JP4843125B2 - Pressure control mechanism of slurry liquid high temperature and high pressure reaction treatment system - Google Patents

Pressure control mechanism of slurry liquid high temperature and high pressure reaction treatment system Download PDF

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JP4843125B2
JP4843125B2 JP04884398A JP4884398A JP4843125B2 JP 4843125 B2 JP4843125 B2 JP 4843125B2 JP 04884398 A JP04884398 A JP 04884398A JP 4884398 A JP4884398 A JP 4884398A JP 4843125 B2 JP4843125 B2 JP 4843125B2
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liquid
pressure
pressure control
temperature
slurry liquid
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JPH11226385A (en
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博史 池田
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Kimura Chemical Plants Co Ltd
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Kimura Chemical Plants Co Ltd
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Description

【０００１】
【発明の属する技術分野】
本発明は、スラリー液を高温高圧で反応処理するスラリー液高温高圧反応処理システム系内の圧力を制御する機構に関する。
【０００２】
【従来の技術】
従来、スラリー液をスラリー液高温高圧反応処理システムで高温高圧反応処理するにあたり、このスラリー液高温高圧反応処理システム系内の圧力を制御するには、スラリー液高温高圧反応処理システム系に背圧弁を設け、このスラリー液高温高圧反応処理システム系内の圧力を一定に保つ機構、又は、スラリー液高温高圧反応処理システム系内の圧力をコントロール弁にてフィードバックすることにより、該系内を制御する機構、更に、スラリー液高温高圧反応処理システム系内の圧力損失で圧力減少させる機構等が行われてきた。
【０００３】
【発明が解決しようとする課題】
しかしながら、この背圧弁により圧力保持する機構、又は、フィードバックによる機構では、スラリー液を高温高圧で処理する場合、この液体を数＋ＭＰａから大気圧近傍にまで減圧するためには、たとえ制御弁を複数個設置して多段減圧しても弁内部のオリフィス部を極端に小さくする必要があって、特にスラリー液高温高圧反応処理システムの流量が少量であれば、その傾向がより顕著となって、目詰まりを起こすという問題点があった。又、圧力損失による機構では、スラリー液高温高圧反応処理システムの高圧部の圧力範囲が圧力損失部のハード形状に依存してしまうために、このスラリー液高温高温高圧反応処理システム系内の圧力変化のコントロールができないという問題点があった。
【０００４】
そこで、本発明はこのような従来のスラリー液高温高圧反応処理システムが有していた課題を解決したものであって、構造が非常に簡単なものとすることができると共に、スラリー液の固形分による閉塞を防ぎ、スラリー液高温高圧反応処理システム系内の圧力を一定に保持することを目的としたスラリー液高温高圧反応処理システムの圧力制御機構を提供するにある。
【０００５】
【課題を解決するための手段】
上記目的を達成するために、本発明のスラリー液高温高圧反応処理システムの圧力制御機構はこのスラリー液高温高圧反応処理システムＡ系外に直列した二つの第１及び第２圧力制御弁１１、１２と、この二つの圧力制御弁１１、１２間の配管を液溜り部１３とし、この液溜り部１３の液を排出する液押出排出装置１４とを備えた圧力制御部９を設け、スラリー液高温高圧反応処理システムＡ系内に流入してくるスラリー液量と同量の排出量を圧力制御部９の第１圧力制御弁１１を解放し液溜り部１３へ導入後、第１圧力制御弁１１を閉鎖して第２圧力制御弁１２を解放と同時に液溜り部１３の液を液押出排出装置１４にて該系外へ強制的に押出、排出してスラリー液高温高圧反応処理システムＡ内の液を間欠的に排出処理する構成としたものである。
【０００６】
【発明の実施の形態】
以下、本発明の実施例について図に基づき説明する。
図中、図１は本発明実施例のスラリー液高温高圧反応処理システムを示すフローチャート図、図２は本発明実施例の圧力制御部を示す概略図、図３は本発明他の実施例の圧力制御部を示す概略図、図４は本発明他の実施例の圧力制御部を示す概略図である。
【０００７】
スラリー液を高温高圧で反応処理するスラリー液高温高圧反応処理システムＡは源液タンク２内のスラリー液をポンプ３を介して供給用配管４を通し高温高圧反応処理機５内へ導く。
６はヒーターであって、スラリー液を加熱している。この高温高圧反応処理機５内では温度を３００℃〜５００℃とし、圧力を１０〜２５ＭＰａの範囲内で高温高圧反応処理している。更に、この高温高圧反応処理機５からの一本の排出配管７より排出液を冷却器８を通り、圧力制御部９へ導く。この圧力制御部９から排出されたドレンは気液分離器１０により分離される。この気液分離器１０では圧力制御部９の排出側で減圧されるために大気圧状態で操作される。
【０００８】
この圧力制御部９は図２に示すように、前方の第１圧力制御弁１１と後方の第２圧力制御弁１２とをスラリー液高温高圧反応処理システムＡ系外の一本の配管中に直列に設け、この二つの圧力制御弁１１、１２間の配管を液溜り部１３とし、この一本の配管中の一部である液溜り部１３に液押出排出装置１４を連結している。この液押出排出装置１４はコンプレッサー（図示せず）等による圧縮エアーを液溜り部１３に直接供給する構造のものであって、液溜り部１３の排出液を強制的に第２圧力制御弁１２側より気液分離器１０へと排出している。
【０００９】
１５は圧縮エアー供給用バルブで圧縮エアーを液溜り部１３に供給する。この際逆止弁１７にて液溜り部１３の排出液をコンプレッサー（図示せず）側へは排出しないようにしている。圧力制御弁１１、１２にはスラリー液の固形分の閉塞を防ぐためボールタイプの弁を使用している。この各圧力制御弁１１、１２及び圧縮エアー供給用バルブ１５は遠隔操作によって自動的にコントロールしてもよい。
【００１０】
而うして、該スラリー液高温高圧反応処理システムＡ系内の排出液は該系内圧力が目的の圧力に達した時点で、第１圧力制御弁１１の開放によって液溜り部１３内へ導かれる。この第１圧力制御弁１１の開放時、第２圧力制御弁１２及び圧縮エアー供給用バルブ１５は閉鎖されている。次に第１圧力制御弁１１を閉鎖して、第２圧力制御弁１２を開放すると同時に圧縮エアー供給用バルブ１５を開放してコンプレッサー（図示せず）等からの圧縮エアーを液溜り部１３内へ導き、この液溜り部１３の排出液を強制的に排出して気液分離器１０へと導くこととなる。
【００１１】
この第１圧力制御弁１１の開放によって液溜り部１３内へ排出された排出液と同量のスラリー液がポンプ３によって高温高圧反応処理機５へ供給され、この圧力制御部９の操作の繰り返しにてスラリー液高温高圧反応処理システムＡ系内の圧力を常時、一定に保つことができる。また、液溜り部１３内の排出液は圧縮エアーによって強制的に排除されるのでスラリー液の固形分による閉塞を防ぐことができる。さらに、液溜り部１３として一本の配管中の一部をそのまま用いているので、構造が非常に簡単であり、しかも小さいのでこの液溜り部１３における排出液保有量が最小限ですみ、排出する液も確実に行われるために操作制御も容易である。
【００１２】
また、この圧力制御部９の液押出排出装置１４は図３に示すように、液溜り部１３にエアーチャンバー１６を連結した構造のものであってもよい。この二つの圧力制御弁１１、１２はボールタイプの弁を使用している。而うして、該スラリー液高温高圧反応処理システムＡ系内の排出液は該系内圧力が目的の圧力に達した時点で、第１圧力制御弁１１の開放によって液溜り部１３内へ導かれる。この第１圧力制御弁１１の開放時、第２圧力制御弁１２は閉鎖されており、エアーチャンバー１６内のエアーは圧縮される。次に第１圧力制御弁１１を閉鎖して、第２圧力制御弁１２を開放すると同時にエアーチャンバー１６内の圧縮されたエアーにて、液溜り部１３の排出液を強制的に排出して気液分離器１０へと導くこととなる。
【００１３】
更に、この圧力制御部９の液押出排出装置１４は図４に示すように、液溜り部１３にエアーチャンバー１６を連結し、このエアーチャンバー１６に定期的にエアーをコンプレッサー等により補充する構造のものであってもよい。この二つの圧力制御弁１１、１２はボールタイプの弁を使用している。
而うして、該スラリー液高温高圧反応処理システムＡ系内の排出液は該系内圧力が目的の圧力に達した時点で、第１圧力制御弁１１の開放によって液溜り部１３内へ導かれる。この第１圧力制御弁１１の開放時、第２圧力制御弁１２は閉鎖されている。次に第１圧力制御弁１１を閉鎖して、第２圧力制御弁１２を開放すると同時にエアーチャンバー１６内の圧縮されたエアーにて、液溜り部１３の排出液を強制的に排出して気液分離器１０へと導くこととなり、しかもエアーチャンバー１６内のエアーが排出液中に溶解して徐々にエアーが少なくなるために、定期的に補充することによって、常時エアーチャンバー１６内のエアーを充分な容量とすることができる。
【００１４】
以上本発明の代表的と思われる実施例について説明したが、本発明は必ずしもこれらの実施例構造のみに限定されるものではなく、本発明にいう前記の構成要件を備え、かつ、本発明にいう目的を達成し、以下にいう効果を有する範囲内において適宜改変して実施することができるものである。又、高温高圧処理システム以外の通常のスラリー液の圧力制御にも適用できる。
【００１５】
【発明の効果】
以上の説明から既に明らかなように、本発明にいうところのスラリー液高温高圧反応処理システムの圧力制御機構はこのスラリー液高温高圧反応処理システム系外に直列した二つの第１及び第２圧力制御弁と、この二つの圧力制御弁間の配管を液溜り部とし、この液溜り部の液を排出する液押出排出装置とを備えた圧力制御部を設け、スラリー液高温高圧反応処理システム系内に流入してくるスラリー液量と同量の排出量を圧力制御部の第１圧力制御弁を解放し液溜り部へ導入後、第１圧力制御弁を閉鎖して第２圧力制御弁を解放と同時に液溜り部の液を液押出排出装置にて該系外へ強制的に押出、排出してスラリー液高温高圧反応処理システム内の液を間欠的に排出処理する構成としたものであるから、一本の配管中の一部である液溜り部をそのまま利用できるために、構造が非常に簡単となり、しかも、液溜り部自体小さくてすみ、排出液保有量も最小限となり、排出する液も確実に行われるために操作制御も容易となると共に、スラリー液の固形分による閉塞を防ぎ、スラリー液高温高圧反応処理システム系内の圧力を一定に保持することができるという顕著な効果を期待することが出来るに至ったのである。
【図面の簡単な説明】
【図１】本発明実施例のスラリー液高温高圧反応処理システムを示すフローチャート図。
【図２】本発明実施例の圧力制御部を示す概略図。
【図３】本発明他の実施例の圧力制御部を示す概略図。
【図４】本発明他の実施例の圧力制御部を示す概略図。
【符号の説明】
Ａ スラリー液高温高圧反応処理システム
２ 原液タンク
３ ポンプ
４ 供給用配管
５ 高温高圧反応処理機
６ ヒーター
７ 排出配管
８ 冷却器
９ 圧力制御部
１０ 気液分離機
１１ 第１圧力制御弁
１２ 第２圧力制御弁
１３ 液溜り部
１４ 液押出排出装置
１５ 圧縮エアー供給用バルブ
１６ エアーチャンバー
１７ 逆止弁[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a mechanism for controlling the pressure in a slurry liquid high-temperature high-pressure reaction processing system that reacts slurry liquid at high temperature and high pressure.
[0002]
[Prior art]
Conventionally, when a slurry liquid is subjected to a high-temperature / high-pressure reaction treatment system using a slurry liquid high-temperature / high-pressure reaction treatment system, in order to control the pressure in the slurry liquid high-temperature / high-pressure reaction treatment system system, A mechanism for maintaining a constant pressure in the slurry liquid high-temperature / high-pressure reaction treatment system, or a mechanism for controlling the inside of the slurry liquid by feeding back the pressure in the slurry liquid high-temperature / high-pressure reaction treatment system using a control valve Furthermore, a mechanism for reducing the pressure by a pressure loss in the slurry liquid high-temperature / high-pressure reaction processing system has been performed.
[0003]
[Problems to be solved by the invention]
However, in the mechanism for holding pressure by this back pressure valve or the mechanism by feedback, when processing the slurry liquid at high temperature and high pressure, in order to depressurize this liquid from several + MPa to near atmospheric pressure, a plurality of control valves are used. It is necessary to make the orifice inside the valve extremely small even if the pressure is reduced by multiple stages, especially when the flow rate of the slurry liquid high-temperature and high-pressure reaction treatment system is small, and this tendency becomes more prominent. There was a problem of causing clogging. In the mechanism based on pressure loss, the pressure range of the high-pressure part of the slurry liquid high-temperature / high-pressure reaction processing system depends on the hardware configuration of the pressure-loss part. There was a problem that it was impossible to control.
[0004]
Therefore, the present invention solves the problems of such a conventional slurry liquid high-temperature and high-pressure reaction processing system, and can have a very simple structure, and the solid content of the slurry liquid. It is an object of the present invention to provide a pressure control mechanism for a slurry liquid high-temperature / high-pressure reaction treatment system for the purpose of preventing clogging due to the above-described problem and keeping the pressure in the slurry liquid high-temperature / high-pressure reaction treatment system constant.
[0005]
[Means for Solving the Problems]
In order to achieve the above object, the pressure control mechanism of the slurry liquid high-temperature / high-pressure reaction processing system of the present invention has two first and second pressure control valves 11, 12 in series outside the slurry liquid high-temperature / high-pressure reaction processing system A system. And a pressure control unit 9 including a pipe between the two pressure control valves 11 and 12 as a liquid reservoir 13 and a liquid extruding and discharging device 14 for discharging the liquid in the liquid reservoir 13. After the first pressure control valve 11 of the pressure control unit 9 is released and introduced into the liquid storage unit 13, the first pressure control valve 11 is released after the first pressure control valve 11 of the pressure control unit 9 is released into the high pressure reaction processing system A system. And the second pressure control valve 12 is released, and at the same time, the liquid in the liquid reservoir 13 is forcibly pushed out and discharged out of the system by the liquid extruding and discharging device 14 to discharge the liquid in the slurry liquid high-temperature and high-pressure reaction processing system A. Also configured to intermittently discharge liquid It is.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
1 is a flow chart showing a slurry liquid high-temperature and high-pressure reaction treatment system according to an embodiment of the present invention, FIG. 2 is a schematic view showing a pressure control unit of the embodiment of the present invention, and FIG. 3 is a pressure of another embodiment of the present invention. FIG. 4 is a schematic diagram showing a pressure control unit according to another embodiment of the present invention.
[0007]
The slurry liquid high-temperature high-pressure reaction processing system A that reacts the slurry liquid at high temperature and high pressure guides the slurry liquid in the source liquid tank 2 into the high-temperature and high-pressure reactor 5 through the supply pipe 4 via the pump 3.
A heater 6 heats the slurry liquid. In the high-temperature and high-pressure reaction treatment machine 5, the temperature is set to 300 ° C. to 500 ° C., and the high-temperature and high-pressure reaction treatment is performed within a pressure range of 10 to 25 MPa. Further, the discharged liquid from one high-temperature and high-pressure reaction processor 5 passes through the cooler 8 and is guided to the pressure control unit 9. The drain discharged from the pressure control unit 9 is separated by the gas-liquid separator 10. The gas-liquid separator 10 is operated in an atmospheric pressure state because the pressure is reduced on the discharge side of the pressure controller 9.
[0008]
As shown in FIG. 2, the pressure control unit 9 includes a front first pressure control valve 11 and a rear second pressure control valve 12 connected in series in a single pipe outside the slurry liquid high temperature / high pressure reaction processing system A system. The pipe between the two pressure control valves 11 and 12 is used as a liquid reservoir 13, and a liquid extrusion / discharge device 14 is connected to the liquid reservoir 13 which is a part of the one pipe . The liquid extrusion / discharge device 14 has a structure in which compressed air from a compressor (not shown) or the like is directly supplied to the liquid reservoir 13, and the liquid discharged from the liquid reservoir 13 is forcibly supplied to the second pressure control valve 12. It is discharged from the side to the gas-liquid separator 10.
[0009]
A compressed air supply valve 15 supplies compressed air to the liquid reservoir 13. At this time, the check valve 17 prevents the liquid discharged from the liquid reservoir 13 from being discharged to the compressor (not shown). Ball type valves are used for the pressure control valves 11 and 12 to prevent clogging of the solid content of the slurry liquid. The pressure control valves 11 and 12 and the compressed air supply valve 15 may be automatically controlled by remote operation.
[0010]
Thus, the discharged liquid in the slurry liquid high-temperature / high-pressure reaction processing system A is introduced into the liquid reservoir 13 by opening the first pressure control valve 11 when the internal pressure reaches the target pressure. . When the first pressure control valve 11 is opened, the second pressure control valve 12 and the compressed air supply valve 15 are closed. Next, the first pressure control valve 11 is closed, the second pressure control valve 12 is opened, and at the same time the compressed air supply valve 15 is opened to allow compressed air from a compressor (not shown) or the like to enter the liquid reservoir 13. The liquid discharged from the liquid reservoir 13 is forcibly discharged and led to the gas-liquid separator 10.
[0011]
By the opening of the first pressure control valve 11, the same amount of slurry liquid as that discharged into the liquid reservoir 13 is supplied to the high-temperature and high-pressure reactor 5 by the pump 3, and the operation of the pressure controller 9 is repeated. The pressure in the slurry liquid high-temperature / high-pressure reaction processing system A can be kept constant at all times. Further, since the discharged liquid in the liquid reservoir 13 is forcibly removed by the compressed air, the clogging due to the solid content of the slurry liquid can be prevented. Further, since a part of one pipe is used as it is as the liquid reservoir 13 , the structure is very simple and small, so that the amount of liquid retained in the liquid reservoir 13 is minimized, and the liquid is discharged. Operation control is easy because the liquid to be used is also reliably performed.
[0012]
Further, the liquid extrusion / discharge device 14 of the pressure controller 9 may have a structure in which an air chamber 16 is connected to the liquid reservoir 13 as shown in FIG. The two pressure control valves 11 and 12 are ball type valves. Thus, the discharged liquid in the slurry liquid high-temperature / high-pressure reaction processing system A is introduced into the liquid reservoir 13 by opening the first pressure control valve 11 when the internal pressure reaches the target pressure. . When the first pressure control valve 11 is opened, the second pressure control valve 12 is closed, and the air in the air chamber 16 is compressed. Next, the first pressure control valve 11 is closed, the second pressure control valve 12 is opened, and at the same time, the discharged liquid in the liquid reservoir 13 is forcibly discharged by the compressed air in the air chamber 16. This leads to the liquid separator 10.
[0013]
Further, as shown in FIG. 4, the liquid extrusion / discharge device 14 of the pressure control unit 9 has a structure in which an air chamber 16 is connected to the liquid reservoir 13 and air is periodically replenished to the air chamber 16 by a compressor or the like. It may be a thing. The two pressure control valves 11 and 12 are ball type valves.
Thus, the discharged liquid in the slurry liquid high-temperature / high-pressure reaction processing system A is introduced into the liquid reservoir 13 by opening the first pressure control valve 11 when the internal pressure reaches the target pressure. . When the first pressure control valve 11 is opened, the second pressure control valve 12 is closed. Next, the first pressure control valve 11 is closed, the second pressure control valve 12 is opened, and at the same time, the discharged liquid in the liquid reservoir 13 is forcibly discharged by the compressed air in the air chamber 16. Since the air in the air chamber 16 is dissolved in the discharged liquid and gradually decreases, the air in the air chamber 16 is always replenished by regularly replenishing the air. A sufficient capacity can be obtained.
[0014]
Although the embodiments considered to be representative of the present invention have been described above, the present invention is not necessarily limited only to the structures of these embodiments, and includes the above-described configuration requirements according to the present invention. It can be carried out with appropriate modifications within the scope of achieving the purpose and having the following effects. Moreover, it is applicable also to the pressure control of normal slurry liquids other than a high temperature / high pressure processing system.
[0015]
【The invention's effect】
As is clear from the above description, the pressure control mechanism of the slurry liquid high-temperature / high-pressure reaction processing system according to the present invention has two first and second pressure controls in series outside the slurry liquid high-temperature / high-pressure reaction processing system. A pressure control unit including a valve and a pipe between the two pressure control valves as a liquid reservoir, and a liquid extrusion / discharge device for discharging the liquid in the liquid reservoir, After releasing the first pressure control valve of the pressure control unit and introducing it into the liquid reservoir, the first pressure control valve is closed and the second pressure control valve is released. At the same time, the liquid in the liquid reservoir is forcibly extruded and discharged out of the system by the liquid extrusion / discharge device, so that the liquid in the slurry liquid high-temperature / high-pressure reaction processing system is intermittently discharged. , liquid reservoir portion which is a part in a single pipe To be used as it, the structure becomes very simple, yet, with corner in the liquid reservoir itself small, the discharged liquid held amount is minimized, the operation control is facilitated in order to be reliably performed even liquid discharged, It has been possible to expect a remarkable effect that the clogging due to the solid content of the slurry liquid can be prevented and the pressure in the slurry liquid high-temperature and high-pressure reaction processing system can be kept constant.
[Brief description of the drawings]
FIG. 1 is a flowchart showing a slurry liquid high-temperature high-pressure reaction treatment system according to an embodiment of the present invention.
FIG. 2 is a schematic diagram showing a pressure control unit according to an embodiment of the present invention.
FIG. 3 is a schematic diagram illustrating a pressure control unit according to another embodiment of the present invention.
FIG. 4 is a schematic view showing a pressure control unit according to another embodiment of the present invention.
[Explanation of symbols]
A slurry liquid high-temperature high-pressure reaction processing system 2 stock solution tank 3 pump 4 supply pipe 5 high-temperature high-pressure reaction processor 6 heater 7 discharge pipe 8 cooler 9 pressure controller 10 gas-liquid separator 11 first pressure control valve 12 second pressure Control valve 13 Liquid reservoir 14 Liquid extrusion / discharge device 15 Compressed air supply valve 16 Air chamber 17 Check valve

Claims (1)

スラリー液を高温高圧処理するスラリー液高温高圧反応処理システム系内の圧力を一定に保持制御する機構であって、このスラリー液高温高圧反応処理システム(A)系外に直列した二つの第１及び第２圧力制御弁(11)、(12)と、この二つの圧力制御弁(11)、(12)間の配管を液溜り部(13)とし、この液溜り部(13)の液を排出する液押出排出装置(14)とを備えた圧力制御部(9)を設け、スラリー液高温高圧反応処理システム(A)系内に流入してくるスラリー液量と同量の排出量を圧力制御部(9)の第１圧力制御弁(11)を解放し液溜り部(13)へ導入後、第１圧力制御弁(11)を閉鎖して第２圧力制御弁(12)を解放と同時に液溜り部(13)の液を液押出排出装置(14)にて該系外へ強制的に押出、排出してスラリー液高温高圧反応処理システム(A)内の液を間欠的に排出処理することを特徴としたスラリー液高温高圧反応処理システムの圧力制御機構。A mechanism for maintaining and controlling the pressure in the slurry liquid high-temperature / high-pressure reaction processing system system for processing the slurry liquid at high temperature / high pressure, wherein two first and The second pressure control valve (11), (12) and the pipe between the two pressure control valves (11), (12) are used as a liquid reservoir (13), and the liquid in the liquid reservoir (13) is discharged. Pressure control unit (9) equipped with a liquid extrusion discharge device (14) to perform pressure control of the same amount of slurry liquid flowing into the slurry liquid high-temperature and high-pressure reaction processing system (A) system After releasing the first pressure control valve (11) of the part (9) and introducing it into the liquid reservoir (13), the first pressure control valve (11) is closed and the second pressure control valve (12) is released simultaneously. The liquid in the liquid reservoir (13) is forcibly extruded and discharged out of the system by the liquid extrusion discharge device (14), and the liquid in the slurry liquid high-temperature and high-pressure reaction processing system (A) is intermittently discharged. Specially The pressure control mechanism of the slurry liquid high temperature and high pressure reaction treatment system.
JP04884398A 1998-02-13 1998-02-13 Pressure control mechanism of slurry liquid high temperature and high pressure reaction treatment system Expired - Lifetime JP4843125B2 (en)

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