JP4950329B2 - 洗浄装置 - Google Patents

洗浄装置 Download PDF

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Publication number
JP4950329B2
JP4950329B2 JP2010195587A JP2010195587A JP4950329B2 JP 4950329 B2 JP4950329 B2 JP 4950329B2 JP 2010195587 A JP2010195587 A JP 2010195587A JP 2010195587 A JP2010195587 A JP 2010195587A JP 4950329 B2 JP4950329 B2 JP 4950329B2
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Japan
Prior art keywords
cleaning
cleaning medium
medium
nozzle
tank
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Expired - Fee Related
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JP2010195587A
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English (en)
Japanese (ja)
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JP2010279949A (ja
JP2010279949A5 (enrdf_load_stackoverflow
Inventor
洋一 岡本
達哉 佐藤
明弘 渕上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
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Ricoh Co Ltd
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Publication date
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Priority to JP2010195587A priority Critical patent/JP4950329B2/ja
Publication of JP2010279949A publication Critical patent/JP2010279949A/ja
Publication of JP2010279949A5 publication Critical patent/JP2010279949A5/ja
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Publication of JP4950329B2 publication Critical patent/JP4950329B2/ja
Expired - Fee Related legal-status Critical Current
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  • Cleaning In General (AREA)
JP2010195587A 2010-09-01 2010-09-01 洗浄装置 Expired - Fee Related JP4950329B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010195587A JP4950329B2 (ja) 2010-09-01 2010-09-01 洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010195587A JP4950329B2 (ja) 2010-09-01 2010-09-01 洗浄装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006169124A Division JP2007330947A (ja) 2006-06-19 2006-06-19 乾式洗浄装置、および乾式洗浄方法

Publications (3)

Publication Number Publication Date
JP2010279949A JP2010279949A (ja) 2010-12-16
JP2010279949A5 JP2010279949A5 (enrdf_load_stackoverflow) 2011-12-15
JP4950329B2 true JP4950329B2 (ja) 2012-06-13

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ID=43537192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010195587A Expired - Fee Related JP4950329B2 (ja) 2010-09-01 2010-09-01 洗浄装置

Country Status (1)

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JP (1) JP4950329B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105215008A (zh) * 2015-09-28 2016-01-06 中国科学院半导体研究所 抽取清洗残余废气的气嘴结构

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011052771A1 (de) * 2011-08-17 2013-02-21 Nordenia Deutschland Gronau Gmbh Verfahren und Vorrichtung zur Entfernung von Verschmutzungen auf profilierten Oberflächen ineinander greifender Streckwalzen
CN103409815B (zh) * 2013-07-15 2016-01-20 东华大学 一种喷丝板自动吹干机
JP5722477B2 (ja) * 2014-03-06 2015-05-20 東北電機鉄工株式会社 バグフィルター清掃用コアンダインジェクター
DE102018219696A1 (de) * 2018-11-16 2020-05-20 Ejot Gmbh & Co. Kg Berührungsfreie Reinigungsvorrichtung mit Wirbelstrom
CN115616856B (zh) * 2022-12-19 2023-04-07 深圳仕上电子科技有限公司 一种掩模板清洗工艺

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60188123A (ja) * 1984-03-08 1985-09-25 株式会社エムテ−樋川 表面清掃方法
JPH0273U (enrdf_load_stackoverflow) * 1988-06-02 1990-01-05
JPH0718646B2 (ja) * 1989-08-22 1995-03-06 ジャパン・フィールド株式会社 被洗浄物の乾燥装置
JP2005296853A (ja) * 2004-04-13 2005-10-27 Ricoh Co Ltd 微粉除去装置
JP4546147B2 (ja) * 2004-05-18 2010-09-15 株式会社リコー 乾式洗浄方法および装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105215008A (zh) * 2015-09-28 2016-01-06 中国科学院半导体研究所 抽取清洗残余废气的气嘴结构

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JP2010279949A (ja) 2010-12-16

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