JP4762162B2 - Photosensitive composition remover - Google Patents
Photosensitive composition remover Download PDFInfo
- Publication number
- JP4762162B2 JP4762162B2 JP2007012437A JP2007012437A JP4762162B2 JP 4762162 B2 JP4762162 B2 JP 4762162B2 JP 2007012437 A JP2007012437 A JP 2007012437A JP 2007012437 A JP2007012437 A JP 2007012437A JP 4762162 B2 JP4762162 B2 JP 4762162B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- mass
- terpene hydrocarbon
- composition
- removing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- 239000000203 mixture Substances 0.000 title claims description 165
- -1 terpene hydrocarbon Chemical class 0.000 claims description 80
- 235000007586 terpenes Nutrition 0.000 claims description 61
- 229930195733 hydrocarbon Natural products 0.000 claims description 56
- 239000007788 liquid Substances 0.000 claims description 52
- 239000004215 Carbon black (E152) Substances 0.000 claims description 45
- 239000002904 solvent Substances 0.000 claims description 34
- 239000000049 pigment Substances 0.000 claims description 33
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 21
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 16
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 16
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 14
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 14
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 10
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 8
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 8
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 claims description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 7
- 150000001733 carboxylic acid esters Chemical class 0.000 claims description 6
- 150000001298 alcohols Chemical class 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 150000004292 cyclic ethers Chemical class 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 150000003464 sulfur compounds Chemical class 0.000 claims description 3
- LFJQCDVYDGGFCH-JTQLQIEISA-N (+)-β-phellandrene Chemical compound CC(C)[C@@H]1CCC(=C)C=C1 LFJQCDVYDGGFCH-JTQLQIEISA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000000034 method Methods 0.000 description 25
- 239000000758 substrate Substances 0.000 description 21
- 238000004040 coloring Methods 0.000 description 18
- 238000000576 coating method Methods 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 16
- 238000004140 cleaning Methods 0.000 description 14
- 239000007787 solid Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 239000004973 liquid crystal related substance Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 8
- 239000002270 dispersing agent Substances 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 7
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 6
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 6
- 229920006243 acrylic copolymer Polymers 0.000 description 6
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 150000003505 terpenes Chemical class 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- XMGQYMWWDOXHJM-JTQLQIEISA-N (+)-α-limonene Chemical compound CC(=C)[C@@H]1CCC(C)=CC1 XMGQYMWWDOXHJM-JTQLQIEISA-N 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 4
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 4
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- YHQGMYUVUMAZJR-UHFFFAOYSA-N α-terpinene Chemical compound CC(C)C1=CC=C(C)CC1 YHQGMYUVUMAZJR-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NOEMSRWQFGPZQS-UHFFFAOYSA-N CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO Chemical compound CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO NOEMSRWQFGPZQS-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- YKFLAYDHMOASIY-UHFFFAOYSA-N γ-terpinene Chemical compound CC(C)C1=CCC(C)=CC1 YKFLAYDHMOASIY-UHFFFAOYSA-N 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- HXVNBWAKAOHACI-UHFFFAOYSA-N 2,4-dimethyl-3-pentanone Chemical compound CC(C)C(=O)C(C)C HXVNBWAKAOHACI-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- GYWYASONLSQZBB-UHFFFAOYSA-N 3-methylhexan-2-one Chemical compound CCCC(C)C(C)=O GYWYASONLSQZBB-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- UAHWPYUMFXYFJY-UHFFFAOYSA-N beta-myrcene Chemical compound CC(C)=CCCC(=C)C=C UAHWPYUMFXYFJY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- XOKSLPVRUOBDEW-UHFFFAOYSA-N pinane Chemical compound CC1CCC2C(C)(C)C1C2 XOKSLPVRUOBDEW-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- OGLDWXZKYODSOB-UHFFFAOYSA-N α-phellandrene Chemical compound CC(C)C1CC=C(C)C=C1 OGLDWXZKYODSOB-UHFFFAOYSA-N 0.000 description 2
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- JTPZTKBRUCILQD-UHFFFAOYSA-N 1-methylimidazolidin-2-one Chemical compound CN1CCNC1=O JTPZTKBRUCILQD-UHFFFAOYSA-N 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- MHDULSOPQSUKBQ-UHFFFAOYSA-N 2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C(N1C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MHDULSOPQSUKBQ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- BIFPSSTVLFHHEI-UHFFFAOYSA-N 4-methylheptan-2-one Chemical compound CCCC(C)CC(C)=O BIFPSSTVLFHHEI-UHFFFAOYSA-N 0.000 description 1
- XUPXMIAWKPTZLZ-UHFFFAOYSA-N 4-methylhexan-2-one Chemical compound CCC(C)CC(C)=O XUPXMIAWKPTZLZ-UHFFFAOYSA-N 0.000 description 1
- WYDAUGNQLUXTFB-UHFFFAOYSA-N 5-methylheptan-2-one Chemical compound CCC(C)CCC(C)=O WYDAUGNQLUXTFB-UHFFFAOYSA-N 0.000 description 1
- DPLGXGDPPMLJHN-UHFFFAOYSA-N 6-Methylheptan-2-one Chemical compound CC(C)CCCC(C)=O DPLGXGDPPMLJHN-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
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- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical compound COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- WSTYNZDAOAEEKG-UHFFFAOYSA-N Mayol Natural products CC1=C(O)C(=O)C=C2C(CCC3(C4CC(C(CC4(CCC33C)C)=O)C)C)(C)C3=CC=C21 WSTYNZDAOAEEKG-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- QRMHDGWGLNLHMN-UHFFFAOYSA-N Methyl methoxyacetate Chemical compound COCC(=O)OC QRMHDGWGLNLHMN-UHFFFAOYSA-N 0.000 description 1
- LOMVENUNSWAXEN-UHFFFAOYSA-N Methyl oxalate Chemical compound COC(=O)C(=O)OC LOMVENUNSWAXEN-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
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Description
本発明は、ガラス基板や半導体ウエーハ等に感光性組成物皮膜を形成する工程において、これらの基板の周辺部、縁辺部または裏面部に形成される未硬化の感光性組成物皮膜の除去、または、このような感光性組成物皮膜を形成する工程において使用される装置、部材ないし器具の表面に付着した未硬化の感光性組成物を除去する際に好適に使用可能な除去液に関する。 In the step of forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like, the present invention removes an uncured photosensitive composition film formed on the peripheral portion, edge portion or back surface portion of these substrates, or The present invention also relates to a removing liquid that can be suitably used for removing an uncured photosensitive composition adhering to the surface of an apparatus, member or instrument used in the step of forming such a photosensitive composition film.
本発明は、更に詳しくは、液晶や有機ＥＬ（エレクトロルミネセンス）等を利用したデバイスの製造工程で使用される基板上に感光性組成物皮膜を形成する工程において、基板の周辺部、縁辺部または裏面部に残存する未硬化の顔料を含有する感光性組成物皮膜の除去、またはこのような感光性組成物皮膜を形成する工程において使用される装置、部材や器具の表面に付着した未硬化の顔料を含有する感光性組成物を除去する際に、特に好適に使用可能な除去液に関する。 More specifically, the present invention relates to a step of forming a photosensitive composition film on a substrate used in a device manufacturing process using liquid crystal, organic EL (electroluminescence), or the like. Or removal of the photosensitive composition film containing uncured pigment remaining on the back surface, or uncured on the surface of an apparatus, member or instrument used in the process of forming such a photosensitive composition film It is related with the removal liquid which can be used especially suitably when removing the photosensitive composition containing these pigments.
従来より、液晶、有機ＥＬ、プラズマディスプレイ等のフラットパネルディスプレイまたは半導体を始めとする種々のデバイスの製造工程では、通常、リソグラフィー技術を用いた感光性組成物のパターン形成が行われる。 Conventionally, in the manufacturing process of various devices such as flat panel displays such as liquid crystal, organic EL and plasma displays, or semiconductors, pattern formation of a photosensitive composition is usually performed using lithography technology.
例えば、液晶や有機ＥＬに用いられるカラーフィルター製造におけるＲＧＢもしくは樹脂ブラックマトリックスのパターン形成方法としては、顔料分散法、染色法、印刷法、電着法等が用いられる。これらの方法のうち、顔料分散法は、顔料を含有する感光性組成物を用いたフォトリソグラフィーにより各色のパターニングを行う方法であり、安定な着色皮膜が得られることからカラーフィルター製造には好適な方法である。この方法により基板上に感光性組成物皮膜を形成する場合には、顔料を含有する感光性組成物を基板上に塗布する工程が含まれ、そのための塗布方法としては、スピンコート、スリットコート、ワイヤーバーコート、ロールコート、ディップコート、スプレーコート或いはこれらの組み合わせ等の方法が知られている。 For example, a pigment dispersion method, a dyeing method, a printing method, an electrodeposition method, or the like is used as a pattern forming method of RGB or resin black matrix in manufacturing a color filter used for liquid crystal or organic EL. Among these methods, the pigment dispersion method is a method of patterning each color by photolithography using a photosensitive composition containing a pigment, and is suitable for producing a color filter because a stable colored film can be obtained. Is the method. When forming a photosensitive composition film on a substrate by this method, a step of applying a photosensitive composition containing a pigment on the substrate is included, and the application method therefor includes spin coating, slit coating, Methods such as wire bar coating, roll coating, dip coating, spray coating, or combinations thereof are known.
例えば、スピンコートを行う場合、感光性組成物コート後の基板の周辺部、縁辺部の感光性組成物膜の盛り上がり部分や裏面に付着した感光性組成物を除去するために、感光性組成物除去液によるリンス処理、いわゆるエッジリンス、バックリンスが通常行われる。更に、スピンコーティングでは、通常はウエーハ外側に配置される感光性組成物回収用のカップに飛散した感光性組成物を除去する工程、いわゆるカップリンスにおいても、感光性組成物除去液による感光性組成物除去処理が行われる。 For example, when performing spin coating, in order to remove the photosensitive composition adhering to the peripheral portion of the substrate after coating the photosensitive composition, the raised portion of the photosensitive composition film on the edge portion, and the back surface, the photosensitive composition Rinsing with a removing solution, so-called edge rinsing and back rinsing are usually performed. Further, in spin coating, the photosensitive composition by the photosensitive composition removing liquid is also used in the process of removing the photosensitive composition scattered in the cup for recovering the photosensitive composition, which is usually disposed outside the wafer, in the so-called coupling. Object removal processing is performed.
また、カラーフィルター製造における感光性組成物塗布工程としては、前述のスピンコート以外にもスリットコート法による感光性組成物塗布やワイヤーバーを用いた塗布、ロールコーターによる塗布が行われるが、これらの方法においても感光性組成物塗布後に、それぞれスリットノズルやワイヤーバー等、塗布装置の一部または全部に付着した不要な感光性組成物の除去が実施される。 Moreover, as a photosensitive composition coating process in color filter production, in addition to the above-mentioned spin coating, photosensitive composition coating by a slit coating method, coating using a wire bar, and coating by a roll coater are performed. Also in the method, after application of the photosensitive composition, unnecessary photosensitive composition attached to part or all of the coating apparatus such as a slit nozzle and a wire bar is removed.
更に、その他にも感光性組成物を移送するための装置配管等、塗布装置の部材に付着した感光性組成物の除去が実施される場合がある。通常、このような感光性組成物の除去には除去液を用いた洗浄処理が行われる。 Furthermore, the photosensitive composition adhering to the member of the coating apparatus such as an apparatus pipe for transferring the photosensitive composition may be removed. Usually, a cleaning treatment using a removing solution is performed to remove such a photosensitive composition.
このような基板および装置に付着した感光性組成物のいずれの除去工程においても、感光性組成物成分の残留が問題となる。特に、カラーフィルター製造に用いられる顔料を含有する感光性組成物、すなわちＲＧＢ形成に用いられるカラーレジストや、樹脂ブラックマトリックス形成に用いられるブラックレジストは、顔料成分が基板や装置表面へ残留しやすく、これらが僅かであっても異物の原因となってカラーフィルター製造の不良率増加、あるいはカラーフィルターの色純度変化やコントラスト低下をきたす可能性がある。近年のカラーディスプレイに用いられるカラーフィルターには基板の大画面化、高精細化、および低コスト化の要求が高くなっているが、このような状況にあってカラーフィルターの性能、歩留まりに影響を及ぼす感光性組成物成分残留の回避は、ますます重要となってきている。 In any of the steps of removing the photosensitive composition adhered to the substrate and the apparatus, the remaining photosensitive composition component becomes a problem. In particular, a photosensitive composition containing a pigment used for color filter production, that is, a color resist used for RGB formation and a black resist used for resin black matrix formation, the pigment component tends to remain on the substrate or the device surface, Even a slight amount of these may cause foreign matters, leading to an increase in the defective rate of color filter manufacture, or a change in color purity of the color filter and a decrease in contrast. In recent years, color filters used in color displays are increasingly required to have a larger substrate, higher definition, and lower cost. Under these circumstances, the performance and yield of color filters are affected. The avoidance of residual photosensitive composition components is becoming increasingly important.
従来より、感光性組成物除去剤としては、グリコールエーテルやそのエステル、あるいはその混合物が一般的に用いられることが多い（例えば、特許文献１、２参照）。しかしながら、これらを上記カラーレジストの洗浄除去に応用した場合は、レジスト除去性が充分でなく、大量の除去液の使用が必要となり、また、除去残が発生するという問題があった。 Conventionally, glycol ether, its ester, or a mixture thereof is generally used as the photosensitive composition remover (see, for example, Patent Documents 1 and 2). However, when these are applied to the cleaning and removal of the color resist, there is a problem that the resist removability is not sufficient, a large amount of removing solution is required, and a removal residue is generated.
また、顔料を含有する着色組成物の除去に、感光性組成物に使用されている溶剤成分または界面活性剤や分散剤等の感光性組成物に含有される成分を用いる方法もある（例えば、特許文献３参照）。しかしながら、この場合には、感光性組成物に含有される溶剤成分のみを洗浄剤として用いた場合は顔料が沈降しやすく、充分な洗浄性が得られない。他方、界面活性剤や分散剤等、感光性組成物成分に含有される成分を洗浄液組成物中に含有させた場合は、これらの新たに添加された成分が蒸発残分として基板や装置部材上に残留しやすく、更なる洗浄工程が必要となるという課題がある。更には、蒸発残分の残留を好まない基板の端面や裏面の感光性組成物除去には、これらの添加成分を含む洗浄液組成物を、実質上用いることができないという課題を指摘することができる。 In addition, there is a method of using a component contained in a photosensitive composition such as a solvent component or a surfactant or a dispersant used in the photosensitive composition to remove the coloring composition containing the pigment (for example, (See Patent Document 3). However, in this case, when only the solvent component contained in the photosensitive composition is used as the cleaning agent, the pigment tends to settle, and sufficient cleaning properties cannot be obtained. On the other hand, when components contained in the photosensitive composition component such as a surfactant and a dispersant are included in the cleaning liquid composition, these newly added components are evaporated as residues on the substrate or apparatus member. There is a problem that it is likely to remain in the substrate and a further cleaning step is required. Furthermore, it is possible to point out the problem that the cleaning liquid composition containing these additive components cannot be substantially used for removing the photosensitive composition on the end face or back face of the substrate that does not like the residue of evaporation residue. .
本発明の目的は、従来技術における上記した課題を解決可能な感光性組成物除去液を提供することにある。 The objective of this invention is providing the photosensitive composition removal liquid which can solve the above-mentioned subject in a prior art.
本発明の他の目的は、感光性組成物除去性能に優れた感光性組成物除去液を提供することにある。 Another object of the present invention is to provide a photosensitive composition removing solution having excellent photosensitive composition removing performance.
本発明の更なる目的は、液晶や有機ＥＬ製造工程における基板上に感光性組成物皮膜を形成する工程において、基板の周辺部、縁辺部または裏面部に残存する顔料を含有する感光性組成物の除去に特に有効な除去液を提供することにある。 A further object of the present invention is to provide a photosensitive composition containing a pigment remaining on the peripheral portion, edge portion or back surface portion of a substrate in the step of forming a photosensitive composition film on the substrate in a liquid crystal or organic EL manufacturing process. Another object of the present invention is to provide a removal liquid that is particularly effective for removing water.
本発明者らは鋭意研究の結果、テルペン系炭化水素を含有する除去液を用いることで、充分な感光性組成物除去性能が得られることを見出した。本発明の感光性組成物除去液は、顔料含有感光性組成物の洗浄除去においても、優れた感光性組成物除去性能を発揮することが見出されている。 As a result of intensive studies, the present inventors have found that sufficient removal performance of the photosensitive composition can be obtained by using a removal liquid containing a terpene hydrocarbon. It has been found that the photosensitive composition removing liquid of the present invention exhibits excellent photosensitive composition removing performance even in washing and removal of a pigment-containing photosensitive composition.
本発明者らの知見によれば、本発明においてこのような除去性向上が得られる理由は、上記のテルペン系炭化水素が顔料含有感光性組成物の洗浄除去における顔料の分散性の低下を抑制することにより、顔料含有感光性組成物の除去性が向上するためと推定される。 According to the knowledge of the present inventors, the reason why such an improvement in removability can be obtained in the present invention is that the above-mentioned terpene hydrocarbon suppresses a decrease in dispersibility of the pigment in washing and removing the pigment-containing photosensitive composition. This is presumably because the removability of the pigment-containing photosensitive composition is improved.
本発明は、例えば、以下の態様を含む。 The present invention includes, for example, the following aspects.
［１］ 未硬化の感光性組成物の除去に用いられる除去液であって、該除去液はテルペン系炭化水素を１〜８０質量％、テルペン系炭化水素以外の溶剤を２０〜９９質量％含有し、該テルペン系炭化水素以外の溶剤が、鎖状アミド化合物、環状アミド化合物、硫黄化合物、環状エステル等、グリコールエーテル類、グリコールエーテルカルボキシレート類、カルボン酸エステル類、ケトン類、アルコール類、アルコキシカルボン酸エステル類および環状エーテル類からなる群から選ばれる少なくとも１種であることを特徴とする感光性組成物除去液。 [1] A removing liquid used for removing an uncured photosensitive composition, the removing liquid containing 1 to 80% by mass of a terpene hydrocarbon and 20 to 99% by mass of a solvent other than the terpene hydrocarbon. Solvents other than the terpene hydrocarbons include chain amide compounds, cyclic amide compounds, sulfur compounds, cyclic esters, etc., glycol ethers, glycol ether carboxylates, carboxylic acid esters, ketones, alcohols, alkoxy A photosensitive composition removing liquid, which is at least one selected from the group consisting of carboxylic acid esters and cyclic ethers .
［２］ 前記テルペン系炭化水素が、二重結合を２個以上含むものであることを特徴とする［１］に記載の感光性組成物除去液。 [2] The photosensitive composition removing liquid according to [1], wherein the terpene hydrocarbon includes two or more double bonds.
［３］ 前記テルペン系炭化水素が、ｐ−メンタジエン類であることを特徴とする［２］に記載の感光性組成物除去液。 [3] The photosensitive composition removing liquid according to [2], wherein the terpene hydrocarbon is p-menthadiene.
［４］ テルペン系炭化水素を５〜８０質量％、テルペン系炭化水素以外の溶剤を２０〜９５％含有することを特徴とする［１］〜［３］のいずれかに記載の感光性組成物除去液。 [4] The photosensitive composition according to any one of [1] to [3], containing 5 to 80% by mass of a terpene hydrocarbon and 20 to 95% of a solvent other than the terpene hydrocarbon. Remover.
［５］ テルペン系炭化水素が１〜４０質量％、テルペン系炭化水素以外の溶剤が６０〜９９質量％である組成を有し、且つ、テルペン系炭化水素以外の溶剤がプロピレングリコールモノメチルエーテル、３-メトキシプロピオン酸メチル、３−エトキシプロピオン酸エチル、Ｎ，Ｎ−ジメチルホルムアミド、Ｎ，Ｎ−ジメチルアセトアミド、Ｎ−メチル−２−ピロリドン、γ−ブチロラクトン、プロピレングリコールモノメチルエーテルアセテート、シクロヘキサノン、シクロペンタノンおよび酢酸ブチルの少なくとも１種である組成からなる群から選ばれる組成であることを特徴とする上記［１］〜［３］のいずれかに記載の感光性組成物除去液。 [5] The terpene hydrocarbon has a composition of 1 to 40% by mass, the solvent other than the terpene hydrocarbon is 60 to 99% by mass, and the solvent other than the terpene hydrocarbon is propylene glycol monomethyl ether, 3 -Methyl methoxypropionate, ethyl 3-ethoxypropionate, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, γ-butyrolactone, propylene glycol monomethyl ether acetate, cyclohexanone, cyclopentanone The photosensitive composition removing liquid according to any one of [1] to [3] above, which is a composition selected from the group consisting of at least one of butyl acetate and butyl acetate.
［６］ テルペン系炭化水素が５〜４０質量％、テルペン系炭化水素以外の溶剤が６０〜９５質量％である組成を有し、且つ、該テルペン系炭化水素以外の溶剤が、プロピレングリコールモノメチルエーテル、３-メトキシプロピオン酸メチル、３−エトキシプロピオン酸エチル、Ｎ，Ｎ−ジメチルホルムアミド、Ｎ，Ｎ−ジメチルアセトアミド、Ｎ−メチル−２−ピロリドン、γ−ブチロラクトン、プロピレングリコールモノメチルエーテルアセテート、シクロヘキサノン、シクロペンタノンおよび酢酸ブチルのうち少なくとも１種である組成であることを特徴とする［１］〜［４］のいずれかに記載の感光性組成物除去液。 [6] The terpene hydrocarbon has a composition of 5 to 40% by mass, the solvent other than the terpene hydrocarbon is 60 to 95% by mass, and the solvent other than the terpene hydrocarbon is propylene glycol monomethyl ether Methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, γ-butyrolactone, propylene glycol monomethyl ether acetate, cyclohexanone, cyclo The photosensitive composition removing liquid according to any one of [1] to [4], wherein the composition is at least one of pentanone and butyl acetate.
［７］ 顔料を含有する感光性組成物の除去に用いられる［１］〜［６］のいずれかに記載の感光性組成物除去液。 [ 7 ] The photosensitive composition removing liquid according to any one of [1] to [ 6 ], which is used for removing a photosensitive composition containing a pigment.
［８］ 顔料を含有するアクリル系感光性組成物の除去に用いられる［１］〜［６］のいずれかに記載の感光性組成物除去液。 [ 8 ] The photosensitive composition removing liquid according to any one of [1] to [ 6 ], which is used for removing an acrylic photosensitive composition containing a pigment.
［９］ 感光前の顔料を含有する感光性組成物の除去に用いられる［１］〜［６］のいずれかに記載の感光性組成物除去液。 [ 9 ] The photosensitive composition removing solution according to any one of [1] to [ 6 ], which is used for removing a photosensitive composition containing a pigment before exposure.
本発明の除去液は、液晶や有機ＥＬ製造工程における基板上に感光性組成物皮膜を形成する工程において、基板周辺部、縁辺部または裏面部に残存する未硬化の顔料を含有する感光性組成物皮膜の除去、または装置部材や器具の表面に付着した未硬化の顔料を含有する感光性組成物の除去に効果を発揮するので有用である。 The removal liquid of the present invention is a photosensitive composition containing an uncured pigment remaining on the peripheral portion, edge portion or back surface portion of the substrate in the step of forming a photosensitive composition film on the substrate in a liquid crystal or organic EL manufacturing process. This is useful because it is effective for removing a physical film or removing a photosensitive composition containing an uncured pigment adhering to the surface of an apparatus member or instrument.
以下に、本発明の感光性組成物除去液について説明する。 Below, the photosensitive composition removal liquid of this invention is demonstrated.
（感光性組成物除去液）
本発明の感光性組成物除去液（以下「除去液」という。）は、未硬化の感光性組成物の除去に用いられるものであり、テルペン系炭化水素を少なくとも１種含有し、その含有割合は１〜８０質量％である。
(Photosensitive composition remover)
The photosensitive composition removing liquid (hereinafter referred to as “removing liquid”) of the present invention is used for removing an uncured photosensitive composition and contains at least one terpene hydrocarbon, and the content ratio thereof. Is 1-80 mass%.
（テルペン系炭化水素）
本発明に用いるテルペン系炭化水素は、（Ｃ５Ｈ８）ｎの組成を有する炭化水素およびその誘導体（α−ピネン、ピナン等）をいう。テルペン系炭化水素の炭素数は、１０〜２０が好ましく、炭素数１０のものが特に好ましい。
(Terpene hydrocarbon)
The terpene hydrocarbon used in the present invention refers to a hydrocarbon having a composition of (C 5 H 8 ) n and derivatives thereof (α-pinene, pinane, etc.). The carbon number of the terpene hydrocarbon is preferably 10 to 20, and particularly preferably 10 carbon atoms.
（テルペン系炭化水素の具体例）
具体的には、ミルセン、オシメン等の鎖状モノテルペン、α−テルピネン、β−テルピネン、γ−テルピネン、α−フェランドレン、β−フェランドレン、リモネン、テルピノーレン等の単環式６員環モノテルペンを例示することができるが、本発明はこれらに限定されない。
(Specific examples of terpene hydrocarbons)
Specifically, myrcene, chain monoterpenes such as ocimene, alpha-terpinene, beta-terpinene, .gamma.-terpinene, alpha-phellandrene, beta-Blow down the drain, limonene, monocyclic 6-membered ring mono- such terpinolene Although a terpene can be illustrated, this invention is not limited to these.
これらのテルペン系炭化水素は感光性組成物除去液中に単独で含有されていてもよいし、２種以上のテルペン系化合物の組み合わせとして含有されていてもよい。 These terpene hydrocarbons may be contained alone in the photosensitive composition removing solution, or may be contained as a combination of two or more terpene compounds.
（好ましいテルペン系炭化水素）
これらの中でも、特に二重結合を２個以上有する炭化水素であって、且つアルキル基を有するテルペン系炭化水素（例えば、メンタジエン類）を用いることが更に望ましい。アルキル基は、直鎖状であっても分岐状であってもよく、また、２個以上の基が連結して環状構造をなしていてもよい。このようなメンタジエン類の具体的な例としては、１，３−ｐ−メンタジエン、１，４−ｐ−メンタジエン、１，４（８）−ｐ−メンタジエン、１，８−ｐ−メンタジエン等のｐ−メンタジエン類が、感光性組成物の除去性能、特に、顔料を含有する感光性組成物の除去性能が高く、更に、感光性組成物除去に適した乾燥性を有する点から好ましい。
(Preferred terpene hydrocarbon)
Among these, it is more desirable to use a terpene hydrocarbon (for example, mentadiene) having 2 or more double bonds and having an alkyl group. The alkyl group may be linear or branched, and two or more groups may be linked to form a cyclic structure. Specific examples of such menthadiene acids, 1, 3-p-menthadiene, 1, 4-p-menthadiene, 1,4 (8) -p- menthadiene, 1, such as 8-p-menthadienes p -Mentadiene is preferable from the viewpoint that the removal performance of the photosensitive composition, in particular, the removal performance of the photosensitive composition containing the pigment is high, and further has a drying property suitable for removal of the photosensitive composition.
（調製法）
本発明の除去液を実際に使用するにあたっては、上記したテルペン系炭化水素類の調製法は特に制限されない。入手の容易性の点からは、例えば、商品名ジペンテンＴ（日本テルペン化学社製）、タービノーレン（日本テルペン化学社）、Ｄ−リモネン（日本テルペン化学社製）、ジペンテンＺ１（ヤスハラケミカル社製）等のテルペン系炭化水素の混合物が、本発明の除去液に好適に使用できる。
(Preparation method)
In actually using the removing liquid of the present invention, the method for preparing the terpene hydrocarbons is not particularly limited. From the point of availability, for example, trade name dipentene T (manufactured by Nippon Terpene Chemical Co., Ltd.), terbinolene (Japan Terpene Chemical Co., Ltd.), D-limonene (manufactured by Nippon Terpene Chemical Co., Ltd.), dipentene Z1 (manufactured by Yashara Chemical Co., Ltd.), etc. A mixture of these terpene hydrocarbons can be suitably used in the removing liquid of the present invention.
（テルペン系炭化水素の含有量）
本発明の除去液には、上記テルペン系炭化水素が（「テルペン系炭化水素」＋「テルペン系炭化水素以外の溶剤」の合計質量を基準として）１質量％〜８０質量％含有される。該テルペン系炭化水素の含有量は、５質量％〜８０質量％であることが好ましく、５質量％〜４０質量％であることが更に好ましい。テルペン系炭化水素の含有量が１質量％以上であれば、感光性組成物除去性能、特に、顔料を含む感光性組成物における顔料の分散除去性能が発揮される。一方、該含有量が８０質量％以下であれば、感光性組成物に含まれる樹脂成分の溶解性能が低下することがなく、結果として感光性組成物の除去性能低下を招くことがないため好ましい。
(Terpene hydrocarbon content)
The removal liquid of the present invention contains 1% by mass to 80% by mass of the terpene hydrocarbon (based on the total mass of “terpene hydrocarbon” + “solvent other than terpene hydrocarbon”). The content of the terpene hydrocarbon is preferably 5% by mass to 80% by mass, and more preferably 5% by mass to 40% by mass. When the content of the terpene hydrocarbon is 1% by mass or more, the photosensitive composition removal performance, particularly the pigment dispersion removal performance in the photosensitive composition containing the pigment is exhibited. On the other hand, if the content is 80 wt% or less, without dissolution performance decreases in the resin component contained in the photosensitive composition, preferable because not caused the removal performance degradation of the photosensitive composition as a result of .
（テルペン系炭化水素以外の溶剤）
本発明の除去液には、テルペン系炭化水素以外の溶剤を２０〜９９質量％含有することで、感光性組成物の溶解除去性を高めることができる。このテルペン系炭化水素以外の溶剤の含有量は、２０〜９５質量％であることが好ましく、６０〜９５質量％であることが更に好ましい。テルペン系炭化水素以外の溶剤の具体的な種類の例としては、例えば、鎖状アミド化合物、環状アミド化合物、硫黄化合物、環状エステル等、グリコールエーテル類、グリコールエーテルカルボキシレート類、カルボン酸エステル類、ケトン類、アルコール類、アルコキシカルボン酸エステル類および環状エーテル類が挙げられる。
(Solvents other than terpene hydrocarbons)
The removal liquid of this invention can improve the melt | dissolution removability of a photosensitive composition by containing 20-99 mass% of solvents other than a terpene hydrocarbon. The content of the solvent other than the terpene hydrocarbon is preferably 20 to 95% by mass, and more preferably 60 to 95% by mass. Examples of specific types of solvents other than terpene hydrocarbons include, for example, chain amide compounds, cyclic amide compounds, sulfur compounds, cyclic esters, glycol ethers, glycol ether carboxylates, carboxylic acid esters , Ke ton, alcohols, alkoxy carboxylic acid esters and cyclic ethers and the like.
（テルペン系炭化水素以外の溶剤の具体例）
テルペン系炭化水素以外の溶剤（以下「その他の溶剤」という）の具体例としては、例えば、以下のものが挙げられる。
(Specific examples of solvents other than terpene hydrocarbons)
Examples of the terpene solvent other than hydrocarbons (hereinafter referred to as "other solvents"), for example, it can be mentioned up as follows.
（１）ホルムアミド、Ｎ−メチルホルムアミド、Ｎ，Ｎ−ジメチルホルムアミド、Ｎ−エチルホルムアミド、Ｎ，Ｎ−ジエチルホルムアミド、Ｎ，Ｎ−ジメチルアセトアミド、テトラメチル尿素、Ｎ−メチル−２−ピロリドン、Ｎ−メチルイミダゾリジノン等の環状アミド化合物； (1) Formamide, N-methylformamide, N, N-dimethylformamide, N-ethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, tetramethylurea, N-methyl-2-pyrrolidone, N- Cyclic amide compounds such as methylimidazolidinone;
（２）ジメチルスルホキシド、スルホラン、γ−ブチロラクトン、等のスルホキシド類、ラクトン類； (2) Sulfoxides such as dimethyl sulfoxide, sulfolane and γ-butyrolactone, lactones;
（３）エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノｎ−プロピルエーテル、エチレングリコールイソプロピルエーテル、エチレングリコールモノｎ−ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノｎ−ブチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールエチルメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノ−ｎ−ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールジメチルエーテル、トリプロピレングリコールモノメチルエーテル等のグリコールエーテル類； (3) Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-propyl ether, ethylene glycol isopropyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol mono n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomer Propyl ether, propylene glycol mono -n- butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, glycol ethers such as tripropylene glycol monomethyl ether;
（４）エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、等のグリコールエーテルカルボキシレート類； (4) Glycol ether carboxylates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, etc. Kind;
（５）酢酸エチル、酢酸ｎ−プロピル、酢酸イソプロピル、酢酸ｎ−ブチル、酢酸ｓｅｃ−ブチル、酢酸イソブチル、酢酸アミル、酢酸ヘキシル、酢酸シクロヘキシル、プロピオン酸ブチル、プロピオン酸アミル、酪酸プロピル、酪酸ブチル、安息香酸メチル、安息香酸エチル、蓚酸ジメチル、蓚酸ジエチル、コハク酸ジメチル、マレイン酸ジメチル、マレイン酸ジエチル等のカルボン酸エステル類；炭酸エチレン、炭酸プロピレン等の炭酸エステル類； (5) ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, sec-butyl acetate, isobutyl acetate, amyl acetate, hexyl acetate, cyclohexyl acetate, butyl propionate, amyl propionate, propyl butyrate, butyl butyrate, Carboxylic acid esters such as methyl benzoate, ethyl benzoate, dimethyl oxalate, diethyl oxalate, dimethyl succinate, dimethyl maleate, and diethyl maleate; Carbonates such as ethylene carbonate and propylene carbonate ;
（６）アセトン、メチルエチルケトン、ジ−ｉｓｏ−ブチルケトン、メチル−ｉｓｏ−ブチルケトン、メチル−ｎ−ブチルケトン、ジ−ｉｓｏ−プロピルケトン、メチル−ｎ−アミルケトン、メチル−ｉｓｏ−アミルケトン、３−メチル−２−ヘキサノン、４−メチル−２−ヘキサノン、メチル−ｎ−ヘキシルケトン、メチル−ｉｓｏ−ヘキシルケトン、４−メチル−２−ヘプタノン、５−メチル−２−ヘプタノン、３−ヘプタノン、４−ヘプタノン、２，６−ジメチル−４−ヘプタノン、シクロペンタノン、シクロヘキサノン等のケトン類； (6) Acetone, methyl ethyl ketone, di-iso-butyl ketone, methyl-iso-butyl ketone, methyl-n-butyl ketone, di-iso-propyl ketone, methyl-n-amyl ketone, methyl-iso-amyl ketone, 3-methyl-2- Hexanone, 4-methyl-2-hexanone, methyl-n-hexyl ketone, methyl-iso-hexyl ketone, 4-methyl-2-heptanone, 5-methyl-2-heptanone, 3-heptanone, 4-heptanone, 2, Ketones such as 6-dimethyl-4-heptanone, cyclopentanone, cyclohexanone;
（７）ブチルアルコール、ｎ−アミルアルコール、ｉｓｏ−アミルアルコール、ベンジルアルコール、シクロヘキサノール、フルフリルアルコール等のアルコール類； (7) Alcohols such as butyl alcohol, n-amyl alcohol, iso-amyl alcohol, benzyl alcohol, cyclohexanol, and furfuryl alcohol;
（８）２−メトキシ酢酸メチル、２−エトキシ酢酸エチル、３−エトキシプロピオン酸エチル、３−メトキシプロピオン酸メチル、３−メトキシプロピオン酸エチル、３−エトキシプロピオン酸メチル、２−ヒドロキシプロピオン酸プロピル、２−メトキシプロピオン酸エチル、２−エトキシプロピオン酸プロピル、２−エトキシプロピオン酸メチル、２−エトキシプロピオン酸エチル、β−メトキシイソ酪酸メチル等のアルコキシカルボン酸エステル類； (8) methyl 2-methoxyacetate, ethyl 2-ethoxyacetate, ethyl 3 -ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, propyl 2-hydroxypropionate, Alkoxycarboxylates such as ethyl 2-methoxypropionate, propyl 2-ethoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl β-methoxyisobutyrate;
（９）テトラヒドロフラン、１，３−ジオキソラン、１，４−ジオキサン等の環状エーテル類。 (9) Cyclic ethers such as tetrahydrofuran, 1,3-dioxolane and 1,4-dioxane.
（好ましい溶剤）
これらの中でも、「その他の溶剤」としては、本発明の除去対象物である感光性組成物の溶解性を有し、テルペン系炭化水素との相溶性がある溶剤であれば、どのようなものでも使用することが可能である。例えば、鎖状アミド化合物、環状アミド化合物、スルホキシド類、ラクトン類、環状エステル等、グリコールエーテル類、グリコールエーテルカルボキシレート類、カルボン酸エステル類、アルコキシカルボン酸エステル類、ケトン類、アルコール類は、感光性組成物の洗浄性を高め、除去液に洗浄除去に適した乾燥性を付与させるので好ましい。
(Preferred solvent)
Among these, as the “other solvent”, any solvent can be used as long as it has the solubility of the photosensitive composition that is the removal target of the present invention and is compatible with the terpene hydrocarbon. But it can be used. For example, chain amide compounds, cyclic amide compounds, sulfoxides, lactones, cyclic esters, etc., glycol ethers, glycol ether carboxylates, carboxylic acid esters, alkoxycarboxylic acid esters, ketones, alcohols are photosensitive. This is preferable because the cleaning property of the composition is improved and the removal solution is given a drying property suitable for cleaning and removal.
より具体的な例としては、例えば、Ｎ−メチルホルムアミド、Ｎ，Ｎ−ジメチルホルムアミド、Ｎ，Ｎ−ジメチルアセトアミド、Ｎ−メチル−２−ピロリドン、ジメチルスルホキシドおよびγ−ブチロラクトン、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、酢酸ブチル、３−エトキシプロピオン酸エチル、３−エトキシプロピオン酸メチル、３−メトキシプロピオン酸メチル、シクロペンタノン、シクロヘキサノン、ｎ−ブチルアルコール等が挙げられる。 More specific examples include, for example, N-methylformamide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide and γ-butyrolactone, propylene glycol monomethyl ether, di Examples include propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, butyl acetate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, methyl 3-methoxypropionate, cyclopentanone, cyclohexanone, and n-butyl alcohol.
より好ましくは、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、酢酸ブチル、３−エトキシプロピオン酸エチル、３−メトキシプロピオン酸メチル、シクロペンタノン、シクロヘキサノンが挙げられる。このようなテルペン系以外の溶剤成分は、単独であっても、また２種以上を組み合わせて用いてもよい。 More preferably, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, butyl acetate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, cyclopentanone, and cyclohexanone are mentioned. Such solvent components other than the terpene system may be used alone or in combination of two or more.
（洗浄液の組成）
本発明の洗浄液は、テルペン系炭化水素が１〜８０質量％、その他の溶剤が２０〜９９質量％の組成を有する。本発明の洗浄液は、テルペン系炭化水素が５〜８０質量％、その他の溶剤が２０〜９５質量％であることがより好ましく、テルペン系炭化水素が５〜４０質量％、その他の溶剤が６０〜９５質量％であるであることが更に好ましい。テルペン系炭化水素は二重結合を２個以上含むものが好ましく、より好ましくは、１，３−ｐ−メンタジエン、１，４−ｐ−メンタジエン、１，４（８）−ｐ−メンタジエン、１，８−ｐ−メンタジエン等のｐ−メンタジエン類のうち少なくとも１種から選ぶことが好ましい。他方、「その他の溶剤」は、プロピレングリコールモノメチルエーテル、３-メトキシプロピオン酸メチル、３−エトキシプロピオン酸エチル、Ｎ，Ｎ−ジメチルホルムアミドおよびＮ，Ｎ−ジメチルアセトアミド、Ｎ−メチル−２−ピロリドン、γ−ブチロラクトン、プロピレングリコールモノメチルエーテルアセテート、シクロヘキサノン、シクロペンタノン、酢酸ブチルのうち少なくとも１種から選ぶことが好ましい。
(Composition of cleaning solution)
The cleaning liquid of the present invention has a composition of 1 to 80% by mass of terpene hydrocarbon and 20 to 99% by mass of other solvents. In the cleaning liquid of the present invention, the terpene hydrocarbon is preferably 5 to 80% by mass and the other solvent is preferably 20 to 95% by mass, the terpene hydrocarbon is 5 to 40% by mass, and the other solvent is 60 to 60% by mass. More preferably, it is 95 mass%. Terpene hydrocarbons, preferably those containing a double bond two or more, more preferably, 1, 3-p-menthadiene, 1, 4-p-menthadiene, 1,4 (8) -p- menthadiene, 1, It is preferable to select from at least one of p-menthadienes such as 8-p-menthadiene. On the other hand, “other solvents” include propylene glycol monomethyl ether, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, N, N-dimethylformamide and N, N-dimethylacetamide, N-methyl-2-pyrrolidone, It is preferable to select from at least one of γ-butyrolactone, propylene glycol monomethyl ether acetate, cyclohexanone, cyclopentanone, and butyl acetate.
（感光性樹脂組成物）
次に、本発明の除去液が適用される感光性樹脂組成物について説明する。
(Photosensitive resin composition)
Next, the photosensitive resin composition to which the removing liquid of the present invention is applied will be described.
本発明の除去液が好適に使用可能な感光性組成物は、通常は、液晶、有機ＥＬ、半導体等の、各種電子部品の製造に使用されている感光性組成物である。特に、本発明の除去液は液晶、有機ＥＬ等に用いられる顔料を含有する感光性組成物の洗浄除去に好適に用いられる。これら感光性組成物は、一般的にアルカリで現像可能な皮膜形成物質と感光性物質からなるものである。更に顔料を含有する感光性組成物は、これに顔料や分散剤が更に添加されるものである。感光性組成物に含まれる皮膜形成物質としては、アクリル系樹脂、ノボラック系樹脂、ポリイミド系樹脂、ポリビニルフェノール系樹脂等を挙げることができるが、本発明は特にアクリル系樹脂を皮膜形成物質として含有する感光性組成物の除去に好適に用いることができる。 The photosensitive composition in which the removing liquid of the present invention can be suitably used is usually a photosensitive composition used in the production of various electronic parts such as liquid crystal, organic EL, and semiconductor. In particular, the removing liquid of the present invention is suitably used for washing and removing photosensitive compositions containing pigments used for liquid crystals, organic EL, and the like. These photosensitive compositions generally comprise a film-forming substance that can be developed with an alkali and a photosensitive substance. Furthermore, the photosensitive composition containing a pigment is such that a pigment and a dispersant are further added thereto. Examples of the film forming substance contained in the photosensitive composition include acrylic resins, novolac resins, polyimide resins, polyvinylphenol resins, etc., but the present invention particularly contains acrylic resins as film forming substances. It can be suitably used for removing the photosensitive composition.
本発明の除去液は、被洗浄物に塗布あるいは付着された状態の感光性組成物の除去に適応することができ、特に、感光前の感光性組成物の除去に好適に用いることができる。感光性組成物は溶剤が含有されている状態であってもよいし、溶剤が揮発した後の状態であってもよい。 The removal liquid of the present invention can be applied to the removal of the photosensitive composition applied or adhered to the object to be cleaned, and can be suitably used particularly for the removal of the photosensitive composition before exposure. The photosensitive composition may be in a state in which a solvent is contained, or may be in a state after the solvent is volatilized.
（感光性組成物を除去する方法）
本発明の除去液を用いて、感光性組成物を除去する方法は特に制限されない。この感光性組成物を除去する方法としては、例えば、感光性組成物が塗布または付着した被洗浄物に本除去液をノズル等から棒状、液滴状あるいはミスト状に吹きかけて除去する方法、本発明の除去液に被洗浄物を浸漬する方法等が挙げられる。除去を効率的に行うために、超音波照射や、ブラシ等による物理的洗浄を併用することも可能である。
(Method for removing photosensitive composition)
The method for removing the photosensitive composition using the removing liquid of the present invention is not particularly limited. As a method for removing the photosensitive composition, for example, a method in which the removal liquid is sprayed from a nozzle or the like into a rod shape, a droplet shape or a mist shape on an object to be cleaned on which the photosensitive composition has been applied or adhered. Examples include a method of immersing an object to be cleaned in the removal liquid of the invention. In order to perform the removal efficiently, it is also possible to use ultrasonic cleaning or physical cleaning with a brush or the like.
特に液晶、半導体、有機ＥＬ製造の感光性組成物塗布工程において、基板の周辺部、縁辺部、または裏面部に付着した不要の未硬化の感光性組成物の除去、または塗布装置の一部または全部に付着した不要の未硬化の感光性組成物の除去に用いることができる。 In particular, in the photosensitive composition coating process of liquid crystal, semiconductor, and organic EL manufacturing, removal of unnecessary uncured photosensitive composition attached to the peripheral portion, edge portion, or back surface portion of the substrate, or a part of the coating apparatus or It can be used to remove unwanted uncured photosensitive composition adhering to all.
本発明の除去液は、液晶や有機ＥＬに用いられるカラーフィルター製造工程の顔料を含有する感光性組成物の塗布工程において、特に好適に使用することができる。 The removing liquid of the present invention can be particularly preferably used in a coating process of a photosensitive composition containing a pigment in a color filter manufacturing process used for liquid crystals and organic EL.
本発明の除去液は、基板上にスピンコート法で感光性組成物を塗布する際の、基板周辺部、縁辺部、あるいは裏面部の未硬化の感光性組成物の除去、いわゆるエッジリンス、バックリンスのリンス剤として、またスピンコート時にカップに飛散した感光性組成物を洗浄除去する、いわゆる、カップリンスにも好適に使用可能である。 The removing liquid of the present invention is used to remove uncured photosensitive composition from the periphery, edge, or back of the substrate when applying the photosensitive composition on the substrate by spin coating, so-called edge rinse, back As a rinsing agent for rinsing, it can also be suitably used for so-called cup rinsing in which the photosensitive composition scattered in the cup during spin coating is washed away.
スピンコート法以外に基板上に感光性組成物を塗布する方法として、スリットコート法やワイヤーバーコート法、あるいはロールコート法等が知られているが、スリットノズルやワイヤーバー、印刷版等、塗布装置の部材や器具の表面に付着した未硬化の感光性組成物を除去する際にも、本発明の除去液は好適に使用することができる。 As a method of applying the photosensitive composition on the substrate other than the spin coating method, a slit coating method, a wire bar coating method, a roll coating method or the like is known. The removal liquid of the present invention can be suitably used also when removing the uncured photosensitive composition adhering to the surface of the apparatus member or the instrument.
（他の態様）
また、本発明の別の態様は、上記除去液を用いて上記方法により未硬化の感光性組成物が除去された液晶用、半導体用または有機ＥＬ用の基板である。
(Other aspects)
Another aspect of the present invention is a substrate for a liquid crystal, a semiconductor or an organic EL from which an uncured photosensitive composition has been removed by the above method using the above-described removing liquid.
以下に実施例を挙げて本発明を説明するが、もちろん本発明はこれらの実施例により何ら限定されるものではない。 EXAMPLES The present invention will be described below with reference to examples, but the present invention is of course not limited to these examples.
（洗浄性の評価）
なお、洗浄性は洗浄液に３分間浸漬後、感光性着色組成物の溶解状況を目視観察により次の３段階で評価した。
(Evaluation of detergency)
In addition, the washing | cleaning property evaluated the dissolution condition of the photosensitive coloring composition in the following three steps by visual observation after being immersed in a washing | cleaning liquid for 3 minutes.
Ａ … 完全に除去されている
Ｂ … 部分的に溶解している
Ｃ … ほとんど溶解していない
A… completely removed
B ... Partially dissolved
C ... almost undissolved
＜調製例１＞アクリル系共重合体の調製
滴下漏斗、温度計、冷却管、撹拌機を付した４つ口フラスコにメタクリル酸（ＭＡ） １２．０質量部、メタクリル酸メチル（ＭＭＡ） １４．０質量部、メタクリル酸ｎ−ブチル（ＢＭＡ） ４３．０質量部、２−ヒドロキシエチルアクリレート（ＨＥＡ） ６．０質量部、エチルセロソルブアセテート（ＥＧＡ） ２２５．０質量部を仕込み、１時間４つ口フラスコ内を窒素置換した。更にオイルバスで９０℃まで加温した後、ＭＡ １２．０質量部、ＭＭＡ １４．０質量部、ＢＭＡ ４３．０質量部、ＨＭＡ ６．０質量部、ＥＧＡ ２２５．０質量部、２，２’−アゾビスイソブチロニトリル（ＡＩＢＮ） ３．２質量部の混合液を１時間かけて滴下した。
Preparation Example 1 Preparation of Acrylic Copolymer Methacrylic acid (MA) 12.0 parts by mass, methyl methacrylate (MMA) in a four-necked flask equipped with a dropping funnel, thermometer, condenser, and stirrer 0 parts by weight, 43.0 parts by weight of n-butyl methacrylate (BMA), 6.0 parts by weight of 2-hydroxyethyl acrylate (HEA), 225.0 parts by weight of ethyl cellosolve acetate (EGA) The inside of the neck flask was replaced with nitrogen. Further, after heating to 90 ° C. with an oil bath, MA 12.0 parts by mass, MMA 14.0 parts by mass, BMA 43.0 parts by mass, HMA 6.0 parts by mass, EGA 225.0 parts by mass, 2, 2 '-Azobisisobutyronitrile (AIBN) 3.2 parts by mass of a mixed solution was added dropwise over 1 hour.
温度９０℃で３時間重合を行った後、ＡＩＢＮ １．０質量部とＥＧＡ １５．０質量部の混合液を加え更に１００℃に昇温して１．５時間重合を行った後放冷した。このようにして得たアクリル系共重合体の固形分濃度は２２．１質量％、酸価（ＪＩＳ Ｋ５６０１により測定した酸価）は９２ｍｇＫＯＨ／ｇ、ＧＰＣ（ゲルパーミエーションクロマトグラフィー）により測定したポリスチレン換算の質量平均分子量は２２，０００であった。 After carrying out the polymerization at 90 ° C. for 3 hours, a mixture of 1.0 part by weight of AIBN and 15.0 parts by weight of EGA was added, the temperature was further raised to 100 ° C., the polymerization was carried out for 1.5 hours, and then allowed to cool. . The acrylic copolymer thus obtained had a solid content concentration of 22.1% by mass, an acid value (acid value measured according to JIS K5601) of 92 mgKOH / g, and polystyrene measured by GPC (gel permeation chromatography). The converted mass average molecular weight was 22,000.
＜調製例２＞感光性着色組成物Ａ：黒色感光性着色組成物の調製
調製例１で得られたアクリル系共重合体 ３０．０質量部、ＥＧＡ５．０質量部，フローレンＤＯＰＡ−３３（共栄社化学株式会社製 分散剤 固形分濃度３０質量％）３．３質量部、Special Black ４（デグサ社 カーボンブラック）６．６質量部を混合後１晩放置した。更に１時間撹拌した後、３本ロールミル（株式会社 小平製作所製 型式ＲIII−１ＲＭ−２）に４回通した。得られた黒色インキにＥＧＡを加えて濃度調整することにより、固形分濃度１８．０質量％の黒色着色組成物を得た。
<Preparation Example 2> Photosensitive Coloring Composition A: Preparation of Black Photosensitive Coloring Composition 30.0 parts by mass of acrylic copolymer obtained in Preparation Example 1, 5.0 parts by mass of EGA, Floren DOPA-33 (Kyoeisha) Chemical Co., Ltd. Dispersant (solid content concentration 30% by mass) 3.3 parts by mass and Special Black 4 (Degussa Carbon Black) 6.6 parts by mass were mixed and allowed to stand overnight. After further stirring for 1 hour, the mixture was passed four times through a three-roll mill (Model RIII-1RM-2 manufactured by Kodaira Seisakusho Co., Ltd.). By adjusting the concentration by adding EGA to the obtained black ink, a black colored composition having a solid content concentration of 18.0% by mass was obtained.
このようにして得られた黒色着色組成物１００質量部に更にジペンタエルスリトールヘキサアクリレート４．４質量部、２−（４−メトキシフェニル）−４，６−ビス（トリクロロメチル）−ｓ−トリアジン２．２質量部およびＥＧＡ２５質量部を添加し、充分攪拌して感光性着色組成物Ａを得た。 In addition to 100 parts by mass of the black colored composition thus obtained, 4.4 parts by mass of dipentaerythritol hexaacrylate, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s- Photosensitive coloring composition A was obtained by adding 2.2 parts by weight of triazine and 25 parts by weight of EGA and stirring sufficiently.
＜調製例３＞感光性着色組成物Ｂ：緑色感光性着色組成物の調製
調製例１で得られたアクリル系共重合体 ３０．０質量部（固形分 ６．６質量部）、ＥＧＡ ５．０質量部、フローレンＤＯＰＡ−３３（商標：共栄社化学株式会社製 分散剤
固形分濃度３０質量％）３．３質量部、Pigment Green ３６ ６．６質量部を混合後１晩放置した。更に１時間撹拌した後、３本ロールミル（株式会社小平製作所製 型式ＲIII−１ＲＭ−２）に４回通した。得られた緑色インキにＥＧＡを加えて濃度調整することにより、固形分濃度１８．０質量％の緑色着色組成物を得た。
<Preparation Example 3> Photosensitive Coloring Composition B: Preparation of Green Photosensitive Coloring Composition 30.0 parts by mass of the acrylic copolymer obtained in Preparation Example 1 (solid content 6.6 parts by mass), EGA 5. 0 parts by mass, Floren DOPA-33 (Trademark: Kyoeisha Chemical Co., Ltd. Dispersant
(Solid content concentration: 30% by mass) 3.3 parts by mass and 6.6 parts by mass of Pigment Green 36 were mixed and allowed to stand overnight. After further stirring for 1 hour, the mixture was passed through a three-roll mill (model RIII-1RM-2 manufactured by Kodaira Seisakusho Co., Ltd.) four times. By adjusting the concentration by adding EGA to the obtained green ink, a green coloring composition having a solid content concentration of 18.0% by mass was obtained.
このようにして得られた緑色着色組成物１００質量部に更にジペンタエルスリトールヘキサアクリレート４．４質量部、４，４’−ビス（Ｎ，Ｎ−ジエチルアミノ）ベンゾフェノン０．７質量部、２，２’−ビス（ｏ−クロロフェニル）−４，４’，５，５’−テトラフェニル−１，２’−ビイミダゾール２．３質量部、トリメチロールプロパントリスチオプロピオネート３．８重量部およびＥＧＡ ４２質量部を加えて充分攪拌し、感光性着色組成物Ｂを得た。 To 100 parts by mass of the green coloring composition thus obtained, 4.4 parts by mass of dipentaerythritol hexaacrylate, 0.7 parts by mass of 4,4′-bis (N, N-diethylamino) benzophenone, 2 , 2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole 2.3 parts by weight, trimethylolpropane tristhiopropionate 3.8 parts by weight And 42 parts by mass of EGA were added and stirred sufficiently to obtain a photosensitive coloring composition B.
＜調製例４＞感光性組成物Ｃ：赤色感光性着色組成物の調製
調製例１で得られたアクリル系共重合体 ３０．０質量部（固形分 ６．６質量部）、ＥＧＡ ５．０質量部，フローレンＤＯＰＡ−３３（商標：共栄社化学株式会社製 分散剤
固形分濃度３０質量％）３．３重量部、Pigment Red １７７ ６．６質量部を混合後１晩放置した。更に１時間撹拌した後、３本ロールミル（株式会社 小平製作所製 型式ＲIII−１ＲＭ−２）に４回通した。得られた赤色インキにＥＧＡを加えて濃度調整することにより、固形分濃度１８．０質量％の赤色着色組成物を得た。
<Preparation Example 4> Photosensitive Composition C: Preparation of Red Photosensitive Colored Composition 30.0 parts by mass of acrylic copolymer obtained in Preparation Example 1 (6.6 parts by mass of solid content), EGA 5.0 Mass parts, 3.3 parts by weight of Florene DOPA-33 (trademark: Kyoeisha Chemical Co., Ltd. dispersant solid content concentration 30% by mass) and Pigment Red 177 6.6 parts by mass were allowed to stand overnight after mixing. After further stirring for 1 hour, the mixture was passed four times through a three-roll mill (Model RIII-1RM-2 manufactured by Kodaira Seisakusho Co., Ltd.). By adjusting the concentration by adding EGA to the obtained red ink, a red coloring composition having a solid concentration of 18.0% by mass was obtained.
該色組成物１００質量部に、更に、ジペンタエルスリトールヘキサアクリレート４．４質量部、イルガキュア３６９（チバスペシャリティケミカルズ社製）３．０質量部、トリメチロールプロパントリスチオプロピオネート３．８質量部、およびＥＧＡ ４２質量部を加えて充分攪拌し、感光性着色組成物Ｃを得た。 To 100 parts by weight of the color composition, 4.4 parts by weight of dipentaerythritol hexaacrylate, 3.0 parts by weight of Irgacure 369 (manufactured by Ciba Specialty Chemicals), 3.8 of trimethylolpropane tristhiopropionate Mass parts and 42 parts by mass of EGA were added and stirred sufficiently to obtain a photosensitive coloring composition C.
＜調製例５＞感光性組成物Ｄ：青色感光性着色組成物の調製
調製例１で得られたアクリル系共重合体 ３０．０質量部（固形分 ６．６質量部）、ＥＧＡ ５．０質量部，フローレンＤＯＰＡ−３３（商標：共栄社化学株式会社製 分散剤固形分濃度３０質量％）３．３重量部、Pigment Blue １５：６ ６．６質量部、Pigment Violet ２３ ０．６部を混合後１晩放置した。更に１時間撹拌した後、３本ロールミル（株式会社 小平製作所製 型式ＲIII−１ＲＭ−２）に４回通した。得られた青色インキにＥＧＡを加えて濃度調整することにより、固形分濃度１８．０質量％の青色着色組成物を得た。
<Preparation example 5> Photosensitive composition D: Preparation of blue photosensitive coloring composition 30.0 parts by mass (solid content 6.6 parts by mass) of acrylic copolymer obtained in Preparation Example 1, EGA 5.0 Part by mass, Floren DOPA-33 (trademark: Dispersant solid content concentration 30% by mass, manufactured by Kyoeisha Chemical Co., Ltd.) 3.3 parts by weight, Pigment Blue 15: 6 6.6 parts by mass, Pigment Violet 23 0.6 part Then left overnight. After further stirring for 1 hour, the mixture was passed four times through a three-roll mill (Model RIII-1RM-2 manufactured by Kodaira Seisakusho Co., Ltd.). By adjusting the concentration by adding EGA to the obtained blue ink, a blue coloring composition having a solid content concentration of 18.0% by mass was obtained.
このようにして得られた青色着色組成物１００質量部に、更に、ジペンタエルスリトールヘキサアクリレート４．４質量部、２−（４−アミノフェニル）−４，６−ビス（トリクロロメチル）−ｓ−トリアジン３．０質量部、トリメチロールプロパントリスチオプロピオネート３．８質量部、およびＥＧＡ ４２質量部を加えて充分攪拌し、感光性着色組成物Ｄを得た。 In addition to 100 parts by weight of the blue colored composition thus obtained, 4.4 parts by weight of dipentaerythritol hexaacrylate, 2- (4-aminophenyl) -4,6-bis (trichloromethyl)- A photosensitive coloring composition D was obtained by adding 3.0 parts by mass of s-triazine, 3.8 parts by mass of trimethylolpropane tristhiopropionate, and 42 parts by mass of EGA, and stirring sufficiently.
実施例１
調製例２〜調製例５で作成した感光性着色組成物Ａ〜感光性組成物Ｄをガラス板上（２８ｍｍ×７６ｍｍ）に１滴滴下し、室温にて２４時間乾燥させた。
Example 1
One drop of the photosensitive coloring composition A to the photosensitive composition D prepared in Preparation Examples 2 to 5 was dropped on a glass plate (28 mm × 76 mm) and dried at room temperature for 24 hours.
これをＤ−リモネン８０ｇ、Ｎ−メチル−２−ピロリドン２０ｇを混合した除去液中に３分間浸漬、静置し、表面に塗布された感光性着色組成物の洗浄除去を行った。その結果を表１に示す。 This was immersed for 3 minutes in a removing liquid in which 80 g of D-limonene and 20 g of N-methyl-2-pyrrolidone were mixed and allowed to stand, and the photosensitive coloring composition applied to the surface was washed and removed. The results are shown in Table 1.
実施例２〜１６、比較例１〜６
表１に示す組成の除去液を用いて、実施例１と同様に感光性着色組成物の除去を実施した。その結果を表１に示す。
Examples 2-16, Comparative Examples 1-6
Using the removal liquid having the composition shown in Table 1, the photosensitive coloring composition was removed in the same manner as in Example 1. The results are shown in Table 1.
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