JP4854603B2 - UV irradiation equipment - Google Patents

Description

  The present invention relates to an ultraviolet irradiation device, and more particularly to an ultraviolet irradiation device that performs sterilization / inactivation treatment of bacteria and pathogenic microorganisms present in a liquid, accelerated oxidation treatment of a hardly decomposable substance, and the like.

In recent years, ultraviolet rays are applied to the stock solution for the purpose of sterilization / inactivation treatment of bacteria and pathogenic microorganisms present in the liquid (stock solution), and accelerated oxidation treatment (AOP treatment) of refractory substances. Many ultraviolet irradiation apparatuses to be used are used (for example, refer to Patent Document 1).
JP 2007-98305 A

  However, since the treatment tank for temporarily storing the ultraviolet treatment liquid is simply placed after the conventional ultraviolet treatment apparatus, a power failure or a failure of the ultraviolet lamp has occurred, resulting in the ultraviolet treatment of the stock solution. If the process is not sufficiently performed, the untreated liquid may flow into the treatment liquid tank and contaminate the treatment liquid. Further, when the ultraviolet lamp is broken, not only the broken pieces of the lamp and the protective tube but also mercury enclosed in the lamp may be mixed into the processing liquid. It is possible to prevent the untreated liquid from flowing into the treatment liquid tank by detecting that a power failure has occurred and closing the valve at the rear stage of the UV treatment device. It is difficult to completely prevent the untreated liquid from flowing into the treatment liquid tank depending on the flow time and flow rate of the treatment liquid from the ultraviolet treatment apparatus to the treatment liquid tank until There is also anxiety that untreated liquid may have flowed into the liquid tank.

  Therefore, an object of the present invention is to provide an ultraviolet irradiation device that can reliably prevent the untreated liquid from being mixed into the treatment liquid when a power failure or a failure of the ultraviolet lamp occurs.

In order to achieve the above object, the ultraviolet irradiation apparatus of the present invention is an ultraviolet irradiation apparatus for irradiating an undiluted solution with ultraviolet rays to treat the undiluted solution with ultraviolet rays. And a processing liquid storage tank for storing the processing liquid that has been subjected to ultraviolet treatment in the process liquid, and the processing liquid storage tank is partitioned into a processing liquid inflow chamber and a processing liquid outflow chamber by an overflow overflow weir , The sub-overflow weir lower than the overflow weir is divided into an upstream compartment and a downstream compartment .

Furthermore, the ultraviolet irradiation apparatus of the present invention is characterized by comprising a treatment liquid return path for returning the treatment liquid in the treatment liquid inflow chamber to the stock solution side. In addition, a short-circuit prevention plate is provided above the downstream section to prevent the processing liquid that has passed through the secondary overflow weir from passing through the overflow weir and into the processing liquid outflow chamber. It is said .

  According to the ultraviolet irradiation device of the present invention, even if untreated liquid that has not been sufficiently subjected to ultraviolet treatment due to a power failure or failure of the ultraviolet lamp flows into the treated liquid storage tank, it is contaminated with untreated liquid. Since this is only the processing liquid in the processing liquid inflow chamber, a large amount of processing liquid is not contaminated. As a result, the amount of liquid when the processing liquid contaminated with the untreated liquid is reprocessed can be greatly reduced, and the time required for cleaning the processing liquid storage tank can be greatly shortened. Operation can be resumed in a short time. In particular, when the treatment liquid is clean water, the contaminated clean water is not distributed and the safety of clean water can be ensured.

  FIG. 1 is a system diagram showing a first embodiment of the ultraviolet irradiation apparatus of the present invention. This ultraviolet irradiation device performs ultraviolet treatment on the undiluted solution pumped from the intake well 11 by the intake pump 12, and in the subsequent stage of the ultraviolet treatment tank 13 equipped with an ultraviolet lamp for irradiating the undiluted solution with ultraviolet rays, A treatment liquid storage tank 14 provided with a safety device for preventing mixing with the treatment liquid is provided.

  The safety device provided in the processing liquid storage tank 14 includes a main overflow weir 17 that partitions the inside of the processing liquid storage tank 14 into a processing liquid inflow chamber 15 and a processing liquid outflow chamber 16, and the inside of the processing liquid inflow chamber 15. Is divided into an upstream compartment 18 and a downstream compartment 19, a short-circuit prevention means (short-circuit prevention plate) 21 provided above the downstream compartment 19, and a treatment from the ultraviolet treatment tank 13. The processing liquid introduction path 22 for introducing the liquid into the upstream section 18, the processing liquid outlet path 23 for sending the processing liquid in the processing liquid outflow chamber 16 to the next process, the upstream section 18, the downstream section 19, and the processing liquid outflow A first return path 24, a second return path 25, and a third return path 26 are provided for returning the liquid in each part of the chamber 16 to the intake well 11.

  Each of the paths 22, 23, 24, 25, 26 is provided with a switching valve 22 V, 23 V, 24 V, 25 V, 26 V, and further, a stock solution introduction path for introducing a stock solution upstream of the ultraviolet treatment tank 13. 27 is provided, and a bypass path 28 is provided to connect the processing liquid introduction path 22 and the processing liquid introduction path 23 without passing through the processing liquid storage tank 14. The raw liquid introduction path 27 is provided with a raw liquid cutoff valve 27V. Each path 28 is provided with a bypass valve 28V. Further, shut-off valves 29V and 30V are respectively provided in the treatment liquid delivery path 30 downstream of the exit path 29 of the ultraviolet treatment tank 13 and the joining part of the treatment liquid outlet path 23 and the bypass path 28. It should be noted that it is sufficient to provide only one of these shut-off valves 27V, 29V, and 30V for stopping water flow, and it is not necessary to install them at three locations at the same time. Description will be made assuming that all 27V, 29V, and 30V are provided.

  In addition, although not shown in the drawing, the UV treatment tank 13 monitors the state of the UV lamp and monitors an abnormality detection signal such as a lamp astigmatism signal, an illuminance shortage signal, or a protection tube breakage signal. Is provided, and a control device for operating a pump and a valve constituting the ultraviolet irradiation device is provided.

  During normal UV treatment operation, the intake pump 12 is operated, the switching valves 22V and 23V and the shutoff valves 27V, 29V and 30V are opened, and the switching valves 24V, 25V and 26V and the bypass valve 28V are closed. . Therefore, the undiluted solution pumped from the intake well 11 by the intake pump 12 flows into the ultraviolet treatment tank 13 through the undiluted solution introduction path 27 and is irradiated with ultraviolet rays in the ultraviolet treatment tank 13 to sterilize / disinfect bacteria and pathogenic microorganisms UV treatment such as activation treatment and accelerated oxidation treatment of a hardly decomposable substance is performed. The processing liquid flowing out from the ultraviolet processing tank 13 flows into the processing liquid storage tank 14 through the processing liquid introduction path 22.

  In the processing liquid storage tank 14, the processing liquid flows from the processing liquid introduction path 22 into the lower part of the upstream section 18 provided in the front stage of the processing liquid inflow chamber 15, and rises in the upstream section 18 to the secondary overflow. Cross over the weir 20, descend between the sub-overflow weir 20 and the short-circuit prevention plate 21 in the downstream section 19, pass under the short-circuit prevention plate 21, and between the short-circuit prevention plate 21 and the main overflow weir 17. And then flows into the processing liquid outflow chamber 16 over the main overflow weir 17. The processing liquid in the processing liquid outflow chamber 16 is sent to the next process through the processing liquid outlet path 23.

  If abnormalities such as lamp inconvenience, insufficient illuminance, breakage of protective tube, etc. occur during operation and an abnormality detection signal is transmitted from the abnormality detector of the UV treatment tank 13, the intake pump 12 is stopped by the control device and shut off. At least one of the valves 27V, 29V, and 30V is closed, and the introduction of the stock solution into the ultraviolet treatment tank 13, the derivation of the treatment liquid from the ultraviolet treatment tank 13, and the derivation of the treatment liquid from the treatment liquid storage tank 14 are interrupted.

  At this time, the intake pump 12 stops the volume of the upstream compartment 18 of the treatment liquid inflow chamber 15 and the volume of the treatment liquid inflow chamber 15 including the upstream compartment 18 and the downstream compartment 19 from the abnormality detection of the ultraviolet treatment tank 13. The amount of liquid flowing out from the ultraviolet ray processing tank 13 during the time until the shut-off valve 27V, 29V, 30V is closed is calculated, and the volume corresponding to this liquid amount or the volume considering the safety factor is set. As a result, the untreated liquid that has flowed into the treatment liquid inflow chamber 15 from the ultraviolet treatment tank 13 in which an abnormality has occurred does not flow into the treatment liquid outflow chamber 16 beyond the main overflow weir 17, and the treatment liquid It is possible to prevent the processing liquid in the outflow chamber 16 from being contaminated by the unprocessed liquid. Further, even when the ultraviolet lamp is broken and the lamp, the broken piece of the protective tube, or mercury enclosed in the lamp flows into the processing liquid inflow chamber 15 together with the unprocessed liquid, these are treated liquid in the processing liquid outflow chamber 16. Mixing in can be prevented.

  Therefore, the time for returning the liquid contaminated with the untreated liquid or the treated liquid possibly contaminated with the untreated liquid to the well 11 or the amount of the liquid when reprocessing with another processing apparatus. Not only can it be significantly reduced, but when the entire processing liquid reservoir 14 is contaminated with the untreated liquid, it is necessary to clean the entire processing liquid storage tank 14, but the processing liquid inflow chamber By appropriately setting the volume of 15 as described above, the cleaning operation can be performed only for the processing liquid inflow chamber 15 and further only for the upstream section 18, so that the liquid return time and the liquid reprocessing time can be reduced. By shortening the time and cleaning time, the operation of the ultraviolet irradiation device after the occurrence of abnormality can be resumed in a short time.

  In particular, by providing a secondary overflow weir 20 in the processing liquid inflow chamber 15 and dividing it into an upstream compartment 18 and a downstream compartment 19, relatively large specific gravity fragments and mercury are captured in the upstream compartment 18. It is possible that almost no debris or mercury flows into the downstream compartment 19 beyond the secondary overflow weir 20, and the troublesome cleaning work for eliminating such inflows can be kept only in the upstream compartment 18. it can. Further, by providing a short-circuit prevention plate 21 between the sub overflow weir 20 and the main overflow weir 17, the untreated liquid that has passed over the sub overflow weir 20 passes directly over the main overflow weir 17 and processed liquid. Inflow into the outflow chamber 16 can be prevented.

  In addition, after an abnormality has occurred, the switching valves 22V and 23V are closed, the processing liquid storage tank 14 is disconnected from the processing line, the inside of the processing liquid storage tank 14 is inspected, and safety is confirmed such as the presence or absence of mercury leakage or debris contamination. If there is no problem, the switching valve 24V, 25V, 26V is opened, and the liquid in the processing liquid storage tank 14 is returned to the intake well 11 through the return paths 24, 25, 26. Further, when mercury or debris is mixed, the inside of the processing liquid storage tank 14 or the inside of the piping is appropriately cleaned.

  Each path, shut-off valve, and switching valve are provided as necessary. For example, when the liquid in the processing liquid outflow chamber 16 is formed to be extracted through a path branched from the processing liquid delivery path 30. The third return path 26 and the switching valve 26V can be omitted. Moreover, what is necessary is just to provide the shut-off valve which prevents that an untreated liquid flows toward the process liquid storage tank 14 at the time of abnormality generation at least at one place.

  FIG. 2 is a system diagram showing a second embodiment of the ultraviolet irradiation device of the present invention. In the following description, the same components as those of the ultraviolet irradiation apparatus shown in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  In this embodiment, when the undiluted solution is supplied to the ultra-violet processing tank 13 under natural flow from the undiluted solution tank 31 provided so that the liquid level is positioned higher than the liquid level in the ultra-violet processing tank 13 and the treating solution storage tank 14. In this example, the return pump 33 is provided in the main return path 32 where the first return path 24, the second return path 25, and the third return path 26 are joined.

  Also in the present embodiment, as in the first embodiment, the shutoff valves 27V, 29V, and 30V are closed when an abnormality occurs, so that the untreated liquid flows into the process liquid outflow chamber 16 beyond the main overflow weir 17. Can be prevented. Further, the liquid in the processing liquid inflow chamber 15 can be returned to the stock solution tank 31 by opening the switching valves 24V and 25V and operating the return pump 33.

  FIG. 3 is a system diagram showing a third embodiment of the ultraviolet irradiation apparatus of the present invention. In this embodiment, the stock solution pumped from the intake well 11 by the intake pump 12 is stored in the stock solution tank 31 provided at a high position in the same manner as described above, and the stock solution is supplied from the stock solution tank 31 to the ultraviolet treatment tank 13 under a natural flow. The example of a structure of the ultraviolet irradiation device at the time is shown.

  In this case, similarly to the second embodiment, by providing the return pump 33 in the main return path 32 where the first return path 24, the second return path 25, and the third return path 26 are joined, the processing when an abnormality occurs is provided. The liquid in the liquid storage tank 14 can be returned to the stock solution tank 31. When returning to the intake well 11 without returning to the stock solution tank 31 as in the first embodiment, the return pump 33 is unnecessary.

FIG. 4 is a system diagram showing a first reference example. In this reference example, the interior of the processing liquid inflow chamber 15 partitioned from the processing liquid outflow chamber 16 by the main overflow weir 17 is partitioned into an upstream section 42 and a downstream section 43 by the partition plate 41, and an upstream section An example is shown in which 42 and the downstream section 43 are communicated by a siphon device 44. The siphon device 44 includes a siphon tube 45, a siphon forming device 46, a siphon forming valve 47 and a siphon breaking valve 48, and the uppermost portion of the siphon tube 45 is disposed at a higher position than the liquid level of the stock solution tank 31. .

  The processing liquid during normal operation flows from the upstream section 42 through the siphon tube 45 to the downstream section 43, and flows into the processing liquid outflow chamber 16 through the overflow weir 17 having the same structure as the main overflow weir. It is in a state. When an abnormality occurs, the siphon action of the siphon tube 45 is destroyed by opening the siphon destruction valve 48, and the flow of liquid from the upstream compartment 42 to the downstream compartment 43 is interrupted, so that the untreated liquid is removed. It is possible to prevent contamination in the processing liquid in the downstream section 43 and the processing liquid outflow chamber 16. When the abnormality occurs, the liquid in the upstream section 42 is returned to the stock solution tank 31 through the first return path 24 and the main return path 32 by opening the switching valve 24V and operating the return pump 33.

FIG. 5 is a system diagram showing a second reference example. The second reference example shows an example in which the siphon device 44 is combined with a configuration in which the stock solution is pumped from the intake well 11 to the stock solution tank 31 by the intake pump 12. Also in the present embodiment, the uppermost part of the siphon tube 45 is arranged at a position higher than the liquid level of the stock solution tank 31, and when the abnormality occurs, the siphon destruction valve 48 is opened and the intake pump 12 is stopped. Supply of the undiluted solution to the treatment tank 13 is interrupted, and untreated solution is prevented from being mixed into the treatment solution. Further, the treatment liquid contaminated with the untreated liquid is returned to the stock solution tank 31 by the return pump 33 as described above.

The shutoff valve and siphon breaker valve in each embodiment and each reference example can use valves of various structures such as emergency shutoff valves, air operated valves, motor operated valves, and electromagnetic valves, but they are also closed during power outages. A valve with a structure that can reliably perform the valve operation in a short time should be used. Moreover, the treatment of the treatment liquid mixed with the untreated liquid is arbitrary. For example, when an ultraviolet irradiation device is provided at the rear stage of the wastewater treatment facility, it can be returned to the wastewater inflow portion of the wastewater treatment facility. The waste water which cleaned the liquid storage tank 14 can also perform an appropriate | suitable process.

  Further, when the ultraviolet processing tank 13 is ready for processing during processing of the liquid in the processing liquid storage tank 14 and internal inspection, the bypass valve 28V is opened and the ultraviolet processing liquid is supplied from the bypass path 28. After the inspection and cleaning in the ultraviolet treatment tank 13 are completed, the switching valves 24V, 25V, and 26V are closed, the switching valves 22V and 23V are opened, and the bypass valve 28V is closed. The processing liquid can be led out through a normal route passing through 14. Thereby, the interruption time of an ultraviolet-ray process can be shortened.

  In each of the above embodiments, the bypass type is exemplified as the processing liquid storage tank. However, if the short circuit flow from the processing liquid introduction path 22 to the processing liquid outlet path 23 can be prevented, a rectifying plate type or a stirrer type is adopted. You can also.

It is a systematic diagram which shows the 1st form example of the ultraviolet irradiation device of this invention. It is a systematic diagram which shows the 2nd form example of the ultraviolet irradiation device of this invention. It is a systematic diagram which shows the 3rd example of an ultraviolet irradiation device of this invention. It is a systematic diagram showing a first reference example. It is a systematic diagram showing a second reference example.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 11 ... Intake well, 12 ... Intake pump, 13 ... Ultraviolet treatment tank, 14 ... Treatment liquid storage tank, 15 ... Treatment liquid inflow chamber, 16 ... Treatment liquid outflow chamber, 17 ... Main overflow weir, 18 ... Upstream section, DESCRIPTION OF SYMBOLS 19 ... Downstream section, 20 ... Sub overflow weir, 21 ... Short-circuit prevention board, 22 ... Process liquid introduction path, 23 ... Process liquid derivation path, 24 ... 1st return path, 25 ... 2nd return path, 26 ... 1st 3 return path, 27 ... stock solution introduction path, 28 ... bypass path, 29 ... outlet path, 30 ... treatment liquid delivery path, 31 ... stock solution tank, 32 ... main return path, 33 ... return pump, 41 ... partition plate, 42 ... Upstream compartment, 43 ... downstream compartment, 44 ... siphon device, 45 ... siphon tube, 46 ... siphon forming device, 47 ... siphon forming valve, 48 ... siphon breaking valve

Claims (3)

In an ultraviolet irradiation apparatus that irradiates the raw solution with ultraviolet rays by irradiating the raw solution with ultraviolet rays, a treatment liquid storage tank that stores the treatment liquid that has been subjected to the ultraviolet treatment in the ultraviolet treatment tank is disposed downstream of the ultraviolet treatment tank that irradiates the raw solution with ultraviolet rays. And the processing liquid storage tank is partitioned into a processing liquid inflow chamber and a processing liquid outflow chamber by an overflow overflow weir, and an upstream partition is formed in the processing liquid inflow chamber by a sub overflow overflow weir lower than the overflow overflow weir. An ultraviolet irradiation device characterized by being divided into a downstream compartment . The processing liquid inlet chamber of the treatment liquid according to claim 1 Symbol placement of the ultraviolet irradiation apparatus, characterized in that it comprises a treatment liquid return path for returning the stock side. And wherein above the downstream section, and a short-circuit flow prevention plate for preventing said processing liquid across a secondary weir is shorted flows into the treatment liquid outlet chamber beyond the weir The ultraviolet irradiation device according to claim 1 or 2.

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