JP4824227B2 - 研摩材の流れによる高精度研削装置及び方法 - Google Patents

研摩材の流れによる高精度研削装置及び方法 Download PDF

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JP4824227B2
JP4824227B2 JP2001269790A JP2001269790A JP4824227B2 JP 4824227 B2 JP4824227 B2 JP 4824227B2 JP 2001269790 A JP2001269790 A JP 2001269790A JP 2001269790 A JP2001269790 A JP 2001269790A JP 4824227 B2 JP4824227 B2 JP 4824227B2
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processing
cylinder
primary
piston
conditioning
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JP2002126994A (ja
JP2002126994A5 (enExample
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エル ウォルチ ウイリアム
エム グリーンスレット ジョン
ジェイ ルスニカ ジュニア エドワード
エス アブト ルース
ジェイ ボス ローレンス
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エクストルード ホーン コーポレイション
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00—Selection of abrasive materials or additives for abrasive blasts
    • B24C11/005—Selection of abrasive materials or additives for abrasive blasts of additives, e.g. anti-corrosive or disinfecting agents in solid, liquid or gaseous form
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/116—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using plastically deformable grinding compound, moved relatively to the workpiece under the influence of pressure

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2001269790A 2000-09-06 2001-09-06 研摩材の流れによる高精度研削装置及び方法 Expired - Lifetime JP4824227B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US23035300P 2000-09-06 2000-09-06
US60/230353 2000-09-06
US09/931,204 US6500050B2 (en) 2000-09-06 2001-08-16 High precision abrasive flow machining apparatus and method
US09/931204 2001-08-16

Publications (3)

Publication Number Publication Date
JP2002126994A JP2002126994A (ja) 2002-05-08
JP2002126994A5 JP2002126994A5 (enExample) 2008-10-23
JP4824227B2 true JP4824227B2 (ja) 2011-11-30

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JP2001269790A Expired - Lifetime JP4824227B2 (ja) 2000-09-06 2001-09-06 研摩材の流れによる高精度研削装置及び方法

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US (1) US6500050B2 (enExample)
EP (1) EP1186377B1 (enExample)
JP (1) JP4824227B2 (enExample)
CN (1) CN1137800C (enExample)
AT (1) ATE529219T1 (enExample)

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AU2003247243A1 (en) 2002-07-03 2004-01-23 Siemens Aktiengesellschaft Method for the hydro-erosive rounding of an edge of a part and use thereof
DE10323743B4 (de) * 2003-05-24 2007-01-18 Daimlerchrysler Ag Freilegemasse, Freilegeverfahren und Freilegevorrichtung
EP1664686B1 (en) * 2003-09-23 2013-05-01 Extrude Hone Corporation Method and apparatus for measuring flow rate through a workpiece orifice
US20050186269A1 (en) * 2004-02-25 2005-08-25 Udell Ronald G. Stabilized feverfew formulations
US7427227B2 (en) * 2005-08-30 2008-09-23 Denso Corporation Method and apparatus for fluid polishing
US7763453B2 (en) * 2005-11-30 2010-07-27 Micronics, Inc. Microfluidic mixing and analytic apparatus
JP4569462B2 (ja) * 2005-12-19 2010-10-27 株式会社デンソー 流体研磨加工方法及び装置
CN101595239B (zh) * 2007-01-29 2013-01-02 东曹Smd有限公司 超光滑面溅射靶及其制造方法
CN100546764C (zh) * 2007-03-21 2009-10-07 浙江工业大学 基于流场约束型液动磨粒流的表面光整加工系统
CN102229096B (zh) * 2011-07-05 2013-10-16 大连隆正光饰机制造有限公司 自动光饰机加工中心水循环系统
EP2594365B1 (de) * 2011-11-15 2014-02-19 Rolls-Royce Deutschland Ltd & Co KG Verfahren zur Ermittlung eines Strömungsverhaltens eines Mediums
CN103286642B (zh) * 2013-05-14 2015-09-23 太原理工大学 一种液体磁性磨具孔光整加工装置
US9132528B2 (en) 2013-10-08 2015-09-15 General Electric Company Refurbishing system
CN103612164B (zh) * 2013-12-03 2015-12-30 浙江工业大学 电涡流加热约束构件的曲面湍流抛光装置
US9687953B2 (en) * 2014-06-27 2017-06-27 Applied Materials, Inc. Chamber components with polished internal apertures
CN104440414B (zh) * 2014-12-07 2016-11-09 陆颖 一种恒压差间歇式旋转挤压磨料流抛光装置
CN104896303B (zh) * 2015-06-11 2017-04-12 湖南拓奇新创科技股份有限公司 一种抛光辅料自动排放装置
EP3349942B1 (en) * 2015-08-25 2023-07-19 Sundaram-Clayton Limited Method for machining a component
CN106041712B (zh) * 2016-06-05 2018-06-19 广州一通活塞环有限公司 一种汽车活塞环珩磨机自动供料装置
CN214848503U (zh) 2018-08-29 2021-11-23 应用材料公司 注入器设备、基板处理设备及在机器可读介质中实现的结构
CN113696089A (zh) * 2021-11-01 2021-11-26 杭州奔涌机械有限公司 一种磨料抛光设备
CN114750078B (zh) * 2022-06-13 2022-10-21 中国航发上海商用航空发动机制造有限责任公司 喷嘴、喷挡阀、以及光整装置
CN114750063B (zh) * 2022-06-13 2022-09-13 中国航发上海商用航空发动机制造有限责任公司 光整装置以及光整方法
CN114734366B (zh) * 2022-06-13 2022-09-06 中国航发上海商用航空发动机制造有限责任公司 光整装置、光整方法以及密封系统
CN114734365B (zh) * 2022-06-13 2022-09-09 中国航发上海商用航空发动机制造有限责任公司 微细内流道的表面光整方法、微细内流道工件及光整介质
CN116638431A (zh) * 2023-07-10 2023-08-25 浙江工业大学 一种用于磨粒流抛光的低温制冷循环装置及其工作方法

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JP3265628B2 (ja) * 1992-07-20 2002-03-11 トヨタ自動車株式会社 砥粒流動体を用いた加工装置及び加工方法
US5367833A (en) 1993-10-22 1994-11-29 Extrude Hone Corporation Unidirectional abrasive flow machining
JPH07266216A (ja) * 1994-03-31 1995-10-17 Hitachi Ltd 砥粒流動加工装置
US5494102A (en) * 1995-03-27 1996-02-27 Schulte; Warren H. Downhole hydraulically operated fluid pump
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US6132482A (en) 1996-11-12 2000-10-17 Dynetics Corporation Abrasive liquid slurry for polishing and radiusing a microhole
US6273787B1 (en) * 1998-08-26 2001-08-14 Extrude Hone Corp Abrasive polishing method, apparatus and composition

Also Published As

Publication number Publication date
JP2002126994A (ja) 2002-05-08
EP1186377B1 (en) 2011-10-19
CN1347788A (zh) 2002-05-08
CN1137800C (zh) 2004-02-11
US6500050B2 (en) 2002-12-31
US20020028633A1 (en) 2002-03-07
EP1186377A3 (en) 2004-01-02
ATE529219T1 (de) 2011-11-15
EP1186377A2 (en) 2002-03-13

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