JP5687746B2 - Stitch data structure for sewing a stippling pattern and storage device storing stitch data for sewing a stippling pattern - Google Patents

Description

The present invention relates to a stitch data structure for sewing a stitch ring pattern to be sewn by a sewing machine and a storage device in which stitch data for sewing a stitch ring pattern is recorded.

The stippling pattern is a pattern in which a complicated curve is drawn with a single line as in a single stroke, and is mainly used for quilting and the like.
When stitching this stippling pattern, it is traditionally done manually, which is called free motion technology. The feed dog of the sewing machine is lowered, the feed amount of the cloth is adjusted by hand, and the operation of the sewing needle is performed. The speed was adjusted by operating the pedal of the controller, and sewing was done manually. However, in order to make the pitch width of the seam constant, it is necessary to adjust the feed amount of the cloth and the operation speed of the sewing needle at the same time, and it is difficult for a skilled worker to sew a stippling pattern. In particular, it was impossible for a general sewing machine user to sew a stippling pattern on a large quilt fabric with a sewing machine.
For this reason, in recent years, attempts have been made to mechanically perform stippling. For example, a device for automatically generating stippling pattern data has been proposed. (Patent Document 1).

JP 2008-136623 A

However, when the stitching pattern sewing is mechanically performed using a sewing machine or the like, it is not possible to sew a large area at once, and it is necessary to perform sewing multiple times while shifting the mounting position of the sewing object such as cloth. there were.
In the case of performing such a plurality of times of sewing, there are a method of sewing by dividing a large pattern and a method of repeatedly sewing a unit pattern that can be sewn at one time. In the former case, in order to divide one pattern, There was a problem that the alignment was difficult and the pattern was likely to shift.
In addition, in the case of the method of repeatedly sewing unit patterns, there is a problem that overlaps occur between unit patterns, or the interval between patterns becomes too wide, resulting in gaps between unit patterns. There was a problem that it was difficult to obtain a uniform sewing pattern.
The object of the present invention is to solve the problems of the prior art.

In order to achieve the above object, a stitch data structure for sewing a stippling pattern according to the present invention is a quadrangular shape that is sewn by an embroiderable sewing machine and is formed by upper and lower opposing sides and left and right opposing sides. A stitch data structure for sewing a stippling pattern drawn within an embroidery range, and has a convex shape so as to be substantially in contact with a plurality of first points on one of upper and lower opposing sides of the quadrangle. Convex stitch data for causing the sewing machine to sew a pattern on the sewing machine, concave stitch data for causing the sewing machine to sew a pattern in a concave shape with a predetermined distance from the plurality of second points on the one side, and For sewing the sewing machine into a concave pattern with a predetermined distance apart from a plurality of first corresponding points corresponding to the plurality of first points on the other of the upper and lower opposing sides of the quadrangle. Concave Stitch data, and convex stitch data for causing the sewing machine to sew a pattern in a convex shape so as to substantially contact a plurality of second corresponding points respectively corresponding to the plurality of second points on the other side, The first corresponding point is a point where a line passing through the first point and parallel to one side of the left and right opposite sides intersects the other side of the upper and lower opposite sides, The second corresponding point is a point where a line passing through the second point and parallel to one of the left and right opposing sides intersects the other of the upper and lower opposing sides.
When a stitch ring pattern with the stitch data structure having the above configuration is sewn a plurality of times so that the one side and the other side are in contact with each other, a gap occurs between the stitch ring pattern and the step ring pattern or between unit patterns. This makes it possible to sew a large stitch ring pattern that is uniform as a whole without causing an uncomfortable appearance.

  According to the recording data structure for stitching the stitching pattern or the stitching data for sewing the stitching pattern according to the present invention, the unit pattern and There is an effect that large unitary stitching pattern stitching can be performed as a whole without overlapping of unit patterns or gaps between unit patterns and without causing a sense of incongruity.

Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 shows an embodiment in which a stitch ring pattern sewing device is incorporated in a sewing machine capable of embroidery sewing.
The sewing machine body α includes a sewing mechanism 7 and a display device 8, and further includes an embroidery frame 74. The embroidery frame 74 is attached with a cloth which is an object to be stitched, and the stitching pattern exceeding the size of the embroidery frame 74 is realized while shifting the position of the cloth.

This embodiment will be described in more detail with reference to the block diagram of FIG.
The entire sewing machine main body α is controlled by the central processing unit 100. The sewing machine motor control unit 70 is controlled by a command from the central processing unit 100, and the sewing mechanism 71 such as a needle and a feed dog is controlled via the sewing machine motor 71. Yes. Further, the X and Y motor control device 72 and the X and Y motor 73 are controlled to move the embroidery frame 74 of the sewing mechanism 7 in the xy direction so as to perform the stitch ring pattern sewing.
Further, the display device 8 is made to perform necessary display as appropriate via the display control device 80.

A pattern storage device 2 is connected to the central processing unit 100 and stores at least one stippling pattern data. FIG. 3 shows an embodiment of the stippling pattern 20. As shown in the figure, a complicated pattern is formed by one pattern line 21.
As described above, in the method of repeatedly sewing unit patterns, a quilt cloth is stretched around an embroidery frame, and a plurality of selected unit step ring patterns 20 are aligned and arranged in combination vertically and horizontally and embroidered. At this time, in the joint portion of the unit step ring pattern 20 arranged as shown in FIG. 3, the uneven portion formed near the boundary of the outer periphery of the unit step ring pattern is formed in the vicinity of the counterpart boundary. A large stippling pattern with a sense of unity as a whole is formed.

The configuration of the stippling pattern 20 will be described in more detail with reference to FIG. The stippling pattern 20 is drawn inside the embroidery range 75. The embroidery range 75 has a quadrangular shape smaller than the embroidery frame 74 defined by the embroidery frame 74.
The embroidery possible range 75 has an upper reference line 76 that is one side opposite to each other and a lower reference line 77 that is the other side. Similarly, a left reference line 78 that is one side opposite to each other and a right reference line 79 that is the other side are provided.

A plurality of first points A1 to A7 are provided on the upper reference line 76, and first corresponding points a1 to a7 are provided on the lower reference line 77 corresponding to the first point A. A point that passes through the first point A on the upper reference line 76 and is parallel to the left reference line 78 intersects the lower reference line 77 is the first corresponding point a.
The convex portion 25 is formed so as to be in contact with or substantially in contact with the first points A1 to A7. The convex portion 25 is formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20.

  On the other hand, a recess 26 is formed at a predetermined distance from the first corresponding points a1 to a7 on the lower reference line 77. The recess 26 is also formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20. The concave portion 26 is curved in a direction away from the first corresponding points a1 to a7, and is concave with respect to the first corresponding points a1 to a7.

  A plurality of second points B1 to B4 are set on the upper reference line 76, and second corresponding points b1 to b4 are provided on the lower reference line 77 corresponding to the second point B. ing. A point that passes through the second point B on the upper reference line 76 and is parallel to the left reference line 78 intersects the lower reference line 77 is the second corresponding point b.

  A recess 26 is formed at a predetermined distance from the second points B1 to B4 on the upper reference line 76. The recess 26 is also formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20. The concave portion 26 is curved in a direction away from the second points B1 to B4, and is concave with respect to the second points B1 to B4.

  On the other hand, the convex portion 25 is formed so as to be in contact with or substantially in contact with the second corresponding points b1 to b4 on the lower reference line 77. The convex portion 25 is formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20.

As described above, the upper reference line 76 and the lower reference line 77 that face each other have the first point A and the first corresponding point a corresponding to each other, the second point B and the second corresponding point b, and the convex portion 25. A recess 26 is formed. That is, a convex portion 25 is formed at the first point A, and a concave portion 26 is formed at the first corresponding point a. On the other hand, a concave portion 26 is formed at the second point B, and a convex portion 25 is formed at the second corresponding point b.
That is, curved lines bent in opposite directions are formed at corresponding points of the upper reference line 76 and the lower reference line 77.

  An example of a state in which the stippling patterns 20 having the above-described configuration are joined in the vertical and horizontal directions is shown in FIG. Here, when the step ring pattern 20 and the step ring pattern 20U are viewed, the lower reference line 77 of the step ring pattern 20U and the upper reference line 76 of the step ring pattern 20 are overlapped at the joint portion, and the step ring pattern 20U side. The convex portions 25 and the concave portions 26 are disposed so as to correspond to the convex portions 25 and the concave portions 26 on the stippling pattern 20 side, respectively. That is, the convex part 25 on the step ring pattern 20U side is arranged so as to face the concave part 26 on the step ring pattern 20 side, and the concave part 26 on the step ring pattern 20U side is arranged so as to face the convex part 25 on the step ring pattern 20 side. Will be.

  Therefore, when the stitching pattern 20 is continuously sewn, the stitching pattern 20 does not overlap or unnaturally separate, and a pattern with a sense of unity can be formed as shown in FIG.

A first point A and a first corresponding point a, and a second point B and a second corresponding point b are formed on the left reference line 78 and the right reference line 79 in exactly the same manner. That is, the left reference line 78 is provided with a plurality of first points A1 to A10, and the first corresponding points a1 to a10 are provided on the right reference line 79 corresponding to the first point A. A point that passes through the first point A on the left reference line 78 and is parallel to the upper reference line 76 intersects the right reference line 79 is the first corresponding point a.
The convex portion 25 is formed so as to be in contact with or substantially in contact with the first points A1 to A10. The convex portion 25 is formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20.

  On the other hand, a recess 26 is formed at a predetermined distance from the first corresponding points a1 to a10 on the right reference line 79. The recess 26 is also formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20. The concave portion 26 is curved in a direction away from the first corresponding points a1 to a10, and is concave with respect to the first corresponding points a1 to a10.

  A plurality of second points B1 to B7 are set on the left reference line 78, and second corresponding points b1 to b7 are provided on the right reference line 79 corresponding to the second point B. A point that passes through the second point B on the left reference line 78 and is parallel to the upper reference line 76 intersects the right reference line 79 is the second corresponding point b.

  A recess 26 is formed at a predetermined distance from the second points B1 to B7 on the left reference line 78. The recess 26 is also formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20. The concave portion 26 is curved in a direction away from the second points B1 to B7, and is concave with respect to the second points B1 to B7.

  On the other hand, the convex portion 25 is formed so as to be in contact with or substantially in contact with the second corresponding points b1 to b7 on the right reference line 79. The convex portion 25 is formed by a line continuous with the pattern line 21 and forms a part of the stippling pattern 20.

  Here, when the step ring pattern 20 and the step ring pattern 20R are viewed in FIG. 5, the right reference line 79 of the step ring pattern 20 and the left reference line 78 of the step ring pattern 20R overlap each other at the joint portion. The convex portions 25 and the concave portions 26 on the 20 side are arranged so as to correspond to the convex portions 25 and the concave portions 26 on the side of the stippling pattern 20R. That is, the convex part 25 on the step ring pattern 20 side is arranged to face the concave part 26 on the step ring pattern 20R side, and the concave part 26 on the step ring pattern 20 side is arranged to face the convex part 25 on the step ring pattern 20R side. Will be.

  As described above, even if the stitching pattern 20 having the above-described configuration is sewn continuously in any direction, the stitching pattern 20 does not overlap or unnaturally separate as shown in FIG. A pattern with a sense of unity can be formed as a whole.

Next, an example of a specific arrangement method of the stippling pattern 20 having the above configuration will be described.
In this embodiment, as shown in FIG. 6, the pattern storage device 2 has a standard size stippling pattern 20 with xy dimensions, x ′ = 1 / 2x, and a vertical half size stippling pattern 20 ′ with x dimensions. , Y ′ = 1 / 2y dimension horizontal half-size stippling pattern 20 ″, x ′ = 1 / 2x, y ′ = 1 / 2y dimension 1 / 4-size stippling pattern 20 ′ ″ ing.
The vertical and horizontal lengths of the standard size pattern 20 are the dimensions of the embroidery possible range 75 corresponding to the vertical and horizontal lengths of the embroidery frame 74 as described above.
It is possible to store other pattern data having different stippling patterns in the pattern storage device 2.

  The pattern selection device 1 is configured to select and read the stippling pattern 20 data stored in the pattern storage device 2. The pattern selection device 1 includes a selection input device 10, and can select and read the stepping pattern 20 instructed by the user, and can select and read the stepping pattern 20 according to a command from the central processing unit 100. Is also possible. The selected and read stippling pattern 20 data is stored in a temporary storage device (not shown) provided in the central processing unit 100.

The cloth size input device 3 is for a user to input the size of an embroidery object such as a cloth, and designates and inputs the vertical and horizontal sizes of the cloth on which the stippling pattern is to be embroidered. In general, the size of the cloth to be stitched with the stitching pattern is large, and is usually larger than the size of the stitching pattern 20.
In the embodiment of the present invention, a plurality of step ring patterns 20 are aligned vertically and horizontally so as to fit into a predetermined size XY of the cloth 30 that is a large quilt fabric, and the stitch ring pattern 20 is embroidered. Adjust the size and arrange an integer number of rows vertically and horizontally.

  The replacement number calculating device 4 calculates the number of vertical and horizontal unit patterns corresponding to the size of the embroidery object as an integer based on the size of the embroidery object and the predetermined vertical and horizontal length of the selected unit pattern. Means. That is, the replacement number calculating device 4 performs the horizontal stippling corresponding to the size of the fabric based on the length and width of the pattern selected by the pattern selection device 1 and the length and width of the fabric specified by the fabric size input device 3. The number of patterns 20 and the number of stippling patterns 20 in the vertical direction are calculated.

This will be specifically described with reference to FIGS.
As shown in FIG. 7, when a stitching pattern 20 having a horizontal size x and a vertical size y is embroidered on a cloth 30 having a horizontal size X and a vertical size Y, as shown in FIG. It is conceivable to arrange the stippling patterns 20 in two rows and two columns. On the other hand, as shown in FIG. 8, it is possible to have two rows and three columns.
Usually, X ÷ x and Y ÷ y are calculated and rounded off to obtain an integer solution. It is also possible to obtain both a rounded-down integer solution and a rounded-up integer solution, and to select an arrangement with a small scaling ratio described later.

As shown in FIG. 7 and FIG. 8, in the arrangement calculated by the number-of-replacement calculation device 4, the stippling pattern 20 does not completely match the size of the cloth 30 in most cases. Therefore, in the stitch changing device 6, the stitching pattern 20 is set so that the XY of the cloth 30 matches the number of x × rows and the number of y × steps of the stitching pattern 20 according to the number of arrangements calculated by the replacement number calculating device 4. The data is scaled up and down in the horizontal and vertical directions. That is, the stitch data of the stippling pattern 20 is multiplied by the enlargement / reduction ratios α and β, respectively, and enlarged / reduced in the vertical and horizontal directions. As a result, the vertical and horizontal sizes of the stippling pattern 20 are set to x × α and y × β. The vertical and horizontal sizes of the enlarged and reduced stippling pattern 20 conform to XY of the cloth 30 and are X = x × α × number of columns and Y = y × β × number of steps.
The stitch changing device 6 uses the vertical and horizontal directions of the unit pattern so that the unit pattern matches the embroidery object based on the number of unit patterns calculated by the calculation unit and the size of the object. This is a calculation means for calculating the enlargement / reduction ratio in the direction.

Conventionally, the enlargement / reduction of the pattern has the same vertical / horizontal magnification in order not to destroy the shape of the pattern, but in the present invention, the stippling pattern in which the pattern collapse does not appear clearly like the conventional pattern By making use of the characteristics of the above, the size of the united stippling pattern 20 is adjusted by independently enlarging and reducing each of the vertical and horizontal directions, and the size of the stippling pattern 20 that matches the size of the cloth 30 without feeling pattern collapse. Embroidery sewing can be realized. In addition, since the integer number of the stippling patterns 20 is arranged, the pattern is not cut off in the middle.
Further, as described above, since the unit stippling pattern 20 is configured so as not to cause a sense of incongruity at the time of joining, a smoother joined portion between the stippling pattern 20 and the stippling pattern 20 can be obtained.

The sewing machine body α is further provided with a printer 9 so that a pattern sewn on the cloth 30 can be printed. In other words, the entire stitch ring pattern 20 combined in a predetermined number of vertical and horizontal directions and enlarged or reduced so as to coincide with the cloth 30 can be printed and used to align the cloth 30 and the embroidery frame 74.
It is also possible to output sewing information such as the number of vertical and horizontal patterns, the vertical and horizontal magnification of the pattern, drafting information, and a unit stippling pattern template to the printer.

  The central processing unit 100 is further connected to an enlargement / reduction rate determination means 50 that determines whether or not the enlargement / reduction rate calculated by the vertical / horizontal magnification calculation device 5 exceeds a predetermined value. In such a case, the display device 8 is notified to that effect. The predetermined value can be set to a predetermined limit magnification that does not cause pattern collapse, for example.

  Further, when the enlargement / reduction rate determination means determines that the enlargement / reduction rate has exceeded a predetermined value, the central processing unit 100 adds a stippling pattern 20 of another size from the pattern storage device 2 to the pattern selection device 1. It is configured to be selected. In other words, as shown in FIG. 8, when the enlargement / reduction ratio exceeds a predetermined value in the standard size, an appropriate one is selected from the other vertical half size, horizontal half size, and 1/4 size, and the number of replacements is calculated. The apparatus 4 and the vertical / horizontal magnification calculating apparatus 5 are configured to execute the same operation. Also in the newly selected stippling pattern 20, when the enlargement / reduction ratio determination device 50 determines that the predetermined value is exceeded, another stippling pattern 20 is selected and the same operation is repeated.

The operation will be described with reference to the flowchart of FIG.
The stippling pattern 20 of the pattern storage device 2 displayed on the display device 8 is selected (step S1), and the vertical and horizontal lengths XY of the cloth 30 to be embroidered are designated (steps S2, 3). The number of vertical / horizontal patterns (integer) that can be arranged in alignment with the vertical / horizontal size XY of the cloth 30 is calculated in the replacement number calculating device 4 (step S4). Based on the calculated number of replacements and the size of the cloth 30, the vertical and horizontal magnifications of the selected unit stippling pattern 20 are calculated so that the overall pattern size matches the size of the cloth 30 ( Step S5).
When each calculated magnification exceeds a predetermined limit magnification that does not cause pattern collapse (step S6), a warning is displayed on the display device 8 (step S12), and the process returns to step S1, and another unit sticker having a different size is displayed. A pulling pattern 20 is selected (step S1), and the same operation is repeated.
If the enlargement / reduction ratio does not exceed a predetermined value, the stitch change device 6 enlarges or reduces the stitch data of the stippling pattern 20 based on the calculated magnifications (step S7). Then, sewing information such as the number of vertical and horizontal patterns and the vertical and horizontal magnifications of the patterns is displayed on the display device (step S8). If there is a print instruction (step S9), drawing information including sewing information and a unit stippling pattern template are output to the printer (step S13).
When the start of sewing is instructed (step S10), the central processing unit 100 controls the sewing machine motor control device 70 and the X, Y motor control device 72 to change the stitches of the enlarged and reduced step ring pattern 20 to the renumber calculation device. The number of vertical and horizontal numbers calculated in 4 is executed (step S11).

The perspective view which shows one Embodiment of this invention. The functional block diagram which shows one Embodiment of this invention. Explanatory drawing which shows one Embodiment of this invention. Explanatory drawing which shows one Embodiment of this invention. Explanatory drawing which shows one Embodiment of this invention. Explanatory drawing which shows the aspect of the size of the step ring pattern 20 of one Embodiment of this invention. Explanatory drawing which shows operation | movement of one Embodiment of this invention. Explanatory drawing which shows operation | movement of one Embodiment of this invention. The flowchart figure which shows operation | movement of one Embodiment of this invention.

1: Pattern selection device, 2: Pattern storage device, 3: Cloth size input device, 4: Reposition number calculation device, 5: Vertical / horizontal magnification calculation device, 6: Stitch change device, 7: Sewing mechanism, 8: Display device , 9: printer, 10: selective input device, 20: stippling pattern, 21: pattern line, 25: convex portion, 26: concave portion, 30: cloth, 50: enlargement / reduction ratio judgment device, 70: sewing machine motor control device, 71: Sewing machine motor, 72: X, Y motor control device, 73: X, Y motor, 74: Embroidery frame, 75: Embroidery range, 76: Upper reference line, 77: Lower reference line, 78: Left reference line 79: right reference line, 80: display control device, 90: printer drive device, 100: central processing unit.

Claims (4)

A stitch data structure for sewing a stitch ring pattern which is sewn by an embroiderable sewing machine and is drawn within a quadrangular embroidery range formed by upper and lower opposing sides and left and right opposing sides,
Convex stitch data for causing the sewing machine to sew a pattern in a convex shape so as to substantially contact a plurality of first points on one of the upper and lower opposing sides of the quadrangle;
Concave stitch data for causing the sewing machine to sew a pattern in a concave shape at a predetermined distance from the plurality of second points on the one side;
To cause the sewing machine to sew a pattern in a concave shape at a predetermined distance from a plurality of first corresponding points corresponding to the plurality of first points on the other of the upper and lower opposing sides of the quadrangle. The concave stitch data of
Convex stitch data for causing the sewing machine to sew a pattern in a convex shape so as to substantially contact a plurality of second corresponding points corresponding to the plurality of second points on the other side,
The first corresponding point is a point where a line passing through the first point and parallel to one of the left and right opposing sides intersects the other of the upper and lower opposing sides,
The second corresponding point is a point where a line passing through the second point and parallel to one of the left and right opposing sides intersects with the other of the upper and lower opposing sides.
Stitch data structure for sewing a stippling pattern. The stitching pattern has stitch data that causes the sewing machine to sew a plurality of times so that the one side contacts the other side.
A stitch data structure for sewing the stippling pattern according to claim 1. This is a storage device that records stitch data for sewing a stitch ring pattern that is sewn by an embroiderable sewing machine and is drawn within a quadrangular embroidery range formed by upper and lower opposing sides and left and right opposing sides. And
Convex stitch data for causing the sewing machine to sew a pattern in a convex shape so as to substantially contact a plurality of first points on one of the upper and lower opposing sides of the quadrangle;
Concave stitch data for causing the sewing machine to sew a pattern in a concave shape at a predetermined distance from the plurality of second points on the one side;
To cause the sewing machine to sew a pattern in a concave shape at a predetermined distance from a plurality of first corresponding points corresponding to the plurality of first points on the other of the upper and lower opposing sides of the quadrangle. The concave stitch data of
Convex stitch data for causing the sewing machine to sew a pattern in a convex shape so as to be substantially in contact with the plurality of second corresponding points respectively corresponding to the plurality of second points on the other side;
The first corresponding point is a point where a line passing through the first point and parallel to one of the left and right opposing sides intersects the other of the upper and lower opposing sides,
The second corresponding point is a point where a line passing through the second point and parallel to one of the left and right opposing sides intersects with the other of the upper and lower opposing sides.
A storage device that records stitch data for sewing a stippling pattern. The stitch data for recording the stitching pattern to allow the sewing machine to sew a plurality of times so as to contact the one side and the other side,
A storage device in which stitch data for sewing the stippling pattern according to claim 1 is recorded.

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