JP4834078B2 - ストラクチャード研磨物品を作る方法 - Google Patents
ストラクチャード研磨物品を作る方法 Download PDFInfo
- Publication number
- JP4834078B2 JP4834078B2 JP2008506445A JP2008506445A JP4834078B2 JP 4834078 B2 JP4834078 B2 JP 4834078B2 JP 2008506445 A JP2008506445 A JP 2008506445A JP 2008506445 A JP2008506445 A JP 2008506445A JP 4834078 B2 JP4834078 B2 JP 4834078B2
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- JP
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- Prior art keywords
- binder formulation
- abrasive
- binder
- acrylate
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000000758 substrate Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 29
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- 230000005855 radiation Effects 0.000 claims description 19
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- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 4
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- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 150000003503 terephthalic acid derivatives Chemical class 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000004385 trihaloalkyl group Chemical group 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000000811 xylitol Substances 0.000 description 1
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 description 1
- 235000010447 xylitol Nutrition 0.000 description 1
- 229960002675 xylitol Drugs 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D2203/00—Tool surfaces formed with a pattern
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Epoxy Resins (AREA)
- Laminated Bodies (AREA)
Description
Q1は、水素原子、1から6個の炭素原子を有するアルキル基(メチル、エチル、プロピル又はブチル基のような)、1から6個の炭素原子を有するフルオロアルキル基、アリル基、アリール基、フリル基又はチエニル基を表し、
Q2は、1から6個の炭素原子を有するアルキレン基(メチレン、エチレン、プロピレン又はブチレン基のような)、又はエーテル結合を含有するアルキレン基、例えばオキシアルキレン基、例としてオキシエチレン、オキシプロピレンもしくはオキシブチレン基のようなもの、を表し、
Zは、酸素原子又は硫黄原子を表し、そして、
R2は、水素原子、1〜6個の炭素原子を有するアルキル基(例えばメチル基、エチル基、プロピル基又はブチル基)、2〜6個の炭素原子を有するアルケニル基(例えば1−プロペニル基、2−プロペニル基、2−メチル−1−プロペニル基、2−メチル−2−プロペニル基、1−ブテニル基、2−ブテニル基又は3−ブテニル基)、6〜18個の炭素原子を有するアリール基(例えばフェニル基、ナフチル基、アントラニル基又はフェナントリル基)、7〜18個の炭素原子を有する置換もしくは非置換アラルキル基(例えばベンジル基、フルオロベンジル基、メトキシベンジル基、フェネチル基、スチリル基、シンナミル基、エトキシベンジル基)、アリールオキシアルキル基(例えばフェノキシメチル基又はフェノキシエチル基)、2〜6個の炭素原子を有するアルキルカルボニル基(例えばエチルカルボニル基、プロピルカルボニル基又はブチルカルボニル基)、2〜6個の炭素原子を有するアルコキシカルボニル基(例えばエトキシカルボニル基、プロポキシカルボニル基又はブトキシカルボニル基)、2〜6個の炭素原子を有するN−アルキルカルバモイル基(例えばエチルカルバモイル基、プロピルカルバモイル基、ブチルカルバモイル基又はペンチルカルバモイル基)、又は2〜1000個の炭素原子を有するポリエーテル基を表す。
一つの特に有用なオキセタンには、3−エチル−3−(2−エチルヘキシルオキシメチル)オキセタンが含まれる。
Q3は、水素原子、1から18個の炭素原子を有するアルキル基、又は1から18個の炭素原子を有するアルコキシル基を表し、
Mは、金属原子、例えばアンチモンを表し、
Zは、ハロゲン原子、例えばフッ素を表し、そして、
tは、該金属の原子価数であり、例えばアンチモンの場合において5である。
により表される化合物が挙げられる。
例1〜5は、ポリマー成分及びナノサイズの粒子状フィラーを含む典型的な結合剤配合物を説明する。
典型的な結合剤配合物は、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキシルカルボキシレート及び40wt%のコロイドシリカ粒子状フィラーを含むエポキシ樹脂の、Hanse Chemieから入手できるナノポックス(Nanopox)XP 22/0314を含む。結合剤配合物はまた、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキシルカルボキシレートを含み粒子状フィラーを含まない、UVR 6105も含む。結合剤配合物は更に、ポリオール(4,8−ビス(ヒドロキシメチル)トリシクロ(5.2.1.0)デカン)、カチオン光開始剤(チヴァキュア(Chivacure)1176)、ラジカル光開始剤(Cibaから入手できるイルガキュア(Irgacure)2022(登録商標))、及びアクリレート前駆体(SR 399、ペンシルベニア州エクストンのAtofina−Sartomerから入手できるジペンタエリトリトールペンタアクリレート)を含む。表1は、結合剤配合物の成分の濃度を示すものである。
別の例において、結合剤配合物は、テラタン(Terathane)250、テラタン(Terathane)1000、4,8−ビス(ヒドロキシメチル)トリシクロ(5.2.1.0)デカン、2−エチル−1,3−ヘキサンジオール及び1,5−ペンタンジオールからなる群から選択された1種のポリオールを含む。選択したポリオールを、ナノポックス(Nanopox)XP 22/0314、イルガキュア(Irgacure)2022、チヴァキュア(Chivacure)1176及びナノクリル(Nanocryl)XP 21/0940と混合する。ナノクリル(Nanocryl)XP 21/0940は、ベルリンのHanse Chemieから入手できる、50wt%のコロイドシリカ粒子状フィラーを含むアクリレート前駆体(テトラアクリレート)である。それらの濃度は、表2に示されている。
この例では、3種のアクリレート樹脂(おのおのが50wt%のコロイドシリカ粒子状フィラーを含み、そしておのおのがHanse Chemieから入手できる、ナノクリル(Nanocryl)XP 21/0940(テトラアクリレート)、ナノクリル(Nanocryl)XP 21/0930(ジアクリレート)、及びナノクリル(Nanocryl)XP 21/0954(トリメチロールプロパンエトキシトリアクリレート))が試験される。結合剤配合物は更に、ナノポックス(Nanopox)XP 22/0314、1,5−ペンタンジオール、イルガキュア(Irgacure)2022及びチヴァキュア(Chivacure)1176を含む。それらの組成は、表3に示されている。
更なる例において、ナノサイズのシリカの粒子状フィラーを有する2種のエポキシ成分(おのおのがHanse Chemieから入手できる、ナノポックス(Nanopox)XP 22/0314及びナノポックス(Nanopox)22/0516(ビスフェノールAジグリシジルエーテル))の濃度を変動させる。加えて、オキセタン成分OXT−212(3−エチル−3−(2−エチルヘキシルオキシメチル)オキセタン)を含める。ポリオール(テラタン(Terathane)250)及び光触媒(チヴァキュア(Chivacure)1176)を含める。それらの組成は、表4に示されている。
別の例において、表5に示された結合剤配合物を有するサイズコートを用いて試料を作製する。結合剤配合物は、ナノポックス(Nanopox)A 610の添加によって供給されるナノサイズのフィラー粒子及び3ミクロンのおおよその平均粒子サイズを有するミクロンサイズのフィラー(NP−30及びATH S−3)の両方を含む。NP−30は、約3ミクロンの平均粒子サイズを有する球状シリカ粒子を含む。ATH S−3は、約3ミクロンの平均粒子サイズを有する非球状アルミナ無水物粒子を含む。この試料は、8.9GPa(1300ksi)のヤング率、77.2MPa(11.2ksi)の引張り強さ、及び1%の破断点伸びを有する。
Claims (14)
- 表面構造を有する研磨物品を作製する方法であって、
少なくとも5wt%の、溶液で生成した平均粒子サイズが100nm未満の粒子状フィラーを含む結合剤配合物を基材にコーティングすること、
該結合剤配合物を化学線によって部分的に硬化させること、及び、
部分硬化した結合剤配合物にパターンを形成すること、
を含む表面構造を有する研磨物品の作製方法。 - パターンを形成後に結合剤配合物を完全に硬化させることを更に含む、請求項1に記載の方法。
- パターンを形成後に結合剤配合物を完全に硬化させることが、結合剤配合物を化学線に暴露することを含む、請求項2に記載の方法。
- パターンを形成後に結合剤配合物を完全に硬化させることが、熱硬化させることを含む、請求項2に記載の方法。
- 結合剤配合物上に砥粒を塗布することを更に含む、請求項1に記載の方法。
- 砥粒を塗布することが、結合剤配合物を部分的に硬化させる前に該砥粒を塗布することを含む、請求項5に記載の方法。
- 砥粒上にサイズコートを適用することを更に含む、請求項5に記載の方法。
- サイズコートを適用することが、結合剤配合物を部分的に硬化させる前にサイズコートを適用することを含む、請求項7に記載の方法。
- 結合剤配合物を部分的に硬化させることが、結合剤配合物を少なくとも約1.1の粘度指数まで部分的に硬化させることを含む、請求項1に記載の方法。
- 結合剤配合物を砥粒と混合して研磨材スラリーを作ることを更に含む、請求項1に記載の方法。
- パターンを形成することが、加熱したパターニング工具を用いてパターンを形成することを含む、請求項1に記載の方法。
- パターンを形成することがロトグラビアで刻みつけることを含む、請求項1に記載の方法。
- パターンを形成することがパターンをスタンピングすることを含む、請求項1に記載の方法。
- 結合剤配合物をコーティングする前に基材にコンプライアントコートをコーティングすることを更に含む、請求項1に記載の方法。
Applications Claiming Priority (3)
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US67112805P | 2005-04-14 | 2005-04-14 | |
US60/671,128 | 2005-04-14 | ||
PCT/US2006/002835 WO2006112909A1 (en) | 2005-04-14 | 2006-01-27 | Method of forming structured abrasive article |
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JP2008537911A JP2008537911A (ja) | 2008-10-02 |
JP4834078B2 true JP4834078B2 (ja) | 2011-12-07 |
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EP (1) | EP1868770B1 (ja) |
JP (1) | JP4834078B2 (ja) |
KR (1) | KR100927109B1 (ja) |
CN (1) | CN100560297C (ja) |
AR (1) | AR052367A1 (ja) |
AT (1) | ATE477084T1 (ja) |
AU (1) | AU2006237653B2 (ja) |
BR (1) | BRPI0608177A2 (ja) |
CA (1) | CA2603275C (ja) |
DE (1) | DE602006016091D1 (ja) |
DK (1) | DK1868770T3 (ja) |
ES (1) | ES2349429T3 (ja) |
MX (1) | MX2007012843A (ja) |
NZ (1) | NZ562513A (ja) |
PL (1) | PL1868770T3 (ja) |
RU (1) | RU2374062C2 (ja) |
TW (1) | TWI294331B (ja) |
WO (1) | WO2006112909A1 (ja) |
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US9359689B2 (en) | 2011-10-26 | 2016-06-07 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
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EP2307519A4 (en) * | 2008-07-22 | 2014-02-05 | Saint Gobain Abrasives Inc | COATED ABRASIVE PRODUCTS CONTAINING AGGREGATES |
US8348723B2 (en) * | 2009-09-16 | 2013-01-08 | 3M Innovative Properties Company | Structured abrasive article and method of using the same |
MX2012007287A (es) * | 2009-12-29 | 2012-07-30 | Saint Gobain Abrasifs Sa | Articulo abrasivo revestido duradero. |
US20130059506A1 (en) * | 2010-05-11 | 2013-03-07 | 3M Innovative Properties Company | Fixed abrasive pad with surfactant for chemical mechanical planarization |
CN102172897B (zh) * | 2011-02-23 | 2013-07-10 | 厦门致力金刚石科技股份有限公司 | 一种钎焊金刚石软磨片及其制造方法 |
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WO2013049526A2 (en) | 2011-09-29 | 2013-04-04 | Saint-Gobain Abrasives, Inc. | Abrasive products and methods for finishing hard surfaces |
US9630297B2 (en) * | 2011-12-29 | 2017-04-25 | 3M Innovative Properties Company | Coated abrasive article and method of making the same |
US9321947B2 (en) | 2012-01-10 | 2016-04-26 | Saint-Gobain Abrasives, Inc. | Abrasive products and methods for finishing coated surfaces |
RU2595788C2 (ru) | 2012-03-16 | 2016-08-27 | Сэнт-Гобэн Эбрейзивс, Инк. | Абразивные продукты и способы чистовой обработки поверхностей |
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US20160068702A1 (en) * | 2014-09-05 | 2016-03-10 | Actega Kelstar, Inc. | Rough tactile radiation curable coating |
EP3551709B1 (en) * | 2016-12-07 | 2021-07-28 | 3M Innovative Properties Company | Flexible abrasive article |
CN106826540A (zh) * | 2017-02-15 | 2017-06-13 | 蓝思科技(长沙)有限公司 | 一种光固型树脂研磨垫及其制备方法 |
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JP2000507885A (ja) * | 1997-01-07 | 2000-06-27 | ノートン カンパニー | パターン化された研磨表面の製造 |
Cited By (6)
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US9202688B2 (en) | 2010-04-23 | 2015-12-01 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
US9328432B2 (en) | 2010-04-23 | 2016-05-03 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
US9617657B2 (en) | 2010-04-23 | 2017-04-11 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
US9856581B2 (en) | 2010-04-23 | 2018-01-02 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
US10753012B2 (en) | 2010-10-27 | 2020-08-25 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
US9359689B2 (en) | 2011-10-26 | 2016-06-07 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
Also Published As
Publication number | Publication date |
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CA2603275C (en) | 2010-07-13 |
AU2006237653B2 (en) | 2010-05-20 |
ES2349429T3 (es) | 2011-01-03 |
NZ562513A (en) | 2010-10-29 |
MX2007012843A (es) | 2007-11-15 |
EP1868770A1 (en) | 2007-12-26 |
RU2007137995A (ru) | 2009-05-20 |
CN101175608A (zh) | 2008-05-07 |
DE602006016091D1 (de) | 2010-09-23 |
KR100927109B1 (ko) | 2009-11-18 |
TW200640617A (en) | 2006-12-01 |
ATE477084T1 (de) | 2010-08-15 |
BRPI0608177A2 (pt) | 2009-11-17 |
JP2008537911A (ja) | 2008-10-02 |
CA2603275A1 (en) | 2006-10-26 |
AU2006237653A1 (en) | 2006-10-26 |
WO2006112909A1 (en) | 2006-10-26 |
RU2374062C2 (ru) | 2009-11-27 |
TWI294331B (en) | 2008-03-11 |
EP1868770B1 (en) | 2010-08-11 |
PL1868770T3 (pl) | 2011-05-31 |
DK1868770T3 (da) | 2010-11-22 |
KR20070121841A (ko) | 2007-12-27 |
CN100560297C (zh) | 2009-11-18 |
AR052367A1 (es) | 2007-03-14 |
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