JP4988196B2 - 自浄性表面及びその製造法 - Google Patents
自浄性表面及びその製造法 Download PDFInfo
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- JP4988196B2 JP4988196B2 JP2005372861A JP2005372861A JP4988196B2 JP 4988196 B2 JP4988196 B2 JP 4988196B2 JP 2005372861 A JP2005372861 A JP 2005372861A JP 2005372861 A JP2005372861 A JP 2005372861A JP 4988196 B2 JP4988196 B2 JP 4988196B2
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- particles
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- wax
- cleaning surface
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- ZAZJGBCGMUKZEL-UHFFFAOYSA-N 2-[ethyl(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctylsulfonyl)amino]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN(CC)S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZAZJGBCGMUKZEL-UHFFFAOYSA-N 0.000 description 2
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- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
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- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
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Images
Classifications
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- B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
-
- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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Landscapes
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Description
−担体としての硬化性物質を表面上に施与する工程
−粒子の混合物を担体に施与する工程、及び
−担体の硬化により粒子を固定する工程
を有する。
ポリメチルメタクリラートからの板の上に、ヘキサンジオールジアクリラート3質量部とペンタエリトリットテトラアクリラート2質量部との混合物から製造されたUV硬化性アクリラート塗料(この塗料に前記混合物に対して更に10質量%のRoehm社のPlex 4092 F、10質量%のメチルメタクリラート、10質量%の2−ヒドロキシエチルメタクリラート並びに2質量%のDarocur 1173(Ciba Spezialitaetenchemie)を硬化剤として混合した)の厚さ25μmの塗料層をナイフを用いて施与し、25μmとした。まだ湿潤している塗料層の上に、Nordson社の静電スプレー系を用いて、疎水化された熱分解法シリカ(Degussa AG社のエアロシルVPLE 8241)95質量%と粉末状ロウ(第1表を参照のこと)5質量%との混合物を施与した。塗料のUV硬化後に、得られた表面をその自浄特性に関して評価した。20μlの水滴が全ての処理された板からわずかな傾斜角で自然に転がる(粒状に滴り落ちる)ことを確認することができた。+++は、<10°と見積もられたわずかな傾斜角により液滴の転がりがもたらされることを意味する。+++!は、実質的に表面と液滴との間の相互作用を認めることができない場合の評価として与えられる。そのように評価された表面上で、液滴は既に慎重な担体の衝突の際にも転がる。
ポリメチルメタクリラートからの板の上に、皮膜延伸フレーム(Filmziehrahmen)を用いて、付加的になお混合物に対して2質量%の流展助剤BYK 3700 (BYK)を有する実施例1によるUV硬化性アクリル塗料系からの厚さ25μmの層を施与した。なお湿潤している塗料層上に、手から茶こしを介して種々の粒子混合物を散布した。粒子混合物を疎水化された熱分解法シリカ(エアロシルVPLE 8241, Degussa AG)2gを、ロウ粒子Copo-Wax 4110又はCopo-Wax 4125と第2表に記載された量で30mlの小さな瓶の中で磁気撹拌機を用いて混合することにより得た。はたき落としにより、過剰の粒子を表面から除去した。塗料のUV硬化後に、得られた板又はその表面をその自浄特性に関して前記の通りに評価した。
Claims (16)
- 凸部から成る人工的な少なくとも部分的に疎水性である表面構造を有し、その際、凸部が、担体を用いて表面上に固定された疎水性粒子の混合物により形成される自浄性表面において、混合物が、半金属酸化物又は金属酸化物、シリカ及び金属粉末から選択された構造を形成する粒子及びロウ粒子を有し、当該担体が熱的又は化学的エネルギー又は光エネルギーを用いて硬化された塗料又は接着剤であることを特徴とする自浄性表面。
- 担体が、硬化された塗料として、一価及び/又は多価不飽和アクリラート及び/又はメタクリラート又はポリウレタンからの混合物を有する、請求項1記載の自浄性表面。
- 構造を形成する粒子が20nm〜50μmの平均粒径を有する、請求項1又は2記載の自浄性表面。
- 構造を形成する粒子が酸化アルミニウム、沈降シリカ又は熱分解法シリカから選択されており、かつナノメートル範囲の微細構造を有する、請求項3記載の自浄性表面。
- ロウ粒子が、構造を形成する粒子の平均粒径の0.5〜20倍の平均粒径を有する、請求項1から4までのいずれか1項記載の自浄性表面。
- 混合物が1〜75質量%のロウ粒子を有する、請求項5記載の自浄性表面。
- 適当な、少なくとも部分的に疎水性である表面構造を、担体を用いた表面上への疎水性粒子の混合物の固定によりもたらす自浄性表面の製造法において、混合物が、半金属酸化物又は金属酸化物、金属粉末及びシリカから選択された構造を形成する粒子及びロウ粒子を有し、当該担体の硬化を熱的又は化学的エネルギー及び/又は光エネルギーにより行うことを特徴とする、自浄性表面の製造法。
- ナノメートル範囲の微細構造を有する酸化アルミニウム、沈降シリカ又は熱分解法シリカから選択された構造を形成する粒子を使用する、請求項7記載の方法。
- 以下の工程
A)担体としての硬化性物質を表面上に施与する工程
B)粒子の混合物を担体に施与する工程、及び
C)担体の硬化により粒子を固定する工程
を有する、請求項7又は8記載の方法。 - 硬化性物質として、一価及び/又は多価不飽和アクリラート及び/又はメタクリラート及び/又はポリウレタン及び/又はシリコーンアクリラート及び/又はウレタンアクリラートからの混合物を少なくとも有する塗料を使用する、請求項9記載の方法。
- 硬化性物質として疎水特性を有する塗料を選択する、請求項10記載の方法。
- 20nm〜50μmの平均粒径を有する構造を形成する粒子を使用する、請求項7から11までのいずれか1項記載の方法。
- 構造を形成する粒子の平均粒径の0.5〜20倍の平均粒径を有するロウ粒子を使用する、請求項7から12までのいずれか1項記載の方法。
- 使用する粒子の混合物が、1〜75質量%のロウ粒子を有する、請求項7から13までのいずれか1項記載の方法。
- フッ素化又は過フッ素化されていてもよいエチレン性不飽和ポリマーを有するロウ粒子を使用する、請求項14記載の方法。
- 物品の剛性又は非剛性の表面上に自浄性表面を製造するための、請求項7から15までのいずれか1項記載の方法の使用。
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-
2004
- 2004-12-27 DE DE102004062739A patent/DE102004062739A1/de not_active Withdrawn
-
2005
- 2005-11-03 EP EP05110308A patent/EP1674535A1/de not_active Withdrawn
- 2005-12-21 US US11/312,469 patent/US7846529B2/en active Active
- 2005-12-26 JP JP2005372861A patent/JP4988196B2/ja active Active
-
2010
- 2010-11-03 US US12/938,690 patent/US8420163B2/en active Active
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DE102004062739A1 (de) | 2006-07-06 |
JP2006198613A (ja) | 2006-08-03 |
US8420163B2 (en) | 2013-04-16 |
US20110045247A1 (en) | 2011-02-24 |
US20060147675A1 (en) | 2006-07-06 |
US7846529B2 (en) | 2010-12-07 |
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