JP4992558B2 - Immersion exposure apparatus, device manufacturing method, and evaluation method - Google Patents

Description

  The present invention relates to an immersion exposure apparatus, a device manufacturing method, and an evaluation method.

In an exposure apparatus used in a photolithography process, an immersion space is formed so that an optical path of exposure light is filled with liquid as disclosed in the following patent document, and exposure light is passed through the liquid in the immersion space. An immersion exposure apparatus for exposing a substrate has been devised.
US Patent Application Publication No. 2005/259234

  In the immersion exposure apparatus, it is necessary to satisfactorily form an immersion space. For example, when the substrate to be exposed is moved with respect to the immersion space, depending on the state of the surface of the substrate, it becomes difficult to maintain the immersion space in a desired state, so that liquid leaks or liquid ( Film, drops, etc.) may remain. As a result, a defective exposure may occur, such as a defect in the pattern formed on the substrate. As a result, a defective device may be manufactured.

  An object of the present invention is to provide an exposure apparatus that can satisfactorily evaluate a surface in contact with a liquid. It is another object of the present invention to provide an exposure apparatus that can suppress the occurrence of exposure failure. Moreover, an object of this invention is to provide the device manufacturing method which can suppress generation | occurrence | production of a defective device. It is another object of the present invention to provide an evaluation method that can satisfactorily evaluate a surface in contact with a liquid.

  According to a first aspect of the present invention, there is provided an immersion exposure apparatus that exposes a substrate with exposure light, the immersion member capable of forming an immersion space so that the optical path of the exposure light is filled with the liquid, A first liquid recovery port capable of recovering at least a part of the liquid on the object facing the immersion member and an outer side of the first liquid recovery port with respect to the optical path of the exposure light, and can recover the liquid on the object And an exposure apparatus that evaluates the state of the surface of the object based on the recovery state of the liquid from the second liquid recovery port when the object is moved relative to the liquid immersion member. Is done.

  According to a second aspect of the present invention, there is provided an immersion exposure apparatus that exposes a substrate with exposure light, the immersion member capable of forming an immersion space so that the optical path of the exposure light is filled with the liquid, A first liquid recovery port capable of recovering at least a part of the liquid on the object facing the liquid contact surface of the immersion member; and a liquid on the object disposed outside the first liquid recovery port with respect to the optical path of the exposure light. A second liquid recovery port capable of recovering the liquid, and when the object is moved relative to the liquid immersion member, the liquid contact surface of the liquid immersion member is determined based on the liquid recovery state from the second liquid recovery port. An exposure apparatus for evaluating the state is provided.

  According to a third aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the first and second aspects and developing the exposed substrate. .

  According to a fourth aspect of the present invention, there is provided an evaluation method for evaluating the surface of an object used in an immersion exposure apparatus, wherein the liquid contact surface of the immersion member is filled with a liquid so that the optical path of the exposure light is filled with the liquid. Forming a liquid immersion space between the surface of the object and the surface of the object, and in the state where the liquid immersion space is formed, the liquid immersion member is disposed so that the surface of the object faces the first liquid recovery port and the second liquid recovery port. On the other hand, moving the object under a predetermined condition, and when moving the object relative to the liquid immersion member, recovering at least a part of the liquid on the object from the first liquid recovery port; Detecting the recovery state of the liquid from the second liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light, and detecting the object based on the detection result. An evaluation method comprising: evaluating a surface condition of the substrate.

  According to a fifth aspect of the present invention, there is provided an evaluation method for evaluating a liquid contact surface of an immersion member, which is used in an immersion exposure apparatus, so that the optical path of exposure light is filled with the liquid. An immersion space is formed between the liquid contact surface of the liquid and the object, and the immersion surface is formed so that the surface of the object faces the first liquid recovery port and the second liquid recovery port in the state where the liquid immersion space is formed. Moving the object with respect to the member under predetermined conditions, recovering at least part of the liquid on the object from the first liquid recovery port when the object is moved with respect to the liquid immersion member, and the liquid immersion member Detecting the recovery state of the liquid from the second liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light when the object is moved relative to the exposure light, and based on the detection result And evaluating the state of the liquid contact surface of the liquid immersion member.

  According to the present invention, the surface in contact with the liquid can be evaluated well. Further, according to the present invention, it is possible to suppress the occurrence of defective exposure and the occurrence of defective devices.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. The predetermined direction in the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction in the horizontal plane is the Y-axis direction, and the direction orthogonal to each of the X-axis direction and the Y-axis direction (ie, the vertical direction) is the Z-axis direction. To do. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. In FIG. 1, an exposure apparatus EX includes a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and a measuring instrument that does not hold the substrate P. Movable measurement stage 3, illumination system IL for illuminating mask M with exposure light EL, projection optical system PL for projecting an image of the pattern of mask M illuminated with exposure light EL onto substrate P, and exposure processing And a storage device 10 that stores various information relating to measurement processing and the like, and a control device 4 that controls the overall operation of the exposure apparatus EX. The storage device 10 is connected to the control device 4.

  In addition, the board | substrate P is a board | substrate for manufacturing a device, Comprising: The thing by which the photosensitive film | membrane was formed on base materials, such as a semiconductor wafer. The mask M includes a reticle on which a device pattern to be projected onto the substrate P is formed. For example, a light shielding pattern is formed on a light transmissive plate such as a glass plate. In the present embodiment, a transmissive mask is used as the mask M, but a reflective mask may be used.

  The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes the substrate P with the exposure light EL via the liquid LQ, so that at least a part of the optical path space K of the exposure light EL is filled with the liquid LQ. The immersion space LS is formed. The optical path space K of the exposure light EL is a space that includes an optical path through which the exposure light EL passes. The immersion space LS is a space filled with the liquid LQ. In the present embodiment, water (pure water) is used as the liquid LQ.

  The exposure apparatus EX includes a liquid immersion member 13 that can form an immersion space LS so that the optical path space K of the exposure light EL is filled with the liquid LQ. The liquid immersion member 13 is disposed in the vicinity of the terminal optical element 11 closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. In the present embodiment, the immersion space LS is formed so that the optical path space K on the image plane side (exit side) of the last optical element 11 is filled with the liquid LQ.

  The liquid immersion member 13 has a liquid contact surface 14 that contacts the liquid LQ in the liquid immersion space LS. The liquid contact surface 14 faces downward (−Z direction). The last optical element 11 has an exit surface 12 that emits the exposure light EL toward the image plane of the projection optical system PL. The liquid LQ in the immersion space LS contacts the emission surface 12. The exit surface 12 faces downward (−Z direction). Liquid LQ between the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13 and the surface of the object facing the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13. Is held, the immersion space LS is formed so that the optical path space K between the exit surface 12 of the last optical element 11 and the surface of the object is filled with the liquid LQ.

  In the present embodiment, the object that can face the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13 is at least the substrate stage 2, the substrate P held on the substrate stage 2, and the measurement stage 3. Including one. In the following, in order to simplify the description, the description will mainly be given of an example in which the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13 are opposed to the substrate P. To do.

  In the present embodiment, the immersion space LS is formed so that a partial region (local region) on the surface of the substrate P is covered with the liquid LQ, and the liquid contact between the surface of the substrate P and the liquid immersion member 13 occurs. An interface (meniscus, edge) LG of the liquid LQ is formed between the surface 14. That is, in the present embodiment, the exposure apparatus EX sets the immersion space LS so that a part of the area on the substrate P including the projection area PR of the projection optical system PL is covered with the liquid LQ when the substrate P is exposed. Adopt the local immersion method to be formed.

  Further, the exposure apparatus EX of the present embodiment includes a collection member 15 disposed outside the liquid immersion member 13 with respect to the optical path of the exposure light EL. The collecting member 15 has a lower surface 16. The lower surface 16 faces downward (−Z direction). In the present embodiment, the object that can face the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13 can move to a position facing the lower surface 16 of the collection member 15. That is, at least one of the substrate stage 2, the substrate P held on the substrate stage 2, and the measurement stage 3 can be moved to a position facing the lower surface 16 of the collection member 15.

The illumination system IL illuminates a predetermined illumination area IR on the mask M with exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, Vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm) is used. In the present embodiment, ArF excimer laser light that is ultraviolet light (vacuum ultraviolet light) is used as the exposure light EL.

  The mask stage 1 is movable in the X-axis, Y-axis, and θZ directions by the first drive system 5 while holding the mask M. The first drive system 5 includes an actuator such as a linear motor, for example. Position information of the mask stage 1 (mask M) in the X-axis, Y-axis, and θZ directions is measured by the laser interferometer 8A of the interferometer system 8. The laser interferometer 8 </ b> A measures position information using a reflection mirror 1 </ b> R provided on the mask stage 1. The control device 4 drives the first drive system 5 based on the measurement result of the laser interferometer 8A, and controls the position of the mask M held on the mask stage 1.

  The projection optical system PL projects an image of the pattern of the mask M onto the substrate P at a predetermined projection magnification. The plurality of optical elements of the projection optical system PL are held by a lens barrel. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis AX of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  The substrate stage 2 can be moved in the six directions of the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions while holding the substrate P by the second drive system 6. The second drive system 6 includes an actuator such as a linear motor. The substrate stage 2 has an upper surface 19 that can face the exit surface 12 of the last optical element 11, the liquid contact surface 14 of the liquid immersion member 13, and the lower surface 16 of the collection member 15. The upper surface 19 of the substrate stage 2 is a flat surface substantially parallel to the XY plane. Position information of the substrate stage 2 (substrate P) in the X-axis, Y-axis, and θZ directions is measured by the laser interferometer 8B of the interferometer system 8. The laser interferometer 8B measures position information using a reflection mirror 2R provided on the substrate stage 2. Further, surface position information (position information regarding the Z-axis, θX, and θY directions) of the surface of the substrate P held on the substrate stage 2 is detected by a focus / leveling detection system 9. The focus / leveling detection system 9 includes an irradiation device 9A that emits detection light and a light receiving device 9B that is disposed at a predetermined position with respect to the detection light. The control device 4 drives the second drive system 6 based on the measurement result of the laser interferometer 8B and the detection result of the focus / leveling detection system 9, and controls the position of the substrate P held on the substrate stage 2.

  The measurement stage 3 can be moved by the third drive system 7 in six directions including the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions with the measuring instrument mounted. The third drive system 7 includes an actuator such as a linear motor, for example. The measuring stage 3 is equipped with a measuring member including a reference member on which a reference mark is formed, a measuring member including an optical member irradiated with the exposure light EL, and a photoelectric sensor capable of measuring the state of the exposure light EL. ing. An example of a technique related to an exposure apparatus including a substrate stage and a measurement stage is disclosed in, for example, US Pat. No. 6,897,963. The measurement stage 3 has an upper surface 20 that can face the exit surface 12 of the last optical element 11, the liquid contact surface 14 of the liquid immersion member 13, and the lower surface 16 of the collection member 15. The upper surface 20 of the measurement stage 3 is a flat surface substantially parallel to the XY plane. Position information of the measurement stage 3 in the X axis, Y axis, and θZ directions is measured by the laser interferometer 8C of the interferometer system 8. The laser interferometer 8 </ b> C measures position information using a reflection mirror 3 </ b> R provided on the measurement stage 3. Further, the surface position information (position information regarding the Z axis, θX, and θY directions) of the upper surface 20 of the measurement stage 3 is detected by the focus / leveling detection system 9. The control device 4 drives the third drive system 7 based on the measurement result of the laser interferometer 8C and the detection result of the focus / leveling detection system 9, and controls the position of the measurement stage 3.

  The substrate stage 2 and the measurement stage 3 are movable in the XY direction (two-dimensional direction) along the guide surface 21 of the surface plate 22. The upper surface 19 of the substrate stage 2 and the upper surface 20 of the measurement stage 3 are disposed in substantially the same plane and are substantially flush. In the present embodiment, as disclosed in, for example, European Patent Application No. 1,713,113, the control device 4 includes at least one of the substrate stage 2 and the measurement stage 3, the terminal optical element 11, and the liquid immersion device. The upper surface 19 of the substrate stage 2 and the upper surface 19 of the measurement stage 3 are brought close to or in contact with each other so as to continue to form a space capable of holding the liquid LQ with the member 13. At least one of the upper surface 20 of the measurement stage 3 and the exit surface 12 of the last optical element 11 and the liquid contact surface 14 of the liquid immersion member 13 are opposed to each other with respect to the last optical element 11 and the liquid immersion member 13. And the measurement stage 3 are moved synchronously in the XY directions. Thereby, the immersion space LS is movable between the upper surface 19 of the substrate stage 2 and the upper surface 20 of the measurement stage 3.

  FIG. 2 is a side sectional view showing the substrate stage 2. In FIG. 2, the substrate stage 2 includes a first holder 17 that holds the substrate P. The upper surface 19 of the substrate stage 2 is disposed around the first holder 17. The first holder 17 holds the substrate P so that the surface of the substrate P and the XY plane are substantially parallel. The surface of the substrate P held by the first holder 17 can be opposed to the emission surface 12 of the last optical element 11, the liquid contact surface 14 of the liquid immersion member 13, and the lower surface 16 of the collection member 15. The surface of the substrate P held by the first holder 17 and the upper surface 19 of the substrate stage 2 are arranged in substantially the same plane and are substantially flush with each other.

  In the present embodiment, the substrate stage 2 has a detachable plate member T. The substrate stage 2 has a second holder 18 that is disposed around the first holder 17 and holds the plate member T in a detachable manner. The plate member T has an opening TK in which the substrate P can be placed. The plate member T held by the second holder 18 is disposed around the substrate P held by the first holder 17. In the present embodiment, the upper surface 19 of the substrate stage 2 includes the upper surface of the plate member T.

  In the present embodiment, the inner surface of the opening TK of the plate member T held by the second holder 18 and the outer surface of the substrate P held by the first holder 17 are arranged to face each other with a predetermined gap. The The second holder 18 holds the plate member T so that the upper surface 19 of the plate member T and the XY plane are substantially parallel.

  FIG. 3 is a diagram illustrating an example of the plate member T. The plate member T includes a base material Tb and a film H formed on the base material Tb. The upper surface (surface) 19 of the plate member T is formed by the film H. The film H is made of, for example, a material containing fluorine and has liquid repellency with respect to the liquid LQ. The contact angle between the upper surface 19 of the plate member T and the liquid LQ is, for example, 80 degrees or more.

  In the present embodiment, the upper surface 20 of the measurement stage 3 is made of, for example, a material containing fluorine (for example, PFA) and has liquid repellency with respect to the liquid LQ. The contact angle between the upper surface 20 of the measurement stage 3 and the liquid LQ is, for example, 80 degrees or more.

  FIG. 4 is a diagram illustrating an example of the substrate P. A substrate P shown in FIG. 4A has a base material W and a photosensitive film Rg formed on the base material W. The photosensitive film Rg is a film of a photosensitive material (photoresist). The base material W includes a semiconductor wafer such as a silicon substrate. The surface of the substrate P shown in FIG. 4A is formed by the photosensitive film Rg. In the present embodiment, the photosensitive film Rg has liquid repellency with respect to the liquid LQ. The contact angle between the surface of the substrate P (photosensitive film Rg) and the liquid LQ is, for example, 80 degrees or more. A substrate P shown in FIG. 4B has a base material W, a photosensitive film Rg formed on the base material W, and a protective film (topcoat film) Tc formed on the photosensitive film Rg. The surface of the substrate P shown in FIG. 4B is formed by the protective film Tc. The protective film Tc has liquid repellency with respect to the liquid LQ. The contact angle between the surface of the substrate P (protective film Tc) and the liquid LQ is, for example, 80 degrees or more. The exposure apparatus EX can expose a substrate P having various surfaces as shown in FIGS. 4 (A) and 4 (B).

  Next, the liquid immersion member 13 and the collection member 15 will be described with reference to FIGS. FIG. 5 is a side sectional view parallel to the YZ plane showing the liquid immersion member 13 and the collection member 15, and FIG. 6 is a view of the liquid immersion member 13 and the collection member 15 as viewed from the lower side (−Z side). is there.

  In the following description, an example in which the substrate P is disposed at a position facing the exit surface 12 of the last optical element 11, the liquid contact surface 14 of the liquid immersion member 13, and the lower surface 16 of the collection member 15 is exemplified. As described above, the substrate stage 2 and the measurement are positioned at positions facing the exit surface 12 of the last optical element 11, the liquid contact surface 14 of the liquid immersion member 13, and the lower surface 16 of the collection member 15, as described above. An object other than the substrate P such as the stage 3 can also be arranged. In the following description, the exit surface 12 of the terminal optical element 11 is appropriately referred to as the lower surface 12 of the terminal optical element 11, and the liquid contact surface 14 of the liquid immersion member 13 is appropriately referred to as the lower surface 14 of the liquid immersion member 13. Called.

  The exposure apparatus EX includes a supply port 23 that can supply the liquid LQ, and a first recovery port 24 and a second recovery port 25 that can recover the liquid LQ. In the present embodiment, the supply port 23 and the first recovery port 24 are disposed in the liquid immersion member 13. The second recovery port 25 is disposed in the collection member 15.

  The supply port 23 can supply the liquid LQ to the optical path space K in order to form the immersion space LS. The supply port 23 is disposed at a predetermined position of the liquid immersion member 13 facing the optical path space K in the vicinity of the optical path space K. In addition, the exposure apparatus EX includes a liquid supply device 26. The liquid supply device 26 can deliver a clean and temperature-adjusted liquid LQ. The supply port 23 and the liquid supply device 26 are connected via a flow path 27. The flow path 27 includes a supply flow path 27 </ b> A formed inside the liquid immersion member 13 and a flow path 27 </ b> B formed of a supply pipe that connects the supply flow path 27 </ b> A and the liquid supply device 26. The liquid LQ delivered from the liquid supply device 26 is supplied to the supply port 23 via the flow path 27. The supply port 23 supplies the liquid LQ from the liquid supply device 26 to the optical path space K.

  The first recovery port 24 can recover at least a part of the liquid LQ on the substrate P facing the lower surface 14 of the liquid immersion member 13. In the present embodiment, the first recovery port 24 is disposed around the optical path of the exposure light EL. The first recovery port 24 is disposed at a predetermined position of the liquid immersion member 13 that faces the surface of the substrate P. In addition, the exposure apparatus EX includes a first liquid recovery apparatus 28 that can recover the liquid LQ. The first liquid recovery device 28 includes a vacuum system and can recover the liquid LQ by aspiration. The first recovery port 24 and the first liquid recovery device 28 are connected via a flow path 29. The flow path 29 includes a recovery flow path 29 </ b> A formed inside the liquid immersion member 13 and a flow path 29 </ b> B formed of a recovery pipe that connects the recovery flow path 29 </ b> A and the first liquid recovery device 28. The liquid LQ recovered from the first recovery port 24 is recovered by the first liquid recovery device 28 via the flow path 29.

  The second recovery port 25 can recover the liquid LQ on the substrate P facing the collection member 15. The second recovery port 25 is disposed outside the first recovery port 24 with respect to the optical path of the exposure light EL. In the present embodiment, the second recovery port 25 is disposed around the optical path of the exposure light EL. The second collection port 25 is disposed at a predetermined position of the collection member 15 that faces the surface of the substrate P. In addition, the exposure apparatus EX includes a second liquid recovery apparatus 30 that can recover the liquid LQ. The second liquid recovery device 30 includes a vacuum system and can recover the liquid LQ by suction. The second recovery port 25 and the second liquid recovery device 30 are connected via a flow path 31. The flow path 31 includes a recovery flow path 31 </ b> A formed inside the collection member 15, and a flow path 31 </ b> B formed of a recovery pipe that connects the recovery flow path 31 </ b> A and the second liquid recovery device 30. The liquid LQ recovered from the second recovery port 25 is recovered by the second liquid recovery device 30 via the flow path 31.

  The liquid immersion member 13 is an annular member and is disposed around the optical path space K. In the present embodiment, the liquid immersion member 13 includes an upper plate portion 13A disposed around the terminal optical element 11, and at least a part of the lower surface 12 of the terminal optical element 11 and the surface of the substrate P in the Z-axis direction. And a lower plate portion 13B disposed therebetween. The lower plate portion 13B has an opening 32 through which the exposure light EL can pass. The exposure light EL emitted from the lower surface 12 of the last optical element 11 passes through the opening 32 and is irradiated onto the surface of the substrate P through the liquid LQ.

  The lower surface 14 of the liquid immersion member 13 has a first surface 33 disposed around the optical path space K and a second surface 34 disposed outside the first surface 33 with respect to the optical path space K. The second surface 34 is disposed around the first surface 33.

  The first surface 33 can hold the liquid LQ with the surface of the substrate P. In the present embodiment, the first surface 33 is flat and substantially parallel to the surface (XY plane) of the substrate P. In the present embodiment, the outer shape of the first surface 33 in the XY plane is a rectangular shape. The first surface 33 includes the lower surface of the lower plate portion 13B. The first surface 33 is disposed around the opening 32. In the present embodiment, at least the first surface 33 of the lower surface 14 of the liquid immersion member 13 is made of, for example, titanium, and is lyophilic with respect to the liquid LQ. For example, the contact angle between the first surface 33 and the liquid LQ is 40 degrees or less, preferably 20 degrees or less. The first surface 33 that is lyophilic with respect to the liquid LQ and is substantially parallel to the surface (XY plane) of the substrate P is in contact with the liquid LQ in the immersion space LS even when the substrate P moves in the XY direction. Can continue. The first surface 33 keeps in contact with the liquid LQ in the immersion space LS at least during the exposure of the substrate P.

  The second surface 34 includes a liquid recovery surface that can recover the liquid LQ, and can recover the liquid LQ that is in contact with the liquid recovery surface. The second surface 34 includes a surface (lower surface) of a porous member (mesh member) 35 disposed in the first recovery port 24. The second surface 34 can collect at least a part of the liquid LQ between the lower surface 14 of the liquid immersion member 13 and the surface of the substrate P. At least a part of the liquid LQ on the substrate P is recovered to the first recovery port 24 via the porous member 35. In the present embodiment, the second surface 34 and the first surface 33 are disposed in the same plane and are substantially flush. As the porous member 35, a sintered member (for example, a sintered metal) in which a large number of pores are formed, a foamed member (for example, a foamed metal), or the like may be used.

  In the present embodiment, the supply port 23 is located between the lower surface 12 of the terminal optical element 11 and the upper surface 36 of the lower plate portion 13B that is opposed to the lower surface 12 of the terminal optical element 11 with a predetermined gap. The liquid LQ can be supplied to the internal space 37. The upper surface 36 is disposed around the opening 32. The liquid LQ supplied to the internal space 37 from the supply port 23 flows through the internal space 37 and is then supplied between the lower surface 14 of the liquid immersion member 13 and the surface of the substrate P through the opening 32. Thereby, the optical path space K of the exposure light EL is filled with the liquid LQ.

  The control device 4 performs the liquid recovery operation by the first recovery port 24 in parallel with the liquid supply operation by the supply port 23, so that the liquid immersion space between the last optical element 11 and the liquid immersion member 13 and the substrate P is obtained. LS can be formed.

  The collecting member 15 is an annular member and is disposed around the liquid immersion member 13. In the present embodiment, the liquid immersion member 13 and the collection member 15 are separated from each other, and a predetermined gap is formed between the outer surface of the liquid immersion member 13 and the inner surface of the collection member 15. The collecting member 15 has a lower surface 16 that can face the surface of the substrate P. In the present embodiment, the lower surface 14 of the liquid immersion member 13 and the lower surface 16 of the collection member 15 are disposed in substantially the same plane and are substantially flush.

  The lower surface 16 includes a liquid recovery surface capable of recovering the liquid LQ, and can recover the liquid LQ in contact with the liquid recovery surface. The lower surface 16 includes a surface (lower surface) of a porous member (mesh member) 39 disposed in the second recovery port 25. The lower surface 16 can recover the liquid LQ between the lower surface 16 of the collecting member 15 and the surface of the substrate P. The liquid LQ on the substrate P is recovered to the second recovery port 25 via the porous member 39. In the present embodiment, the lower surface 16 and the first surface 33 and the second surface 34 are arranged in the same plane and are substantially flush. As the porous member 35, a sintered member (for example, a sintered metal) in which a large number of pores are formed, a foamed member (for example, a foamed metal), or the like may be used. Further, the lower surface 16 and the first surface 33 and the second surface 34 may not be disposed in the same plane. For example, the lower surface 16 is disposed on the −Z direction side of the first surface 33 and the second surface 34. It may be.

  The second recovery port 25 can recover the liquid LQ when the substrate P is exposed. The second recovery port 25 recovers, for example, the liquid LQ that cannot be recovered by the first recovery port 24 when the substrate P is exposed. In the present embodiment, the second recovery port 25 continues to suck fluid (including liquid LQ and gas) around the second recovery port 25 at least during immersion exposure of the substrate P. Thereby, the liquid LQ is prevented from leaking out from the immersion space LS and the liquid LQ remaining on the substrate P is suppressed.

  Further, the exposure apparatus EX includes a detection device 40 that detects whether or not the liquid LQ has been recovered from the second recovery port 25. In the present embodiment, the detection device 40 includes a temperature sensor 40A that detects the temperature in the vicinity of the second recovery port 25. In the present embodiment, the temperature sensor 40 </ b> A is disposed in the vicinity of the second recovery port 25 of the collection member 15. When the second recovery port 25 recovers the liquid LQ, the temperature in the vicinity of the second recovery port 25 changes depending on the recovered liquid LQ. For example, when the second recovery port 25 recovers the liquid LQ, the temperature of the collection member 15 in the vicinity of the second recovery port 25 of the collection member 15 decreases due to the heat of vaporization of the liquid LQ. When the detection device 40 determines that the temperature in the vicinity of the second recovery port 25 has changed based on the detection result of the temperature sensor 40A, the detection device 40 can determine that the liquid LQ has been recovered from the second recovery port 25.

  FIG. 7 is a plan view of the substrate P held on the substrate stage 2. As shown in FIG. 7, on the substrate P, a plurality of shot areas S (S1 to S21) which are exposure target areas are set in a matrix. As shown in FIG. 7, in the present embodiment, the projection region PR of the projection optical system PL has a slit shape whose longitudinal direction is the X-axis direction.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. During exposure of the shot region S of the substrate P, the mask M and the substrate P are moved in a predetermined scanning direction in the XY plane. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The exposure apparatus EX moves the shot area S of the substrate P in the Y axis direction with respect to the projection area PR of the projection optical system PL, and synchronizes with the movement of the substrate P in the Y axis direction of the illumination system IL. The substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS while moving the pattern formation region of the mask M in the Y-axis direction with respect to the illumination region IR. Thereby, the pattern image of the mask M is projected onto the shot area S of the substrate P, and the shot area S of the substrate P is exposed with the exposure light EL.

  In the present embodiment, the control device 4 moves the substrate stage 2 so that the projection region PR of the projection optical system PL and the substrate P relatively move along a movement locus indicated by an arrow R1 in FIG. 7, for example. While moving, the projection area PR is irradiated with the exposure light EL to expose the shot areas S1 to S21 on the substrate P. When exposing each shot area S, the control device 4 controls the substrate stage 2 to move the substrate P in the Y-axis direction with respect to the projection area PR of the projection optical system PL. In addition, in order to expose the next shot area (for example, the second shot area S2) after the exposure of a certain shot area (for example, the first shot area S1) is completed, the control device 4 uses the projection area PR as the next shot. The substrate stage 2 is controlled to move the substrate P in a predetermined direction in the XY plane so as to be arranged at the exposure start position in the region S. In the following description, moving the substrate P in the Y-axis direction in order to expose the shot area S will be referred to as scan movement as appropriate. Further, after the exposure for a certain shot area is completed, in order to expose the next shot area, the stepping is appropriately performed by moving the substrate P so that the projection area PR is arranged at the exposure start position of the next shot area. This is called movement.

  In the present embodiment, at least a part of the operation of the exposure apparatus EX is executed based on predetermined control information (exposure control information) related to exposure. The exposure control information includes a control command group that defines the operation of the exposure apparatus, and is also called an exposure recipe. In the following description, the control information related to exposure is appropriately referred to as an exposure recipe.

  The exposure recipe includes a movement locus R1 of the substrate P (substrate stage 2) relative to the last optical element 11 and the liquid immersion member 13. That is, in the present embodiment, the movement locus R1 of the substrate P (substrate stage 2) is determined in advance. In the present embodiment, the movement trajectory R1 is determined based on the shot areas S1 to S21 set on the substrate P. The exposure recipe including the movement locus R1 is stored in the storage device 10 in advance. The control device 4 controls the operation of the exposure apparatus EX based on the exposure recipe stored in the storage device 10.

  Next, an example of the operation of the exposure apparatus EX having the above-described configuration will be described. As shown in the flowchart of FIG. 8, in the present embodiment, the terminal optical element 11 and the liquid immersion member are evaluated based on the process (step SA1) for evaluating the state of the surface of the substrate P and the evaluation result in step SA1. The relationship between the relative moving speed V and the moving distance L of the substrate P with respect to the last optical element 11 and the liquid immersion member 13 that allows the liquid LQ in the liquid immersion space LS between the substrate 13 and the substrate P to maintain a predetermined state. Based on the information about the relationship between the relative movement speed V and the movement distance L of the substrate P relative to the terminal optical element 11 and the liquid immersion member 13 derived in step SA2 and the processing to be derived (step SA2). Movement of the substrate P relative to the last optical element 11 and the liquid immersion member 13 so that the liquid LQ in the liquid immersion space LS between the element 11 and the liquid immersion member 13 and the substrate P maintains a predetermined state. Process of determining the matter (step SA3), while moving the substrate P based on the movement condition determined in step SA3, the process of immersion exposing the substrate P (step SA4) is performed.

  Hereinafter, an example of the process (step SA1) for evaluating the state of the surface of the substrate P will be described. As shown in FIG. 4, when the surface of the substrate P is formed of a film (photosensitive film Rg, protective film Tc, etc.), the evaluation of the state of the surface of the substrate P is performed on the film that forms the surface of the substrate P. Includes assessment of surface condition.

  When the substrate P is moved with respect to the last optical element 11 and the liquid immersion member 13 with the immersion space LS formed between the last optical element 11 and the liquid immersion member 13 and the substrate P, the surface of the substrate P The state of the liquid LQ in the immersion space LS changes according to the state of the substrate P or the moving condition of the substrate P. The state of the surface of the substrate P includes the state of the surface of the film that forms the surface of the substrate P. Further, the surface state of the substrate P includes a liquid repellency state of the surface of the substrate P with respect to the liquid LQ. The moving condition of the substrate P includes a relative moving speed of the substrate P with respect to the last optical element 11 and the liquid immersion member 13. Further, the movement condition of the substrate P includes a relative movement distance of the substrate P with respect to the last optical element 11 and the liquid immersion member 13. The movement condition of the substrate P includes an acceleration (deceleration) condition when the substrate P moves relative to the last optical element 11 and the liquid immersion member 13.

  In the present embodiment, when the control device 4 moves the substrate P relative to the last optical element 11 and the liquid immersion member 13, the control device 4 determines the state of the substrate P based on the recovery state of the liquid LQ from the second recovery port 25. Evaluate the surface condition. In the present embodiment, the control device 4 moves the substrate P based on the presence or absence of the liquid LQ recovered by the second recovery port 25 when the substrate P is moved relative to the last optical element 11 and the liquid immersion member 13. Evaluate the surface condition.

  FIG. 9 is a flowchart showing an example of a process for evaluating the state of the surface of the substrate P, and shows a subroutine of step SA1 shown in FIG. In the present embodiment, the control device 4 moves the substrate P with respect to the last optical element 11 and the liquid immersion member 13 under a plurality of movement conditions, and the liquid LQ from the second recovery port 25 under each of the plurality of movement conditions. Based on the recovered state, the surface state of the substrate P is evaluated.

  When the start of the process for evaluating the state of the surface of the substrate P is instructed (step SB1), the control device 4 causes the lower surface 12 of the last optical element 11 and the liquid so that the optical path of the exposure light EL is filled with the liquid LQ. An immersion space LS is formed between the lower surface 14 of the immersion member 13 and the surface of the substrate P (step SB2). The controller 4 forms the immersion space LS by executing the liquid recovery operation by the first recovery port 24 in parallel with the liquid supply operation by the supply port 23.

  FIG. 10 is a schematic diagram showing a part of the immersion space LS formed between the lower surface 12 of the last optical element 11, the lower surface 14 of the liquid immersion member 13, and the surface of the substrate P. In FIG. 10, the substrate P is substantially stationary. The controller 4 forms the immersion space LS by executing the liquid recovery operation by the first recovery port 24 in parallel with the liquid supply operation by the supply port 23. As shown in FIG. 10, in this embodiment, the interface LG of the immersion space LS is between the first recovery port 24 (second surface 34) and the surface of the substrate P when the substrate P is substantially stationary. An immersion space LS is formed so as to be disposed therebetween.

  Further, the control device 4 starts the fluid suction operation by the second recovery port 25 in the state where the immersion space LS is formed. As shown in FIG. 10, the liquid LQ is not recovered from the second recovery port 25 when the substrate P is substantially stationary. The second recovery port 25 sucks the gas around the second recovery port 25.

  After the immersion space LS is formed, in order to evaluate the state of the surface of the substrate P, the control device 4 forms the immersion space LS between the terminal optical element 11 and the immersion member 13 and the substrate P. In this state, the process of moving the substrate P under the predetermined condition with respect to the last optical element 11 and the liquid immersion member 13 is started so that the surface of the substrate P faces the first recovery port 24 and the second recovery port 25. First, the counter n is reset (step SB3), and then the counter n is counted (step SB4). The control device 4 determines the movement distance of the substrate P in one predetermined direction as the first movement distance L1 (step SB5). In the following description, a case where the substrate P is moved in the −Y direction will be described as an example. Therefore, the control device 4 determines the movement distance of the substrate P in the −Y direction as the first movement distance L1.

  Further, the counter m is reset (step SB6), and then the counter m is counted (step SB7). The control device 4 determines the moving speed of the substrate P in the −Y direction as the first moving speed V1 (step SB8).

  And the control apparatus 4 starts the movement of the board | substrate P based on the moving distance L1 defined by step SB5, and the moving speed V1 defined by step SB8. That is, the control device 4 starts an operation of moving the substrate P by the first movement distance L1 at the first movement speed V1 in the −Y direction.

  The control device 4 supplies the liquid LQ from the supply port 23 when the substrate P is moved with respect to the last optical element 11 and the liquid immersion member 13, and at least a part of the liquid LQ on the substrate P Collected from one collection port 24. Further, at least when the substrate P is moving, the second recovery port 25 continues to suck the fluid around the second recovery port 25.

  Then, the control device 4 uses the detection device 40 to recover the liquid LQ from the second recovery port 25 while moving the substrate P in the −Y direction at the first movement speed V1 by the first movement distance L1. A state is detected (step SB9). As described above, the detection device 40 can detect whether or not the liquid LQ has been recovered from the second recovery port 25. Whether the second recovery port 25 recovered the liquid LQ using the detection device 40 while the control device 4 moves the substrate P in the −Y direction at the first movement speed V1 by the first movement distance L1. To detect. Based on the detection result of the detection device 40, the control device 4 moves the substrate P with respect to the last optical element 11 and the liquid immersion member 13 in the −Y direction at the first movement speed V 1 by the first movement distance L 1. At this time, it is determined whether or not the liquid LQ has been recovered from the second recovery port 25 (step SB10).

  FIG. 11 is a schematic diagram showing a part of the immersion space LS when the substrate P is moved with respect to the last optical element 11 and the immersion member 13 under the first movement condition in a state where the immersion space LS is formed. FIG. 12 is a schematic diagram showing a part of the immersion space LS when the substrate P is moved under a second movement condition different from the first movement condition.

  FIG. 11 shows an example where the liquid LQ in the immersion space LS between the terminal optical element 11 and the liquid immersion member 13 and the substrate P is maintained in a predetermined state. The predetermined state of the liquid LQ includes a state in which leakage of the liquid LQ from between the terminal optical element 11 and the liquid immersion member 13 and the substrate P is suppressed by the first recovery port 24. Further, the predetermined state of the liquid LQ includes a state where the liquid LQ remaining on the substrate P is suppressed by the first recovery port 24. When the substrate P is moved under the first moving condition, the interface LG of the immersion space LS is formed between the first recovery port 24 (second surface 34) and the surface of the substrate P by the liquid recovery operation of the first recovery port 24. The leakage of the liquid LQ from between the last optical element 11 and the liquid immersion member 13 and the substrate P is suppressed. As shown in FIG. 11, the liquid LQ is not recovered from the second recovery port 25 when the liquid LQ is in a predetermined state.

  FIG. 12 shows an example where the liquid LQ in the immersion space LS between the terminal optical element 11 and the liquid immersion member 13 and the substrate P is not maintained in a predetermined state. Depending on the movement condition of the substrate P, it may be difficult for the liquid LQ in the immersion space LS to maintain a predetermined state. The liquid LQ cannot be maintained in a predetermined state and leaks outside the predetermined space between the terminal optical element 11 and the liquid immersion member 13 and the substrate P, or remains on the substrate P without being recovered by the first recovery port 24. In such a case, the leaked liquid LQ or the remaining liquid LQ is recovered in the second recovery port 25 disposed outside the first recovery port 24 with respect to the optical path of the exposure light EL.

  Therefore, the control device 4 determines whether or not the second recovery port 25 has recovered the liquid LQ based on the detection result of the detection device 40, and based on the presence or absence of the liquid LQ recovered by the second recovery port 25. It can be determined whether or not the liquid LQ in the immersion space LS maintains a predetermined state.

  In Step SB10, when it is determined that the liquid LQ is not recovered from the second recovery port 25, that is, when it is determined that the liquid LQ in the immersion space LS is maintained in a predetermined state, the control device 4 determines that the counter m Is counted (step SB7), and the moving speed of the substrate P is set to the second moving speed V2 (step SB8). The second movement speed V2 is higher than the first movement speed V1. The control device 4 uses the detection device 40 to move the substrate P in the −Y direction at the second movement speed V2 and move the substrate P using the detection device 40. Presence / absence is detected (step SB10). If it is determined in step SB10 that the liquid LQ is not recovered from the second recovery port 25, the control device 4 counts the counter m (step SB7), and sets the moving speed of the substrate P to the third moving speed V3. (Step SB8). The third movement speed V3 is higher than the second movement speed V2. Then, the control device 4 moves the substrate P in the −Y direction at the third movement speed V3 by the first movement distance L1, and uses the detection device 40 to recover the liquid LQ collected by the second collection port 25. The presence or absence is detected (step SB10).

  Until the liquid LQ is recovered from the second recovery port 25, that is, until the liquid LQ in the immersion space LS cannot maintain the predetermined state, the control device 4 performs the third movement speed V3, the fourth movement speed V4, ..., the processing of steps SB7 to SB10 is repeated while increasing the moving speed of the substrate P like the nth moving speed Vn. Thereby, the control device 4 obtains the maximum moving speed of the substrate P at which the second recovery port 25 does not recover the liquid LQ, that is, the maximum moving speed of the substrate P at which the liquid LQ in the immersion space LS can maintain a predetermined state. Can do. The control device 4 can determine the maximum moving speed of the substrate P corresponding to the first moving distance L1 at which the liquid LQ in the immersion space LS is maintained in a predetermined state.

  After the maximum movement speed of the substrate P corresponding to the first movement distance L1 is determined, the control device 4 determines whether or not the counter n has exceeded a predetermined value N (step SB11). When it is determined in step SB11 that the counter n does not exceed the predetermined value N, the control device 4 counts the counter n (step SB4), and sets the movement distance of the substrate P as the second movement distance L2 ( Step SB5). The second movement distance L2 is longer than the first movement distance L1.

  And the control apparatus 4 repeats the process of step SB7-SB10 like the procedure mentioned above in the state which set the movement distance of the board | substrate P to the 2nd movement distance L2, and the liquid LQ of the immersion space LS is a predetermined state. The maximum movement speed of the substrate P corresponding to the second movement distance L2 is maintained.

  Similarly, the control device 4 repeats the above-described procedure, and each of the third movement distance L3, the fourth movement distance L4,..., The Nth movement distance LN, in which the immersion space LS is maintained in a predetermined state. The maximum moving speed of the substrate P corresponding to is determined.

  As described above, the immersion space LS is maintained in a predetermined state, and each of the first movement distance L1, the second movement distance L2,..., And the Nth movement distance LN in one predetermined direction in the XY plane. The maximum moving speed of the corresponding substrate P is determined, and the process of evaluating the surface state of the substrate P is completed (step SB12).

  In the procedure shown in FIG. 9, the difference between the first movement speed V1 and the second movement speed V2 can be arbitrarily set. Similarly, the difference between the second, third,..., Nth moving speeds can be arbitrarily set. Further, the difference between the first movement distance L1 and the second movement distance L2 can be arbitrarily set. Similarly, the difference between the second, third,..., Nth moving distances can be arbitrarily set.

  Returning to the flowchart shown in FIG. 8, after the process of evaluating the surface state of the substrate P (step SA <b> 1) is completed, the control device 4 determines the terminal optical element 11 and the liquid immersion member 13 based on the evaluation result. The relationship between the moving speed V and the moving distance L of the substrate P with respect to the last optical element 11 and the liquid immersion member 13 is derived so that the liquid LQ in the liquid immersion space LS between the substrate P and the substrate P can maintain a predetermined state (step). SA2). That is, the control device 4 derives information related to the maximum moving speed corresponding to the moving distance of the substrate P at which the liquid LQ in the immersion space LS is maintained in a predetermined state. The derived relationship is stored in the storage device 10.

  FIG. 13 is a schematic diagram showing the relationship between the moving speed V and the moving distance L of the substrate P with respect to the last optical element 11 and the liquid immersion member 13 so that the liquid LQ in the liquid immersion space LS can maintain a predetermined state. In FIG. 13, when the substrate P is moved by the kth movement distance Lk (linear movement), the maximum movement speed at which the liquid LQ can be maintained in a predetermined state is Vk. That is, when the substrate P is moved by the k-th movement distance Lk (linear movement), the liquid P is prevented from leaking, remaining, etc. by suppressing the movement speed V of the substrate P to be equal to or lower than the k-th movement speed Vk. Can do. Similarly, when the substrate P is moved by the j-th movement distance Lj (linear movement), the liquid P is prevented from leaking, remaining, etc. by suppressing the movement speed V of the substrate P to be equal to or lower than the j-th movement speed Vj. be able to.

  Thus, the state of the liquid LQ in the immersion space LS changes according to the moving speed of the substrate P. Further, the state of the liquid LQ in the immersion space LS changes according to the movement distance of the substrate P. In the present embodiment, as shown in FIG. 13, when the moving distance of the substrate P is short, even if the moving speed of the substrate P is increased, leakage, remaining, etc. of the liquid LQ are suppressed.

  Next, the control device 4 controls the terminal optical element 11 and the liquid immersion member 13 so that the liquid LQ in the liquid immersion space LS between the terminal optical element 11 and the liquid immersion member 13 and the substrate P maintains a predetermined state. The moving condition of the substrate P is determined (step SA3).

  In order to maintain the liquid LQ in the immersion space LS in a predetermined state, it is desirable to suppress the moving speed of the substrate P. On the other hand, it is desirable that the moving speed of the substrate P is high from the viewpoint of improving the throughput. Therefore, it is desirable to move the substrate P at the highest possible moving speed within a range where the liquid LQ does not leak or remain.

  In the present embodiment, in step SA2, information regarding the relationship between the moving speed V and the moving distance L of the substrate P that can maintain the liquid LQ in the immersion space LS in a predetermined state as shown in FIG. It has been demanded. Information regarding the relationship is stored in the storage device 10. In the present embodiment, the control device 4 controls the substrate P with respect to the terminal optical element 11 and the liquid immersion member 13 so that the liquid LQ in the liquid immersion space LS maintains a predetermined state based on the storage information of the storage device 10. Determine moving conditions. Specifically, the control device 4 determines the moving speed of the substrate P when exposing the substrate P based on the storage information of the storage device 10 so that the liquid LQ in the immersion space LS maintains a predetermined state. To do.

  The control device 4 determines the moving speed of the substrate P so that the time from the start to the end of exposure of the substrate P is shortened. For example, the control device 4 determines the moving speed of the substrate P so that the time from the start of exposure of the first shot area S1 to the end of exposure of the 21st shot area S21 is shortened.

  As described above, in the present embodiment, the movement locus R1 of the substrate P is determined in advance based on the shot areas S1 to S21 set on the substrate P. The control device 4 determines the moving speed of the substrate P so that the liquid LQ is maintained in a predetermined state when the substrate P is moved along the movement locus R1. At the time of exposure of the substrate P, for example, the moving distance of the substrate P in the scanning movement may be different from the moving distance of the substrate P in the stepping movement. Further, for example, the movement distance of the substrate P when stepping from the first shot area S1 to the second shot area S2, and the movement distance of the substrate P when stepping from the third shot area S3 to the fourth shot area S4 May be different. The control device 4 determines, for example, the moving speed (maximum moving speed) of the substrate P during each scanning movement and each stepping movement so that the time from the start to the end of exposure of the substrate P is shortened. That is, when the moving distance of the substrate P is short, the moving speed is increased, and when the moving distance is long, the moving speed is decreased. Thereby, it is possible to shorten the time from the start of exposure of the substrate P to the end thereof while suppressing leakage, remaining, etc. of the liquid LQ. Thereby, throughput can be improved.

  In this embodiment, the substrate P scans in the Y-axis direction during exposure of the shot area S, and moves to the exposure start position of the next shot area S from the exposure end position of one shot area S. Stepping in a predetermined direction in the plane. In other words, the substrate P moves in a plurality of directions within the XY plane with respect to the last optical element 11 and the liquid immersion member 13. For example, the maximum movement speed of the substrate P that maintains the liquid LQ in a predetermined state when the substrate P moves by a predetermined distance in the Y-axis direction, and the liquid LQ when the substrate P moves by a predetermined distance in the X-axis direction. The liquid LQ is maintained in a predetermined state when the substrate P is moved by a predetermined distance in a direction inclined with respect to the maximum movement speed of the substrate P maintained in a predetermined state and the Y-axis direction (X-axis direction) in the XY plane. The maximum moving speed of the substrate P may be different. The control device 4 exposes the substrate P by determining in advance the relationship between the moving speed V and the moving distance L of the substrate P that can maintain the liquid LQ in a predetermined state corresponding to each of the moving directions of the substrate P. The movement speed when moving the substrate P in the Y-axis direction (maximum movement speed) and the movement speed when moving the substrate P in the X-axis direction (so that the time from the start to the end is shortened) The maximum movement speed) and the movement speed (maximum movement speed) when moving the substrate P in the Y-axis direction (X-axis direction) and the tilting direction in the XY plane can be determined.

  And the control apparatus 4 carries out immersion exposure of the board | substrate P, moving the board | substrate P based on the determined movement conditions (step SA4).

  The control device 4 can determine the irradiation condition of the exposure light EL based on the determined moving condition. For example, when the moving speed of the substrate P is increased, the control device 4 increases the illuminance of the exposure light EL, for example, by controlling the illumination system IL so that the substrate P is exposed with a desired exposure amount. Further, when the moving speed of the substrate P is lowered, the control device 4 lowers the illuminance of the exposure light EL, for example, so that the substrate P is exposed with a desired exposure amount. Thereby, the board | substrate P can be exposed with a desired exposure amount.

  The case where the substrate P has a predetermined surface state has been described above. As described with reference to FIG. 4, there is a possibility that the state of the surface of the substrate P changes due to a change in the film forming the surface of the exposed substrate P. When the surface state of the substrate P changes, for example, when the liquid repellency of the surface of the substrate P with respect to the liquid LQ (contact angle of the surface of the substrate P with respect to the liquid LQ) changes, the liquid LQ in the immersion space LS maintains a predetermined state. May be difficult to do. For example, if the liquid repellency of the surface of the substrate P with respect to the liquid LQ is low, when the substrate P is moved, the liquid LQ in the immersion space LS cannot be maintained in a predetermined state and leaks or remains on the substrate P. Is more likely to do.

  The control device 4 can execute the evaluation of the state of the film forming the surface of the substrate P and the liquid repellency of the surface of the substrate P with respect to the liquid LQ using the procedure of steps SB1 to SB12. Then, the control device 4 can derive the relationship between the moving speed and the moving distance of the substrate P that allows the liquid LQ in the immersion space LS to maintain a predetermined state based on the result of the evaluation. The movement condition of the substrate P can be determined so that the liquid LQ of LS maintains a predetermined state.

  Further, the control device 4 changes the surface state of the substrate P based on the presence or absence of the liquid LQ recovered by the second recovery port 25 when the substrate P is moved relative to the last optical element 11 and the liquid immersion member 13. Based on the result of the evaluation, it can be determined whether or not the surface state of the substrate P is usable. That is, the control device 4 determines whether or not the surface state of the substrate P is usable for the immersion exposure process based on the evaluation result of the surface of the substrate P, in other words, the surface of the substrate P is the terminal optical element. 11 and the liquid immersion member 13, it is determined whether the liquid LQ is satisfactorily maintained and the liquid LQ in the liquid immersion space LS can be maintained in a predetermined state. For example, even when the moving speed of the substrate P is sufficiently reduced, if the liquid LQ in the immersion space LS cannot maintain a predetermined state, the film forming the surface of the substrate P is changed, or the substrate It can be determined that the film forming the surface of P cannot be used.

  As described above, according to the present embodiment, the state of the surface of the substrate P can be satisfactorily evaluated. Then, based on the result of the evaluation, a substrate P (film forming the surface of the substrate P) that can form the immersion space LS satisfactorily is selected, or the substrate that can maintain the liquid LQ in the immersion space LS in a predetermined state. P moving conditions can be determined. Accordingly, it is possible to suppress the liquid LQ from leaking out or the liquid LQ (film, droplet, etc.) remaining on the substrate P.

  For example, if the liquid LQ in the immersion space LQ cannot maintain a predetermined state and the liquid LQ leaks, the substrate stage 2 or peripheral equipment may be affected. Further, if the liquid LQ remains on the substrate P, the heat of vaporization of the liquid LQ may affect the substrate P. As a result, a defective exposure may occur, such as a defect in the pattern formed on the substrate P. As a result, a defective device may be manufactured. According to this embodiment, since the state of the surface of the substrate P can be evaluated satisfactorily, it is possible to execute a measure for suppressing the occurrence of exposure failure, the occurrence of defective devices, and the like based on the evaluation result. .

  Further, according to the present embodiment, the substrate P can be moved at the highest possible moving speed within the range in which the liquid LQ can maintain the predetermined state. Therefore, it is possible to suppress a decrease in throughput while suppressing the occurrence of exposure failure.

  In the present embodiment, the movement speed of the substrate P is determined so that the liquid LQ is maintained in a predetermined state when the substrate P is moved along the predetermined movement locus R1. The control device 4 uses the terminal optical element when exposing the substrate P so that the liquid LQ is maintained in a predetermined state and the time from the start to the end of exposure of the substrate P is shortened. 11 and the movement distance of the substrate P with respect to the liquid immersion member 13 can be determined.

  Further, the state of the liquid LQ in the immersion space LS may change according to the acceleration when the substrate P is moved. The control device 4 determines the acceleration condition when the substrate P moves so that the liquid LQ is maintained in a predetermined state and the time from the start to the end of exposure of the substrate P is shortened. be able to.

  Further, the control device 4 linearly moves the substrate P in one predetermined direction so that the liquid LQ is maintained in a predetermined state and the time from the start to the end of exposure of the substrate P is shortened. When moving to, the deceleration operation may be executed a predetermined number of times.

  In the present embodiment, the case where the state of the surface of the substrate P is evaluated has been described as an example. However, not only the substrate P but also a predetermined region including a position facing the terminal optical element 11 and the liquid immersion member 13 is used. It is possible to evaluate the state of the surface of the movable member that is movable. For example, as shown in the schematic diagram of FIG. 14, an immersion space LS is formed between the terminal optical element 11 and the liquid immersion member 13 and the upper surface 20 of the measurement stage 3, and the terminal optical element 11 and the liquid immersion member 13 are formed. On the other hand, when the measurement stage 3 is moved and the measurement stage 3 is moved, the state of the upper surface 20 of the measurement stage 3 can be evaluated based on the recovery state of the liquid LQ from the second recovery port 25. Further, based on the result of the evaluation, the measurement stage 3 for the last optical element 11 and the liquid immersion member 13 can maintain the predetermined state of the liquid LQ between the last optical element 11 and the liquid immersion member 13 and the measurement stage 3. The relationship between the moving speed and the moving distance can be derived. Further, based on the evaluation result, the measurement stage 3 for the last optical element 11 and the liquid immersion member 13 is maintained so that the liquid LQ between the last optical element 11 and the liquid immersion member 13 and the measurement stage 3 maintains a predetermined state. The moving condition can be determined.

  Similarly, an immersion space LS is formed between the terminal optical element 11 and the liquid immersion member 13 and the upper surface 19 of the substrate stage 2 (plate member T), and the substrate stage is formed with respect to the terminal optical element 11 and the liquid immersion member 13. When the substrate stage 2 is moved, the state of the upper surface 19 of the substrate stage 2 (plate member T) can be evaluated based on the recovery state of the liquid LQ from the second recovery port 25. As shown in FIG. 3, when the upper surface 19 of the plate member T is formed of the film H, the evaluation of the state of the upper surface 19 of the substrate stage 2 (plate member T) is based on the state of the surface of the film H. Includes evaluation. Further, based on the result of the evaluation, the terminal optical element 11 and the liquid immersion member can maintain the predetermined state of the liquid LQ between the terminal optical element 11 and the liquid immersion member 13 and the substrate stage 2 (plate member T). The relationship between the moving speed and the moving distance of the substrate stage 2 (plate member T) with respect to 13 can be derived. Further, based on the result of the evaluation, the terminal optical element 11 and the liquid immersion member are maintained so that the liquid LQ between the terminal optical element 11 and the liquid immersion member 13 and the substrate stage 2 (plate member T) maintains a predetermined state. The moving condition of the substrate stage 2 (plate member T) with respect to 13 can be determined. The plate member T is detachable and replaceable. For example, when the state of the upper surface 19 of the plate member T is changed, the control device 4 can execute the evaluation of the state of the upper surface 19 of the plate member T.

  Further, for example, the movement condition of the plate member T (substrate stage 2) when the upper surface 19 of the plate member T is in the reference state and the recovery state of the liquid LQ from the second recovery port 25 are stored in the storage device 10. In addition, the state of the upper surface 19 of the plate member T can be evaluated using the stored information of the storage device 10. The reference state of the upper surface 19 includes that the upper surface 19 is in an initial state and includes a state having desired liquid repellency. The stored information of the storage device 10 can be obtained in advance by processing including the same procedure as the above-described steps SB1 to SB12. The storage information of the storage device 10 includes information on the maximum moving speed corresponding to the moving distance of the plate member T in the reference state in which the liquid LQ in the immersion space LS is maintained in a predetermined state.

  For example, when the liquid repellency of the upper surface 19 of the plate member T with respect to the liquid LQ deteriorates, there is a high possibility that the liquid LQ leaks or remains on the plate member T. Therefore, the control device 4 evaluates the state of the upper surface 19 of the plate member T, for example, at predetermined time intervals, and compares the result of the evaluation with the movement condition in the reference state stored in the storage device 10. To do. Then, for example, when the liquid LQ is recovered from the second recovery port 25 even at a low moving speed as compared with the reference state, it can be determined that the liquid repellency of the plate member T with respect to the liquid LQ has deteriorated. In that case, for example, the control device 4 moves the plate member T (substrate stage 2) with respect to the last optical element 11 and the liquid immersion member 13 in a state where the liquid immersion space LS is formed. The moving condition of stage 2) can be changed. Thereby, the leakage of the liquid LQ, a residue, etc. can be suppressed. Similarly, information related to the reference state of the upper surface 20 of the measurement stage 3 is stored in the storage device 10, and the storage information of the storage device 10 is used so that the liquid LQ can maintain a predetermined state. The movement condition can be changed.

  Further, based on the recovery state of the liquid LQ from the second recovery port 25 derived from the detection result of the detection device 40, for example, the state of the upper surface 19 of the plate member T (liquid repellency with respect to the liquid LQ) is extremely deteriorated. If it is determined that the plate member T is present, the control device 4 determines that the plate member T is unusable and can replace it with a new plate member T. The plate member T can be attached to and detached from the second holder 18 of the substrate stage 2. As shown in the schematic diagram of FIG. 15, the control device 4 uses the predetermined transfer device 80 to carry out the plate member T released from being held by the second holder 18 from the substrate stage 2, and to create a new plate member T. Can be held by the second holder 18. Thereby, the immersion space LS can be formed using the plate member T having a desired surface state.

  When it is determined that the liquid repellency of the upper surface 19 of the plate member T with respect to the liquid LQ is deteriorated based on the evaluation result, a maintenance process for the plate member T may be executed. For example, the upper surface 19 of the plate member T may be cleaned by irradiating the upper surface 19 of the plate member T with exposure light EL that is ultraviolet light. By executing the maintenance process including the light cleaning process, the upper surface 19 of the plate member T can be in a good state. Further, as a maintenance process, for example, a cleaning process using a cleaning liquid may be executed. Similarly, maintenance processing of the upper surface 20 of the measurement stage 3 can be executed based on the evaluation result.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  The characteristic part of the present embodiment is that the object is moved with respect to the liquid immersion member 13 in a state where the liquid immersion space LS is formed between the lower surface 14 of the liquid immersion member 13 and the object facing the lower surface 14. In this case, the state of the lower surface 14 of the liquid immersion member 13 is evaluated based on the recovery state of the liquid LQ from the second recovery port 25.

  In the present embodiment, in order to evaluate the state of the lower surface 14 of the liquid immersion member 13, an object DP having a reference surface 50 is disposed at a position facing the lower surface 14 of the liquid immersion member 13, as shown in FIG. Is done. The reference surface 50 is clean and flat. In the present embodiment, the object DP has the same outer shape as the substrate P and can be held by the first holder 17. In the following description, the object DP having the reference surface 50 is appropriately referred to as a dummy substrate DP.

  In order to evaluate the lower surface 14 of the liquid immersion member 13, the control device 4 sets the liquid immersion space LS between the lower surface 14 of the liquid immersion member 13 and the reference surface 50 of the dummy substrate DP. The dummy substrate DP is moved with respect to the immersion member 13. When the dummy substrate DP is moved relative to the liquid immersion member 13, the control device 4 evaluates the state of the lower surface 14 of the liquid immersion member 13 based on the recovery state of the liquid LQ from the second recovery port 25.

  In order to form the immersion space LS satisfactorily, the lower surface 14 of the immersion member 13 is lyophilic with respect to the liquid LQ. For example, if the lyophilicity of the lower surface 14 of the liquid immersion member 13 with respect to the liquid LQ is low, when the substrate P is moved, the liquid LQ in the immersion space LS cannot be maintained in a predetermined state, and leaks out or onto the substrate P. The possibility of remaining is increased. In the present embodiment, the evaluation of the state of the lower surface 14 of the liquid immersion member 13 includes the evaluation of the lyophilicity of the lower surface 14 with respect to the liquid LQ.

  The process for evaluating the state of the lower surface 14 of the liquid immersion member 13 includes the same procedure as Steps SB1 to SB12 described in the first embodiment. In order to evaluate the state of the lower surface 14 of the liquid immersion member 13, an immersion space LS is formed between the lower surface 14 of the liquid immersion member 13 and the reference surface 50 of the dummy substrate DP. The control device 4 moves the dummy substrate DP with respect to the liquid immersion member 13 under a plurality of movement conditions in a state where the liquid immersion space LS is formed. The control device 4 evaluates the state of the lower surface 14 of the liquid immersion member 13 based on the presence or absence of the liquid LQ recovered by the second recovery port 25 under each of a plurality of movement conditions. Then, the control device 4 derives a relationship between the moving speed and the moving distance of the dummy substrate DP with respect to the liquid immersion member 13 that allows the liquid LQ in the liquid immersion space LS to maintain a predetermined state based on the evaluation result. Further, the control device 4 determines, based on the evaluation result, the dummy substrate DP for the liquid immersion member 13 so that the liquid LQ in the liquid immersion space LS between the liquid immersion member 13 and the dummy substrate DP is maintained in a predetermined state. Determine the movement conditions. For example, the control device 4 determines the moving condition of the dummy substrate DP so that the dummy substrate DP moves at the highest possible moving speed within the range in which the liquid LQ can maintain the predetermined state.

  Based on the movement condition determined using the dummy substrate DP, the control device 4 determines the movement condition of the substrate P when exposing the substrate P having a surface equivalent to the reference surface 50 of the dummy substrate DP. Thereby, the control device 4 can shorten the time from the start to the end of exposure of the substrate P while maintaining the liquid LQ in the immersion space LS in a predetermined state. Therefore, it is possible to suppress a decrease in throughput while suppressing the occurrence of exposure failure.

  Further, for example, the movement condition of the dummy substrate DP and the recovery state of the liquid LQ from the second recovery port 25 when the lower surface 14 of the liquid immersion member 13 is in the reference state are stored in the storage device 10 and stored. Evaluation of the state of the lower surface 14 of the liquid immersion member 13 can be performed using the stored information of the apparatus 10. The reference state of the lower surface 14 includes that the lower surface 14 is in an initial state and includes a state having a desired lyophilic property. The stored information of the storage device 10 can be obtained in advance by processing including the same procedure as the above-described steps SB1 to SB12. The storage information of the storage device 10 includes information regarding the maximum moving speed corresponding to the moving distance of the dummy substrate DP with respect to the liquid immersion member 13 in the reference state in which the liquid LQ in the liquid immersion space LS is maintained in a predetermined state.

  For example, when the lyophilicity with respect to the liquid LQ of the lower surface 14 of the liquid immersion member 13 deteriorates, it may be difficult for the liquid LQ in the liquid immersion space LS to maintain a predetermined state. Therefore, the control device 4 forms the immersion space LS between the lower surface 14 of the immersion space 13 and the dummy substrate DP, for example, at predetermined time intervals, and evaluates the state of the lower surface 14 of the immersion member 13. The result of the evaluation is compared with the movement condition in the reference state stored in the storage device 10. Then, it can be determined that the lyophilicity of the lower surface 14 of the liquid immersion member 13 has deteriorated, for example, when the liquid LQ is recovered from the second recovery port 25 even at a lower moving speed than in the reference state. In that case, for example, the control device 4 can change the movement condition of the substrate P when the substrate P having the same surface as the reference surface 50 of the dummy substrate DP is exposed. Thereby, when the substrate P is exposed, leakage, remaining, etc. of the liquid LQ can be suppressed.

  Further, for example, when it is determined that the state of the lower surface 14 of the liquid immersion member 13 (lyophilicity with respect to the liquid LQ) is extremely deteriorated, the liquid immersion member 13 is determined to be unusable, and a new liquid immersion member 13 can be exchanged.

  For example, when it is determined that the lyophilicity of the lower surface 14 of the liquid immersion member 13 has deteriorated based on the result of the evaluation, a maintenance process for the liquid immersion member 13 may be performed. For example, a light cleaning device capable of irradiating the lower surface 14 of the liquid immersion member 13 with ultraviolet light is provided, and the lower surface 14 of the liquid immersion member 13 is irradiated with ultraviolet light from the light cleaning device to irradiate the lower surface 14 of the liquid immersion member 13. You may wash with light. By executing the maintenance process including the light cleaning process, the state of the lower surface 14 of the liquid immersion member 13 can be improved. Further, as a maintenance process, for example, a cleaning process using a cleaning liquid may be executed.

  Further, the evaluation of the state of the lower surface 12 of the last optical element 11 can be performed by the same procedure as that described in the above embodiment.

  In the present embodiment, the case where the reference surface 50 is disposed on the dummy substrate DP has been described as an example. However, the reference surface 50 may be disposed, for example, on the plate member T, or the measurement stage 3. May be arranged.

  In each of the above-described embodiments, the case where the detection device 40 that detects whether or not the liquid LQ has been recovered from the second recovery port 25 includes the temperature sensor 40A has been described as an example. For example, FIG. As described above, the detection device 40 may include the optical sensor 40B. In FIG. 17, the detection device 40 includes an optical sensor 40 </ b> B that optically detects the liquid LQ collected in the second collection port 25. In the present embodiment, a part of the collecting member 15 is formed by first and second optical members 61 and 62 having optical transparency. The second optical members 61 and 62 form at least a part of the recovery channel 31 </ b> A connected to the second recovery port 25. The optical sensor 40B includes a projection device 63 that emits the detection light SL and a light receiving device 64 that can receive the detection light SL. The projection device 63 is disposed so as to face the first optical member 61. The light receiving device 64 is disposed so as to face the second optical member 62. The projection device 63 can irradiate the recovery flow path 31 </ b> A with the detection light SL via the first optical member 61. When the liquid LQ does not exist in the recovery channel 31A, the detection light SL emitted from the projection device 63 passes through the first optical member 61, passes through the recovery channel 31A, and then passes through the second optical member 62. The light receiving device 64 receives the light. On the other hand, when the second recovery port 25 recovers the liquid LQ and the liquid LQ is present in the recovery channel 31A, the detection light SL emitted from the projection device 63 passes through the first optical member 61 and is recovered. The liquid LQ existing in the path 31A is irradiated. The light receiving state of the light receiving device 64 with respect to the detection light SL differs depending on whether or not the liquid LQ is present in the recovery flow path 31A. Therefore, the detection device 40 can detect whether or not the second recovery port 25 recovered the liquid LQ based on the light reception result of the light receiving device 64 of the optical sensor 40B.

  As shown in FIG. 18, the detection device 40 may include a pressure sensor 40 </ b> C that detects the pressure in the recovery flow path 31 </ b> A connected to the second recovery port 25. The detection result of the pressure sensor 40C differs depending on whether the second recovery port 25 recovers the liquid LQ or not. For example, when the second recovery port 25 recovers the liquid LQ and the liquid LQ flows into the second recovery port 25, the pressure in the recovery channel 31A decreases. Therefore, the detection device 40 can detect whether or not the second recovery port 25 has recovered the liquid LQ based on the detection result of the pressure sensor 40C.

  In each of the above-described embodiments, the state of the surface of the substrate P and the like is evaluated based on the presence or absence of the liquid LQ recovered by the second recovery port 25. However, the liquid LQ recovered by the second recovery port 25 Based on this amount, the state of the surface of the substrate P and the like can be evaluated. For example, when the liquid repellency of the surface of the substrate P is low, there is a higher possibility that the amount of the liquid LQ recovered at the second recovery port 25 is larger than when the liquid repellency is high. Can evaluate the state of the surface of the substrate P based on the amount of the liquid LQ recovered by the second recovery port 25. Similarly, the control device 4 determines the state of the upper surface 19 of the plate member T, the state of the upper surface 20 of the measurement stage 3, and the lower surface 14 of the liquid immersion member 13 based on the amount of the liquid LQ recovered by the second recovery port 25. Can be evaluated.

  In each of the above-described embodiments, the projection optical system PL fills the optical path space on the exit side (image plane side) of the last optical element 11 with a liquid, but is disclosed in International Publication No. 2004/019128. As described above, it is also possible to employ a projection optical system in which the optical path space on the incident side (object plane side) of the last optical element 11 is also filled with the liquid LQ.

  In addition, although the liquid LQ of the above-mentioned embodiment is water, liquids other than water may be sufficient. The liquid LQ is preferably a liquid LQ that is transmissive to the exposure light EL, has a refractive index as high as possible, and is stable with respect to the projection optical system or a photosensitive material (photoresist) film that forms the surface of the substrate. For example, as the liquid LQ, hydrofluoroether (HFE), perfluorinated polyether (PFPE), fomblin oil, cedar oil, or the like can be used. A liquid LQ having a refractive index of about 1.6 to 1.8 may be used. Furthermore, an optical element (such as a terminal optical element) of the projection optical system PL that is in contact with the liquid LQ may be formed of a material having a refractive index higher than that of quartz and fluorite (for example, 1.6 or more). In addition, various fluids such as a supercritical fluid can be used as the liquid LQ.

For example, when the exposure light EL is F ₂ laser light, the F ₂ laser light does not transmit water, so that the liquid LQ can transmit F ₂ laser light, for example, perfluorinated polyether (PFPE). ), Fluorine-based fluids such as fluorine-based oils can be used. In this case, the lyophilic treatment is performed by forming a thin film with a substance having a molecular structure having a small polarity including fluorine, for example, at a portion in contact with the liquid LQ.

  As the substrate P in each of the above embodiments, not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Furthermore, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary, the second pattern With the projection optical system, the reduced image of the second pattern may be partially overlapped with the first pattern and collectively exposed on the substrate P (stitch type batch exposure apparatus). ). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate through a projection optical system, and one scanning exposure is performed on one substrate. The present invention can also be applied to an exposure apparatus that performs double exposure of shot areas almost simultaneously. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  The present invention also includes US Pat. No. 6,341,007, US Pat. No. 6,400,441, US Pat. No. 6,549,269, and US Pat. No. 6,590,634, US Pat. No. 6,208,407. No. 6, U.S. Pat. No. 6,262,796 and the like, and can also be applied to a twin-stage type exposure apparatus having a plurality of substrate stages. In the twin stage type exposure apparatus, the state of the upper surface of each stage is evaluated.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In each of the above-described embodiments, each position information of the mask stage 1, the substrate stage 2, and the measurement stage 3 is measured using an interferometer system including the laser interferometers 8A, 8B, and 8C. For example, an encoder system that detects scales (diffraction gratings) provided in the respective stages 1, 2, and 3 may be used. In this case, it is preferable that a hybrid system including both the interferometer system and the encoder system is used, and the measurement result of the encoder system is calibrated using the measurement result of the interferometer system. Further, the position of the stage may be controlled by switching between the interferometer system and the encoder system or using both.

  In each of the above-described embodiments, an ArF excimer laser may be used as a light source device that generates ArF excimer laser light as exposure light EL. For example, as disclosed in US Pat. No. 7,023,610. In addition, a harmonic generation apparatus that includes a solid-state laser light source such as a DFB semiconductor laser or a fiber laser, an optical amplification unit having a fiber amplifier, a wavelength conversion unit, and the like and outputs pulsed light with a wavelength of 193 nm may be used. Furthermore, in the above-described embodiment, each illumination area and the projection area described above are rectangular, but other shapes such as an arc shape may be used.

  In each of the above-described embodiments, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in Japanese Patent No. 6,778,257, a variable shaping mask (an electronic mask, an active mask, or a mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. (Also called an image generator) may be used. The variable shaping mask includes, for example, a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (spatial light modulator). The variable shaping mask is not limited to DMD, and a non-light emitting image display element described below may be used instead of DMD. Here, the non-light-emitting image display element is an element that spatially modulates the amplitude (intensity), phase, or polarization state of light traveling in a predetermined direction, and a transmissive liquid crystal modulator is a transmissive liquid crystal modulator. An electrochromic display (ECD) etc. are mentioned as an example other than a display element (LCD: Liquid Crystal Display). In addition to the DMD described above, the reflective spatial light modulator includes a reflective mirror array, a reflective liquid crystal display element, an electrophoretic display (EPD), electronic paper (or electronic ink), and a light diffraction type. An example is a light valve (Grating Light Valve).

  Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element. In this case, an illumination system is unnecessary. Here, as a self-luminous image display element, for example, CRT (Cathode Ray Tube), inorganic EL display, organic EL display (OLED: Organic Light Emitting Diode), LED display, LD display, field emission display (FED: Field Emission) Display), plasma display (PDP: Plasma Display Panel), and the like. In addition, as a self-luminous image display element included in the pattern forming apparatus, a solid light source chip having a plurality of light emitting points, a solid light source chip array in which a plurality of chips are arranged in an array, or a plurality of light emitting points on a single substrate A built-in type or the like may be used to form a pattern by electrically controlling the solid-state light source chip. The solid light source element may be inorganic or organic.

  In each of the above embodiments, the exposure apparatus provided with the projection optical system PL has been described as an example. However, the present invention can be applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. Even when the projection optical system PL is not used in this way, the exposure light is irradiated onto the substrate via an optical member such as a lens, and an immersion space is formed in a predetermined space between the optical member and the substrate. It is formed.

  Further, as disclosed in, for example, International Publication No. 2001/035168, an exposure apparatus (lithography system) that exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P. The present invention can also be applied to.

  As described above, the exposure apparatus EX according to the embodiment of the present application maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 19, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for manufacturing a mask (reticle) based on the design step, and a substrate as a base material of the device Substrate processing step 204 including substrate processing (exposure processing) including exposing the substrate with exposure light using a mask pattern and developing the exposed substrate according to the above-described embodiment. The device is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a package process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a sectional side view which shows the substrate stage which concerns on 1st Embodiment. It is a sectional side view which shows the plate member which concerns on 1st Embodiment. It is a sectional side view which shows an example of a board | substrate. It is a sectional side view parallel to the YZ plane showing the vicinity of the liquid immersion member according to the first embodiment. It is the figure which looked at the liquid immersion member and predetermined member which concern on 1st Embodiment from the lower side. It is the figure which looked at the substrate stage concerning a 1st embodiment from the upper part. It is a flowchart figure which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a flowchart figure which shows an example of the evaluation method which concerns on 1st Embodiment. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram which shows the relationship between the moving speed and moving distance of the board | substrate derived | led-out by the result of the evaluation method. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram which shows an example of operation | movement of the exposure apparatus which concerns on 2nd Embodiment. It is a schematic diagram which shows an example of a detection apparatus. It is a schematic diagram which shows an example of a detection apparatus. It is a flowchart figure which shows an example of the manufacturing process of a microdevice.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 4 ... Control apparatus, 10 ... Memory | storage device, 11 ... Terminal optical element, 12 ... Ejection surface, 13 ... Liquid immersion member, 14 ... Liquid contact surface, 15 ... Collection member, 16 DESCRIPTION OF SYMBOLS ... Lower surface, 19 ... Upper surface, 20 ... Upper surface, 23 ... Supply port, 24 ... 1st collection port, 25 ... 2nd collection port, 40 ... Detection apparatus, 40A ... Temperature sensor, 40B ... Optical sensor, 40C ... Pressure sensor, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... light path space, LQ ... liquid, LS ... immersion space, P ... substrate, PL ... projection optical system, Rg ... photosensitive film, T ... plate member, Tc ... Protective film

Claims (46)

An immersion exposure apparatus that exposes a substrate with exposure light,
An immersion member capable of forming an immersion space so that the optical path of the exposure light is filled with liquid;
A first liquid recovery port capable of recovering at least part of the liquid on the object facing the liquid immersion member and maintaining the liquid immersion space by recovering the liquid;
A second liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light and capable of recovering the liquid on the object,
Whether or not the surface of the object is in a state capable of maintaining the immersion space based on the recovery state of the liquid from the second liquid recovery port when the object is moved relative to the immersion member. Exposure equipment that evaluates.   The exposure apparatus according to claim 1, wherein the evaluation includes an evaluation of a surface state of a film forming the surface of the object.   The exposure apparatus according to claim 1, wherein the evaluation includes an evaluation of a liquid repellency of the surface of the object with respect to the liquid.   The exposure apparatus according to claim 1, wherein the object includes the substrate. A substrate stage movable while holding the substrate;
The exposure apparatus according to claim 1, wherein the object includes the substrate stage. The substrate stage has a detachable plate member,
The exposure apparatus according to claim 5, wherein the object includes the plate member.   The exposure apparatus according to claim 1, wherein it is determined whether the surface state of the object is usable based on the result of the evaluation. Moving the object with respect to the liquid immersion member under a plurality of movement conditions;
The exposure apparatus according to claim 1, wherein the state of the surface of the object is evaluated based on a liquid recovery state from the second liquid recovery port in each of the plurality of movement conditions.   The relationship between the moving speed and the moving distance of the object with respect to the liquid immersion member, which can maintain a predetermined state of the liquid between the liquid immersion member and the object, is derived based on the result of the evaluation. The exposure apparatus described.   The exposure according to claim 8 or 9, wherein a moving condition of the object relative to the liquid immersion member is determined based on the result of the evaluation so that the liquid between the liquid immersion member and the object maintains a predetermined state. apparatus.   The exposure apparatus according to claim 10, wherein the movement condition is determined so that a time from the start to the end of exposure of the substrate is shortened.   The exposure apparatus according to any one of claims 9 to 11, wherein the predetermined state includes a state in which leakage of liquid from between the liquid immersion member and the object is suppressed by the first liquid recovery port.   The exposure apparatus according to any one of claims 9 to 12, wherein the predetermined state includes a state in which the liquid remaining on the object is suppressed by the first liquid recovery port.   The exposure apparatus according to claim 9, wherein no liquid is recovered from the second liquid recovery port in the predetermined state.   The exposure apparatus according to claim 8, wherein the movement condition includes a relative movement speed of the object with respect to the liquid immersion member.   The exposure apparatus according to claim 8, wherein the movement condition includes a relative movement distance of the object with respect to the liquid immersion member.   The exposure apparatus according to claim 8, wherein the movement condition includes an acceleration condition when the object moves with respect to the liquid immersion member. A storage device that stores a moving condition of the object when the surface of the object is in a reference state and a liquid recovery state from the second liquid recovery port;
The exposure apparatus according to claim 1, wherein the evaluation is performed using stored information of the storage device. An immersion exposure apparatus that exposes a substrate with exposure light,
An immersion member capable of forming an immersion space so that the optical path of the exposure light is filled with liquid;
A first liquid recovery port capable of recovering at least part of the liquid on the object facing the liquid contact surface of the liquid immersion member and maintaining the liquid immersion space by recovering the liquid;
A second liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light and capable of recovering the liquid on the object,
When moving the object relative to the liquid immersion member, based on the recovery state of the liquid from the second liquid recovery port, the liquid contact surface of the immersion member is in a state capable of maintaining the immersion space An exposure apparatus that evaluates whether or not there is . A detection device for detecting whether or not the liquid is recovered from the second liquid recovery port;
The exposure apparatus according to claim 19, wherein the state of the liquid contact surface is evaluated based on a detection result of the detection apparatus.   21. The exposure apparatus according to claim 19 or 20, wherein the evaluation includes an evaluation of lyophilicity of the liquid contact surface with respect to the liquid.   The exposure apparatus according to any one of claims 19 to 21, wherein the object has a reference surface.   The exposure apparatus according to any one of claims 19 to 22, wherein it is determined whether or not the state of the liquid contact surface is usable based on a result of the evaluation. A storage device for storing a movement condition of the object when the liquid contact surface is in a reference state and a recovery state of the liquid from the second liquid recovery port;
The exposure apparatus according to claim 19, wherein the evaluation is performed using storage information of the storage device. Moving the object with respect to the liquid immersion member under a plurality of movement conditions;
The exposure apparatus according to any one of claims 19 to 24, wherein the state of the liquid contact surface of the liquid immersion member is evaluated based on a liquid recovery state from the second liquid recovery port in each of the plurality of movement conditions.   26. A relationship between a moving speed and a moving distance of the object with respect to the liquid immersion member is derived based on the result of the evaluation so that the liquid between the liquid immersion member and the object can maintain a predetermined state. The exposure apparatus described.   27. The exposure according to claim 25 or 26, wherein a moving condition of the object relative to the liquid immersion member is determined based on a result of the evaluation so that a liquid between the liquid immersion member and the object maintains a predetermined state. apparatus.   28. The exposure apparatus according to claim 27, wherein the movement condition is determined so that a time from the start to the end of exposure of the substrate is shortened.   29. The exposure apparatus according to claim 26, wherein the predetermined state includes a state in which leakage of liquid from between the liquid immersion member and the object is suppressed by the first liquid recovery port.   30. The exposure apparatus according to any one of claims 26 to 29, wherein the predetermined state includes a state in which the liquid remaining on the object is suppressed by the first liquid recovery port.   31. The exposure apparatus according to claim 26, wherein in the predetermined state, no liquid is recovered from the second liquid recovery port.   32. The exposure apparatus according to claim 25, wherein the moving condition includes a relative moving speed of the object with respect to the liquid immersion member.   The exposure apparatus according to any one of claims 25 to 32, wherein the movement condition includes a relative movement distance of the object with respect to the liquid immersion member.   34. The exposure apparatus according to claim 25, wherein the moving condition includes an acceleration condition when the object moves with respect to the liquid immersion member. A liquid supply port,
35. The exposure apparatus according to claim 1, wherein the immersion space is formed by executing a liquid recovery operation by the first liquid recovery port in parallel with a liquid supply operation by the liquid supply port.   36. The exposure apparatus according to any one of claims 1 to 35, wherein the first liquid recovery port is disposed in the liquid immersion member.   The exposure apparatus according to any one of claims 1 to 36, wherein the second liquid recovery port is disposed around an optical path of the exposure light. A predetermined member disposed outside the liquid immersion member with respect to the optical path of the exposure light;
38. The exposure apparatus according to any one of claims 1 to 37, wherein the second liquid recovery port is disposed in the predetermined member.   The exposure apparatus according to any one of claims 1 to 38, wherein the second liquid recovery port continues to suck fluid around the second liquid recovery port at least when the object is moving.   40. The exposure apparatus according to any one of claims 1 to 39, further comprising a detection device that detects whether or not liquid has been recovered from the second liquid recovery port.   41. The exposure apparatus according to claim 40, wherein the detection device includes a temperature sensor that detects a temperature in the vicinity of the second liquid recovery port.   42. The exposure apparatus according to claim 40 or 41, wherein the detection device includes an optical sensor that optically detects the liquid recovered in the second liquid recovery port.   43. The exposure apparatus according to any one of claims 40 to 42, wherein the detection device includes a pressure sensor that detects a pressure of a flow path connected to the second liquid recovery port. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 43;
Developing the exposed substrate; and a device manufacturing method. An evaluation method for evaluating the surface of an object used in an immersion exposure apparatus,
Forming an immersion space between the liquid contact surface of the immersion member and the surface of the object so that the optical path of the exposure light is filled with liquid;
Moving the object on the liquid immersion member under a predetermined condition so that the surface of the object faces the first liquid recovery port and the second liquid recovery port in a state where the liquid immersion space is formed;
Recovering at least a portion of the liquid on the object from the first liquid recovery port and maintaining the immersion space when the object is moved at a first speed relative to the liquid immersion member;
The first liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light when the object is moved with respect to the liquid immersion member at a second speed higher than the first speed . 2 detecting the liquid recovery state from the liquid recovery port;
And evaluating whether or not the surface of the object is in a state in which the immersion space can be maintained based on the detection result. An evaluation method for evaluating a liquid contact surface of an immersion member used in an immersion exposure apparatus,
Forming an immersion space between the liquid contact surface of the immersion member and the object so that the optical path of the exposure light is filled with liquid;
Moving the object on the liquid immersion member under a predetermined condition so that the surface of the object faces the first liquid recovery port and the second liquid recovery port in a state where the liquid immersion space is formed;
Recovering at least a portion of the liquid on the object from the first liquid recovery port and maintaining the immersion space when the object is moved at a first speed relative to the liquid immersion member;
The first liquid recovery port disposed outside the first liquid recovery port with respect to the optical path of the exposure light when the object is moved with respect to the liquid immersion member at a second speed higher than the first speed . 2 detecting the liquid recovery state from the liquid recovery port;
An evaluation method comprising: evaluating whether or not the liquid contact surface of the liquid immersion member is in a state in which the liquid immersion space can be maintained based on the detection result.

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