JP4875049B2 - 高温用部品の潤滑コーティング装置 - Google Patents
高温用部品の潤滑コーティング装置 Download PDFInfo
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- JP4875049B2 JP4875049B2 JP2008311116A JP2008311116A JP4875049B2 JP 4875049 B2 JP4875049 B2 JP 4875049B2 JP 2008311116 A JP2008311116 A JP 2008311116A JP 2008311116 A JP2008311116 A JP 2008311116A JP 4875049 B2 JP4875049 B2 JP 4875049B2
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- temperature component
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- coating apparatus
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- 239000011248 coating agent Substances 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims abstract description 29
- 239000000314 lubricant Substances 0.000 title abstract description 10
- 238000004544 sputter deposition Methods 0.000 claims abstract description 30
- 239000011261 inert gas Substances 0.000 claims abstract description 17
- 230000001050 lubricating effect Effects 0.000 claims description 24
- 239000010410 layer Substances 0.000 claims description 23
- 239000012790 adhesive layer Substances 0.000 claims description 20
- 238000005461 lubrication Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 230000007246 mechanism Effects 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical group [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Lubricants (AREA)
Description
化学発電所のボイラ管、ガスタービン、原子炉のスタッドボルトなどは高温で使われる部品である。これらの高温用部品は、結合部の高い荷重および温度、接触面の堅い粒子、停滞時間の増加などによって磨耗および擦り傷などの損傷が発生する。
110 セッティング部
111 フレーム
112 移動パネル
113 治具
120 蓋
200 真空ポンプ
300 不活性気体供給部
400 制御部
500 プラットフォーム
600 回転駆動手段
610 駆動モータ
620 駆動ローラ
630 ガイドローラ
700 油空圧機構
810 接着層ターゲット
820 潤滑層ターゲット
910、920 スパッタガン
P 高温用部品
Claims (8)
- 高温用部品がセットされるセッティング部、および前記高温用部品に対するスパッタリング空間を形成する蓋を備えたチャンバーと、
前記セッティング部にセットされた高温用部品を回転駆動させる回転駆動手段と、
前記チャンバーのスパッタリング空間を真空に保つための真空ポンプと、
前記チャンバーのスパッタリング空間を不活性気体雰囲気に造成するための不活性気体供給部と、
前記蓋の上面部と前・後面部に前記高温用部品に向いて複数設置されるターゲットと、
前記ターゲットに対応するように前記蓋の上面部と前・後面部に設置され、前記ターゲットの原子を放出させて前記高温用部品に蒸着させる複数のスパッタガンと、
前記回転駆動手段、前記真空ポンプ、前記不活性気体供給部および前記スパッタガンを制御する制御部とを含んでなることを特徴とする、高温用部品の潤滑コーティング装置。 - 前記セッティング部は、
前記回転駆動手段が前後方向に移動し得るように設置される前後滑走レールを備えた移動パネルと、
前記移動パネルが左右方向に移動し得るように設置される左右滑走レールを備えたフレームと、
前記フレームの左右両端で前記高温用部品を回転可能に支持する治具とを含んでなることを特徴とする、請求項1に記載の高温用部品の潤滑コーティング装置。 - 前記セッティング部は、前記高温用部品の大きさと形態に応じて交替可能であることを特徴とする、請求項1または2に記載の高温用部品の潤滑コーティング装置。
- 前記蓋を回転開閉するように前記制御部の制御によって作動する油空圧機構をさらに含んでなることを特徴とする、請求項1に記載の高温用部品の潤滑コーティング装置。
- 前記回転駆動手段は、
回転駆動力を発生させる駆動モータと、
前記駆動モータによって回転する中央の駆動ローラと、
前記駆動ローラの左右に位置するガイドローラとを含んでなることを特徴とする、請求項1に記載の高温用部品の潤滑コーティング装置。 - 前記ターゲットの一部は、前記高温用部品の軸方向に沿って位置が変更できるように前記蓋上にボルトによって締結されることを特徴とする、請求項1に記載の高温用部品の潤滑コーティング装置。
- 前記ターゲットの一部は接着層ターゲットであり、残りは潤滑層ターゲットであることを特徴とする、請求項1に記載の高温用部品の潤滑コーティング装置。
- 前記接着層ターゲットの素材はニッケル(Ni)であり、前記潤滑層ターゲットの素材は銀パラジウム(AgPd)合金であることを特徴とする、請求項7に記載の高温用部品の潤滑コーティング装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080027893A KR100977613B1 (ko) | 2008-03-26 | 2008-03-26 | 고온용 부품의 윤활코팅장치 |
KR10-2008-0027893 | 2008-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009235560A JP2009235560A (ja) | 2009-10-15 |
JP4875049B2 true JP4875049B2 (ja) | 2012-02-15 |
Family
ID=40794151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008311116A Active JP4875049B2 (ja) | 2008-03-26 | 2008-12-05 | 高温用部品の潤滑コーティング装置 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP2105517B1 (ja) |
JP (1) | JP4875049B2 (ja) |
KR (1) | KR100977613B1 (ja) |
CN (1) | CN101545092B (ja) |
AT (1) | ATE474940T1 (ja) |
DE (1) | DE602008001873D1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6068095B2 (ja) * | 2012-10-31 | 2017-01-25 | 田中貴金属工業株式会社 | 連続成膜装置および連続成膜方法 |
CZ2014115A3 (cs) * | 2014-02-26 | 2015-09-09 | Hvm Plasma, Spol.S R.O. | Způsob unášení substrátů při depozici tenké vrstvy na povrch substrátů a rotační stolek pro unášení substrátů podle způsobu |
WO2021190808A1 (en) * | 2020-03-24 | 2021-09-30 | Evatec Ag | Vacuum recipient apparatus with at least one treatment station |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4197336A (en) * | 1978-12-21 | 1980-04-08 | Ukrainsky Nauchno-Issledovatelsky Institut Spetsialnykh Stalei, Splavov I Ferrosplavov | Method for applying protective coating to metal pipes |
US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
JPS62230972A (ja) | 1986-04-01 | 1987-10-09 | Hitachi Ltd | イオンビ−ムミキシング装置 |
CN86204865U (zh) * | 1986-07-09 | 1987-12-05 | 天津大学 | 多用对向靶溅射仪 |
JPH0413867A (ja) * | 1990-05-01 | 1992-01-17 | Casio Comput Co Ltd | スパッタ装置 |
JP2901317B2 (ja) * | 1990-07-02 | 1999-06-07 | 株式会社日立製作所 | スパッタ装置及びそれを用いた成膜方法 |
JPH04116160A (ja) * | 1990-09-04 | 1992-04-16 | Mitsubishi Heavy Ind Ltd | 皮膜形成装置 |
DE4312014A1 (de) * | 1993-04-13 | 1994-10-20 | Leybold Ag | Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer |
DE4405477A1 (de) * | 1994-02-21 | 1995-08-24 | Hauzer Holding | PVD-Verfahren zur Abscheidung von mehrkomponentigen Hartstoffschichten |
DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
DE10005612A1 (de) * | 2000-02-09 | 2001-08-16 | Hauzer Techno Coating Europ B | Verfahren zur Herstellung eines Gegenstandes und Gegenstand |
US6521104B1 (en) | 2000-05-22 | 2003-02-18 | Basic Resources, Inc. | Configurable vacuum system and method |
JP4097893B2 (ja) * | 2000-12-05 | 2008-06-11 | 株式会社エフ・ティ・エスコーポレーション | 対向ターゲット式スパッタ方法及び導電性膜の形成方法 |
EP1524329A1 (de) * | 2003-10-17 | 2005-04-20 | Platit AG | Modulare Vorrichtung zur Beschichtung von Oberflächen |
TW200532043A (en) * | 2004-02-10 | 2005-10-01 | Ulvac Inc | Thin film forming apparatus |
US20060096851A1 (en) * | 2004-11-08 | 2006-05-11 | Ilya Lavitsky | Physical vapor deposition chamber having an adjustable target |
US20060096857A1 (en) * | 2004-11-08 | 2006-05-11 | Ilya Lavitsky | Physical vapor deposition chamber having a rotatable substrate pedestal |
-
2008
- 2008-03-26 KR KR1020080027893A patent/KR100977613B1/ko active IP Right Grant
- 2008-11-28 EP EP08170298A patent/EP2105517B1/en active Active
- 2008-11-28 AT AT08170298T patent/ATE474940T1/de not_active IP Right Cessation
- 2008-11-28 DE DE602008001873T patent/DE602008001873D1/de active Active
- 2008-12-05 JP JP2008311116A patent/JP4875049B2/ja active Active
- 2008-12-10 CN CN2008101793965A patent/CN101545092B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101545092B (zh) | 2012-02-01 |
ATE474940T1 (de) | 2010-08-15 |
KR20090102442A (ko) | 2009-09-30 |
DE602008001873D1 (de) | 2010-09-02 |
JP2009235560A (ja) | 2009-10-15 |
CN101545092A (zh) | 2009-09-30 |
KR100977613B1 (ko) | 2010-08-23 |
EP2105517B1 (en) | 2010-07-21 |
EP2105517A1 (en) | 2009-09-30 |
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