechanism which is 3rd Embodiment of the inclination adjustment mechanism of this invention. It is a principal part enlarged view of the plane adjustment mechanism which is 4th Embodiment of the inclination mechanism of this invention. It is a figure which shows the state by which the whole surface of a board | substrate is pressurized uniformly. It is a figure which shows the state by which the center part of the board | substrate is mainly pressurized. It is a figure which shows the state in which the peripheral part of the board | substrate is mainly pressurized. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly. It is a figure which shows an example of the method of pressurizing the whole surface of a board | substrate uniformly.

Explanation of symbols

102 Planar adjustment mechanism (tilt adjustment mechanism)
121 stage 122 hemisphere (receiving part)
123 Spherical bearing (base)
2 Planar adjustment mechanism (tilt adjustment mechanism)
21 Stage 213 Support foot (support part)
215 Piezo driving means 217 cradle (support)
23 Spherical bearing (spherical recess, backup means)
24a, 24b, 24c Piezoelectric elements (piezo elements, piezo drive means)
24a1, 24b1, 24c1 Support section 25 Pressure sensor (load detection means)
307 head 320 chip (reference tilt object, object to be pressed)
322 Substrate (Tilt adjustment object, Pressurized object)
325 Vertical drive mechanism (moving means, pressurizing means)
331 Control device (piezo driving means, pressurizing means, moving means, piezo element control parameter storage means)
43 Z-axis (pressurizing means, moving means)
45 Servo mechanism (pressurizing means, moving means)
5 Vacuum chamber 502 Planar adjustment mechanism (tilt adjustment mechanism)
521 Stage 523 Spherical bearing (spherical recess, backup means)
524a Piezoelectric element (piezo element, piezo driving means)
525 Pressure sensor (load detection means)
602 Plane adjustment mechanism (tilt adjustment mechanism)
621 Head 623 Spherical bearing (spherical recess, backup means)
624a, 624b, 624c Piezoelectric element (piezo element, piezo driving means)
624a1, 624b1, 624c1 support portion 625 pressure sensor (load detection means)
607 Stage 8 controller (piezo drive means, pressurizing means, moving means, piezo element control parameter storage means)
S substrate (inclination adjustment object, object to be pressed)
M Master plate (reference tilt object, object to be pressed)

Claims (12)

A stage on which an object to be tilted is placed on the upper surface;
Back-up means for supporting the stage in surface contact with the lower surface of the stage so as to be freely contactable and separable;
A plurality of piezo elements each having a support portion provided at a tip thereof, and each piezo element is provided with piezo drive means for adjusting the tilt of the stage by supporting the stage from below by the support portion while expanding and contracting.
The tilt adjustment mechanism characterized in that the piezo drive means expands and contracts each piezo element so that the lower surface of the stage and the backup means are separated at least during tilt adjustment of the stage. The lower surface of the stage is formed in a convex spherical shape,
The inclination adjusting mechanism according to claim 1, wherein the backup means is provided with a spherical concave portion that can slide on the lower surface of the convex spherical stage. The lower surface of the stage is formed in a planar shape,
The backup means includes
A base formed with a spherical recess,
A spherical convex portion that is slidable in contact with the spherical concave portion is formed, and a receiving portion that is in surface contact with the lower surface of the stage in a state where the spherical convex portion is in sliding contact with the spherical concave portion is provided. The tilt adjusting mechanism according to claim 1. A vacuum chamber,
4. The tilt adjusting mechanism according to claim 1, wherein the stage, the backup unit, and the piezo driving unit are disposed in the vacuum chamber. A head that is disposed opposite to the stage and holds a reference tilt object on the lower surface that serves as a reference tilt in the tilt adjustment of the tilt adjustment object by adjusting the tilt of the stage;
A moving means for moving the upper surface of the stage and the lower surface of the head so as to be close to each other;
The moving means is
After the piezo driving means makes the inclination of the inclination adjustment object substantially coincide with the inclination of the reference inclination object and adjusts the inclination adjustment object and the reference inclination object substantially in parallel,
5. The tilt adjustment mechanism according to claim 1, wherein the stage and the head are moved close to each other to bring the tilt adjustment target object and the reference tilt target object into contact with each other. A pressurizing unit that pressurizes an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage;
Each of the piezoelectric elements is disposed so as to surround the backup means, and each of the support portions surrounds a support position on the lower surface of the stage by the backup means, and supports the stage from below.
The piezo drive means is configured to press the object to be pressurized by the pressurizing means,
Expanding and contracting each piezo element so that the lower surface of the stage and the backup means are separated from each other;
The pressurizing unit pressurizes the object to be pressurized after the piezoelectric driving unit expands and contracts each piezoelectric element so that the lower surface of the stage and the backup unit are separated from each other. The tilt adjusting mechanism according to any one of 5 to 5. A pressurizing unit that pressurizes an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage;
Each of the piezoelectric elements is disposed so as to surround the backup means, and each of the support portions surrounds a support position on the lower surface of the stage by the backup means, and supports the stage from below.
The piezo driving means is before pressurization of the object to be pressurized by the pressurizing means,
Extending and contracting each piezo element to release the support state from below the stage by the support part,
The pressurizing unit pressurizes the object to be pressurized after the piezoelectric driving unit expands and contracts the piezoelectric elements so as to release the support state from below the stage. 5. The tilt adjustment mechanism according to any one of 5 above. A pressurizing means for pressurizing an object to be pressurized as the tilt adjustment object placed on the upper surface of the stage;
Load detecting means for detecting a load on each of the piezoelectric elements;
Piezo element control parameter storage means for preliminarily storing control parameters when the piezo driving means expands and contracts each piezo element;
The piezo drive means is configured to pressurize the object to be pressurized by the pressurizing means.
Based on the control parameters stored in advance in the piezo element control parameter storage means, the piezo element control parameter storage means stores each of the piezo elements so that the detected value of the load applied to the piezo elements by the load detection means is approximately the same as a preset setting. The tilt adjusting mechanism according to claim 1, wherein the tilt adjusting mechanism is expanded and contracted. A head disposed opposite to the stage and holding the object to be pressed on the lower surface;
Moving means for moving the upper surface of the stage and the lower surface of the head so as to be close to each other;
Pressurizing means for pressurizing the object to be pressed as the tilt adjustment object placed on the upper surface of the stage, and the object to be pressed held by the head;
Load detecting means for detecting a load on each of the piezoelectric elements;
At the time of pressurization of the object to be pressed by the pressurizing unit, the piezoelectric drive unit is configured so that the detected value of the load applied to the piezoelectric element by the load detecting unit becomes a preset set value. The load applied to each piezo element by the load detection means at the time of contact between the control parameter when the stage expands and contracts and the pressed object held by the stage by the moving means and the pressed object held by the head Piezo element control parameter storage means for preliminarily storing control parameters when the piezo driving means expands and contracts each piezo element so that the detected value becomes a preset setting value,
The piezo drive means is configured to contact the objects to be pressurized by the moving means and pressurize the objects to be pressurized by the pressure means.
5. The piezoelectric element according to claim 1, wherein the piezoelectric element is expanded and contracted based on the control parameters stored in the piezoelectric element control parameter storage unit in advance, respectively, at the time of contact and at the time of pressurization. The described tilt adjustment mechanism. A head on which a tilt adjustment object is installed on the lower surface;
Backup means for supporting the head in surface contact with the upper surface of the head so as to be freely contacted and separated;
A plurality of piezo elements each having a support portion provided at a tip thereof, and each piezo element is provided with piezo drive means for adjusting the tilt of the head by supporting the head from above by the support portion while expanding and contracting.
The tilt adjustment mechanism characterized in that the piezo drive means expands and contracts each piezo element so that the upper surface of the head and the backup means are separated at least during the tilt adjustment of the head. A stage that is disposed opposite to the head and holds a reference tilt object on the upper surface that serves as a reference tilt in the tilt adjustment of the tilt adjustment object by adjusting the tilt of the head;
A moving means for moving the lower surface of the head and the upper surface of the stage so as to be close to each other;
The moving means is
After the piezo driving means makes the inclination of the inclination adjustment object substantially coincide with the inclination of the reference inclination object and adjusts the inclination adjustment object and the reference inclination object substantially in parallel,
11. The tilt adjustment mechanism according to claim 10, wherein the head and the stage are moved close to each other to bring the tilt adjustment target object and the reference tilt target object into contact with each other. A stage on which an object to be tilted is placed on the upper surface;
In a control method of a tilt adjustment mechanism comprising backup means for supporting the stage by making surface contact with the lower surface of the stage so as to be freely contacted and separated,
A plurality of piezo elements provided with a support portion at the tip are extended and contracted, and the stage is supported from below by the support portion to adjust the inclination of the stage,
At least during the tilt adjustment of the stage, the piezoelectric element is expanded and contracted so that the lower surface of the stage and the backup means are separated from each other.

Images