JP4777946B2 - Pollutant removal device - Google Patents

Description

  The present invention relates to a pollutant removing apparatus for removing a pollutant in a gas by passing the gas laterally through a gas-liquid contact material into which water is dropped.

  In general, semiconductors and liquid crystals are manufactured in a clean room with high cleanliness, and a large amount of outside air is introduced into the clean room in order to compensate for the amount of air exhausted from the room and keep the room at a positive pressure. The outside air to be introduced is controlled by an external air conditioner, and the dust is removed by a HEPA (High-Efficiency Particulate Air) filter or the like and then supplied to the room. In addition, with the recent increase in the degree of integration of semiconductors and the like, it is required to remove molecular contaminants (AMCs) in the air in clean rooms, so a contaminant removal device called an air washer has been installed. There are also many things.

  This type of pollutant removal device removes water-soluble components such as ammonia and sulfur dioxide in the air by dissolving them in water by gas-liquid contact, and has a high water-soluble component removal capability, low ventilation resistance, In addition to space saving, it is also used as a humidifier, so high saturation efficiency during humidification is required. There are two types of pollutant removal devices: a water spray type that sprays water against the air flow and makes direct gas-liquid contact, and a vaporization type that makes gas-liquid contact by dripping water onto the gas-liquid contact material. However, the water spray type has a large pump power and ventilation resistance, and requires a large installation space.

  As a conventional contaminant removal device of this type, for example, as shown in FIG. 4, a water supply facility 2 is installed above the laminated gas-liquid contact material 1 and at the bottom of the gas-liquid contact material 1. There is known a system in which a lowermost water tank 3 is installed and air that passes through the gas-liquid contact material in a horizontal direction is brought into contact with water dropped from the water supply facility 2 onto the gas-liquid contact material 1 (for example, Patent Documents 1 to 3). reference).

Further, as shown in FIG. 5, the lower end of the gas-liquid contact material 1 is immersed in the lowermost water tank 3, or as shown in FIG. 6, a large number of holes 4 are formed in the bottom 5. The formed water tank 6 is installed at the upper end of the gas-liquid contact material 1, and the impregnating material layer 7 is installed at the bottom 5 of the water tank 6. After impregnating the impregnating material layer 7 with the liquid in the water tank 4, the holes What supplies to the gas-liquid contact material 1 via 4 (for example, refer patent document 4) etc. are also known.
Japanese Patent No. 3716926 JP 2006-341194 A JP 2000-317248 A Japanese Patent Application Laid-Open No. 11-244641

  However, in the pollutant removing device shown in FIG. 4 described above, a part of the air passing through the gas-liquid contact material 1 bypasses from the upper end and the lower end of the gas-liquid contact material 1, and the contact time with the gas-liquid contact material 1 is increased. There is a problem that the gas-liquid contact is not sufficiently performed because of shortening. Further, as a solution to this problem, it is conceivable that the upper end of the gas-liquid contact material 1 is closed with the lid 8 as shown by a two-dot chain line in FIG. 4, but the air bypass cannot be completely prevented. .

  Further, in the pollutant removing device as shown in FIG. 5 described above, air bypass from the lower end of the gas-liquid contact material 1 can be prevented, but the air bypass from the upper end of the gas-liquid contact material 1 is completely bypassed. It cannot be prevented. Furthermore, the lowermost water tank 3 needs a supplementary water facility for making up for the shortage of water at the time of humidification and supplementing the blow of pure water, and the fluctuation of the water level in the lowermost water tank 3 becomes large. Therefore, it is necessary to immerse the lower end of the gas-liquid contact material 1 in the lowermost water tank 3 by 100 mm or more, and the gas-liquid contact material 1 corresponding to that amount is necessary, which is uneconomical.

  Furthermore, in the pollutant removal apparatus shown in FIG. 6 described above, a large number of holes 4 are accurately arranged in the bottom 5 of the water tank 6 so that water can be evenly dropped onto the gas-liquid contact materials 1 arranged in parallel. In addition, since the shape of the hole 4 is restricted to a specific shape, there is a problem that it takes time to manufacture. Furthermore, since the impregnating material layer 7 is required, the number of parts increases, which causes an increase in manufacturing cost and maintenance management cost.

  The present invention has been made to solve the above-described problems, and prevents gas bypass from the upper and lower ends of the gas-liquid contact material, thereby improving the gas-liquid contact efficiency and increasing the contaminant removal capability. It is an object of the present invention to provide a pollutant removing device that can perform such a process.

  In order to achieve the above object, the present invention provides a pollutant removing apparatus for removing a pollutant in a gas by passing the gas laterally through the gas-liquid contact material into which water has been dropped. The upper and lower ends of the liquid contact material are sealed with water.

  An upper water tank is provided above the gas-liquid contact material with a bottom surface having an opening in contact with the upper end of the gas-liquid contact material, and water supply equipment for supplying water into the upper water tank It is preferable that a lower water tank is provided below the gas-liquid contact material so that the lower end of the gas-liquid contact material is immersed.

  The opening ratio of the upper water tank opening may be 0.5 to 1%.

  Further, a lowermost water tank may be provided below the lower water tank, and water discharged from the lower water tank may fall into the lowermost water tank.

  Furthermore, the same opening as the opening of the bottom face of the upper water tank may be formed on the bottom face of the lower water tank.

  Further, the lower water tank includes an immersion part in which a lower end of the gas-liquid contact material is immersed, and a drainage part provided so that water overflowing from the immersion part flows in and an opening is formed on the bottom surface. The water discharged from the opening of the drainage part may fall into the lowest water tank.

  Furthermore, the lower water tank includes an immersion part in which a lower end of the gas-liquid contact material is immersed, and a drainage part provided so as to communicate with the immersion part, and the water overflowing from the drainage part is It may fall to the lowest water tank.

  According to the present invention, since the upper and lower ends of the gas-liquid contact material are sealed with water, a part of the air passing through the gas-liquid contact material does not bypass the upper and lower ends of the gas-liquid contact material. Therefore, a sufficient contact time between the air and the gas-liquid contact material can be secured, the gas-liquid contact can be reliably performed, and the removal efficiency of contaminants in the air can be increased.

  In addition, when the lower end of the gas-liquid contact material is immersed in the water in the lower water tank, even when it is necessary to humidify the air, such as in winter, the gas-liquid contact material sucks up water and prevents drying. be able to.

  Furthermore, since the amount of water that passes through the opening of the upper water tank changes depending on the amount of water stored in the upper water tank, there is no need to change the opening ratio in order to adjust the amount of water that passes through the opening, and the shape and arrangement of this opening are arbitrary. Can be set. Therefore, the manufacturing is simplified, and unnecessary parts such as an impregnating material layer are not required, and the manufacturing cost and the maintenance management cost can be reduced.

  Furthermore, the bottom opening of the lower water tank is formed to be the same as the opening of the bottom surface of the upper water tank, or water is overflowed from the immersion part to the drainage part, or the water flowing from the immersion part is The water level of the lower water tank hardly fluctuates by being configured to overflow from the drainage section. Therefore, since the length of the lower end of the gas-liquid contact material immersed in the lower water tank can be minimized, the gas-liquid contact material can be used effectively, and economic efficiency can be improved.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. Here, FIG. 1 is a schematic view showing a contaminant removal apparatus according to an embodiment of the present invention.

  A pollutant removal apparatus 10 according to an embodiment of the present invention includes a gas-liquid contact material 11 stacked in the front-rear direction (perpendicular to the plane of FIG. 1), and an upper water tank 12 provided above the gas-liquid contact material 11. And a water supply facility 13, a lower water tank 14 provided below the gas-liquid contact material 11, and a lowermost water tank 15 provided below the lower water tank 14. When air passes through 11 in a horizontal direction (in the direction of the arrow in FIG. 1), contaminants in the air are removed.

  The gas-liquid contact material 11 is formed, for example, by laminating hydrophilic or water-absorbing materials such as polyester, polyethylene, or ceramic in a honeycomb shape, but since this material and shape are already known, Further explanation is omitted.

  The upper water tank 12 is provided in a state where the bottom surface 16 is in contact with the upper end of the gas-liquid contact material 11, and a number of minute openings 17 are formed in the bottom surface 16. The ratio of the area of the entire opening 17 to the area of the bottom surface 16 (hereinafter referred to as “opening ratio”) is set to 0.5 to 1%, for example, and the amount of water passing through the opening 17 is the upper water tank 12. Therefore, it is not necessary to change the aperture ratio in order to adjust the amount of water passing through the opening 17. Further, the opening 17 is not limited to a specific shape, and various shapes such as a round shape and a slit shape can be adopted, and the installation position of the opening 17 is not limited. That is, as long as the aperture 17 is formed so that the aperture ratio falls within a predetermined range, the shape and position thereof can be arbitrarily set. Therefore, the manufacturing is simplified and an extra impregnation layer and the like are added. Parts are not necessary, and manufacturing costs and maintenance management costs can be reduced.

  The water supply facility 13 includes a water supply pipe 18 disposed horizontally above the upper water tank 12, and water in the pipe 18 is supplied to the upper water tank 12 through a hole (not shown) drilled in the water supply pipe 18. It is designed to be dripped.

  The lower water tank 14 is provided so that the lower end of the gas-liquid contact material 11 is immersed, and an opening 20 having the same shape and opening ratio as the opening 17 of the upper water tank 12 is formed on the bottom surface 19. In this case, since the water level of the lower water tank 14 hardly fluctuates, the length of the lower end of the gas-liquid contact material 11 immersed in the lower water tank 14 is about 5 mm. Therefore, the gas-liquid contact material 11 can be used effectively, and the economic efficiency can be improved.

  Although not shown in the drawings, the lowermost water tank 15 is connected to a circulation facility including a circulation pump and piping, and the water in the lowermost water tank 15 is returned to the water supply facility 13 by this circulation facility. ing.

  Next, the operation of the contaminant removal apparatus 10 according to the embodiment of the present invention will be described with reference to FIG.

  Water dropped from the water supply pipe 18 to the upper water tank 12 is dropped to the gas-liquid contact material 11 through the opening 17 in the bottom surface 16 of the upper water tank 12, thereby forming a thin water film on the gas-liquid contact material 11. Thus, the gas-liquid contact material 11 becomes wet. Then, the water that has traveled through the gas-liquid contact material 11 and dropped into the lower water tank 14 passes through the opening 20 and then falls into the lowermost water tank 15, and is then returned to the water supply equipment 13 by the circulation equipment.

  On the other hand, air to be pollutant-removed is supplied to the pollutant-removing device 10 in the lateral direction (in the direction of the arrow in FIG. 1), contacts with the water film formed on the gas-liquid contact material 11, and ammonia in the air. Water-soluble components such as sulfur dioxide and sulfur dioxide are dissolved in this water and removed. At this time, since the upper end and the lower end of the gas-liquid contact material 11 are sealed with water in the upper water tank 12 and the lower water tank 14, respectively, a part of the air passing through the gas-liquid contact material 11 1 is gas-liquid contact material. There is no bypass from the upper end or the lower end of 11. Therefore, a sufficient contact time between the air and the gas-liquid contact material 11 can be ensured, the gas-liquid contact can be reliably performed, and the removal efficiency of contaminants in the air can be increased.

  Moreover, since the lower end of the gas-liquid contact material 11 is immersed in the water in the lower water tank 14, even when it is necessary to humidify the air, such as in winter, the gas-liquid contact material 11 absorbs water. Drying can be prevented.

  In the above-described embodiment, the lower water tank 14 includes the same opening 20 as the upper water tank 12, but this is merely an example, and various changes can be made to the configuration of the lower water tank.

  That is, for example, as shown in FIG. 2, the lower water tank 21 is configured to include an immersion part 22 in which the lower end of the gas-liquid contact material 11 is immersed, and a drainage part 23 adjacent to the immersion part 22, The water overflowing from the immersion part 22 and flowing into the drainage part 23 is configured to fall into the lowermost water tank 15 from the opening 24 formed on the bottom surface of the drainage part 23, or as shown in FIG. The water tank 25 is configured to include an immersion part 26 in which the lower end of the gas-liquid contact material 11 is immersed, and a drainage part 27 communicating with the immersion part 26, and the water flowing into the drainage part 27 from the immersion part 26 is drained. It may be configured to overflow from the portion 27 and fall into the lowermost water tank 15.

  In the above-described embodiment, the water in the lowermost water tank 15 is returned to the water supply equipment 13 by the circulation equipment. However, this is merely an example. It is configured so that the water in the lowermost water tank 15 is drained as it is, or the pollutant removing devices 10 are installed in a plurality of stages in series in the vertical direction, and the water in the uppermost lower water tank 15 is disposed. Can be directly dropped onto the gas-liquid contact material 11, or the water supply facility 13 can be directly connected to the pure water supply facility.

  Furthermore, the gas that is subject to contaminant removal by the contaminant removal apparatus according to the present invention is not limited to the above-described air, and the present invention is applicable when removing contaminants in gases other than air. It goes without saying that is also applicable.

It is the schematic which shows the contaminant removal apparatus which concerns on embodiment of this invention. It is the schematic which shows the modification of the contaminant removal apparatus which concerns on embodiment of this invention. It is the schematic which shows another modification of the contaminant removal apparatus which concerns on embodiment of this invention. It is the schematic which shows the conventional contaminant removal apparatus. It is the schematic which shows another conventional contaminant removal apparatus. It is the schematic which shows another conventional contaminant removal apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Pollutant removal apparatus 11 Gas-liquid contact material 12 Upper water tank 13 Water supply equipment 14 Lower water tank 15 Bottom water tank 16 Bottom face 17 Opening (upper water tank)
20 Opening (lower water tank)
21 Lower water tank 22 Immersion part 23 Drainage part 25 Lower water tank 26 Immersion part 27 Drainage part

Claims (4)

A pollutant removing apparatus for removing a pollutant in a gas by passing the gas laterally through the gas-liquid contact material into which water has been dropped,
The upper and lower ends of the gas-liquid contact material are sealed with water,
Above the gas-liquid contact material, a bottom surface having an opening whose aperture ratio, which is a ratio of the area of the entire opening to the area of the bottom surface, falls within a range of 0.5 to 1% is brought into contact with the upper end of the gas-liquid contact material. In addition, an upper water tank is provided and a water supply facility for supplying water into the upper water tank is provided, and the lower side of the gas-liquid contact material is immersed below the gas-liquid contact material. A water tank,
The lowermost water tank is provided below the lower water tank, and the water discharged from the lower water tank falls into the lower water tank.   The pollutant removing device according to claim 1, wherein the bottom surface of the lower water tank is formed with the same opening as the bottom surface of the upper water tank.   The lower water tank includes an immersion part in which the lower end of the gas-liquid contact material is immersed, and a drainage part that is provided so that water overflowing from the immersion part flows in and has an opening formed on the bottom surface. The pollutant removal apparatus according to claim 1 or 2, wherein water discharged from the opening of the drainage part falls into the lowermost water tank. The lower water tank includes an immersion part in which the lower end of the gas-liquid contact material is immersed, and a drainage part provided to communicate with the immersion part, and water overflowing from the drainage part is the lowest The pollutant removing device according to claim 1 or 2, wherein the pollutant removing device is adapted to fall into a water tank.

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