JP4786955B2 - Functional water generating apparatus and functional water generating method using the same - Google Patents

Description

The present invention, the functional fluid (carbon dioxide gas, hydrogen, ozone, oxygen, functional gas selected from ammonia, or ammonia, function liquid is selected from hydrofluoric acid) were dissolved or mixed in ultrapure water The present invention relates to a functional water generating device that generates functional water and a functional water generating method using the same. More specifically, by precisely controlling the amount of dissolution or mixing of the ultra-pure water of the functional fluid, together it is possible to generate the functional water of the correct functional fluid density, compact and inexpensive functional water The present invention relates to a generation device and an efficient functional water generation method using the same.

  Functional water (water with various functions added) is used in various industrial fields. For example, in the field of semiconductor manufacturing, ultrapure water is used for cleaning a substrate. However, if ultrapure water is used as it is, since the specific resistance of ultrapure water is high, static electricity is generated on the surface of the object to be cleaned. There is an inconvenience of causing dielectric breakdown in the wiring of the semiconductor, and in order to eliminate such an inconvenience, carbon dioxide is dissolved in ultrapure water to obtain a functional water to which a function of reducing specific resistance is added. Used for cleaning.

As such a functional water generating device and a functional water generating method, for example, a flow rate sensor that measures a flow rate in advance in an ultrapure water flow path, a carbon dioxide gas injector that directly injects carbon dioxide gas, a specific resistance measuring instrument, Are sequentially disposed, the carbon dioxide injection amount is measured by a carbon dioxide mass flow meter, the carbon dioxide injection amount is calculated from the flow rate fluctuation value in the ultrapure water path, the specific resistance measurement value, and the specific resistance setting value, A method of obtaining ultrapure water having a predetermined specific resistance value by matching a measured value of a carbon dioxide gas mass flow meter with this calculated value in real time is disclosed (see Patent Document 1). In addition, a means for generating ultrapure water to which carbon dioxide gas is added so that the specific resistance value is lower than the target value, and the carbon dioxide added water are uniformly mixed with the ultrapure water raw water to obtain a desired ratio. An apparatus for producing ultrapure water having a resistance value is disclosed (see Patent Document 2).
Japanese Examined Patent Publication No. 7-67554 JP-A-10-324502

  However, in the method disclosed in Patent Document 1, a flow rate sensor that measures the flow rate of ultrapure water, a mass flow meter that measures the amount of carbon dioxide gas, a specific resistance measuring instrument that measures the specific resistance of ultrapure water, and these Since the controlling microcomputer is used, the functional water production apparatus itself must be large and expensive, and the flow rate of carbon dioxide gas is controlled according to the change in specific resistance. There was a problem that the specific resistance value fluctuated due to a time delay in the increase / decrease. In addition, in the apparatus disclosed in Patent Document 2, the raw ultrapure water is distributed, and the carbon dioxide gas passed through the pressure regulating valve for keeping the pressure of the carbon dioxide gas constant in one ultrapure water is dissolved. Since carbon dioxide high-concentration added water is manufactured and combined with raw water that has passed through the bypass pipe, it is difficult to control the flow rate of carbon dioxide gas in response to changes in the flow rate in the system, and the specific resistance value There was a problem that it was difficult to precisely control.

The present invention has been made to solve the above problems, and precisely control the amount of dissolution or mixing of the ultra-pure water of the functional fluid, to generate the functional water of the correct functional fluid density An object of the present invention is to provide a small and inexpensive functional water generating apparatus and an efficient functional water generating method using the same.

  In order to achieve the above object, according to the present invention, the following functional water generating device and a functional water generating method using the same are provided.

[1] Functional water is generated by dissolving or mixing a functional fluid that is a gas selected from carbon dioxide, hydrogen, ozone, oxygen, and ammonia, or a liquid selected from ammonia and hydrofluoric acid, in ultrapure water. A functional water generating device comprising: an ultrapure water main flow path as a main flow path of the ultra pure water; an ultra pure water branch flow path branched from the ultra pure water main flow path; and a flow path of the functional fluid. The functional fluid flow path is disposed in communication with the ultrapure water branch flow path and communicated with the functional fluid flow path through a communication path different from the communication of the ultra pure water branch flow path. Fluid flow rate control means for controlling the flow rate of the functional fluid corresponding to the flow rate of ultrapure water in the ultrapure water branch flow path, and the location of the fluid flow rate control means in the ultrapure water branch flow path In addition to the communication of the ultrapure water branch flow path. The functional fluid whose flow rate is controlled by the fluid flow rate control means is added to the ultrapure water (first ultrapure water) that flows through the ultrapure water branch flow channel that communicates with the functional fluid flow channel through a channel. Mixing means for generating first functional water by dissolving or mixing, and supplying the first functional water from the mixing means to the ultrapure water (second ultrapure water) flowing through the ultrapure water main flow path. A functional water generator (hereinafter also referred to as “first invention”) characterized by generating second functional water by introducing, dissolving or mixing.

[2] Functional water is generated by dissolving or mixing a functional fluid that is a gas selected from carbon dioxide, hydrogen, ozone, oxygen, and ammonia, or a liquid selected from ammonia and hydrofluoric acid, in ultrapure water. A functional water generator, wherein the ultrapure water channel as the ultrapure water channel, the functional fluid channel as the functional fluid channel, and the ultrapure water channel are in communication with each other And the flow rate of the functional fluid corresponding to the flow rate of the ultrapure water in the ultrapure water flow channel communicated with the functional fluid flow channel through a communication path different from the communication of the ultrapure water flow channel. The fluid flow rate control means to be controlled and the communication path different from the communication of the ultra pure water flow path are disposed downstream of the location of the fluid flow rate control means of the ultra pure water flow path. The ultrapure water flowing through the ultrapure water flow channel communicated with the functional fluid flow channel at A functional water generating device (hereinafter referred to as “second invention”), characterized in that it comprises mixing means for dissolving or mixing the functional fluid whose flow rate is controlled by the fluid flow control means to generate functional water. Sometimes).

[3] The fluid flow rate control means includes an ultrapure water communication channel communicating with the ultrapure water branch channel or the ultrapure water channel, a functional fluid communication channel communicating with the functional fluid channel, A cylindrical resistor disposed in the ultrapure water communication path and movable in accordance with the flow rate of the ultrapure water, and disposed in the functional fluid communication path in a state surrounded by the cylindrical resistor. A fluid flow controller that is movable in conjunction with the movement of the cylindrical resistor, and a fluid that can adjust the size of the functional fluid communication path in accordance with the movement of the fluid flow controller. The functional water generating device according to [1] or [2], further including a communication path adjusting unit that controls a flow rate of the functional fluid in accordance with a flow rate of the ultrapure water.

[4] The cylindrical resistor includes a cylindrical driving magnet concentrically built therein, and the fluid flow controller includes a rod-shaped driven magnet magnetically coupled to the cylindrical driving magnet of the cylindrical resistor. Further, the fluid communication path adjusting means includes a valve rod disposed at a tip of the fluid flow controller, a valve seat and a biasing means disposed in the functional fluid communication path. And the valve rod is configured to be pressed against the valve seat by the biasing means, and when the cylindrical resistor is moved by the flow of the ultrapure water, The fluid flow control element moves in conjunction with the valve rod disposed at the tip of the fluid flow control element while being separated from or close to the valve seat while resisting the pressure from the urging means, Increase the size of the fluid communication path or Functional water generating apparatus according to the small [3].

[5] The cylindrical resistor is selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to [3] or [4], wherein the functional water generating device is lined with at least one resin and a part constituting the ultrapure water communication path is made of the resin.

[6] It has a valve mechanism composed of a valve rod disposed at the tip of the cylindrical resistor and a valve seat disposed in the ultrapure water communication path, and the valve rod and the valve seat. The functional water generating device according to any one of [3] to [5], in which a branch communication path through which the ultrapure water is constantly flowed is configured between the two.

[7] The fluid flow control means includes the ultrapure water branch channel or the ultrapure water communication channel that communicates with the ultrapure water channel, the functional fluid communication channel that communicates with the functional fluid channel, A rod-shaped resistor disposed in the ultrapure water communication path and movable in accordance with the flow rate of the ultrapure water, and disposed in the functional fluid communication path in parallel with the rod-shaped resistor. A fluid flow rate controller that can move in conjunction with the movement of the rod-shaped resistor, and a fluid communication path adjustment means that can adjust the size of the functional fluid communication path in accordance with the movement of the fluid flow rate controller The functional water generating apparatus according to [1] or [2], wherein the functional fluid flow rate is controlled corresponding to the flow rate of the ultrapure water.

[8] The rod-shaped resistor has a built-in rod-shaped drive magnet, the fluid flow controller has a built-in rod-shaped driven magnet magnetically coupled to the rod-shaped drive magnet of the rod-shaped resistor, and The fluid communication path adjusting means includes a valve rod disposed at the tip of the fluid flow controller, and a valve seat and biasing means disposed in the functional fluid communication path. At the same time, the valve rod is configured to be pressed against the valve seat by the biasing means, and when the rod-shaped resistor is moved by the flow of the ultrapure water, the fluid flow rate controller is interlocked. The size of the fluid communication passage is increased by moving the valve rod disposed at the tip of the fluid flow control element away from or close to the valve seat against the pressing force from the urging means. Or reduce the above [7] Functional water generating apparatus according.

[9] The rod-shaped resistor is at least selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to [7] or [8], wherein the functional water generating device is lined with a single resin, and the components constituting the ultrapure water communication path are made of the resin.

[10] A valve mechanism including a valve rod disposed at a tip of the rod-shaped resistor and a valve seat disposed in the ultrapure water communication path, and the valve rod and the valve seat The functional water generating device according to any one of [7] to [9], in which a branch communication path through which the ultrapure water is always flowed is configured.

[11] The fluid flow control means includes the ultrapure water branch channel or the ultrapure water communication channel that communicates with the ultrapure water channel, the functional fluid communication channel that communicates with the functional fluid channel, It is formed integrally with the resistor portion disposed in the ultrapure water communication path and movable in accordance with the flow rate of the ultrapure water, and the resistor portion disposed in the functional fluid communication path. A valve rod-shaped resistor composed of a fluid flow controller, and the ultrapure water communication passage and the functional fluid communication passage disposed in the valve rod-shaped resistor and the valve rod-shaped resistor. The diaphragm portion is divided into the resistor portion and the fluid flow rate controller portion, and the fluid communication path adjustment means capable of adjusting the size of the functional fluid communication path, and corresponds to the flow rate of the ultrapure water. In the above [1] or [2], which controls the flow rate of the functional fluid Mounting of functional water generating apparatus.

[12] The fluid communication path adjusting means comprises a valve rod disposed at the tip of the fluid flow rate controller portion, and a valve seat and biasing means disposed in the functional fluid communication path. And the valve stem is configured to be pressed against the valve seat by the urging means, and when the resistor portion of the valve stem resistor is moved by the flow of the ultrapure water. The fluid flow rate controller portion integrally formed with the resistor portion moves in conjunction with the valve rod disposed at the tip of the fluid flow rate controller portion to press the biasing means. The functional water generating device according to [11], wherein the size of the fluid communication path is enlarged or reduced by moving away from or close to the valve seat while resisting.

[13] The resistor portion is at least selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to [11] or [12], wherein the functional water generating device is lined with a single resin, and the parts constituting the ultrapure water communication path are made of the resin.

[14] It has a valve mechanism composed of a valve rod disposed at the tip of the resistor portion and a valve seat disposed in the ultrapure water communication passage, and the valve rod and the valve seat The functional water generator according to any one of [11] to [13], in which a branch communication path through which the ultrapure water is constantly flowed is configured.

[ 15 ] A functional water generating method, wherein functional water is generated using the functional water generating device according to any one of [1] to [ 14 ].

The present invention, the functional dissolution amount or mixing amount of the ultrapure water fluid precisely controlled, with it is possible to generate the functional water of the correct functional fluid density, compact and inexpensive functional water A generating device and an efficient functional water generating method using the same are provided.

  Hereinafter, the best mode for carrying out the present invention will be specifically described with reference to the drawings.

  FIG. 1 is an explanatory view schematically showing one embodiment of the present invention (first invention). As shown in FIG. 1, the functional water generator of the present embodiment dissolves or mixes a functional fluid G in ultrapure water W to finally produce functional water (second functional water F2 in FIG. 1 finally). A functional water generating apparatus 100 that generates an ultrapure water main channel 101 as a main channel of ultrapure water W, and an ultrapure water branch channel 102 branched from the ultrapure water main channel 101 (in FIG. 1, branching) The ultrapure water flow path before the operation is indicated by reference numeral 101a), the functional fluid flow path 103 as the flow path of the functional fluid G (the functional fluid storage source is indicated by reference numeral 103a in FIG. 1), and ultrapure water. The ultrapure water in the ultrapure water branch flow path 102 is disposed in communication with the branch flow path 102 and communicates with the functional fluid flow path 103 through a communication path different from the communication of the ultrapure water branch flow path 102. Fluid flow control means 104 for controlling the flow rate of the functional fluid G corresponding to the flow rate of the water W, and ultrapure water branch The passage 102 is arranged to communicate downstream from the location where the fluid flow rate control means 104 is arranged, and communicates with the functional fluid flow path 103 through a communication path different from the communication of the ultrapure water branch flow path 102. The functional fluid G, whose flow rate is controlled by the fluid flow rate control means 104, is dissolved or mixed in the ultrapure water (first ultrapure water) W1 flowing through the ultrapure water branch flow path 102. The first functional water F1 is introduced from the mixing means 105 into the ultrapure water (second ultrapure water) W2 flowing through the ultrapure water main channel 101 and dissolved or dissolved. By mixing, the second functional water F2 having a lower dissolved concentration or mixed concentration of the functional fluid G than the first functional water F1 is generated. In FIG. 1, reference numeral 106 denotes a pressure control valve that controls the pressure of the functional fluid G, and reference numeral 107 denotes a second ultrapure water W <b> 2 that flows through the ultrapure water main channel 101 from the mixing unit 105. The check valve 108 for preventing backflow into the first functional water F1 is disposed further downstream except for the functional fluid G remaining in the ultrapure water as a gas. For example, a hydrophobic membrane filter for sending to a cleaning device (not shown) is shown.

  Thus, the first functional water F1 having a high concentration or mixed concentration of the functional fluid G is first generated, and then the functional fluid G is diluted with the second ultrapure water W2 not dissolved or mixed. By generating the second functional water F2, the dissolved concentration or the mixed concentration of the concentration of the second functional water F2 obtained than when the second functional water F2 having a predetermined dissolved concentration or mixed concentration is generated from the beginning. Can be suppressed.

  FIG. 2 is an explanatory view schematically showing one embodiment of the present invention (second invention). As shown in FIG. 2, the functional water generator of the present embodiment is a functional water generator 200 that generates functional water F by dissolving or mixing a functional fluid G in ultrapure water W. The ultrapure water channel 201 as the water W channel, the functional fluid channel 203 as the functional fluid G channel, and the ultrapure water channel 201 are arranged in communication with the ultrapure water channel 201. Fluid flow rate control means 204 for controlling the flow rate of the functional fluid G corresponding to the flow rate of the ultrapure water W in the ultrapure water flow channel 201 communicated with the functional fluid flow channel 203 through a communication path different from the communication of 201. And the functional fluid flow path in a communication path different from the communication of the ultrapure water flow path 201 and disposed downstream of the location of the fluid flow rate control means 204 in the ultra pure water flow path 201. The fluid flow control means 204 is added to the ultrapure water flowing through the ultrapure water flow path 201, which communicates with 203. Therefore those characterized by comprising a mixing means 205 for generating a dissolved or mixed functional water F controlled functional fluids G flow. In FIG. 2, reference numeral 206 denotes a pressure control valve that controls the pressure of the functional fluid G, and reference numeral 208 denotes a functional fluid G remaining in the ultrapure water as a gas, further downstream. Each of the installed hydrophobic membrane filters, for example, for sending to a cleaning device (not shown) is shown.

  The second invention is preferably used when the tolerance for the variation of the dissolved concentration or mixed concentration of the functional fluid G is larger than that of the first invention and there is a greater demand for downsizing and cost reduction of the apparatus. .

  FIG. 3 is a cross-sectional view schematically showing an example of the fluid flow rate control means (first fluid flow rate control means) used in the present invention. FIG. When the flow rate of the functional fluid is reduced, FIG. 3B shows the case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. As shown in FIGS. 3A and 3B, the first fluid flow rate control means used in the present invention (hereinafter described based on the first invention, but the same applies to the second invention). 204a includes an ultrapure water communication path 251 that communicates with the ultrapure water branch flow path 102 (see FIG. 1), a functional fluid communication path 252 that communicates with the functional fluid flow path 203 (see FIG. 1), and an ultrapure water. A cylindrical resistor 253 that is movable in accordance with the flow rate of ultrapure water disposed in the water communication path 251 and a functional fluid communication path 252 that is surrounded by the cylindrical resistor 253. The fluid flow rate controller 254 that can move in conjunction with the movement of the cylindrical resistor 253 and the fluid that can adjust the size of the functional fluid communication path 252 in accordance with the movement of the fluid flow rate controller 254 The communication path adjusting means (the valve disposed at the tip of the fluid flow rate controller 254 in FIG. (Needle) 254b and functional fluids valve seat 255 disposed in the communication passage 252) and has, can control the flow rate of the functional fluid in response to the flow rate of ultra pure water. In this way, in the example shown in FIG. 3, the functional fluid communication path 252 that is a functional fluid path and the ultrapure water communication path 251 that is a flow path of ultrapure water are in communication with each other separately (each other In response to an increase (decrease) in the flow rate of ultrapure water, the flow rate of the functional fluid also increases (decreases). Functional fluid can be fed into the mixing means 105 (see FIG. 1).

  Based on FIG. 3A, the first fluid flow rate control means 204a will be described more specifically. The slit 256 will be described later. The cylinder 261 forms a functional fluid communication path 252 that is open at both ends, and the outer diameter of the fluid flow rate controller 254 is set to a dimension that allows the inside of the cylinder 261 to slide. A valve seat 255 is inserted at the lower end of the cylinder 261 and controls the flow rate of the functional fluid together with the valve rod (needle) 254b of the fluid flow rate controller 254. An urging means (spring) 263 is disposed on the upper part of the fluid flow rate controller 254 and presses the fluid flow rate controller 254 to the valve seat 255. The urging force of the urging means (spring) 263 is due to screwing of a set screw 264 having a functional fluid communication path 252 at the center. The cylinder 261 has a flange with a flange at the top, and is fitted to the main body cover 266 and then fixed with a retaining ring 265. The cylindrical resistor 253 is a cylindrical inner wall of the main body cover 266 (preferably made of a material having a low component elution property to ultrapure water, such as perfluoroalkoxy resin (PFA) or polytetrafluoroethylene resin (PTFE)). The valve rod (conical portion) 253 c (see FIG. 4) is in contact with the valve seat 270 of the main body cover 266. The first fluid flow rate control means 204a is hermetically sealed by a main body cover 266 and O-rings 268, 269, and forms a space for accommodating the cylindrical resistor 253 and forms an ultrapure water communication path 251. The movement of the cylindrical resistor 253 in the axial direction is restricted by a travel stopper 267. The main body cover 266 is formed with an ultrapure water inlet 257 and an ultrapure water outlet 258, and the ultrapure water flowing from the ultrapure water inlet 257 is connected to the valve rod (conical part) 253 c of the cylindrical resistor 253 and the valve seat. When the flow rate increases between 270 and the flow rate increases, the resistance of the cylindrical resistor 253 moves in the axial direction, upward in FIG. 3A, and is fluidly connected by the rod-shaped driven magnet 254a. Are also moved in the upward direction in synchronism with each other, and the functional fluid flows from the functional fluid inlet 259 to the functional fluid outlet 260. In this example, the cylindrical resistor 253 of the first fluid flow control means 204a is brought into contact with the valve seat 270 by gravity, and the functional fluid communication path 252 is disposed in the axial direction (vertical direction). However, by providing an urging means (for example, a spring) to the cylindrical resistor 253, the installation direction of the first fluid flow rate control means 204a is not limited to the vertical direction as in this example, for example, the horizontal direction. It can be arbitrarily set to an oblique direction or the like. In FIG. 3A, reference numeral 262 indicates an O-ring for ensuring airtightness in the valve seat 255 portion.

  FIG. 4 is a cross-sectional view schematically showing an example of a cylindrical resistor used in the fluid flow control means, and FIG. 5 is a schematic example of a fluid flow control element used in the fluid flow control means. FIG. As shown in FIGS. 4 and 5, the cylindrical resistor 253 has a cylindrical drive magnet 253 a built in concentrically, and the fluid flow rate controller 254 is connected to the cylindrical drive magnet 253 a of the cylindrical resistor 253. A magnetically coupled rod-shaped driven magnet 254a is incorporated, and the fluid communication path adjusting means further includes a valve rod (needle) 254b disposed at the tip of the fluid flow rate controller 254, and a functional fluid communication path 252 ( 3 (a)) and a biasing means (a spring in FIG. 3 (a)) 263, and a valve rod (see FIG. 3 (a)). The needle 254b is configured to be pressed (crimped) against the valve seat 254b by a biasing means (spring) 263, and when the cylindrical resistor 253 moves due to the flow of ultrapure water. The fluid flow control element 254 moves in conjunction with it and moves away from the valve seat 255 while resisting the pressure from the urging means (spring) 263 on the valve rod (needle) 254 b disposed at the tip of the fluid flow control element 254. Alternatively, the size of the fluid communication path 252 (see FIG. 3A) can be enlarged or reduced by being close to each other. In addition, the code | symbol 253b in FIG. 4 shows lining by a perfluoro alkoxy resin (PFA), a polytetrafluoroethylene resin (PTFE), etc.

  Specific examples of the fluid flow rate controller 254 include, for example, a rare earth rod-like driven magnet 254a such as samarium cobalt and neodymium, and a valve rod (needle) made of ceramics such as partially stabilized zirconia and silicon carbide, or super hard metal. An example in which 254b and lining 254c are integrally formed is a preferred example. Preferred examples of the lining 254c include those made of polyether ether ketone resin (PEEK) and acrylonitrile / butadiene / styrene resin (ABS resin) which have corrosion resistance to the functional fluid. The rod-shaped driven magnet 254a of the fluid flow controller 254 and the cylindrical drive magnet 253a of the cylindrical resistor 253 have substantially the same length in the axial direction and are arranged at positions where the magnetic polarities S and N attract each other. And can move in the axial direction synchronously.

  The cylindrical resistor 253 is at least one selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). It is preferable that the resin is completely covered with a lining. Moreover, it is preferable that the parts which comprise the ultrapure water communication path 251 (refer FIG. 3 (a)) are comprised from the above-mentioned resin. By comprising in this way, the elution to the ultrapure water of a structural component can be prevented. Among these, perfluoroalkoxy resin (PFA) is more preferable because it has a large elution prevention effect and can be melt-molded.

  The first fluid flow rate control means 204a (see FIG. 3A) includes a valve stem (conical portion) 253c (see FIG. 4) disposed at the tip of the cylindrical resistor 253, and an ultrapure water communication path 251. It has a valve mechanism composed of a valve seat 270 disposed in (see FIG. 3A) and can move the cylindrical resistor 253 in the axial direction in accordance with the flow rate of ultrapure water. It is like that. Further, a plurality of branch communication passages (slits in FIG. 3A) 256 for constantly flowing ultrapure water in the radial direction are arranged between the valve stem (conical portion) 253c and the valve seat 270, and the valve Even if the rod (conical portion) 253c and the valve seat 270 are in close contact with each other, a part thereof is opened so that ultrapure water always flows (such a mechanism is called a slow leak). The first fluid flow rate control means 204a having such a mechanism is configured so that the ultrapure water stays in the ultrapure water communication passage 251 and the ultrapure water stays in the first fluid, although it is small. The component that comes into contact with the ultrapure water of the flow rate control means 204a is eluted into the ultrapure water, and the concentration of the eluted component is increased. In this way, this can be prevented by always flowing a small amount of ultrapure water.

  FIG. 6 is a cross-sectional view schematically showing another example of the fluid flow rate control means (second fluid flow rate control means) used in the present invention. FIG. When the flow rate of the functional fluid is reduced, FIG. 6B shows the case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. FIG. 7 is a cross-sectional view taken along line AA in FIG. FIG. 8 is a cross-sectional view schematically showing an example of a rod-like resistor used for the second fluid flow rate control means. As shown in FIGS. 6 to 8, the second fluid flow rate control means 304 includes an ultrapure water communication path 351 that communicates with the ultrapure water branch path 102 (see FIG. 1), and a functional fluid path 103 (see FIG. 6). 1), a rod-like resistor 353 that is disposed in the ultrapure water communication passage 351 and is movable in accordance with the flow rate of ultrapure water, and a functional fluid communication passage 352. In addition, a fluid flow rate controller 354 that is arranged in parallel with the rod resistor 353 and is movable in conjunction with the movement of the rod resistor 353, and a function corresponding to the movement of the fluid flow rate controller 354. A fluid communication path adjusting means capable of adjusting the size of the fluid communication path 352 (in FIG. 6A, it is disposed in a valve rod (needle) 354b and a functional fluid communication path 352 disposed at the tip of the fluid flow rate controller 354. The valve seat 355) is provided, and the machine responds to the flow rate of ultrapure water. It is possible to control the flow rate of the sex fluid (the control of the flow rate of the functional fluid is later more specifically described). As described above, in the example shown in FIG. 6, the functional fluid communication path 352 that is a functional fluid path and the ultrapure water communication path 351 that is a flow path of ultrapure water are in communication with each other separately (each other In response to an increase (decrease) in the flow rate of ultrapure water, the flow rate of the functional fluid also increases (decreases). The functional fluid can be fed into the mixing means 105 (see FIG. 1). The main body cover 366 is preferably made of a material having a low component elution property to ultrapure water, such as perfluoroalkoxy resin (PFA) or polytetrafluoroethylene resin (PTFE). 6A, the ultrapure water inlet 357, the ultrapure water outlet 358, the functional fluid inlet 359, the functional fluid outlet 360, the O-ring 362, the slit 356, and the valve seat 370 are the first shown in FIG. This is similar to the case of the fluid flow rate control means. The first circular hole 372 and the second circular hole 373 will be described later. The first circular hole 372 is sealed by a lid 374, and the lid 374 and the main body cover are welded by a welding portion 374.

  As shown in FIG. 6A, the rod-shaped resistor 353 has a built-in rod-shaped drive magnet 353a (see FIG. 8), and the fluid flow rate controller 354 has a magnetic force with the rod-shaped drive magnet 353a of the rod-shaped resistor 353. A coupled rod-shaped driven magnet 354a is built in, and the fluid communication path adjusting means is arranged in a valve rod (needle) 354b disposed at the tip of the fluid flow rate controller 354 and the functional fluid communication path 352. The valve seat 355 and the biasing means (spring) 363 are provided, and the valve rod (needle) 354b is pressed against the valve seat 355 by the biasing means (spring) 363. When the rod-like resistor 353 moves in the axial direction due to the flow of ultrapure water, the fluid flow rate controller 354 moves in the axial direction in conjunction with the fluid flow rate. The size of the fluid communication passage 352 is increased or decreased by moving the valve rod (needle) 354b disposed at the tip of the plunger 354 away from or close to the valve seat 355 while resisting the pressing from the biasing means (spring) 363. It can be reduced.

  As shown in FIG. 7, in the second fluid flow rate control means 304, the ultrapure water communication path 351 and the first circular hole 372 are integrated so as to penetrate through the inside thereof, and The functional fluid communication path 352 and the second circular hole 373 are formed in an integrated state. A fluid flow rate controller 354 shown in FIG. 6A is slidably inserted on the inner surface of the second circular hole 373, and the function is achieved by the valve rod (needle) 354b and the valve seat 355 of the fluid flow rate controller 354. The fluid flow rate is controlled. The second fluid flow rate control means 304 is urged by an urging means (spring) 363, and the urging force is set by a set screw 364.

  The rod-shaped resistor 353 shown in FIG. 8 has a structure in which the rod-shaped drive magnet 353a is completely covered with a lining 353b, and has a tapered valve rod (needle) 353c at the lower end. As shown in FIG. 6A, the ultrapure water communication passage 351 of the main body cover 366 has a conical valve seat 370 corresponding to the valve rod (needle) 353c of the rod-like resistor 353, and Some of them have a slit 356 so that even if the rod-like resistor 353 is in close contact with the valve seat 370, a slight amount of ultrapure water can be leaked. Such a slow leak is the same as in the case of the first fluid flow control means 204a. The amount of axial movement of the rod-shaped resistor 353 is limited by the lid 374. The lid 374 is welded and sealed with a main body cover 366 and a welded portion 375. The ultrapure water communication path 351 has an ultrapure water inlet 357, and when the flow rate of ultrapure water increases, the rod-like resistor 353 moves toward the upper part in the axial direction, so that the ultrapure water passes through the ultrapure water communication path. It will flow from the ultrapure water outlet 358 to the mixing unit 105 (see FIG. 1) through 351. The fluid flow rate controller 354 magnetically coupled in response to the movement of the rod-shaped resistor 353 also moves upward and downward in the axial direction, and the functional fluid flowing in from the functional fluid inlet 359 of the functional fluid communication path 352 is Then, the fluid flows from the functional fluid outlet 360 to the mixing unit 105 through the functional fluid communication path 352. An example is shown in which the functional fluid is introduced into the functional fluid communication path 352 from the functional fluid inlet 359 disposed on the upper portion of the fluid flow controller 354. The valve rod (needle) of the fluid flow controller 354 is shown. You may introduce from the 354b side. However, since the flow rate of the functional fluid is controlled by pressing the fluid flow rate controller 354 against the valve seat 355 to control the amount of the functional fluid, the flow rate of the functional fluid is matched with the biasing direction of the biasing means (spring) 363. Is preferred.

  The rod-shaped resistor 353 is at least one resin selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). Is preferably completely covered with a lining. Moreover, it is preferable that the parts which comprise the ultrapure water communication path 351 are comprised from the above-mentioned resin. By comprising in this way, the elution to the ultrapure water of a structural component can be prevented. Among these, perfluoroalkoxy resin (PFA) is more preferable because it has a large elution prevention effect and can be melt-molded.

  The valve mechanism includes a valve rod (needle) 353c (see FIG. 8) disposed at the tip of the rod-shaped resistor 353, and a valve seat 370 disposed in the ultrapure water communication path 351. As in the case of the first fluid flow rate control means 204a, it is preferable that a branch communication path for constantly flowing ultrapure water is formed between the rod (needle) 353c and the valve seat 370.

  FIG. 9 is a cross-sectional view schematically showing one modified example (sideways example) of the second fluid flow rate control means, and FIG. 9A shows a functional fluid with a reduced flow rate of ultrapure water. FIG. 9B shows a case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. As described above, the rod-like resistor 353 is pressed by the valve seat 370 (see FIG. 6A) when the ultrapure water is not flowing in the second fluid flow rate control means 304 at a rate greater than the slow leak amount. Therefore, by applying magnet coupling, as shown in FIG. 9A, the axial positions of the rod-like drive magnet 353a and the rod-like driven magnet 354a are shifted by the length T, and the rod-like drive magnet 353a An axial thrust force (a force with which both rod-shaped magnets 353a and 354a try to be in the same axial position) is applied between the rod-shaped driven magnets 354a. Other configurations, materials, and the like are the same as those shown in FIG.

  FIG. 10 is a cross-sectional view schematically showing another example of the fluid flow rate control means (third fluid flow rate control means) used in the present invention. FIG. 10 (a) shows the flow rate of ultrapure water being reduced. When the flow rate of the functional fluid is reduced, FIG. 10B shows the case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. FIG. 11 is a cross-sectional view schematically showing an example of a valve rod resistor used in the third fluid flow rate control means. As shown in FIGS. 10 and 11, the third fluid flow rate control means 404 includes an ultrapure water communication path 451 communicating with the ultrapure water branch path 102 (see FIG. 1), and a functional fluid path 103 (FIG. 1), a resistor portion 454s movable in accordance with the flow rate of ultrapure water disposed in the ultrapure water communication passage 451, and the functional fluid communication passage 452. A valve rod-shaped resistor 454 composed of a fluid flow rate controller portion 454t formed integrally with the resistor portion 454s, and an ultrapure water communication path 451 disposed in the valve rod-shaped resistor 454. And the functional fluid communication passage 452 and the diaphragm 454b for dividing the valve rod resistor 454 into the resistor portion 454s and the fluid flow control portion 454t, and the size of the functional fluid communication passage 452 can be adjusted. Fluid communication path adjuster (In FIG. 10A, the valve stem 454a disposed at the tip of the valve rod-like resistor 454 (fluid flow rate controller portion 454t) and the valve seat 455 disposed in the functional fluid communication passage 452); The flow rate of the functional fluid can be controlled in accordance with the flow rate of ultrapure water. The control of the flow rate of the functional fluid will be described more specifically later.

  The fluid communication path adjusting means includes a valve rod (needle) 454a disposed at the tip of the valve rod-shaped resistor 454 (fluid flow rate controller portion 454t), a valve seat 455 disposed in the functional fluid communication path 452, and The urging means (spring) 463 and the valve rod (needle) 454a are pressed against the valve seat 455 by the urging means (spring) 463. When the resistor portion 454s of the valve stem resistor 454 moves in the axial direction due to the flow of water, the fluid flow rate controller portion 454t configured integrally with the resistor portion 454s moves in association with the fluid flow rate controller portion. A functional fluid communication is performed by moving a valve rod (needle) 454a disposed at the tip of 454t away from or close to the valve seat 455 while resisting the pressing from the biasing means spring 463. And it is capable of enlarging or reducing the size of 452.

  The valve rod-shaped resistor 454 has a valve rod (needle) 454a at one end, a spindle 454d at the other end, and a conical portion 454e that increases in diameter toward the spindle 454d. The valve stem (needle) 454a is preferably made of stainless steel or ceramics, and the spindle 454d and the conical part 454e are components of ultrapure water such as perfluoroalkoxy resin (PFA) and polytetrafluoroethylene resin (PTFE). A resistor valve seat 476 is accommodated in a material coated with a low elution property, and then a diaphragm 454b made of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE) or the like is welded at a welded portion 454f. All together. The resistor valve seat 476 is formed with the slit 456 for the slow leak described above. The ultrapure water side housing 479 has an ultrapure water communication passage 451, an ultrapure water inlet 457, and an ultrapure water outlet 458, and is fitted to the ultrapure water side housing 479 after an O-ring 477 is attached to the valve rod-shaped resistor 454. Further, the functional fluid side housing 480 is fitted to the ultrapure water side housing 479, the urging means (spring) 463 is fixed by the snap ring 478, and the valve seat housing 481 is fitted. The bolts (not shown) are integrally assembled in the axial direction. The functional fluid side housing 480 and the valve seat housing 481 are preferably made of stainless steel or the like. The valve rod-like resistor 454 is slidably held by a spindle 454d in a circular hole 482 of the ultrapure water side housing 479, and the outer periphery of the diaphragm 454b is supported by the ultrapure water side housing 479 and the functional fluid side housing 480. The rod (needle) 454 a is in contact with the valve seat 455 of the valve seat housing 481 by biasing means (spring) 463. A groove 483 that connects the inside of the circular hole 482 and the functional fluid communication path 452 is formed in the circular hole 482 of the ultrapure water side housing 479. When the amount of ultrapure water flowing from the ultrapure water inlet 457 into the ultrapure water communication passage 451 increases, the valve rod resistor 454 moves toward the upper portion in the axial direction and interlocks with the valve of the valve rod resistor 454. The bar (needle) 454a also moves upward and the functional fluid introduced from the functional fluid inlet 459 flows from the functional fluid outlet 460 to the mixing unit 105 (see FIG. 1). In addition, the code | symbol 254c in FIG. 11 shows lining by a perfluoro alkoxy resin (PFA), a polytetrafluoroethylene resin (PTFE), etc.

  The resistor portion 454s is at least one resin selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). Is preferably completely covered with a lining. Moreover, it is preferable that the parts which comprise the ultrapure water communication path 451 are comprised from the above-mentioned resin. By comprising in this way, the elution to the ultrapure water of a structural component can be prevented. Among these, perfluoroalkoxy resin (PFA) is more preferable because it has a large elution prevention effect and can be melt-molded.

  While having a valve mechanism composed of a valve stem (conical portion in FIG. 10A) 454e disposed at the tip of the resistor portion 454s and a valve seat 476 disposed in the ultrapure water communication passage 451. It is preferable that a branch communication path (slit in FIG. 10A) 456 that constantly flows ultrapure water is formed between the valve stem (conical portion) 454e and the valve seat 476. This is similar to the case of the fluid flow rate control means.

  FIG. 12 is a cross-sectional view schematically showing an example of the mixing means used in the present invention. As shown in FIG. 12, the mixing means of this example has a functional fluid communication path 552, a functional fluid supply section 501 that supplies the functional fluid G via the functional fluid communication path 552, A pure water communication passage 551 is provided, and in the ultra pure water communication passage 551, the functional fluid G supplied from the functional fluid supply unit 501 and the ultra pure water W passing through the ultra pure water communication passage 551 continuously are supplied. The mixing unit 500 includes a mixing unit 502 that mixes to produce functional water F, and the functional fluid supply unit 501 and the mixing unit 502 are detachably fixed. Here, as a method of detachably fixing the functional fluid supply unit 501 and the mixing unit 502, for example, the functional fluid supply unit 501 is screwed into the mixing unit 502 as shown in FIG. Can be mentioned. In addition, fixing by screwing, fixing by interposing a clip, fixing by making each other into a coupling shape, and the like may be used.

  The functional fluid supply unit 501 includes a porous plate 512, a check valve 513, and an orifice 514 in order from the end surface side facing the ultrapure water communication path 551 in the functional fluid communication path 552. More preferably, an orifice filter 515 is further provided on the upstream side of the orifice 514. By comprising in this way, the functional fluid density | concentration of functional water can be controlled correctly and rapidly.

  The functional fluid used in the present invention is preferably carbon dioxide gas or ammonia gas.

The functional water production | generation method of this invention produces | generates functional water using the above-mentioned functional water production | generation apparatus, It is characterized by the above-mentioned. By comprising in this way, the functional water of the exact functional fluid density | concentration can be produced | generated efficiently.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.

(Example 1)
In the configuration shown in FIG. 1, the fluid flow rate control means (gas flow rate control device) having the structure shown in FIG. 3 (a) capable of handling 0 to 16 liters / minute as the amount of functional water is used and the pressure is reduced to 0.1 MPa. Was introduced into a gas flow rate control device, and changes in the flow rate of carbon dioxide gas relative to the flow rate of ultrapure water adjusted to 20 MΩ and the specific resistance value of ultrapure water were measured. The result is shown in FIG. As shown in FIG. 13, since the carbon dioxide gas does not flow to the mixing means until the amount of ultrapure water is 1 liter / min, the specific resistance value remains 20 MΩ, but the flow rate of ultrapure water is from 1 liter / min. The resistivity value of ultrapure water rises rapidly between 2 liters / minute, and the resistivity value with respect to the flow rate of ultrapure water is between 2 liters / minute and 16 liters / minute. 0.2 ± 0.02 MΩ, which is ultrapure water capable of preventing electric leakage suitable for cleaning wafers and the like.

  The functional water generating apparatus and the functional water generating method using the same of the present invention include, for example, semiconductor industry, electronic / electric industry, chemical industry, etc. that require cleaning of silicon wafers, liquid crystal glass substrates, organic EL glass substrates, etc. It is suitably used in various industrial fields.

It is explanatory drawing which shows typically one Embodiment of this invention (1st invention). It is explanatory drawing which shows typically one Embodiment of this invention (2nd invention). FIG. 3A is a cross-sectional view schematically showing one example of the fluid flow rate control means (first fluid flow rate control means) used in the present invention. FIG. When the flow rate is reduced, FIG. 3B shows a case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. It is sectional drawing which shows typically an example of the cylindrical resistor used for a fluid flow control means. It is sectional drawing which shows typically an example of the fluid flow control element used for a fluid flow control means. FIG. 6A is a cross-sectional view schematically showing another example of the fluid flow rate control means (second fluid flow rate control means) used in the present invention. FIG. 6A shows the functional fluid flow by reducing the flow rate of ultrapure water. When the flow rate is reduced, FIG. 6B shows a case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. It is sectional drawing of the AA line in FIG. It is sectional drawing which shows typically an example of the rod-shaped resistor used for a 2nd fluid flow control means. FIG. 9A is a cross-sectional view schematically showing one modified example (sideways example) of the second fluid flow rate control means. FIG. 9A shows a flow rate of the functional fluid by reducing the flow rate of ultrapure water. FIG. 9B shows a case where the flow rate of the ultra-pure water is increased and the flow rate of the functional fluid is increased. FIG. 10A is a cross-sectional view schematically showing another example of the fluid flow rate control means (third fluid flow rate control means) used in the present invention. FIG. When the flow rate is reduced, FIG. 10B shows a case where the flow rate of the functional fluid is increased by increasing the flow rate of ultrapure water. It is sectional drawing which shows typically an example of the valve rod-shaped resistor used for a 3rd fluid flow control means. It is sectional drawing which shows typically an example of the mixing means used for this invention. In Example 1, it is a graph which shows the result of having measured the carbon dioxide gas flow rate with respect to the flow rate of ultrapure water adjusted to 20 MΩ, and the change of the specific resistance value of ultrapure water.

Explanation of symbols

100: Functional water generator 101: Ultrapure water main channel 101a: Ultrapure water channel 102: Ultrapure water branch channel 103: Functional fluid channel 103a: Functional fluid storage source 104: Fluid flow rate control means 105: Mixing means 106: Pressure control valve 107: Check valve 108: Hydrophobic membrane filter 200: Functional water generator 201: Ultrapure water flow path 203: Functional fluid flow path 203a: Functional fluid storage source 204: Fluid flow rate control means 204a: First fluid flow rate control means 205: Mixing means 206: Pressure control valve 207: Check valve 208: Hydrophobic membrane filter 251: Ultrapure water communication path 252: Functional fluid communication path 253: Cylindrical resistor 253a: Cylindrical drive magnet 253b: Lining 253c: Valve stem (conical part)
254: Fluid flow controller 254a: Rod-shaped driven magnet 254b: Valve rod (needle)
254c: Lining 255: Valve seat 256: Slit 257: Ultrapure water inlet 258: Ultrapure water outlet 259: Functional fluid inlet 260: Functional fluid outlet 261: Cylinder 262: O-ring 263: Biasing means (spring)
264: Set screw 265: Retaining ring 266: Main body cover 267: Travel stopper 268: O-ring 269: O-ring 270: Valve seat 271: Cylindrical inner wall 304: Second fluid flow rate control means 351: Ultrapure water communication path 352: Functional fluid communication path 353: rod-shaped resistor 353a: rod-shaped drive magnet 353b: lining 353c: valve rod (needle)
354: Fluid flow rate controller 354a: Rod-shaped driven magnet 354b: Valve rod (needle)
355: Valve seat 356: Slit 357: Ultrapure water inlet 358: Ultrapure water outlet 359: Functional fluid inlet 360: Functional fluid outlet 362: O-ring 363: Biasing means (spring)
364: set screw 366: body cover 370: valve seat 372: first circular hole 373: second circular hole 374: lid 375: weld 404: third fluid flow control means 451: ultrapure water ream Passage 452: Functional fluid communication passage 454: Fluid flow rate controller 454a: Valve stem (needle)
454b: Diaphragm 454c: Lining 454d: Spindle 454e: Conical part 454f: Welded part 454s: Resistor part 454t: Fluid flow controller part 455: Valve seat 456: Slit 457: Ultrapure water inlet 458: Ultrapure water outlet 459: Functional fluid inlet 460: Functional fluid outlet 463: Biasing means (spring)
470: Valve seat 476: Resistor valve seat 477: O-ring 478: Snap ring 479: Ultrapure water side housing 480: Functional fluid side housing 481: Valve seat housing 482: Circular hole 483: Groove 500: Mixing means 501: Functional fluid supply unit 502: mixing unit 512: porous plate 513: check valve 514: orifice 515: orifice filter 551: ultrapure water communication path 552: functional fluid communication path W: ultrapure water W1: first Ultrapure water W2: second ultrapure water G: functional fluid F: functional water F1: first functional water F2: second functional water

Claims (15)

Functional water generation to generate functional water by dissolving or mixing a functional fluid that is a gas selected from carbon dioxide, hydrogen, ozone, oxygen, ammonia, or a liquid selected from ammonia and hydrofluoric acid, into ultra pure water A device,
An ultrapure water main channel as the main channel of the ultrapure water;
An ultrapure water branch channel branched from the ultrapure water main channel;
A functional fluid channel as the functional fluid channel;
The ultrapure water branch flow path that is disposed in communication with the ultrapure water branch flow path and that communicates with the functional fluid flow path through a communication path different from the communication of the ultra pure water branch flow path. Fluid flow rate control means for controlling the flow rate of the functional fluid corresponding to the flow rate of ultrapure water in
The functionality of the ultrapure water branch flow path is communicated downstream from the location where the fluid flow rate control means is disposed, and the functionality is different from the communication path of the ultrapure water branch flow path. The functional fluid whose flow rate is controlled by the fluid flow rate control means is dissolved or mixed in ultrapure water (first ultrapure water) that flows through the ultrapure water branch flow channel that communicates with the fluid flow channel. Mixing means for generating the first functional water,
The first functional water is introduced into the ultrapure water (second ultrapure water) flowing through the ultrapure water main channel from the mixing unit, and dissolved or mixed to generate second functional water. A functional water generator characterized by that. Functional water generation to generate functional water by dissolving or mixing a functional fluid that is a gas selected from carbon dioxide, hydrogen, ozone, oxygen, ammonia, or a liquid selected from ammonia and hydrofluoric acid, into ultra pure water A device,
An ultrapure water channel as the ultrapure water channel;
A functional fluid channel as the functional fluid channel;
The flow rate of the ultrapure water in the ultrapure water channel that is arranged in communication with the ultrapure water channel and communicates with the functional fluid channel through a communication channel different from the communication of the ultrapure water channel. Fluid flow rate control means for controlling the flow rate of the functional fluid in response to
The ultrapure water flow channel is disposed downstream of the fluid flow rate control unit and is connected to the functional fluid flow channel through a communication path different from the communication of the ultrapure water flow channel. Mixing means for generating functional water by dissolving or mixing the functional fluid whose flow rate is controlled by the fluid flow rate control means in the ultrapure water flowing through the ultrapure water flow path. A functional water generator.   The fluid flow rate control means includes the ultrapure water branch channel or the ultrapure water communication channel communicated with the ultrapure water channel, the functional fluid communication channel communicated with the functional fluid channel, and the ultrapure water. A cylindrical resistor disposed in the communication path and movable in accordance with the flow rate of the ultrapure water, and disposed in the functional fluid communication path in a state surrounded by the cylindrical resistor. , A fluid flow controller that can move in conjunction with the movement of the cylindrical resistor, and a fluid communication path adjustment that can adjust the size of the functional fluid communication path in accordance with the movement of the fluid flow controller The functional water generating device according to claim 1, wherein the functional water generating device is configured to control the flow rate of the functional fluid corresponding to the flow rate of the ultrapure water.   The cylindrical resistor has a cylindrical drive magnet built in concentrically, and the fluid flow controller has a built-in rod driven magnet that is magnetically coupled to the cylindrical drive magnet of the cylindrical resistor. Further, the fluid communication path adjusting means is composed of a valve rod disposed at the tip of the fluid flow controller, a valve seat disposed in the functional fluid communication path, and an urging means. The valve rod is pressed against the valve seat by the urging means, and the fluid flow rate when the cylindrical resistor is moved by the flow of the ultrapure water. The control element moves in conjunction with the fluid communication path by moving the valve rod disposed at the tip of the fluid flow rate control element away from or close to the valve seat while resisting the pressure from the urging means. Increase or decrease the size of Functional water generating apparatus according to claim 3.   The cylindrical resistor is at least one selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to claim 3 or 4, wherein the functional water generating device is formed by lining with a resin, and the parts constituting the ultrapure water communication path are made of the resin.   A valve mechanism having a valve rod disposed at a tip of the cylindrical resistor and a valve seat disposed in the ultrapure water communication path; and between the valve rod and the valve seat. The functional water generating device according to any one of claims 3 to 5, wherein a branch communication passage through which the ultrapure water is always flowed is configured.   The fluid flow rate control means includes the ultrapure water branch channel or the ultrapure water communication channel communicated with the ultrapure water channel, the functional fluid communication channel communicated with the functional fluid channel, and the ultrapure water. A rod-shaped resistor that is movable in correspondence with the flow rate of the ultrapure water disposed in the communication path, and the rod-shaped resistor that is disposed in the functional fluid communication path in parallel with the rod-shaped resistor. A fluid flow rate controller that can move in conjunction with the movement of the resistor, and a fluid communication path adjustment means that can adjust the size of the functional fluid communication path in accordance with the movement of the fluid flow rate controller. The functional water generating device according to claim 1, wherein the flow rate of the functional fluid is controlled corresponding to the flow rate of the ultrapure water.   The rod-shaped resistor has a built-in rod-shaped drive magnet, the fluid flow controller has a built-in rod-shaped driven magnet magnetically coupled to the rod-shaped drive magnet of the rod-shaped resistor, and the fluid The communication path adjusting means is composed of a valve rod disposed at the tip of the fluid flow rate controller, a valve seat disposed in the functional fluid communication path, and an urging means, and The valve rod is configured to be pressed against the valve seat by the biasing means. When the rod-shaped resistor is moved by the flow of the ultrapure water, the fluid flow controller is moved in conjunction with the valve rod. The size of the fluid communication passage is enlarged or reduced by moving the valve rod disposed at the tip of the fluid flow control element away from or close to the valve seat while resisting the pressing from the urging means. Claim 7 Noh water generation apparatus.   The rod-shaped resistor is at least one resin selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to claim 7 or 8, wherein the functional water generating device is formed by the resin and the components constituting the ultrapure water communication path are made of the resin.   The valve mechanism includes a valve rod disposed at the tip of the rod-shaped resistor and a valve seat disposed in the ultrapure water communication path, and between the valve rod and the valve seat. The functional water generating device according to any one of claims 7 to 9, wherein a branch communication path through which the ultrapure water is constantly flowed is configured.   The fluid flow rate control means includes the ultrapure water branch channel or the ultrapure water communication channel communicated with the ultrapure water channel, the functional fluid communication channel communicated with the functional fluid channel, and the ultrapure water. Resistor portion movable in correspondence with the flow rate of the ultrapure water disposed in the communication passage, and fluid flow rate formed integrally with the resistor portion disposed in the functional fluid communication passage A valve rod resistor composed of a controller portion, and the ultrapure water communication passage and the functional fluid communication passage disposed in the valve rod resistor are divided and the valve rod resistor is A diaphragm that divides into a child part and the fluid flow controller part, and a fluid communication path adjusting means that can adjust the size of the functional fluid communication path, and corresponding to the flow rate of the ultrapure water The functional aquatic according to claim 1 or 2, which controls a flow rate of the functional fluid. Apparatus.   The fluid communication path adjusting means comprises a valve rod disposed at the tip of the fluid flow rate controller portion, and a valve seat and biasing means disposed in the functional fluid communication path. In addition, the valve stem is configured to be pressed against the valve seat by the biasing means, and when the resistor portion of the valve stem-shaped resistor moves by the flow of the ultrapure water, the resistance The fluid flow controller part integrally formed with the child part moves in conjunction with the valve rod disposed at the tip of the fluid flow controller part against the pressure from the urging means. The functional water generating device according to claim 11, wherein the size of the fluid communication path is enlarged or reduced by being separated from or close to the valve seat.   The resistor portion is at least one resin selected from the group consisting of perfluoroalkoxy resin (PFA), polytetrafluoroethylene resin (PTFE), fluorinated ethylene propylene resin (FEP), and ethylene tetrafluoroethylene resin (ETFE). The functional water generating device according to claim 11 or 12, wherein the component constituting the ultrapure water communication path is made of the resin.   A valve mechanism configured by a valve rod disposed at a tip of the resistor portion and a valve seat disposed in the ultrapure water communication path; and between the valve rod and the valve seat. The functional water generating device according to any one of claims 11 to 13, wherein a branch communication passage through which the ultrapure water is constantly flowed is configured. Functional water generating method characterized by generating a functional water with a functional water generator according to any one of claims 1-14.

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