JP4866211B2 - Design piece embroidery processing method - Google Patents

Description

  The present invention relates to an embroidery processing method in which a design piece such as a mark or a logo is cut out from a material fabric with a laser beam, and the periphery of the design piece is sewn to a base fabric with an embroidery sewing machine.

  2. Description of the Related Art Conventionally, an embroidery processing method is known in which an embroidery machine equipped with a laser cutting device and an embroidery sewing machine is used to continuously cut out and sew a design piece. For example, as shown in FIG. 8A, in pasting a design piece 52 representing a mark on the base fabric 51, conventionally, a method as shown in FIGS. 8B to 8E has been adopted. First, as shown in FIG. 5B, the base fabric 51 is covered with a base fabric 54 via a base sheet 53 such as an aluminum foil. Next, as shown in (c), the laser beam 55 is irradiated along the contour line of the design piece 52 to cut out the design piece 52 from the material fabric 54. Subsequently, as shown in (d), a stitch 56 is formed on the periphery of the design piece 52 by an embroidery sewing machine, and the design piece 52 is sewn to the base fabric 51 by the stitch 56. Thereafter, the base sheet 53 is cut along the stitches 56 and removed from the base fabric 51 as shown in FIG.

In Patent Document 1, an embroidery machine in which an embroidery sewing machine and a laser cutting device are provided side by side is used to form an embroidery pattern on a heat-meltable sheet, and then a laser beam is irradiated along the contour line of the embroidery pattern. A method for cutting out a design piece from a heat-meltable sheet is described. Patent Document 2 describes a technique for adjusting the output of a laser cutting apparatus so that only the upper fabric of two fabrics stacked one above the other can be cut with a laser beam.
JP 2006-104583 A Japanese Patent No. 2971327

  According to the conventional embroidery processing method shown in FIG. 8, since the design piece 52 is cut out in a state where the base fabric 51 is covered with the base sheet 53, the base fabric 51 is protected from the cutting heat by the laser beam 55, and is made of a chemical fiber. Mark processing of uniforms made of net fabric can be easily performed. However, according to the conventional method, as shown in FIG. 8 (e), a part of the base sheet 53 is enclosed between the base fabric 51 and the design piece 52 by the stitches 56, and therefore remains in the embroidery portion. There is a problem in that the base deteriorates the quality of the sewing product.

  An object of the present invention is to provide a design piece embroidery processing method that solves the above-described problems, removes a base for protecting a base fabric from an embroidery portion, and improves the quality of a sewn product.

  In order to solve the above-described problems, the design piece embroidery processing method of the present invention covers the base fabric on the base fabric through a base sheet, cuts out the design piece from the material fabric with laser light, and embroiders the periphery of the design piece In the method of sewing to the base fabric with the sewing machine, before covering the base fabric with the base fabric, before laying the material fabric, irradiate the base sheet along the cutting line corresponding to the inside of the outline of the design piece, A part of the base sheet is cut out to form an opening, and when the base fabric is covered with the material fabric through the base sheet and the design piece is cut out, the base fabric is removed from the laser beam with the base sheet surrounding the opening. After shielding and cutting out the design piece, the base sheet is removed from the base fabric. The “contour line” of the design piece includes both the case of the outer contour line and the case of the inner contour line, and “inside” of the contour line means the inside of the design piece. Therefore, the inner side of the inner contour line is on the outer peripheral side of the inner contour line.

  Here, the design piece is formed from a material fabric into a shape representing various designs such as characters, marks, logos, and the like. Although it does not specifically limit as raw material cloth, For example, the sheet | seat material which can be cut | disconnected with a laser beam, such as a cloth, artificial leather, natural leather, felt, can be used. The base fabric is not particularly limited, but may be the same material as the material fabric or a different material. Although it does not specifically limit as a base sheet, For example, thin sheet materials, such as wax paper, or a film material can be used.

In carrying out the embroidery processing method of the present invention, the following means can be preferably employed.
(A) Use a base sheet having a melting point lower than that of the base fabric so that the base fabric is not damaged when the base sheet is cut out.
(B) Use paper as a base sheet. By adjusting the number of paper sheets, the heat insulating effect of the base sheet can be easily adjusted according to the material of the base fabric.
(C) Use wax paper (paraffin paper) for the base sheet. The wax paper can easily absorb the cutting heat generated by the laser beam, and can scan the laser beam at a high speed, and can cut out the base sheet in a short time.

(B) Before the base sheet is cut out, the base sheet is temporarily stitched to the base fabric with an embroidery sewing machine. Since the base sheet does not move, an opening can be formed in the base sheet with an accurate shape.
(E) Before the design piece is cut out, the material fabric is temporarily sewn to the base fabric by an embroidery sewing machine in the region inside the opening. Since the stitches for temporary sewing do not sew the base sheet, the base sheet can be easily removed after cutting out the design piece.
(F) In this case, a stitch for temporary stitching is formed in a shape similar to the contour line of the design piece. In this way, the entire cutout line of the material dough can be joined to the base fabric in advance.

(G) The base sheet is removed from the base fabric before the periphery of the design piece is sewn to the base fabric. The base sheet can be easily removed without being obstructed by the seam.
(H) The base sheet is removed from the base fabric after the periphery of the design piece is sewn to the base fabric. In this case, it is preferable to use paper for the base sheet. In the case of a paper base sheet, the base sheet can be easily removed from the base fabric by tearing the base sheet.
(I) Examples of stitches on which the design piece is sewn include edge stitches such as main stitches, satin stitches, and staggered stitches.

  According to the design piece embroidery processing method of the present invention, an opening is formed in the base sheet, and the base fabric is shielded from the laser beam by the base sheet around the opening, so that the design piece can be cut out without damaging the base fabric. It is possible to remove the base sheet from the base fabric after cutting out the design piece. Therefore, there is an effect that it is possible to produce a high-quality sewing product in which the base is not left in the embroidery portion.

  Hereinafter, the best mode for carrying out the present invention will be described with reference to the drawings. As shown in FIG. 3A, the design piece embroidery processing method according to this embodiment includes a step of covering the base fabric 22 with a base sheet 28 and a laser beam along a cutting line inside the outline of the design piece 24. Irradiating the base sheet 28, cutting a part of the base sheet 28 to form the opening 28a, covering the base sheet 28 with the material fabric 29 so as to cover the opening 28a, and surrounding the opening 28a. In a state where the base fabric 22 is shielded from the laser beam by the partial base sheet 28, a step of cutting the material fabric 29 by the laser light to form the design piece 24, a step of removing the base sheet 28 from the base fabric 22, and a design A step of sewing the periphery of the piece 24 to the base fabric 22 with an embroidery sewing machine.

  Next, an embodiment of the present invention will be described with reference to FIGS. FIG. 1 shows the overall configuration of the embroidery machine. The embroidery machine 1 includes an embroidery sewing machine 2 and a laser cutting device 3. A plurality of embroidery sewing machines 2 are arranged in parallel on the upper part of the machine casing 4, and a table 6 is provided at an intermediate height of the machine casing 4. On the table 6, there is installed a frame driving device 5 for feeding the embroidery frame back and forth and right and left. The laser cutting device 3 includes two left and right columns 7, and a rail 8 is installed between the upper ends of the columns 7. A traveling body 9 is supported on the rail 8, and a laser head 10 is attached to the lower end thereof. Then, the controller 11 of the embroidery sewing machine 2 and the controller 12 of the laser cutting device 3 are connected to the processing data creation device 13, and the embroidery sewing machine 2 and the laser cutting device 3 are synchronously controlled according to the processing data created by the device 13. .

  FIG. 2 shows a baseball uniform as an example of a sewn product processed by the embroidery machine 1. A mark 23 representing a team name is embroidered on the front surface of the base fabric 22 of the uniform 21. The mark 23 is composed of three characters, and is composed of two design pieces 24 and 25 in which each character overlaps vertically. The lower design piece 24 is sewn to the base fabric 22 with zigzag stitches 26 formed at the periphery. The upper design piece 25 is formed smaller than the lower design piece 24 and is sewn to the base fabric 22 via the lower design piece 24 by zigzag stitches 27 formed on the periphery. The material pieces of different colors are used for the two design pieces 24, 25, and the upper design piece 25 is based on the contrast between the color exposed at the peripheral edge of the lower design piece 24 and the color of the upper design piece 25. It can be seen floating from the fabric 22. The mark 23 may be designed with continuous characters.

  FIG. 3 shows materials used for embroidery processing of the mark 23 and processing data. As shown in FIG. 3 (a), in the mark processing, the base fabric 22 of the uniform 21, the lower base sheet 28 that protects the base fabric 22 from cutting heat by laser light, and the material of the lower design piece 24 The lower material fabric 29, the upper base sheet 30 that protects the lower design piece 24 from cutting heat by laser light, and the upper material fabric 31 that is the material of the upper design piece 25 are used. In this embodiment, a net fabric made of chemical fibers such as polyester, nylon, and tetron is used for the base fabric 22. The material fabrics 29, 31 are made of glittering mark fabric made of chemical fiber. For the base sheets 28 and 30, thin wax paper having a melting point lower than that of the base fabric 22 is used by lightly bonding one or more sheets with glue.

  As shown in FIG. 3B, the processing data 33 of the mark 23 includes first embroidery information 34 for embroidering the lower design piece 24 and second embroidery information for embroidering the upper design piece 25. 44 is created or edited by the machining data creation device 13. The embroidery information 34 and 44 are configured in the same manner, and the base basting information 35 and 45 for temporarily sewing the base sheets 28 and 30 to the base fabric 22 and a part of the base sheets 28 and 30 are cut out by laser light. Design from ground material information 29, 31 by laser light, base cutting information 36, 46 for forming the openings 28a, 30a, material temporary sewing information 37, 47 for temporarily sewing the material materials 29, 31 to the base material 22. Material cutting information 38 and 48 for cutting out the pieces 24 and 25 and main sewing information 39 and 49 for sewing the peripheral edges of the design pieces 24 and 25 to the base fabric 22 are provided. The fabric cutting information 38 and 48 includes XY coordinate values for defining the contour lines of the design pieces 24 and 25 as cut lines.

  FIG. 4 shows an operation mode of the embroidery machine 1 during mark processing. The frame driving device 5 of the embroidery machine 1 includes a Y direction driving frame 14 and an X direction driving frame 15, and an embroidery frame 16 is attached to the X direction driving frame 15 via an arm 17. A base fabric 22 of a uniform 21 is held on the embroidery frame 16, and base sheets 28 and 30 and material fabrics 29 and 31 are covered on the base fabric 22 in a predetermined order. In the stitch formation step, as shown in FIG. 4A, the embroidery frame 16 is sent to the front, back, left and right on the lower side of the embroidery sewing machine 2, and the base sheets 28 and 30 and the material fabric are fed by the needle 18 of the embroidery sewing machine 2. Stitches are formed at 29 and 31. In the laser cutting step, as shown in FIG. 4B, the embroidery frame 16 is disposed in front of the embroidery sewing machine 2, and the laser head 10 is moved above the embroidery frame 16, and the laser beam 19 is used to form a base sheet. Openings 28 a and 30 a are formed in 28 and 30, and the design pieces 24 and 25 are cut out from the material fabrics 29 and 31. The laser head 10 is provided with a suction port for sucking the gas generated in the laser irradiation unit.

  Next, an embroidery processing method for the mark 23 will be described with reference to FIGS. In this embodiment, the lower design piece 24 is processed first, and then the upper design piece 25 is processed in the same procedure. In processing the lower design piece 24, first, as shown in FIG. 5A, the base fabric 22 is covered with the lower base sheet 28. Then, according to the ground basting information 35 in the first embroidery information 34, the embroidery sewing machine 2 forms a basting seam 40 on the ground sheet 28, and the ground sheet 28 is prevented from moving by the gas suction pressure of the laser head 10 at the time of cutting. Temporarily fasten to the base fabric 22 with temporary stitches 40. At this time, in the case of the mark 23 having the hollow portion (characters “B” and “D”), the temporary stitching 40 is also formed on the base sheet 28 corresponding to the hollow portion.

  Next, as shown in FIGS. 5 (b) and 5 (c), according to the ground cutting information 36, the laser light 19 is guided along the cutting line 42 corresponding to the inner side of the contour line 41 of the lower design piece 24. , And a portion of the base sheet 28 is cut off to form an opening 28a. At this time, since wax paper having a melting point lower than that of the base fabric 22 is used for the base sheet 28, heat at the time of cutting can be efficiently absorbed by the wax paper, and damage to the base fabric 22 can be prevented. Further, since the wax paper can be cut with a small amount of energy compared to the cloth, the laser beam 19 is scanned on the base sheet 28 at a high speed (for example, about twice the speed when the material cloth 29 is cut). 28a can be formed in a short time. The cutting line 42 of the base sheet 28 is defined in the base cutting information 36 by XY coordinate values obtained by offsetting the outline 41 from the inside of the design piece 24 by, for example, about 1 to 2 mm.

  Subsequently, as shown in FIGS. 6D and 6E, the base material 22 is covered with the lower material material 29 via the base sheet 28. Then, according to the fabric temporary stitching information 37, the embroidery sewing machine 2 forms an annular temporary stitch 43 on the material fabric 29, and the material fabric 29 is temporarily fixed to the base fabric 22 with the stitches 43. At this time, the temporary stitches 43 are formed in a shape (offset shape) similar to the design piece 24 in the region inside the opening 28a so that the base sheet 28 is not sewn. In this way, the entire cut line of the material dough 29 can be joined to the base dough 22 in advance before the design piece 24 is cut out. Next, as shown in FIG. 6 (f), according to the fabric cutting information 38, the laser beam 19 is irradiated along the contour line 41 (cutting line of the material fabric 29) of the design piece 24, and the design piece is then removed from the material fabric 29. Cut out 24. At this time, the base fabric 22 is shielded from the laser light 19 by a portion 28b (see FIG. 6f) where the base sheet 28 surrounds the opening 28a. Therefore, heat transfer from the material fabric 28 to the base fabric 22 due to cutting can be suppressed, and the uniform fabric made of the low melting point material can be reliably prevented from being damaged.

  After the design piece 24 is cut out, the base sheet 28 is pulled out from the lower side of the design piece 24 and removed from the base fabric 22 as shown in FIG. At this stage, since no seam is formed on the periphery of the design piece 24, the base sheet 28 can be easily removed without being obstructed by the seam. Subsequently, as shown in FIGS. 7 (h) and 7 (i), in accordance with the main stitch information 39, the embroidery sewing machine 2 forms the staggered stitch 26 on the entire periphery of the design piece 24, and the staggered stitch 26 forms the lower side design. The piece 24 is sewn to the base fabric 22. Thereafter, the same procedure is repeated, and as shown in FIG. 3A, the lower design piece 24 is used as the base fabric, the upper base sheet 30 is covered thereon, the opening 30a is formed in the base sheet 30, and the upper side is formed. The upper design piece 25 is cut out from the material fabric 31, and as shown in FIG. 7 (j), the entire circumference of the design piece 25 is sewn to the base fabric 22 with the zigzag stitches 27 to complete the mark 23. By doing so, as shown in FIG. 7 (k), it is possible to manufacture a high-quality uniform 21 in which no base remains in any part of the mark 23.

The present invention is not limited to the above-described embodiments. For example, as described below, the present invention can be appropriately modified and embodied without departing from the spirit of the invention.
(1) In the embroidery machine 1 shown in FIG. 1, a single laser cutting device 3 is combined with a plurality of embroidery sewing machines 2, but an embroidery machine in which a laser cutting device is provided in parallel for each embroidery sewing machine 2 is used. You may implement the said method.
(2) The mark 23 shown in FIG. 2 is composed of two upper and lower design pieces 24 and 25, but the mark 23 can also be composed of one design piece.
(3) In the step shown in FIG. 6G, the base sheet 28 is removed immediately after the design piece 24 is cut out. After the peripheral edge of the design piece 24 is sewn, the base sheet 28 is staggered 26. It may be removed by tearing.

It is a front view of the embroidery machine which shows the apparatus which implements the method of this invention. It is a front view which shows the mark processed by the method of this invention. It is a structure explanatory view of a mark and its processing data. It is a principal part top view of the embroidery machine at the time of mark processing. It is a cut-out process figure of the base sheet which shows the method of this invention. It is a cutting process figure of the design piece which shows the method of this invention. It is a sewing process figure of the design piece which shows the method of this invention. It is process drawing which shows the conventional method.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Embroidery machine 2 Embroidery sewing machine 3 Laser cutting device 13 Processing data creation device 19 Laser light 21 Uniform 22 Base fabric 23 Mark 24 Design piece 26 Staggered stitch 28 Base sheet 28a Base sheet opening 28b Part surrounding the opening 29 Material fabric 33 Process data 40 Temporary stitches 41 Design piece outline

Claims (1)

  In the embroidery processing method in which the base fabric is covered with the material fabric via the base sheet, the design piece is cut out from the material fabric with laser light, and the periphery of the design piece is sewn to the base fabric with the embroidery sewing machine, the base fabric is covered with the base sheet. Before covering the material fabric, the laser beam is irradiated to the base sheet along the cutting line corresponding to the inner side of the design piece outline, a part of the base sheet is cut off to form an opening, When the design piece is cut out by covering the material fabric through the base sheet, the base fabric is shielded from the laser beam by the base sheet surrounding the opening, and after the design piece is cut out, the base sheet is removed from the base fabric. A design piece embroidery processing method characterized by the above.

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