JP4914284B2 - Circuit board composition and circuit board using the same - Google Patents

Circuit board composition and circuit board using the same Download PDF

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JP4914284B2
JP4914284B2 JP2007115125A JP2007115125A JP4914284B2 JP 4914284 B2 JP4914284 B2 JP 4914284B2 JP 2007115125 A JP2007115125 A JP 2007115125A JP 2007115125 A JP2007115125 A JP 2007115125A JP 4914284 B2 JP4914284 B2 JP 4914284B2
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circuit board
epoxy resin
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bisphenol
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JP2008266535A (en
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奨 猪又
好彦 辻村
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Denka Co Ltd
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Denki Kagaku Kogyo KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a circuit board excellent in stress relaxation, heat resistance, moisture resistance and heat radiating properties. <P>SOLUTION: The composition for the circuit board comprises an epoxy resin having a polyether skeleton in the main chain, a curing agent having an aromatic ring and &ge;2 primary amino groups on terminals of the main chain and an inorganic filler as essential components. Preferably, the composition for circuit boards includes &ge;1 species epoxy resins selected from a group consisting of high molecular weight epoxy resins having a straight main chain and a bisphenol F type or a bisphenol A type skeleton having 800-4,000 epoxy equivalent, polypropylene glycol type epoxy resins, polyethylene glycol type epoxy resins and polytetramethylene glycol type epoxy resins. More preferably, the resin composition after curing has 100-5,000 MPa storage modulus at 300 K. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

本発明は、応力緩和に優れ、しかも絶縁信頼性及び放熱性に優れた回路基板、特に金属ベース回路基板を容易に提供できる回路基板用組成物とそれを用いた回路基板に関する。 The present invention relates to a circuit board having excellent stress relaxation and excellent insulation reliability and heat dissipation, particularly a circuit board composition that can easily provide a metal base circuit board and a circuit board using the same.

金属板上に無機フィラーを充填したエポキシ樹脂等からなる絶縁層を設け、その上に導電回路を配設した金属ベース基板が、熱放散性に優れることから高発熱性電子部品を実装する回路基板として用いられている。 A circuit board on which a highly heat-generating electronic component is mounted because a metal base substrate having an insulating layer made of an epoxy resin filled with an inorganic filler on a metal plate and a conductive circuit disposed on the insulating layer is excellent in heat dissipation. It is used as.

一方、車載用電子機器について、その小型化、省スペース化と共に電子機器をエンジンルーム内に配置することが要望されている。エンジンルーム内は温度が高く、温度変化が大きいなど過酷な環境であり、また、放熱面積の大きな基板が必要とされる。このような用途に対して、放熱性に優れる前記金属ベース回路基板が注目されている。 On the other hand, with respect to in-vehicle electronic devices, there is a demand for arranging the electronic devices in the engine room together with downsizing and space saving. The engine room has a harsh environment such as a high temperature and a large temperature change, and a substrate having a large heat radiation area is required. For such applications, the metal base circuit board having excellent heat dissipation has attracted attention.

従来の金属ベース回路基板は、放熱性や経済的な理由から金属基板としてアルミニウム板を用いることが多いが、実使用下で過熱/冷却が繰り返されると、前記アルミニウム板と当該回路基板に実装される電子部品、特にチップ部品との熱膨張率の差に起因して大きな熱応力が発生し、部品を固定している半田部分或いはその近傍にクラックが発生するなど電気的信頼性が低下するという問題点がある。このような点を改良するために、絶縁層を熱伝導性が高く、低弾性率にし、さらに高レベルの耐熱性、耐湿性を有するようにすることが必要である。このために、たとえば特許文献1には反応性アクリルゴムで低弾性率化した組成物が開示されているが、耐湿性は十分でない。また、特許文献2には、ヒートサイクル試験500回をクリアする低弾性率化した硬化性樹脂組成物が開示されているが、実用に供するにはまだ不十分であり、より高レベルなヒートサイクル特性が必要とされている。 Conventional metal base circuit boards often use an aluminum plate as a metal substrate for heat dissipation and economical reasons. However, when overheating / cooling is repeated under actual use, the aluminum board is mounted on the circuit board. Due to the difference in coefficient of thermal expansion between the electronic parts, especially chip parts, a large thermal stress is generated, and the electrical reliability is reduced, for example, cracks are generated in or near the solder parts fixing the parts. There is a problem. In order to improve such points, it is necessary to make the insulating layer have a high thermal conductivity, a low elastic modulus, and a high level of heat resistance and moisture resistance. For this reason, for example, Patent Document 1 discloses a composition having a low elastic modulus with a reactive acrylic rubber, but the moisture resistance is not sufficient. Patent Document 2 discloses a curable resin composition having a low elastic modulus that clears 500 heat cycle tests, but is still insufficient for practical use, and a higher level heat cycle. Characteristics are needed.

特開平10−242606号公報JP-A-10-242606 特開2002−012653号公報JP 2002-012653 A

本発明は、上記の事情に鑑みてなされたものであり、低弾性率であり、かつ接着性、耐熱性、耐湿性に優れる無機フィラーを含有する硬化性の樹脂からなる組成物を提供し、その利用として金属板と導電回路との密着性に優れ、しかも応力緩和性に優れ、急激な加熱/冷却を受けても半田或いはその近傍でクラック発生時の異常を生じない、耐熱性、耐湿性及び放熱性に優れる回路基板、特に金属ベース回路基板を提供することを目的とするものである。 The present invention has been made in view of the above circumstances, and provides a composition comprising a curable resin containing an inorganic filler that has a low elastic modulus and is excellent in adhesiveness, heat resistance, and moisture resistance. As its use, it has excellent adhesion between the metal plate and the conductive circuit, excellent stress relaxation, and does not cause abnormalities when cracks occur in the solder or in the vicinity even when subjected to rapid heating / cooling, heat resistance, moisture resistance It is another object of the present invention to provide a circuit board excellent in heat dissipation and, in particular, a metal base circuit board.

本発明は、(1)主鎖がポリエーテル骨格を有し直鎖状であるエポキシ樹脂、(2)芳香環を有し、主鎖の末端に1級アミン基を2個以上有する硬化剤、及び(3)無機充填剤を必須成分とする回路基板用組成物であり、好ましくは、エポキシ樹脂として主鎖が直鎖状であり、エポキシ当量が800以上4000以下のビスフェノールF型若しくはビスフェノールA型骨格をもつ高分子量エポキシ樹脂、ポリプロピレングリコール型エポキシ樹脂、ポリエチレングリコール型エポキシ樹脂、及びポリテトラメチレングリコール型エポキシ樹脂からなる群から選ばれる1種類以上を含む前記の回路基板用組成物であり、更に好ましくは、硬化後の樹脂組成物の貯蔵弾性率が、300Kで100〜5000MPaである前記の回路基板用組成物である。また、本発明は、前記回路基板用組成物を用いてなる回路基板であり、好ましくは金属ベース回路基板である。 The present invention includes (1) an epoxy resin in which the main chain has a polyether skeleton and is linear, (2) a curing agent having an aromatic ring and having two or more primary amine groups at the ends of the main chain, And (3) a circuit board composition comprising an inorganic filler as an essential component, preferably a bisphenol F type or bisphenol A type having an epoxy resin having a linear main chain and an epoxy equivalent of 800 to 4000 A circuit board composition comprising one or more selected from the group consisting of a high molecular weight epoxy resin having a skeleton, a polypropylene glycol type epoxy resin, a polyethylene glycol type epoxy resin, and a polytetramethylene glycol type epoxy resin, and Preferably, in the above circuit board composition, the storage elastic modulus of the cured resin composition is 100 to 5000 MPa at 300K. That. Moreover, this invention is a circuit board using the said composition for circuit boards, Preferably it is a metal base circuit board.

本発明の回路基板用組成物とそれを用いた回路基板は、応力緩和に優れ、絶縁信頼性にも優れているために、実使用条件化で受ける厳しい温度変化によっても、半導体チップ等の電子部品を固定している半田部分にクラックを生じることなく高信頼性の混成集積回路を提供することができる。 Since the circuit board composition of the present invention and the circuit board using the composition are excellent in stress relaxation and insulation reliability, the electronic circuit such as a semiconductor chip can be subjected to severe temperature changes under actual use conditions. It is possible to provide a highly reliable hybrid integrated circuit without causing a crack in a solder portion to which a component is fixed.

本発明の回路基板用組成物は、(1)主鎖がポリエーテル骨格を有し直鎖状であるエポキシ樹脂、(2)芳香環を有し、主鎖の末端に1級アミン基を2個以上有する硬化剤、及び(3)無機充填剤を必須成分として含んでいるので、応力緩和性、放熱性、耐熱性、耐湿性、に優れた回路基板の用いて好適な硬化物を提供することができる。 The composition for a circuit board of the present invention comprises (1) a linear epoxy resin having a polyether skeleton and (2) an aromatic ring, and 2 primary amine groups at the ends of the main chain. Since a hardener having at least one and (3) an inorganic filler are contained as essential components, a cured product suitable for use in a circuit board excellent in stress relaxation, heat dissipation, heat resistance, and moisture resistance is provided. be able to.

(1)主鎖がポリエーテル骨格を有し直鎖状であるエポキシ樹脂については、例えば、ポリサルファイド変性エポキシ樹脂、ビスフェノールAアルキレンオキサイド付加物型のエポキシ樹脂が挙げられ、これらを複数組み合わせて用いることもできる。 (1) As for the epoxy resin whose main chain has a polyether skeleton and is linear, for example, a polysulfide-modified epoxy resin and a bisphenol A alkylene oxide adduct type epoxy resin are used, and a plurality of these are used in combination. You can also.

更に、(1)主鎖がポリエーテル骨格を有し直鎖状であるエポキシ樹脂について、主鎖が直鎖状であり、エポキシ当量が800以上4000以下のビスフェノールF型若しくはビスフェノールA型骨格をもつ高分子量エポキシ樹脂、ポリプロピレングリコール型エポキシ樹脂、ポリエチレングリコール型エポキシ樹脂、及びポリテトラメチレングリコール型エポキシ樹脂からなる群から選ばれる1種以上が、樹脂硬化物に可とう性を付与し、その樹脂組成物を用いた回路基板が応力緩和性に優れるという理由から、好ましく用いられる。 Further, (1) For an epoxy resin in which the main chain has a polyether skeleton and is linear, the main chain is linear and has an bisphenol F type or bisphenol A type skeleton having an epoxy equivalent of 800 to 4000. One or more selected from the group consisting of a high molecular weight epoxy resin, a polypropylene glycol type epoxy resin, a polyethylene glycol type epoxy resin, and a polytetramethylene glycol type epoxy resin imparts flexibility to the resin cured product, and its resin composition A circuit board using an object is preferably used because it has excellent stress relaxation properties.

前記のエポキシ樹脂については、更に、エポキシ当量が800未満のビスフェノールF型若しくはビスフェノールA型骨格をもつエポキシ樹脂や水素添加されたビスフェノールA型のエポキシ樹脂を全エポキシ樹脂中10質量パーセント以上50質量%以下含むとき、硬化体の応力緩和性と耐湿性のバランスが更に向上するので好ましい。 As for the above-mentioned epoxy resin, an epoxy resin having a bisphenol F type or bisphenol A type skeleton having an epoxy equivalent of less than 800 or a hydrogenated bisphenol A type epoxy resin is 10 mass percent or more and 50 mass% in the total epoxy resin. When included below, the balance between the stress relaxation property and moisture resistance of the cured product is further improved, which is preferable.

硬化剤は、組成物の硬化体の電気絶縁性、耐湿性等のバランスを好適にすることを念頭に、芳香環を有し、主鎖の末端に1級アミン基を2個以上有するものが選択される。芳香環を有し主鎖の末端に1級アミン基を2個以上有する硬化剤としては、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、メタフェニレンジアミン等が挙げられる。 A curing agent having an aromatic ring and having two or more primary amine groups at the end of the main chain in view of making the balance of electrical insulation and moisture resistance of the cured product of the composition suitable. Selected. Examples of the curing agent having an aromatic ring and having two or more primary amine groups at the end of the main chain include diaminodiphenylmethane, diaminodiphenylsulfone, and metaphenylenediamine.

硬化剤の配合量は、エポキシ樹脂100質量部に対して10〜25質量部が好ましく選択される。25以下であれば応力緩和性が十分であるし、10以上であれば絶縁信頼性、耐湿性が十分である。15〜20質量部がより好ましい。 As for the compounding quantity of a hardening | curing agent, 10-25 mass parts is preferably selected with respect to 100 mass parts of epoxy resins. If it is 25 or less, the stress relaxation property is sufficient, and if it is 10 or more, the insulation reliability and moisture resistance are sufficient. 15-20 mass parts is more preferable.

無機充填剤は、電気絶縁性が良好で、しかも高熱伝導率のものが用いられ、このようなもとして酸化アルミニウム(アルミナ)、窒化アルミニウム、窒化珪素、窒化ホウ素、酸化珪素(シリカ)等があり、前記の1種又は2種以上で用いることができる。これらのうち、酸化アルミニウム、酸化珪素は粒子形状が球状で高充填可能なものが安価に、容易に入手できる理由で好ましい。 Inorganic fillers have good electrical insulation and high thermal conductivity, such as aluminum oxide (alumina), aluminum nitride, silicon nitride, boron nitride, and silicon oxide (silica). , One or more of the above can be used. Among these, aluminum oxide and silicon oxide are preferable because those having a spherical particle shape and capable of being highly filled are inexpensive and easily available.

無機充填剤の配合量は、エポキシ樹脂100質量部に対して、420〜630質量部が好ましい。630以下であれば応力緩和性が十分であるし、420以上であれば放熱性が十分である。480〜580質量部がより好ましい。 As for the compounding quantity of an inorganic filler, 420-630 mass parts is preferable with respect to 100 mass parts of epoxy resins. If it is 630 or less, the stress relaxation property is sufficient, and if it is 420 or more, the heat dissipation property is sufficient. 480-580 mass parts is more preferable.

エポキシ樹脂中に添加して回路基板用組成物とする場合には、組成物中にエポキシシラン、アミノシラン等のシランカップリング剤を配合することにより、回路基板用組成物の硬化体からなる絶縁層の回路との接着性を向上することができる。 When it is added to an epoxy resin to form a circuit board composition, an insulating layer made of a cured product of the circuit board composition is blended into the composition with a silane coupling agent such as epoxysilane or aminosilane. Adhesion with the circuit can be improved.

回路基板用組成物の硬化後の貯蔵弾性率は、300Kで100〜5000MPaであることが好ましい。5000MPa以下で十分に満足な応力緩和性が得られる。また、貯蔵弾性率が低すぎると外力が加わった時に変形して絶縁信頼性が損なわれる可能性があるので、300Kで100MPa以上あることが好ましい。 The storage elastic modulus of the circuit board composition after curing is preferably 100 to 5000 MPa at 300K. Sufficiently satisfactory stress relaxation is obtained at 5000 MPa or less. In addition, if the storage elastic modulus is too low, it may be deformed when external force is applied and the insulation reliability may be impaired.

本発明の組成物を回路基板に適用する場合、硬化後の厚さは、応力緩和性、放熱性、絶縁信頼性、生産性等を考慮して決められるが、通常は50〜150μm程度である。 When the composition of the present invention is applied to a circuit board, the thickness after curing is determined in consideration of stress relaxation, heat dissipation, insulation reliability, productivity, etc., but is usually about 50 to 150 μm. .

本発明の回路基板は前記回路基板用組成物を用いたものである。金属ベース回路基板を作成する場合を例に以下説明する。 The circuit board of the present invention uses the composition for a circuit board. An example of producing a metal base circuit board will be described below.

金属ベース回路基板は、金属板に前記回路基板用組成物の硬化体からなる絶縁層を介して回路を設けた構造を有している。金属板は、アルミニウム、鉄、銅及びそれらの合金、もしくはこれらのクラッド材等からなり、その厚みは特に規定するものではないが、熱放熱性に富みしかも経済的であることから、厚み0.5〜5.0mmのアルミニウムが一般的に選択される。回路としては、銅、アルミニウム、ニッケル、鉄、錫、銀、チタニウムのいずれか、これらの金属を2種類以上含む合金、或いは前期金属又は合金を使用したクラッド箔等も用いることができる。尚、前期箔の製造方法は電解法でも圧延法でも作製したものでもよく、箔状にはNiメッキ、Ni−Auメッキ、半田メッキなどの金属メッキがほどこされていてもかまわないが、絶縁接着層との接着性の点から回路の絶縁層に接する側の表面はエッチングやメッキ等により予め粗化処理されていることが一層好ましい。 The metal base circuit board has a structure in which a circuit is provided on a metal plate through an insulating layer made of a cured product of the circuit board composition. The metal plate is made of aluminum, iron, copper, an alloy thereof, or a clad material thereof, and the thickness thereof is not particularly specified. However, since the metal plate is rich in heat radiation and economical, it has a thickness of 0. Aluminum of 5 to 5.0 mm is generally selected. As the circuit, any one of copper, aluminum, nickel, iron, tin, silver, and titanium, an alloy containing two or more of these metals, or a clad foil using an earlier metal or alloy can be used. The foil manufacturing method may be either electrolytic or rolling, and the foil may be plated with a metal such as Ni plating, Ni-Au plating, or solder plating. From the viewpoint of adhesiveness to the layer, it is more preferable that the surface on the side in contact with the insulating layer of the circuit is roughened in advance by etching, plating or the like.

金属ベース回路基板は、回路基板用組成物に適宜消泡剤やレベリング剤等の添加剤を添加して得られる絶縁材料を金属板及び/又は金属箔上に塗布し、金属箔又は金属板を張り合わせた後に十分に硬化させ、前記金属箔より回路形成する方法、或いは前記方法に於いて金属箔に変えて予め回路形成されている回路を直接に用いる方法等の従来公知の方法で得ることができる。 The metal base circuit board is obtained by applying an insulating material obtained by appropriately adding an additive such as an antifoaming agent or a leveling agent to the circuit board composition on the metal plate and / or the metal foil. It can be obtained by a conventionally known method such as a method of sufficiently curing after bonding and forming a circuit from the metal foil, or a method of directly using a circuit in which a circuit is previously formed in place of the metal foil. it can.

〔実施例1〕
エポキシ樹脂として高分子ビスフェノールF型エポキシ樹脂(ジャパンエポキシレジン社製、「エピコート4004P」;エポキシ当量=848)30質量部と、ポリプロピレングリコール型エポキシ樹脂(東都化成社製、「PG207GS」)50質量部、ビスフェノールF型エポキシ樹脂(ジャパンエポキシレジン社製、「エピコート807」;エポキシ当量=175)20質量部、シランカップリング剤、γ−グリシドキシプロピルトリメトキシシラン(東レダウコーンニング社製、「Z6040N」)5質量部、無機フィラーとして平均粒子径が16μmである球状粗粒子の酸化アルミニウム(昭和電工社製、「AS30−1」)と平均粒子径が0.7μmである球状微粒子の酸化アルミニウム(住友化学社製、「AKP−15」)500質量部(球状素粒子と球状微粒子は質量比が6:4)、硬化剤として芳香族アミン(日本合成化工社製、「アクメックスH−84B」)20質量部を配合、混合した。
[Example 1]
30 parts by mass of a polymer bisphenol F type epoxy resin (manufactured by Japan Epoxy Resin, “Epicoat 4004P”; epoxy equivalent = 848) and 50 parts by mass of a polypropylene glycol type epoxy resin (manufactured by Toto Kasei Co., Ltd., “PG207GS”) Bisphenol F type epoxy resin (Japan Epoxy Resin, “Epicoat 807”; epoxy equivalent = 175) 20 parts by mass, silane coupling agent, γ-glycidoxypropyltrimethoxysilane (manufactured by Toray Dow Corning, “ Z6040N ") 5 parts by mass, aluminum oxide of spherical coarse particles having an average particle size of 16 μm as inorganic filler (“ AS30-1 ”, manufactured by Showa Denko KK) and aluminum oxide of spherical fine particles having an average particle size of 0.7 μm ("AKP-15" manufactured by Sumitomo Chemical Co., Ltd.) 5 0 parts by weight (spherical particles and the spherical fine particles mass ratio of 6: 4), aromatic amines (Nippon Synthetic Chemical Co., Ltd., "Accession Mex H-84B") to 20 parts by mass, were mixed as a curing agent.

上記操作で得た混合物を厚さ2.0mmのアルミニウム板状に硬化後の絶縁層の厚みが100μmになるように塗布し、Bステージ状態に予備硬化させ、ラミネーターで厚さ70μmの電解銅箔を張り合わせ、アフターキュアを行い銅箔基板を作製し、更に、銅箔をエッチングしてパット部を有する所望の回路を形成して金属ベース回路基板とした。また、前記混合物を硬化させて、厚さ約0.5mm幅約3mm長さ50mmの硬化体の試験片を別途作製した。前記の金属ベース回路基板と硬化体を用いて以下の試験に供した。また結果を表1に示した。 The mixture obtained by the above operation was applied to an aluminum plate having a thickness of 2.0 mm so that the thickness of the insulating layer after curing was 100 μm, pre-cured to a B stage state, and an electrolytic copper foil having a thickness of 70 μm using a laminator. And after-curing to produce a copper foil substrate, and further etching the copper foil to form a desired circuit having a pad portion to obtain a metal base circuit board. Moreover, the said mixture was hardened and the test piece of the hardening body about thickness 0.5mm width about 3mm length 50mm was produced separately. The metal base circuit board and the cured body were used for the following test. The results are shown in Table 1.

<貯蔵弾性率の測定>
硬化体について、動的粘弾性測定器(T&Aインスツルメント社製、「RSA 3」)を用い、周波数10Hz、昇温速度10℃/minの条件下、−50℃〜+150℃の温度範囲で貯蔵弾性率を測定した。
<Measurement of storage modulus>
About the cured body, using a dynamic viscoelasticity measuring device (manufactured by T & A Instruments, “RSA 3”), in a temperature range of −50 ° C. to + 150 ° C. under conditions of a frequency of 10 Hz and a heating rate of 10 ° C./min. The storage modulus was measured.

<耐電圧の測定>
回路基板について、温度121℃、相対湿度100%、気圧2026hPaのプレッシャークッカーテスターにて96時間処理後と処理前の試験片を絶縁油中に浸漬し、絶縁破壊する電圧を測定した。初期印加電圧は0.5kVであり、各電圧で30秒間保持した後、0.5kVずつ段階的に昇圧する方法で印加した。
<Measurement of withstand voltage>
The circuit board was immersed for 96 hours in a pressure cooker tester at a temperature of 121 ° C., a relative humidity of 100%, and an atmospheric pressure of 2026 hPa for 96 hours, and the voltage before dielectric breakdown was measured. The initial applied voltage was 0.5 kV, and each voltage was held for 30 seconds, and then applied by a method in which the voltage was increased stepwise by 0.5 kV.

<ヒートサイクル試験方法>
回路基板について、パッド間にチップサイズ2.0mm×1.25mmのチップ抵抗を半田付けし、−40℃7分〜+125℃7分を1サイクルとして2000回のヒートサイクル試験を行った後、顕微鏡で半田部分のクラックの有無を観察した。半田部分のクラック発生が10%以上あるものは不良とし、半田クラックの発生が10%未満のものを良好と判定した。
<Heat cycle test method>
The circuit board was soldered with a chip resistor having a chip size of 2.0 mm × 1.25 mm between the pads, subjected to 2000 heat cycle tests with -40 ° C. 7 minutes to + 125 ° C. 7 minutes as one cycle, and then a microscope. Then, the presence or absence of cracks in the solder portion was observed. Those having a crack occurrence of 10% or more in the solder part were judged as defective, and those having a solder crack occurrence of less than 10% were judged good.

Figure 0004914284
Figure 0004914284

〔実施例2〕
エポキシ樹脂として高分子ビスフェノールF型エポキシ樹脂(ジャパンエポキシレジン社製、「エピコート4004P」)30質量部と、ポリテトラメチレングリコール型エポキシ樹脂(阪本薬品工業社製、「SR−PTMG」)50質量部を用いる他は、実施例1と同様に試験した。結果を表1に示した。
[Example 2]
30 parts by mass of polymer bisphenol F type epoxy resin (manufactured by Japan Epoxy Resin, “Epicoat 4004P”) and 50 parts by mass of polytetramethylene glycol type epoxy resin (manufactured by Sakamoto Pharmaceutical Co., Ltd., “SR-PTMG”) as epoxy resins The test was conducted in the same manner as in Example 1 except that. The results are shown in Table 1.

〔実施例3〕
エポキシ樹脂として高分子ビスフェノールF型エポキシ樹脂(東都化成社製、「YD6020」;エポキシ当量=3020)30質量部と、ポリプロピレングリコール型エポキシ樹脂(東都化成社製、「PG207GS」)50質量部、水素添加されたビスフェノールA型エポキシ樹脂(大日本インキ化学工業社製、「EXA―7015」;エポキシ当量=207)20質量部を用いる他は、実施例1と同様に試験した。結果を表1に示した。
Example 3
As an epoxy resin, 30 parts by mass of a polymer bisphenol F type epoxy resin (manufactured by Toto Kasei Co., Ltd., “YD6020”; epoxy equivalent = 3020), 50 parts by mass of a polypropylene glycol type epoxy resin (manufactured by Toto Kasei Co., Ltd., “PG207GS”), hydrogen The test was conducted in the same manner as in Example 1 except that 20 parts by mass of the added bisphenol A type epoxy resin (Dainippon Ink & Chemicals, “EXA-7015”; epoxy equivalent = 207) was used. The results are shown in Table 1.

〔実施例4〕
エポキシ樹脂として高分子ビスフェノールF型エポキシ樹脂(東都化成社製、「YD6020」)30質量部と、ポリテトラメチレングリコール型エポキシ樹脂(阪本薬品工業社製、「SR−PTMG」)50質量部、水素添加されたビスフェノールA型エポキシ樹脂(大日本インキ化学工業社製、「EXA―7015」)20質量部を用いる他は、実施例1と同様に試験した。結果を表1に示した。
Example 4
As an epoxy resin, 30 parts by mass of a polymer bisphenol F type epoxy resin (manufactured by Toto Kasei Co., Ltd., “YD6020”), a polytetramethylene glycol type epoxy resin (manufactured by Sakamoto Pharmaceutical Co., Ltd., “SR-PTMG”), 50 parts by mass The test was conducted in the same manner as in Example 1 except that 20 parts by mass of the added bisphenol A type epoxy resin (Dainippon Ink & Chemicals, "EXA-7015") was used. The results are shown in Table 1.

〔比較例1〕
エポキシ樹脂として、ビスフェノールF型エポキシ樹脂(ジャパンエポキシレジン社製、「エピコート807」)60質量部、ジシクロペンタジエン型エポキシ樹脂(大日本インキ化学工業社製、「HP−7200」;エポキシ当量=260)40質量部、シランカップリング剤、γ−グリシドキシプロピルメチルエトキシシラン(日本ユニカー社製、「AZ−6165」)5質量部、無機フィラーとして平均粒径5μmのアルミナ(昭和電工社製、「AS―50」)500質量部、硬化剤として、ポリオキシプロピレンアミン(三井化学ファイン社製、「ジェファーミンD230」)20質量部、ポリオキシプロピレンアミン(三井化学ファイン社製、「ジェファーミンD2000」)25質量部、芳香族アミン(日本合成化工社製、「アクメックスH−84B」)20質量部を用いる他は、実施例1と同様に試験した。結果を表1に示した。
[Comparative Example 1]
As an epoxy resin, 60 parts by mass of a bisphenol F type epoxy resin (manufactured by Japan Epoxy Resin, “Epicoat 807”), a dicyclopentadiene type epoxy resin (manufactured by Dainippon Ink and Chemicals, “HP-7200”; epoxy equivalent = 260) ) 40 parts by mass, silane coupling agent, 5 parts by mass of γ-glycidoxypropylmethylethoxysilane (Nihon Unicar Co., Ltd., “AZ-6165”), alumina having an average particle size of 5 μm as an inorganic filler (manufactured by Showa Denko KK "AS-50") 500 parts by mass, as a curing agent, 20 parts by mass of polyoxypropyleneamine (Mitsui Chemicals Fine, "Jeffamine D230"), polyoxypropyleneamine (Mitsui Chemicals Fine, "Jefamine D2000") ] 25 parts by mass, aromatic amine (manufactured by Nippon Synthetic Chemical Industry Co., Ltd. Mex H-84B ") The test was conducted in the same manner as in Example 1 except that 20 parts by mass was used. The results are shown in Table 1.

〔比較例2〕
エポキシ樹脂として(ジャパンエポキシレジン社製、「エピコート807」)100質量部、γ−グリシドキシプロピルメチルエトキシシラン(日本ユニカー社製、「AZ−6165」)5質量部、アルミナ(昭和電工社製、「AS−50」)500質量部、硬化剤として芳香族アミン(日本合成化工社製、「アクメックスH−84B」)30質量部を用いる他は、実施例1と同様に試験した。結果を表1に示した。
[Comparative Example 2]
As an epoxy resin (Japan Epoxy Resin, “Epicoat 807”) 100 parts by mass, γ-glycidoxypropylmethylethoxysilane (Nihon Unicar, “AZ-6165”) 5 parts by mass, Alumina (Showa Denko) , “AS-50”) and 500 parts by mass, and 30 parts by mass of an aromatic amine (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., “Acmex H-84B”) as a curing agent. The results are shown in Table 1.

実施例1〜4で得られた基板は、貯蔵弾性率が低くヒートサイクル試験結果も良好であり、PCT処理後の耐電圧も良好であった。比較例1、2はPCT処理後の耐電圧は良好であるが、貯蔵弾性率が高いために、十分な応力緩和効果が得られずヒートサイクル試験結果が不良であった。 The substrates obtained in Examples 1 to 4 had low storage elastic modulus, good heat cycle test results, and good withstand voltage after PCT treatment. In Comparative Examples 1 and 2, the withstand voltage after the PCT treatment was good, but since the storage elastic modulus was high, a sufficient stress relaxation effect could not be obtained and the heat cycle test result was poor.

本発明の回路基板用組成物及びそれを用いた回路基板は、応力緩和に優れ、絶縁信頼性にも優れているために、実使用条件化で受ける厳しい温度変化によっても、チップを固定している半田部分にクラックを生じることなく高信頼性の混成集積回路を提供することができるので、例えば、自動車のエンジンルーム等の過酷な環境でも使用することができ、産業上非常に有用である。 Since the circuit board composition of the present invention and the circuit board using the same are excellent in stress relaxation and insulation reliability, the chip is fixed even by severe temperature changes under actual use conditions. Therefore, it is possible to provide a highly reliable hybrid integrated circuit without causing cracks in the soldered portion. Therefore, the present invention can be used in a harsh environment such as an engine room of an automobile, and is very useful industrially.

Claims (4)

(1)主鎖がポリエーテル骨格を有し直鎖状であるエポキシ樹脂、(2)芳香環を有し、主鎖の末端に1級アミン基を2個以上有する硬化剤、及び(3)無機充填剤を必須成分とする回路基板用組成物であって、
さらに、エポキシ当量が800未満のビスフェノールF型若しくはビスフェノールA型骨格を有するエポキシ樹脂又は水素添加されたビスフェノールA型エポキシ樹脂を含み、かつ、
前記エポキシ樹脂(1)が、ポリプロピレングリコール型エポキシ樹脂、ポリエチレングリコール型エポキシ樹脂、及びポリテトラメチレングリコール型エポキシ樹脂からなる群から選ばれる1種類以上であることを特徴とする回路基板用組成物
(1) an epoxy resin in which the main chain has a polyether skeleton and is linear, (2) a curing agent having an aromatic ring and having two or more primary amine groups at the ends of the main chain, and (3) A circuit board composition comprising an inorganic filler as an essential component ,
And an epoxy resin having a bisphenol F type or bisphenol A type skeleton having an epoxy equivalent of less than 800 or a hydrogenated bisphenol A type epoxy resin, and
The circuit board composition, wherein the epoxy resin (1) is at least one selected from the group consisting of a polypropylene glycol type epoxy resin, a polyethylene glycol type epoxy resin, and a polytetramethylene glycol type epoxy resin .
硬化後の樹脂組成物の貯蔵弾性率が、300Kで100〜5000MPaであることを特徴とする請求項記載の回路基板用組成物。 2. The circuit board composition according to claim 1 , wherein the cured resin composition has a storage elastic modulus of 100 to 5000 MPa at 300K. 請求項1又は2に記載の組成物を用いてなる回路基板。 Circuit board made by using the composition according to claim 1 or 2. 金属ベース回路基板であることを特徴とする請求項記載の回路基板。
4. The circuit board according to claim 3 , wherein the circuit board is a metal base circuit board.
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