JP4913826B2 - 同時的にモード同期を受けるqスイッチレーザ - Google Patents
同時的にモード同期を受けるqスイッチレーザ Download PDFInfo
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- JP4913826B2 JP4913826B2 JP2008544486A JP2008544486A JP4913826B2 JP 4913826 B2 JP4913826 B2 JP 4913826B2 JP 2008544486 A JP2008544486 A JP 2008544486A JP 2008544486 A JP2008544486 A JP 2008544486A JP 4913826 B2 JP4913826 B2 JP 4913826B2
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- 239000004065 semiconductor Substances 0.000 claims description 12
- 238000006073 displacement reaction Methods 0.000 claims description 5
- 238000003754 machining Methods 0.000 claims description 5
- 230000005284 excitation Effects 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000000418 atomic force spectrum Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/117—Q-switching using intracavity acousto-optic devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/164—Solid materials characterised by a crystal matrix garnet
- H01S3/1643—YAG
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Lasers (AREA)
- Laser Surgery Devices (AREA)
Description
著作権表示
60、122 レーザ
62 レーザコントローラ
64 Qスイッチ駆動信号
66、134 Qスイッチ
82、132 レーザ共振器
84、130 レーザ媒体
90、92 ダイオードレーザ(励起源)
100、152 半導体可飽和吸収体ミラー装置
110 光パルス放出バースト
112 加工パルス
114 低強度モード同期レーザパルス
116 パルスピッキング装置
160 半導体デバイスリンク(半導体記憶装置のリンク構造対象物)
190 被加工物
Claims (12)
- それぞれが1以上のモード同期出力パルスを含む多数の時間変位レーザ光パルス放出バーストによって部分的に特徴付けられたレーザ出力を生じる同時的にモード同期を受けるQスイッチレーザであって、
Q値によって特徴付けられたレーザ共振器に存在するレーザ媒体に光学的に結合され、該レーザ媒体のレーザ利得を誘発する励起光を与えるための励起源と、
モード同期状態でレーザ光放出を確立すべく前記レーザ媒体および前記レーザ共振器に光学的に結合されたモード同期装置と、
前記レーザ共振器の中に配置され、該レーザ共振器の高低のQ状態を選択的に生じるQスイッチ駆動信号に応答して前記レーザ共振器の前記Q値を変更すべく動作するQスイッチとを含み、
前記高Q状態は、1以上のモード同期出力パルスから成る時間変位を生じた複数のレーザ光パルス放出バーストの生成を生じ、前記低Q状態は、前記レーザ出力が前記複数の時間変位を生じたレーザ光パルス放出バースト間でモード同期状態を維持すべく、前記レーザ光パルス放出バーストの相互に隣接したものの間で、極めて低強度のモード同期レーザパルスの生成を生じる、Qスイッチレーザ。 - さらに、前記レーザ出力を受けるレーザパルスピッキング装置と、前記Qスイッチ駆動信号の生成に寄与するレーザコントローラとを含み、該レーザコントローラは、前記極めて低強度のモード同期レーザパルスから多数の前記時間変位を生じたレーザ光パルス放出バーストを選択するために、前記Qスイッチおよび前記レーザパルスピッキング装置の動作を調整する、請求項1のレーザ。
- さらに、前記レーザ出力から出る加工レーザ出力が入射する、半導体記憶装置のリンク構造対象物を含む、請求項2のレーザ。
- さらに、前記レーザ出力を受けるレーザパルスピッキング装置と、前記Qスイッチ駆動信号の生成に寄与するレーザコントローラとを含み、該レーザコントローラは、前記時間変位を生じた多数のレーザ光パルス放出バーストの所望数を選択するために、前記Qスイッチおよび前記レーザパルスピッキング装置の動作を調整する、請求項1のレーザ。
- さらに、前記レーザ出力から出る加工レーザ出力が入射する、半導体記憶装置のリンク構造対象物を含む、請求項4のレーザ。
- さらに、選択された所望数の前記レーザ光パルス放出バーストを増幅する増幅器を含む、請求項4のレーザ。
- さらに、前記レーザ出力を受けるレーザパルスピッキング装置と、前記Qスイッチ駆動信号の生成に寄与するレーザコントローラとを含み、該レーザコントローラは、前記1以上のレーザ光パルス放出バーストから所望数のモード同期出力パルスを選択するために、前記Qスイッチおよび前記レーザパルスピッキング装置の動作を調整する、請求項1のレーザ。
- 選択された所望数のモード同期出力パルスを増幅する増幅器を含む、請求項7のレーザ。
- さらに、前記レーザ出力から出る加工レーザ出力が入射するシリコン基板対象物を含む、請求項1のレーザ。
- 前記レーザ出力から出る加工レーザ出力は、低K層ダイスカットをもたらすために、低K層から成る対象試料に向けられる、請求項1のレーザ。
- 前記レーザ出力から出る加工レーザ出力は、対象試料にビアを成形するために該対象試料に向けられる、請求項1のレーザ。
- 前記励起光は連続波である、請求項1のレーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74298005P | 2005-12-06 | 2005-12-06 | |
US60/742,980 | 2005-12-06 | ||
PCT/US2006/046588 WO2007067643A2 (en) | 2005-12-06 | 2006-12-05 | Simultaneously mode-locked, q-switched laser |
Publications (2)
Publication Number | Publication Date |
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JP2009518868A JP2009518868A (ja) | 2009-05-07 |
JP4913826B2 true JP4913826B2 (ja) | 2012-04-11 |
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Application Number | Title | Priority Date | Filing Date |
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JP2008544486A Expired - Fee Related JP4913826B2 (ja) | 2005-12-06 | 2006-12-05 | 同時的にモード同期を受けるqスイッチレーザ |
Country Status (8)
Country | Link |
---|---|
US (1) | US7420995B2 (ja) |
JP (1) | JP4913826B2 (ja) |
KR (1) | KR101358241B1 (ja) |
CN (1) | CN101317310B (ja) |
DE (1) | DE112006003317T5 (ja) |
GB (1) | GB2445715B (ja) |
TW (1) | TWI387170B (ja) |
WO (1) | WO2007067643A2 (ja) |
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GB2445771A (en) * | 2007-01-19 | 2008-07-23 | Gsi Group Ltd | A diode pumped CW laser |
WO2009137062A2 (en) | 2008-05-05 | 2009-11-12 | The General Hospital Corporation | Photoactivatable antimicrobial agents and therapeutic and diagnostic methods of using same |
GB2471385B (en) * | 2009-06-23 | 2011-10-19 | Bruce Arnold Tunget | Apparatus and methods for forming and using subterranean salt cavern |
US8309885B2 (en) * | 2009-01-15 | 2012-11-13 | Electro Scientific Industries, Inc. | Pulse temporal programmable ultrafast burst mode laser for micromachining |
US10307862B2 (en) * | 2009-03-27 | 2019-06-04 | Electro Scientific Industries, Inc | Laser micromachining with tailored bursts of short laser pulses |
CA2756507A1 (en) * | 2009-03-27 | 2010-09-30 | Ams Research Corporation | Laser modulation for coagulation |
KR101115470B1 (ko) * | 2010-05-04 | 2012-02-24 | 강동환 | 레이저 발생장치 |
US20130294465A1 (en) * | 2012-05-07 | 2013-11-07 | Continuum | HIGHLY EFFICIENT 3rd HARMONIC GENERATION IN Nd: YAG LASER |
WO2013192521A1 (en) | 2012-06-22 | 2013-12-27 | The General Hospital Corporation | β-LACTAMASE TARGETED PHOTOSENSITIZER FOR PESTICIDE AND PEST DETECTION |
KR101328626B1 (ko) * | 2012-10-12 | 2013-11-14 | 서울시립대학교 산학협력단 | Q-스위칭 및 모드 잠금을 이용한 펄스 레이저 생성 장치 및 방법 |
US20160143692A1 (en) * | 2014-11-22 | 2016-05-26 | Candela Corporation | Laser System For Skin Treatment |
KR101682593B1 (ko) * | 2015-05-26 | 2016-12-05 | 한국과학기술연구원 | 단일 펄스 레이저 장치 |
KR102044378B1 (ko) * | 2018-11-21 | 2019-11-13 | 한국과학기술연구원 | 이중 트리거를 이용한 단일 펄스 레이저 장치 |
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2006
- 2006-12-05 KR KR1020087013485A patent/KR101358241B1/ko not_active IP Right Cessation
- 2006-12-05 GB GB0809121A patent/GB2445715B/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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TW200729651A (en) | 2007-08-01 |
KR101358241B1 (ko) | 2014-02-05 |
GB2445715B (en) | 2011-04-27 |
KR20080074156A (ko) | 2008-08-12 |
CN101317310A (zh) | 2008-12-03 |
GB2445715A (en) | 2008-07-16 |
TWI387170B (zh) | 2013-02-21 |
JP2009518868A (ja) | 2009-05-07 |
WO2007067643A2 (en) | 2007-06-14 |
US7420995B2 (en) | 2008-09-02 |
CN101317310B (zh) | 2010-12-08 |
DE112006003317T5 (de) | 2008-10-16 |
GB0809121D0 (en) | 2008-06-25 |
US20070133627A1 (en) | 2007-06-14 |
WO2007067643A3 (en) | 2007-07-26 |
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