JP4789725B2 - 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法 - Google Patents

感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法 Download PDF

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Publication number
JP4789725B2
JP4789725B2 JP2006194587A JP2006194587A JP4789725B2 JP 4789725 B2 JP4789725 B2 JP 4789725B2 JP 2006194587 A JP2006194587 A JP 2006194587A JP 2006194587 A JP2006194587 A JP 2006194587A JP 4789725 B2 JP4789725 B2 JP 4789725B2
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resin composition
photosensitive resin
pattern
composition
polymerization initiator
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JP2008020838A (ja
JP2008020838A5 (enrdf_load_stackoverflow
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那央 本田
昌彦 浦田
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Nippon Kayaku Co Ltd
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Nippon Kayaku Co Ltd
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  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
JP2006194587A 2006-07-14 2006-07-14 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法 Active JP4789725B2 (ja)

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JP2006194587A JP4789725B2 (ja) 2006-07-14 2006-07-14 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法

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JP2006194587A JP4789725B2 (ja) 2006-07-14 2006-07-14 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法

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JP2008020838A JP2008020838A (ja) 2008-01-31
JP2008020838A5 JP2008020838A5 (enrdf_load_stackoverflow) 2009-05-14
JP4789725B2 true JP4789725B2 (ja) 2011-10-12

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Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010095385A1 (ja) 2009-02-20 2010-08-26 サンアプロ株式会社 スルホニウム塩，光酸発生剤及び感光性樹脂組成物
JP5827791B2 (ja) * 2009-05-15 2015-12-02 富士フイルム株式会社 ネガ型パターン形成方法
JP5630068B2 (ja) * 2010-04-28 2014-11-26 Jsr株式会社 ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
JP5967824B2 (ja) 2012-10-26 2016-08-10 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP5901070B2 (ja) 2012-10-26 2016-04-06 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP5939964B2 (ja) * 2012-11-22 2016-06-29 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP5939963B2 (ja) * 2012-11-22 2016-06-29 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP6021180B2 (ja) * 2012-11-22 2016-11-09 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP6066413B2 (ja) * 2012-11-22 2017-01-25 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
JP5939965B2 (ja) * 2012-11-22 2016-06-29 日本化薬株式会社 感光性樹脂組成物、レジスト積層体及びそれらの硬化物
US10442941B2 (en) * 2015-03-20 2019-10-15 Blue Cube Ip Llc Curable compositions
US20240027901A1 (en) 2020-12-14 2024-01-25 San-Apro Ltd. Photoacid generator, and photosensitive composition using same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001209718A (ja) * 2000-01-24 2001-08-03 Soriton Syst:Kk 予約の確保と解除の方法
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
CN1989145B (zh) * 2004-05-28 2010-06-23 三亚普罗株式会社 新颖的氟代烷基氟磷酸鎓盐和过渡金属络合物盐

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